JP4440180B2 - Substrate processing apparatus and substrate processing method - Google Patents

Description

  The present invention relates to a substrate processing apparatus and a substrate processing method for performing predetermined processing on a substrate such as a semiconductor substrate, a glass substrate for a liquid crystal display device, and a glass substrate for a photomask.

  2. Description of the Related Art Conventionally, in a substrate manufacturing process, a substrate processing apparatus that performs substrate processing by immersing a substrate in a processing solution stored in each processing tank while transporting the substrate between a plurality of processing tanks is known. It has been.

  When such a substrate processing apparatus finishes processing a substrate in one processing tank, the substrate processing apparatus lifts the substrate from the processing tank and conveys the substrate to the next processing tank. However, the treatment liquid adheres to the surface of the substrate pulled up from the treatment tank. For this reason, such a substrate processing apparatus is provided with an inter-vat bat (liquid receiving part) for receiving the processing liquid falling from the substrate between the processing tanks.

  A conventional substrate processing apparatus provided with an inter-batt bat is disclosed in Patent Document 1, for example.

JP 2002-280346 A

  A drainage part is connected to the inter-bat bat. For this reason, the processing liquid dropped from the substrate to the inter-vessel bat is drained to the drainage section. However, even if such a drainage part is provided, a part of the processing liquid is not discharged from the tank bat, but remains attached to the inner wall of the tank bat. The treatment liquid remaining in the vat bat may contaminate the surrounding atmosphere or crystallize to become a particle generation source.

  The present invention has been made in view of such circumstances, and in a substrate processing apparatus provided with a liquid receiving portion that receives a processing liquid falling from a substrate being transferred, a technique that can prevent the processing liquid from remaining in the liquid receiving portion. The purpose is to provide.

  In order to solve the above-described problem, the invention according to claim 1 is a substrate processing apparatus, wherein a plurality of processing units that perform processing on a substrate with a processing solution and adhesion of the processing solution between the plurality of processing units A transport means for transporting the processed substrate, a liquid receiving section for receiving the processing liquid falling from the substrate in the middle of transport, a supply means for supplying a liquid to the liquid receiving section, and a discharge means for discharging the liquid from the liquid receiving section. The supply means starts supplying the liquid before the substrate passes above the liquid receiving portion, and the supply means supplies the liquid simultaneously with the completion of the passage of the substrate above the liquid receiving portion or after passing the substrate. And a controller for controlling the supply means and the discharge means so as to stop and discharge the liquid by the discharge means.

  The invention according to claim 2 is the substrate processing apparatus according to claim 1, further comprising a sensor that detects that the substrate has passed a predetermined position on the transfer path, and the control unit detects a detection signal of the sensor. The supply means and the discharge means are controlled based on the above.

  The invention according to claim 3 is the substrate processing apparatus according to claim 1, wherein the control means controls the supply means and the discharge means based on a schedule stored in advance. To do.

  The invention according to claim 4 is the substrate processing apparatus according to any one of claims 1 to 3, wherein the discharge means discharges the liquid from the bottom of the liquid receiving portion; And a second discharge part for discharging the liquid stored in the liquid receiving part in a predetermined amount or more.

  A fifth aspect of the present invention is the substrate processing apparatus according to any one of the first to fourth aspects, wherein the supply means supplies pure water to the liquid receiving portion.

  The invention according to claim 6 is a substrate processing method, wherein a first step of processing a substrate with a processing liquid, a second step of transporting the substrate after the first step, and the second step A third step of receiving the processing liquid falling from the substrate transported in the step in the liquid receiving unit, and a fourth step of starting the supply of the liquid to the liquid receiving unit before passing the substrate above the liquid receiving unit. And a fifth step of stopping the supply of the liquid to the liquid receiving unit and discharging the liquid from the liquid receiving unit at the same time as or after the completion of the passage of the substrate above the liquid receiving unit. It is characterized by.

