JP4356071B2 - Sputtering target material and manufacturing method thereof - Google Patents
Sputtering target material and manufacturing method thereof Download PDFInfo
- Publication number
- JP4356071B2 JP4356071B2 JP2004102899A JP2004102899A JP4356071B2 JP 4356071 B2 JP4356071 B2 JP 4356071B2 JP 2004102899 A JP2004102899 A JP 2004102899A JP 2004102899 A JP2004102899 A JP 2004102899A JP 4356071 B2 JP4356071 B2 JP 4356071B2
- Authority
- JP
- Japan
- Prior art keywords
- metal element
- target material
- sputtering target
- grains
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013077 target material Substances 0.000 title claims description 58
- 238000005477 sputtering target Methods 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002184 metal Substances 0.000 claims description 68
- 229910052751 metal Inorganic materials 0.000 claims description 68
- 239000000843 powder Substances 0.000 claims description 42
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 239000002994 raw material Substances 0.000 claims description 12
- 238000005245 sintering Methods 0.000 claims description 12
- 239000011159 matrix material Substances 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 238000011049 filling Methods 0.000 claims description 4
- 238000010298 pulverizing process Methods 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 16
- 229910001182 Mo alloy Inorganic materials 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 238000001513 hot isostatic pressing Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000000748 compression moulding Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000005098 hot rolling Methods 0.000 description 4
- 229910000599 Cr alloy Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000007088 Archimedes method Methods 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明は、平面表示装置等の電気配線、電極等に用いられるＭｏ合金薄膜の形成に使用されるスパッタリングターゲット材およびその製造方法に関するものである。 The present invention relates to a sputtering target material used for forming a Mo alloy thin film used for electric wiring, electrodes and the like of a flat display device and the like, and a manufacturing method thereof.
現在、平面表示装置の一種である液晶ディスプレイ（Ｌｉｑｕｉｄ Ｃｒｙｓｔａｌ Ｄｉｓｐｌａｙ、以下ＬＣＤという）等の薄膜電極および薄膜配線等には、電気抵抗の小さいＭｏ等の高融点金属膜が広く利用されている。そして、これら薄膜電極および薄膜配線等には、薄膜形成の製造工程中での、耐熱性、耐食性の要求があるため、例えば、ＣｒやＷを添加したＭｏ合金の適用が進んでいる。 At present, a refractory metal film such as Mo having a low electric resistance is widely used for thin film electrodes and thin film wirings of a liquid crystal display (hereinafter referred to as LCD) which is a kind of flat display device. And since these thin film electrodes, thin film wirings, and the like are required to have heat resistance and corrosion resistance during the manufacturing process of thin film formation, for example, application of Mo alloys to which Cr or W is added is in progress.
上記のＭｏ合金を配線として形成する方法としては、同一組成のターゲット材をスパッタリングによって形成する方法が一般的に利用されている。そして、Ｍｏ合金のスパッタリングターゲット材に関しては、成分構成やターゲット材に含まれる不純物の低減等に関して様々な提案がなされている。
例えば、Ｃｒを１〜５ｗｔ％含有したＭｏ−Ｃｒ合金スパッタリングターゲット材が開示されているものがある（例えば、特許文献１参照）。また、Ｗを２０〜７０原子％含有したＭｏ−Ｗターゲットが開示されているものがある（例えば、特許文献２参照）。さらに、Ｎｂおよび/またはＶを２〜５０原子％含有したＭｏ合金が開示されているものがある（例えば、特許文献３参照）。
For example, there has been disclosed a Mo—Cr alloy sputtering target material containing 1 to 5 wt% of Cr (see, for example, Patent Document 1). In addition, there is a Mo-W target containing 20 to 70 atomic% of W (see, for example, Patent Document 2). Further, there is a Mo alloy containing 2 to 50 atomic% of Nb and / or V (see, for example, Patent Document 3).
融点の高いＭｏは溶解鋳造法による製造が困難なため、一般に粉末焼結法が利用されている。Ｍｏ合金を製造する場合においては、Ｍｏ粉末と添加元素の粉末を混合した混合粉末を焼結する方法が利用されるが、混合粉末中に添加元素同士の粉末が凝集するために、焼結後に大きな成分の偏在が発生し、スパッタによって成膜された薄膜の成分が不均一になるという問題がある。また、さらに、成分の偏在により焼結体を塑性加工した場合に割れ等の欠陥が発生しやすいという問題もある。 Since Mo having a high melting point is difficult to produce by a melt casting method, a powder sintering method is generally used. In the case of manufacturing Mo alloy, a method of sintering a mixed powder obtained by mixing Mo powder and additive element powder is used. However, since the powder of additive elements aggregates in the mixed powder, after sintering, There is a problem that uneven distribution of large components occurs and the components of a thin film formed by sputtering become non-uniform. Furthermore, there is a problem that defects such as cracks are likely to occur when the sintered body is plastically processed due to uneven distribution of components.
本発明の目的は、上記課題に鑑み成分の偏在が抑制されることにより、スパッタによって成膜される薄膜の成分均一性を向上させるＭｏ合金スパッタリングターゲット材を提供することである。 The objective of this invention is providing the Mo alloy sputtering target material which improves the component uniformity of the thin film formed by sputtering by suppressing the uneven distribution of a component in view of the said subject.
