JP4624066B2 - Operation method of electric deionized water production apparatus and electric deionized water production apparatus - Google Patents
Operation method of electric deionized water production apparatus and electric deionized water production apparatus Download PDFInfo
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Description
本発明は半導体製造分野、電力分野、医製薬製造、食品工業などの各種の産業または研究施設において使用される電気式脱イオン水製造装置の運転方法及び電気式脱イオン水製造装置に関するものである。 The present invention relates to an operation method of an electric deionized water production apparatus and an electric deionized water production apparatus used in various industries such as semiconductor manufacturing field, electric power field, medical and pharmaceutical manufacturing, food industry, and research facilities. .
ホウ素を含有する被処理水から純水又は超純水を製造する方法としては、(1)イオン交換樹脂装置によって処理する方法、(2)被処理水にアルカリ剤を注入してpHを9.2以上として逆浸透膜装置によって処理する方法(特開平11−188359号公報)、(3)逆浸透膜装置処理水を電気式脱イオン水製造装置によって処理する方法などが知られている。いずれの方法も単独ではホウ素を数十ppt以下に低減することは困難であり、(1)〜(3)の方法を組み合わせてホウ素を低減することも行われている。 As a method for producing pure water or ultrapure water from the water to be treated containing boron, (1) a method of treating with an ion exchange resin device, (2) a pH of 9. 9 by injecting an alkaline agent into the water to be treated. A method of treating with a reverse osmosis membrane device as two or more (Japanese Patent Laid-Open No. 11-188359), (3) a method of treating reverse osmosis membrane device treated water with an electric deionized water production device, and the like are known. In either method alone, it is difficult to reduce boron to several tens of ppt or less, and boron is also reduced by combining the methods (1) to (3).
(1)のイオン交換樹脂によって処理してホウ素を除去する方法は、低コストでの運転が可能である。しかしながら、イオン交換樹脂装置はイオン交換樹脂のイオン破過を防ぐため、定期的に薬剤による再生を行う必要があり、連続運転することができない。また、薬剤による洗浄のための設備を別途設置する必要があり、コストがかかる。そして、薬剤を定期的に補充する必要性から運転コストもかかる。 The method of removing boron by treating with the ion exchange resin (1) can be operated at low cost. However, in order to prevent ion breakthrough of the ion exchange resin, the ion exchange resin device needs to be periodically regenerated with a chemical and cannot be operated continuously. In addition, it is necessary to separately install equipment for cleaning with chemicals, which is expensive. In addition, there is an operation cost due to the necessity of regularly replenishing the medicine.
一方、(2)の供給水にアルカリ剤を注入して逆浸透膜装置によって処理することによりホウ素を除去する方法は、pHが9.2以上のアルカリ性条件下においてホウ酸の解離が進み、イオン状物質として分離されやすくなる性質を利用したものであり、pHが9.2以上のアルカリ性条件下では逆浸透膜装置によるホウ素除去性能は大幅に向上する。しかしながら、被処理水にアルカリ剤が注入されると被処理水がアルカリ性になり、カルシウムやマグネシウムなどの硬度成分がスケールとして析出してしまい、透過水量の低下や通水差圧の上昇を引き起こしてしまうという問題が発生する。従って、供給水中にアルカリ剤を注入するのと同時にスケール防止剤を注入してスケールの発生を阻止する必要がある。この場合、そのための装置を別途設置する必要があるためコストがかかる。また、アルカリ剤を注入したことによって、透過水質の悪化を招く恐れがある。 On the other hand, in the method of removing boron by injecting an alkaline agent into the feed water of (2) and treating with a reverse osmosis membrane device, the dissociation of boric acid proceeds under alkaline conditions with a pH of 9.2 or more, and ions This utilizes the property of being easily separated as a particulate material, and the boron removal performance by the reverse osmosis membrane device is greatly improved under alkaline conditions with a pH of 9.2 or higher. However, when an alkaline agent is injected into the water to be treated, the water to be treated becomes alkaline, and hardness components such as calcium and magnesium are precipitated as scales, causing a decrease in the amount of permeated water and an increase in water flow differential pressure. Problem occurs. Therefore, it is necessary to prevent the generation of scale by injecting the scale inhibitor simultaneously with injecting the alkaline agent into the feed water. In this case, since it is necessary to install the apparatus for it separately, cost starts. Moreover, there exists a possibility of causing the deterioration of permeated water quality by inject | pouring an alkaline agent.
(3)の電気式脱イオン水製造装置を用いた処理方法では、前段に逆浸透膜装置を設置した場合、数ppb程度までホウ素を除去することは容易であるが、数pptレベルにまで除去することは非常に難しい。例えば半導体製造工場などで要求される18.2MΩ・cmのような超高純度の水質を提供するためには、脱イオン装置の後段に非再生型のイオン交換樹脂装置を設置する必要があるが、前記のように十分に除去しきれないホウ素によって該イオン交換樹脂は短時間で破過してしまう。このため、頻繁に該非再生型イオン交換樹脂装置を交換する必要があり、コストがかかる。また、炭酸やシリカなどの弱酸成分が多く含まれるような供給水ではホウ素の除去性能は低下する。これを改善するために、特開平11−188359号公報には、電気式脱イオン水製造装置の供給水にアルカリ剤を添加して炭酸やシリカ、そしてホウ素の除去性能を向上させる方法が開示されている。
しかしながら、電気式脱イオン水製造装置への供給水にアルカリ剤を添加すると、電気式脱イオン水製造装置への負荷が増し、処理水質の悪化を招く恐れがある。また、特開平11−188359号公報記載の電気式脱イオン水製造装置は、脱塩室構造が不明であり、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画される2つの小脱塩室を内包し、被処理水が2つの該小脱塩室に順次直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室を備えるものについては開示がない。 However, when an alkaline agent is added to the water supplied to the electrical deionized water production apparatus, the load on the electrical deionized water production apparatus increases, and the quality of the treated water may be deteriorated. In addition, in the electric deionized water production apparatus described in JP-A-11-188359, the demineralization chamber structure is unknown, the anode side is partitioned by an anion exchange membrane, the cathode side is partitioned by a cation exchange membrane, and the anion exchange membrane Including two small desalting chambers defined by an intermediate ion exchange membrane located between the cation exchange membrane and the cation exchange membrane, and water to be treated is sequentially passed through the two small desalting chambers in series. There is no disclosure about what comprises a plurality of desalting chambers and one or more concentrating chambers disposed between the desalting chambers and the desalting chambers.
