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JP4385384B2 - Photosensitive element sensitivity control method, spatial information detection device using intensity-modulated light - Google Patents
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JP4385384B2 - Photosensitive element sensitivity control method, spatial information detection device using intensity-modulated light - Google Patents

Photosensitive element sensitivity control method, spatial information detection device using intensity-modulated light Download PDF

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JP4385384B2
JP4385384B2 JP2006327382A JP2006327382A JP4385384B2 JP 4385384 B2 JP4385384 B2 JP 4385384B2 JP 2006327382 A JP2006327382 A JP 2006327382A JP 2006327382 A JP2006327382 A JP 2006327382A JP 4385384 B2 JP4385384 B2 JP 4385384B2
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photosensitive
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JP2007093620A (en
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裕介 橋本
裕司 高田
史和 栗原
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Panasonic Electric Works Co Ltd
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Matsushita Electric Works Ltd
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Description

本発明は、受光素子の感度制御方法、強度変調光を用いた空間情報の検出装置に関するものである。   The present invention relates to a sensitivity control method for a light receiving element and a spatial information detection apparatus using intensity-modulated light.

従来から、受光素子の感度を外部信号によって制御しようとする場合に、受光素子の前方に外部信号によって通過光量を調節することができる光学部材を配置する構成が広く採用されている。この技術は受光素子に入射する光量を制御するものであるが、その一方、受光素子で受光強度に対応して発生した電荷のうち実際に信号電荷として外部に取り出す割合を制御することによって、受光素子の感度を制御する技術も採用されている。   2. Description of the Related Art Conventionally, when the sensitivity of a light receiving element is to be controlled by an external signal, a configuration in which an optical member that can adjust the amount of light passing through an external signal is arranged in front of the light receiving element. This technology controls the amount of light incident on the light receiving element, but on the other hand, by controlling the proportion of the charge generated by the light receiving element corresponding to the received light intensity and actually taking it out as signal charge, A technique for controlling the sensitivity of the element is also employed.

受光素子の感度を制御する技術は、たとえば、強度変調した光を発光源から空間に放射し、この空間に存在する物体により反射された反射光を受光素子で受光し、発光源から放射した光と受光素子で受光した光との関係に基づいて空間に関する各種情報を検出する場合などに採用される。ここで、空間に関する情報とは、空間に存在する物体までの距離や空間に存在する物体での反射による受光量の変化などを意味する。物体までの距離を求める場合には、発光源から空間に放射する光を所定の変調周波数で強度変調しておき、光電素子では変調周波数の逆数である変調周期に同期させて受光強度を複数回検出する技術が考えられている(たとえば、特許文献1)。   The technology to control the sensitivity of the light receiving element is, for example, that light whose intensity is modulated is emitted from the light source to the space, the reflected light reflected by the object existing in this space is received by the light receiving element, and the light emitted from the light source is emitted. This is employed when detecting various information related to space based on the relationship between the light received by the light receiving element and the light received by the light receiving element. Here, the information related to the space means a distance to an object existing in the space, a change in received light amount due to reflection by the object existing in the space, and the like. When determining the distance to the object, the light emitted from the light source to the space is intensity-modulated at a predetermined modulation frequency, and the photoelectric element receives the received light intensity multiple times in synchronization with the modulation period that is the reciprocal of the modulation frequency. A technique for detection is considered (for example, Patent Document 1).

すなわち、発光源から空間に放射する光の強度を変調し、変調時の特定の位相に対する光電素子での受光強度を検出するようにし、変調周期に同期して特定の位相の受光強度を3回以上求めると、求めた受光強度の関係によって発光源から放射した光と受光素子により受光した光との位相差を求めることができる。以下では受光強度を4回以上求めるものとして説明する。たとえば、発光源から空間に放射する光の強度を正弦波で変調している場合には、変調信号の位相が0度、90度、180度、270度である4点において受光強度を検出したときの各受光強度をそれぞれA0,A1,A2,A3とすれば、各位相における受光強度A0,A1,A2,A3を用いて位相差ψを表すと、次式のようになる。
ψ=tan−1{(A3−A1)/(A0−A2)}
上述のように変調周期に合わせて特定の位相の受光強度を求めようとすれば、受光素子の感度を制御することが必要であって、特許文献1に記載の技術では、受光素子で集積された電荷を記憶領域に移送する経路にスイッチ領域を設け、受光素子で集積された電荷のうち受光強度A0,A1,A2,A3を求めるのに必要な電荷を記憶領域に蓄積するようにスイッチ領域を制御する構成を採用している。
特表平10−508736号公報(第7−9頁、図1、図2)
That is, the intensity of light radiated from the light source to the space is modulated, and the received light intensity at the photoelectric element for the specific phase at the time of modulation is detected, and the received light intensity of the specific phase is measured three times in synchronization with the modulation period. If it calculates | requires above, the phase difference of the light radiated | emitted from the light emission source and the light received by the light receiving element can be calculated | required by the relationship of the calculated | required received light intensity. In the following description, it is assumed that the received light intensity is obtained four times or more. For example, when the intensity of light radiated from the light source to the space is modulated with a sine wave, the received light intensity is detected at four points where the phase of the modulation signal is 0 degrees, 90 degrees, 180 degrees, and 270 degrees. If the received light intensities at that time are A0, A1, A2, and A3, respectively, the phase difference ψ is expressed as follows using the received light intensities A0, A1, A2, and A3 at the respective phases.
ψ = tan −1 {(A3-A1) / (A0-A2)}
As described above, if the received light intensity of a specific phase is determined in accordance with the modulation period, it is necessary to control the sensitivity of the light receiving element. In the technique described in Patent Document 1, the light receiving element is integrated. A switch region is provided in a path for transferring the stored charge to the storage region, and the switch region is configured to accumulate the charge necessary for obtaining the received light intensity A0, A1, A2, A3 among the charges integrated by the light receiving element in the storage region. The structure which controls is adopted.
JP 10-508736 A (page 7-9, FIG. 1, FIG. 2)

上述した特許文献1に記載の技術では、感光性部分とは別にスイッチ領域および記憶領域を画像センサに設ける必要があるから構造が比較的複雑になるという問題があり、またスイッチ領域および記憶領域を遮光する必要があり、画像センサにおいて遮光を必要とする部分が占有する面積が比較的大きいから、開口率が小さくなり感度が低いという問題もある。   In the technique described in Patent Document 1 described above, there is a problem that the structure is relatively complicated because it is necessary to provide a switch area and a storage area separately from the photosensitive portion in the image sensor. There is also a problem that the aperture ratio is small and the sensitivity is low because the area occupied by the portion that needs light shielding in the image sensor is relatively large.

本発明は上記事由に鑑みて為されたものであり、その目的は、構造が比較的簡単であって、かつ開口率が比較的大きくS/Nに優れた受光素子の感度制御方法を提供し、この方法を利用した強度変調光を用いた空間情報の検出装置を提供することにある。   The present invention has been made in view of the above-mentioned reasons, and an object of the present invention is to provide a sensitivity control method for a light receiving element having a relatively simple structure and a relatively large aperture ratio and excellent S / N. Another object of the present invention is to provide a spatial information detection device using intensity-modulated light using this method.

請求項1の発明は、受光強度に対応する量の電荷を発生する感光部と、感光部に設けた制御電極への制御電圧の印加により感光部に形成され感光部で発生した電荷の少なくとも一部を集積する電荷集積部と、電荷集積部に集積した電荷を受光出力として外部に取り出す電荷取出部とを備える受光素子において受光感度を制御する方法であって、感光部における半導体層の不純物濃度について、受光面に沿って制御電極からの距離に応じた分布を付与し、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧の大きさを変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えることを特徴とする。 According to the first aspect of the present invention, there is provided a photosensitive portion that generates an amount of charge corresponding to the received light intensity, and at least one of the charges generated in the photosensitive portion formed in the photosensitive portion by applying a control voltage to a control electrode provided in the photosensitive portion. A method for controlling light reception sensitivity in a light receiving element including a charge integration unit that integrates a charge collecting unit and a charge extraction unit that extracts the charge accumulated in the charge integration unit as a light reception output, wherein the impurity concentration of a semiconductor layer in the photosensitive unit for, grant distribution corresponding to the distance from the control electrode along the light receiving surface, the magnitude of a control voltage to the control electrode so that the area of the charge accumulation portions in a plane along the light receiving surface of the photosensitive section changes is varied and a generation period to increase the area of the charge accumulation portion, between a holding period for holding the generated electric charges in the generation period by reducing the area of the charge accumulation portion, the area of the charge accumulation portion big Characterized in that the switching of the.

請求項2の発明は、強度変調光を用いた空間情報の検出装置であって、所定の変調周波数の変調信号で強度変調された光が照射されている空間からの光を受光し受光強度に対応する量の電荷を発生する感光部と、感光部に設けた制御電極への制御電圧の印加により感光部に形成され感光部で発生した電荷の少なくとも一部を集積する電荷集積部と、電荷集積部に集積した電荷を受光出力として外部に取り出す電荷取出部と、感光部の受光面に沿った面内での電荷集積部の面積が時間経過に伴って変化するように時間経過に伴って大きさが変化する制御電圧を出力する制御回路部と、電荷取出部により取り出した電荷を用いて前記空間に関する情報を評価する評価部とを備え、感光部における半導体層の不純物濃度について、受光面に沿って制御電極からの距離に応じた分布を付与し、制御回路部は、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧の大きさを変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えることを特徴とする。 The invention of claim 2 is an apparatus for detecting spatial information using intensity-modulated light, and receives light from a space irradiated with light that has been intensity-modulated with a modulation signal having a predetermined modulation frequency to obtain a received light intensity. A photosensitive portion that generates a corresponding amount of charge, a charge accumulation portion that accumulates at least a portion of the charge generated in the photosensitive portion formed by applying a control voltage to a control electrode provided in the photosensitive portion, and a charge With the passage of time so that the area of the charge collection section in the plane along the light receiving surface of the photosensitive section changes with the passage of time a control circuit unit for outputting a control voltage magnitude varies, and a evaluation unit for evaluating the information related to the space using a charge removed by a charge take-out portion, the impurity concentration of the semiconductor layer in the photosensitive portion, the light-receiving surface In line with Grant distribution corresponding to the distance from the electrode, the control circuit section changes the magnitude of the control voltage to the control electrode so that the area of the charge accumulation portions in a plane along the light receiving surface of the photosensitive section changes Between the generation period for increasing the area of the charge integration portion and the holding period for holding charges generated in the generation period by reducing the area of the charge integration portion. It is characterized by switching.

