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JP4557262B2 - Gas dissolved water production equipment - Google Patents
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JP4557262B2 - Gas dissolved water production equipment - Google Patents

Gas dissolved water production equipment Download PDF

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JP4557262B2
JP4557262B2 JP2006301893A JP2006301893A JP4557262B2 JP 4557262 B2 JP4557262 B2 JP 4557262B2 JP 2006301893 A JP2006301893 A JP 2006301893A JP 2006301893 A JP2006301893 A JP 2006301893A JP 4557262 B2 JP4557262 B2 JP 4557262B2
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gas
water
dissolved
liquid mixing
dissolved water
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JP2008114185A (en
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之信 佐藤
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Sato Kogyo Co Ltd
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Sato Kogyo Co Ltd
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Description

本発明は、ガスと水との気液混合水を生成する気液混合ポンプと、気液混合ポンプからの気液混合水の供給路に接続され、水に対するガスの溶存量を高めることが可能なミキサーとを備えたガス溶存水製造装置に関する。   The present invention is connected to a gas-liquid mixing pump for generating gas-liquid mixed water of gas and water, and a gas-liquid mixed water supply path from the gas-liquid mixing pump, so that the dissolved amount of gas with respect to water can be increased. The present invention relates to a gas-dissolved water production apparatus equipped with a simple mixer.

従来のガス溶存水製造装置としては、流路径を絞った流体圧縮部と流路径を広げた流体解放部と有して水に対するガスの溶存量を高めることが可能なミキサーを備えたものが知られている(例えば、特許文献1参照)。
特開平8−155284号公報([0011]第1図、第4図)
As a conventional gas-dissolved water production apparatus, a device having a fluid compression section with a narrowed flow path diameter and a fluid release section with a wide flow path diameter, and a mixer capable of increasing the dissolved amount of gas with respect to water is known. (For example, refer to Patent Document 1).
JP-A-8-155284 ([0011] FIGS. 1 and 4)

ところで、上述したガス溶存水製造装置によって製造されたガス溶存水は、各種ワークの洗浄水として近年、注目されている。洗浄方式としては、ガス溶存水を貯めた複数の洗浄槽にワークを順次に移動させて洗浄する多段洗浄方式が一般的であり、各洗浄槽で使用するガス溶存水は、例えば、汚れの程度や洗浄条件に応じて、ガス溶存量を異ならせておくことが好ましい。   By the way, the gas dissolved water manufactured by the gas dissolved water manufacturing apparatus mentioned above attracts attention in recent years as washing water of various workpieces. As a cleaning method, a multi-stage cleaning method in which a workpiece is sequentially moved to a plurality of cleaning tanks storing gas-dissolved water for cleaning is generally used. The gas-dissolved water used in each cleaning tank is, for example, the degree of contamination. It is preferable to vary the amount of dissolved gas according to the cleaning conditions.

しかしながら、上述した従来のガス溶存水製造装置は、1つの製造ラインしか備えておらず、その製造ラインに備えた溶解モジュールを付け替えることで、ガス溶存量の異なる複数種類のガス溶存水を製造していた。つまり、何れか1つのガス溶存水を製造している間は、その他のガス溶存水の製造を停止せざるを得ず、複数種類のガス溶存水を同時に製造することができなかった。   However, the conventional gas-dissolved water production apparatus described above has only one production line, and a plurality of types of gas-dissolved water having different gas-dissolved amounts can be produced by replacing the dissolution module provided in the production line. It was. That is, while any one of the gas-dissolved waters is produced, the production of the other gas-dissolved waters must be stopped, and a plurality of types of gas-dissolved waters cannot be produced at the same time.

本発明は、上記事情に鑑みてなされたもので、ガス溶存量の異なる複数種類のガス溶存水を同時に製造することが可能なガス溶存水製造装置の提供を目的とする。   The present invention has been made in view of the above circumstances, and an object thereof is to provide a gas-dissolved water production apparatus capable of simultaneously producing a plurality of types of gas-dissolved water having different gas-dissolved amounts.

上記目的を達成するためになされた請求項1の発明に係るガス溶存水製造装置は、水道管に接続され、脱気した水を生成する脱気装置と、水に溶解するためのガスを供給するガス供給装置と、脱気装置からの水の供給路とガス供給装置からのガスの供給路とが共に接続されて、ガスと水との気液混合水を生成する気液混合ポンプと、気液混合ポンプからの気液混合水の供給路に接続されると共に、流路径を絞った流体圧縮部と流路径を広げた流体解放部と有して水に対するガスの溶存量を高めることが可能なミキサーとを備え、水にガスを溶解してガス溶存水を製造するためのガス溶存水製造装置において、気液混合ポンプを複数設けると共に、脱気装置からの水の供給路及びガス供給装置からのガスの供給路を、それぞれ複数に分岐して各気液混合ポンプに接続し、複数の気液混合ポンプの下流側に設けた複数のミキサーにおける流体圧縮部の流路径を異ならせて溶存量が異なる複数種類のガス溶存水を同時に製造可能としたところに特徴を有する。   A gas-dissolved water production apparatus according to the invention of claim 1 made to achieve the above object is connected to a water pipe and generates a deaerated water, and supplies a gas for dissolving in water. A gas supply device, a water supply path from the deaeration device, and a gas supply path from the gas supply device are connected together, and a gas-liquid mixing pump for generating gas-liquid mixed water of gas and water; It is connected to the gas-liquid mixed water supply path from the gas-liquid mixing pump and has a fluid compression section with a narrowed flow path diameter and a fluid release section with a wide flow path diameter to increase the dissolved amount of gas with respect to water In a gas-dissolved water production apparatus for producing gas-dissolved water by dissolving gas in water and providing a plurality of gas-liquid mixing pumps, a water supply path and gas supply from the degasser Divide the gas supply path from the equipment into multiple parts. It is connected to the liquid mixing pump, and it is possible to simultaneously produce multiple types of dissolved gas with different dissolved amounts by changing the flow path diameter of the fluid compression part in the plurality of mixers provided downstream of the plurality of gas-liquid mixing pumps It has the characteristics.

請求項2の発明は、請求項1に記載のガス溶存水製造装置において、ガスは、水素ガスであるところに特徴を有する。   The invention of claim 2 is characterized in that, in the gas dissolved water producing apparatus according to claim 1, the gas is hydrogen gas.

請求項3の発明は、請求項2に記載のガス溶存水製造装置において、気液混合ポンプを2つ設けて、一方の気液混合ポンプを含む第1系統の生成ラインで、水素ガスの溶存量が0.5〜1.2ppmのガス溶存水を製造すると共に、他方の気液混合ポンプを含む第2系統の生成ラインで、水素ガスの溶存量が1.3ppm以上のガス溶存水を製造するように構成したところに特徴を有する。   According to a third aspect of the present invention, there is provided the gas-dissolved water producing apparatus according to the second aspect, wherein two gas-liquid mixing pumps are provided and hydrogen gas is dissolved in the first generation line including one gas-liquid mixing pump. Manufactures gas-dissolved water with an amount of 0.5-1.2 ppm, and produces gas-dissolved water with a dissolved hydrogen gas content of 1.3 ppm or more in the second generation line including the other gas-liquid mixing pump. It has the characteristic in the place comprised.

請求項4の発明は、請求項3に記載のガス溶存水製造装置において、ガス供給装置からのガスの供給路のうち、分岐部分より下流側にそれぞれマスフロコントローラを設け、第1系統の生成ラインの気液混合ポンプへの水に対する水素ガスの供給量を100〜200[ml/min]とし、第2系統の生成ラインの気液混合ポンプへの水に対するガスの供給量を250〜500[ml/min]としたところに特徴を有する。   According to a fourth aspect of the present invention, there is provided the gas dissolved water production apparatus according to the third aspect, wherein a mass flow controller is provided on the downstream side of the branch portion in the gas supply path from the gas supply device to generate the first system. The supply amount of hydrogen gas to water to the gas-liquid mixing pump in the line is set to 100 to 200 [ml / min], and the supply amount of gas to water to the gas-liquid mixing pump in the generation line of the second system is set to 250 to 500 [ ml / min].

請求項5の発明は、請求項3又は4に記載のガス溶存水製造装置において、各ミキサーより下流側に、水中の気泡を除去するための脱泡装置を備えたところに特徴を有する。   The invention of claim 5 is characterized in that, in the gas-dissolved water production apparatus according to claim 3 or 4, a defoaming device for removing bubbles in water is provided downstream of each mixer.

