JP4459742B2 - Optical 3D modeling equipment - Google Patents

Description

  The present invention relates to an optical three-dimensional modeling apparatus used for performing optical modeling using a photocurable resin composition, and a method for performing optical modeling using the apparatus. More specifically, the present invention uses a photocurable resin composition to produce a high-quality three-dimensional structure that is excellent in dimensional accuracy, appearance, strength, homogeneity, etc., with high modeling accuracy and a high modeling speed. The present invention relates to an optical three-dimensional modeling apparatus and method for manufacturing with good performance, and according to the present invention, various three-dimensional models ranging from small to large can be manufactured smoothly.

  In recent years, an optical modeling method and apparatus for manufacturing a three-dimensional model by curing a photocurable resin based on data input to a three-dimensional CAD has been put into practical use. This stereolithography technology includes a model for verifying the appearance design in the middle of design, a model for checking the functionality of parts, a resin mold for manufacturing a mold, a base model for manufacturing a mold, etc. It attracts attention because it can easily form such complex three-dimensional objects.

  A method using a modeling bath is widely used for manufacturing a modeled object by optical modeling technology. As a procedure, a liquid photocurable resin is put in the modeling bath so that a desired pattern can be obtained on the liquid surface. A spot-shaped ultraviolet laser beam controlled by a computer is selectively irradiated to be photocured to a predetermined thickness to form a cured resin layer, and the cured resin layer is moved downward in the modeling bath to form a modeling bath. The photocurable resin liquid is flowed onto the cured resin layer to form a layer of the photocurable resin liquid, and the cured resin layer is formed by irradiating the photocurable resin liquid layer with a spot-like ultraviolet laser beam. A method of forming and repeating the above steps until a three-dimensional object having a predetermined shape and size is obtained is widely adopted.

  However, in the case of the above-described conventional technique using spot-like ultraviolet laser light, a so-called photo-cured pattern is formed by moving one spot-like laser light while irradiating the surface of the photocurable resin. Since it is a stippling method, it takes a long time for modeling, and there is a problem that productivity is low. Moreover, since the ultraviolet laser device used as the light source is extremely expensive, this type of optical three-dimensional modeling apparatus is made expensive.

  For the purpose of eliminating the drawbacks of the prior art described above, a line-shaped exposure mask in which optical shutters capable of light shielding control in a minute dot area are continuously arranged in a row is used, and the exposure mask is orthogonal to the arrangement direction of the optical shutters. An optical three-dimensional modeling technique has been proposed in which a photocured resin layer for one layer is sequentially formed by controlling an optical shutter in accordance with predetermined horizontal sectional shape data while scanning in a direction (see Patent Document 1). reference). In the case of this stereolithography technique, it is not always necessary to use an expensive ultraviolet laser device as a light source, and an inexpensive light source such as a normal ultraviolet lamp can be used, and the conventional laser using spot-like ultraviolet laser light is used. Compared with this method, the modeling speed can be increased. However, in the case of this stereolithography technique, a linear photocuring part is formed in a row in the scanning direction of the exposure mask, and a cross-sectional shape pattern for one layer is formed by repeating this many times. For this reason, if the scanning speed of the exposure mask is increased, it is not possible to form a photocured portion for each row that has been sufficiently photocured, and therefore it is necessary to scan the exposure mask slowly. In addition, it takes time for modeling because of the method of forming the photo-curing portion for each row one after another to form a planar photo-curing layer. For this reason, it cannot be said that the modeling speed is sufficiently high, and it is not satisfactory in terms of productivity.

  In addition to the above, a planar drawing mask composed of a liquid crystal shutter capable of shielding and transmitting light in a minute dot area is fixedly arranged between the light source and the surface of the photocurable resin composition, and the planar drawing is performed. With the mask stopped, a predetermined mask pattern is formed on the planar drawing mask according to the cross-sectional shape pattern for one layer to be formed, and light is applied to the surface of the photocurable resin composition through the mask pattern. Irradiating to cure the photocurable resin composition to form a cross-sectional shape pattern for one layer, and then supplying the photocurable resin composition for the next layer onto the photocured cross-sectional shape pattern In the stop state of the planar drawing mask, the following predetermined mask pattern is formed on the planar drawing mask according to the cross-sectional shape pattern for one layer to be formed, and the photocurable resin composition is formed through the mask pattern. On the surface of things Irradiating the optical molding technique by curing a photocurable resin composition for producing a three-dimensional object by repeating the operation of forming the next one layer of sectional shape pattern are known.

In the case of this stereolithography technique, the above-described use of a spot-like ultraviolet laser is used to form a light-irradiated surface of the photo-curable resin composition and a photo-cured cross-sectional shape pattern for one layer at a time. Compared to the conventional optical technique and the optical modeling technique described in Patent Document 1 described above using a line-shaped exposure mask in which one row of optical shutters capable of controlling light shielding in a minute dot area is continuously arranged. Can be faster.
In manufacturing a three-dimensional modeled object by this optical modeling technique, the distance between adjacent minute dot areas on the surface of the photocurable resin composition projected from the planar drawing mask is 0 from the viewpoint of modeling accuracy (resolution). Therefore, it is necessary that the number of pixels is small, for example, a modeling area size of 250 mm × 250 mm and at least about 2500 × 2500 dots, and the modeling area size is The medium size of 600 mm × 600 mm requires at least about 6000 × 6000 dots. However, existing liquid crystal masks (liquid crystal shutters) and digital micromirror shutters do not have resolutions that realize this, or even if they exist, they are extremely expensive.

In addition, in the case of the above-described stereolithography technique in which light irradiation is performed through a fixedly arranged planar drawing mask, the definition of the exposure shape pattern is determined by the definition (roughness) of the planar drawing mask and the planar drawing mask. It is determined by the enlargement / reduction ratio with the pattern projected on the surface of the photocurable resin composition. The smaller the enlargement ratio (the greater the reduction ratio), the more the distance between the light dots on the surface of the photocurable resin composition. The fineness of the cross-sectional shape pattern formed on the modeling surface becomes smaller, and the distance between the light dots on the surface of the photocurable resin composition increases as the enlargement ratio increases. The definition of the cross-sectional shape pattern is reduced.
For this reason, in the case of this stereolithography technique in which a planar drawing mask is fixedly arranged, it is difficult to produce a large three-dimensional modeled object with excellent definition (modeling accuracy), and small in terms of definition (modeling accuracy). The present situation is that it can be applied only to the manufacture of 3D objects.

  In order to eliminate the drawbacks of the above-described technique using a fixedly arranged planar drawing mask and enable the production of a large three-dimensional object using a small liquid crystal shutter, light is selectively transmitted or A liquid crystal shutter (liquid crystal mask) that shields light is arranged so that it can run parallel to the liquid surface of the photocurable resin, and the liquid crystal shutter travel range is divided into a plurality of parts, and the liquid crystal shutter is divided into travel ranges. The light source provided on the back of the liquid crystal shutter in a state where the liquid crystal shutter is stopped in a state where the liquid crystal shutter is stopped is transferred to the surface of the photocurable resin through the liquid crystal shutter while the liquid crystal shutter is stopped. The cured portion corresponding to the divided first range is formed by irradiating light, and then the liquid crystal shutter is moved to the second divided traveling range and stopped. The second range divided by irradiating light onto the surface of the photocurable resin through the liquid crystal shutter while the light source provided on the back of the liquid crystal shutter is transported in the range of the liquid crystal shutter in a state where the shutter is stopped The cured portion corresponding to is formed, and the same operation is performed until a predetermined cross-sectional shape pattern for one layer is formed on the surface of the photocurable resin composition, and the above-described process is performed to form a predetermined three-dimensional model. Until now, an optical modeling technique for producing a three-dimensional modeled object has been proposed (see Patent Document 2).

  However, in the case of the optical modeling technique described in Patent Document 2, the liquid crystal shutter is moved to the divided first traveling range-light irradiation with the liquid crystal shutter stopped (light on the surface of the photocurable resin). Formation of curing part)-Movement of liquid crystal shutter to divided second traveling range-Light irradiation with liquid crystal shutter stopped (formation of photocuring part on photocurable resin surface) ... When a cross-sectional pattern that has been cured by one layer is formed by the above, a three-dimensional model is manufactured by repeating the pattern over multiple layers, and the liquid crystal shutter is moved to the respective travel range positions divided into a plurality of parts. There is no light irradiation. Therefore, in the case of this stereolithography technique, the exposure is not continuously performed and is intermittently performed, so that the modeling speed is slowed down. In addition, in the case of this stereolithography technique, the traveling range of the liquid crystal shutter is divided into a plurality of parts, and in order to cure the photocurable resin composition in a state where the liquid crystal shutter is stopped in each section, the traveling parts are separated from each other. The cured state tends to be discontinuous or non-uniform at the boundary between the areas, and accordingly, uneven strength, insufficient strength, poor appearance, and reduced dimensional accuracy of the entire three-dimensional structure are likely to occur.

