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JP4570182B2 - Laser processing equipment - Google Patents
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JP4570182B2 - Laser processing equipment - Google Patents

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Publication number
JP4570182B2
JP4570182B2 JP18684599A JP18684599A JP4570182B2 JP 4570182 B2 JP4570182 B2 JP 4570182B2 JP 18684599 A JP18684599 A JP 18684599A JP 18684599 A JP18684599 A JP 18684599A JP 4570182 B2 JP4570182 B2 JP 4570182B2
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Prior art keywords
laser
pattern forming
diffracted light
forming mechanism
laser beam
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JP18684599A
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JP2001018085A (en
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山 博 隆 小
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Description

【0001】
【発明の属する技術分野】
本発明はレーザ光により被加工物を加工するレーザ加工に係り、とりわけ、レーザ発振器から出力されたレーザ光を結像させて被加工物を加工するレーザ加工装置に関する。
【0002】
【従来の技術】
従来から、レーザ発振器から出力されたレーザ光を結像させて被加工物を加工する方法として、パターン成形機構により所定の断面形状のレーザビームを成形した後、この成形されたレーザビームを被加工物上に結像させ、被加工物上に任意形状の結像パターン(レーザ加工スポット)を形成する方法が知られている。
【0003】
【発明が解決しようとする課題】
しかしながら、上述した従来のレーザ加工方法では、レーザ光がパターン成形機構のレーザ透過窓を透過するときにレーザ透過窓にて回折が生じるので、レーザビームの結像位置にて干渉が引き起こされ、被加工物上での結像パターンに強度分布が生じることとなる。なお、この強度分布は、結像レンズが同一である場合には、レーザ光の波長とレーザ透過窓の寸法とに応じてピッチが変化する周期的な干渉縞として現れ、被加工物上でレーザ光のエネルギー密度に周期的に高低が生じることとなる。
【0004】
このため、上述した従来のレーザ加工方法では、被加工物上で結像パターンの強度分布の高い部分では加工が十分に行われるが、強度分布が低い部分では加工が不十分または全く加工が行われないという状態(レーザ加工の不均一性)が発生し、被加工物上でレーザ加工の均一性を満たすような適正な加工条件を見つけ出すことが困難となり、特に被加工物や光学系の種類等によっては適正な加工条件が見つけ出すことが全くできなくなるという問題がある。
【0005】
また、上述した従来のレーザ加工方法では、レーザ光を被加工物まで効率良く導くためにパターン成形機構のレーザ透過窓の寸法をレーザビームの断面形状の大きさに比べて可能な限り大きくとる必要がある。そして、このようにしてレーザ透過窓の寸法を大きく保った状態で被加工物上で微小な結像パターンを形成する場合を考えると、結像倍率を小さくする必要から、結像レンズを短焦点としたり、パターン成形機構と結像レンズとの間の距離を大きくとったりする必要がある。
【0006】
このため、上述した従来のレーザ加工方法では、結像レンズを短焦点とすることにより、レーザビームの結像位置での焦点深度が極めて浅くなり、被加工物を結像位置に正確に配置することが困難となり、加工の信頼性が低下してしまうという問題がある。また、結像レンズを短焦点とし、パターン成形機構と結像レンズとの間の距離を大きくとることにより、結像レンズの必要口径の増大や、結像レンズ等の光学部品の複雑化等を招き、装置の大型化およびコストの増大等を招いてしまうという問題がある。
【0007】
本発明はこのような点を考慮してなされたものであり、被加工物上でレーザ加工を均一に行うことができるとともに、加工の信頼性を向上させ、かつ装置の小型化およびコストの低減等を容易に実現することができるレーザ加工装置を提供することを目的とする。
【0008】
【課題を解決するための手段】
本発明による解決手段は、レーザ光を出力するレーザ発振器と、前記レーザ発振器から出力されたレーザ光を成形して所定の断面形状のレーザビームを形成するパターン成形機構と、前記パターン成形機構で成形されたレーザビームを被加工物上に結像させて該被加工物上に前記レーザビームの断面形状に対応する形状のレーザ加工スポットを形成する結像レンズと、前記パターン成形機構で成形されたレーザビームに含まれる回折光のうち高次の回折光の一部を除去する高次回折光除去機構と、前記レーザ発振器と前記パターン成形機構との間に配置され前記レーザ発振器から出力されたレーザ光を集光させる集光レンズとを備え、前記高次回折光除去機構が、前記パターン成形機構と前記結像レンズとの間に配置されていることを特徴とするレーザ加工装置である。
【0009】
なお、上述した解決手段において前記パターン成形機構は前記レーザ発振器から出力されたレーザ光を遮蔽する遮蔽部材からなり、この遮蔽部材はレーザ光の一部のみを透過させるレーザ透過窓を有することが好ましい。さらに、前記高次回折光除去機構は前記パターン成形機構で成形されたレーザビームを遮蔽する遮蔽部材からなり、この遮蔽部材はレーザビームに含まれる回折光のうち低次の回折光のみを透過させるレーザ透過窓を有することが好ましい。ここで、前記パターン成形機構および前記高次回折光除去機構は前記遮蔽部材の前記レーザ透過窓の形状および寸法を変化させる透過窓可変機構を有することが好ましい。なお、前記遮蔽部材は前記結像レンズを保持するホルダとしてもよい。