従って、本発明の目的は、電気式脱イオン水製造装置を用いて純水または超純水を製造する際、アルカリ剤などの薬剤の添加を極力低減して、電気式脱イオン水製造装置の処理水中のホウ素濃度を飛躍的に低減することができる電気式脱イオン水製造装置の運転方法及び電気式脱イオン水製造装置を提供することにある。 Accordingly, an object of the present invention is to reduce the addition of chemicals such as alkaline agents as much as possible when producing pure water or ultrapure water using an electric deionized water production apparatus, An object of the present invention is to provide an operation method of an electric deionized water production apparatus and an electric deionized water production apparatus capable of dramatically reducing the boron concentration in treated water.
かかる実情において、本発明者らは鋭意検討を行った結果、陽極室及び陰極室が両端に配置され、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画されるアニオン交換体単層が充填される第1小脱塩室とアニオン交換体とカチオン交換体の混床が充填される第2小脱塩室を内包し、ホウ素を含有する被処理水が該第1小脱塩室と該第2小脱塩室にこの順序で直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室を備える電気式脱イオン水製造装置において、該第2小脱塩室供給水のpHを9.2以上とし、これを該第2小脱塩室に通水すれば、アルカリ剤などの薬剤の添加が極微量であっても、処理水中のホウ素濃度を飛躍的に低減することができること等を見出し、本発明を完成するに至った。 In such a situation, the present inventors conducted extensive studies, and as a result, the anode chamber and the cathode chamber were disposed at both ends, the anode side was partitioned by an anion exchange membrane, the cathode side was partitioned by a cation exchange membrane, and the anion exchange membrane and the A first small desalination chamber filled with an anion exchanger monolayer partitioned by an intermediate ion exchange membrane located between cation exchange membranes, and a second small desalination filled with a mixed bed of anion exchanger and cation exchanger. One or a plurality of desalination chambers containing a salt chamber, and water to be treated containing boron is serially passed through the first small desalination chamber and the second small desalination chamber in this order; In an electric deionized water production apparatus comprising one or more concentration chambers disposed between a desalting chamber and the desalting chamber, the pH of the second small desalting chamber feed water is set to 9.2 or more, If this water is passed through the second small desalting chamber, the addition of a chemical such as an alkaline agent is minimal. Even, it found such that it is possible to dramatically reduce the boron concentration in the treated water, and have completed the present invention.
すなわち、本発明(1)は、陽極室及び陰極室が両端に配置され、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画されるアニオン交換体単層が充填される第1小脱塩室とアニオン交換体とカチオン交換体の混床が充填される第2小脱塩室を内包し、ホウ素を含有する被処理水が該第1小脱塩室と該第2小脱塩室にこの順序で直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室を備える電気式脱イオン水製造装置において、該第2小脱塩室供給水のpHを9.2以上とし、これを該第2小脱塩室に通水することを特徴とする電気式脱イオン水製造装置の運転方法を提供するものである。 That is, in the present invention (1), the anode chamber and the cathode chamber are arranged at both ends, the anode side is partitioned by the anion exchange membrane, the cathode side is partitioned by the cation exchange membrane, and the anode chamber and the cathode chamber are positioned between the anion exchange membrane and the cation exchange membrane. Including a first small desalting chamber filled with an anion exchanger monolayer partitioned by an intermediate ion exchange membrane and a second small desalting chamber filled with a mixed bed of anion exchanger and cation exchanger, and boron One or a plurality of desalting chambers in which treated water containing water is passed in series in this order through the first small desalting chamber and the second small desalting chamber, the desalting chamber, and the desalting chamber In an electric deionized water production apparatus provided with one or a plurality of concentrating chambers arranged between chambers, the pH of the second small demineralization chamber feed water is set to 9.2 or more, and this is supplied to the second small deionization water. It provides a method for operating an electric deionized water production apparatus characterized by passing water through a salt chamber. That.
また、本発明(2)は、前記濃縮室にイオン交換体を充填することを特徴とする前記電気式脱イオン水製造装置の運転方法を提供するものである。また、本発明(3)は、前記第2小脱塩室供給水の流路にアルカリ剤を注入することを特徴とする前記電気式脱イオン水製造装置の運転方法を提供するものである。また、本発明(4)は、前記ホウ素を含有する被処理水は、塩が注入されたものであることを特徴とする前記電気式脱イオン水製造装置の運転方法を提供するものである。また、本発明(5)は、前記ホウ素を含有する被処理水は、脱炭酸処理された後、該脱炭酸処理水にアルカリ剤が注入されたものであることを特徴とする前記電気式脱イオン水製造装置の運転方法を提供するものである。 Moreover, this invention (2) provides the operating method of the said electrical deionized water manufacturing apparatus characterized by filling the said ion concentration body into the said concentration chamber. Moreover, this invention (3) provides the operating method of the said electrical deionized water manufacturing apparatus characterized by inject | pouring an alkaline agent into the flow path of said 2nd small demineralization chamber feed water. Moreover, this invention (4) provides the operating method of the said electrical deionized water manufacturing apparatus characterized by the above-mentioned to-be-processed water containing a boron being what salt was inject | poured. Further, the present invention (5) is characterized in that the water to be treated containing boron is obtained by decarboxylation, and then an alkaline agent is injected into the decarboxylation water. The operation method of an ion water production apparatus is provided.
