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JP4605437B2 - Rare earth magnet manufacturing method - Google Patents
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JP4605437B2 - Rare earth magnet manufacturing method - Google Patents

Rare earth magnet manufacturing method Download PDF

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JP4605437B2
JP4605437B2 JP2004093840A JP2004093840A JP4605437B2 JP 4605437 B2 JP4605437 B2 JP 4605437B2 JP 2004093840 A JP2004093840 A JP 2004093840A JP 2004093840 A JP2004093840 A JP 2004093840A JP 4605437 B2 JP4605437 B2 JP 4605437B2
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rare earth
magnet
heat treatment
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JP2005285860A (en
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哲人 米山
亮 福野
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TDK Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/0293Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets diffusion of rare earth elements, e.g. Tb, Dy or Ho, into permanent magnets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/032Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
    • H01F1/04Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
    • H01F1/047Alloys characterised by their composition
    • H01F1/053Alloys characterised by their composition containing rare earth metals
    • H01F1/055Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
    • H01F1/057Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
    • H01F1/0571Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
    • H01F1/0575Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together
    • H01F1/0577Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together sintered

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Powder Metallurgy (AREA)
  • Coating With Molten Metal (AREA)
  • Chemical Vapour Deposition (AREA)
  • Hard Magnetic Materials (AREA)

Description

本発明は、希土類磁石の製造方法に関するものであり、特に、表面特性劣化層を効率的に回復させるための技術に関する。   The present invention relates to a method for producing a rare earth magnet, and more particularly to a technique for efficiently recovering a surface property degradation layer.

希土類焼結磁石、例えばNd−Fe−B系焼結磁石は、磁気特性に優れた高性能磁石として知られており、磁気共鳴画像診断装置(MRI)用磁気回路や、ハードディスクドライブ(HDD)用モータ等の他、幅広く応用されている。そして、Nd−Fe−B系焼結磁石は、実用磁石の中で最も高い磁気特性を有するため、これらの応用製品の小型化に貢献している。   Rare earth sintered magnets, such as Nd-Fe-B based sintered magnets, are known as high performance magnets with excellent magnetic properties, and are used for magnetic resonance imaging diagnostic (MRI) magnetic circuits and hard disk drives (HDD). In addition to motors, it is widely applied. And since a Nd-Fe-B system sintered magnet has the highest magnetic characteristic in a practical magnet, it has contributed to size reduction of these applied products.

ただし、この種の希土類焼結磁石は、切断や研磨等の機械加工によって磁気特性が低下する傾向にあり、その解消が課題となっている。特に、小型の磁石での磁気特性の低下が著しく、例えばモバイル機器の小型化やマイクロマシーンの高性能化を進める上において、大きな障害となっている。機械加工によって磁石の表面付近は、数十〜200μm程度にわたり加工の影響を受け、表面積が大きく体積が小さい磁石では、この影響を受けた表面部分が占める割合が大きくなって、磁気特性の低下が顕著に現れる。   However, this kind of rare earth sintered magnet has a tendency to deteriorate the magnetic properties by machining such as cutting and polishing, and there is a problem to solve it. In particular, the magnetic characteristics of a small magnet are significantly reduced, which is a major obstacle in, for example, advancing miniaturization of mobile devices and high performance of micromachines. In the vicinity of the surface of the magnet due to machining, the influence of the processing is on the order of several tens to 200 μm, and in a magnet having a large surface area and a small volume, the proportion of the affected surface portion is increased, and the magnetic properties are reduced. Appears prominently.

そこで、従来、このような機械加工による磁気特性の劣化に対し、様々な対策を講じて磁気特性を回復することが試みられている(例えば、特許文献1や特許文献2、非特許文献1等を参照)。   Thus, conventionally, attempts have been made to recover the magnetic characteristics by taking various measures against the deterioration of the magnetic characteristics due to such machining (for example, Patent Document 1, Patent Document 2, Non-Patent Document 1, etc.). See).

特許文献1には、焼結後、最終形状に加工した後に、時効処理を行って加工劣化層を正常組織へ回復させる方法が開示されている。特許文献2には、熱処理と、熱処理後の焼結体表面の研削加工を繰り返し行うことにより、磁気特性(残留磁束密度Brや最大エネルギー積BH)を向上させる方法が開示されている。非特許文献1には、Dy金属をスパッター法により被着させ、その後、熱処理(時効処理)を行うことにより、表面改質による高特性化を図る方法が開示されている。
特開昭61−140108号公報 特開平7−37742公報 第27回日本応用磁気学会学術講演概要集(2003)、p386
Patent Document 1 discloses a method of recovering a work-deteriorated layer to a normal structure by performing an aging treatment after sintering and processing into a final shape. Patent Document 2 discloses a method for improving magnetic characteristics (residual magnetic flux density Br and maximum energy product BH) by repeatedly performing heat treatment and grinding of the surface of the sintered body after heat treatment. Non-Patent Document 1 discloses a method for improving characteristics by surface modification by depositing Dy metal by sputtering and then performing heat treatment (aging treatment).
JP 61-140108 A JP-A-7-37742 27th Annual Meeting of the Japan Society of Applied Magnetics (2003), p386

しかしながら、前記特許文献1や特許文献2に記載される時効処理(熱処理)のみでは、特に薄肉形状になればなるほど、十分な磁気特性の回復効果は得られていない。また、非特許文献1に記載される方法でも、角型性等、磁気特性の回復はある程度期待できるものの、必ずしも十分とは言えない。また、回復に要する時間や安定な回復といった点で課題も多い。   However, with only the aging treatment (heat treatment) described in Patent Document 1 and Patent Document 2, the effect of recovering sufficient magnetic properties is not obtained as the thickness becomes particularly thin. Further, even the method described in Non-Patent Document 1 can be expected to recover magnetic properties such as squareness to some extent, but it is not always sufficient. There are also many problems in terms of time required for recovery and stable recovery.

本発明は、このような従来の実情に鑑みて提案されたものであり、特に薄肉形状の磁石等においても加工劣化層を実用的、且つ簡便な手法により十分に回復させる技術を提供することを目的とするものである。すなわち、本発明は、磁気特性を短時間に、且つ安定して回復させることができ、最終製品として高い磁気特性を有する希土類磁石を製造することが可能な希土類磁石の製造方法を提供することを目的とする。   The present invention has been proposed in view of such a conventional situation, and provides a technique for sufficiently recovering a processing deteriorated layer by a practical and simple method even in a thin-walled magnet or the like. It is the purpose. That is, the present invention provides a method for producing a rare earth magnet capable of stably recovering magnetic properties in a short time and capable of producing a rare earth magnet having high magnetic properties as a final product. Objective.

前述の目的を達成するため、本発明の希土類磁石の製造方法は、磁石素体の表面に希土類元素を主体とする被膜を成膜した後、2段階の熱処理を行い、1段目に500°以上、被膜の融点未満の温度で熱処理し、2段目に被膜の融点以上、1000℃以下の温度で熱処理し、且つ、各段階の熱処理時間を10分間〜1時間とすることを特徴とする。 In order to achieve the above-mentioned object, the method for producing a rare earth magnet of the present invention comprises forming a film mainly composed of a rare earth element on the surface of a magnet body, performing a two-step heat treatment, and performing the first step at 500 °. As described above, heat treatment is performed at a temperature lower than the melting point of the film, heat treatment is performed at a temperature not lower than the melting point of the film and not higher than 1000 ° C. in the second stage, and the heat treatment time for each stage is 10 minutes to 1 hour .

磁石素体を希土類元素を主体とする被膜で被覆し、回復のための熱処理を施すことで、被膜に含まれる希土類元素の表面改質作用により、機械加工等により磁石素体の表面に形成された加工劣化層が正常組織に回復し、特性が回復する。このとき、前記熱処理を2段階で行い、各段階での熱処理温度を最適化することで、迅速な特性回復、及び安定した特性回復が実現される。   By coating the magnet body with a coating mainly composed of rare earth elements and applying a heat treatment for recovery, it is formed on the surface of the magnet body by machining or the like due to the surface modification action of the rare earth elements contained in the coating. The deteriorated processing layer is restored to the normal structure, and the properties are restored. At this time, by performing the heat treatment in two stages and optimizing the heat treatment temperature in each stage, quick characteristic recovery and stable characteristic recovery are realized.

本発明によれば、加工劣化層による磁気特性の低下を効率的に回復させることができ、角型性や保磁力、最大エネルギー積等において、例えば加工前の磁気特性に匹敵する磁気特性を有する希土類磁石を提供することが可能である。また、本発明の製造方法によれば、短時間に効率的、且つ安定して加工劣化層を表面改質することができ、製造時間や製造コストを大幅に削減することが可能である。   According to the present invention, it is possible to efficiently recover a decrease in magnetic properties due to a processing deteriorated layer, and in terms of squareness, coercive force, maximum energy product, etc., the magnetic properties are comparable to, for example, the magnetic properties before processing. It is possible to provide a rare earth magnet. In addition, according to the manufacturing method of the present invention, it is possible to efficiently and stably modify the surface of the work deterioration layer in a short time, and it is possible to greatly reduce the manufacturing time and manufacturing cost.