上述した解決手段によれば、パターン成形機構で成形されたレーザビームに含まれる回折光のうち高次の回折光を遮蔽して低次の回折光のみを透過させるようにしているので、レーザビームの結像位置での干渉の影響を抑えることができ、結像パターンの内部に不均一な強度分布が生じることを効果的に防止することができる。また、パターン成形機構で成形されたレーザビームに含まれる低次の回折光の回折広がり角を大きくとることができるので、高次回折光除去機構のレーザ透過窓も大きくとることができ、隣り合った次数の回折光を分離するためのレーザ透過窓の寸法の調整を容易かつ簡易に行うことができる。
【0010】
また、レーザ発振器から出力されたレーザ光を集光レンズにより集光させることにより、パターン成形機構でのレーザ光の透過率を向上させることができ、パターン成形機構によるレーザ光の損失を抑えて被加工物の加工効率を向上させることができる。
【0011】
さらに、レーザ発振器から出力されたレーザ光を集光レンズにより集光させることにより、被加工物上で微小な結像パターンを形成する場合でも、結像倍率を大きくとることが可能となり、結像レンズを短焦点としたり、パターン成形機構と結像レンズとの間の距離を大きくとったりする必要がなくなる。このため、レーザビームの結像位置での焦点深度を深くして加工の信頼性を向上させるとともに、結像レンズの必要口径の増大や、結像レンズ等の光学部品の複雑化等を防止して装置の小型化およびコストの低減等を容易に実現することができる。
【0012】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態について説明する。
【0013】
図1は本発明によるレーザ加工装置の一実施の形態の構成を示す図である。図1に示すように、レーザ加工装置は、レーザ光Lを出力するレーザ発振器1と、レーザ発振器1から出力されたレーザ光Lを成形して所定の断面形状のレーザビームL1を形成するパターン成形機構2と、パターン成形機構2で成形されたレーザビームL1を被加工物6上に結像させて該被加工物6上にレーザビームL1の断面形状と相似形をなす形状の結像パターン(レーザ加工スポット)を形成する結像レンズ3と、パターン成形機構2と結像レンズ3との間に配置されパターン成形機構2で成形されたレーザビームL1に含まれる回折光のうち高次の回折光を除去する高次回折光除去機構4とを備えている。
【0014】
ここで、パターン成形機構2は、レーザ発振器1から出力されたレーザ光を遮蔽する遮蔽部材からなり、レーザ光の一部のみを透過させるレーザ透過窓2aを有している。また、高次回折光除去機構4は、パターン成形機構2で成形されたレーザビームL1を遮蔽する遮蔽部材からなり、レーザビームL1に含まれる回折光のうち低次の回折光のみを透過させるレーザ透過窓4aを有している。
【0015】
なお、レーザ発振器1とパターン成形機構2との間には、レーザ発振器1から出力されたレーザ光Lを集光させる集光レンズ5が設けられている。
【0016】
次に、このような構成からなる本実施の形態の作用について、被加工物6上に正方形の結像パターンを形成する場合を例に挙げて説明する。なおここでは、説明を簡略化するため、結像レンズ3および集光レンズ5等の光学部品は収差等が全くない理想光学系であるとし、光軸La方向の厚さは無視できるものとする。
この場合には、パターン成形機構2として、被加工物6上に形成される結像パターンの形状と相似形をなす正方形のレーザ透過窓2aを有する遮蔽部材を設け、レーザ透過窓2aの中心が光軸La上でかつ集光レンズ5の焦点位置にくるよう配置する。
【0017】
ここで例えば、レーザ光Lのビーム径が3mm、広がり角が1mrad、波長が0.5μm、被加工物6上での結像パターン(正方形)の一辺が100μmである場合を想定する。この場合には、パターン成形機構2のレーザ透過窓2aが一辺100μmの正方形であるとすると、レーザ発振器1から出力されたレーザ光Lは、集光レンズ5によって集光された後、パターン成形機構2のレーザ透過窓2aを透過して断面形状が正方形のレーザビームとして成形され、またレーザ光Lはパターン成形機構2のレーザ透過窓2aで回折される。なおこのとき、集光レンズ5の焦点距離が150mmである場合を想定すると、パターン成形機構2のレーザ透過窓2aにてそのスポット径はレーザ透過窓2aに外接する径とほぼ等しい約150μmとなる。
【0018】
なお、このような回折はフラウンホーファ近似を用いて次のように定式化することができる。すなわち、パターン成形機構2のレーザ透過窓2aの形状(正方形)の一辺の長さをa、レーザ光Lの波長をλとすると、零次光の回折広がり角の零値幅dは、d=2×λ/a(rad)となり、λ/aの値に比例して干渉縞の暗線のピッチが変更されることとなる。なお、上述した例では、λ=0.5μm、a=100μmであるので、零次光の回折広がり角は零値幅で10mradとなり、レーザビームL1に含まれる回折光の強度は、光軸Laから12.3mrad(1次)、17.35mrad(2次)、22.4mrad(3次)、…の角度の位置で極大となる。
【0019】
図2(a)(b)はパターン成形機構2で成形されたレーザビームL1に含まれる回折光のパターンを模式的に示す図である。このうち、図2(a)はレーザ透過窓2aの寸法が大きい場合の回折光のパターンを示しており、この場合には、零次光の回折広がり角が狭くなり、また各次数の回折光のピッチも狭くなる(図2(a)参照)。これに対し、図2(b)はレーザ透過窓2aの寸法が小さい場合の回折光のパターンを示しており、この場合には、零次光の回折広がり角が十分な大きさとなり、また各次数の回折光のピッチも十分な大きさとなる(図2(b)参照)。なお、上述した例のようにレーザ透過窓2aが一辺100μmの正方形である場合には、図2(b)に示すようなパターンとなり、高次回折光除去機構4のレーザ透過窓4aにより、隣り合った次数の回折光を確実に分離することが可能となる。
【0020】
パターン成形機構2で成形されたレーザビームLは、高次回折光除去機構4へ導かれ、レーザビームL1に含まれる高次の回折光が遮蔽されて低次の回折光(零次の回折光を含む)のみがレーザ透過窓4aを通して透過される。また、高次回折光除去機構4で高次の回折光が除去されたレーザビームL1は結像レンズ3に導かれ、被加工物6上にレーザビームL1の断面形状と相似形をなす形状の結像パターンが結像される。
【0021】
