JP4453899B2 - Epoxy resin composition - Google Patents
Epoxy resin composition Download PDFInfo
- Publication number
- JP4453899B2 JP4453899B2 JP2003344847A JP2003344847A JP4453899B2 JP 4453899 B2 JP4453899 B2 JP 4453899B2 JP 2003344847 A JP2003344847 A JP 2003344847A JP 2003344847 A JP2003344847 A JP 2003344847A JP 4453899 B2 JP4453899 B2 JP 4453899B2
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- JP
- Japan
- Prior art keywords
- epoxy resin
- formula
- resin composition
- epoxy
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229920000647 polyepoxide Polymers 0.000 title claims description 56
- 239000003822 epoxy resin Substances 0.000 title claims description 54
- 239000000203 mixture Substances 0.000 title claims description 24
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 239000004593 Epoxy Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 239000011888 foil Substances 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 15
- 229920003986 novolac Polymers 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 239000002966 varnish Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- -1 amine compounds Chemical class 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 150000002989 phenols Chemical class 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000001246 bromo group Chemical group Br* 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LCHYEKKJCUJAKN-UHFFFAOYSA-N 2-propylphenol Chemical compound CCCC1=CC=CC=C1O LCHYEKKJCUJAKN-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
Description
本発明は耐熱性に優れる硬化物を与え、しかもフィルム状に形成した場合、十分なフレキシビリティーを有するエポキシ樹脂組成物に関する。 The present invention relates to an epoxy resin composition that provides a cured product having excellent heat resistance and has sufficient flexibility when formed into a film.
エポキシ樹脂は種々の硬化剤で硬化させることにより、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。従来、電気・電子部品分野では高い信頼性が要求されるため、オルソクレゾールノボラック型のエポキシ樹脂が広く使用されてきた。またエポキシ樹脂の硬化剤としては酸無水物やアミン系化合物が知られているが電気・電子部品分野では耐熱性などの信頼性の面からフェノールノボラックが使用されることが多い。
しかしながら、前記したようなオルソクレゾールノボラック型エポキシ樹脂とフェノールノボラックの組み合わせは耐熱性には優れているものの、その硬化物は剛直であり、フレキシビリティーに欠ける。近年の電気・電子部品の形態は従来の大型パッケージやガラス繊維を基材とした基板だけではなく、ポリイミドやPET(ポリエチレングリコールテレフタレート)フィルム、金属箔上にワニスの状態で塗布した後、溶剤を除去するシート状の成形物が開発されている。この様な場合、使用される樹脂には十分なフレキシビリティーが要求される。こうした用途に適した材料として高分子量のポリヒドロキシポリエーテル樹脂が使用されることが多い(特許文献1)が、このポリヒドロキシポリエーテル樹脂は実質的に熱可塑性樹脂であり、耐熱性には著しく劣る。
Epoxy resins are cured with various curing agents, and generally become cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., and adhesives, paints, laminates, moldings It is used in a wide range of fields such as materials and casting materials. Conventionally, since high reliability is required in the electric / electronic parts field, ortho-cresol novolac type epoxy resins have been widely used. Further, acid anhydrides and amine compounds are known as curing agents for epoxy resins, but phenol novolac is often used from the viewpoint of reliability such as heat resistance in the field of electric and electronic parts.
However, although the combination of the ortho cresol novolac type epoxy resin and the phenol novolac as described above is excellent in heat resistance, the cured product is rigid and lacks flexibility. In recent years, electrical and electronic components are not only used for conventional large packages and glass fiber-based substrates, but are also applied to varnish on polyimide, PET (polyethylene glycol terephthalate) films, and metal foils. Sheet-like moldings to be removed have been developed. In such a case, the resin used is required to have sufficient flexibility. A high molecular weight polyhydroxy polyether resin is often used as a material suitable for such applications (Patent Document 1). However, this polyhydroxy polyether resin is substantially a thermoplastic resin, and has a remarkable heat resistance. Inferior.
本発明は、フレキシビリティーと耐熱性に優れた硬化物を与えるエポキシ樹脂組成物を提供することを目的とする。 An object of this invention is to provide the epoxy resin composition which gives the hardened | cured material excellent in flexibility and heat resistance.
本発明者らはこうした実状に鑑み、耐熱性に優れた硬化物を与え、シート状に成形しても十分なフレキシビリティーを有するエポキシ樹脂、エポキシ樹脂組成物を求めて鋭意研究した結果、本発明を完成させるに到った。 In view of the actual situation, the present inventors have eagerly studied for an epoxy resin and an epoxy resin composition that give a cured product excellent in heat resistance and have sufficient flexibility even when formed into a sheet. The invention has been completed.
すなわち本発明は
(1)(a)下記式(1)
That is, the present invention provides (1) (a) the following formula (1)
(式中、mは正数であり、平均値を表す。Rは水素原子または臭素原子を表す。)
または、下記式(2)
(In the formula, m is a positive number and represents an average value. R represents a hydrogen atom or a bromine atom.)
Or the following formula (2)
(式中、mは正数であり、平均値を表す。Rは水素原子または臭素原子を表す。)
で表され、エポキシ当量が400g/eq以上であるエポキシ樹脂
及び
(b)下記式(3)
(In the formula, m is a positive number and represents an average value. R represents a hydrogen atom or a bromine atom.)
An epoxy resin having an epoxy equivalent of 400 g / eq or more and (b) the following formula (3)
(式中、nは繰り返し数を表す。Rは水素原子または炭素数1〜4のアルキル基を表す。)
で表され軟化点が130〜200℃であるノボラック型樹脂
を含有することを特徴とするエポキシ樹脂組成物、
(2)硬化促進剤を含有する上記(1)に記載のエポキシ樹脂組成物、
(3)上記(1)または(2)に記載のエポキシ樹脂組成物及び溶剤を含有するワニス、
(4)平面状支持体の両面または片面に上記(1)または(2)記載のエポキシ樹脂組成物の層を有するシート、
(5)平面状支持体がポリイミドフィルムである上記(4)に記載のシート、
(6)平面状支持体が金属箔である上記(4)に記載のシート、
(7)平面状支持体が剥離フィルムである上記(4)に記載のシート、
を提供するものである。
(In the formula, n represents the number of repetitions. R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.)
An epoxy resin composition characterized by containing a novolac resin having a softening point of 130 to 200 ° C.
(2) The epoxy resin composition according to the above (1), which contains a curing accelerator,
(3) A varnish containing the epoxy resin composition according to the above (1) or (2) and a solvent,
(4) a sheet having a layer of the epoxy resin composition according to the above (1) or (2) on both sides or one side of a planar support;
(5) The sheet according to (4), wherein the planar support is a polyimide film,
(6) The sheet according to (4), wherein the planar support is a metal foil,
(7) The sheet according to (4), wherein the planar support is a release film,
Is to provide.
本発明のエポキシ樹脂組成物の硬化物は、薄膜状に成形した場合でも十分なフレキシビリティーを有し、しかもその硬化物は耐熱性に優れているため、成形材料、注型材料、積層材料、塗料、接着剤、レジストなどの広範囲の用途にきわめて有用である。 The cured product of the epoxy resin composition of the present invention has sufficient flexibility even when molded into a thin film, and since the cured product is excellent in heat resistance, it is a molding material, casting material, laminated material. It is extremely useful for a wide range of applications such as paints, adhesives, and resists.
本発明において成分(a)であるエポキシ樹脂はエポキシ当量が400g/eq以上であるが、好ましくは450g/eq以上、通常6000g/eq以下、好ましくは5000g/eq以下、特に好ましくは400〜700g/eqである。エポキシ当量はJIS K7236の記載に準じて測定することができる。この様なエポキシ樹脂は市販のものが使用できる。具体的にはエピコート1001、エピコート1002、エピコート1003、エピコート1004、エピコート1007、エピコート1009(いずれもジャパンエポキシレジン株式会社製)、AER8018、AER8011(いずれも旭化成エポキシ株式会社製)等が挙げられる。式(1)または(2)において、Rは全て水素原子、または一部もしくは全部が臭素原子の場合があり得るが、一部または全部が臭素原子の場合、エポキシ樹脂中に占める臭素原子の割合が通常15〜55重量%のものが好ましい。 In the present invention, the epoxy resin as the component (a) has an epoxy equivalent of 400 g / eq or more, preferably 450 g / eq or more, usually 6000 g / eq or less, preferably 5000 g / eq or less, particularly preferably 400 to 700 g / eq. eq. The epoxy equivalent can be measured according to the description of JIS K7236. A commercially available epoxy resin can be used. Specifically, Epicoat 1001, Epicoat 1002, Epicoat 1003, Epicoat 1004, Epicoat 1007, Epicoat 1009 (all manufactured by Japan Epoxy Resin Co., Ltd.), AER8018, AER8011 (all manufactured by Asahi Kasei Epoxy Co., Ltd.) and the like can be mentioned. In the formula (1) or (2), R may be all hydrogen atoms, or a part or all of them may be bromine atoms, but when part or all are bromine atoms, the proportion of bromine atoms in the epoxy resin Is usually preferably 15 to 55% by weight.
