JP4350043B2 - 分散液、塗工液および吸収性媒体 - Google Patents
分散液、塗工液および吸収性媒体 Download PDFInfo
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- JP4350043B2 JP4350043B2 JP2004556152A JP2004556152A JP4350043B2 JP 4350043 B2 JP4350043 B2 JP 4350043B2 JP 2004556152 A JP2004556152 A JP 2004556152A JP 2004556152 A JP2004556152 A JP 2004556152A JP 4350043 B2 JP4350043 B2 JP 4350043B2
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Description
− 粉末Aが0.05〜0.7μmの平均粒径および5〜50m2/gのBET表面積を有する無定形二酸化ケイ素粉末であり、
− 粉末Bが成長した一次粒子の凝集物から構成されている金属酸化物粉末または非金属酸化物粉末であり、5〜50nmの一次粒径および50〜400m2/gのBET表面積を示し、
− 分散液の所定のpHで粉末AおよびBが同じ表面電荷徴候を示し、粉末AおよびBが粉末間のファン・デル・ワールス引力よりも大きい粒子間の静電斥力を生じるゼータ電位を有し、分散液中で粉末A群の平均粒径が粉末B群の凝集物の60〜166%であり、
− 粉末AおよびBの総和に対して粉末Aの割合が少なくとも5質量%であり、
− 分散液中の粉末AおよびBの含量が分散液の全体量に対して20〜80質量%であり、
− 分散液の粘度が12s-1の剪断速度および23℃の温度で1500mPasの値を超えないことを特徴とする、粉末AおよびBを含有する安定した水性分散液を提供する。
また、本発明は、本発明による塗工液および支持体を用いてインキ吸収性コーティングを提供する。使用されうる支持体の例は、紙、コート紙、樹脂フィルム、例えばポリエチレンテレフタレート、ポリエチレンナフタレート、ジアセテート樹脂、トリアセテート樹脂、アクリル樹脂、ポリカーボネート樹脂、ポリ塩化ビニル、ポリイミド樹脂、セロファン、セルロイドを含めてポリエステル樹脂およびガラス板である。
分析法:分散液の粘度は、0.01〜100s−1の剪断速度で得られる測定値と一緒に、Parr-Physica社からの測定系CC27を有するMCR300装置を用いて測定される。粘度は、1s−1および100s−1ならびに23℃で記載される。塗工液の粘度は、100s−1および23℃でB型RVT回転粘度計で測定される。
配合物:12.33%の固体含量を有するポリビニルアルコール水溶液(PVA Mowiol 40-88, Clariant)をビーカー中に入れ、分散液D2の添加後に望ましい固体含量を有する塗工液が得られるような量の水を添加する。特殊な分散液を高速型ミキサーディスクで500rpmで攪拌しながら、ポリビニルアルコール溶液と水との組合せ物に添加する。添加が完結したら直ちにさらに30分間500rpmで攪拌を継続させる。次に、塗工液をデシケーターおよび水流ポンプを用いて脱気する。
塗工液S2−Aを湿潤フィルム螺旋形ブレードを用いて厚さ100μmの未処理のポリエステルフィルム(Benn)上に塗布する。乾燥をヘアドライヤーで実施する。得られた塗布速度は、25g/m2である。
Claims (16)
- 粉末AおよびBを含有する安定した水性分散液において、
− 粉末Aが0.05〜0.7μmの平均粒径および5〜50m2/gのBET表面積を有する無定形二酸化ケイ素粉末であり、
− 粉末Bが成長した一次粒子の凝集物から構成されている金属酸化物粉末または非金属酸化物粉末であり、5〜50nmの一次粒径および50〜400m2/gのBET表面積を示し、
− 分散液の所定のpHで粉末AおよびBが同じ表面電荷徴候を示し、粉末AおよびBが粉末間のファン・デル・ワールス引力よりも大きい粒子間の静電斥力を生じるゼータ電位を有し、分散液中で粉末A群の平均粒径が粉末B群の凝集物の60〜166%であり、
− 粉末AおよびBの総和に対して粉末Aの割合が少なくとも5質量%であり、
− 分散液中の粉末AおよびBの含量が分散液の全体量に対して20〜80質量%であり、
− 分散液の粘度が12s -1 の剪断速度および23℃の温度で1500mPasの値を超えないことを特徴とする、粉末AおよびBを含有する安定した水性分散液。 - 粉末Aが熱分解法で得られた二酸化ケイ素である、請求項1記載の分散液。
- 粉末Aが5〜30m2/gのBET表面積および40未満の分散係数Zを示し、この場合Z=Y/2Xであり、但し、Xは、粒径分布の中央値であり、Yは、累積粒径の10〜90%に対する粒径分布の範囲である、請求項2記載の分散液。
- 粉末Bの平均凝集物寸法が50〜500nmである、請求項1から3までのいずれか1項に記載の分散液。
- 粉末Bが熱分解法で得られた二酸化ケイ素である、請求項4記載の分散液。
- 粉末Bが熱分解法で得られた混合酸化物である、請求項4記載の分散液。
- 混合酸化物がケイ素−アルミニウム混合酸化物である、請求項6記載の分散液。
- 粉末AおよびBが陽イオン化された形で使用されている、請求項1から7までのいずれか1項に記載の分散液。
- 分散液がpHを調節するための物質、例えば酸、塩基または緩衝系、分散液を安定化するための添加剤、例えば塩、界面活性剤、有機溶剤、殺菌剤および/または殺真菌剤を含有する、請求項1から8までのいずれか1項に記載の分散液。
- 請求項1から9までのいずれか1項に記載の分散液を製造する方法において、粉末AとBを別々に分散装置により水性分散液中に分散させ、次に結合させるかまたは粉末AとBを最初に物理的に混合し、次に一緒に分散させるかまたは粉末AとBを少量ずつ分散装置中に装入し、次に一緒に分散させることを特徴とする、請求項1から9までのいずれか1項に記載の分散液を製造する方法。
- 請求項1から9までのいずれか1項に記載の分散液および少なくとも1つの親水性結合剤を用いてインキ吸収性コーティングを形成させるための塗工液。
