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JP4463121B2 - Glass material for sintering, method for producing the same, and method for producing a glass sintered product - Google Patents
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JP4463121B2 - Glass material for sintering, method for producing the same, and method for producing a glass sintered product - Google Patents

Glass material for sintering, method for producing the same, and method for producing a glass sintered product Download PDF

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JP4463121B2
JP4463121B2 JP2005011410A JP2005011410A JP4463121B2 JP 4463121 B2 JP4463121 B2 JP 4463121B2 JP 2005011410 A JP2005011410 A JP 2005011410A JP 2005011410 A JP2005011410 A JP 2005011410A JP 4463121 B2 JP4463121 B2 JP 4463121B2
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binder
glass
sintering
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sintered
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木 教 一 柵
茂 小野田
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iwasakidenki
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/07Impurity concentration specified

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)

Description

本発明は、石英ガラス製品を低コストで高精度に製造するための焼結用ガラス材料及びその製造方法と、その焼結用ガラス材料を用いたガラス焼結品の製造方法に関する。   The present invention relates to a glass material for sintering for manufacturing a quartz glass product at low cost with high accuracy, a method for manufacturing the glass material, and a method for manufacturing a sintered glass product using the glass material for sintering.

石英ガラスは、光学特性に優れることから液晶プロジェクタのバックライト光源ユニットなどへの使用が期待されている。
しかし、複雑な形状物の加工が難しく、熟練した作業者の技術が要求されるため、設計寸法通りに成形することが困難であり、同一形状、同一品質のものを量産できないことから、加工コストも著しく高価という問題があった。
また、加工温度が約2000℃と著しく高温であるため、エネルギーの消費量が多く、ひいては地球温暖化ガスであるCOの大量発生につながるという懸念がある。
Quartz glass is expected to be used in backlight light source units of liquid crystal projectors because of its excellent optical characteristics.
However, since it is difficult to process complex shapes and skill of skilled workers is required, it is difficult to form according to the design dimensions, and the same shape and quality cannot be mass-produced. There was also a problem that it was extremely expensive.
In addition, since the processing temperature is as high as about 2000 ° C., there is a concern that the energy consumption is large, leading to a large amount of CO 2 being a global warming gas.

そこで本出願人は、球状シリカにバインダを添加し、これを顆粒状に造粒した焼結用ガラス材料を金型に入れて乾式プレス成形することにより焼結用成形体を作成し、この成形体を大気中の酸化性雰囲気または還元性雰囲気で加熱焼結して石英ガラス製品を製造する方法を提案した。
特開2004−131351
Therefore, the present applicant creates a sintered compact by adding a binder to spherical silica, putting the glass material for sintering granulated into a mold and dry press molding, and forming this molding. A method for producing quartz glass products by heating and sintering the body in an oxidizing or reducing atmosphere in the atmosphere was proposed.
JP 2004-131351 A

これによれば、任意の形状の石英ガラス製品を製造する場合に、熟練を必要とせず、量産しても寸法制度が確保されるため、製造コストを格段に低減できるし、焼結温度も比較的低温で済むので、エネルギーの消費量が少なくて済み、その分、COの発生も抑制することができるというメリットがある。 According to this, when manufacturing quartz glass products of any shape, skill is not required and the dimensional system is ensured even in mass production, so the manufacturing cost can be significantly reduced, and the sintering temperature is also compared. Therefore, there is an advantage that energy consumption can be reduced and generation of CO 2 can be suppressed correspondingly.

しかしながら、このような製法で、プロジェクタ用光源装置の反射鏡を作成し、熟練工が手作業で作成した反射鏡と比較したところ、手作業の反射鏡と遜色のないものもあるが、中には著しく明るさの劣る反射鏡が製造される場合があることが判明した。
これらの反射鏡を比較検討してみたところ、良品は反射鏡表面のガラス組織が密で凹凸がないのに対し、明るさの劣る反射鏡表面は、表面の一部あるいは全面のガラス組織が比較的粗く梨地状の微細な凹凸が形成されているものがあることが判明した。
However, a reflector for a light source device for a projector is produced by such a method, and when compared with a reflector created manually by a skilled worker, there are some that are not inferior to a reflector made by hand. It has been found that reflectors with extremely poor brightness may be manufactured.
Comparing these reflectors, the non-defective product has a dense glass structure on the surface of the reflector and no irregularities, while the reflector surface with inferior brightness is compared with the glass structure of a part or the entire surface. It was found that there were some rough and satin-like fine irregularities formed.

