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JP4587974B2 - Manufacturing method of multilayer printed wiring board - Google Patents
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JP4587974B2 - Manufacturing method of multilayer printed wiring board - Google Patents

Manufacturing method of multilayer printed wiring board Download PDF

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JP4587974B2
JP4587974B2 JP2006043416A JP2006043416A JP4587974B2 JP 4587974 B2 JP4587974 B2 JP 4587974B2 JP 2006043416 A JP2006043416 A JP 2006043416A JP 2006043416 A JP2006043416 A JP 2006043416A JP 4587974 B2 JP4587974 B2 JP 4587974B2
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layer
liquid crystal
wiring board
crystal polymer
printed wiring
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JP2007227420A (en
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克文 平石
嘉宏 後藤
和憲 植田
直也 北村
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Nippon Steel Chemical and Materials Co Ltd
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Priority to PCT/JP2007/053201 priority patent/WO2007097366A1/en
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Description

本発明は、多層プリント配線板に関する。   The present invention relates to a multilayer printed wiring board.

近年の電子機器の高性能化は目覚しく、特に、通信機器、コンピュータは、動作速度の向上に加え、高周波化への対応が求められ、加えて、多機能化や携帯性向上のため、一層の軽薄短小化も要求されている。
このため、これらの機器に搭載されるプリント配線板に対しても高速・低損失信号伝送性、配線高密度化、薄化、軽量化等が求められている。そして、プリント配線板に対するこれらの要求は、そのまま、基板材料のより一層の低誘電率化、低誘電正接化や薄化、軽量化等に向けられている。これらの要求を解決する手段として、ビルドアップ方式による多層プリント配線板が採用されて久しい。
In recent years, the performance of electronic devices has been remarkably improved. In particular, communication devices and computers are required to cope with higher frequencies in addition to higher operating speeds. There is also a demand for miniaturization.
For this reason, printed wiring boards mounted on these devices are also required to have high speed and low loss signal transmission, high wiring density, thinning, light weight, and the like. These requirements for the printed wiring board are directly directed to further lowering the dielectric constant, lowering the dielectric loss tangent, reducing the thickness, and reducing the weight of the substrate material. As a means for solving these requirements, a multilayer printed wiring board by a build-up method has been adopted for a long time.

従来のビルドアップ方式による多層プリント配線板では、層間絶縁材料として、一般に、エポキシ樹脂単体あるいはガラス織布基材エポキシ樹脂プリプレグ、アラミド不織布基材エポキシ樹脂プリプレグ等の熱硬化性樹脂単体またはプリプレグを用い、これらの層間絶縁材料をFR−4材のようなコアプリント配線板上に積層して多層プリント配線板を得ている。
層間絶縁材料としてエポキシ樹脂単体を用いる場合、エポキシ樹脂付き銅箔をコアプリント配線板表面に加熱加圧成形して一体することにより多層プリント配線板を形成するか、エポキシ樹脂をコアプリント配線板表面に塗布し、その上に銅箔を載置して加熱加圧成形により一体化して多層プリント配線板を形成する。一方、ガラス織布基材エポキシ樹脂プリプレグ、アラミド不織布基材エポキシ樹脂プリプレグ等を層間絶縁材料として用いる場合、これらのプリプレグをコアプリント配線板表面に載置しさらに銅箔を重ねて加熱加圧成形により一体して多層プリント配線板を形成する。そして、このようにして形成した絶縁層に炭酸ガスレーザで明けたビア孔内に充填しためっき銅でプリント配線の層間接続を行う構造や製法が主流となっている。
In multilayer printed wiring boards using the conventional build-up method, the thermosetting resin or prepreg such as epoxy resin alone, glass woven fabric base epoxy resin prepreg, or aramid nonwoven fabric base epoxy resin prepreg is generally used as an interlayer insulating material. These interlayer insulating materials are laminated on a core printed wiring board such as FR-4 material to obtain a multilayer printed wiring board.
When using an epoxy resin alone as an interlayer insulating material, a multilayer printed wiring board is formed by heat-press molding a copper foil with an epoxy resin on the core printed wiring board surface, or an epoxy resin is coated on the core printed wiring board surface. Then, a copper foil is placed thereon and integrated by heating and pressing to form a multilayer printed wiring board. On the other hand, when glass woven fabric base material epoxy resin prepreg, aramid non-woven fabric base material epoxy resin prepreg, etc. are used as an interlayer insulating material, these prepregs are placed on the core printed wiring board surface, and copper foil is stacked and heat-press molded To form a multilayer printed wiring board. A structure and a manufacturing method in which an interlayer connection of printed wiring is made of plated copper filled in a via hole opened by a carbon dioxide laser on the insulating layer formed in this manner are mainly used.

このような熱硬化性樹脂を絶縁材料に用いた多層プリント配線板は、剛性や耐熱性に優れるとともに、低誘電率、低誘電正接、軽量な有機物のみで構成される絶縁材料を用いるため、高速・低損失信号伝送性、軽量化に優れる。また、ガラス織布のような加工しにくい成分を含まないため、微細なビア孔の加工が可能であり、高密度化された多層プリント配線板を得ることができる。
しかしながら、上記多層プリント配線板は、ポリイミド樹脂を用いるものも含めて絶縁材料に用いる熱硬化性樹脂が必ずしも十二分な低誘電率、低誘電正接特性を有するものではないため、電子機器に要求される高周波特性を十二分に満足するものではない。
Multi-layer printed wiring boards that use such thermosetting resins as insulating materials are superior in rigidity and heat resistance, and because they use insulating materials consisting of only low-permittivity, low-dielectric-tangent, and lightweight organic substances,・ Excellent low loss signal transmission and light weight. In addition, since it does not contain a difficult-to-process component such as a glass woven fabric, it is possible to process fine via holes and obtain a high-density multilayer printed wiring board.
However, the multilayer printed wiring board is required for electronic devices because thermosetting resins used for insulating materials, including those using polyimide resin, do not necessarily have sufficient low dielectric constant and low dielectric loss tangent characteristics. It does not fully satisfy the high-frequency characteristics.

一方、熱可塑性樹脂である液晶ポリマーを層間絶縁材料に用いた多層プリント配線板も提案されている(例えば、特許文献1、2参照)。液晶ポリマーは、低誘電率、低誘電正接の各特性において優れているため、多層プリント配線板の高周波領域での高速・低損失信号伝送性に優れる。
しかしながら、多層プリント配線板の一層の高密度化、小型化を実現するために求められる多層プリント配線板の板厚の薄型化を図る場合、絶縁層の耐熱性が求められるが、液晶ポリマーは耐熱性が必ずしも十分ではない。
On the other hand, a multilayer printed wiring board using a liquid crystal polymer, which is a thermoplastic resin, as an interlayer insulating material has also been proposed (see, for example, Patent Documents 1 and 2). Since the liquid crystal polymer is excellent in low dielectric constant and low dielectric loss tangent characteristics, it is excellent in high-speed and low-loss signal transmission in the high-frequency region of the multilayer printed wiring board.
However, in order to reduce the thickness of multilayer printed wiring boards, which are required to achieve higher density and miniaturization of multilayer printed wiring boards, the heat resistance of the insulating layer is required, but liquid crystal polymers are heat resistant. Sex is not always enough.

ところで、多層プリント配線板は、一般に、樹脂付き銅箔、プリプレグや基板端面から樹脂成分やガラス片が脱落しやすく(いわゆる「粉落ち」)、これらが、確実に除去されないまま加熱加圧成形時に金属箔表面に残り、打痕を形成し、また、微細配線の形成が困難となり、さらに、微細配線を形成できても搭載機器の誤作動を引き起こすという課題もある。
特開平8−97565号公報 特開2004−311926号公報
By the way, the multilayer printed wiring board generally has a resin-coated copper foil, a prepreg, and a resin piece and a glass piece that easily fall off from the end face of the substrate (so-called “powder-off”). It remains on the surface of the metal foil, forms dents, makes it difficult to form fine wiring, and there is also a problem that even if the fine wiring can be formed, malfunction of the mounted device is caused.
JP-A-8-97565 JP 2004-31926 A

上記のように、多層プリント配線板の一層の高密度化、小型化を図ることができる耐熱性と優れた高周波特性を同時に実現することについては、従来のいずれの多層プリント配線板においても必ずしも満足のいくものは得られていない。   As mentioned above, it is not always satisfactory with any conventional multilayer printed wiring board that can achieve higher density and miniaturization of multilayer printed wiring boards and simultaneously achieve heat resistance and excellent high frequency characteristics. No good thing has been obtained.

本発明は、上記の課題に鑑みてなされたものであり、耐熱性と優れた高周波特性を同時に実現することができる多層プリント配線板を提供することを目的とする。   The present invention has been made in view of the above problems, and an object of the present invention is to provide a multilayer printed wiring board capable of simultaneously realizing heat resistance and excellent high frequency characteristics.

本発明に係る多層プリント配線板の製造方法は、配線回路層と絶縁層とが交互に積層されてなる多層プリント配線板の製造方法において、
ポリイミド樹脂層の両面にそれぞれ配線回路層形成して両面配線基板とし、該両面配線基板をコア基板としてその両面に液晶ポリマー層形成する工程を有することを特徴とする。
Method for manufacturing a multilayer printed wiring board according to the present invention is a method of manufacturing a multilayer printed wiring board and the wiring circuit layers and insulating layers are alternately laminated,
A double-sided circuit board form respective wiring circuit layers on both surfaces of the polyimide resin layer, characterized by having a step of forming a liquid crystal polymer layers on both sides of that the double-sided wiring board as a core substrate.

また、本発明に係る多層プリント配線板の製造方法は、前記液晶ポリマー層の前記コア基板と隣り合う側とは反対側に、さらに配線回路層を介して液晶ポリマー層を形成することを特徴とする。 A method for manufacturing a multilayer printed wiring board according to the present invention, the side opposite to the side where the adjacent core substrate of the liquid crystal polymer layer, and characterized by forming a liquid crystal polymer layer through the further wiring circuit layer To do.

また、本発明に係る多層プリント配線板の製造方法は、前記ポリイミド樹脂層と前記液晶ポリマー層の境界面の粗さが4〜6μmであることを特徴とする。 Moreover, the manufacturing method of the multilayer printed wiring board concerning this invention is characterized by the roughness of the interface of the said polyimide resin layer and the said liquid crystal polymer layer being 4-6 micrometers.

また、本発明に係る多層プリント配線板の製造方法は、前記ポリイミド樹脂層と前記液晶ポリマー層の境界面の粗さが4μm未満であることを特徴とする。 Moreover, the manufacturing method of the multilayer printed wiring board concerning this invention is characterized by the roughness of the interface of the said polyimide resin layer and the said liquid crystal polymer layer being less than 4 micrometers.

また、本発明に係る多層プリント配線板の製造方法は、前記液晶ポリマー層の積層面が予め表面処理されてなること特徴とする。 Moreover, the method for producing a multilayer printed wiring board according to the present invention is characterized in that the laminated surface of the liquid crystal polymer layer is surface-treated in advance.

本発明の多層プリント配線板は、配線回路層を介して隣り合う2層の絶縁層うちの1つの絶縁層がポリイミド樹脂層であり、他の1つの絶縁層が液晶ポリマー層である積層構造単位を含むため、多層プリント配線板の耐熱性と優れた高周波特性を両立することができる。   The multilayer printed wiring board of the present invention is a laminated structural unit in which one insulating layer of two insulating layers adjacent to each other via a wiring circuit layer is a polyimide resin layer, and the other insulating layer is a liquid crystal polymer layer. Therefore, both the heat resistance of the multilayer printed wiring board and the excellent high frequency characteristics can be achieved.

本発明に係る多層プリント配線板の好適な実施の形態について、以下に説明する。   Preferred embodiments of the multilayer printed wiring board according to the present invention will be described below.

多層プリント配線板は、複数の配線回路層(配線回路、導体層)と複数の絶縁層とが交互に積層された構造を有する。
本発明の多層プリント配線板は、例えば図1に示すように、上記の積層構造をもつ多層プリント配線板10において、配線回路層12を介して隣り合う2層の絶縁層14a、14bのうちの1つの絶縁層がポリイミド樹脂層であり、他の1つの絶縁層が液晶ポリマー層である積層構造単位16を含むことを特徴とする。この積層構造単位16は、多層プリント配線板10の積層構造全体に及ぶものであってもよく、また、積層構造全体のなかの適当な部位に1または複数設けられるものであってもよい。
なお、1つの絶縁層14aの材料は、ポリイミド樹脂を用いることが好ましいが、これに限らず、絶縁層の耐熱性が確保され、かつ、適度の低誘電率、低誘電正接の各特性を有するものであれば、他の熱硬化性樹脂を用いてもよい。一方、他の1つの絶縁層14bの材料は、液晶ポリマーを用いることが好ましいが、これに限らず、低誘電率、低誘電正接の各特性に優れるものであれば、他の熱可塑性樹脂を用いてもよい。
また、配線回路層12の材料は、適宜の良導電性金属を用いることができるが、特に、銅箔を用いることが好ましい。
絶縁層14aをポリイミド樹脂層とし、また絶縁層14bを液晶ポリマー層とした場合、絶縁層14aの厚みは、例えば5〜100μm程度とすることができ、絶縁層14bの厚みは、例えば10〜100μm程度とすることができる。また、配線回路層12の厚みは、例えば3〜35μm程度とすることができる。
The multilayer printed wiring board has a structure in which a plurality of wiring circuit layers (wiring circuits, conductor layers) and a plurality of insulating layers are alternately stacked.
The multilayer printed wiring board of the present invention is, for example, as shown in FIG. 1, in the multilayer printed wiring board 10 having the above laminated structure, of the two insulating layers 14 a and 14 b adjacent to each other via the wiring circuit layer 12. One insulating layer is a polyimide resin layer, and the other one insulating layer includes a laminated structural unit 16 that is a liquid crystal polymer layer. The multilayer structure unit 16 may extend over the entire multilayer structure of the multilayer printed wiring board 10, or may be provided at one or more appropriate locations in the entire multilayer structure.
In addition, although it is preferable to use a polyimide resin as the material of one insulating layer 14a, it is not restricted to this, The heat resistance of an insulating layer is ensured, and it has each characteristic of moderate low dielectric constant and a low dielectric loss tangent. If it is a thing, you may use another thermosetting resin. On the other hand, it is preferable to use a liquid crystal polymer as the material of the other insulating layer 14b. However, the present invention is not limited to this, and other thermoplastic resins may be used as long as they have excellent characteristics of low dielectric constant and low dielectric loss tangent. It may be used.
Further, as the material of the wiring circuit layer 12, an appropriate highly conductive metal can be used, but it is particularly preferable to use a copper foil.
When the insulating layer 14a is a polyimide resin layer and the insulating layer 14b is a liquid crystal polymer layer, the insulating layer 14a can have a thickness of about 5 to 100 μm, for example, and the insulating layer 14b can have a thickness of 10 to 100 μm, for example. Can be about. Moreover, the thickness of the wiring circuit layer 12 can be about 3 to 35 micrometers, for example.