また、本発明(6)は、陽極室及び陰極室が両端に配置され、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画されるアニオン交換体単層が充填される第1小脱塩室とアニオン交換体とカチオン交換体の混床が充填される第2小脱塩室を内包し、ホウ素を含有する被処理水が該第1小脱塩室と該第2小脱塩室にこの順序で直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室を備える電気式脱イオン水製造装置であって、次の(1)〜(3);(1)該第2小脱塩室供給水の流路にアルカリ剤を注入するアルカリ注入手段、(2)該ホウ素を含有する被処理水に塩を注入する塩注入手段、(3)該ホウ素を含有する被処理水を脱炭酸処理する脱炭酸手段及び脱炭酸処理された処理水の流路にアルカリ剤を注入するアルカリ注入手段、から選ばれる1つ又は2つ以上の手段を更に備えることにより、前記第2小脱塩室への供給水のpHを9.2以上とすることを特徴とする電気式脱イオン水製造装置を提供するものである。 In the present invention (6), the anode chamber and the cathode chamber are disposed at both ends, the anode side is partitioned by an anion exchange membrane, the cathode side is partitioned by a cation exchange membrane, and the anode chamber and the cathode chamber are positioned between the anion exchange membrane and the cation exchange membrane. Including a first small desalting chamber filled with an anion exchanger monolayer partitioned by an intermediate ion exchange membrane and a second small desalting chamber filled with a mixed bed of anion exchanger and cation exchanger, and boron One or a plurality of desalting chambers in which treated water containing water is passed in series in this order through the first small desalting chamber and the second small desalting chamber, the desalting chamber, and the desalting chamber An electric deionized water production apparatus comprising one or a plurality of concentrating chambers arranged between chambers, the following (1) to (3); (1) the second small demineralization chamber feed water Alkaline injection means for injecting an alkaline agent into the flow path, (2) Salt injection for injecting salt into the water to be treated containing boron One or two selected from a stage, (3) a decarboxylation means for decarboxylating the treated water containing boron and an alkali injection means for injecting an alkaline agent into the flow path of the decarboxylated treatment water or means by further comprising Rukoto a, there is provided a second electrodeionization water producing apparatus according to claim 9.2 or more and a to Rukoto the pH of the feed water to the small depletion chamber.
本発明によれば、半導体製造分野、電力分野、医製薬製造、食品工業などの各種の産業または研究施設において電気式脱イオン水製造装置を用いて純水または超純水を製造する際、アルカリ剤などの薬剤の添加が極微量であっても、電気式脱イオン水製造装置の処理水中のホウ素濃度を数十ppt以下と飛躍的に低減することができる。これにより、その後段の非再生型イオン交換樹脂装置への負荷を大幅に低減することができるため、該非再生型イオン交換樹脂装置の交換頻度を少なくすることができ、安定して高純度の水を提供することができる。また、非再生型イオン交換樹脂装置を含むサブシステム全体について長時間にわたって安定した運転を継続することができる。また、例えば逆浸透膜装置の透過水など、シリカや炭酸などの弱酸性成分を多く含む被処理水中の当該弱酸性成分を極めて効率的に除去できる。 According to the present invention, when pure water or ultrapure water is produced using an electric deionized water production apparatus in various industries or research facilities such as the semiconductor manufacturing field, electric power field, medical and pharmaceutical manufacturing, and food industry, Even if the addition of a chemical such as a chemical is extremely small, the boron concentration in the treated water of the electric deionized water production apparatus can be drastically reduced to several tens of ppt or less. As a result, the load on the non-regenerative ion exchange resin apparatus in the subsequent stage can be greatly reduced, so that the frequency of replacement of the non-regenerative ion exchange resin apparatus can be reduced, and high-purity water can be stably supplied. Can be provided. In addition, stable operation can be continued for a long time for the entire subsystem including the non-regenerative ion exchange resin apparatus. Further, for example, the weakly acidic components in the water to be treated containing a large amount of weakly acidic components such as silica and carbonic acid such as permeated water of a reverse osmosis membrane device can be removed very efficiently.
本発明の運転方法で用いる電気式脱イオン水製造装置(以下、単にEDIとも言う)は、陽極板を内蔵する陽極室及び陰極板を内蔵する陰極室が両端に配置され、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画される第1小脱塩室と第2小脱塩室を内包し、被処理水が該第1小脱塩室と該第2小脱塩室にこの順序で直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室を備えるものであって、かかる構造及び通水方法は、特開2001−239270号公報に開示されたものである。 An electric deionized water production apparatus (hereinafter also simply referred to as EDI) used in the operation method of the present invention has an anode chamber containing an anode plate and a cathode chamber containing a cathode plate arranged at both ends, and the anode side is an anion exchange membrane. Including a first small desalting chamber and a second small desalting chamber which are partitioned by a cation exchange membrane and partitioned by an intermediate ion exchange membrane located between the anion exchange membrane and the cation exchange membrane. One or a plurality of desalination chambers in which water to be treated is passed through the first small desalination chamber and the second small desalination chamber in series in this order; the desalination chamber and the desalination chamber; One or a plurality of concentrating chambers disposed between them is provided, and such a structure and a water flow method are disclosed in Japanese Patent Application Laid-Open No. 2001-239270.