このように鏡面部分に一部でも粗面が形成されると、ランプから放出された直線光が反射鏡に入射しても、粗面で散乱して所望の設計角度通りに反射しないため、プロジェクタ用光源装置の反射鏡として用いると著しく明るさが劣るだけでなく、散乱光が液晶パネル面に直角入射しない光となって無駄に放射されるだけでなく、液晶パネル面を余分に加熱してしまうという問題を生ずる。
このため発明者らが、粗面が形成される原因を究明すべく試験・研究を行ったところ、顆粒状に造粒された焼結用ガラス材料に用いられている球状シリカに混合されているバインダの態様に影響していることが判明した。
In this way, if a part of the rough surface is formed on the mirror surface, even if the linear light emitted from the lamp is incident on the reflecting mirror, it is scattered by the rough surface and is not reflected at the desired design angle. When used as a reflector of a light source device, the brightness is notably inferior, but not only is scattered light incident on the liquid crystal panel surface at a right angle but is not radiated, but the liquid crystal panel surface is heated excessively. Cause the problem.
For this reason, the inventors conducted tests and research to find out the cause of the formation of the rough surface, and it was mixed with the spherical silica used in the glass material for sintering granulated. It was found that the binder aspect was affected.

図4は顆粒状に造粒された焼結用ガラス材料を拡大したときの模式図であるが、図4(a)に示すように、バインダ粒子41が球状シリカ42に比して小さく均一に分布する場合は表面に粗面が形成され難く、図4(b)に示すように、バインダ粒子41が球状シリカ42に比して大きいものもあり、不均一に分布する場合は表面に粗面が形成されやすいことが判明した。
即ち、バインダ粒子が大きい分、球状シリカの密度が低くなるため焼結時に巣が入りやすく、また、バインダを揮発燃焼させるのに時間がかかるため焼結時に完全に揮発燃焼されないままガラス組織内に閉じ込められて粗面が形成されることが判明した。
FIG. 4 is a schematic diagram when the glass material for sintering granulated is enlarged. As shown in FIG. 4A, the binder particles 41 are smaller and more uniform than the spherical silica 42. When distributed, it is difficult to form a rough surface on the surface. As shown in FIG. 4B, some of the binder particles 41 are larger than the spherical silica 42, and when unevenly distributed, the surface is rough. Turned out to be easy to form.
In other words, the larger the binder particles, the lower the density of the spherical silica, so that the nests are likely to enter during sintering, and it takes time to volatilize and burn the binder. It was found that a rough surface was formed by being confined.

したがって、図4(a)に示すようにバインダ粒子41を球状シリカ42に比して小さく均一に揃えれば高品質の石英ガラス製品が製造されるが、バインダ粒子41を小さく均一に形成することは難しく、コストも時間もかかるため、実験室レベルでの研究であればともかく実用的ではない。   Accordingly, as shown in FIG. 4 (a), if the binder particles 41 are made smaller and uniform than the spherical silica 42, a high-quality quartz glass product is produced. It is difficult, costly and time consuming, so it is not practical anyway if it is a laboratory level study.

そこで本発明は、そのような発明者の知見に基づきなされたもので、焼結用ガラス材料を金型に入れて乾式プレス成形して得られた焼結用成形体を加熱焼結して石英ガラス製品を製造する際に、製品表面にガラス組織の粗い梨地状の微細な凹凸が形成されることがなく、量産しても高品質の石英ガラス製品を低コストで製造できるようにすることを技術的課題としている。   Therefore, the present invention has been made on the basis of such inventor's knowledge. A sintered compact obtained by putting a sintering glass material into a mold and dry press molding is heated and sintered to obtain quartz. When manufacturing glass products, it is possible to produce high-quality quartz glass products at low cost even when mass-produced, without the formation of fine irregularities with a rough texture on the product surface. It is a technical issue.

この課題を解決するために、本発明に係る焼結用ガラス材料は、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダがシリカを主成分とするコアの表面に隙間なくコーティングされて成るガラス原料粉末を集合させて顆粒状に形成されたことを特徴としている。   In order to solve this problem, the glass material for sintering according to the present invention has a binder containing one or both of a paraffin binder and a stearic acid binder coated on the surface of a core containing silica as a main component without gaps. The glass raw material powder is formed into a granular shape by assembling.

また、本発明に係る焼結用ガラス材料の製造方法は、シリカを主成分とするコアと、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダ溶液を混合した懸濁液を生成し、チャンバ内を流れる熱風中に前記懸濁液を噴霧することにより、前記バインダがコアの表面にコーティングされて成るガラス原料粉末を集合させて顆粒状に形成する際に、前記熱風のチャンバ内への流入温度及び流出温度がいずれも前記バインダの融点より高く設定したことを特徴としている。   Further, the method for producing a sintering glass material according to the present invention produces a suspension in which a core mainly composed of silica and a binder solution containing one or both of a paraffinic binder and a stearic acid binder are produced. By spraying the suspension into hot air flowing in the chamber, the glass raw material powder in which the binder is coated on the surface of the core is aggregated and formed into a granular shape, and then into the hot air chamber. Both the inflow temperature and the outflow temperature are set higher than the melting point of the binder.

さらに、本発明に係る焼結用ガラスの製造方法は、焼結用ガラス材料を成形用金型に充填して乾式プレス成形することにより得られた焼結用成形体を加熱焼結する際に、前記焼結用ガラス材料が、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダがシリカを主成分とするコアの表面に隙間なくコーティングされて成るガラス原料粉末を集合させて顆粒状に形成されていることを特徴としている。   Furthermore, in the method for producing a sintering glass according to the present invention, when the sintered compact obtained by filling the sintering glass material into a molding die and dry press molding is heated and sintered, The glass material for sintering is made by assembling a glass raw material powder in which a binder containing one or both of a paraffin binder and a stearic acid binder is coated on the surface of a core mainly composed of silica without gaps. It is characterized by being formed.

本発明によれば、シリカを主成分とするコアと、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダ溶液を混合した懸濁液を生成し、流入温度及び流出温度がいずれも前記バインダの融点より高く設定された熱風が流れるチャンバ内に前記懸濁液を噴霧することにより、バインダがコアの表面に隙間なくコーティングされたガラス原料粉末が集合した顆粒状の焼結用ガラス材料が生成される。
したがって、焼結用ガラス材料のガラス原料粉末の表面にはバインダが隙間なくコーティングされているので、ガラス粒子の周囲に径の小さなバインダ粒子を製造したり均一に分布させたりするまでもなく、これと同等の粒子分布を形成することができる。
According to the present invention, a suspension is prepared by mixing a core mainly composed of silica and a binder solution containing one or both of a paraffinic binder and a stearic acid binder, both of which have an inflow temperature and an outflow temperature. By spraying the suspension into a chamber in which hot air set higher than the melting point of the binder flows, a granular sintering glass material in which glass raw material powders coated with a binder on the surface of the core without gaps is collected. Generated.
Therefore, since the binder is coated on the surface of the glass raw material powder of the glass material for sintering without gaps, it is not necessary to produce binder particles with a small diameter around the glass particles or evenly distribute them. A particle distribution equivalent to the above can be formed.

また、このように生成された焼結用ガラス材料のガラス原料粉末は、コアにバインダをコーティングすることによりその表面に形成されたバインダ層は薄膜状になっているので、これを集合させて顆粒状に形成したときにガラス原料粉末の密度が高くなる。
したがって、これを型に入れて乾式プレスするときに、表面に付着されているバインダが潤滑材となって個々のガラス原料粉末を流動させると共に、ガラス原料粉末が稠密に固められる。
また、加熱焼結したときに巣が入りにくく、同時に、その表面に形成されているバインダ層は比較的薄く均一であるのでバインダが揮発燃焼されやすい。
したがって、製品表面にガラス組織の粗い梨地状の微細な凹凸が形成されることがなく、ガラス組織が密で高品質の石英ガラス製品を低コストで量産することができるという効果がある。
Moreover, since the glass raw material powder of the glass material for sintering produced in this way has a binder layer formed on its surface by coating the core with a binder, it is assembled into granules. When formed into a shape, the density of the glass raw material powder becomes high.
Therefore, when this is put into a mold and dry-pressed, the binder attached to the surface serves as a lubricant to flow the individual glass raw material powders, and the glass raw material powders are densely consolidated.
Further, the nest is difficult to enter when heated and sintered, and at the same time, the binder layer formed on the surface thereof is relatively thin and uniform, so that the binder is easily volatilized and burned.
Accordingly, there is no effect of forming a textured fine irregularity with a rough glass structure on the product surface, and it is possible to mass-produce a high-quality quartz glass product having a dense glass structure at a low cost.

本例では、製品表面にガラス組織の粗い梨地状の微細な凹凸が形成されることがなく高品質の石英ガラス製品を低コストで量産するという目的を、乾式プレス成形する焼結用ガラス材料を改良することにより達成した。   In this example, a sintered glass material for dry press molding is used for the purpose of mass-producing high-quality quartz glass products at low cost without the formation of fine irregularities with a rough texture on the product surface. Achieved by improvement.

以下、本発明を図面に示す実施例に基づいて説明する。
図1は本発明に係る焼結用ガラス材料を示す拡大模式図、図2はその製造方法を示す説明図、図3はガラス焼結品の製造方法を示す説明図である。
Hereinafter, the present invention will be described based on embodiments shown in the drawings.
FIG. 1 is an enlarged schematic view showing a glass material for sintering according to the present invention, FIG. 2 is an explanatory view showing a manufacturing method thereof, and FIG. 3 is an explanatory view showing a manufacturing method of a glass sintered product.

本例に係る焼結用ガラス材料1は、成形用金型に充填して乾式プレス成形することにより焼結用成形体を形成した後、この成形体を加熱焼結して石英ガラス製品を製造するためのものであって、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダ2がシリカを主成分とするコア3の表面に隙間なくコーティングされて成るガラス原料粉末4を集合させて顆粒状に形成されている。   The sintering glass material 1 according to the present example is manufactured by filling a molding die and performing dry press molding to form a sintered compact, and then heating and sintering the compact to produce a quartz glass product. A glass raw material powder 4 is formed by assembling a binder 2 containing one or both of a paraffinic binder and a stearic acid binder on the surface of a core 3 mainly composed of silica without gaps. It is formed into granules.