In order to improve the above-described prior art, a planar drawing mask that can continuously change the mask image in a moving image is used, and the planar drawing mask is in a state parallel to the modeling surface made of the photocurable resin composition. The mask image of the planar drawing mask is continuously changed in synchronization with the movement of the planar drawing mask in correspondence with the cross-sectional shape pattern of the photocured resin layer to be formed. A method and apparatus for modeling are known ( Patent Document 3). In the case of the optical modeling technique of Patent Document 3, a high-quality three-dimensional model is manufactured with high modeling accuracy by using a relatively inexpensive small planar drawing mask and further using an inexpensive light source such as an ultraviolet lamp. However, in the field of stereolithography technology, demands for shortening of modeling time and simplification of modeling equipment are increasing in recent years.

JP-A-4-305438 JP-A-8-112863 JP 2003-266546 A

  It is an object of the present invention to use an inexpensive light source such as an ultraviolet lamp without using an expensive ultraviolet laser device, and to obtain a liquid crystal drawing mask (for example, the number of pixels) that is currently difficult to obtain or extremely expensive even if it is available. Various types of solids ranging from small to medium to large using a general-purpose, inexpensive, small-sized liquid crystal drawing mask (such as a liquid crystal shutter) without using a large liquid crystal shutter whose size is larger than 300 mm. An object of the present invention is to provide an optical three-dimensional modeling apparatus capable of producing a modeled object efficiently in a short modeling time and smoothly with high dimensional accuracy while preventing the occurrence of curing unevenness and strength unevenness.

  In order to achieve the above object, the present inventors have repeatedly studied. In an optical three-dimensional modeling apparatus for sequentially forming a photocured resin layer by irradiating a modeling surface made of a photocurable resin composition with a light shape pattern corresponding to the mask image through a planar drawing mask, When a plurality of sets of optical device systems composed of optical means such as a planar drawing mask are arranged and a predetermined light shape pattern is simultaneously irradiated onto the modeling surface via the respective planar drawing masks of the plurality of sets of optical device systems, 1 The knowledge that modeling time can be significantly shortened compared with the case where stereolithography is performed through individual planar drawing masks was obtained.

Therefore, when further examination was performed based on the above-described knowledge, when a plurality of sets of optical device systems are separately moved and optical modeling is performed, a plurality of sets of optical device systems are located at positions separated from each other. Collisions between other planar drawing masks and other optical members in the set of optical device systems, path obstructions, etc. do not occur, while a plurality of sets of optical device systems are moved simultaneously, and a predetermined surface is formed on the modeling surface via each planar drawing mask. Although it is possible to perform modeling by simultaneously irradiating the light of the shape pattern, when multiple sets of optical device systems are in close proximity to each other, collisions between the planar drawing mask and other optical members during travel and path obstruction Interference between devices is likely to occur. If there is a risk of interference between the devices, one or more of the plurality of optical device systems are stopped at a predetermined position and stopped in order to prevent interference between the devices, and remain in that state. It has been found that optical modeling must be performed using only the optical device system, and the merit of using a plurality of sets of optical device systems cannot be fully utilized.
Furthermore, when trying to model while utilizing all of the optical device systems without suspending any of the multiple sets of optical device systems, the design and control of the movement path of each optical device system during modeling is extremely strict. It turns out that there is a need to do it.
In addition, when performing optical modeling while moving each of a plurality of optical device systems individually, a plurality of drive devices are required to move each optical device system, and the drive system is complicated and expensive. There was found.

  Therefore, the present inventors have further studied to solve the above-described problems that occur when optical modeling is performed using a plurality of sets of optical device systems. As a result, rather than moving each of a plurality of sets of optical device systems separately, the plurality of sets of optical device systems are moved together (integrated) without causing any positional deviation, and at that time, a plurality of sets of optical devices are moved. A continuous pattern in which a plurality of light shape patterns irradiated onto the modeling surface through each planar drawing mask are connected to each other when the entire surface of each planar drawing mask is transmitted through the apparatus system to form one continuous shape pattern as a whole. If at least one of the plurality of optical device systems is provided with a small liquid crystal shutter or the like that is currently widely used as a planar drawing mask, the total movement distance of the plurality of optical device systems While reducing the number of drive units for moving the optical system, while reducing the number of drive units and without causing unevenness of curing or unevenness of strength, with high modeling accuracy and from small to large Found that can be produced with good productivity at various stereolithography was short molding times throughout.

  Furthermore, when using the above-described optical three-dimensional modeling apparatus, the present inventors can irradiate a modeling surface made of a photocurable resin composition with light having a predetermined shape pattern with uniform energy intensity, thereby It has been found that optical three-dimensional modeling without curing unevenness and strength unevenness can be obtained. In addition, when the above-described stereolithography apparatus is used, the present inventors eliminate interference between apparatuses such as collisions between plane drawing masks and other optical members and path obstructions in a plurality of optical apparatus systems, and a plurality of sets. It has been found that the modeling time can be greatly shortened because modeling can be performed by irradiating the modeling surface with light through a plurality of planar drawing masks while simultaneously utilizing the optical device system. In addition, the present inventors, when performing optical modeling using the above-described optical modeling apparatus, a plurality of lights irradiated on the modeling surface via each of the planar drawing masks in a plurality of sets of optical device systems When shaping is carried out while maintaining the arrangement state between the shape patterns, a wide curing area can be secured during stereolithography regardless of the movement direction of the planar drawing mask, and the modeling time can be further shortened. I found. Furthermore, when performing the optical modeling by the above-described method, the present inventors continuously move a plurality of sets of optical device systems together and change the mask image of the planar drawing mask continuously (moving image). When modeling was performed, modeling speed and modeling accuracy were further improved, and the present invention was completed based on these findings.

That is, the present invention
(1) (I) Means for sequentially supplying a photocurable resin composition for one layer on a mounting table or a photocured resin layer to sequentially form a modeling surface made of the photocurable resin composition ;
(II) A mask image of the planar drawing mask comprising at least a light emitting means and a planar drawing mask, and the light emitted from the light emitting means is applied to the modeling surface made of the photocurable resin composition through the planar drawing mask. A plurality of sets of optical device systems for irradiating with a predetermined shape pattern corresponding to
(III) Each light shape pattern irradiated to the modeling surface through each surface drawing mask when the entire surface of each surface drawing mask in the plurality of sets of optical device systems is transmitted is the end or end of each light shape pattern. Continuous patterning means for forming one continuous light shape pattern on the modeling surface of the photocurable resin composition in close proximity to each other or overlapping each other; and
(IV) While maintaining the arrangement form of a plurality of sets of optical device systems in an arrangement form that allows one continuous light shape pattern to be formed on the modeling surface as a whole by the continuous patterning means of (III) above, Means for moving a set of optical systems together;
It is an optical three-dimensional modeling apparatus characterized by having.

And this invention,
(2) The optical system according to (1), wherein the continuous patterning unit according to (III) is a declination prism disposed downstream of a planar drawing mask in at least one of the plurality of optical device systems. 3D modeling apparatus.

Furthermore, the present invention provides
(3) Each planar drawing mask in a plurality of sets of optical device systems is a rectangular planar drawing mask, and the arrangement form of the plurality of sets of optical device systems corresponds to each planar drawing when the entire surface of each planar drawing mask is transparent. A plurality of rectangular light shape patterns irradiated onto the modeling surface through the mask are closely or overlapped with each other at diagonal ends of the rectangular light shape pattern, thereby forming one continuous shape as a whole. Forming a pattern on a modeling surface, or an arrangement form that forms one continuous shape pattern on the modeling surface as a whole by closely or overlapping each other in a series arrangement state at sides of a rectangular optical shape pattern, The continuous patterning means of (III) described above has a plurality of rectangular light shape patterns irradiated onto the modeling surface via each planar drawing mask when the entire surface is transparent under the arrangement form of a plurality of sets of optical device systems. Diagonal The optical three-dimensional modeling apparatus according to (1) or (2), which is a means for forming one continuous shape pattern on the modeling surface as a whole by closely or overlapping in a placed state or a serially arranged state.

And this invention,
(4) Each optical device system has a projection lens downstream of the planar drawing mask, and in the optical device system having the continuous patterning means (III) downstream of the planar drawing mask, downstream of the planar drawing mask. And the optical three-dimensional modeling apparatus in any one of said (1)-(3) which has a projection lens upstream of the continuous patterning means of said (III);
(5) The planar drawing mask in each optical device system is a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in a planar shape. ) Any of the optical three-dimensional modeling apparatuses; and
(6) The optical three-dimensional modeling apparatus according to any one of (1) to (5), wherein the planar drawing mask in each optical device system is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a plane. ;
It is.

Furthermore, the present invention provides
(7) Each of the planar drawing masks in the plurality of sets of optical device systems is a planar drawing mask capable of continuously changing the mask image, and the means of (IV) for moving the plurality of sets of optical device systems together Is means for continuously moving a plurality of sets of optical device systems together, and has means for continuously changing the mask image of each planar drawing mask corresponding to the continuous movement of the plurality of sets of optical device systems. It is an optical three-dimensional modeling apparatus in any one of (1)-(6).
And this invention,
(8) A method for performing optical modeling using the optical three-dimensional modeling apparatus according to any one of (1) to (7).