以下、本発明を適用した希土類磁石の製造方法について詳細に説明する。   Hereinafter, a method for producing a rare earth magnet to which the present invention is applied will be described in detail.

先ず、本発明において、製造対照となる希土類磁石は、希土類元素、遷移金属元素及びホウ素を主成分とする希土類焼結磁石、例えばNdFeB系希土類焼結磁石等を磁石素体とするものである。ここで、磁石素体の磁石組成は、目的に応じて任意に選択すればよい。例えば、R−T−B(R=Yを含む希土類元素の1種または2種以上、T=FeまたはFe及びCoを必須とする遷移金属元素の1種または2種以上、B=ホウ素)系希土類焼結磁石とする場合、磁気特性に優れた希土類焼結磁石を得るためには、焼結後の磁石組成において、希土類元素Rが27.0〜32.0重量%、ホウ素Bが0.5〜2.0重量%、残部が実質的に遷移金属元素T(例えばFe)となるような配合組成とすることが好ましい。希土類元素Rの量が27.0重量%未満であると、軟磁性であるα−Fe等が析出し、保磁力が低下する。逆に、希土類元素Rが32.0重量%を越えると、Rリッチ相の量が多くなって耐蝕性が劣化するとともに、主相であるR214B結晶粒の体積比率が低下し、残留磁束密度が低下する。また、ホウ素Bが0.5重量%未満の場合には、高い保磁力を得ることができない。逆に、ホウ素Bが2.0重量%を越えると、残留磁束密度が低下する傾向がある。 First, in the present invention, a rare earth magnet as a production control is a rare earth sintered magnet mainly composed of a rare earth element, a transition metal element and boron, for example, an NdFeB rare earth sintered magnet or the like as a magnet body. Here, the magnet composition of the magnet body may be arbitrarily selected according to the purpose. For example, R-T-B (one or more of rare earth elements including R = Y, T = one or more of transition metal elements essential to Fe or Fe and Co, B = boron) system When a rare earth sintered magnet is used, in order to obtain a rare earth sintered magnet having excellent magnetic properties, the sintered magnet composition has a rare earth element R of 27.0 to 32.0 wt% and boron B of 0. It is preferable that the blending composition is 5 to 2.0% by weight and the balance is substantially the transition metal element T (for example, Fe). When the amount of the rare earth element R is less than 27.0% by weight, α-Fe or the like that is soft magnetic precipitates, and the coercive force decreases. Conversely, when the rare earth element R exceeds 32.0% by weight, the amount of the R-rich phase increases and the corrosion resistance deteriorates, and the volume ratio of the R 2 T 14 B crystal grains as the main phase decreases. The residual magnetic flux density is reduced. Further, when boron B is less than 0.5% by weight, a high coercive force cannot be obtained. Conversely, if boron B exceeds 2.0% by weight, the residual magnetic flux density tends to decrease.

前記組成において、希土類元素Rは、Yを含む希土類元素、すなわちY、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Yb及びLuから選ばれる1種、または2種以上である。中でも、NdやPrは、磁気特性のバランスが良いこと、資源的に豊富で比較的安価であることから、主成分をNdやPrとすることが好ましい。また、Dy2Fe14BやTb2Fe14B化合物は、異方性磁界が大きく、保磁力Hcjを向上させる上で有効である。 In the composition, the rare earth element R is a rare earth element including Y, that is, one selected from Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Yb, and Lu, or 2 or more types. Among these, Nd and Pr are preferably Nd and Pr because the balance of magnetic properties is good and they are abundant and relatively inexpensive. Dy 2 Fe 14 B and Tb 2 Fe 14 B compounds have a large anisotropic magnetic field and are effective in improving the coercive force Hcj.

さらに、前記希土類焼結磁石は、添加元素Mを加えて、R−T−B−M系希土類焼結磁石とすることも可能である。この場合、添加元素Mとしては、Al、Ga、Cr、Mn、Mg、Si、Cu、C、Nb、Sn、W、V、Zr、Ti、Hf、Mo等を挙げることができ、これらの1種または2種以上を選択して添加することができる。例えば、高融点金属であるNb、Zr、W等の添加は、結晶粒成長を抑制する効果がある。勿論、これら組成に限らず、磁石素体の組成として、従来公知の希土類磁石組成全般に適用可能であることは言うまでもない。   Furthermore, the rare earth sintered magnet may be an R-TBM type rare earth sintered magnet by adding an additive element M. In this case, examples of the additive element M include Al, Ga, Cr, Mn, Mg, Si, Cu, C, Nb, Sn, W, V, Zr, Ti, Hf, and Mo. A seed | species or 2 or more types can be selected and added. For example, the addition of Nb, Zr, W or the like, which is a refractory metal, has an effect of suppressing crystal grain growth. Of course, it is needless to say that the composition of the magnet element body is not limited to these compositions, and can be applied to all conventionally known rare earth magnet compositions.

磁石素体は、焼結の後、機械加工、例えば切断や研磨加工により所定のサイズとされるが、本発明は、厚さ2mm以下の磁石素体に適用して効果が高い。特に、厚さ1mm以下の磁石素体に適用することで、より一層顕著な効果を期待することができる。   The magnet body is made into a predetermined size by machining such as cutting or polishing after sintering, but the present invention is highly effective when applied to a magnet body having a thickness of 2 mm or less. In particular, when applied to a magnet element having a thickness of 1 mm or less, a more remarkable effect can be expected.

本発明により製造される希土類磁石は、前記磁石素体が希土類元素を主体とする被膜により被覆され、回復処理されてなるものである。ここで、被膜に含まれる希土類元素としては、Nd、Pr、Dy、Tbから選ばれる少なくとも1種が好適である。また、前記被膜を構成する金属は、前記希土類元素を多く含む希土類リッチ合金であることが好ましく、2元系合金であってもよいし、3元系以上の合金であってもよい。この被膜による被覆及び回復処理により、磁石素体の表面近傍における希土類元素の割合が増え、表面近傍の加工劣化層が改質され、磁気特性が大幅に改善される。   The rare earth magnet produced according to the present invention is obtained by coating the magnet body with a coating mainly composed of rare earth elements and performing a recovery treatment. Here, the rare earth element contained in the coating is preferably at least one selected from Nd, Pr, Dy, and Tb. The metal constituting the coating is preferably a rare earth-rich alloy containing a large amount of the rare earth element, and may be a binary alloy or a ternary or higher alloy. By this coating and recovery treatment with the coating, the ratio of rare earth elements in the vicinity of the surface of the magnet body increases, the work-deteriorated layer in the vicinity of the surface is modified, and the magnetic characteristics are greatly improved.

次に、本発明の希土類磁石の製造方法について説明する。本発明の希土類磁石において、磁石素体となる希土類焼結磁石は、粉末冶金法により製造されるものである。以下、希土類焼結磁石の粉末冶金法による製造方法について説明する。   Next, the manufacturing method of the rare earth magnet of this invention is demonstrated. In the rare earth magnet of the present invention, the rare earth sintered magnet as the magnet body is manufactured by a powder metallurgy method. Hereinafter, a method for producing a rare earth sintered magnet by powder metallurgy will be described.

図1は、粉末冶金法による希土類焼結磁石の作製プロセス、さらにはその後の加工プロセスの一例を示すものである。この製造プロセスは、基本的には、合金化工程1、粗粉砕工程2、微粉砕工程3、磁場中成形工程4、焼結工程5、機械加工工程6、被膜形成工程7、1段目熱処理8、2段目熱処理9、時効工程10、研削加工工程11とにより構成される。なお、酸化防止のために、焼結後までの各工程は、ほとんどの工程を真空中、あるいは不活性ガス雰囲気中(窒素雰囲気中、Ar雰囲気中等)で行う。   FIG. 1 shows an example of a process for producing a rare earth sintered magnet by a powder metallurgy method, and a subsequent processing process. This manufacturing process basically includes an alloying step 1, a coarse pulverizing step 2, a fine pulverizing step 3, a magnetic field forming step 4, a sintering step 5, a machining step 6, a film forming step 7, and a first stage heat treatment. 8, second stage heat treatment 9, aging step 10, and grinding step 11. In order to prevent oxidation, most of the steps after sintering are performed in a vacuum or in an inert gas atmosphere (in a nitrogen atmosphere, an Ar atmosphere, etc.).

合金化工程1では、原料となる金属、あるいは合金を原料合金組成に応じて配合し、不活性ガス、例えばAr雰囲気中で溶解し、鋳造することにより合金化する。鋳造法としては、溶融した高温の液体金属を回転ロール上に供給し、合金薄板を連続的に鋳造するストリップキャスト法(連続鋳造法)が生産性等の観点から好適である。原料金属(合金)としては、純希土類元素、希土類合金、純鉄、フェロボロン、さらにはこれらの合金等を使用することができる。インゴットとして鋳造した場合には、凝固偏析を解消すること等を目的に、必要に応じて溶体化処理を行ってもよい。溶体化処理の条件としては、例えば真空またはAr雰囲気下、700〜1200℃領域で1時間以上保持する。   In the alloying step 1, a raw material metal or alloy is blended according to the raw material alloy composition, melted in an inert gas, for example, Ar atmosphere, and cast into an alloy. As a casting method, a strip casting method (continuous casting method) in which molten high-temperature liquid metal is supplied onto a rotating roll and an alloy thin plate is continuously cast is preferable from the viewpoint of productivity and the like. As the raw material metal (alloy), pure rare earth elements, rare earth alloys, pure iron, ferroboron, and alloys thereof can be used. When cast as an ingot, solution treatment may be performed as necessary for the purpose of eliminating solidification segregation. As a condition for the solution treatment, for example, it is kept in a 700 to 1200 ° C. region for 1 hour or more under vacuum or Ar atmosphere.