バインダ2は、ファインセラミックの成形助剤となるパラフィン系バインダを1.0重量%(融点=55℃)及びステアリン酸系バインダを1.0重量%(融点=100℃)、その他PVAやレジンを加え、その総量をコア3の約3.4重量%としている。   The binder 2 is 1.0% by weight (melting point = 55 ° C.) of a paraffinic binder as a forming aid for fine ceramics, 1.0% by weight (melting point = 100 ° C.) of a stearic acid binder, and other PVA and resin In addition, the total amount is about 3.4% by weight of the core 3.

コア3は外径0.3〜1.5μmの球状シリカを用いている。
球状シリカは、シリカ100%が理想であるが、製造過程でアルミナが不純物として混入し、その量によって焼結温度及び焼結された石英ガラス製品の性状に影響を与える。
すなわち、球状シリカは、半導体産業に多く使用される基板であるシリコンウエハをカットした残砕物(切れ端)やシリコンウエハの不良品を破砕した後、アルミナ製ボールミルで粉状化して生成するため、粉状化する際にアルミナ(Al)が混入し、その量は粉砕時間によって変化する。
粉砕時間は、ボールミルに投入するシリコンウエハの破片の大きさ等で加減されるため一定ではなく、またアルミ成分(Al)は、球状シリカを最も多く利用している半導体パッケージ内の絶縁材料の指定不純物としては規制されていないためその混在量には大きなバラツキがある。
The core 3 is made of spherical silica having an outer diameter of 0.3 to 1.5 μm.
The spherical silica is ideally 100% silica, but alumina is mixed as an impurity during the production process, and the amount of the silica affects the sintering temperature and the properties of the sintered quartz glass product.
In other words, spherical silica is produced by crushing a residue (cut pieces) or a defective silicon wafer cut from a silicon wafer, which is a substrate often used in the semiconductor industry, and then pulverizing it with an alumina ball mill. When forming, alumina (Al 2 O 3 ) is mixed, and the amount thereof varies depending on the grinding time.
The pulverization time is not constant because it depends on the size of the silicon wafer debris that is put into the ball mill, and the aluminum component (Al) is the designation of the insulating material in the semiconductor package that uses the most spherical silica. Since the impurities are not regulated, there is a large variation in the amount of mixture.

そして、このようなアルミ成分を不純物に含むシリカで生成されたコア3にバインダ2をコーティングする場合、バインダ2にはアルミ成分が含まれていないので、コア3に含まれるアルミ成分がそのままガラス原料粉末4の不純物となる。
そして、アルミ成分がシリカに対して70ppmを超えると焼結温度が1350℃を超えてしまい、70ppm以下だと1300℃以上1350℃以下の焼結温度でガラス組織が密で歪のない焼結体が得られることが分かった。
なお、アルミ成分がシリカに対して100ppm以上になると焼結温度が1370℃を超え、さらに220ppmを超えると1400℃以上に加熱しても焼結せずクリストパーライト化してしまうことが判明した。
したがって、アルミ成分をシリカに対して70ppm以下とすれば、加工時の作業温度(軟化点)が2000℃近い石英ガラス製品でも、1300〜1350℃の低温度で良好な焼結体を得ることができる。
And when coating the binder 2 on the core 3 produced | generated with the silica which contains such an aluminum component in an impurity, since the binder 2 does not contain the aluminum component, the aluminum component contained in the core 3 is the glass raw material as it is. It becomes an impurity of the powder 4.
When the aluminum component exceeds 70 ppm relative to silica, the sintering temperature exceeds 1350 ° C., and when it is 70 ppm or less, the sintered body has a dense glass structure and no distortion at a sintering temperature of 1300 ° C. to 1350 ° C. Was found to be obtained.
It has been found that when the aluminum component is 100 ppm or more with respect to silica, the sintering temperature exceeds 1370 ° C., and when it exceeds 220 ppm, even if heated to 1400 ° C. or more, it does not sinter and becomes cristoperlite.
Therefore, if the aluminum component is 70 ppm or less with respect to silica, a good sintered body can be obtained at a low temperature of 1300 to 1350 ° C. even in a quartz glass product having a working temperature (softening point) near 2000 ° C. during processing. it can.

また、アルミの重量比率をシリカに対して50ppm以下にすれば、焼結温度の下限値を1280℃まで下げることができ、1350℃までは上述と同様、ガラス組織が密で歪のない焼結体が得られることが分かった。
しかし、1350℃を超える場合には、歪の発生があり、更に1400℃の様な高温度では、僅かな不純物を核としてクリストバーライト化してしまう。
したがって、アルミ成分をシリカに対して50ppm以下としたときは、1280℃以上1350℃以下の低温度で良好な焼結体を得ることができる。
Moreover, if the weight ratio of aluminum is 50 ppm or less with respect to silica, the lower limit of the sintering temperature can be lowered to 1280 ° C., and up to 1350 ° C., as described above, the glass structure is dense and sintered without distortion. It turns out that a body is obtained.
However, when the temperature exceeds 1350 ° C., distortion occurs, and at a high temperature such as 1400 ° C., cristobalite is formed with a few impurities as nuclei.
Therefore, when the aluminum component is 50 ppm or less with respect to silica, a good sintered body can be obtained at a low temperature of 1280 ° C. or higher and 1350 ° C. or lower.