EDIの第1小脱塩室にはアニオン交換体単層が充填される。第1小脱塩室におけるアニオン交換体単層の充填形態としては、特に制限されず、第1小脱塩室の一部又は全てのいずれであってもよい。また、EDIの第2小脱塩室にはカチオン交換体とアニオン交換体の混床が充填される。第2小脱塩室におけるカチオン交換体とアニオン交換体の混床の充填形態としては、特に制限されず、第2小脱塩室の一部又は全てのいずれであってもよい。EDIの濃縮室はイオン交換体充填、未充填のいずれであってもよいが、イオン交換体が充填されたものが、EDIの電気抵抗を低減でき、運転コストを低減することができる点で好ましい。また、電気抵抗が低減すると、低電圧でより多くの電流をかけることができ、EDIにかける電流値が上がるとホウ素除去性能も向上する点で好ましい。 The first small desalting chamber of EDI is filled with an anion exchanger monolayer. The filling form of the anion exchanger monolayer in the first small desalting chamber is not particularly limited, and may be a part or all of the first small desalting chamber. The second small desalting chamber of EDI is filled with a mixed bed of cation exchanger and anion exchanger. The form of filling the mixed bed of the cation exchanger and the anion exchanger in the second small desalting chamber is not particularly limited and may be any part or all of the second small desalting chamber. The EDI concentration chamber may be either filled or unfilled with an ion exchanger, but the one filled with an ion exchanger is preferable in that the electric resistance of EDI can be reduced and the operating cost can be reduced. . Further, when the electric resistance is reduced, a larger amount of current can be applied at a low voltage, and a higher current value applied to EDI is preferable in terms of improving boron removal performance.
本発明において、ホウ素を含有する被処理水としては、特に制限されず、例えば、井水、水道水、下水、工業用水、河川水、半導体製造工場の半導体デバイスなどの洗浄排水又は濃縮室からの回収水などを逆浸透膜処理した透過水、また、半導体製造工場等のユースポイントで使用された回収水であって、逆浸透膜処理がされていない水が挙げられる。また、これらの混合水でもよい。被処理水中のホウ素濃度としては、特に制限されないが、例えばホウ素を1〜500μg/l程度含有する被処理水が挙げられる。 In the present invention, the water to be treated containing boron is not particularly limited. For example, from well water, tap water, sewage, industrial water, river water, cleaning wastewater such as semiconductor devices in a semiconductor manufacturing factory, or from a concentration chamber Examples thereof include permeated water obtained by treating the recovered water with a reverse osmosis membrane, and recovered water that has been used at a point of use such as a semiconductor manufacturing factory and has not been subjected to a reverse osmosis membrane treatment. Moreover, these mixed water may be sufficient. Although it does not restrict | limit especially as a boron density | concentration in to-be-processed water, For example, the to-be-processed water which contains about 1-500 microgram / l boron is mentioned.
本発明の運転方法において、第2小脱塩室供給水のpHを9.2以上とし、これを第2小脱塩室に通水する。pHが9.2以上のアルカリ性条件下においては、ホウ酸の解離が進み、イオン状物質として分離されやすくなる。すなわち、水溶液中においてホウ素は主にホウ酸H3BO3の形態で存在しており、pHがホウ酸のpKa値9.2以下では未解離状態のホウ酸としての化学形態をとるのに対し、pHが9.2以上になると、H3BO3+OH−→B(OH)4−のように解離が進む。従って、pHが9.2以上のアルカリ性条件下、第2小脱塩室においてホウ素除去性能は大幅に向上する。 In the operation method of the present invention, the pH of the second small desalting chamber feed water is set to 9.2 or more, and this is passed through the second small desalting chamber. Under alkaline conditions with a pH of 9.2 or higher, the dissociation of boric acid proceeds and it is easily separated as an ionic substance. In other words, boron exists mainly in the form of boric acid H 3 BO 3 in an aqueous solution, whereas it takes a chemical form as boric acid in an undissociated state when the pH is 9.2 or less of boric acid. When the pH is 9.2 or more, dissociation proceeds as H 3 BO 3 + OH − → B (OH) 4− . Therefore, the boron removal performance is greatly improved in the second small desalting chamber under alkaline conditions where the pH is 9.2 or higher.
第2小脱塩室供給水のpHを9.2以上とする方法としては、第2小脱塩室供給水の流路にアルカリ剤を注入する方法(方法1)、ホウ素を含有する被処理水に塩を注入する方法(方法2)及びホウ素を含有する被処理水を脱炭酸処理した後、該脱炭酸処理水にアルカリ剤を注入する方法(方法3)が挙げられる。このうち、方法1が第2小脱塩室供給水のpHを極微量のアルカリ剤の添加で安定して9.2以上にすることができる点で好ましい。これらの方法1〜3は、いずれかの方法を単独で行っても、併用して行ってもよいが、いずれかの方法を単独で行うことが、装置が簡単となり且つ運転も容易である点で好ましい。
As a method of setting the pH of the second small desalting chamber feed water to 9.2 or more, a method of injecting an alkaline agent into the flow path of the second small desalting chamber feed water (method 1), a treatment containing boron Examples thereof include a method of injecting salt into water (method 2) and a method of injecting an alkaline agent into the decarboxylated water after decarboxylation of the water to be treated containing boron (method 3). Among these, the
第2小脱塩室供給水の流路にアルカリ剤を注入する方法によれば、極微量のアルカリ剤を添加するだけで、EDI処理水中のホウ素濃度を数十ppt以下と飛躍的に低減することができる。アニオン交換体が充填された第1小脱塩室においてpHを上げることを阻害する炭酸等のアニオン成分が除去されるため、第2小脱塩室供給水はアニオン成分による緩衝作用がほとんどない水となると共にカチオン成分に富んだ水となる。このため、極微量添加したアルカリ剤がそのままpHを上げる作用に寄与する。従って、アルカリ剤を添加したことによる処理水質への影響はほとんどなく、ホウ素濃度を飛躍的に低減した高純度の処理水を得ることができる。第2小脱塩室供給水に対するアルカリ剤の注入量としては、被処理水の水質等によって変化するため特に制限されないが、概ね0.1〜10mgNaOH/l、好ましくは0.5〜5mgNaOH/lである。このアルカリの添加量は、特開2001−239270号公報の従来技術に記載された従前の電気式脱イオン水製造装置を用いる場合と比べると概ね1/10程度である。アルカリ剤としては、特に制限されず、例えば水酸化ナトリウム、水酸化カリウム等が挙げられる。 According to the method of injecting the alkali agent into the flow path of the second small desalination chamber supply water, the boron concentration in the EDI-treated water is drastically reduced to several tens of ppt or less simply by adding a very small amount of the alkali agent. be able to. Since the anion components such as carbonic acid that inhibit the increase in pH in the first small desalting chamber filled with the anion exchanger are removed, the second small desalting chamber feed water is water that has little buffering action due to the anion components. And water rich in cationic components. For this reason, the alkali agent added in a very small amount contributes to the action of raising the pH as it is. Therefore, there is almost no influence on the quality of treated water due to the addition of the alkaline agent, and high-purity treated water with a drastically reduced boron concentration can be obtained. The amount of the alkaline agent injected into the second small desalination chamber feed water is not particularly limited because it varies depending on the quality of the water to be treated, but is generally 0.1 to 10 mg NaOH / l, preferably 0.5 to 5 mg NaOH / l. It is. The amount of alkali added is about 1/10 compared to the case of using a conventional electric deionized water production apparatus described in the prior art of JP-A-2001-239270. The alkali agent is not particularly limited, and examples thereof include sodium hydroxide and potassium hydroxide.
