Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP4595893B2 - Insulating film formation method - Google Patents
[go: Go Back, main page]

JP4595893B2 - Insulating film formation method - Google Patents

Insulating film formation method Download PDF

Info

Publication number
JP4595893B2
JP4595893B2 JP2006177064A JP2006177064A JP4595893B2 JP 4595893 B2 JP4595893 B2 JP 4595893B2 JP 2006177064 A JP2006177064 A JP 2006177064A JP 2006177064 A JP2006177064 A JP 2006177064A JP 4595893 B2 JP4595893 B2 JP 4595893B2
Authority
JP
Japan
Prior art keywords
aerosol
nozzle
metal
insulating
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006177064A
Other languages
Japanese (ja)
Other versions
JP2008006342A (en
Inventor
順二 今井
康史 正木
正英 武藤
健太郎 平山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Electric Works Co Ltd
Original Assignee
Panasonic Corp
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Works Ltd filed Critical Panasonic Corp
Priority to JP2006177064A priority Critical patent/JP4595893B2/en
Publication of JP2008006342A publication Critical patent/JP2008006342A/en
Application granted granted Critical
Publication of JP4595893B2 publication Critical patent/JP4595893B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)

Description

本発明は、絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射し、当該対象物の表面に前記絶縁材料からなる絶縁被膜を形成する絶縁被膜形成方法に関するものである。   The present invention relates to an insulating film forming method in which an aerosol in which fine particles of an insulating material are dispersed in a gas is sprayed from a nozzle onto an object, and an insulating film made of the insulating material is formed on the surface of the object.

従来、金属を主成分とする導電体(対象物)の表面に絶縁材料からなる絶縁被膜を形成するに当たって、絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射する被膜形成方法、いわゆるエアロゾルデポジション法が採用される場合があった(例えば、特許文献1〜5参照)。   Conventionally, when forming an insulating film made of an insulating material on the surface of a conductor (object) containing a metal as a main component, a film is formed by spraying an aerosol in which fine particles of an insulating material are dispersed in a gas from the nozzle onto the object. In some cases, a so-called aerosol deposition method is employed (see, for example, Patent Documents 1 to 5).

エアロゾルデポジション法とは、予め用意された微粒子原料をガスと混合してエアロゾル化し、減圧下の雰囲気でノズルを通して対象物に噴射して被膜を形成する被膜形成方法であり、ガス搬送により加速された原料粒子の運動エネルギが対象物に衝突することで局所的な熱エネルギに変換され、対象物と粒子間、粒子同士の結合を実現するものと考えられている。
特開2001−181859号公報 特開2002−20878号公報 特開2002−320879号公報 特開2003−247080号公報 特開2003−251227号公報
The aerosol deposition method is a film formation method in which a particulate raw material prepared in advance is mixed with a gas to form an aerosol, which is then sprayed onto an object through a nozzle in a reduced-pressure atmosphere to form a film, which is accelerated by gas transportation. It is considered that the kinetic energy of the raw material particles collides with the object to be converted into local thermal energy, thereby realizing the coupling between the object and the particles and between the particles.
JP 2001-181859 A Japanese Patent Laid-Open No. 2002-20878 JP 2002-320879 A JP 2003-247080 A JP 2003-251227 A

ところで、対象物を構成する金属材料と絶縁被膜を形成する絶縁材料とにおいては、一般に熱膨張係数が大きく異なっている。そのため、温度変化に伴って対象物と絶縁被膜との界面に熱応力が発生して絶縁被膜の密着性が低下するという問題があった。   By the way, in general, the thermal expansion coefficient differs greatly between the metal material constituting the object and the insulating material forming the insulating film. For this reason, there has been a problem that thermal stress is generated at the interface between the object and the insulating coating as the temperature changes, and the adhesion of the insulating coating is reduced.

本発明は上記事情に鑑みて為されたものであり、その目的は、対象物と絶縁材料の熱膨張係数の違いに起因した熱応力による絶縁被膜の密着性低下を防いだ絶縁被膜形成方法を提供することにある。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an insulating film forming method that prevents a decrease in adhesive film adhesion due to thermal stress caused by a difference in thermal expansion coefficient between an object and an insulating material. It is to provide.

請求項1の発明は、上記目的を達成するために、絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射し、当該対象物の表面に前記絶縁材料からなる絶縁被膜を形成する絶縁被膜形成方法において、エアロゾルが流入する流入口と、エアロゾルを噴出する噴出口と、流入口から流入するエアロゾルを噴出口に導く流路とを有し、エアロゾルに接触する前記流路の表面に、対象物の主成分である金属と同一の金属を、対象物表面に形成される前記絶縁性被覆の面積に対応した所定の厚みで被覆したノズルを用いてエアロゾルを対象物に噴射することを特徴とする。   In order to achieve the above object, the invention according to claim 1 sprays an aerosol, in which fine particles of an insulating material are dispersed in a gas, onto a target object from a nozzle, and forms an insulating film made of the insulating material on the surface of the target object. In the insulating film forming method to be formed, an inflow port through which the aerosol flows, an ejection port from which the aerosol is ejected, and a flow path that guides the aerosol that flows in from the inflow port to the ejection port, the flow path in contact with the aerosol The aerosol is sprayed onto the object using a nozzle that is coated on the surface with the same metal as the main component of the object with a predetermined thickness corresponding to the area of the insulating coating formed on the object surface. It is characterized by that.

請求項2の発明は、請求項1の発明において、絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射し、当該対象物の表面に前記絶縁材料からなる絶縁被膜を形成する絶縁被膜形成方法において、エアロゾルが流入する流入口と、エアロゾルを噴出する噴出口と、流入口から流入するエアロゾルを噴出口に導く流路とをノズル本体に設けるとともに、噴出口の開口するノズル本体先端に、噴出口と連通した流路が設けられた金属ブロックを配置し、金属ブロックが、対象物の主成分である金属と同一の金属により、対象物表面に形成される前記絶縁性被覆の面積に対応した所定の寸法に形成されたノズルを用いてエアロゾルを対象物に噴射することを特徴とする。   According to a second aspect of the present invention, in the first aspect of the invention, an aerosol in which fine particles of an insulating material are dispersed in a gas is sprayed from a nozzle onto an object, and an insulating film made of the insulating material is formed on the surface of the object. In the insulating film forming method, the nozzle body is provided with an inflow port through which the aerosol flows, an ejection port through which the aerosol is ejected, and a flow path for guiding the aerosol inflow from the inflow port to the ejection port. A metal block provided with a flow path communicating with a jet outlet is disposed at the tip of the main body, and the insulating coating is formed on the object surface by the same metal as the metal that is the main component of the object. It is characterized in that aerosol is sprayed onto an object using a nozzle formed in a predetermined dimension corresponding to the area.