請求項6の発明は、請求項1乃至5の何れかに記載のガス溶存水製造装置において、各ミキサーに、流路径が異なる流体圧縮部が取り替えて取り付け可能としたところに特徴を有する。   The invention of claim 6 is characterized in that in the gas-dissolved water production apparatus according to any one of claims 1 to 5, a fluid compression section having a different flow path diameter can be replaced and attached to each mixer.

[請求項1の発明]
請求項1の構成では、ガスと水との気液混合水を生成する気液混合ポンプを複数設けると共に、脱気装置からの水の供給路及びガス供給装置からのガスの供給路をそれぞれ複数に分岐して各気液混合ポンプに接続し、それら複数の気液混合ポンプの下流側に複数のミキサーを設けた。そして、複数のミキサーにおける流体圧縮部の流路径を異ならせることで、溶存量が異なる複数種類のガス溶存水を同時に製造することが可能となる。また、ガスと混合する前の水に含まれる気体を予め脱気するから、水に対してガスを溶解させ易くなり、ガスの溶存量をより高めることができる。
[Invention of Claim 1]
In the configuration of claim 1, a plurality of gas-liquid mixing pumps for generating gas-liquid mixed water of gas and water are provided, and a plurality of water supply paths from the deaeration device and a plurality of gas supply paths from the gas supply apparatus are provided. The gas-liquid mixing pump was branched and connected to each gas-liquid mixing pump, and a plurality of mixers were provided downstream of the gas-liquid mixing pumps. And by making the flow path diameters of the fluid compression sections in the plurality of mixers different, it is possible to simultaneously produce a plurality of types of gas-dissolved water having different dissolved amounts. Moreover, since the gas contained in water before mixing with gas is deaerated beforehand, it becomes easy to dissolve gas with respect to water, and the dissolved amount of gas can be raised more.

[請求項2の発明]
水に水素ガスが溶解したガス溶存水は、水素ガスの溶存量に応じて洗浄効果が異なる。即ち、本発明のガス溶存水製造装置によれば、洗浄効果が異なる複数種類のガス溶存水を同時に製造することができる。
[Invention of claim 2]
Gas-dissolved water in which hydrogen gas is dissolved in water has different cleaning effects depending on the dissolved amount of hydrogen gas. That is, according to the gas dissolved water manufacturing apparatus of the present invention, a plurality of types of gas dissolved water having different cleaning effects can be manufactured simultaneously.

[請求項3及び4の発明]
水素ガスの溶存量が0.5〜1.2ppmのガス溶存水で、予備洗浄を行ってから、水素ガスの溶存量が1.3ppm以上のガス溶存水で仕上げ洗浄を行うと、汚れを効果的に落とすことができる。本発明のガス溶存水製造装置では、これら水素ガスの溶存量が0.5〜1.2ppmのガス溶存水と1.3ppm以上のガス溶存水とを同時に製造することができる。ここで、水素ガスの溶存量が0.5〜1.2ppmのガス溶存水を製造するには、気液混合ポンプへの水に対する水素ガスの供給量を100〜200[ml/min]とし、水素ガスの溶存量が1.3ppm以上のガス溶存水を製造するには、気液混合ポンプへの水に対するガスの供給量を250〜500[ml/min]とすればよい(請求項4の発明)。
[Inventions of Claims 3 and 4]
If pre-cleaning is performed with gas-dissolved water with a dissolved hydrogen gas content of 0.5 to 1.2 ppm, and then cleaning with gas-dissolved water with a dissolved hydrogen gas content of 1.3 ppm or more, dirt is effective. Can be dropped. In the gas-dissolved water production apparatus of the present invention, gas-dissolved water having a dissolved amount of hydrogen gas of 0.5 to 1.2 ppm and gas-dissolved water having 1.3 ppm or more can be produced simultaneously. Here, in order to produce gas-dissolved water having a dissolved amount of hydrogen gas of 0.5 to 1.2 ppm, the supply amount of hydrogen gas to water to the gas-liquid mixing pump is set to 100 to 200 [ml / min], In order to produce gas-dissolved water in which the dissolved amount of hydrogen gas is 1.3 ppm or more, the gas supply amount to the gas-liquid mixing pump may be 250 to 500 [ml / min]. invention).

[請求項5の発明]
気泡を除去したガス溶存水は、超音波洗浄の洗浄水として好適である。
[Invention of claim 5]
Gas-dissolved water from which bubbles have been removed is suitable as cleaning water for ultrasonic cleaning.

[請求項6の発明]
ミキサーのうち流体圧縮部を取り替えることで、生成されるガス溶存水のガス溶存量を変更することができる。また、流体圧縮部が破損した場合には、ミキサーのその他の部品は流用し、流体圧縮部だけを取り替えればよいから、ランニングコストを抑えることができる。
[Invention of claim 6]
By replacing the fluid compression part of the mixer, the dissolved gas amount of the dissolved gas water can be changed. In addition, when the fluid compression section is damaged, other parts of the mixer are diverted and only the fluid compression section needs to be replaced, so that the running cost can be suppressed.

以下、本発明に係る一実施形態を図1〜図6に基づいて説明する。図1に示された本実施形態のガス溶存水製造装置100は、水素ガスを水に溶解させた2種類のガス溶存水GW1,GW2を製造するためのものであって、水が流れる水配管11(本発明の「水の供給路」に相当する)に沿って上流側から順番にプレフィルター18、磁場付与装置17、脱気装置25、気液混合ポンプ12、ミキサー10及び脱泡装置19を備えている。   Hereinafter, an embodiment according to the present invention will be described with reference to FIGS. The gas-dissolved water production apparatus 100 of this embodiment shown in FIG. 1 is for producing two types of gas-dissolved water GW1 and GW2 in which hydrogen gas is dissolved in water, and a water pipe through which water flows. 11 (corresponding to the “water supply path” of the present invention) in order from the upstream side, the pre-filter 18, the magnetic field applying device 17, the degassing device 25, the gas-liquid mixing pump 12, the mixer 10, and the defoaming device 19. It has.

プレフィルター18は、水道水を濾過して水道水中の異物(錆等)を除去する。   The pre-filter 18 filters tap water to remove foreign matters (such as rust) in the tap water.

磁場付与装置17は、内部に磁石(例えば、電磁石、永久磁石の何れでもよい)を備え、水配管11を貫通する磁束を発生させている。そして、この磁束による磁場を水が通過するように構成されている。これにより、水のクラスターサイズ(水分子の集合体の大きさ)が小さくなるものと推測される。   The magnetic field applying device 17 includes a magnet (for example, either an electromagnet or a permanent magnet) inside, and generates a magnetic flux penetrating the water pipe 11. And it is comprised so that water may pass the magnetic field by this magnetic flux. Thereby, it is estimated that the cluster size of water (the size of the aggregate of water molecules) is reduced.

脱気装置25は、真空モジュール25M内に水を導入し、その真空モジュール25M内を真空ポンプ25P等によって真空にすることで水中の気体を抜く構成となっている。なお、脱気装置25は、このような所謂、真空脱気装置に限らず、例えば、超音波振動を利用したものでもよい。   The deaeration device 25 has a configuration in which water is introduced into the vacuum module 25M, and the vacuum module 25M is evacuated by a vacuum pump 25P or the like to remove the water gas. Note that the deaeration device 25 is not limited to such a so-called vacuum deaeration device, and may be one utilizing ultrasonic vibration, for example.

水素ガス供給装置13は、例えば、水を電気分解することで水素ガスを生成する。そのために、水配管11のうちプレフィルター18より下流側部分と水素ガス供給装置13との間は給水管で接続されている。この水素ガス供給装置13からガス配管14(本発明の「ガスの供給路」に相当する)を通じて気液混合ポンプ12,12に水素ガスが供給される。なお、水素ガス供給装置13は、メタノールや天然ガスを改質して水素ガスを生成する構成でもよいし、予め水素ガスが充填された市販の水素ガスボンベでもよい。   For example, the hydrogen gas supply device 13 generates hydrogen gas by electrolyzing water. For this purpose, a portion of the water pipe 11 downstream from the prefilter 18 and the hydrogen gas supply device 13 are connected by a water supply pipe. Hydrogen gas is supplied from the hydrogen gas supply device 13 to the gas-liquid mixing pumps 12 and 12 through a gas pipe 14 (corresponding to a “gas supply path” of the present invention). The hydrogen gas supply device 13 may be configured to generate hydrogen gas by reforming methanol or natural gas, or may be a commercially available hydrogen gas cylinder filled with hydrogen gas in advance.