本発明者等は、上記の問題点を種々検討した結果、添加する金属元素ＭとＭｏとで造粒粉末を形成した後に焼結することで、金属元素Ｍを著しく微細に分散でき、Ｍｏ中の酸素を固定可能な金属元素Ｍを微細に分散させ、その金属元素粒の周囲にＭｏ中の酸素を固定させた金属組織とすることで解決できることを見出し、本発明に到達した。さらに、金属元素Ｍ粒の周囲にＭｏ中の酸素を固定させたことで、塑性加工性をも向上させることを見出した。 As a result of various investigations on the above problems, the present inventors can disperse the metal element M remarkably finely by sintering after forming the granulated powder with the metal element M and Mo to be added. It has been found that the problem can be solved by finely dispersing the metal element M capable of fixing oxygen in a metal structure in which oxygen in Mo is fixed around the metal element grains. Furthermore, it discovered that the plastic workability was also improved by fixing oxygen in Mo around the metal element M grains.
すなわち、本発明は，Ｍｏを主体として、（Ｔｉ、Ｚｒ、Ｖ、Ｎｂ、Ｃｒ）から選択される金属元素Ｍを０．５〜５０原子％含有するスパッタリングターゲット材において、スパッタ面に対して垂直方向の断面ミクロ組織における金属元素Ｍ粒の周囲に酸化物が形成されており、該金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の最大面積が０．００９ｍｍ２以下であり、Ｍｏマトリックス中に微細に分散するスパッタリングターゲット材である。また、Ｍｏ合金に含有される金属元素Ｍは、Ｎｂであることが望ましい。
また、好ましくは、本発明は、スパッタ面の面積が１ｍ２以上であるスパッタリングターゲット材である。
また、好ましくは、本発明は、スパッタ面を構成する一辺の長さが１ｍ以上であるスパッタリングターゲット材である。
That is, the present invention is a sputtering target material containing 0.5 to 50 atomic% of a metal element M selected from (Ti, Zr, V, Nb, Cr) mainly composed of Mo and perpendicular to the sputtering surface. An oxide is formed around the metal element M grains in the cross-sectional microstructure in the direction, and the maximum area of the metal element M grains obtained by connecting the oxides present around the metal element M grains with a network is 0. 009 mm 2 Ri der less, a sputtering target material to be dispersed finely in the Mo matrix. Further, the metal element M contained in the Mo alloy is desirably Nb.
Also preferably, the present invention is a sputtering target material having a sputter surface area of 1 m 2 or more.
Preferably, the present invention is a sputtering target material in which the length of one side constituting the sputtering surface is 1 m or more.
また、本発明は、Ｍｏ原料粉末と(Ｔｉ、Ｚｒ、Ｖ、Ｎｂ、Ｃｒ)から選択される金属元素Ｍの原料粉末とを混合した後、圧縮成形した成形体を粉砕して再度粉末にした造粒粉末を、加圧容器に充填し、次いで加圧焼結を施すことで、スパッタ面に対して垂直方向の断面ミクロ組織における金属元素Ｍ粒の周囲に酸化物が形成されており、該金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の最大面積が０．００９ｍｍ２以下であり、Ｍｏマトリックス中に微細に分散するスパッタリングターゲット材の製造方法である。
また、好ましくは、加圧焼結後に塑性加工を施すスパッタリングターゲット材の製造方法である。
In the present invention, the Mo raw material powder and the raw material powder of the metal element M selected from (Ti, Zr, V, Nb, Cr) are mixed, and then the compression-molded compact is pulverized into a powder again. By filling the granulated powder into a pressurized container and then performing pressure sintering, an oxide is formed around the metal element M grains in the cross-sectional microstructure perpendicular to the sputtering surface, In the method for producing a sputtering target material, the maximum area of metal element M grains obtained by connecting oxides present around metal element M grains with a network is 0.009 mm 2 or less and finely dispersed in a Mo matrix. is there.
Moreover, it is preferable that the sputtering target material be produced by plastic working after pressure sintering.
本発明のスパッタリングターゲット材は、成分の偏在が抑制され、スパッタによって成膜される薄膜の成分均一性を向上させることができるものとなる。さらに、塑性加工性がよいものとなる。 In the sputtering target material of the present invention, uneven distribution of components can be suppressed, and the uniformity of components of a thin film formed by sputtering can be improved. Furthermore, the plastic workability is improved.
本発明における最大の特徴は、成分の偏在が抑制されたＭｏ合金スパッタリングターゲット材として、Ｍｏを主体として、（Ｔｉ、Ｚｒ、Ｖ、Ｎｂ、Ｃｒ）から選択される金属元素Ｍを０．５〜５０原子％含有するスパッタリングターゲット材において、断面ミクロ組織における金属元素Ｍ粒の周囲に存在する酸化物を結んで得られる金属元素Ｍ粒の面積が１．０ｍｍ２以下という金属組織を見出したことにある。さらに、上記の金属組織にすることによって塑性加工性をも向上できるという特徴を有する。
以下に本発明の金属組織および限定理由を詳細に述べる。
The greatest feature of the present invention is that the Mo alloy sputtering target material in which the uneven distribution of the components is suppressed, the metal element M selected from (Ti, Zr, V, Nb, Cr), with Mo as the main component, is 0.5 to In a sputtering target material containing 50 atomic%, a metal structure in which the area of the metal element M grains obtained by connecting oxides present around the metal element M grains in the cross-sectional microstructure is 1.0 mm 2 or less has been found. is there. Furthermore, it has the characteristic that plastic workability can also be improved by using said metal structure.
