JP4353772B2 - 電解水生成装置 - Google Patents
電解水生成装置 Download PDFInfo
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- JP4353772B2 JP4353772B2 JP2003378334A JP2003378334A JP4353772B2 JP 4353772 B2 JP4353772 B2 JP 4353772B2 JP 2003378334 A JP2003378334 A JP 2003378334A JP 2003378334 A JP2003378334 A JP 2003378334A JP 4353772 B2 JP4353772 B2 JP 4353772B2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 169
- 238000005868 electrolysis reaction Methods 0.000 claims description 48
- 239000003814 drug Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 13
- 238000011144 upstream manufacturing Methods 0.000 claims description 10
- 230000005856 abnormality Effects 0.000 claims description 5
- 230000001737 promoting effect Effects 0.000 claims description 5
- 229940079593 drug Drugs 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 37
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 34
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 22
- 239000000460 chlorine Substances 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000011780 sodium chloride Substances 0.000 description 7
- 238000010790 dilution Methods 0.000 description 6
- 239000012895 dilution Substances 0.000 description 6
- 239000004576 sand Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000005708 Sodium hypochlorite Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- -1 hydroxide ions Chemical class 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
- C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
- C02F2201/46125—Electrical variables
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
- C02F2201/46125—Electrical variables
- C02F2201/4614—Current
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4616—Power supply
- C02F2201/4617—DC only
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4618—Supplying or removing reactants or electrolyte
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
- C02F2209/006—Processes using a programmable logic controller [PLC] comprising a software program or a logic diagram
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/30—H2
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/42—Liquid level
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Description
以下、図面を参照しつつ、本発明の実施の形態を説明する。
NaCl ⇔ Na++Cl− (2)
また、電極対11のアノード電極近傍では、式(3)〜(5)に示すように、水の電気分解により酸素ガスが発生し、塩化物イオンは塩素ガスとなり、塩素ガスの一部は水和して次亜塩素酸となる。
2Cl− ⇔ Cl2↑+2e− (4)
Cl2+H2O ⇔ H++Cl−+HClO (5)
なお、電極対11のカソード電極近傍では、式(6),(7)に示すように、水の電気分解により水素ガスが発生し、アノード電極で生じたナトリウムイオンが水酸化物イオンと反応して水酸化ナトリウムが生成される。
Na++OH− ⇔ NaOH (7)
これにより、カソード電極近傍では、水酸化ナトリウムが生成されて、被処理水がアルカリ性となる。
上記した第1の実施の形態では、特に図5および図6を参照して説明されたように、図1に示された電解水生成装置において、電解槽10に添加される電解促進剤濃度を調整して当該電解槽10内の電解促進剤濃度を調整することにより、当該電解槽10内の最前段の電極の電流値が所定の範囲内(F2の範囲内)になるように、制御がなされる。
Claims (2)
- 被処理水を収容する電解槽を含み、
前記電解槽は、被処理水を導入される導入口と、当該電解槽内で電解処理された被処理水を排出する排出口とを有し、
前記電解槽内で、前記導入口から前記排出口に向けて形成される水路に沿って並べられた複数の電極対と、
前記複数の電極対のそれぞれに所定量の電力が供給されるよう制御する電力供給量制御手段と、
前記電解槽内に、前記電極対による被処理水の電解を促進するための薬剤を供給する薬剤供給手段と、
前記複数の電極対のそれぞれに前記所定量の電力が供給された際の、前記複数の電極対の中の、前記水路において最も上流側に並べられた電極対を構成する電極間に流れる電流値である第1の電流値と、当該最も上流側に並べられた電極対とは別の電極対を構成する電極間に流れる電流値である第2 の電流値とを検出する、電流値検出手段と、
前記第1の電流値が所定の範囲内となるように前記薬剤供給手段の供給する薬剤の供給量を制御する薬剤量制御手段とをさらに含み、
前記薬剤量制御手段は、前記第2の電流値が特定の電流値以上となった場合には、前記所定の範囲を規定する上限値および下限値を、それまでの値よりも低い値へと更新させる、電解水生成装置。 - 前記薬剤量制御手段による更新後の前記所定の範囲の下限値が一定の値を下回ったことを条件として、異常を報知する異常報知手段をさらに含む、請求項1に記載の電解水生成装置。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003378334A JP4353772B2 (ja) | 2003-11-07 | 2003-11-07 | 電解水生成装置 |
| KR1020040085277A KR100626586B1 (ko) | 2003-11-07 | 2004-10-25 | 전해수 생성장치 |
| US10/978,407 US20050109610A1 (en) | 2003-11-07 | 2004-11-02 | Electrolytic water generation apparatus having stable performance of electrolytic water generation |
| CN200410088497.3A CN1282611C (zh) | 2003-11-07 | 2004-11-03 | 电解水生成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003378334A JP4353772B2 (ja) | 2003-11-07 | 2003-11-07 | 電解水生成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005138044A JP2005138044A (ja) | 2005-06-02 |
| JP4353772B2 true JP4353772B2 (ja) | 2009-10-28 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003378334A Expired - Fee Related JP4353772B2 (ja) | 2003-11-07 | 2003-11-07 | 電解水生成装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20050109610A1 (ja) |