そして、このようなバインダ2をコア3の表面に隙間なくコーティングして成るガラス原料粉末4を集合させた顆粒状の焼結用ガラス材料1は以下の手順で製造する。
まず、コア3となる球状シリカに前記バインダ2を約3.4重量%混合し、粘性値10〜20mPa・sとなるように純水を加え、水分率60%に調整した後、メッシュの個々の開口が縦横38μmに設計されたフィルタにより異物を除去してスラリ(懸濁液)を得る。
コア3は、不純物となるアルミ成分がシリカに対して70ppm以下にコントロールされている。
A granular sintering glass material 1 in which glass raw material powders 4 formed by coating such a binder 2 on the surface of the core 3 without gaps is assembled in the following procedure.
First, about 3.4% by weight of the binder 2 is mixed with the spherical silica used as the core 3, pure water is added so that the viscosity value becomes 10 to 20 mPa · s, and the moisture content is adjusted to 60%. A foreign material is removed by a filter whose openings are designed to be 38 μm in length and breadth to obtain a slurry (suspension).
The core 3 is controlled so that an aluminum component as an impurity is 70 ppm or less with respect to silica.

次いで、このスラリから顆粒を作成するために噴霧乾燥機を用いる。
図2は噴霧乾燥機11を示し、下端部に顆粒回収口12が形成された直径1.5m程度のホッパ型チャンバ13の天井部中央に、スラリを噴霧する回転霧化ディスク14aを備えたアトマイザ14が配されている。
また、チャンバ13の上端側周壁面に水平接線方向から熱風を流入させる給気ダクト15が接続されると共に、チャンバ13内には前記顆粒回収口12に対向して開口する排気ダクト16が配されている。
A spray dryer is then used to make granules from this slurry.
Figure 2 shows the mists dryer 11, the ceiling portion center of the granules recovery port 12 is about the formed diameter 1.5m hopper shaped chamber 13 to the lower end, with a rotary atomizing disk 14a for spraying the slurry An atomizer 14 is arranged.
An air supply duct 15 that allows hot air to flow in from a horizontal tangential direction is connected to the peripheral wall surface on the upper end side of the chamber 13, and an exhaust duct 16 that opens facing the granule recovery port 12 is disposed in the chamber 13. ing.

なお、前記給気ダクト15に熱風発生装置17が接続されており、給気ダクト15がチャンバ13に開口する流入口15aに配された温度センサ18と、排気ダクト16がチャンバ13内に開口する流出口16aに配された温度センサ19で熱風の温度コントロールを行う。
本例では、パラフィン系バインダとステアリン酸系バインダの融点が何れも100℃以下であるので、給気ダクト15の開口部における流入熱風温度を220℃とし、排気ダクト16の開口部における排気熱風温度を130℃として、いずれも、バインダ2の融点よりも高くなるように熱風の温度が制御されるようになっている。
なお、排気熱風温度がバインダ2の融点より高ければ、流入熱風温度は必ずその温度より高いので、流出口16aのみに温度センサ19を配して温度コントロールしても同様である。
A hot air generator 17 is connected to the air supply duct 15, and a temperature sensor 18 disposed at an inlet 15 a where the air supply duct 15 opens into the chamber 13 and an exhaust duct 16 open into the chamber 13. The temperature of the hot air is controlled by the temperature sensor 19 disposed at the outlet 16a.
In this example, since the melting points of the paraffin binder and the stearic acid binder are both 100 ° C. or less, the inflow hot air temperature at the opening of the air supply duct 15 is 220 ° C., and the exhaust hot air temperature at the opening of the exhaust duct 16 The temperature of the hot air is controlled to be 130 ° C. so as to be higher than the melting point of the binder 2.
Note that if the exhaust hot air temperature is higher than the melting point of the binder 2, the inflow hot air temperature is always higher than that temperature, so that the temperature sensor 19 is disposed only at the outlet 16a to control the temperature.

そして、熱風発生装置17から給気ダクト15を介して流入熱風温度が220℃となる熱風を供給し、排気熱風温度が130℃に達するまでチャンバ13を加熱したところで、アトマイザ14の霧化ディスク14aの回転数を12000rpmとし、スラリを100ml/minで供給して霧化させる。
給気ダクト15からチャンバ13に流入した熱風は、チャンバ13の周壁に沿って回転しながら螺旋状に流下していく。
Then, hot air having an inflow hot air temperature of 220 ° C. is supplied from the hot air generator 17 through the air supply duct 15, and the chamber 13 is heated until the exhaust hot air temperature reaches 130 ° C. Then, the atomizing disk 14 a of the atomizer 14. The number of rotations is 12000 rpm, and the slurry is supplied at 100 ml / min for atomization.
The hot air flowing into the chamber 13 from the air supply duct 15 flows down spirally while rotating along the peripheral wall of the chamber 13.

このとき、流入熱風温度及び排気熱風温度がいずれもバインダ2の融点より高く、したがって、チャンバ13内の温度がバインダ2の融点よりも高く維持されるので、バインダとコア3を含むスラリを霧化したときに、バインダ2が溶けてコア3の表面に付着する。
また、コア3の表面温度もバインダ2の融点より高くなっているので、バインダ2はコア3の表面を流れて、均一で薄膜状のコーティング層が隙間なく形成されたガラス原料粉末4が形成される。
そして、多数のガラス原料粉末4がチャンバ13の熱風に乗って乾燥される過程で、その表面にコーティングされたバインダ2を介在して溶着され、直径50μm程度の顆粒状の焼結用ガラス材料1が生成される。
At this time, both the inflow hot air temperature and the exhaust hot air temperature are higher than the melting point of the binder 2, and thus the temperature in the chamber 13 is maintained higher than the melting point of the binder 2, so that the slurry including the binder and the core 3 is atomized. When this occurs, the binder 2 melts and adheres to the surface of the core 3.
Further, since the surface temperature of the core 3 is higher than the melting point of the binder 2, the binder 2 flows on the surface of the core 3 to form a glass raw material powder 4 in which a uniform thin film-like coating layer is formed without a gap. The
In the course of drying a large number of glass raw material powders 4 on the hot air in the chamber 13, the glass material powder 1 is sintered in the form of granules having a diameter of about 50 μm. Is generated.

チャンバ13は、断面積が徐々に低下するホッパ状の部分を熱風が流下することにより、ホッパ下端の顆粒回収口12近傍の内圧が高くなるので、熱風は顆粒回収口12に対向して開口している排気ダクト16から排出される。
その際に、螺旋状に流下してきた熱風により運ばれてきた顆粒状の焼結用ガラス材料1は、熱風の流れが上向に反転されるときに熱風から分離されて顆粒回収口12に落下して回収される。
図1はこのように製造した焼結用ガラス材料1の顆粒の模式図であって、表面にバインダ2が隙間なくコーティングされたガラス原料粉末4が稠密に集合されている様子がわかる。
The chamber 13 has an internal pressure in the vicinity of the granule recovery port 12 at the lower end of the hopper as hot air flows down the hopper-like portion where the cross-sectional area gradually decreases, so that the hot air opens opposite to the granule recovery port 12. The exhaust duct 16 is discharged.
At that time, the granular sintering glass material 1 carried by the hot air flowing down spirally is separated from the hot air when the hot air flow is reversed upward and falls to the granule recovery port 12. And recovered.
FIG. 1 is a schematic diagram of granules of the sintered glass material 1 produced in this way, and it can be seen that the glass raw material powder 4 on which the binder 2 is coated without gaps is densely assembled.

図3はこのように製造した焼結用ガラス材料1を用いて、反射鏡形状の石英ガラス製品(ガラス焼結品)を製造する方法を示す説明図である。
まず、顆粒状の焼結用ガラス材料1を成形用金型21の胴型22に入れた後(図3(a))、プランジャ23を降下させ、その挿通孔24に胴型22の中心ロッド25を挿入させながらプレス圧力を加えると焼結用成形体Fが成形される(図3(b))。
その後、プランジャ23を引き上げて、胴型22の底枠26を外枠27から外して型バラシし(図3(c))、底枠26から焼結用成形体Fを抜き出す(図3(d))。
FIG. 3 is an explanatory diagram showing a method of manufacturing a reflecting mirror-shaped quartz glass product (glass sintered product) using the sintering glass material 1 manufactured as described above.
First, after putting the granular glass material 1 for sintering into the barrel 22 of the molding die 21 (FIG. 3A), the plunger 23 is lowered, and the central rod of the barrel 22 is inserted into the insertion hole 24. When a pressing pressure is applied while 25 is inserted, a sintered compact F is formed (FIG. 3B).
Thereafter, the plunger 23 is pulled up, the bottom frame 26 of the body mold 22 is removed from the outer frame 27 and separated (FIG. 3C), and the sintered compact F is extracted from the bottom frame 26 (FIG. 3D). ) ).

このようにして作成した焼結用成形体Fを焼成炉28に入れ、酸化性雰囲気加熱焼結法と還元性雰囲気加熱焼結法によって焼結させて、反射鏡形状の石英ガラス製品Mを製造した(図3(e))。
この場合、いずれの方法においても、バインダを完全に揮発燃焼させるため、先ず、300〜1000℃の酸化性雰囲気で予備加熱を行う。
バインダを揮発燃焼させる温度は、使用するバインダの種類により異なるため、示差熱分析等で燃焼除去に適した温度を予め確認しておく必要がある。



The sintered compact F thus prepared is placed in a firing furnace 28 and sintered by an oxidizing atmosphere heating sintering method and a reducing atmosphere heating sintering method to produce a reflector-shaped quartz glass product M. (FIG. 3 (e)).
In this case, in any method, in order to completely volatilize and burn the binder, first, preheating is performed in an oxidizing atmosphere of 300 to 1000 ° C.
Since the temperature at which the binder is volatilized and burned varies depending on the type of binder used, it is necessary to confirm in advance a temperature suitable for combustion removal by differential thermal analysis or the like.