請求項1の発明によれば、高速で通過する絶縁材料の微粒子によってエアロゾルが通過するノズルの流路表面が削り取られ、削り取られた金属粒子が対象物に噴射されて絶縁材料の微粒子とともに対象物の表面に成膜されるが、時間の経過に従って削り取られる金属粒子が減少して対象物表面に成膜される金属粒子の割合も減少し、絶縁被膜における金属の混入量は界面近傍が最も多く、界面から離れるにつれて減少して界面から所定距離以上離れると金属が混入しなくなる。その結果、絶縁被膜の対象物表面との界面には対象物の主成分である金属と同一の金属が混入しているために絶縁被膜と対象物との界面近傍における熱膨張係数が非常に近くなって両者の密着性を高めることができ、しかも、絶縁被膜の表面近傍には金属が混入しないことから絶縁被膜の絶縁特性(絶縁耐圧)の低下も抑制できる。   According to the first aspect of the present invention, the surface of the flow path of the nozzle through which the aerosol passes is scraped by the fine particles of the insulating material that passes at high speed, and the scraped metal particles are jetted onto the target object together with the fine particles of the insulating material. However, the amount of metal particles deposited on the surface of the target object decreases, and the amount of metal mixed in the insulating coating is the largest near the interface. When the distance from the interface decreases and the distance from the interface exceeds a predetermined distance, the metal is not mixed. As a result, since the same metal as the main component of the object is mixed in the interface between the insulating film and the object surface, the thermal expansion coefficient in the vicinity of the interface between the insulating film and the object is very close. Thus, the adhesion between the two can be improved, and further, since no metal is mixed in the vicinity of the surface of the insulating coating, it is possible to suppress a decrease in the insulating characteristics (insulation breakdown voltage) of the insulating coating.

請求項2の発明によれば、高速で通過する絶縁材料の微粒子によってエアロゾルが通過するノズルの流路表面において金属ブロックが削り取られ、削り取られた金属粒子が対象物に噴射されて絶縁材料の微粒子とともに対象物の表面に成膜されるが、時間の経過に従って削り取られる金属粒子が減少して対象物表面に成膜される金属粒子の割合も減少し、絶縁被膜における金属の混入量は界面近傍が最も多く、界面から離れるにつれて減少して界面から所定距離以上離れると金属が混入しなくなる。その結果、絶縁被膜の対象物表面との界面には対象物の主成分である金属と同一の金属が混入しているために絶縁被膜と対象物との界面近傍における熱膨張係数が非常に近くなって両者の密着性を高めることができ、しかも、絶縁被膜の表面近傍には金属が混入しないことから絶縁被膜の絶縁特性(絶縁耐圧)の低下も抑制できる。さらに、絶縁被膜に混入する金属の混入量が金属ブロックの寸法によって調整できるから、対象物表面に形成される絶縁被膜の面積への対応可能範囲が拡大できる。   According to the second aspect of the invention, the metal block is scraped off on the surface of the flow path of the nozzle through which the aerosol passes by the fine particles of the insulating material passing at high speed, and the scraped metal particles are jetted onto the object to form the fine particles of the insulating material. At the same time, a film is formed on the surface of the object, but the amount of metal particles deposited on the surface of the object also decreases as the amount of metal particles scraped off as time elapses. The number decreases as the distance from the interface increases, and the metal is not mixed when the distance from the interface exceeds a predetermined distance. As a result, since the same metal as the main component of the object is mixed in the interface between the insulating film and the object surface, the thermal expansion coefficient in the vicinity of the interface between the insulating film and the object is very close. Thus, the adhesion between the two can be improved, and further, since no metal is mixed in the vicinity of the surface of the insulating coating, it is possible to suppress a decrease in the insulating characteristics (insulation breakdown voltage) of the insulating coating. Furthermore, since the amount of metal mixed in the insulating coating can be adjusted by the size of the metal block, the range of coverage for the area of the insulating coating formed on the surface of the object can be expanded.

以下、エアロゾルデポジション法により対象物の表面に絶縁材料たる酸化アルミニウム(アルミナ)の被膜(絶縁被膜)を形成する絶縁被膜形成方法に本発明の技術思想を適用した実施形態について説明する。但し、本発明はエアロゾルを噴射するためのノズルに特徴があり、エアロゾルデポジション法の基本構成に関しては従来周知であるから詳細な説明並びに図示を省略する。   Hereinafter, an embodiment in which the technical idea of the present invention is applied to an insulating film forming method of forming an aluminum oxide (alumina) film (insulating film) as an insulating material on the surface of an object by an aerosol deposition method will be described. However, the present invention is characterized by a nozzle for injecting aerosol, and the basic configuration of the aerosol deposition method is well known in the art, and therefore detailed description and illustration are omitted.

(実施形態1)
本実施形態の絶縁被膜形成方法で使用するノズル1は、図1に示すように金属材料(例えば、SUS316Lのステンレス鋼)で形成された2枚の板状部材2,3を貼り合わせて構成されている。
(Embodiment 1)
As shown in FIG. 1, the nozzle 1 used in the insulating film forming method of the present embodiment is configured by bonding two plate-like members 2 and 3 formed of a metal material (for example, SUS316L stainless steel). ing.

板状部材2,3は何れも扁平な六角形状であって、厚み方向に重ね合わせて接合される。片側の板状部材2は、図2(a)〜(d)に示すように接合面に第1の溝部2aと第2の溝部2bとが凹設されている。第1の溝部2aは、幅寸法並びに深さ寸法が均一であり且つ一方の端部が板状部材2における幅広の側端面に開口している(図2(c)参照)。第2の溝部2bは、幅寸法並びに深さ寸法が第1の溝部2aよりも小さく且つ均一であり、さらに一方の端部が板状部材2における幅狭の側端面に開口している(図2(b)参照)。ここで、板状部材2の接合面における第1の溝部2aと第2の溝部2bとの間には両溝部2a,2bを繋ぐ緩衝溝部2cが凹設されている。この緩衝溝部2cは、一端側の幅寸法並びに深さ寸法が第1の溝部2aと同一で第1の溝部2aに連通するとともに、他端側の幅寸法並びに深さ寸法が第2の溝部2bと同一で第2の溝部2bに連通し、且つ一端から他端にかけて幅寸法と深さ寸法が直線的に変化する形状に形成されている。   Each of the plate-like members 2 and 3 has a flat hexagonal shape and is overlapped and joined in the thickness direction. As shown in FIGS. 2A to 2D, the plate-like member 2 on one side has a first groove portion 2a and a second groove portion 2b that are recessed in the joint surface. The first groove 2a has a uniform width and depth, and one end is open to the wide side end face of the plate-like member 2 (see FIG. 2C). The second groove 2b is smaller and more uniform in width and depth than the first groove 2a, and one end is open to a narrow side end surface of the plate-like member 2 (see FIG. 2 (b)). Here, between the first groove 2a and the second groove 2b on the joint surface of the plate-like member 2, a buffer groove 2c that connects both the grooves 2a and 2b is formed in a recessed manner. The buffer groove 2c has the same width and depth on one end as those of the first groove 2a and communicates with the first groove 2a, and has a width and depth on the other end of the second groove 2b. It is the same as that of the second groove portion 2b and is formed in a shape in which the width dimension and the depth dimension change linearly from one end to the other end.