なお、高次回折光除去機構4で除去される回折光の次数は、高次回折光除去機構4のパターン成形機構2からの距離およびレーザ透過窓4aの寸法等を適宜調整することにより、例えば3〜4次以上の範囲で任意に選択することができる。
具体的には例えば、レーザビームL1に含まれる回折光のうち2次の回折光までを透過させて被加工物6上に結像させる場合には、パターン成形機構2から100mmだけ離間した位置に一辺2mmの正方形のレーザ透過窓4aを有する高次回折光除去機構4を配置し、さらにその直ぐ後段に焦点距離が50mmの結像レンズ3を配置するようにするとよい。これにより、2次の回折光までを含むレーザビームL1を被加工物6上に結像する等倍結像の光学系が得られ、結像レンズ3から100mmの後段の位置にて一辺100μmの正方形の結像パターンを得ることができる。
【0022】
図3(a)(b)(c)は被加工物の表面パターンを模式的に示す図である。
このうち、図3(a)は図1に示すレーザ加工装置で加工された被加工物の表面パターンを示しており、この場合には、結像パターンの内部でほぼ均一な強度分布が得られた。これに対し、図3(b)(c)は高次回折光除去機構4を用いない場合の比較例を示している。このうち、図3(b)はパターン生成機構2のレーザ透過窓2aの寸法が大きい場合を示しており、この場合には、結像パターンの内部に細かな強弱パターンが現れた。また、図3(c)はパターン生成機構2のレーザ透過窓2aの寸法が小さい場合を示しており、この場合には、図3(b)に比べて結像パターンの内部の強弱パターンの密度は減少したが、図3(b)に比べてより粗い強弱パターンが現れた。
【0023】
このように本実施の形態によれば、パターン成形機構2から所定距離だけ離間した位置に高次回折光除去機構4を配置し、パターン成形機構2で成形されたレーザビームL1に含まれる回折光のうち高次の回折光を遮蔽して低次の回折光のみを透過させるようにしているので、レーザビームL1の結像位置での干渉の影響を抑えることができ、被加工物6上にて結像される結像パターンの内部に不均一な強度分布が生じることを効果的に防止することができる。
【0024】
また本実施の形態によれば、パターン成形機構2の前段に集光レンズ5を配置し、レーザ発振器1から出力されたレーザ光Lのスポット径をパターン成形機構2のレーザ透過窓2aに外接する径程度まで集光させるようにしているので、パターン成形機構2でのレーザ光Lの透過率を向上させることができ、パターン成形機構2のレーザ透過窓2aが小さな寸法を有している場合でも、パターン成形機構2によるレーザ光Lの損失を抑えて被加工物6の加工効率を向上させることができる。なおこのとき、レーザ発振器1から出力されたレーザ光Lを集光レンズ5により集光させることにより、パターン成形機構2で成形されたレーザビームL1に含まれる低次の回折光の回折広がり角を大きくとることができるので、高次回折光除去機構4のレーザ透過窓4aも大きくとることができ、隣り合った次数の回折光を分離するためのレーザ透過窓4aの寸法の調整を容易かつ簡易に行うことができる。
【0025】
さらに本実施の形態によれば、レーザ発振器1から出力されたレーザ光Lを集光レンズ5により集光させることにより、パターン成形機構2のレーザ透過窓2aの寸法を小さくすることができるので、被加工物6上で微小な結像パターンを形成する場合でも、結像倍率を大きくすることが可能となり、結像レンズ3を短焦点としたり、パターン成形機構2と結像レンズ3との間の距離を大きくとったりする必要がなくなる。このため、レーザビームL1の結像位置での焦点深度を深くして加工の信頼性を向上させるとともに、結像レンズ3の必要口径の増大や、結像レンズ3等の光学部品の複雑化等を防止して装置の小型化およびコストの低減等を容易に実現することができる。
【0026】
なお、上述した実施の形態においては、パターン成形機構2および高次回折光除去機構4のレーザ透過窓2a,4aの形状および寸法を固定としているが、可変スリットや可変絞り等の機構(透過窓可変機構)によりレーザ透過窓の形状および寸法を変化させるようにしてもよい。
【0027】
また、上述した実施の形態においては、パターン成形機構2および高次回折光除去機構4のレーザ透過窓2a,4aの形状を正方形としているが、これに限らず、任意の形状を採用することができる。また、高次回折光除去機構4のレーザ透過窓4aの形状はパターン成形機構2のレーザ透過窓2aの形状と同一である必要はなく、レーザビームL1に含まれる高次の回折光を除去できる限りにおいて任意の形状を採用することができる。
【0028】
さらに、上述した実施の形態においては、高次回折光除去機構4がパターン成形機構2と結像レンズ3との間に配置されているが、これに限らず、結像レンズ3と被加工物6との間に配置することも可能である。
【0029】
さらにまた、上述した実施の形態においては、高次回折光除去機構4を結像レンズ3とは独立した部材としているが、結像レンズ3を保持するホルダ(図示せず)を高次回折光除去機構4として用いるようにしてもよい。また、結像レンズ3の断面形状がパターン成形機構2で生じた回折光のうち低次の回折光のみを受け入れるのに適した寸法(口径)を有している場合には、結像レンズ3へのレーザビームL1の入射および非入射を利用して高次回折光除去機構4の機能をも果たすようにすることも可能である。
【0030】
なお、上述した実施の形態においては、パターン成形機構2および高次回折光除去機構4のレーザ透過窓2a,4aの形状および寸法、各光学部品間の距離、および結像レンズ3の焦点距離等について具体的な数値を上げて説明したが、これらはあくまでも一例として挙げたものであり、レーザ発振器1の特性や結像倍率、加工内容等に応じて適宜選択することが可能であることは当然である。また、各光学部品の数等もあくまでも一例として挙げたものであり、例えばパターン成形機構2および高次回折光除去機構4等を複数設けるようにしたり、結像レンズ3を複数設けるようにしてもよい。
【0031】
なお、上述した実施の形態においては、集光レンズ5により、レーザ発振器1から出力されたレーザ光Lのスポット径をパターン成形機構2のレーザ透過窓2aに外接する径程度まで集光させるようにしているが、被加工物6上での結像パターンの内部の強度分布の均一性がどの程度要求されるかに応じてスポット径の大きさを増減するようにしてもよい。
【0032】
【発明の効果】
以上説明したように本発明によれば、被加工物上でレーザ加工を均一に行うことができるとともに、加工の信頼性を向上させ、かつ装置の小型化およびコストの低減等を容易に実現することができる。
【図面の簡単な説明】
【図1】本発明によるレーザ加工装置の一実施の形態を示す概略図。