- 粉末の含量が10〜60質量%である、請求項11記載の塗工液。
- 粉末に対する結合剤の割合が3〜150質量%である、請求項11または12記載の塗工液。
- 請求項11から13までのいずれか1項に記載の塗工液を製造する方法において、請求項1から9までのいずれか1項に記載の分散液を攪拌しながら親水性結合剤の水溶液に添加し、この水溶液に付加的に添加剤を場合によっては添加してもよく、場合によっては粉末と結合剤の望ましい割合および望ましい全固体含量が確立されるまで希釈することを特徴とする、請求項11から13までのいずれか1項に記載の塗工液を製造する方法。
- 請求項11から13までのいずれか1項に記載の塗工液および支持体を使用する吸収性媒体。
- 請求項15記載の吸収性媒体を製造する方法において、塗工液を支持体に塗布し、乾燥することを特徴とする、請求項15記載の吸収性媒体を製造する方法。
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| DE10256267A DE10256267A1 (de) | 2002-12-03 | 2002-12-03 | Dispersion, Streichfarbe und Aufnahmemedium |
| PCT/EP2003/012877 WO2004050377A1 (en) | 2002-12-03 | 2003-11-18 | Dispersion, coating slip and absorptive medium |
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| DE19943103A1 (de) * | 1999-09-09 | 2001-03-15 | Wacker Chemie Gmbh | Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung |
| US7083770B2 (en) * | 2000-06-20 | 2006-08-01 | Nippon Aerosil Co., Ltd. | Amorphous, fine silica particles, and method for their production and their use |
| AU2001277973A1 (en) * | 2000-07-21 | 2002-02-05 | Chul Chai | Ink jet recording medium |
| US20030091647A1 (en) * | 2001-11-15 | 2003-05-15 | Lewis Jennifer A. | Controlled dispersion of colloidal suspensions via nanoparticle additions |
| DE10203047A1 (de) * | 2002-01-26 | 2003-08-07 | Degussa | Kationische Mischoxid-Dispersion, Streichfarbe und tintenaufnehmendes Medium |
| DE50300055D1 (de) * | 2002-03-22 | 2004-09-23 | Degussa | Dispersion, Streichfarbe und Aufnahmemedium |
-
2002
- 2002-12-03 DE DE10256267A patent/DE10256267A1/de not_active Ceased
-
2003
- 2003-11-18 DE DE60334727T patent/DE60334727D1/de not_active Expired - Lifetime
- 2003-11-18 JP JP2004556152A patent/JP4350043B2/ja not_active Expired - Fee Related
- 2003-11-18 US US10/531,706 patent/US20060163533A1/en not_active Abandoned
- 2003-11-18 AT AT03779967T patent/ATE485947T1/de not_active IP Right Cessation
- 2003-11-18 AU AU2003288095A patent/AU2003288095A1/en not_active Abandoned
- 2003-11-18 WO PCT/EP2003/012877 patent/WO2004050377A1/en not_active Ceased
- 2003-11-18 CN CNB2003801050436A patent/CN100348426C/zh not_active Expired - Fee Related
- 2003-11-18 EP EP03779967A patent/EP1567362B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20060163533A1 (en) | 2006-07-27 |
| DE60334727D1 (de) | 2010-12-09 |
| CN1720147A (zh) | 2006-01-11 |
| EP1567362A1 (en) | 2005-08-31 |
| AU2003288095A1 (en) | 2004-06-23 |
| DE10256267A1 (de) | 2004-06-24 |
| ATE485947T1 (de) | 2010-11-15 |
| JP2006508882A (ja) | 2006-03-16 |
| EP1567362B1 (en) | 2010-10-27 |
| WO2004050377A1 (en) | 2004-06-17 |
| CN100348426C (zh) | 2007-11-14 |
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