粗粉砕工程2では、先に鋳造した原料合金の薄板、あるいはインゴット等を、それぞれ粒径数百μm程度になるまで粉砕する。粉砕手段としては、スタンプミル、ジョークラッシャー、ブラウンミル等を用いることができる。粗粉砕性を向上させるために、水素を吸蔵させて脆化させた後、粗粉砕を行うことが効果的である。   In the coarse pulverization step 2, the previously cast raw alloy thin plate, ingot or the like is pulverized to a particle size of about several hundred μm. As the pulverizing means, a stamp mill, a jaw crusher, a brown mill, or the like can be used. In order to improve the coarse pulverization property, it is effective to perform coarse pulverization after occlusion of hydrogen and embrittlement.

前述の粗粉砕工程2が終了した後、通常、粗粉砕した原料合金粉に粉砕助剤を添加する。粉砕助剤としては、例えば脂肪酸系化合物等を使用することができるが、特に、脂肪酸アミドを粉砕助剤として用いることで、良好な磁気特性、特に高配向度で高い磁化を有する希土類焼結磁石を得ることができる。粉砕助剤の添加量としては、0.03〜0.4重量%とすることが好ましい。粉砕助剤の添加量が0.03重量%未満であると、潤滑剤の磁気特性に与える効果が十分に得られず、0.4重量%以下の添加量であれば、焼結後の残留炭素の量を効果的に低減することができ、希土類焼結磁石の磁気特性を向上させる上で有効である。   After the aforementioned coarse pulverization step 2 is completed, a pulverization aid is usually added to the coarsely pulverized raw material alloy powder. As the grinding aid, for example, fatty acid compounds can be used, and in particular, by using fatty acid amide as the grinding aid, a rare earth sintered magnet having good magnetic properties, particularly high orientation and high magnetization. Can be obtained. The addition amount of the grinding aid is preferably 0.03 to 0.4% by weight. If the addition amount of the grinding aid is less than 0.03% by weight, the effect on the magnetic properties of the lubricant cannot be sufficiently obtained. If the addition amount is 0.4% by weight or less, the residual after sintering The amount of carbon can be effectively reduced, which is effective in improving the magnetic properties of the rare earth sintered magnet.

粗粉砕工程2の後、微粉砕工程3を行うが、この微粉砕工程3は、例えば気流式粉砕機等を使用して行われる。微粉砕の際の条件は、用いる気流式粉砕機に応じて適宜設定すればよく、原料合金粉を平均粒径が1〜10μm程度、例えば3〜6μmとなるまで微粉砕する。気流式粉砕機としては、ジェットミル等が好適である。ジェットミルは、高圧の不活性ガス(例えば窒素ガス)を狭いノズルより開放して高速のガス流を発生させ、この高速のガス流により粉体の粒子を加速し、粉体の粒子同士の衝突や、衝突板あるいは容器壁との衝突を発生させて粉砕する方法である。ジェットミルは、一般的に、流動層を利用するジェットミル、渦流を利用するジェットミル、衝突板を用いるジェットミル等に分類される。これらのジェットミルのうちでは、流動層を利用するジェットミル、及び渦流を利用するジェットミルが好ましく、特に流動層を利用するジェットミルが好ましい。例えば原料合金粉と粉砕助剤とは比重が大きく異なるが、流動層中及び渦流中では比重の違いに殆ど関係なく良好に粉砕及び混合が行なわれ、特に流動層中では比重の違いは殆ど問題とならないからである。   After the coarse pulverization step 2, a fine pulverization step 3 is performed. The fine pulverization step 3 is performed using, for example, an airflow pulverizer. The conditions for fine pulverization may be appropriately set according to the airflow pulverizer to be used, and the raw material alloy powder is finely pulverized until the average particle size becomes about 1 to 10 μm, for example, 3 to 6 μm. A jet mill or the like is suitable as the airflow pulverizer. A jet mill opens a high-pressure inert gas (for example, nitrogen gas) from a narrow nozzle to generate a high-speed gas flow, accelerates powder particles by this high-speed gas flow, and collides powder particles with each other. Or, it is a method of crushing by generating a collision with a collision plate or a container wall. Jet mills are generally classified into jet mills that use fluidized beds, jet mills that use vortex flow, jet mills that use impingement plates, and the like. Among these jet mills, a jet mill using a fluidized bed and a jet mill using a vortex are preferable, and a jet mill using a fluidized bed is particularly preferable. For example, although the specific gravity of the raw material alloy powder and the grinding aid differ greatly, in the fluidized bed and in the vortex, the grinding and mixing are performed well regardless of the difference in specific gravity, and the difference in specific gravity is particularly problematic in the fluidized bed. It is because it does not become.

微粉砕工程3の後、磁場中成形工程4において、原料合金微粉を磁場中にて成形する。具体的には、微粉砕工程3にて得られた原料合金微粉を電磁石を配置した金型内に充填し、磁場印加によって結晶軸を配向させた状態で磁場中成形する。磁場中成形は、成形圧力と磁界方向が平行な縦磁場成形、成形圧力と磁界方向が直交する横磁場成形のいずれであってもよい。さらに、磁界印加手段として、パルス電源と空芯コイルも採用することができる。この磁場中成形は、例えば700〜1300kA/mの磁場中で、100〜200MPa前後の圧力で行えばよい。   After the pulverizing step 3, in the forming step 4 in the magnetic field, the raw material alloy fine powder is formed in the magnetic field. Specifically, the raw material alloy fine powder obtained in the fine pulverization step 3 is filled in a mold in which an electromagnet is arranged, and is molded in a magnetic field with a crystal axis oriented by applying a magnetic field. The forming in the magnetic field may be either a vertical magnetic field forming in which the forming pressure and the magnetic field direction are parallel, or a horizontal magnetic field forming in which the forming pressure and the magnetic field direction are orthogonal to each other. Further, a pulse power source and an air-core coil can be employed as the magnetic field applying means. The forming in the magnetic field may be performed at a pressure of about 100 to 200 MPa in a magnetic field of 700 to 1300 kA / m, for example.

次に、前記磁場中成形工程により形成された成形体を焼結するが、焼結に先立って、脱バインダー工程において脱バインダー処理を行うことが好ましい。この脱バインダー処理は、粉砕工程において添加され成形体に含まれる潤滑剤を系外に除去するための工程であり、脱バインダー処理を行うことで、焼結後に炭化物、酸化物等として残存する炭素や酸素の残存量を減らすことができる。   Next, the molded body formed by the molding step in the magnetic field is sintered, but it is preferable to perform a debinding process in the debinding step prior to sintering. This binder removal process is a process for removing the lubricant added in the pulverization process and contained in the molded body, and by removing the binder, carbon remaining as a carbide, oxide, etc. after sintering. And the remaining amount of oxygen can be reduced.

次いで、焼結工程5において、焼結を実施する。すなわち、原料合金微粉を磁場中成形後、前記脱バインダー処理を行った成形体(予備焼結体)を真空または不活性ガス雰囲気中で焼結する。焼結温度は、組成、粉砕方法、粒度と粒度分布の違い等、諸条件により調整する必要があるが、例えば1000〜1150℃で5時間程度焼結すればよい。加熱方法は、抵抗加熱、高周波誘導加熱等、任意である。   Next, in the sintering step 5, sintering is performed. That is, after forming the raw material alloy fine powder in a magnetic field, the formed body (pre-sintered body) subjected to the binder removal treatment is sintered in a vacuum or an inert gas atmosphere. Although it is necessary to adjust sintering temperature by various conditions, such as a composition, a grinding | pulverization method, and the difference of a particle size and a particle size distribution, for example, what is necessary is just to sinter at 1000-1150 degreeC for about 5 hours. The heating method is arbitrary such as resistance heating and high frequency induction heating.

焼結工程あるいはその後の時効工程を経た希土類焼結磁石は、機械加工工程6において、切断、研磨、サンドブラスト、バレル加工等の機械加工を施すことにより、所定のサイズに加工される。機械加工の手法は任意であり、例えば切断の方法としては、ワイヤーソーや放電加工等を挙げることができる。磁石素体の加工サイズも任意であるが、加工劣化層の発生する厚みがほぼ一定なため、磁石素体の加工サイズの厚みが厚いとその影響を受けにくく、薄くなるにつれて、加工劣化層の影響を受けやすくなる。厚さ2mm以下、特に厚さ1mm以下となるような機械加工を行った場合、後述の回復処理による効果が大きい。   The rare earth sintered magnet that has undergone the sintering process or the subsequent aging process is processed into a predetermined size by machining such as cutting, polishing, sand blasting, and barrel machining in the machining process 6. The machining method is arbitrary, and examples of the cutting method include a wire saw and electric discharge machining. The processing size of the magnet body is also arbitrary, but the thickness of the processing degradation layer is almost constant, so the thickness of the processing size of the magnet body is not easily affected. Be susceptible. When machining is performed so that the thickness is 2 mm or less, particularly 1 mm or less, the effect of the recovery process described later is large.