The metal structure of the present invention and the reason for limitation will be described in detail below.
本発明のスパッタリングターゲット材は、図１のＭｏ−Ｃｒ合金の断面ミクロ組織の組織写真に示すように、Ｍｏマトリックスに金属元素Ｍ粒（Ｃｒ粒）が分散したミクロ組織を有する。図１の組織を模式的に示した図２により、さらに詳細に説明すると、本発明のスパッタリングターゲット材は、Ｍｏマトリックス１に、金属元素Ｍ粒２の内部もしくは周囲に酸化物３が形成さている。そして、金属元素Ｍ粒２の周囲に存在する酸化物３をネットワークで結んで得られる金属元素Ｍ粒の面積とは、図２に示すように金属元素Ｍ粒の周囲に存在する酸化物３の中心を結ぶ線分で囲まれた面積４をいう。 The sputtering target material of the present invention has a microstructure in which metal element M grains (Cr grains) are dispersed in a Mo matrix, as shown in the structural photograph of the cross-sectional microstructure of the Mo—Cr alloy in FIG. Referring to FIG. 2 schematically showing the structure of FIG. 1, the sputtering target material of the present invention has an oxide 3 formed in or around a metal element M grain 2 in a Mo matrix 1. . The area of the metal element M grain obtained by connecting the oxide 3 existing around the metal element M grain 2 with a network is the oxide 3 existing around the metal element M grain as shown in FIG. An area 4 surrounded by a line connecting the centers.
（Ｔｉ、Ｚｒ、Ｖ、Ｎｂ、Ｃｒ）から選択される金属元素Ｍは、Ｍｏに添加することでＭｏの耐食性を向上できるため、Ｍｏ合金の含有元素として好ましいものである。さらに、金属元素Ｍは、Ｍｏと比較して酸化物生成エネルギー順位が低く、酸化物を生成しやすい元素である。そのため、Ｍｏ粉末と金属元素Ｍ粉末を使用して粉末焼結法によりＭｏ合金ターゲット材を作製する際には、Ｍｏマトリックスに固溶あるいは化合物を形成して析出する酸素が、金属元素Ｍ粒の周囲に酸化物を形成して固定される。この酸素のＭｏマトリックスからの移動により、Ｍｏマトリックス自体の塑性加工性が向上すると同時に、酸化物が固定された金属元素Ｍ粒が微細に分散することで、焼結体全体としての塑性加工性も向上するものと考えられる。 Since the metal element M selected from (Ti, Zr, V, Nb, Cr) can improve the corrosion resistance of Mo when added to Mo, it is preferable as the element contained in the Mo alloy. Furthermore, the metal element M is an element that has a lower oxide generation energy rank than Mo and easily generates an oxide. Therefore, when using Mo powder and metal element M powder to produce a Mo alloy target material by a powder sintering method, oxygen precipitated as a solid solution or a compound is formed in the Mo matrix. It is fixed by forming an oxide around it. Due to the movement of oxygen from the Mo matrix, the plastic workability of the Mo matrix itself is improved, and at the same time, the metal element M grains on which the oxide is fixed are finely dispersed, so that the plastic workability of the entire sintered body is also improved. It is thought to improve.
本発明において、断面ミクロ組織における金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積は、成分の偏在を抑制する点および塑性加工性の点からより狭いものとすることが望ましい。本発明者らは、スパッタリングターゲット材の塑性加工性の点およびスパッタリングにより成膜した薄膜の特性の点から検討した結果、最大でも１．０ｍｍ２以下である必要があることを確認した。さらに、好ましくは０．１ｍｍ２以下である。 In the present invention, the area of the metal element M grains obtained by connecting the oxides present around the metal element M grains in the cross-sectional microstructure with a network is narrower from the viewpoint of suppressing the uneven distribution of components and the plastic workability. It is desirable to make it. The present inventors have examined from the viewpoint of the plastic workability of the sputtering target material and the characteristics of the thin film formed by sputtering, and have confirmed that it is necessary to be 1.0 mm 2 or less at the maximum. Furthermore, it is preferably 0.1 mm 2 or less.
なお、金属元素Ｍの含有量を０．５〜５０原子％とした理由は、下限が０．５原子％を下回る場合は、金属元素ＭがＭｏから酸素を吸収するという効果が極めて小さくなるためであり、５０原子％より高くなるとベースとなるＭｏ本来の性質を失うためである。 The reason why the content of the metal element M is 0.5 to 50 atomic% is that when the lower limit is less than 0.5 atomic%, the effect that the metal element M absorbs oxygen from Mo becomes extremely small. This is because, when the content is higher than 50 atomic%, the original properties of Mo as a base are lost.