ホウ素を含有する被処理水に塩を注入する方法によれば、極微量の塩を被処理水に添加するだけで、EDI処理水の水質を悪化させることなく、EDI処理水中のホウ素濃度を数十ppt以下と飛躍的に低減することができる。本発明で用いるEDIの第1小脱塩室処理水は、カチオン成分に富むため塩無添加の被処理水であってもpHは高いものであるが、更に極少量の塩を被処理水に添加することで第1小脱塩室処理水は更にカチオン成分に富み、pHが上昇する。被処理水に対する塩の注入量としては、被処理水の水質等によって変化するため特に制限されないが、概ね0.05〜6mgNa+/l、好ましくは0.25〜3mgNa+/lである。塩としては、特に制限されず、例えば塩化ナトリウム、塩化カリウム、硝酸ナトリウム、硝酸カリウム等が挙げられる。 According to the method of injecting salt into the water to be treated containing boron, the concentration of boron in the EDI treated water is several times without deteriorating the quality of the EDI treated water simply by adding a very small amount of salt to the treated water. It can be drastically reduced to 10 ppt or less. The EDI first small desalination chamber treated water used in the present invention has a high pH even if it is treated water to which no salt is added because it is rich in cationic components. By adding, the first small desalting chamber treated water is further rich in cationic components, and the pH rises. The amount of salt injected into the water to be treated is not particularly limited because it varies depending on the quality of the water to be treated, but is generally 0.05 to 6 mg Na + / l, preferably 0.25 to 3 mg Na + / l. The salt is not particularly limited, and examples thereof include sodium chloride, potassium chloride, sodium nitrate, and potassium nitrate.
ホウ素を含有する被処理水を脱炭酸処理した後、該脱炭酸処理水にアルカリ剤を注入する方法によれば、EDIへ供給される被処理水中の炭酸の緩衝作用は大幅に低減する。このため、脱炭酸処理水に極微量のアルカリ剤を添加するだけで、容易に第2小脱塩室供給水のpHを9.2以上にすることができる。また、方法(1)と同様の理由により、EDIの処理水質を悪化させることなく、ホウ素を飛躍的に低減した高純度の処理水を得ることができる。脱炭酸処理方法としては、特に制限されず、例えば膜脱気装置を用いた脱炭酸処理方法が挙げられる。アルカリ剤としては、方法(1)で用いるアルカリ剤と同様のものが挙げられる。 According to the method of injecting an alkaline agent into the decarboxylated water after decarbonating the water to be treated containing boron, the buffering action of carbonic acid in the water to be treated supplied to EDI is greatly reduced. For this reason, the pH of the second small desalting chamber feed water can be easily increased to 9.2 or more simply by adding a trace amount of an alkali agent to the decarboxylated water. Further, for the same reason as in the method (1), it is possible to obtain high-purity treated water in which boron is drastically reduced without deteriorating the treated water quality of EDI. The decarboxylation method is not particularly limited, and examples thereof include a decarboxylation method using a membrane deaerator. Examples of the alkali agent include the same as the alkali agent used in the method (1).
