JP4367886B2 - Gas laser device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a gas laser device using a gas laser electrode for exciting a laser gas .
[0002]
[Prior art]
In a gas laser device such as an excimer laser device, a main discharge is disposed in the laser chamber so as to be opposed to each other with the optical axis of the laser beam interposed between them in order to excite the laser gas sealed in the laser chamber and cause laser oscillation. In order to easily generate discharge between the main discharge electrodes, a preionization electrode for preionizing the space between these electrodes is provided. As the laser gas, for example, a mixed gas of a rare gas and a halogen gas is used.
[0003]
In such a gas laser device, the main discharge electrodes are pre-ionized by the pre-ionization electrodes, whereby a discharge is generated between the main discharge electrodes, the laser gas is excited, and laser oscillation is performed. As is well known, by performing a stable discharge between the main discharge electrodes, the laser oscillation is also stabilized, resulting in a stable laser output.
[0004]
By the way, as main discharge electrodes used in such a gas laser apparatus, Japanese Utility Model Laid-Open No. 61-174762 (hereinafter referred to as Reference 1), Japanese Patent Application Laid-Open No. 62-199078 (hereinafter referred to as Reference 2), and Japanese Patent Application Laid-Open No. 2002-199078. One described in Japanese Patent Laid-Open No. 63-227069 (hereinafter referred to as Document 3) is known.
[0005]
Even if the distance between the main discharge electrode and the arc discharge electrode (corresponding to the preionization electrode) is shortened in order to obtain a large laser output, the discharge described between the main discharge electrode and the arc discharge electrode is used. In order to prevent the occurrence of the above, an insulator is tightly coated on the side surface portion of the main discharge electrode excluding the main discharge portion.
[0006]
Moreover, the thing of the said literature 2 suppresses malfunctions, such as corrosion of the inner wall of a laser tube and the member for discharge, deterioration of enclosed gas, etc. by strong ultraviolet rays, ion, an electron, etc. which generate | occur | produce in the main discharge electrode vicinity. Therefore, a halogen corrosion-resistant resin layer is coated on at least a part of the laser tube or the discharge member.
[0007]
Further, in the above-mentioned document 3, in order to obtain a stable glow discharge at the flat portion at the center of the main discharge electrode in the main discharge electrode and to suppress dielectric breakdown and arc at the end of the main discharge electrode, An insulator is attached to an end portion of the discharge electrode, for example, an end face portion.
[0008]
As main discharge electrodes other than those described in these documents, there are known main discharge electrodes in which a dielectric thin film is applied to the cathode surface of a main discharge electrode composed of an anode and a cathode. This is to reduce the deterioration of the anode (deformation of the electrode) due to the impact of discharge by utilizing the phenomenon that the discharge start voltage is lowered by applying a dielectric thin film on the cathode surface.
[0009]
[Problems to be solved by the invention]
However, in the main discharge electrodes of Documents 1 to 3 described above, deformation of the anode surface due to the impact of discharge (deformation into irregularities), and alteration of the electrode due to halogenation of the electrode material due to halogen gas erosion on the anode surface. The laser output characteristics change rapidly and it is difficult to maintain the initial characteristics. That is, a desired stable laser output characteristic cannot be obtained.
[0010]
For example, a main discharge electrode provided in a laser chamber used in an excimer laser apparatus such as a krypton fluorine (KrF) excimer laser or an argon fluorine (ArF) excimer laser repeats a laser oscillation operation, whereby a rare gas (krypton Fluorine (F2) contained in a mixed gas (laser gas) composed of Kr, argon Ar) and halogen gas (fluorine F2) reacts with the discharge part of the anode, and the anode is halogenated (in this case, fluorinated). The At the same time, the discharge part of the anode is deformed from a flat state to an uneven shape.
[0011]
As a result, the discharge between the main discharge electrodes becomes unstable, the output energy of the laser decreases, and the desired laser output characteristics cannot be obtained.
[0012]
In order to cope with this problem, it is necessary to take measures such as increasing the gas pressure in the laser chamber or increasing the voltage applied between the main discharge electrodes. In some cases, the deteriorated anode (or main discharge electrode) The workability was poor. In addition, even when a deteriorated electrode is replaced with a new electrode, the same problems as described above will not occur, and as a result, electrode replacement cycles will occur frequently, resulting in a reduction in maintenance costs. Invited to rise.