【図2】パターン成形機構で成形されたレーザビームに含まれる回折光のパターンを示す図。
【図3】被加工物の表面パターンを示す図。
【符号の説明】
1 レーザ発振器
2 パターン成形機構
2a レーザ透過窓
3 結像レンズ
4 高次回折光除去機構
4a レーザ透過窓
5 集光レンズ
6 被加工物
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to laser processing for processing a workpiece by laser light, and more particularly to a laser processing apparatus for processing a workpiece by forming an image of laser light output from a laser oscillator.
[0002]
[Prior art]
Conventionally, as a method of processing a workpiece by forming an image of laser light output from a laser oscillator, a laser beam having a predetermined cross-sectional shape is formed by a pattern forming mechanism, and then the formed laser beam is processed. A method is known in which an image is formed on an object and an arbitrarily formed image pattern (laser processing spot) is formed on the workpiece.
[0003]
[Problems to be solved by the invention]
However, in the above-described conventional laser processing method, diffraction occurs in the laser transmission window when the laser beam passes through the laser transmission window of the pattern forming mechanism, so that interference is caused at the imaging position of the laser beam and the object is covered. An intensity distribution is generated in the imaging pattern on the workpiece. Note that this intensity distribution appears as periodic interference fringes whose pitch changes according to the wavelength of the laser beam and the size of the laser transmission window when the imaging lenses are the same, and the laser beam is reflected on the workpiece. The energy density of light will periodically rise and fall.
[0004]
For this reason, in the conventional laser processing method described above, processing is sufficiently performed at a portion where the intensity distribution of the imaging pattern is high on the workpiece, but processing is insufficient or not performed at all at a portion where the intensity distribution is low. It is difficult to find the proper processing conditions that satisfy the uniformity of laser processing on the workpiece, especially the type of workpiece or optical system. There is a problem that appropriate processing conditions cannot be found at all.
[0005]
In the conventional laser processing method described above, the size of the laser transmission window of the pattern forming mechanism needs to be as large as possible compared with the size of the cross-sectional shape of the laser beam in order to efficiently guide the laser beam to the workpiece. There is. Considering the case where a fine imaging pattern is formed on the workpiece while keeping the size of the laser transmission window large in this way, the imaging lens needs to be short-focused because the imaging magnification needs to be reduced. It is necessary to increase the distance between the pattern forming mechanism and the imaging lens.
