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JP4609779B2 - Magnesium alloy member and method for forming highly corrosion-resistant film thereof - Google Patents
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JP4609779B2 - Magnesium alloy member and method for forming highly corrosion-resistant film thereof - Google Patents

Magnesium alloy member and method for forming highly corrosion-resistant film thereof Download PDF

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JP4609779B2
JP4609779B2 JP2007178771A JP2007178771A JP4609779B2 JP 4609779 B2 JP4609779 B2 JP 4609779B2 JP 2007178771 A JP2007178771 A JP 2007178771A JP 2007178771 A JP2007178771 A JP 2007178771A JP 4609779 B2 JP4609779 B2 JP 4609779B2
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film
magnesium alloy
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JP2009013484A (en
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裕之 星
篤志 岡本
慶一 板倉
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Proterial Ltd
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Hitachi Metals Ltd
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Description

マグネシウム合金の高耐食被膜形成方法及びそれを用いて生成したマグネシウム製品に関する。   The present invention relates to a method for forming a highly corrosion-resistant film of a magnesium alloy and a magnesium product produced using the method.

マグネシウムはアルミニウムに比べて密度が約2/3と軽く、薄板とした時の強度が強いことから実用化が期待されている。ところが、マグネシウム及びその合金は非常に錆びやすい性質を持っているため、防錆のための表面処理が必要となる。現在、マグネシウム合金の表面処理には主に塗装が用いられているが、金属質感を持つ表面処理も要求されており、めっきによる表面処理が注目されている。   Magnesium is expected to be put to practical use because its density is about 2/3 that of aluminum and its strength when made into a thin plate is strong. However, since magnesium and its alloys are very rusting, surface treatment for rust prevention is required. Currently, painting is mainly used for the surface treatment of magnesium alloy, but surface treatment with a metallic texture is also required, and surface treatment by plating is attracting attention.

アルミニウム被膜の製膜方法としては溶融めっきが一般的であるが、マグネシウムの融点(650℃)はアルミニウムの融点(660.2℃)よりも低いため、めっき中に素地のマグネシウムが溶解する。別の製膜方法としては蒸着がよく知られているが、製膜速度が遅いためマグネシウム上に十分な耐食性をもつ厚さの膜を形成するには長時間を必要とする。一方、実用化された例は少ないものの低温で短時間にアルミニウムを製膜する方法として電気アルミニウムめっき法がある。電気アルミニウムめっき法は、めっき膜に環境および人体に影響を与える重金属を含まないことから、古くから研究が行われている。水溶液中におけるアルミニウム電析の電位は水素発生の電位よりも卑であるため、水溶液からめっきを行う場合、アルミニウムの電析より優先して水の電気分解が生じる。従って、水溶液からの電気アルミニウムめっきは不可能とされており、溶媒にはテトラヒドロフラン、ジエチルエーテル、トルエン等の非水溶媒が使用されている。アルミニウム源となる溶質には、アルミニウムハロゲン化物やアルキルアルミニウムが用いられる。これらの溶質は水分と反応しやすく、空気中の水分を容易に吸収するため、電気アルミニウムめっきでは雰囲気の制御が重要である。   As a method for forming an aluminum film, hot dipping is generally used, but since the melting point of magnesium (650 ° C.) is lower than the melting point of aluminum (660.2 ° C.), the base magnesium dissolves during plating. Vapor deposition is well known as another film forming method, but it takes a long time to form a film having a sufficient corrosion resistance on magnesium because the film forming speed is slow. On the other hand, although there are few examples of practical use, there is an electroaluminum plating method as a method for forming aluminum at a low temperature in a short time. The electroaluminum plating method has been studied for a long time since the plating film does not contain heavy metals that affect the environment and the human body. Since the potential of aluminum electrodeposition in an aqueous solution is lower than the potential of hydrogen generation, when plating is performed from an aqueous solution, electrolysis of water occurs in preference to electrodeposition of aluminum. Therefore, electroaluminum plating from an aqueous solution is impossible, and nonaqueous solvents such as tetrahydrofuran, diethyl ether, and toluene are used as the solvent. An aluminum halide or alkylaluminum is used as a solute serving as an aluminum source. Since these solutes easily react with moisture and easily absorb moisture in the air, it is important to control the atmosphere in electroaluminum plating.