機械加工により所定のサイズに加工した希土類焼結磁石を磁石素体とし、これを希土類磁石として用いるが、機械加工を施した磁石素体は、表面に加工劣化層が形成され、磁気特性の低下が見られる。そこで、本発明においては、次の被膜形成工程7において、希土類元素を主体とする被膜を成膜し、さらに回復処理工程、すなわち1段目熱処理工程8及び2段目熱処理工程9において回復処理を行うことで、磁気特性の回復を図る。   A rare earth sintered magnet machined to a predetermined size by machining is used as a magnet body, and this is used as a rare earth magnet. However, a machined magnet body has a process-deteriorated layer formed on its surface, resulting in reduced magnetic properties. Is seen. Therefore, in the present invention, in the next film formation step 7, a film mainly composed of rare earth elements is formed, and further, in the recovery process, that is, in the first stage heat treatment process 8 and the second stage heat treatment process 9, the recovery process is performed. By doing so, recovery of magnetic properties is aimed at.

前記被膜は、任意の手法で形成することができる。例えば、蒸着、スパッター等の物理的蒸着法(PVD法)や、化学気相成長法(CVD法)、ディッピング法等により形成することが可能である。物理的蒸着法については、先の非特許文献1に詳述されている。以下においては、CVD法による被膜の形成と、ディッピング法による被膜の形成について説明する。   The coating can be formed by any method. For example, it can be formed by a physical vapor deposition method (PVD method) such as vapor deposition or sputtering, a chemical vapor deposition method (CVD method), a dipping method, or the like. The physical vapor deposition method is described in detail in the aforementioned Non-Patent Document 1. Hereinafter, formation of a film by a CVD method and formation of a film by a dipping method will be described.

先ず、CVD法では、原料物質を含むガスに、熱や光によってエネルギーを与えたり、高周波でプラズマ化したりすることにより、原料物質がラジカル化して反応性に富むようになり、基板上に吸着されて堆積する。CVD法としては、例えば、温度を上げて堆積させる熱CVDや、化学反応や熱分解を促進させるために光を照射する光CVD、ガスをプラズマ状態に励起するプラズマCVD、タングステンホットワイヤ等で材料ガスを高効率に接触分解するCat−CVD等、種々の方式のCVD法が知られているが、本発明ではいずれの方法も任意に採用することができる。   First, in the CVD method, energy is applied to a gas containing a raw material by heat or light, or plasma is generated at a high frequency, so that the raw material is radicalized and rich in reactivity, and is adsorbed on the substrate. accumulate. As the CVD method, for example, a material such as a thermal CVD for increasing the temperature, a light CVD for irradiating light to promote a chemical reaction or thermal decomposition, a plasma CVD for exciting a gas into a plasma state, a tungsten hot wire, etc. Various types of CVD methods such as Cat-CVD for catalytically decomposing gas with high efficiency are known, but any method can be arbitrarily employed in the present invention.

図2は、CVD装置の一例の概略構成を示すものである。CVD装置は、成膜空間を構成する真空チャンバ21と、当該真空チャンバ21内を所定の真空度とする真空排気機構22、真空チャンバ21内に原料ガスを供給する原料ガス供給手段23とから構成される。真空チャンバ21には、図示は省略するが、CVDの方式に応じて、例えば加熱手段、光源、高周波電源、ホットワイヤ等が設置される。   FIG. 2 shows a schematic configuration of an example of a CVD apparatus. The CVD apparatus includes a vacuum chamber 21 that forms a film formation space, a vacuum exhaust mechanism 22 that makes the inside of the vacuum chamber 21 a predetermined degree of vacuum, and a source gas supply unit 23 that supplies a source gas into the vacuum chamber 21. Is done. Although not shown, the vacuum chamber 21 is provided with, for example, a heating means, a light source, a high frequency power supply, a hot wire, etc. according to the CVD method.

原料ガス供給手段23には、通常は原料ガスを充填したタンク、ボンベ等が用いられるが、本発明では、常温で固体の希土類化合物を気化して成膜するため、原料ガス供給手段23として、キャリアガス源24、及び希土類化合物25を収容する原料容器26を用いている。原料容器26には、加熱手段が設けられ、これを加熱しながらキャリアガスを供給することで、前記希土類化合物25が気化してシャワーヘッド27を介して真空チャンバ21内へと導入される。導入された希土類化合物は、真空チャンバ21内で分解され、真空チャンバ21内に設置された磁石素体28の表面に堆積し、CVD膜が形成される。CVD膜を2元系合金、あるいは3元系以上の合金とする場合には、CVD膜を構成する金属の数だけ原料ガス供給手段23を並列に設置し、各金属元素の化合物を原料容器26内に収容する。なお、原料ガス供給手段23には、流量計29や調整バルブ30を設置して、原料ガスの供給量を制御可能とする。   As the source gas supply means 23, a tank, a cylinder or the like filled with the source gas is usually used. However, in the present invention, a solid rare earth compound is vaporized at room temperature to form a film. A raw material container 26 containing a carrier gas source 24 and a rare earth compound 25 is used. The raw material container 26 is provided with heating means, and the carrier gas is supplied while heating the raw material container 26, whereby the rare earth compound 25 is vaporized and introduced into the vacuum chamber 21 through the shower head 27. The introduced rare earth compound is decomposed in the vacuum chamber 21 and deposited on the surface of the magnet body 28 installed in the vacuum chamber 21 to form a CVD film. When the CVD film is a binary alloy, or a ternary or higher alloy, the source gas supply means 23 are installed in parallel by the number of metals constituting the CVD film, and the compound of each metal element is supplied to the source container 26. Housed inside. The source gas supply means 23 is provided with a flow meter 29 and an adjustment valve 30 so that the supply amount of the source gas can be controlled.

CVD膜の成膜に際しては、磁石素体28の全面を均一なCVD膜で被覆する必要がある。したがって、磁石素体28を真空チャンバ21内で回転、振動等により撹拌しながらCVDによる成膜を行うことが好ましい。   When forming the CVD film, it is necessary to cover the entire surface of the magnet body 28 with a uniform CVD film. Therefore, it is preferable to perform film formation by CVD while stirring the magnet body 28 in the vacuum chamber 21 by rotation, vibration, or the like.

原料となる希土類化合物としては、βジケトン系希土類元素有機金属錯体等を挙げることができる。具体的化合物としては、一般式R(DPM)3、R(HFA)3、R(FOD)3等が例示される。なお、前記一般式中、Rは希土類元素、DPMは2,2,6,6−テトラメチル−1,3,5−ヘプタンジオン(2,2,6,6-tetramethyl-1,3,5-heptanedione)、HFAは1,1,1,5,5,5−ヘキサフルオロ−2,4−ペンタンジオン(1,1,1,5,5,5,-hexafluoro-2,4-pentanedione)、FODは1,1,1,2,2,3,3−ヘプタフルオロ−7,7−ジメチル−4,6−オクタンジオン(1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedione)である。あるいは、前記βジケトン系希土類元素有機金属錯体として、6−エチル−2,2−ジメチル−3,5−オクタンジオンを希土類元素の配位子とした有機希土類錯体等も使用可能である。 Examples of the rare earth compound used as a raw material include a β-diketone-based rare earth element organometallic complex. Specific examples of the compound include general formulas R (DPM) 3 , R (HFA) 3 , R (FOD) 3 and the like. In the above general formula, R is a rare earth element, and DPM is 2,2,6,6-tetramethyl-1,3,5-heptanedione (2,2,6,6-tetramethyl-1,3,5- heptanedione), HFA is 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (1,1,1,5,5,5, -hexafluoro-2,4-pentanedione), FOD 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedione (1,1,1,2,2,3,3-heptafluoro-7,7 -dimethyl-4,6-octanedione). Alternatively, as the β-diketone-based rare earth element organometallic complex, an organic rare earth complex using 6-ethyl-2,2-dimethyl-3,5-octanedione as a ligand of a rare earth element can be used.

前記希土類化合物は、百数十℃以上の温度で加熱して気化させ、これを含んだ蒸気を真空チャンバ21内に供給する。あるいは、これら希土類化合物をテトラヒドロフラン(THF)等の溶媒に溶かして溶液とし、液体マスフローコントローラを使って真空チャンバ21内に輸液したり、ノズルから吹き付けることで供給することも可能である。   The rare earth compound is heated and vaporized at a temperature of hundreds of degrees Celsius or higher, and a vapor containing this is supplied into the vacuum chamber 21. Alternatively, these rare earth compounds can be dissolved in a solvent such as tetrahydrofuran (THF) to form a solution, which can be supplied into the vacuum chamber 21 using a liquid mass flow controller or sprayed from a nozzle.