一方、もう片側の板状部材3は、図2(e)〜(h)に示すように幅寸法並びに長さ寸法が板状部材2の第1の溝部2aと同寸法であり且つ一方の端部が板状部材3における幅広の側端面に開口する第3の溝部3aと(図2(g)参照)、幅寸法並びに長さ寸法が板状部材2の緩衝溝部2cと同寸法であり且つ第3の溝部3aと連通する緩衝溝部3bとが接合面に凹設されている。   On the other hand, the plate-like member 3 on the other side has the same width and length as the first groove 2a of the plate-like member 2 and one end as shown in FIGS. A third groove portion 3a having an opening at a wide side end surface of the plate-like member 3 (see FIG. 2G), a width dimension and a length dimension are the same as those of the buffer groove portion 2c of the plate-like member 2; A buffer groove 3b communicating with the third groove 3a is recessed in the joint surface.

而して、2枚の板状部材2,3を互いの接合面で接合してノズル1を構成すれば、図1に示すように第1の溝部2aと第3の溝部3aからなる第1の流路と、板状部材2の第2の溝部2bと板状部材3の接合面からなる第2の流路と、緩衝溝部2cと板状部材3の接合面からなる緩衝用流路とがノズル1内に形成されるとともに、第1の流路への入り口であってエアロゾルが流入する流入口がノズル1における幅広の側端面に開口し(図1(c)参照)、さらに第2の流路からの出口であってエアロゾルを噴出する噴出口がノズル1における幅狭の側端面に開口することになる(図1(b)参照)。   Thus, when the two plate-like members 2 and 3 are joined to each other at the joining surfaces to constitute the nozzle 1, the first groove portion 2a and the third groove portion 3a are formed as shown in FIG. A second flow path formed by a joint surface between the second groove 2b of the plate-like member 2 and the plate-like member 3, and a buffer flow path constituted by a joint surface between the buffer groove 2c and the plate-like member 3. Is formed in the nozzle 1, and an inlet into which the aerosol flows is opened to the wide side end surface of the nozzle 1 (see FIG. 1 (c)). The nozzle from which the aerosol is ejected opens at the narrow side end face of the nozzle 1 (see FIG. 1B).

ここで、第2の流路となる板状部材2の第2の溝部2bの内側面及び内底面と板状部材3の接合面には、炭化チタンの被膜4とアルミナ(酸化アルミニウム)の被膜5とを介して対象物の主成分である金属と同一の金属からなる金属被膜6が形成されている(図1(e)参照)。   Here, the titanium carbide coating 4 and the alumina (aluminum oxide) coating are formed on the inner surface and inner bottom surface of the second groove 2b of the plate-like member 2 serving as the second flow path and the joining surface of the plate-like member 3. 5, a metal film 6 made of the same metal as the main component of the object is formed (see FIG. 1E).

次に、全長20mm、噴出口の寸法0.5mm×10mmのノズル1を作成し、このノズル1を用いたエアロゾルデポジション法により、対象物(タフピッチ銅製基板)の表面にアルミナの絶縁被膜を形成する方法について説明する。なお、ノズル1の第2の流路表面には、プラズマCVD法によって膜厚5μmの炭化チタンの被膜4が形成されるとともに被膜4上に膜厚10μmのアルミナの被膜5が形成され、さらに被膜5上には銅を真空蒸着してなる膜厚1μmの金属被膜6が形成されている。   Next, a nozzle 1 having a total length of 20 mm and a nozzle size of 0.5 mm × 10 mm is prepared, and an alumina insulating coating is formed on the surface of the object (tough pitch copper substrate) by an aerosol deposition method using the nozzle 1 How to do will be described. A titanium carbide film 4 having a thickness of 5 μm is formed on the surface of the second flow path of the nozzle 1 by a plasma CVD method, and an alumina film 5 having a thickness of 10 μm is formed on the film 4. A metal film 6 having a film thickness of 1 μm formed by vacuum-depositing copper is formed on 5.

まず、純度99.9%のアルミナ粒子(粒径1μm以下)を容器(以下、エアロゾル化チャンバと呼ぶ。)内に収容し、当該エアロゾル化チャンバ内を200Paまで減圧した後に窒素ガスを毎分7リットルの流量で導入し且つ撹拌してエアロゾル化させる。エアロゾル化チャンバには細径の搬送管の一端が接続され、成膜チャンバ内に導入された搬送管の他端にノズル1の流入口が接続される。成膜チャンバ内に設けられた台(以下、X−Y−Zステージと呼ぶ。)の上に対象物が載置され、X−Y−Zステージの上方に配置されたノズル1の噴出口が対象物に対向させてある。X−Y−Zステージは水平面内並びに鉛直面内で移動可能であって、対象物表面に形成する絶縁被膜の膜厚が均一になるように対象物を水平面内で往復移動させる。   First, alumina particles having a purity of 99.9% (particle size of 1 μm or less) are accommodated in a container (hereinafter referred to as an aerosolization chamber), and after the pressure inside the aerosolization chamber is reduced to 200 Pa, nitrogen gas is supplied at a rate of 7 minutes per minute. Introduced at a flow rate of liters and stirred to aerosolize. One end of a small diameter transport pipe is connected to the aerosolization chamber, and the inlet of the nozzle 1 is connected to the other end of the transport pipe introduced into the film forming chamber. An object is placed on a stage (hereinafter referred to as an XYZ stage) provided in a film forming chamber, and a jet port of a nozzle 1 disposed above the XYZ stage is provided. It faces the object. The XYZ stage is movable in a horizontal plane and a vertical plane, and reciprocates the target in the horizontal plane so that the film thickness of the insulating coating formed on the target surface is uniform.

成膜チャンバ内は真空ポンプ(例えば、ロータリポンプとブースタポンプ)によってエアロゾル化チャンバ内よりも低圧となるように減圧されており、両チャンバ内の圧力差によって生じるガスの流れでエアロゾルが搬送管を通して成膜チャンバへ搬送される。さらに、ガス搬送された絶縁材料(アルミナ)の微粒子は微少な径のノズル1の流路(第2の流路)を通すことで加速され、ノズル1の噴出口から対象物に噴射されて対象物表面に絶縁材料の被膜(絶縁被膜)を形成する。このとき、加速された微粒子によってノズル1の第2の流路表面を覆っている金属被膜6が削り取られ、削り取られた金属粒子の一部が絶縁材料の微粒子とともに噴出口から噴射されるから、対象物の表面には金属(銅)が混入した絶縁被膜が成膜される。   The film forming chamber is depressurized by a vacuum pump (for example, a rotary pump and a booster pump) so as to have a pressure lower than that in the aerosol forming chamber, and the aerosol flows through the carrier pipe by the gas flow generated by the pressure difference in both chambers. It is transferred to the deposition chamber. Further, the fine particles of the insulating material (alumina) transported by the gas are accelerated by passing through the flow path (second flow path) of the nozzle 1 having a very small diameter, and are ejected from the nozzle 1 to the target object. An insulating material film (insulating film) is formed on the surface of the object. At this time, the metal coating 6 covering the surface of the second flow path of the nozzle 1 is scraped off by the accelerated fine particles, and a part of the scraped metal particles is ejected from the jet outlet together with the fine particles of the insulating material. An insulating coating mixed with metal (copper) is formed on the surface of the object.