アルミニウムの表面は、陽極酸化することで高耐食性を持つ被膜とすることができる。また、陽極酸化後に着色を行うことで、様々な外観を持つ被膜を形成することができる。
特許2751530号 特開2006−233315号
The surface of aluminum can be formed into a film having high corrosion resistance by anodizing. Moreover, the film which has various external appearances can be formed by coloring after anodization.
Japanese Patent No. 2751530 JP 2006-233315 A

マグネシウム合金表面には自然酸化による酸化膜が生成するため、マグネシウム合金にめっきを行うには前処理による酸化膜の除去が重要となる。ところが、上述のように電気アルミニウムめっき液は水分の影響を受けやすい特性をもっているため、被めっき物が充分乾燥した状態でめっきしなければならない。従って、酸化膜を除去し、且つ乾燥により自然酸化膜を生成しない前処理が必要となる。   Since an oxide film is formed by natural oxidation on the surface of the magnesium alloy, it is important to remove the oxide film by pretreatment in order to plate the magnesium alloy. However, as described above, since the electroaluminum plating solution has a characteristic that it is easily affected by moisture, it must be plated in a state where the object to be plated is sufficiently dried. Accordingly, it is necessary to perform a pretreatment that removes the oxide film and does not generate a natural oxide film by drying.

特許文献1では、酸化防止膜として亜鉛/銅めっきを用い、マグネシウム合金に亜鉛/銅/ニッケル/アルミニウムの4層構造を持つめっき膜の形成方法が報告されている。これらのめっきプロセスではマグネシウム酸化膜除去のための前処理でクロム酸等の物質を含有する液を使用し、銅めっき工程では青酸を含有する液を使用しており自然環境への影響や作業の安全性に問題がある。   Patent Document 1 reports a method of forming a plating film having a four-layer structure of zinc / copper / nickel / aluminum on a magnesium alloy using zinc / copper plating as an antioxidant film. These plating processes use a liquid containing chromic acid and other substances in the pretreatment for removing the magnesium oxide film, and the copper plating process uses a liquid containing hydrocyanic acid. There is a problem with safety.

特許文献2には青酸、クロム酸などの有害物質を使用しない前処理プロセスを用いてニッケルめっきを行い、更に電気アルミニウムめっきを行うことによりニッケル/アルミニウムの二層構造を持つめっき膜の形成方法が報告されているが、アルミニウムめっき液の腐食性が強いためニッケルめっき膜のピンホールを通してマグネシウム合金素地が溶出し、その結果ニッケルめっき膜の密着性が低下することがある。   Patent Document 2 discloses a method for forming a plating film having a nickel / aluminum two-layer structure by performing nickel plating using a pretreatment process that does not use harmful substances such as hydrocyanic acid and chromic acid, and further performing electroaluminum plating. Although it has been reported, since the corrosiveness of the aluminum plating solution is strong, the magnesium alloy substrate is eluted through the pinholes of the nickel plating film, and as a result, the adhesion of the nickel plating film may be lowered.

また、アルミニウムめっき膜はアルカリ溶液で容易に除去できるが、上記の膜構成では酸化防止膜として使用している銅やニッケルめっき膜が除去し難く、マグネシウム合金のリサイクルが困難であるという問題がある。   In addition, although the aluminum plating film can be easily removed with an alkaline solution, the above-described film configuration has a problem that it is difficult to remove the copper or nickel plating film used as the antioxidant film and it is difficult to recycle the magnesium alloy. .

本特許では、マグネシウム合金上に有害物質を使用しない方法を用いて高耐食性を有し且つ金属質感及びカラーバリエーションに富んだ被膜を形成し、更にリサイクル性も良好なめっき膜を提供することを目的とする。   The purpose of this patent is to provide a plating film that has a high corrosion resistance and is rich in metal texture and color variation by using a method that does not use harmful substances on the magnesium alloy, and also has good recyclability. And