CVD膜を2元系合金、あるいは3元系以上の合金とする場合、他の金属元素の化合物を原料として使用する必要があるが、例えばFe等の希土類元素以外の金属元素の場合にも、Fe(DPM)3等のβジケトン系有機金属錯体等、各種既存の有機金属化合物等を用いることで、原料供給が可能である。 When the CVD film is a binary alloy, or a ternary or higher alloy, it is necessary to use a compound of another metal element as a raw material, but also in the case of a metal element other than rare earth elements such as Fe, By using various existing organometallic compounds such as β-diketone organometallic complexes such as Fe (DPM) 3 , raw materials can be supplied.

前述のCVD法では、原料ガスの流量を制御することにより成膜されるCVD膜の組成を制御することができる。そこで、これを利用してCVD膜の組成に分布を持たせることが可能である。先にも述べたように、前記CVD膜において、磁石素体と接する内側部分においてNd、Prから選ばれる少なくとも1種の濃度が高く、これとは反対側の外側部分においてDy、Tbから選ばれる少なくとも1種の濃度が高くなるように組成分布を持たせることにより、DyやTbの使用量を削減することができ、製造コストを抑えることができる。   In the above-described CVD method, the composition of the CVD film formed can be controlled by controlling the flow rate of the source gas. Therefore, it is possible to give a distribution to the composition of the CVD film by utilizing this. As described above, in the CVD film, at least one concentration selected from Nd and Pr is high in the inner portion in contact with the magnet body, and Dy and Tb are selected in the outer portion on the opposite side. By providing the composition distribution so that at least one concentration becomes high, the amount of Dy and Tb used can be reduced, and the manufacturing cost can be suppressed.

CVD膜にこのような組成分布を持たせるには、先ずNd、Prから選ばれる少なくとも1種の希土類化合物を原料ガスとして供給し、Nd、あるいはPrを主体とするCVD膜を成膜する。次いで、原料ガスを切り替え、Dy、Tbから選ばれる少なくとも1種の希土類化合物を原料ガスとして供給し、Dy、あるいはTbを主体とするCVD膜を成膜する。これにより、前記組成分布を持ったCVD膜が成膜される。   In order to give such a composition distribution to the CVD film, first, at least one rare earth compound selected from Nd and Pr is supplied as a source gas, and a CVD film mainly composed of Nd or Pr is formed. Next, the source gas is switched, at least one rare earth compound selected from Dy and Tb is supplied as a source gas, and a CVD film mainly composed of Dy or Tb is formed. Thereby, a CVD film having the composition distribution is formed.

一方、ディッピング処理は、磁石素体を希土類元素を主体とする合金溶湯中に浸漬するだけでよく、極めて簡便な手法である。使用する合金溶湯は、希土類元素を主体とするものであるが、希土類元素単体の溶湯であってもよいし、希土類元素を含む2元系合金、あるいは3元系以上の合金の溶湯であってもよい。ただし、加工劣化層の改質による効果を得るためには、希土類元素を50原子%以上含有していることが好ましい。また、磁石素体に含まれる希土類元素の割合よりも、合金溶湯に含まれる希土類元素の割合の方が大であることが好ましい。   On the other hand, the dipping process is an extremely simple technique because it is sufficient to immerse the magnet body in a molten alloy mainly composed of rare earth elements. The molten alloy used is mainly composed of rare earth elements, but it may be a molten rare earth element alone, or a binary alloy containing rare earth elements, or a molten alloy of ternary or higher alloys. Also good. However, in order to obtain the effect by the modification of the work deterioration layer, it is preferable to contain 50 atom% or more of rare earth elements. Moreover, it is preferable that the ratio of the rare earth element contained in the molten alloy is larger than the ratio of the rare earth element contained in the magnet body.

また、合金溶湯の融点は、あまり高すぎると磁石素体の焼結温度に近づき、磁石素体の特性を劣化させるおそれがあることから、1000℃以下とすることが好ましい。したがって、合金溶湯の組成は、この融点の観点から設定することも必要である。例えば、Dy−Fe系の状態図を図3に、Nd−Fe系の状態図を図4に示す。Dy−Fe系では、Dyが70原子%において融点が890℃まで下がっており、Dyが65原子%〜77原子%で融点1000℃以下が達成される。Nd−Fe系では、Ndが78原子%で融点685℃であり、Ndが55原子%以上で融点1000℃以下が達成される。   Further, if the melting point of the molten alloy is too high, the melting point approaches the sintering temperature of the magnet body and may deteriorate the characteristics of the magnet body, and therefore it is preferably set to 1000 ° C. or lower. Therefore, it is also necessary to set the composition of the molten alloy from the viewpoint of this melting point. For example, FIG. 3 shows a Dy—Fe phase diagram, and FIG. 4 shows a Nd—Fe phase diagram. In the Dy-Fe system, the melting point is lowered to 890 ° C. when Dy is 70 atomic%, and a melting point of 1000 ° C. or less is achieved when Dy is 65 atomic% to 77 atomic%. In the Nd—Fe system, Nd is 78 atomic% and the melting point is 685 ° C., and Nd is 55 atomic% or more and the melting point is 1000 ° C. or less.

ディッピング処理におけるディッピング時間は、10分間〜1時間程度である。ディッピング時間が短すぎると、表面改質効果が不十分となるおそれがある。ディッピング時間が長すぎると、生産性が低下し、磁石素体への熱的影響が大きくなるおそれもある。なお、ディッピング温度やディッピング時間を最適化すれば、時効処理を兼ねることもでき、製造工程をさらに簡略化することが可能である。   The dipping time in the dipping process is about 10 minutes to 1 hour. If the dipping time is too short, the surface modification effect may be insufficient. If the dipping time is too long, the productivity is lowered and the thermal influence on the magnet body may be increased. If the dipping temperature and dipping time are optimized, the aging treatment can be performed, and the manufacturing process can be further simplified.

前記いずれかの方法で磁石素体の表面に被膜を成膜した後、回復処理工程で磁石素体の表面改質を行う。この回復処理工程は、例えば熱処理することによって行うが、本発明では、この回復処理のための熱処理を温度の異なる2段階の熱処理とする。ここで重要なのは、各段階での温度設定であり、1段目の熱処理温度よりも2段目の熱処理温度が高くなるように設定する。   After a film is formed on the surface of the magnet body by any of the above methods, the surface of the magnet body is modified in a recovery process. This recovery process is performed by, for example, heat treatment. In the present invention, the heat treatment for the recovery process is a two-stage heat treatment at different temperatures. What is important here is the temperature setting at each stage, which is set so that the second stage heat treatment temperature is higher than the first stage heat treatment temperature.

具体的には、1段目に固相反応が進む温度で熱処理し、2段目に液相が生じる温度で熱処理する。あるいは、1段目に被膜の融点未満の温度で熱処理し、2段目に被膜の融点以上の温度で熱処理する。   Specifically, heat treatment is performed at a temperature at which a solid phase reaction proceeds in the first stage, and heat treatment is performed at a temperature at which a liquid phase is generated in the second stage. Alternatively, the first stage is heat-treated at a temperature lower than the melting point of the film, and the second stage is heat-treated at a temperature higher than the melting point of the film.

例えば、図3に示すDy−Fe系の状態図や図4に示すNd−Fe系の状態図において、各組成での融点を示す融点曲線より温度が上の領域では液相のみになり、これより温度が下の領域では固相、あるいは固相と液相の混相となる。そして、Dy−Fe系では、Dyが70原子%において融点が890℃と最も低くなり、Nd−Fe系では、Ndが78原子%で融点が685℃と最も低くなる。したがって、Dy−Fe系の場合、890℃未満であれば、また、Nd−Fe系の場合、685℃未満であれば、組成によらず固相のみの状態となる。   For example, in the Dy-Fe phase diagram shown in FIG. 3 and the Nd-Fe phase diagram shown in FIG. 4, only the liquid phase is present in the region above the melting point curve showing the melting point of each composition. In a region where the temperature is lower, a solid phase or a mixed phase of a solid phase and a liquid phase is obtained. The Dy—Fe system has the lowest melting point of 890 ° C. when Dy is 70 atomic%, and the Nd—Fe system has the lowest melting point of 685 ° C. with Nd of 78 atomic%. Therefore, in the case of Dy—Fe system, if it is less than 890 ° C., and in the case of Nd—Fe system, if it is less than 685 ° C., only a solid phase is obtained regardless of the composition.

前記のように1段目に固相反応が進む温度で熱処理し、2段目に液相が生じる温度で熱処理する場合には、Dy−Fe系では890℃未満で、Nd−Fe系では685℃未満で1段目の熱処理を行い、2段目の熱処理は、Dy−Fe系では890℃以上で、Nd−Fe系では685℃以上で行う。1段目の熱処理では、磁石素体の表面に形成された被膜は、固相状態を保っており、いわゆる固相反応により被膜を構成する希土類元素の磁石素体中への拡散が行われる。2段目の熱処理では、融点曲線より下の温度である場合には、固相と液相との混相の状態で被膜を構成する希土類元素の磁石素体中への拡散が行われる。2段目の熱処理温度が融点曲線より高い温度である場合には、液相の状態で被膜を構成する希土類元素の磁石素体中への拡散が行われる。   As described above, when the heat treatment is performed at the temperature at which the solid phase reaction proceeds in the first stage and the heat treatment is performed at the temperature at which the liquid phase is generated in the second stage, the temperature is less than 890 ° C. for the Dy-Fe system and 685 for the Nd—Fe system. The first heat treatment is performed at a temperature lower than 0 ° C., and the second heat treatment is performed at 890 ° C. or more for the Dy—Fe system and 685 ° C. or more for the Nd—Fe system. In the first heat treatment, the film formed on the surface of the magnet element body maintains a solid state, and diffusion of rare earth elements constituting the film into the magnet element body is performed by a so-called solid phase reaction. In the second heat treatment, when the temperature is lower than the melting point curve, the rare earth element constituting the coating is diffused into the magnet body in a mixed phase state of the solid phase and the liquid phase. When the heat treatment temperature in the second stage is higher than the melting point curve, the rare earth element constituting the coating is diffused into the magnet body in the liquid phase.