ところで、本実施形態のガス溶存水製造装置100は、水素ガス溶存量が異なる2種類のガス溶存水GW1,GW2、即ち、第1のガス溶存水GW1と、その第1のガス溶存水GW1より水素ガスの溶存量が高い第2のガス溶存水GW2とを同時に製造するために、脱気装置25の下流側で水配管11が2つに分岐している。即ち、脱気装置25の下流側には、第1のガス溶存水GW1を生成するための第1系統の生成ライン11Aと、第2のガス溶存水GW2を生成するための第2系統の生成ライン11Bとが備えられている。そして、それら各系統の生成ライン11A,11Bのそれぞれに、気液混合ポンプ12、ミキサー10及び脱泡装置19が備えられている。   By the way, the gas dissolved water manufacturing apparatus 100 of this embodiment is based on two types of gas dissolved water GW1 and GW2 having different hydrogen gas dissolved amounts, that is, the first gas dissolved water GW1 and the first gas dissolved water GW1. In order to simultaneously produce the second gas-dissolved water GW2 in which the dissolved amount of hydrogen gas is high, the water pipe 11 is branched into two on the downstream side of the deaeration device 25. That is, on the downstream side of the deaeration device 25, a first generation line 11A for generating the first gas-dissolved water GW1 and a second system for generating the second gas-dissolved water GW2 are generated. Line 11B is provided. And the gas-liquid mixing pump 12, the mixer 10, and the defoaming device 19 are provided in each of the production lines 11A and 11B of these systems.

各系統の生成ライン11A,11Bに備えられた気液混合ポンプ12,12は同一仕様となっている。気液混合ポンプ12は、水配管11の上流端に備えた定流量弁29の設定に応じた所定流量(例えば、10〜20L/min)で水を、また、水素ガス供給装置13と各気液混合ポンプ12,12との間を接続したガス配管14の分岐部分より下流側に備えたマスフローコントローラ28の設定に応じた所定流量(例えば、0.1〜0.5L/min)及び所定圧力(例えば、0.2〜0.4MPa)で水素ガスを吸引し、これら水と水素ガスとを攪拌混合してから、ミキサー10に所定圧力(例えば、0.7〜1.2MPa)で圧送する。ミキサー10を通過する過程で水に対する水素ガスの溶存量が高められて、所定の水素ガス溶存量に調整された第1及び第2のガス溶存水GW1,GW2が製造される。これら第1及び第2のガス溶存水GW1,GW2は、公知な構成の脱泡装置19にて気泡を除去(例えば、不織布やメンブレンフィルターに通水して気泡を分離)した後、超音波洗浄装置90に供給される。   The gas-liquid mixing pumps 12 and 12 provided in the generation lines 11A and 11B of each system have the same specifications. The gas-liquid mixing pump 12 supplies water at a predetermined flow rate (for example, 10 to 20 L / min) according to the setting of the constant flow valve 29 provided at the upstream end of the water pipe 11, and the hydrogen gas supply device 13 and each gas. A predetermined flow rate (for example, 0.1 to 0.5 L / min) and a predetermined pressure corresponding to the setting of the mass flow controller 28 provided on the downstream side of the branch portion of the gas pipe 14 connected between the liquid mixing pumps 12 and 12. The hydrogen gas is sucked at (for example, 0.2 to 0.4 MPa), the water and the hydrogen gas are stirred and mixed, and then pumped to the mixer 10 at a predetermined pressure (for example, 0.7 to 1.2 MPa). . In the process of passing through the mixer 10, the dissolved amount of hydrogen gas with respect to water is increased, and the first and second gas-dissolved waters GW1 and GW2 adjusted to a predetermined dissolved amount of hydrogen gas are produced. The first and second gas-dissolved waters GW1 and GW2 are subjected to ultrasonic cleaning after removing bubbles (for example, passing water through a nonwoven fabric or a membrane filter to separate the bubbles) with a defoaming device 19 having a known configuration. Supplied to the device 90.

具体的には、第1のガス溶存水GW1は、超音波洗浄装置90のうち、予備洗浄用の1次洗浄槽91に供給され、第2のガス溶存水GW2は、1次洗浄槽91で予備洗浄した後で仕上げ洗浄するための2次洗浄槽92に供給される。ここで、1次洗浄槽91では、第1のガス溶存水GW1をオーバーフローさせつつ所定周波数(例えば、28〜40KHz)の超音波振動を付与し、さらに、ワーク自体も所定の揺れ幅で揺動させる。これに対し、2次洗浄槽92では、第2のガス溶存水GW2をオーバーフローさせつつ1次洗浄槽91と同じ超音波振動(例えば、28〜40KHz)を付与するが、ワークは揺動させないようになっている。また、第1系統の生成ライン11Aに備えたミキサー10は、生成される第1のガス溶存水GW1の水素ガス溶存量が0.5〜1.2ppmとなるように構成されており、第2系統の生成ライン11Bに備えたミキサー10は、生成される第2のガス溶存水GW2の水素ガス溶存量が第1のガス溶存水GW1よりも高い1.3ppm以上となるように構成されている。ここで、水素ガス溶存量が比較的低い第1のガス溶存水GW1で予備洗浄を行った後で、水素ガス溶存量が比較的高い第2のガス溶存水GW2で仕上げ洗浄を行うようにすると、何れか1種類のガス溶存水のみで予備洗浄と仕上げ洗浄とを行った場合に比較し、ワークに対するダメージが抑えられ、汚れも効果的に落とせることが目視により確認された。   Specifically, the first gas dissolved water GW1 is supplied to the primary cleaning tank 91 for preliminary cleaning in the ultrasonic cleaning apparatus 90, and the second gas dissolved water GW2 is supplied to the primary cleaning tank 91. After the preliminary cleaning, the secondary cleaning tank 92 for finishing cleaning is supplied. Here, in the primary cleaning tank 91, ultrasonic vibration of a predetermined frequency (for example, 28 to 40 KHz) is applied while overflowing the first gas-dissolved water GW1, and the workpiece itself also swings with a predetermined swing width. Let In contrast, in the secondary cleaning tank 92, the same ultrasonic vibration (for example, 28 to 40 KHz) as that in the primary cleaning tank 91 is applied while overflowing the second gas-dissolved water GW2, but the work is not swung. It has become. Moreover, the mixer 10 provided in the production line 11A of the first system is configured so that the hydrogen gas dissolved amount of the generated first gas dissolved water GW1 is 0.5 to 1.2 ppm, and the second The mixer 10 provided in the generation line 11B of the system is configured such that the hydrogen gas dissolved amount of the generated second gas dissolved water GW2 is 1.3 ppm or higher, which is higher than that of the first gas dissolved water GW1. . Here, after the preliminary cleaning is performed with the first gas dissolved water GW1 having a relatively low hydrogen gas dissolved amount, the finish cleaning is performed with the second gas dissolved water GW2 having a relatively high hydrogen gas dissolved amount. As compared with the case where preliminary cleaning and finishing cleaning are performed only with any one kind of gas-dissolved water, it was visually confirmed that damage to the workpiece was suppressed and dirt could be effectively removed.

なお、ガス溶存水製造装置100に備えた配管の所定部位には、圧力センサ26,27及び流量センサ60,61が備えられている。また、水配管11及びガス配管14の所定位置にはバルブ(ソレノイドバルブ、モーターバルブ、手動バルブ)が備えられている。   In addition, pressure sensors 26 and 27 and flow rate sensors 60 and 61 are provided at predetermined portions of the piping provided in the gas dissolved water manufacturing apparatus 100. Further, valves (solenoid valve, motor valve, manual valve) are provided at predetermined positions of the water pipe 11 and the gas pipe 14.

さらに、ガス溶存水製造装置100は、ミキサー10と脱泡装置19との間で水配管11から分岐した採水管21を備え、その採水管21の途中には、定流量弁20と共に、図示しないpH計、酸化還元電位計及び溶存水素計が備えられている。これにより、各生成ライン11A,11Bで生成された第1及び第2のガス溶存水GW1,GW2の水質を検査できるようになっている。また、採水管21によって、水配管11中に残った水を排水することができる。   Further, the gas-dissolved water production apparatus 100 includes a water sampling pipe 21 branched from the water pipe 11 between the mixer 10 and the defoaming apparatus 19, and is not shown along with the constant flow valve 20 in the middle of the water sampling pipe 21. A pH meter, a redox potential meter, and a dissolved hydrogen meter are provided. Thereby, the water quality of the 1st and 2nd gas dissolved water GW1, GW2 produced | generated by each production | generation line 11A, 11B can be test | inspected. Moreover, the water remaining in the water pipe 11 can be drained by the water sampling pipe 21.