而して、高速で通過する絶縁材料(アルミナ)の微粒子によってエアロゾルが通過するノズル1の第2の流路表面(金属被膜6)が削り取られ、削り取られた金属粒子が対象物に噴射されて絶縁材料の微粒子とともに対象物の表面に成膜されるが、時間の経過に従って削り取られる金属粒子が減少して対象物表面に成膜される金属粒子の割合も減少し、絶縁被膜における金属の混入量は界面近傍が最も多く、界面から離れるにつれて減少して界面から所定距離以上離れると金属が混入しなくなる。例えば、本実施形態では金属被膜6の膜厚を1μm、対象物表面に形成される絶縁被膜の膜厚を10μmとしており、対象物表面(界面)から2μm以上離れると絶縁被膜に金属は混入していなかった。従って、絶縁被膜の対象物表面との界面には対象物の主成分である金属(銅)と同一の金属(銅)が混入しているために絶縁被膜と対象物との界面近傍における熱膨張係数が非常に近くなって両者の密着性を高めることができる。   Thus, the second flow path surface (metal coating 6) of the nozzle 1 through which the aerosol passes by the fine particles of the insulating material (alumina) that passes at high speed is scraped off, and the scraped metal particles are jetted onto the object. The film is formed on the surface of the object together with the fine particles of the insulating material. However, the metal particles scraped off with the passage of time decrease, and the ratio of the metal particles formed on the surface of the object also decreases. The amount in the vicinity of the interface is the largest, and the amount decreases as the distance from the interface increases. When the distance from the interface exceeds a predetermined distance, the metal is not mixed. For example, in this embodiment, the thickness of the metal coating 6 is 1 μm, and the thickness of the insulating coating formed on the surface of the object is 10 μm. When the distance from the object surface (interface) is 2 μm or more, the metal is mixed into the insulating coating. It wasn't. Therefore, since the same metal (copper) as the main component of the object (copper) is mixed in the interface between the insulating film and the object surface, thermal expansion in the vicinity of the interface between the insulating film and the object is performed. The coefficient becomes very close and the adhesion between them can be improved.

ここで、絶縁被膜全体に導電体である金属が混入していると絶縁被膜の絶縁特性(絶縁耐圧)が低下してしまう虞があるが、上述のように金属が混入しているのは絶縁被膜における対象物表面との界面近傍のみ、言い換えると、対象物表面との界面近傍にのみ混入する程度の量の金属がノズル1から噴射されるように金属被膜6の膜厚を設定しているから、絶縁被膜の表面近傍には金属が混入せず、その結果、絶縁被膜の絶縁特性(絶縁耐圧)の低下も抑制できる。   Here, if the metal that is a conductor is mixed in the entire insulating film, there is a risk that the insulating characteristics (insulation withstand voltage) of the insulating film will deteriorate. However, as described above, the metal is mixed in the insulating film. The film thickness of the metal coating 6 is set so that the nozzle 1 ejects an amount of metal only in the vicinity of the interface with the object surface in the coating, in other words, only in the vicinity of the interface with the object surface. Therefore, no metal is mixed in the vicinity of the surface of the insulating coating, and as a result, a decrease in the insulating characteristics (insulation breakdown voltage) of the insulating coating can be suppressed.

(実施形態2)
本実施形態の絶縁被膜形成方法で使用するノズル1は、基本的な構成が実施形態1におけるノズル1と共通であるから共通の構成要素には同一の符号を付して図示並びに説明を省略する。
(Embodiment 2)
Since the basic configuration of the nozzle 1 used in the insulating film forming method of the present embodiment is the same as that of the nozzle 1 of the first embodiment, common components are denoted by the same reference numerals, and illustration and description thereof are omitted. .

以下、全長20mm、噴出口の寸法0.5mm×10mmのノズル1を作成し、このノズル1を用いたエアロゾルデポジション法により、対象物(黄銅製基板)の表面にアルミナの絶縁被膜を形成する方法について説明する。なお、ノズル1の第2の流路表面には、実施形態1と同様にプラズマCVD法によって膜厚5μmの炭化チタンの被膜4が形成されるとともに被膜4上に膜厚10μmのアルミナの被膜5が形成され、さらに被膜5上には銅を真空蒸着してなる膜厚0.5μmの金属被膜6が形成されている。   Hereinafter, a nozzle 1 having a total length of 20 mm and a jet nozzle size of 0.5 mm × 10 mm is formed, and an alumina insulating film is formed on the surface of the object (brass substrate) by an aerosol deposition method using the nozzle 1. A method will be described. Note that a titanium carbide coating 4 having a thickness of 5 μm is formed on the surface of the second flow path of the nozzle 1 by plasma CVD as in the first embodiment, and an alumina coating 5 having a thickness of 10 μm is formed on the coating 4. Further, a metal film 6 having a film thickness of 0.5 μm formed by vacuum-depositing copper is formed on the film 5.

まず、純度99.9%のアルミナ粒子(粒径1μm以下)をエアロゾル化チャンバ内に収容し、当該エアロゾル化チャンバ内を200Paまで減圧した後にヘリウムガスを毎分10リットルの流量で導入し且つ撹拌してエアロゾル化させる。成膜チャンバ内に設けられたX−Y−Zステージの上に対象物が載置され、X−Y−Zステージの上方に配置されたノズル1の噴出口が対象物に対向させてある。   First, alumina particles having a purity of 99.9% (particle size of 1 μm or less) are accommodated in an aerosolization chamber, the pressure in the aerosolization chamber is reduced to 200 Pa, helium gas is introduced at a flow rate of 10 liters per minute, and stirring is performed. And aerosolize. An object is placed on an XYZ stage provided in the film formation chamber, and a nozzle 1 disposed above the XYZ stage is opposed to the object.

エアロゾル化チャンバから成膜チャンバへガス搬送された絶縁材料(アルミナ)の微粒子は微少な径のノズル1の流路(第2の流路)を通すことで加速され、ノズル1の噴出口から対象物に噴射されて対象物表面に絶縁材料の被膜(絶縁被膜)を形成する。このとき、加速された微粒子によってノズル1の第2の流路表面を覆っている金属被膜6が削り取られ、削り取られた金属粒子の一部が絶縁材料の微粒子とともに噴出口から噴射されるから、対象物の表面には金属(銅)が混入した絶縁被膜が成膜される。   The fine particles of the insulating material (alumina) transported from the aerosol forming chamber to the film forming chamber are accelerated by passing through the flow path (second flow path) of the nozzle 1 having a small diameter, and are targeted from the nozzle 1 outlet. A film of insulating material (insulating film) is formed on the surface of the object by being sprayed onto the object. At this time, the metal coating 6 covering the surface of the second flow path of the nozzle 1 is scraped off by the accelerated fine particles, and a part of the scraped metal particles is ejected from the jet outlet together with the fine particles of the insulating material. An insulating coating mixed with metal (copper) is formed on the surface of the object.