ポリイミド樹脂は、公知のジアミノ化合物とテトラカルボン酸またはその無水物を適宜選定し、所望の特性が得られるようにこれらを組み合わせて有機溶剤中で反応させて得られるポリイミド系前駆体樹脂を用いて得ることができる。この場合、分子中にイミド結合を有するポリイミド樹脂やポリアミド樹脂を主成分とするものであるが、必ずしも単一なポリイミド樹脂である必要は無く、他の樹脂との混合物であってもよい。
本発明に適用されるポリイミド樹脂としては、寸法安定性の観点から、線膨張係数が一定の範囲にあるものが好ましい。線膨張係数は、0〜35×10-6/℃の範囲にあることが好ましく、1×10-6〜25×10-6/℃の範囲がより好ましい。
絶縁層のポリイミド樹脂は、市販のポリイミドフィルムまたは銅張積層板を使用することが簡便ある。ポリイミドフィルムを用いる場合、スパッタめっきなど公知の方法で回路形成したものを使用することができる。また、銅張積層板の場合、公知の方法で任意の配線回路を形成して使用することができる。ポリイミドフィルムは、アピカルAH,NPI((株)カネカ社製)、ユーピレックスS(宇部興産(株)社製)、カプトン(東レ・デュポン(株)社製)などを用いることができる。また、銅張積層板としては、エスパネッスクSシリーズやMシリーズ(いずれも、新日鐵化学(株)社製)を使用することができる。
The polyimide resin is a polyimide precursor resin obtained by appropriately selecting a known diamino compound and tetracarboxylic acid or anhydride thereof, and combining them in an organic solvent so as to obtain desired characteristics. Obtainable. In this case, the main component is a polyimide resin or polyamide resin having an imide bond in the molecule, but it is not necessarily a single polyimide resin, and may be a mixture with other resins.
As the polyimide resin applied to the present invention, those having a linear expansion coefficient in a certain range are preferable from the viewpoint of dimensional stability. The linear expansion coefficient is preferably in the range of 0~35 × 10 -6 / ℃, the range of 1 × 10 -6 ~25 × 10 -6 / ℃ is more preferable.
As the polyimide resin of the insulating layer, it is convenient to use a commercially available polyimide film or a copper clad laminate. When a polyimide film is used, a film formed by a known method such as sputter plating can be used. Moreover, in the case of a copper clad laminated board, arbitrary wiring circuits can be formed and used by a well-known method. As the polyimide film, Apical AH, NPI (manufactured by Kaneka Co., Ltd.), Upilex S (manufactured by Ube Industries, Ltd.), Kapton (manufactured by Toray DuPont Co., Ltd.), or the like can be used. Moreover, as a copper clad laminated board, Espanesque S series and M series (all are the Nippon Steel Chemical Co., Ltd. product) can be used.

液晶ポリマーは、光学的異方性の溶融相を形成するものである。液晶ポリマーは、特にその種類を限定するものではないが、いわゆる全芳香族液晶ポリマー、すなわち、脂肪族長鎖を含まず実質的に芳香族のみで構成される液晶ポリマーが好ましく、さらにそのなかでも、6−ヒドロキシ−2−ナフトエ酸とp−ヒドロキシ安息香酸とからなるポリエステルがより好ましい。また、液晶ポリマーは、適宜の種類の液晶材料を組み合わせた混合物を用いることもできる。
配線基板に使用される液晶ポリマーは、液晶ポリマーと共に使用されるポリイミド樹脂とのバランスを保つため、一定以上の耐熱性と線膨張係数を有することが好ましい。液晶ポリマーの融点の好ましい範囲は、250〜350℃であり、また、線膨張係数の好ましい範囲は、1×10-6〜25×10-6/℃である。
絶縁層の液晶ポリマーは、市販の液晶ポリマーフィルムまたは銅張積層板を使用することが簡便ある。液晶ポリマーフィルムを用いる場合、スパッタめっきなど公知の方法で回路形成したものを使用することができる。また、銅張積層板の場合も、公知の方法で任意の配線回路を形成して使用する。液晶ポリマーフィルムは、ベクスター((株)クラレ社製)などを用いることができる。また、銅張積層板としては、エスパネッスクLシリーズ(新日鐵化学(株)社製)を使用することができる。
The liquid crystal polymer forms an optically anisotropic melt phase. The liquid crystal polymer is not particularly limited in its kind, but a so-called wholly aromatic liquid crystal polymer, that is, a liquid crystal polymer that does not contain an aliphatic long chain and is substantially composed only of an aromatic is preferable, and among them, A polyester composed of 6-hydroxy-2-naphthoic acid and p-hydroxybenzoic acid is more preferable. In addition, the liquid crystal polymer may be a mixture in which an appropriate kind of liquid crystal material is combined.
The liquid crystal polymer used for the wiring substrate preferably has a certain level of heat resistance and linear expansion coefficient in order to maintain a balance with the polyimide resin used together with the liquid crystal polymer. A preferable range of the melting point of the liquid crystal polymer is 250 to 350 ° C., and a preferable range of the linear expansion coefficient is 1 × 10 −6 to 25 × 10 −6 / ° C.
As the liquid crystal polymer of the insulating layer, it is convenient to use a commercially available liquid crystal polymer film or a copper clad laminate. When a liquid crystal polymer film is used, a film formed by a known method such as sputter plating can be used. Also, in the case of a copper clad laminate, an arbitrary wiring circuit is formed and used by a known method. As the liquid crystal polymer film, Bexter (manufactured by Kuraray Co., Ltd.) or the like can be used. Moreover, as a copper clad laminated board, Espanesque L series (made by Nippon Steel Chemical Co., Ltd.) can be used.

上記のように構成される本発明の多層プリント配線板は、ポリイミド樹脂の良好な耐熱性と、液晶ポリマーの優れた高周波特性とが相俟って特性のバランスに優れる。
また、本発明の絶縁層にはガラス織布、アラミド不織布のような補強材を含まないので、得られる多層プリント配線板の高密度化、薄化、軽量化に優れる。また、粉落ち起因の歩留り損の発生が軽減される。
The multilayer printed wiring board of the present invention configured as described above has an excellent balance of characteristics due to the combination of the good heat resistance of the polyimide resin and the excellent high frequency characteristics of the liquid crystal polymer.
Moreover, since the insulating layer of the present invention does not contain a reinforcing material such as a glass woven fabric or an aramid nonwoven fabric, the resulting multilayer printed wiring board is excellent in densification, thinning, and weight reduction. Moreover, the occurrence of yield loss due to powder falling is reduced.

また、本発明の多層プリント配線板は、例えば図2に示すように、積層構造単位16aにおいて、液晶ポリマー層(絶縁層14b)のポリイミド樹脂層(絶縁層14a)と隣り合う側とは反対側に、さらに配線回路層12aを介して液晶ポリマー層(絶縁層14c)が設けられる構成のものであってもよい。
このような液晶ポリマーを隣り合わせで積層する構造の場合、多層プリント配線板の製造工程での加熱・加圧により配線回路の位置づれが懸念されるため、隣り合わせる液晶ポリマーの融点は、液晶ポリマー層14bの方が液晶ポリマー層14cよりも好ましくは5℃以上、より好ましくは10〜40℃高いことが好ましい。なお、本発明における液晶ポリマーの融点は、示差走査熱量計(DSC)によって液晶ポリマーを10℃/分の昇温速度で加熱して測定される融解(吸熱)ピーク温度を指す。
上記のように構成される積層構造単位16aを含む多層プリント配線板は、前記の積層構造単位16を骨格構造としたプリント配線板の高次多層化を容易に実現することができる。
In addition, the multilayer printed wiring board of the present invention is, for example, as shown in FIG. 2, in the laminated structural unit 16a, the side opposite to the side adjacent to the polyimide resin layer (insulating layer 14a) of the liquid crystal polymer layer (insulating layer 14b). In addition, the liquid crystal polymer layer (insulating layer 14c) may be provided via the wiring circuit layer 12a.
In the case of such a structure in which the liquid crystal polymers are laminated side by side, there is a concern about the positioning of the wiring circuit due to heating and pressurization in the manufacturing process of the multilayer printed wiring board. 14b is preferably 5 ° C. or more, more preferably 10 to 40 ° C. higher than the liquid crystal polymer layer 14c. The melting point of the liquid crystal polymer in the present invention refers to a melting (endothermic) peak temperature measured by heating the liquid crystal polymer at a rate of temperature increase of 10 ° C./min with a differential scanning calorimeter (DSC).
The multilayer printed wiring board including the laminated structural unit 16a configured as described above can easily realize higher-order multilayering of the printed wiring board having the laminated structural unit 16 as a skeleton structure.

また、本発明に係る多層プリント配線板は、上記積層構造単位16、16aにおいて、ポリイミド樹脂層(絶縁層14a)と液晶ポリマー層(絶縁層14b)の境界面(図1中、矢印Aで示す。)の粗さ(Rz)が4〜6μmであると、境界面の粗さが顕著に大きい場合に生じうる高周波領域での高速・低損失信号伝送性への悪影響を生じることなく、層間を隙間なく密着させ、十分な層間密着強度を確保することができる。
また、上記境界面の粗さ(Rz)は、4μm未満、好ましくは1〜3μmであってもよく、この場合は、高周波領域での高速・低損失信号伝送性への悪影響をより確実に避けることができる。
境界面の粗さの制御は、例えば、ポリイミド樹脂層(絶縁層14a)に予め積層された導体層をエッチング、パターン化して配線回路層12を形成する際に、予めポリイミド樹脂層(絶縁層14a)に積層される銅箔などの導体層の表面粗さ、言い換えれば、液晶ポリマー層(絶縁層14b)が積層される面(積層面)の表面粗さを変更する等の適宜の方法によって行うことができる。
Further, the multilayer printed wiring board according to the present invention has a boundary surface (indicated by an arrow A in FIG. 1) between the polyimide resin layer (insulating layer 14a) and the liquid crystal polymer layer (insulating layer 14b) in the laminated structural units 16 and 16a. )) Roughness (Rz) of 4 to 6 μm, without causing adverse effects on high-speed and low-loss signal transmission in the high-frequency region, which can occur when the roughness of the interface is significantly large. Adhering without gaps, sufficient interlayer adhesion strength can be ensured.
Further, the roughness (Rz) of the boundary surface may be less than 4 μm, preferably 1 to 3 μm. In this case, the adverse effect on high-speed and low-loss signal transmission performance in the high-frequency region can be avoided more reliably. be able to.
The roughness of the boundary surface is controlled by, for example, preliminarily forming a polyimide resin layer (insulating layer 14a) when the wiring layer 12 is formed by etching and patterning a conductor layer previously laminated on the polyimide resin layer (insulating layer 14a). ) By a suitable method such as changing the surface roughness of a conductor layer such as a copper foil laminated on the surface, in other words, changing the surface roughness of the surface (laminated surface) on which the liquid crystal polymer layer (insulating layer 14b) is laminated. be able to.

また、本発明に係る多層プリント配線板は、上記積層構造単位16、16aにおいて、ポリイミド樹脂層(絶縁層14a)と液晶ポリマー層(絶縁層14b)の境界面Aを構成する液晶ポリマー層14bのポリイミド樹脂層14aに向いた積層面、液晶ポリマー層14cの液晶ポリマー層14bに向いた積層面がそれぞれ予め表面処理されたものであると、層間を隙間なく密着させ、良好な層間密着強度を得ることができる。
特に、上記のように表面粗さが4μm未満の場合に、表面処理加工を行うと、高周波領域での高速・低損失信号伝送性への悪影響の軽減と層間密着強度の確保をバランスよく実現することができて、より好適である。
表面処理加工は、積層一体化工程の前に施す。表面処理方法としては、アルカリ混合溶液によるエッチング処理やプラズマによるエッチング処理が望ましい。
そして、真空熱プレスプロセスでは、例えば、最高温度を220〜300℃の範囲で、プレス圧を4〜8MPaの範囲でコントロールすることにより、また、ラミネートプロセスでも、例えば、最高温度を200〜300℃の範囲で、ラミネート圧(線圧)を2〜200kN/mの範囲でコントロールすることにより、熱可塑性樹脂を好適に軟化あるいは流動させることで、十分な層間密着強度の確保を実現することができる。
In addition, the multilayer printed wiring board according to the present invention includes a liquid crystal polymer layer 14b constituting the boundary surface A between the polyimide resin layer (insulating layer 14a) and the liquid crystal polymer layer (insulating layer 14b) in the laminated structural units 16 and 16a. When the laminated surface facing the polyimide resin layer 14a and the laminated surface of the liquid crystal polymer layer 14c facing the liquid crystal polymer layer 14b are respectively surface-treated in advance, the layers are closely adhered to each other and good interlayer adhesion strength is obtained. be able to.
In particular, when the surface roughness is less than 4 μm as described above, the surface treatment is performed to achieve a good balance between reducing the adverse effects on high-speed and low-loss signal transmission and ensuring the interlayer adhesion strength in a high-frequency region. It is possible and more preferable.
The surface treatment is performed before the lamination integration process. As the surface treatment method, etching with an alkali mixed solution or etching with plasma is desirable.
In the vacuum hot pressing process, for example, the maximum temperature is controlled in the range of 220 to 300 ° C. and the pressing pressure is controlled in the range of 4 to 8 MPa. In the lamination process, for example, the maximum temperature is set to 200 to 300 ° C. By controlling the laminating pressure (linear pressure) in the range of 2 to 200 kN / m within this range, it is possible to achieve sufficient interlayer adhesion strength by suitably softening or flowing the thermoplastic resin. .