次に、ミキサー10について詳説する。図2に示すように、ミキサー10は、金属(例えば、ステンレス)製の筒形ボディ30の内部に、同じく金属(例えば、ステンレス)製のミキシング壁40、内部隔壁42及び板金部材50を収容してなる。そして、各系統の生成ライン11A,11Bにそれぞれ設けられたミキサー10,10は、板金部材50を除き、同一仕様となっている。   Next, the mixer 10 will be described in detail. As shown in FIG. 2, the mixer 10 accommodates a metal (for example, stainless steel) mixing wall 40, an internal partition wall 42, and a sheet metal member 50 in a cylindrical body 30 made of metal (for example, stainless steel). It becomes. The mixers 10 and 10 provided in the generation lines 11A and 11B of the respective systems have the same specifications except for the sheet metal member 50.

筒形ボディ30は、円筒状をなしたボディ本体31の軸方向の両端部に流入側パイプ32及び流出側パイプ33を備えている。これら各パイプ32,33は、ボディ本体31より小径な円管状をなしており、その内周面には水配管11と螺合する螺旋部34が形成されている。これら各パイプ32,33が水配管11の途中に連結されて、ミキサー10の内部を気液混合ポンプ12から圧送された水素ガスと水の気液混合水が通過可能となっている。なお、流入側パイプ32の内径は流出側パイプ33の内径よりも僅かに小径となっている。   The cylindrical body 30 includes an inflow side pipe 32 and an outflow side pipe 33 at both end portions in the axial direction of a cylindrical body body 31. Each of these pipes 32, 33 has a circular shape smaller in diameter than the body main body 31, and a spiral portion 34 that is screwed into the water pipe 11 is formed on the inner peripheral surface thereof. These pipes 32 and 33 are connected in the middle of the water pipe 11 so that the gas-liquid mixed water of hydrogen gas and water pumped from the gas-liquid mixing pump 12 can pass through the mixer 10. The inner diameter of the inflow side pipe 32 is slightly smaller than the inner diameter of the outflow side pipe 33.

詳細には、ボディ本体31は、両端開放の円筒部材31Aの両端部に平板リング状の端部壁部材31B,31Bを宛がって、それら円筒部材31Aと端部壁部材31B,31Bとを全周に亘って溶接してなる。端部壁部材31Bのうち径方向の外寄り位置には円筒ボス36が一体形成されており、この円筒ボス36が円筒部材31Aの端部内側に嵌合している。また、筒形ボディ30は、端部壁部材31B,31Bの中央に形成された孔部31C,31Cに流入側パイプ32及び流出側パイプ33をそれぞれ嵌合した状態でその嵌合部分を全周に亘って溶接してなる。   More specifically, the body main body 31 is configured such that the flat ring-shaped end wall members 31B and 31B are addressed to both ends of the cylindrical member 31A open at both ends, and the cylindrical member 31A and the end wall members 31B and 31B are connected to each other. It is welded over the entire circumference. A cylindrical boss 36 is integrally formed at a radially outward position of the end wall member 31B, and the cylindrical boss 36 is fitted inside the end of the cylindrical member 31A. In addition, the cylindrical body 30 is configured so that the inflow side pipe 32 and the outflow side pipe 33 are respectively fitted in the holes 31C and 31C formed in the center of the end wall members 31B and 31B. It is welded over.

図2に示すように、ボディ本体31の上流端側にはミキシング壁40が備えられている。図3(A)に示すように、ミキシング壁40は円板構造をなしており、その外径はボディ本体31(円筒部材31A)の内径とほぼ同一となっている。また、ミキシング壁40の中心部には、円形の第1通水孔41が1つ貫通形成されている。図3(B)に示すように、第1通水孔41の両開口縁41Kは、外側に向かって拡径したテーパ形状をなしている。具体的には、第1通水孔41の両開口縁41Kにおける最大内径D1は、例えば、9mmであり、第1通水孔41の軸方向中央部における最小内径D2は、例えば、5mmである。また、両開口縁41Kにおけるテーパ角度θ1は約45度である。   As shown in FIG. 2, a mixing wall 40 is provided on the upstream end side of the body main body 31. As shown in FIG. 3A, the mixing wall 40 has a disk structure, and the outer diameter thereof is substantially the same as the inner diameter of the body main body 31 (cylindrical member 31A). Further, one circular first water passage hole 41 is formed through the central portion of the mixing wall 40. As shown in FIG. 3 (B), both opening edges 41K of the first water passage holes 41 have a tapered shape whose diameter is increased outward. Specifically, the maximum inner diameter D1 at both opening edges 41K of the first water passage hole 41 is, for example, 9 mm, and the minimum inner diameter D2 at the axial center portion of the first water passage hole 41 is, for example, 5 mm. . The taper angle θ1 at both opening edges 41K is about 45 degrees.

図2に示すように、ボディ本体31の内部でミキシング壁40より下流側にはミキシング壁40よりやや厚肉な内部隔壁42が備えられている。図4(A)に示すように、内部隔壁42は、ミキシング壁40と同様に円板構造をなしている。即ち、内部隔壁42の外径は、ボディ本体31(円筒部材31A)の内径とほぼ同一である。また、内部隔壁42の中心部には、ミキシング壁40の第1通水孔41よりやや大径な螺旋孔42Nが貫通形成されている(図4(B)を参照)。   As shown in FIG. 2, an inner partition wall 42 that is slightly thicker than the mixing wall 40 is provided in the body main body 31 on the downstream side of the mixing wall 40. As shown in FIG. 4A, the internal partition wall 42 has a disk structure similar to the mixing wall 40. That is, the outer diameter of the inner partition wall 42 is substantially the same as the inner diameter of the body main body 31 (cylindrical member 31A). A spiral hole 42N having a slightly larger diameter than the first water passage hole 41 of the mixing wall 40 is formed through the central portion of the inner partition wall 42 (see FIG. 4B).

図2に示すように、ミキシング壁40と内部隔壁42は筒形ボディ30(ボディ本体31)の軸方向に間隔を空けて重ねて配置されている。詳細には、筒形ボディ30のうち上流側の端部壁部材31Bとミキシング壁40との間、ミキシング壁40と内部隔壁42との間、及び、内部隔壁42と下流側の端部壁部材31Bとの間には、それぞれ扁平筒状のスペーサ45(例えば、ステンレスリング)が挟まれている。これにより、ミキシング壁40と内部隔壁42とが筒形ボディ30の軸方向で間隔を空けて固定されると共に、ボディ本体31の内部がその軸方向で複数の流体通過エリアに区画されている。   As shown in FIG. 2, the mixing wall 40 and the inner partition wall 42 are disposed so as to overlap each other with an interval in the axial direction of the cylindrical body 30 (body main body 31). Specifically, in the cylindrical body 30, between the upstream end wall member 31B and the mixing wall 40, between the mixing wall 40 and the internal partition wall 42, and between the internal partition wall 42 and the downstream end wall member. A flat cylindrical spacer 45 (for example, a stainless steel ring) is sandwiched between 31B. As a result, the mixing wall 40 and the internal partition wall 42 are fixed at an interval in the axial direction of the cylindrical body 30, and the interior of the body main body 31 is partitioned into a plurality of fluid passage areas in the axial direction.

図2に示すように、内部隔壁42の螺旋孔42Nにはノズル55が螺合されている。ノズル55は円筒状をなしており、先端部が流出側パイプ33の内側に達している。また、ノズル55の内径は、その軸方向における中間部が、螺旋孔42Nに螺合した基端部と流出側パイプ33内に配置された先端部とに比較して大径となっている。   As shown in FIG. 2, a nozzle 55 is screwed into the spiral hole 42 </ b> N of the internal partition wall 42. The nozzle 55 has a cylindrical shape, and the tip portion reaches the inside of the outflow side pipe 33. Further, the inner diameter of the nozzle 55 is larger in the axial direction than the proximal end portion screwed into the spiral hole 42 </ b> N and the distal end portion disposed in the outflow side pipe 33.

ノズル55は、その先端寄り位置でノズル本体56とノズルヘッド57とに分割可能となっている。詳細には、ノズル本体56の先端外周面には雄螺旋が形成されており、ノズルヘッド57の外周面に係合した連結ナット58をその雄螺旋に螺合することで、ノズル本体56とノズルヘッド57とが連結されている。そして、ノズル本体56の先端面とノズルヘッド57の基端面との間に、円形の板金部材50の外縁部が板厚方向で挟持されている。   The nozzle 55 can be divided into a nozzle body 56 and a nozzle head 57 at a position near the tip. More specifically, a male spiral is formed on the outer peripheral surface of the nozzle body 56, and a coupling nut 58 engaged with the outer peripheral surface of the nozzle head 57 is screwed into the male spiral, whereby the nozzle main body 56 and the nozzle The head 57 is connected. And the outer edge part of the circular sheet-metal member 50 is clamped in the plate | board thickness direction between the front end surface of the nozzle main body 56, and the base end surface of the nozzle head 57. FIG.