本発明のEDI装置は、陽極室及び陰極室が両端に配置され、陽極側がアニオン交換膜で区画され陰極側がカチオン交換膜で区画され且つ当該アニオン交換膜と当該カチオン交換膜の間に位置する中間イオン交換膜で区画されるアニオン交換体単層が充填される第1小脱塩室とアニオン交換体とカチオン交換体の混床が充填される第2小脱塩室を内包し、ホウ素を含有する被処理水が該第1小脱塩室と該第2小脱塩室にこの順序で直列に通水される1つ又は複数の脱塩室と、該脱塩室と該脱塩室の間に配置された1つ又は複数の濃縮室と、必要に応じて第2小脱塩室供給水のpHを測定するpH計と、を備えるものであって、次の(1)〜(3);(1)該第2小脱塩室供給水の流路にアルカリ剤を注入するアルカリ注入手段、(2)該ホウ素を含有する被処理水に塩を注入する塩注入手段、(3)該ホウ素を含有する被処理水を脱炭酸処理する脱炭酸手段及び脱炭酸処理された処理水の流路にアルカリ剤を注入するアルカリ注入手段、から選ばれる1つ又は2つ以上の手段を更に備える。本発明のEDIを用いれば、上記EDIの運転方法を確実に実施することができる。本発明のEDIにおいて、上記(1)〜(3)の手段は、それぞれ単独で設置されたものが、装置が簡単となり、コストを低減できる点で好ましい。 In the EDI apparatus of the present invention, an anode chamber and a cathode chamber are arranged at both ends, an anode side is partitioned by an anion exchange membrane, a cathode side is partitioned by a cation exchange membrane, and an intermediate located between the anion exchange membrane and the cation exchange membrane. Contains a first small desalting chamber filled with an anion exchanger monolayer partitioned by an ion exchange membrane and a second small desalting chamber filled with a mixed bed of anion exchanger and cation exchanger, and contains boron One or a plurality of desalination chambers in which treated water is passed through the first small desalination chamber and the second small desalination chamber in series in this order, the desalination chamber, and the desalination chamber One or a plurality of concentrating chambers arranged in between, and a pH meter for measuring the pH of the second small desalting chamber feed water as required, comprising the following (1) to (3 ); (1) Alkaline injection means for injecting an alkaline agent into the flow path of the second small desalination chamber feed water, (2) the boron Salt injecting means for injecting salt into the water to be treated containing, (3) decarbonation means for decarboxylating the water to be treated containing boron, and an alkali agent being injected into the flow path of the decarbonized treated water One or more means selected from alkali injection means. If the EDI of the present invention is used, the above-mentioned EDI operating method can be reliably implemented. In the EDI of the present invention, it is preferable that the means (1) to (3) are individually installed from the viewpoint that the apparatus becomes simple and the cost can be reduced.
本発明におけるEDIの具体的な運転条件としては、特に制限されず、例えば、第1小脱塩室及び第2小脱塩室に順次直列に流入する被処理水のSVを50〜500[h−1]、より望ましくは100〜300[h−1] となるように脱塩室の構造や脱塩室の流量を調整して通水し、脱塩室に印加する電流密度を0.05〜0.5[A/dm2]、より望ましくは0.15〜0.4[A/dm2]となるように調節して運転すればよい。 The specific operating conditions of EDI in the present invention are not particularly limited, and for example, the SV of the water to be treated that flows into the first small desalination chamber and the second small desalination chamber in series is 50 to 500 [h. -1 ], more desirably 100-300 [h -1 ], the structure of the desalting chamber and the flow rate of the desalting chamber are adjusted to pass water, and the current density applied to the desalting chamber is 0.05. It may be adjusted and operated so as to be ˜0.5 [A / dm 2 ], more preferably 0.15 to 0.4 [A / dm 2 ].
次に、実施例を挙げて本発明を更に具体的に説明するが、これは単に例示であって本発明を制限するものではない。 EXAMPLES Next, the present invention will be described more specifically with reference to examples. However, this is merely illustrative and does not limit the present invention.
下記仕様の電気式脱イオン水製造装置を下記運転条件下、図1のフローに従い運転を行った。また、電気式脱イオン水製造装置の処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表1に示す。なお、第2小脱塩室供給水への苛性ソーダの注入は、第2小脱塩室供給水のpHが10.2となるよう調整した。 An electric deionized water production apparatus having the following specifications was operated according to the flow shown in FIG. Moreover, the boron concentration and specific resistivity in the treated water of the electric deionized water production apparatus were measured. The results are shown in Table 1. The injection of caustic soda into the second small desalting chamber feed water was adjusted so that the pH of the second small desalting chamber feed water was 10.2.
(電気式脱イオン水製造装置)
電気式脱イオン水製造装置1は、前述の構造を有し、より詳細な構造及び通水方法は、特開2001−239270号公報に開示されたものである。図1の電気式脱イオン水製造装置1は簡略化して示したものであり、第1小脱塩室21と第2小脱塩室22は配管23により直列に接続されている。また、第1小脱塩室21と第2小脱塩室22とを接続する配管23は他端が苛性ソーダ注入手段3に接続する苛性ソーダ注入配管31の一端が接続され、そして第2小脱塩室22の供給水のpHがわかるようにpH計4が、第1小脱塩室21と第2小脱塩室22を接続する配管23の苛性ソーダ添加後の配管に附設されている。
(Electrical deionized water production equipment)
The electric deionized
(EDIの運転条件)
・EDI;「標準型D2EDI」(オルガノ社製)
・ 脱塩室;第1小脱塩室(幅300mm、高さ360mm、厚み8mm)、
第2小脱塩室(幅300mm、高さ360mm、厚み4mm)
・ イオン交換膜;カチオン交換膜(ネオセプタC66−10F)、
アニオン交換膜(ネオセプタAHA)(ともにトクヤマ社製)
・ イオン交換樹脂;第1小脱塩室(アニオン交換樹脂(IRA402BL))、第2小脱塩室(カチオン交換樹脂(IR120B)とアニオン交換樹脂(IRA402BL)の混合床(体積比1:1))(ともにロームアンドハース社製)
・処理水量;1.0m3/h
・電流密度; 0.2A/dm2
・ EDIに供給する被処理水;市水を膜除濁した後、逆浸透膜装置によって処理したホウ素を40〜50ppb含有する水
・EDIに供給する被処理水の電気伝導率:4〜5μS/cm
・ EDIに供給する被処理水の炭酸濃度:3〜4 mgCO2/L
なお、逆浸透膜装置は、「ES−10」(8インチ、2本)(日東電工社製)を用い、苛性ソーダ注入手段は薬注ユニット「PTU-100-PZD-61」(タクミナ社製)を用いた。
(EDI operating conditions)
EDI: “Standard D2EDI” (manufactured by Organo)
-Desalination chamber; first small desalination chamber (width 300 mm, height 360 mm, thickness 8 mm),
Second small desalination chamber (width 300mm, height 360mm, thickness 4mm)
An ion exchange membrane; a cation exchange membrane (Neoceptor C66-10F),
Anion exchange membrane (Neocepta AHA) (both manufactured by Tokuyama)
-Ion exchange resin: 1st small desalting chamber (anion exchange resin (IRA402BL)), 2nd small desalting chamber (cation exchange resin (IR120B) and anion exchange resin (IRA402BL) mixed bed (volume ratio 1: 1)) (Both made by Rohm and Haas)
・ Processed water volume: 1.0 m 3 / h
Current density: 0.2 A / dm 2
Water to be treated to be supplied to EDI; water containing 40 to 50 ppb of boron treated with a reverse osmosis membrane device after the city water has been turbidized. Electric conductivity of water to be supplied to EDI: 4 to 5 μS / cm
, Carbon concentration of the treated water supplied to the EDI: 3~4 mgCO 2 / L
The reverse osmosis membrane device uses “ES-10” (8 inches, 2 pieces) (manufactured by Nitto Denko), and the caustic soda injection means is a chemical injection unit “PTU-100-PZD-61” (manufactured by Takumina). Was used.