本発明では、マグネシウム合金上に導電性陽極酸化処理を行って導電性陽極酸化膜を形成し、更に亜鉛皮膜/アルミニウム皮膜の二層めっき膜構造とすることで上記課題を解決した。電気アルミニウムめっきの前処理としてマグネシウム合金の導電性陽極酸化処理及び電気亜鉛めっきを使用した。導電性陽極酸化膜を形成することで電気亜鉛めっき液とマグネシウム素材の反応を防止することができる。更に、アルミニウムめっき下地として亜鉛めっきを行うことで、腐食性の強いアルミニウムめっき液とマグネシウム素材との反応を防止することができる。亜鉛めっき膜はアルミニウムめっき膜と似た銀色を呈しており、傷付いた際に亜鉛が露出しても顕著な色調変化はない。また、AZ系マグネシウム合金は亜鉛及びアルミニウムを含有しているので、廃棄の際にめっき膜を剥離することなくリサイクルが可能となる。リサイクルの際にアルミニウムめっき膜の陽極酸化膜はアルカリで溶かすことで容易に除去できる。   In the present invention, the above-mentioned problems have been solved by forming a conductive anodized film on a magnesium alloy by forming a conductive anodized film and further forming a zinc film / aluminum film double-layer plating film structure. Conductive anodizing treatment of magnesium alloy and electrogalvanizing were used as pretreatment for electroaluminum plating. By forming the conductive anodic oxide film, the reaction between the electrogalvanizing solution and the magnesium material can be prevented. Furthermore, by performing zinc plating as the aluminum plating base, it is possible to prevent a reaction between the highly corrosive aluminum plating solution and the magnesium material. The galvanized film has a silver color similar to that of the aluminum plated film, and there is no noticeable color tone change even if zinc is exposed when scratched. Further, since the AZ-based magnesium alloy contains zinc and aluminum, it can be recycled without peeling off the plating film at the time of disposal. During recycling, the anodized film of the aluminum plating film can be easily removed by dissolving with an alkali.


すなわち本願第一の発明は、マグネシウム合金と、該マグネシウム合金から形成した厚さ5μm以下の導電性陽極酸化膜と、該導電性陽極酸化膜上に形成した厚さ10〜15μmの亜鉛めっき皮膜と、該亜鉛めっき皮膜上に形成した厚さ10〜100μmの電気アルミニウムめっき皮膜と、該電気アルミニウムめっき皮膜から形成した酸化皮膜とを有するマグネシウム合金部材である。

That is, the first invention of the present application is directed to a magnesium alloy, a conductive anodic oxide film having a thickness of 5 μm or less formed from the magnesium alloy, and a galvanized film having a thickness of 10 to 15 μm formed on the conductive anodic oxide film. a magnesium alloy member having a electroplated aluminum film having a thickness of 10~100μm formed on the galvanized coating, the oxide film formed from the electroplated aluminum coating.


本願第二の発明は、マグネシウム合金上に該マグネシウム合金の厚さ5μm以下の導電性陽極酸化膜を形成し、その上に厚さ10〜15μmの亜鉛めっき皮膜を形成し、その上に厚さ10〜100μmの電気アルミニウムめっき皮膜を形成し、該電気アルミニウムめっき皮膜の表面を酸化して酸化皮膜を形成するマグネシウム合金部材の高耐食被膜形成方法である。

In the second invention of the present application, a conductive anodic oxide film having a thickness of 5 μm or less is formed on a magnesium alloy, a galvanized film having a thickness of 10 to 15 μm is formed thereon, and the thickness is further formed thereon. forming an electrical aluminum plating film 10 to 100 [mu] m, a high corrosion resistant coating method for forming a magnesium alloy member to form an oxide film by oxidizing the surface of the electroplated aluminum coating.

導電性陽極酸化膜の厚さは5μm以下が好ましい。膜厚が5μmを超えると導電性がなくなり、電気亜鉛めっきができなくなる。   The thickness of the conductive anodic oxide film is preferably 5 μm or less. When the film thickness exceeds 5 μm, conductivity is lost and electrogalvanization cannot be performed.

亜鉛めっき膜厚は5〜15μmが好ましい。亜鉛めっき膜厚が5μm未満ではアルミニウムめっきの際に亜鉛めっき膜のピンホールを通してアルミニウムめっき液とマグネシウム合金素地とが反応する。また、膜厚が15μm以上になると、めっき膜の内部応力が増大するため密着性が低下する。なお、亜鉛皮膜はめっき以外の方法で形成してもよい。   The galvanized film thickness is preferably 5 to 15 μm. When the galvanized film thickness is less than 5 μm, the aluminum plating solution reacts with the magnesium alloy substrate through the pinholes of the galvanized film during aluminum plating. On the other hand, when the film thickness is 15 μm or more, the internal stress of the plating film increases, so that the adhesiveness decreases. The zinc film may be formed by a method other than plating.