一方、1段目に被膜の融点未満の温度で熱処理し、2段目に被膜の融点以上の温度で熱処理する場合には、1段目の熱処理をDy−Fe系で890℃未満、Nd−Fe系で685℃未満の温度で行った場合、固相反応により被膜を構成する希土類元素の磁石素体中への拡散が行われ、2段目の熱処理では、被膜の融点以上の温度で熱処理が行われるので、液相の状態で被膜を構成する希土類元素の磁石素体中への拡散が行われる。共晶組成以外の組成において、1段目の熱処理をDy−Fe系で890℃以上、Nd−Fe系で685℃以上の温度で行った場合には、1段目の熱処理により、固相と液相との混相の状態で被膜を構成する希土類元素の磁石素体中への拡散が行われる。   On the other hand, when heat treatment is performed at a temperature lower than the melting point of the film in the first stage and heat treatment is performed at a temperature higher than the melting point of the film in the second stage, the first heat treatment is less than 890 ° C. in Dy-Fe system, Nd— When it is performed at a temperature of less than 685 ° C. in an Fe system, the rare earth element constituting the coating is diffused into the magnet body by a solid phase reaction, and in the second heat treatment, the heat treatment is performed at a temperature higher than the melting point of the coating. Therefore, diffusion of rare earth elements constituting the coating in a liquid phase state into the magnet element body is performed. In a composition other than the eutectic composition, when the first stage heat treatment is performed at a temperature of 890 ° C. or higher for the Dy—Fe system and 685 ° C. or higher for the Nd—Fe system, Diffusion of the rare earth elements constituting the coating into the magnet body is performed in a mixed phase with the liquid phase.

ただし、いずれの場合にも、1段目の熱処理温度は500℃以上とすることが好ましい。1段目の熱処理温度が500℃未満であると、固相反応が進まず、所定の効果が得られなくなるおそれがある。また、2段目の熱処理温度は、1000℃以下とすることが好ましい。各段階の熱処理時間は、10分間〜1時間程度である。熱処理時間が短すぎると、表面改質効果が不十分となるおそれがある。熱処理時間が長すぎると、生産性が低下し、磁石素体への熱的影響が大きくなるおそれもある。なお、回復処理における各段階の熱処理温度や時間を最適化すれば、時効処理を兼ねることもでき、製造工程をさらに簡略化することが可能である。   However, in any case, the heat treatment temperature in the first stage is preferably 500 ° C. or higher. If the first-stage heat treatment temperature is less than 500 ° C., the solid-phase reaction does not proceed, and the predetermined effect may not be obtained. Further, the heat treatment temperature in the second stage is preferably 1000 ° C. or lower. The heat treatment time for each stage is about 10 minutes to 1 hour. If the heat treatment time is too short, the surface modification effect may be insufficient. If the heat treatment time is too long, the productivity is lowered and the thermal influence on the magnet body may be increased. Note that if the heat treatment temperature and time at each stage in the recovery process are optimized, it can also serve as an aging treatment, and the manufacturing process can be further simplified.

以上のように、回復のための熱処理工程を2段階で行うことにより、1段階の熱処理の場合のように、固相のみ、液相のみ、あるいは固相と液相のみでの熱処理や、2段階の熱処理でも、液相から固相となるような温度設定の熱処理に比べ、迅速、且つ安定して磁気特性の回復を図ることができ、優れた特性の希土類磁石を得ることができる。その理由について、詳細は不明であるが、ある程度固相で元素の相互拡散を進めた後、固液界面を有する拡散を行うことで、相互拡散が円滑に進行するものと考えられる。   As described above, by performing the heat treatment process for recovery in two stages, as in the case of one-stage heat treatment, heat treatment in only the solid phase, only the liquid phase, or only the solid phase and the liquid phase, or 2 Even in the step heat treatment, the magnetic properties can be recovered quickly and stably compared to the temperature setting heat treatment from the liquid phase to the solid phase, and a rare earth magnet having excellent properties can be obtained. Although the details of the reason are unknown, it is considered that the interdiffusion proceeds smoothly by proceeding with the interdiffusion of elements in a solid phase to some extent and then performing diffusion having a solid-liquid interface.

前述の回復処理工程の後、希土類元素を含む被膜によって被覆し表面改質した磁石素体に対して、時効処理を施すことが好ましい。時効工程10は、希土類磁石の保磁力Hcjを制御する上で重要な工程であり、例えば不活性ガス雰囲気中あるいは真空中で時効処理を施す。時効処理としては、例えば2段時効処理が好ましく、例えば1段目の時効処理工程では、800℃前後の温度で0.1〜3時間保持する。次いで、急冷し、2段目の時効処理工程では、550℃前後の温度で0.2〜3時間保持する。600℃近傍の熱処理で保磁力Hcjが大きく増加するため、時効処理を一段で行う場合には、600℃近傍、例えば450℃〜650℃での時効処理を施すとよい。   After the above-described recovery treatment step, it is preferable to apply an aging treatment to the magnet body that has been coated with a coating containing a rare earth element and whose surface has been modified. The aging step 10 is an important step in controlling the coercive force Hcj of the rare earth magnet, and for example, an aging treatment is performed in an inert gas atmosphere or in a vacuum. As the aging treatment, for example, a two-stage aging treatment is preferable. For example, in the first aging treatment step, the temperature is maintained at a temperature of about 800 ° C. for 0.1 to 3 hours. Next, it is rapidly cooled and maintained at a temperature of around 550 ° C. for 0.2 to 3 hours in the second stage aging treatment step. Since the coercive force Hcj is greatly increased by heat treatment in the vicinity of 600 ° C., when aging treatment is performed in one step, it is preferable to perform aging treatment in the vicinity of 600 ° C., for example, 450 ° C. to 650 ° C.

なお、前述の通り、回復処理工程において、各段階の熱処理温度や熱処理時間を最適化して時効処理を兼ねるようにした場合には、前記時効工程10の一部、あるいは全部を省略することも可能である。   As described above, in the recovery process, when the heat treatment temperature and heat treatment time of each stage are optimized so as to serve as an aging treatment, a part or all of the aging process 10 can be omitted. It is.

次に、研削加工工程10において、被膜が形成された磁石素体の表面の研削加工を行う。この研削加工は、回復処理及び時効処理後に磁石素体の表面に残った希土類リッチ合金を取り除くために行うものであり、簡単な研削加工を施すだけでよい。勿論、この研削加工工程10を省略して、磁石素体を被膜で被覆されたままの状態とすることも可能である。   Next, in the grinding step 10, the surface of the magnet body on which the coating film is formed is ground. This grinding process is performed to remove the rare earth-rich alloy remaining on the surface of the magnet body after the recovery process and the aging process, and it is only necessary to perform a simple grinding process. Of course, it is possible to omit the grinding step 10 and leave the magnet body covered with the coating.

最後に、耐食性被膜形成工程により耐食性被膜を形成して希土類磁石を完成する。耐食性被膜としては、磁石素体の酸化を防ぐ保護膜として機能するものであれば材料は問わないが、例えばNi、Si、Al、Cu、Znから選ばれる少なくとも1種の被膜等を挙げることができる。   Finally, a corrosion-resistant film is formed by a corrosion-resistant film forming process to complete a rare earth magnet. The corrosion-resistant film may be any material as long as it functions as a protective film that prevents the magnet body from being oxidized. Examples thereof include at least one film selected from Ni, Si, Al, Cu, and Zn. it can.

前記耐食性被膜の成膜方法も任意であるが、先の表面改質のための被膜をCVD法により形成した場合、耐食性被膜もCVD法により形成すれば、工程の簡略化を図ることができる。例えば耐食性材料を含む被膜もCVD法により成膜し、表面改質のためCVD膜と耐食性材料を含む被膜を同一チャンバ内において連続して形成することで、被膜形成工程から耐食性被膜形成工程までを、同一装置内で一連の工程として行うこともできる。   The method for forming the corrosion-resistant film is arbitrary, but when the film for surface modification is formed by the CVD method, the process can be simplified if the corrosion-resistant film is also formed by the CVD method. For example, a film containing a corrosion-resistant material is also formed by a CVD method, and a CVD film and a film containing a corrosion-resistant material are continuously formed in the same chamber for surface modification, so that the film formation process to the corrosion-resistant film formation process is performed. It can also be performed as a series of steps in the same apparatus.