次に、本発明のスパッタリングターゲット材を作製するための好ましい方法を以下に説明する。
本発明のスパッタリングターゲット材の特徴は、前述の通り金属元素Ｍが、Ｍｏ原料粉末の表面付着酸素を吸収する点にある。金属元素Ｍの原料粉末は、比重、形状、粒径といった粉末性状がＭｏと異なるため、単純にＭｏ原料粉末と混合しても均一な分散状態を得ることはできない。すなわち金属元素Ｍを添加したＭｏ合金の特徴を最大限に活用する意味で成分の均一な分散性が重要となる。
Next, the preferable method for producing the sputtering target material of this invention is demonstrated below.
The feature of the sputtering target material of the present invention is that the metal element M absorbs oxygen adhering to the surface of the Mo raw material powder as described above. Since the raw material powder of the metal element M is different from Mo in powder properties such as specific gravity, shape, and particle diameter, a uniform dispersion state cannot be obtained even if simply mixed with the Mo raw material powder. That is, the uniform dispersibility of the components is important in order to make the best use of the characteristics of the Mo alloy added with the metal element M.
金属元素Ｍの原料粉末とＭｏ原料粉末の混合は、Ｖ型混合機、クロスロータリーミキサー等の一般的な混合機による混合をした後に、一度、冷間静水圧プレス（ＣＩＰ）等で圧縮成形し、次いでその圧縮成形体を粉砕して再度粉末にする造粒方法をとることが、金属元素Ｍの均一な分散を実現する上で極めて重要である。それは、ＣＩＰ等による圧縮成形の時点では、原料粉末の混合時の混合状態が反映されるが、次の圧縮成形体の粉砕工程で再び分離、細分散されることになり分散性が向上できるためである。また、造粒粉末の粒径が分散効果の点で重要である。造粒粉末の平均粒径が５ｍｍを超えると再粉砕時の分散効果が小さいため、好ましくは５ｍｍ以下、より好ましくは３ｍｍ以下、さらに好ましくは１ｍｍ以下である。 Mixing of the metal element M raw material powder and Mo raw material powder is performed by compression molding with a cold isostatic press (CIP) once after mixing with a general mixer such as a V-type mixer or cross rotary mixer. Then, it is extremely important to achieve a uniform dispersion of the metal element M by taking a granulation method in which the compression molded body is pulverized and re-pulverized. This is because, at the time of compression molding with CIP or the like, the mixing state at the time of mixing the raw material powder is reflected, but since it is separated and finely dispersed again in the next compression molding body pulverization step, the dispersibility can be improved. It is. Further, the particle size of the granulated powder is important in terms of the dispersion effect. When the average particle diameter of the granulated powder exceeds 5 mm, the dispersion effect at the time of re-pulverization is small, and therefore, it is preferably 5 mm or less, more preferably 3 mm or less, and even more preferably 1 mm or less.
さらに、上述の造粒粉末を加圧容器に充填後脱気封止して加圧焼結法により焼結した焼結体を作製し機械加工するか、前記焼結体に熱間圧延等の塑性加工を施した後に所望の寸法のターゲット材を得る。造粒粉末を焼結することで、加圧焼結前の粉末自身で成分の均一な分散を実現でき、ターゲット材においても金属元素ＭがＭｏマトリックス中に微細に分散できるため、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積を１．０ｍｍ２以下とすることが可能となる。 Further, the above-mentioned granulated powder is filled in a pressure vessel and then deaerated and sealed, and a sintered body sintered by a pressure sintering method is produced and machined, or the sintered body is subjected to hot rolling or the like. A target material having a desired dimension is obtained after plastic working. By sintering the granulated powder, uniform dispersion of the components can be realized by the powder itself before pressure sintering, and the metal element M can be finely dispersed in the Mo matrix even in the target material. It is possible to make the area of the metal element M grains obtained by connecting the oxides present around the metal by a network to be 1.0 mm 2 or less.
また、本発明のスパッタリングターゲット材に含有される金属元素Ｍとしては、Ｖ、Ｎｂ、Ｃｒが、ＬＣＤ等の薄膜配線、薄膜電極の形成に使用する場合に、耐食性を具備した低抵抗な薄膜が得られるために好ましい。さらに、その中でもより低抵抗な薄膜を得られるためＮｂが好ましい。また、Ｚｒ、Ｔｉは、Ｖ、Ｎｂ、Ｃｒに比べＭｏに添加した場合に抵抗が大きくなるが、耐食性の向上効果が高いため、ＬＣＤ等の主導電膜のバリヤ膜としての使用が望ましい。 In addition, as the metal element M contained in the sputtering target material of the present invention, when V, Nb, and Cr are used for forming a thin film wiring and a thin film electrode such as an LCD, a low resistance thin film having corrosion resistance is used. It is preferable because it is obtained. Furthermore, among these, Nb is preferable because a low-resistance thin film can be obtained. In addition, Zr and Ti have higher resistance when added to Mo than V, Nb, and Cr. However, since Zr and Ti are highly effective in improving corrosion resistance, they are desirably used as barrier films for main conductive films such as LCDs.