| JP (1) | JP4353772B2 (ja) |
| KR (1) | KR100626586B1 (ja) |
| CN (1) | CN1282611C (ja) |
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| JP5140218B2 (ja) * | 2001-09-14 | 2013-02-06 | 有限会社コヒーレントテクノロジー | 表面洗浄・表面処理に適した帯電アノード水の製造用電解槽及びその製造法、並びに使用方法 |
| CA2468856C (en) | 2001-12-05 | 2011-07-26 | Osao Sumita | Method and apparatus for producing negative and positive oxidative reductive potential (orp) water |
| US9168318B2 (en) | 2003-12-30 | 2015-10-27 | Oculus Innovative Sciences, Inc. | Oxidative reductive potential water solution and methods of using the same |
| US20050196462A1 (en) * | 2003-12-30 | 2005-09-08 | Oculus Innovative Sciences, Inc. | Topical formulation containing oxidative reductive potential water solution and method for using same |
| CA2602522C (en) | 2005-03-23 | 2014-09-09 | Oculus Innovative Sciences, Inc. | Method of treating skin ulcers using oxidative reductive potential water solution |
| BRPI0610901B1 (pt) | 2005-05-02 | 2019-04-16 | Oculus Innovative Sciences, Inc. | Uso de uma solução aquosa de potencial oxi-redutivo (orp). |
| EP1993571B1 (en) | 2006-01-20 | 2018-07-25 | Sonoma Pharmaceuticals, Inc. | Methods of treating or preventing inflammation and hypersensitivity with oxidative reductive potential water solution |
| KR100802361B1 (ko) * | 2006-12-01 | 2008-02-15 | (주) 시온텍 | 전해살균 소독수 공급장치 |
| KR101338220B1 (ko) * | 2006-12-20 | 2013-12-06 | (주)세호코리아 | 해수 전기분해에 의한 안전한 선박 냉각수 공급장치 및방법 |
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| WO2010148004A1 (en) | 2009-06-15 | 2010-12-23 | Oculus Innovative Sciences, Inc. | Solution containing hypochlorous acid and methods of using same |
| FR2951446B1 (fr) * | 2009-10-20 | 2011-11-25 | Pacific Ind | Dispositif de traitement d'une eau de bassin et notamment de piscine a partir d'un derive halogene et procede de mise en oeuvre associe |
| AR082347A1 (es) * | 2010-07-28 | 2012-11-28 | Chevron Usa Inc | Sistema y metodo de reutilizacion de agua de fluido de fractura |
| JP5909506B2 (ja) * | 2012-01-23 | 2016-04-26 | シャープ株式会社 | 水浄化装置および消毒液製造装置 |
| GB2513368B (en) * | 2013-04-25 | 2016-01-27 | Radical Filtration Ltd | Process apparatus |
| CN105198044B (zh) * | 2014-06-26 | 2017-12-01 | 苏州三星电子有限公司 | 一种溶液电解雾化装置 |
| JP5980373B1 (ja) * | 2015-04-28 | 2016-08-31 | シャープ株式会社 | 電解装置 |
| JP6578181B2 (ja) * | 2015-10-08 | 2019-09-18 | モレックス エルエルシー | 電解水の製造装置 |
| CN105352114B (zh) * | 2015-10-28 | 2017-10-03 | 小米科技有限责任公司 | 水流控制器及水流控制方法 |
| CN105645527A (zh) * | 2016-01-15 | 2016-06-08 | 佛山市海狮凯尔科技有限公司 | 一种动物饲养和植物养植专用的消毒设备 |
| TWI619678B (zh) * | 2016-07-21 | 2018-04-01 | Wu Huang Tzu | 電解水設備 |
| CN106977022B (zh) * | 2017-04-16 | 2020-11-27 | 重庆七口泉生物医药科技有限公司 | 一种强碱性电解水生产系统 |
| CN107055699A (zh) * | 2017-04-16 | 2017-08-18 | 重庆七口泉环保科技有限公司 | 一种控制电解液温度的强碱性电解水生成装置 |
| CN107055698A (zh) * | 2017-04-16 | 2017-08-18 | 重庆七口泉环保科技有限公司 | 一种控制电解液浓度的强碱性电解水生成装置 |
| WO2019026631A1 (ja) * | 2017-08-04 | 2019-02-07 | パナソニックIpマネジメント株式会社 | 電解促進錠剤投入装置及び電解水散布装置 |
| JP6621150B2 (ja) * | 2018-04-26 | 2019-12-18 | 興研株式会社 | 電解水生成装置及び内視鏡洗浄装置 |
| JP7269791B2 (ja) * | 2019-05-15 | 2023-05-09 | リンナイ株式会社 | 熱機器 |
| CN116157362B (zh) * | 2020-07-21 | 2025-07-25 | 松下知识产权经营株式会社 | 电解水喷洒装置 |
| TW202231585A (zh) * | 2020-09-29 | 2022-08-16 | 日商松下知識產權經營股份有限公司 | 電解水噴灑裝置 |
| CN115636479B (zh) * | 2021-07-19 | 2024-08-23 | 重庆美的制冷设备有限公司 | 净化设备及其控制方法、装置及存储介质 |
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| KR102654788B1 (ko) | 2021-10-12 | 2024-04-04 | 백진아 | 전해수 생성장치 |
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2003
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2004
- 2004-10-25 KR KR1020040085277A patent/KR100626586B1/ko not_active Expired - Fee Related
- 2004-11-02 US US10/978,407 patent/US20050109610A1/en not_active Abandoned
- 2004-11-03 CN CN200410088497.3A patent/CN1282611C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1282611C (zh) | 2006-11-01 |
| CN1613787A (zh) | 2005-05-11 |
| KR20050044245A (ko) | 2005-05-12 |
| KR100626586B1 (ko) | 2006-09-25 |
| JP2005138044A (ja) | 2005-06-02 |
| US20050109610A1 (en) | 2005-05-26 |
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