次に、本発明の具体的な実施例について、実験結果を基に説明する。   Next, specific examples of the present invention will be described based on experimental results.

<実験1>
先ず、NdFeB系焼結磁石として、Nd25重量%、Pr2.5重量%、Dy2.5重量%、Co3重量%、B1重量%、残部Feからなる希土類焼結磁石(磁石素材)を用意した。これを試料1(比較例)とする。
<Experiment 1>
First, as a NdFeB-based sintered magnet, a rare earth sintered magnet (magnet material) made of Nd 25 wt%, Pr 2.5 wt%, Dy 2.5 wt%, Co 3 wt%, B 1 wt% and the balance Fe was prepared. This is designated as Sample 1 (Comparative Example).

次に、この希土類焼結磁石を機械加工によって切断し、10mm×10mm×0.5mm(厚さ)の磁石素体とした。これを試料2(比較例)とする。   Next, the rare earth sintered magnet was cut by machining to obtain a magnet body of 10 mm × 10 mm × 0.5 mm (thickness). This is designated as Sample 2 (Comparative Example).

さらに、図2に示すような装置を用い、これらの焼結磁石を600℃の反応炉(真空チャンバ21)内に入れ、攪拌しながら希土類磁石表面に被膜を形成した。被膜の形成はCVD法により行い、原料ガスを供給するための希土類化合物としては、β−ジケトン系化合物を用いた。また、被膜(CVD膜)の組成は、Nd30原子%、Pr10原子%、Dy50原子%、残部Feであり、約4μm成膜した。その後、これらの試料を750℃で30分間の回復熱処理(1段目熱処理)を行い、固相反応を行った。次いで、870℃で10分間の回復熱処理(2段目熱処理)を行い、液相を含む状態で熱処理を行った。さらに、600℃で30分間の時効処理を施した。これを試料3(実施例)とする。   Furthermore, using a device as shown in FIG. 2, these sintered magnets were placed in a 600 ° C. reactor (vacuum chamber 21), and a film was formed on the surface of the rare earth magnet while stirring. The coating was formed by the CVD method, and a β-diketone compound was used as the rare earth compound for supplying the raw material gas. The composition of the coating (CVD film) was Nd 30 atomic%, Pr 10 atomic%, Dy 50 atomic%, and the balance Fe, and the film was formed with a thickness of about 4 μm. Thereafter, these samples were subjected to a recovery heat treatment (first-stage heat treatment) at 750 ° C. for 30 minutes to perform a solid phase reaction. Next, a recovery heat treatment (second stage heat treatment) was performed at 870 ° C. for 10 minutes, and the heat treatment was performed in a state including a liquid phase. Further, an aging treatment was performed at 600 ° C. for 30 minutes. This is designated as Sample 3 (Example).

被膜成膜後の回復熱処理を1段階のみ行い、その後、600℃で30分間の時効処理を施した。回復熱処理は、870℃で10分間とし、液相を含む状態で熱処理を行った。これを試料4(比較例)とする。   Recovery heat treatment after film formation was performed only in one stage, and then an aging treatment was performed at 600 ° C. for 30 minutes. The recovery heat treatment was performed at 870 ° C. for 10 minutes, and the heat treatment was performed in a state including a liquid phase. This is designated as Sample 4 (Comparative Example).

作製した各希土類磁石について、残留磁束密度Br、保磁力iHc、角型性を測定した。磁石特性[残留磁束密度Br、保磁力iHc、]の測定は、B−Hトレーサーを用いて行った。角型性は、B−Hループにおいて、磁化Bが残留磁化Brより10%低下した点での磁界Hkと、磁化Bがゼロとなる点での磁界(保磁力iHc)との比率(Hk/iHc)より算出した。なお、測定は、各試料20個のサンプルについて行い、その平均値を求めた。結果を表1に示す。また、試料3、4については、20個のサンプルについて測定を行った際のバラツキのレンジ(R)も求めた。その結果を表2に示す。   About each produced rare earth magnet, residual magnetic flux density Br, coercive force iHc, and squareness were measured. Magnet characteristics [residual magnetic flux density Br, coercive force iHc,] were measured using a BH tracer. In the BH loop, the squareness is the ratio (Hk /) of the magnetic field Hk at the point where the magnetization B is 10% lower than the residual magnetization Br and the magnetic field (coercive force iHc) at which the magnetization B becomes zero. iHc). Note that the measurement was performed on 20 samples, and the average value was obtained. The results are shown in Table 1. For samples 3 and 4, the variation range (R) when 20 samples were measured was also obtained. The results are shown in Table 2.

Figure 0004605437
Figure 0004605437

Figure 0004605437
この表1から明らかなように、希土類元素を主体とする被膜(CVD膜)の形成及び回復処理により、加工前の磁石素材(試料1)の磁気特性に匹敵する磁石特性を有する希土類磁石が得られることがわかる。機械加工を施した磁石素体(試料2)は、そのままでは磁気特性の劣化が大きい。また、回復熱処理の効果について試料3と試料4を比較すると、試料3は試料4と比べ、高い保磁力、角形性が得られることがわかる。試料3及び4において、バラツキのレンジ(R)を求めた結果、表2に示すように、試料4ではRが大きく、特性にバラツキが大きいことがわかる。したがって、2段階の回復熱処理によって、安定して特性の改善が得られることがわかる。
Figure 0004605437
As is apparent from Table 1, a rare earth magnet having magnet characteristics comparable to the magnetic characteristics of the magnet material (sample 1) before processing is obtained by forming and recovering a film (CVD film) mainly composed of rare earth elements. I understand that The machined magnet body (Sample 2) is greatly deteriorated in magnetic properties as it is. Further, comparing sample 3 and sample 4 with respect to the effect of the recovery heat treatment, it can be seen that sample 3 can obtain higher coercive force and squareness than sample 4. As a result of obtaining the variation range (R) for Samples 3 and 4, as shown in Table 2, it can be seen that Sample 4 has a large R and a large variation in characteristics. Therefore, it can be seen that the two-stage recovery heat treatment can stably improve the characteristics.

<実験2>
本実験では、PVDにより被膜を形成し、他は実験1と同様にして試料5,6を作製した。ただし、試料5は、回復熱処理を2段階熱処理とし、試料6では、回復熱処理を1段階熱処理とした。PVDに際しては、被膜組成となるようにNdPrDyFe合金をターゲットとして作製し、スパッタリングを行い、希土類磁石素体の表面に表3に示す成膜組成の被膜を被覆した。これら試料についても、先の実験1と同様にして磁気特性を測定した。結果を表3に示す。
<Experiment 2>
In this experiment, a film was formed by PVD, and Samples 5 and 6 were prepared in the same manner as in Experiment 1. However, in Sample 5, the recovery heat treatment was a two-step heat treatment, and in Sample 6, the recovery heat treatment was a one-step heat treatment. At the time of PVD, an NdPrDyFe alloy was prepared as a target so as to have a coating composition, and sputtering was performed to coat the surface of the rare earth magnet element with the coating composition shown in Table 3. For these samples, the magnetic properties were measured in the same manner as in Experiment 1 above. The results are shown in Table 3.

Figure 0004605437
Figure 0004605437

この表3からも、2段階の熱処理が、安定した回復に繋がり、安定して高い特性が得られることがわかる。また、バラツキのレンジ(R)を実験1と同様に求めた結果、試料5では、試料6に比べて特性のバラツキが小さいことが確認された。   Also from Table 3, it can be seen that the two-stage heat treatment leads to stable recovery, and stable high characteristics can be obtained. Further, as a result of obtaining the variation range (R) in the same manner as in Experiment 1, it was confirmed that the variation in characteristics of Sample 5 was smaller than that of Sample 6.

<実験3>
先の実験1と同様、先ず、NdFeB系焼結磁石として、Nd25重量%、Pr2.5重量%、Dy2.5重量%、Co3重量%、B1重量%、残部Feからなる希土類焼結磁石(磁石素材)を用意した。次に、この希土類焼結磁石を機械加工によって切断し、10mm×10mm×0.5mm(厚さ)の磁石素体とした。
<Experiment 3>
As in the previous experiment 1, first, as a NdFeB-based sintered magnet, a rare earth sintered magnet (magnet including Nd 25% by weight, Pr 2.5% by weight, Dy 2.5% by weight, Co 3% by weight, B1% by weight, and the balance Fe) Material). Next, the rare earth sintered magnet was cut by machining to obtain a magnet body of 10 mm × 10 mm × 0.5 mm (thickness).