また、現在、ＬＣＤのパネルサイズの大型化に伴い、ＬＣＤの薄膜配線、薄膜電極に使用されるスパッタリングターゲット材も、スパッタ面の面積が１ｍ２以上の大型品、あるいは１辺の長さが１ｍ以上の長尺品のターゲット材が必要とされている。
これらの大型品、長尺品のターゲット材に対応するためには、焼結体等に塑性加工を施して対応する方法が考えられる。そのため、本発明の金属組織を有するスパッタリングターゲット材は塑性加工性が優れており、さらにスパッタ面の成分の均一性に優れているため、スパッタ面の面積が１ｍ２以上の大型品、あるいは１辺の長さが１ｍ以上の長尺品のターゲット材に好適である。
In addition, with the increase in LCD panel size, sputtering target materials used for LCD thin film wiring and thin film electrodes are also large products with a sputter surface area of 1 m 2 or more, or the length of one side is 1 m. There is a need for a long target material.
In order to cope with these large and long target materials, there can be considered a method in which the sintered body is subjected to plastic working. Therefore, since the sputtering target material having the metal structure of the present invention has excellent plastic workability and excellent uniformity of the components of the sputtered surface, a large-sized product having a sputtered surface area of 1 m 2 or more, or one side Is suitable for a long target material having a length of 1 m or more.
本発明の実施例について以下に説明する。
平均粒径６μｍのＭｏ粉末、平均粒径１００μｍのＮｂ粉末、Ｃｒ粉末、Ｔｉ粉末、Ｚｒ粉末、Ｖ粉末を準備した。表１に示すスパッタリングターゲット材を製造するために、Ｍｏ粉末および各添加元素の金属粉末を所定の原子％比率で秤量後、Ｖ型混合機で１０分間混合して得られた原料粉末を冷間静水圧プレス（ＣＩＰ）で圧縮成形した圧密体を作製した。その後、前記圧密体をジョークラッシャーおよびディスクミルを使用して粉砕し造粒粉末を作製した。その造粒粉末を再度Ｖ型混合機で１０分間混合した後、内径寸法で厚さ１００ｍｍ×幅１２５０ｍｍ×高さ１４５０ｍｍの軟鋼製加圧容器に充填した。充填後、加圧容器の上蓋を溶接した後に４５０℃の温度下で真空脱気して封止し、次いで熱間静水圧プレス（ＨＩＰ）で加圧焼結した。ＨＩＰは、1２５０℃、１２０ＭＰａの条件下で５時間保持した。ＨＩＰ後の焼結体を切断および機械加工して、厚さ１６ｍｍ×幅９８０ｍｍ×長さ１１５０ｍｍのスパッタリングターゲット材を得た。
Examples of the present invention will be described below.
Mo powder with an average particle size of 6 μm, Nb powder with an average particle size of 100 μm, Cr powder, Ti powder, Zr powder, and V powder were prepared. In order to produce the sputtering target material shown in Table 1, Mo powder and metal powder of each additive element were weighed at a predetermined atomic% ratio, and then the raw material powder obtained by mixing for 10 minutes with a V-type mixer was cooled. A consolidated body compression-molded by an isostatic press (CIP) was produced. Thereafter, the compacted body was pulverized using a jaw crusher and a disk mill to produce a granulated powder. The granulated powder was again mixed for 10 minutes with a V-type mixer, and then filled into a pressure vessel made of mild steel having an inner diameter of 100 mm thick × 1250 mm wide × 1450 mm high. After filling, the upper lid of the pressurized container was welded, vacuum degassed and sealed at a temperature of 450 ° C., and then pressure sintered by hot isostatic pressing (HIP). The HIP was held at 1250 ° C. and 120 MPa for 5 hours. The sintered body after HIP was cut and machined to obtain a sputtering target material having a thickness of 16 mm × width of 980 mm × length of 1150 mm.
また、比較例として、表１の試料Ｎｏ．７、８に示すスパッタリングターゲット材を下記の通り製造した。Ｍｏ粉末およびＮｂ粉末を所定の原子％比率で秤量後、Ｖ型混合機で１０分間混合して得られた原料粉末を圧縮成形せずに直接に上記と同一寸法の軟鋼製加圧容器に充填した。充填後、加圧容器の上蓋を溶接した後に４５０℃の温度下で真空脱気して封止し、次いで1２５０℃、１２０ＭＰａ、５時間保持するＨＩＰを行い焼結体を作製した。その後、このＨＩＰ後の焼結体を切断および機械加工して、厚さ１６ｍｍ×幅８９０ｍｍ×長さ９８０ｍｍのターゲット材を得た。 As a comparative example, sample No. The sputtering target materials shown in 7 and 8 were produced as follows. After weighing Mo powder and Nb powder at the specified atomic% ratio, the raw material powder obtained by mixing for 10 minutes with a V-type mixer is directly packed into a pressure vessel made of mild steel with the same dimensions as above without compression molding. did. After filling, the upper lid of the pressurized container was welded, vacuum degassed and sealed at a temperature of 450 ° C., and then HIP held at 1250 ° C., 120 MPa for 5 hours to prepare a sintered body. Thereafter, the sintered body after HIP was cut and machined to obtain a target material having a thickness of 16 mm × width of 890 mm × length of 980 mm.