図5(A)に示すように、板金部材50は、ミキシング壁40よりも小径でかつ薄肉(例えば、0.2mm)な薄板円板状をなしている。板金部材50の中心部には、ミキシング壁40の第1通水孔41より小径な第2通水孔51が形成されている。そして、本実施形態のミキサー10では、ミキシング壁40を通過した水が全てこの第2通水孔51を通過するようになっている。なお、ミキシング壁40及び板金部材は50は、本発明に係る「流体圧縮部」に相当し、ミキサー10内部のうちミキシング壁40及び板金部材50の上下流側の領域は、本発明の「流体解放部」に相当する。   As shown in FIG. 5A, the sheet metal member 50 has a thin disk shape that is smaller in diameter and thinner (eg, 0.2 mm) than the mixing wall 40. A second water passage hole 51 having a diameter smaller than that of the first water passage hole 41 of the mixing wall 40 is formed at the center of the sheet metal member 50. And in the mixer 10 of this embodiment, all the water which passed the mixing wall 40 passes through this 2nd water flow hole 51. As shown in FIG. The mixing wall 40 and the sheet metal member 50 correspond to the “fluid compression section” according to the present invention, and the regions on the upstream and downstream sides of the mixing wall 40 and the sheet metal member 50 in the mixer 10 are “fluids” according to the present invention. Corresponds to "release part".

板金部材50には、上流側から受ける水圧が所定の基準値以上となった場合に、第2通水孔51の開口面積を広げるように板金部材50を破断させるための破断溝52が形成されている。破断溝52は、板金部材50の下流側を向いた面に形成されており、第2通水孔51の開口縁に一端が接続されて、径方向の外側に向かって延びている。これら破断溝52は、板金部材50を周方向で4等分する位置に配置されており、周方向で隣り合った破断溝52同士が直角となっている。図5(B)に示すように、破断溝52は、例えば、断面V字形をなしている。具体的には、板金部材50の板厚は0.2mmであり、破断溝52の深さは板金部材50の板厚の約半分(約0.08〜0.1mm)であり、破断溝52のテーパー角度θ2は約60度となっている。   The sheet metal member 50 is formed with a breaking groove 52 for breaking the sheet metal member 50 so as to widen the opening area of the second water passage hole 51 when the water pressure received from the upstream side exceeds a predetermined reference value. ing. The fracture groove 52 is formed on the surface facing the downstream side of the sheet metal member 50, and one end is connected to the opening edge of the second water passage hole 51 and extends outward in the radial direction. These breaking grooves 52 are arranged at positions where the sheet metal member 50 is divided into four equal parts in the circumferential direction, and the breaking grooves 52 adjacent in the circumferential direction are perpendicular to each other. As shown in FIG. 5B, the fracture groove 52 has, for example, a V-shaped cross section. Specifically, the sheet thickness of the sheet metal member 50 is 0.2 mm, the depth of the fracture groove 52 is about half of the sheet thickness of the sheet metal member 50 (about 0.08 to 0.1 mm), and the fracture groove 52 The taper angle θ2 is about 60 degrees.

例えば、第2通水孔51が異物や結晶の析出等で詰まると、ミキサー10より上流側の水配管11の内圧が上昇し、水配管11の破損や、破損部位からの水漏れが起こり得る。これに対し、本実施形態によれば、第2通水孔51が詰まって板金部材50が受ける水圧が予め設定された基準値以上となると、図6(A)及び図6(B)に示すように、板金部材50が破断溝52に沿って裂けて下流側に塑性変形し、第2通水孔51の開口面積が広げられる。すると、詰まりが解消されると共に板金部材50を多くの水が通過可能となって、水配管11の内圧が減少する。これにより、ミキサー10の詰まりによる水配管11の破損や水漏れを未然に防止することができる。なお、第2通水孔51の詰まりに限らず、ミキサー10に対して水が過剰供給された場合にも、上述の如く水圧によって板金部材50が破断して水配管11の破損や水漏れを未然に防止することができる。   For example, if the second water passage hole 51 is clogged with foreign matter, crystal precipitation, or the like, the internal pressure of the water pipe 11 on the upstream side of the mixer 10 increases, and the water pipe 11 may be damaged or water may leak from the damaged portion. . On the other hand, according to the present embodiment, when the second water passage hole 51 is clogged and the water pressure received by the sheet metal member 50 is equal to or higher than a preset reference value, it is shown in FIGS. 6 (A) and 6 (B). As described above, the sheet metal member 50 is torn along the fracture groove 52 and plastically deformed downstream, and the opening area of the second water passage hole 51 is widened. Then, the clogging is eliminated and a large amount of water can pass through the sheet metal member 50, so that the internal pressure of the water pipe 11 decreases. Thereby, damage to the water pipe 11 and water leakage due to clogging of the mixer 10 can be prevented. Not only clogging of the second water passage hole 51 but also when water is excessively supplied to the mixer 10, the sheet metal member 50 is broken by water pressure as described above, and the water pipe 11 is damaged or leaked. It can be prevented in advance.

ところで、各ミキサー10,10は、第2通水孔51の孔径(開口面積)を異ならせた複数種類の板金部材50をノズル55に対して着脱可能に備えており、製造するガス溶存水中の水素ガス溶存量の目標値に応じて、複数種類の中から板金部材50を選択可能となっている。本実施形態では、前記第1のガス溶存水GW1(水素ガス溶存量0.5〜1.2ppm)を生成するために、第1系統の生成ライン11Aのミキサー10には孔径3.0mmの第2通水孔51を有した板金部材50が組み付けられており、前記第2のガス溶存水GW2(水素ガス溶存量1.3ppm以上)を生成するために、第2系統の生成ライン11Bのミキサー10には孔径2.0mmの第2通水孔51を有した板金部材50が組み付けられている。ここで、第2通水孔51の孔径を小さくした方が水素ガス溶存量が高くなるという点については、後述する実験で実証された。   By the way, each mixer 10 and 10 is equipped with several types of sheet-metal members 50 which varied the hole diameter (opening area) of the 2nd water flow hole 51 with respect to the nozzle 55, and in the gas dissolved water to manufacture The sheet metal member 50 can be selected from a plurality of types according to the target value of the dissolved hydrogen gas amount. In the present embodiment, in order to generate the first gas-dissolved water GW1 (hydrogen gas dissolved amount 0.5 to 1.2 ppm), the mixer 10 of the first generation line 11A has a first hole diameter of 3.0 mm. A sheet metal member 50 having two water passage holes 51 is assembled, and in order to generate the second gas-dissolved water GW2 (hydrogen gas-dissolved amount 1.3 ppm or more), the mixer of the generation line 11B of the second system 10 is assembled with a sheet metal member 50 having a second water passage hole 51 having a hole diameter of 2.0 mm. Here, the fact that the hydrogen gas dissolved amount is increased when the hole diameter of the second water passage hole 51 is reduced was proved by an experiment described later.

なお、板金部材50は以下のようにして取り替えることができる。まず、ミキサー10を水配管11から取り外す。次いで、ミキサー10の流出側パイプ33から専用の回転工具(図示せず)を挿入して内部隔壁42の螺旋孔42Nとノズル55との螺合を解除し、ノズル55を筒形ボディ30から取り出す。次いで、ノズル55の連結ナット58を緩めてノズル本体56とノズルヘッド57とに分解し、破壊された板金部材50の代わりに新品の板金部材50をセットする。そしてノズル本体56とノズルヘッド57とを再び螺合すると、それらノズル本体56とノズルヘッド57との間に板金部材50の外周縁が挟まれて、ノズル55の内部に固定される。最後に、ノズル55を流出側パイプ33から挿入して、回転工具により内部隔壁42の螺旋孔42Nに螺合する。以上で、板金部材50の取り替え作業は完了である。   The sheet metal member 50 can be replaced as follows. First, the mixer 10 is removed from the water pipe 11. Next, a dedicated rotary tool (not shown) is inserted from the outflow side pipe 33 of the mixer 10 to release the screw connection between the spiral hole 42N of the internal partition wall 42 and the nozzle 55, and the nozzle 55 is taken out from the cylindrical body 30. . Next, the connection nut 58 of the nozzle 55 is loosened and disassembled into the nozzle body 56 and the nozzle head 57, and a new sheet metal member 50 is set in place of the broken sheet metal member 50. When the nozzle body 56 and the nozzle head 57 are screwed together again, the outer peripheral edge of the sheet metal member 50 is sandwiched between the nozzle body 56 and the nozzle head 57 and fixed inside the nozzle 55. Finally, the nozzle 55 is inserted from the outflow side pipe 33 and screwed into the spiral hole 42N of the internal partition wall 42 with a rotary tool. Thus, the replacement work of the sheet metal member 50 is completed.