請求項1の発明は、受光強度に対応する量の電荷を発生する感光部に設けた制御電極への制御電圧の印加により感光部の一部分を電荷集積部として用いる受光素子について、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧を変化させるので、受光素子において受光光量に応じて電荷を生成する部位の面積が制御電圧に応じて変化し、感光部で生成された電荷のうち電荷集積部を通して信号電荷として外部に取り出される割合を制御電圧によって調節することができる。さらに、感光部に対応する電荷集積部を設け、電荷集積部の面積を感光部に設けた制御電極への制御電圧に応じて変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えるから、感光部の面内で感度の制御および電荷の集積が可能であって、感光部とは別領域にスイッチ領域および記憶領域を設ける従来構成に比較すると構造が簡単になるという利点があり、しかも、感度の制御および電荷の集積を行う機能を備えながらも遮光することなく使用可能であるから、受光面積を比較的大きくとることができて開口率が大きく、結果的に信号電荷を高いS/Nで取り出すことが可能になる。   According to the first aspect of the present invention, a light receiving element that uses a part of the photosensitive portion as a charge accumulation portion by applying a control voltage to a control electrode provided in the photosensitive portion that generates an amount of electric charge corresponding to the received light intensity. Since the control voltage to the control electrode is changed so that the area of the charge accumulation portion in the plane along the plane changes, the area of the part that generates charges according to the amount of received light in the light receiving element depends on the control voltage. It is possible to adjust the ratio of the electric charges generated in the photosensitive portion and taken out as signal charges through the charge accumulation portion by the control voltage. Furthermore, a charge accumulation unit corresponding to the photosensitive unit is provided, and a generation period for increasing the area of the charge integration unit by changing the area of the charge integration unit according to the control voltage to the control electrode provided in the photosensitive unit, and charge integration Since the area of the charge accumulation unit is switched between the holding period for holding the charge generated during the generation period by reducing the area of the unit, the sensitivity control and charge accumulation are performed within the surface of the photosensitive unit. Compared to a conventional configuration in which a switch area and a storage area are provided in a separate area from the photosensitive part, there is an advantage that the structure becomes simple, and while having functions for controlling sensitivity and collecting charge. Since it can be used without being shielded from light, the light receiving area can be made relatively large, the aperture ratio is large, and as a result, the signal charge can be taken out with high S / N.

請求項2の発明は、受光強度に対応する量の電荷を発生する感光部に設けた制御電極への制御電圧の印加により感光部の一部分を電荷集積部として用いる受光素子について、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧を変化させるので、受光素子において受光光量に応じて電荷を生成する部位の面積が制御電圧に応じて変化し、感光部で生成された電荷のうち電荷集積部を通して信号電荷として外部に取り出される割合を制御電圧によって調節することができる。また、強度変調光が照射されている空間からの光を受光素子で受光するとともに受光素子の感度を調節することで空間に関する情報を含んだ信号電荷を取り出すことが可能になる。さらに、感光部に対応する電荷集積部を設け、電荷集積部の面積を感光部に設けた制御電極への制御電圧に応じて変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えるから、感光部の面内で感度の制御および電荷の集積が可能であって、感光部とは別領域にスイッチ領域および記憶領域を設ける従来構成に比較すると構造が簡単になるという利点があり、しかも、感度の制御および電荷の集積を行う機能を備えながらも遮光することなく使用可能であるから、受光面積を比較的大きくとることができて開口率が大きく、結果的に信号電荷を高いS/Nで取り出すことが可能になる。   According to a second aspect of the present invention, there is provided a light receiving element that uses a part of the photosensitive portion as a charge accumulation portion by applying a control voltage to a control electrode provided in the photosensitive portion that generates an amount of charge corresponding to the received light intensity. Since the control voltage to the control electrode is changed so that the area of the charge accumulation portion in the plane along the plane changes, the area of the part that generates charges according to the amount of received light in the light receiving element depends on the control voltage. The ratio of the electric charge generated by the photosensitive portion and taken out as signal charge through the charge accumulation portion can be adjusted by the control voltage. In addition, it is possible to take out signal charges including information about the space by receiving light from the space irradiated with the intensity-modulated light by the light receiving element and adjusting the sensitivity of the light receiving element. Furthermore, a charge accumulation unit corresponding to the photosensitive unit is provided, and a generation period for increasing the area of the charge integration unit by changing the area of the charge integration unit according to the control voltage to the control electrode provided in the photosensitive unit, and charge integration Since the area of the charge accumulation unit is switched between the holding period for holding the charge generated during the generation period by reducing the area of the unit, the sensitivity control and charge accumulation are performed within the surface of the photosensitive unit. Compared to a conventional configuration in which a switch area and a storage area are provided in a separate area from the photosensitive part, there is an advantage that the structure becomes simple, and while having functions for controlling sensitivity and collecting charge. Since it can be used without being shielded from light, the light receiving area can be made relatively large, the aperture ratio is large, and as a result, the signal charge can be taken out with high S / N.

まず、図1に示す構成の受光素子1を用いた構成例について説明する。この受光素子1は、不純物を添加した半導体層11を備えるとともに、半導体層11の主表面が酸化膜からなる絶縁膜12により覆われ、半導体層11に絶縁膜12を介して制御電極13を設けた構成を有する。この受光素子1はMIS素子として知られた構造であるが、1個の受光素子1として機能する領域に複数個(図示例では5個)の制御電極13を備える点が通常のMIS素子とは異なる。絶縁膜12および制御電極13は光が透過するように材料が選択され、絶縁膜12を通して半導体層11に光が入射すると、半導体層11の内部に電荷が生成される。図示例の半導体層11の導電形はn形であり、光の照射により生成される電荷としては電子eを利用する。 First, a configuration example using the light receiving element 1 having the configuration shown in FIG. 1 will be described. The light receiving element 1 includes a semiconductor layer 11 to which an impurity is added, the main surface of the semiconductor layer 11 is covered with an insulating film 12 made of an oxide film, and a control electrode 13 is provided on the semiconductor layer 11 via the insulating film 12. Have a configuration. The light receiving element 1 has a structure known as a MIS element. However, the light receiving element 1 has a plurality of (five in the illustrated example) control electrodes 13 in a region functioning as one light receiving element 1. Different. Materials are selected for the insulating film 12 and the control electrode 13 so that light can be transmitted. When light enters the semiconductor layer 11 through the insulating film 12, charges are generated inside the semiconductor layer 11. The conductivity type of the semiconductor layer 11 in the illustrated example is n-type, and electrons e are used as charges generated by light irradiation.

この構造の受光素子1では、制御電極13に正の制御電圧+Vを印加すると、半導体層11には制御電極13に対応する部位に電子eを集積するポテンシャル井戸(空乏層)14が形成される。つまり、半導体層11にポテンシャル井戸14を形成するように制御電極13に制御電圧を印加した状態で光が半導体層11に照射されると、ポテンシャル井戸14の近傍で生成された電子eの一部はポテンシャル井戸14に捕獲されてポテンシャル井戸14に集積され、残りの電子eは半導体層11の深部での再結合により消滅する。また、ポテンシャル井戸14から離れた場所で生成された電子eも半導体層11の深部での再結合により消滅する。   In the light receiving element 1 having this structure, when a positive control voltage + V is applied to the control electrode 13, a potential well (depletion layer) 14 for accumulating electrons e is formed in the semiconductor layer 11 at a site corresponding to the control electrode 13. . That is, when light is applied to the semiconductor layer 11 with a control voltage applied to the control electrode 13 so as to form the potential well 14 in the semiconductor layer 11, a part of the electrons e generated in the vicinity of the potential well 14. Are captured in the potential well 14 and accumulated in the potential well 14, and the remaining electrons e disappear due to recombination in the deep part of the semiconductor layer 11. Further, the electrons e generated at a location away from the potential well 14 are also extinguished by recombination in the deep part of the semiconductor layer 11.

上述のように、ポテンシャル井戸14は制御電圧を印加した制御電極13に対応する部位に形成されるから、制御電圧を印加する制御電極13の個数を変化させることによって、半導体層11の主表面に沿ったポテンシャル井戸14の面積(言い換えると、受光面に占める電荷集積部の面積)を変化させることができる。電荷集積部の面積が変化すれば、半導体層11において生成された電子eのうち電荷集積部に蓄積される割合が変化するから、電荷集積部に蓄積された電荷を信号電荷として外部に取り出すようにすれば、実質的に受光素子1の感度を調節したことになる。つまり、制御電極13への制御電圧の印加パターンを制御することにより、受光素子1の感度を制御することができる。たとえば、図1(a)のように3個の制御電極13に制御電圧を印加する場合と、図1(b)のように1個の制御電極13に制御電圧を印加する場合とでは、電荷集積部であるポテンシャル井戸14が受光面に占める面積が変化するのであって、図1(a)の状態のほうがポテンシャル井戸14の面積が大きいから、図1(b)の状態に比較して同光量に対する信号電荷の割合が大きくなり、実質的に受光素子1の感度を高めたことになる。   As described above, since the potential well 14 is formed at a portion corresponding to the control electrode 13 to which the control voltage is applied, the potential well 14 is formed on the main surface of the semiconductor layer 11 by changing the number of the control electrodes 13 to which the control voltage is applied. The area of the potential well 14 (in other words, the area of the charge accumulation portion in the light receiving surface) can be changed. If the area of the charge accumulation unit changes, the proportion of electrons e generated in the semiconductor layer 11 accumulated in the charge accumulation unit changes, so that the charge accumulated in the charge accumulation unit is taken out as a signal charge to the outside. In this case, the sensitivity of the light receiving element 1 is substantially adjusted. That is, the sensitivity of the light receiving element 1 can be controlled by controlling the application pattern of the control voltage to the control electrode 13. For example, when a control voltage is applied to three control electrodes 13 as shown in FIG. 1A and when a control voltage is applied to one control electrode 13 as shown in FIG. The area occupied by the potential well 14 which is an integrated portion changes in the light receiving surface, and the area of the potential well 14 is larger in the state of FIG. 1A than in the state of FIG. The ratio of the signal charge with respect to the light amount is increased, and the sensitivity of the light receiving element 1 is substantially increased.

