JP4482299B2 - Ruthenium compound and method for producing optically active alcohol compound - Google Patents
Ruthenium compound and method for producing optically active alcohol compound Download PDFInfo
- Publication number
- JP4482299B2 JP4482299B2 JP2003303471A JP2003303471A JP4482299B2 JP 4482299 B2 JP4482299 B2 JP 4482299B2 JP 2003303471 A JP2003303471 A JP 2003303471A JP 2003303471 A JP2003303471 A JP 2003303471A JP 4482299 B2 JP4482299 B2 JP 4482299B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- ruthenium
- containing heterocyclic
- compound
- optically active
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- -1 alcohol compound Chemical class 0.000 title claims description 116
- 150000003304 ruthenium compounds Chemical class 0.000 title claims description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000003446 ligand Substances 0.000 claims description 55
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 52
- 125000001424 substituent group Chemical group 0.000 claims description 36
- 125000000623 heterocyclic group Chemical group 0.000 claims description 35
- 150000004985 diamines Chemical class 0.000 claims description 26
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 26
- 238000009876 asymmetric hydrogenation reaction Methods 0.000 claims description 19
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 19
- 239000003054 catalyst Substances 0.000 claims description 17
- 150000001728 carbonyl compounds Chemical class 0.000 claims description 16
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 15
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 15
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 claims description 9
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims description 9
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 claims description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 239000011593 sulfur Substances 0.000 claims description 8
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 7
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 7
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 description 23
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 9
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 9
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 8
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- MUALRAIOVNYAIW-UHFFFAOYSA-N binap Chemical group C1=CC=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1P(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 MUALRAIOVNYAIW-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000004423 acyloxy group Chemical group 0.000 description 6
- 229960001701 chloroform Drugs 0.000 description 6
- DHCWLIOIJZJFJE-UHFFFAOYSA-L dichlororuthenium Chemical compound Cl[Ru]Cl DHCWLIOIJZJFJE-UHFFFAOYSA-L 0.000 description 6
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 6
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000012327 Ruthenium complex Substances 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 4
- 125000004370 n-butenyl group Chemical group [H]\C([H])=C(/[H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- NPGAXSHDDOESHB-JTQLQIEISA-N (1r)-n',n'-dimethyl-1-phenylethane-1,2-diamine Chemical compound CN(C)C[C@H](N)C1=CC=CC=C1 NPGAXSHDDOESHB-JTQLQIEISA-N 0.000 description 3
- 125000006833 (C1-C5) alkylene group Chemical group 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 3
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 3
- SMWUDAKKCDQTPV-UHFFFAOYSA-N 1,3-dimethylimidazolidine Chemical compound CN1CCN(C)C1 SMWUDAKKCDQTPV-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- GQHTUMJGOHRCHB-UHFFFAOYSA-N DBU Substances C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- IOPQYDKQISFMJI-UHFFFAOYSA-N [1-[2-bis(4-methylphenyl)phosphanylnaphthalen-1-yl]naphthalen-2-yl]-bis(4-methylphenyl)phosphane Chemical group C1=CC(C)=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1P(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 IOPQYDKQISFMJI-UHFFFAOYSA-N 0.000 description 3
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 125000000732 arylene group Chemical group 0.000 description 3
- 235000019445 benzyl alcohol Nutrition 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229950005499 carbon tetrachloride Drugs 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 125000002993 cycloalkylene group Chemical group 0.000 description 3
- 125000002541 furyl group Chemical group 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 125000006038 hexenyl group Chemical group 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- ADYYRXNLCZOUSU-UHFFFAOYSA-M potassium;propan-2-ol;hydroxide Chemical compound [OH-].[K+].CC(C)O ADYYRXNLCZOUSU-UHFFFAOYSA-M 0.000 description 3
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- 125000006024 2-pentenyl group Chemical group 0.000 description 2
- FWXAUDSWDBGCMN-UHFFFAOYSA-N 3-diphenylphosphanylbutan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 FWXAUDSWDBGCMN-UHFFFAOYSA-N 0.000 description 2
- RVDLHGSZWAELAU-UHFFFAOYSA-N 5-tert-butylthiophene-2-carbonyl chloride Chemical compound CC(C)(C)C1=CC=C(C(Cl)=O)S1 RVDLHGSZWAELAU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000005427 anthranyl group Chemical group 0.000 description 2
- 125000005199 aryl carbonyloxy group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- FFSAXUULYPJSKH-UHFFFAOYSA-N butyrophenone Chemical compound CCCC(=O)C1=CC=CC=C1 FFSAXUULYPJSKH-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012973 diazabicyclooctane Substances 0.000 description 2
- 125000005879 dioxolanyl group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001786 isothiazolyl group Chemical group 0.000 description 2
- 125000000842 isoxazolyl group Chemical group 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052987 metal hydride Inorganic materials 0.000 description 2
- 150000004681 metal hydrides Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000006606 n-butoxy group Chemical group 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 125000002971 oxazolyl group Chemical group 0.000 description 2
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 2
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 2
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 235000011181 potassium carbonates Nutrition 0.000 description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 2
- 125000003373 pyrazinyl group Chemical group 0.000 description 2
- 125000003226 pyrazolyl group Chemical group 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 125000005493 quinolyl group Chemical group 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- 229910000104 sodium hydride Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000335 thiazolyl group Chemical group 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- 125000001425 triazolyl group Chemical group 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- OVPWEQROJNJHAG-UHFFFAOYSA-N (1-naphthalen-1-ylnaphthalen-2-yl)-diphenylphosphane Chemical group C1=CC=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1)C1=CC=CC=C1 OVPWEQROJNJHAG-UHFFFAOYSA-N 0.000 description 1
- HQRWWHIETAKIMO-JTQLQIEISA-N (1s)-1-phenylbutan-1-ol Chemical compound CCC[C@H](O)C1=CC=CC=C1 HQRWWHIETAKIMO-JTQLQIEISA-N 0.000 description 1
- CDJHPMXMJUCLPA-UHFFFAOYSA-N (3-diphenylphosphanyl-2-bicyclo[2.2.1]hept-5-enyl)-diphenylphosphane Chemical compound C1C2C=CC1C(P(C=1C=CC=CC=1)C=1C=CC=CC=1)C2P(C=1C=CC=CC=1)C1=CC=CC=C1 CDJHPMXMJUCLPA-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-ZETCQYMHSA-N (S)-1-phenylethanol Chemical compound C[C@H](O)C1=CC=CC=C1 WAPNOHKVXSQRPX-ZETCQYMHSA-N 0.000 description 1
- FTTATHOUSOIFOQ-UHFFFAOYSA-N 1,2,3,4,6,7,8,8a-octahydropyrrolo[1,2-a]pyrazine Chemical compound C1NCCN2CCCC21 FTTATHOUSOIFOQ-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- WGOBPPNNYVSJTE-UHFFFAOYSA-N 1-diphenylphosphanylpropan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)CP(C=1C=CC=CC=1)C1=CC=CC=C1 WGOBPPNNYVSJTE-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- LRLQQERNMXHASR-UHFFFAOYSA-N 2-diphenylphosphanylpropan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 LRLQQERNMXHASR-UHFFFAOYSA-N 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003682 3-furyl group Chemical group O1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001541 3-thienyl group Chemical group S1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- CTYPJIUQROQJBG-UHFFFAOYSA-N 4-diphenylphosphanylpentan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)CC(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 CTYPJIUQROQJBG-UHFFFAOYSA-N 0.000 description 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- KRWTWSSMURUMDE-UHFFFAOYSA-N [1-(2-methoxynaphthalen-1-yl)naphthalen-2-yl]-diphenylphosphane Chemical group COC1=CC=C2C=CC=CC2=C1C(C1=CC=CC=C1C=C1)=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 KRWTWSSMURUMDE-UHFFFAOYSA-N 0.000 description 1
- MXGXXBYVDMVJAO-UHFFFAOYSA-N [1-[2-bis(3,5-dimethylphenyl)phosphanylnaphthalen-1-yl]naphthalen-2-yl]-bis(3,5-dimethylphenyl)phosphane Chemical group CC1=CC(C)=CC(P(C=2C=C(C)C=C(C)C=2)C=2C(=C3C=CC=CC3=CC=2)C=2C3=CC=CC=C3C=CC=2P(C=2C=C(C)C=C(C)C=2)C=2C=C(C)C=C(C)C=2)=C1 MXGXXBYVDMVJAO-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000001370 alpha-amino acid derivatives Chemical class 0.000 description 1
- 235000008206 alpha-amino acids Nutrition 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- BHWOFJARJXORKD-UHFFFAOYSA-N butyl-ethyl-methylphosphane Chemical compound CCCCP(C)CC BHWOFJARJXORKD-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 125000004976 cyclobutylene group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004979 cyclopentylene group Chemical group 0.000 description 1
- 125000004980 cyclopropylene group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- SKCMIKXIHUVXEG-UHFFFAOYSA-N dicyclohexyl-[2-(2-dicyclohexylphosphanyl-6-methylphenyl)-3-methylphenyl]phosphane Chemical group CC=1C=CC=C(P(C2CCCCC2)C2CCCCC2)C=1C=1C(C)=CC=CC=1P(C1CCCCC1)C1CCCCC1 SKCMIKXIHUVXEG-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 239000000386 donor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- RDKSTWLPGJFGDW-UHFFFAOYSA-N ethyl-methyl-phenylphosphane Chemical compound CCP(C)C1=CC=CC=C1 RDKSTWLPGJFGDW-UHFFFAOYSA-N 0.000 description 1
- XCPIGESPXUUNNW-UHFFFAOYSA-N ethyl-methyl-propan-2-ylphosphane Chemical compound CCP(C)C(C)C XCPIGESPXUUNNW-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000852 hydrogen donor Substances 0.000 description 1
- 125000003037 imidazol-2-yl group Chemical group [H]N1C([*])=NC([H])=C1[H] 0.000 description 1
- 125000002140 imidazol-4-yl group Chemical group [H]N1C([H])=NC([*])=C1[H] 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 125000000593 indol-1-yl group Chemical group [H]C1=C([H])C([H])=C2N([*])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000002249 indol-2-yl group Chemical group [H]C1=C([H])C([H])=C2N([H])C([*])=C([H])C2=C1[H] 0.000 description 1
- 125000000814 indol-3-yl group Chemical group [H]C1=C([H])C([H])=C2N([H])C([H])=C([*])C2=C1[H] 0.000 description 1
- 125000004531 indol-5-yl group Chemical group [H]N1C([H])=C([H])C2=C([H])C(*)=C([H])C([H])=C12 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical class [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 1
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- CRGZYKWWYNQGEC-UHFFFAOYSA-N magnesium;methanolate Chemical compound [Mg+2].[O-]C.[O-]C CRGZYKWWYNQGEC-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- FSYNJORCDZYHJB-UHFFFAOYSA-N methyl-di(propan-2-yl)phosphane Chemical compound CC(C)P(C)C(C)C FSYNJORCDZYHJB-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- SAWKFRBJGLMMES-UHFFFAOYSA-N methylphosphine Chemical compound PC SAWKFRBJGLMMES-UHFFFAOYSA-N 0.000 description 1
- PPLYZPAMMOECNS-UHFFFAOYSA-N n'-(1-phenylethyl)ethane-1,2-diamine Chemical compound NCCNC(C)C1=CC=CC=C1 PPLYZPAMMOECNS-UHFFFAOYSA-N 0.000 description 1
- RLEBYZJBMZZXSZ-CJNGLKHVSA-N n-[(1r,2r)-1-hydroxy-1-phenylpropan-2-yl]-n-methylbenzamide Chemical compound C1([C@@H](O)[C@@H](C)N(C)C(=O)C=2C=CC=CC=2)=CC=CC=C1 RLEBYZJBMZZXSZ-CJNGLKHVSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002900 organolithium compounds Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical group 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 238000000711 polarimetry Methods 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- SIMSUOWKMVWQAI-UHFFFAOYSA-N tert-butyl-[2-[tert-butyl(methyl)phosphanyl]ethyl]-methylphosphane Chemical compound CC(C)(C)P(C)CCP(C)C(C)(C)C SIMSUOWKMVWQAI-UHFFFAOYSA-N 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- YRQNNUGOBNRKKW-UHFFFAOYSA-K trifluororuthenium Chemical class F[Ru](F)F YRQNNUGOBNRKKW-UHFFFAOYSA-K 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、カルボニル化合物の不斉水素化触媒として有用な新規ルテニウム化合物、及びこのルテニウム化合物を不斉水素化触媒として用いて、カルボニル化合物を不斉水素還元する光学活性アルコール化合物の製造方法に関する。 The present invention relates to a novel ruthenium compound useful as an asymmetric hydrogenation catalyst for a carbonyl compound, and a method for producing an optically active alcohol compound in which the carbonyl compound is asymmetrically hydrogenated using the ruthenium compound as an asymmetric hydrogenation catalyst.