[0006]
For this reason, in the conventional laser processing method described above, the focal length of the laser beam at the imaging position becomes extremely shallow by setting the imaging lens to a short focal point, and the workpiece is accurately placed at the imaging position. There is a problem that the processing reliability is lowered. Also, by making the imaging lens a short focal point and increasing the distance between the pattern forming mechanism and the imaging lens, the required aperture of the imaging lens is increased and the optical components such as the imaging lens are complicated. There is a problem that the size of the apparatus is increased and the cost is increased.
[0007]
The present invention has been made in consideration of such points, and can perform laser processing uniformly on a workpiece, improve processing reliability, and reduce the size and cost of the apparatus. An object of the present invention is to provide a laser processing apparatus capable of easily realizing the above.
[0008]
[Means for Solving the Problems]
The solution according to the present invention includes: a laser oscillator that outputs laser light; a pattern forming mechanism that forms a laser beam having a predetermined cross-sectional shape by forming the laser light output from the laser oscillator; and the pattern forming mechanism that forms the laser beam. An image forming lens for forming an image of the laser beam formed on the workpiece and forming a laser processing spot having a shape corresponding to the cross-sectional shape of the laser beam on the workpiece, and the pattern forming mechanism. A high-order diffracted light removing mechanism that removes a part of high-order diffracted light from the diffracted light contained in the laser beam, and a laser beam that is arranged between the laser oscillator and the pattern forming mechanism and output from the laser oscillator and a condenser lens for condensing, characterized in that the higher-order diffracted light removal mechanism is disposed between the imaging lens and the pattern forming mechanism A laser processing apparatus for.
[0009]
In the above-described solution , the pattern forming mechanism includes a shielding member that shields the laser beam output from the laser oscillator, and the shielding member has a laser transmission window that transmits only a part of the laser beam. preferable. Further, the high-order diffracted light removing mechanism includes a shielding member that shields the laser beam shaped by the pattern shaping mechanism, and this shielding member is a laser that transmits only low-order diffracted light out of the diffracted light contained in the laser beam. It is preferable to have a transmission window. Here, it is preferable that the pattern forming mechanism and the high-order diffracted light removing mechanism have a transmission window variable mechanism that changes the shape and size of the laser transmission window of the shielding member. The shielding member may be a holder that holds the imaging lens.
According to the above-described solution, since the high-order diffracted light among the diffracted light contained in the laser beam formed by the pattern forming mechanism is shielded and only the low-order diffracted light is transmitted, the laser beam The influence of interference at the image forming position can be suppressed, and the occurrence of non-uniform intensity distribution inside the image forming pattern can be effectively prevented. In addition, since the diffraction spread angle of the low-order diffracted light contained in the laser beam shaped by the pattern shaping mechanism can be increased, the laser transmission window of the high-order diffracted light removal mechanism can be increased and adjacent to each other. Adjustment of the dimension of the laser transmission window for separating the diffracted light of the order can be easily and easily performed.
[0010]
In addition, by condensing the laser light output from the laser oscillator by the condenser lens, the transmittance of the laser light in the pattern forming mechanism can be improved, and the loss of the laser light by the pattern forming mechanism is suppressed. The processing efficiency of the workpiece can be improved.
[0011]
Furthermore, by focusing the laser beam output from the laser oscillator with a condenser lens, it is possible to increase the imaging magnification even when forming a minute imaging pattern on the workpiece. There is no need to make the lens a short focal point or to increase the distance between the pattern forming mechanism and the imaging lens. For this reason, the depth of focus at the imaging position of the laser beam is increased to improve processing reliability, while preventing an increase in the required aperture of the imaging lens and complication of optical components such as the imaging lens. Therefore, it is possible to easily realize downsizing and cost reduction of the apparatus.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0013]
FIG. 1 is a diagram showing a configuration of an embodiment of a laser processing apparatus according to the present invention. As shown in FIG. 1, the laser processing apparatus includes a laser oscillator 1 that outputs a laser beam L, and a pattern forming that forms the laser beam L1 having a predetermined cross-sectional shape by shaping the laser beam L output from the laser oscillator 1. The mechanism 2 and an imaging pattern (with a shape similar to the cross-sectional shape of the laser beam L1 formed on the workpiece 6 by forming an image of the laser beam L1 formed by the pattern forming mechanism 2 on the workpiece 6. High-order diffraction among the diffracted light included in the laser beam L1 that is disposed between the imaging lens 3 that forms a laser processing spot) and the pattern forming mechanism 2 and is formed by the pattern forming mechanism 2. And a high-order diffracted light removing mechanism 4 for removing light.
[0014]
Here, the pattern forming mechanism 2 is formed of a shielding member that shields the laser beam output from the laser oscillator 1, and has a laser transmission window 2a that transmits only a part of the laser beam. The high-order diffracted light removing mechanism 4 is a shielding member that shields the laser beam L1 formed by the pattern forming mechanism 2, and transmits laser light that transmits only low-order diffracted light out of the diffracted light contained in the laser beam L1. A window 4a is provided.
[0015]
A condensing lens 5 that condenses the laser light L output from the laser oscillator 1 is provided between the laser oscillator 1 and the pattern forming mechanism 2.
[0016]
Next, the operation of the present embodiment having such a configuration will be described by taking as an example the case of forming a square imaging pattern on the workpiece 6. Here, in order to simplify the description, it is assumed that the optical components such as the imaging lens 3 and the condenser lens 5 are ideal optical systems having no aberration and the thickness in the direction of the optical axis La can be ignored. .
In this case, the pattern forming mechanism 2 is provided with a shielding member having a square laser transmission window 2a which is similar to the shape of the imaging pattern formed on the workpiece 6, and the center of the laser transmission window 2a is It arrange | positions so that it may come to the focus position of the condensing lens 5 on the optical axis La.
[0017]
Here, for example, a case is assumed where the beam diameter of the laser beam L is 3 mm, the spread angle is 1 mrad, the wavelength is 0.5 μm, and one side of the imaging pattern (square) on the workpiece 6 is 100 μm. In this case, if the laser transmission window 2a of the pattern forming mechanism 2 is a square having a side of 100 μm, the laser light L output from the laser oscillator 1 is condensed by the condenser lens 5 and then the pattern forming mechanism. The laser beam L is diffracted by the laser transmission window 2 a of the pattern forming mechanism 2. At this time, assuming that the focal length of the condenser lens 5 is 150 mm, the spot diameter in the laser transmission window 2a of the pattern forming mechanism 2 is about 150 μm, which is substantially equal to the diameter circumscribed by the laser transmission window 2a. .
[0018]
Such diffraction can be formulated using the Fraunhofer approximation as follows. That is, when the length of one side of the shape (square) of the laser transmission window 2a of the pattern forming mechanism 2 is a and the wavelength of the laser light L is λ, the zero-value width d of the diffraction spread angle of the zero-order light is d = 2. Xλ / a (rad), and the pitch of the dark lines of the interference fringes is changed in proportion to the value of λ / a. In the above example, since λ = 0.5 μm and a = 100 μm, the diffraction spread angle of the zero-order light is 10 mrad at the zero value width, and the intensity of the diffracted light included in the laser beam L1 is from the optical axis La. It becomes maximum at the position of the angle of 12.3 mrad (primary), 17.35 mrad (secondary), 22.4 mrad (third order),.
[0019]
2A and 2B are diagrams schematically showing a pattern of diffracted light included in the laser beam L1 formed by the pattern forming mechanism 2. FIG. Among these, FIG. 2A shows a pattern of diffracted light when the size of the laser transmission window 2a is large. In this case, the diffraction spread angle of the zero-order light becomes narrow, and the diffracted light of each order. Is also narrowed (see FIG. 2A). On the other hand, FIG. 2B shows a diffracted light pattern when the size of the laser transmission window 2a is small. In this case, the diffraction spread angle of the zero-order light is sufficiently large, The pitch of the diffracted light of the order is also sufficiently large (see FIG. 2B). When the laser transmission window 2a is a square having a side of 100 μm as in the above-described example, a pattern as shown in FIG. It is possible to reliably separate the diffracted light of the second order.
[0020]
The laser beam L shaped by the pattern shaping mechanism 2 is guided to the high-order diffracted light removing mechanism 4 where the high-order diffracted light contained in the laser beam L1 is shielded and low-order diffracted light (zero-order diffracted light is converted). Only) is transmitted through the laser transmission window 4a. Further, the laser beam L1 from which the higher-order diffracted light is removed by the higher-order diffracted light removing mechanism 4 is guided to the imaging lens 3 and forms a shape similar to the cross-sectional shape of the laser beam L1 on the workpiece 6. An image pattern is imaged.
[0021]
Note that the order of the diffracted light removed by the high-order diffracted light removing mechanism 4 can be adjusted to, for example, 3 to 3 by appropriately adjusting the distance from the pattern forming mechanism 2 of the high-order diffracted light removing mechanism 4 and the dimensions of the laser transmission window 4a. It can be arbitrarily selected within the range of the fourth order or higher.
Specifically, for example, in the case where an image is formed on the workpiece 6 by transmitting up to the second-order diffracted light among the diffracted light included in the laser beam L1, the pattern forming mechanism 2 is separated from the pattern forming mechanism 2 by 100 mm. The high-order diffracted light removing mechanism 4 having a square laser transmission window 4a having a side of 2 mm may be disposed, and the imaging lens 3 having a focal length of 50 mm may be disposed immediately after that. As a result, an equal-magnification imaging optical system that forms an image of the laser beam L1 including up to the second-order diffracted light on the workpiece 6 is obtained, and has a side of 100 μm at a position subsequent to the imaging lens 3 by 100 mm. A square imaging pattern can be obtained.
[0022]
FIGS. 3A, 3B and 3C are diagrams schematically showing the surface pattern of the workpiece.
Among these, FIG. 3A shows the surface pattern of the workpiece processed by the laser processing apparatus shown in FIG. 1, and in this case, a substantially uniform intensity distribution is obtained inside the imaging pattern. It was. On the other hand, FIGS. 3B and 3C show comparative examples when the high-order diffracted light removing mechanism 4 is not used. Among these, FIG. 3B shows a case where the size of the laser transmission window 2a of the pattern generation mechanism 2 is large. In this case, a fine strength pattern appears inside the imaging pattern. FIG. 3C shows a case where the size of the laser transmission window 2a of the pattern generating mechanism 2 is small. In this case, the density of the strong and weak patterns inside the imaging pattern is compared with FIG. 3B. However, a coarser and weaker pattern appeared as compared with FIG.
[0023]
As described above, according to the present embodiment, the high-order diffracted light removing mechanism 4 is arranged at a position separated from the pattern forming mechanism 2 by a predetermined distance, and the diffracted light contained in the laser beam L1 formed by the pattern forming mechanism 2 is Among them, since the higher-order diffracted light is shielded and only the lower-order diffracted light is transmitted, the influence of the interference at the imaging position of the laser beam L1 can be suppressed, and the work piece 6 is It is possible to effectively prevent a non-uniform intensity distribution from being generated inside the imaging pattern to be imaged.
[0024]
In addition, according to the present embodiment, the condenser lens 5 is disposed in front of the pattern forming mechanism 2, and the spot diameter of the laser light L output from the laser oscillator 1 is circumscribed to the laser transmission window 2 a of the pattern forming mechanism 2. Since the light is condensed to about the diameter, the transmittance of the laser light L in the pattern forming mechanism 2 can be improved, and even when the laser transmission window 2a of the pattern forming mechanism 2 has a small size. The processing efficiency of the workpiece 6 can be improved while suppressing the loss of the laser beam L due to the pattern forming mechanism 2. At this time, the laser beam L output from the laser oscillator 1 is condensed by the condenser lens 5, so that the diffraction spread angle of the low-order diffracted light included in the laser beam L 1 formed by the pattern forming mechanism 2 is reduced. Since it can be made large, the laser transmission window 4a of the high-order diffracted light removing mechanism 4 can also be made large, and the adjustment of the dimensions of the laser transmission window 4a for separating adjacent orders of diffracted light is easy and simple. It can be carried out.
[0025]
Furthermore, according to the present embodiment, by condensing the laser light L output from the laser oscillator 1 by the condenser lens 5, the size of the laser transmission window 2a of the pattern forming mechanism 2 can be reduced. Even when a fine imaging pattern is formed on the workpiece 6, the imaging magnification can be increased, the imaging lens 3 can be made into a short focal point, or between the pattern forming mechanism 2 and the imaging lens 3. There is no need to increase the distance. For this reason, the depth of focus at the imaging position of the laser beam L1 is increased to improve processing reliability, the required aperture of the imaging lens 3 is increased, and the optical components such as the imaging lens 3 are complicated. Therefore, it is possible to easily realize downsizing and cost reduction of the apparatus.
[0026]
In the above-described embodiment, the shapes and dimensions of the laser transmission windows 2a and 4a of the pattern forming mechanism 2 and the high-order diffracted light removing mechanism 4 are fixed, but a mechanism such as a variable slit or a variable aperture (transmission window variable). The shape and size of the laser transmission window may be changed by a mechanism).
[0027]
In the above-described embodiment, the shapes of the laser transmission windows 2a and 4a of the pattern forming mechanism 2 and the high-order diffracted light removing mechanism 4 are square, but the present invention is not limited to this, and any shape can be adopted. . Further, the shape of the laser transmission window 4a of the high-order diffracted light removing mechanism 4 does not have to be the same as the shape of the laser transmission window 2a of the pattern forming mechanism 2, and as long as high-order diffracted light contained in the laser beam L1 can be removed. Any shape can be adopted.
[0028]
Furthermore, in the above-described embodiment, the high-order diffracted light removing mechanism 4 is disposed between the pattern forming mechanism 2 and the imaging lens 3. However, the present invention is not limited thereto, and the imaging lens 3 and the workpiece 6 are not limited thereto. It is also possible to arrange between them.
[0029]
Furthermore, in the above-described embodiment, the high-order diffracted light removal mechanism 4 is a member independent of the imaging lens 3, but a holder (not shown) that holds the imaging lens 3 is a high-order diffracted light removal mechanism. 4 may be used. Further, when the cross-sectional shape of the imaging lens 3 has a size (aperture) suitable for receiving only low-order diffracted light among the diffracted light generated by the pattern forming mechanism 2, the imaging lens 3 It is also possible to fulfill the function of the high-order diffracted light removing mechanism 4 by utilizing the incidence and non-incidence of the laser beam L1 to the.
[0030]
In the above-described embodiment, the shapes and dimensions of the laser transmission windows 2a and 4a of the pattern forming mechanism 2 and the high-order diffracted light removing mechanism 4, the distance between the optical components, the focal length of the imaging lens 3, and the like. Although specific numerical values have been described above, these are merely examples, and it is naturally possible to appropriately select the laser oscillator 1 according to the characteristics, imaging magnification, processing content, and the like. is there. In addition, the number of optical components and the like are only given as an example. For example, a plurality of pattern forming mechanisms 2 and high-order diffracted light removing mechanisms 4 may be provided, or a plurality of imaging lenses 3 may be provided. .