ここで、金属被膜6の膜厚を0.5μm、対象物表面に形成される絶縁被膜の膜厚を15μmとしたとき、金属が混入している割合は界面近傍で最も高く、対象物表面(界面)から2μm以上離れると絶縁被膜に金属は混入していなかった。   Here, when the film thickness of the metal film 6 is 0.5 μm and the film thickness of the insulating film formed on the surface of the object is 15 μm, the ratio of metal contamination is the highest near the interface, and the object surface ( The metal was not mixed in the insulating coating when it was 2 μm or more away from the interface.

(実施形態3)
本実施形態の絶縁被膜形成方法で使用するノズル1は、基本的な構成が実施形態1におけるノズル1と共通であるから共通の構成要素には同一の符号を付して図示並びに説明を省略する。
(Embodiment 3)
Since the basic configuration of the nozzle 1 used in the insulating film forming method of the present embodiment is the same as that of the nozzle 1 of the first embodiment, common components are denoted by the same reference numerals, and illustration and description thereof are omitted. .

以下、全長20mm、噴出口の寸法0.5mm×10mmのノズル1を作成し、このノズル1を用いたエアロゾルデポジション法により、対象物(アルミニウム製基板)の表面にアルミナの絶縁被膜を形成する方法について説明する。なお、ノズル1の第2の流路表面には、実施形態1と同様にプラズマCVD法によって膜厚5μmの炭化チタンの被膜4が形成されるとともに被膜4上に膜厚10μmのアルミナの被膜5が形成され、さらに被膜5上にはアルミニウムを真空蒸着してなる膜厚0.5μmの金属被膜6が形成されている。   Hereinafter, a nozzle 1 having a total length of 20 mm and a jet nozzle size of 0.5 mm × 10 mm is prepared, and an alumina insulating coating is formed on the surface of the object (aluminum substrate) by an aerosol deposition method using the nozzle 1. A method will be described. Note that a titanium carbide coating 4 having a thickness of 5 μm is formed on the surface of the second flow path of the nozzle 1 by plasma CVD as in the first embodiment, and an alumina coating 5 having a thickness of 10 μm is formed on the coating 4. Further, a metal film 6 having a thickness of 0.5 μm formed by vacuum vapor deposition of aluminum is formed on the film 5.

まず、純度99.9%のアルミナ粒子(粒径1μm以下)をエアロゾル化チャンバ内に収容し、当該エアロゾル化チャンバ内を200Paまで減圧した後に窒素ガスを毎分7リットルの流量で導入し且つ撹拌してエアロゾル化させる。成膜チャンバ内に設けられたX−Y−Zステージの上に対象物が載置され、X−Y−Zステージの上方に配置されたノズル1の噴出口が対象物に対向させてある。   First, alumina particles having a purity of 99.9% (particle size of 1 μm or less) are accommodated in an aerosolization chamber, and after the pressure in the aerosolization chamber is reduced to 200 Pa, nitrogen gas is introduced at a flow rate of 7 liters per minute and stirred. And aerosolize. An object is placed on an XYZ stage provided in the film formation chamber, and a nozzle 1 disposed above the XYZ stage is opposed to the object.

エアロゾル化チャンバから成膜チャンバへガス搬送された絶縁材料(アルミナ)の微粒子は微少な径のノズル1の流路(第2の流路)を通すことで加速され、ノズル1の噴出口から対象物に噴射されて対象物表面に絶縁材料の被膜(絶縁被膜)を形成する。このとき、加速された微粒子によってノズル1の第2の流路表面を覆っている金属被膜6が削り取られ、削り取られた金属粒子の一部が絶縁材料の微粒子とともに噴出口から噴射されるから、対象物の表面には金属(アルミニウム)が混入した絶縁被膜が成膜される。   The fine particles of the insulating material (alumina) transported from the aerosol forming chamber to the film forming chamber are accelerated by passing through the flow path (second flow path) of the nozzle 1 having a small diameter, and are targeted from the nozzle 1 outlet. A film of insulating material (insulating film) is formed on the surface of the object by being sprayed onto the object. At this time, the metal coating 6 covering the surface of the second flow path of the nozzle 1 is scraped off by the accelerated fine particles, and a part of the scraped metal particles is ejected from the jet outlet together with the fine particles of the insulating material. An insulating coating mixed with metal (aluminum) is formed on the surface of the object.

ここで、金属被膜6の膜厚を0.5μm、対象物表面に形成される絶縁被膜の膜厚を12μmとしたとき、金属が混入している割合は界面近傍で最も高く、対象物表面(界面)から1μm以上離れると絶縁被膜に金属は混入していなかった。   Here, when the thickness of the metal coating 6 is 0.5 μm and the thickness of the insulating coating formed on the surface of the object is 12 μm, the ratio of metal contamination is the highest near the interface, and the surface of the object ( The metal was not mixed in the insulating coating when it was 1 μm or more away from the interface.

(実施形態4)
本実施形態の絶縁被膜形成方法で使用するノズル10は、図3に示すように金属材料(例えば、ステンレス鋼)で形成された2枚の板状部材12,13を貼り合わせてなるノズル本体11と、対象物を構成する金属材料の主成分と同一の金属で形成されて噴出口を含むノズル本体11の表面を覆う金属ブロック14とで構成されている。
(Embodiment 4)
As shown in FIG. 3, the nozzle 10 used in the insulating film forming method of the present embodiment is a nozzle body 11 formed by bonding two plate-like members 12 and 13 formed of a metal material (for example, stainless steel). And a metal block 14 that is formed of the same metal as the main component of the metal material constituting the object and covers the surface of the nozzle body 11 including the ejection port.