従来、光学活性アルコール化合物の製造方法として、ケトン類等のカルボニル化合物を触媒的に不斉水素化する方法が知られている。例えば、非特許文献1及び2に記載されたロジウム錯体を用いる方法、非特許文献3に記載されたイリジウム錯体を用いる方法、特許文献1に記載されたルテニウムを触媒に用いる水素移動による方法、特許文献2に記載されたルテニウムを触媒に用いる水素化による方法等が知られている。 Conventionally, as a method for producing an optically active alcohol compound, a method of catalytically asymmetrically hydrogenating a carbonyl compound such as a ketone is known. For example, a method using a rhodium complex described in Non-Patent Documents 1 and 2, a method using an iridium complex described in Non-Patent Document 3, a method by hydrogen transfer using ruthenium as a catalyst described in Patent Document 1, a patent A hydrogenation method using ruthenium described in Document 2 as a catalyst is known.
しかしながら、これらの方法のうち、非特許文献1〜3に記載の方法は、触媒として用いる金属が比較的高価なロジウム、イリジウム等のいわゆる貴金属であり、しかも水素化活性が低く、不斉水素化触媒として用いる場合においては、比較的高温あるいは高い水素圧を必要とするものである。特許文献1に記載の方法は、水素源として蟻酸等の有機化合物を用いなければならず、水素ガス等の安価な水素源を用いる場合に比べ、操作的・コスト的に不利である。また、特許文献2に記載の方法は、カルボニル化合物の不斉水素化方法として優れたものであるが、複数の置換基を有する高価な2座ホスフィン配位子と、合成が困難なジアミン配位子を有する触媒を用いなければ良好な結果が得られない等の問題があった。
従って、水素ガス等の安価な水素源を用いて、カルボニル化合物から対応する光学活性アルコール化合物を高選択的、高収率で製造できる、安価な不斉水素化触媒の開発が望まれていた。
However, among these methods, the methods described in Non-Patent Documents 1 to 3 are so-called noble metals such as rhodium and iridium, which are relatively expensive metals, and have a low hydrogenation activity and asymmetric hydrogenation. When used as a catalyst, a relatively high temperature or a high hydrogen pressure is required. The method described in Patent Document 1 must use an organic compound such as formic acid as a hydrogen source, which is disadvantageous in terms of operation and cost as compared to using an inexpensive hydrogen source such as hydrogen gas. In addition, the method described in Patent Document 2 is an excellent method for asymmetric hydrogenation of carbonyl compounds, but an expensive bidentate phosphine ligand having a plurality of substituents and a diamine coordination that is difficult to synthesize. There is a problem that good results cannot be obtained unless a catalyst having a child is used.
Therefore, development of an inexpensive asymmetric hydrogenation catalyst capable of producing a corresponding optically active alcohol compound from a carbonyl compound with high selectivity and high yield using an inexpensive hydrogen source such as hydrogen gas has been desired.
本発明は、かかる実状に鑑みてなされたものであり、入手が容易で、カルボニル化合物の不斉水素化触媒として有用な新規ルテニウム化合物、及びこのルテニウム化合物を不斉水素化触媒として用いる光学活性アルコール化合物の製造方法を提供することを課題とする。 The present invention has been made in view of such a situation, is easily available, and is useful as a catalyst for asymmetric hydrogenation of carbonyl compounds, and an optically active alcohol using this ruthenium compound as an asymmetric hydrogenation catalyst It is an object to provide a method for producing a compound.
上記課題を解決すべく、本発明は第1に、式(I) In order to solve the above problems, the present invention firstly provides a compound of formula (I)
〔式中、X及びYは、それぞれ独立して水素原子、ハロゲン原子、カルボキシル基、水酸基又はC1〜C20アルコキシ基を表す。
Pxはホスフィン配位子を表し、nは1又は2を表す。
Aは、下記に示す式(1)で表されるジアミン配位子を表す。
[Wherein, X and Y each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a hydroxyl group or a C1-C20 alkoxy group.
Px represents a phosphine ligand, and n represents 1 or 2.
A represents a diamine ligand represented by the following formula (1) .
〔式中、R 1 は、(ハロゲン原子、C3〜C8シクロアルキル基、C1〜C20アルコキシ基、フェニル基、1−ナフチル基、2−ナフチル基、アセチル基、プロピオニル基、イソプロピオニルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基、C1〜C12アルキルカルボニルオキシ基、含酸素ヘテロ環基、含イオウヘテロ環基、若しくは含窒素ヘテロ環基)で置換されていてもよいC1〜C20アルキル基、
(ハロゲン原子、C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C1〜C20アルコキシ基、アセチル基、プロピオニル基、イソプロピオニルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基、C1〜C12アルキルカルボニルオキシ基、含酸素ヘテロ環基、含イオウヘテロ環基、若しくは含窒素ヘテロ環基)で置換されていてもよいC7〜C20アラルキル基、又は、
(ハロゲン原子、C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C7〜C20アラルキル基、C1〜C20アルコキシ基、C7〜C20アラルキル基、フェニル基、1−ナフチル基、2−ナフチル基、アセチル基、プロピオニル基、イソプロピオニルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基、C1〜C12アルキルカルボニルオキシ基、含酸素ヘテロ環基、含イオウヘテロ環基、若しくは含窒素ヘテロ環基)で置換されていてもよいフェニル基を表し、
R 2 、R 3 はメチル基を表す。また、R2、R3が一緒になって結合して環を形成してもよい。〕
で表されるルテニウム化合物を提供する。
[In the formula, R 1 is (halogen atom, C3-C8 cycloalkyl group, C1-C20 alkoxy group, phenyl group, 1-naphthyl group, 2-naphthyl group, acetyl group, propionyl group, isopropionylcarbonyl group, benzoyl Group, a phenylmethylcarbonyl group, a C1-C12 alkylcarbonyloxy group, an oxygen-containing heterocyclic group, a sulfur-containing heterocyclic group, or a nitrogen-containing heterocyclic group),
(Halogen atom, C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C1-C20 alkoxy group, acetyl group, propionyl group, isopropionylcarbonyl group, benzoyl group, phenylmethylcarbonyl group, C1- A C7-C20 aralkyl group optionally substituted with a C12 alkylcarbonyloxy group, an oxygen-containing heterocyclic group, a sulfur-containing heterocyclic group, or a nitrogen-containing heterocyclic group, or
(Halogen atom, C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C7-C20 aralkyl group, C1-C20 alkoxy group, C7-C20 aralkyl group, phenyl group, 1-naphthyl group, 2 -Naphthyl group, acetyl group, propionyl group, isopropionylcarbonyl group, benzoyl group, phenylmethylcarbonyl group, C1-C12 alkylcarbonyloxy group, oxygen-containing heterocyclic group, sulfur-containing heterocyclic group, or nitrogen-containing heterocyclic group) Represents an optionally substituted phenyl group,
R 2 and R 3 represent a methyl group. R 2 and R 3 may be bonded together to form a ring. ]
The ruthenium compound represented by these is provided.
本発明のルテニウム化合物は、前記Pxが光学活性ホスフィン配位子であるものが好ましく、前記Aが光学活性ジアミン配位子であるものが好ましい。
本発明のルテニウム化合物は、前記Aが、前記式(1)又は(2)中、R1が置換基を有してもよいフェニル基のジアミン配位子であるものが好ましく、R2及びR3がメチル基のジアミン配位子であるものが好ましい。
In the ruthenium compound of the present invention, the compound in which Px is an optically active phosphine ligand is preferable, and the compound in which A is an optically active diamine ligand is preferable.
The ruthenium compound of the present invention is preferably such that A is a diamine ligand of a phenyl group that R 1 may have a substituent in the formula (1) or (2), and R 2 and R What 3 is a diamine ligand of a methyl group is preferable.
本発明は第2に、本発明のルテニウム化合物からなる不斉水素化触媒を提供する。
本発明は第3に、本発明のルテニウム化合物の存在下、カルボニル化合物を水素化することを特徴とする光学活性アルコール化合物の製造方法を提供する。
The present invention secondly provides an asymmetric hydrogenation catalyst comprising the ruthenium compound of the present invention.
Thirdly, the present invention provides a method for producing an optically active alcohol compound, characterized in that a carbonyl compound is hydrogenated in the presence of the ruthenium compound of the present invention.
本発明によれば、入手容易で安価な、カルボニル化合物の不斉水素化触媒として有用な新規ルテニウム化合物が提供される。また、本発明によれば、このルテニウム化合物の存在下、水素ガス等の安価な水素源を用いて、カルボニル化合物から対応する光学活性アルコール化合物を高選択的、高収率に製造することができる。 According to the present invention, a new ruthenium compound useful as an asymmetric hydrogenation catalyst for a carbonyl compound, which is easily available and inexpensive, is provided. Further, according to the present invention, a corresponding optically active alcohol compound can be produced from a carbonyl compound with high selectivity and high yield using an inexpensive hydrogen source such as hydrogen gas in the presence of the ruthenium compound. .
以下、本発明を、1)ルテニウム化合物及び不斉水素化触媒、並びに2)光学活性アルコールの製造方法に項分けして詳細に説明する。 Hereinafter, the present invention will be described in detail by dividing it into 1) a ruthenium compound and an asymmetric hydrogenation catalyst, and 2) a method for producing an optically active alcohol.
1)ルテニウム化合物及び不斉水素化触媒
本発明の第1は、下記に示す式(I)で表されるルテニウム化合物である。
1) Ruthenium compound and asymmetric hydrogenation catalyst The first of the present invention is a ruthenium compound represented by the following formula (I).
