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JP4367632B2 - Silphenylene compound having photopolymerization initiating group and method for producing the same - Google Patents
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JP4367632B2 - Silphenylene compound having photopolymerization initiating group and method for producing the same - Google Patents

Silphenylene compound having photopolymerization initiating group and method for producing the same Download PDF

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JP4367632B2
JP4367632B2 JP2004141889A JP2004141889A JP4367632B2 JP 4367632 B2 JP4367632 B2 JP 4367632B2 JP 2004141889 A JP2004141889 A JP 2004141889A JP 2004141889 A JP2004141889 A JP 2004141889A JP 4367632 B2 JP4367632 B2 JP 4367632B2
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silphenylene
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欣也 児玉
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Shin Etsu Chemical Co Ltd
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本発明は、ラジカル重合開始基を有するシルフェニレン化合物及びその製造方法に関し、更に詳しくは、(メタ)アクリル官能基を有する樹脂、特に、(メタ)アクリル変性シリコーン樹脂及びエポキシアクリレートの光重合開始剤として、樹脂との相溶性が高く、低温においても樹脂分から光重合開始剤が分離析出しない新規な光重合開始基を有するシルフェニレン化合物及びその製造方法に関する。   The present invention relates to a silphenylene compound having a radical polymerization initiating group and a method for producing the same, and more particularly, a resin having a (meth) acryl functional group, in particular, a photopolymerization initiator of (meth) acryl-modified silicone resin and epoxy acrylate. The present invention relates to a silphenylene compound having a novel photopolymerization initiating group having high compatibility with a resin and in which a photopolymerization initiator does not separate and precipitate from a resin component even at low temperatures, and a method for producing the same.

従来から、光重合開始剤は混合する樹脂の種類や用途によって使い分けられているが、実際には、種々市販の光開始剤の中から検討することにより最適な開始剤を選択していることが多い。従って、混合する樹脂と相溶性が悪いなどの不都合が生じることもある。   Conventionally, photopolymerization initiators have been properly used depending on the type of resin to be mixed and the application, but in practice, the optimum initiator may be selected by examining among various commercially available photoinitiators. Many. Therefore, inconveniences such as poor compatibility with the resin to be mixed may occur.

そこで、化学修飾可能な光開始剤を目的に応じて各種化合物と反応させることにより、新規に光開始剤を合成するケースも報告されている。低揮発性で、臭気が少ないという利点を持つ4−(2−ヒドロキシエトキシ)フェニル−2−ヒドロキシ−2−プロピルケトン(イルガキュア2959、チバ・スペシャリティー・ケミカルズ社製商品名)は、化学修飾可能な化合物であり、(メタ)アクリル基の重合開始剤として多く使用されているが、例えば、シリコーン樹脂に溶解後、低温で放置すると樹脂分から析出してしまうという欠点があり、冬期の保存安定性に問題がある。また、常温で固体であるため、樹脂に溶解しにくいという問題もある。   Thus, a case has been reported in which a photoinitiator that can be chemically modified is reacted with various compounds according to the purpose to synthesize a new photoinitiator. 4- (2-Hydroxyethoxy) phenyl-2-hydroxy-2-propylketone (Irgacure 2959, trade name of Ciba Specialty Chemicals), which has the advantage of low volatility and low odor, can be chemically modified This compound is often used as a polymerization initiator for (meth) acrylic groups. For example, it has the disadvantage of being deposited at low temperatures after being dissolved in a silicone resin, resulting in the storage stability in winter. There is a problem. Moreover, since it is solid at normal temperature, there also exists a problem that it is hard to melt | dissolve in resin.

本発明は、上記事情に鑑みなされたもので、(メタ)アクリル変性シリコーン樹脂やエポキシアクリレートと相溶性が良く、低温においても樹脂分から光開始剤が析出することなく、常温において液体で、また、光開始剤として有用なシルフェニレン骨格を有する新規化合物、及びその製造方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, and has good compatibility with (meth) acryl-modified silicone resin and epoxy acrylate, and is liquid at room temperature without precipitation of a photoinitiator from the resin component at low temperature, It is an object of the present invention to provide a novel compound having a silphenylene skeleton useful as a photoinitiator and a method for producing the same.