以上が、本実施形態におけるガス溶存水製造装置100の構造の説明であって、次に作用及び効果を説明する。本実施形態のガス溶存水製造装置100が起動すると、水道水が、プレフィルター18、磁場付与装置17の順に流されて脱気装置25にて脱気される。この脱気された水が、第1及び第2系統の各生成ライン11A,11Bにそれぞれ流れ込んで、各生成ライン11A,11Bに備えた気液混合ポンプ12,12によって水素ガスと共に吸引される。ここで、水は、定流量弁29の設定に応じた所定流量(例えば、10〜20L/min)で吸引される。   The above is description of the structure of the gas dissolved water manufacturing apparatus 100 in this embodiment, and the effect | action and effect are demonstrated next. When the gas-dissolved water production apparatus 100 of the present embodiment is activated, tap water is flowed in the order of the pre-filter 18 and the magnetic field applying apparatus 17 and is deaerated by the deaerator 25. The degassed water flows into the production lines 11A and 11B of the first and second systems, respectively, and is sucked together with hydrogen gas by the gas-liquid mixing pumps 12 and 12 provided in the production lines 11A and 11B. Here, water is sucked at a predetermined flow rate (for example, 10 to 20 L / min) according to the setting of the constant flow valve 29.

一方、水素ガスは、各系統の生成ライン11A,11Bに備えたマスフローコントローラ28,28の設定に応じた所定流量で各気液混合ポンプ12,12に吸引される。詳細には、第1系統の生成ライン11Aに備えた気液混合ポンプ12には、水素ガスが100〜200[ml/min]で供給され、第2系統の生成ライン11Bに備えた気液混合ポンプ12には、水素ガスが250〜500[ml/min]で供給される。そして、各気液混合ポンプ12,12にて水素ガスと水とが攪拌混合され、水素ガスと混合された気液混合水がそれぞれミキサー10に向けて所定の圧力で圧送される。   On the other hand, hydrogen gas is sucked into the gas-liquid mixing pumps 12 and 12 at a predetermined flow rate according to the settings of the mass flow controllers 28 and 28 provided in the production lines 11A and 11B of the respective systems. Specifically, hydrogen gas is supplied at 100 to 200 [ml / min] to the gas-liquid mixing pump 12 provided in the first generation line 11A, and the gas-liquid mixing provided in the second generation line 11B. Hydrogen gas is supplied to the pump 12 at 250 to 500 [ml / min]. Then, hydrogen gas and water are stirred and mixed by each gas-liquid mixing pump 12, 12, and the gas-liquid mixed water mixed with hydrogen gas is pumped toward the mixer 10 at a predetermined pressure.

水素ガスと混合された気液混合水は、ミキサー10内に流入してミキシング壁40に衝突する。ミキシング壁40に衝突した水は、ミキシング壁40に形成された第1通水孔41に押し込められることで加圧される。   The gas-liquid mixed water mixed with the hydrogen gas flows into the mixer 10 and collides with the mixing wall 40. The water that collides with the mixing wall 40 is pressurized by being pushed into the first water passage holes 41 formed in the mixing wall 40.

ミキシング壁40の第1通水孔41を通過した水は、ミキシング壁40と内部隔壁42との間の流体通過エリア内に流入する。この流体通過エリアにおいて水にかかる圧力は減圧される。   The water that has passed through the first water passage holes 41 of the mixing wall 40 flows into the fluid passage area between the mixing wall 40 and the internal partition wall 42. The pressure applied to water in this fluid passage area is reduced.

ミキシング壁40と内部隔壁42との間の流体通過エリアに流入した水は、内部隔壁42に接続されたノズル55の内部に押し込められることで再び加圧され、ノズル55内に備えた板金部材50の第2通水孔51を通過する際にさらに加圧される。そして、板金部材50を通り過ぎると、水にかかる圧力が減圧される。このように、ミキサー10を通過する過程で、水素ガスと混合された水にかかる圧力の強弱が繰り返される。これにより、水に対する水素ガスの溶存量が高められて、水素ガス溶存量の異なる2種類のガス溶存水GW1,GW2が同時に製造される。即ち、第1系統の生成ライン11Aでは、水素ガス溶存量が0.5〜1.2ppmに調整された第1のガス溶存水GW1が生成し、第2系統の生成ライン11Bでは、水素ガス溶存量が1.3ppm以上に調整された第2のガス溶存水GW2が生成する。ここで、第1及び第2のガス溶存水GW1,GW2は、水素ガスが溶解したことで、酸化還元電位(以下「ORP」という)が何れも水道水に比較して極端に低い値(約−600mV)となっている。即ち、還元性が強くなっている。   The water flowing into the fluid passage area between the mixing wall 40 and the inner partition wall 42 is pressurized again by being pushed into the nozzle 55 connected to the inner partition wall 42, and the sheet metal member 50 provided in the nozzle 55. Further pressure is applied when passing through the second water passage hole 51. And if it passes the sheet-metal member 50, the pressure concerning water will be pressure-reduced. Thus, in the process of passing through the mixer 10, the pressure applied to the water mixed with the hydrogen gas is repeated. Thereby, the dissolved amount of hydrogen gas with respect to water is increased, and two types of gas-dissolved waters GW1 and GW2 having different hydrogen gas dissolved amounts are produced simultaneously. That is, in the first system generation line 11A, the first gas dissolved water GW1 in which the hydrogen gas dissolved amount is adjusted to 0.5 to 1.2 ppm is generated, and in the second system generation line 11B, the hydrogen gas dissolved The second gas-dissolved water GW2 whose amount is adjusted to 1.3 ppm or more is generated. Here, the first and second gas-dissolved waters GW1 and GW2 each have an extremely low value (approximately about the ORP) compared to tap water because hydrogen gas is dissolved. −600 mV). That is, the reducing property is strong.

ミキサー10を通過した直後のガス溶存水GW1,GW2中には気泡が存在することがあるが、気泡は、超音波の伝搬を妨害して洗浄効果を低下させるので、超音波洗浄の洗浄水とするには好ましくない。これに対し、本実施形態のガス溶存水製造装置100では、各系統の生成ライン11A,11Bで生成された第1及び第2のガス溶存水GW1,GW2中の気泡を脱泡装置19,19にて除去することができる。そして、各生成ライン11A,11Bに備えたバルブ24が開放されると、第1及び第2のガス溶存水GW1,GW2が、超音波洗浄装置90の1次洗浄槽91と2次洗浄槽92とに同時に供給される。これにより、各洗浄槽91,92でガス溶存水GW1,GW2をオーバーフローさせつつ洗浄を行っても、ガス溶存水GW1,GW2が不足することが防がれる。   Bubbles may exist in the gas dissolved water GW1 and GW2 immediately after passing through the mixer 10, but the bubbles interfere with the propagation of ultrasonic waves and reduce the cleaning effect. It is not preferable to. In contrast, in the gas-dissolved water production apparatus 100 of the present embodiment, the bubbles in the first and second gas-dissolved waters GW1 and GW2 generated in the generation lines 11A and 11B of the respective systems are removed from the bubbles 19 and 19. Can be removed. And if the valve | bulb 24 with which each production line 11A, 11B was opened, the 1st and 2nd gas dissolved water GW1, GW2 will be the primary washing tank 91 and the secondary washing tank 92 of the ultrasonic cleaning apparatus 90. And supplied at the same time. This prevents the gas dissolved waters GW1 and GW2 from being insufficient even if the cleaning is performed while the gas dissolved waters GW1 and GW2 are overflowed in the respective cleaning tanks 91 and 92.

なお、本実施形態のガス溶存水GW1,GW2による洗浄対象となるワークとしては、医療機器や工業用部品(例えば、半導体部品、光学系レンズ、ガラス金型、金属部品)が挙げられる。また、配管洗浄等に利用することもできる。   In addition, as a workpiece | work which becomes washing | cleaning object by gas dissolved water GW1, GW2 of this embodiment, a medical device and industrial parts (For example, a semiconductor component, an optical system lens, a glass mold, a metal component) are mentioned. It can also be used for pipe cleaning and the like.