比較例1
第2小脱塩室供給水への苛性ソーダの添加を省略した以外は、実施例1と同様の方法で行い、電気式脱イオン水製造装置の処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表1に示す。
Comparative Example 1
Except for omitting the addition of caustic soda to the second small demineralization chamber feed water, the same method as in Example 1 was used to measure the boron concentration and specific resistivity in the treated water of the electrical deionized water production apparatus. The results are shown in Table 1.
表1から明らかなように、第2小脱塩室供給水中に苛性ソーダを注入して、第2小脱塩室供給水のpHを10.2にしたものは、処理水中のホウ素濃度を飛躍的に低減できることがわかる。また、該苛性ソーダの添加量は微量であり、処理水質の悪化を招かないことがわかる。 As is apparent from Table 1, when caustic soda was injected into the second small desalting chamber feed water and the pH of the second small desalting chamber feed water was 10.2, the boron concentration in the treated water was dramatically increased. It can be seen that it can be reduced. Further, it can be seen that the amount of the caustic soda added is very small, and the quality of the treated water is not deteriorated.
図2のフロー図に示すように、苛性ソーダ注入手段を省略し、被処理水供給配管11に他端が塩化ナトリウム注入手段5に接続する塩化ナトリウム注入配管51の一端を接続した以外は、実施例1と同様の方法で行い、電気式脱イオン水製造装置1aの被処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表2に示す。なお、被処理水への塩化ナトリウムの注入は、第2小脱塩室供給水のpHが9.7となるよう調整した。なお、塩化ナトリウム注入手段は薬注ユニット「PTU-100-PZD-61」(タクミナ社製)を用いた。
As shown in the flow diagram of FIG. 2, the embodiment is the same except that the caustic soda injection means is omitted and one end of a sodium
比較例2
EDI被処理水への塩化ナトリウムの添加を省略した以外は、実施例2と同様の方法で行い、電気式脱イオン水製造装置の処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表2に示す。
Comparative Example 2
Except for omitting the addition of sodium chloride to the EDI treated water, the same method as in Example 2 was used to measure the boron concentration and specific resistivity in the treated water of the electric deionized water production apparatus. The results are shown in Table 2.
比較例3
図3のフロー図に示すように、2つの小脱塩室を直列に配置した脱塩室を備える電気式脱イオン水製造装置1に代えて、1種類の脱塩室を備える電気式脱イオン水製造装置1bを用いた以外は、実施例2と同様の方法で行い、電気式脱イオン水製造装置1bの処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表2に示す。なお、電気式脱イオン水製造装置1bの1種類の脱塩室24は、幅300mm、高さ360mm、厚み12mmであり、アニオン交換樹脂とカチオン交換樹脂の混床を充填したものである。
Comparative Example 3
As shown in the flow diagram of FIG. 3, instead of the electric deionized
表2の結果より、第1小脱塩室供給水に塩化ナトリウムを添加しなかった比較例2は、第2小脱塩室供給水のpHが8.4とpH9.2を下回り、電気式脱イオン水製造装置の処理水中ホウ素濃度が3μg/lであるのに対し、第1小脱塩室供給水に塩化ナトリウムを添加した実施例2は、第2小脱塩室供給水のpHは9.7となり、処理水中ホウ素濃度が0.05μg/lとなり飛躍的に低減した。一方、電気式脱イオン水製造装置の脱塩室の構造を、アニオン交換樹脂とカチオン交換樹脂の混床を充填した1種類の脱塩室のみにした比較例3は、実施例2と同様に塩化ナトリウムを添加しているにもかかわらず、電気式脱イオン水製造装置の処理水中ホウ素濃度は4μg/lであった。比較例3の脱塩室の構造は特開2001−239270号公報の従来技術に記載された従前の電気式脱イオン水製造装置の構造と類似であるため、脱塩室が一種類の部屋より構成される一般的なEDIでは、本発明の効果はないことがわかる。 From the results of Table 2, in Comparative Example 2 in which sodium chloride was not added to the first small desalting chamber feed water, the pH of the second small desalting chamber feed water was lower than 8.4 and pH 9.2. While the boron concentration in the treated water of the deionized water production apparatus is 3 μg / l, in Example 2 in which sodium chloride was added to the first small desalting chamber feed water, the pH of the second small desalting chamber feed water was It became 9.7, and the boron concentration in the treated water was 0.05 μg / l, which was drastically reduced. On the other hand, Comparative Example 3 in which the structure of the demineralization chamber of the electric deionized water production apparatus is only one type of demineralization chamber filled with a mixed bed of anion exchange resin and cation exchange resin is the same as in Example 2. Despite the addition of sodium chloride, the boron concentration in the treated water of the electric deionized water production apparatus was 4 μg / l. Since the structure of the desalting chamber of Comparative Example 3 is similar to the structure of the conventional electric deionized water production apparatus described in the prior art of Japanese Patent Laid-Open No. 2001-239270, the desalting chamber is more than one type of room. It can be seen that the general EDI constructed does not have the effect of the present invention.
図4のフロー図に示すように、被処理水供給管11に膜脱気装置6を設置すること、苛性ソーダ注入場所を第1小脱塩室21と第2小脱塩室22とを接続する配管23に代えて、膜脱気装置6と第1小脱塩室21を接続する配管12としたこと以外は、実施例1と同様の方法で行い、電気式脱イオン水製造装置1cの処理水中のホウ素濃度及び比抵抗率を測定した。その結果を表3に示す。なお、膜脱気処理された被処理水への苛性ソーダの注入は、第2小脱塩室供給水のpHが9.8となるよう調整した。膜脱気装置は、「liqui-Cel G284」(X-40)(ヘキストインターナショナル東京社製)を用いた。
As shown in the flowchart of FIG. 4, the
比較例4
膜脱気装置6と第1小脱塩室21を接続する配管12を通る膜脱気処理水へのへの苛性ソーダの添加を省略した以外は、実施例3と同様の方法で行い、電気式脱イオン水製造装置の処理水中のホウ素濃度及び比抵抗率を測定した。すなわち、比較例4は膜脱気処理された被処理水をそのまま第1小脱塩室に供給し処理水を得たものである。その結果を表3に示す。
Comparative Example 4
Except for omitting the addition of caustic soda to the membrane deaeration treated water passing through the
表3から明らかなように、膜脱気処理後の第1小脱塩室供給水中に苛性ソーダを注入しなかった比較例4は、第2小脱塩室供給水のpHが8.4と、pH9.2を下回り、電気式脱イオン水製造装置の処理水中ホウ素濃度が3μg/lであったのに対して、第2小脱塩室供給水のpHを9.8になるように、膜脱気処理後の第1小脱塩室供給水中に苛性ソーダを注入した実施例3は電気式脱イオン水製造装置の処理水中ホウ素濃度が0.06μg/lとなり、ホウ素を劇的に低減する効果が認められた。また、第1小脱塩室供給水は膜脱気処理が施され炭酸濃度が低減されているため、炭酸のpHに与える緩衝作用は弱まり、より少ない苛性ソーダの添加量でもpHを上げることができた。結果的に、処理水質を悪化させることなくホウ素を劇的に低減する効果が認められた。 As apparent from Table 3, Comparative Example 4 in which caustic soda was not injected into the first small demineralization chamber feed water after membrane deaeration treatment had a pH of 8.4 for the second small demineralization chamber feed water, The membrane was adjusted so that the pH of the second small desalting chamber feed water was 9.8, while the pH was lower than 9.2 and the boron concentration in the treated water of the electric deionized water production apparatus was 3 μg / l. In Example 3 in which caustic soda was injected into the first small desalination chamber feed water after the deaeration treatment, the boron concentration in the treated water of the electric deionized water production apparatus became 0.06 μg / l, and the effect of dramatically reducing boron. Was recognized. In addition, since the first small desalting chamber feed water is subjected to membrane deaeration treatment and the carbonic acid concentration is reduced, the buffering effect on the pH of carbonic acid is weakened, and the pH can be raised even with a smaller amount of caustic soda added. It was. As a result, the effect of dramatically reducing boron without deteriorating the quality of treated water was recognized.
1、1a〜1c 電気式脱イオン水製造装置
3 苛性ソーダ注入手段
4 pH計
5 塩化ナトリウム注入手段
6 膜脱気装置
21 第1小脱塩室
22 第2小脱塩室
24 脱塩室
DESCRIPTION OF
Claims (6)
(1)該第2小脱塩室供給水の流路にアルカリ剤を注入するアルカリ注入手段、
(2)該ホウ素を含有する被処理水に塩を注入する塩注入手段、
(3)該ホウ素を含有する被処理水を脱炭酸処理する脱炭酸手段及び脱炭酸処理された処理水の流路にアルカリ剤を注入するアルカリ注入手段、
から選ばれる1つ又は2つ以上の手段を更に備えることにより、前記第2小脱塩室への供給水のpHを9.2以上とすることを特徴とする電気式脱イオン水製造装置。 The anode chamber and the cathode chamber are arranged at both ends, the anode side is partitioned by an anion exchange membrane, the cathode side is partitioned by a cation exchange membrane, and is partitioned by an intermediate ion exchange membrane positioned between the anion exchange membrane and the cation exchange membrane. The first small desalting chamber filled with the anion exchanger monolayer and the second small desalting chamber filled with the mixed bed of the anion exchanger and the cation exchanger are included, and the treated water containing boron contains the first treated water containing boron. One or a plurality of desalting chambers that are passed in series in this order through one small desalting chamber and the second small desalting chamber, and one disposed between the desalting chamber and the desalting chamber Or an electric deionized water production apparatus comprising a plurality of concentration chambers, the following (1) to (3);
(1) Alkaline injection means for injecting an alkaline agent into the flow path of the second small desalting chamber supply water;
(2) salt injection means for injecting salt into the water to be treated containing boron;
(3) Decarbonation means for decarboxylating the water to be treated containing boron, and alkali injection means for injecting an alkaline agent into the flow path of the decarboxylated treatment water,
One or further comprising the Rukoto two or more means, the second manufacturing electrodeionization water, wherein 9.2 or more and a to Rukoto the pH of the feed water to the small depletion chamber selected from apparatus.
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