板状部材12,13は何れも扁平な六角形状であって、厚み方向に重ね合わせて接合される。片側の板状部材12は、接合面に第1の溝部12aと第2の溝部12bとが凹設されている。第1の溝部12aは、幅寸法並びに深さ寸法が均一であり且つ一方の端部が板状部材12における幅広の側端面に開口している(図3(c)参照)。第2の溝部12bは、幅寸法並びに深さ寸法が第1の溝部12aよりも小さく且つ均一であり、さらに一方の端部が板状部材12における幅狭の側端面に開口している(図3(b)参照)。ここで、板状部材12の接合面における第1の溝部12aと第2の溝部12bとの間には両溝部12a,12bを繋ぐ緩衝溝部12cが凹設されている。この緩衝溝部12cは、一端側の幅寸法並びに深さ寸法が第1の溝部12aと同一で第1の溝部12aに連通するとともに、他端側の幅寸法並びに深さ寸法が第2の溝部12bと同一で第2の溝部12bに連通し、且つ一端から他端にかけて幅寸法と深さ寸法が直線的に変化する形状に形成されている。   Each of the plate-like members 12 and 13 has a flat hexagonal shape and is overlapped and joined in the thickness direction. The plate-like member 12 on one side has a first groove portion 12a and a second groove portion 12b that are recessed in the joint surface. The first groove portion 12a has a uniform width dimension and depth dimension, and one end portion opens to a wide side end face of the plate-like member 12 (see FIG. 3C). The second groove portion 12b is smaller and more uniform in width and depth than the first groove portion 12a, and one end portion is open to a narrow side end surface of the plate-like member 12 (see FIG. 3 (b)). Here, between the first groove 12a and the second groove 12b on the joint surface of the plate-like member 12, a buffer groove 12c that connects both the grooves 12a and 12b is provided in a recessed manner. The buffer groove 12c has the same width and depth on one end as the first groove 12a and communicates with the first groove 12a, and the width and depth on the other end have a second groove 12b. It is the same as that of the second groove portion 12b and is formed in a shape in which the width dimension and the depth dimension change linearly from one end to the other end.

一方、もう片側の板状部材13は、幅寸法並びに長さ寸法が板状部材12の第1の溝部12aと同寸法であり且つ一方の端部が板状部材13における幅広の側端面に開口する第3の溝部13aと(図3(c)参照)、幅寸法並びに長さ寸法が板状部材12の緩衝溝部12cと同寸法であり且つ第3の溝部13aと連通する緩衝溝部13bとが接合面に凹設されている。   On the other hand, the plate-like member 13 on the other side has the same width and length as the first groove 12a of the plate-like member 12, and one end is open on the wide side end face of the plate-like member 13. A third groove 13a (see FIG. 3C), and a buffer groove 13b having the same width and length as the buffer groove 12c of the plate-like member 12 and communicating with the third groove 13a. The joint surface is recessed.

而して、2枚の板状部材12,13を互いの接合面で接合してノズル本体11を構成すれば、図3に示すように第1の溝部12aと第3の溝部13aからなる第1の流路と、板状部材12の第2の溝部12bと板状部材13の接合面からなる第2の流路と、緩衝溝部12cと板状部材13の接合面からなる緩衝用流路とがノズル本体11内に形成されるとともに、第1の流路への入り口であってエアロゾルが流入する流入口がノズル本体11における幅広の側端面に開口し(図3(c)参照)、さらに第2の流路からの出口であってエアロゾルを噴出する噴出口がノズル本体11における幅狭の側端面に開口することになる(図3(b)参照)。   Thus, if the nozzle body 11 is formed by joining the two plate-like members 12 and 13 at the joint surfaces, the first groove portion 12a and the third groove portion 13a as shown in FIG. 1, a second flow path composed of a joint surface between the second groove portion 12 b of the plate-like member 12 and the plate-like member 13, and a buffer flow passage composed of a joint surface between the buffer groove portion 12 c and the plate-like member 13. Are formed in the nozzle body 11, and an inlet to which the aerosol flows is an entrance to the first flow path, and opens to a wide side end surface of the nozzle body 11 (see FIG. 3C). Further, an outlet from the second flow path, which ejects aerosol, opens to a narrow side end surface of the nozzle body 11 (see FIG. 3B).

ここで、第2の流路となる板状部材12の第2の溝部12bの内側面及び内底面と板状部材13の接合面には、それぞれ炭化チタンの被膜(図示せず)とアルミナ(酸化アルミニウム)の被膜(図示せず)が積層されている。   Here, a titanium carbide coating (not shown) and alumina (not shown) are respectively formed on the inner surface and inner bottom surface of the second groove portion 12b of the plate-like member 12 serving as the second flow path and the joint surface of the plate-like member 13. A film (not shown) of aluminum oxide is laminated.

金属ブロック14は、扁平な六角形状に形成された2枚の板状金属部材15,16からなり、これら2枚の板状金属部材15,16を、その間にノズル本体11を挟む形で厚み方向に重ね合わせてノズル本体11と接合することによって構成される。板状金属部材15,16は、各々噴出口が開口したノズル本体11の先端より前方へ突出した突出部15a,16aと、流入口が開口した底面及び幅狭の側面を除いてノズル本体11の表面を覆う本体部15b,16bとが一体に形成されてなり、本体部15b,16bが各々板状部材12,13の表面に接合される。ここで、板状金属部材15,16の突出部15a,16aの間に形成される隙間(流路)がノズル本体11先端の噴出口と連通している。   The metal block 14 includes two plate-like metal members 15 and 16 formed in a flat hexagonal shape, and the two plate-like metal members 15 and 16 are arranged in the thickness direction with the nozzle body 11 sandwiched therebetween. And is joined to the nozzle body 11 in an overlapping manner. The plate-like metal members 15 and 16 are formed on the nozzle body 11 except for the protrusions 15a and 16a that protrude forward from the tip of the nozzle body 11 with the nozzle opening and the bottom and narrow sides with the inlet opening. The body portions 15b and 16b covering the surface are integrally formed, and the body portions 15b and 16b are joined to the surfaces of the plate-like members 12 and 13, respectively. Here, a gap (flow path) formed between the protruding portions 15 a and 16 a of the plate-like metal members 15 and 16 communicates with the jet outlet at the tip of the nozzle body 11.

次に、全長20mm、噴出口の寸法0.5mm×10mmのノズル本体11を作成し、噴出口が開口するノズル本体11の先端から前方(図3(a)における上方)へ突出部15a,16aが10mmだけ突出するとともに、突出部15a,16aにおける対向面が前記アルミナ被膜の表面よりも内向き(隙間(流路)を狭める向き)に突出した金属ブロック14をノズル本体11と組み合わせてノズル10を構成し、このノズル10を用いたエアロゾルデポジション法により、対象物(アルミニウム−マグネシウム系合金基板)の表面にアルミナの絶縁被膜を形成する方法について説明する。なお、ノズル本体11の第2の流路表面には、プラズマCVD法によって膜厚5μmの炭化チタンの被膜が形成されるとともにその被膜上に膜厚10μmのアルミナの被膜が形成されている。また、突出部15a,16aにおける対向面はアルミナ被膜の表面から5μm内向きに突出している。   Next, a nozzle main body 11 having a total length of 20 mm and a jet nozzle size of 0.5 mm × 10 mm is prepared, and projecting portions 15a and 16a from the tip of the nozzle main body 11 where the jet port opens forward (upward in FIG. 3A). The nozzle 10 is combined with the nozzle body 11 with a metal block 14 that protrudes by 10 mm and the opposing surfaces of the protrusions 15a and 16a protrude inward (in the direction of narrowing the gap (flow path)) from the surface of the alumina coating. A method of forming an insulating coating of alumina on the surface of an object (aluminum-magnesium alloy substrate) by an aerosol deposition method using this nozzle 10 will be described. A titanium carbide film having a thickness of 5 μm is formed on the surface of the second flow path of the nozzle body 11 by a plasma CVD method, and an alumina film having a thickness of 10 μm is formed on the film. The opposing surfaces of the protrusions 15a and 16a protrude inwardly by 5 μm from the surface of the alumina coating.