上記で作製したスパッタリングターゲット材からスパッタ面と垂直の断面で６×１０ｍｍの試験片を採取し、走査型電子顕微鏡（ＳＥＭ）によってミクロ組織観察を行った。前記の試験片は、図３に示すようにスパッタリングターゲット材５をスパッタ面６から見て対角線上端部７および中央部８の計５箇所から採取した。なお、ＳＥＭによるミクロ組織の観察は各試験片の全体を観察し、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積が最大のものを選択し、その試験片の代表金属元素Ｍ粒とした。そして、この各試験片の代表金属元素Ｍ粒周囲のミクロ組織写真を撮影し、酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積とそれ以外に二値化して画像解析法により面積を測定した。さらにこの５箇所の試験片の代表金属元素Ｍ粒の面積の中で最大のものを代表値として表１に示す。また、各スパッタリングターゲット材の相対密度をアルキメデス法により測定した結果を同様に表１に示す。 A 6 × 10 mm test piece with a cross section perpendicular to the sputtering surface was collected from the sputtering target material prepared above, and the microstructure was observed with a scanning electron microscope (SEM). As shown in FIG. 3, the test specimens were collected from a total of five locations including a diagonal upper end portion 7 and a central portion 8 when the sputtering target material 5 was viewed from the sputtering surface 6. In addition, the observation of the microstructure by SEM is to observe the whole of each test piece, and select the one having the largest area of the metal element M grain obtained by connecting the oxide present around the metal element M grain with a network, It was set as the representative metal element M grain of the test piece. Then, a micro structure photograph around the representative metal element M grain of each test piece is taken, and the area of the metal element M grain obtained by connecting oxides with a network and the other are binarized, and the area is determined by image analysis. It was measured. Further, Table 1 shows the maximum value among the areas of the representative metal element M grains of the five test pieces as representative values. Moreover, the result of having measured the relative density of each sputtering target material by the Archimedes method is similarly shown in Table 1.
また、本発明例の試料Ｎｏ．４のスパッタリングターゲット材をＳＥＭで５００倍に拡大したミクロ組織を撮影した写真を図４に、図４と同一視野においてＥＰＭＡ（Ｅｌｅｃｔｒｏｎ Ｐｒｏｂｅ Ｍｉｃｒｏａｎａｌｙｓｅｒ）でＮｂ粒をカラーマップ化したスケッチを図５に示す。図４および図５から図の中央部分にＮｂ粒が５個存在することが確認できる。そして、図４からＮｂ粒の周囲に黒色で識別できる酸化物が存在しており、そのＮｂ粒の周囲に存在する酸化物をネットワークで結んで得られるＮｂ粒の最大面積がいずれも１．０ｍｍ２以下であることが分かる。なお、ＥＰＭＡによるカラーマップによって図４のＮｂ粒の周囲に存在する黒色の粒が酸化物であることを確認した。 In addition, Sample No. FIG. 4 shows a photograph of a microstructure obtained by enlarging a sputtering target material of No. 4 500 times with an SEM, and FIG. 5 shows a sketch of color mapping Nb grains with an EPMA (Electron Probe Microanalyzer) in the same field of view as FIG. . It can be confirmed from FIG. 4 and FIG. 5 that there are five Nb grains in the center of the figure. From FIG. 4, there is an oxide that can be identified in black around the Nb grains, and the maximum area of the Nb grains obtained by connecting the oxides around the Nb grains with a network is 1.0 mm. It turns out that it is 2 or less. It was confirmed by the EPMA color map that the black grains present around the Nb grains in FIG. 4 were oxides.
表１に示した通り、本発明例の試料Ｎｏ．１〜６のスパッタリングターゲット材は、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積が１．０ｍｍ２以下であることがわかる。
一方、比較例の試料Ｎｏ．７、８のスパッタリングターゲット材は、部位による金属元素Ｍの分布差が認められ、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積が１．０ｍｍ２を超えるものであることを確認した。
As shown in Table 1, sample No. It can be seen that in the sputtering target materials 1 to 6, the area of the metal element M grains obtained by connecting oxides present around the metal element M grains with a network is 1.0 mm 2 or less.
On the other hand, Sample No. In the sputtering target materials of Nos. 7 and 8, a difference in distribution of the metal element M depending on the part is recognized, and the area of the metal element M grain obtained by connecting oxides present around the metal element M grain with a network is 1.0 mm 2. It was confirmed that it was over.