アルミニウムめっき膜厚は10〜100μmであることが好ましい。膜厚が10μm未満になると、アルミニウムめっき膜のピンホールが顕著となり、後の表面酸化の際に亜鉛めっきしたマグネシウム合金素地を侵食する恐れがある。また、膜厚が100μmを超えると試料エッジにおける瘤状電析が顕著となる。   The aluminum plating film thickness is preferably 10 to 100 μm. If the film thickness is less than 10 μm, pinholes in the aluminum plating film become prominent, and there is a risk of eroding the galvanized magnesium alloy substrate during subsequent surface oxidation. Further, when the film thickness exceeds 100 μm, the nodule electrodeposition on the sample edge becomes remarkable.

アルミニウム酸化膜の厚さは100nm以上が好ましい。100nm未満ではアルミニウムめっき膜の酸化が生じ、外観にムラを生じやすくなる。   The thickness of the aluminum oxide film is preferably 100 nm or more. If the thickness is less than 100 nm, the aluminum plating film is oxidized and the appearance is likely to be uneven.

本発明を用いれば、マグネシウム合金上に金属光沢とカラーバリエーションを持ち、且つ耐食性の良い被膜を得ることができる。   By using the present invention, it is possible to obtain a film having a metallic luster and color variation on the magnesium alloy and having good corrosion resistance.

本発明のマグネシウム合金用高耐食コーティングについて、その一例を以下に述べる。なお、亜鉛めっき及びアルミニウムめっき液は実施例に記載のものに限らず、どのようなめっき液でも適用可能である。   An example of the highly corrosion resistant coating for magnesium alloy of the present invention will be described below. The zinc plating and aluminum plating solutions are not limited to those described in the embodiments, and any plating solution can be applied.

(比較例1)
被めっき試料には、60mm×60mm×1mm厚のマグネシウム合金(AZ31)板を使用した。ジメチルスルホン5.0molに対して無水塩化アルミニウム1.0molを溶融させて作製しためっき液を用いて、試料に前処理無し(表面にマグネシウム合金の酸化物層を残したまま)に直接電気アルミニウムめっきを行ったが、電析物は黒色の粉状となり被膜を形成しなかった。
(Comparative Example 1)
A 60 mm × 60 mm × 1 mm thick magnesium alloy (AZ31) plate was used as the sample to be plated. Using a plating solution prepared by melting 1.0 mol of anhydrous aluminum chloride against 5.0 mol of dimethylsulfone, direct electroaluminum plating was performed on the sample without pretreatment (leaving the oxide layer of the magnesium alloy on the surface). However, the deposit was black powder and did not form a film.

(比較例2)
リン酸系化成液を用いて約1μmの導電性陽極酸化膜を形成し、その上に比較例1と同様にして電気アルミニウムめっきを行った。その結果、図1に示すように電析物は白色の膜状に生成したものの、素地から容易に剥離した。なお、マグネシウム合金板の自然酸化膜は陽極酸化膜に比べて無視できる程度の厚さ(せいぜい数十Å)であるため前処理で除去していない。
(Comparative Example 2)
A conductive anodic oxide film having a thickness of about 1 μm was formed using a phosphoric acid-based chemical, and electroaluminum plating was performed in the same manner as in Comparative Example 1. As a result, as shown in FIG. 1, the electrodeposit was formed in a white film shape, but was easily peeled off from the substrate. Note that the natural oxide film of the magnesium alloy plate has a negligible thickness (at most several tens of squares) compared to the anodic oxide film, and thus is not removed by pretreatment.