本発明者等は、上記目的を達成するために鋭意検討した結果、下記一般式(2)で表される光重合開始基及びヒドロキシ基を有する化合物と、下記一般式(3−1)又は(3−2)で表されるシルフェニレン化合物とを反応させることにより得られる下記一般式(1−1)又は(1−2)で表される光重合開始基を有する新規なシルフェニレン化合物が、常温において液状であり、(メタ)アクリル変性シリコーン樹脂やエポキシアクリレートと相溶性が良く、低温においても樹脂分から光開始剤が析出することなく、(メタ)アクリル基に対して有用なラジカル重合開始能を有することを見出し、本発明を完成するに至った。   As a result of intensive studies to achieve the above object, the present inventors have found that a compound having a photopolymerization initiation group and a hydroxy group represented by the following general formula (2) and the following general formula (3-1) or ( 3-2) a novel silphenylene compound having a photopolymerization initiating group represented by the following general formula (1-1) or (1-2) obtained by reacting with a silphenylene compound represented by It is liquid at normal temperature, has good compatibility with (meth) acryl-modified silicone resins and epoxy acrylates, and has a useful radical polymerization initiating ability for (meth) acrylic groups without precipitation of photoinitiators from the resin even at low temperatures. As a result, the present invention has been completed.

Figure 0004367632
(式中、R1及びR2は炭素数1〜10の1価の有機基を示し、nは1〜3の整数を示す。)
Figure 0004367632
(Wherein, R 1 and R 2 represents a monovalent organic group having 1 to 10 carbon atoms, n represents an integer of 1-3.)

Figure 0004367632
(式中、R1は炭素数1〜10の1価の有機基を示す。)
Figure 0004367632
(In the formula, R 1 represents a monovalent organic group having 1 to 10 carbon atoms.)

Figure 0004367632
(式中、R2は炭素数1〜10の1価の有機基を示す。)
Figure 0004367632
(In the formula, R 2 represents a monovalent organic group having 1 to 10 carbon atoms.)

従って、本発明は、以下のシルフェニレン化合物及びその製造方法を提供する。
〔1〕 上記一般式(1−1)又は(1−2)で表される光重合開始基を有するシルフェニレン化合物。
〔2〕 上記一般式(2)で表される光重合開始基及びヒドロキシ基を有する化合物と、上記一般式(3−1)又は(3−2)で表されるシルフェニレン化合物とを反応させることを特徴とする〔1〕記載の光重合開始基を有するシルフェニレン化合物の製造方法。
Accordingly, the present invention provides the following silphenylene compounds and methods for producing the same.
[1] A silphenylene compound having a photopolymerization initiating group represented by the general formula (1-1) or (1-2).
[2] A compound having a photopolymerization initiating group and a hydroxy group represented by the general formula (2) is reacted with a silphenylene compound represented by the general formula (3-1) or (3-2). [1] The process for producing a silphenylene compound having a photopolymerization initiating group as described in [1].

本発明の光重合開始基含有シルフェニレン化合物は、常温において液状で、(メタ)アクリル変性シリコーン樹脂やエポキシアクリレートと相溶性が良く、低温においても樹脂分から光開始剤が析出することなく、(メタ)アクリル変性された樹脂の光重合開始剤として有用である。   The photopolymerization initiating group-containing silphenylene compound of the present invention is liquid at normal temperature and has good compatibility with (meth) acryl-modified silicone resins and epoxy acrylates. ) Useful as a photopolymerization initiator for acrylic-modified resins.

本発明の新規光重合開始基含有シルフェニレン化合物は、下記一般式(1−1)及び(1−2)で示されるもので、シルフェニレン骨格を中心としてその両端にラジカルを発生させる上で重要な役割を果たす光重合開始基を含んでいるものである。   The novel photopolymerization initiating group-containing silphenylene compound of the present invention is represented by the following general formulas (1-1) and (1-2), and is important for generating radicals at both ends of the silphenylene skeleton. It contains a photopolymerization initiating group that plays an important role.

Figure 0004367632
Figure 0004367632

式(1−1)及び(1−2)中のR1及びR2は、炭素数1〜10、好ましくは1〜6の1価の有機基であり、飽和又は不飽和炭化水素基が望ましく、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基、ビニル基、アリル基等のアルケニル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェネチル基等のアラルキル基、クロロメチル基、3−クロロプロピル基、3,3,3−トリフロロプロピル基等の非置換又はハロゲン置換一価炭化水素基が挙げられ、エーテル構造やエステル構造を含んでいてもよい。また、nは1〜3の整数であり、特にn=1が好ましい。 R 1 and R 2 in the formulas (1-1) and (1-2) are monovalent organic groups having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, and are preferably saturated or unsaturated hydrocarbon groups. For example, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, cyclohexyl group, alkyl group such as heptyl group, alkenyl group such as vinyl group, allyl group, phenyl group, tolyl group, xylyl group, An aryl group such as a naphthyl group, an aralkyl group such as a benzyl group and a phenethyl group, an unsubstituted or halogen-substituted monovalent hydrocarbon group such as a chloromethyl group, a 3-chloropropyl group, and a 3,3,3-trifluoropropyl group And may include an ether structure or an ester structure. N is an integer of 1 to 3, and n = 1 is particularly preferable.

上記一般式(1−1),(1−2)で表される光重合開始基を有するシルフェニレン化合物は、下記一般式(2)   The silphenylene compound having a photopolymerization initiating group represented by the general formulas (1-1) and (1-2) is represented by the following general formula (2).

Figure 0004367632
(式中、R1は炭素数1〜10の1価の有機基を示す。)
で表される光重合開始基及びヒドロキシ基を有する化合物と、下記一般式(3−1)あるいは(3−2)
Figure 0004367632
(In the formula, R 1 represents a monovalent organic group having 1 to 10 carbon atoms.)
A compound having a photopolymerization initiating group and a hydroxy group represented by the following general formula (3-1) or (3-2):

Figure 0004367632
(式中、R2は炭素数1〜10の1価の有機基を示す。)
で表されるシルフェニレン化合物とを反応させることにより製造することができる。
Figure 0004367632
(In the formula, R 2 represents a monovalent organic group having 1 to 10 carbon atoms.)
It can manufacture by making the silphenylene compound represented by these react.

ここで、一般式(2)で表される重合開始基及びヒドロキシ基を有する化合物は、重合開始基を分子末端に1つ以上含み、またヒドロキシ基を含む(好ましくは一級水酸基でかつ1つのみ含み、カルボン酸の−OH基あるいはカルボニル基のα−位の炭素に結合した−OH基は対象とならない)ものである。   Here, the compound having a polymerization initiating group and a hydroxy group represented by the general formula (2) contains at least one polymerization initiating group at the molecular end and also contains a hydroxy group (preferably a primary hydroxyl group and only one. Including —OH group of carboxylic acid or —OH group bonded to α-position carbon of carbonyl group).

また、式(2)中のR1は、炭素数1〜10、好ましくは1〜6の1価の有機基であり、飽和又は不飽和炭化水素基が望ましく、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基、ビニル基、アリル基等のアルケニル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェネチル基等のアラルキル基、クロロメチル基、3−クロロプロピル基、3,3,3−トリフロロプロピル基等の非置換又は置換一価炭化水素基が挙げられる。これらの中でも好ましいのはメチル基等のアルキル基である。 R 1 in formula (2) is a monovalent organic group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, and is preferably a saturated or unsaturated hydrocarbon group, such as a methyl group, an ethyl group, Alkyl groups such as propyl group, butyl group, pentyl group, hexyl group, cyclohexyl group and heptyl group, alkenyl groups such as vinyl group and allyl group, aryl groups such as phenyl group, tolyl group, xylyl group and naphthyl group, benzyl group And unsubstituted or substituted monovalent hydrocarbon groups such as an aralkyl group such as a phenethyl group, a chloromethyl group, a 3-chloropropyl group, and a 3,3,3-trifluoropropyl group. Among these, an alkyl group such as a methyl group is preferable.

一般式(3−1)あるいは(3−2)で表されるシルフェニレン化合物は、シリルクロライド構造が、分子両末端に存在しているものである。
また、式(3−1)及び(3−2)中のR2は、炭素数1〜10、好ましくは1〜6の1価の有機基であり、飽和又は不飽和炭化水素基が望ましく、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基、ビニル基、アリル基等のアルケニル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェネチル基等のアラルキル基、クロロメチル基、3−クロロプロピル基、3,3,3−トリフロロプロピル基等の非置換又は置換一価炭化水素基が挙げられ、エーテル構造やエステル構造を含んでいてもよい。これらの中でも好ましいのはメチル基である。
The silphenylene compound represented by the general formula (3-1) or (3-2) has a silyl chloride structure at both molecular ends.
R 2 in formulas (3-1) and (3-2) is a monovalent organic group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, preferably a saturated or unsaturated hydrocarbon group, For example, alkyl group such as methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, cyclohexyl group, heptyl group, alkenyl group such as vinyl group, allyl group, phenyl group, tolyl group, xylyl group, naphthyl Aryl groups such as benzyl groups, aralkyl groups such as benzyl groups and phenethyl groups, and unsubstituted or substituted monovalent hydrocarbon groups such as chloromethyl groups, 3-chloropropyl groups and 3,3,3-trifluoropropyl groups. In addition, an ether structure or an ester structure may be included. Among these, a methyl group is preferable.

上記式(2)で表される化合物と、上記式(3−1)あるいは(3−2)で表されるシルフェニレン化合物の反応割合は、式(3−1)あるいは(3−2)の化合物1モルに対し、式(2)の化合物を1.0〜2.4モル、特に1.8〜2.2モル使用して反応を行うことが好ましい。式(2)の化合物が少なすぎると光重合開始基を有しないシルフェニレン化合物が含まれる場合があり、多すぎると未反応物の除去に時間を要する場合がある。   The reaction ratio of the compound represented by the above formula (2) and the silphenylene compound represented by the above formula (3-1) or (3-2) is represented by the formula (3-1) or (3-2). The reaction is preferably carried out using 1.0 to 2.4 mol, particularly 1.8 to 2.2 mol of the compound of formula (2) per mol of the compound. If the amount of the compound of formula (2) is too small, a silphenylene compound having no photopolymerization initiating group may be contained, and if it is too large, it may take time to remove unreacted substances.

本反応は、通常有機溶媒中で行われ、このような有機溶媒としては、例えば、テトラヒドロフラン(THF)、トルエン、アセトン等が挙げられる。また本反応は、脱HCl反応であり、アミンによりHClをアンモニウム塩としてトラップすることが好ましい。アミンとしては、公知のアミンを用いることができ、例えば、トリエチルアミンなどが挙げられる。アミンの使用量は、前記シルフェニレン化合物(3−1)あるいは(3−2)1モルに対し、通常2.0〜2.4モルである。   This reaction is usually carried out in an organic solvent, and examples of such an organic solvent include tetrahydrofuran (THF), toluene, acetone and the like. This reaction is a de-HCl reaction, and it is preferable to trap HCl as an ammonium salt with an amine. As the amine, a known amine can be used, and examples thereof include triethylamine. The usage-amount of an amine is 2.0-2.4 mol normally with respect to 1 mol of said silphenylene compounds (3-1) or (3-2).

本反応は、通常、遮光し、室温(例えば0〜45℃、好ましくは5〜40℃)で30分〜4時間、好ましくは1時間〜2時間行えばよい。   This reaction is usually performed in the dark, at room temperature (eg, 0 to 45 ° C., preferably 5 to 40 ° C.) for 30 minutes to 4 hours, preferably 1 to 2 hours.

このようにして、上記一般式(1)で表される新規光重合開始基を有するシルフェニレン化合物が得られる。該光重合開始基含有シルフェニレン化合物は、光重合開始基を有しているため、光によりラジカルを発生させることができ、(メタ)アクリル基を有する化合物を重合させることができる。   In this way, a silphenylene compound having a novel photopolymerization initiating group represented by the general formula (1) is obtained. Since the photopolymerization initiating group-containing silphenylene compound has a photopolymerization initiating group, a radical can be generated by light, and a compound having a (meth) acryl group can be polymerized.

以下、実施例及び参考例を示し、本発明を更に具体的に説明するが、本発明は下記の実施例に限定されるものではない。なお、下記例中の式において、Meはメチル基を示す。   EXAMPLES Hereinafter, although an Example and a reference example are shown and this invention is demonstrated more concretely, this invention is not limited to the following Example. In the formulas in the following examples, Me represents a methyl group.

[実施例1]
1,4−ビス(ジメチルクロロシリル)ベンゼン0.20モルをTHF250mlに溶解し、撹拌しておき(溶液1)、イルガキュア2959(チバ・スペシャリティー・ケミカルズ社製)を0.40モル及びトリエチルアミン0.44モルをTHF150mlに撹拌混合したもの(溶液2)を溶液1に室温で添加した。反応溶液は(C253NH+Cl-の析出により白濁し、溶液温度は20℃から40℃まで上昇した。室温雰囲気中で2時間撹拌した後、吸引濾過にてアンモニウム塩を取除き、濾過液をロータリーエバポレーターにて、留分が出なくなるまで加熱減圧処理(50℃、1mmHg)をし、下記式(4)で示される生成物を得た。
[Example 1]
0.20 mol of 1,4-bis (dimethylchlorosilyl) benzene was dissolved in 250 ml of THF and stirred (solution 1), and Irgacure 2959 (Ciba Specialty Chemicals) A solution obtained by stirring and mixing 44 mol in 150 ml of THF (solution 2) was added to solution 1 at room temperature. The reaction solution became cloudy due to precipitation of (C 2 H 5 ) 3 NH + Cl , and the solution temperature rose from 20 ° C. to 40 ° C. After stirring in a room temperature atmosphere for 2 hours, the ammonium salt was removed by suction filtration, and the filtrate was heated under reduced pressure (50 ° C., 1 mmHg) with a rotary evaporator until no fraction was produced. ) Was obtained.

Figure 0004367632
Figure 0004367632

次に、得られた反応生成物のGPC、IR、1H−NMR、29Si−NMRを測定した。結果を図1〜図4に示す。GPC(図1)は、1本のピークを示し、29Si−NMR(図4)においても9.9ppmにシングルピークを示した。IR(NEAT)(図2)は、イルガキュア2959由来のピーク1664cm-1(カルボニルC=O伸縮)及びシルフェニレン由来のピーク1137cm-1(Si−C64)を示した。 Next, GPC, IR, 1 H-NMR, and 29 Si-NMR of the obtained reaction product were measured. The results are shown in FIGS. GPC (FIG. 1) showed one peak, and 29 Si-NMR (FIG. 4) also showed a single peak at 9.9 ppm. IR (NEAT) (FIG. 2) showed a peak 1664 cm −1 (carbonyl C═O stretching) derived from Irgacure 2959 and a peak 1137 cm −1 (Si—C 6 H 4 ) derived from silphenylene.

[参考例1]
実施例1において合成した光重合開始基を有するシルフェニレン化合物1.5質量部を、両末端アクリル変性シリコーンオイル(重量平均分子量:約4,000)100質量部に均一に混合し、光硬化性シリコーン樹脂組成物(A)を得た。
[Reference Example 1]
1.5 parts by mass of the silphenylene compound having a photopolymerization initiating group synthesized in Example 1 was uniformly mixed with 100 parts by mass of both-end acrylic modified silicone oil (weight average molecular weight: about 4,000), and photocurability was obtained. A silicone resin composition (A) was obtained.

[比較参考例1]
比較として、光開始剤(イルガキュア2959)3質量部を、両末端アクリル変性シリコーンオイル(重量平均分子量:約4,000)100質量部に均一に混合し、光硬化性シリコーン樹脂組成物(B)を得た。
[Comparative Reference Example 1]
As a comparison, 3 parts by weight of a photoinitiator (Irgacure 2959) was uniformly mixed with 100 parts by weight of both terminal acrylic-modified silicone oil (weight average molecular weight: about 4,000) to obtain a photocurable silicone resin composition (B). Got.