  According to the first to sixth aspects of the present invention, supply of the liquid to the liquid receiving part is started before passing the substrate above the liquid receiving part, and at the same time as the completion of the passage of the substrate above the liquid receiving part or After passing, the supply of the liquid to the liquid receiving part is stopped and the liquid is discharged from the liquid receiving part. For this reason, the chemical liquid dropped from the substrate in the middle of conveyance falls into the liquid stored in the liquid receiving portion, and is quickly diluted and discharged. Therefore, it is possible to prevent the processing liquid from remaining in the liquid receiving portion. Further, the liquid is supplied to the liquid receiving part only before and after the substrate passes over the liquid receiving part. For this reason, the amount of liquid used can be saved.

  In particular, according to the second aspect of the invention, the liquid is supplied and discharged based on the detection signal of the sensor. For this reason, even if it is a case where the conveyance time of a board | substrate has moved forward and backward, a liquid can be supplied and discharged | emitted with a suitable timing.

  In particular, according to the third aspect of the invention, the liquid is supplied and discharged based on a schedule stored in advance. For this reason, the liquid can be supplied and discharged at an appropriate timing without complicating the configuration of the apparatus.

  In particular, according to the fourth aspect of the present invention, the first discharge portion for discharging the liquid from the bottom portion of the liquid receiving portion is provided. For this reason, the liquid can be quickly discharged from the liquid receiving portion. Moreover, it has the 2nd discharge part which discharges | emits the liquid stored by the liquid receiving part more than predetermined amount. For this reason, there is no fear that the liquid overflows from the liquid receiving portion.

  In particular, according to the invention described in claim 5, pure water is supplied to the liquid receiving portion. For this reason, it is possible to more effectively prevent the treatment liquid from remaining in the liquid receiving portion.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

<1. Configuration of substrate processing apparatus>
FIG. 1 is a diagram showing a configuration of a substrate processing apparatus 1 according to the present invention. The substrate processing apparatus 1 is an apparatus that alternately performs a chemical solution process and a water washing process on a substrate W while collectively transporting a plurality of substrates W (hereinafter simply referred to as substrates W). The substrate processing apparatus 1 mainly includes a plurality of chemical solution processing units 10, a plurality of water washing processing units 20, a lifter 30 that moves the substrate W up and down in each processing unit, and a transport mechanism 40 that transports the substrate W between the processing units. A tank bat 50 that receives a chemical solution or pure water falling from the substrate W being transported, a first sensor 61 and a second sensor 62 that detect that the substrate W has passed a predetermined position, and a controller 70 (FIG. 3).

  The chemical processing unit 10 is a processing unit that performs chemical processing on the substrate W. The chemical processing unit 10 includes a chemical processing tank 11 that stores the chemical and a casing 12 that stores the chemical processing tank 11. A chemical solution supply unit and a chemical solution discharge unit (not shown) are connected to the chemical solution treatment tank 11. When the chemical treatment of the substrate W is performed, the chemical solution is supplied from the chemical solution supply unit into the chemical treatment tank 11. And the chemical | medical solution process of the board | substrate W is performed by immersing the board | substrate W in the chemical | medical solution stored in the chemical | medical solution processing tank 11. FIG. After the chemical liquid processing of the substrate W is completed, the chemical liquid is discharged from the chemical liquid processing tank 11 to the chemical liquid discharge unit. A circulation unit that circulates the chemical solution in the chemical treatment tank 11 may be connected to the chemical treatment tank 11.

  The water washing processing unit 20 is a processing unit that performs a water washing process on the substrate W. The washing treatment unit 20 includes a washing treatment tank 21 that stores pure water and a casing 22 that houses the washing treatment tank 21. The casing 12 of the chemical solution processing unit 10 and the casing 22 of the water washing processing unit 20 are integrally configured by a common member. A pure water supply unit and a pure water discharge unit (not shown) are connected to the rinsing treatment tank 21. When performing the water washing process of the substrate W, pure water is supplied into the water washing tank 21 from the pure water supply unit. Then, the substrate W is washed with water by immersing the substrate W in pure water stored in the washing treatment tank 21. After the washing process of the substrate W is completed, pure water is discharged from the washing process tank 21 to the pure water discharge unit. A circulation unit that circulates pure water in the washing treatment tank 21 may be connected to the washing treatment tank 21.

  The lifter 30 is a mechanism that moves the substrate W up and down while holding the substrate W in each processing unit. The lifter 30 has three holding bars 31 that hold the substrate W from below, and holds the substrate W in an upright position on the holding bar 31. The lifter 30 is connected to the drive mechanism 32 conceptually shown in FIG. When the drive mechanism 32 is operated, the lifter 30 moves up and down, and the substrate W moves up and down between the immersion position in the chemical treatment tank 11 or the water washing treatment tank 21 and the lifting position above the processing section.

  The transport mechanism 40 is a mechanism for transporting the substrate W above the plurality of chemical solution processing units 10 and the plurality of water washing processing units 20 that are alternately arranged. The transport mechanism 40 includes a pair of arm portions 41, and holds the substrate W by the arm portions 41. Further, the transport mechanism 40 is connected to a drive mechanism 42 conceptually shown in FIG. When the drive mechanism 42 is operated, the transport mechanism 40 moves to the left and right, and the substrate W moves horizontally above the chemical solution processing unit 10 and the water washing processing unit 20.

  When the substrate W is processed in the chemical processing unit 10 or the water washing processing unit 20, the substrate W is immersed in the chemical processing tank 11 or the water cleaning processing tank 21 by the lifter 30. Then, the processed substrate W is pulled up by the lifter 30 above the chemical processing unit 10 or the water washing processing unit 20. The substrate W is transferred from the lifter 30 to the transport mechanism 40 by the pair of arm portions 41 of the transport mechanism 40 sandwiching the substrate W above the chemical solution processing unit 10 or the water washing processing unit 20. The transport mechanism 40 that has received the substrate W moves horizontally to the upper part of the next chemical solution processing unit 10 or the water washing processing unit 20. Then, the transport mechanism 40 places the substrate W on the next lifter 30 by opening the pair of arm portions 41. The lifter 30 that has received the substrate W descends while holding the substrate W, and immerses the substrate in the chemical solution treatment tank 11 or the water washing treatment tank 21. By repeating such an operation, the substrate W is transferred and processed.

  The tank bat 50 is a liquid receiving part for receiving a chemical solution or pure water falling from the substrate W in the middle of conveyance. One tank bat 50 is provided between the chemical solution processing unit 10 and the water washing processing unit 20, and is provided on the upper part of the members constituting the casings 12 and 22. The inter-bat bat 50 extends in the arrangement direction of the substrates W and is formed in a semi-cylindrical shape opened upward. FIG. 2 is a perspective view showing the inter-tank bat 50 and the substrate W passing over the inter-tank bat 50. A chemical solution or pure water adheres to the surface of the substrate W by the previous treatment. For this reason, the chemical solution or pure water droplet DR falls from the substrate W in the middle of transport, but the dropped chemical solution or pure water is received by the inter-bat bat 50 and stored in the inter-bat bat 50.

  The first sensor 61 and the second sensor 62 are sensors that detect that the substrate W being transported has passed a predetermined position. The first sensor 61 is provided on the transport path of each lifter 30. When the substrate W pulled up by the lifter 30 passes a predetermined position, the first sensor 61 detects the substrate W and transmits a detection signal to the control unit 70 (see FIG. 3). The second sensor 62 is provided at a position immediately after passing over the tank bat 50 on the transport path of the transport mechanism 40. When the substrate W transported by the transport mechanism 40 passes through the detection position, the second sensor 62 detects the substrate W and transmits a detection signal to the control unit 70 (see FIG. 3). It is desirable that the first sensor 61 and the second sensor 62 can detect the substrate W in a non-contact manner, and are configured by, for example, a photoelectric sensor having a projector and a light receiver.

  FIG. 3 is a block diagram showing the configuration of the piping system and the control system connected to the tank bat 50. Connected to the inter-vat bat 50 are a pure water supply unit 51 that supplies pure water to the inter-vat bat 50 and a drainage unit 52 that discharges liquid from the inter-vat bat 50. The pure water supply unit 51 has a configuration in which the pure water supply source 51a and the tank bat 50 are connected by a pipe 51b, and an opening / closing valve 51c is provided in the middle of the path. For this reason, when the on-off valve 51c is opened, pure water is supplied from the pure water supply source 51a into the tank bat 50 via the pipe 51b. The supplied pure water is stored in the tank bat 50.

  On the other hand, the drainage part 52 has a configuration in which the bottom part of the inter-vat bat 50 and the drainage line are connected by a pipe 52a, and an on-off valve 52b is provided in the middle of the path. For this reason, when the on-off valve 52b is opened, the liquid stored in the tank bat 50 is discharged to the drainage line via the pipe 52a. Further, the inter-tank bat 50 is connected to a pipe 52c for discharging the liquid stored in a predetermined amount or more. The other end of the pipe 52c is connected to the pipe 52a. For this reason, the liquid stored in the tank bat 50 in a predetermined amount or more is discharged to the drainage line via the pipe 52c and the pipe 52a, and the liquid does not overflow from the tank bat 50. The pure water supply unit 51 and the drainage unit 52 are connected to each of the plurality of inter-bat bats 50 provided in the substrate processing apparatus 1.

  The control unit 70 is configured by a computer including a CPU and a memory, for example. The control unit 70 is electrically connected to the first sensor 61 and the second sensor 62 described above, and receives detection signals from the first sensor 61 and the second sensor 62. The control unit 70 is electrically connected to the drive mechanisms 32 and 42 and the on-off valves 51c and 52b, and controls these operations.

<2. About supply / drainage operation of bat between tanks (in case of control by sensor)>
In the substrate processing apparatus 1 described above, when the substrate W is transferred between adjacent processing units, the supply of pure water to the inter-bat bat 50 and the drainage from the inter-bat bat 50 are performed at a predetermined timing. Do. FIG. 4 is a flowchart showing the flow of the supply / drainage operation of the inter-bat bat 50.

  For example, when the substrate W is transferred from the chemical solution processing unit 10 to the water washing processing unit 20, first, the substrate W immersed in the chemical solution processing tank 11 is pulled up by the lifter 30. At this time, the first sensor 61 continuously performs a detection operation (step S11). For this reason, when the substrate W passes the predetermined position, the first sensor 61 detects the substrate W and transmits a detection signal to the control unit 70. When the control unit 70 receives the detection signal from the first sensor 61, the tank bat 50 corresponding to the first sensor 61 (below the point where the substrate W passes after a predetermined time from the detection time of the first sensor 61). The on-off valve 51c of the existing inter-vat bat 50) is opened, and the supply of pure water to the inter-vat bat 50 is started (step S12).

  Thereafter, pure water is supplied to the inter-vat bat 50, while the substrate W is pulled up above the chemical solution processing tank 11. Then, the substrate W is transferred from the lifter 30 to the transport mechanism 40 and is transported horizontally to above the chemical solution processing chamber 40. When the substrate W approaches the bat 50 between tanks, a predetermined amount of pure water is stored in the bat 50 between tanks. For this reason, the chemical solution dropped from the substrate W passing over the tank bat 50 falls into the pure water stored in the tank bat 50 and is diluted. Thus, in this substrate processing apparatus 1, the inter-vat bat 50 is placed above the inter-vat bat 50 so that a sufficient amount of pure water is stored in the inter-vat bat 50 when the substrate W arrives above the inter-vat bat 50. The first sensor 61 is disposed on the transport path a predetermined distance from the front.

  Further, during the transfer of the substrate W, the second sensor 62 continuously performs the detection operation (step S13). For this reason, immediately after the substrate W passes over the tank bat 50, the second sensor 62 detects the substrate W and transmits a detection signal to the control unit 70. When the control unit 70 receives the detection signal from the second sensor 62, the inter-vat bat 50 corresponding to the second sensor 62 (the inter-vat bat 50 disposed immediately below the detection position of the second sensor 62). The on-off valve 51c is closed, and the supply of pure water to the tank bat 50 is stopped (step S14). And the control part 70 opens the on-off valve 52b, and discharges the liquid (mixed liquid of the pure water and the chemical | medical solution which fell from the board | substrate W) in the vat 50 between tanks (step S15).

  FIG. 5 is a timing chart showing the above supply / drainage operation. FIG. 5 shows operations of the first sensor 61, the second sensor 62, the on-off valve 51c, and the on-off valve 52b. The horizontal axis is common and shows the passage of time. First, when processing the substrate W in the chemical solution processing tank 11, the on-off valve 51c and the on-off valve 52b are closed. When the processing of the substrate W in the chemical solution processing tank 11 is completed and the substrate W is pulled up from the chemical solution processing tank 11, the first sensor 61 detects the substrate W at time t1. When the control unit 70 receives the detection signal from the first sensor 61, the control unit 70 opens the on-off valve 51c. While the on-off valve 51c is open, pure water is supplied to the tank bat 50. Thereafter, the substrate W passes over the inter-vat bat 50, and the chemical solution falling from the substrate W at that time falls into the pure water stored in the inter-bat bat 50. Soon, the second sensor 62 detects the substrate W at time t2. When receiving the detection signal from the second sensor 62, the controller 70 closes the on-off valve 51c and opens the on-off valve 52b. Thereby, the supply of pure water to the tank bat 50 is stopped, and the liquid in the tank bat 50 is discharged.

  In this substrate processing apparatus 1, the supply of pure water to the inter-vessel bat 50 is started immediately before the passage of the substrate W above the inter-vessel bat 50, and the pure water passes immediately after the passage of the substrate above the inter-vessel bat 50. Water supply is stopped and drained from the inter-vat bat 50. For this reason, the chemical | medical solution which fell from the board | substrate W falls in the pure water stored by the vat | bat 50 between tanks, is diluted quickly, and is drained with a pure water. Therefore, it is possible to prevent the processing liquid from remaining in the inter-vat bat 50. Further, in this substrate processing apparatus 1, pure water is supplied to the inter-bat bat 50 only before and after the substrate W passes over the inter-bat bat 50. That is, in other periods, the inter-bat bat 50 stands by in an empty state. For this reason, the amount of pure water used can be minimized.

  In the substrate processing apparatus 1, the supply / drainage operation of the inter-vat bat 50 is performed based on the detection signals of the first sensor 61 and the second sensor 62. For this reason, even if conveyance of the substrate W is delayed, the supply / drainage operation of the inter-vat bat 50 can be performed at an appropriate timing.

<3. About supply / drainage operation of bat between tanks (in case of control by schedule)>
In the above example, based on the detection signals of the first sensor 61 and the second sensor 62, the supply / drainage operation of the inter-vat bat 50 is performed. However, the supply / drainage operation of the tank bat 50 may be performed based on a schedule stored in the control unit 70. FIG. 6 is a flowchart showing a flow of operation when the supply / drainage operation of the inter-bat bat 50 is performed based on the schedule.

  For example, when the substrate W is transferred from the chemical solution processing unit 10 to the water washing processing unit 20, first, the substrate W immersed in the chemical solution processing tank 11 is pulled up by the lifter 30. The control unit 70 waits for a predetermined time t3 (step S21), and opens the opening / closing valve of the inter-tank bat 50 at time t3. Thereby, supply of pure water to the vat 50 between tanks is started (step S22).

  Thereafter, pure water is supplied to the inter-vat bat 50, while the substrate W is pulled up above the chemical solution processing tank 11. Then, the substrate W is transferred from the lifter 30 to the transport mechanism 40 and is transported horizontally to above the chemical solution processing chamber 40. When the substrate W approaches the bat 50 between tanks, a predetermined amount of pure water is stored in the bat 50 between tanks. For this reason, the chemical solution dropped from the substrate W passing over the tank bat 50 falls into the pure water stored in the tank bat 50 and is diluted. Thus, in this substrate processing apparatus 1, the inter-vat bat 50 is placed above the inter-vat bat 50 so that a sufficient amount of pure water is stored in the inter-vat bat 50 when the substrate W arrives above the inter-vat bat 50. The time t3 is set a predetermined time before the scheduled time when the substrate W arrives.

  During the transfer of the substrate W, the control unit 70 waits for a predetermined time t6 (step S23), and closes the on-off valve 51c of the inter-bat bat 50 at time t6. Thereby, the supply of pure water to the tank bat 50 is stopped (step S24). And the control part 70 opens the on-off valve 52b, and discharges the liquid (mixed liquid of the pure water and the chemical | medical solution which fell from the board | substrate W) in the vat | bat 50 between tanks (step S25).

  FIG. 7 is a timing chart showing the above supply / drainage operation. FIG. 7 shows operations of the lifter 30, the transport mechanism 40, the on-off valve 51c, and the on-off valve 52b. The horizontal axis is common and shows the passage of time. First, when processing the substrate W in the chemical solution processing tank 11, the on-off valve 51c and the on-off valve 52b are closed. When the processing of the substrate W in the chemical solution processing tank 11 is completed, the lifter 30 operates and the substrate W is pulled up from the chemical solution processing tank 11. When the time t3 is reached, the control unit 70 opens the on-off valve 51c. While the on-off valve 51c is open, pure water is supplied to the tank bat 50. Thereafter, the substrate W is transferred from the lifter 30 to the transport mechanism 40, and the transport mechanism 40 operates to transport the substrate W horizontally. The substrate W passes over the inter-vat bat 50 between times t4 and t5, and the chemical solution falling from the substrate W at that time falls into the pure water stored in the inter-vessel bat 50. When time t6 is reached, the control unit 70 closes the on-off valve 51c and opens the on-off valve 52b. Thereby, the supply of pure water to the tank bat 50 is stopped, and the liquid in the tank bat 50 is discharged.

  Thus, even if it is control by a schedule, supply / drainage operation | movement of the bat 50 between tanks is possible similarly to the control by a sensor. For this reason, the chemical | medical solution which fell from the board | substrate W falls into the pure water stored in the vat | bat 50 between tanks, is diluted quickly, and is drained with a pure water. Therefore, it is possible to prevent the processing liquid from remaining in the tank bat 50. Further, pure water is supplied to the inter-bat bat 50 only before and after the substrate W passes above the inter-bat bat 50. For this reason, the amount of pure water used can be minimized.

  Further, in this example, the supply / drainage operation of the inter-bat bat 50 is performed based on a schedule stored in the control unit 70 in advance. For this reason, the supply / drainage operation of the tank bat 50 can be performed at an appropriate timing without complicating the configuration of the substrate processing apparatus 1.

<4. Modification>
As mentioned above, although main embodiment of this invention was described, this invention is not limited to said example. For example, in the above example, the case where the substrate W is transported from the chemical processing unit 10 to the water washing processing unit 20 has been described. The tank bat 50 may be supplied and discharged. However, when the substrate W is transported from the chemical solution processing unit 10 to the rinsing processing unit 20, since the chemical solution mainly drops from the substrate W, problems such as atmospheric contamination are more likely to occur. Therefore, it is desirable to perform the liquid supply / drainage operation of the bat 50 between tanks at least after the chemical treatment.

  In the above example, the case where a chemical solution and pure water are used for processing the substrate has been described. However, the treatment solution used in the present invention is not limited to the combination of the chemical solution and pure water. One type of processing solution may be used, or three or more types may be used.