さらに、図2に示すような装置を用い、これらの焼結磁石を600℃の反応炉(真空チャンバ21)内に入れ、攪拌しながら希土類磁石表面に被膜を形成した。被膜の形成はCVD法により行い、原料ガスを供給するための希土類化合物としては、β−ジケトン系化合物を用いた。また、被膜(CVD膜)の組成は、Nd50原子%、Pr20原子%、Dy20原子%、残部Feであり、約4μm成膜した。その後、これらの試料を680℃で30分間の回復熱処理(1段目熱処理)を行い、固相反応を行った。次いで、850℃で15分間の回復熱処理(2段目熱処理)を行い、液相を含む状態で熱処理を行った。さらに、600℃で30分間の時効処理を施した。これを試料7(実施例)とする。   Furthermore, using a device as shown in FIG. 2, these sintered magnets were placed in a 600 ° C. reactor (vacuum chamber 21), and a film was formed on the surface of the rare earth magnet while stirring. The coating was formed by the CVD method, and a β-diketone compound was used as the rare earth compound for supplying the raw material gas. The composition of the coating (CVD film) was Nd 50 atomic%, Pr 20 atomic%, Dy 20 atomic%, and the balance Fe, and the film was formed with a thickness of about 4 μm. Thereafter, these samples were subjected to a recovery heat treatment (first-stage heat treatment) at 680 ° C. for 30 minutes to perform a solid phase reaction. Next, a recovery heat treatment (second stage heat treatment) was performed at 850 ° C. for 15 minutes, and the heat treatment was performed in a state including a liquid phase. Further, an aging treatment was performed at 600 ° C. for 30 minutes. This is designated as Sample 7 (Example).

被膜成膜後の回復熱処理を1段階のみ行い、その後、600℃で30分間の時効処理を施した。回復熱処理は、850℃で15分間とし、液相を含む状態で熱処理を行った。これを試料8(比較例)とする。これら試料についても、先の実験1と同様にして磁気特性を測定した。結果を表4に示す。   Recovery heat treatment after film formation was performed only in one stage, and then an aging treatment was performed at 600 ° C. for 30 minutes. The recovery heat treatment was performed at 850 ° C. for 15 minutes, and the heat treatment was performed in a state including a liquid phase. This is designated as Sample 8 (Comparative Example). For these samples, the magnetic properties were measured in the same manner as in Experiment 1 above. The results are shown in Table 4.

Figure 0004605437
Figure 0004605437

この表4からも、2段階の熱処理が、安定した回復に繋がり、安定して高い特性が得られることがわかる。また、バラツキのレンジ(R)を実験1と同様に求めた結果、試料7では、試料8に比べて特性のバラツキが小さいことが確認された。   Table 4 also shows that the two-stage heat treatment leads to stable recovery, and high characteristics can be obtained stably. Further, as a result of obtaining the variation range (R) in the same manner as in Experiment 1, it was confirmed that the variation in characteristics of Sample 7 was smaller than that of Sample 8.

<実験4>
本実験では、ディッピングにより被膜を形成し、他は実験1と同様にして試料9,10を作製した。ただし、試料9は、回復熱処理を2段階熱処理とし、試料10では、回復熱処理を1段階熱処理とした。ディッピングに際しては、表4に示す合金溶湯を用い、850℃で1分間、ディッピングを行った。その後、これらの試料を670℃で30分間の回復熱処理(1段目熱処理)を行い、次いで、830℃で15分間の回復熱処理(2段目熱処理)を行った。さらに600℃で30分間の時効処理を施した。試料10は、830℃15分間、その後600℃で30分間の時効処理を施した。これら試料についても、先の実験1と同様にして磁気特性を測定した。結果を表5に示す。
<Experiment 4>
In this experiment, a film was formed by dipping, and Samples 9 and 10 were produced in the same manner as in Experiment 1 except for that. However, in Sample 9, the recovery heat treatment was a two-step heat treatment, and in Sample 10, the recovery heat treatment was a one-step heat treatment. In dipping, the molten alloy shown in Table 4 was used, and dipping was performed at 850 ° C. for 1 minute. Thereafter, these samples were subjected to recovery heat treatment (first-stage heat treatment) at 670 ° C. for 30 minutes, and then subjected to recovery heat treatment (second-stage heat treatment) at 830 ° C. for 15 minutes. Further, an aging treatment was performed at 600 ° C. for 30 minutes. Sample 10 was aged at 830 ° C. for 15 minutes and then at 600 ° C. for 30 minutes. For these samples, the magnetic properties were measured in the same manner as in Experiment 1 above. The results are shown in Table 5.

Figure 0004605437
Figure 0004605437

この表5からも、2段階の熱処理が、安定した回復に繋がり、安定して高い特性が得られることがわかる。また、バラツキのレンジ(R)を実験1と同様に求めた結果、試料9では、試料10に比べて特性のバラツキが小さいことが確認された。   Also from Table 5, it can be seen that the two-step heat treatment leads to stable recovery, and high characteristics can be obtained stably. Further, as a result of obtaining the variation range (R) in the same manner as in Experiment 1, it was confirmed that the variation in characteristics of the sample 9 was smaller than that of the sample 10.

希土類磁石の製造プロセスの一例を示すフローチャートである。It is a flowchart which shows an example of the manufacturing process of a rare earth magnet. CVD装置の一例を示す模式図である。It is a schematic diagram which shows an example of a CVD apparatus. DyFe系合金の状態図である。It is a phase diagram of DyFe system alloy. NdFe系合金の状態図である。It is a phase diagram of a NdFe-type alloy.

符号の説明Explanation of symbols

1 合金化工程、2 粗粉砕工程、3 微粉砕工程、4 磁場中成形工程、5 焼結工程、6 機械加工工程、7 CVD工程、8 回復処理工程、9 時効工程、10 研削加工工程、11 耐食性被膜形成工程、21 真空チャンバ、22 真空排気機構、23 原料ガス供給手段、24 キャリアガス源、25 希土類化合物、26 原料容器、27 シャワーヘッド、28 磁石素体、29 流量計、30 調整バルブ 1 alloying process, 2 coarse grinding process, 3 fine grinding process, 4 magnetic field forming process, 5 sintering process, 6 machining process, 7 CVD process, 8 recovery process, 9 aging process, 10 grinding process, 11 Corrosion-resistant film forming process, 21 vacuum chamber, 22 vacuum exhaust mechanism, 23 raw material gas supply means, 24 carrier gas source, 25 rare earth compound, 26 raw material container, 27 shower head, 28 magnet body, 29 flow meter, 30 adjustment valve

Claims (9)

磁石素体の表面に希土類元素を主体とする被膜を成膜した後、2段階の熱処理を行い、
1段目に500°以上、被膜の融点未満の温度で熱処理し、2段目に被膜の融点以上、1000℃以下の温度で熱処理し、
且つ、各段階の熱処理時間を10分間〜1時間とすることを特徴とする希土類磁石の製造方法。
After forming a film mainly composed of rare earth elements on the surface of the magnet body, two-stage heat treatment is performed,
Heat treatment at a temperature of 500 ° C. or higher and lower than the melting point of the coating in the first stage , heat treatment at a temperature of melting point of the coating and 1000 ° C. or lower in the second stage
And the manufacturing method of the rare earth magnet characterized by making heat processing time of each step into 10 minutes-1 hour.
希土類元素、遷移金属元素及びホウ素を含む原料合金微粉を成形した成形体を焼結して希土類焼結磁石を作製し、当該希土類焼結磁石を磁石素体として用いることを特徴とする請求項1記載の希土類磁石の製造方法。   2. A rare earth sintered magnet is produced by sintering a compact formed from a raw material alloy fine powder containing a rare earth element, a transition metal element and boron, and the rare earth sintered magnet is used as a magnet body. The manufacturing method of the rare earth magnet of description. 前記磁石素体としてNdFeB系希土類焼結磁石を用いることを特徴とする請求項2記載の希土類磁石の製造方法。   3. The method for producing a rare earth magnet according to claim 2, wherein an NdFeB-based rare earth sintered magnet is used as the magnet body. 磁石素体を機械加工により所定の厚さに加工した後、前記被膜を成膜することを特徴とする請求項1乃至3のいずれか1項記載の希土類磁石の製造方法。   4. The method for producing a rare earth magnet according to claim 1, wherein the film is formed after the magnet body is machined to a predetermined thickness. 磁石素体の厚さを2mm以下(ただし、0mmは含まず。)とすることを特徴とする請求項4記載の希土類磁石の製造方法。 5. The method for producing a rare earth magnet according to claim 4, wherein the thickness of the magnet body is 2 mm or less (however, 0 mm is not included) . 前記被膜は、Nd、Pr、Dy、Tbから選ばれる少なくとも1種を含むことを特徴とする請求項1乃至5のいずれか1項記載の希土類磁石の製造方法。   6. The method for producing a rare earth magnet according to claim 1, wherein the coating contains at least one selected from Nd, Pr, Dy, and Tb. 前記被膜は、融点が1000℃以下であることを特徴とする請求項6記載の希土類磁石の製造方法。 The method for producing a rare earth magnet according to claim 6, wherein the coating has a melting point of 1000 ° C. or less . 前記被膜は、物理的蒸着法、化学気相成長法、ディッピング法のいずれかにより成膜することを特徴とする請求項1乃至7のいずれか1項記載の希土類磁石の製造方法。   The method of manufacturing a rare earth magnet according to claim 1, wherein the film is formed by any one of a physical vapor deposition method, a chemical vapor deposition method, and a dipping method. 前記2段階の熱処理の後、温度450℃〜650℃で時効処理を行うことを特徴とする請求項1乃至8のいずれか1項記載の希土類磁石の製造方法。   The method for producing a rare earth magnet according to any one of claims 1 to 8, wherein an aging treatment is performed at a temperature of 450 ° C to 650 ° C after the two-stage heat treatment.
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