(実施例1)
比較例2と同じ条件で約1μmの導電性陽極酸化膜を形成し、硫酸亜鉛めっき浴を用いて厚さ約10μmの亜鉛めっき膜を形成し、その上に比較例1と同じ電気アルミニウムめっき液により、3A/dm2の電流密度でアルミニウムめっき膜を形成した。その結果、図2に示すような白色のアルミニウムめっき膜を得た。図3にはその断面写真を示す。このときのアルミニウムめっき膜厚は約10μmである。碁盤目密着性試験(JIS K 5400)の結果、図4に示すように被膜は剥離せず密着性は良好であった。アルミニウムめっき膜の表面を100℃の沸騰水で1時間酸化して厚さ約500nmの酸化膜を形成した後のGD-OESによる成分分析結果を図5に示す。発行強度のピークから表面(スパッタ時間0秒)側からAl/Zn/Mgの構成となっていることがわかる。塩水噴霧試験結果を図6に示す。膜の変色は認められるものの96時間以上錆の発生は認められず良好な耐食性を示した。
Example 1
A conductive anodic oxide film having a thickness of about 1 μm is formed under the same conditions as in Comparative Example 2, a zinc plating film having a thickness of about 10 μm is formed using a zinc sulfate plating bath, and the same electroaluminum plating solution as in Comparative Example 1 is formed thereon. Thus, an aluminum plating film was formed at a current density of 3 A / dm 2 . As a result, a white aluminum plating film as shown in FIG. 2 was obtained. FIG. 3 shows a cross-sectional photograph thereof. The thickness of the aluminum plating at this time is about 10 μm. As a result of a cross-cut adhesion test (JIS K 5400), the coating did not peel off as shown in FIG. FIG. 5 shows the result of component analysis by GD-OES after the surface of the aluminum plating film was oxidized with boiling water at 100 ° C. for 1 hour to form an oxide film having a thickness of about 500 nm. It can be seen that the structure is Al / Zn / Mg from the surface (sputtering time 0 second) side from the peak of the issuing intensity. The salt spray test results are shown in FIG. Although discoloration of the film was observed, no rust was observed over 96 hours, indicating good corrosion resistance.

(比較例3)
比較例2と同じ化成液を用いて膜厚約10μmの導電性陽極酸化膜を形成し、その上に実施例1と同じ電気亜鉛めっき及び電気アルミニウムめっきを行ったが、陽極酸化膜が厚すぎるため導電性がなく被膜を形成しなかった。
(Comparative Example 3)
A conductive anodic oxide film having a film thickness of about 10 μm was formed using the same chemical conversion solution as in Comparative Example 2, and the same electrogalvanization and electroaluminum plating as in Example 1 were performed thereon, but the anodic oxide film was too thick. Therefore, there was no conductivity and no film was formed.

比較例のアルミニウムめっき膜外観Appearance of aluminum plating film of comparative example 実施例のアルミニウムめっき膜外観Example of aluminum plating film appearance 図2のマグネシウム合金部材の断面写真Cross-sectional photograph of the magnesium alloy member in Fig. 2 碁盤目密着性試験結果Cross-cut adhesion test results GD−OES結果GD-OES results 塩水噴霧試験結果Salt spray test results

Claims (2)


マグネシウム合金と、該マグネシウム合金から形成した厚さ5μm以下の導電性陽極酸化膜と、該導電性陽極酸化膜上に形成した厚さ10〜15μmの亜鉛めっき皮膜と、該亜鉛めっき皮膜上に形成した厚さ10〜100μmの電気アルミニウムめっき皮膜と、該電気アルミニウムめっき皮膜から形成した酸化皮膜とを有することを特徴とするマグネシウム合金部材。

Magnesium alloy, conductive anodic oxide film having a thickness of 5 μm or less formed from the magnesium alloy, galvanized film having a thickness of 10 to 15 μm formed on the conductive anodic oxide film, and formed on the galvanized film magnesium alloy member, characterized in that it comprises an electric aluminum plating film thickness 10~100μm that, the oxide film formed from the electroplated aluminum coating.

マグネシウム合金上に該マグネシウム合金の厚さ5μm以下の導電性陽極酸化膜を形成し、その上に厚さ10〜15μmの亜鉛めっき皮膜を形成し、その上に厚さ10〜100μmの電気アルミニウムめっき皮膜を形成し、該電気アルミニウムめっき皮膜の表面を酸化して酸化皮膜を形成することを特徴とするマグネシウム合金部材の高耐食被膜形成方法。

A conductive anodic oxide film having a thickness of 5 μm or less is formed on the magnesium alloy, a galvanized film having a thickness of 10 to 15 μm is formed thereon, and an electroaluminum plating having a thickness of 10 to 100 μm is formed thereon. to form a film, high corrosion resistant coating method for forming a magnesium alloy member characterized by oxidizing the surface of the electroplated aluminum film to form an oxide film.
JP2007178771A 2007-07-06 2007-07-06 Magnesium alloy member and method for forming highly corrosion-resistant film thereof Expired - Fee Related JP4609779B2 (en)

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