  In the above example, the first sensor 61 is provided on the transport path of the lifter 30, but the position of the first sensor 61 may be on the transport path of the transport mechanism 40. The first sensor 61 is a predetermined distance from the upper side of the inter-bat bat 50 so that a sufficient amount of pure water is stored in the inter-bat bat 50 when the substrate W reaches the upper portion of the inter-bat bat 50. What is necessary is just to be arrange | positioned on a conveyance path | route.

  In the above example, the case where the substrate W drains from the inter-vat bat 50 after passing over the inter-vat bat 50 has been described. The liquid may be drained from the intermediate bat 50.

  In the above example, the case where pure water is supplied to the inter-bat bat 50 has been described. However, the liquid supplied to the inter-bat bat 50 may be a cleaning liquid other than pure water.

  In the example described above, the case where a plurality of substrates W are transferred and processed in a batch has been described. However, the substrate W may be transferred and processed one by one. Further, in the above example, each processing unit is an immersion processing type processing unit that immerses the substrate W in the processing liquid in the processing tank, but a coating processing type processing that discharges the processing liquid toward the substrate W. Part.

It is the figure which showed the structure of the substrate processing apparatus which concerns on this invention. It is the perspective view which showed the board | substrate which passes over the bat between tanks, and the bat between tanks. It is the block diagram which showed the structure of the piping system and control system which are connected to the bat between tanks. It is the flowchart which showed the flow of the supply / drainage operation | movement of the bat between tanks. It is a timing chart of the supply / drainage operation | movement of the bat between tanks. It is the flowchart which showed the flow of the supply / drainage operation | movement of the bat between tanks. It is a timing chart of the supply / drainage operation | movement of the bat between tanks.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 10 Chemical processing part 11 Chemical processing tank 20 Flushing processing part 21 Flushing processing tank 21 Lifter 40 Transfer mechanism 50 Bat between tanks 51 Pure water supply part 51c, 52b On-off valve 52 Drain part 61 First sensor 62 Second Sensor 70 Control unit W substrate

Claims (6)

A substrate processing apparatus,
A plurality of processing units for processing the substrate with a processing liquid;
A transporting means for transporting a substrate to which a processing liquid is adhered between the plurality of processing units;
A liquid receiver for receiving the processing liquid falling from the substrate in the middle of conveyance;
Supply means for supplying a liquid to the liquid receiver;
Discharging means for discharging liquid from the liquid receiving portion;
The supply means starts supplying the liquid before passing the substrate above the liquid receiving portion, and stops supplying the liquid by the supplying means simultaneously with the completion of passing the substrate above the liquid receiving portion or after passing the substrate. And a controller for controlling the supply means and the discharge means so as to discharge the liquid by the discharge means;
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 1,
A sensor for detecting that the substrate has passed a predetermined position on the transport path;
The substrate processing apparatus, wherein the control unit controls the supply unit and the discharge unit based on a detection signal of the sensor. The substrate processing apparatus according to claim 1,
The substrate processing apparatus, wherein the control unit controls the supply unit and the discharge unit based on a schedule stored in advance. A substrate processing apparatus according to any one of claims 1 to 3,
The discharging means is
A first discharge part for discharging the liquid from the bottom of the liquid receiving part;
A second discharge part for discharging the liquid stored in the liquid receiving part in a predetermined amount or more;
A substrate processing apparatus comprising: A substrate processing apparatus according to any one of claims 1 to 4, wherein
The substrate processing apparatus, wherein the supply means supplies pure water to the liquid receiving portion. A substrate processing method comprising:
A first step of processing a substrate with a processing liquid;
A second step of transporting the substrate after the first step;
A third step of receiving in the liquid receiving part the processing liquid falling from the substrate transported in the second step;
A fourth step of starting the supply of liquid to the liquid receiver before passing through the substrate above the liquid receiver;
A fifth step of stopping the supply of the liquid to the liquid receiving part simultaneously with the completion of the passage of the substrate above the liquid receiving part or discharging the liquid from the liquid receiving part;
A substrate processing method comprising:

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