まず、純度99.9%のアルミナ粒子(粒径1μm以下)をエアロゾル化チャンバ内に収容し、当該エアロゾル化チャンバ内を200Paまで減圧した後に窒素ガスを毎分7リットルの流量で導入し且つ撹拌してエアロゾル化させる。成膜チャンバ内に設けられたX−Y−Zステージの上に対象物が載置され、X−Y−Zステージの上方に配置されたノズル10の噴出口が対象物に対向させてある。X−Y−Zステージは毎秒1mm以上の速度で100mmの範囲を往復移動する。   First, alumina particles having a purity of 99.9% (particle size of 1 μm or less) are accommodated in an aerosolization chamber, and after the pressure in the aerosolization chamber is reduced to 200 Pa, nitrogen gas is introduced at a flow rate of 7 liters per minute and stirred. And aerosolize. An object is placed on an XYZ stage provided in the film forming chamber, and a nozzle 10 disposed above the XYZ stage is opposed to the object. The XYZ stage reciprocates in the range of 100 mm at a speed of 1 mm or more per second.

成膜チャンバ内が真空ポンプによってエアロゾル化チャンバ内よりも低圧となるように減圧され、両チャンバ内の圧力差によって生じるガスの流れでエアロゾルが搬送管を通して成膜チャンバへ搬送される。そして、ノズル本体11の第2の流路を通して加速された絶縁材料(アルミナ)の微粒子がノズル本体11の噴出口から金属ブロック14の突出部15a,16a間に形成されている隙間(流路)を通過して対象物に噴射され、対象物表面に絶縁被膜を形成する。このとき、加速された微粒子によって金属ブロック14の突出部15a,16aが削り取られ、削り取られた金属粒子の一部が絶縁材料の微粒子とともに噴出口から噴射されるから、対象物の表面には金属ブロック14を構成している金属(アルミニウム)が混入した絶縁被膜が成膜される。   The pressure in the film formation chamber is reduced by the vacuum pump so as to be lower than that in the aerosol formation chamber, and the aerosol is transferred to the film formation chamber through the transfer pipe by the gas flow caused by the pressure difference between the two chambers. And the clearance gap (flow path) in which the fine particle of the insulating material (alumina) accelerated through the 2nd flow path of the nozzle main body 11 is formed between the protrusion parts 15a and 16a of the metal block 14 from the jet nozzle of the nozzle main body 11. And is sprayed onto the object to form an insulating film on the surface of the object. At this time, the protrusions 15a and 16a of the metal block 14 are scraped off by the accelerated fine particles, and a part of the scraped metal particles is ejected from the ejection port together with the fine particles of the insulating material. An insulating film mixed with the metal (aluminum) constituting the block 14 is formed.

而して、高速で通過する絶縁材料(アルミナ)の微粒子によってエアロゾルが通過するノズル10の金属ブロック14が削り取られ、削り取られた金属粒子が対象物に噴射されて絶縁材料の微粒子とともに対象物の表面に成膜されるが、時間の経過に従って削り取られる金属粒子が減少して対象物表面に成膜される金属粒子の割合も減少し、絶縁被膜における金属の混入量は界面近傍が最も多く、界面から離れるにつれて減少して界面から所定距離以上離れると金属が混入しなくなる。例えば、本実施形態では対象物表面に形成される絶縁被膜の膜厚を20μmとしており、対象物表面(界面)から5μm以上離れると絶縁被膜に金属は混入していなかった。従って、絶縁被膜の対象物表面との界面には対象物の主成分である金属(アルミニウム)と同一の金属(アルミニウム)が混入しているために絶縁被膜と対象物との界面近傍における熱膨張係数が非常に近くなって両者の密着性を高めることができ、しかも、絶縁被膜の表面近傍には金属が混入しないから、絶縁被膜の絶縁特性(絶縁耐圧)の低下も抑制できる。さらに、絶縁被膜に混入する金属の混入量が金属ブロック14の突出部15a,16aの寸法、具体的には、突出部15a,16aがノズル本体11の先端から前方へ突出する突出量(流路の長さ)と、突出部15a,16aにおける対向面がアルミナ被膜の表面から対向向きへ突出する突出量(流路の幅)とによって調整できるから、対象物表面に形成される絶縁被膜の面積への対応可能範囲が拡大できる。   Thus, the metal block 14 of the nozzle 10 through which the aerosol passes by the fine particles of the insulating material (alumina) that passes at high speed is scraped off, and the scraped metal particles are jetted onto the target object together with the fine particles of the insulating material. Although the film is deposited on the surface, the percentage of metal particles deposited on the surface of the target object is reduced as the amount of metal particles scraped off over time, and the amount of metal contamination in the insulating coating is the largest near the interface, When the distance from the interface decreases and the distance from the interface exceeds a predetermined distance, the metal is not mixed. For example, in this embodiment, the film thickness of the insulating film formed on the surface of the object is 20 μm, and no metal is mixed in the insulating film when it is separated from the object surface (interface) by 5 μm or more. Therefore, since the same metal (aluminum) as the main component of the object (aluminum) is mixed in the interface between the insulating film and the object surface, thermal expansion in the vicinity of the interface between the insulating film and the object is performed. Since the coefficients are very close to each other and the adhesion between them can be improved, and since no metal is mixed in the vicinity of the surface of the insulating coating, it is possible to suppress a decrease in the insulating properties (insulation breakdown voltage) of the insulating coating. Furthermore, the amount of metal mixed in the insulating coating is the size of the protrusions 15a, 16a of the metal block 14, specifically, the protrusion amount (flow path) by which the protrusions 15a, 16a protrude forward from the tip of the nozzle body 11. Of the insulating coating formed on the surface of the object, since the opposing surfaces of the protruding portions 15a and 16a can be adjusted by the protruding amount (flow channel width) protruding in the opposite direction from the surface of the alumina coating. The range that can be handled is expanded.

本発明の実施形態1におけるノズルを示し、(a)は、平面図、(b)は上面図、(c)は下面図、(d)は右断面図、(e)は第2の流路の要部断面図である。The nozzle in Embodiment 1 of this invention is shown, (a) is a top view, (b) is a top view, (c) is a bottom view, (d) is a right cross-sectional view, (e) is a 2nd flow path. FIG. 同上のノズルを構成する板状部材を示し、(a)〜(d)は片側の板状部材の平面図、上面図、下面図、右断面図であり、(e)〜(h)はもう片側の板状部材の平面図、上面図、下面図、右断面図である。The plate-shaped member which comprises a nozzle same as the above is shown, (a)-(d) is a top view, a top view, a bottom view, and a right sectional view of a plate-like member on one side, and (e)-(h) are already It is a top view, a top view, a bottom view, and a right sectional view of a plate-like member on one side. 本発明の実施形態4におけるノズルを示し、(a)は、平面図、(b)は上面図、(c)は下面図、(d)は右断面図である。The nozzle in Embodiment 4 of this invention is shown, (a) is a top view, (b) is a top view, (c) is a bottom view, (d) is a right sectional view.