上述した受光素子1において電荷集積部であるポテンシャル井戸14から信号電荷を取り出すには、フレーム転送型のCCDと同様の技術を採用すればよく、ポテンシャル井戸14に電子eが集積された後に、制御電圧の印加パターンを制御することによってポテンシャル井戸14に集積された電子eを一方向(図の右方向または左方向)に転送し、半導体層11に設けた図示しない電極から電子eを取り出すことになる。   In order to take out the signal charge from the potential well 14 which is the charge accumulation portion in the light receiving element 1 described above, a technique similar to that of the frame transfer type CCD may be adopted. After the electron e is accumulated in the potential well 14, the control is performed. By controlling the voltage application pattern, the electrons e accumulated in the potential well 14 are transferred in one direction (right direction or left direction in the figure), and the electrons e are taken out from an electrode (not shown) provided in the semiconductor layer 11. Become.

受光素子1の各部の動作を機能によって表せば、半導体層11は光の入射により電子eを生成する感光部1a(図2参照)および感光部1aで生成された電子eを集積する電荷集積部1c(図2参照)として機能し、制御電極13は受光中に制御電圧の印加パターンを変化させることによって感度制御部1b(図2参照)として機能する。また、制御電極13への制御電圧の印加パターンを制御することによって半導体層11は電荷取出部1d(図2参照)としても機能する。制御電圧の印加パターンを制御する上述の動作によって受光素子1の感度を制御可能とすることにより、受光素子1を用いて図2に示す装置を実現することができる。   If the operation of each part of the light receiving element 1 is expressed by function, the semiconductor layer 11 includes a photosensitive part 1a (see FIG. 2) that generates electrons e upon incidence of light and a charge integration part that integrates the electrons e generated by the photosensitive part 1a. 1c (see FIG. 2), and the control electrode 13 functions as a sensitivity control unit 1b (see FIG. 2) by changing the application pattern of the control voltage during light reception. Further, the semiconductor layer 11 also functions as the charge extraction portion 1d (see FIG. 2) by controlling the application pattern of the control voltage to the control electrode 13. By making the sensitivity of the light receiving element 1 controllable by the above-described operation for controlling the application pattern of the control voltage, the apparatus shown in FIG. 2 can be realized using the light receiving element 1.

図示する装置は強度変調した光が照射されている空間から空間情報を検出する装置である。ここに、空間情報とは物体までの距離や空間に存在する物体での反射による受光量の変化など意味する。受光素子1の出力から空間情報としてどのような情報を抽出するかは評価部3の構成による。ここでは、評価部3において、空間に照射されている強度変調された光の元の位相と光電素子1で受光した光との位相差を求め、この位相差から空間に存在する物体5までの距離を求める例を示す。 The illustrated apparatus is an apparatus that detects spatial information from a space irradiated with intensity-modulated light. Here, the spatial information means a distance to the object, a change in the amount of received light due to reflection by an object existing in the space, and the like. What information is extracted as spatial information from the output of the light receiving element 1 depends on the configuration of the evaluation unit 3. Here , the evaluation unit 3 obtains the phase difference between the original phase of the intensity-modulated light applied to the space and the light received by the photoelectric element 1, and from this phase difference to the object 5 existing in the space. The example which calculates | requires distance is shown.

図2に示す装置は、物体5までの距離を求めようとする空間に光を照射する発光源2と、物体5により反射された光を受光する受光素子1とを備える。発光源2は制御回路部4から出力される所定の変調周波数である変調信号によって駆動され、発光源2から放射される光は変調周波数で強度変調される。発光源2としては、たとえば多数個の発光ダイオードを一平面上に配列したものや半導体レーザと発散レンズとを組み合わせたものなどを用いる。制御回路部4では、たとえば20MHzの正弦波で発光源2から放射する光を強度変調する。   The apparatus shown in FIG. 2 includes a light emitting source 2 that irradiates light into a space in which a distance to the object 5 is to be obtained, and a light receiving element 1 that receives light reflected by the object 5. The light emission source 2 is driven by a modulation signal having a predetermined modulation frequency output from the control circuit unit 4, and the light emitted from the light emission source 2 is intensity-modulated at the modulation frequency. As the light emitting source 2, for example, a light emitting diode in which a large number of light emitting diodes are arranged on one plane or a combination of a semiconductor laser and a diverging lens is used. The control circuit unit 4 modulates the intensity of light emitted from the light source 2 with, for example, a 20 MHz sine wave.

一方、発光源2からの光を照射した空間からの光は、受光光学系6を通して受光素子1に入射する。受光素子1は図1に示した構造の感光部1aを複数個(たとえば、100×100個)備え、感光部1aはマトリクス状などに配列されることによりイメージセンサ7を構成する。この種のイメージセンサ7は、たとえば1枚の半導体基板上に感光部1aをマトリクス状に配列し、感光部1aのうち垂直方向の各列では一体に連続する半導体層11を共用するとともに半導体層11を垂直方向への電荷(電子e)の転送経路として用い、さらに各列の半導体層11の一端から電子eを受け取って水平方向に電子eを転送するCCD型の水平転送部を半導体基板に設ける構成を採用することができる。この構成のイメージセンサ7はフレーム転送型のCCDイメージセンサと類似した構成になる。   On the other hand, light from the space irradiated with light from the light emitting source 2 enters the light receiving element 1 through the light receiving optical system 6. The light receiving element 1 includes a plurality of (for example, 100 × 100) photosensitive portions 1a having the structure shown in FIG. 1, and the photosensitive portions 1a are arranged in a matrix or the like to constitute the image sensor 7. In this type of image sensor 7, for example, the photosensitive portions 1 a are arranged in a matrix on a single semiconductor substrate, and the semiconductor layers 11 that are integrally continuous in each column in the vertical direction of the photosensitive portions 1 a are shared and the semiconductor layers. 11 is used as a transfer path for charges (electrons e) in the vertical direction, and a CCD type horizontal transfer unit that receives the electrons e from one end of the semiconductor layer 11 in each column and transfers the electrons e in the horizontal direction is provided on the semiconductor substrate. The provided structure can be adopted. The image sensor 7 having this configuration is similar to a frame transfer type CCD image sensor.

受光光学系6はイメージセンサ7の受光面である2次元平面に発光源2からの光を放射した3次元空間をマッピングする。つまり、イメージセンサ7が受光光学系6を通して見る視界内に存在する物体5は感光部1aに対応付けられる。ここに、物体5に対応した感光部1aに入射する光の受光強度は発光源2からの光によって強度変調されているから、発光源2から放射された光と感光部1aで受光した光との位相差を検出すれば、感光部1aに対応している物体5の各部位までの距離を求めることができる。   The light receiving optical system 6 maps a three-dimensional space in which light from the light source 2 is emitted onto a two-dimensional plane that is a light receiving surface of the image sensor 7. That is, the object 5 existing in the field of view viewed by the image sensor 7 through the light receiving optical system 6 is associated with the photosensitive portion 1a. Here, since the light receiving intensity of the light incident on the photosensitive portion 1a corresponding to the object 5 is modulated by the light from the light source 2, the light emitted from the light source 2 and the light received by the photosensitive portion 1a Is detected, the distance to each part of the object 5 corresponding to the photosensitive portion 1a can be obtained.

図2においては、イメージセンサ7の機能の理解を容易にするために、受光素子1の機能を上述したように感光部1aと感度制御部1bと電荷集積部1cと電荷取出部1dとに分けて記載している。図2における電荷取出部1dは、半導体層11だけではなくイメージセンサ7の水平転送部も含んでいる。感度制御部1bおよび電荷取出部1dは、上述のように制御電極13を共用しており、制御回路部4で生成され制御電圧13に印加される制御電圧の印加パターンを制御することによって感度の調節および電荷の転送がなされる。   In FIG. 2, in order to facilitate understanding of the function of the image sensor 7, the function of the light receiving element 1 is divided into the photosensitive portion 1a, the sensitivity control portion 1b, the charge accumulation portion 1c, and the charge extraction portion 1d as described above. It is described. The charge extraction unit 1 d in FIG. 2 includes not only the semiconductor layer 11 but also the horizontal transfer unit of the image sensor 7. The sensitivity control unit 1b and the charge extraction unit 1d share the control electrode 13 as described above, and the sensitivity is controlled by controlling the application pattern of the control voltage generated by the control circuit unit 4 and applied to the control voltage 13. Regulation and charge transfer are made.

ここでは、発光源2から空間に放射した光と感光部1aにおいて受光した光との位相差を求めるために、発光源2を駆動する変調信号の周期に同期するタイミングで感度制御部1bにおける感度の制御を行う例を示す。つまり、感度制御部1bにおいて高感度の状態と低感度の状態とを交互に繰り返すのであって、この繰り返し周期を変調信号の周期に同期させるのである。 Here , in order to obtain the phase difference between the light emitted from the light source 2 into the space and the light received by the photosensitive unit 1a, the sensitivity in the sensitivity control unit 1b is synchronized with the period of the modulation signal that drives the light source 2. An example of performing the control will be shown. That is, the sensitivity control unit 1b alternately repeats the high sensitivity state and the low sensitivity state, and synchronizes this repetition cycle with the modulation signal cycle.

具体的には、図3に示すように、発光源2から空間に放射する光の強度変化が曲線イであって、感光部1aでの受光強度の変化が曲線ロであるとすれば、位相差ψを求めるには、曲線ロについて異なる位相での4点における強度を求めればよいことがわかる。たとえば、曲線イについて位相が0度、90度、180度、270度である4点のタイミングでの曲線ロにおける受光強度をそれぞれA0,A1,A2,A3とする。ここに、各位相における受光強度A0,A1,A2,A3は、実際には時間幅Twで示す時間内において入射した光量に比例するものとする。ここで、受光強度A0,A1,A2,A3を求める間には位相差ψが変化せず、かつ発光から受光までの光の減衰率にも変化がないものとすれば、受光強度A0,A1,A2,A3を90度毎に求めていることから、各受光強度A0,A1,A2,A3と位相差ψとの関係は、次式で表すことができる。
ψ=tan−1{(A3−A1)/(A0−A2)}
つまり、感度制御部1bにおいて上述した受光強度A0,A1,A2,A3を求めるタイミングで時間幅Twだけ高感度に設定すれば、各タイミングにおいて受光強度A0,A1,A2,A3に相当する信号電荷が電荷集積部1cに集積されることになる。このようにして得られる4個の信号電荷を信号電荷が得られるたびに電荷取出部1dを通して評価部3に取り出すか、あるいは4個の信号電荷を各別の感光部1aに対応付けておき4個の信号電荷が得られてから電荷取出部1dを通して評価部3に取り出すようにすれば、上式から位相差ψを求めることができ、変調周波数と位相差ψとを用いることによって位相差ψを物体5までの距離に換算することができる。
Specifically, as shown in FIG. 3, if the change in intensity of light radiated from the light source 2 into the space is a curve a and the change in the received light intensity at the photosensitive portion 1a is a curve b, It can be seen that in order to obtain the phase difference ψ, the intensities at four points at different phases can be obtained for the curve b. For example, it is assumed that the received light intensity at curve B at the timing of 4 points with a phase of 0 degree, 90 degrees, 180 degrees, and 270 degrees for curve A is A0, A1, A2, and A3, respectively. Here, the received light intensities A0, A1, A2, and A3 in each phase are actually proportional to the amount of light incident within the time indicated by the time width Tw. Here, if the phase difference ψ does not change while the received light intensity A0, A1, A2, A3 is obtained, and the light attenuation rate from light emission to light reception does not change, the light reception intensity A0, A1. , A2 and A3 are obtained every 90 degrees, the relationship between each received light intensity A0, A1, A2 and A3 and the phase difference ψ can be expressed by the following equation.
ψ = tan −1 {(A3-A1) / (A0-A2)}
That is, if the sensitivity control unit 1b is set to be highly sensitive by the time width Tw at the timing for obtaining the above-described received light intensity A0, A1, A2, A3, the signal charge corresponding to the received light intensity A0, A1, A2, A3 at each timing. Is accumulated in the charge accumulation section 1c. The four signal charges obtained in this way are taken out to the evaluation unit 3 through the charge extraction unit 1d each time a signal charge is obtained, or four signal charges are associated with each of the different photosensitive units 1a. If the signal charges are obtained and then extracted to the evaluation unit 3 through the charge extraction unit 1d, the phase difference ψ can be obtained from the above equation, and the phase difference ψ can be obtained by using the modulation frequency and the phase difference ψ. Can be converted into a distance to the object 5.

上述した構成では、感光部1aと電荷集積部1cとで半導体層11を共用しているから、信号電荷を取り出すために感度制御部1bを高感度に設定している期間以外であっても、半導体層11を電荷集積部1cとして機能させるために、制御電極13には感度制御部1bが低感度になる状態の制御電圧を印加する必要がある。つまり、電荷集積部1cには信号電荷以外の電荷も混入することになる。ただし、低感度である期間には電荷集積部1cの面積が小さくなっており、しかも、信号電荷以外の電荷は4個の信号電荷にほぼ均等に混入すると考えられるから、上式のように受光強度A0,A1,A2,A3の差分を求める演算((A3−A1)と(A0−A2)とを求める演算)によって、信号電荷以外の電荷による成分は外乱光の影響とともに除去される。また、図1(b)のように電荷集積部1cの面積を小さくしている期間において信号電荷以外の電荷の混入を抑制するには、この期間における電荷集積部1cに対応した制御電極13の近傍に遮光膜を設ける構成を採用してもよい。   In the configuration described above, since the semiconductor layer 11 is shared by the photosensitive portion 1a and the charge integration portion 1c, even during a period other than the period in which the sensitivity control portion 1b is set to high sensitivity in order to extract signal charges, In order for the semiconductor layer 11 to function as the charge accumulation unit 1c, it is necessary to apply a control voltage to the control electrode 13 in a state where the sensitivity control unit 1b has low sensitivity. That is, charges other than signal charges are also mixed in the charge accumulation unit 1c. However, since the area of the charge accumulating portion 1c is small during the period of low sensitivity, and it is considered that charges other than the signal charge are mixed almost equally into the four signal charges, the light reception is performed as shown in the above equation. By the calculation for calculating the difference between the intensities A0, A1, A2, and A3 (the calculation for determining (A3-A1) and (A0-A2)), components due to charges other than the signal charges are removed together with the influence of disturbance light. Further, in order to suppress the mixing of charges other than the signal charge during the period in which the area of the charge accumulating portion 1c is reduced as shown in FIG. 1B, the control electrode 13 corresponding to the charge accumulating portion 1c in this period is suppressed. You may employ | adopt the structure which provides a light shielding film in the vicinity.

なお、図示例では4個の信号電荷(受光強度A0,A1,A2,A3)を変調信号の1周期内で90度ごとに得るようにしているが、変調信号に対して信号電荷を取り出すタイミングの位相が規定されていれば90度ごとに取り出すことは必須ではなく、また4個の信号電荷を取り出す間に位相差ψや光の減衰率に変化が生じないのであれば、変調信号の1周期内で4個の信号電荷を取り出すことも必須ではない。また、発光源2から放射される光を正弦波で変調しているが、三角波あるいは鋸歯状波などの他の波形で強度変調を行ってもよい。さらに、太陽光や照明光のような外乱光の影響があるときには、発光源2から放射される光の波長のみを透過させる光学フィルタを感光部1aの前に配置するのが望ましい。これらのことは以下の構成例でも同様である。 In the illustrated example, four signal charges (light receiving intensities A0, A1, A2, A3) are obtained every 90 degrees within one period of the modulation signal. If the phase of the signal is defined, it is not essential to extract every 90 degrees, and if no change occurs in the phase difference ψ or the light attenuation rate during the extraction of the four signal charges, 1 of the modulation signal is obtained. It is not essential to take out four signal charges within a period. Moreover, although the light radiated | emitted from the light emission source 2 is modulated with the sine wave, you may modulate intensity | strength with other waveforms, such as a triangular wave or a sawtooth wave. Further, when there is an influence of disturbance light such as sunlight or illumination light, it is desirable to dispose an optical filter that transmits only the wavelength of light emitted from the light source 2 in front of the photosensitive portion 1a. The same applies to the following configuration examples .

図3に示した動作例では、変調信号の周期に同期させて信号電荷を抽出しているから、たとえば、変調周波数が20MHzの場合、変調信号の1周期に対する信号電荷の蓄積時間は数十ns程度と短い。この場合、制御電極13に印加する制御電圧の波形歪が位相差ψの検出精度に直接影響する。また、発光源2から放射される光の波形歪も位相差ψの検出精度に直接影響する。 In the operation example shown in FIG. 3, since the signal charge is extracted in synchronization with the period of the modulation signal, for example, when the modulation frequency is 20 MHz, the accumulation time of the signal charge for one period of the modulation signal is several tens of ns. About short. In this case, the waveform distortion of the control voltage applied to the control electrode 13 directly affects the detection accuracy of the phase difference ψ. Further, the waveform distortion of the light emitted from the light emitting source 2 also directly affects the detection accuracy of the phase difference ψ.

そこで、ここでは、感度制御部1bを変調周波数とは異なる局発周波数で制御することによって、感度制御部1bを変調周波数と局発周波数とを混合する混合器として用い、混合結果のビート信号を用いて位相差ψの検出を行う。この構成では、制御電圧の波形および変調信号の波形の周期性さえ保たれていれば、波形歪の影響を受けることなく位相差ψの検出が行える。ここに、局発周波数の局発信号は制御回路部4から与えられる。このような構成を採用することによって、電荷集積部1cには、感光部1aにおいて受光した光量に対応する電荷(受光信号に相当)と局発信号との周波数差の包絡線成分を持つ図4のようなビート信号に相当する信号電荷が集積される。ビート信号の周期は変調周波数と局発周波数との周波数差に依存し、たとえば周波数差を300kHz程度に設定すれば、ビート信号の周期は3μs程度になる。 Therefore, here , by controlling the sensitivity control unit 1b at a local frequency different from the modulation frequency, the sensitivity control unit 1b is used as a mixer for mixing the modulation frequency and the local frequency, and the beat signal obtained as a result of the mixing is used. To detect the phase difference ψ. In this configuration , as long as the periodicity of the waveform of the control voltage and the waveform of the modulation signal is maintained, the phase difference ψ can be detected without being affected by the waveform distortion. Here, the local oscillation signal of the local oscillation frequency is given from the control circuit unit 4. By adopting such a configuration, the charge accumulating unit 1c has an envelope component of the frequency difference between the charge (corresponding to the received light signal) corresponding to the amount of light received by the photosensitive unit 1a and the local oscillation signal. The signal charge corresponding to the beat signal is accumulated. The cycle of the beat signal depends on the frequency difference between the modulation frequency and the local frequency. For example, if the frequency difference is set to about 300 kHz, the cycle of the beat signal is about 3 μs.

物体5までの距離が時間経過とともに変化しなければ、ビート信号の位相は、発光源2から放射された光の位相と、制御回路部4から出力された局発信号の位相と、感光部1aから出力される受光信号の位相との関係によって決定される。すなわち、変調周波数に相当する角周波数をω1とし、発光源2から放射された光の位相と受光信号の位相との位相差をψとすれば、受光信号の信号強度Y1は次式で表される。ただし、a1,b1は定数であって、a1は受光信号の振幅に相当し、b1は暗電流や外光(時間変化は無視する)に相当する。
Y1=b1+a1・cos(ω1・t+ψ)
また、局発信号の角周波数をω2とすれば、局発信号の信号強度Y2は次式で表される。ただし、a2,b2は定数であって、a2は局発信号の振幅に相当し、b2は直流バイアスに相当する。
Y2=b2+a2・cos(ω2・t)
ここで、受光信号と局発信号とを混合した信号は(Y1・Y2)になるから、変調周波数と局発信号の周波数との周波数差に相当する包絡線成分を持つビート信号が得られ、かつ包絡線成分の位相には位相差ψがそのまま反映されることになる。つまり、位相差ψを求めるための信号電荷は、ビート信号の周期に同期するように取り出せばよい。ただし、ビート信号には変調信号による光量の変動成分が含まれているから、信号電荷を取り出すにはビート信号の包絡線成分を取り出すことが必要である。図4に示す例では、ビート信号の周期に同期させて図4に示す時間幅Tiにおいて生じた電荷を電荷集積部1cに集積する構成を採用している(つまり、時間幅Tiに相当する期間は感度制御部1bの感度を局発信号で制御し、他の期間は感度制御部1bの感度を低感度にする)。したがって、電荷集積部1cでは時間幅Tiにおけるビート信号を積分したことになり、変調信号による変動成分が除去され、ビート信号の包絡線成分に比例した量の信号電荷が電荷集積部1cに集積されることになる。言い換えれば、電荷集積部1cはビート信号を包絡線検波したことになる。
If the distance to the object 5 does not change with time, the phase of the beat signal is the phase of the light emitted from the light source 2, the phase of the local signal output from the control circuit unit 4, and the photosensitive unit 1a. It is determined by the relationship with the phase of the received light signal output from. That is, if the angular frequency corresponding to the modulation frequency is ω1, and the phase difference between the phase of the light emitted from the light source 2 and the phase of the received light signal is ψ, the signal intensity Y1 of the received light signal is expressed by the following equation. The However, a1 and b1 are constants, a1 corresponds to the amplitude of the received light signal, and b1 corresponds to dark current or external light (time change is ignored).
Y1 = b1 + a1 · cos (ω1 · t + ψ)
If the angular frequency of the local oscillation signal is ω2, the signal intensity Y2 of the local oscillation signal is expressed by the following equation. However, a2 and b2 are constants, a2 corresponds to the amplitude of the local oscillation signal, and b2 corresponds to the DC bias.
Y2 = b2 + a2 · cos (ω2 · t)
Here, since the signal obtained by mixing the received light signal and the local oscillation signal is (Y1 · Y2), a beat signal having an envelope component corresponding to the frequency difference between the modulation frequency and the frequency of the local oscillation signal is obtained. In addition, the phase difference ψ is directly reflected in the phase of the envelope component. That is, the signal charge for obtaining the phase difference ψ may be taken out in synchronization with the cycle of the beat signal. However, since the beat signal includes a fluctuation component of the light amount due to the modulation signal, it is necessary to extract the envelope component of the beat signal in order to extract the signal charge. In the example shown in FIG. 4, a configuration is adopted in which charges generated in the time width Ti shown in FIG. 4 are accumulated in the charge accumulating unit 1c in synchronization with the cycle of the beat signal (that is, a period corresponding to the time width Ti). Controls the sensitivity of the sensitivity control unit 1b with a local signal, and makes the sensitivity control unit 1b low in other periods). Therefore, in the charge accumulation unit 1c, the beat signal in the time width Ti is integrated, the fluctuation component due to the modulation signal is removed, and an amount of signal charge proportional to the envelope component of the beat signal is accumulated in the charge accumulation unit 1c. Will be. In other words, the charge accumulating unit 1c has envelope-detected the beat signal.

たとえば、ビート信号の周期に同期する4点(たとえば、0°、90°、180°、270°のタイミング)で電荷集積部1cに信号電荷を集積させるのであって、各点の信号電荷はそれぞれ時間幅Tiで積分された積分値A0′,A1′,A2′,A3′になる。これらの積分値A0′,A1′,A2′,A3′は図3に示した受光強度A0,A1,A2,A3と同様に扱うことができ、次式によって位相差ψを求めることができる。
ψ=tan−1{(A3′−A1′)/(A0′−A2′)}
図4に示す例では、ビート信号の周期に同期させて求めた4個の積分値を用いて位相差ψを求めるから、変調周波数および局発周波数を周波数誤差が生じないように管理すれば、発光源2から放射した光と同期させることなく局発信号を生成しても位相差ψを求めることができる。
For example, signal charges are accumulated in the charge accumulating unit 1c at four points (for example, timings of 0 °, 90 °, 180 °, and 270 °) synchronized with the cycle of the beat signal. The integrated values A0 ′, A1 ′, A2 ′, and A3 ′ are integrated by the time width Ti. These integrated values A0 ', A1', A2 ', A3' can be handled in the same manner as the received light intensity A0, A1, A2, A3 shown in FIG. 3, and the phase difference ψ can be obtained by the following equation.
ψ = tan −1 {(A3′−A1 ′) / (A0′−A2 ′)}
In the example shown in FIG. 4, since the phase difference ψ is obtained using the four integrated values obtained in synchronization with the cycle of the beat signal, if the modulation frequency and the local frequency are managed so as not to cause a frequency error, Even if the local oscillation signal is generated without being synchronized with the light emitted from the light emitting source 2, the phase difference ψ can be obtained.

上述したように、位相差ψを求めるにあたって、変調周波数に比較すると十分に低周波数であるビート信号を用い、しかもビート信号の積分値A0′,A1′,A2′,A3′を用いるから、暗電流や外光などによるノイズ成分に対してSN比を十分に大きくとることができる。   As described above, when the phase difference ψ is obtained, a beat signal that is sufficiently lower than the modulation frequency is used, and the beat signal integration values A0 ′, A1 ′, A2 ′, and A3 ′ are used. The SN ratio can be made sufficiently large with respect to noise components due to current and external light.

なお、図4に示す例では、ビート信号の1周期内においてビート信号の1/4周期毎に4個の積分値A0′,A1′,A2′,A3′を求めているが、ビート信号に対する位相が規定されていれば、積分値A0′,A1′,A2′,A3′を求めるタイミングは1/4周期毎であることは必須ではなく、またビート信号の1周期内である必要もない。他の構成および動作は図3に示した動作例と同様である。 In the example shown in FIG. 4, four integral values A0 ′, A1 ′, A2 ′, A3 ′ are obtained for each quarter cycle of the beat signal within one cycle of the beat signal. If the phase is defined, the timing for obtaining the integral values A0 ', A1', A2 ', A3' is not essential every quarter cycle, and it is not necessary to be within one cycle of the beat signal. . Other configurations and operations are similar to the operation example shown in FIG.

図4に示した例では、位相差ψを求めるための4個の積分値A0′,A1′,A2′,A3′を異なるタイミングで取り出しているが、ここでは複数個の積分値A0′,A1′,A2′,A3′を同時に取り出すことを可能としている。ここでは、ビート信号において互いに位相が180度異なる(つまり、逆位相)の2個ずつの積分値A0′,A1′,A2′,A3′を同時に求める例を示す。 In the example shown in FIG. 4, four integrated values A0 ′, A1 ′, A2 ′, A3 ′ for obtaining the phase difference ψ are taken out at different timings. Here, a plurality of integrated values A0 ′, A1 ', A2' and A3 'can be taken out simultaneously . Here, an example is shown in which two integral values A0 ′, A1 ′, A2 ′, and A3 ′ having phases different from each other by 180 degrees in the beat signal are obtained simultaneously.

2個ずつの積分値A0′,A1′,A2′,A3′を同時に求めるために、ここでは2個1組の感光部1aにより1画素を形成するとともに、制御回路部4において互いに逆位相である2種類の局発信号を生成し組になる2個の感光部1aに対応した感度制御部1bに互いに逆位相の局発信号を与える。2種類の局発信号は逆位相ではあるが局発周波数は等しく設定される。このように逆位相の局発信号を感度制御部1bに与えることによって、各感度制御部1bの出力として得られるビート信号は互いに逆位相になる。 Integral value of two by two A0 ', A1', A2 ' , A3' in order to obtain at the same time, to form the one pixel by now in a set of two photosensitive portions 1a, have the opposite phase to the control circuit unit 4 Two kinds of local oscillation signals are generated, and local oscillation signals having opposite phases are given to the sensitivity control section 1b corresponding to the two photosensitive sections 1a. Although the two types of local oscillation signals are in opposite phases, the local oscillation frequencies are set equal. In this way, by providing the local control signal having the opposite phase to the sensitivity control unit 1b, the beat signals obtained as the outputs of the sensitivity control units 1b have the opposite phases.

ここでは、図5に示すように、組にした2個の感光部1aにそれぞれ3個ずつの制御電極13を設けているものとする。以下の説明では、1画素の各制御電極13を区別するために、図5に示すように、各制御電極13に(1)〜(6)の数字を付与して区別する。すなわち、組になる2個の感光部1aのうちの一方は制御電極(1)〜(3)を備え、他方は制御電極(4)〜(6)を備える。なお、1画素ずつの感光部1aに対応付けて、それぞれオーバフロードレインを設けるのが望ましい。   Here, as shown in FIG. 5, it is assumed that three control electrodes 13 are provided for each of the two photosensitive portions 1a in the set. In the following description, in order to distinguish each control electrode 13 of one pixel, the numbers (1) to (6) are assigned to each control electrode 13 as shown in FIG. That is, one of the two photosensitive portions 1a in the set includes control electrodes (1) to (3), and the other includes control electrodes (4) to (6). It is desirable to provide an overflow drain in association with each photosensitive portion 1a.

