JP4454115B2 - Seamless belt - Google Patents
Seamless belt Download PDFInfo
- Publication number
- JP4454115B2 JP4454115B2 JP2000208585A JP2000208585A JP4454115B2 JP 4454115 B2 JP4454115 B2 JP 4454115B2 JP 2000208585 A JP2000208585 A JP 2000208585A JP 2000208585 A JP2000208585 A JP 2000208585A JP 4454115 B2 JP4454115 B2 JP 4454115B2
- Authority
- JP
- Japan
- Prior art keywords
- bis
- carbon black
- resin
- acid
- insulating resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920005989 resin Polymers 0.000 claims description 52
- 239000011347 resin Substances 0.000 claims description 52
- 239000006229 carbon black Substances 0.000 claims description 32
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 229920000768 polyamine Polymers 0.000 claims description 11
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 10
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- 239000002002 slurry Substances 0.000 description 17
- 238000007639 printing Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 239000011550 stock solution Substances 0.000 description 11
- 229920001187 thermosetting polymer Polymers 0.000 description 9
- -1 resins, acrylic ester Chemical class 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000006232 furnace black Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- HMOZDINWBHMBSQ-UHFFFAOYSA-N 2-[3-(4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC(C=2OCCN=2)=C1 HMOZDINWBHMBSQ-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 239000006231 channel black Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000001991 dicarboxylic acids Chemical class 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 239000004962 Polyamide-imide Substances 0.000 description 3
- 239000004695 Polyether sulfone Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920002312 polyamide-imide Polymers 0.000 description 3
- 229920006393 polyether sulfone Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- VMKOFRJSULQZRM-UHFFFAOYSA-N 1-bromooctane Chemical compound CCCCCCCCBr VMKOFRJSULQZRM-UHFFFAOYSA-N 0.000 description 2
- 150000000376 2-oxazolines Chemical class 0.000 description 2
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 2
- IBOFVQJTBBUKMU-UHFFFAOYSA-N 4,4'-methylene-bis-(2-chloroaniline) Chemical compound C1=C(Cl)C(N)=CC=C1CC1=CC=C(N)C(Cl)=C1 IBOFVQJTBBUKMU-UHFFFAOYSA-N 0.000 description 2
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 2
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- JLLMOYPIVVKFHY-UHFFFAOYSA-N Benzenethiol, 4,4'-thiobis- Chemical compound C1=CC(S)=CC=C1SC1=CC=C(S)C=C1 JLLMOYPIVVKFHY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- JJOJFIHJIRWASH-UHFFFAOYSA-N icosanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCCCCCC(O)=O JJOJFIHJIRWASH-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 2
- 230000008707 rearrangement Effects 0.000 description 2
- 238000001175 rotational moulding Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- UXOXUHMFQZEAFR-UHFFFAOYSA-N 2,2',5,5'-Tetrachlorobenzidine Chemical group C1=C(Cl)C(N)=CC(Cl)=C1C1=CC(Cl)=C(N)C=C1Cl UXOXUHMFQZEAFR-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- KKKKCPPTESQGQH-UHFFFAOYSA-N 2-(4,5-dihydro-1,3-oxazol-2-yl)-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=NCCO1 KKKKCPPTESQGQH-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- KFNAHVKJFHDCSK-UHFFFAOYSA-N 2-[2-(4,5-dihydro-1,3-oxazol-2-yl)ethyl]-4,5-dihydro-1,3-oxazole Chemical compound N=1CCOC=1CCC1=NCCO1 KFNAHVKJFHDCSK-UHFFFAOYSA-N 0.000 description 1
- VOGDKZZTBPDRBD-UHFFFAOYSA-N 2-[2-(4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC=C1C1=NCCO1 VOGDKZZTBPDRBD-UHFFFAOYSA-N 0.000 description 1
- GZQKJQLFIGBEIE-UHFFFAOYSA-N 2-[4-(4,5-dihydro-1,3-oxazol-2-yl)butyl]-4,5-dihydro-1,3-oxazole Chemical compound N=1CCOC=1CCCCC1=NCCO1 GZQKJQLFIGBEIE-UHFFFAOYSA-N 0.000 description 1
- ZDNUPMSZKVCETJ-UHFFFAOYSA-N 2-[4-(4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=C(C=2OCCN=2)C=C1 ZDNUPMSZKVCETJ-UHFFFAOYSA-N 0.000 description 1
- LDXQWLJXDIZULP-UHFFFAOYSA-N 2-[6-(4,5-dihydro-1,3-oxazol-2-yl)hexyl]-4,5-dihydro-1,3-oxazole Chemical compound N=1CCOC=1CCCCCCC1=NCCO1 LDXQWLJXDIZULP-UHFFFAOYSA-N 0.000 description 1
- MPPNPBNSYXFIBF-UHFFFAOYSA-N 2-[8-(4,5-dihydro-1,3-oxazol-2-yl)octyl]-4,5-dihydro-1,3-oxazole Chemical compound N=1CCOC=1CCCCCCCCC1=NCCO1 MPPNPBNSYXFIBF-UHFFFAOYSA-N 0.000 description 1
- IUKSYUOJRHDWRR-UHFFFAOYSA-N 2-diazonio-4,6-dinitrophenolate Chemical compound [O-]C1=C([N+]#N)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IUKSYUOJRHDWRR-UHFFFAOYSA-N 0.000 description 1
- 125000003504 2-oxazolinyl group Chemical group O1C(=NCC1)* 0.000 description 1
- ZXTHWIZHGLNEPG-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC=C1 ZXTHWIZHGLNEPG-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- OMHOXRVODFQGCA-UHFFFAOYSA-N 4-[(4-amino-3,5-dimethylphenyl)methyl]-2,6-dimethylaniline Chemical compound CC1=C(N)C(C)=CC(CC=2C=C(C)C(N)=C(C)C=2)=C1 OMHOXRVODFQGCA-UHFFFAOYSA-N 0.000 description 1
- XECVXFWNYNXCBN-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylmethyl]aniline Chemical compound C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)C1=CC=CC=C1 XECVXFWNYNXCBN-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- REMDUNQHFJGFFA-UHFFFAOYSA-N 5-methyl-2-[2-(5-methyl-4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1C(C)CN=C1C1=CC=CC=C1C1=NCC(C)O1 REMDUNQHFJGFFA-UHFFFAOYSA-N 0.000 description 1
- ZXJMMQWZOFQDFC-UHFFFAOYSA-N 5-methyl-2-[3-(5-methyl-4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1C(C)CN=C1C1=CC=CC(C=2OC(C)CN=2)=C1 ZXJMMQWZOFQDFC-UHFFFAOYSA-N 0.000 description 1
- DEXHGMUVBNTXIN-UHFFFAOYSA-N 5-methyl-2-[4-(5-methyl-4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1C(C)CN=C1C1=CC=C(C=2OC(C)CN=2)C=C1 DEXHGMUVBNTXIN-UHFFFAOYSA-N 0.000 description 1
- CIIILUMBZOGKDF-UHFFFAOYSA-N 5-methyl-4,5-dihydro-1,3-oxazole Chemical compound CC1CN=CO1 CIIILUMBZOGKDF-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 150000001263 acyl chlorides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009435 amidation Effects 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000011951 cationic catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000011987 methylation Effects 0.000 description 1
- 238000007069 methylation reaction Methods 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000009469 supplementation Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Electrostatic Charge, Transfer And Separation In Electrography (AREA)
- Belt Conveyors (AREA)
- Delivering By Means Of Belts And Rollers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、電子写真複写機、レーザプリンタ、ファクシミリ、あるいはこれらを複合したOA機器に使用され、トナーや紙等を静電的に付着させて搬送・剥離可能な半導電性のシームレスベルトに関するものである。
【0002】
【従来の技術】
電子写真複写機等に中間転写ベルト等として使用される従来のシームレスベルトは、図示しないが、画像の品位や耐久性の観点から、ポリイミド樹脂、ポリアミドイミド樹脂、ポリカーボネート樹脂、ポリエーテルサルフォン樹脂、ポリアリレート樹脂、ポリフェニルエーテル樹脂等の合成樹脂を用いて成形される。具体的には、0.1〜20wt%のカーボンブラックが分散混合されるとともに、均一な膜厚を得るために回転成形等で成形され、使用機器に適合した表面抵抗、体積抵抗に設定される。
【0003】
【発明が解決しようとする課題】
ところで、近年の機器の高速化、多色化によるトナーの帯電特性の多様化、印刷品位向上等の観点から、トナーや紙等の付着や剥離は、迅速・確実に行う必要がある。したがって、シームレスベルトの表面抵抗は、体積抵抗よりも高いものが求められる。
しかしながら、印刷回数が増加すると、付着や剥離用に印加される高圧電圧により、シームレスベルトの表面抵抗は、徐々に低下し、付着や剥離が不確実化することとなる。この結果、印刷のかすれ、汚れ、位置ずれ等の印刷の不具合が発生し、ついには高価な部品モジュールを交換しなければならないという問題を生じる。
【0004】
本発明は、上記に鑑みなされたもので、印刷のかすれ、汚れ、位置ずれ等の印刷の不具合を抑制防止し、部品モジュールの寿命を延ばすことのできるシームレスベルトを提供することを目的としている。
【0005】
【課題を解決するための手段】
本発明者等は、上記課題について検討を重ねた結果、高電圧の印加により微小な電流が流れ、それに沿ってカーボンブラックの再配列が行われた結果、導電パスが形成されて表面抵抗値が低下することを発見した。これを受け、絶縁性樹脂中でカーボンブラックの動きを制限すれば、表面抵抗値の低下を押さえることができるのを見出し、本発明を完成させた。
すなわち、本発明においては上記課題を解決するため、絶縁性樹脂にカーボンブラックが分散混合され、遠心成形される半導電性のシームレスベルトであって、
絶縁性樹脂が、ビス(2‐オキサゾリン)化合物と、多価芳香族ポリアミンと、ジカルボン酸との少なくとも一方の反応生成物からなり、この絶縁性樹脂の一部がカーボン表面の不飽和結合あるいは活性水素と反応し、カーボンブラックを束縛してなり、
初期表面抵抗(S0)と初期体積抵抗(V0)との差(S0−V0)を、初期表面抵抗(S0)とパルス電流を流した後の経時表面抵抗(S1)との差(S0−S1)よりも大きくしたことを特徴としている。
【0006】
なお、上記絶縁性樹脂の一部がカーボン表面の不飽和結合、特にはπ電子あるいは活性水素と反応し、カーボンブラックを束縛してなることが好ましい。
また、上記絶縁性樹脂が、ビス(2‐オキサゾリン)化合物と、多価芳香族ポリアミンと、ジカルボン酸との少なくとも一方の反応生成物からなることが好ましい。
【0007】
絶縁性樹脂としては、ポリイミド樹脂、ポリアミドイミド樹脂、ポリカーボネート樹脂、ポリエーテルサルフォン樹脂、ポリアリレート樹脂、ポリフェニルエーテル樹脂等の高強度、高モジュラスの材料が選択される。これらの熱可塑性樹脂はカーボンブラック表面との反応性を有しないので、エポキシ樹脂、ポリウレタン樹脂、ビニルエステル樹脂、不飽和ポリエステル樹脂、アクリルエステル樹脂、ジシクロペンタジエン樹脂、ビスマレイミド樹脂等のカーボンブラック表面の不飽和結合、あるいはカルボキシル基や水酸基等の活性水素と反応する熱硬化性樹脂が必要になる。これらの熱硬化性樹脂は単独で使用することもできる。また、強度、耐久性、加工性の観点から、ビス(2‐オキサゾリン)化合物と、多価芳香族ポリアミンと、ジカルボン酸との少なくとも一方の反応生成物が好ましい。
【0008】
これを詳説すると、ビス(2‐オキサゾリン)化合物は、既に公知であり、一般式
【化1】
(R0は炭素間結合又は2価の炭化水素基を示し、R1、R2、R3、R4はそれぞれ水素、アルキル基又はアリール基を示す)で表される。具体例としては、2,2′‐ビス(2‐オキサゾリン)、2,2′‐ビス(5‐メチル‐2‐オキサゾリン)、2,2′‐ビス(5,5′‐ジメチル‐2‐オキサゾリン)、2,2′‐ビス(4,4,4′,4′‐テトラメチル‐2‐オキサゾリン)、1,2‐ビス(2‐オキサゾリン‐2‐イル)エタン、1,4‐ビス(2‐オキサゾリン‐2‐イル)ブタン、1,6‐ビス(2‐オキサゾリン‐2‐イル)ヘキサン、1,8‐ビス(2‐オキサゾリン‐2‐イル)オクタン、1,4‐ビス(2‐オキサゾリン‐2‐イル)シクロヘキサン、1,2‐ビス(2‐オキサゾリン‐2‐イル)ベンゼン、1,3‐ビス(2‐オキサゾリン‐2‐イル)ベンゼン、1,4‐ビス(2‐オキサゾリン‐2‐イル)ベンゼン、1,2‐ビス(5‐メチル‐2‐オキサゾリン‐2‐イル)ベンゼン、1,3‐ビス(5‐メチル‐2‐オキサゾリン‐2‐イル)ベンゼン、1,4‐ビス(5‐メチル‐2‐オキサゾリン‐2‐イル)ベンゼン、1,4‐ビス(4,4′‐ジメチル‐2‐オキサゾリン‐2‐イル)ベンゼン等があげられる。このうち、特に扱いやすい融点を有する1,3‐ビス(2‐オキサゾリン‐2‐イル)ベンゼンの使用が好ましい。これらは単独あるいは併用して用いてもかまわない。
【0009】
多価芳香族ポリアミンは、分子内に少なくとも2つのアミノ基を有していれば良く、単環式又は多環式の化合物であっても良い。この多価芳香族ポリアミンの具体例としては、例えば4,4′‐ジアミノビフェニル、3,3′‐ジメトキシ‐4,4′‐ジアミノビフェニル、4,4′‐ジアミノトリフェニルメタン、3,3′‐ジメチル‐4,4′‐ジアミノビフェニル、2,2′,5,5′‐テトラクロロ‐4,4′‐ジアミノビフェニル、4,4′‐メチレンビスアニリン、4,4′‐メチレンビス(2‐クロロアニリン)、2,2′‐ビス〔4‐(4‐アミノフェノキシ)フェニル〕プロパン、1,3‐ビス(4‐アミノフェノキシ)ベンゼン、1,3‐ビス(3‐アミノフェノキシ)ベンゼン、3,4′‐ジアミノジフェニルエーテル、4,4′‐ジアミノジフェニルスルフィド、4,4′‐ビス(アミノフェニル)アミン、4,4′‐〔1,3‐フェニレンビス(1‐メチルエチリデン)〕ビスアニリン、4,4′‐〔1,4‐フェニレンビス(1‐メチルエチリデン)〕ビスアニリン等があげられる。これら多価芳香族ポリアミンの中では、入手の容易性から4,4′‐メチレンビスアニリン、2,2′‐ビス〔4‐(4‐アミノフェノキシ)フェニル〕プロパン等が好ましい。
【0010】
可撓性の観点からは、4,4′‐ジアミノビフェニル、3,4′‐ジアミノジフェニルエーテル、4,4′‐ジアミノジフェニルスルフィド等が好ましく、4,4′‐メチレンビス(2‐クロロアニリン)、3,3′,5,5′‐テトラメチル‐4,4′‐ジアミノジフェニルメタン、3,3′,5,5′‐テトラエチル‐4,4′‐ジアミノジフェニルメタン、3,3′‐ジメチル‐5,5′‐ジエチル‐4,4′‐ジアミノジフェニルメタン等は溶融粘度を下げる効果があり、特に好ましい。これら多価芳香族ポリアミンは、単独あるいは2種以上の混合物として用いても良い。
【0011】
ジカルボン酸の具体例としては、例えばマロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、ドデカン二酸、エイコサン二酸、マレイン酸、フマル酸、イタコン酸、フタル酸、イソフタル酸、テレフタル酸、ナフタレンジカルボン酸、両末端がカルボキシル化されたポリエーテルグリコール、ポリエステルグリコール、ポリカーボネートオリゴマー、NBRオリゴマー等があげられる。ジカルボン酸の中では、アジピン酸、アゼライン酸、テレフタル酸等が好ましい。これらのジカルボン酸は、炭素数が大きいほど伸びが増し、可撓性を示す。さらに、多価芳香族ポリアミンと反応させる前に、予め過剰のビス(2‐オキサゾリン)化合物と反応させ、プレポリマー化すると架橋点間の距離をより大きくすることができ、可撓性を調整することが可能になる。これらジカルボン酸も、単独あるいは2種以上の混合物として用いることができる。
【0012】
ビス(2‐オキサゾリン)化合物(a)と、多価芳香族ポリアミン(b)と、ジカルボン酸(c)との混合モル比はビス(2‐オキサゾリン)のオキサゾリン基が開環してアミンあるいはカルボン酸と反応するものであるから、(a)/((b)+(c))は架橋密度に影響するものであり、1より大きくなければならず、これより小さいと十分な反応生成物はできない。(a)/((b)+(c))が2.0以上大きくてもあまり物性上影響はないが、大き過ぎるとピークを超えて物性の低下する傾向がみられる。(a)、(b)、(c)の3成分の混合物の溶融粘度は、その比が大きいほど低粘度になるが、中間転写ベルト等のベルトとして機能するには十分なモジュラスと伸びとが必要であり、1.0<(a)/((b)+(c))<=3.0が望ましく、1.1<(a)/((b)+(c))<=2.0がより望ましい。
この他、4,4′‐チオビスベンゼンチオール等のジチオールは、ビス(2‐オキサゾリン)化合物との反応性も高く、ジカルボン酸と同様に使用することができる。
【0013】
上記化合物のための反応触媒としては、カチオン触媒が用いられる。具体例としては、強酸、スルホン酸エステル、硫酸エステル、ルイス酸、脂肪族、又は脂環族炭素、例えばアルキル炭素やアルキレン炭素に結合したハロゲン原子を少なくとも1つ有するハロゲン化物等があげられる。触媒は、単独で使用しても良いし、併用しても良い。
【0014】
加工に必要な粘度は加工法によるが、一般的に行われる回転成形では、加熱溶融や、必要ならばトルエン、キシレン等の芳香族系、アセトン、MEK、MIBK等のケトン系、酢酸エチル、酢酸ブチル、酢酸カルビトール等のエステル系、モノグライム、ジグライム、トリグライム等のエーテル系、ジメチルアセトアミド、ジメチルホルムアミド、n‐メチルピロリドン等の窒素系の単一あるいは混合溶剤に溶かした溶液が用いられる。この溶液の粘度は、通常30〜3,000cp程度である。
【0015】
静電付着等に必要な108〜1014(Ω・cm)の半導電性を付与するカーボンブラックは、ファーネスブラック、酸化ファーネスブラック、チャンネルブラックなどから選択されるが、それらの表面には不飽和結合、あるいはカルボキシル基や水酸基等の活性水素があり、絶縁性樹脂の一部と反応し、機械的、熱的振動、又は電流の影響に伴うカーボンブラックの接触状態の変化が抑制される。また、絶縁性樹脂が直接カーボンブラックと反応しなくても、カーボンブラック表面の不飽和結合あるいは活性水素に結合する化合物と反応すれば、同様の効果が得られる。
しかしながら、過度に反応すると、成形前の樹脂溶液の粘度が上昇し、不安定化したり、抵抗値が高くなったり、あるいは成形前の物性が劣化することから、予めカーボンブラック表面をエステル化、アルキル化、シリル化、又はアミド化等し、反応性を低下させることが必要である。
【0016】
この前処理を説明すると、一次粒子径が5〜30nmで揮発分2〜20%のチャンネルブラックあるいは酸化処理されたファーネスブラック等と、アルコール類とを塩酸等の触媒を使用して反応させ、エステルを生成する。または、硫酸ジメチル等を使用してのメチル化、N‐ビニルカルバゾールやメチルスチレン等のビニルモノマーをカチオングラフトすること等により、アルキル化する。また、メチルクロロシラン、ヘキサメチルジシラザン等のシリカ剤を噴霧、加熱して前処理カーボンブラックを得ることができる。さらにまた、イソシアネートやオキサゾリン化合物を溶媒中で還流させ、前処理カーボンブラックを得ることもできる。
【0017】
イソシアネート及びオキサゾリン化合物は、カーボンブラック表面の不揮発分の活性水素に対し、効率良く反応し、活性水素を有するアミド結合、ウレタン結合を生成させるので、絶縁性樹脂の一部が反応する。また、ファーネスブラックは反応性基を有していないが、ルイス酸触媒下でアシルクロリドを反応させたり、アゾ化合物、パーオキサイド化合物の分解反応物をラジカル反応させて前処理カーボンブラックを得ることができる。