そして、酸化性雰囲気加熱焼結法では、予備加熱終了後、酸化性雰囲気でバインダを燃焼除去した後、そのまま酸化性雰囲気によって、1280〜1350℃で加熱焼結を行った。本例では、1300℃で1時間保持した。
また、還元性雰囲気加熱焼結法では、予備加熱終了後、一酸化炭素を使用した還元性雰囲気において1280〜1350℃で加熱焼結を行う。本例では、1300℃で30分保持した。
In the oxidizing atmosphere heating and sintering method, after the preliminary heating was completed, the binder was burned and removed in the oxidizing atmosphere, and then the sintering was performed at 1280 to 1350 ° C. in the oxidizing atmosphere as it was. In this example, it was held at 1300 ° C. for 1 hour.
In the reducing atmosphere heating and sintering method, after preliminary heating, the sintering is performed at 1280 to 1350 ° C. in a reducing atmosphere using carbon monoxide. In this example, it was held at 1300 ° C. for 30 minutes.

このような比較的低温で加熱焼結させたところ、反射鏡形状の石英ガラス製品(ガラス焼結品)Mが得られた。
この石英ガラス製品Mの表面を数千倍の顕微鏡で観察したが、どこを観察しても粗面となる部分が見当たらず、凹凸がなく極めて緻密で良好な石英ガラス製品Mを製造することができた。
そして、その内面に多層膜のコールドミラーを施して反射鏡を形成し、定格200Wの高圧水銀蒸気放電ランプと組み合わせた光源ユニットを作成したところ、熟練者が作成した同じ形状寸法の試作反射鏡と組み合わせた光源ユニットに比して同等の明るさが得られた。
また、その光源ユニットの寿命試験を行ったところ、寿命末期の2000時間まで、熟練者の試作反射鏡と、光学特性で何等遜色はなく良好な結果が得られた。
When heat-sintered at such a relatively low temperature, a reflecting mirror-shaped quartz glass product (glass sintered product) M was obtained.
Although the surface of this quartz glass product M was observed with a microscope of several thousand times, no rough portion was found no matter where it was observed, and it was possible to produce an extremely dense and good quartz glass product M without irregularities. did it.
Then, a cold mirror of a multilayer film was formed on the inner surface to form a reflecting mirror, and a light source unit combined with a 200 W rated high-pressure mercury vapor discharge lamp was created. The same brightness was obtained compared to the combined light source unit.
Further, when the life test of the light source unit was conducted, good results were obtained up to 2000 hours at the end of the life without any inferiority in optical characteristics with the prototype reflector of the expert.

以上述べたように、本発明によれば、コアとバインダを混合した懸濁液を噴霧乾燥させる際に、チャンバの流入熱風温度及び排気熱風温度のいずれもがバインダの融点より高く設定されているので、バインダが溶けた状態でコアの表面を流れ隙間なくコーティングされたガラス原料粉末が生成され、そのバインダが溶着されてガラス原料粉末が集合され、顆粒状の焼結用ガラス材料となる。
したがって、この焼結用ガラス材料のガラス原料粉末の表面にはバインダが隙間なく薄膜状にコーティングされているので、径の小さなバインダ粒子を均一に分布させるまでもなくこれと略同じ組織の顆粒を得ることができる。
As described above, according to the present invention, when the suspension in which the core and the binder are mixed is spray-dried, both the inflow hot air temperature and the exhaust hot air temperature of the chamber are set higher than the melting point of the binder. Therefore, a glass raw material powder coated on the surface of the core without any gaps is generated in a state where the binder is melted, and the binder is welded to gather the glass raw material powder to form a granular glass material for sintering.
Therefore, since the binder is coated in a thin film on the surface of the glass raw material powder of this sintering glass material without gaps, it is not necessary to uniformly distribute the binder particles having a small diameter, so that granules having substantially the same structure as this can be obtained. Obtainable.

そして、バインダが薄膜状にコーティングされていることから、顆粒状に形成された焼結用ガラス材料はガラス原料粉末が密に集合され、これを型に入れて乾式プレスするときに、表面に付着されているバインダが潤滑材となって個々のガラス原料粉末を流動させると共に、ガラス原料粉末が稠密に固められる。
したがって、これを加熱焼結したときに巣が入りにくく、同時に、その表面に形成されているバインダは薄く均一であるので揮発燃焼されやすい。
これにより、製品表面にガラス組織の粗い梨地状の微細な凹凸が形成されることがなく、ガラス組織が密で高品質の石英ガラス製品を低コストで量産することができるという効果がある。
And since the binder is coated in a thin film shape, the glass material for sintering formed into a granular form is densely assembled with the glass raw material powder and adheres to the surface when this is put into a mold and dry-pressed As the binder is used as a lubricant to flow the individual glass raw material powders, the glass raw material powders are densely consolidated.
Therefore, when this is heat-sintered, the nest is difficult to enter, and at the same time, the binder formed on the surface is thin and uniform, so that it is easy to volatilize and burn.
As a result, there is no effect on the surface of the product that a fine texture with a rough glass structure is not formed, and a high-quality quartz glass product with a dense glass structure can be mass-produced at low cost.