By performing optical modeling using the optical three-dimensional modeling apparatus of the present invention, a liquid crystal mask or a digital micromirror mask in which small and inexpensive liquid crystal shutters and digital micromirror shutters that are currently widely distributed are arranged in a planar shape, etc. As a planar drawing mask, while keeping the total movement distance of the optical device system short, and using a small number of drive devices to move the optical device system, from small to large shaped objects, With high modeling accuracy, it is possible to manufacture a high-quality optical three-dimensional model without curing unevenness or strength unevenness with high productivity in an extremely short time.
By performing optical modeling using the optical three-dimensional modeling apparatus of the present invention, uniform light having no unevenness or distribution in energy intensity is irradiated onto a modeling surface made of a photocurable resin composition with a continuous large light shape pattern. Therefore, it is possible to produce a uniform and high-quality optical three-dimensional modeling without unevenness of curing and unevenness of strength.
In the optical three-dimensional modeling apparatus of the present invention, even when multiple sets of optical device systems are arranged on the modeling surface, when modeling while moving the optical device system, such as collision between optical devices and path obstruction Since there is no interference between devices, a predetermined light shape pattern can be simultaneously irradiated onto a modeling surface via each planar drawing mask in a plurality of sets of optical devices while simultaneously using a plurality of sets of optical devices. The optical modeling can be performed efficiently, and the modeling speed is further improved.

  In the present invention, as each planar drawing mask in a plurality of sets of optical apparatus systems, a rectangular planar drawing mask that forms a square mask image when the entire surface is transparent is adopted, and when each planar drawing mask is completely transparent The arrangement form of a plurality of light shape patterns irradiated on the modeling surface through each liquid crystal drawing mask is set such that one end portion on the diagonal line of one rectangular light shape pattern and the other side of the adjacent rectangular light shape pattern. One end of the rectangular light shape pattern on the diagonal line is closely located in a dotted manner in the diagonal arrangement state of the adjacent rectangular light shape patterns, and forms one continuous light shape pattern as a whole. In this way, a plurality of sets of optical device systems are arranged, and optical means such as a declination prism is used for that purpose, and the plurality of sets of optical device systems are moved together on the modeling surface while maintaining the arrangement form. I will do it If designed, a plurality of sets of optical device systems can be secured in a single state to ensure a wide photocuring region by moving in any direction (for example, the horizontal direction and the vertical direction) with respect to the modeling surface. The speed can be further improved.

  In addition, the optical three-dimensional modeling apparatus of the present invention is continuously moved together with a plurality of sets of optical apparatus systems, and the mask image is continuously animated as each planar drawing mask in the plurality of sets of optical apparatus systems. When adopting what can be changed, it is possible to perform optical shaping while continuously changing the mask image of the liquid crystal drawing mask while moving continuously with a plurality of optical device systems together, thereby It is possible to manufacture a high-quality three-dimensional structure that is further excellent in dimensional accuracy, appearance, strength, and the like with high productivity in a very short time while maintaining higher modeling accuracy at a higher modeling speed.

Furthermore, when performing optical modeling using the optical three-dimensional modeling apparatus of the present invention, not only small and medium-sized three-dimensional modeling objects, but also large three-dimensional modeling objects can be smoothly smooth with high dimensional accuracy and high modeling speed. Can be manufactured.
Further, in the optical three-dimensional modeling apparatus of the present invention, an inexpensive light source such as a normal ultraviolet lamp can be used without using an expensive ultraviolet laser device as a light source, and in that case, the above-described high-quality three-dimensional modeling apparatus can be used. A model can be manufactured smoothly at a high modeling speed.

The present invention is described in detail below.
The optical three-dimensional modeling apparatus of the present invention irradiates a modeling surface made of a photocurable resin composition with light of a predetermined shape pattern under control through each planar drawing mask of a plurality of sets of optical device systems. After forming a photocured resin layer having a predetermined cross-sectional shape pattern, a photocurable resin composition for one layer is applied on the photocured resin layer to form a modeling surface made of the photocurable resin composition. An optical modeling step of forming and forming a photocured resin layer having a predetermined cross-sectional shape pattern by irradiating light of a predetermined shape pattern under control through the plurality of planar drawing masks on the modeling surface It is an apparatus for repeatedly manufacturing a three-dimensional modeled object until a predetermined three-dimensional modeled object is formed.

  The above-described modeling operation is generally performed by placing a modeling table in a modeling bath filled with a liquid photocurable resin composition and lowering the modeling table to lower the modeling table for one layer of liquid photocurable resin. A composition layer (modeling surface) is formed, and a light-cured resin layer (hereinafter referred to as “photocured layer”) having a predetermined pattern and thickness is formed by irradiating the modeling surface with light through each planar drawing mask under control. After forming the molding table, a liquid photocurable resin composition layer (modeling surface) for one layer is formed on the surface of the photocured layer, and each planar drawing mask is formed. The molding bath method can be employed in which the process of irradiating light under control to repeatedly laminate and form a photocured layer having a predetermined pattern and thickness is performed.

  In addition, the above-described modeling operation is performed by, for example, arranging a modeling table in a gas atmosphere and applying a liquid, paste, powder, or thin film photocurable resin composition for one layer on the modeling table surface, respectively. After forming a photocured layer having a predetermined pattern and thickness by irradiating light through a planar drawing mask, a liquid, paste, powder or thin film for one layer is formed on the photocured layer surface. A method of repeatedly applying a photocurable resin composition and irradiating light under control through respective planar drawing masks to integrally form a photocured layer having a predetermined pattern and thickness. It can also be adopted. When using this method, the modeling table or photocuring layer is left facing upward, the photocurable resin composition is applied to the top surface, and light is irradiated through each planar drawing mask to sequentially form the photocuring layer. It is possible to adopt a method that does this, or place a modeling table or photocuring layer vertically or diagonally, apply a photocurable resin layer on the modeling table surface or photocuring layer surface, and draw each planar shape You may adopt the method of irradiating light through a mask and sequentially laminating and forming a photocuring layer, or placing a modeling table or a photocuring layer downwards on the modeling table surface or the photocuring layer surface. You may employ | adopt the system which gives a photocurable resin composition, irradiates light through each planar drawing mask, and laminates | stacks and forms a photocuring layer below one by one. In applying the photocurable resin composition to the modeling table surface or the photocured layer surface, for example, an appropriate method such as blade coating, cast coating, roller coating, transfer coating, brush coating, spray coating, or the like can be employed. .

  Accordingly, in the optical three-dimensional modeling apparatus of the present invention, the above-mentioned means (I) (one-layer photocurable resin composition is sequentially supplied onto the mounting table or the photocured resin layer to form a photocurable resin. The means for sequentially forming a modeling surface made of the composition) is a liquid, paste-like, powdery or thin-film photocurable resin composition on the mounting table or photocured resin layer. Any means can be used as long as it can sequentially form one layer at a time by an appropriate method such as descending, blade coating, cast coating, roller coating, transfer coating, brush coating, spray coating or the like.

The optical three-dimensional modeling apparatus of the present invention comprises at least a light emitting means and a planar drawing mask, and the light emitted from the light emitting means is applied to a modeling surface made of a photocurable resin composition via the planar drawing mask. A plurality of sets of optical device systems for irradiating with a predetermined shape pattern corresponding to the mask image of the planar drawing mask are provided.
Each optical device system of the plurality of sets of optical device systems constituting the optical three-dimensional modeling apparatus of the present invention includes at least light emitting means such as a light source and a planar drawing mask, and light emitted from the light emitting means. As long as the optical device system can satisfactorily irradiate the modeling surface made of the photocurable resin composition with a shape pattern corresponding to the mask image of the planar drawing mask through the planar drawing mask.
In the optical three-dimensional modeling apparatus of the present invention, in the upstream (back side) of the planar drawing mask for the purpose of improving modeling accuracy, improving modeling speed, reducing the weight of the apparatus, improving maintainability, and reducing the cost of the apparatus. Depending on the type, shape, number, and shape and size of the planar drawing mask of the light emitting means such as the light source to be arranged, in order to guide the light from the light emitting means to the planar drawing mask satisfactorily to each optical device system (For example, a rod lens, an imaging lens, a reflecting mirror, a condensing lens, a Fresnel lens, etc.), and a mask image (light image that has passed through the planar drawing mask) formed by a planar drawing mask. It is preferable to arrange an optical member such as means (for example, a projection lens, a projector lens, etc.) for irradiating a predetermined position on the surface of the composition with high modeling accuracy. In each optical apparatus system, the above-described optical members are moved together in synchronism with the movement of the planar drawing mask during stereolithography.

The type of light emitting means such as a light source provided in each optical device system is not particularly limited and may be any light emitting means that can be used in optical three-dimensional modeling. For example, a xenon lamp, a metal halide lamp, a mercury lamp, a fluorescent lamp And halogen lamps, incandescent lamps, Ar lasers, He—Cd lasers, LD lasers (semiconductor-excited solid state lasers), LEDs, and the like. In particular, in the optical three-dimensional modeling apparatus of the present invention, an xenon lamp, a metal halide lamp, a mercury lamp, a fluorescent lamp, and a halogen lamp are used without using an expensive light source such as a laser beam apparatus conventionally used in optical three-dimensional modeling. An inexpensive general-purpose light source such as an incandescent lamp can be used, thereby reducing the cost of the optical three-dimensional modeling apparatus.
The same type of light emitting means may be used for each planar drawing mask in a plurality of sets of optical device systems, or different types of light emitting means may be used in some cases.