実施例1で作製したと同様の組成、寸法の焼結体を同様の製法で作製し、さらに熱間圧延を実施した。熱間圧延は、ＨＩＰによる終了後に加圧容器を除去せずそのままの状態で、１１５０℃加熱と圧下率５０％以下の圧延を５回実施した。目標圧下率は２５％とした。熱間圧延後に切断および機械加工して、厚さ１０ｍｍ×幅１１３０ｍｍ×長さ１２００ｍｍのスパッタリングターゲット材を得た。実施例１で評価したのと同様に、スパッタリングターゲット材からスパッタ面と垂直の断面で６×１０ｍｍの試験片を採取し、走査型電子顕微鏡（ＳＥＭ）によってミクロ組織観察を行い、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積を測定した。その結果を表２に示す。また、各スパッタリングターゲット材の相対密度をアルキメデス法により測定した結果を同様に表２に示す。なお、試料Ｎｏ．１７、１８は、熱間圧延時に焼結体の周囲から割れが発生したため、スパッタリングターゲット材が作製できなかった。 A sintered body having the same composition and dimensions as those produced in Example 1 was produced by the same production method, and further hot-rolled. In the hot rolling, after completion of HIP, the pressure vessel was not removed and the heating was performed at 1150 ° C. and rolling with a reduction rate of 50% or less was performed 5 times. The target reduction rate was 25%. After hot rolling, cutting and machining were performed to obtain a sputtering target material having a thickness of 10 mm × width of 1130 mm × length of 1200 mm. In the same manner as evaluated in Example 1, a 6 × 10 mm test piece was taken from the sputtering target material in a cross section perpendicular to the sputtering surface, and the microstructure was observed with a scanning electron microscope (SEM). The area of metal element M grains obtained by connecting oxides present in the vicinity of each other with a network was measured. The results are shown in Table 2. Table 2 shows the results of measuring the relative density of each sputtering target material by the Archimedes method. Sample No. In Nos. 17 and 18, a crack was generated from the periphery of the sintered body during hot rolling, and thus a sputtering target material could not be produced.
また、本発明例の試料Ｎｏ．１４のスパッタリングターゲット材をＳＥＭで１５００倍に拡大したミクロ組織を撮影した写真を図６に、図６と同一視野においてＥＰＭＡでＮｂ粒をカラーマップ化したスケッチを図７に示す。図６および図７から図の中央部分にＮｂ粒が存在することが確認できる。そして、図６からＮｂ粒の周囲に黒色で識別できる酸化物が存在しており、そのＮｂ粒の周囲に存在する酸化物をネットワークで結んで得られるＮｂ粒の最大面積が１．０ｍｍ２以下であることが分かる。なお、ＥＰＭＡによるカラーマップによって図６のＮｂ粒の周囲に存在する黒色の粒が酸化物であることを確認した。 In addition, Sample No. FIG. 6 shows a photograph of the microstructure of 14 sputtering target materials magnified 1500 times with SEM, and FIG. 7 shows a sketch of color mapping Nb grains with EPMA in the same field of view as FIG. It can be confirmed from FIG. 6 and FIG. 7 that Nb grains are present in the center of the figure. From FIG. 6, there is an oxide that can be identified in black around the Nb grain, and the maximum area of the Nb grain obtained by connecting the oxide around the Nb grain with a network is 1.0 mm 2 or less. It turns out that it is. It was confirmed by the EPMA color map that the black grains present around the Nb grains in FIG. 6 were oxides.
表２に示した通り、金属元素Ｍ粒の周囲に存在する酸化物をネットワークで結んで得られる金属元素Ｍ粒の面積が１．０ｍｍ２以下である本発明のスパッタリングターゲット材であれば、所望の形状に圧延が可能であった。また、これらのスパッタリングターゲット材は十分な相対密度が得られた。 As shown in Table 2, if the sputtering target material of the present invention in which the area of the metal element M grains obtained by connecting the oxides present around the metal element M grains with a network is 1.0 mm 2 or less is desired It was possible to roll to the shape of Moreover, sufficient relative density was obtained for these sputtering target materials.
１ Ｍｏマトリックス、２ 金属元素Ｍ粒、３ 酸化物、４ 面積、５ スパッタリングターゲット材、６ スパッタ面、７ 対角線上端部、８ 中央部 1 Mo matrix, 2 metal element M grains, 3 oxide, 4 area, 5 sputtering target material, 6 sputtering surface, 7 diagonal upper end, 8 center
Claims (6)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004102899A JP4356071B2 (en) | 2004-03-31 | 2004-03-31 | Sputtering target material and manufacturing method thereof |
| US11/070,339 US20050230244A1 (en) | 2004-03-31 | 2005-03-03 | Sputter target material and method of producing the same |
| CNB2005100594763A CN100447290C (en) | 2004-03-31 | 2005-03-25 | Sputtering target material and production method thereof |
| TW094109924A TWI310407B (en) | 2004-03-31 | 2005-03-30 | Sputter target material and method of producing the same |
| KR1020050026676A KR100665243B1 (en) | 2004-03-31 | 2005-03-30 | Sputtering Target Material and Manufacturing Method Thereof |
| KR1020060086790A KR20060102322A (en) | 2004-03-31 | 2006-09-08 | Sputtering Target Material and Manufacturing Method Thereof |
| US12/479,121 US8409498B2 (en) | 2004-03-31 | 2009-06-05 | Method of producing a sputter target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004102899A JP4356071B2 (en) | 2004-03-31 | 2004-03-31 | Sputtering target material and manufacturing method thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005290409A JP2005290409A (en) | 2005-10-20 |
| JP2005290409A5 JP2005290409A5 (en) | 2006-08-24 |
| JP4356071B2 true JP4356071B2 (en) | 2009-11-04 |
Family
ID=35323679
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004102899A Expired - Lifetime JP4356071B2 (en) | 2004-03-31 | 2004-03-31 | Sputtering target material and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4356071B2 (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008255440A (en) * | 2007-04-06 | 2008-10-23 | Hitachi Metals Ltd | MoTi ALLOY SPUTTERING TARGET MATERIAL |
| AT10578U1 (en) * | 2007-12-18 | 2009-06-15 | Plansee Metall Gmbh | DUNGOUS SOLAR CELL WITH MOLYBDAN-CONTAINING ELECTRODE LAYER |
| JP5518375B2 (en) * | 2008-09-19 | 2014-06-11 | 山陽特殊製鋼株式会社 | Formed body made of molybdenum alloy having excellent drillability for accelerating electrode and method for producing the same |
| JP5287669B2 (en) * | 2009-11-04 | 2013-09-11 | 住友金属鉱山株式会社 | Method for producing zinc oxide-based oxide pellets for vacuum deposition |
| US8449817B2 (en) | 2010-06-30 | 2013-05-28 | H.C. Stark, Inc. | Molybdenum-containing targets comprising three metal elements |
| US8449818B2 (en) * | 2010-06-30 | 2013-05-28 | H. C. Starck, Inc. | Molybdenum containing targets |
| US9334565B2 (en) | 2012-05-09 | 2016-05-10 | H.C. Starck Inc. | Multi-block sputtering target with interface portions and associated methods and articles |
| AT13602U3 (en) | 2013-10-29 | 2014-08-15 | Plansee Se | Sputtering target and method of preparation |
| CN115094390A (en) * | 2014-09-30 | 2022-09-23 | 捷客斯金属株式会社 | Master alloy for sputtering target and method for producing sputtering target |
| AT15356U1 (en) * | 2016-09-29 | 2017-07-15 | Plansee Se | Sputtering target |
| JP7205213B2 (en) * | 2018-03-27 | 2023-01-17 | 日立金属株式会社 | TiW alloy target and manufacturing method thereof |
| JP7267086B2 (en) * | 2019-05-07 | 2023-05-01 | 株式会社アルバック | Sputtering target manufacturing method |
| CN115210018A (en) * | 2020-01-31 | 2022-10-18 | 麻省理工学院 | Molybdenum-containing alloys and related systems and methods |
| CN111850490B (en) * | 2020-07-29 | 2023-01-20 | 丰联科光电(洛阳)股份有限公司 | Binary molybdenum alloy sputtering target material and preparation method thereof |
| CN114934260B (en) * | 2022-05-23 | 2024-02-13 | 安泰天龙钨钼科技有限公司 | A kind of molybdenum alloy target material and its preparation method and application |
| KR102854577B1 (en) * | 2022-11-23 | 2025-09-03 | 주식회사 이엠엘 | Manufacturing method of high purity Mo sputtering target |
-
2004
- 2004-03-31 JP JP2004102899A patent/JP4356071B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005290409A (en) | 2005-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8409498B2 (en) | Method of producing a sputter target material | |
| JP4356071B2 (en) | Sputtering target material and manufacturing method thereof | |
| JP4110533B2 (en) | Manufacturing method of Mo-based target material | |
| JP4894008B2 (en) | Method for producing MoNb-based sintered sputtering target material | |
| JP6493561B2 (en) | High entropy alloy member, method for producing the alloy member, and product using the alloy member | |
| JP2013083000A (en) | METHOD OF MANUFACTURING SINTERED Mo ALLOY SPUTTERING TARGET MATERIAL | |
| US10207372B2 (en) | Aluminum composite material and method for manufacturing aluminum composite material | |
| TW201704494A (en) | Polycrystalline tungsten and tungsten alloy sintered body and the manufacturing method thereof | |
| JP2012237056A (en) | METHOD FOR PRODUCING MoCr TARGET MATERIAL AND THE MoCr TARGET MATERIAL | |
| CN111304512A (en) | Medium-high entropy alloy material, preparation method and application thereof | |
| JP5322754B2 (en) | Metal matrix composite | |
| JP2017534059A (en) | Radiation shielding composition and method for producing the same | |
| CN101514404A (en) | Process of using powder metallurgy method to prepare alloy | |
| JP7557648B2 (en) | Oxide sintered body, its manufacturing method, and sputtering target material | |
| CN107208259A (en) | Chromium titanium alloy sputtering target material and its manufacture method | |
| JP4721090B2 (en) | Manufacturing method of Mo-based target material | |
| JP2010255032A (en) | Metal matrix composite | |
| JP4591749B2 (en) | Manufacturing method of Mo target material | |
| JP4953168B2 (en) | Te-based sputtering target for forming an optical recording medium film with less generation of particles | |
| JP4706980B2 (en) | Manufacturing method of Mo target material | |
| JPH02259029A (en) | Manufacture of aluminide | |
| Olejarz et al. | Role of chromium oxides and carbides in strengthening CoCrFeNi multi-principle element alloys | |
| JP2002212607A (en) | Manufacturing method of high melting point alloy | |
| CN104508173A (en) | Target material and method for producing same | |
| KR20120122898A (en) | Method of producing MoCr sputtering target material and MoCr sputtering target material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060711 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060711 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090220 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090227 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090420 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090710 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090723 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120814 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4356071 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120814 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130814 Year of fee payment: 4 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |