JP4470516B2 - Immersion coating method - Google Patents
Immersion coating method Download PDFInfo
- Publication number
- JP4470516B2 JP4470516B2 JP2004037711A JP2004037711A JP4470516B2 JP 4470516 B2 JP4470516 B2 JP 4470516B2 JP 2004037711 A JP2004037711 A JP 2004037711A JP 2004037711 A JP2004037711 A JP 2004037711A JP 4470516 B2 JP4470516 B2 JP 4470516B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- liquid
- solution
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 238000007654 immersion Methods 0.000 title description 11
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- 238000003618 dip coating Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 7
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- 238000000034 method Methods 0.000 description 18
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Description
本発明は、基体表面に液を塗布する方法に関し、更に詳しくは、円柱状または円筒状の基体表面に、ムラなく短時間に塗布液を塗布する、塗布方法に関するものである。 The present invention relates to a method for applying a liquid to a substrate surface, and more particularly to an application method for applying a coating solution to a columnar or cylindrical substrate surface in a short time without unevenness.
基体表面に液を塗布する方法として、塗布用の溶液中に浸漬させた後に上昇させる、浸漬塗布法が知られている。円柱状基体表面に液を塗布する際には、基体をそのまま塗布液に浸漬して、上昇させるだけで容易に表面に塗布することができる。一方、円筒体表面に液を塗布する場合、塗布の必要がない、あるいは、例えば、円筒体内部に可動装置を持つなどの理由により、円筒体内面には液が付着しないようにする必要がある場合がある。円筒状基体の表面に液を塗布し、円筒体内部には塗布液が付着しないようにするために、円筒体内部を把持し、且つ円筒体上端部を密封し、円筒体の仮想軸線が液面に対して略垂直になるようにして浸漬した後に上昇させてなる塗布方法が考えられる。 As a method of applying a liquid to the surface of a substrate, a dip coating method is known in which the solution is raised after being immersed in a coating solution. When the liquid is applied to the surface of the cylindrical substrate, the substrate can be easily applied to the surface by simply immersing the substrate in the coating solution and raising it. On the other hand, when the liquid is applied to the surface of the cylindrical body, it is not necessary to apply the liquid, or it is necessary to prevent the liquid from adhering to the inner surface of the cylindrical body because, for example, a movable device is provided inside the cylindrical body. There is a case. In order to apply the liquid to the surface of the cylindrical substrate and prevent the coating liquid from adhering to the inside of the cylindrical body, the inside of the cylindrical body is gripped and the upper end of the cylindrical body is sealed, and the virtual axis of the cylindrical body is A coating method in which the film is lifted after being immersed so as to be substantially perpendicular to the surface is conceivable.
塗布に要する時間が短く、且つ、基体表面に塗られた液がムラ無く均一となるようにするには、基体を浸漬させる際の速度や上昇させる際の速度、塗布液の供給方法や速度を厳密に制御する必要があるが、従来、塗布液の入った容器に塗布液を常時一定量供給し、該容器から塗布液が常時溢れた状態において、浸漬して塗布する方法(以下これを、COF法ということがある)や(例えば、特許文献1 参照)、被塗布用の基体を塗布液中に浸漬した際にのみ、塗布液が塗布液の入った容器から溢れた状態となる塗布方法(以下これを、IOF法ということがある)が知られていた(例えば、特許文献2 参照)。
しかしながら、COF法での塗布では次の問題が発生しやすかった。すなわち、(1)表面張力により塗布液容器端より液面が盛り上がり安定しないため、液面が振動しやすく塗布ムラが出やすい、(2)広面積の液面が常に外気と接するために溶剤が蒸発しがちで液濃度変化による塗布ムラが発生しやすい、(3)基体外径と容器径差が10mm以上になると、塗布用の溶液が該溶液を保持している容器から均一に溢れず、塗布ムラが発生しやすい、といった問題があった。 However, the following problems are likely to occur in coating by the COF method. That is, (1) The liquid level rises from the end of the coating liquid container due to surface tension and is not stable, so that the liquid level is likely to vibrate and coating unevenness is likely to occur. (2) Evaporation tends to cause uneven coating due to change in liquid concentration. (3) When the difference between the outer diameter of the substrate and the container diameter is 10 mm or more, the coating solution does not overflow uniformly from the container holding the solution. There has been a problem that uneven coating tends to occur.
上記問題は、(1)送液装置を脈動しないタイプに変えたり、基体外径にあわせて最適な塗布容器外径を使用すること、(2)溶剤が蒸発しないように外壁を作成し溶剤を溜めたり、(3)塗布中は溢れさせないIOF法での塗布を実施することで回避することができる。ところが、基体の外径毎に塗布容器を用意したり、必要以上に塗膜が垂れることによる塗膜形状悪化を防止するために塗布中の雰囲気をコントロールする装置を導入したりと設備が大きく複雑になること、またIOF法においては基体が液面を離脱したときでも、まだ塗布用の溶液を保持する容器内に基体が留まっているために、更に容器から離脱するまで基体を引き上げなければ次の工程に進むことができず、生産性が落ちるという別の問題があった。 The above problems are: (1) Change the liquid feeding device to a type that does not pulsate, or use the optimum outer diameter of the coating container according to the outer diameter of the substrate, and (2) Create the outer wall so that the solvent does not evaporate and remove the solvent. It can be avoided by applying the IOF method that does not allow the reservoir or overflow during application. However, the equipment is large and complicated, such as preparing a coating container for each outer diameter of the substrate and introducing a device that controls the atmosphere during coating to prevent deterioration of the coating shape due to dripping of the coating more than necessary. In the IOF method, even when the substrate is released from the liquid level, the substrate still remains in the container holding the coating solution. There was another problem that productivity could be reduced due to the inability to proceed to this process.