図1を用いて説明したように、感度制御部1bでは受光面に占めるポテンシャル井戸14の面積を変化させるのであって、2個1組で1画素となる感光部1aの制御電極13に逆位相の局発信号を与えることは、隣接する一対の感光部1aに対応してそれぞれ形成するポテンシャル井戸14の面積を大小2段階で交互に切り換えることに相当する。 As described with reference to FIG. 1, in the sensitivity control unit 1b, the area of the potential well 14 occupying the light receiving surface is changed, and the phase is opposite to the control electrode 13 of the photosensitive unit 1a which becomes one pixel by one set. Giving a local oscillation signal corresponds to alternately switching the area of the potential well 14 formed corresponding to each pair of adjacent photosensitive portions 1a in two steps.

つまり、図5(a)のように、制御電極(1)〜(3)に対応するポテンシャル井戸14の面積を大きくするには1画素内の一方の感光部1aに対応した3個の制御電極(1)〜(3)のすべてに同電圧である制御電圧を印加し、この期間には他方の感光部1aに対応した3個の制御電極(4)〜(6)のうちの中央の制御電極(5)にのみ電圧を印加してポテンシャル井戸14の面積を小さくする。言い換えると、制御電極(1)〜(3)に対応する領域は感度制御部1bを高感度に設定した状態であり、制御電極(4)〜(6)に対応する領域では受光による新たな電荷(電子e)はほとんど生成されない。この状態では、位相差ψを求めるために用いる4区間の積分値A0′,A1′,A2′,A3′のうち、積分値A0′または積分値A2′に相当する電荷(電子e)をポテンシャル井戸14に集積することができる。   That is, as shown in FIG. 5A, in order to increase the area of the potential well 14 corresponding to the control electrodes (1) to (3), three control electrodes corresponding to one photosensitive portion 1a in one pixel. The control voltage which is the same voltage is applied to all of (1) to (3), and the central control among the three control electrodes (4) to (6) corresponding to the other photosensitive portion 1a is applied during this period. A voltage is applied only to the electrode (5) to reduce the area of the potential well. In other words, the region corresponding to the control electrodes (1) to (3) is a state in which the sensitivity control unit 1b is set to high sensitivity, and the region corresponding to the control electrodes (4) to (6) has a new charge due to light reception. Almost no (electrons e) are generated. In this state, out of the four interval integral values A0 ′, A1 ′, A2 ′, A3 ′ used for obtaining the phase difference ψ, the charge (electron e) corresponding to the integral value A0 ′ or the integral value A2 ′ is potential. It can be accumulated in the well 14.

また、図5(b)のように、制御電極(4)〜(6)に対応するポテンシャル井戸14の面積を大きくするには1画素内の一方の感光部1aに対応した3個の制御電極(4)〜(6)のすべてに同電圧である制御電圧を印加し、この期間には他方の感光部1aに対応した3個の制御電極(1)〜(3)のうちの中央の制御電極(2)にのみ電圧を印加してポテンシャル井戸14の面積を小さくする。つまり、制御電極(4)〜(6)に対応する領域は感度制御部1bを高感度に設定した状態になり、制御電極(1)〜(3)に対応する領域では受光による新たな電荷はほとんど生成されない。この状態では、位相差ψを求めるために用いる4区間の積分値A0′,A1′,A2′,A3′のうち、積分値A1′または積分値A3′に相当する電荷(電子e)をポテンシャル井戸14に蓄積することができる。   Further, as shown in FIG. 5B, in order to increase the area of the potential well 14 corresponding to the control electrodes (4) to (6), three control electrodes corresponding to one photosensitive portion 1a in one pixel. The control voltage which is the same voltage is applied to all of (4) to (6), and the central control among the three control electrodes (1) to (3) corresponding to the other photosensitive portion 1a is applied during this period. A voltage is applied only to the electrode (2) to reduce the area of the potential well 14. That is, the region corresponding to the control electrodes (4) to (6) is in a state in which the sensitivity control unit 1b is set to high sensitivity, and in the region corresponding to the control electrodes (1) to (3), new charges due to light reception are Almost no generation. In this state, out of the four interval integral values A0 ′, A1 ′, A2 ′, A3 ′ used for obtaining the phase difference ψ, the charge (electron e) corresponding to the integral value A1 ′ or the integral value A3 ′ is potential. It can be accumulated in the well 14.

図5(a)と図5(b)との両状態は、積分値A0′,A1′を求めることができる期間内および積分値A2′,A3′を求めることができる期間内において交互に繰り返される。つまり、図4に示した積分値A0′を求める期間内において図5(a)の状態と図5(b)の状態とを交互に繰り返すことによって、積分値A0′と積分値A1′とに相当する信号電荷が各感光部1aに対応したポテンシャル井戸14に蓄積され、また、図4における積分値A2′を求める期間内において図5(a)の状態と図5(b)の状態とを交互に繰り返すことによって、積分値A2′と積分値A3′とに相当する信号電荷が感光部1aに対応した各ポテンシャル井戸14に蓄積される。   Both the states of FIG. 5A and FIG. 5B are alternately repeated in a period in which the integral values A0 ′ and A1 ′ can be obtained and in a period in which the integral values A2 ′ and A3 ′ can be obtained. It is. That is, by alternately repeating the state of FIG. 5A and the state of FIG. 5B within the period for obtaining the integral value A0 ′ shown in FIG. 4, the integral value A0 ′ and the integral value A1 ′ are obtained. Corresponding signal charges are accumulated in the potential well 14 corresponding to each photosensitive portion 1a, and the state shown in FIG. 5A and the state shown in FIG. 5B are obtained within the period for obtaining the integral value A2 ′ in FIG. By repeating alternately, signal charges corresponding to the integral value A2 'and the integral value A3' are accumulated in each potential well 14 corresponding to the photosensitive portion 1a.

ここでは、図5(a)の状態と図5(b)の状態とのいずれにおいても各3個の制御電極(1)〜(3)または(4)〜(6)に同時に印加する電圧と、1個の制御電極(2)または(5)のみに印加する電圧とは略等しく設定してある。 Here , the voltage applied simultaneously to each of the three control electrodes (1) to (3) or (4) to (6) in both the state of FIG. 5A and the state of FIG. The voltage applied to only one control electrode (2) or (5) is set substantially equal.

上述のようにして図5(a)の状態で積分値A0′に相当する信号電荷が制御電極(1)〜(3)に対応するポテンシャル井戸14に蓄積されるとともに、図5(b)の状態で積分値A1′に相当する信号電荷が制御電極(4)〜(6)に対応するポテンシャル井戸14に蓄積されると、これらの積分値A0′,A1′を外部に一旦取り出す。次に、図5(a)の状態で積分値A2′に相当する信号電荷を制御電極(1)〜(3)に対応するポテンシャル井戸14に蓄積するとともに、図5(b)の状態で積分値A3′に相当する信号電荷を制御電極(4)〜(6)に対応するポテンシャル井戸14に蓄積し、これらの積分値A2′,A3′を外部に取り出す。このような動作を繰り返すことによって、4区間の積分値A0′,A1′,A2′,A3′に相当する信号電荷を2回の読出動作で得ることができ、これらの信号電荷を用いて位相差ψを求めることが可能になる。   As described above, the signal charge corresponding to the integral value A0 ′ in the state of FIG. 5A is accumulated in the potential well 14 corresponding to the control electrodes (1) to (3), and as shown in FIG. When signal charges corresponding to the integration value A1 ′ are accumulated in the potential well 14 corresponding to the control electrodes (4) to (6) in the state, these integration values A0 ′ and A1 ′ are once taken out to the outside. Next, the signal charge corresponding to the integral value A2 ′ in the state of FIG. 5A is accumulated in the potential well 14 corresponding to the control electrodes (1) to (3), and is integrated in the state of FIG. 5B. Signal charges corresponding to the value A3 ′ are accumulated in the potential well 14 corresponding to the control electrodes (4) to (6), and these integrated values A2 ′ and A3 ′ are taken out to the outside. By repeating such an operation, signal charges corresponding to the integration values A0 ′, A1 ′, A2 ′, A3 ′ in the four sections can be obtained by two read operations, and the signal charges are used to change the signal charges. The phase difference ψ can be obtained.

上述した制御では、1画素を形成する2個の感光部1aの一方に対応するポテンシャル井戸14の面積を大きくしている期間において、他方に対応する部位では信号電荷を保持するためにポテンシャル井戸14の面積を小さくしている。要するに、2個の感光部1aの一方は主として電荷を生成する生成期間となり、他方は主として電荷を保持する保持期間となる。ここに、保持期間であって面積が小さいポテンシャル井戸14においても受光による電荷が生成されているから、積分値A0′,A1′に相当する信号電荷を保持している電荷集積部1cには積分値A2′,A3′に相当する信号電荷の一部が混入し、積分値A2′,A3′に相当する信号電荷を保持している電荷集積部1cには積分値A0′,A1′に相当する信号電荷の一部が混入することになる。このように、信号電荷に対して目的外の電荷が混在するから雑音成分が生じるものの、雑音成分は信号電荷の量に比較すると少ない上に信号電荷に対して略一定の割合で混在し、しかも位相差ψを求める際の減算処理((A3′−A1′)と(A0′−A2′))によってほぼ除去されるから、位相差ψを求める際には雑音成分の影響は低減される。他の構成および動作は図4に示した例と同様である。 In the control described above, in the period in which the area of the potential well 14 corresponding to one of the two photosensitive portions 1a forming one pixel is increased, the potential well 14 is used to hold the signal charge in the portion corresponding to the other. The area is reduced. In short, one of the two photosensitive parts 1a is mainly a generation period for generating charges, and the other is a holding period for mainly holding charges. Here, since the charge due to the light reception is generated even in the potential well 14 having a small holding area during the holding period, the charge integrating unit 1c holding the signal charges corresponding to the integrated values A0 'and A1' is integrated. A part of the signal charge corresponding to the values A2 ′ and A3 ′ is mixed, and the charge accumulating unit 1c holding the signal charge corresponding to the integrated values A2 ′ and A3 ′ corresponds to the integrated values A0 ′ and A1 ′. A part of the signal charge is mixed. In this way, noise components are generated because unintended charges are mixed with signal charges, but the noise components are small compared to the amount of signal charges, and are mixed at a substantially constant rate with respect to signal charges. Since the subtraction process ((A3′-A1 ′) and (A0′-A2 ′)) for obtaining the phase difference ψ is almost eliminated, the influence of the noise component is reduced when obtaining the phase difference ψ. Other configurations and operations are the same as those in the example shown in FIG.

図5に示した例では、各3個の制御電極(1)〜(3)または(4)〜(6)に同時に印加する制御電圧と、1個の制御電極(2)または(5)のみに印加する制御電圧とを略等しく設定していたから、ポテンシャル井戸14の面積には変化が生じるものの、大面積のポテンシャル井戸14と小面積のポテンシャル井戸14とのいずれについても深さは略等しくなっている。 In the example shown in FIG. 5, only the control voltage applied simultaneously to each of the three control electrodes (1) to (3) or (4) to (6) and one control electrode (2) or (5). Since the control voltage to be applied to is set to be substantially equal, the area of the potential well 14 changes, but the depths of both the large area potential well 14 and the small area potential well 14 are substantially equal. Yes.

ここでは、図6に示すように、図5に示した例と基本的な構成は同様であるが、各3個の制御電極(1)〜(3)または(4)〜(6)に同時に印加する制御電圧が、1個の制御電極(2)または(5)にのみ印加する制御電圧よりも低くなるように設定し、小面積のポテンシャル井戸14の深さを大面積のポテンシャル井戸14の深さよりも小さく設定した点に特徴がある。たとえば、大面積のポテンシャル井戸14を形成する際に各3個の制御電極(1)〜(3)または(4)〜(6)に同時に印加する電圧を7Vとすれば、小面積のポテンシャル井戸14を形成する際に1個の制御電極(2)または(5)にのみ印加する電圧を3Vなどと設定する。このように、主として電荷(電子e)を生成しているポテンシャル井戸14を電荷を保持するポテンシャル井戸14よりも深くすることにより、制御電圧を印加していない制御電極(1)(3)または(4)(6)に対応する部位で生じた電荷は、深いほうのポテンシャル井戸14に流れ込みやすくなり、結果的に電荷を保持するポテンシャル井戸14に流れ込む雑音成分を図5に示した例よりも低減することができる。他の構成および動作は図5に示した例と同様である。 Here, as shown in FIG. 6, the basic configuration is the same as the example shown in FIG. 5, but each of the three control electrodes (1) to (3) or (4) to (6) is simultaneously applied. The control voltage to be applied is set to be lower than the control voltage to be applied only to one control electrode (2) or (5), and the depth of the small area potential well 14 is set to that of the large area potential well 14. It is characterized in that it is set smaller than the depth. For example, if the voltage applied simultaneously to each of the three control electrodes (1) to (3) or (4) to (6) when forming the large area potential well 14 is 7V, the small area potential well When forming 14, the voltage applied only to one control electrode (2) or (5) is set to 3V or the like. In this way, by making the potential well 14 that mainly generates charges (electrons e) deeper than the potential well 14 that holds charges, the control electrode (1) (3) or (3) or ( 4) The charge generated at the portion corresponding to (6) is likely to flow into the deeper potential well 14, and as a result, the noise component flowing into the potential well 14 holding the charge is reduced as compared with the example shown in FIG. can do. Other configurations and operations are the same as those of the example shown in FIG.

図7に示すように、図6に示した構成に加えて、各感光部1aに対応する各3個の制御電極(1)〜(3)または(4)〜(6)のうちの中央の制御電極(2)または(5)に遮光膜15を重ねてもよい。つまり、感光部1aにおいて遮光膜15に覆われる部位では電荷(電子e)がほとんど生成されないから、電荷を保持するための小面積のポテンシャル井戸14に対応する部位では感光部1aでの電荷がほとんど発生せず、信号電荷の保持中に雑音成分となる電荷が混入する可能性を大幅に低減することができる。さらに、ここでは、電荷を生成している大面積のポテンシャル井戸14に対応する部位では各3個の制御電極(1)〜(3)または(4)〜(6)のうち中央の制御電極(2)または(5)に印加する電圧を両側の制御電極(1)(3)または(4)(6)に印加する電圧よりも高くしてある。制御電極(1)〜(6)に印加する電圧をこのような関係とすることによって、感光部1aのうち制御電極(1)(3)(4)(6)に対応する部位で生成された電荷が制御電極(2)(5)に対応する部位に流れ込んで蓄積されることになる。 As shown in FIG. 7 , in addition to the configuration shown in FIG. 6, the center of the three control electrodes (1) to (3) or (4) to (6) corresponding to each photosensitive portion 1a. The light shielding film 15 may be overlaid on the control electrode (2) or (5) . That is, almost no electric charge (electrons e) is generated in the portion covered with the light shielding film 15 in the photosensitive portion 1a, and therefore, almost no electric charge is generated in the photosensitive portion 1a in the portion corresponding to the small-area potential well 14 for holding the electric charge. The possibility that a charge that becomes a noise component is mixed while the signal charge is not generated can be greatly reduced. Further, here, at the portion corresponding to the large-area potential well 14 generating the charge, the central control electrode (3) of the three control electrodes (1) to (3) or (4) to (6) is provided. The voltage applied to 2) or (5) is set higher than the voltage applied to the control electrodes (1), (3), (4), and (6) on both sides. By making the voltage applied to the control electrodes (1) to (6) in such a relationship, the voltage generated in the portion corresponding to the control electrodes (1), (3), (4), and (6) in the photosensitive portion 1a. The electric charge flows into the portion corresponding to the control electrodes (2) and (5) and is accumulated.

ところで、図6に示した例では、電荷を生成している生成期間において、制御電極(1)〜(3)または(4)〜(6)に対応する部位に形成されるポテンシャル井戸14が一定の深さであるのに対して、図7に示すように、ここでは、電荷を生成している生成期間に形成されるポテンシャル井戸14は、制御電極(1)(3)または(4)(6)に対応する部位が、制御電極(2)または(5)に対応する部位よりも浅い階段状になっている。 By the way, in the example shown in FIG. 6, the potential well 14 formed in the part corresponding to the control electrodes (1) to (3) or (4) to (6) is constant during the generation period in which charges are generated. Here , as shown in FIG. 7, the potential well 14 formed in the generation period in which charges are generated here is the control electrode (1) (3) or (4) ( The part corresponding to 6) has a shallower step than the part corresponding to the control electrode (2) or (5).

したがって、図6に示したでは、電荷を生成する状態(生成期間)と電荷を保持する状態(保持期間)とを数ns以下の短時間で切り換えたとすると、電荷を生成している生成期間において制御電極(1)(3)または(4)(6)に対応する部位で生成された電荷の一部が、電荷を保持する保持期間において制御電極(2)または(5)に対応する部位に移動することなく取り残されるおそれがある。その結果、取り残された電荷は隣りの感光部1aに対応して形成されるポテンシャル井戸14に流れ込み、隣接する電荷集積部1c(ポテンシャル井戸14)の間で信号電荷が混合される可能性がある。つまり、信号電荷に含まれる雑音成分が多くなる。 Therefore, in the example shown in FIG. 6, if the state in which charges are generated (generation period) and the state in which charges are held (holding period) are switched in a short time of several ns or less, the generation period in which charges are generated A portion of the charge generated at the portion corresponding to the control electrode (1), (3), (4), or (6) in FIG. 5 corresponds to the control electrode (2) or (5) in the holding period for holding the charge. There is a risk of being left behind without moving to. As a result, the remaining charge flows into the potential well 14 formed corresponding to the adjacent photosensitive portion 1a, and the signal charge may be mixed between the adjacent charge accumulation portions 1c (potential well 14). . That is, the noise component contained in the signal charge increases.

これに対して、図7に示す例のように階段状のポテンシャル井戸14が形成されるように制御することによって、制御電極(1)(3)または(4)(6)に対応する部位で生成された電荷(電子e)は発生と同時に制御電極(2)または(5)に対応する部位に移動する。すなわち、電荷を生成する生成期間と電荷を保持する保持期間とを数ns以下の短時間で切り換えた場合であっても、隣接する感光部1aに対応して形成される電荷集積部1c(ポテンシャル井戸14)の間で信号電荷が混合される可能性が少なくなる。なお、ポテンシャル井戸14を階段状に形成する技術は遮光膜15の有無にかかわらず採用可能である。他の構成および動作は図5に示した例と同様である。 On the other hand, by controlling so that the stepped potential well 14 is formed as in the example shown in FIG. 7, at the portion corresponding to the control electrode (1) (3) or (4) (6). The generated electric charges (electrons e) move to a portion corresponding to the control electrode (2) or (5) simultaneously with the generation. That is, even when the generation period for generating the charge and the holding period for holding the charge are switched in a short time of several ns or less, the charge accumulation unit 1c (potential that is formed corresponding to the adjacent photosensitive unit 1a. The possibility of mixing signal charges between the wells 14) is reduced. A technique for forming the potential well 14 in a stepped manner can be employed regardless of the presence or absence of the light shielding film 15. Other configurations and operations are the same as those of the example shown in FIG.

図5ないし図7に示した例では、感光部1aごとに3個ずつの制御電極13を対応付けているが、制御電極13を4個以上設けるようにしてもよい。さらに、組にした制御電極13について制御電圧を印加する制御電極13の個数を1個と3個との2段階に切り換えるようにしているが、3段階以上に切り換えることも可能である。また、互いに逆位相である局発信号を異なる感光部1aの感度制御部1bに与える構成を採用しているが、たとえば90度ずつ位相の異なる局発信号を互いに異なる4個の感光部1aに与える構成とすれば、4区間の積分値A0′,A1′,A2′,A3′を同時に求めることも可能である。 In the example shown in FIGS. 5 to 7, three control electrodes 13 are associated with each photosensitive portion 1a. However, four or more control electrodes 13 may be provided. Furthermore, although the number of control electrodes 13 to which the control voltage is applied is switched to two stages of one and three for the control electrodes 13 in a group, it is possible to switch to three or more stages. Further, a configuration is adopted in which local signals having opposite phases to each other are provided to the sensitivity control unit 1b of the different photosensitive units 1a. For example, local signals having different phases by 90 degrees are applied to four different photosensitive units 1a. If given, the integrated values A0 ′, A1 ′, A2 ′, A3 ′ of four sections can be obtained simultaneously.

ところで、図5ないし図7に示した例は、図4に示した例と同様に局発信号を感度制御部1bに与える構成を採用しているが、組になる複数個の感光部1aに対して変調信号に同期した異なる位相に対応する信号電荷を与える構成を採用してもよい。たとえば、4個の感光部1aを組にしている場合に、各感光部1aに対応した電荷集積部1cには、変調信号の周期に同期して異なる位相の受光強度A0,A1,A2,A3に相当する信号電荷が集積される。要するに、複数個の感光部1aに対応する電荷集積部1cに各位相の信号電荷を振り分けて集積する。このようにして複数個の電荷集積部1cに集積した複数個の信号電荷を電荷取出部1dにおいて一括して取り出すようにすれば、図1ないし図3に示した例と同様に、受光強度A0,A1,A2,A3に相当する信号電荷に基づいて位相差ψを求めることができる。 Incidentally, the example shown in FIGS. 5 to 7 adopts the configuration in which the local oscillation signal is given to the sensitivity control unit 1b as in the example shown in FIG. On the other hand, a configuration in which signal charges corresponding to different phases synchronized with the modulation signal may be adopted. For example, when four photosensitive portions 1a are grouped, the charge accumulating portion 1c corresponding to each photosensitive portion 1a has received light intensity A0, A1, A2, A3 having different phases in synchronization with the period of the modulation signal. The signal charge corresponding to is integrated. In short, the signal charges of each phase are distributed and accumulated in the charge accumulating unit 1c corresponding to the plurality of photosensitive units 1a. If the plurality of signal charges accumulated in the plurality of charge accumulating sections 1c in this way are taken out collectively by the charge extracting section 1d, the received light intensity A0 is similar to the example shown in FIGS. , A1, A2, and A3, the phase difference ψ can be obtained based on the signal charges.

上述した各構成例において用いたイメージセンサ7は、2次元配列であることを想定しているが、1次元配列であってもよく、また図1ないし図4に示した例では感光部1aを1個だけ設ける構成としてもよい。また、評価部3として位相差ψを求めるとともに距離を求める例を説明したが、評価部3は必ずしも距離を求めるものに限らず、位相差ψのみを求める構成や積分値A0′,A1′,A2′,A3′に基づいて空間に関する他の情報を評価するものであってもよい。 The image sensor 7 used in each of the configuration examples described above is assumed to be a two-dimensional array. However, the image sensor 7 may be a one-dimensional array . In the example shown in FIGS. Only one may be provided. Moreover, although the example which calculates | requires phase difference (psi) and calculates | requires distance was demonstrated as the evaluation part 3, the evaluation part 3 is not necessarily what calculates | requires distance, The structure which calculates | requires only phase difference (psi), integral value A0 ', A1', Other information about the space may be evaluated based on A2 ′ and A3 ′.

述した構成例では電荷集積部1cの面積を変化させるために複数個の制御電極13を設けるとともに、制御電極13への制御電圧の印加パターンを変化させる構成を採用しているが、感光部1aにおける半導体層11の不純物濃度について受光面に沿って制御電極13からの距離に応じた分布を付与し、制御電極13に印加する電圧を制御することによっても電荷集積部1cの面積を変化させることが可能である。 It provided with a plurality of control electrodes 13 to vary the area of the charge accumulation portion 1c in the configuration example described above above, but employs a configuration for changing the application pattern of the control voltage to the control electrode 13, photosensitive section The distribution of the impurity concentration of the semiconductor layer 11 in 1a is given according to the distance from the control electrode 13 along the light receiving surface, and the voltage applied to the control electrode 13 is also controlled to change the area of the charge accumulation portion 1c. It is possible.

受光素子の原理説明図である。It is principle explanatory drawing of a light receiving element . 空間情報の検出装置の構成例を示すブロック図である。It is a block diagram which shows the structural example of the detection apparatus of spatial information . 空間情報の検出装置の一動作例を示す原理説明図である。It is principle explanatory drawing which shows one operation example of the detection apparatus of spatial information . 空間情報の検出装置の他動作例を示すの原理説明図である。It is principle explanatory drawing which shows the other operation example of the detection apparatus of spatial information . 受光素子の一動作例を示す動作説明図である。It is operation | movement explanatory drawing which shows one operation example of a light receiving element . 受光素子の他動作例を示す動作説明図である。It is operation | movement explanatory drawing which shows the other operation example of a light receiving element . 受光素子の別動作例を示す動作説明図である。It is operation | movement explanatory drawing which shows another example of operation | movement of a light receiving element .

符号の説明Explanation of symbols

1 受光素子
1a 感光部
1b 感度制御部
1c 電荷集積部
1d 電荷取出部
2 発光源
3 評価部
4 制御回路部
11 半導体層
12 絶縁膜
13 制御電極
14 ポテンシャル井戸
DESCRIPTION OF SYMBOLS 1 Light receiving element 1a Photosensitive part 1b Sensitivity control part 1c Charge integration part 1d Charge extraction part 2 Light emission source 3 Evaluation part 4 Control circuit part 11 Semiconductor layer 12 Insulating film 13 Control electrode 14 Potential well

Claims (2)

受光強度に対応する量の電荷を発生する感光部と、感光部に設けた制御電極への制御電圧の印加により感光部に形成され感光部で発生した電荷の少なくとも一部を集積する電荷集積部と、電荷集積部に集積した電荷を受光出力として外部に取り出す電荷取出部とを備える受光素子において受光感度を制御する方法であって、感光部における半導体層の不純物濃度について、受光面に沿って制御電極からの距離に応じた分布を付与し、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧の大きさを変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えることを特徴とする受光素子の感度制御方法。 A photosensitive portion that generates an amount of charge corresponding to the received light intensity, and a charge accumulation portion that accumulates at least a portion of the charges generated in the photosensitive portion by applying a control voltage to a control electrode provided in the photosensitive portion. And a charge extraction unit that takes out the charge accumulated in the charge accumulation unit as a light reception output, and controls the light reception sensitivity with respect to the impurity concentration of the semiconductor layer in the photosensitive unit along the light receiving surface. Charge distribution is given by giving a distribution according to the distance from the control electrode, and changing the control voltage magnitude to the control electrode so that the area of the charge accumulation part in the plane along the light receiving surface of the photosensitive part changes. Switching the area of the charge accumulation section between a generation period for increasing the area of the charge section and a holding period for holding charges generated in the generation period by reducing the area of the charge accumulation section Sensitivity control method of the light-receiving element characterized. 所定の変調周波数の変調信号で強度変調された光が照射されている空間からの光を受光し受光強度に対応する量の電荷を発生する感光部と、感光部に設けた制御電極への制御電圧の印加により感光部に形成され感光部で発生した電荷の少なくとも一部を集積する電荷集積部と、電荷集積部に集積した電荷を受光出力として外部に取り出す電荷取出部と、感光部の受光面に沿った面内での電荷集積部の面積が時間経過に伴って変化するように時間経過に伴って大きさが変化する制御電圧を出力する制御回路部と、電荷取出部により取り出した電荷を用いて前記空間に関する情報を評価する評価部とを備え、感光部における半導体層の不純物濃度について、受光面に沿って制御電極からの距離に応じた分布を付与し、制御回路部は、感光部の受光面に沿った面内での電荷集積部の面積が変化するように制御電極への制御電圧の大きさを変化させ、電荷集積部の面積を大きくする生成期間と、電荷集積部の面積を小さくすることにより生成期間において生成された電荷を保持する保持期間との間で、電荷集積部の面積の大きさを切り換えることを特徴とする強度変調光を用いた空間情報の検出装置。 Control of the photosensitive part that receives the light from the space irradiated with the light whose intensity is modulated by the modulation signal of the predetermined modulation frequency and generates an amount of charge corresponding to the received light intensity, and the control electrode provided in the photosensitive part A charge accumulating unit that accumulates at least a part of charges generated in the photosensitive unit by applying a voltage, a charge extraction unit that extracts the charges accumulated in the charge accumulating unit as a light receiving output, and a light receiving unit that receives the light. A control circuit unit that outputs a control voltage whose magnitude changes with time so that the area of the charge accumulation unit in the plane along the surface changes with time, and the charge that has been taken out by the charge extraction unit And an evaluation unit that evaluates information about the space using the sensor, the semiconductor layer in the photosensitive unit is provided with a distribution according to the distance from the control electrode along the light receiving surface, and the control circuit unit is a photosensitive unit Light reception Changing the magnitude of the control voltage to the control electrode so that the area of the charge accumulation portion varies in accordance with a plane, the smaller the generation period to increase the area of the charge accumulation section, the area of the charge accumulation portion detection equipment between, the spatial information with intensity modulated light, characterized in that for switching the magnitude of the area of the charge accumulation portion of the holding period for holding the generated electric charges in the generation period by.
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