[0031]
In the above-described embodiment, the condensing lens 5 condenses the spot diameter of the laser light L output from the laser oscillator 1 to a diameter that circumscribes the laser transmission window 2a of the pattern forming mechanism 2. However, the size of the spot diameter may be increased or decreased depending on the degree of uniformity of the intensity distribution inside the imaging pattern on the workpiece 6.
[0032]
【The invention's effect】
As described above, according to the present invention, laser processing can be uniformly performed on a workpiece, processing reliability is improved, and apparatus downsizing and cost reduction are easily realized. be able to.
[Brief description of the drawings]
FIG. 1 is a schematic view showing an embodiment of a laser processing apparatus according to the present invention.
FIG. 2 is a diagram showing a pattern of diffracted light included in a laser beam formed by a pattern forming mechanism.
FIG. 3 is a diagram showing a surface pattern of a workpiece.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Laser oscillator 2 Pattern shaping mechanism 2a Laser transmission window 3 Imaging lens 4 Higher order diffracted light removal mechanism 4a Laser transmission window 5 Condensing lens 6 Workpiece

Claims (7)

レーザ光を出力するレーザ発振器と、
前記レーザ発振器から出力されたレーザ光を成形して所定の断面形状のレーザビームを形成するパターン成形機構と、
前記パターン成形機構で成形されたレーザビームを被加工物上に結像させて該被加工物上に前記レーザビームの断面形状に対応する形状のレーザ加工スポットを形成する結像レンズと、
前記パターン成形機構で成形されたレーザビームに含まれる回折光のうち高次の回折光の一部を除去する高次回折光除去機構と、
前記レーザ発振器と前記パターン成形機構との間に配置され前記レーザ発振器から出力されたレーザ光を集光させる集光レンズと、を備え、
前記パターン成形機構は、前記集光レンズによってレーザ光が収束した位置に配置され、
前記高次回折光除去機構は、前記パターン成形機構と前記結像レンズとの間であって、該パターン成形機構から離れた該結像レンズ寄りに配置されていることを特徴とするレーザ加工装置。
A laser oscillator that outputs laser light;
A pattern forming mechanism for forming a laser beam having a predetermined cross-sectional shape by shaping the laser beam output from the laser oscillator;
An imaging lens that forms an image of a laser processing spot having a shape corresponding to a cross-sectional shape of the laser beam on the workpiece by imaging the laser beam formed by the pattern forming mechanism on the workpiece;
A high-order diffracted light removing mechanism for removing a part of the high-order diffracted light from the diffracted light contained in the laser beam formed by the pattern forming mechanism;
A condenser lens that is arranged between the laser oscillator and the pattern forming mechanism and condenses the laser light output from the laser oscillator, and
The pattern forming mechanism is arranged at a position where the laser beam is converged by the condenser lens,
The laser processing apparatus, wherein the high-order diffracted light removing mechanism is disposed between the pattern forming mechanism and the imaging lens and close to the imaging lens away from the pattern forming mechanism .
前記パターン成形機構は前記レーザ発振器から出力されたレーザ光を遮蔽する遮蔽部材からなり、この遮蔽部材はレーザ光の一部のみを透過させるレーザ透過窓を有することを特徴とする請求項1記載のレーザ加工装置。  2. The pattern forming mechanism includes a shielding member that shields laser light output from the laser oscillator, and the shielding member has a laser transmission window that transmits only a part of the laser light. Laser processing equipment. 前記パターン成形機構は前記遮蔽部材の前記レーザ透過窓の形状および寸法を変化させる透過窓可変機構を有することを特徴とする請求項2記載のレーザ加工装置。  The laser processing apparatus according to claim 2, wherein the pattern forming mechanism includes a transmission window variable mechanism that changes a shape and a size of the laser transmission window of the shielding member. 前記高次回折光除去機構は前記パターン成形機構で成形されたレーザビームを遮蔽する遮蔽部材からなり、この遮蔽部材はレーザビームに含まれる回折光のうち低次の回折光のみを透過させるレーザ透過窓を有することを特徴とする請求項1乃至3のいずれか記載のレーザ加工装置。  The high-order diffracted light removing mechanism includes a shielding member that shields the laser beam formed by the pattern forming mechanism, and the shielding member transmits only a low-order diffracted light out of the diffracted light contained in the laser beam. The laser processing apparatus according to claim 1, comprising: 前記高次回折光除去機構は前記遮蔽部材の前記レーザ透過窓の形状および寸法を変化させる透過窓可変機構を有することを特徴とする請求項4記載のレーザ加工装置。  The laser processing apparatus according to claim 4, wherein the high-order diffracted light removing mechanism includes a transmission window variable mechanism that changes a shape and a size of the laser transmission window of the shielding member. 前記遮蔽部材は前記結像レンズを保持するホルダであることを特徴とする請求項4記載のレーザ加工装置。  The laser processing apparatus according to claim 4, wherein the shielding member is a holder that holds the imaging lens. 請求項1乃至6のいずれか記載のレーザ加工装置により加工された被加工物。  A workpiece processed by the laser processing apparatus according to claim 1.
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