このように本実施形態によれば、脱気装置25を途中に備えた水配管11と水素ガス供給装置13とからのガス配管14とが共に接続された第1系統の生成ライン11Aと第2系統の生成ライン11Bとのそれぞれに、気液混合ポンプ12とミキサー10とが備えられ、第1系統の生成ライン11Aに備えたミキサー10の第2通水孔51の孔径を、第2系統の生成ライン11Bに備えたミキサー10の第2通水孔51の孔径より大きくすることで、第1のガス溶存水GW1と、その第1のガス溶存水GW1よりガスの溶存量が大きい第2のガス溶存水GW2との2種類のガス溶存水を、同時に製造することができる。これにより、予備洗浄と仕上げ洗浄とに分けて洗浄を行う超音波洗浄装置90の各洗浄槽91,92に、これら2種類のガス溶存水GW1,GW2を安定供給することができる。また、水素ガスと混合する前の水を予め脱気するから、水に水素ガスを溶解させ易くなり、水素ガスの溶存量をより高めることができる。   As described above, according to the present embodiment, the first generation line 11A and the second line in which the water pipe 11 provided with the degassing device 25 and the gas pipe 14 from the hydrogen gas supply device 13 are connected together. A gas-liquid mixing pump 12 and a mixer 10 are provided in each of the generation lines 11B of the system, and the hole diameter of the second water passage hole 51 of the mixer 10 provided in the generation line 11A of the first system is set to be that of the second system. By making it larger than the hole diameter of the second water passage hole 51 of the mixer 10 provided in the generation line 11B, the second dissolved gas amount is larger than the first gas dissolved water GW1 and the first gas dissolved water GW1. Two types of gas dissolved water with gas dissolved water GW2 can be manufactured simultaneously. Thereby, these two types of gas-dissolved water GW1 and GW2 can be stably supplied to each of the cleaning tanks 91 and 92 of the ultrasonic cleaning apparatus 90 that performs cleaning separately for preliminary cleaning and finishing cleaning. Moreover, since the water before mixing with hydrogen gas is deaerated beforehand, it becomes easy to dissolve hydrogen gas in water, and the dissolved amount of hydrogen gas can be further increased.

また、第2通水孔51の孔径が異なる複数種類の板金部材50を備えて、これら板金部材50をミキサー10に対して取り替え可能としたから、板金部材50の種類を変更することで、ガス溶存水の水素ガス溶存量を変更することができる。また、板金部材50が破損した場合には、ミキサー10のその他の部品は流用し、板金部材50だけを取り替えればよいから、ランニングコストを抑えることができる。   In addition, since a plurality of types of sheet metal members 50 having different diameters of the second water passage holes 51 are provided and the sheet metal members 50 can be replaced with respect to the mixer 10, the gas can be changed by changing the type of the sheet metal members 50. The dissolved hydrogen gas amount can be changed. Further, when the sheet metal member 50 is damaged, the other components of the mixer 10 are diverted and only the sheet metal member 50 needs to be replaced, so that the running cost can be suppressed.

なお、水素ガスが溶解したガス溶存水GW1,GW2は、水道水に比較して還元性が強い(ORPが低い)ので、金属製のワークをこのガス溶存水GW1,GW2で洗浄した場合には、水道水で洗浄した場合に比較して、洗浄後の錆の発生を抑えることが可能である。   In addition, since the gas dissolved water GW1 and GW2 in which hydrogen gas is dissolved have a strong reducing property (ORP is low) compared to tap water, when a metal workpiece is washed with the gas dissolved water GW1 and GW2, Compared with the case of washing with tap water, it is possible to suppress the occurrence of rust after washing.

[実施例1]
ミキサー10の第2通水孔51の孔径と水素ガス溶存量との関係を調べるべく、以下の実験を行った。即ち、第2通水孔51の孔径を2.0〜3.0mmの範囲で変化させると共に、ミキサー10への水の供給圧力を0.8Mpa、気液混合ポンプ12への水素ガス供給量を250ml/minで一定としてガス溶存水を実際に製造し、そのガス溶存水の水素ガス溶存量を計測した。また併せて、単位時間当たりの製造量、pH、ORPも計測した。なお、水素ガスを溶解させる前の水(水道水)のpHは6.83、ORPは+294mVである。
[Example 1]
In order to investigate the relationship between the hole diameter of the second water flow hole 51 of the mixer 10 and the dissolved amount of hydrogen gas, the following experiment was performed. That is, while changing the hole diameter of the 2nd water flow hole 51 in the range of 2.0-3.0 mm, the supply pressure of the water to the mixer 10 is 0.8 Mpa, and the hydrogen gas supply amount to the gas-liquid mixing pump 12 is changed. Gas dissolved water was actually produced at a constant rate of 250 ml / min, and the hydrogen gas dissolved amount of the gas dissolved water was measured. In addition, the production amount per unit time, pH, and ORP were also measured. The pH of water (tap water) before dissolving hydrogen gas is 6.83, and ORP is +294 mV.

[実験結果]
[Experimental result]

表1に示すように、第2通水孔51の孔径を小さくするに従って、水素ガス溶存量は増加した。具体的には孔径3.0mmのときに最小値の1.145ppmとなり、孔径2.0mmのときに最大値の1.431ppmとなった。ここで、孔径を2.8mm以下とした場合に、水素ガス溶存量は1.3ppm以上となることが分かった。   As shown in Table 1, as the diameter of the second water passage hole 51 was reduced, the dissolved hydrogen gas amount increased. Specifically, the minimum value was 1.145 ppm when the hole diameter was 3.0 mm, and the maximum value was 1.431 ppm when the hole diameter was 2.0 mm. Here, it was found that the dissolved hydrogen gas amount was 1.3 ppm or more when the pore diameter was 2.8 mm or less.

ガス溶存水の単位時間当たりの製造量は、第2通水孔51の孔径を大きくするに従って増加することが分かった。具体的には、孔径を最小の2.0mmとした場合には、1分間当たりの製造量が5.5Lであったのに対し、孔径を最大の3.0mmとした場合には、1分間当たりの製造量が2倍の11.0Lとなった。   It was found that the production amount of gas dissolved water per unit time increases as the diameter of the second water passage hole 51 is increased. Specifically, when the hole diameter is the minimum 2.0 mm, the production amount per minute was 5.5 L, whereas when the hole diameter is the maximum 3.0 mm, 1 minute. The production amount per unit was doubled to 11.0 L.

ガス溶存水のORPは、第2通水孔51の孔径に拘わらず、殆ど一定(−592〜−609mV)であった。また、pHは、第2通水孔51の孔径に拘わらず水素ガスを溶解する前の水(水道水)より上昇したが、いずれも、ほぼ中性を維持していた。詳細には、孔径3.0mmのときにpH7.40であり、それ以外の孔径では、ほぼ一定(pH7.90〜7.98)であった。   The ORP of the gas-dissolved water was almost constant (−592 to −609 mV) regardless of the diameter of the second water passage hole 51. Moreover, although pH rose from the water (tap water) before melt | dissolving hydrogen gas irrespective of the hole diameter of the 2nd water flow hole 51, all were maintaining neutrality. Specifically, the pH was 7.40 when the pore diameter was 3.0 mm, and the other pore diameters were almost constant (pH 7.90 to 7.98).

[他の実施形態]
本発明は、前記実施形態に限定されるものではなく、例えば、以下に説明するような実施形態も本発明の技術的範囲に含まれ、さらに、下記以外にも要旨を逸脱しない範囲内で種々変更して実施することができる。
[Other Embodiments]
The present invention is not limited to the above-described embodiment. For example, the embodiments described below are also included in the technical scope of the present invention, and various other than the following can be made without departing from the scope of the invention. It can be changed and implemented.

(1)上記第1及び第2実施形態では、磁場付与装置17及びプレフィルタ18を備えていたが、これらを備えていなくてもよい。   (1) In the first and second embodiments, the magnetic field applying device 17 and the prefilter 18 are provided, but these may not be provided.

(2)上記実施形態では、各系統の生成ライン11A,11Bには、それぞれミキサー10が1つだけ備えられていたが、複数のミキサー10を直列または並列に接続してもよい。   (2) In the above embodiment, only one mixer 10 is provided in each of the generation lines 11A and 11B of each system, but a plurality of mixers 10 may be connected in series or in parallel.

(3)水道水を蓄える貯水槽を設けて、ここに水配管11を接続してもよい。このようにすれば、気液混合ポンプ12に供給される水の圧力、さらには、ミキサー10にかかる圧力が一定となり、より安定したガス溶存水を製造することが可能となる。   (3) A water storage tank for storing tap water may be provided, and the water pipe 11 may be connected thereto. In this way, the pressure of water supplied to the gas-liquid mixing pump 12 and further the pressure applied to the mixer 10 become constant, and it becomes possible to produce more stable gas-dissolved water.