前記式(3)で表され軟化点が130〜200℃のノボラック型樹脂はフェノール類及びホルムアルデヒドを酸触媒の存在下で特定の割合で反応させることにより得ることが出来る。 The novolac resin represented by the formula (3) and having a softening point of 130 to 200 ° C. can be obtained by reacting phenols and formaldehyde in a specific ratio in the presence of an acid catalyst.
フェノール類としては、フェノール、クレゾール、プロピルフェノール、ターシャリーブチルフェノール等が挙げられるが、クレゾールが特に好ましい。フェノール類は単独で用いても良く、複数を併用しても構わない。 Examples of phenols include phenol, cresol, propylphenol, and tertiary butylphenol, with cresol being particularly preferred. Phenols may be used alone or in combination.
ホルムアルデヒドの形状はホルマリン水溶液を用いても、重合体であるパラホルムアルデヒドを用いても良い。ホルムアルデヒドの仕込み比率はフェノール類の仕込みモル数に対して通常1:0.1〜1:0.95であり、好ましくは1:0.15〜0.9である。仕込み方法としてはホルマリン水溶液の場合、系中に滴下する方法が好ましく、パラホルムアルデヒドの場合は発熱に注意しながら所定量を徐々に分割添加する方法が好ましい。 The formaldehyde may be a formalin aqueous solution or a polymer, paraformaldehyde. The charging ratio of formaldehyde is usually 1: 0.1 to 1: 0.95, preferably 1: 0.15 to 0.9, relative to the number of moles of phenol. As a preparation method, in the case of a formalin aqueous solution, a method of dropping in the system is preferable, and in the case of paraformaldehyde, a method of gradually adding a predetermined amount while paying attention to heat generation is preferable.
酸触媒としては、シュウ酸、塩酸、硫酸、パラトルエンスルホン酸等が挙げられる。酸触媒の使用量はフェノール類の100重量部に対して、通常0.01〜10重量部、好ましくは0.05〜5重量部である。 Examples of the acid catalyst include oxalic acid, hydrochloric acid, sulfuric acid, paratoluenesulfonic acid and the like. The usage-amount of an acid catalyst is 0.01-10 weight part normally with respect to 100 weight part of phenols, Preferably it is 0.05-5 weight part.
反応温度は、通常50〜180℃であり、好ましくは60〜150℃である。反応時間としてはGPC(ゲルパーミエイションクロマトグラフィー)などを用いて分子量が変わらなくなった点を終点とすればよい。実際には、通常1〜20時間であり、好ましくは1.5〜15時間である。反応中に生成する水を、分留管などを用いて除去することは、反応を速やかに進行させる上において好ましい。 The reaction temperature is usually 50 to 180 ° C, preferably 60 to 150 ° C. The reaction time may be determined by using GPC (gel permeation chromatography) or the like as the end point where the molecular weight is not changed. In practice, it is usually 1 to 20 hours, preferably 1.5 to 15 hours. It is preferable to remove the water produced during the reaction using a fractionating tube or the like in order to rapidly advance the reaction.
反応終了後、水洗などを行って酸触媒を除去する。有機溶媒を用いても良く、無溶媒でも良い。有機溶媒を用いる場合はメチルイソブチルケトン、トルエン、メチルエチルケトンなどが好ましい。有機溶媒の量は、仕込んだフェノール類とホルマリンの合計重量に対して通常10〜300重量%であり、好ましくは20〜200重量%である。水洗後、エバポレーターなどを用いて加熱減圧下で未反応のフェノール類及び溶媒を除去する。このようにして得られたフェノールノボラック型樹脂は式(3)で表される。式(3)において、nは繰り返し数を表すが、平均値で通常10〜30程度のものを使用する。また、式(3)の化合物は、その軟化点が130〜200℃であるが、160〜180℃が好ましい。軟化点が130℃未満であるとフィルム形成能が悪くなり、全く形成できない場合もある。200℃を超えると硬化時の流動性が悪くなり、これに伴い接着性が悪くなる。 After completion of the reaction, the acid catalyst is removed by washing with water. An organic solvent may be used or no solvent may be used. When an organic solvent is used, methyl isobutyl ketone, toluene, methyl ethyl ketone and the like are preferable. The amount of the organic solvent is usually 10 to 300% by weight, preferably 20 to 200% by weight, based on the total weight of the charged phenols and formalin. After washing with water, unreacted phenols and solvent are removed under reduced pressure by heating using an evaporator or the like. The phenol novolac resin thus obtained is represented by the formula (3). In Formula (3), n represents the number of repetitions, but an average value of about 10 to 30 is usually used. Moreover, although the softening point of the compound of Formula (3) is 130-200 degreeC, 160-180 degreeC is preferable. When the softening point is lower than 130 ° C., the film forming ability is deteriorated and the film cannot be formed at all. If it exceeds 200 ° C., the fluidity at the time of curing will deteriorate, and the adhesiveness will deteriorate accordingly.
本発明のエポキシ樹脂組成物において前記式(1)または式(2)で表されるエポキシ樹脂は単独でまたは他のエポキシ樹脂と併用して使用することが出来る。併用する場合、式(1)または式(2)のエポキシ樹脂の全エポキシ樹脂中に占める割合は30重量%以上が好ましく、特に40重量%以上が好ましい。 In the epoxy resin composition of the present invention, the epoxy resin represented by the formula (1) or the formula (2) can be used alone or in combination with other epoxy resins. When used together, the proportion of the epoxy resin of formula (1) or formula (2) in the total epoxy resin is preferably 30% by weight or more, particularly preferably 40% by weight or more.
前記式(1)または式(2)で表されるエポキシ樹脂と併用し得る他のエポキシ樹脂の具体例としては、ノボラック型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビフェニル型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、ジシクロペンタジエン・フェノール重縮合型エポキシ樹脂、ビフェニルノボラック型エポキシ樹脂などが挙げられるがこれらは単独であるいは、2種以上併用してもよい。 Specific examples of other epoxy resins that can be used in combination with the epoxy resin represented by the formula (1) or formula (2) include novolac type epoxy resins, bisphenol F type epoxy resins, biphenyl type epoxy resins, and triphenylmethane types. An epoxy resin, a dicyclopentadiene / phenol polycondensation type epoxy resin, a biphenyl novolac type epoxy resin and the like may be mentioned, but these may be used alone or in combination of two or more.
本発明のエポキシ樹脂組成物において前記式(3)で表されるノボラック型樹脂は、エポキシ樹脂の硬化剤として作用し、単独でまたは他の硬化剤と併用して使用することが出来る。併用する場合、前記式(3)で表されるノボラック型樹脂の全硬化剤中に占める割合は30重量%以上が好ましく、特に40重量%以上が好ましい。 In the epoxy resin composition of the present invention, the novolac resin represented by the formula (3) acts as a curing agent for the epoxy resin and can be used alone or in combination with other curing agents. When used in combination, the proportion of the novolak resin represented by the formula (3) in the total curing agent is preferably 30% by weight or more, particularly preferably 40% by weight or more.
前記式(3)で表されるノボラック型樹脂と併用し得る他の硬化剤としては、例えばアミン系化合物、酸無水物系化合物、アミド系化合物、フェノ−ル系化合物などが挙げられる。用い得る硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、軟化点120℃以下程度のフェノールノボラック、及びこれらの変性物、イミダゾ−ル、BF3−アミン錯体、グアニジン誘導体などが挙げられるがこれらに限定されるものではない。これらは単独であるいは、2種以上併用してもよい。 Examples of other curing agents that can be used in combination with the novolak resin represented by the formula (3) include amine compounds, acid anhydride compounds, amide compounds, and phenol compounds. Specific examples of curing agents that can be used include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, polyamide resin synthesized from linolenic acid and ethylenediamine, phthalic anhydride, triethylene anhydride. Merit acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol novolac with a softening point of about 120 ° C. or less, And modified products thereof, imidazole, BF 3 -amine complexes, guanidine derivatives and the like, but are not limited thereto. These may be used alone or in combination of two or more.
本発明のエポキシ樹脂組成物において硬化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対して0.7〜1.2当量が好ましい。エポキシ基1当量に対して、0.7当量に満たない場合、あるいは1.2当量を超える場合、いずれも硬化が不完全となり良好な硬化物性が得られない恐れがある。 In the epoxy resin composition of the present invention, the amount of the curing agent used is preferably 0.7 to 1.2 equivalents relative to 1 equivalent of the epoxy group of the epoxy resin. When less than 0.7 equivalent or more than 1.2 equivalent with respect to 1 equivalent of epoxy group, curing may be incomplete and good cured properties may not be obtained.
また本発明のエポキシ樹脂組成物において硬化促進剤を併用しても差し支えない。用いうる硬化促進剤の具体例としては例えば2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾ−ル類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズ等の金属化合物等が挙げられる。硬化促進剤は本発明のエポキシ樹脂組成物の全エポキシ樹脂100重量部に対して0.1〜5.0重量部が必要に応じ用いられる。 In addition, a curing accelerator may be used in combination in the epoxy resin composition of the present invention. Specific examples of the curing accelerator that can be used include, for example, imidazoles such as 2-methylimidazole, 2-ethylimidazole, and 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, and 1,8-diaza. -Tertiary amines such as bicyclo (5,4,0) undecene-7, phosphines such as triphenylphosphine, and metal compounds such as tin octylate. The curing accelerator is used in an amount of 0.1 to 5.0 parts by weight as needed with respect to 100 parts by weight of the total epoxy resin of the epoxy resin composition of the present invention.
本発明のエポキシ樹脂組成物は必要により無機充填材を含有する。用いうる無機充填材の具体例としてはシリカ、アルミナ、タルク等が挙げられる。無機充填材は本発明のエポキシ樹脂組成物中において0〜90重量%を占める量が用いられる。更に本発明のエポキシ樹脂組成物には、シランカップリング剤、ステアリン酸、パルミチン酸、ステアリン酸亜鉛、ステアリン酸カルシウム等の離型剤、顔料等の種々の配合剤を添加することができる。 The epoxy resin composition of the present invention contains an inorganic filler as necessary. Specific examples of the inorganic filler that can be used include silica, alumina, talc and the like. The inorganic filler is used in an amount of 0 to 90% by weight in the epoxy resin composition of the present invention. Furthermore, various compounding agents such as silane coupling agents, mold release agents such as stearic acid, palmitic acid, zinc stearate, calcium stearate, and pigments can be added to the epoxy resin composition of the present invention.
本発明のエポキシ樹脂組成物は、上記各成分を均一に混合することにより得られる。本発明のエポキシ樹脂組成物は従来知られている方法と同様の方法で容易にその硬化物とすることができる。例えば、エポキシ樹脂と硬化剤、並びに必要により硬化促進剤及び無機充填材、配合剤とを必要に応じて押出機、ニーダ、ロール等を用いて均一になるまで充分に混合することより本発明のエポキシ樹脂組成物を得て、そのエポキシ樹脂組成物を溶融注型法あるいはトランスファー成型法やインジェクション成型法、圧縮成型法などによって成型し、更に80〜200℃で2〜10時間加熱することにより硬化物を得ることができる。 The epoxy resin composition of the present invention can be obtained by uniformly mixing the above components. The epoxy resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method. For example, the epoxy resin, the curing agent, and if necessary, the curing accelerator, the inorganic filler, and the compounding agent are mixed sufficiently until uniform using an extruder, a kneader, a roll, or the like as necessary. An epoxy resin composition is obtained, and the epoxy resin composition is molded by a melt casting method, a transfer molding method, an injection molding method, a compression molding method, or the like, and further cured by heating at 80 to 200 ° C. for 2 to 10 hours. You can get things.
本発明のワニスは、本発明のエポキシ樹脂組成物を溶剤に溶解して得られる。用いられる溶剤としては、例えばγ−ブチロラクトン類、N−メチルピロリドン(NMP)、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N,N−ジメチルイミダゾリジノン等のアミド系溶剤、テトラメチレンスルフォン等のスルフォン類、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルモノアセテート、プロピレングリコールモノブチルエーテル等のエーテル系溶剤、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン等のケトン系溶剤、トルエン、キシレンなどの芳香族系溶剤が挙げられる。溶剤は、得られたワニス中の固形分濃度が通常10〜80重量%、好ましくは20〜70重量%となる範囲で使用する。なお、本発明のワニスは、本発明のエポキシ樹脂組成物を調製する混合工程において、溶剤を併用して調製することができる。 The varnish of the present invention is obtained by dissolving the epoxy resin composition of the present invention in a solvent. Examples of the solvent used include amide solvents such as γ-butyrolactone, N-methylpyrrolidone (NMP), N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N, N-dimethylimidazolidinone and the like. , Sulfones such as tetramethylene sulfone, ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, propylene glycol monobutyl ether, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone And ketone solvents such as cyclohexanone and aromatic solvents such as toluene and xylene. The solvent is used in the range where the solid content concentration in the obtained varnish is usually 10 to 80% by weight, preferably 20 to 70% by weight. In addition, the varnish of this invention can be prepared using a solvent together in the mixing process which prepares the epoxy resin composition of this invention.
本発明のシートは上記のワニスをそれ自体公知のグラビアコート法、スクリーン印刷、メタルマスク法、スピンコート法などの各種塗工方法により平面状支持体上に乾燥後の厚さが所定の厚さ、例えば5〜100μmになるように塗布後乾燥して得られるが、どの塗工法を用いるかは基材の種類、形状、大きさ、塗膜の膜厚により適宜選択される。基材としては、例えばポリイミド、ポリアミド、ポリアミドイミド、ポリアリレート、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルケトン、ポリケトン、ポリエチレン、ポリプロピレン等の各種高分子及び/またはその共重合体から作られるフィルム、或いは銅箔等の金属箔であり、特に好ましくは、ポリイミド又は金属箔である。また更に加熱することによりシート状の硬化物を得ることが出来る。また、ワニスを前記高分子フィルムからなる剥離フィルム上に塗布し50〜100℃で5〜20分間乾燥させ溶剤を除去し半硬化の熱硬化性接着フィルムを得ることができる。 The sheet of the present invention has a predetermined thickness after drying the above varnish on a planar support by various known coating methods such as gravure coating, screen printing, metal mask, and spin coating. For example, although it is obtained by drying after coating so as to be 5 to 100 μm, which coating method is used is appropriately selected depending on the type, shape, size, and film thickness of the coating film. Examples of the base material include various polymers such as polyimide, polyamide, polyamideimide, polyarylate, polyethylene terephthalate (PET), polybutylene terephthalate, polyetheretherketone, polyetherimide, polyetherketone, polyketone, polyethylene, polypropylene, and the like. / Or a film made from the copolymer thereof, or a metal foil such as a copper foil, particularly preferably a polyimide or a metal foil. Further, a sheet-like cured product can be obtained by further heating. Moreover, a varnish is apply | coated on the peeling film which consists of the said polymer film, and it can dry for 5 to 20 minutes at 50-100 degreeC, a solvent is removed, and a semi-hardened thermosetting adhesive film can be obtained.
次に本発明を更に実施例、比較例により具体的に説明するが、以下において部は特に断わりのない限り重量部である。 Next, the present invention will be described more specifically with reference to Examples and Comparative Examples. In the following, parts are parts by weight unless otherwise specified.
実施例1
エポキシ樹脂としてエピコート1002(式(1)のエポキシ樹脂;ジャパンエポキシレジン株式会社製、エポキシ当量645g/eq、軟化点78℃)32.3部に対し硬化剤として下記式(4)
Example 1
Epicoat 1002 as an epoxy resin (epoxy resin of formula (1); manufactured by Japan Epoxy Resin Co., Ltd., epoxy equivalent 645 g / eq, softening point 78 ° C.) 32.3 parts as a curing agent with the following formula (4)
で表されるノボラック型樹脂(軟化点175.3℃、水酸基当量120g/eq、式中n=3.3(平均値))6.0部を、硬化促進剤としてトリフェニルホスフィン(TPP)0.32部を、溶剤としてメチルエチルケトン39部を混合し本発明のワニスを得た。 And 6.0 parts of a novolak resin (softening point 175.3 ° C., hydroxyl group equivalent 120 g / eq, where n = 3.3 (average value)) is used as a curing accelerator. .32 parts was mixed with 39 parts of methyl ethyl ketone as a solvent to obtain a varnish of the present invention.
上記の本発明のワニスをPETフィルム上に乾燥後の厚さが50μmになるように塗布し180℃で1時間加熱することにより硬化せしめ、PETフィルムを除去してシート状のサンプルを得た。得られたサンプルは折り曲げてもひび割れることがなく十分なフィルム形成能を有していた。またこのサンプルのガラス転移温度をDMA(動的粘弾性測定装置)により測定した。結果を表1に示す。さらに得られたワニスを、アプリケータを用いて乾燥後の厚さが10μmになるように厚さ18μの表面処理銅箔の粗面に塗布した。100℃で10分間乾燥させ溶剤を除去し得られた接着剤層に、厚さ25μmのポリイミドフィルム(ユーピレックス25SGA 宇部興産株式会社製)を重ね、熱板プレス装置を用い180℃で1時間硬化反応を行った。角度90度における剥離強度を観察した。結果を表1に示す。 The varnish of the present invention was applied onto a PET film so that the thickness after drying was 50 μm and cured by heating at 180 ° C. for 1 hour, and the PET film was removed to obtain a sheet-like sample. The obtained sample did not crack even when bent, and had sufficient film forming ability. Moreover, the glass transition temperature of this sample was measured by DMA (dynamic viscoelasticity measuring apparatus). The results are shown in Table 1. Furthermore, the obtained varnish was apply | coated to the rough surface of the surface-treated copper foil of thickness 18 micrometers so that the thickness after drying might be 10 micrometers using an applicator. An adhesive layer obtained by drying at 100 ° C. for 10 minutes to remove the solvent is layered with a polyimide film having a thickness of 25 μm (Upilex 25SGA manufactured by Ube Industries Co., Ltd.), and cured at 180 ° C. for 1 hour using a hot plate press. Went. The peel strength at an angle of 90 degrees was observed. The results are shown in Table 1.
実施例2
エポキシ樹脂をAER−8011(式(1)のエポキシ樹脂;旭化成エポキシ株式会社製、臭素含有量20重量%、エポキシ当量468g/eq、軟化点70℃)23.4部に対し前記式(4)で表されるノボラック型樹脂6.0部を、硬化促進剤としてトリフェニルホスフィン(TPP)0.23部を、溶剤としてメチルエチルケトン30部を混合し本発明のワニスを得た。
Example 2
The epoxy resin is AER-8011 (epoxy resin of formula (1); manufactured by Asahi Kasei Epoxy Co., Ltd., bromine content 20% by weight, epoxy equivalent 468 g / eq, softening point 70 ° C.) with respect to 23.4 parts of the above formula (4) The varnish of the present invention was obtained by mixing 6.0 parts of the novolak type resin represented by the formula, 0.23 part of triphenylphosphine (TPP) as a curing accelerator, and 30 parts of methyl ethyl ketone as a solvent.
上記の本発明のワニスをPETフィルム上に乾燥後の厚さが50μmになるように塗布し180℃で1時間加熱することにより硬化せしめ、PETフィルムを除去してシート状のサンプルを得た。得られたサンプルは折り曲げてもひび割れることがなく十分なフィルム形成能を有していた。またこのサンプルのガラス転移温度及び銅剥離強度を実施例1と同様に測定した。結果を表1に示す。 The varnish of the present invention was applied onto a PET film so that the thickness after drying was 50 μm and cured by heating at 180 ° C. for 1 hour, and the PET film was removed to obtain a sheet-like sample. The obtained sample did not crack even when bent, and had sufficient film forming ability. The glass transition temperature and copper peel strength of this sample were measured in the same manner as in Example 1. The results are shown in Table 1.
表1
実施例1 実施例2
ガラス転移温度(℃) 171.8 172.5
銅箔剥離強度(N/cm) 11.5 10.9
Table 1
Example 1 Example 2
Glass transition temperature (° C) 171.8 172.5
Copper foil peel strength (N / cm) 11.5 10.9
Claims (4)
(a)下記式(1)
(式中、mは繰り返し数を表す。Rは水素原子または臭素原子を表す。)
で表され、エポキシ当量が400g/eq以上であるエポキシ樹脂
及び
(b)下記式(3)
(式中、nは繰り返し数を表す。Rは水素原子または炭素数1〜4のアルキル基を表す。)
で表され軟化点が175.3〜200℃であるノボラック型樹脂
を含有するエポキシ樹脂組成物の層を有するシート。 On both sides or one side of the planar support (a) the following formula (1)
(In the formula, m represents the number of repetitions. R represents a hydrogen atom or a bromine atom.)
An epoxy resin having an epoxy equivalent of 400 g / eq or more and (b) the following formula (3)
(In the formula, n represents the number of repetitions. R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.)
The sheet | seat which has a layer of the epoxy resin composition containing the novolak-type resin which is represented by these and whose softening point is 175.3-200 degreeC .
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