[0013]
By the way, even in the main discharge electrode in which the dielectric thin film is coated on the cathode surface, since the discharge portion where discharge is performed between the cathode and the cathode in the anode is not coated, similarly to the above, There is a problem that stable laser output characteristics cannot be obtained due to deterioration (deformation of the electrode) and alteration of the electrode (anode) due to halogenation (for example, fluorination) of the electrode material.
[0016]
The present invention is to suppress the deterioration of the electrodes (discharge characteristics), and solve problems to provide a gas laser apparatus using the gas laser electrodes capable of obtaining stable laser output.
[0017]
[Means, actions and effects for solving the problems]
In order to achieve the above-mentioned solution , in the first invention, the cathode is held by the cathode holder in the laser chamber, the anode is held by the anode holder, and the cathode and the anode are arranged to face each other. In the gas laser apparatus for exciting a laser gas containing a halogen gas by discharging between the anodes, the anode is coated with a dielectric or an insulator at a portion where discharge is performed between the anode and the cathode. Features.
[0018]
In the second invention, in the first invention, the dielectric or insulator is formed with a thickness that does not cause the laser gas to erode in the portion and can ensure conductivity. It is characterized by.
[0019]
The third invention is characterized in that, in the first or second invention, the dielectric or insulator is a dielectric or insulator mixed with metal fine particles.
[0020]
The first, second and third inventions will be described with reference to FIG.
[0021]
In the gas laser electrode 1, the cathode 2 is formed of only a metal material, but the anode 3 is described later in detail in order to suppress deterioration of the electrode, but as shown in FIG. A dielectric (or insulator) 4 is coated on a portion (hereinafter referred to as a discharge portion) 3 a where discharge is performed between the dielectric 2 and 2.
[0022]
Fluoride is used as a material (dielectric) to be coated on the anode 3 of the gas laser electrode 1 used in a gas laser apparatus employing a fluorine-based halogen gas. A substance having a low vapor pressure among fluorides is even better.
[0023]
Specifically, as the dielectric 4 as a coating material, calcium fluoride (CaF2), strontium fluoride (SrF2), magnesium fluoride (MgF2), copper fluoride (CuF2), aluminum fluoride (AlF3), There are fluorides such as nickel fluoride (NiF3), cobalt fluoride (CoF3), and iron fluoride (FeF3). Of these fluorides, it is more preferable to use CaF2 and SrF2 which are substances having a low vapor pressure. Further, aluminum oxide (alumina = Al203) or aluminum nitride (AlN) having fluorine resistance may be used.
[0024]
The dielectric 4 has a thickness that does not cause erosion of the halogen gas in the laser gas in the discharge part 3a of the anode 3 and can ensure conductivity (that is, discharge between the cathode 2 and the anode 3). The single fluoride is uniformly and densely formed with a desired value in a range of 0.005 mm to 1.5 mm, more preferably 0.1 mm to 1 mm, for example.
[0025]
Further, the dielectric 4 may be a film in which a single fluoride is uniformly and densely formed. For example, a dielectric such as alumina (Al203) is used as an electrode material (anode 3) to ensure the conductivity of the electrode. Or a mixed material in which fine particles of a metal (copper, aluminum, cobalt, nickel, strontium, iron, etc.) that is different from the electrode material and has good electrical conductivity are mixed. But it ’s okay.
[0026]
As described above, according to the first and second inventions, it is possible to suppress deformation due to laser gas erosion or discharge shock at a portion where discharge is performed between the anode and the cathode, and thus stable. Discharge can be performed.
[0027]
Further, according to the third invention, the conductivity of the anode can be ensured as compared with the first and second inventions, and more stable discharge can be performed.
[0028]
In order to solve the above-mentioned problems, the fourth invention is characterized in that, in the first or second invention, the dielectric or insulator is a dielectric or insulator having holes.
[0029]
The fourth invention will be described with reference to FIG.
[0030]
As shown in FIG. 3, the dielectric 4 is formed of a non-uniform film having holes having a diameter of about 0.1 mm, for example, in order to ensure the conductivity of the anode 3.
[0031]
According to the fourth invention, similarly to the third invention, the conductivity of the anode can be ensured as compared with the first and second inventions, and more stable discharge can be performed.
[0032]
Furthermore, in order to solve the above-mentioned problem, in the fifth invention, in a gas laser electrode having a cathode and an anode arranged to face each other and exciting a laser gas by discharging between these electrodes, The electrode material is doped with a single metal or an alloy that forms a fluoride film.
[0038]
Next, the laser chamber used in the first to fifth inventions will be described with reference to FIGS. 1, 3, and 4 to 6. FIG.
[0039]
The laser chamber 10 is a container configured by, for example, nickel plating on aluminum. As shown in FIG. 5, a pair of electrode holders 20 and 30 are provided in the laser chamber 10 at positions that are above and below each other with the optical axis L interposed therebetween. The cathode 2 shown in FIGS. 1A and 1B is held in the electrode holder 20, and the electrode holder 30 is held in FIGS. 1A and 1B or FIGS. b) or the anode 3 shown in FIGS. 4A and 4B is held.
[0042]
The gas laser apparatus according to the first to fifth inventions has the laser chamber 10 shown in FIG. 5 or FIG.
[0043]
As described above, according to the first to fifth inventions , it is possible to suppress the deformation due to the erosion by the laser gas or the impact of the discharge at the portion where the discharge is performed between the anode and the cathode, and thus the stable. A gas laser device that can obtain a stable laser output by performing discharge can be provided.
[0044]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the accompanying drawings.
[0045]
FIG. 1A is a cross-sectional view showing a main part cross section of the gas laser electrode 1, and FIG. 1B is a cross-sectional view showing an XX cross section of the gas laser electrode 1 shown in FIG. .
[0046]
The gas laser electrode 1 is composed of a cathode 2 and an anode 3 as shown in FIGS. 1A and 1B. These electrodes are disposed in a laser chamber of a gas laser device such as an excimer laser device, for example. They are arranged opposite to each other across the optical axis of the laser beam. Since the arrangement of the electrodes 2 and 3 in the laser chamber itself can be arranged in the same arrangement relationship as in the prior art, the description thereof is omitted here. A gas laser device using the gas laser electrode 1 will be described later.
[0047]
By the way, in the laser chamber, for example, a mixed gas (krypton fluorine KrF, argon fluorine ArF) composed of a rare gas (krypton Kr, argon Ar) and a halogen gas (fluorine F2), a rare gas (xenon Xe), and a halogen are used. A mixed gas (xenon chlorine XeCl) made of gas (hydrogen chloride HCl) is enclosed.
[0048]
In the gas laser electrode 1, the cathode 2 is formed of only a metal material, but the anode 3 is described later in detail in order to suppress deterioration of the electrode, but as shown in FIG. A dielectric (or insulator) 4 is coated on a portion (hereinafter referred to as a discharge portion) 3 a where discharge is performed between the dielectric 2 and 2. Here, the material of the coating may be either a dielectric or an insulator, but will be described as the dielectric 4 in the following description.
[0049]
Next, the coating process for the anode 3 will be described in detail. Here, the material of coating, its thickness, and its method will be described in order.
[0050]
1: Coating material As the material of the dielectric 4, fluoride is effective when the halogen gas sealed in the laser chamber is fluorine-based (fluorine F 2), and chlorine-based (hydrogen chloride HCl) In some cases, the chloride system is effective. The reason for this is that the deterioration of the discharge part 3a of the anode 3 is caused by halogenation of the electrode material (reaction between, for example, fluorine F2 and the anode 3 in the case of a fluorine-based material) (for example, fluoride in the case of a fluorine-based material). This is because alteration due to
[0051]
Therefore, fluoride is effective as a material for coating the anode 3 of the gas laser electrode 1 used in the gas laser apparatus employing a fluorine-based halogen gas, that is, the dielectric 4.
[0052]
Specifically, as the dielectric 4, for example, calcium fluoride (CaF2), strontium fluoride (SrF2), magnesium fluoride (MgF2), copper fluoride (CuF2), aluminum fluoride (AlF3), fluoride There are fluorides such as nickel (NiF3), cobalt fluoride (CoF3), and iron fluoride (FeF3). Of these fluorides, it is more preferable to use CaF2 and SrF2 which are substances having a low vapor pressure. Further, aluminum oxide (alumina = Al203) or aluminum nitride (AlN) having fluorine resistance may be used.
[0053]
2: Coating thickness The dielectric 4 has a thickness that does not cause erosion of the halogen gas contained in the laser gas in the discharge part 3a of the anode 3 and can ensure conductivity (that is, between the cathode 2 and the anode 3). The thickness is sufficient to generate a discharge. For this thickness, a desired value in the range of, for example, 0.005 mm to 1.5 mm, more preferably 0.1 mm to 1 mm is applied in order to satisfy the above condition.
[0054]
Of course, the thickness of the dielectric 4 is set to a desired value within an allowable range in order to satisfy the above condition, depending on the material of the dielectric.
[0055]
3: Coating method As a method for coating the anode 3, a method of forming a thin film by thermal spraying, explosion, physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma deposition, or the like (first method) And a method of forming a fluoride film in a fluorine atmosphere (second method) by doping a single metal or alloy into the electrode material.
[0056]
As the simple metal to be doped, aluminum (Al), calcium (Ca), strontium (Sr), magnesium (Mg), copper (Cu), nickel (Ni), cobalt (Co), iron (Fe), etc. are strong. Elements capable of forming a fluoride film are preferred. The doping ratio is desirably 0.01 to 50% with respect to the base material.
[0057]
Here, the second method will be described. In this second method, first, the anode 3 of the gas laser electrode 1 to be attached to the laser chamber is doped with a desired metal in the above-described metal group, such as calcium (Ca) or strontium (Sr). Next, the gas laser electrode 1 in which the desired metal is doped on the anode 3 is attached to the laser chamber before the fluoride film is formed. Subsequently, by applying a predetermined voltage between the cathode 2 and the anode 3, a discharge is generated between these electrodes to excite the laser gas and cause laser oscillation.
[0058]
When laser oscillation is performed in this manner, only the surface of the discharge part 3a of the anode 3 is heated, and fluorination proceeds as compared with parts other than the discharge part 3a (parts where no discharge is performed). As a result, a particularly thick fluoride film is formed on the surface of the discharge part 3a of the anode 3. For example, when the single metal (Ca or Sr) is doped, a fluoride film such as calcium fluoride (CaF2) or strontium fluoride (SrF2) is formed.
[0059]
Here, the anode 3 is fluorinated in a state where the laser chamber and the gas laser electrode 1 incorporated therein are paired. This fluorination is the gas laser electrode or anode to be fluorinated. Each time, as described above, it may be performed in a dedicated laser chamber for fluorination treatment. After the coating is completed, the gas laser electrode or anode is taken out from the dedicated laser chamber and incorporated in a new laser chamber.
[0060]
FIG. 2 shows characteristics representing the relationship between the laser output energy and the number of pulses in the gas laser device using the gas laser electrode 1 coated with the dielectric 4 as described above.
[0061]
In FIG. 2, the solid line curve shows the characteristics when the gas laser electrode 1 of the present invention is used, and the alternate long and short dash line curve uses a conventional gas laser electrode (the anode discharge part has a dielectric not coated). It shows the characteristics when there is.
[0062]
In FIG. 2, the relationship of the number of laser pulses at time t1 <the number of laser pulses at time t2 <the number of laser pulses at time tn is established.
[0063]
When the gas laser electrode 1 of the present invention is used, as is apparent from FIG. 2, the initial characteristics of the laser at the time t1, that is, the laser output energy E1, and the number of pulses of the laser increased (that is, the laser oscillation operation). The difference (performance difference) between the output energy E2 of the laser at the time point tn and the difference between the output energy E3 at the time point t1 and the output energy E4 at the time point tn in the conventional case is compared. And it can suppress small.
[0064]
Further, as is apparent from FIG. 2, the laser output energy itself can be obtained at a higher output than the conventional case during the period from the time point t2 to the time point tn.
