JP4577361B2 - 感光性樹脂組成物及びこれを用いた感光性エレメント - Google Patents
感光性樹脂組成物及びこれを用いた感光性エレメント Download PDFInfo
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- JP4577361B2 JP4577361B2 JP2007539827A JP2007539827A JP4577361B2 JP 4577361 B2 JP4577361 B2 JP 4577361B2 JP 2007539827 A JP2007539827 A JP 2007539827A JP 2007539827 A JP2007539827 A JP 2007539827A JP 4577361 B2 JP4577361 B2 JP 4577361B2
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- compound
- resin composition
- photosensitive
- photosensitive resin
- meth
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Images
Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/006—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/147—Polyurethanes; Polyureas
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
-
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- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
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- C08G18/72—Polyisocyanates or polyisothiocyanates
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- C08G18/75—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic
- C08G18/751—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring
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- C08G18/755—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group containing one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group having a primary carbon atom next to the isocyanate or isothiocyanate group and at least one isocyanate or isothiocyanate group linked to a secondary carbon atom of the cycloaliphatic ring, e.g. isophorone diisocyanate
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Description
上記一般式(I)中、R1は水素原子又はメチル基を示す。また、R2は炭素数1〜12のアルキル基を示し、水素原子が、水酸基、エポキシ基、ハロゲン原子等に置換されていてもよい。
−(CH2)6−O−CO−O− (II)
−(CH2)5−O−CO−O− (III)
<感光性エレメントの製造>
表1に示す各材料を所定の質量部となるように配合した溶液に対し、下記の成分を添加し、感光層形成用塗布液(感光性樹脂組成物の溶液)を得た。(B)成分の(B1)化合物として、UF−8003M(商品名、共栄社化学株式会社製、80%メチルエチルケトン溶液)65質量部(固形分)、他の光重合性化合物として、BPE−500(商品名、新中村化学工業株式会社製)20質量部、並びに、(D)成分として、ジシアンジアミド(ジャパンエポキシレジン株式会社製)1質量部をN,N−ジメチルホルムアミド3質量部(溶剤)と共に添加した。
ポンプ:日立 L−6000型(株式会社日立製作所製)、
カラム:Gelpack GL−R420 + Gelpack GL−R430 + Gelpack GL−R440(計3本)(以上商品名、日立化成工業株式会社製)、
溶離液:テトラヒドロフラン、
測定温度:室温、
流量:2.05ml/分、
検出器:日立 L−3300型RI(株式会社日立製作所製)。
FPC用基板に対して耐折性試験を以下のように行い、FPC用基板の可とう性を評価した。すなわち、表面にカバーレイを有するFPC用基板を260℃のはんだ浴中に10秒間浸漬してはんだ処理を行った後、ハゼ折りで180°折り曲げ、折り曲げた際のカバーレイのクラック発生状況を目視で観察した。評価は下記の基準で行った。
A:クラックの発生なし
B:クラックの発生あり
表面にカバーレイを有するFPC用基板を常温の2N−塩酸水溶液に30分間浸漬後、基材から永久レジストパターン開口部の染み込み及び浮きの発生状況を目視で観察し、酸性薬品に対する耐性を評価した。また、FPC用基板を2N−水酸化ナトリウム水溶液に浸漬させ、アルカリ性薬品に対する耐性を同様にして評価した。評価は下記の基準で行った。
A:染み込み及び浮きの発生なし
B:染み込み又は浮きの発生あり
カバーレイの耐めっき性を評価するために、まず、無電解ニッケル/金めっき処理を以下のようにして行った。すなわち、表面にカバーレイを有するFPC用基板に対し、脱脂(5分浸漬)、水洗、ソフトエッチング(2分浸漬)、水洗、酸洗(3分浸漬)、水洗、プレディップ(90秒浸漬)、無電解ニッケルめっき(23分処理)、水洗、無電解金めっき(15分処理)、水洗及び乾燥をこの順序で行った。なお、上記の各工程で使用した材料は以下の通りである。
脱脂:PC−455(メルテックス社製)25質量%の水溶液、
ソフトエッチング:過硫酸アンモニウム150g/Lの水溶液、
酸洗:5体積%硫酸水溶液、
無電解ニッケルめっき:ニムデンNPF−2(商品名、上村工業株式会社製)、