(4)上記実施形態では、製造されたガス溶存水GW1,GW2は、そのまま超音波洗浄装置90に送水されていたが、生成水タンクを設けて一旦貯留するようにしてもよい。生成水タンクは密閉することが好ましいが開放していてもよい。これにより、生成水タンク内に水素ガスが滞留することが防がれる。   (4) In the above embodiment, the manufactured gas dissolved water GW1 and GW2 are directly supplied to the ultrasonic cleaning device 90, but may be temporarily stored by providing a generated water tank. The product water tank is preferably sealed but may be open. This prevents hydrogen gas from staying in the generated water tank.

(5)採水管21に備えた溶存水素計の計測値に基づいて、水素ガスの供給量を自動制御する制御装置を備えていてもよい。   (5) A control device that automatically controls the supply amount of hydrogen gas based on the measured value of the dissolved hydrogen meter provided in the water sampling pipe 21 may be provided.

(6)生成したガス溶存水GW1,GW2を環流させるための循環配管を設けて、ガス溶存水GW1,GW2がミキサー10を複数回通過するような構成としてもよい。   (6) A circulation pipe for circulating the generated gas dissolved water GW1 and GW2 may be provided so that the gas dissolved water GW1 and GW2 pass through the mixer 10 a plurality of times.

(7)気液混合ポンプ12より上流側に、水道水中の残留塩素を除去するための脱塩素装置と、金属イオンを除去するための軟水装置とを備えてもよい。   (7) A dechlorination device for removing residual chlorine in tap water and a soft water device for removing metal ions may be provided upstream of the gas-liquid mixing pump 12.

(8)水に溶解させるガスは、水素ガスに限定するものではなく、例えば、酸素、オゾン、二酸化炭素、アンモニア等でもよい。   (8) The gas dissolved in water is not limited to hydrogen gas, but may be oxygen, ozone, carbon dioxide, ammonia, or the like.

(9)上記実施形態ではガス溶存量の異なる2種類のガス溶存水を製造可能なガス溶存水製造装置100を例示したが、気液混合ポンプ及びミキサーを3組以上設けて3系統以上の生成ラインを構成し、ガス溶存量の異なる3種類以上のガス溶存水を製造可能としてもよい。   (9) In the above embodiment, the gas dissolved water production apparatus 100 capable of producing two types of gas dissolved water having different amounts of dissolved gas is exemplified. However, three or more gas-liquid mixing pumps and mixers are provided to generate three or more systems. It is good also as a line being comprised and being able to manufacture three or more types of gas dissolved water from which a gas dissolved amount differs.

本発明の一実施形態に係るガス溶存水製造装置の概念図The conceptual diagram of the gas dissolved water manufacturing apparatus which concerns on one Embodiment of this invention. ミキサーの側断面図Cross section of mixer (A)ミキシング壁の平面図、(B)ミキシング壁の断面図(A) Plan view of mixing wall, (B) Cross section of mixing wall (A)内部隔壁の平面図、(B)内部隔壁の断面図(A) Plan view of internal partition, (B) Cross section of internal partition (A)板金部材の平面図、(B)板金部材の断面図(A) Plan view of sheet metal member, (B) Cross section of sheet metal member (A)破断した板金部材の平面図、(B)図6(A)におけるX−X断面図(A) Plan view of a broken sheet metal member, (B) XX sectional view in FIG. 6 (A)

符号の説明Explanation of symbols

10 ミキサー
11A 第1系統の生成ライン
11B 第2系統の生成ライン
12 気液混合ポンプ
19 脱泡装置
25 脱気装置
40 ミキシング壁(流体圧縮部)
50 板金部材(流体圧縮部)
100 ガス溶存水製造装置
GW1 第1のガス溶存水
GW2 第2のガス溶存水
DESCRIPTION OF SYMBOLS 10 Mixer 11A 1st generation line 11B 2nd generation line 12 Gas-liquid mixing pump 19 Deaerator 25 Deaerator 40 Mixing wall (fluid compression part)
50 Sheet metal member (fluid compression part)
100 Gas dissolved water production apparatus GW1 1st gas dissolved water GW2 2nd gas dissolved water

Claims (6)

水道管に接続され、脱気した水を生成する脱気装置と、
前記水に溶解するためのガスを供給するガス供給装置と、
前記脱気装置からの水の供給路と前記ガス供給装置からのガスの供給路とが共に接続されて、前記ガスと前記水との気液混合水を生成する気液混合ポンプと、
前記気液混合ポンプからの気液混合水の供給路に接続されると共に、流路径を絞った流体圧縮部と流路径を広げた流体解放部と有して前記水に対する前記ガスの溶存量を高めることが可能なミキサーとを備え、前記水に前記ガスを溶解してガス溶存水を製造するためのガス溶存水製造装置において、
前記気液混合ポンプを複数設けると共に、前記脱気装置からの水の供給路及び前記ガス供給装置からのガスの供給路を、それぞれ複数に分岐して前記各気液混合ポンプに接続し、前記複数の気液混合ポンプの下流側に設けた複数の前記ミキサーにおける前記流体圧縮部の流路径を異ならせて前記溶存量が異なる複数種類のガス溶存水を同時に製造可能としたことを特徴とするガス溶存水製造装置。
A degassing device connected to a water pipe to generate degassed water;
A gas supply device for supplying a gas for dissolving in the water;
A gas-liquid mixing pump that connects a water supply path from the degassing apparatus and a gas supply path from the gas supply apparatus together to generate gas-liquid mixed water of the gas and the water;
The gas-liquid mixed water from the gas-liquid mixing pump is connected to a supply path, and has a fluid compression section with a narrowed flow path diameter and a fluid release section with a wide flow path diameter to reduce the dissolved amount of the gas with respect to the water. A gas-dissolved water production apparatus for producing gas-dissolved water by dissolving the gas in the water,
A plurality of the gas-liquid mixing pumps are provided, and a water supply path from the deaeration device and a gas supply path from the gas supply device are respectively branched into a plurality and connected to the gas-liquid mixing pumps, A plurality of types of gas-dissolved waters having different dissolved amounts can be produced simultaneously by changing the flow path diameters of the fluid compression portions in the plurality of mixers provided downstream of a plurality of gas-liquid mixing pumps. Gas dissolved water production equipment.
前記ガスは、水素ガスであることを特徴とする請求項1に記載のガス溶存水製造装置。   The gas-dissolved water production apparatus according to claim 1, wherein the gas is hydrogen gas. 前記気液混合ポンプを2つ設けて、一方の気液混合ポンプを含む第1系統の生成ラインで、前記水素ガスの溶存量が0.5〜1.2ppmのガス溶存水を製造すると共に、他方の気液混合ポンプを含む第2系統の生成ラインで、前記水素ガスの溶存量が1.3ppm以上のガス溶存水を製造するように構成したことを特徴とする請求項2に記載のガス溶存水製造装置。   Two gas-liquid mixing pumps are provided, and in the first generation line including one gas-liquid mixing pump, gas-dissolved water having a dissolved hydrogen gas content of 0.5 to 1.2 ppm is produced. 3. The gas according to claim 2, wherein gas dissolved water having a dissolved amount of the hydrogen gas of 1.3 ppm or more is produced in a generation line of a second system including the other gas-liquid mixing pump. Dissolved water production equipment. 前記ガス供給装置からのガスの供給路のうち、分岐部分より下流側にそれぞれマスフロコントローラを設け、前記第1系統の生成ラインの前記気液混合ポンプへの水に対する水素ガスの供給量を100〜200[ml/min]とし、前記第2系統の生成ラインの前記気液混合ポンプへの水に対するガスの供給量を250〜500[ml/min]としたことを特徴とする請求項3に記載のガス溶存水製造装置。   In the gas supply path from the gas supply device, a mass flow controller is provided on the downstream side of the branch portion, and the amount of hydrogen gas supplied to water to the gas-liquid mixing pump of the generation line of the first system is set to 100. The gas supply amount to the gas-liquid mixing pump of the second system generation line is 250 to 500 [ml / min], and is set to 250 to 500 [ml / min]. The gas dissolved water manufacturing apparatus of description. 前記各ミキサーより下流側に、水中の気泡を除去するための脱泡装置を備えたことを特徴とする請求項3又は4に記載のガス溶存水製造装置。   The gas-dissolved water production apparatus according to claim 3 or 4, further comprising a defoaming device for removing bubbles in water downstream from each mixer. 前記各ミキサーに、前記流路径が異なる前記流体圧縮部が取り替えて取り付け可能としたことを特徴とする請求項1乃至5の何れかに記載のガス溶存水製造装置。   The gas-dissolved water production apparatus according to any one of claims 1 to 5, wherein the fluid compression unit having a different flow path diameter can be replaced and attached to each mixer.
JP2006301893A 2006-11-07 2006-11-07 Gas dissolved water production equipment Expired - Fee Related JP4557262B2 (en)

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