The shape, size, and number of light sources in each optical device system are not particularly limited, and may be appropriately selected according to the shape and size of the planar drawing mask, the shape and size of the photocuring cross-sectional shape pattern to be formed, and the like. it can. The light emitting means such as the light source may be, for example, a dot shape, a spherical shape, a rod shape, or a plane shape, and the dot shape or the spherical light source is directly or directly arranged on the back side of the planar drawing mask. You may arrange.
Further, the light emitting means such as a light source may be provided so as to be movable together with the planar drawing mask upstream (back side) of the planar drawing mask, or the modeling accuracy is improved, the modeling speed is improved, and the apparatus is reduced in weight. For the purpose of improving maintainability, the light source is provided so as not to move to a fixed position, and the light from the light source is guided to the back of the planar drawing mask through an optical fiber, a light guide or other light transmission means, and the optical fiber or the light guide. And other light transmission means may be provided so as to be movable together with the planar drawing mask.
Moreover, you may employ | adopt the system which condenses and raises light energy using a some light source for the improvement of modeling speed. In particular, when an optical fiber or a light guide is used, there is an advantage that a plurality of light sources can be easily condensed.

  As each planar drawing mask in a plurality of sets of optical device systems, it is preferable to use a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in a planar shape. Specific examples of such a planar drawing mask include a liquid crystal shutter or a digital micromirror shutter. Liquid crystal shutters and digital micromirror shutters, which are preferably used as planar drawing masks in a plurality of sets of optical device systems, can be used in other fields (for example, televisions, personal computers, Already used in projectors, car navigation systems, mobile phones, etc.) When a liquid crystal shutter or a digital micromirror shutter is used as a planar drawing mask, the mask image of the planar drawing mask is used as a continuous movement of the optical system. In conjunction with this, it is possible to perform stereolithography while continuously changing in a moving manner as in television and movies.

The shape and dimensions of the planar drawing mask are not particularly limited, and those having an appropriate shape and dimensions can be adopted according to the shape and dimensions (particularly the cross-sectional shape and dimensions thereof) of the optically shaped object to be manufactured. However, the planar drawing mask made up of the liquid crystal shutter or the digital micromirror shutter preferably used in the optical three-dimensional modeling apparatus of the present invention has a plurality of micro light shutters capable of shielding and transmitting light in a micro dot area. Since it is generally manufactured and sold in a rectangular shape (square or rectangular) arranged in parallel in a planar shape (XY direction), a rectangular (square or rectangular) planar drawing mask is preferably employed in the present invention. The number of minute light shutters (image elements) arranged on the planar drawing mask is not particularly limited, and conventionally known ones can be used. As a liquid crystal shutter (liquid crystal display element), for example, QVGA (number of pixels = 320 dots × 240 dots), VGA (number of pixels = 640 × 480 dots), SVGA (number of pixels = 800 × 600 dots), UXGA (number of pixels) = 1024 × 768 dots), QSXGA (number of pixels = 2560 × 2648 dots), and the like, and these liquid crystal shutters have been widely sold.
As the digital micromirror shutter, for example, a DMD (registered trademark) device of “DLP Technology” (registered trademark) manufactured by Texas Instruments Inc. can be used.

The optical three-dimensional modeling apparatus of the present invention irradiates a modeling surface made of a photocurable resin composition through each planar drawing mask when the entire surface of each planar drawing mask in a plurality of sets of optical device systems is transparent. Since it is designed to perform optical modeling while forming one continuous light shape pattern as a whole by closely contacting or overlapping the light shape patterns at or near their ends, The various inexpensive liquid crystal shutters and digital micromirror shutters that are sold on the market can be used as they are as planar drawing masks, and as a result, high-quality three-dimensional objects that are large and have excellent dimensional accuracy are also short. It can be manufactured with good productivity in modeling time.
Specifically, using the liquid crystal shutter exemplified above, one pixel pitch (distance between adjacent pixels) on the modeling surface made of the photocurable resin composition is 0.1 mm (required for optical modeling). In the case of the conventional technique in which light irradiation is performed with the liquid crystal shutter stopped, the exposure surface size is 32 mm × 24 mm for QVGA, 64 mm × 48 mm for VGA, and 80 mm × 60 mm for SVGA. , UXGA 102.4 mm x 76.8 mm, QSXGA 256 mm x 264.8 mm, and it was difficult to produce a large three-dimensional modeled object in which the size of one side of the exposed surface (cross-sectional shape pattern) exceeded 300 mm . On the other hand, when the optical three-dimensional modeling apparatus of the present invention is used, the above-described conventional commercially available liquid crystal shutter is arranged as a planar drawing mask for each optical device system of a plurality of sets of optical device systems, and each planar drawing is performed. Each light shape pattern (a plurality of light shape patterns as a whole) formed on the modeling surface via each surface drawing mask when the entire surface of the mask is transparent is connected to each other to form one continuous large light shape pattern. Since optical modeling is performed by moving the optical device system while maintaining the arrangement form, even a large three-dimensional model having a side size exceeding 300 mm can be easily obtained with high modeling accuracy and at a high modeling speed. It can be manufactured with high productivity.
Here, “when the planar drawing mask is fully transparent” means that the planar drawing mask is open on the entire surface and has no light blocking portion. For example, the planar drawing mask is square. In some cases, the mask image of the planar drawing mask has the same square shape as the planar drawing mask.
In the optical three-dimensional modeling apparatus of the present invention, the planar drawing masks provided in a plurality of sets of optical apparatus systems may have the same type, size, number of dots, or the like, or may be different from each other.

When a liquid crystal planar drawing mask is used as each planar drawing mask in multiple sets of optical device systems, it corresponds to the predetermined cross-sectional shape to be formed and the movement of the optical device system, and consequently the movement of the liquid crystal planar drawing mask. Depending on the information stored in advance in the computer, etc., the liquid crystal shutter located at the position where the light should pass through among the plurality of minute liquid crystal shutters arranged on the liquid crystal surface drawing mask should pass the light. The liquid crystal shutter, which is opened and closed at the place where light should be shielded, is closed to prevent the passage of light, and such operation is continued until a photocured resin layer having a predetermined cross-sectional shape is formed (video Can be designed to repeat.
In addition, when a DMD type surface drawing mask is used as a surface drawing mask in the optical apparatus system, it is stored in advance in a computer or the like in correspondence with the predetermined cross-sectional shape to be formed and the continuous movement of the DMD type surface drawing mask. Depending on the information, a specific mirror shutter among a plurality of minute mirror shutters arranged in a plane is directed in a direction in which light is reflected (guided) in the direction of the projection lens and the light-transmitting surface, and one-sided light The mirror shutter located at a position where the light should be shielded is directed in a direction in which light is not reflected (not guided) in the direction of the projection lens and the modeling surface, and such a manipulation is performed by a photocured resin layer having a predetermined cross-sectional shape. It can be designed to repeat continuously (animated) until it is formed.

Although not limited, when the principal part of each optical apparatus system which comprises the optical three-dimensional model | molding apparatus of this invention is shown with a figure, an optical apparatus system as shown, for example in FIG. 1 can be mentioned.
In FIG. 1, 1 is a light source, 2 is a rod lens, 3 is a convex lens, 4 is a reflecting mirror, 5 is a condensing lens or Fresnel lens, 6 is a planar drawing mask, 7 is a projection lens, and 8 is a photocurable resin composition. The modeling surface which consists of a thing is shown.
The light emitted from the light source 1 passes through the rod lens 2, the convex lens 5, and the reflecting mirror 4, and then is irradiated so as to cover the entire surface of the planar drawing mask 6 using the condensing lens or the Fresnel lens 5. .
In FIG. 1, the light emitted from the light source 1 is guided to the reflecting mirror 4 through the rod lens 2 and the convex lens 3, but the rod lens 2, the convex lens 3, the reflecting mirror 4 and the like are not provided in some cases. Alternatively, the light source 1 may be arranged directly on the back side of the condenser lens or Fresnel lens 5 so that the light from the light source 1 is directly guided to the condenser lens or Fresnel lens 5. In addition, the light source 1 is disposed at a location away from the condenser lens or the Fresnel lens 5, and the light from the light source 1 is directly applied to the condenser lens or the Fresnel lens 5 through a light transmission means such as an optical fiber or a light guide. You may make it guide.

The optical three-dimensional modeling apparatus of the present invention has a plurality of sets of the above optical apparatus system, and further,
・ Each light shape pattern irradiated to the modeling surface through each planar drawing mask when the entire surface of each planar drawing mask in the plurality of sets of optical devices is transparent is the end of each light shape pattern or the vicinity of the end. A continuous patterning means for forming one continuous light shape pattern on the modeling surface made of the photocurable resin composition in close contact with each other or overlapping each other; and
A plurality of sets of optical apparatus systems while maintaining the arrangement form of a plurality of sets of optical apparatus systems in an arrangement form in which one continuous light shape pattern can be formed on the modeling surface as a whole by the continuous patterning means described above. Means for moving them together [hereinafter, this may be simply referred to as “moving means”];
Have

  Each light shape pattern irradiated on the modeling surface through each surface drawing mask when the entire surface of each surface drawing mask is transmitted through the plurality of sets of optical device systems is continuously edged by the continuous patterning means. Each surface in a plurality of sets of optical device systems in that a single continuous light shape pattern is formed on a modeling surface made of a photocurable resin composition by being in close contact with each other or overlapping each other in the vicinity of a portion or an end portion With reference to FIG. 2 to FIG. 4, an example in which the shape drawing mask is a rectangular planar drawing mask, and the light shape pattern of the rectangular planar drawing mask when light is transmitted through the entire surface is rectangular. Explained.