【0018】
反応させるモノマーは、分子量が大きいほど、あるいは反応させる量が多いほどカーボンブラックの反応性を低下させ、絶縁性樹脂による適度な補足ができる。但し、過剰だと補足が不充分となり、カーボンブラックが動いて再配列するので注意が必要である。カーボンブラックの前処理の状態は、カーボンブラックのpHを測定するか、アルカリ滴定を行い、定量化することができる。
【0019】
この他、シリカ、アルミナ、酸化チタン、水酸化アルミニウム、炭酸カルシウム、炭酸マグネシウム、タルク、クレー等の充填材も合成樹脂成形の分野で使用されている任意のものを用いることができる。但し、増粘をもたらすもの等は避ける必要がある。また、通常の合成樹脂成形の分野で使用されている安定剤、酸化防止剤、内部離型剤、顔料、分散剤、難燃剤等の任意の添加剤をも用いることが可能である。
【0020】
次に、本発明に係るシームレスベルトの製造方法について説明する。先ず、シームレスベルト用材料を調整するが、この場合には、加工時間と温度から適正な濃度、粘度、溶剤沸点を選択する。こうして加工時間や温度等を選択したら、絶縁性樹脂(少なくとも一部は熱硬化性樹脂)に必要な溶剤を加え、樹脂原液を得る。
【0021】
次いで、カーボンブラックを、通常の分散装置、例えば溶液状態あるいは乾燥状態でポットミル、サイクロイドミル、アッペクスミル、ダイノールミル、アトライターミル、ジェットミル等で十分解碎し、一次凝集体にする。一次凝集体を得たら、これを湿式あるいは乾式でモノマーと反応させ、必要ならば洗浄・乾燥して前処理カーボンブラックを調製し、これを樹脂原液に分散混合して半導電性の溶液あるいは溶融スラリーを得る。
【0022】
次いで、スラリーに硬化剤や触媒を添加し、予め回転させている管状の金型に注入する。この際、スラリーの溶融粘度は50ポイズ以下が良い。これは、50ポイズを超えると、均一な膜厚を得るのが困難になるからである。また、遠心成形用の金型は、約500〜3,000rpmで回転させ、120〜200℃に加熱しておく。溶剤を揮発するための乾燥、反応時間は、45〜200分ほど必要であるが、熱硬化性樹脂単独の場合には、加熱時間が短く、5〜30分ほどで良い。こうして所定の時間が経過し、その後、金型を室温まで冷却すれば、50〜200μmの厚さを有するエンドレスで可撓性のシームレスベルトを作製することができる。
【0023】
ところで、シームレスベルトの抵抗値は、印刷回数が増すにしたがい、付着や剥離用の印加電圧により、表面抵抗値が徐々に低下する。そこで、トナーや紙等の付着と剥離が確実に行われることを見越して、初期においては、体積抵抗値よりも約2桁以上高い表面抵抗値が望まれ、数万から数十万回の印刷後でも表面抵抗の減少が2桁以下程度であることが実用的な限界となっている。この実際の経時変化を実機で確認するのは時間がかかるが、促進試験によれば把握することができる。
【0024】
すなわち、シームレスベルトを2枚の導電性の弾性電極により印刷用紙と共に挟持し、シームレスベルトに0.02mA/cm2以下のパルス電流を耐用印刷回数の5〜10倍のパルス数をかければ、表面抵抗値の変化を確認することができる。この時の印加電圧は、シームレスベルトの抵抗や弾性電極の電極面積で変化するが、おおよそ数百〜数千ボルトである。抵抗の測定には、任意の測定器を使用することができるが、三菱化学株式会社製のハイレスター〔商品名〕等が一般に使用される。
【0025】
【実施例】
以下、本発明に係るシームレスベルトの実施例を比較例と共に説明する。
実施例1の調整
先ず、ポリエーテルサルフォン〔住友化学株式会社製 商品名4800G〕800gと、エポキシ当量475でビスフェノールAタイプのエポキシ樹脂200gと、ポリアミド系硬化剤100g〔旭電化株式会社製 商品名EH‐333〕とをN‐メチルピロリドンとトルエン〔混合wt比9:1〕に溶解し、固形分15%の樹脂溶液を調製した。この樹脂溶液の粘度は6ポイズであった。
【0026】
樹脂溶液を調製したら、ファーネスブラック〔三菱化学株式会社製 商品名#2400〕を3規定の硝酸中で60℃、1時間反応させ、濾過・水洗し、乾燥させたカーボンブラックを樹脂溶液の固形分に対して1.7wt%配合し、ビーズミルで16時間分散混合してスラリーを得た。こうしてスラリーを得たら、このスラリーを1,000rpmで回転している金型に注入し、50分間乾燥硬化させ、その後、金型を常温まで冷却して試料Aを作製した。金型は、内周面がクロムメッキされたφ200mmの鋼管とし、135℃で加熱した。スラリーをさらに135℃、50分間還流操作し、上記と同様に試料Bを作製し、絶縁性樹脂との反応確認用とした。
【0027】
実施例2の調整
先ず、1,3‐ビス(2‐オキサゾリン‐2‐イル)ベンゼン238g(1.1モル)と、4,4′‐〔1,4‐フェニレンビス(1‐メチルエチリデン)〕ビスアニリン275g(0.8モル)と、4,4′‐チオビスベンゼンチオール50g(0.2モル)とを秤量し、150℃のオイルバス中に容器に取り、ミキサで攪拌した。こうしてミキサで攪拌したところ、約15分後に全て溶融したので、さらに2時間攪拌し、熱硬化性樹脂原液を調製した。この熱硬化性樹脂原液を120℃まで冷却し、ポリカーボネート〔帝人化成株式会社製 商品名K1285〕のジメチルフォルムアミド溶液280gと混合し、10時間かけて溶剤を揮発し、樹脂原液を得た。この樹脂原液の粘度は120℃で12ポイズであった。
【0028】
次いで、樹脂原液にチャンネルブラック〔デグサ株式会社製 商品名150T〕8wt%のフェニルイソシアネートを酢酸エチル溶液中で80°、1時間反応させた。乾燥させた前処理カーボンブラックを樹脂原液の固形分に対して4.8wt配合し、高速攪拌機で16時間分散混合した。こうしてスラリーを得たら、このスラリーに臭化オクチルを2phr添加混合するとともに、スラリーを2,000rpmで回転している金型に直ちに注入し、15分間乾燥硬化させ、その後、金型を常温まで冷却して試料Aを作製した。金型は、内周面がクロムメッキされたφ200mmの鋼管とし、145℃で加熱した。スラリーをさらに145℃、15分間加熱操作し、上記と同様に試料Bを作製し、絶縁性樹脂との反応確認用とした。
【0029】
実施例3の調整
先ず、1,3‐ビス(2‐オキサゾリン‐2‐イル)ベンゼン303g(1.4モル)と、4,4′‐メチレンビスアニリン198g(1.0モル)とを秤量し、150℃のオイルバス中に容器に取り、ミキサで攪拌した。こうしてミキサで攪拌したところ、約15分後に全て溶融したので、さらに2時間攪拌し、熱硬化性樹脂原液を調製した。この熱硬化性樹脂原液の粘度は120℃で2ポイズであった。この熱硬化性樹脂原液に酸化チャンネルブラック〔デグサ株式会社製 商品名#550〕8wt%のフェニルオキサゾリンを酢酸エチル溶液中で80°、3時間反応させた。
【0030】
乾燥させた前処理カーボンブラックを樹脂原液の固形分に対して4.8wt配合し、高速攪拌機で16時間分散混合した。こうしてスラリーを得たら、このスラリーに臭化オクチルを2phr添加混合するとともに、スラリーを2,000rpmで回転している金型に直ちに注入し、10分間乾燥硬化させ、その後、金型を常温まで冷却して試料Aを作製した。金型は、内周面がクロムメッキされたφ200mmの鋼管とし、140℃で加熱した。スラリーをさらに145℃、50分間加熱操作し、上記と同様に試料Bを作製し、絶縁性樹脂との反応確認用とした。
【0031】
比較例1の調整
カーボンブラックが酸化処理されていないことを除き、実施例1と同様にして試料A、試料Bを作製した。
比較例2の調整
ポリアミドイミドワニス〔東洋紡績株式会社製 商品名NX100〕(固形分15%、溶剤、N‐メチルピロリドン)に、実施例2で示す前処理カーボンブラックを樹脂溶液の固形分に対し2.1wt%配合し、ビーズミルで16時間分散混合し、スラリーを得た。得られたスラリーを実施例2と同様に処理し、試料A、試料Bを作製した。
【0032】
反応確認
試料A、試料Bの体積抵抗をハイレスターで測定した。この測定に際しては、500Vを印加し、測定5点の平均値で算出した。
促進試験
試料A、試料Bの体積抵抗と表面抵抗とをハイレスターで測定した。この測定に際しては、500Vを印加し、測定5点の平均値で算出した。続いて、試料Aに印刷用紙を載せ、厚さ1mmの導電性シリコーンゴム電極(比抵抗5Ω・cm)で挟み、20gf/cm2になるよう錘を載せた。こうして錘を載せたら、導電性シリコーンゴム電極に0.015mA/cm2の電流が流れるように商業波の高電圧を一定の電圧で印加し、16時間印加後、表面抵抗を再度測定した。
【0033】
【表1】
【0034】
【発明の効果】
以上のように本発明によれば、絶縁性樹脂の一部がカーボンブラックと反応するので、印刷回数の増加にしたがいカーボンブラックの再配列を起こす微小な動きを規制することが可能になる。そしてこれを通じ、印刷のかすれ、汚れ、位置ずれ等の印刷の不具合発生を抑制することができるとともに、部品モジュールの長期使用が期待できるという産業上の利用価値のきわめて高いシームレスベルトを提供することができるという効果がある。