これら光硬化性シリコーン樹脂組成物(10cm×10cm、厚さ1mm)をメタルハライドランプにて露光(400mJ/cm2)し、硬化させた。この硬化物の物性は表1の通りであり、光硬化性に差は見られなかった。また、0℃にて6ヶ月保存した場合、(A)に外観の変化は見られなかったが、(B)は白色の析出物(イルガキュア2959)が確認された。 These photocurable silicone resin compositions (10 cm × 10 cm, thickness 1 mm) were exposed (400 mJ / cm 2 ) with a metal halide lamp and cured. The physical properties of the cured product are as shown in Table 1, and no difference was observed in photocurability. Moreover, when it preserve | saved for 6 months at 0 degreeC, the change of the external appearance was not seen by (A), but (B) confirmed the white precipitate (Irgacure 2959).

Figure 0004367632
*引張強さ及び伸びはオートグラフを用いて測定した(引張速度:500mm/min)。
Figure 0004367632
* Tensile strength and elongation were measured using an autograph (tensile speed: 500 mm / min).

本発明の実施例で得られた反応生成物のGPC測定結果である。It is a GPC measurement result of the reaction product obtained in the Example of this invention. 本発明の実施例で得られた反応生成物のIR測定結果である。It is IR measurement result of the reaction product obtained in the Example of this invention. 本発明の実施例で得られた反応生成物の1H−NMR測定結果である。It is a < 1 > H-NMR measurement result of the reaction product obtained in the Example of this invention. 本発明の実施例で得られた反応生成物の29Si−NMR測定結果である。It is a 29 Si-NMR measurement result of the reaction product obtained in the Example of this invention.

Claims (2)

下記一般式(1−1)又は(1−2)で表される光重合開始基を有するシルフェニレン化合物。
Figure 0004367632
(式中、R1及びR2は炭素数1〜10のアルキル基、アルケニル基、アリール基、アラルキル基の非置換又はハロゲン置換一価炭化水素基を示し、nは1〜3の整数を示す。)
A silphenylene compound having a photopolymerization initiating group represented by the following general formula (1-1) or (1-2).
Figure 0004367632
(In the formula, R 1 and R 2 represent an alkyl group having 1 to 10 carbon atoms , an alkenyl group, an aryl group, an aralkyl group unsubstituted or a halogen-substituted monovalent hydrocarbon group, and n represents an integer of 1 to 3. .)
下記一般式(2)
Figure 0004367632
(式中、R1は炭素数1〜10のアルキル基、アルケニル基、アリール基、アラルキル基の非置換又はハロゲン置換一価炭化水素基を示す。)
で表される光重合開始基及びヒドロキシ基を有する化合物と、下記一般式(3−1)又は(3−2)
Figure 0004367632
(式中、R2は炭素数1〜10のアルキル基、アルケニル基、アリール基、アラルキル基の非置換又はハロゲン置換一価炭化水素基を示す。)
で表されるシルフェニレン化合物とを反応させることを特徴とする請求項1記載の光重合開始基を有するシルフェニレン化合物の製造方法。
The following general formula (2)
Figure 0004367632
(Wherein R 1 represents an unsubstituted or halogen-substituted monovalent hydrocarbon group of an alkyl group, alkenyl group, aryl group or aralkyl group having 1 to 10 carbon atoms.)
A compound having a photopolymerization initiating group and a hydroxy group represented by the following general formula (3-1) or (3-2):
Figure 0004367632
(In the formula, R 2 represents an unsubstituted or halogen-substituted monovalent hydrocarbon group of an alkyl group, alkenyl group, aryl group or aralkyl group having 1 to 10 carbon atoms.)
The method for producing a silphenylene compound having a photopolymerization initiating group according to claim 1, wherein the compound is reacted with a silphenylene compound represented by the formula:
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