  2 to 4, the optical three-dimensional modeling apparatus has three sets of optical device systems, and each optical device system has one rectangular planar drawing mask (omitted in FIGS. 2 to 4) having the same size. The light of three rectangular shape patterns A, B, and C (hereinafter referred to as “light”) is formed on the modeling surface made of the photocurable resin composition through each of the planar drawing masks when the entire surface of each planar drawing mask is transparent. FIG. 6 is a diagram (plan view) schematically showing a case where a shape pattern A ”, a“ light shape pattern B ”, and a“ light shape pattern C ”may be irradiated.

FIG. 2 shows that in one of two adjacent rectangular light shape patterns A and B, one end portion a ₂ on the diagonal line of one light shape pattern A and one end portion on the diagonal line of the other light shape pattern B are shown. b _{1 is} located in the form of a diagonal arrangement of the light shape patterns A and B (positions where the right-angled corners of the light shape pattern A and the light shape pattern B face each other) closely or overlap each other in a dotted manner Further, in two adjacent light shape patterns B and C, one end b ₂ on the diagonal of one light shape pattern B and one end c ₁ on the diagonal of the other light shape pattern C Are located close to each other in a dot-like manner in the diagonal arrangement state of the light shape patterns B and C (the arrangement state in which the right-angle corners of the light shape pattern B and the light shape pattern C face each other), Planar drawing mask This shows an example in which one continuous staggered light shape pattern is arranged so as to be formed on the modeling surface in the whole of the three rectangular light shape patterns A, B and C when the entire surface is transparent. is there.

  The three rectangular light shape patterns A, B, and C irradiated on the modeling surface through the respective planar drawing masks when the entire surface of the three planar drawing masks is transmitted so as to maintain the arrangement form shown in FIG. On the other hand, the three sets of optical device systems are moved together (integrally) so as not to be displaced from each other, and each of the plane drawing masks (three plane drawing masks) of the three sets of optical device systems is moved. Irradiate light of a predetermined shape pattern corresponding to the cross-sectional shape pattern to be formed on the modeling surface made of the photocurable resin composition via each, and form a photo-curing layer of the predetermined cross-sectional shape pattern on the modeling surface Let At that time, each of the planar drawing masks in the three sets of optical device systems, and thus in the three sets of optical device systems, shows the arrangement of the three rectangular light shape patterns A, B, and C when the entire surface is transparent. The mask image of each planar drawing mask of the three sets of optical device systems corresponds to the cross-sectional shape pattern of the photocured layer to be formed on the modeling surface while maintaining the positional relationship so as to form the configuration shown in FIG. The modeling operation is performed while changing. Therefore, the optical shape patterns irradiated on the modeling surface through the respective planar drawing masks of the three sets of optical device systems during the actual modeling operation for manufacturing the three-dimensional modeled object are not always continuous with each other. May be separated.

In the arrangement form of FIG. 2, when the three optical device systems are moved together so that the three light shape patterns A, B, and C move in the X direction of FIG. 2 while maintaining the arrangement form of FIG. The modeling dimension Wx is three times (L ₁ × 3) the vertical dimension of the rectangular optical shape pattern formed by one planar drawing mask. When the three optical device systems are moved together so that the three light shape patterns A, B, and C move in the Y direction of FIG. 2 while maintaining the arrangement form of FIG. This is three times (L ₂ × 3) the horizontal dimension of the rectangular optical shape pattern formed by one planar drawing mask. When the three optical device systems are moved together so that the three light shape patterns A, B, and C move in the S direction in FIG. 2 while maintaining the arrangement form of FIG. This is three times the diagonal dimension (L ₃ × 3) of the rectangular optical shape pattern formed by one planar drawing mask. As a result, the modeling area when performing modeling while moving the optical device system is much wider than when modeling using one planar drawing mask in one set of optical device system, and the modeling time is increased. Can be greatly shortened.

3 and 4 show that, in two adjacent rectangular light shape patterns A and B, one side a ₄ of one light shape pattern A and one side b _{3 of the} other light shape pattern B are light. In the state in which the shape patterns A and B are arranged in series, they are close to each other in a linear manner or overlapped (overlapped) with each other, and in the two adjacent rectangular light shape patterns B and C, one light shape pattern B The one side b ₄ of the light source and the one side c _{3 of the} other light shape pattern C are close to each other in a linear arrangement or overlap (overlapping) with the light shape patterns B and C arranged in series. And an example in which one continuous light shape pattern (one large rectangular light shape pattern) is arranged on the modeling surface in the whole of the three rectangular light shape patterns A, B, and C. Indicated Than is.

  3 or 4 shows three rectangular light shape patterns A, B, and C that are irradiated on the modeling surface through the respective surface drawing masks when the entire surface of each surface drawing mask in the three sets of optical device systems transmits light. While maintaining the arrangement shown in the drawing, each of the three optical drawing masks (three planar drawing masks) is moved while moving the three sets of optical device systems and eventually each of the planar drawing masks together (integrated). By irradiating the modeling surface with light of a predetermined shape pattern through each of them, a photocured layer having a predetermined cross-sectional shape pattern is formed on the modeling surface. At that time, the arrangement form of the three rectangular light shape patterns A, B, and C when the entire surface of each of the planar drawing masks in the three sets of optical device systems is transparent is formed as shown in FIG. 3 or FIG. While maintaining the mutual positional relationship, the mask image of each planar drawing mask is subjected to a modeling operation while changing in accordance with the cross-sectional shape pattern of the photocured layer to be formed on the modeling surface. Therefore, also in this case, at the time of the actual modeling operation for manufacturing the three-dimensional modeled object, the optical shape patterns irradiated on the modeling surface through the respective planar drawing masks of the three sets of optical device systems are continuous with each other. Not always, but sometimes it is far away.

3 or 4, the three light shape patterns A, B, and C are moved in the X direction of FIG. 3 or 4 while maintaining the arrangement of FIG. 3 or FIG. When the optical device system is moved together, the modeling dimension Wx is three times (L ₁ × 3) the vertical dimension (L ₁ ) of the rectangular light shape pattern formed by one planar drawing mask. Also, the three optical device systems are moved together so that the three light shape patterns A, B, and C move in the Y direction of FIG. 3 or 4 while maintaining the arrangement form of FIG. 3 or FIG. Sometimes, the modeling dimension Wy is the same as the lateral dimension (L ₂ ) of the rectangular light shape pattern formed by one planar drawing mask. Therefore, the modeling area at the time of movement of the planar drawing mask becomes larger (when moved in the X direction) than when modeling using one planar drawing mask, and the modeling time can be shortened. .

2 to 4, the case where each planar drawing mask in the three sets of optical device systems is rectangular and a rectangular optical shape pattern is formed when the entire surface is transparent is described. However, as described above, planar drawing is performed. The mask is not limited to a rectangle, and may be a square or other shapes (for example, a circle, a rhombus, and a polygon).
2 to 4, when each of the three sets of optical device systems has one rectangular planar drawing mask of the same size, each planar drawing mask is transparent when the entire surface is transparent. Although the case where three rectangular optical shape patterns having the same dimensions are formed on the modeling surface by irradiating light through the drawing mask has been described, it is not limited to FIGS.
In the optical three-dimensional model | molding apparatus of this invention, the shape and dimension of each planar drawing mask in a plurality of sets of optical apparatus system may all be the same, or may mutually differ. For example, one of a plurality of sets of optical device systems may include a rectangular planar drawing mask, the other optical device system may include a square planar drawing mask, or one optical device system may be rectangular. The other optical device system may be provided with a rectangular surface drawing mask having different vertical and horizontal dimensions. In either case, each of the planar drawing masks in the plurality of sets of optical device systems may be provided. Forming one continuous light shape pattern on the modeling surface as a whole by closely or overlapping the light shape patterns irradiated to the modeling surface through the respective planar drawing masks when the entire surface is transparent It is necessary to design.

Also, in FIGS. 2 to 4, when three light shape patterns connected to the modeling surface are formed through the respective surface drawing masks when the entire surface of each of the surface drawing masks in the three optical device systems is transparent. As described above, the number of optical device systems, and thus the number of planar drawing masks, is not limited to three, but may be two or four or more.
Furthermore, the arrangement form of the optical shape pattern formed on the modeling surface when the entire surface of each planar drawing mask is transmitted through each planar drawing mask in a plurality of sets of optical device systems is a right angle as shown in FIG. A diagonal arrangement that is maintained, and a series arrangement as shown in FIGS. 3 and 4 are preferable from the standpoints of ease of device design, widening of the modeling area, ease of screen control, and the like. However, the present invention is not limited to this, and a plurality of light shape patterns irradiated to the modeling surface when the entire surface of each planar drawing mask is transmitted through the respective planar drawing masks in a plurality of sets of optical device systems are continuous. As long as the arrangement form is one light shape pattern, the arrangement forms other than FIGS. 2 to 4 (for example, the rectangular light shape pattern A, the light shape pattern B, and the light shape pattern C are bent). In this case, the arrangement form of the optical device systems and the type, shape, structure, etc. of the continuous patterning means can be selected.