本願発明者らは、浸漬塗布方法における前記の問題点を解決するため鋭意検討した結果、送液速度を調整することにより、塗布中の塗布液を容器から溢れさせることなく、溶液面を塗布容器口元の下、一定の高さに保持することで上記問題が解決されることを見いだ
した。すなわち、(1)塗布液が盛り上がらないために液面振動が少なくなり、(2)容器の口元が外壁の役割を果たし送液速度を調整することで、異なる基体外径や上昇速度に対して溶剤蒸気濃度をコントロールすることが可能になり、(3)液面を塗布容器口元のすぐ下に保持すれば生産性の低下も最小限に押さえることができ、ムラのない均一な塗布が可能で、且つ、塗布終了後、短期間に塗布液容器から基体が離脱することができることを見いだし、本発明に到達した。
As a result of intensive investigations to solve the above-described problems in the dip coating method, the inventors of the present application have adjusted the liquid feeding speed so that the coating surface can be applied to the coating container without overflowing the coating liquid during coating from the container. It was found that the above problem can be solved by holding the tablet at a certain height under the mouth. That is, (1) liquid level vibration is reduced because the coating liquid does not rise, and (2) the mouth of the container acts as an outer wall to adjust the liquid feeding speed, so that different substrate outer diameters and rising speeds can be obtained. It is possible to control the solvent vapor concentration. (3) If the liquid level is held just below the mouth of the coating container, the decrease in productivity can be suppressed to a minimum, and uniform application without unevenness is possible. In addition, the present inventors have found that the substrate can be detached from the coating solution container in a short period of time after the coating is completed.
すなわち本発明は、塗布用の溶液中に、被塗布用の円柱状または円筒状の基体を、その仮想軸線が液面に対して略垂直になるようにして浸漬した後に、該溶液の液面に対して相対的に上昇させてなる塗布方法において、基体の液面に対する上昇速度D(mm/分)と、基体の外径Ds(mm)、基体上昇中に塗布用の溶液を保持する容器に供給する塗布用溶液の供給速度をV(L/分)とするときに、下記式(1)で表される関係が成り立つことを特徴とする、浸漬塗布方法に存する。 That is, the present invention is a method in which a columnar or cylindrical substrate to be coated is immersed in a coating solution so that its virtual axis is substantially perpendicular to the liquid level, and then the liquid level of the solution is obtained. In a coating method in which the substrate is lifted relatively to the substrate, the rising speed D (mm / min) relative to the liquid level of the substrate, the outer diameter Ds (mm) of the substrate, and a container for holding the coating solution while the substrate is rising In the dip coating method, the relationship represented by the following formula (1) is established when the supply rate of the coating solution to be supplied is V (L / min).
D>V/(1/4(π・Ds2))×106>0 (1) D> V / (1/4 (π · Ds 2 )) × 10 6 > 0 (1)
本発明の塗布方法によれば、塗膜が均一でムラ発生がなく、所望の厚みに精密に制御可能で、しかも短時間に生産性良く塗布することが可能となる。本発明の塗布方法により、高品質な電子写真感光体を提供することが可能となる。 According to the coating method of the present invention, the coating film is uniform and does not cause unevenness, can be precisely controlled to a desired thickness, and can be coated with high productivity in a short time. The coating method of the present invention can provide a high-quality electrophotographic photosensitive member.
以下、本発明の実施の形態につき詳細に説明するが、以下に記載する構成要件の説明は本発明の実施形態の代表例であって、本発明の趣旨を逸脱しない範囲において適宜変形して実施することができる。
<浸漬塗布方法>
本発明の浸漬塗布方法では、例えば図1に示すような浸漬装置を用いる。図示した浸漬装置(3)は、塗布液が貯溜され且つ円筒状基体(1)が浸漬される浸漬槽(30)と、塗布液の循環機構とから主として構成される。浸漬槽(30)に貯溜される塗布液は、塗布液供給口(31)から供給されて浸漬槽(30)の上部からオーバーフローする。受けトイ(32)にオーバーフローした塗布液は、塗布液タンク(33)に送られて攪拌された後、供給ポンプ(34)を介して再び供給される。符号(35)は、塗布液面での溶媒の蒸発防止のため、浸漬槽(30)および受けトイ(32)の上に必要に応じて設けられたフードを示す。
Hereinafter, embodiments of the present invention will be described in detail. However, the description of the constituent elements described below is a representative example of the embodiments of the present invention, and is appropriately modified without departing from the spirit of the present invention. can do.
<Dip coating method>
In the dip coating method of the present invention, for example, a dip device as shown in FIG. 1 is used. The illustrated immersion apparatus (3) is mainly composed of an immersion tank (30) in which the coating liquid is stored and the cylindrical substrate (1) is immersed, and a coating liquid circulation mechanism. The coating liquid stored in the immersion tank (30) is supplied from the coating liquid supply port (31) and overflows from the upper part of the immersion tank (30). The coating liquid overflowed to the receiving toy (32) is sent to the coating liquid tank (33) and stirred, and then supplied again via the supply pump (34). Reference numeral (35) denotes a hood provided as necessary on the dipping tank (30) and the receiving toy (32) for preventing evaporation of the solvent on the coating liquid surface.
本発明における浸漬塗布では、オーバーフローした場合の塗布液の液面が一定に維持されるような構造の浸漬槽(30)中に、円筒状基体(1)を垂直に降下させて浸漬し、次いで、円筒状基体(1)を垂直に上昇させて上昇させることにより行う。その際、円筒状基体(1)の下降および上昇速度を制御することにより、円筒状基体(1)の周りの塗布液面の振動を防止し、塗布欠陥(流れムラ)を防止することが出来るが、液面に対する上昇速度D(mm/分)と、円筒状基体の外径Ds(mm)、上昇中に塗布溶液を保持する容器に供給される塗布液量をV(L/分)とするときに、下記式(1)で表される関係が成り立つようにすることにより、ムラのない均一な塗布を行うことができる。 In the dip coating according to the present invention, the cylindrical substrate (1) is vertically lowered and immersed in a dip tank (30) having a structure in which the liquid level of the coating liquid in the case of overflow is maintained constant, and then Then, the cylindrical base body (1) is lifted vertically and lifted. At that time, by controlling the descending and rising speeds of the cylindrical substrate (1), it is possible to prevent vibration of the coating liquid surface around the cylindrical substrate (1) and to prevent coating defects (flow unevenness). Is the rising speed D (mm / min) relative to the liquid level, the outer diameter Ds (mm) of the cylindrical substrate, and the amount of coating liquid supplied to the container holding the coating solution during the rise is V (L / min). In this case, by applying the relationship represented by the following formula (1), uniform coating without unevenness can be performed.