符号の説明Explanation of symbols

1 ノズル
2 板状部材
2a 第1の溝部
2b 第2の溝部
3 板状部材
3a 第3の溝部
6 金属被膜
DESCRIPTION OF SYMBOLS 1 Nozzle 2 Plate-shaped member 2a 1st groove part 2b 2nd groove part 3 Plate-shaped member 3a 3rd groove part 6 Metal film

Claims (2)

絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射し、当該対象物の表面に前記絶縁材料からなる絶縁被膜を形成する絶縁被膜形成方法において、
エアロゾルが流入する流入口と、エアロゾルを噴出する噴出口と、流入口から流入するエアロゾルを噴出口に導く流路とを有し、エアロゾルに接触する前記流路の表面に、対象物の主成分である金属と同一の金属を、対象物表面に形成される前記絶縁性被覆の面積に対応した所定の厚みで被覆したノズルを用いてエアロゾルを対象物に噴射することを特徴とする絶縁被膜形成方法。
In an insulating film forming method in which an aerosol in which fine particles of an insulating material are dispersed in a gas is sprayed from a nozzle onto an object, and an insulating film made of the insulating material is formed on the surface of the object.
The main component of the target object is provided on the surface of the flow path that comes into contact with the aerosol, having an inlet into which the aerosol flows in, a jet outlet through which the aerosol is jetted, and a flow path that guides the aerosol flowing in from the inlet to the jet outlet. Insulating film formation characterized by spraying aerosol onto an object using a nozzle coated with the same metal as the above metal with a predetermined thickness corresponding to the area of the insulating coating formed on the surface of the object Method.
絶縁材料の微粒子をガス中に分散させたエアロゾルをノズルから対象物に噴射し、当該対象物の表面に前記絶縁材料からなる絶縁被膜を形成する絶縁被膜形成方法において、
エアロゾルが流入する流入口と、エアロゾルを噴出する噴出口と、流入口から流入するエアロゾルを噴出口に導く流路とをノズル本体に設けるとともに、噴出口の開口するノズル本体先端に、噴出口と連通した流路が設けられた金属ブロックを配置し、金属ブロックが、対象物の主成分である金属と同一の金属により、対象物表面に形成される前記絶縁性被覆の面積に対応した所定の寸法に形成されたノズルを用いてエアロゾルを対象物に噴射することを特徴とする絶縁被膜形成方法。
In an insulating film forming method in which an aerosol in which fine particles of an insulating material are dispersed in a gas is sprayed from a nozzle onto an object, and an insulating film made of the insulating material is formed on the surface of the object.
The nozzle body is provided with an inlet into which the aerosol flows, an outlet from which the aerosol is ejected, and a flow path that guides the aerosol flowing from the inlet to the outlet, and at the tip of the nozzle body at which the ejection opening opens, A metal block provided with a communication channel is disposed, and the metal block is a predetermined metal corresponding to the area of the insulating coating formed on the surface of the object by the same metal as the main component of the object. An insulating film forming method, wherein an aerosol is sprayed onto an object using a nozzle having a dimension.
JP2006177064A 2006-06-27 2006-06-27 Insulating film formation method Expired - Fee Related JP4595893B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006177064A JP4595893B2 (en) 2006-06-27 2006-06-27 Insulating film formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006177064A JP4595893B2 (en) 2006-06-27 2006-06-27 Insulating film formation method

Publications (2)

Publication Number Publication Date
JP2008006342A JP2008006342A (en) 2008-01-17
JP4595893B2 true JP4595893B2 (en) 2010-12-08

Family

ID=39065044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006177064A Expired - Fee Related JP4595893B2 (en) 2006-06-27 2006-06-27 Insulating film formation method

Country Status (1)

Country Link
JP (1) JP4595893B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5468958B2 (en) * 2010-03-30 2014-04-09 富士フイルム株式会社 Intracorporeal ultrasound system
JP5920308B2 (en) * 2013-10-18 2016-05-18 株式会社デンソー Rotating electric machine
CN206998647U (en) * 2016-12-09 2018-02-13 江苏康友医用器械有限公司 It is a kind of to create hypodynia sense medical needle sandblasting special line-type blast nozzle without interior

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4236414B2 (en) * 2002-02-28 2009-03-11 独立行政法人産業技術総合研究所 Nozzle for composite structure production
JP4487306B2 (en) * 2003-03-17 2010-06-23 Toto株式会社 Composite structure forming apparatus and forming method

Also Published As

Publication number Publication date
JP2008006342A (en) 2008-01-17

Similar Documents

Publication Publication Date Title
US10418229B2 (en) Aerosol deposition coating for semiconductor chamber components
US9481933B2 (en) Coaxial laser assisted cold spray nozzle
JP4388277B2 (en) Method for forming a film on a substrate
US20150020466A1 (en) Method for manufacturing insulating glazing
US20050084617A1 (en) Method for coating internal surface of plasma processing chamber
US20110244216A1 (en) Thermal barrier coating system and method for the production thereof
US8052074B2 (en) Apparatus and process for depositing coatings
KR101249951B1 (en) Method for coating in process equipments and coating structure using the same
US20130032230A1 (en) Flow distributor
JP4595893B2 (en) Insulating film formation method
CN112017932A (en) Corrosion-resistant structure of gas delivery system in plasma processing equipment
US20010046596A1 (en) Method for making metallic surface layer for heat transfer augmentation
JP2023503093A (en) Double layer protective coating for metal parts
US20180347050A1 (en) Film forming device
JP4474105B2 (en) Water repellent member and method of manufacturing ink jet head
CA2184603A1 (en) Thermal spray nozzle for producing rough thermal spray coatings, method for producing rough thermal spray coatings, and thermal spray coatings produced therewith
JP4661703B2 (en) Insulating film formation method
JP2016222940A (en) Atomic layer growth apparatus and exhaust layer of atomic layer growth apparatus
TWI883311B (en) Dust removal device nozzle and dust removal head
US20180363477A1 (en) Coated ceramic matrix composite of metallic component and method for forming a component
KR101456099B1 (en) Non-Binder Ceramic Coating Metal Mask
KR101579236B1 (en) Member with flow passage and method for manufacturing the same
JP2013256708A (en) Dielectric member, film forming apparatus and thin-film forming method
US10782059B2 (en) Sealed sublimator porous plates
JP2005046696A (en) Nozzle for making composite structure

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100402

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100824

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100906

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131001

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees