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JP4421597B2 - Substrate transfer device - Google Patents
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JP4421597B2 - Substrate transfer device - Google Patents

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JP4421597B2
JP4421597B2 JP2006311846A JP2006311846A JP4421597B2 JP 4421597 B2 JP4421597 B2 JP 4421597B2 JP 2006311846 A JP2006311846 A JP 2006311846A JP 2006311846 A JP2006311846 A JP 2006311846A JP 4421597 B2 JP4421597 B2 JP 4421597B2
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soft
transfer
ray
roller
substrate
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JP2008130677A (en
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仁 稲葉
正春 藤野
修平 土本
泰彦 福地
一義 中島
正人 古知
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Future Vision Inc
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Description

本発明は、基板搬送装置に係り、特に液晶表示パネルを構成する絶縁基板のコロ搬送に伴う帯電を軟X線の照射で除去する機能を備えた基板搬送装置に関する。   The present invention relates to a substrate transport device, and more particularly to a substrate transport device having a function of removing the charge associated with roller transport of an insulating substrate constituting a liquid crystal display panel by soft X-ray irradiation.

ディスプレイデバイスとして代表的な液晶表示装置は、液晶表示パネルと駆動回路およびバックライト等の周辺装置を組み合わせて構成される。液晶表示パネルは、通常、一方の絶縁基板(アクティブ・マトリクス基板あるいは薄膜トランジスタ基板)と、他方の絶縁基板(対向基板あるいはカラーフィルタ基板)との間に液晶を封入して構成される。絶縁基板としては、ガラス基板以外に水晶板や樹脂板も含むが、以下では、一般的に広く用いられているガラス基板を例として説明する。


A typical liquid crystal display device as a display device is configured by combining a liquid crystal display panel and peripheral devices such as a drive circuit and a backlight. The liquid crystal display panel is usually configured by sealing liquid crystal between one insulating substrate (active matrix substrate or thin film transistor substrate) and the other insulating substrate (counter substrate or color filter substrate). The insulating substrate includes a crystal plate and a resin plate in addition to the glass substrate , but a glass substrate that is generally widely used will be described below as an example.


このようなガラス基板は、搬入から洗浄工程を経て薄膜トランジスタ形成工程、あるいはカラーフィルタ形成工程等、複数の処理ステーション間を、所謂コロ搬送装置とも呼ばれる基板搬送装置で移送され、処理ステーションや搬送カセットとの間で移載される。コロ搬送装置は、複数のローラ(即ちコロ)を面内に配置したコンベヤーであり、ガラス基板はこのコロの上に載置され、コロの駆動で所定の速度で所定の方向に搬送される。   Such a glass substrate is transferred between a plurality of processing stations, such as a thin film transistor forming process or a color filter forming process, from a carry-in through a cleaning process, by a substrate transport apparatus called a so-called roller transport apparatus. Will be transferred between. The roller transport device is a conveyor in which a plurality of rollers (that is, rollers) are arranged in a plane, and the glass substrate is placed on the roller and transported in a predetermined direction at a predetermined speed by driving the roller.

このようなコロ搬送では、コロとガラス基板とが摩擦、接触剥離を繰り返すことで、コロとガラス基板が帯電する。この帯電はガラス基板に作り込まれる配線や回路素子を破壊する放電の原因となったり、静電気力により周囲の塵埃が吸着されて種々の障害を発生させたりする。特に、ガラス基板の搬送終端部又は搬送途中で当該ガラス基板をカセットあるいは処理ステーションなどに移載するために、ガラス基板をコロとの接触から上方に離脱する(リフトアップする)際に大きな帯電がコロとガラス基板に生じ、これが放電を起こす原因になることが多い。このような帯電を除去するため、従来からガラス基板の下面から軟X線を照射することが行われている。   In such roller conveyance, the roller and the glass substrate are charged by repeating friction and contact peeling between the roller and the glass substrate. This charging may cause a discharge that destroys the wiring and circuit elements built in the glass substrate, or may cause various obstacles due to the adsorbing of surrounding dust by electrostatic force. In particular, in order to transfer the glass substrate to a cassette or a processing station or the like during transfer of the glass substrate to the cassette or a processing station during transfer, a large charge is generated when the glass substrate is lifted up (lifted up) from contact with the roller. This often occurs on the roller and the glass substrate, and this often causes discharge. In order to remove such charge, conventionally, soft X-rays have been irradiated from the lower surface of a glass substrate.

図7は、軟X線照射装置を備えた従来の基板搬送装置の説明図である。この基板搬送装置SXUは、シャフトSFTに支持されて回転する複数のコロRLRを所定方向に通常は水平面内に配置して構成される。このコロRLRの上にガラス基板SUBを載置し、搬送する。ガラス基板SUBの下面はコロRLRに対して次々に接触と剥離を繰り返しながら矢印A方向に移動する。これによって、コロRLRとガラス基板SUBに静電気が帯電し、蓄積する。   FIG. 7 is an explanatory view of a conventional substrate transfer apparatus provided with a soft X-ray irradiation apparatus. The substrate transfer device SXU is configured by arranging a plurality of rollers RLR supported by a shaft SFT and rotating in a predetermined direction, usually in a horizontal plane. The glass substrate SUB is placed on the roller RLR and conveyed. The lower surface of the glass substrate SUB moves in the direction of arrow A while repeatedly contacting and peeling against the roller RLR. As a result, static electricity is charged and accumulated in the roller RLR and the glass substrate SUB.

図7はガラス基板SUBをリフトアップし、次工程へ受け渡すための移載を行う搬送終端部を示す。この搬送終端部又は搬送途中には軟X線照射装置SXUがガラス基板SUBの下面を上方に望む位置に設置されている。軟X線照射装置SXUはガラス基板SUBの下面に軟X線を照射して、コロRLRとの接触と剥離で帯電した電荷を除去する。この種の除電装置を開示したものとしては、特許文献1、特許文献2を挙げることができる。なお、軟X線は、波長が数Å〜数百ÅのX線である(岩波書店 理化学辞典)。
特開2004−299814号公報 特許第2749202号公報
FIG. 7 shows a transfer end portion that lifts up the glass substrate SUB and performs transfer for delivery to the next process. A soft X-ray irradiator SXU is installed at a position where the lower surface of the glass substrate SUB is desired upward in the conveyance end portion or in the middle of the conveyance. The soft X-ray irradiator SXU irradiates the lower surface of the glass substrate SUB with soft X-rays, and removes electric charges charged by contact with the roller RLR and peeling. Patent Documents 1 and 2 can be cited as examples of disclosing this type of static eliminator. Soft X-rays are X-rays having a wavelength of several to hundreds of millimeters (Iwanami Shoten RIKEN Dictionary).
JP 2004-299814 A Japanese Patent No. 2749202

軟X線の照射による除電性能は被除電物との距離に比例して低下するため、軟X線照射装置SXUは搬送終端部又は搬送途中でコロRLRに接近した位置に設置されることになる。ガラス基板の下面に配置されるコロRLRはテフロン(テフロンは登録商標)樹脂やポリエチレン樹脂等の有機系素材で形成されているため、軟X線の照射で劣化する。   Since the static elimination performance due to the soft X-ray irradiation decreases in proportion to the distance to the object to be neutralized, the soft X-ray irradiation device SXU is installed at the conveyance end portion or at a position close to the roller RLR during the conveyance. . The roller RLR disposed on the lower surface of the glass substrate is made of an organic material such as Teflon (registered trademark) resin or polyethylene resin, and therefore deteriorates by irradiation with soft X-rays.

この種の基板搬送装置の周囲には充分なスペースが確保できないのが通常で、またガラス基板との距離が遠くなると軟X線の除電効果が低下することから、軟X線照射装置SXUを基板搬送装置の直近に配置せざるを得ない。そのため、上記したように、軟X線照射装置SXUから出射した軟X線がコロRLRを直射することになる。劣化したコロはパーティクルを発生するので頻繁に取り替える必要があり、この取替え作業に伴う処理の中断はスループットの低下となって、製品コストの引き下げの障害の1つとなっている。   Usually, a sufficient space cannot be secured around this type of substrate transfer apparatus, and the soft X-ray irradiation apparatus SXU is mounted on the substrate because the effect of removing static electricity from the soft X-rays decreases as the distance from the glass substrate increases. It must be placed in the immediate vicinity of the transport device. Therefore, as described above, the soft X-rays emitted from the soft X-ray irradiation device SXU directly hit the roller RLR. Deteriorated rollers generate particles and need to be replaced frequently. Discontinuation of processing associated with this replacement operation reduces throughput and is one of the obstacles to lowering product costs.

本発明の目的は、コロの直近に配置した軟X線照射装置からの軟X線の照射による当該コロの劣化を抑制した基板搬送装置を提供することにある。   An object of the present invention is to provide a substrate transfer device that suppresses deterioration of a roller due to soft X-ray irradiation from a soft X-ray irradiation device disposed in the immediate vicinity of the roller.

上記目的を達成する本発明の第1手段は、軟X線照射装置とこの軟X線照射装置の近傍に配置されたコロの間に遮蔽板を設け、強度の大きい軟X線がコロを直射するのを抑制したことを特徴とする。遮蔽板としては板厚が0.3mm程度のSUS板が望ましい。また、本発明の第2手段は、軟X線照射装置とこの軟X線照射装置に配置されたコロの間に、直近のコロの配置部分を照射する軟X線が透過する部位は減衰率が高く、軟X線照射装置から遠いコロの部分を照射する軟X線が透過する部位は減衰率が小さくなるX線減衰板を設けたことを特徴とする。   The first means of the present invention for achieving the above object is to provide a shielding plate between the soft X-ray irradiation device and a roller disposed in the vicinity of the soft X-ray irradiation device, and the soft X-ray having high strength directly hits the roller. It is characterized by having suppressed. As the shielding plate, a SUS plate having a thickness of about 0.3 mm is desirable. Further, the second means of the present invention is such that the portion through which soft X-rays that irradiate the arrangement portion of the nearest roller pass between the soft X-ray irradiation device and the roller arranged in the soft X-ray irradiation device is an attenuation factor. The X-ray attenuating plate having a small attenuation factor is provided in a portion through which soft X-rays that irradiate a portion of a roller far from the soft X-ray irradiation apparatus are transmitted.

第1手段により、強度の大きい軟X線が直撃するコロの劣化が抑制される。第1手段を構成する遮蔽板により静電容量が大きくなり、遮蔽板を有しない場合に較べて、帯電電荷による電位が下がって、放電の防止効果も期待できる。さらに、この遮蔽板を接地することで、ガラス基板との間に強い電界が形成され、軟X線で生成されるイオンの濃度が高くなって、除電効果が向上する。   By the 1st means, deterioration of the roller which a soft X ray with high intensity hits directly is controlled. The electrostatic capacity is increased by the shielding plate constituting the first means, and the potential due to the charged electric charge is lowered as compared with the case where the shielding plate is not provided, and a discharge preventing effect can be expected. Further, by grounding the shielding plate, a strong electric field is formed between the glass substrate and the concentration of ions generated by the soft X-rays is increased, so that the charge removal effect is improved.

第2手段により、強度の大きい軟X線が直射する部位の劣化が抑制されると共に、軟X線減衰部材の減衰率を適切に選定することで、軟X線照射装置に対して近い部位と遠い部位とを照射する軟X線の強度差を小さくでき、ガラス基板の除電効果を均一にすることができる。   The second means suppresses the deterioration of the portion where the high-intensity soft X-rays are directly irradiated, and by appropriately selecting the attenuation rate of the soft X-ray attenuation member, The difference in the intensity of soft X-rays that irradiate a far site can be reduced, and the static elimination effect of the glass substrate can be made uniform.

以下、本発明の実施の形態を、実施例の図面を参照して詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings of the examples.

図1は、本発明による基板搬送装置の実施例1を説明する模式図で、図1(a)は矢印Aに沿った側断面図、図1(b)は図1(a)の矢印B方向から見た要部図である。基板搬送装置は、シャフトSFTに支持されて回転するコロRLRを複数有する。通常、コロRLRは水平面の面内に配列されている。ガラス基板SUBはこのコロRLRの上に載置されて矢印A方向に搬送される。   1A and 1B are schematic diagrams for explaining a first embodiment of a substrate transfer apparatus according to the present invention. FIG. 1A is a side sectional view taken along an arrow A, and FIG. 1B is an arrow B in FIG. It is the principal part figure seen from the direction. The substrate transport apparatus includes a plurality of rollers RLR that are supported by the shaft SFT and rotate. Usually, the rollers RLR are arranged in a horizontal plane. The glass substrate SUB is placed on the roller RLR and conveyed in the direction of arrow A.

この基板搬送装置の搬送終端部又は搬送途中に、ガラス基板SUBの下面(コロRLRと接触する面)に軟X線を照射して、コロRLRとの接触と剥離で帯電した電荷を除去するための軟X線照射装置SXUを備えている。そして、搬送終端部又は搬送途中の軟X線照射装置SXUの近傍に配置されたコロRLRに、軟X線照射装置SXUから出射する軟X線SXの直射を遮蔽する遮蔽板SHPを設けた。軟X線照射装置SXUは、搬送終端部又は搬送途中の基板搬送方向の両端部かつ搬送終端部又は搬送途中に配置されたコロRLRを斜め上方に臨む位置に設置される。遮蔽板SHPは、SUSを好適とする板厚が0.3mm程度の金属板で構成される。   In order to remove charges charged by contact with and peeling from the roller RLR by irradiating the lower surface (the surface in contact with the roller RLR) of the glass substrate SUB with a soft X-ray during the transfer terminal portion of the substrate transfer device or during the transfer. Soft X-ray irradiation device SXU. And the shielding board SHP which shields the direct irradiation of the soft X-ray SX radiate | emitted from the soft X-ray irradiation apparatus SXU was provided in the roller RLR arrange | positioned in the vicinity of the conveyance terminal part or the soft X-ray irradiation apparatus SXU in the middle of conveyance. The soft X-ray irradiation apparatus SXU is installed at a position where the roller RLR disposed at both ends of the transfer end portion or in the substrate transfer direction during transfer and at the transfer end portion or during transfer faces obliquely upward. The shielding plate SHP is formed of a metal plate having a thickness of about 0.3 mm, which is preferably SUS.

遮蔽板SHPを設けることにより、強度の大きい軟X線SXが直撃するコロRLRの劣化が抑制される。この遮蔽板SHPを設けることによりガラス基板SUBとの間の静電容量が大きくなり、遮蔽板を有しない場合に較べて、帯電電荷による電位が下がって、放電の防止効果が期待できる。さらに、この遮蔽板SHPを接地することで、ガラス基板SUBとの間に強い電界が形成され、イオン濃度が高くなって、除電効果が向上する。   By providing the shielding plate SHP, deterioration of the roller RLR directly hit by the high-intensity soft X-ray SX is suppressed. By providing this shielding plate SHP, the capacitance between the glass substrate SUB is increased, and the potential due to the charged charge is lowered compared with the case where the shielding plate is not provided, and an effect of preventing discharge can be expected. Furthermore, by grounding the shielding plate SHP, a strong electric field is formed between the glass substrate SUB, the ion concentration is increased, and the neutralization effect is improved.

図2は、本発明の実施例1をさらに説明する図で、図2(a)は側面図、図2(b)は図2(a)の上面図である。図2において、図1と同一機能部分には同一符号を付してある。ガラス基板SUBは基板搬送装置のコロRLRに載置されて矢印方向に搬送される。図2では、右側に示した位置で搬送動作が停止され、ガラス基板SUBは図示しない移載ロボットのアームでコロRLRからリフトアップされ、カセットに収納される。   2A and 2B are diagrams for further explaining the first embodiment of the present invention, in which FIG. 2A is a side view and FIG. 2B is a top view of FIG. In FIG. 2, the same functional parts as those in FIG. The glass substrate SUB is placed on the roller RLR of the substrate transfer device and transferred in the direction of the arrow. In FIG. 2, the transfer operation is stopped at the position shown on the right side, and the glass substrate SUB is lifted up from the roller RLR by the arm of the transfer robot (not shown) and stored in the cassette.

基板搬送装置の搬送終端部の両端側近傍で、ガラス基板SUBを載置したコロRLRを上方に見上げて臨む位置に軟X線照射装置SXUが設置されている。そして、これらの軟X線照射装置SXUの軟X線SXが強く照射されるコロRLRには、当該コロRLRを軟X線SXから遮蔽する遮蔽板SHPが取り付けられている。図2では、基板搬送装置の搬送終端部から2列のコロRLRにそれぞれ遮蔽板SHPが取り付けられているが、これに限るものではなく、ガラス基板SUBのサイズ、除電のための軟X線SXの照射方向、その強度に応じて遮蔽板SHPを取り付けるコロRLRを決めればよい。   A soft X-ray irradiator SXU is installed at a position facing the roller RLR on which the glass substrate SUB is placed in the vicinity of both ends of the transfer terminal portion of the substrate transfer apparatus. Further, a shielding plate SHP that shields the roller RLR from the soft X-ray SX is attached to the roller RLR to which the soft X-ray SX of the soft X-ray irradiation device SXU is strongly irradiated. In FIG. 2, the shielding plates SHP are respectively attached to the two rows of rollers RLR from the transfer terminal end of the substrate transfer apparatus. However, the present invention is not limited to this, and the size of the glass substrate SUB and soft X-rays SX for static elimination are used. The roller RLR to which the shielding plate SHP is attached may be determined in accordance with the irradiation direction and the intensity thereof.

図3は、軟X線SXの照射領域に照射距離とイオン濃度の関係を測定した結果の一例を説明する図である。なお、横軸の照射距離(cm)は軟X線照射装置SXUの軟X線SX出射部から等距離の球面までの距離で、縦軸のイオン濃度(ions・cm-3)ある。軟X線は距離減衰性が大きく、例えば30cmの場合と80cmの場合では照射部位の軟X線強度は一桁小さくなる。そして、図3に示されたように、軟X線の強度は距離にほぼ逆比例の関係にある。したがって、前記のように、軟X線照射装置SXUをガラス基板SUBの下面にできるだけ接近させて配置する必要がある。このことは、軟X線照射装置SXUに近く、軟X線に直撃されるコロの劣化が他のコロに比べて極端に大きいことを意味する。 FIG. 3 is a diagram for explaining an example of the result of measuring the relationship between the irradiation distance and the ion concentration in the irradiation region of the soft X-ray SX. The irradiation distance (cm) on the horizontal axis is the distance from the soft X-ray SX emission part of the soft X-ray irradiation apparatus SXU to the equidistant spherical surface, and is the ion concentration (ions · cm −3 ) on the vertical axis. Soft X-rays have a large distance attenuation. For example, in the case of 30 cm and 80 cm, the soft X-ray intensity at the irradiation site is reduced by an order of magnitude. And as FIG. 3 showed, the intensity | strength of a soft X-ray has the relationship of a substantially inverse proportion to distance. Therefore, as described above, it is necessary to arrange the soft X-ray irradiation apparatus SXU as close as possible to the lower surface of the glass substrate SUB. This means that the deterioration of the roller that is close to the soft X-ray irradiation device SXU and is directly hit by the soft X-ray is extremely large compared to other rollers.

しかし、本発明の実施例1によれば、軟X線に直射されるコロは遮蔽板SHPで保護されて劣化の進行が阻止される。また、軟X線SXの照射で生成したイオンは遮蔽板SHPの内側にも回り込むので、ガラス基板SUBの帯電電荷は充分に除去される。   However, according to the first embodiment of the present invention, the roller directly irradiated with soft X-rays is protected by the shielding plate SHP, and the progress of deterioration is prevented. Further, since the ions generated by the irradiation with the soft X-ray SX wrap around the inside of the shielding plate SHP, the charged charges on the glass substrate SUB are sufficiently removed.

図4は、本発明による基板搬送装置の実施例2を説明する模式図で、図1(a)と同様の側断面図である。実施例2の基板搬送装置も実施例1と同様に、搬送方向に配置された複数のコロRLRを有し、液晶表示パネルを構成するためのガラス基板SUBの下面をコロRLRの上に載置して搬送すると共に、搬送終端部又は搬送途中でガラス基板SUBをリフトアップし、次工程へ受け渡すための移載を行う。   FIG. 4 is a schematic diagram for explaining Example 2 of the substrate transfer apparatus according to the present invention, and is a side sectional view similar to FIG. Similarly to the first embodiment, the substrate transport apparatus according to the second embodiment has a plurality of rollers RLR arranged in the transport direction, and the lower surface of the glass substrate SUB for configuring the liquid crystal display panel is placed on the rollers RLR. In addition, the glass substrate SUB is lifted up during transfer or at the middle of transfer, and transferred for delivery to the next process.

搬送終端部又は搬送途中に、ガラス基板SUBの下面に軟X線を照射して、コロRLRとの接触と剥離で帯電した電荷を除去するための軟X線照射装置SXUを備える。そして、搬送終端部又は搬送途中の軟X線照射装置SXUの近傍には、直近のコロを照射する軟X線の透過部位の減衰率が大で、軟X線照射装置SXUとの距離が遠くなるコロを照射する軟X線の透過部位の減衰率が順次小さくなる軟X線減衰部材ATNを設けた。   A soft X-ray irradiation device SXU is provided for irradiating the lower surface of the glass substrate SUB with soft X-rays at the end of transfer or in the middle of transfer to remove charges charged by contact with and peeling from the roller RLR. In addition, the attenuation rate of the transmission part of the soft X-ray that irradiates the nearest roller is large in the vicinity of the transfer end part or the soft X-ray irradiation apparatus SXU in the middle of the transfer, and the distance from the soft X-ray irradiation apparatus SXU is long. A soft X-ray attenuating member ATN is provided in which the attenuation rate of the soft X-ray transmission site that irradiates the roller becomes gradually smaller.

搬送終端部又は搬送途中の矢印Aで示した基板搬送方向の両端部かつ搬送終端部又は搬送途中に配置されたコロRLRを斜め上方に見て臨む位置に軟X線照射装置SXUが設置されている。軟X線減衰部材ATNは、開口率が段階的に変化する金属メッシュ、厚みが漸次変化する金属板、厚みが漸次変化する樹脂板、あるいはスリット幅が漸次変化する金属蒸着膜付き樹脂板を用いる。金属メッシュ、厚みが漸次変化する金属板、あるいはスリット幅が漸次変化する金属蒸着膜付き樹脂板を用いた場合には、これを接地するのが望ましい。   The soft X-ray irradiator SXU is installed at both ends of the substrate transfer direction indicated by the arrow A during transfer or at the transfer end, and at a position facing the roller RLR arranged at the transfer end or in the transfer diagonally upward. Yes. The soft X-ray attenuation member ATN uses a metal mesh whose aperture ratio changes stepwise, a metal plate whose thickness changes gradually, a resin plate whose thickness changes gradually, or a resin plate with a metal vapor deposition film whose slit width changes gradually . When using a metal mesh, a metal plate whose thickness gradually changes, or a resin plate with a metal vapor deposition film whose slit width gradually changes, it is desirable to ground this.

図5は、本発明の実施例2で設定する軟X線減衰部材ATNの減衰特性の説明図である。矢印Eは搬送終端部を示し、実線aは搬送終端部Eでの減衰量が大きくて軟X線照射装置SXUからの距離が遠くなるにしたがって減衰量が急激に小さくなる特性、点線bは搬送終端部Eでの減衰量がそれほど大きくなく軟X線照射装置SXUからの距離が遠くなるにしたがって減衰量が徐々に小さくなる特性である。   FIG. 5 is an explanatory diagram of the attenuation characteristics of the soft X-ray attenuation member ATN set in the second embodiment of the present invention. An arrow E indicates a conveyance end portion, a solid line a indicates a characteristic in which the attenuation amount at the conveyance end portion E is large and the attenuation amount decreases rapidly as the distance from the soft X-ray irradiation apparatus SXU increases, and a dotted line b indicates conveyance. The attenuation at the end E is not so large, and the attenuation gradually decreases as the distance from the soft X-ray irradiation apparatus SXU increases.

図6は、ガラス基板SUBの下面における軟X線強度分布が、軟X線減衰部材ATNの有無によってどのように異なるかを説明した図である。図6の破線c’は軟X線減衰部材を設置しない場合のガラス基板下面の軟X線強度分布を示す。これに対し図6の実線a’は、図5の実線aの特性を有する軟X線減衰部材を設置した場合のガラス基板下面の軟X線強度分布を示し、分布は場所的にほぼ一様である。このように、軟X線減衰部材の各部位の減衰率を適切に選定することにより、軟X線照射装置からの距離の長短による照射強度差を小さくすることができ、ガラス基板下面の広い領域で一様な除電効果を得ることが出来る。また、図6の点線b’は、図5の点線bの特性を有する軟X線減衰部材を設置した場合のガラス基板下面の軟X線強度分布を示し、分布は搬送終端部Eで強度が若干高くはなるが、図6の破線c’に示す軟X線減衰部材を設置しない場合に比べれば低い強度になる。したがって、図5のいずれの特性の軟X線減衰部材を採用しても、コロの劣化低減に軟X線減衰部材の設置が有効であることがわかる。   FIG. 6 is a diagram illustrating how the soft X-ray intensity distribution on the lower surface of the glass substrate SUB varies depending on the presence / absence of the soft X-ray attenuation member ATN. A broken line c 'in FIG. 6 shows a soft X-ray intensity distribution on the lower surface of the glass substrate when the soft X-ray attenuation member is not installed. On the other hand, the solid line a ′ in FIG. 6 shows the soft X-ray intensity distribution on the lower surface of the glass substrate when the soft X-ray attenuation member having the characteristics of the solid line a in FIG. It is. Thus, by appropriately selecting the attenuation rate of each part of the soft X-ray attenuation member, the difference in irradiation intensity due to the distance from the soft X-ray irradiation apparatus can be reduced, and a wide area on the lower surface of the glass substrate. A uniform charge eliminating effect can be obtained. 6 shows the soft X-ray intensity distribution on the lower surface of the glass substrate when the soft X-ray attenuation member having the characteristics of the dotted line b in FIG. 5 is installed. Although slightly higher, the strength is lower than in the case where the soft X-ray attenuation member indicated by the broken line c ′ in FIG. 6 is not installed. Therefore, it can be seen that the soft X-ray attenuation member is effective in reducing the deterioration of the roller, regardless of the soft X-ray attenuation member having any of the characteristics shown in FIG.

以上述べたように、本発明によれば、軟X線遮蔽部材または軟X線減衰部材を設置することによりコロの劣化が抑制され、コロの交換頻度を低く抑えることが出来るので、スループットの向上を図ることができる。また、本発明の効果をさらに高めるためには、コロも含めて軟X線で劣化する部位は容易に交換できる構造にすることはいうまでもない。   As described above, according to the present invention, by installing the soft X-ray shielding member or the soft X-ray attenuation member, the deterioration of the rollers can be suppressed and the replacement frequency of the rollers can be kept low, thereby improving the throughput. Can be achieved. Further, in order to further enhance the effect of the present invention, it goes without saying that a structure that can be easily replaced with a soft X-ray including a roller is provided.

本発明による基板搬送装置の実施例1を説明する模式図である。It is a schematic diagram explaining Example 1 of the board | substrate conveyance apparatus by this invention. 本発明の実施例1をさらに説明する図である。It is a figure which further demonstrates Example 1 of this invention. 軟X線SXの照射領域に照射距離とイオン濃度の関係を測定した結果の一例を説明する図である。It is a figure explaining an example of the result of having measured the relationship between irradiation distance and ion concentration in the irradiation area | region of soft X-ray SX. 本発明による基板搬送装置の実施例2説明する模式図である。It is a schematic diagram explaining Example 2 of the board | substrate conveyance apparatus by this invention. 本発明の実施例2で設定する軟X線減衰部材の減衰特性の説明図である。It is explanatory drawing of the attenuation | damping characteristic of the soft X-ray attenuation member set in Example 2 of this invention. 軟X線減衰部材の有無によるガラス基板の下面における軟X線強度分布を説明する図である。It is a figure explaining the soft X-ray intensity distribution in the lower surface of the glass substrate by the presence or absence of a soft X-ray attenuation member. 軟X線照射装置を備えた従来の基板搬送装置の説明図である。It is explanatory drawing of the conventional board | substrate conveyance apparatus provided with the soft X-ray irradiation apparatus.

符号の説明Explanation of symbols

SUB・・・絶縁基板(ガラス基板)、RLR・・・コロ(ローラ)、SXU・・・軟X線照射装置、SX・・・軟X線、SHP・・・遮蔽板、ATN・・・軟X線減衰部材。   SUB ... insulating substrate (glass substrate), RLR ... roller (roller), SXU ... soft X-ray irradiation device, SX ... soft X-ray, SHP ... shielding plate, ATN ... soft X-ray attenuation member.

Claims (12)

搬送方向に配置された複数のコロを有し、液晶表示パネルを構成するためのガラス基板の下面を前記コロの上に載置して搬送すると共に、搬送終端部又は搬送途中で前記ガラス基板をリフトアップし、次工程へ受け渡すための移載を行う基板搬送装置であって、
前記搬送終端部又は搬送途中に、前記ガラス基板の下面に軟X線を照射して、前記コロとの接触と剥離で帯電したコロとガラス基板の電荷を除去するための軟X線照射装置を備え、
前記搬送終端部又は搬送途中の前記軟X線照射装置の近傍に配置された前記コロに、前記軟X線照射装置から出射する軟X線の直射を遮蔽する遮蔽板を設けたことを特徴とする基板搬送装置。
It has a plurality of rollers arranged in the transport direction and transports the lower surface of the glass substrate for constituting the liquid crystal display panel placed on the roller, and transports the glass substrate in the transport end portion or in the middle of transport. A substrate transfer device that lifts up and transfers to transfer to the next process,
A soft X-ray irradiator for irradiating the lower surface of the glass substrate with soft X-rays in the transfer termination portion or in the middle of transfer, and removing the charges of the roller and the glass substrate charged by contact and peeling with the roller. Prepared,
The roller disposed in the vicinity of the transfer end portion or the soft X-ray irradiation device in the middle of transfer is provided with a shielding plate that blocks direct soft X-rays emitted from the soft X-ray irradiation device. Substrate transport device.
請求項1において、
前記軟X線照射装置は、前記搬送終端部又は搬送途中の基板搬送方向両端部かつ前記搬送終端部又は搬送途中に配置された前記コロを斜め上方に臨む位置に設置されていることを特徴とする基板搬送装置。
In claim 1,
The soft X-ray irradiator is installed at a position facing the upper end of the transfer or the both ends of the substrate transfer direction in the middle of transfer and the roller disposed in the transfer end or in the middle of the transfer obliquely upward. Substrate transport device.
請求項1において、
前記遮蔽板は金属であることを特徴とする基板搬送装置。
In claim 1,
The substrate transfer apparatus, wherein the shielding plate is made of metal.
請求項3において、
前記遮蔽板が接地されていることを特徴とする基板搬送装置。
In claim 3,
The substrate transfer apparatus, wherein the shielding plate is grounded.
搬送方向に配置された複数のコロを有し、液晶表示パネルを構成するためのガラス基板の下面を前記コロの上に載置して搬送すると共に、搬送終端部又は搬送途中で前記ガラス基板をリフトアップし、次工程へ受け渡すための移載を行う基板搬送装置であって、
前記搬送終端部又は搬送途中に、前記ガラス基板の下面に軟X線を照射して、前記コロとの接触と離脱剥離で帯電したコロとガラス基板の電荷を除去するための軟X線照射装置を備え、
前記搬送終端部又は搬送途中の前記軟X線照射装置の近傍に、直近のコロを照射する軟X線の透過部位の減衰率が大で、前記軟X線照射装置との距離が遠くなるコロを照射する軟X線の透過部位の減衰率が順次小さくなる軟X線減衰部材を設けたことを特徴とする基板搬送装置。
It has a plurality of rollers arranged in the transport direction and transports the lower surface of the glass substrate for constituting the liquid crystal display panel placed on the roller, and transports the glass substrate in the transport end portion or in the middle of transport. A substrate transfer device that lifts up and transfers to transfer to the next process,
A soft X-ray irradiation apparatus for irradiating the lower surface of the glass substrate with soft X-rays in the transfer termination portion or in the middle of transfer, and removing the charges of the roller and the glass substrate charged by contact with the roller and detachment peeling. With
A roller that has a large attenuation factor of a soft X-ray transmission part that irradiates the nearest roller near the end of transfer or the soft X-ray irradiation device in the middle of transfer, and the distance from the soft X-ray irradiation device is long. A soft X-ray attenuating member is provided in which the attenuation rate of the transmission part of soft X-rays that irradiates is gradually reduced.
請求項において、
前記軟X線照射装置は、前記搬送終端部又は搬送途中の基板搬送方向両端部かつ前記搬送終端部又は搬送途中に配置された前記コロを斜め上方に臨む位置に設置されていることを特徴とする基板搬送装置。
In claim 5 ,
The soft X-ray irradiator is installed at a position facing the upper end of the transfer or the both ends of the substrate transfer direction in the middle of transfer and the roller disposed in the transfer end or in the middle of the transfer obliquely upward. Substrate transport device.
請求項において、
前記軟X線減衰部材が、開口率が段階的に変化する金属メッシュであることを特徴とする基板搬送装置。
In claim 5 ,
The substrate transfer apparatus, wherein the soft X-ray attenuation member is a metal mesh whose aperture ratio changes stepwise.
請求項において、
前記軟X線減衰部材が、厚みが漸次変化する金属板であることを特徴とする基板搬送装置。
In claim 5 ,
The substrate transfer apparatus, wherein the soft X-ray attenuation member is a metal plate whose thickness gradually changes.
請求項において、
前記軟X線減衰部材が、厚みが漸次変化する樹脂板であることを特徴とする基板搬送装置。
In claim 5 ,
The substrate transfer apparatus, wherein the soft X-ray attenuation member is a resin plate whose thickness gradually changes.
請求項において、
前記軟X線減衰部材が、スリット幅が漸次変化する金属蒸着膜付き樹脂板であることを特徴とする基板搬送装置。
In claim 5 ,
The substrate transfer apparatus, wherein the soft X-ray attenuation member is a resin plate with a metal vapor deposition film whose slit width gradually changes.
請求項7において、
前記金属メッシュが接地されていることを特徴とする基板搬送装置。
In claim 7,
The substrate transfer apparatus, wherein the metal mesh is grounded.
請求項10において、
前記金属蒸着膜が接地されていることを特徴とする基板搬送装置。
In claim 10,
The substrate transfer apparatus, wherein the metal deposition film is grounded.
JP2006311846A 2006-11-17 2006-11-17 Substrate transfer device Expired - Fee Related JP4421597B2 (en)

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