  Using the optical three-dimensional modeling apparatus of the present invention, when the entire surface of each planar drawing mask in a plurality of sets of optical apparatus systems is transparent, the optical shape patterns formed on the modeling surface via each planar drawing mask are end portions. Alternatively, when forming one continuous light shape pattern in close proximity or overlapping in the vicinity of the end portion, adjacent light shape patterns are not in contact with each other and there is a gap between them (each surface shape) (When one continuous light shape pattern is not formed in the whole of the plurality of light shape patterns formed on the modeling surface when the entire surface of the drawing mask is light-transmitted) Note that a high quality stereolithography product cannot be obtained.

  As the continuous patterning means in the optical three-dimensional modeling apparatus of the present invention, each light shape irradiated to the modeling surface through each planar drawing mask when the entire surface of each planar drawing mask in a plurality of sets of optical apparatus is transparent A means capable of forming one continuous light shape pattern as a whole on the modeling surface made of the photocurable resin composition by bringing the patterns into close contact with each other at or near the end of each light shape pattern. Any can be used. Among them, in the present invention, as a continuous patterning means, a declination prism that can change the traveling direction of light having a predetermined shape pattern formed through a planar drawing mask while maintaining the shape pattern, A mirror or the like is preferably employed. In the optical three-dimensional modeling apparatus of the present invention, among the plurality of sets of optical apparatus systems, the optical shape patterns irradiated on the modeling surface through the respective planar drawing masks when the entire surface of each planar drawing mask is transmitted are end portions. The downstream side of the planar drawing mask of the optical device system that needs to change the traveling direction of the light of the predetermined shape pattern that has passed through the planar drawing mask in order to closely or overlap with each other to form one continuous light shape pattern In addition, continuous patterning optical means such as a declination prism is arranged. At that time, in the optical apparatus system, it is possible to arrange a projection lens downstream of the planar drawing mask and to arrange a continuous patterning optical means such as a declination prism downstream of the projection lens, particularly directly below. It is preferable in terms of ease.

  A declination prism preferably used as the continuous patterning means is a declination prism 9 as illustrated in FIG. 5, wherein the angle α is 10 ° to 80 ° and the angle β is 1/2 of the angle α. The V-shaped declination prism is preferably used from the viewpoint of internal reflection. FIG. 5A is a schematic diagram showing the entire deflection prism, and FIG. 5B is a view seen from the V-shaped end face of the deflection prism. FIG. 5C is a diagram schematically showing a state in which light incident on the deflection prism of FIG. 5 is refracted and emitted by the deflection prism 9. In FIG. 5, a declination prism in which the angle α is 10 ° to 80 ° and the angle β is ½ of the angle α, particularly the angle α is 30 °, 35 °, 40 °, 45 °, 50 Declination prisms having an angle of β, 55 °, 60 ° and β being ½ of α have been commercially available in the past, and such commercially available declination prisms can be used in the present invention. . In the declination prism 9 as shown in FIG. 5, the corners at the angles α and β generally do not need to be sharp because they are not involved in light refraction (change in the light path). From the standpoint of preventing breakage, it may be cut out as shown in FIG. 5 or may be rounded.

  One continuous staggered light as shown in FIG. 2 in which three rectangular light shape patterns are in close contact with each other at the edge of the modeling surface when the entire surface of each planar drawing mask is transparent in a plurality of sets of optical device systems In order to form the shape pattern on the modeling surface, the optical three-dimensional modeling apparatus of the present invention may be arranged and structured as shown in FIGS. 6 and 7, for example. 6 is a bird's-eye view of the entire optical three-dimensional modeling apparatus including three sets of optical device systems (A1, B1, C1), and FIG. 7 is an arrow indicating the optical three-dimensional modeling apparatus of FIG. It is the figure (front view) seen from the direction of a. The optical three-dimensional modeling apparatus shown in FIGS. 6 and 7 is not shown on the upstream side of the Fresnel lenses 5a, 5b, and 5c in the three sets of optical apparatus systems (A1, B1, and C1). Each optical device system includes optical members such as a rod lens, a convex lens, and a reflecting mirror.

  In the optical three-dimensional modeling apparatus shown in FIG. 6 and FIG. 7, each of the three sets of optical device systems (A1, B1, C1) is composed of, for example, an optical device system as shown in FIG. Each of the planar drawing masks in FIG. Deflection prisms 9a and 9c are arranged immediately below the projection lenses 7a and 7c in the optical device systems A1 and C1, and the light shape pattern A (Fresnel lens 5a, planar drawing mask 6a and the like) formed by the optical device system A1 is provided. Each of the optical shape pattern that has passed through the projection lens 7a and the optical shape pattern C that is formed by the optical device system C1 (the optical shape pattern that has passed through the Fresnel lens 5c, the planar drawing mask 6c, and the projection lens 7c) is drawn in a planar manner. A light shape pattern formed by the central optical device system B1 is refracted by the declination prism 9a or 9c (changing the path) while maintaining the same light shape pattern as that formed through the mask 6a or 6c. On both sides of B (light shape pattern that has passed through Fresnel lens 5b, planar drawing mask 6b, and projection lens 7b) It is close to point-like at the end in square arrangement. As a result, as shown in FIG. 2, three light shape patterns (A, B, and C) are closely or overlapped with each other in a diagonal arrangement state, and a staggered light shape pattern that is continuous as a whole is formed. The surface is irradiated.

  As shown in FIG. 3 or 4, three rectangular light shape patterns are closely or overlapped with each other on the side of the modeling surface when the entire surface of each of the planar drawing masks in the plurality of sets of optical device systems is transparent. In order to form a continuous large rectangular optical shape pattern on the modeling surface, the optical three-dimensional modeling apparatus according to the present invention is not limited to the arrangement form as shown in FIG. 8 and FIG. It should be structured. FIG. 8 is a bird's-eye view of the entire optical three-dimensional modeling apparatus composed of three sets of optical device systems (A1, B1, C1), and FIG. 9 shows the optical three-dimensional modeling apparatus of FIG. It is the figure (front view) seen from the direction of a. 8 and 9 is not shown on the upstream side of the Fresnel lenses 5a, 5b, and 5c in the three sets of optical device systems (A1, B1, and C1). Each optical device system includes optical members such as a rod lens, a convex lens, and a reflecting mirror.

  In the optical three-dimensional modeling apparatus shown in FIGS. 8 and 9, each of the three sets of optical device systems (A1, B1, and C1) includes, for example, an optical device system as shown in FIG. Each of the planar drawing masks in FIG. Deflection prisms 9a and 9c are arranged immediately below the projection lenses 7a and 7c in the optical device systems A1 and C1, and the light shape pattern A (Fresnel lens 5a, planar drawing mask 6a and the like) formed by the optical device system A1 is provided. Each of the optical shape pattern that has passed through the projection lens 7a and the optical shape pattern C that is formed by the optical device system C1 (the optical shape pattern that has passed through the Fresnel lens 5c, the planar drawing mask 6c, and the projection lens 7c) is drawn in a planar manner. A light shape pattern formed by the central optical device system B1 is refracted by the declination prism 9a or 9c (changing the path) while maintaining the same light shape pattern as that formed through the mask 6a or 6c. On both sides of B (light shape pattern that has passed through Fresnel lens 5b, planar drawing mask 6b, and projection lens 7b) Or brought into intimate linearized with sides or to overlap with the column arrangement. Thereby, as shown in FIG. 3 or FIG. 4, the modeling surface is irradiated with a large rectangular light shape pattern that is continuous as a whole.

  In the optical three-dimensional model | molding apparatus of this invention including the optical three-dimensional model | molding apparatus illustrated in FIGS. 6-9, it is a photocurable resin composition through a planar drawing mask at the time of the whole surface transparency of each planar drawing mask. As shown in FIGS. 2 to 4, for example, the optical shape pattern formed on the modeling surface is maintained as one continuous optical shape pattern, and the positional relationship between the plurality of optical device systems is shifted. Perform optical modeling by moving together (integrated) on the modeling surface so that there is no such thing. At the time of actual modeling work, the mask image of each planar drawing mask in a plurality of sets of optical device systems corresponded to the photocured cross-sectional shape pattern to be formed on the modeling surface, not the mask image at the time of the entire surface transmission Since it is a mask image, the optical shape pattern formed (irradiated) on the modeling surface by a plurality of sets of optical device systems at the time of actual modeling work is the optical shape pattern illustrated in FIGS. It is not according to the cross-sectional shape pattern to be formed on the modeling surface.

  The types of declination prisms that are preferably arranged as continuous patterning means under the projection lens (especially the angles α and β in the declination prism, the length dimensions of each part of the declination prism, etc.) Size, arrangement, number of pixels of planar drawing mask, shape, size, shape and size of optical shape pattern irradiated to modeling surface via planar drawing mask, distance between projection lens and modeling surface, and production Depending on the size of the three-dimensional object to be formed (the size of the cross-sectional shape pattern), etc., each surface drawing mask in a plurality of sets of optical device systems is formed on the modeling surface via each surface drawing mask when light is transmitted through the entire surface. Those that can be formed into one continuous light shape pattern by closely or overlapping each other at or near the end without causing interference between the light shape patterns are selected and used.

  When performing optical modeling using the optical three-dimensional modeling apparatus of the present invention, a plurality of sets of optical apparatus systems are moved together (integrally) so that their positional relationships are not shifted, and are moved continuously or intermittently. Accordingly, the mask image of each planar drawing mask in a plurality of sets of optical device systems is changed continuously or intermittently depending on the cross-sectional shape pattern to be formed on the modeling surface made of the photocurable resin composition. Can be modeled. Among them, the mask image can be changed continuously (moving image) as a planar drawing mask, and liquid crystal shutters or digital micromirror shutters arranged in a planar shape (liquid crystal mask or digital micromirror mask) are used. The optical device systems of the set are continuously moved together so that the positional relationship does not deviate from each other, and the mask image of each planar drawing mask in the plurality of sets of optical device systems is made of a photocurable resin composition accordingly. It is preferable to employ a method of modeling while changing continuously in a moving image according to a cross-sectional shape pattern to be formed on the modeling surface (hereinafter, this may be referred to as “continuous modeling method”).

  When the continuous modeling method is adopted, the distance between adjacent minute dot areas projected from a surface drawing mask such as a liquid crystal mask or a digital micromirror mask is kept small on the modeling surface made of the photocurable resin composition. However, it is possible to smoothly manufacture an optically shaped object of various sizes ranging from a small size to a large size at a high modeling speed and high modeling accuracy. In addition, each part of the photocured resin layer formed on the modeling surface by light irradiation is not simply cured by only one light irradiation, but is continuously irradiated on the modeling surface through a planar drawing mask. Since the light of a predetermined pattern that changes in a moving manner is completely irradiated and light-cured resin layer is formed until it completely passes through each part, the light of the irradiation light at the time of optical modeling is formed. Even if the moving speed is increased, sufficient photocuring can be performed, and the target optically shaped article can be manufactured with high productivity in a short time. Moreover, since the light irradiation amount in each part of the photocured resin layer having a predetermined cross-sectional shape pattern formed on the modeling surface is made uniform by the continuous light irradiation described above, discontinuity between adjacent irradiation parts No light unevenness occurs, light irradiation is performed without uniform spots on the entire cross-sectional shape pattern, the dimensional accuracy and modeling accuracy of the optically shaped object is improved, and there is no intensity unevenness, and the appearance is superior It will be a thing.

  A plurality of sets of optical apparatus systems when performing modeling by the above-described continuous modeling method using the optical three-dimensional modeling apparatus of the present invention, and the direction and speed of continuous movement of each planar drawing mask are the type of light source, photocuring Intensity of light irradiated on a modeling surface made of a curable resin composition, exposure area (exposure area) on the modeling surface, shape of a cross-sectional pattern to be formed, type of photocurable resin composition, photocurability It is controlled and adjusted using a computer or the like according to the photocuring characteristics of the resin composition and the exposure time required to form the photocured layer. Uniform control of the amount of light applied to a modeling surface made of a photocurable resin composition when a plurality of sets of optical device systems, and thus a plurality of planar drawing masks, are continuously moved linearly together while maintaining a predetermined arrangement form. However, it is of course not limited thereto.

  In order to change the mask image of each planar drawing mask in a continuous (moving image) manner in synchronism with the continuous movement of a plurality of sets of optical device systems, and thus each planar drawing mask together, try to form The information about the mask image to be formed by the planar drawing mask is stored in advance in a computer or the like in correspondence with the contents of the cross-sectional shape pattern, multiple sets of optical device systems, the continuous moving speed of each planar drawing mask, etc. It is preferable to continuously change the mask image of each planar drawing mask based on the information.

The means for moving a plurality of sets of optical devices together (integrated) on the modeling surface is not particularly limited. For example, a linear guide, a shaft, a flat bar, etc. are used as a guide, and the drive is a ball screw or a trapezoidal screw. , A timing belt, a rack and pinion, a chain, and the like, and an AC servo motor, a DC servo motor, a stepping motor, a pulse motor, and the like can be used as a drive source. Also, a linear motor system that serves both as a guide and a drive, and an arm tip of an articulated robot can also be used. In particular, when a pulse motor is used as a drive source, the planar drawing mask can be moved continuously with a fine pitch precisely, so that the mask image of the planar drawing mask is continuously changed like a movie. It is advantageous when performing stereolithography.
Regardless of which moving device is used, in the optical three-dimensional modeling apparatus of the present invention, the plurality of sets of optical device systems are not moved individually but moved together (integrated), so that The number of moving means in the apparatus system can be reduced, and the moving means can be simplified.

The kind of the photocurable resin composition used when performing optical modeling using the optical three-dimensional modeling apparatus of the present invention is not particularly limited, and light such as liquid, paste, powder, and thin film that can be used for optical modeling. Any of the curable resin compositions can be used.
Examples of photocurable resin compositions that can be used include various oligomers such as urethane acrylate oligomers, epoxy acrylate oligomers, ester acrylate oligomers, and polyfunctional epoxy resins that are conventionally used in stereolithography; isobornyl acrylate, Isobornyl methacrylate, dicyclopentenyl acrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethyl acrylate, dicyclopentenyloxyethyl methacrylate, dicyclopetanyl acrylate, dicyclopetanyl methacrylate, bornyl acrylate, bornyl methacrylate , 2-hydroxyethyl acrylate, cyclohexyl acrylate, 2-hydroxypropyl acrylate, phenoxyethyl acrylate, mole Acrylic compounds such as phosphorus acrylamide, morpholine methacrylamide and acrylamide, and various monofunctional vinyl compounds such as N-vinyl pyrrolidone, N-vinyl caprolactam, vinyl acetate and styrene; trimethylolpropane triacrylate, ethylene oxide modified trimethylolpropane Triacrylate, ethylene glycol diacrylate, tetraethylene glycol diacrylate, polyethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, dicyclopentanyl diacrylate, Polyester diacrylate, ethylene oxide modified bisphenol A diacrylate, pentaerythritol triacryl , Pentaerythritol tetraacrylate, propylene oxide modified trimethylolpropane triacrylate, propylene oxide modified bisphenol A diacrylate, tris (acryloxyethyl) isocyanurate, etc .; hydrogenated bisphenol A diglycidyl ether, 3, 4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-meta-dioxane, bis (3,4-epoxy And various epoxy compounds such as (cyclohexylmethyl) adipate, and a photocurable resin containing one or more of these compounds, a photopolymerization initiator, and a sensitizer if necessary. A fat composition can be used.

In addition to the above-described components, the photo-curable resin composition may include a leveling agent, a surfactant other than a phosphate ester surfactant, an organic polymer modifier, an organic plasticizer, and the like as necessary. May be contained.
Furthermore, the photocurable resin composition may contain a filler such as solid fine particles or whiskers as necessary. When a photocurable resin composition containing a filler is used, it is possible to improve dimensional accuracy by reducing volume shrinkage at the time of curing, improve mechanical properties and heat resistance, and the like.

  Examples of the solid fine particles used as the filler include inorganic fine particles such as carbon black fine particles, and organic polymer fine particles such as polystyrene fine particles, polyethylene fine particles, polypropylene fine particles, acrylic resin fine particles, and synthetic rubber fine particles. 1 type (s) or 2 or more types can be used. The particle size of the solid fine particles is not particularly limited, but generally those having an average particle size of 200 μm or less, particularly 100 μm or less are preferably used.

  The whisker preferably has a diameter of 0.3 to 1 μm, particularly 0.3 to 0.7 μm, a length of 10 to 70 μm, particularly 20 to 50 μm, and an aspect ratio of 10 to 100, particularly 20 to 70 μm. Used. In addition, the dimension and aspect ratio of a whisker here are the dimension and aspect ratio measured using the laser diffraction / scattering type particle size distribution measuring apparatus. The type of whisker is not particularly limited, and examples thereof include aluminum borate whisker, aluminum oxide whisker, aluminum nitride whisker water, magnesium oxide whisker, titanium oxide whisker, and the like. Species or two or more can be used.

  The solid fine particles and / or whiskers may or may not be surface-treated with a silane coupling agent, but are preferably surface-treated. When the solid fine particles and / or whiskers are surface-treated with a silane coupling agent, a photocured product with higher heat deformation temperature, flexural modulus, and mechanical strength can be obtained. In this case, as the silane coupling agent, any of silane coupling agents conventionally used for filler surface treatment and the like can be used. Preferred silane coupling agents include aminosilane, epoxy silane, vinyl silane, and ( Mention may be made of (meth) acrylic silanes.

The present invention will be specifically described below, but the present invention is not limited to the examples.
Example 1
(1) Three sets (A1, B1, C1) of the same optical device system shown in FIG. 1 are prepared, and the three sets of optical device systems (A1, B1, C1) are arranged as shown in FIGS. Thus, they are continuously moved together (integrally) without causing any positional deviation. At that time, the ultra-high pressure mercury lamp “HXPR120W” (output 120 W) manufactured by Mitsubishi Electric OSRAM Co., Ltd. is used as the light source, the rod lens (Φ50) manufactured by Weilty Co., Ltd. Company "Cold Mirror", Fresnel lens made by Nippon Special Optical Resin Co., Ltd. as Fresnel lens 5 (5a, 5b, 5c), Casio calculator as planar drawing mask (liquid crystal drawing mask) 6 (6a, 6b, 6c) “EL-Nikkor” manufactured by Nikon Corporation was used as a VGA liquid crystal (640 × 480 pixels) manufactured by Corporation and a projection lens 7 (7a, 7b, 7c). Further, right under the projection lenses 7a and 7c in the optical device systems A1 and C1, as the deflection prisms 9a and 9c, a deflection prism “45 °” manufactured by Morita Optical Co., Ltd. (the angle α of the deflection prism = 45 °, The angle of β = 22.5 ° was attached as shown in FIGS.

(2) “CPX-1000” (curing sensitivity: 2.5 mJ; ultraviolet curing wavelength: 365 nm; containing Irgacure (registered trademark) 651 as a photopolymerization initiator) manufactured by C-met as a photocurable resin composition, The three optical device systems (A1, B1, C1) arranged as shown in FIGS. 6 and 7 are joined together so as not to cause misalignment between the optical device systems (position misalignment between the planar drawing masks). (Integrated), each projection size at the time of the whole surface transmission to the modeling surface 8 (photocurable resin composition surface) by each planar drawing mask (6a, 6b or 6c) = 28.8 mm × 38.4 mm (Rectangular) [(traveling direction of apparatus; X direction shown in FIG. 2) × (direction perpendicular to traveling direction; Y direction shown in FIG. 2)] A series of three light shape patterns formed in close contact with each other One light shape pattern (total projection Size) = 86.4 mm × 115.2 mm (staggered shape in a diagonal arrangement) [(traveling direction of apparatus; X direction shown in FIG. 2) × (direction perpendicular to traveling direction; Y direction shown in FIG. 2) ], Each surface drawing mask (6a, 6b) under the condition of light energy intensity of 4 mW / cm ^{2 on} the modeling surface 8 and continuous moving speed at the time of light irradiation with three sets of optical device systems integrated = 30 mm / sec. , 6c) was subjected to optical modeling while continuously changing the mask image in a moving manner, and a three-dimensional modeled object (vertical × horizontal × thickness = 220 mm × 220 mm × 15 mm) having the cross-sectional shape pattern of FIG. 10 was manufactured.
(3) The total modeling time required in Example 1 was 6.2 hours, which was about 1/3 of the modeling time when the same three-dimensional model was manufactured using one planar drawing mask. It was. In addition, compared to the modeling time (about 74.5 hours) when the same three-dimensional model is manufactured by performing the modeling by the pointillization method with the light beam (energy intensity of the light beam = 120 mW, moving speed = 5 m / sec), Stereolithography could be performed at an extremely high speed in a short time. The obtained three-dimensional model was excellent in appearance and strength.

The optical three-dimensional modeling apparatus of the present invention effectively uses a high-quality three-dimensional modeled object having excellent dimensional accuracy and appearance and high strength at a high modeling speed and high modeling accuracy with high productivity. be able to.
And the optical three-dimensional model | molding apparatus of this invention can be effectively used for manufacture of the various three-dimensional model | molding thing ranging from small size to large size.
In the case of the optical three-dimensional modeling apparatus of the present invention, models for precision parts, electrical / electronic parts, furniture, building structures, automobile parts, various containers, castings, molds, mother molds, etc. Smoothly design parts for complex heat transfer circuits, parts for analysis planning of heat transfer behavior of complex structures, and other various 3D objects with complicated shapes and structures with high modeling speed and dimensional accuracy Can be manufactured.

It is a figure which shows the example of each optical apparatus system which comprises the optical three-dimensional model | molding apparatus of this invention. The continuous optical shape pattern formed on the modeling surface made of the photocurable resin composition when the entire surface of each planar drawing mask in the optical device system is transparent by the plural optical device systems in the optical three-dimensional modeling apparatus of the present invention. It is a figure which shows the example of. The continuous optical shape pattern formed on the modeling surface made of the photocurable resin composition when the entire surface of each planar drawing mask in the optical device system is transparent by the plural optical device systems in the optical three-dimensional modeling apparatus of the present invention. It is a figure which shows another example of. The continuous optical shape pattern formed on the modeling surface made of the photocurable resin composition when the entire surface of each planar drawing mask in the optical device system is transparent by the plural optical device systems in the optical three-dimensional modeling apparatus of the present invention. It is a figure which shows another example of these. It is a figure which shows the example of the declination prism used for the optical three-dimensional model | molding apparatus of this invention. It is a figure which shows the example of the optical three-dimensional modeling apparatus of this invention used in forming the optical shape pattern shown in FIG. 2 in a modeling surface. It is the figure which looked at the optical three-dimensional modeling apparatus of FIG. 6 from the direction of arrow A. It is a figure which shows the example of the optical three-dimensional model | molding apparatus of this invention used for forming the optical shape pattern shown in FIG. 3 or FIG. 4 in a modeling surface. It is the figure which looked at the optical three-dimensional modeling apparatus of FIG. 8 from the direction of arrow A. 3 is a diagram showing a cross-sectional shape pattern of a three-dimensional structure manufactured in Example 1. FIG.

Explanation of symbols

A Optical shape pattern formed on the modeling surface when one surface drawing mask is transparent on the entire surface B B Optical shape pattern formed on the modeling surface when one surface drawing mask is transparent on the entire surface C One surface shape Optical shape pattern formed on the modeling surface when the entire surface of the drawing mask is transparent A1 Optical device system B1 Optical device system C1 Optical device system 1 Light source 2 Rod lens 3 Convex lens 4 Reflecting mirror 5 Condensing lens or Fresnel lens 5a Fresnel lens 5b Fresnel lens Lens 5c Fresnel lens 6 Planar drawing mask 6a Planar drawing mask 6b Planar drawing mask 6c Planar drawing mask 7 Projection lens 7a Projection lens 7b Projection lens 7c Projection lens 8 Modeling surface made of photocurable resin composition 9 Deflection angle Prism 9a Deflection prism 9c Deflection prism

Claims (8)

(I) Means for sequentially supplying one layer of the photocurable resin composition on the mounting table or the photocured resin layer to sequentially form a modeling surface made of the photocurable resin composition;
(II) A mask image of the planar drawing mask comprising at least a light emitting means and a planar drawing mask, and the light emitted from the light emitting means is applied to the modeling surface made of the photocurable resin composition through the planar drawing mask. A plurality of sets of optical device systems for irradiating with a predetermined shape pattern corresponding to
(III) Each light shape pattern irradiated to the modeling surface through each surface drawing mask when the entire surface of each surface drawing mask in the plurality of sets of optical device systems is transmitted is the end or end of each light shape pattern. Continuous patterning means for forming one continuous light shape pattern on the modeling surface of the photocurable resin composition in close proximity to each other or overlapping each other; and
(IV) While maintaining the arrangement form of a plurality of sets of optical device systems in an arrangement form that allows one continuous light shape pattern to be formed on the modeling surface as a whole by the continuous patterning means of (III) above, Means for moving a set of optical systems together;
An optical three-dimensional modeling apparatus characterized by comprising:   The optical solid according to claim 1, wherein the (III) continuous patterning means is a declination prism arranged downstream of a planar drawing mask in at least one of the plurality of optical device systems. Modeling equipment.   Each planar drawing mask in the plurality of sets of optical device systems is a rectangular planar drawing mask, and the arrangement form of the plurality of sets of optical device systems is arranged via each planar drawing mask when the entire surface of each planar drawing mask is transparent. A plurality of rectangular light shape patterns irradiated on the modeling surface are closely or overlapped with each other at diagonal ends of the rectangular light shape pattern to form one continuous shape pattern as a whole. Or an arrangement in which one continuous shape pattern is formed on the molding surface by closely or overlapping each other in a side-by-side arrangement with the sides of the rectangular optical shape pattern, The continuous patterning means of the above-described diagonal arrangement of a plurality of rectangular light shape patterns irradiated on the modeling surface through the respective planar drawing masks when the entire surface is transparent under the arrangement form of a plurality of sets of optical device systems Status Other stereolithography apparatus according to claim 1 or 2 which is a means for forming into a shaped surface of one continuous shape pattern across closely or overlapping in a series arrangement.   Each optical device system has a projection lens downstream of the planar drawing mask, and the optical device system having the continuous patterning means (III) downstream of the planar drawing mask is downstream of the planar drawing mask and ( The optical three-dimensional model | molding apparatus of any one of Claims 1-3 which has a projection lens upstream of the continuous patterning means of III).   The planar drawing mask in each optical device system is a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in a planar shape. The optical three-dimensional modeling apparatus described in 1.   The optical three-dimensional modeling apparatus according to claim 1, wherein the planar drawing mask in each optical device system is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a planar shape.   Each planar drawing mask in a plurality of sets of optical device systems is a planar drawing mask capable of continuously changing a mask image, and the means (IV) for moving a plurality of sets of optical device systems together is a plurality of sets. And a means for continuously changing the mask image of each planar drawing mask corresponding to the continuous movement of a plurality of sets of optical device systems. 6. The optical three-dimensional modeling apparatus according to claim 1. The method of performing optical modeling using the optical three-dimensional model | molding apparatus of any one of Claims 1-7.

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