式(I)において、X及びYは、それぞれ独立して水素原子;フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;カルボキシル基;水酸基;又は、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、ペンチルオキシ基、ヘキシルオキシ基、シクロヘキシルオキシ基、ドデシルオキシ基等のC1〜C20アルコキシ基;を表す。 In the formula (I), X and Y are each independently a hydrogen atom; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom; a carboxyl group; a hydroxyl group; or a methoxy group, an ethoxy group, a propoxy group, Represents a C1-C20 alkoxy group such as an isopropoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a cyclohexyloxy group, or a dodecyloxy group;
(1)ホスフィン配位子(Px)
Pxはホスフィン配位子を表す。Pxとしては、安定してルテニウム化合物を形成し得るものであれば、特に限定されるものではないが、優れた不斉水素化触媒活性を有するルテニウム化合物を得る観点から、光学活性ホスフィン配位子であるのが好ましい。
(1) Phosphine ligand (Px)
Px represents a phosphine ligand. Px is not particularly limited as long as it can stably form a ruthenium compound. From the viewpoint of obtaining a ruthenium compound having excellent asymmetric hydrogenation catalytic activity, an optically active phosphine ligand. Is preferred.
前記Pxとしては、以下に示す式(3)で表される単座ホスフィン配位子や、式(4)で表される2座ホスフィン配位子を例示することができる。 As said Px, the monodentate phosphine ligand represented by Formula (3) shown below and the bidentate phosphine ligand represented by Formula (4) can be illustrated.
前記式(3)で表される単座ホスフィン配位子において、RA、RB及びRCは、それぞれ独立してメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、イソブチル基、t−ブチル基、ペンチル基,ヘキシル基、ヘプチル基、ノニル基、ドデシル基等のC1〜C20アルキル基;置換基を有してもよいフェニル基;シクロプロピル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基等のC3〜C8シクロアルキル基;ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基等のC7〜C20アラルキル基;等を表す。また、RA、RB及びRCのうちの2つが結合して、置換基を有してもよいPを含むヘテロ環を形成してもよい。 In the monodentate phosphine ligand represented by the formula (3), R A , R B and R C are each independently methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec -C1-C20 alkyl group such as butyl group, isobutyl group, t-butyl group, pentyl group, hexyl group, heptyl group, nonyl group, dodecyl group; phenyl group which may have a substituent; cyclopropyl group, cyclopentyl A C3-C8 cycloalkyl group such as a group, a cyclohexyl group or a cyclooctyl group; a C7-C20 aralkyl group such as a benzyl group, an α-methylbenzyl group or an α, α-dimethylbenzyl group; Also, two of R A , R B and R C may be bonded to form a heterocycle containing P which may have a substituent.
前記フェニル基及びPを含むヘテロ環の置換基としては、例えば、フッ素原子、塩素原子、臭素原子等のハロゲン原子;水酸基;メチル基、エチル基、プロピル基、ブチル基、ペンチル基,ヘキシル基、ヘプチル基、ノニル基、ドデシル基等のC1〜C20アルキル基;ビニル基、プロペニル基、ブテニル基、2−ヘキセニル基等のC2〜C20アルケニル基;シクロプロピル基、シクロブチル基、シクロペンチル基等のC3〜C8シクロアルキル基;ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基等のC7〜C20アラルキル基;フェニル基、1−ナフチル基、2−ナフチル基等のアリール基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、ブトキシ基、ペンチロキシ基、ヘキシロキシ基、ドデシロキシ基等のC1〜C20アルコキシ基;アセトキシ基、プロピオニルオキシ基、ベンゾイルオキシ基等のアシルオキシ基;ジオキソラン−2−イル、オキサゾリン−2−イル等のヘテロ環基;等が挙げられる。 Examples of the substituent of the heterocyclic ring containing phenyl group and P include, for example, halogen atom such as fluorine atom, chlorine atom, bromine atom; hydroxyl group; methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, C1-C20 alkyl groups such as heptyl group, nonyl group, dodecyl group; C2-C20 alkenyl groups such as vinyl group, propenyl group, butenyl group, 2-hexenyl group; C3-C3 such as cyclopropyl group, cyclobutyl group, cyclopentyl group, etc. C8 cycloalkyl group; C7-C20 aralkyl group such as benzyl group, α-methylbenzyl group, α, α-dimethylbenzyl group; aryl group such as phenyl group, 1-naphthyl group, 2-naphthyl group; methoxy group, ethoxy Group, n-propoxy group, isopropoxy group, butoxy group, pentyloxy group, hexyloxy group, dodecyloxy group C1~C20 alkoxy group such as a group; acetoxy group, propionyloxy group, an acyloxy group such as a benzoyloxy group; dioxolan-2-yl, the heterocyclic group such as oxazolin-2-yl; and the like.
前記式(3)で表される単座ホスフィン配位子の具体例としては、トリメチルホスフィン、トリエチルホスフィン、トリブチルホスフィン、トリフェニルホスフィン、トリシクロヘキシルホスフィン、トリ(p−トリル)ホスフィン、ジフェニルメチルホスフィン、ジメチルフェニルホスフィン、ジイソプロピルメチルホスフィン、1−[2−(ジフェニルホスフィノ)フェロセニル]エチルメチルエーテル、2−(ジフェニルホスフィノ)−2’−メトキシ−1,1’−ビナフチル等の3級ホスフィンが好適なものとして挙げることができる。また、エチルメチルブチルホスフィン、エチルメチルフェニルホスフィン、イソプロピルエチルメチルホスフィン、シクロヘキシル(O−アニシル)メチルホスフィン等のRA、RB及びRCが3種とも異なる置換基からなるホスフィン配位子を用いることもできる。 Specific examples of the monodentate phosphine ligand represented by the formula (3) include trimethylphosphine, triethylphosphine, tributylphosphine, triphenylphosphine, tricyclohexylphosphine, tri (p-tolyl) phosphine, diphenylmethylphosphine, dimethyl Tertiary phosphines such as phenylphosphine, diisopropylmethylphosphine, 1- [2- (diphenylphosphino) ferrocenyl] ethyl methyl ether, 2- (diphenylphosphino) -2′-methoxy-1,1′-binaphthyl are suitable. Can be cited as a thing. In addition, a phosphine ligand having a substituent in which R A , R B and R C are different from each other, such as ethylmethylbutylphosphine, ethylmethylphenylphosphine, isopropylethylmethylphosphine, and cyclohexyl (O-anisyl) methylphosphine, is used. You can also.
前記式(4)で表される2座ホスフィン配位子において、RD、RE、RF及びRGは、それぞれ独立して、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、ペンチル基及びその異性体,ヘキシル基及びその異性体、ヘプチル基及びその異性体、ノニル基及びその異性体、ドデシル基及びその異性体等のC1〜C20アルキル基;置換基を有してもよいフェニル基;又はシクロプロピル基、シクロペンチル基、シクロヘキシル基等のC3〜C8シクロアルキル基;等を表す。また、RDとRE 及び/又は RFとRGが結合して置換基を有してもよいPを含む複素環を形成してもよい。 In the bidentate phosphine ligand represented by the formula (4), R D , R E , R F and R G are each independently a methyl group, an ethyl group, an n-propyl group, an isopropyl group, n -Butyl group, sec-butyl group, t-butyl group, pentyl group and its isomer, hexyl group and its isomer, heptyl group and its isomer, nonyl group and its isomer, dodecyl group and its isomer, etc. A C1-C20 alkyl group; a phenyl group which may have a substituent; or a C3-C8 cycloalkyl group such as a cyclopropyl group, a cyclopentyl group or a cyclohexyl group; In addition, RD and R E and / or R F and RG may combine to form a heterocyclic ring containing P which may have a substituent.
前記フェニル基及び複素環の置換基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;水酸基;メチル基、エチル基、プロピル基、ブチル基等のC1〜C20アルキル基;ビニル基、プロペニル基、ブテニル基等のC2〜C20アルケニル基;シクロプロピル基、シクロブチル基、シクロペンチル基等のC3〜C8シクロアルキル基;ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基等のC7〜C20アラルキル基;フェニル基、1−ナフチル基、2−ナフチル基等のアリール基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、ブトキシ基等のC1〜C20アルコキシ基;アセトキシ基、プロピオニルオキシ基、ベンゾイルオキシ基等のアシルオキシ基;ジオキソラン−2−イル基、オキサゾリン−2−イル基等のヘテロ環基;等が挙げられる。 Examples of the substituent for the phenyl group and heterocyclic ring include halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; hydroxyl group; C1-C20 alkyl group such as methyl group, ethyl group, propyl group and butyl group; vinyl Groups, propenyl groups, butenyl groups, etc., C2-C20 alkenyl groups; cyclopropyl groups, cyclobutyl groups, cyclopentyl groups, etc., C3-C8 cycloalkyl groups; benzyl groups, α-methylbenzyl groups, α, α-dimethylbenzyl groups, etc. An aryl group such as a phenyl group, a 1-naphthyl group and a 2-naphthyl group; a C1 to C20 alkoxy group such as a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group and a butoxy group; Groups, propionyloxy groups, acyloxy groups such as benzoyloxy groups; dioxolan-2-yl , Heterocyclic group such as oxazolin-2-yl group; and the like.
Wは、置換基を有してもよいC1〜C5アルキレン基、置換基を有してもよいC3〜C6シクロアルキレン基、置換基を有してもよいアリーレン基、置換基を有してもよいC2〜C20アルケンジイル基、又は置換基を有してもよいC2〜C20アルキンジイル基を表す。 W may have a C1-C5 alkylene group which may have a substituent, a C3-C6 cycloalkylene group which may have a substituent, an arylene group which may have a substituent, or a substituent. The C2-C20 alkene diyl group which may be good, or the C2-C20 alkyne diyl group which may have a substituent is represented.
C1〜C5アルキレン基の例としては、メチレン基、エチレン基、プロピレン基等が挙げられる。
C3〜C6シクロアルキレン基としては、シクロプロピレン基、シクロブチレン基、シクロペンチレン基、シクロヘキシレン基等が挙げられる。
アリーレン基としては、フェニレン基、ナフチレン基、1,1’−ビフェニル−2,2’−ジイル基、1,1’−ビナフチル−2,2’−ジイル基、1,1’−ビナフチル−7,7’−ジイル基等が挙げられる。
C2〜C20アルケンジイル基としては、エテンジイル基、プロペンジイル基、イソプロペンジイル基、ブテンジイル基等が挙げられる。
C2〜C20アルキンジイル基としては、エチンジイル、プロピンジイル基等が挙げられる。
Examples of the C1-C5 alkylene group include a methylene group, an ethylene group, and a propylene group.
Examples of the C3-C6 cycloalkylene group include a cyclopropylene group, a cyclobutylene group, a cyclopentylene group, and a cyclohexylene group.
Examples of the arylene group include phenylene group, naphthylene group, 1,1′-biphenyl-2,2′-diyl group, 1,1′-binaphthyl-2,2′-diyl group, 1,1′-binaphthyl-7, 7'-diyl group etc. are mentioned.
Examples of the C2-C20 alkenediyl group include an ethenediyl group, a propenediyl group, an isopropenediyl group, and a butenediyl group.
Examples of the C2 to C20 alkynediyl group include ethynediyl and propynediyl groups.
また、C1〜C5アルキレン基、C3〜C6シクロアルキレン基、アリーレン基、C2〜C20アルケンジイル基、C2〜C20アルキンジイル基の置換基としては、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基等のC1〜C20アルキル基;ビニル基、プロペニル基、ブテニル等のC2〜C20アルケニル基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、ブトキシ基等のC1〜C20アルコキシ基;等が挙げられる。 Moreover, as a substituent of C1-C5 alkylene group, C3-C6 cycloalkylene group, arylene group, C2-C20 alkene diyl group, C2-C20 alkyne diyl group, for example, methyl group, ethyl group, n-propyl group, isopropyl group C1-C20 alkyl group such as n-butyl group; C2-C20 alkenyl group such as vinyl group, propenyl group, butenyl; C1-C20 such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, butoxy group An alkoxy group; and the like.
前記式(4)で表される2座ホスフィン配位子の具体例としては、ビスジフェニルホスフィノメタン、ビスジフェニルホスフィノエタン、ビスジフェニルホスフィノプロパン、ビスジフェニルホスフィノブタン、ビスジメチルホスフィノエタン、ビスジメチルホスフィノプロパン等が挙げられる。 Specific examples of the bidentate phosphine ligand represented by the formula (4) include bisdiphenylphosphinomethane, bisdiphenylphosphinoethane, bisdiphenylphosphinopropane, bisdiphenylphosphinobutane, and bisdimethylphosphinoethane. And bisdimethylphosphinopropane.
さらに本発明においては、2,2’−ビス−(ジフェニルホスフィノ)−1,1’−ビナフチル(以下、BINAPと称す)、及びBINAPのナフチル環にアルキル基やアリール基等の置換基をもつBINAP誘導体、フッ素置換基を有するBINAP誘導体、リン原子上の2個のベンゼン環にそれぞれアルキル基やアルコキシ基等の置換基を1〜5個有するBINAPの誘導体等の不斉配位子も好適な2座ホスフィン配位子として例示することができる。 Furthermore, in the present invention, 2,2′-bis- (diphenylphosphino) -1,1′-binaphthyl (hereinafter referred to as BINAP) and a naphthyl ring of BINAP have a substituent such as an alkyl group or an aryl group. Also suitable are asymmetric ligands such as BINAP derivatives, BINAP derivatives having a fluorine substituent, and BINAP derivatives each having 1 to 5 substituents such as alkyl groups and alkoxy groups on two benzene rings on the phosphorus atom. It can be illustrated as a bidentate phosphine ligand.
これらの具体例としては、2,2’−ビス−(ジ−p−トリルホスフィノ)−1,1’−ビナフチル(Tol−BINAP)、2,2’−ビス[ビス(3,5−ジメチルフェニル)ホスフィノ]−1,1’−ビナフチル(Xylyl−BINAP)、1−[1’,2−ビス(ジフェニルホスフィノ)フェロセニル]エチルジアミン、2,2’−ビス−(ジシクロヘキシルホスフィノ)−6,6’−ジメチル−1,1’−ビフェニル、2,3−ビス−(ジフェニルホスフィノ)ブタン、1−シクロヘキシル−1,2−ビス−(ジフェニルホスフィノ)エタン、1−置換−3,4−ビス−(ジフェニルホスフィノ)ピロリジン、2,3−O−イソプロピリデン−2,3−ジヒドロキシ−1,4−ビス−(ジフェニルホスフィノ)ブタン、1,2−ビス[(O−メトキシフェニル)フェニルホスフィノ]エタン、置換−1,2−ビス(ホスホラノ)ベンゼン、5,6−ビス−(ジフェニルホスフィノ)−2−ノルボルネン、N,N’−ビス−(ジフェニルホスフィノ)−N,N’−ビス(1−フェニルエチル)エチレンジアミン、1,2−ビス−(ジフェニルホスフィノ)プロパン、2,4−ビス−(ジフェニルホスフィノ)ペンタン、[(5,6),(5’,6’)−ビス(メチレンジオキシ)ビフェニル−2,2’−ジイル]ビス(ジフェニルホスフィン)、1,2−ビス(t−ブチルメチルホスフィノ)エタン、2,4−ビス−(ジフェニルホスフィノ)ペンタン等が挙げられる。 Specific examples thereof include 2,2′-bis- (di-p-tolylphosphino) -1,1′-binaphthyl (Tol-BINAP), 2,2′-bis [bis (3,5-dimethylphenyl) Phosphino] -1,1′-binaphthyl (Xylyl-BINAP), 1- [1 ′, 2-bis (diphenylphosphino) ferrocenyl] ethyldiamine, 2,2′-bis- (dicyclohexylphosphino) -6,6 '-Dimethyl-1,1'-biphenyl, 2,3-bis- (diphenylphosphino) butane, 1-cyclohexyl-1,2-bis- (diphenylphosphino) ethane, 1-substituted-3,4-bis -(Diphenylphosphino) pyrrolidine, 2,3-O-isopropylidene-2,3-dihydroxy-1,4-bis- (diphenylphosphino) butane, 1,2-bis [ O-methoxyphenyl) phenylphosphino] ethane, substituted-1,2-bis (phosphorano) benzene, 5,6-bis- (diphenylphosphino) -2-norbornene, N, N′-bis- (diphenylphosphino) ) -N, N′-bis (1-phenylethyl) ethylenediamine, 1,2-bis- (diphenylphosphino) propane, 2,4-bis- (diphenylphosphino) pentane, [(5,6), ( 5 ′, 6 ′)-bis (methylenedioxy) biphenyl-2,2′-diyl] bis (diphenylphosphine), 1,2-bis (t-butylmethylphosphino) ethane, 2,4-bis- ( And diphenylphosphino) pentane.
ホスフィン配位子(Px)の多くは、公知物質であり、公知の方法により製造・入手することができる。また、市販されているものをそのままで、あるいは所望により精製して用いることもできる。 Many of the phosphine ligands (Px) are known substances and can be produced and obtained by known methods. Moreover, what is marketed can be used as it is or after purification if desired.
(2)ジアミン配位子(A)
Aは、下記に示す式(1)又は式(2)で表されるジアミン配位子を表す。
(2) Diamine ligand (A)
A represents a diamine ligand represented by the following formula (1) or (2).
式(1)及び(2)中、R1は置換基を有してもよいC1〜C20アルキル基、置換基を有してもよいC2〜C20アルケニル基、置換基を有してもよいC3〜C8シクロアルキル基、置換基を有してもよいC7〜C20アラルキル基、置換基を有してもよいアリール基、又は置換基を有してもよいヘテロ環基を表す。 In the formulas (1) and (2), R 1 may have a C1-C20 alkyl group which may have a substituent, a C2-C20 alkenyl group which may have a substituent, or C3 which may have a substituent. -C8 cycloalkyl group, the C7-C20 aralkyl group which may have a substituent, the aryl group which may have a substituent, or the heterocyclic group which may have a substituent is represented.
C1〜C20アルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基、ペンチル基、ヘキシル基等を挙げることができ、好ましくはC1〜C6のアルキル基である。
C2〜C20アルケニル基としては、エテニル基、n−プロペニル基、イソプロペニル基、n−ブテニル基、sec−ブテニル基、t−ブテニル基、ペンテニル基、ヘキセニル基等を挙げることができ、好ましくはC2〜C6のアルケニル基である。
C3〜C8シクロアルキル基としては、シクロプロピル基、シクロペンチル基、シクロヘキシル基等を挙げることができる。
C7〜C20アラルキル基としては、ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基、α−エチルベンジル基、フェネチル基等を挙げることができる。
アリール基としては、フェニル基、1−ナフチル基、2−ナフチル基等を挙げることができる。
Examples of the C1-C20 alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a t-butyl group, a pentyl group, and a hexyl group. Preferably, it is a C1-C6 alkyl group.
Examples of the C2-C20 alkenyl group include ethenyl group, n-propenyl group, isopropenyl group, n-butenyl group, sec-butenyl group, t-butenyl group, pentenyl group, hexenyl group, and preferably C2. A C6 alkenyl group.
Examples of the C3 to C8 cycloalkyl group include a cyclopropyl group, a cyclopentyl group, and a cyclohexyl group.
Examples of the C7 to C20 aralkyl group include benzyl group, α-methylbenzyl group, α, α-dimethylbenzyl group, α-ethylbenzyl group, phenethyl group and the like.
Examples of the aryl group include a phenyl group, a 1-naphthyl group, and a 2-naphthyl group.
ヘテロ環基としては、テトラヒドロフラン−2−イル基、テトラヒドロフラン−3−イル基、2−フラニル基、3−フラニル基、1,3−オキサゾリン−2−イル基、1,3−オキサゾリン−4−イル基、1,3−オキサゾリン−5−イル基、テトラヒドロチオフェン−2−イル基、テトラヒドロチオフェン−3−イル基、2−チエニル基、3−チエニル基、1,3−チアゾリン−2−イル基、1,3−チアゾリン−4−イル基、1,3−チアゾリン−5−イル基、イミダゾール−2−イル基、イミダゾール−4−イル基、2−ピリジル基、3−ピリジル基、4−ピリジル基、インドール−1−イル基、インドール−2−イル基、インドール−3−イル基、インドール−4−イル基、インドール−5−イル基等を挙げることができる。 As the heterocyclic group, tetrahydrofuran-2-yl group, tetrahydrofuran-3-yl group, 2-furanyl group, 3-furanyl group, 1,3-oxazolin-2-yl group, 1,3-oxazolin-4-yl Group, 1,3-oxazolin-5-yl group, tetrahydrothiophen-2-yl group, tetrahydrothiophen-3-yl group, 2-thienyl group, 3-thienyl group, 1,3-thiazolin-2-yl group, 1,3-thiazoline-4-yl group, 1,3-thiazoline-5-yl group, imidazol-2-yl group, imidazol-4-yl group, 2-pyridyl group, 3-pyridyl group, 4-pyridyl group , Indol-1-yl group, indol-2-yl group, indol-3-yl group, indol-4-yl group, indol-5-yl group and the like.
前記C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C7〜C20アラルキル基、アリール基及びヘテロ環基の置換基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、t−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、n−ドデシル基等のC1〜C20アルキル基;ビニル基、n−プロペニル基、イソプロペニル基、n−ブテニル基、sec−ブテニル基、t−ブテニル基、1,3−ブタジエニル基、n−ペンテニル基、2−ペンテニル基、3−ペンテニル基、ヘキセニル基等のC2〜C20アルケニル基;シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等のC3〜C8シクロアルキル基;ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基、α−エチルベンジル基等のC7〜C20アラルキル基;フェニル基、1−ナフチル基、2−ナフチル基等のアリール基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基等のC1〜C20アルコキシ基;アシル基;アシルオキシ基;ヘテロ環基;等が挙げられる。 Examples of the substituent for the C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C7-C20 aralkyl group, aryl group and heterocyclic group include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. A halogen atom of: methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n -C1-C20 alkyl group such as hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-dodecyl group; vinyl group, n-propenyl group, isopropenyl group, n- Butenyl group, sec-butenyl group, t-butenyl group, 1,3-butadienyl group, n-pentenyl group, 2-pentenyl group, 3-pentenyl group, C2-C20 alkenyl group such as xenyl group; C3-C8 cycloalkyl group such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group; benzyl group, α-methylbenzyl group, α, α-dimethylbenzyl group, α- C7-C20 aralkyl groups such as ethylbenzyl group; aryl groups such as phenyl group, 1-naphthyl group, 2-naphthyl group; methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec- C1-C20 alkoxy groups such as butoxy group and t-butoxy group; acyl group; acyloxy group; heterocyclic group;
アシル基としては、アセチル基、プロピオニル基、イソプロピルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基等が挙げられる。
アシルオキシ基としては、アセトキシ基、プロピオニルオキシ基、イソプロピルカルボニルオキシ基等のC1〜C12のアルキルカルボニルオキシ基;
ベンゾイルオキシ基等のアリールカルボニルオキシ基;フェニルメチルカルボニルオキシ基等のアラルキルカルボニルオキシ基;等が挙げられる。
ヘテロ環基としては、フラニル基、ピラニル基、ジオキソラニル基等の含酸素ヘテロ環基;チエニル基等の含イオウヘテロ環基;ピロリル基、イミダゾリル基、ピラゾリル基、オキサゾリル基、イソオキサゾリル基、トリアゾリル基、チアゾリル基、イソチアゾリル基、ピリジル基、ピラダジル基、ピラジニル基、ベンゾイミダゾリル基、ベンゾピラゾリル基、ペンゾチアゾリル基、キノリル基、アントラニル基、インドリル基、フェナントロニリル基等の飽和若しくは不飽和の含窒素ヘテロ環基;等が挙げられる。
これらの置換基は、その置換位置、置換基の種類、置換基の数等に特に制限はない。
Examples of the acyl group include an acetyl group, a propionyl group, an isopropylcarbonyl group, a benzoyl group, and a phenylmethylcarbonyl group.
Examples of the acyloxy group include C1-C12 alkylcarbonyloxy groups such as an acetoxy group, a propionyloxy group, and an isopropylcarbonyloxy group;
Arylcarbonyloxy groups such as benzoyloxy group; aralkylcarbonyloxy groups such as phenylmethylcarbonyloxy group; and the like.
Heterocyclic groups include oxygen-containing heterocyclic groups such as furanyl group, pyranyl group, dioxolanyl group; sulfur-containing heterocyclic groups such as thienyl group; pyrrolyl group, imidazolyl group, pyrazolyl group, oxazolyl group, isoxazolyl group, triazolyl group, thiazolyl group Group, isothiazolyl group, pyridyl group, pyradadyl group, pyrazinyl group, benzoimidazolyl group, benzopyrazolyl group, benzozothiazolyl group, quinolyl group, anthranyl group, indolyl group, phenantronylyl group, etc. And the like.
These substituents are not particularly limited in the position of substitution, the type of substituent, the number of substituents, and the like.
R2及びR3は、それぞれ独立して水素原子、置換基を有してもよいC1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、又はC7〜C20アラルキル基を表す。ただし、R2とR3が同時に水素原子である場合は除かれる。
C1〜C20アルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、ペンチル基又はその異性体、ヘキシル基又はその異性体等を挙げることができ、好ましくはC1〜C6のアルキル基である。
C2〜C20アルケニル基としては、エテニル基、n−プロペニル基、イソプロペニル基、n−ブテニル基、sec−ブテニル基、t−ブテニル基、ペンテニル基、ヘキセニル基等を挙げることができ、好ましくはC2〜C6のアルケニル基である。
C3〜C8シクロアルキル基としては、シクロプロピル基、シクロペンチル基、シクロヘキシル基等を挙げることができる。
C7〜C20アラルキル基としては、ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基、α−エチルベンジル基等を挙げることができる。
R 2 and R 3 each independently represent a hydrogen atom, an optionally substituted C1-C20 alkyl group, a C2-C20 alkenyl group, a C3-C8 cycloalkyl group, or a C7-C20 aralkyl group. However, the case where R 2 and R 3 are hydrogen atoms at the same time is excluded.
As C1-C20 alkyl group, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, t-butyl group, pentyl group or its isomer, hexyl group or its isomer Etc., preferably a C1-C6 alkyl group.
Examples of the C2-C20 alkenyl group include ethenyl group, n-propenyl group, isopropenyl group, n-butenyl group, sec-butenyl group, t-butenyl group, pentenyl group, hexenyl group, and preferably C2. A C6 alkenyl group.
Examples of the C3 to C8 cycloalkyl group include a cyclopropyl group, a cyclopentyl group, and a cyclohexyl group.
Examples of the C7 to C20 aralkyl group include benzyl group, α-methylbenzyl group, α, α-dimethylbenzyl group, α-ethylbenzyl group and the like.
前記C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C7〜C20アラルキル基の置換基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、t−ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基等のC1〜C20アルキル基;ビニル基、n−プロペニル基、イソプロペニル基、n−ブテニル基、sec−ブテニル基、t−ブテニル基、1,3−ブタジエニル基、n−ペンテニル基、2−ペンテニル基、3−ペンテニル基、ヘキセニル基等のC2〜C20アルケニル基;シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等のC3〜C8シクロアルキル基;ベンジル基、α−メチルベンジル基、α,α−ジメチルベンジル基、α−エチルベンジル基等のC7〜C20アラルキル基;フェニル基、1−ナフチル基、2−ナフチル基等のアリール基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基等のC1〜C20アルコキシ基;アシルオキシ基;又はヘテロ環基;等が挙げられる。 Examples of the substituent for the C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C7-C20 aralkyl group include halogen atoms such as fluorine atom, chlorine atom, bromine atom, iodine atom; Ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, hexyl group, heptyl group, octyl group C1-C20 alkyl groups such as nonyl group, decyl group, dodecyl group; vinyl group, n-propenyl group, isopropenyl group, n-butenyl group, sec-butenyl group, t-butenyl group, 1,3-butadienyl group A C2-C20 alkenyl group such as n-pentenyl group, 2-pentenyl group, 3-pentenyl group, hexenyl group; A C3-C8 cycloalkyl group such as a pill group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group; a C7-C20 aralkyl group such as a benzyl group, an α-methylbenzyl group, an α, α-dimethylbenzyl group, an α-ethylbenzyl group; Aryl groups such as phenyl group, 1-naphthyl group, 2-naphthyl group; C1-C1 such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, etc. C20 alkoxy group; acyloxy group; or heterocyclic group; and the like.
アシルオキシ基としては、アセトキシ基、エチルカルボニルオキシ基、イソプロピルカルボニルオキシ基等のC1〜C12のアルキルカルボニルオキシ基;ベンゾイルオキシ基等のアリールカルボニルオキシ基;フェニルメチルカルボニルオキシ基等のアラルキルカルボニルオキシ基;等が挙げられる。
ヘテロ環基としては、フラニル基、ピラニル基、ジオキソラニル基等の含酸素ヘテロ環基;チエニル基等の含イオウヘテロ環基;ピロリル基、イミダゾリル基、ピラゾリル基、オキサゾリル基、イソオキサゾリル基、トリアゾリル基、チアゾリル基、イソチアゾリル基、ピリジル基、ピラダジル基、ピラジニル基、ベンゾイミダゾリル基、ベンゾピラゾリル基、ペンゾチアゾリル基、キノリル基、アントラニル基、インドリル基、フェナントロニリル基等の飽和若しくは不飽和の含窒素ヘテロ環基;等が挙げられる。
これらの置換基は、その置換位置、置換基の種類、置換基の数等に特に制限はない。
また、R 2 とR 3 は一緒になって結合して環を形成してもよい。
Examples of the acyloxy group include C1-C12 alkylcarbonyloxy groups such as acetoxy group, ethylcarbonyloxy group, isopropylcarbonyloxy group; arylcarbonyloxy groups such as benzoyloxy group; aralkylcarbonyloxy groups such as phenylmethylcarbonyloxy group; Etc.
Heterocyclic groups include oxygen-containing heterocyclic groups such as furanyl group, pyranyl group, dioxolanyl group; sulfur-containing heterocyclic groups such as thienyl group; pyrrolyl group, imidazolyl group, pyrazolyl group, oxazolyl group, isoxazolyl group, triazolyl group, thiazolyl group Group, isothiazolyl group, pyridyl group, pyradadyl group, pyrazinyl group, benzoimidazolyl group, benzopyrazolyl group, benzozothiazolyl group, quinolyl group, anthranyl group, indolyl group, phenantronylyl group, etc. And the like.
These substituents are not particularly limited in the position of substitution, the type of substituent, the number of substituents, and the like.
R 2 and R 3 may be bonded together to form a ring.
前記式(1)及び式(2)で表されるジアミン配位子Aの具体例を第1表及び第2表に示すが、これらに限定されるものではない。
第1表及び第2表中、略号は次の意味で用いている。
n−:ノルマル、i−:イソ、t−:ターシャリー、c−Pr:シクロプロピル、c−Pen:シクロペンチル、c−Hex:シクロヘキシル、Ph:フェニル、Fu:フリル、Py:ピリジル、
Although the specific example of the diamine ligand A represented by the said Formula (1) and Formula (2) is shown to a 1st table | surface and a 2nd table | surface, it is not limited to these.
In Tables 1 and 2, the abbreviations have the following meanings.
n-: normal, i-: iso, t-: tertiary, c-Pr: cyclopropyl, c-Pen: cyclopentyl, c-Hex: cyclohexyl, Ph: phenyl, Fu: furyl, Py: pyridyl,
本発明に用いるジアミン配位子(A)としては、安定してルテニウム化合物を形成し得るものであれば、特に限定されるものではないが、優れた不斉水素化触媒活性を有するルテニウム化合物を得る観点から、光学活性ジアミン配位子であるのが好ましい。本発明に用いるジアミン配位子(A)は、原則として分子内に不斉炭素原子を一つしか有さないので、光学活性なジアミン配位子を合成するのが比較的容易である。 The diamine ligand (A) used in the present invention is not particularly limited as long as it can stably form a ruthenium compound, but a ruthenium compound having excellent asymmetric hydrogenation catalytic activity is used. From the viewpoint of obtaining, it is preferably an optically active diamine ligand. Since the diamine ligand (A) used in the present invention has only one asymmetric carbon atom in the molecule in principle, it is relatively easy to synthesize an optically active diamine ligand.
前記式(1)又は(2)で表されるジアミン配位子(A)の多くは、公知物質であり、公知の方法により製造し、入手することができる。製造方法の一例を下記に示す。(製造ルート1)によれば、前記式(1)において、種々の置換基R1を有するジアミン配位子(1−1)を得ることができる。(製造ルート2)によれば、前記式(2)において、種々の置換基R1を有するジアミン配位子(2−1)を得ることができる。また、(製造ルート3)によれば、前記式(1)において、種々の置換基R2、R3を有するジアミン配位子(1−2)を得ることができる。
下記に示す(製造ルート1)において、出発原料となるアミノアルコール(a)は、入手容易なα−アミノ酸から公知の方法により誘導することができる。
Many of the diamine ligands (A) represented by the formula (1) or (2) are known substances, and can be produced and obtained by known methods. An example of the manufacturing method is shown below. According to (Production route 1), in formula (1), diamine ligands (1-1) having various substituents R 1 can be obtained. According to (Production route 2), in formula (2), a diamine ligand (2-1) having various substituents R 1 can be obtained. Moreover, according to (Production route 3), the diamine ligand (1-2) having various substituents R 2 and R 3 in the formula (1) can be obtained.
In the following (Production Route 1), the amino alcohol (a) as a starting material can be derived from a readily available α-amino acid by a known method.
(式中、R1、R2は前記と同じ意味を表し、Bocはt−ブトキシカルボニル基を表し、Msはトリフルオロメタンスルホニル基を表し、Meはメチル基を表す。また、*は光学活性炭素原子を表す。) (Wherein R 1 and R 2 represent the same meaning as described above, Boc represents a t-butoxycarbonyl group, Ms represents a trifluoromethanesulfonyl group, Me represents a methyl group, and * represents an optically active carbon. Represents an atom.)
本発明のルテニウム化合物は、0価、1価、2価、3価及び、さらに高原子価のルテニウム単体又はルテニウム化合物に、ホスフィン配位子(Px)及びジアミン配位子(A)を反応させることで製造することができる。なかでも、Angew.Chem.Int.Ed.,37,1703(1998)に記載の2価ルテニウム錯体を用いる方法が簡便である。すなわち、2価のルテニウム−ハライド錯体と2座ホスフィン配位子の溶媒溶液を加熱後、ジアミン化合物を加えることで製造することができる。 In the ruthenium compound of the present invention, a phosphine ligand (Px) and a diamine ligand (A) are reacted with zero-valent, monovalent, divalent, trivalent, and higher-valent ruthenium simple substance or ruthenium compound. Can be manufactured. Among them, Angew. Chem. Int. Ed. 37, 1703 (1998), a method using a divalent ruthenium complex is simple. That is, it can be manufactured by adding a diamine compound after heating a solvent solution of a divalent ruthenium-halide complex and a bidentate phosphine ligand.
以下、出発原料として2価のルテニウム−ハライド錯体を用いた場合のルテニウム化合物の製造方法についてより詳細に説明する。
まず、出発原料の2価のルテニウム−ハライド錯体とホスフィン配位子(Px)とを、溶媒中、加熱し反応させ、対応するホスフィン−ルテニウム−ハライド錯体を得る。
Hereinafter, a method for producing a ruthenium compound when a divalent ruthenium-halide complex is used as a starting material will be described in more detail.
First, a divalent ruthenium-halide complex as a starting material and a phosphine ligand (Px) are reacted by heating in a solvent to obtain a corresponding phosphine-ruthenium-halide complex.
出発原料の2価のルテニウム−ハライド錯体としては、ホスフィン配位子(Px)及びジアミン配位子(A)と置換可能な配位子を有するルテニウム錯体であれば、特に制限されるものではない。 The divalent ruthenium-halide complex of the starting material is not particularly limited as long as it is a ruthenium complex having a ligand that can be substituted with the phosphine ligand (Px) and the diamine ligand (A). .
その具体例としては、[2塩化ルテニウム(ノルボルナジエン)]多核体、[2塩化ルテニウム(シクロオクタジエン)]多核体、[ビス(メチルアリル)ルテニウム(シクロオクタジエン)]等のジエンが配位したハロゲン化ルテニウム化合物;[2塩化ルテニウム(ベンゼン)]二核体、[2塩化ルテニウム(p−シメン)]二核体、[2塩化ルテニウム(トリメチルベンゼン)]二核体、[2塩化ルテニウム(ヘキサメチルベンゼン)]二核体等の芳香族化合物が配位したハロゲン化ルテニウム;等が挙げられる。 Specific examples include [ruthenium dichloride (norbornadiene)] polynuclear, [ruthenium dichloride (cyclooctadiene)] polynuclear, halogens coordinated with dienes such as [bis (methylallyl) ruthenium (cyclooctadiene)]. Ruthenium fluoride compounds; [ruthenium dichloride (benzene)] dinuclear, [ruthenium dichloride (p-cymene)] dinuclear, [ruthenium dichloride (trimethylbenzene)] dinuclear, [ruthenium dichloride (hexamethyl) Benzene)] ruthenium halides coordinated with an aromatic compound such as a dinuclear compound.
ホスフィン配位子(Px)の使用量は、ルテニウム−ハライド錯体1モルに対して、Pxが単座配位子の場合は、通常2〜3倍モル、好ましくは2倍モルであり、2座配位子の場合は、通常1〜2倍モル、好ましくは等モルである。 The amount of the phosphine ligand (Px) used is usually 2 to 3 moles, preferably 2 moles when Px is a monodentate ligand with respect to 1 mole of ruthenium-halide complex. In the case of a ligand, it is usually 1 to 2 moles, preferably equimolar.
この反応に用いる溶媒としては、例えば、ベンゼン、トルエン、キシレン等の芳香族炭化水素類;ペンタン、ヘキサン等の脂肪族炭化水素類;ジクロロメタン、クロロホルム、トリクロロメタン、四塩化炭素、1,2−ジクロロエタン等のハロゲン炭化水素類;ジエチルエーテル、テトラヒドロフラン(THF)、1,2−ジメトキシエタン、1,4−ジオキサン等のエーテル類;メタノール、エタノール、n−プロパノール、イソプロパノール、ブタノール、ベンジルアルコール等のアルコール類;N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセタミド、1,3−ジメチルイミダゾリジン、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン、ヘキサメチルリン酸トリアミド(HMPT)等のアミド類;アセトニトリル、ベンゾニトリル等のニトリル類;ジメチルスルホキシド(DMSO)等が挙げられる。これらの溶媒は単独で、あるいは2種以上を混合して使用することができる。 Examples of the solvent used in this reaction include aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as pentane and hexane; dichloromethane, chloroform, trichloromethane, carbon tetrachloride, and 1,2-dichloroethane. Halogen ethers such as diethyl ether, tetrahydrofuran (THF), ethers such as 1,2-dimethoxyethane and 1,4-dioxane; alcohols such as methanol, ethanol, n-propanol, isopropanol, butanol and benzyl alcohol N, N-dimethylformamide (DMF), N, N-dimethylacetamide, 1,3-dimethylimidazolidine, 1,3-dimethyl-2-imidazolidinone, N-methylpyrrolidone, hexamethylphosphoric triamide Amides such as (HMPT); Acetonitrile, nitriles such as benzonitrile; dimethyl sulfoxide (DMSO) and the like. These solvents can be used alone or in admixture of two or more.
溶媒の使用量は、基質1gに対して、通常、1ml〜100ml、好ましくは、1ml〜10mlの範囲である。反応温度は、通常、0〜200℃、好ましくは、室温〜100℃の範囲である。 The amount of the solvent used is usually in the range of 1 ml to 100 ml, preferably 1 ml to 10 ml, with respect to 1 g of the substrate. The reaction temperature is usually in the range of 0 to 200 ° C, preferably room temperature to 100 ° C.
次に、得られたホスフィン−ルテニウム−ハライド錯体とジアミン化合物(A)とを反応させて、対応するアミン−ホスフィン−ルテニウム−ハライド錯体を得ることができる。
この反応に用いるジアミン化合物(A)の使用量は、ホスフィン−ルテニウム−ハライド錯体に対して、通常1〜2倍モル、好ましくは等モルである。
反応温度は、通常、−100〜+200℃、好ましくは−10〜+50℃の範囲である。
Next, the obtained phosphine-ruthenium-halide complex is reacted with the diamine compound (A) to obtain a corresponding amine-phosphine-ruthenium-halide complex.
The usage-amount of the diamine compound (A) used for this reaction is 1-2 times mole normally with respect to a phosphine-ruthenium-halide complex, Preferably it is equimolar.
The reaction temperature is usually in the range of −100 to + 200 ° C., preferably −10 to + 50 ° C.
また、あらかじめ単離したホスフィン−ルテニウム−ハライド錯体に、前記と同様の条件下にジアミン化合物(A)を作用させることによっても、アミン−ホスフィン−ルテニウム−ハライド錯体を得ることができる。 An amine-phosphine-ruthenium-halide complex can also be obtained by allowing a diamine compound (A) to act on a phosphine-ruthenium-halide complex isolated in advance under the same conditions as described above.
次いで、得られたアミン−ホスフィン−ルテニウム−ハライド錯体を、溶媒中、塩基と反応させることによって、式(I)で表される化合物のうち、X=Y=H である アミン−ホスフィン−ルテニウムヒドリド錯体を得ることができる。 Next, by reacting the obtained amine-phosphine-ruthenium-halide complex with a base in a solvent, among the compounds represented by the formula (I), X = Y = H 2 amine-phosphine-ruthenium hydride A complex can be obtained.
用いる塩基としては、例えば、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、1,4−ジアザビシクロ[2,2,2]オクタン(DABCO)、1,4−ジアザビシクロ[5,4,0]ウンデ−7−エン(DBU)等の有機塩基;ナトリウムメトキシド、ナトリウムエトキシド、カリウム t−ブトキシド、マグネシウムエトキシド等の金属アルコキシド類;n−ブチルリチウム、リチウムジイソプロピルアミド(LDA)等の有機リチウム化合物;水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物;炭酸カリウム、炭酸ナトリウム等の炭酸塩;水素化ナトリウム等の金属水素化物;等が挙げられる。 Examples of the base used include triethylamine, diisopropylethylamine, pyridine, 1,4-diazabicyclo [2,2,2] octane (DABCO), 1,4-diazabicyclo [5,4,0] unde-7-ene (DBU). Organic bases such as sodium methoxide, sodium ethoxide, potassium t-butoxide, magnesium ethoxide; organolithium compounds such as n-butyllithium and lithium diisopropylamide (LDA); sodium hydroxide, water Alkali metal hydroxides such as potassium oxide; carbonates such as potassium carbonate and sodium carbonate; metal hydrides such as sodium hydride;
塩基の使用量は、アミン−ホスフィン−ルテニウム−ハライド錯体に対して、通常、2〜10,000倍モル、好ましくは、2〜40倍モルの範囲である。
この反応に用いる溶媒としては、例えば、ベンゼン、トルエン、キシレン等の芳香族炭化水素類;ペンタン、ヘキサン等の脂肪族炭化水素類;ジクロロメタン、クロロホルム、トリクロロメタン、四塩化炭素、1,2−ジクロロエタン等のハロゲン炭化水素類;ジエチルエーテル、THF、1,2−ジメトキシエタン、1,4−ジオキサン等のエーテル類;メタノール、エタノール、n−プロパノール、イソプロパノール、ブタノール、ベンジルアルコール等のアルコール類;アセトニトリル、ベンゾニトリル等のニトリル類;DMF、N,N−ジメチルアセタミド、1,3−ジメチルイミダゾリジン、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等のアミド類;DMSO等が挙げられる。これらの溶媒は単独で、あるいは2種以上を混合して使用することができる。
The amount of the base used is usually in the range of 2 to 10,000 times mol, preferably 2 to 40 times mol, of the amine-phosphine-ruthenium-halide complex.
Examples of the solvent used in this reaction include aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as pentane and hexane; dichloromethane, chloroform, trichloromethane, carbon tetrachloride, and 1,2-dichloroethane. Halogen ethers such as diethyl ether, THF, 1,2-dimethoxyethane, 1,4-dioxane, etc .; alcohols such as methanol, ethanol, n-propanol, isopropanol, butanol, benzyl alcohol; acetonitrile, Nitriles such as benzonitrile; Amides such as DMF, N, N-dimethylacetamide, 1,3-dimethylimidazolidine, 1,3-dimethyl-2-imidazolidinone, N-methylpyrrolidone; Can be mentioned. These solvents can be used alone or in admixture of two or more.
溶媒の使用量は、アミン−ホスフィン−ルテニウム−ハライド錯体1gに対して、1ml〜10L、好ましくは1ml〜1Lの範囲である。また、反応温度は、通常、−100〜+200℃、好ましくは、−10〜+50℃の範囲である。 The usage-amount of a solvent is 1 ml-10L with respect to 1g of amine-phosphine-ruthenium-halide complexes, Preferably it is the range of 1 ml-1L. The reaction temperature is usually in the range of −100 to + 200 ° C., preferably −10 to + 50 ° C.
前記式(I)中、X及び/又はYがカルボキシル基、水酸基、アルコキシ基であるルテニウム化合物は、上記の方法等で得られるアミン−ホスフィン−ルテニウム−ハライド錯体にRCOONaやRONa(Rはアルキル基を表す。)等を反応させて得ることができる。 In the formula (I), a ruthenium compound in which X and / or Y is a carboxyl group, a hydroxyl group, or an alkoxy group is an amine-phosphine-ruthenium-halide complex obtained by the above method or the like, and RCOONa or RONa (R is an alkyl group). It can be obtained by reacting.
以上のようにして得られる本発明のルテニウム化合物は、以下に述べるように、水素ガス等の安価な水素源を用いて、カルボニル化合物から対応する光学活性アルコール化合物を高選択的、高収率で製造できる不斉水素化触媒として有用である。 As described below, the ruthenium compound of the present invention obtained as described above can be obtained with high selectivity and high yield of the corresponding optically active alcohol compound from the carbonyl compound using an inexpensive hydrogen source such as hydrogen gas. It is useful as an asymmetric hydrogenation catalyst that can be produced.
2)光学活性アルコール化合物の製造方法
本発明の光学活性アルコール化合物の製造方法は、本発明のルテニウム化合物の存在下、カルボニル化合物を水素化することを特徴とする。
本発明の光学活性アルコール化合物の製造方法は、基質となるカルボニル化合物を、前記式(I)で表されるルテニウム化合物の存在下に、所望により塩基を添加して、所定圧力の水素ガス又は水素供与体の存在下に不斉水素化することにより行う。
2) Method for Producing Optically Active Alcohol Compound The method for producing an optically active alcohol compound of the present invention is characterized by hydrogenating a carbonyl compound in the presence of the ruthenium compound of the present invention.
In the method for producing an optically active alcohol compound of the present invention, a base is optionally added to a carbonyl compound serving as a substrate in the presence of the ruthenium compound represented by the formula (I), and hydrogen gas or hydrogen at a predetermined pressure is added. It is carried out by asymmetric hydrogenation in the presence of a donor.
本発明においては、(i)ルテニウム錯体(又はルテニウム塩)、リン化合物及びジアミン化合物とを別々に反応系に添加、又は(ii)ホスフィン配位子を有するルテニウム錯体(又はルテニウム塩)及びジアミン化合物とを別々に反応系に添加して、必要に応じて塩基を添加してルテニウム化合物を生成させた後、該ルテニウム化合物を反応系から取り出すことなく、そこへ基質を添加することにより、in situで不斉水素化反応を行わせることもできる。 In the present invention, (i) a ruthenium complex (or ruthenium salt), a phosphorus compound and a diamine compound are separately added to the reaction system, or (ii) a ruthenium complex (or ruthenium salt) having a phosphine ligand and a diamine compound Are separately added to the reaction system, a base is added as necessary to form a ruthenium compound, and then the substrate is added in situ without removing the ruthenium compound from the reaction system. An asymmetric hydrogenation reaction can also be performed.
ルテニウムの配位子として、光学活性なホスフィン配位子(Px)と光学活性なジアミン配位子(A)とを用いる場合、どのような絶対配置を有するホスフィン配位子(Px)とジアミン配位子(A)とを組み合わせて用いるかによって、得られるルテニウム化合物の不斉水素化触媒活性(得られる光学活性アルコールの立体選択性、反応収率等)が異なることがある。また、ジアミン配位子(A)の窒素原子の置換基の種類によっても、得られるルテニウム化合物の不斉水素化触媒活性が異なることがある。従って、本発明のルテニウム化合物を調製するに際しては、目的とする光学活性アルコールの種類等に応じて、ホスフィン配位子(Px)とジアミン配位子(A)とを適宜選定し、組み合わせて用いる必要がある。 When an optically active phosphine ligand (Px) and an optically active diamine ligand (A) are used as the ruthenium ligand, the phosphine ligand (Px) having any absolute configuration and the diamine configuration Depending on whether the ligand (A) is used in combination, the asymmetric hydrogenation catalytic activity of the obtained ruthenium compound (stereoselectivity of the resulting optically active alcohol, reaction yield, etc.) may differ. In addition, the asymmetric hydrogenation catalytic activity of the obtained ruthenium compound may differ depending on the type of substituent of the nitrogen atom of the diamine ligand (A). Therefore, when preparing the ruthenium compound of the present invention, the phosphine ligand (Px) and the diamine ligand (A) are appropriately selected and used in combination according to the type of the target optically active alcohol. There is a need.
触媒として使用する前記式(I)で表されるルテニウム化合物の使用量は、反応容器の大きさや触媒活性によって異なるが、反応基質である縮合カルボニル化合物又はα−ジアミノカルボニル化合物に対して、通常1/50〜1/2,000,000倍モル、好ましくは1/500〜1/500,000倍モルの範囲である。 The amount of the ruthenium compound represented by the formula (I) used as the catalyst varies depending on the size of the reaction vessel and the catalytic activity, but is usually 1 with respect to the condensed carbonyl compound or α-diaminocarbonyl compound as the reaction substrate. / 50 to 1 / 2,000,000 times mole, preferably 1/500 to 1 / 500,000 times mole.
用いる塩基としては、例えば、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、DABCO、DBU等の有機塩基;ナトリウムメトキシド、ナトリウムエトキシド、カリウム t−ブトキシド、マグネシウムメトキシド、マグネシウムエトキシド等の金属アルコキシド類;n−ブチルリチウム等の有機リチウム化合物;LDA、リチウムビストリメチルシリルアミド等のリチウムアミド類;水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物;水酸化マグネシウム、水酸化カルシウム等のアルカリ土類金属水酸化物;炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩;炭酸水素ナトリウム、炭酸水素カリウム等のアルカリ金属炭酸水素塩;炭酸マグネシウム、炭酸カルシウム等のアルカリ土類金属炭酸塩;水素化ナトリウム、水素化カルシウム等の金属水素化物;が挙げられる。 Examples of the base used include organic bases such as triethylamine, diisopropylethylamine, pyridine, DABCO and DBU; metal alkoxides such as sodium methoxide, sodium ethoxide, potassium t-butoxide, magnesium methoxide and magnesium ethoxide; n- Organic lithium compounds such as butyl lithium; lithium amides such as LDA and lithium bistrimethylsilylamide; alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide; alkaline earth such as magnesium hydroxide and calcium hydroxide Alkali metal carbonates such as sodium carbonate and potassium carbonate; Alkali metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate; Alkaline earth metals such as magnesium carbonate and calcium carbonate Genus carbonate; sodium hydride, metal hydrides such as calcium hydride; and the like.
塩基の添加量は、ルテニウム化合物に対し、通常2〜500,000倍モル、好ましくは、2〜5,000倍モルの範囲である。 The addition amount of the base is usually in the range of 2 to 500,000 times mol, preferably 2 to 5,000 times mol of the ruthenium compound.
本発明は、適当な溶媒中で行なうことができる。用いる溶媒としては、基質及び触媒を可溶化するものであれば特に制限ない。その具体例としては、メタノール、エタノール、n−プロパノール、イソプロパノール、ブタノール、ベンジルアルコール等のアルコール類;ベンゼン、トルエン、キシレン等の芳香族炭化水素類;ペンタン、ヘキサン等の脂肪族炭化水素類;ジクロロメタン、クロロホルム、トリクロロメタン、四塩化炭素、1,2−ジクロロエタン等のハロゲン炭化水素類;ジエチルエーテル、THF、1,2−ジメトキシエタン、1,4−ジオキサン等のエーテル類;DMF、N,N−ジメチルアセタミド、1,3−ジメチルイミダゾリジン、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン、HMPT等のアミド類;アセトニトリル、ベンゾニトリル等のニトリル類;DMSO等を用いることができる。これらの溶媒は単独で、あるいは2種以上を混合して使用することができる。これらの溶媒の中でも、反応生成物がアルコール化合物であることから、アルコール類の使用が好ましい。 The present invention can be carried out in a suitable solvent. The solvent to be used is not particularly limited as long as it can solubilize the substrate and the catalyst. Specific examples thereof include alcohols such as methanol, ethanol, n-propanol, isopropanol, butanol and benzyl alcohol; aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as pentane and hexane; dichloromethane Halogen ethers such as chloroform, trichloromethane, carbon tetrachloride, 1,2-dichloroethane; ethers such as diethyl ether, THF, 1,2-dimethoxyethane, 1,4-dioxane; DMF, N, N— Use amides such as dimethylacetamide, 1,3-dimethylimidazolidine, 1,3-dimethyl-2-imidazolidinone, N-methylpyrrolidone and HMPT; nitriles such as acetonitrile and benzonitrile; use DMSO and the like Can do. These solvents can be used alone or in admixture of two or more. Among these solvents, the use of alcohols is preferred because the reaction product is an alcohol compound.
溶媒の使用量は、カルボニル化合物の溶解度及び経済性に依存し、場合によっては無溶媒又は高希釈条件に近い状態でも反応は進行するが、通常、該カルボニル化合物100重量部に対して0.1〜10,000重量部、好ましくは20〜1,000重量部の範囲である。 The amount of solvent used depends on the solubility and economics of the carbonyl compound, and in some cases, the reaction proceeds even without solvent or close to high dilution conditions. The range is from 10,000 to 10,000 parts by weight, preferably from 20 to 1,000 parts by weight.
水素の圧力は、通常、1〜200気圧、好ましくは3〜50気圧の範囲であり、水素供与体としては、例えば、水素貯蔵合金やジイミド等を用いることができ、その使用量は、カルボニル化合物に対して、通常、1〜100倍当量の範囲である。 The hydrogen pressure is usually in the range of 1 to 200 atm, preferably 3 to 50 atm. As the hydrogen donor, for example, a hydrogen storage alloy or diimide can be used. On the other hand, it is usually in the range of 1 to 100 times equivalent.
反応温度は、通常−50〜+100℃、好ましくは25〜40℃の温度範囲である。また、反応時間は、反応基質濃度や温度、圧力等の反応条件に依存するが、通常、数分〜数日である。反応形式としては特に制限はないが、例えば、バッチ式においても連続式においても実施することができる。 The reaction temperature is usually in the temperature range of −50 to + 100 ° C., preferably 25 to 40 ° C. Moreover, although reaction time is dependent on reaction conditions, such as a reaction substrate density | concentration, temperature, and pressure, it is normally several minutes-several days. Although there is no restriction | limiting in particular as a reaction format, For example, it can implement also in a batch type and a continuous type.
反応終了後は、通常の有機合成化学的手法により、単離・精製を行い目的物を得ることができる。
目的物の構造は、1H−NMR、旋光度測定、液体クロマトグラフィー、ガスクロマトグラフィー等の公知の分析手段によって決定することができる。
After completion of the reaction, the desired product can be obtained by isolation and purification by ordinary organic synthetic chemical techniques.
The structure of the target product can be determined by known analytical means such as 1 H-NMR, optical rotation measurement, liquid chromatography, gas chromatography and the like.
次に、実施例により本発明を詳しく説明するが、本発明はこれらに限定されるものではない。
なお、各実施例における物性の測定に用いた装置は次の通りである。
1H−NMRスペクトル:GEMINI−300(300MHz)、バリアン社製、及びJNM−GSX−400(400MHz)、日本電子社製
高速液体クロマトグラフィー:LC−10Advp、SPD−10Avp、島津製作所(株)製
ガスクロマトグラフィー:GC−17A、C−R7A Plus、島津製作所(株)製
EXAMPLES Next, although an Example demonstrates this invention in detail, this invention is not limited to these.
In addition, the apparatus used for the measurement of the physical property in each Example is as follows.
1 H-NMR spectrum: GEMINI-300 (300 MHz), manufactured by Varian, and JNM-GSX-400 (400 MHz), JEOL Ltd. high performance liquid chromatography: LC-10Advp, SPD-10Avp, manufactured by Shimadzu Corporation Gas chromatography: GC-17A, C-R7A Plus, manufactured by Shimadzu Corporation
実施例1 RuCl 2 [(S)−binap][(R)−2−ジメチルアミノ−1−フェニルエチルアミン]の合成
Org.Synth.,71,1(1993)の方法に従い、〔RuCl2 (S)−binap〕(dmf)n (binapは2,2’−ビス−(ジフェニルホスフィノ)−1,1’−ビナフチルを、dmfはジメチルホルムアミドをそれぞれ表す。以下にて同じ。)を合成した。
次いで、アルゴン置換した100mlシュレンクに、〔RuCl2 (S)−binap〕(dmf)n(0.47g,0.5mmol)、(R)−2−ジメチルアミノ−1−フェニルエチルアミン(0.1g,0.6mmol)、脱気したジメチルホルムアミド3mlを加え室温で1時間攪拌した。ジメチルホルムアミドを留去し、析出した固体をジエチルエーテルで洗浄して、目的物を定量的に得た。
31P−NMR(CDCl3,δppm)51.0,36.6(d,J=31Hz)
Example 1 Synthesis of RuCl 2 [(S) -binap] [(R) -2-dimethylamino-1-phenylethylamine] Org. Synth. , According to the method of 71, 1 (1993), [RuCl 2 (S) -binap] (dmf) n (binap is 2,2'-bis - a (diphenylphosphino) -1,1'-binaphthyl, dmf is Dimethylformamide is represented respectively, and the same applies hereinafter).
Next, argon-substituted 100 ml Schlenk was added to [RuCl 2 (S) -binap] (dmf) n (0.47 g, 0.5 mmol), (R) -2-dimethylamino-1-phenylethylamine (0.1 g, 0.6 mmol) and 3 ml of degassed dimethylformamide were added and stirred at room temperature for 1 hour. Dimethylformamide was distilled off, and the precipitated solid was washed with diethyl ether to quantitatively obtain the desired product.
31 P-NMR (CDCl 3 , δ ppm) 51.0, 36.6 (d, J = 31 Hz)
実施例2 1−(S)−フェニルエタノールの合成
1M水酸化カリウムイソプロパノール溶液0.1ml、(R)−2−ジメチルアミノ−1−フェニルエチルアミン3.5μl及びアセトフェノン0.60g(5mmol)をイソプロパノール3mlに加え、脱気した。RuCl2[(S)−tolbinap](dmf)n(tolbinapは、2,2’−ビス−(ジ−p−トリルホスフィノ)−1,1’−ビナフチルを表す。Tolbinapとも略す。以下にて同じ。)10mg(0.01mml)を加えて溶解した。次いで、全容をオートクレーブに移送し、8気圧の水素雰囲気下、室温で1時間撹拌した。反応液をガスクロマトグラフィー(移動相:ヘリウム、カラム:CP−Chiralcel−Dex CB、クロムパック(株)製)で測定したところ、転換率99%以上、光学純度91%eeであった。
Example 2 Synthesis of 1- (S) -phenylethanol 0.1 ml of 1M potassium hydroxide isopropanol solution, 3.5 μl of (R) -2-dimethylamino-1-phenylethylamine and 0.60 g (5 mmol) of acetophenone in 3 ml of isopropanol And degassed. RuCl 2 [(S) -tolbinap] (dmf) n (tolbinap represents 2,2′-bis- (di-p-tolylphosphino) -1,1′-binaphthyl, also abbreviated as Tolbinap. The same applies hereinafter. ) 10 mg (0.01 ml) was added and dissolved. Next, the whole volume was transferred to an autoclave, and stirred at room temperature for 1 hour under a hydrogen atmosphere of 8 atm. The reaction liquid was measured by gas chromatography (mobile phase: helium, column: CP-Chiralcel-Dex CB, manufactured by Chrome Pack Co., Ltd.), and the conversion was 99% or more and the optical purity was 91% ee.
実施例2において、ジアミンを(R)−2−ジメチルアミノ−1−フェニルエチルアミンに代えて、第3表〜第5表に示すものを用い、第3表〜第5表に示すTolbinapを用いる以外は実施例2と同様に操作を行った。反応生成物の絶対配置(config.)及び光学純度(%ee)を第3表〜第5表に示す。また、転換率(%conv.)は、特に示さない場合は99%であった。 In Example 2, the diamine was replaced with (R) -2-dimethylamino-1-phenylethylamine, and those shown in Tables 3 to 5 were used, except that Tolbinap shown in Tables 3 to 5 was used. Were operated in the same manner as in Example 2. Tables 3 to 5 show the absolute configuration (config.) And optical purity (% ee) of the reaction product. The conversion rate (% conv.) Was 99% unless otherwise indicated.
実施例3 1−(S)−フェニルブタノールの合成
1M水酸化カリウムイソプロパノール溶液0.1ml及びブチロフェノン0.74g(5mmol)をイソプロパノール3mlに加え、脱気した。RuCl2[(S)−binap][(R)−2−ジメチルアミノ−1−フェニルエチルアミン]9.6mg(0.01mml)を加え溶解した後にオートクレーブに移送し、8気圧の水素雰囲気下室温で1時間撹拌した。反応液を濃縮後、シリカゲルカラムクロマトグラフィーに付し、目的物を0.68g(収率91%)得た。このものの光学純度を高速液体クロマトグラフィー(移動相:n−ヘキサン/イソプロパノール=9/1、カラム:Chiralcel OD−H、ダイセル化学工業(株)製)で測定したところ90%eeであった。
Example 3 Synthesis of 1- (S) -phenylbutanol 0.1 ml of 1M potassium hydroxide isopropanol solution and 0.74 g (5 mmol) of butyrophenone were added to 3 ml of isopropanol and deaerated. RuCl 2 [(S) -binap] [(R) -2-dimethylamino-1-phenylethylamine] 9.6 mg (0.01 ml) was added and dissolved, then transferred to an autoclave, and at room temperature under a hydrogen atmosphere of 8 atm. Stir for 1 hour. The reaction solution was concentrated and subjected to silica gel column chromatography to obtain 0.68 g (yield 91%) of the desired product. The optical purity of this product was 90% ee as measured by high performance liquid chromatography (mobile phase: n-hexane / isopropanol = 9/1, column: Chiralcel OD-H, manufactured by Daicel Chemical Industries, Ltd.).
実施例3において、ブチロフェノンに代えて第6表に示すカルボニル化合物を用いる以外は、実施例3と同様にして操作を行った。反応生成物の光学純度(%ee)及び収率(%conv.)を第6表に示す。 In Example 3, operation was performed in the same manner as in Example 3 except that the carbonyl compound shown in Table 6 was used instead of butyrophenone. Table 6 shows the optical purity (% ee) and yield (% conv.) Of the reaction product.
実施例4 光学活性−1−フェニル−2−(N−メチル−N−ベンゾイルアミノ)−1−プロパノールの製造 Example 4 Production of optically active-1-phenyl-2- (N-methyl-N-benzoylamino) -1-propanol
アルゴン雰囲気下、簡易型オートクレーブ(容量100ml)中に、1−フェニル−2−(N−メチル−N−ベンゾイル)アミノプロパン−1−オン0.27g(1mmol)を加えた。0.1Mの水酸化カリウムイソプロパノール0.1ml溶液をイソプロパノール3mlに溶解し、脱気した後にRuCl2[(S)−binap][(R)−2−ジメチルアミノ−1−フェニルエチルアミン]5mg(0.005mmol)を加え、溶解し、オートクレーブへ移送した。反応系内に水素を12気圧まで圧入し、室温で1時間攪拌した。反応液を濃縮し、シリカゲルカラムクロマトグラフィー(溶離液:n−ヘキサン/酢酸エチル)で精製して、(1R,2R)−1−フェニル−2−(N−メチル−N−ベンゾイルアミノ)−1−プロパノールを定量的に得た。
このものの光学純度及びジアステレオマー純度を高速液体クロマトグラフィー(移動相:n−ヘキサン/エタノール=15/1、カラム:Chiralcel OJ、ダイセル化学工業(株)製)で測定したところ、光学純度は97%eeであり、ジアステレオマー純度は99%de以上であった。
Under an argon atmosphere, 0.27 g (1 mmol) of 1-phenyl-2- (N-methyl-N-benzoyl) aminopropan-1-one was added to a simple autoclave (capacity 100 ml). A 0.1 ml solution of 0.1 M potassium hydroxide isopropanol was dissolved in 3 ml of isopropanol, degassed, and then RuCl 2 [(S) -binap] [(R) -2-dimethylamino-1-phenylethylamine] 5 mg (0 0.005 mmol) was added, dissolved and transferred to an autoclave. Hydrogen was injected into the reaction system to 12 atm and stirred at room temperature for 1 hour. The reaction solution was concentrated and purified by silica gel column chromatography (eluent: n-hexane / ethyl acetate) to give (1R, 2R) -1-phenyl-2- (N-methyl-N-benzoylamino) -1 -Propanol was obtained quantitatively.
The optical purity and diastereomeric purity of this product were measured by high performance liquid chromatography (mobile phase: n-hexane / ethanol = 15/1, column: Chiralcel OJ, manufactured by Daicel Chemical Industries, Ltd.). % Ee and the diastereomeric purity was 99% de or higher.
Claims (6)
Pxはホスフィン配位子を表し、nは1又は2を表す。
Aは、下記に示す式(1)で表されるジアミン配位子を表す。
(ハロゲン原子、C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C1〜C20アルコキシ基、アセチル基、プロピオニル基、イソプロピオニルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基、C1〜C12アルキルカルボニルオキシ基、含酸素ヘテロ環基、含イオウヘテロ環基、若しくは含窒素ヘテロ環基)で置換されていてもよいC7〜C20アラルキル基、又は、
(ハロゲン原子、C1〜C20アルキル基、C2〜C20アルケニル基、C3〜C8シクロアルキル基、C7〜C20アラルキル基、C1〜C20アルコキシ基、C7〜C20アラルキル基、フェニル基、1−ナフチル基、2−ナフチル基、アセチル基、プロピオニル基、イソプロピオニルカルボニル基、ベンゾイル基、フェニルメチルカルボニル基、C1〜C12アルキルカルボニルオキシ基、含酸素ヘテロ環基、含イオウヘテロ環基、若しくは含窒素ヘテロ環基)で置換されていてもよいフェニル基を表し、
R 2 、R 3 はメチル基を表す。また、R2、R3が一緒になって結合して環を形成してもよい。〕
で表されるルテニウム化合物。 Formula (I)
Px represents a phosphine ligand, and n represents 1 or 2.
A represents a diamine ligand represented by the following formula (1) .
(Halogen atom, C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C1-C20 alkoxy group, acetyl group, propionyl group, isopropionylcarbonyl group, benzoyl group, phenylmethylcarbonyl group, C1- A C7-C20 aralkyl group optionally substituted with a C12 alkylcarbonyloxy group, an oxygen-containing heterocyclic group, a sulfur-containing heterocyclic group, or a nitrogen-containing heterocyclic group, or
(Halogen atom, C1-C20 alkyl group, C2-C20 alkenyl group, C3-C8 cycloalkyl group, C7-C20 aralkyl group, C1-C20 alkoxy group, C7-C20 aralkyl group, phenyl group, 1-naphthyl group, 2 -Naphtyl group, acetyl group, propionyl group, isopropionylcarbonyl group, benzoyl group, phenylmethylcarbonyl group, C1-C12 alkylcarbonyloxy group, oxygen-containing heterocyclic group, sulfur-containing heterocyclic group, or nitrogen-containing heterocyclic group) Represents an optionally substituted phenyl group,
R 2, R 3 represents a methyl group. R 2 and R 3 may be bonded together to form a ring. ]
Ruthenium compounds represented by
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