以下、本発明の多層プリント配線板の製造方法について説明する。
図7は、ポリイミド樹脂層を中心とする4層プリント配線板(後述する実施例5に対応)の製造方法を示す工程図である。
まず、ポリイミド樹脂層を絶縁層とし、その両面に銅箔503が積層された両面銅張積層板502が準備される(図7(a))。両面銅張積層板502は、市販の両面銅張積層板を使用することができる。この両面銅張積層板502に任意の方法で配線回路層504を形成する(図7(b))。例えば、ポリイミドフィルムにスパッタめっきで配線回路層504を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
次に、このように形成した両面配線基板505の両側に、液晶ポリマーを絶縁層とする片面銅張積層板506を加熱圧着する(図7(c))。なお、参照符号507は、真空プレスの熱盤を示す。ここで、液晶ポリマーは同じ融点のものを使用することが回路間への液晶ポリマーの充填を良好に行ううえで好ましい。液晶ポリマーの好ましい融点は、250〜350℃の範囲であり、加熱・加圧時の加熱温度は、液晶ポリマーの融点よりも0〜50℃低い温度とすることが好ましい。また、加圧は4〜8MPaで、5〜60分行うことが好ましい。ここで、液晶ポリマーに対する加熱・加圧時の加熱温度が、液晶ポリマーの融点よりも50℃以上低いと配線基板の配線回路が変形するおそれがあり、また、加圧範囲が4MPaに満たないと配線回路間への液晶ポリマーの充填が不十分となるおそれがある。一方、液晶ポリマーに対する加熱・加圧時の加熱温度が、液晶ポリマーの融点よりも高いか、加圧範囲が8MPaを超えると液晶ポリマーの基板(配線基板)外への染み出しが多くなったり、液晶ポリマー層内でボイドが発生するおそれがある。
加熱・加圧後、基板を冷却し、積層体508を得る(図7(d)、図7(e))。これらの製造条件は、以下に説明する類似の製造方法においても同様である。
Hereinafter, the manufacturing method of the multilayer printed wiring board of this invention is demonstrated.
FIG. 7 is a process diagram showing a method for producing a four-layer printed wiring board (corresponding to Example 5 described later) centering on a polyimide resin layer.
First, a double-sided copper-clad laminate 502 in which a polyimide resin layer is used as an insulating layer and copper foils 503 are laminated on both sides thereof is prepared (FIG. 7A). As the double-sided copper-clad laminate 502, a commercially available double-sided copper-clad laminate can be used. A wiring circuit layer 504 is formed on the double-sided copper-clad laminate 502 by an arbitrary method (FIG. 7B). For example, the wiring circuit layer 504 may be formed on a polyimide film by sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.
Next, a single-sided copper-clad laminate 506 having a liquid crystal polymer as an insulating layer is thermocompression bonded to both sides of the double-sided wiring board 505 thus formed (FIG. 7C). Reference numeral 507 denotes a hot press hot platen. Here, it is preferable to use liquid crystal polymers having the same melting point in order to satisfactorily fill the liquid crystal polymer between the circuits. The preferable melting point of the liquid crystal polymer is in the range of 250 to 350 ° C., and the heating temperature during heating and pressurization is preferably 0 to 50 ° C. lower than the melting point of the liquid crystal polymer. Moreover, pressurization is preferably performed at 4 to 8 MPa for 5 to 60 minutes. Here, if the heating temperature at the time of heating / pressurizing the liquid crystal polymer is lower by 50 ° C. or more than the melting point of the liquid crystal polymer, the wiring circuit of the wiring board may be deformed, and the pressurizing range is less than 4 MPa. There is a risk of insufficient filling of the liquid crystal polymer between the wiring circuits. On the other hand, when the heating temperature for the liquid crystal polymer is higher than the melting point of the liquid crystal polymer or the pressure range exceeds 8 MPa, the liquid crystal polymer oozes out of the substrate (wiring substrate), Voids may be generated in the liquid crystal polymer layer.
After heating and pressurization, the substrate is cooled to obtain a stacked body 508 (FIGS. 7D and 7E). These manufacturing conditions are the same in the similar manufacturing method described below.

得られた積層体508は、NCドリルなど公知の方法で、スルーホール509を形成し(図7(f))、デスミア処理を行い、パネルめっき510を形成する(図7(g))。そして、テンティング法により最外層511をエッチング、パターン化し、配線回路層512を形成し、ソルダーレジスト層513を形成して、多層プリント配線基板501を得ることができる(図7(h))。   The obtained laminated body 508 forms a through hole 509 by a known method such as an NC drill (FIG. 7F), performs a desmear process, and forms a panel plating 510 (FIG. 7G). Then, the outermost layer 511 is etched and patterned by a tenting method, the wiring circuit layer 512 is formed, and the solder resist layer 513 is formed, so that the multilayer printed wiring board 501 can be obtained (FIG. 7H).

図8は、ポリイミド樹脂層を中心とする4層プリント配線板(後述する実施例6に対応)をロール・トゥ・ロール方式で製造する方法を示す工程図である。
まず、ロール状の、ポリイミド樹脂層を絶縁層とし、その両側に銅箔603を積層した両面銅張積層板602が準備され、任意の方法で配線回路層604を形成し、両面配線基板605を得る(図8(a))。両面銅張積層板602は、市販の両面銅張積層板を使用することができる。なお、ポリイミドフィルムにスパッタめっきなど任意の方法で配線回路層604を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
FIG. 8 is a process diagram showing a method for producing a four-layer printed wiring board (corresponding to Example 6 to be described later) centering on a polyimide resin layer by a roll-to-roll method.
First, a double-sided copper-clad laminate 602 in which a roll-shaped polyimide resin layer is used as an insulating layer and copper foils 603 are laminated on both sides thereof is prepared, a wiring circuit layer 604 is formed by an arbitrary method, and a double-sided wiring board 605 is formed. Is obtained (FIG. 8 (a)). As the double-sided copper-clad laminate 602, a commercially available double-sided copper-clad laminate can be used. Note that the wiring circuit layer 604 may be formed on the polyimide film by an arbitrary method such as sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.

次に、このように形成した両面配線基板605の両側に、液晶ポリマーを絶縁層とするロール状の2本の片面銅張積層板606を加熱圧着し、積層体608を得る(図8(b)、図8(c))。なお、参照符号607は、ロールを示す。ここで、液晶ポリマーは同じ融点のものを使用することが、両側の回路間への充填を良好に行ううえで好ましい。使用する液晶ポリマーの融点範囲は、プレスプロセスと同様であるが、加熱・加圧時の加熱温度は、液晶ポリマーの融点よりも、0〜80℃低い温度とすることが好ましい。また、加圧は、ラミネート圧(線圧)2〜200kN/mでロールを通過させることが好ましい。これらの製造条件は、以下に説明する類似の製造方法においても同様である。ここで、液晶ポリマーに対する加熱・加圧時の加熱温度が、液晶ポリマーの融点よりも80℃以上低いと配線基板の配線回路が変形するおそれがあり、また、加圧範囲が2kN/mに満たないと配線回路間への液晶ポリマーの充填が不十分となるおそれがある。一方、液晶ポリマーに対する加熱・加圧時の加熱温度が、液晶ポリマーの融点よりも高いか、加圧範囲が200kN/mを超えると液晶ポリマーの基板外への染み出しが多くなったり、液晶ポリマー層内でボイドが発生するおそれがある。
得られた積層体608は、切断後、上述したと同様の方法と同様に、スルーホール609を形成し(図8(d))、デスミア処理を行い、パネルめっき610を形成し(図8(e))、ついで、テンティング方により最外層611をエッチング、パターン化して、配線回路層612を形成し、さらにソルダーレジスト層613を形成して、多層プリント配線基板601を得ることができる(図7(f))。
Next, on both sides of the double-sided wiring board 605 formed in this way, two roll-shaped single-sided copper-clad laminates 606 having a liquid crystal polymer as an insulating layer are heat-pressed to obtain a laminate 608 (FIG. 8B). ), FIG. 8 (c)). Reference numeral 607 indicates a roll. Here, it is preferable to use liquid crystal polymers having the same melting point in order to satisfactorily fill between the circuits on both sides. The melting point range of the liquid crystal polymer to be used is the same as in the press process, but the heating temperature at the time of heating and pressurization is preferably 0 to 80 ° C. lower than the melting point of the liquid crystal polymer. The pressurization is preferably performed by passing the roll at a laminate pressure (linear pressure) of 2 to 200 kN / m. These manufacturing conditions are the same in the similar manufacturing method described below. Here, if the heating temperature at the time of heating / pressurizing the liquid crystal polymer is lower by 80 ° C. or more than the melting point of the liquid crystal polymer, the wiring circuit of the wiring board may be deformed, and the pressurizing range is less than 2 kN / m. Otherwise, the liquid crystal polymer may be insufficiently filled between the wiring circuits. On the other hand, if the heating temperature for the liquid crystal polymer is higher than the melting point of the liquid crystal polymer, or if the pressure range exceeds 200 kN / m, the liquid crystal polymer oozes out of the substrate, or the liquid crystal polymer Voids may occur in the layer.
The obtained laminate 608 is cut and then through-holes 609 are formed in the same manner as described above (FIG. 8D), desmear treatment is performed, and panel plating 610 is formed (FIG. 8D e)) Next, the outermost layer 611 is etched and patterned by a tenting method to form a wiring circuit layer 612 and further a solder resist layer 613 to obtain a multilayer printed wiring board 601 (see FIG. 7 (f)).

図9は、図7と同様のポリイミド樹脂層を中心とする4層プリント配線板(後述する実施例7に対応)の製造方法を示す工程図である。
まず、ポリイミド樹脂層を絶縁層とし、その両面に銅箔703−1、703−2が積層された両面銅張積層板702が準備される(図9(a))。両面銅張積層板702は、市販の両面銅張積層板を使用することができる。この両面銅張積層板702を2枚準備し(他の1枚を参照符号702’で示す。)、任意の方法でそれぞれの両面銅張積層板702、702’の片面に配線回路層704−1’、704−2を形成する(図9(b))。例えば、ポリイミドフィルムにスパッタめっきで配線回路層を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
一方、両面銅張積層板702、702’と同サイズの液晶ポリマー層707を絶縁層とする両面銅張積層板705の両面の銅箔706をエッチング除去し、アルカリ混合水溶液に浸漬処理して、液晶ポリマー層707を得る(図9(c))。
ついで、配線回路層704−2、704−1’面を対向させた両面銅張積層板702、702’の間に表面処理済み液晶ポリマー層707を挟み、加熱圧着する(図9(d))。なお、参照符号708は、熱盤を示す。加熱・加圧後、基板を冷却し、積層体709を得る(図9(e)、図9(f))。
得られた積層体709は、NCドリルなど公知の方法で、スルーホール710を形成し(図9(g))、デスミア処理を行い、パネルめっき711を形成する(図9(h))。そして、テンティング法により最外層712をエッチング、パターン化し、配線回路層713を形成し、ソルダーレジスト層714を形成して、多層プリント配線基板701を得ることができる(図9(i))。
FIG. 9 is a process diagram showing a method for producing a four-layer printed wiring board (corresponding to Example 7 described later) centering on the same polyimide resin layer as FIG.
First, a double-sided copper-clad laminate 702 in which a polyimide resin layer is used as an insulating layer and copper foils 703-1 and 703-2 are laminated on both sides thereof is prepared (FIG. 9A). As the double-sided copper-clad laminate 702, a commercially available double-sided copper-clad laminate can be used. Two sheets of this double-sided copper-clad laminate 702 are prepared (the other one is indicated by reference numeral 702 ′), and the wiring circuit layer 704- is formed on one side of each of the double-sided copper-clad laminates 702 and 702 ′ by an arbitrary method. 1 ′ and 704-2 are formed (FIG. 9B). For example, a wiring circuit layer may be formed on a polyimide film by sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.
On the other hand, the copper foil 706 on both sides of the double-sided copper-clad laminate 705 having a liquid crystal polymer layer 707 of the same size as the double-sided copper-clad laminates 702 and 702 ′ as an insulating layer is removed by etching and immersed in an alkaline mixed aqueous solution. A liquid crystal polymer layer 707 is obtained (FIG. 9C).
Next, the surface-treated liquid crystal polymer layer 707 is sandwiched between the double-sided copper-clad laminates 702 and 702 ′ facing the wiring circuit layers 704-2 and 704-1 ′, and thermocompression bonded (FIG. 9D). . Reference numeral 708 indicates a hot platen. After heating and pressurization, the substrate is cooled to obtain a laminate 709 (FIGS. 9E and 9F).
The obtained laminate 709 forms a through hole 710 by a known method such as an NC drill (FIG. 9G), performs a desmear process, and forms a panel plating 711 (FIG. 9H). Then, the outermost layer 712 is etched and patterned by a tenting method, the wiring circuit layer 713 is formed, and the solder resist layer 714 is formed, so that the multilayer printed wiring board 701 can be obtained (FIG. 9I).