本発明は、光学特性の極めて良好な反射鏡、光学要素その他の石英ガラス製品を、高精度且つ低コストで量産する用途に使用し得る。   INDUSTRIAL APPLICABILITY The present invention can be used for applications in which a mirror, an optical element and other quartz glass products having extremely good optical properties are mass-produced with high accuracy and low cost.

本発明に係る焼結用ガラス材料を示す拡大模式図。The expansion schematic diagram which shows the glass material for sintering which concerns on this invention. その製造方法を示す説明図。Explanatory drawing which shows the manufacturing method. ガラス焼結品の製造方法を示す説明図。Explanatory drawing which shows the manufacturing method of a glass sintered product. 従来の焼結用ガラス材料を示す拡大模式図。The expansion schematic diagram which shows the conventional glass material for sintering.

符号の説明Explanation of symbols

1 焼結用ガラス材料
2 バインダ
3 コア
4 ガラス原料粉末


1 Glass material for sintering 2 Binder 3 Core 4 Glass raw material powder


Claims (6)

成形用金型に充填して乾式プレス成形することにより焼結用成形体を形成する焼結用ガラス材料であって、
パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダがシリカを主成分とするコアの表面に隙間なくコーティングされて成るガラス原料粉末を集合させて顆粒状に形成されたことを特徴とする焼結用ガラス材料。
A sintering glass material for forming a sintered compact by filling a molding die and dry press molding,
A binder containing one or both of a paraffin binder and a stearic acid binder is formed into a granule by assembling glass raw material powder that is coated on the surface of a core mainly composed of silica without gaps. Glass material for sintering.
前記ガラス原料粉末に不純物として存在するアルミ成分の重量比率がシリカに対して70ppm以下に選定されて成る請求項1記載の焼結用ガラス材料。   The glass material for sintering according to claim 1, wherein a weight ratio of an aluminum component present as an impurity in the glass raw material powder is selected to be 70 ppm or less with respect to silica. 成形用金型に充填して乾式プレス成形することにより焼結用成形体を形成する焼結用ガラス材料の製造方法であって
シリカを主成分とするコアと、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダ溶液を混合した懸濁液を生成し、
チャンバ内を流れる熱風中に前記懸濁液を噴霧することにより、前記バインダがコアの表面にコーティングされて成るガラス原料粉末を集合させて顆粒状に形成する際に、前記熱風のチャンバ内への流入温度及び流出温度がいずれも前記バインダの融点より高く設定したことを特徴とする焼結用ガラス材料の製造方法。
A method for producing a sintered glass material, which is formed by filling a molding die and dry press molding to form a sintered compact. A core mainly composed of silica, a paraffin binder, and a stearic acid binder Producing a suspension mixed with a binder solution containing one or both of
By spraying the suspension into hot air flowing in the chamber, when the glass raw material powder formed by coating the binder on the surface of the core is aggregated and formed into granules, the hot air flows into the chamber. A method for producing a glass material for sintering, wherein both the inflow temperature and the outflow temperature are set higher than the melting point of the binder.
焼結用ガラス材料を成形用金型に充填して乾式プレス成形することにより得られた焼結用成形体を加熱焼結されるガラス焼結品の製造方法であって、
前記焼結用ガラス材料が、パラフィン系バインダ及びステアリン酸系バインダの一方又は双方を含むバインダがシリカを主成分とするコアの表面に隙間なくコーティングされて成るガラス原料粉末を集合させて顆粒状に形成されていることを特徴とするガラス焼結品の製造方法。
A method for producing a sintered glass product in which a sintered compact obtained by filling a molding die with a glass material for sintering and dry press molding is heated and sintered,
The glass material for sintering is made by assembling a glass raw material powder in which a binder containing one or both of a paraffin binder and a stearic acid binder is coated on the surface of a core mainly composed of silica without gaps. A method for producing a sintered glass product, which is formed.
前記ガラス原料粉末に不純物として存在するアルミ成分の重量比率がシリカに対して70ppm以下に選定され、前記焼結用成形体の焼結温度が、1300℃以上1350℃以下である請求項4記載のガラス焼結品の製造方法。 The weight ratio of the aluminum component which exists as an impurity in the said glass raw material powder is selected as 70 ppm or less with respect to a silica, The sintering temperature of the said molded object for sintering is 1300 degreeC or more and 1350 degrees C or less. A method for producing a sintered glass product. 前記ガラス原料粉末に不純物として存在するアルミ成分の重量比率がシリカに対して50ppm以下に選定され、前記焼結用成形体の焼結温度が、1280℃以上1350℃以下である請求項4記載のガラス焼結品の製造方法。 The weight ratio of the aluminum component which exists as an impurity in the said glass raw material powder is selected to 50 ppm or less with respect to a silica, and the sintering temperature of the said molded object for sintering is 1280 degreeC or more and 1350 degrees C or less. A method for producing a sintered glass product.
JP2005011410A 2005-01-19 2005-01-19 Glass material for sintering, method for producing the same, and method for producing a glass sintered product Expired - Fee Related JP4463121B2 (en)

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