無電解金めっき:ゴブライトTIG−10(商品名、上村工業株式会社製)。
A:剥がれは認められない
B:剥がれがわずかに認められる
C:剥がれが多く認められる
A:もぐりは認められない
B:もぐりがわずかに認められる
C:もぐりが多く認められる
(B)成分の他の成分として、BPE−500(商品名)の代わりに、A−TMPT(商品名、新中村化学工業株式会社製)20質量部を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。
(B)成分の他の成分として、BPE−500(商品名)の代わりに、TMCH(商品名、日立化成工業株式会社製)20質量部を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。
(B)成分の(B1)化合物として、UF−8003Mの代わりにUF−TCB−50(商品名、共栄社化学株式会社製、60%メチルエチルケトン溶液)65質量部(固形分)を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。なお、UF−TCB−50(商品名)は末端にヒドロキシル基を有するポリエステル化合物、有機イソシアネート及び2−ヒドロキシエチルアクリレートを反応させて得られた光重合性化合物からなり、重量平均分子量は15000である。
(B)成分の(B1)化合物として、UF−8003Mの代わりにヒタロイド9082−95(商品名、日立化成工業株式会社製、75%メチルエチルケトン溶液)65質量部(固形分)を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。なお、ヒタロイド9082−95(商品名)は末端にヒドロキシル基を有するポリカーボネート化合物、有機イソシアネート及び2−ヒドロキシエチルアクリレートを反応させて得られた光重合性化合物からなり、重量平均分子量は4000である。
(B)成分の(B1)化合物として、UF−8003Mの代わりにUF−TC4−55(商品名、共栄社化学株式会社製、60%メチルエチルケトン溶液)65質量部(固形分)を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。なお、UF−TC4−55(商品名)は末端にヒドロキシル基を有するポリエステル化合物、有機イソシアネート及び2−ヒドロキシエチルアクリレートを反応させて得られた光重合性化合物からなり、重量平均分子量は20000である。
(B)成分の(B1)化合物を配合せずに、BPE−500(商品名)30質量部及びTMCH(商品名)50質量部を(B)成分として使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。
(B)成分の(B1)化合物を配合せずに、A−TMPT(商品名)30質量部及びTMCH(商品名)50質量部を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。
比較例3〜5では、(D)成分であるジシアンジアミドを配合せずに、それぞれ(D)成分の代替成分を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。比較例3〜5では、ジシアンジアミド1質量部の代わりにそれぞれ、5−アミノ−2−メルカプト−1,3,4−チアジアゾール1質量部、2−メルカプトベンゾイミダゾール1質量部、2,5−カルボキシ−1,2,3−ベンゾトリアゾール1質量部を使用した。
(B)成分の(B1)化合物であるUF−8003Mの代替成分としてUA−21(商品名、新中村化学工業株式会社製)65質量部を使用したことの他は、実施例1と同様にして、感光性エレメントを製造した。また、これを用いてカバーレイを形成した後、実施例1と同様にして、各種評価試験を行った。なお、UA−21(商品名)はイソシアヌル環、ウレタン結合及びエチレン性不飽和基を有する光重合性化合物であり、平均分子量の計算値は1554であり、重量平均分子量の実測値は3000である。
Claims (4)
- (A)カルボキシル基を有するバインダーポリマ、
(B)光重合性化合物、
(C)光重合開始剤、並びに、
(D)ジシアンジアミド及び/又はその誘導体、
を含有する感光性樹脂組成物であって、
前記(B)光重合性化合物は、(B1)分子内にウレタン結合及びエチレン性不飽和基を有する重量平均分子量3500〜100000の化合物を含む、感光性樹脂組成物。 - 前記(A)カルボキシル基を有するバインダーポリマが、アクリル樹脂を含む、請求項1記載の感光性樹脂組成物。
- 前記(B1)分子内にウレタン結合及びエチレン性不飽和基を有する重量平均分子量3500〜100000の化合物は、
ポリカーボネート化合物及び/又はポリエステル化合物の末端のヒドロキシル基とジイソシアネート化合物のイソシアネート基との反応に由来するウレタン結合を有し且つ複数の末端にイソシアナート基を有するウレタン化合物と、
ヒドロキシル基及びエチレン性不飽和基を有する化合物と、
を反応させて得られるものである、請求項1又は2に記載の感光性樹脂組成物。 - 支持体と、
前記支持体上に形成された請求項1〜3のいずれか一項記載の感光性樹脂組成物からなる感光層と、を有する、感光性エレメント。
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| Application Number | Priority Date | Filing Date | Title |
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| JP2005294882 | 2005-10-07 | ||
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| JP2006063173 | 2006-03-08 | ||
| JP2006063173 | 2006-03-08 | ||
| PCT/JP2006/315659 WO2007043240A1 (ja) | 2005-10-07 | 2006-08-08 | 感光性樹脂組成物及びこれを用いた感光性エレメント |
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| JP5417716B2 (ja) * | 2008-02-20 | 2014-02-19 | 日立化成株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性フィルム、レジストパターンの形成方法及び永久レジスト |
| JP5224119B2 (ja) * | 2008-11-18 | 2013-07-03 | 日立化成株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性フィルム及び永久マスクレジスト |
| JP5420290B2 (ja) * | 2009-03-27 | 2014-02-19 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、フレキソ印刷版、及びフレキソ印刷版の製造方法 |
| KR20130102543A (ko) * | 2010-08-24 | 2013-09-17 | 히타치가세이가부시끼가이샤 | 광도파로 형성용 수지 조성물, 이것을 이용한 광도파로 형성용 수지 필름, 및 이들을 이용한 광도파로 |
| CN103282830B (zh) * | 2010-12-14 | 2016-06-22 | 株式会社钟化 | 新颖的感光性树脂组合物及其利用 |
| JP6134264B2 (ja) * | 2011-04-25 | 2017-05-24 | 株式会社カネカ | 新規な感光性樹脂組成物及びその利用 |
| WO2013111481A1 (ja) | 2012-01-25 | 2013-08-01 | 株式会社カネカ | 新規な顔料含有絶縁膜用樹脂組成物及びその利用 |
| US9332653B2 (en) | 2012-01-25 | 2016-05-03 | Kaneka Corporation | Resin composition for insulating film, and use thereof |
| JP2013140379A (ja) * | 2013-02-07 | 2013-07-18 | Hitachi Chemical Co Ltd | 感光性樹脂組成物、感光性フィルム、永久マスクレジストの製造方法及び永久マスクレジスト |
| CN109983403B (zh) * | 2016-11-18 | 2023-02-17 | 株式会社有泽制作所 | 感光性树脂组合物、使用该感光性树脂组合物的阻焊膜、柔性印刷布线板及图像显示装置 |
| JP7569213B2 (ja) * | 2019-12-26 | 2024-10-17 | 住友化学株式会社 | 感光性組成物 |
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| JP3916605B2 (ja) * | 2001-11-12 | 2007-05-16 | 旭化成エレクトロニクス株式会社 | 感光性樹脂組成物及びその用途 |
| JP2005024893A (ja) * | 2003-07-02 | 2005-01-27 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びその用途 |
| JP4449402B2 (ja) * | 2003-08-25 | 2010-04-14 | 日立化成工業株式会社 | 永久レジスト用感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法及びプリント配線板 |
| US7670752B2 (en) * | 2005-08-03 | 2010-03-02 | Toagosei Co., Ltd. | Photosensitive resin composition, composition for solder resist, and photosensitive dry film |
-
2006
- 2006-08-08 WO PCT/JP2006/315659 patent/WO2007043240A1/ja not_active Ceased
- 2006-08-08 KR KR1020087005397A patent/KR101002832B1/ko not_active Expired - Fee Related
- 2006-08-08 KR KR1020107020579A patent/KR101141852B1/ko not_active Expired - Fee Related
- 2006-08-08 JP JP2007539827A patent/JP4577361B2/ja not_active Expired - Fee Related
- 2006-08-08 US US12/089,504 patent/US20100041785A1/en not_active Abandoned
- 2006-08-08 CN CN2006800369274A patent/CN101278236B/zh not_active Expired - Fee Related
- 2006-09-29 TW TW095136430A patent/TW200715050A/zh not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04149444A (ja) * | 1990-10-12 | 1992-05-22 | Ryoden Kasei Co Ltd | 2液混合型硬化性樹脂組成物 |
| JP2000281738A (ja) * | 1999-03-31 | 2000-10-10 | Nippon Kayaku Co Ltd | 新規不飽和基含有ポリカルボン酸樹脂、樹脂組成物及びその硬化物 |
| JP2002207292A (ja) * | 2001-10-30 | 2002-07-26 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101278236A (zh) | 2008-10-01 |
| JPWO2007043240A1 (ja) | 2009-04-16 |
| KR20100117672A (ko) | 2010-11-03 |
| CN101278236B (zh) | 2013-11-27 |
| TW200715050A (en) | 2007-04-16 |
| KR101002832B1 (ko) | 2010-12-21 |
| US20100041785A1 (en) | 2010-02-18 |
| KR20080034193A (ko) | 2008-04-18 |
| WO2007043240A1 (ja) | 2007-04-19 |
| KR101141852B1 (ko) | 2012-05-08 |
| TWI334964B (ja) | 2010-12-21 |
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