[0065]
That is, when the gas laser electrode 1 of the present invention is used, a stable laser output can be obtained over a long period of time.
[0066]
The reason for this is that, as described above, since the discharge body 3a of the anode 3 is coated with the dielectric 4, the discharge section 3a is protected, and deformation of the discharge section 3a due to the impact of discharge is suppressed, and the anode 3 The reaction between the (discharge part 3a) and the halogen gas (for example, fluorine F2) is suppressed (halogenation of the electrode material due to the erosion of the halogen gas, for example, fluorination is suppressed). This is because deterioration of the electrode (anode) based on the above can be suppressed.
[0067]
For this reason, stable discharge is performed between the cathode 2 and the anode 3, and accordingly, laser oscillation is also stabilized, and as a result, a stable laser output is obtained.
[0068]
Next, a modified example of the dielectric 4 coated on the anode 3 will be described.
[0069]
That is, in the above-described embodiment, a single fluoride is coated with a dielectric formed of a uniform and dense film. However, the present invention is not limited to this, and in order to ensure the conductivity of the electrode. In addition, the dielectric (or insulator) 4 coated on the anode 3 may be formed as follows.
[0070]
(A): A dielectric or insulator mixed with metal fine particles.
[0071]
For example, a dielectric material such as alumina (Al203), an electrode material (the same material as the material of the anode 3) or a metal that is different from the electrode material and has good electrical conductivity in order to ensure the conductivity of the electrode. The dielectric 4 is made of a mixed material in which fine particles (copper, aluminum, cobalt, nickel, strontium, iron, etc.) are mixed.
[0072]
(B): It is a dielectric or insulator having pores (porous structure).
[0073]
The structure of the anode 3 in this case is shown in FIG. 3A is a cross-sectional view showing a cross section of the main part of the anode 3 of the gas laser electrode 1 as an application example of the present embodiment, and FIG. 3B is a cross-sectional view of the anode 3 shown in FIG. It is sectional drawing which shows XX cross section.
[0074]
As shown in FIGS. 3 (a) and 3 (b), in order to ensure the conductivity of the electrode, a dielectric film having a hole 5 having a diameter of about 0.1 mm is used as a dielectric. Used as body 4. The holes 5 do not need to penetrate the film. This is because the vacancies 5 and the portions of the film that are thin due to the presence of the vacancies 5 are sequentially broken down, and the portions of the film have conductivity.
[0075]
Note that the dielectric (film) 4 shown in FIG. 3 (a) has pores 5 to ensure conductivity, so that it is compared with the dielectric (film) 4 shown in FIG. 1 (a). Can be made slightly thicker.
[0076]
The anode 3 coated with the dielectric described in the above (A) and (B) ensures the conductivity of the electrode (anode) more than the anode 3 coated with the dielectric 4 shown in FIG. can do.
[0077]
In the above embodiment, the discharge part 3a of the anode 3 is coated with a dielectric film. However, the present invention is not limited to this, and as shown in FIGS. 3 is coated with a film of the dielectric 4, and a film 6 made of a material different from that of the dielectric or a film 6 such as a complete insulating film is applied to portions other than the discharge part 3 a, that is, the side surfaces 3 b and 3 c. Coating.
[0078]
As described above, according to the present embodiment, by coating the anode (anode) of the laser excitation electrode using a halogen gas with a dielectric or an insulator, the influence of deterioration of the anode (for example, discharge) Characteristic deterioration and laser output characteristic deterioration) can be minimized.
[0079]
That is, by pre-coating the discharge part 3a (electrode surface) of the anode with a dielectric or an insulator, the discharge of the anode 3 due to the alteration of the discharge part 3a due to the erosion of the halogen gas contained in the laser gas or the impact of discharge. The deformation of the part 3a can be suppressed. This means that consumption of the anode 3 can be reduced, and stable laser output characteristics (laser output) can be obtained over a long period of time.
[0080]
Furthermore, since the deterioration of the discharge part 3a of the anode 3 can be suppressed and the life of the electrode can be extended, maintenance costs associated with replacement of the deteriorated anode can be suppressed.
[0081]
Next, a gas laser device to which the above-described gas laser electrode 1 is applied will be described with reference to FIG. Here, only the outline of the laser chamber to which the gas laser electrode 1 is attached will be described.