また、絶縁性樹脂が、ビス(2‐オキサゾリン)化合物と、多価芳香族ポリアミンと、ジカルボン酸との少なくとも一方の反応生成物なので、優れた強度、耐久性、加工性を得ることができる。また、機械的、熱的振動、又は電流の影響に伴うカーボンブラックの接触状態の変化を抑制することができる。 [0001]
BACKGROUND OF THE INVENTION
The present invention relates to a semiconductive seamless belt which can be used for an electrophotographic copying machine, a laser printer, a facsimile machine, or an OA device combining these, and can be transported and peeled off by electrostatically attaching toner or paper. It is.
[0002]
[Prior art]
A conventional seamless belt used as an intermediate transfer belt or the like in an electrophotographic copying machine or the like is not shown, but from the viewpoint of image quality and durability, polyimide resin, polyamideimide resin, polycarbonate resin, polyethersulfone resin, It is molded using a synthetic resin such as polyarylate resin or polyphenyl ether resin. Specifically, 0.1 to 20 wt% of carbon black is dispersed and mixed, and is formed by rotational molding or the like to obtain a uniform film thickness, and is set to a surface resistance and volume resistance suitable for the equipment used. .
[0003]
[Problems to be solved by the invention]
By the way, from the viewpoint of increasing the speed of devices in recent years, diversifying the charging characteristics of toner by increasing the number of colors, improving the printing quality, and the like, it is necessary to quickly and reliably attach or remove toner or paper. Therefore, the surface resistance of the seamless belt is required to be higher than the volume resistance.
However, when the number of times of printing increases, the surface resistance of the seamless belt gradually decreases due to the high voltage applied for adhesion and separation, and adhesion and separation become uncertain. As a result, printing defects such as faint printing, smudges, and misregistration occur, and finally an expensive component module must be replaced.
[0004]
The present invention has been made in view of the above, and an object of the present invention is to provide a seamless belt that can suppress and prevent printing defects such as fading, smudges, and misregistration, and extend the life of a component module.
[0005]
[Means for Solving the Problems]
As a result of repeated investigations on the above problems, the present inventors have conducted a minute current by applying a high voltage, and as a result of rearrangement of carbon black along with it, a conductive path is formed and the surface resistance value is reduced. I found it to decline. In response, the inventors have found that if the movement of carbon black in the insulating resin is restricted, the decrease in surface resistance can be suppressed, and the present invention has been completed.
That is, in order to solve the above-described problems in the present invention, a semi-conductive seamless belt in which carbon black is dispersed and mixed in an insulating resin and centrifugally molded,
The insulating resin comprises at least one reaction product of a bis (2-oxazoline) compound, a polyvalent aromatic polyamine, and a dicarboxylic acid, and a part of the insulating resin is an unsaturated bond or activity on the carbon surface. Reacts with hydrogen and binds carbon black,
The difference (S0−V0) between the initial surface resistance (S0) and the initial volume resistance (V0) is the difference between the initial surface resistance (S0) and the surface resistance (S1) with time after passing the pulse current (S0−S1). ) Is larger than).
[0006]
In addition, it is preferable that a part of the insulating resin reacts with an unsaturated bond on the carbon surface, particularly π electrons or active hydrogen, and binds carbon black.
The insulating resin is preferably composed of at least one reaction product of a bis (2-oxazoline) compound, a polyvalent aromatic polyamine, and a dicarboxylic acid.
[0007]
As the insulating resin, a high-strength, high-modulus material such as polyimide resin, polyamideimide resin, polycarbonate resin, polyether sulfone resin, polyarylate resin, polyphenyl ether resin, or the like is selected. Since these thermoplastic resins have no reactivity with the carbon black surface, carbon black surfaces such as epoxy resins, polyurethane resins, vinyl ester resins, unsaturated polyester resins, acrylic ester resins, dicyclopentadiene resins, bismaleimide resins, etc. A thermosetting resin that reacts with an active bond such as an unsaturated bond or a carboxyl group or a hydroxyl group is required. These thermosetting resins can also be used alone. In addition, from the viewpoint of strength, durability, and processability, a reaction product of at least one of a bis (2-oxazoline) compound, a polyvalent aromatic polyamine, and a dicarboxylic acid is preferable.
[0008]
In detail, bis (2-oxazoline) compounds are already known and have the general formula:
(R 0 represents a carbon-carbon bond or a divalent hydrocarbon group, and R 1 , R 2 , R 3 , and R 4 represent hydrogen, an alkyl group, or an aryl group, respectively). Specific examples include 2,2'-bis (2-oxazoline), 2,2'-bis (5-methyl-2-oxazoline), 2,2'-bis (5,5'-dimethyl-2-oxazoline) ), 2,2'-bis (4,4,4 ', 4'-tetramethyl-2-oxazoline), 1,2-bis (2-oxazolin-2-yl) ethane, 1,4-bis (2 -Oxazolin-2-yl) butane, 1,6-bis (2-oxazolin-2-yl) hexane, 1,8-bis (2-oxazolin-2-yl) octane, 1,4-bis (2-oxazoline) -2-yl) cyclohexane, 1,2-bis (2-oxazolin-2-yl) benzene, 1,3-bis (2-oxazolin-2-yl) benzene, 1,4-bis (2-oxazoline-2 -Yl) benzene, 1,2-bis (5-methyl-2-oxazolin-2-yl) benzene Zen, 1,3-bis (5-methyl-2-oxazolin-2-yl) benzene, 1,4-bis (5-methyl-2-oxazolin-2-yl) benzene, 1,4-bis (4 4'-dimethyl-2-oxazolin-2-yl) benzene and the like. Of these, use of 1,3-bis (2-oxazolin-2-yl) benzene having a particularly easy-to-handle melting point is preferred. These may be used alone or in combination.
[0009]
The polyvalent aromatic polyamine only needs to have at least two amino groups in the molecule, and may be a monocyclic or polycyclic compound. Specific examples of this polyaromatic polyamine include, for example, 4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 4,4'-diaminotriphenylmethane, 3,3 '-Dimethyl-4,4'-diaminobiphenyl, 2,2 ', 5,5'-tetrachloro-4,4'-diaminobiphenyl, 4,4'-methylenebisaniline, 4,4'-methylenebis (2- Chloroaniline), 2,2'-bis [4- (4-aminophenoxy) phenyl] propane, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 3, , 4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 4,4'-bis (aminophenyl) amine, 4,4 '-[1,3-phenylenebis (1-methyl) Chiriden)] bisaniline, 4,4 '- [1,4-phenylene bis (1-methylethylidene)] bisaniline, and the like. Among these polyvalent aromatic polyamines, 4,4′-methylenebisaniline, 2,2′-bis [4- (4-aminophenoxy) phenyl] propane and the like are preferable because of their availability.
[0010]
From the viewpoint of flexibility, 4,4′-diaminobiphenyl, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl sulfide and the like are preferable, and 4,4′-methylenebis (2-chloroaniline), 3 , 3 ', 5,5'-tetramethyl-4,4'-diaminodiphenylmethane, 3,3', 5,5'-tetraethyl-4,4'-diaminodiphenylmethane, 3,3'-dimethyl-5,5 '-Diethyl-4,4'-diaminodiphenylmethane and the like are particularly preferred because they have an effect of lowering the melt viscosity. These polyvalent aromatic polyamines may be used alone or as a mixture of two or more.
[0011]
Specific examples of the dicarboxylic acid include, for example, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid, eicosanedioic acid, maleic acid, fumaric acid, itaconic acid, Examples thereof include phthalic acid, isophthalic acid, terephthalic acid, naphthalene dicarboxylic acid, polyether glycol, polyester glycol, polycarbonate oligomer, NBR oligomer having both ends carboxylated. Among dicarboxylic acids, adipic acid, azelaic acid, terephthalic acid and the like are preferable. These dicarboxylic acids increase in elongation as the carbon number increases, and exhibit flexibility. Furthermore, when reacted with an excess of bis (2-oxazoline) compound in advance and then prepolymerized before reacting with the polyvalent aromatic polyamine, the distance between the crosslinking points can be increased, and flexibility is adjusted. It becomes possible. These dicarboxylic acids can also be used alone or as a mixture of two or more.
[0012]
The mixing molar ratio of the bis (2-oxazoline) compound (a), the polyvalent aromatic polyamine (b), and the dicarboxylic acid (c) is such that the oxazoline group of bis (2-oxazoline) is ring-opened to form an amine or carboxylic acid. Since it reacts with acid, (a) / ((b) + (c)) affects the crosslink density and must be greater than 1, otherwise less than enough Can not. Even if (a) / ((b) + (c)) is 2.0 or more, there is not much influence on the physical properties, but if it is too large, there is a tendency that the physical properties decrease beyond the peak. The melt viscosity of the mixture of the three components (a), (b), and (c) decreases as the ratio increases. However, the modulus and elongation sufficient to function as a belt such as an intermediate transfer belt can be obtained. 1.0 <(a) / ((b) + (c)) <= 3.0, 1.1 <(a) / ((b) + (c)) <= 2. 0 is more desirable.
In addition, dithiols such as 4,4′-thiobisbenzenethiol have high reactivity with bis (2-oxazoline) compounds and can be used in the same manner as dicarboxylic acids.
[0013]
Cationic catalysts are used as reaction catalysts for the above compounds. Specific examples include halides having at least one halogen atom bonded to a strong acid, sulfonic acid ester, sulfuric acid ester, Lewis acid, aliphatic or alicyclic carbon such as alkyl carbon or alkylene carbon. The catalyst may be used alone or in combination.
[0014]
Viscosity required for processing depends on the processing method. In general rotational molding, heat melting, if necessary, aromatics such as toluene and xylene, ketones such as acetone, MEK and MIBK, ethyl acetate, acetic acid A solution dissolved in an ester type such as butyl or carbitol acetate, an ether type such as monoglyme, diglyme or triglyme, or a nitrogen type single or mixed solvent such as dimethylacetamide, dimethylformamide or n-methylpyrrolidone is used. The viscosity of this solution is usually about 30 to 3,000 cp.
[0015]
Carbon black imparting a semiconductivity of 10 8 to 10 14 (Ω · cm) necessary for electrostatic adhesion or the like is selected from furnace black, oxidized furnace black, channel black, etc. There is a saturated bond, or active hydrogen such as a carboxyl group or a hydroxyl group, which reacts with a part of the insulating resin, and changes in the contact state of carbon black due to the influence of mechanical, thermal vibration, or current are suppressed. Even if the insulating resin does not directly react with carbon black, the same effect can be obtained by reacting with an unsaturated bond on the surface of carbon black or a compound bonded to active hydrogen.
However, if it reacts excessively, the viscosity of the resin solution before molding increases and becomes unstable, the resistance value becomes high, or the physical properties before molding deteriorate. It is necessary to reduce the reactivity by oxidization, silylation or amidation.
[0016]
This pretreatment will be explained by reacting an alcohol with a channel black having a primary particle size of 5 to 30 nm and a volatile content of 2 to 20% or an oxidized furnace black using a catalyst such as hydrochloric acid. Is generated. Alternatively, alkylation is carried out by methylation using dimethyl sulfate or the like, or by cation grafting vinyl monomers such as N-vinylcarbazole and methylstyrene. Further, a pretreated carbon black can be obtained by spraying and heating a silica agent such as methylchlorosilane and hexamethyldisilazane. Furthermore, it is possible to obtain a pretreated carbon black by refluxing an isocyanate or an oxazoline compound in a solvent.
[0017]
The isocyanate and oxazoline compounds react efficiently with the active hydrogen content on the surface of the carbon black to generate amide bonds and urethane bonds having active hydrogen, so that a part of the insulating resin reacts. Although furnace black does not have a reactive group, pretreatment carbon black can be obtained by reacting acyl chloride under a Lewis acid catalyst or radical reaction of decomposition products of azo compounds and peroxide compounds. it can.
[0018]
As the monomer to be reacted has a higher molecular weight or a larger amount to be reacted, the reactivity of the carbon black is lowered and can be appropriately supplemented with an insulating resin. However, if it is excessive, supplementation will be insufficient, and carbon black will move and rearrange, so care must be taken. The state of pretreatment of carbon black can be quantified by measuring the pH of carbon black or performing alkali titration.
[0019]
In addition, fillers such as silica, alumina, titanium oxide, aluminum hydroxide, calcium carbonate, magnesium carbonate, talc, and clay can also be used as desired in the field of synthetic resin molding. However, it is necessary to avoid those that cause thickening. Moreover, it is possible to use arbitrary additives such as stabilizers, antioxidants, internal mold release agents, pigments, dispersants, flame retardants and the like used in the field of ordinary synthetic resin molding.
[0020]
Next, the manufacturing method of the seamless belt which concerns on this invention is demonstrated. First, the material for the seamless belt is adjusted. In this case, an appropriate concentration, viscosity, and solvent boiling point are selected from the processing time and temperature. When the processing time, temperature, and the like are selected in this manner, a necessary solvent is added to the insulating resin (at least part of the thermosetting resin) to obtain a resin stock solution.
[0021]
Next, the carbon black is sufficiently undissolved in a normal dispersion apparatus such as a pot mill, a cycloid mill, an apex mill, a dinol mill, an attritor mill, a jet mill or the like in a solution state or a dry state to form primary aggregates. Once the primary agglomerates are obtained, they are reacted with the monomer in a wet or dry manner, and if necessary, washed and dried to prepare pretreated carbon black, which is dispersed and mixed in the resin stock solution to produce a semiconductive solution or melt. A slurry is obtained.
[0022]
Next, a curing agent or a catalyst is added to the slurry and poured into a tubular mold that has been rotated in advance. At this time, the melt viscosity of the slurry is preferably 50 poise or less. This is because if it exceeds 50 poise, it is difficult to obtain a uniform film thickness. The centrifugal mold is rotated at about 500 to 3,000 rpm and heated to 120 to 200 ° C. The drying and reaction time for volatilizing the solvent needs about 45 to 200 minutes. However, in the case of the thermosetting resin alone, the heating time is short and may be about 5 to 30 minutes. Thus, if predetermined time passes and a metal mold | die is cooled to room temperature after that, the endless flexible seamless belt which has a thickness of 50-200 micrometers can be produced.
[0023]
By the way, the resistance value of the seamless belt gradually decreases as the number of times of printing increases due to the applied voltage for adhesion and peeling. Therefore, in anticipation of reliable adhesion and peeling of toner and paper, a surface resistance value that is approximately two orders of magnitude higher than the volume resistance value is desired in the initial stage, and tens of thousands to hundreds of thousands of printings are desired. Even after that, the decrease in surface resistance is about two orders of magnitude or less, which is a practical limit. Although it takes time to confirm this actual change with time, it can be determined by an accelerated test.
[0024]
That is, if a seamless belt is sandwiched with two sheets of conductive elastic electrodes together with printing paper, a pulse current of 0.02 mA / cm 2 or less is applied to the seamless belt at a pulse number of 5 to 10 times the number of durable printings, The change in resistance value can be confirmed. The applied voltage at this time varies depending on the resistance of the seamless belt and the electrode area of the elastic electrode, but is approximately several hundred to several thousand volts. An arbitrary measuring device can be used for the measurement of resistance, but a Hiresta [trade name] manufactured by Mitsubishi Chemical Corporation is generally used.
[0025]
【Example】
Examples of seamless belts according to the present invention will be described below together with comparative examples.
Preparation of Example 1 First, 800 g of polyethersulfone (trade name 4800G, manufactured by Sumitomo Chemical Co., Ltd.), 200 g of bisphenol A type epoxy resin with an epoxy equivalent of 475, and 100 g of polyamide-based curing agent (trade name, manufactured by Asahi Denka Co., Ltd.) EH-333] was dissolved in N-methylpyrrolidone and toluene (mixed wt ratio 9: 1) to prepare a resin solution having a solid content of 15%. The viscosity of this resin solution was 6 poise.
[0026]
Once the resin solution is prepared, furnace black (trade name # 2400, manufactured by Mitsubishi Chemical Corporation) is reacted in 3N nitric acid at 60 ° C. for 1 hour, filtered, washed with water, and dried carbon black. The slurry was mixed with 1.7% by weight and dispersed and mixed in a bead mill for 16 hours. When the slurry was thus obtained, this slurry was poured into a mold rotating at 1,000 rpm, dried and cured for 50 minutes, and then the mold was cooled to room temperature to prepare Sample A. The mold was a φ200 mm steel pipe with an inner peripheral surface plated with chromium, and was heated at 135 ° C. The slurry was further refluxed at 135 ° C. for 50 minutes to prepare Sample B in the same manner as described above and used for confirming the reaction with the insulating resin.
[0027]
Preparation of Example 2 First, 238 g (1.1 mol) of 1,3-bis (2-oxazolin-2-yl) benzene and 4,4 ′-[1,4-phenylenebis (1-methylethylidene)] Bisaniline (275 g, 0.8 mol) and 4,4′-thiobisbenzenethiol (50 g, 0.2 mol) were weighed, placed in a 150 ° C. oil bath and stirred with a mixer. When the mixture was stirred in this manner, all melted after about 15 minutes, and the mixture was further stirred for 2 hours to prepare a thermosetting resin stock solution. This thermosetting resin stock solution was cooled to 120 ° C., mixed with 280 g of a dimethylformamide solution of polycarbonate [trade name K1285 manufactured by Teijin Chemicals Ltd.], and the solvent was evaporated over 10 hours to obtain a resin stock solution. The viscosity of this resin stock solution was 12 poise at 120 ° C.
[0028]
Then, 8 wt% of phenyl isocyanate was reacted in the ethyl acetate solution with channel black (trade name 150T, manufactured by Degussa Co., Ltd.) in an ethyl acetate solution for 1 hour. 4.8 wt% of the dried pretreated carbon black was blended with respect to the solid content of the resin stock solution, and dispersed and mixed with a high-speed stirrer for 16 hours. When the slurry is thus obtained, 2 phr of octyl bromide is added and mixed with the slurry, and the slurry is immediately poured into a rotating mold at 2,000 rpm, dried and cured for 15 minutes, and then the mold is cooled to room temperature. Thus, sample A was prepared. The mold was a φ200 mm steel pipe with an inner peripheral surface plated with chromium, and heated at 145 ° C. The slurry was further heated at 145 ° C. for 15 minutes to prepare Sample B in the same manner as described above, and used for confirming the reaction with the insulating resin.
[0029]
Preparation of Example 3 First, 303 g (1.4 mol) of 1,3-bis (2-oxazolin-2-yl) benzene and 198 g (1.0 mol) of 4,4′-methylenebisaniline were weighed. In a 150 ° C. oil bath, the container was taken and stirred with a mixer. When the mixture was stirred in this manner, all melted after about 15 minutes, and the mixture was further stirred for 2 hours to prepare a thermosetting resin stock solution. The viscosity of this thermosetting resin stock solution was 2 poise at 120 ° C. Oxidized channel black (trade name # 550, manufactured by Degussa Co., Ltd.) 8 wt% phenyloxazoline was reacted with this thermosetting resin stock solution in an ethyl acetate solution at 80 ° C. for 3 hours.
[0030]
4.8 wt% of the dried pretreated carbon black was blended with respect to the solid content of the resin stock solution, and dispersed and mixed with a high-speed stirrer for 16 hours. When the slurry is thus obtained, 2 phr of octyl bromide is added to and mixed with the slurry, and the slurry is immediately poured into a rotating mold at 2,000 rpm, dried and cured for 10 minutes, and then the mold is cooled to room temperature. Thus, sample A was prepared. The mold was a φ200 mm steel pipe with an inner peripheral surface plated with chromium, and heated at 140 ° C. The slurry was further heated at 145 ° C. for 50 minutes to prepare Sample B in the same manner as described above and used for confirming the reaction with the insulating resin.
[0031]
Sample A and Sample B were prepared in the same manner as in Example 1 except that the adjusted carbon black of Comparative Example 1 was not oxidized.
Preparation of Comparative Example 2 Polyamideimide varnish [trade name NX100 manufactured by Toyobo Co., Ltd.] (solid content 15%, solvent, N-methylpyrrolidone), the pretreated carbon black shown in Example 2 was added to the solid content of the resin solution. 2.1 wt% was blended and dispersed and mixed in a bead mill for 16 hours to obtain a slurry. The obtained slurry was processed in the same manner as in Example 2 to prepare Sample A and Sample B.
[0032]
The volume resistances of the reaction confirmation samples A and B were measured with a high-reester. In this measurement, 500 V was applied, and the average value of five measurements was calculated.
The volume resistance and surface resistance of the accelerated test sample A and sample B were measured with a high-rester. In this measurement, 500 V was applied, and the average value of five measurements was calculated. Subsequently, a printing paper was placed on the sample A, sandwiched between conductive silicone rubber electrodes (specific resistance 5 Ω · cm) having a thickness of 1 mm, and a weight was placed so as to be 20 gf / cm 2 . After placing the weight in this way, a commercial wave high voltage was applied at a constant voltage so that a current of 0.015 mA / cm 2 would flow through the conductive silicone rubber electrode, and after 16 hours of application, the surface resistance was measured again.
[0033]
[Table 1]
[0034]
【The invention's effect】
As described above, according to the present invention, since a part of the insulating resin reacts with carbon black, it is possible to regulate minute movement that causes rearrangement of carbon black as the number of printings increases. Through this, it is possible to provide a seamless belt with extremely high industrial utility value that can suppress the occurrence of printing defects such as faint printing, smudges, misalignment, etc. and can be expected to be used for a long period of time. There is an effect that can be done.
In addition, since the insulating resin is a reaction product of at least one of a bis (2-oxazoline) compound, a polyvalent aromatic polyamine, and a dicarboxylic acid, excellent strength, durability, and processability can be obtained. In addition, changes in the contact state of the carbon black due to the influence of mechanical, thermal vibration, or current can be suppressed.
Claims (1)
絶縁性樹脂が、ビス(2‐オキサゾリン)化合物と、多価芳香族ポリアミンと、ジカルボン酸との少なくとも一方の反応生成物からなり、この絶縁性樹脂の一部がカーボン表面の不飽和結合あるいは活性水素と反応し、カーボンブラックを束縛してなり、
初期表面抵抗(S0)と初期体積抵抗(V0)との差(S0−V0)を、初期表面抵抗(S0)とパルス電流を流した後の経時表面抵抗(S1)との差(S0−S1)よりも大きくしたことを特徴とするシームレスベルト。 It is a semiconductive seamless belt in which carbon black is dispersed and mixed in an insulating resin and is centrifugally molded .
The insulating resin is composed of a reaction product of at least one of a bis (2-oxazoline) compound, a polyvalent aromatic polyamine, and a dicarboxylic acid, and a part of the insulating resin is an unsaturated bond or activity on the carbon surface. Reacts with hydrogen and binds carbon black,
The difference (S0−V0) between the initial surface resistance (S0) and the initial volume resistance (V0) is the difference between the initial surface resistance (S0) and the surface resistance (S1) after passing the pulse current (S0−S1). ) Seamless belt characterized by being larger than.
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| JP2000208585A JP4454115B2 (en) | 2000-07-10 | 2000-07-10 | Seamless belt |
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| JP2006349708A (en) * | 2005-06-13 | 2006-12-28 | Shin Etsu Polymer Co Ltd | Belt for electrophotographic apparatus |
| JP5062802B2 (en) * | 2005-12-12 | 2012-10-31 | 信越ポリマー株式会社 | Endless belt, manufacturing method thereof, and electrophotographic apparatus provided with the same |
| JP5740916B2 (en) * | 2010-10-29 | 2015-07-01 | 住友化学株式会社 | Polysulfone composition |
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