図10は、図9と同様のポリイミド樹脂層を中心とする4層プリント配線板(後述する実施例8に対応)の製造方法を示す工程図である。
まず、ロール状の、ポリイミド樹脂層を絶縁層とし、その両側に銅箔803、803’を積層した、2枚の両面銅張積層板802、802’が準備され、任意の方法で配線回路層804、804’を形成し、両面配線基板805、805’を得る(図10(a))。両面銅張積層板805、805’は、市販の両面銅張積層板を使用することができる。なお、ポリイミドフィルムにスパッタめっきなど任意の方法で配線回路層804、804’を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
一方、両面銅張積層板805、805’と同サイズの液晶ポリマー層を絶縁層とする両面銅張積層板806の両面の銅箔をエッチング除去した後、露出した表面をプラズマ処理して、液晶ポリマー層807を得る(図10(b))。
ついで、配線回路層804、804’を対向させた両面銅張積層板805、805’の間に表面処理済み液晶ポリマー層807を挟み、加熱圧着する(図10(c))。なお、参照符号808は、ロールを示す。加熱・加圧後、基板を冷却し、積層体809を得る。
得られた積層体809は、切断後、上述したと同様の方法で、スルーホール810を形成し(図10(d))、デスミア処理を行い、パネルめっき811を形成し、ついで、テンティング方により最外層812をエッチング、パターン化して、配線回路層813を形成し、さらにソルダーレジスト層814を形成して、多層プリント配線基板801を得ることができる(図10(e)、図10(f))。
FIG. 10 is a process diagram showing a method for producing a four-layer printed wiring board (corresponding to Example 8 to be described later) centering on a polyimide resin layer similar to FIG.
First, two double-sided copper-clad laminates 802 and 802 ′ in which a roll-shaped polyimide resin layer is used as an insulating layer and copper foils 803 and 803 ′ are laminated on both sides thereof are prepared. 804 and 804 ′ are formed to obtain double-sided wiring boards 805 and 805 ′ (FIG. 10A). Commercially available double-sided copper-clad laminates can be used as the double-sided copper-clad laminates 805 and 805 ′. Note that the wiring circuit layers 804 and 804 ′ may be formed on the polyimide film by an arbitrary method such as sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.
On the other hand, after removing the copper foil on both sides of the double-sided copper-clad laminate 806 having a liquid crystal polymer layer of the same size as that of the double-sided copper-clad laminates 805 and 805 'as an insulating layer, the exposed surface is subjected to plasma treatment to obtain a liquid crystal A polymer layer 807 is obtained (FIG. 10B).
Next, the surface-treated liquid crystal polymer layer 807 is sandwiched between double-sided copper-clad laminates 805 and 805 ′ facing the wiring circuit layers 804 and 804 ′, and thermocompression bonded (FIG. 10C). Reference numeral 808 indicates a roll. After heating and pressurizing, the substrate is cooled to obtain a laminate 809.
The obtained laminated body 809 is cut and then through holes 810 are formed in the same manner as described above (FIG. 10D), desmear treatment is performed, panel plating 811 is formed, and then the tenting method By etching and patterning the outermost layer 812, a wiring circuit layer 813 is formed, and further a solder resist layer 814 is formed, whereby a multilayer printed wiring board 801 can be obtained (FIG. 10 (e), FIG. 10 (f) )).

図11は、ポリイミド樹脂層を中心とする8層プリント配線板(後述する実施例9に対応)の製造方法を示す工程図である。
まず、ポリイミド樹脂層を絶縁層とし、その両面に銅箔903−1が積層された、両面銅張積層板902が2枚準備される(図11(a)。ここで両面銅張積層板902のみ表示。)。両面銅張積層板902、902’は、市販の両面銅張積層板を使用することができる。この両面銅張積層板902、902’それぞれの両面に任意の方法で配線回路層904−1、904−1’、904−2、904−2’を形成する(図11(b))。例えば、ポリイミドフィルムにスパッタめっきで配線回路層を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
一方、両面銅張積層板902、902’と同サイズの液晶ポリマー層907を絶縁層とする両面銅張積層板905の両面の銅箔906をエッチング除去し、アルカリ混合水溶液に浸漬処理して、液晶ポリマー層907を得る(図11(c))。
ついで、両面銅張積層板902、902’の間に表面処理済み液晶ポリマー層907を挟み、加熱圧着する(図11(d))。なお、参照符号908は、熱盤を示す。加熱・加圧後、基板を冷却し、積層体909を得る(図11(e))。
液晶ポリマーの樹脂面911、911’をプラズマ処理した片面銅張積層板910、910’を準備し、積層体909の両面に、樹脂面911、911’を対向させて重ね(図11(f))、加熱・加圧して積層体912を得る(図11(g))。
積層体912をエッチング加工913し(図11(h))、ついで、ブラインドビア穴914を形成する(図11(i))。デスミア処理後、めっき層915を形成し(図11(j))、さらに配線回路層916を形成する(図11(k))。再度、図11(f)〜(i)までの工程を実施し、得られた積層体917にスルーホール918を形成し(図11(l))、デスミア処理して、パネルめっき919を得る(図11(m))。そして、テンティング法により最外層920をエッチング、パターン化し、配線回路層919を形成し、ソルダーレジスト層921を形成して8層プリント配線板901を得る(図11(n))。
FIG. 11 is a process diagram showing a method for manufacturing an eight-layer printed wiring board (corresponding to Example 9 described later) centered on a polyimide resin layer.
First, two double-sided copper-clad laminates 902 in which a polyimide resin layer is used as an insulating layer and copper foils 903-1 are laminated on both sides thereof are prepared (FIG. 11A). Only display.). Commercially available double-sided copper-clad laminates can be used as the double-sided copper-clad laminates 902 and 902 ′. Wiring circuit layers 904-1, 904-1 ′, 904-2 and 904-2 ′ are formed on both surfaces of the double-sided copper-clad laminates 902 and 902 ′ by an arbitrary method (FIG. 11B). For example, a wiring circuit layer may be formed on a polyimide film by sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.
On the other hand, the copper foil 906 on both sides of the double-sided copper-clad laminate 905 having a liquid crystal polymer layer 907 of the same size as the double-sided copper-clad laminate 902, 902 ′ as an insulating layer is removed by etching, and immersed in an alkali mixed aqueous solution. A liquid crystal polymer layer 907 is obtained (FIG. 11C).
Next, the surface-treated liquid crystal polymer layer 907 is sandwiched between the double-sided copper-clad laminates 902 and 902 ′ and thermocompression bonded (FIG. 11 (d)). Reference numeral 908 indicates a hot platen. After heating and pressurization, the substrate is cooled to obtain a laminate 909 (FIG. 11E).
A single-sided copper-clad laminate 910, 910 ′ in which the resin surfaces 911, 911 ′ of the liquid crystal polymer are plasma-treated is prepared, and the resin surfaces 911, 911 ′ are opposed to each other on both sides of the laminate 909 (FIG. 11F). ) To obtain a laminate 912 by heating and pressing (FIG. 11 (g)).
The laminated body 912 is etched 913 (FIG. 11 (h)), and then a blind via hole 914 is formed (FIG. 11 (i)). After the desmear treatment, a plating layer 915 is formed (FIG. 11 (j)), and a wiring circuit layer 916 is further formed (FIG. 11 (k)). 11 (f) to (i) are performed again, through holes 918 are formed in the obtained laminate 917 (FIG. 11 (l)), and desmear treatment is performed to obtain panel plating 919 ( FIG. 11 (m)). Then, the outermost layer 920 is etched and patterned by a tenting method, a wiring circuit layer 919 is formed, a solder resist layer 921 is formed, and an eight-layer printed wiring board 901 is obtained (FIG. 11 (n)).

図12は、図11と同様のポリイミド樹脂層を中心とする8層プリント配線板(後述する実施例10に対応)の製造方法を示す工程図である。
まず、ロール状の、ポリイミド樹脂層を絶縁層とし、その両側に銅箔1003−1、1003−2、1003−1’、1003−2’を積層した2枚の両面銅張積層板1002、1002’が準備され、任意の方法で配線回路層1004−1、1004−2、1004−1’、1004−2’を形成し、両面配線基板1005、1005’を得る(図12(a))。両面銅張積層板1005、1005’は、市販の両面銅張積層板を使用することができる。なお、ポリイミドフィルムにスパッタめっきなど任意の方法で配線回路層1004−1、1004−2、1004−1’、1004−2’を形成してもよい。ポリイミド樹脂層、配線回路層(銅箔)の厚さなどは上述したものが好ましい。
一方、両面銅張積層板1005、1005’と同サイズの液晶ポリマー層を絶縁層とする両面銅張積層板1006の両面の銅箔をエッチング除去した後、表面をプラズマ処理して液晶ポリマー層1007を得る(図12(b))。
次に、両面銅張積層板1005、1005’の間に表面処理済み液晶ポリマー層1007を挟み、加熱圧着した後、冷却し、積層体1009を得る(図12(c))。なお、参照符号1008は、熱盤を示す。
液晶ポリマー1011、1011’の樹脂面をプラズマ処理した片面銅張積層板1010、1010’を準備し、積層体1009の両面に、液晶ポリマー1011、1011’の樹脂面を対向させて重ね、加熱・加圧して積層体1012を得る(図12(d))。
次に、積層体1012をエッチング加工1014し、その後、ブラインドビア穴1015を形成する(図12(e))。デスミア処理後、配線回路層1004−1、1004−2’と電気的に接続しためっき層1016を形成し(図12(f))、さらに配線回路層1017を形成する(図12(g))。再度、図12(d)〜(e)までの工程を実施し、得られた積層体1018にスルーホール1019を形成し(図12(h))、デスミア処理して、パネルめっき1020を得る(図12(i))。そして、テンティング法により最外層1021、1021’をエッチング、パターン化し、配線回路層1022を形成し、ソルダーレジスト層1023を形成して8層プリント配線板1001を得る(図12(j))。
FIG. 12 is a process diagram showing a method for producing an 8-layer printed wiring board (corresponding to Example 10 described later) centering on a polyimide resin layer similar to FIG.
First, two double-sided copper-clad laminates 1002 and 1002 in which a roll-shaped polyimide resin layer is an insulating layer and copper foils 1003-1, 1003-2, 1003-1 ′, and 1003-2 ′ are laminated on both sides thereof. 'Is prepared, wiring circuit layers 1004-1, 1004-2, 1004-1', 1004-2 'are formed by an arbitrary method, and double-sided wiring boards 1005, 1005' are obtained (FIG. 12A). As the double-sided copper-clad laminates 1005 and 1005 ′, commercially available double-sided copper-clad laminates can be used. Note that the wiring circuit layers 1004-1, 1004-2, 1004-1 ′, and 1004-2 ′ may be formed on the polyimide film by an arbitrary method such as sputter plating. The thicknesses of the polyimide resin layer and the wiring circuit layer (copper foil) are preferably as described above.
On the other hand, after removing the copper foil on both sides of the double-sided copper-clad laminate 1006 having a liquid crystal polymer layer of the same size as that of the double-sided copper-clad laminates 1005 and 1005 ′ as an insulating layer, the surface is subjected to plasma treatment and the liquid crystal polymer layer 1007 Is obtained (FIG. 12B).
Next, the surface-treated liquid crystal polymer layer 1007 is sandwiched between the double-sided copper-clad laminates 1005 and 1005 ′, thermocompression-bonded, and then cooled to obtain a laminate 1009 (FIG. 12C). Reference numeral 1008 indicates a hot platen.
A single-sided copper-clad laminate 1010, 1010 ′ in which the resin surfaces of the liquid crystal polymers 1011 and 1011 ′ are plasma-treated is prepared, and the resin surfaces of the liquid crystal polymers 1011 and 1011 ′ are overlapped on both surfaces of the laminate 1009, The laminated body 1012 is obtained by applying pressure (FIG. 12 (d)).
Next, the laminated body 1012 is etched 1014, and then a blind via hole 1015 is formed (FIG. 12E). After the desmear process, a plating layer 1016 electrically connected to the wiring circuit layers 1004-1 and 1004-2 ′ is formed (FIG. 12 (f)), and a wiring circuit layer 1017 is further formed (FIG. 12 (g)). . 12D to 12E are performed again, through holes 1019 are formed in the obtained laminate 1018 (FIG. 12H), and desmearing is performed to obtain panel plating 1020 ( FIG. 12 (i)). Then, the outermost layers 1021 and 1021 ′ are etched and patterned by a tenting method to form a wiring circuit layer 1022, and a solder resist layer 1023 to obtain an eight-layer printed wiring board 1001 (FIG. 12 (j)).

実施例および比較例を挙げて、本発明をさらに説明する。なお、本発明は、以下に説明する実施例に限定されるものではない。   The present invention will be further described with reference to examples and comparative examples. In addition, this invention is not limited to the Example demonstrated below.

(実施例1)
図3に断面図を示す多層プリント配線板101について説明する。
多層(4層)プリント配線板101は、基本構造105として、絶縁層に1層のポリイミド樹脂層103と2層の液晶ポリマー層104を用いたものであり、ポリイミド樹脂層103の両側には、配線回路層102が形成されており、更にその両側には、液晶ポリマー層104を絶縁層として有している。ポリイミド樹脂層103とその両側の配線回路層102は、両面銅張積層板(新日鐵化学(株)社製 商品名エスパネックスS(エスパネックスは登録商標) 品番:SB12−25−12CE)から形成されている。すなわち、ポリイミド樹脂層103は前記両面銅張積層板に由来するポリイミド樹脂層であり、配線回路層102は、同両面銅張積層板に由来する銅箔を回路加工して形成されたものである。
Example 1
The multilayer printed wiring board 101 whose sectional view is shown in FIG. 3 will be described.
The multilayer (four-layer) printed wiring board 101 uses, as a basic structure 105, one polyimide resin layer 103 and two liquid crystal polymer layers 104 as insulating layers, and on both sides of the polyimide resin layer 103, A wiring circuit layer 102 is formed, and a liquid crystal polymer layer 104 is provided as an insulating layer on both sides thereof. The polyimide resin layer 103 and the wiring circuit layer 102 on both sides thereof are made from a double-sided copper-clad laminate (trade name Espanex S (Espanex is a registered trademark) manufactured by Nippon Steel Chemical Co., Ltd., product number: SB12-25-12CE). Is formed. That is, the polyimide resin layer 103 is a polyimide resin layer derived from the double-sided copper-clad laminate, and the wiring circuit layer 102 is formed by processing a copper foil derived from the double-sided copper-clad laminate. .

図3の多層プリント配線板101において、基本構造105としての液晶ポリマー層104とそれに隣接して設けられている配線回路層109は、例えば、前記両面銅張積層板を回路加工して得られた両面配線基板の両側に、厚さ25μmの液晶ポリマーからなる絶縁層の片面に厚さ12μmの銅箔を有する片面銅張積層板(以下、これを片面銅張積層板LXという。液晶ポリマーの融点:280℃)を積層一体化し、銅箔を回路加工することによって形成することができる。図3中、配線回路層109上にはその表面に配線回路層106を有し、また、各層間を電気的に接続するめっきスルーホール107と最外層に形成されたソルダーレジスト層108を有している。 In the multilayer printed wiring board 101 of FIG. 3, the liquid crystal polymer layer 104 as the basic structure 105 and the wiring circuit layer 109 provided adjacent thereto are obtained, for example, by circuit processing of the double-sided copper-clad laminate. A single-sided copper-clad laminate (hereinafter referred to as single-sided copper-clad laminate LX. This is referred to as a single-sided copper-clad laminate LX. Melting point of the liquid crystal polymer). : 280 [deg.] C.), and a copper foil can be formed by circuit processing. In FIG. 3, the wiring circuit layer 109 has a wiring circuit layer 106 on the surface thereof, and also has a plated through hole 107 that electrically connects each layer and a solder resist layer 108 formed in the outermost layer. ing.

ここで、配線回路層106は配線回路層109とめっきスルーホール107と同一のめっき銅110とから構成される。液晶ポリマー層104の厚みは25μm、配線回路層109の厚みは12μm、ポリイミド樹脂層103の厚みは25μmである。また、スルーホール107の穴径は0.15mm、めっき銅110の厚みは8μm、ソルダーレジスト層108の厚みは25μmである。配線回路層の基本設計ルールは配線回路層102がライン/スペース:50/50μm、配線回路層106が75/75μm、各配線回路層102、106のスルーホールランド111がφ0.3mmである。なお、ポリイミド樹脂層103と2つの液晶ポリマー層104、104との間に形成される2つの境界面112、112の粗さ(Rz)は、断面観察の結果、4.5μmと4.9μmであった。また。この4層プリント配線板101の総厚は約125μmであった。 Here, the wiring circuit layer 106 is composed of the wiring circuit layer 109 and the same plated copper 110 as the plated through hole 107. The thickness of the liquid crystal polymer layer 104 is 25 μm, the thickness of the wiring circuit layer 109 is 12 μm, and the thickness of the polyimide resin layer 103 is 25 μm. The through hole 107 has a hole diameter of 0.15 mm, the plated copper 110 has a thickness of 8 μm, and the solder resist layer 108 has a thickness of 25 μm. The basic design rule of the wiring circuit layer is that the wiring circuit layer 102 has a line / space of 50/50 μm, the wiring circuit layer 106 has 75/75 μm, and the through-hole land 111 of each wiring circuit layer 102 and 106 has φ0.3 mm. The roughness (Rz) of the two boundary surfaces 112 and 112 formed between the polyimide resin layer 103 and the two liquid crystal polymer layers 104 and 104 is 4.5 μm and 4.9 μm as a result of cross-sectional observation. there were. Also. The total thickness of the four-layer printed wiring board 101 was about 125 μm.

(実施例2)
図4に断面図を示す多層プリント配線板201について説明する。
多層(4層)プリント配線板201は、絶縁層に2層のポリイミド樹脂層203、203’と1層の液晶ポリマー層204を用いたものであり、各ポリイミド樹脂層203、203’の両側には、配線回路層208、208’が形成されており、ポリイミド樹脂層203とポリイミド樹脂層203’との間には絶縁層として液晶ポリマー層204を有している。ポリイミド樹脂層203とその両側の配線回路層208、208’は、両面銅張積層板(新日鐵化学(株)社製 商品名エスパネックスM 品番:MB12−12−12FR)から形成されている。すなわち、ポリイミド樹脂層203、203’は前記両面銅張積層板に由来するポリイミド樹脂層であり、配線回路層208、208’は、同両面銅張積層板に由来する銅箔を回路加工して形成されたものである。
(Example 2)
The multilayer printed wiring board 201 whose sectional view is shown in FIG. 4 will be described.
The multilayer (four-layer) printed wiring board 201 uses two polyimide resin layers 203 and 203 ′ and one liquid crystal polymer layer 204 as insulating layers, and is provided on both sides of each polyimide resin layer 203 and 203 ′. Wiring circuit layers 208 and 208 ′ are formed, and a liquid crystal polymer layer 204 is provided as an insulating layer between the polyimide resin layer 203 and the polyimide resin layer 203 ′. The polyimide resin layer 203 and the wiring circuit layers 208 and 208 ′ on both sides thereof are formed from a double-sided copper-clad laminate (trade name Espanex M product number: MB12-12-12FR manufactured by Nippon Steel Chemical Co., Ltd.). . That is, the polyimide resin layers 203 and 203 ′ are polyimide resin layers derived from the double-sided copper-clad laminate, and the wiring circuit layers 208 and 208 ′ are obtained by circuit processing of copper foil derived from the double-sided copper-clad laminate. It is formed.

図4の多層プリント配線板201の基本構造205は、液晶ポリマー層204の両側に、ポリイミド樹脂層203、203’を絶縁層とする両面銅張積層板の片面側のみ回路加工して形成した配線回路層202−2、202−1’と液晶ポリマー層204が対向するように積層一体化し、その後、外側の配線回路層208を形成した。ここで、液晶ポリマー層204には、厚さ50μmの液晶ポリマー層を絶縁層とし、その両面に厚さ12μmの銅箔を有する両面銅張積層板(以下、これを両面銅張積層板LYという。液晶ポリマーの融点:300℃ )の銅箔をエッチング除去した液晶ポリマーフィルムを使用した。図4中、外側の配線回路層208上にはその表面に配線回路層209を有し、また、各層間を電気的に接続するめっきスルーホール206と最外層に形成されたソルダーレジスト層207を有している。   The basic structure 205 of the multilayer printed wiring board 201 in FIG. 4 is a wiring formed by processing a circuit on only one side of a double-sided copper-clad laminate having polyimide resin layers 203 and 203 ′ as insulating layers on both sides of a liquid crystal polymer layer 204. The circuit layers 202-2 and 202-1 ′ and the liquid crystal polymer layer 204 were laminated and integrated so as to face each other, and then the outer wiring circuit layer 208 was formed. Here, the liquid crystal polymer layer 204 is a double-sided copper-clad laminate (hereinafter referred to as a double-sided copper-clad laminate LY) having a liquid crystal polymer layer having a thickness of 50 μm as an insulating layer and copper foil having a thickness of 12 μm on both sides thereof. A liquid crystal polymer film obtained by etching away a copper foil having a melting point of liquid crystal polymer: 300 ° C. was used. In FIG. 4, a wiring circuit layer 209 is provided on the surface of the outer wiring circuit layer 208, and a plated through hole 206 for electrically connecting each layer and a solder resist layer 207 formed in the outermost layer. Have.

ここで、配線回路層202−1と202−2’は、両面銅張積層板LY由来の配線回路層208(エスパネックスM 品番:MB12−12−12FR)とめっきスルーホール206と同一のめっき銅209とから構成される。ポリイミド樹脂層の厚みは12μm、エスパネックスMに由来する銅箔厚は12μmである。また、スルーホール206の穴径は0.15mm、めっき銅209の厚みは8μm、ソルダーレジスト膜厚は20μmである。配線回路層の基本設計ルールは、配線回路層202−2と202−1’がライン/スペース:50/50μm、配線回路層202−1と202−2’がライン/スペース:75/75μm、各層のスルーホールが206がφ0.3mmである。なお、ポリイミド樹脂層203、203’と液晶ポリマー層204の界面210の粗さ(Rz)は、断面観察の結果、2.0μmと1.9μmであった。また。この4層プリント配線板201の総厚は約115μmであった。   Here, the wiring circuit layers 202-1 and 202-2 'are the same plated copper as the wiring circuit layer 208 (Espanex M product number: MB12-12-12FR) derived from the double-sided copper clad laminate LY and the plated through hole 206. 209. The thickness of the polyimide resin layer is 12 μm, and the thickness of the copper foil derived from Espanex M is 12 μm. The through hole 206 has a hole diameter of 0.15 mm, the plated copper 209 has a thickness of 8 μm, and a solder resist film thickness of 20 μm. The basic design rules of the wiring circuit layer are as follows: wiring circuit layers 202-2 and 202-1 ′ are line / space: 50/50 μm, wiring circuit layers 202-1 and 202-2 ′ are line / space: 75/75 μm, each layer The through hole 206 is φ0.3 mm. The roughness (Rz) of the interface 210 between the polyimide resin layers 203 and 203 ′ and the liquid crystal polymer layer 204 was 2.0 μm and 1.9 μm as a result of cross-sectional observation. Also. The total thickness of the four-layer printed wiring board 201 was about 115 μm.

(実施例3)
図5に断面図を示す多層プリント配線板301について説明する。
多層(8層)プリント配線板301は、実施例2と同様の基本構造302(但し、スルーホール208とそのめっき銅209に相当する構造は無し)の両面に、液晶ポリマー層303、303’と、IVH304’、配線回路層305、305’、さらにもう一層ずつ液晶ポリマー層317、317’、BVH307、307’、配線回路層308、308’を積層一体化し、各層間を電気的に接続するめっきスルーホール309と最外層に形成されたソルダーレジスト層310とからなる8層プリント配線板である。
液晶ポリマー層303、303’は、 厚さ25μmの液晶ポリマーを絶縁層とし、その片面に厚さ9μmの銅箔を有する片面銅張積層板(以下、これを片面銅張積層板LXという。液晶ポリマーの融点:300℃)に由来するもので、配線回路層311、311’は、同片面銅張積層板の銅箔を回路加工して形成されたものである。また、液晶ポリマー層317、317’は、厚さ50μmの液晶ポリマーを絶縁層とし、その片面に厚さ9μmの銅箔を有する片面銅張積層板(以下、これを片面銅張積層板LXという。液晶ポリマーの融点:280℃)に由来するもので、配線回路層313、313’は、同片面銅張積層板の銅箔を回路加工して形成されたものである。IVH304’は、公知の手段で任意に設けられ、他の配線回路との電気的接続を可能とする。
(Example 3)
The multilayer printed wiring board 301 whose sectional view is shown in FIG. 5 will be described.
A multilayer (8-layer) printed wiring board 301 includes liquid crystal polymer layers 303 and 303 ′ on both sides of a basic structure 302 similar to that of the second embodiment (however, there is no structure corresponding to the through hole 208 and its plated copper 209). , IVH 304 ′, wiring circuit layers 305, 305 ′, liquid crystal polymer layers 317, 317 ′, BVH 307, 307 ′, wiring circuit layers 308, 308 ′ are laminated and integrated, and the layers are electrically connected to each other. This is an eight-layer printed wiring board composed of a through hole 309 and a solder resist layer 310 formed in the outermost layer.
Liquid crystal polymer layer 303, 303 'is a liquid crystal polymer having a thickness of 25μm and the insulating layer, single-sided copper-clad laminate having a copper foil having a thickness of 9μm on one surface thereof (hereinafter referred to as single-sided copper clad laminate LX 2. The wiring circuit layers 311 and 311 ′ are formed by circuit processing of the copper foil of the single-sided copper-clad laminate. The liquid crystal polymer layers 317 and 317 ′ have a single-sided copper-clad laminate (hereinafter referred to as a single-sided copper-clad laminate LX 3) having a liquid crystal polymer with a thickness of 50 μm as an insulating layer and a copper foil with a thickness of 9 μm on one side. The wiring circuit layers 313 and 313 ′ are formed by processing a copper foil of the single-sided copper-clad laminate. The IVH 304 ′ is arbitrarily provided by a known means, and can be electrically connected to other wiring circuits.

ここで、配線回路層305と305’は、配線回路層311、311’とIVH304、304’と同一のめっき銅312とから構成される。同様に、配線回路層308、308’は配線回路層313、313’とBVH307、307’と、めっきスルーホール309と同一のめっき銅314とから構成される。
片面銅張積層板LX及び片面銅張積層板LXに由来する液晶ポリマー厚は25μmおよび配線回路層313、313’の厚みは9μmで、IVH304’、BVH307、307’の上径は100μm、下径は90μm、めっき銅314の厚みは8μm、スルーホール309の穴径は0.15mm、めっき銅312の厚みは8μm、ソルダーレジスト層310の膜厚は20μmである。配線回路層の基本設計ルールは、配線回路層305と305’ のライン/スペースが全層50/50μm、スルーホールランド315が全層0.3mm、IVH304’とBVH307、307’のパッドが0.2mmである。なお、ポリイミド樹脂層と液晶ポリマー層の界面316の粗さ(Rz)は、断面観察の結果、2.2μmと2.0μmであった。また。この8層プリント配線板301の総厚は約270μmであった。
Here, the wiring circuit layers 305 and 305 ′ are composed of the wiring circuit layers 311 and 311 ′ and the plated copper 312 that is the same as the IVHs 304 and 304 ′. Similarly, the wiring circuit layers 308 and 308 ′ are composed of the wiring circuit layers 313 and 313 ′, the BVH 307 and 307 ′, and the plated copper 314 that is the same as the plated through hole 309.
The liquid crystal polymer thickness derived from the single-sided copper-clad laminate LX 2 and the single-sided copper-clad laminate LX 3 is 25 μm and the wiring circuit layers 313 and 313 ′ have a thickness of 9 μm, and the upper diameters of IVH304 ′, BVH307 and 307 ′ are 100 μm, The lower diameter is 90 μm, the thickness of the plated copper 314 is 8 μm, the hole diameter of the through hole 309 is 0.15 mm, the thickness of the plated copper 312 is 8 μm, and the thickness of the solder resist layer 310 is 20 μm. The basic design rules for the wiring circuit layer are as follows: the wiring / layers of the wiring circuit layers 305 and 305 ′ are 50/50 μm in all layers, the through-hole lands 315 are 0.3 mm in all layers, and the pads of IVH304 ′ and BVH307 and 307 ′ are 0. 2 mm. The roughness (Rz) of the interface 316 between the polyimide resin layer and the liquid crystal polymer layer was 2.2 μm and 2.0 μm as a result of cross-sectional observation. Also. The total thickness of the eight-layer printed wiring board 301 was about 270 μm.

(実施例4)
図6に断面図を示す多層プリント配線板401について説明する。
多層(4層)プリント配線板401は、絶縁層に1層のポリイミド樹脂層403と2層の液晶ポリマー層404、407を有し、4層の配線回路層402、406,412,414を有している。ポリイミド樹脂層403とその両側の配線回路層402、414は、ポリイミド樹脂層を絶縁層とする両面銅張積層板(エスパネックスS 品番:SB18−25−18CE)に由来する樹脂層とその銅箔を回路加工して形成された配線回路層である。また、ポリイミド樹脂層403に隣接する液晶ポリマー層404と配線回路層406は厚さ50μmの液晶ポリマー層の絶縁層の片面に厚さ18μmの銅箔を有する片面銅張積層板(以下、これを片面銅張積層板LXという。液晶ポリマーの融点:290℃)に由来するもので、その液晶ポリマー層404に隣接する液晶ポリマー層407と配線回路層412とは、厚さ50μmの液晶ポリマー層の絶縁層の片面に厚さ18μmの銅箔を有するとする片面銅張積層板(以下、これを片面銅張積層板LXという。液晶ポリマーの融点:280℃)に由来する樹脂層とその銅箔を回路加工して形成された配線回路層である。なお、配線回路層408は、配線回路層412とBVH409、めっきスルーホール410と同一のめっき銅413から、また、配線回路層402’は配線回路層414とめっき銅413から構成される。
Example 4
The multilayer printed wiring board 401 whose sectional view is shown in FIG. 6 will be described.
The multilayer (four-layer) printed wiring board 401 has one polyimide resin layer 403 and two liquid crystal polymer layers 404 and 407 in an insulating layer, and four wiring circuit layers 402, 406, 412, and 414. is doing. The polyimide resin layer 403 and the wiring circuit layers 402 and 414 on both sides thereof are a resin layer derived from a double-sided copper-clad laminate (Espanex S product number: SB18-25-18CE) having a polyimide resin layer as an insulating layer and its copper foil It is a wiring circuit layer formed by processing the circuit. Further, the liquid crystal polymer layer 404 and the wiring circuit layer 406 adjacent to the polyimide resin layer 403 are a single-sided copper clad laminate (hereinafter referred to as “this”) having a 18 μm thick copper foil on one side of an insulating layer of a 50 μm thick liquid crystal polymer layer. This is derived from a single-sided copper-clad laminate LX 4. The liquid crystal polymer layer 407 adjacent to the liquid crystal polymer layer 404 and the wiring circuit layer 412 are derived from a liquid crystal polymer layer 404 having a thickness of 50 μm. the insulating layer single-sided copper-clad laminate to a copper foil having a thickness of 18μm on one side of (. hereinafter referred to as one-sided copper-clad laminate LX 5 of the liquid crystal polymer melting point: 280 ° C.) from which the resin layer and its It is a wiring circuit layer formed by processing a copper foil. The wiring circuit layer 408 includes the wiring circuit layer 412 and the BVH 409 and the plated copper 413 that is the same as the plated through hole 410, and the wiring circuit layer 402 ′ includes the wiring circuit layer 414 and the plated copper 413.

ここで、片面銅張積層板LXと片面銅張積層板LXの液晶ポリマーの厚みは50μm、配線回路層406、412の厚みは18μm、ポリイミド樹脂層403の厚みは25μm、配線回路層402’ 408の厚みは18μmである。また、スルーホール410の穴径は0.15mm、BVH409の上径は80μm、下径は75μm、めっき銅413の厚みは8μm、ソルダーレジスト層411の膜厚は20μmである。なお、ポリイミド樹脂層403と液晶ポリマー層404の界面415の粗さ(Rz)は、断面観察の結果、4.7μmと4.6μmであった。また。この4層プリント配線板401の総厚は約168μmであった。 Here, the thickness of the liquid crystal polymer of the single-sided copper-clad laminate LX 4 and the single-sided copper-clad laminate LX 5 is 50 μm, the wiring circuit layers 406 and 412 are 18 μm, the polyimide resin layer 403 is 25 μm, and the wiring circuit layer 402. 'The thickness of 408 is 18 μm. The through hole 410 has a hole diameter of 0.15 mm, the upper diameter of BVH 409 is 80 μm, the lower diameter is 75 μm, the thickness of the plated copper 413 is 8 μm, and the film thickness of the solder resist layer 411 is 20 μm. The roughness (Rz) of the interface 415 between the polyimide resin layer 403 and the liquid crystal polymer layer 404 was 4.7 μm and 4.6 μm as a result of cross-sectional observation. Also. The total thickness of the four-layer printed wiring board 401 was about 168 μm.

(実施例5)
実施例1の4層プリント配線板と同構造の4層プリント配線板501の製造方法を、図7(a)〜(h)に示すプロセス断面図で詳細に説明する。
図7(a)に示すポリイミド樹脂層を絶縁層とする両面銅張積層板(エスパネックスS(SB12−25−12CE))502の両面の銅箔503をサブトラクティブ法によりパターン加工し、配線回路層504を形成した400×300mmの両面配線基板505を作製した(図7(b))。次に、液晶ポリマー層を絶縁層とする同サイズの片面銅張積層板LX506を準備し、樹脂面同士を対向させ両面配線基板505をその両側から挟み、そのまま、真空プレスにセットした(図7(c))。次いで、プレス熱盤507間を1.3kPaで排気しながら、型締めを行い、熱盤を260℃に昇温して加熱した。熱盤温度が260℃に達した5分後に、6MPaの接着圧を付加し、10分後、熱盤507の冷却を開始した(図7(d))。20分後、接着圧を除去し、熱盤507を開放して、積層体508を取り出した(図7(e))。得られた積層体508にNCドリル加工にてφ0.15mmのスルーホール509を形成し(図7(f))、所定のデスミア処理後、8μm厚のパネルめっき510を形成した(図7(g))。そして、テンティング法により最外層511をエッチング、パターン化し、配線回路層512を形成し、ソルダーレジスト層513を形成して4層プリント配線板501を作製した(図7(h))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
(Example 5)
A manufacturing method of the four-layer printed wiring board 501 having the same structure as the four-layer printed wiring board of Example 1 will be described in detail with reference to process cross-sectional views shown in FIGS.
A copper circuit 503 on both sides of a double-sided copper-clad laminate (Espanex S (SB12-25-12CE)) 502 having the polyimide resin layer shown in FIG. 7A as an insulating layer is patterned by a subtractive method, and a wiring circuit A 400 × 300 mm double-sided wiring board 505 on which the layer 504 was formed was produced (FIG. 7B). Next, a single-sided copper-clad laminate LX506 of the same size having a liquid crystal polymer layer as an insulating layer was prepared, the resin surfaces were opposed to each other, the double-sided wiring board 505 was sandwiched from both sides, and was set as it was in a vacuum press (FIG. 7). (C)). Next, the mold was clamped while evacuating the press hot platen 507 at 1.3 kPa, and the hot platen was heated to 260 ° C. and heated. Five minutes after the hot platen temperature reached 260 ° C., an adhesive pressure of 6 MPa was applied, and 10 minutes later, cooling of the hot platen 507 was started (FIG. 7D). After 20 minutes, the adhesive pressure was removed, the heating plate 507 was opened, and the laminate 508 was taken out (FIG. 7 (e)). A through hole 509 having a diameter of 0.15 mm was formed in the obtained laminate 508 by NC drilling (FIG. 7 (f)), and after a predetermined desmear treatment, a panel plating 510 having a thickness of 8 μm was formed (FIG. 7 (g) )). Then, the outermost layer 511 was etched and patterned by a tenting method, a wiring circuit layer 512 was formed, a solder resist layer 513 was formed, and a four-layer printed wiring board 501 was produced (FIG. 7H).
The yield loss due to powder falling in this process was 0%.

(実施例6)
実施例5の4層プリント配線板と同構造の4層プリント配線板601の別の製造方法を、図8(a)〜(f)に示すプロセス断面図で詳細に説明する。
実施例5で使用したのと同じ両面銅張積層板602の両面の銅箔603をサブトラクティブ法によりパターン加工し、配線回路層604を形成した幅300mm×長さ100mのロール状に巻き取った長尺の両面配線基板605を作製した(図8(a))。両面配線基板605をその両側から樹脂面を対向させた同形状の片面銅張積層板LX606で挟み(図8(b))、表面温度260℃のロール607間に供給し、連続的に線圧20kN/mで加熱、加圧した(図8(c))。得られた連続積層体608は、400×30mmに裁断し、NCドリル加工にてφ0.15mmのスルーホール609を形成し(図8(d))、所定のデスミア処理後、8μm厚のパネルめっき610を形成した(図8(e))。そして、テンティング法により最外層611をエッチング、パターン化し、配線回路層612を形成し、ソルダーレジスト層613を形成して4層プリント配線板601を作製した(図8(f))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
(Example 6)
Another method for manufacturing a four-layer printed wiring board 601 having the same structure as the four-layer printed wiring board of Example 5 will be described in detail with reference to process cross-sectional views shown in FIGS.
The copper foil 603 on both sides of the same double-sided copper-clad laminate 602 used in Example 5 was patterned by a subtractive method, and wound into a roll having a width of 300 mm and a length of 100 m on which the wiring circuit layer 604 was formed. A long double-sided wiring board 605 was produced (FIG. 8A). The double-sided wiring board 605 is sandwiched between the same-shaped single-sided copper-clad laminates LX606 with the resin surfaces facing from both sides (FIG. 8B), and is supplied between rolls 607 having a surface temperature of 260 ° C. It heated and pressurized at 20 kN / m (FIG.8 (c)). The obtained continuous laminate 608 is cut to 400 × 30 mm, and a through hole 609 having a diameter of 0.15 mm is formed by NC drilling (FIG. 8D). After predetermined desmear treatment, 8 μm thick panel plating is performed. 610 was formed (FIG. 8E). Then, the outermost layer 611 was etched and patterned by a tenting method, a wiring circuit layer 612 was formed, and a solder resist layer 613 was formed to produce a four-layer printed wiring board 601 (FIG. 8F).
The yield loss due to powder falling in this process was 0%.

(実施例7)
実施例2の4層プリント配線板と同構造の4層プリント配線板701の製造方法を、図9(a)〜(i)に示すプロセス断面図で詳細に説明する。
400×300mmのポリイミド樹脂層を絶縁層とする両面銅張積層板(エスパネックスM 品番:MB12−12−12FR)702(図9(a))の片面の銅箔703−2をサブトラクティブ法によりパターン加工し、配線回路層704−2を形成した。同様にもう一枚の両面銅張積層板702’をパターン加工した(図9(b))。次いで、同サイズの液晶ポリマー層を絶縁層とする両面銅張積層板LY705の両面の銅箔706をエッチング除去し、露出した表面を水酸化カリウム(34質量%)/エチレングリコール(22質量%)/エチレンジアミン(11質量%)のアルカリ混合水溶液で60℃、60秒浸漬処理した液晶ポリマー層707を作製した(図9(c))。配線回路層(704−2、704−1’)面を対向させた片面加工基板702、702’の間に表面処理済み液晶ポリマー層707を挟み、そのまま、真空プレスにセットした(図9(d))。次いで、プレス熱盤708間を1.3kPaで排気しながら、型締めを行い、熱盤708を300℃に昇温して加熱した。熱盤温度が300℃に達した5分後に、4MPaの接着圧を付加し、10分後、熱盤708の冷却を開始した(図9(e))。20分後、接着圧を除去し、熱盤708を開放して、積層体709を取り出した(図9(f))。得られた積層体709にNCドリル加工にてφ0.15mmのスルーホール710を形成し(図9(g))、所定のデスミア処理後、8μm厚のパネルめっき711を形成した(図9(h))。そして、テンティング法により最外層712をエッチング、パターン化し、配線回路層713を形成し、さらにソルダーレジスト層714を形成して4層プリント配線板701を作製した(図9(i))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
(Example 7)
A method for manufacturing a four-layer printed wiring board 701 having the same structure as the four-layer printed wiring board of Example 2 will be described in detail with reference to process cross-sectional views shown in FIGS.
A double-sided copper-clad laminate (Espanex M product number: MB12-12-12FR) 702 (FIG. 9 (a)) having a 400 × 300 mm polyimide resin layer as an insulating layer is applied by a subtractive method. Pattern processing was performed to form a wiring circuit layer 704-2. Similarly, another double-sided copper-clad laminate 702 ′ was patterned (FIG. 9B). Next, the copper foil 706 on both sides of the double-sided copper clad laminate LY705 having the same size liquid crystal polymer layer as an insulating layer is removed by etching, and the exposed surface is potassium hydroxide (34% by mass) / ethylene glycol (22% by mass). A liquid crystal polymer layer 707 was prepared by immersion treatment in an alkali mixed aqueous solution of / ethylenediamine (11% by mass) at 60 ° C. for 60 seconds (FIG. 9C). The surface-treated liquid crystal polymer layer 707 is sandwiched between single-sided processed substrates 702 and 702 ′ facing the wiring circuit layers (704-2 and 704-1 ′) and set in a vacuum press as it is (FIG. 9 (d). )). Next, the mold was clamped while evacuating between the press hot plates 708 at 1.3 kPa, and the hot plate 708 was heated to 300 ° C. and heated. Five minutes after the hot platen temperature reached 300 ° C., an adhesive pressure of 4 MPa was applied, and 10 minutes later, cooling of the hot platen 708 was started (FIG. 9E). After 20 minutes, the adhesive pressure was removed, the hot platen 708 was opened, and the laminate 709 was taken out (FIG. 9 (f)). A through hole 710 having a diameter of 0.15 mm was formed in the obtained laminate 709 by NC drilling (FIG. 9G), and a panel plating 711 having a thickness of 8 μm was formed after predetermined desmear treatment (FIG. 9H )). Then, the outermost layer 712 was etched and patterned by a tenting method to form a wiring circuit layer 713, and further a solder resist layer 714 was formed to produce a four-layer printed wiring board 701 (FIG. 9 (i)).
The yield loss due to powder falling in this process was 0%.

(実施例8)
実施例7の4層プリント配線板と同構造の4層プリント配線板801の別の製造方法を、図10(a)〜(f)に示すプロセス断面図で詳細に説明する。
ポリイミド樹脂層を絶縁層とする2本の両面銅張積層板(エスパネックスM 品番:MB12−12−12FR)802、802’の銅箔803、803’ のそれぞれ片面をサブトラクティブ法によりパターン加工し、配線回路層804、804’を形成した幅30mm×長さ100mのロール状に巻き取った長尺の両面配線基板805、805’を作製した(図10(a))。次いで、同形状の液晶ポリマー層を絶縁層とする両面銅張積層板LY806の両面の銅箔をエッチング除去し、露出した表面をアルゴン、ヘリウム、酸素、窒素からなるガスを用いてプラズマ処理した液晶ポリマー層807を作製した(図10(b))。この液晶ポリマー層807を配線回路層804、804’を対向させた2枚の配線基板805、805’で挟み、表面温度260℃のロール808間に供給し、連続的に線圧100kN/mで加熱、加圧した(図10(c))。得られた連続積層体809は、400×300mmに裁断し、NCドリル加工にてφ0.15mmのスルーホール810を形成し(図10(d))、所定のデスミア処理後、8μm厚のパネルめっきを811形成した(図10(e))。そして、テンティング法により最外層812をエッチング、パターン化し、配線回路層813を形成し、ソルダーレジスト層814を形成して4層プリント配線板801を作製した(図10(f))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
(Example 8)
Another method for manufacturing a four-layer printed wiring board 801 having the same structure as the four-layer printed wiring board of Example 7 will be described in detail with reference to process cross-sectional views shown in FIGS.
Two sides of copper-clad laminate (Espanex M product number: MB12-12-12FR) 802, 802 ′ copper foils 803, 803 ′ each having a polyimide resin layer as an insulating layer are patterned by a subtractive method. Then, long double-sided wiring boards 805 and 805 ′ wound in a roll shape having a width of 30 mm and a length of 100 m on which the wiring circuit layers 804 and 804 ′ were formed were produced (FIG. 10A). Next, the copper foil on both sides of the double-sided copper clad laminate LY806 having the same shape liquid crystal polymer layer as the insulating layer is removed by etching, and the exposed surface is plasma-treated using a gas composed of argon, helium, oxygen, and nitrogen. A polymer layer 807 was produced (FIG. 10B). The liquid crystal polymer layer 807 is sandwiched between two wiring boards 805 and 805 ′ facing the wiring circuit layers 804 and 804 ′, and supplied between rolls 808 having a surface temperature of 260 ° C., and continuously at a linear pressure of 100 kN / m. It heated and pressurized (FIG.10 (c)). The obtained continuous laminate 809 is cut to 400 × 300 mm, and a through hole 810 having a diameter of 0.15 mm is formed by NC drilling (FIG. 10D). After predetermined desmear treatment, panel plating with a thickness of 8 μm is performed. 811 was formed (FIG. 10E). Then, the outermost layer 812 was etched and patterned by a tenting method, a wiring circuit layer 813 was formed, a solder resist layer 814 was formed, and a four-layer printed wiring board 801 was produced (FIG. 10F).
The yield loss due to powder falling in this process was 0%.

(実施例9)
実施例3の8層プリント配線板と同構造の8層プリント配線板901の製造方法を、図11(a)〜(j)に示すプロセス断面図で詳細に説明する。
400×300mmのポリイミド樹脂層を絶縁層とする両面銅張積層板(エスパネックスM 品番:MB12−12−12FR)902(図11(a))の両面の銅箔903−1、903−2をサブトラクティブ法によりパターン加工し、配線回路層904−1、904−2を形成した。同様にもう一枚作製した(図11(b))。次いで、同サイズの液晶ポリマー層を絶縁層とする両面銅張積層板LY905の両面の銅箔906をエッチング除去し、露出した表面を水酸化カリウム(34質量%)/エチレングリコール(22質量%)/エチレンジアミン(11質量%)のアルカリ混合水溶液で80℃30秒浸漬処理した液晶ポリマー層907を作製した(図11(c))。両面銅張積層板902、902’の間に表面処理済み液晶ポリマー層907を挟み、そのまま、真空プレスにセットした(図11(d))。次いで、プレス熱盤908間を1.3kPaで排気しながら、型締めを行い、熱盤908を280℃に昇温して加熱した。熱盤温度が280℃に達した5分後に、5MPaの接着圧を付加し、10分後、熱盤908の冷却を開始した(図11(e))。20分後、接着圧を除去し、熱盤908を開放して、積層体909を取り出し、得られた積層体909の両面に、液晶ポリマーの樹脂面をアルゴン、ヘリウム、酸素、窒素からなるガスを用いてプラズマ処理した片面銅張積層板LX910、910’の樹脂面911、911’を対向させて重ね(図11(f))、上記条件で真空プレスして積層体912を作製した(図11(g))。積層体912の所定の位置の銅箔をφ100μmにエッチング加工913し(図11(h))、ついで、炭酸レーザにてブラインドビア穴914を形成した(図11(i))。デスミア処理後、配線回路層904−2’と電気的に接続しためっき層915を形成し(図11(j))、サブトラクティブ法により配線回路層916を形成した(図11(k))。再度、図11(f)〜(i)までの工程を実施し、得られた積層体917にNCドリル加工にてφ0.15mmのスルーホール918を形成し(図11(l))、所定のデスミア処理後、8μm厚のパネルめっき919を形成した(図11(m))。但し、図11(l)において新たに積層した片面銅張積層板には、片面銅張積層板LXを用いた。そして、テンティング法により最外層920をエッチング、パターン化し、配線回路層921を形成し、ソルダーレジスト層922を形成して8層プリント配線板901を作製した(図11(n))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
Example 9
A manufacturing method of the 8-layer printed wiring board 901 having the same structure as the 8-layer printed wiring board of Example 3 will be described in detail with reference to the process cross-sectional views shown in FIGS.
Double-sided copper-clad laminate (Espanex M product number: MB12-12-12FR) 902 (FIG. 11A) having a 400 × 300 mm polyimide resin layer as an insulating layer is used. Pattern processing was performed by a subtractive method to form wiring circuit layers 904-1 and 904-2. Similarly, another sheet was produced (FIG. 11 (b)). Next, the copper foil 906 on both sides of the double-sided copper clad laminate LY905 having the same size liquid crystal polymer layer as the insulating layer is removed by etching, and the exposed surface is potassium hydroxide (34% by mass) / ethylene glycol (22% by mass). / Liquid crystal polymer layer 907 which was immersed in an alkali mixed aqueous solution of ethylenediamine (11% by mass) at 80 ° C. for 30 seconds was produced (FIG. 11C). The surface-treated liquid crystal polymer layer 907 was sandwiched between the double-sided copper-clad laminates 902 and 902 ′ and set in a vacuum press as it was (FIG. 11 (d)). Next, the mold was clamped while evacuating between the press hot plates 908 at 1.3 kPa, and the hot plate 908 was heated to 280 ° C. and heated. Five minutes after the hot platen temperature reached 280 ° C., an adhesive pressure of 5 MPa was applied, and 10 minutes later, cooling of the hot platen 908 was started (FIG. 11 (e)). After 20 minutes, the adhesive pressure is removed, the heating platen 908 is opened, the laminate 909 is taken out, and the resin surface of the liquid crystal polymer is formed on both sides of the obtained laminate 909 with a gas composed of argon, helium, oxygen, and nitrogen. Was laminated with the resin surfaces 911 and 911 ′ of the single-sided copper-clad laminate LX 2 910 and 910 ′ facing each other (FIG. 11 (f)) and vacuum-pressed under the above conditions to produce a laminate 912. (FIG. 11 (g)). The copper foil at a predetermined position of the laminated body 912 was etched 913 to φ100 μm (FIG. 11 (h)), and then blind via holes 914 were formed with a carbonic acid laser (FIG. 11 (i)). After the desmear treatment, a plating layer 915 electrically connected to the wiring circuit layer 904-2 ′ was formed (FIG. 11 (j)), and a wiring circuit layer 916 was formed by a subtractive method (FIG. 11 (k)). The steps from FIG. 11 (f) to (i) are performed again, and a through hole 918 having a diameter of 0.15 mm is formed in the obtained laminate 917 by NC drilling (FIG. 11 (l)). After the desmear treatment, panel plating 919 having a thickness of 8 μm was formed (FIG. 11 (m)). However, the single-sided copper-clad laminate newly stacked in FIG. 11 (l), was used a single-sided copper-clad laminate LX 3. Then, the outermost layer 920 was etched and patterned by a tenting method, a wiring circuit layer 921 was formed, and a solder resist layer 922 was formed to produce an eight-layer printed wiring board 901 (FIG. 11 (n)).
The yield loss due to powder falling in this process was 0%.

(実施例10)
実施例9の8層プリント配線板と同構造の8層プリント配線板1001の別の製造方法を、図12(a)〜(f)に示すプロセス断面図で詳細に説明する。
ポリイミド樹脂層を絶縁層とする2本の両面銅張積層板(エスパネックスM 品番:MB12−12−12FR)1002、1002’のそれぞれ両面の銅箔1003−1、1003−2、1003−1’、1003−2’をサブトラクティブ法によりパターン加工し、配線回路層1004−1、1004−2、1004−1’、1004−2’を形成した幅300mm×長さ100mのロール状に巻き取った長尺の両面配線基板1005、1005’を作製した(図12(a))。次いで、同形状の液晶ポリマー層を絶縁層とする両面銅張積層板LY1006の両面の銅箔をエッチング除去し、露出した表面をアルゴン、ヘリウム、酸素、窒素からなるガスを用いてプラズマ処理した液晶ポリマー層1007を作製した(図12(b))。この液晶ポリマー層1007を2枚の両面配線基板1005、1005’で挟み、表面温度240℃のロール1008間に供給し、連続的に線圧100kN/mで加熱、加圧した(図12(c))。得られた連続積層体1009の両面に、さらに、樹脂面をアルゴン、ヘリウム、酸素、窒素からなるガスを用いてプラズマ処理した幅300mm×長さ100mの液晶ポリマー層を絶縁層とする片面銅張積層板LX1010、1010’の樹脂面1011、1011’を対向させて重ね、上記条件で連続加熱・加圧して連続積層体1012を作製した(図12(d))。次いで、連続積層体1012の最外層の銅箔1013、1013’の所定の位置にφ100μmのエッチング加工1014し、続いて、炭酸レーザにてブラインドビア穴1015を加工した(図12(e))。デスミア処理後、配線回路層1004−2’と電気的に接続しためっき層1016を形成し(図12(f))、サブトラクティブ法により配線回路層1017を形成した(図12(g))。再度、図12(d)〜(e)の工程を実施し、得られた連続積層体1018にNCドリル加工でφ0.15mmのスルーホール1019を形成し(図12(h))、所定のデスミア処理後、8μm厚のパネルめっき1020を形成した(図12(i))。但し、図11(h)において新たに積層した片面銅張積層板には、片面銅張積層板LXを用いた。そして、400mm×300mmに裁断した後、テンティング法により最外層1021、1021’をエッチング、パターン化し、配線回路層1022を形成し、ソルダーレジスト層1023を形成して8層プリント配線板1001を形成した(図12(j))。
本プロセスにおける粉落ち起因の歩留り損は0%であった。
(Example 10)
Another manufacturing method of the 8-layer printed wiring board 1001 having the same structure as the 8-layer printed wiring board of Example 9 will be described in detail with reference to process cross-sectional views shown in FIGS.
Two double-sided copper-clad laminates (Espanex M product number: MB12-12-12FR) 1002 and 1002 ′ each having a polyimide resin layer as an insulating layer 1003-1, 1003-2, and 1003-1 ′ , 1003-2 ′ were patterned by a subtractive method, and wound into a roll having a width of 300 mm × a length of 100 m in which wiring circuit layers 1004-1, 1004-2, 1004-1 ′, and 1004-2 ′ were formed. Long double-sided wiring boards 1005 and 1005 ′ were produced (FIG. 12A). Next, the copper foil on both sides of the double-sided copper-clad laminate LY1006 having the same shape liquid crystal polymer layer as an insulating layer is removed by etching, and the exposed surface is plasma-treated using a gas comprising argon, helium, oxygen, and nitrogen. A polymer layer 1007 was produced (FIG. 12B). The liquid crystal polymer layer 1007 is sandwiched between two double-sided wiring boards 1005 and 1005 ′, supplied between rolls 1008 having a surface temperature of 240 ° C., and continuously heated and pressurized at a linear pressure of 100 kN / m (FIG. 12 (c )). On both surfaces of the obtained continuous laminate 1009, a single-sided copper-clad with a liquid crystal polymer layer having a width of 300 mm × length of 100 m obtained by plasma treatment of the resin surface using a gas composed of argon, helium, oxygen, and nitrogen. The resin surfaces 1011 and 1011 ′ of the laminates LX 2 1010 and 1010 ′ were stacked to face each other and continuously heated and pressurized under the above conditions to produce a continuous laminate 1012 (FIG. 12D). Next, an etching process 1014 of φ100 μm was performed at predetermined positions on the outermost copper foils 1013 and 1013 ′ of the continuous laminate 1012, and then blind via holes 1015 were processed with a carbonic acid laser (FIG. 12E). After the desmear treatment, a plating layer 1016 electrically connected to the wiring circuit layer 1004-2 ′ was formed (FIG. 12 (f)), and a wiring circuit layer 1017 was formed by a subtractive method (FIG. 12 (g)). The steps of FIGS. 12D to 12E are performed again, and a through hole 1019 having a diameter of 0.15 mm is formed in the obtained continuous laminate 1018 by NC drilling (FIG. 12H), and a predetermined desmear is formed. After the treatment, a panel plating 1020 having a thickness of 8 μm was formed (FIG. 12 (i)). However, the single-sided copper-clad laminate newly stacked in FIG. 11 (h), using the one-sided copper-clad laminate LX 3. Then, after cutting to 400 mm × 300 mm, the outermost layers 1021 and 1021 ′ are etched and patterned by a tenting method to form a wiring circuit layer 1022 and a solder resist layer 1023 to form an eight-layer printed wiring board 1001. (FIG. 12 (j)).
The yield loss due to powder falling in this process was 0%.

(比較例1)
実施例5において、エスパネックスSの代わりにガラスエポキシ系両面銅張積層板(日立化成製MCL−E−679;銅箔厚12μm、絶縁基材厚60μm)を使用した以外は同様に実施して、総厚190μmの4層基板を作製した。粉落ち起因の歩留り損は4.5%であった。
(Comparative Example 1)
In Example 5, a glass epoxy double-sided copper-clad laminate (MCL-E-679 manufactured by Hitachi Chemical Co., Ltd .; copper foil thickness 12 μm, insulating base material thickness 60 μm) was used instead of Espanex S. A four-layer substrate having a total thickness of 190 μm was produced. The yield loss due to powder falling was 4.5%.

(比較例2)
実施例6において、片面銅張積層板LXの代わりに樹脂付き銅箔(松下電工製R0880;銅箔厚12μm、樹脂厚50μm)を使用し、ラミネートロール表面温度を180℃にした以外は同様に実施した。しかし、ラミネート中に樹脂付銅箔が破断したため、4層プリント配線板は製造できなかった。
(Comparative Example 2)
In Example 6, a copper foil with resin (R0880 made by Matsushita Electric Works; copper foil thickness 12 μm, resin thickness 50 μm) was used instead of the single-sided copper clad laminate LX, and the surface temperature of the laminate roll was changed to 180 ° C. Carried out. However, since the resin-coated copper foil broke during lamination, a four-layer printed wiring board could not be produced.

本発明の多層プリント配線板の基本構造の一例を示す断面図である。It is sectional drawing which shows an example of the basic structure of the multilayer printed wiring board of this invention. 本発明の多層プリント配線板の基本構造の図1とは別の一例を示す断面図である。It is sectional drawing which shows an example different from FIG. 1 of the basic structure of the multilayer printed wiring board of this invention. 実施例1の多層プリント配線板の構造を示す断面図である。1 is a cross-sectional view showing the structure of a multilayer printed wiring board of Example 1. FIG. 実施例2の多層プリント配線板の構造を示す断面図である。It is sectional drawing which shows the structure of the multilayer printed wiring board of Example 2. FIG. 実施例3の多層プリント配線板の構造を示す断面図である。It is sectional drawing which shows the structure of the multilayer printed wiring board of Example 3. FIG. 実施例4の多層プリント配線板の構造を示す断面図である。It is sectional drawing which shows the structure of the multilayer printed wiring board of Example 4. 実施例5の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 5. FIG. 実施例6の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 6. FIG. 実施例7の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 7. FIG. 実施例8の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 8. FIG. 実施例9の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 9. FIG. 実施例10の多層プリント配線板の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the multilayer printed wiring board of Example 10. FIG.

符号の説明Explanation of symbols

10、101、201、301、401、501、601、701、801、901、1001 多層プリント配線板
12、12a、102、106、109、202−1、202−2、208、208’、305、305’、308、308’、 311、311’、 313、313’、402、402’、406、408、412、414、504、512、604、612、713、804、804’、813、916、921、1004−1、1004−2、1004−2’、1017、1022 配線回路層
14a、14b、16c 絶縁層
16、16a 積層構造単位
103、203、203’、403 ポリイミド樹脂層
104、204、303、303’、306、306’、317、317’、404、407、707、807、907、1007 液晶ポリマー層
105、205、302、405 基本構造
107、206、309、410 めっきスルーホール
108、207、310、513、613、714、814、922、1023 ソルダーレジスト層
503、603、703−2、706、803、803、803’、903−1、903−2、904−1、904−2、906、1003−1、1013、1013’ 銅箔
110、209、312、314 めっき銅
111、315 スルーホールランド
112、210、316、411、415 界面
304’ IVH
307、307’、409 BVH
413 めっき
502、602、705、806、905、1006 両面銅張積層板
505、605、805、805’、1005、1005’ 両面配線基板
506、606、910、910’、1010、1010’ 片面銅張積層板
507、708、908 プレス熱盤
508、709、909、912、917 積層体
509、609、710、810、918、1019 スルーホール
510、610、711、811、919、1020 パネルめっき
511、611、712、812、920、1021 最外層
607 ロール
608、809、1009、1012、1018 連続積層体
702、702’、802、902、902’、1002 エスパネックスM
704−1’、704−2、904−2’ 配線回路層
808、1008 ロール
911、911’、1011、1011’ 樹脂面
913、1014 エッチング加工部
914、1015 ブラインドビア穴
915、1016 めっき層
10, 101, 201, 301, 401, 501, 601, 701, 801, 901, 1001 Multilayer printed wiring board 12, 12a, 102, 106, 109, 202-1, 202-2, 208, 208 ′, 305, 305 ′, 308, 308 ′, 311, 311 ′, 313, 313 ′, 402, 402 ′, 406, 408, 412, 414, 504, 512, 604, 612, 713, 804, 804 ′, 813, 916, 921, 1004-1, 1004-2, 1004-2 ′, 1017, 1022 Wiring circuit layers 14a, 14b, 16c Insulating layers 16, 16a Laminated structural units 103, 203, 203 ′, 403 Polyimide resin layers 104, 204, 303 , 303 ′, 306, 306 ′, 317, 317 ′, 404, 407, 707, 807, 907, 10 7 Liquid crystal polymer layer 105, 205, 302, 405 Basic structure 107, 206, 309, 410 Plating through hole 108, 207, 310, 513, 613, 714, 814, 922, 1023 Solder resist layer 503, 603, 703-2 , 706, 803, 803, 803 ′, 903-1, 903-2, 904-1, 904-2, 906, 1003-1, 1013, 1013 ′ Copper foil 110, 209, 312, 314 Plated copper 111, 315 Through-hole land 112, 210, 316, 411, 415 Interface 304 ′ IVH
307, 307 ', 409 BVH
413 Plating 502, 602, 705, 806, 905, 1006 Double-sided copper-clad laminate 505, 605, 805, 805 ′, 1005, 1005 ′ Double-sided wiring board 506, 606, 910, 910 ′, 1010, 1010 ′ Single-sided copper-clad Laminated plate 507, 708, 908 Press hot platen 508, 709, 909, 912, 917 Laminated body 509, 609, 710, 810, 918, 1019 Through hole 510, 610, 711, 811, 919, 1020 Panel plating 511, 611 , 712, 812, 920, 1021 Outermost layer 607 Roll 608, 809, 1009, 1012, 1018 Continuous laminate 702, 702 ′, 802, 902, 902 ′, 1002 Espanex M
704-1 ′, 704-2, 904-2 ′ Wiring circuit layer 808, 1008 Roll 911, 911 ′, 1011, 1011 ′ Resin surface 913, 1014 Etching portion 914, 1015 Blind via hole 915, 1016 Plating layer

Claims (5)

配線回路層と絶縁層とが交互に積層されてなる多層プリント配線板の製造方法において、
ポリイミド樹脂層の両面にそれぞれ配線回路層形成して両面配線基板とし、該両面配線基板をコア基板としてその両面に液晶ポリマー層形成する工程を有することを特徴とする多層プリント配線板の製造方法
In the method for producing a multilayer printed wiring board in which wiring circuit layers and insulating layers are alternately laminated,
On both sides of the polyimide resin layer to form a wiring circuit layer and double-sided circuit board, on both sides of its a double-sided wiring board as a core substrate for a multilayer printed wiring board characterized by having a step of forming a liquid crystal polymer layer Manufacturing method .
前記液晶ポリマー層の前記コア基板と隣り合う側とは反対側に、さらに配線回路層を介して液晶ポリマー層を形成することを特徴とする請求項1記載の多層プリント配線板の製造方法 The method for producing a multilayer printed wiring board according to claim 1, wherein a liquid crystal polymer layer is further formed on a side opposite to the side adjacent to the core substrate of the liquid crystal polymer layer via a wiring circuit layer. 前記ポリイミド樹脂層と前記液晶ポリマー層の境界面の粗さが4〜6μmであることを特徴とする請求項1または2記載の多層プリント配線板の製造方法 The method for producing a multilayer printed wiring board according to claim 1 or 2, wherein a roughness of a boundary surface between the polyimide resin layer and the liquid crystal polymer layer is 4 to 6 µm. 前記ポリイミド樹脂層と前記液晶ポリマー層の境界面の粗さが4μm未満であることを特徴とする請求項1または2記載の多層プリント配線板の製造方法 The method for producing a multilayer printed wiring board according to claim 1 or 2, wherein the roughness of the interface between the polyimide resin layer and the liquid crystal polymer layer is less than 4 µm. 前記液晶ポリマー層の積層面が予め表面処理されてなること特徴とする請求項1〜4のいずれか1項に記載の多層プリント配線板の製造方法 Method for manufacturing a multilayer printed wiring board according to any one of claims 1 to 4, characterized in that the stacking surface of the liquid crystal polymer layer is formed by previously surface-treated.
JP2006043416A 2006-02-21 2006-02-21 Manufacturing method of multilayer printed wiring board Expired - Fee Related JP4587974B2 (en)

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KR1020127033037A KR101262135B1 (en) 2006-02-21 2007-02-21 Multilayer printed wiring board and method for manufacturing same
PCT/JP2007/053201 WO2007097366A1 (en) 2006-02-21 2007-02-21 Multilayer printed wiring board and method for manufacturing same
KR1020087022937A KR101262136B1 (en) 2006-02-21 2008-09-19 Multilayer printed wiring board and method for manufacturing same

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JP5151265B2 (en) 2007-06-14 2013-02-27 日立電線株式会社 Multilayer wiring board and method for manufacturing multilayer wiring board
JP5234647B2 (en) * 2009-03-31 2013-07-10 新日鉄住金化学株式会社 Composite adhesive film, multilayer circuit board using the same, and manufacturing method thereof
KR101022871B1 (en) * 2009-08-11 2011-03-16 삼성전기주식회사 Printed circuit board and manufacturing method thereof
US8217272B2 (en) * 2009-12-18 2012-07-10 Intel Corporation Apparatus and method for embedding components in small-form-factor, system-on-packages
US20140158414A1 (en) * 2012-12-11 2014-06-12 Chris Baldwin Recessed discrete component mounting on organic substrate
JP6917415B2 (en) * 2019-07-25 2021-08-11 株式会社フジクラ Multi-layer board
JP7312461B2 (en) * 2020-06-27 2023-07-21 プロマティック株式会社 Laminate manufacturing method

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JP2002353619A (en) * 2001-03-23 2002-12-06 Fujikura Ltd Multilayer wiring board, base material for multilayer wiring, and method of manufacturing the same
JP2003069237A (en) * 2001-08-29 2003-03-07 Kyocera Corp Insulating film and multilayer wiring board using the same
JP2004276411A (en) * 2003-03-14 2004-10-07 Kanegafuchi Chem Ind Co Ltd Laminate, printed wiring board, and method of manufacturing printed wiring board
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JP2005197574A (en) * 2004-01-09 2005-07-21 Fujikura Ltd SUBSTRATE FOR MULTILAYER WIRING BOARD AND METHOD FOR PRODUCING THE SAME, MANUFACTURING METHOD FOR MULTILAYER WIRING BOARD
JP2005236196A (en) * 2004-02-23 2005-09-02 Yamaichi Electronics Co Ltd Manufacturing method of multilayer wiring board
JP2005285849A (en) * 2004-03-26 2005-10-13 North:Kk Interlayer member for manufacturing multilayer wiring board and method for manufacturing the same
JP2005294441A (en) * 2004-03-31 2005-10-20 Sanyo Electric Co Ltd Element mounting substrate and semiconductor device using the same
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