[0082]
The laser chamber 10 is a container configured by, for example, nickel plating on aluminum. The laser chamber 10 is provided with windows 11 and 12 on both end faces facing the optical axis L, respectively. The windows 11 and 12 function as a laser light passing window between the inside and the outside of the laser chamber 10.
[0083]
Inside the laser chamber 10, a pair of electrode holders 20, 30 are provided at positions that are above and below each other across the optical axis L. The cathode 2 shown in FIGS. 1A and 1B is held in the electrode holder 20, and the electrode holder 30 is held in FIGS. 1A and 1B or FIGS. b) or the anode 3 shown in FIGS. 4A and 4B is held. As is clear from FIG. 5, the cathode 2 and the anode 3 are arranged to face each other with the optical axis L in between.
[0084]
In FIG. 5, reference numeral 13 denotes a connection portion with a power source, and reference numeral 14 denotes a peaking capacitor provided between the connection portion 13 and the cathode 2 and the anode 3.
[0085]
Here, the cross section seen from the YY direction of FIG. 5 is shown in FIG. In FIG. 6, the connecting portion 13 and the peaking capacitor 14 are omitted. Reference numerals 41 and 42 denote preliminary ionization electrodes for performing preliminary ionization of the laser gas.
[0086]
FIG. 7 shows a cross-sectional view of another gas laser apparatus to which the above-described gas laser electrode 1 is applied, and corresponds to a cross-sectional view (see FIG. 6) seen from the Y-Y direction of FIG. Here, only the outline of the laser chamber to which the gas laser electrode 1 is attached will be described. In FIG. 7, parts having the same functions as those shown in FIGS. 5 and 6 are denoted by the same reference numerals.
[0087]
The heat exchanger 40 cools the laser gas in the laser chamber 10. The fan 50 rotates to circulate the laser gas. Incidentally, gas flows in the direction of the arrow indicated by reference numeral 61 in FIG.
[Brief description of the drawings]
FIG. 1 (a) is a cross-sectional view showing a cross-section of the main part of a gas laser electrode of the present embodiment, and FIG. 1 (b) is an XX line in the gas laser electrode shown in FIG. 1 (a). It is sectional drawing which shows a cross section.
FIG. 2 is a graph showing the relationship between the laser output energy and the number of pulses when the gas laser electrode of the present embodiment is used.
3A is a cross-sectional view showing a cross section of the main part of the anode of a gas laser electrode as an application example of the present embodiment, and FIG. 3B is a cross-sectional view of the anode shown in FIG. It is sectional drawing which shows a XX line cross section.
4 (a) and 4 (b) are cross-sectional views showing a cross section of a main part of an anode in a gas laser electrode as an application example of the present embodiment.
FIG. 5 is a cross-sectional view showing a main part of a laser chamber in a gas laser apparatus to which the gas laser electrode of the present embodiment is applied.
6 is a cross-sectional view showing a cross section taken along line YY in FIG. 5. FIG.
FIG. 7 is a cross-sectional view showing a main part of a laser chamber in another gas laser apparatus to which the gas laser electrode of the present embodiment is applied.
[Explanation of symbols]
1 Gas Laser Electrode 2 Cathode 3 Anode 4 Dielectric or Insulator 10 Laser Chamber

Claims (5)

A laser gas containing a halogen gas by holding the cathode with a cathode holder in the laser chamber and holding the anode with an anode holder and disposing the cathode and the anode so as to face each other and discharging between the cathode and the anode. In the gas laser device that excites
A gas laser device , wherein the anode is coated with a dielectric or an insulator at a portion where discharge is performed between the anode and the cathode. 2. The gas laser device according to claim 1, wherein the dielectric or the insulator is formed with a thickness that does not cause erosion of the laser gas at the portion and can ensure conductivity. 3. The gas laser device according to claim 1, wherein the dielectric or insulator is a dielectric or insulator in which metal fine particles are mixed. The gas laser device according to claim 1, wherein the dielectric or insulator is a dielectric or insulator having holes. The gas laser device according to claim 1, wherein the dielectric or insulator is a halogenated compound.

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