D>V/(1/4(π・Ds2))×106>0 (1)
上昇速度Dと、円筒状基体の外径Ds、上昇中に塗布溶液を保持する容器に供給される塗布液量をVの関係は、基体が液面を離脱した後、塗布液容器から離脱するまでの時間を短くして生産性を上げるために、
V/(1/4(π・Ds2))×106>0.8D
であることが好ましく、より好ましくは、
V/(1/4(π・Ds2))×106>0.9D
であり、特に好ましくは、
V/(1/4(π・Ds2))×106>0.95D
である。
D> V / (1/4 (π · Ds 2 )) × 10 6 > 0 (1)
The relationship between the rising speed D, the outer diameter Ds of the cylindrical substrate, and the amount of coating liquid supplied to the container that holds the coating solution during ascent is V. After the substrate leaves the liquid surface, it is detached from the coating solution container. In order to shorten productivity and increase productivity,
V / (1/4 (π · Ds 2 )) × 10 6 > 0.8D
And more preferably
V / (1/4 (π · Ds 2 )) × 10 6 > 0.9D
And particularly preferably,
V / (1/4 (π · Ds 2 )) × 10 6 > 0.95D
It is.
積層型電子写真感光体を製造する場合、上記の浸漬塗布は、電荷発生層用の塗布液の塗布と、電荷輸送層用の塗布液の塗布とについてそれぞれに実施される。
浸漬塗布から保持台までに至る工程において、円筒状基体の保持および移動は、例えば、図2に示す様なチャック装置を使用して行われる。図示したチャック装置(2)は、昇降可能かつ水平移動可能に構成された水平アーム(20)と、当該水平アームに垂直に吊持され且つ円筒状基体(1)の筒内に挿入される挿入軸(21)と、当該挿入軸の外周面に設けられた風船体(22)とから成る。
In the case of producing a laminated electrophotographic photosensitive member, the above-described dip coating is performed for each of coating of a coating solution for a charge generation layer and coating of a coating solution for a charge transport layer.
In the process from the dip coating to the holding table, the cylindrical substrate is held and moved using, for example, a chuck device as shown in FIG. The illustrated chuck device (2) includes a horizontal arm (20) configured to be movable up and down and horizontally movable, and an insertion that is suspended vertically by the horizontal arm and inserted into a cylinder of the cylindrical base body (1). It consists of a shaft (21) and a balloon body (22) provided on the outer peripheral surface of the insertion shaft.
風船体(22)は、挿入軸(21)に対して少なくとも1箇所に設ければ円筒状基体(1)を保持することができるが、円筒状基体(1)を垂直かつ一層安定に保持するため、好ましくは挿入軸(21)に対して2箇所に設けられる。これらの風船体(22)は、挿入軸(21)の内部に形成された流路を通じて供給される加圧空気などの流体によって膨張させられることにより、円筒状基体(1)をその筒内から保持する。そして、水平アーム(20)の作動により、風船体(22)にて保持された円筒状基体(1)が昇降または横移動させられる。チャック装置(2)としては、図2に示すような、いわゆるエア・ピッカー方式の装置の他、円筒状基体の筒内に挿入される挿入軸の周囲に拡縮可能なフィンガーを設けた構造のもの等、各種の構造の装置を採用し得る。 The balloon body (22) can hold the cylindrical base body (1) if it is provided at least in one place with respect to the insertion shaft (21), but holds the cylindrical base body (1) vertically and more stably. Therefore, it is preferably provided at two positions with respect to the insertion shaft (21). These balloon bodies (22) are expanded by a fluid such as pressurized air supplied through a flow path formed inside the insertion shaft (21), so that the cylindrical base body (1) is removed from the cylinder. Hold. And the cylindrical base | substrate (1) hold | maintained with the balloon body (22) is moved up / down or moved horizontally by the action | operation of a horizontal arm (20). As the chuck device (2), in addition to a so-called air picker type device as shown in FIG. 2, a structure in which fingers that can be expanded and contracted are provided around an insertion shaft inserted into a cylinder of a cylindrical base. The apparatus of various structures, such as, can be employ | adopted.
上記処理の後は、図示しないが、チャック装置(2)にて保持した円筒状基体(1)を搬送ラインのパレットに移載して乾燥工程へ送り、円筒状基体(1)の外周面を乾燥させて当該外周面に感光塗膜を形成する。乾燥方法は、従来公知の昇温乾燥法または自然乾燥法によって行う。昇温乾燥法は、空気対流式乾燥装置(熱風式乾燥装置)を使用し、円筒状基体(1)の温度を所定の温度まで昇温して塗布液の乾燥を行う乾燥法である。昇温乾燥法では、いわゆる泡欠陥の発生を防止するため、昇温速度などが制御される。また、自然乾燥法は、カバーでシールされた空間内に円筒状基体(1)を静止させて自然乾燥する方法である。自然乾燥法では、乾燥速度を調整して厚さムラの発生を防止するため、シールド空間内の溶媒蒸気の濃度が制御される。
<基体>
本発明の塗布方法のおける被塗布用の基体は、円柱状基体、もしくは内面には塗布しない円筒状基体であれば、材質や形状などに特に制限はないが、アルミニウム、ニッケル、黄銅、ステンレスなどの金属材料、これらの金属箔によるラミネート物、またはこれらの金属による蒸着物があげられる。
After the above processing, although not shown, the cylindrical substrate (1) held by the chuck device (2) is transferred to the pallet of the transfer line and sent to the drying process, and the outer peripheral surface of the cylindrical substrate (1) is transferred. It is made to dry and a photosensitive coating film is formed in the said outer peripheral surface. The drying method is performed by a conventionally known temperature rising drying method or natural drying method. The temperature rising drying method is a drying method in which an air convection drying device (hot air drying device) is used and the temperature of the cylindrical substrate (1) is raised to a predetermined temperature to dry the coating liquid. In the temperature rising drying method, the temperature rising rate and the like are controlled in order to prevent so-called bubble defects. The natural drying method is a method in which the cylindrical substrate (1) is stationary in a space sealed with a cover and naturally dried. In the natural drying method, the concentration of the solvent vapor in the shield space is controlled in order to adjust the drying speed and prevent the occurrence of thickness unevenness.
<Substrate>
The substrate to be coated in the coating method of the present invention is not particularly limited as long as it is a cylindrical substrate or a cylindrical substrate that is not applied to the inner surface, but aluminum, nickel, brass, stainless steel, etc. These metal materials, laminates of these metal foils, or vapor-deposited materials of these metals.
また、表面にアルミニウム、銅、パラジウム、酸化すず、酸化インジウム等の導電性層を設けた、ポリエチレンテレフタレート、ポリプロピレン、ナイロン、ポリスチレン、フェノール樹脂などの高分子材料、前記の高分子材料等にカーボンブラックのような導電性化合物を混合して導電性を持たせたもの、硬質紙などのその他の材料を円筒状に成形し、金属粉末、カーボンブラック、ヨウ化銅、高分子電解質等の導電性物質を適当なバインダーとともに塗布して導電処理したもの、または酸化スズ、酸化インジウム等の導電性金属酸化物で導電処理したプラスチックドラムなどが挙げられる。 Also, a polymer material such as polyethylene terephthalate, polypropylene, nylon, polystyrene, phenol resin, etc. with a conductive layer made of aluminum, copper, palladium, tin oxide, indium oxide, etc. on the surface, carbon black on the polymer material, etc. Conductive substances such as metal powders, carbon black, copper iodide, polymer electrolytes, etc. formed by mixing conductive materials such as And a plastic drum subjected to a conductive treatment with a conductive metal oxide such as tin oxide or indium oxide.
本発明の塗布方法は、特に均一な塗布を必要とする電子写真感光体用基体への塗布に好適に用いられる。該電子写真感光体用の基体としては、上記のいずれの種類のものも用いることが出来るが、なかでもアルミニウム等の金属のエンドレスパイプが好ましい支持体である。特に、アルミニウムまたはアルミニウム合金製の基体が好適に用いられ。該基体
に用いられるアルミニウム材質としては、JISで規定されている例えば3000番台、5000番台、6000番台等のアルミニウム合金が適しており、それらの材料の押し出し管、引き抜き管またはそれらを切削加工したものが用いられる。アルミニウム等の金属のエンドレスパイプは、押し出し、引き抜き、しごき等の加工により成形される。成形したものをそのまま用いても良いし、更に切削、研削、研磨などの加工を加えたものでも良い。導電性支持体の表面には、画質に影響のない範囲で、例えば酸化処理や薬品処理等の各種の処理を施すことができる。通常、円筒状基体の外径は1〜20cm、長さは20〜100cmのものが用いられる。
<塗布用溶液>
本発明の塗布方法により塗布するのに好適な溶液としては、塗布することにより塗膜を形成可能なものであればどのようなものでも使用できるが、特に、高度な均一性を有し、塗膜の厚みを精密に制御する必要のある電子写真感光体の感光層を塗布形成する際の溶液が好適である。本発明の塗布方法により、電子写真感光体の感光層を塗布形成するための溶液を塗布することにより、高度に均一な感光層を目的の厚みに精度良く塗布形成することが可能となる。
The coating method of the present invention is suitably used for coating on a substrate for an electrophotographic photosensitive member that requires particularly uniform coating. As the substrate for the electrophotographic photosensitive member, any of the above-mentioned types can be used. Among them, a metal endless pipe such as aluminum is a preferable support. In particular, a base made of aluminum or an aluminum alloy is preferably used. As the aluminum material used for the substrate, aluminum alloys such as 3000 series, 5000 series, 6000 series, etc. specified by JIS are suitable. Extruded pipes, drawn pipes of those materials or those obtained by cutting them. Is used. A metal endless pipe such as aluminum is formed by processing such as extrusion, drawing, and ironing. What was shape | molded may be used as it is, and what added processes, such as cutting, grinding, and grinding | polishing further, may be used. The surface of the conductive support can be subjected to various treatments such as oxidation treatment and chemical treatment within a range that does not affect the image quality. Usually, a cylindrical substrate having an outer diameter of 1 to 20 cm and a length of 20 to 100 cm is used.
<Coating solution>
As a solution suitable for coating by the coating method of the present invention, any solution can be used as long as it can form a coating film by coating. A solution for coating and forming a photosensitive layer of an electrophotographic photoreceptor that requires precise control of the thickness of the film is suitable. By applying the solution for coating and forming the photosensitive layer of the electrophotographic photoreceptor by the coating method of the present invention, a highly uniform photosensitive layer can be coated and formed with a desired thickness with high accuracy.
本発明の塗布方法では、前記基体上に、電子写真感光体が通常有する、たとえば中間層、下引き層、光導電性物質を含有する感光層および/または表面保護層などのいずれの層も形成することができる。これらの層の中でも、通常3μm以下の薄膜の層を形成する、下引き層や、電荷発生物質を含有する電荷発生層と電荷輸送物質を含有する電荷輸送層を積層した積層構造の感光層(以下、積層型感光層ということがある)の電荷発生層の形成に好適に用いることができる。この中でも特に、電荷発生層の塗布形成に好適に用いることができる。 In the coating method of the present invention, any layer such as an intermediate layer, an undercoat layer, a photosensitive layer containing a photoconductive substance and / or a surface protective layer, which is usually possessed by an electrophotographic photoreceptor, is formed on the substrate. can do. Among these layers, an undercoat layer that usually forms a thin film layer of 3 μm or less, or a photosensitive layer having a laminated structure in which a charge generation layer containing a charge generation material and a charge transport layer containing a charge transport material are laminated ( Hereinafter, it may be suitably used for forming a charge generation layer). Among these, in particular, it can be suitably used for coating formation of the charge generation layer.
<塗布液>
本発明の製造方法における塗布液は、従前知られた方法によって、電荷発生物質や電荷輸送物質等の導電性物質、結着樹脂、金属酸化物や金属化合物等の導電性無機化合物、および/または酸化防止剤等の各種添加材を、有機溶媒中に溶解、または分散することによって得ることができる。
<Coating solution>
The coating liquid in the production method of the present invention is a conductive material such as a charge generation material or a charge transport material, a binder resin, a conductive inorganic compound such as a metal oxide or a metal compound, and / or a conventionally known method. Various additives such as an antioxidant can be obtained by dissolving or dispersing in an organic solvent.
<電荷発生物質>
電荷発生物質としては、セレニウムおよびその合金やアモルファスシリコン等の無機系光導電性材料、スーダンレッド、ダイアンブルー、ジエナスグリーンB等のアゾ顔料、ジスアゾ顔料、アルゴールイエロー、ピレンキノン等のキノン顔料、キノシアニン顔料、ペリレン顔料、インジゴ顔料、インドフアーストオレンジトナー等のビスベンゾイミダゾール顔料、銅フタロシアニン等のフタロシアニン顔料、アントアントロン顔料、キナクリドン顔料、ピリリウム塩、アズレニウム塩が挙げられる。
<Charge generating material>
Examples of charge generation materials include selenium and its alloys, inorganic photoconductive materials such as amorphous silicon, azo pigments such as Sudan Red, Diane Blue, and Dienas Green B, quinone pigments such as disazo pigments, algor yellow, and pyrenequinone, and quinocyanine Examples thereof include pigments, perylene pigments, indigo pigments, bisbenzimidazole pigments such as Indian First Orange toner, phthalocyanine pigments such as copper phthalocyanine, anthanthrone pigments, quinacridone pigments, pyrylium salts, and azurenium salts.
これらの中でも有機顔料、特にフタロシアニン顔料、アゾ顔料を使用することが望ましい。フタロシアニン顔料を使用する場合、具体的には無金属フタロシアニン、銅、インジウム、ガリウム、スズ、チタン、亜鉛、バナジウム、シリコン、ゲルマニウムなどの金属またはその酸化物、ハロゲン化物、水酸化物、アルコキシドなどの配位したフタロシアニン類の各結晶型を持ったものが使用される。更に具体的には、特開昭63−259572号公報、特開昭57−195567号公報、特開平5−32905号公報記載のアゾ顔料や特開平5−98181号公報、特開平2−8256号公報、特開昭62−67094号公報記載のフタロシアニン顔料などが好ましい例である。 Among these, it is desirable to use organic pigments, particularly phthalocyanine pigments and azo pigments. When using phthalocyanine pigments, specifically, metal-free phthalocyanine, copper, indium, gallium, tin, titanium, zinc, vanadium, silicon, germanium and other metals or oxides thereof, halides, hydroxides, alkoxides, etc. Coordinated phthalocyanines having crystal forms are used. More specifically, the azo pigments described in JP-A-63-259572, JP-A-57-195567, JP-A-5-32905, JP-A-5-98181, and JP-A-2-8256. Preferred examples are phthalocyanine pigments described in JP-A-62-267094.
電荷発生物質としてフタロシアニン化合物を用いる場合、具体的には、無金属フタロシアニン、銅、インジウム、ガリウム、錫、チタン、亜鉛、バナジウム、シリコン、ゲルマニウム等の金属、またはその酸化物、ハロゲン化物等の配位したフタロシアニン類が使用
される。3価以上の金属原子への配位子の例としては、上に示した酸素原子、塩素原子の他、水酸基、アルコキシ基などがあげられる。特に感度の高いX型、τ型無金属フタロシアニン、A型、B型、D型等のチタニルフタロシアニン、バナジルフタロシアニン、クロロインジウムフタロシアニン、クロロガリウムフタロシアニン、ヒドロキシガリウムフタロシアニン等が好適である。なお、ここで挙げたチタニルフタロシアニンの結晶型のうち、A型、B型についてはW.HellerらによってそれぞれI相、II相として示されており(Zeit.Kristallogr.159(1982)173)、A型は安定型として知られているものである。D型は、CuKα線を用いた粉末X線回折において、回折角2θ±0.2゜が27.3゜に明瞭なピークを示すことを特徴とする結晶型である。フタロシアニン化合物は単一の化合物のもののみを用いても良いし、いくつかの混合状態でも良い。ここでのフタロシアニン化合物ないしは結晶状態に置ける混合状態として、それぞれの構成要素を後から混合して用いても良いし、合成、顔料化、結晶化等のフタロシアニン化合物の製造・処理工程において混合状態を生じせしめたものでも良い。このような処理としては、酸ペースト処理・磨砕処理・溶剤処理等が知られている。
When a phthalocyanine compound is used as the charge generation material, specifically, a metal such as metal-free phthalocyanine, copper, indium, gallium, tin, titanium, zinc, vanadium, silicon, germanium, or an oxide or halide thereof. Phthalocyanines are used. Examples of the ligand to a metal atom having 3 or more valences include a hydroxyl group and an alkoxy group in addition to the oxygen atom and chlorine atom shown above. Particularly preferred are X-type, τ-type metal-free phthalocyanine, A-type, B-type, and D-type titanyl phthalocyanine, vanadyl phthalocyanine, chloroindium phthalocyanine, chlorogallium phthalocyanine, hydroxygallium phthalocyanine, and the like. Of the crystal forms of titanyl phthalocyanine mentioned here, A type and B type are described in W.W. It has been shown by Heller et al. As phase I and phase II, respectively (Zeit. Kristallogr. 159 (1982) 173), and type A is known as a stable type. The D-type is a crystal type characterized by a clear peak at a diffraction angle 2θ ± 0.2 ° of 27.3 ° in powder X-ray diffraction using CuKα rays. As the phthalocyanine compound, only a single compound may be used, or several mixed states may be used. As the mixed state that can be placed in the phthalocyanine compound or crystal state here, the respective constituent elements may be mixed and used later, or the mixed state in the production / treatment process of the phthalocyanine compound such as synthesis, pigmentation, crystallization, etc. It may be generated. As such treatment, acid paste treatment, grinding treatment, solvent treatment and the like are known.
<電荷輸送物質>
電荷輸送物質としては、主鎖または側鎖にアントラセン、ピレン、フエナントレン、コロネン等の多芳香族化合物またはインドール、カルバゾール、オキサゾール、イソオキサゾール、チアゾール、イミダゾール、ピラゾール、オキサジアゾール、ピラゾリン、チアジアゾール、トリアゾール等の含窒素環式化合物の骨格を有する化合物、2,4,7−トリニトロフルオレノンなどの芳香族ニトロ化合物、テトラシアノキノジメタンなどのシアノ化合物、ジフェノキノン等のキノン類などの電子吸引性物質、カルバゾール誘導体、インドール誘導体、イミダゾール誘導体、オキサゾール誘導体、ピラゾール誘導体、チアジアゾール誘導体などの複素環化合物、アニリン誘導体、ヒドラゾン化合物、芳香族アミン誘導体、スチルベン誘導体、ブタジエン誘導体およびこれらの化合物が複数結合されたもの、あるいはこれらの化合物からなる基を主鎖もしくは側鎖に有する重合体その他、ヒドラゾン化合物など正孔輸送物質が挙げられる。
<Charge transport material>
Charge transport materials include polyaromatic compounds such as anthracene, pyrene, phenanthrene, coronene or indole, carbazole, oxazole, isoxazole, thiazole, imidazole, pyrazole, oxadiazole, pyrazoline, thiadiazole, triazole in the main chain or side chain Compounds having a skeleton of nitrogen-containing cyclic compounds such as, aromatic nitro compounds such as 2,4,7-trinitrofluorenone, cyano compounds such as tetracyanoquinodimethane, and electron-withdrawing substances such as quinones such as diphenoquinone , Carbazole derivatives, indole derivatives, imidazole derivatives, oxazole derivatives, pyrazole derivatives, thiadiazole derivatives and other heterocyclic compounds, aniline derivatives, hydrazone compounds, aromatic amine derivatives, stilbene derivatives, Those diene derivatives and these compounds are more bond or polymers other having a group consisting of these compounds in the main chain or side chain, include hole transport materials such as hydrazone compounds.
<結着樹脂>
感光塗膜を形成するための結着樹脂としては、ポリカーボネート、ポリアリレート、スチレン−メタクリル酸メチルコポリマー、ポリエステル、スチレン−アクリロニトリルコポリマー、ポリサルホン等、ポリアクリロニトリル、ポリビニルブチラール、ポリビニルプロピオナール、ポリビニルアセテート、ポリビニルアセトアセタール、ポリビニルピロリドン、メチルセルロース、ヒドロキシメチルセルロース、ポリアミド、フェノキシ樹脂、エポキシ樹脂、ウレタン樹脂、珪素樹脂、セルロースエステル、セルロースエーテル、および、スチレン、酢酸ビニル、塩化ビニル、アクリル酸エステル、メタクリル酸エステル、ビニルアルコール、エチルビニルエーテル等のビニル化合物の重合体および共重合体が挙げられる。これらの樹脂の中から、複数の樹脂を併用してもかまわない。
<Binder resin>
Examples of the binder resin for forming the photosensitive coating film include polycarbonate, polyarylate, styrene-methyl methacrylate copolymer, polyester, styrene-acrylonitrile copolymer, polysulfone, polyacrylonitrile, polyvinyl butyral, polyvinyl propional, polyvinyl acetate, polyvinyl acetate. Acetoacetal, polyvinylpyrrolidone, methylcellulose, hydroxymethylcellulose, polyamide, phenoxy resin, epoxy resin, urethane resin, silicon resin, cellulose ester, cellulose ether, and styrene, vinyl acetate, vinyl chloride, acrylate ester, methacrylate ester, vinyl Examples thereof include polymers and copolymers of vinyl compounds such as alcohol and ethyl vinyl ether. Among these resins, a plurality of resins may be used in combination.
<溶媒>
溶媒、または分散媒としては、揮発性が高く且つその蒸気の密度が空気よりも大きい溶剤が好適に用いられ、例えば、n−ブチルアミン、ジエチルアミン、エチレンジアミン、イソプロパノールアミン、トリエタノールアミン、トリエチレンジアミン、N,N−ジメチルホルムアミド、アセトン、メチルエチルケトン、シクロヘキサノン、ベンゼン、4−メトキシ−4−メチルペンタノン−2、ジメトキシメタン、ジメトキシエタン、2,4−ペンタジオン、アニソール、3−オキソブタン酸メチル、モノクロルベンゼン、トルエン、キシレン、クロロホルム、1,2−ジクロロエタン、1,2ージクロロプロパン、1,1,2−トリクロロエタン、1,1,1−トリクロロエタン、トリクロロエチレン、テトラクロロエタン、ジクロロメタン、テトラヒドロフラン、ジオキサン、メチルアルコール、エチルアルコール、イソプロピルアルコール、酢酸エチル、酢酸ブチル、ジメチルスル
ホキシド、メチルセルソルブ、エチルセルソルブ、メチルセルソルブアセテート等が挙げられる。これらの溶媒は、1種類単独で使用してもよく、或いは2種類以上を混合して用いても良い。
<Solvent>
As the solvent or dispersion medium, a solvent having high volatility and a vapor density higher than that of air is preferably used. For example, n-butylamine, diethylamine, ethylenediamine, isopropanolamine, triethanolamine, triethylenediamine, N , N-dimethylformamide, acetone, methyl ethyl ketone, cyclohexanone, benzene, 4-methoxy-4-methylpentanone-2, dimethoxymethane, dimethoxyethane, 2,4-pentadione, anisole, methyl 3-oxobutanoate, monochlorobenzene, toluene , Xylene, chloroform, 1,2-dichloroethane, 1,2-dichloropropane, 1,1,2-trichloroethane, 1,1,1-trichloroethane, trichloroethylene, tetrachloroethane, dichlorometa , Tetrahydrofuran, dioxane, methyl alcohol, ethyl alcohol, isopropyl alcohol, ethyl acetate, butyl acetate, dimethyl sulfoxide, methyl cellosolve, ethyl cellosolve, and the like methyl cellosolve acetate. These solvents may be used alone or in combination of two or more.
<塗布液の物性>
塗布液中の各成分の濃度、塗布液の粘度は、公知の方法に従って適宜選択される。
例えば、単層型感光体、及び機能分離型感光体の電荷輸送層の場合には、塗布液の固形分濃度を通常5重量%以上、好ましくは10重量%以上、より好ましくは20重量%以上であって、通常50重量%以下、好ましくは40重量%以下、特に好ましくは35重量%以下の範囲で用いられる。また、塗布液の粘度は、通常10cps以上、好ましくは50cps以上、また、通常500cps以下、好ましくは400cps以下の範囲で用いられる。塗膜の膜厚は、15〜40μmとするのがよい。
<Physical properties of coating solution>
The density | concentration of each component in a coating liquid and the viscosity of a coating liquid are suitably selected according to a well-known method.
For example, in the case of a charge transport layer of a single layer type photoreceptor or a function separation type photoreceptor, the solid content concentration of the coating solution is usually 5% by weight or more, preferably 10% by weight or more, more preferably 20% by weight or more. In general, it is used in the range of 50% by weight or less, preferably 40% by weight or less, particularly preferably 35% by weight or less. The viscosity of the coating solution is usually 10 cps or more, preferably 50 cps or more, and usually 500 cps or less, preferably 400 cps or less. The film thickness of the coating film is preferably 15 to 40 μm.
また、積層型感光体の電荷発生層の場合には、塗布液の固形分濃度は、通常0.1重量%以上、好ましくは1重量%以上、また、通常15重量%以下、好ましくは10重量%以下の範囲で用いる。そして、塗布液の粘度は、通常0.01cps以上、好ましくは0.1cps以上、また、通常20cps以下、好ましくは10cps以下の範囲とする。 In the case of a charge generating layer of a multilayer photoreceptor, the solid content concentration of the coating solution is usually 0.1% by weight or more, preferably 1% by weight or more, and usually 15% by weight or less, preferably 10% by weight. % Or less is used. The viscosity of the coating solution is usually in the range of 0.01 cps or more, preferably 0.1 cps or more, and usually 20 cps or less, preferably 10 cps or less.
以下、本発明を製造例、実施例及び比較例によりさらに詳細に説明する。なお、以下の実施例は本発明を詳細に説明するために示すものであり、本発明はその趣旨に反しない限り、以下に示した製造例及び実施例に限定されるものではない。
実施例1
Hereinafter, the present invention will be described in more detail with reference to production examples, examples and comparative examples. The following examples are given for the purpose of illustrating the present invention in detail, and the present invention is not limited to the production examples and examples shown below, unless they are contrary to the spirit of the invention.
Example 1
<アルミニウム製基体の製造>
JISで規定されている6063番のアルミニウム合金を、押し出しにより円筒状に加工した後、引き抜き加工し、更に切削加工して外径60mm、長さ300mmの、アルミニウム製基体を得た。
<塗布液の製造>
CuKα特性X線に対する粉末X線回折スペクトルにおいて、ブラッグ角(2θ±0.2°)が、9.3°,10.6°および26.3°に強い回折ピークを有する、A型オキシチタニウムフタロシアニン10重量部を、4−メトキシ−4−メチルペンタノン−2 150重量部に加え、サンドグラインドミルで1時間粉砕して微粒化処理を行った。
<Manufacture of aluminum substrate>
An aluminum alloy No. 6063 defined by JIS was processed into a cylindrical shape by extrusion, then drawn and further cut to obtain an aluminum substrate having an outer diameter of 60 mm and a length of 300 mm.
<Manufacture of coating liquid>
A-type oxytitanium phthalocyanine having strong diffraction peaks at 9.3 °, 10.6 ° and 26.3 ° in the powder X-ray diffraction spectrum for CuKα characteristic X-rays 10 parts by weight was added to 150 parts by weight of 4-methoxy-4-methylpentanone-2 and pulverized with a sand grind mill for 1 hour for atomization.
バインダー樹脂として、ポリビニルブチラール(電気化学工業(株)製、商品名デンカブチラール#6000C)の5% 1,2−ジメトキシエタン溶液100部及びフェノキシ樹脂(ユニオンカーバイド社製、商品名PKHH)の5% 1,2−ジメトキシエタン溶液100部を混合して、バインダー樹脂溶液を作製した。
先に作製した顔料分散液160重量部に、バインダー樹脂溶液100重量部、適量の1,2−ジメトキシエタンを加え、最終的に固形分濃度4.0%の顔料分散液を調製した。
As binder resin, 5% of polyvinyl butyral (Electrochemical Industry Co., Ltd., trade name Denkabutyral # 6000C) 5% 1,2-dimethoxyethane solution and phenoxy resin (Union Carbide, trade name PKHH) A binder resin solution was prepared by mixing 100 parts of a 1,2-dimethoxyethane solution.
100 parts by weight of the binder resin solution and an appropriate amount of 1,2-dimethoxyethane were added to 160 parts by weight of the previously prepared pigment dispersion to finally prepare a pigment dispersion having a solid content concentration of 4.0%.
<塗布工程>
前記アルミニウム製基体を、上端部より挿入された風船チャックにより、内面から把持し、直径80mm、深さ500mmの円筒状の容器上端部まで上記顔料分散液を満たした塗布液槽に、略垂直に浸漬し、液面に対する相対上昇速度300mm/分、基体上昇中の液供給速度0.80L/分として、浸漬塗布を行った。この塗布条件を式(2)にあてはめて計算すると、D=300,V=0.8,Ds=60であるので、
V/(1/4(π・Ds2))×106=283
D=300
0.8D=240
となり、本発明の式(2)で表される条件を満たすものである。
<Application process>
The aluminum substrate is gripped from the inner surface by a balloon chuck inserted from the upper end, and is approximately perpendicular to the coating liquid tank filled with the pigment dispersion up to the upper end of a cylindrical container having a diameter of 80 mm and a depth of 500 mm. Immersion coating was performed at a relative rising speed of 300 mm / min with respect to the liquid surface and a liquid supply speed of 0.80 L / min during the ascending of the substrate. When this application condition is applied to equation (2) and calculated, D = 300, V = 0.8, and Ds = 60.
V / (1/4 (π · Ds 2 )) × 10 6 = 283
D = 300
0.8D = 240
Thus, the condition represented by the formula (2) of the present invention is satisfied.
実施例2
基体の上昇中の液供給速度を0.70L/分とした以外は、実施例1と同様にして浸漬
塗布を行った。この塗布条件を式(1)にあてはめて計算すると、D=300,V=0.7,Ds=60であるので、
V/(1/4(π・Ds2))×106=212
となり、本発明の式(1)で表される条件を満たすものである。
Example 2
Immersion coating was performed in the same manner as in Example 1 except that the liquid supply rate during ascending the substrate was 0.70 L / min. When this application condition is applied to the equation (1) and calculated, D = 300, V = 0.7, and Ds = 60.
V / (1/4 (π · Ds 2 )) × 10 6 = 212
Thus, the condition represented by the formula (1) of the present invention is satisfied.
比較例1
基体の上昇中の液供給速度を1.0L/分とした以外は、実施例1と同様にして浸漬塗
布を行った。この塗布条件を式(1)にあてはめて計算すると、D=300,V=1.0,Ds=60であるので、
V/(1/4(π・Ds2))×106=353
となり、V/(1/4(π・Ds2))×106の値は、D(=300)の値を超えるものであって、本発明の塗布方法ではないものである。
Comparative Example 1
Immersion coating was carried out in the same manner as in Example 1 except that the liquid supply rate during ascending the substrate was 1.0 L / min. When this application condition is applied to equation (1) and calculated, D = 300, V = 1.0, and Ds = 60.
V / (1/4 (π · Ds 2 )) × 10 6 = 353
Thus, the value of V / (1/4 (π · Ds 2 )) × 10 6 exceeds the value of D (= 300) and is not a coating method of the present invention.
比較例2
基体の上昇中に塗布液槽に塗布液を供給しないこと以外は、実施例1と同様にして浸漬塗布を行った。この塗布条件を式(1)にあてはめて計算すると、D=300,V=0,Ds=60であるので、
V/(1/4(π・Ds2))×106=0
となり、V/(1/4(π・Ds2))×106の値は、本発明の塗布方法ではないものである。
[評価]
基体上に形成された塗膜の外観を、目視により評価し、アルミニウム製基体が塗布液に接してから、塗布槽を出るまでの時間(以下、塗布時間ということがある)をストップウォッチで計測した。結果を表−1に示す。
Comparative Example 2
Immersion coating was performed in the same manner as in Example 1 except that the coating solution was not supplied to the coating solution tank while the substrate was raised. When this application condition is applied to the equation (1) and calculated, D = 300, V = 0, Ds = 60.
V / (1/4 (π · Ds 2 )) × 10 6 = 0
Thus, the value of V / (1/4 (π · Ds 2 )) × 10 6 is not the coating method of the present invention.
[Evaluation]
The appearance of the coating film formed on the substrate is evaluated visually, and the time from when the aluminum substrate contacts the coating solution until it exits the coating tank (hereinafter sometimes referred to as coating time) is measured with a stopwatch. did. The results are shown in Table-1.
1:円筒状基体
2:チャック装置
3:浸漬塗布装置
1: Cylindrical substrate 2: Chuck device 3: Immersion coating device
Claims (3)
D>V/(1/4(π・Ds2))×106>0 (1) After immersing a columnar or cylindrical substrate to be coated in a coating solution so that its virtual axis is substantially perpendicular to the liquid surface, the substrate is relative to the liquid surface of the solution. In the coating method, the rising speed D with respect to the liquid level of the substrate (mm / min), the outer diameter Ds (mm) of the substrate, and the coating solution for supplying the coating solution while the substrate is rising A dip coating method, wherein the relationship represented by the following formula (1) is established when the solution supply rate is V (L / min).
D> V / (1/4 (π · Ds 2 )) × 10 6 > 0 (1)
D>V/(1/4(π・Ds2))×106>0.8D (2) The dip coating method according to claim 1, wherein the following formula (2) is satisfied.
D> V / (1/4 (π · Ds 2 )) × 10 6 > 0.8D (2)
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| JP2004037711A JP4470516B2 (en) | 2004-02-16 | 2004-02-16 | Immersion coating method |
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| JP2004037711A JP4470516B2 (en) | 2004-02-16 | 2004-02-16 | Immersion coating method |
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| JP4470516B2 true JP4470516B2 (en) | 2010-06-02 |
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