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JP4645943B2 - Carbide broach made of surface-coated cemented carbide with excellent wear resistance due to lubricated amorphous carbon coating - Google Patents
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JP4645943B2 - Carbide broach made of surface-coated cemented carbide with excellent wear resistance due to lubricated amorphous carbon coating - Google Patents

Carbide broach made of surface-coated cemented carbide with excellent wear resistance due to lubricated amorphous carbon coating Download PDF

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JP4645943B2
JP4645943B2 JP2004304263A JP2004304263A JP4645943B2 JP 4645943 B2 JP4645943 B2 JP 4645943B2 JP 2004304263 A JP2004304263 A JP 2004304263A JP 2004304263 A JP2004304263 A JP 2004304263A JP 4645943 B2 JP4645943 B2 JP 4645943B2
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nitrogen
amorphous carbon
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broach
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JP2006116620A (en
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安彦 田代
智行 益野
幸生 青木
俊之 谷内
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Mitsubishi Materials Corp
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Description

この発明は、特に各種のTi合金やAl合金、さらにCu合金などの工作物の引き抜き穴加工などで、炭化タングステン基超硬合金で構成されたブローチ本体(以下、超硬ブローチ本体という)の表面に蒸着形成された潤滑性非晶質炭素系被膜がすぐれた耐摩耗性を発揮する表面被覆超硬合金製ブローチ(以下、被覆超硬ブローチという)に関するものである。   The present invention is particularly applicable to the surface of a broach body (hereinafter referred to as a carbide broach body) made of tungsten carbide-based cemented carbide, such as by drawing holes in workpieces such as various Ti alloys, Al alloys, and Cu alloys. The present invention relates to a surface-coated cemented carbide broach (hereinafter referred to as a coated cemented carbide broach) in which a lubricated amorphous carbon-based film deposited on the surface exhibits excellent wear resistance.

一般に、図3に概略正面図で例示されるブローチと呼ばれる総形工具を用い、前記ブローチを各種のTi合金やAl合金、さらにCu合金などからなる工作物の下穴に挿入して下方向に引き抜くことにより断面形状の複雑な穴などを一度に仕上げるブローチ工法が知られている。
上記のブローチ工法は、図3に示される通りブローチの中央部に形成された、下方の荒刃から上方の仕上げ刃へ順次変化する切刃部が、ブローチの下方動作により工作物を少しづつ切削して所定寸法に仕上げるものである。
In general, a general tool called a broach illustrated in a schematic front view in FIG. 3 is used, and the broach is inserted into a prepared hole made of various Ti alloys, Al alloys, Cu alloys, and the like in a downward direction. A broaching method is known in which a complicated hole having a cross-sectional shape is finished at once by drawing.
In the above broaching method, as shown in FIG. 3, the cutting edge portion formed in the central portion of the broach, which gradually changes from the lower rough blade to the upper finishing blade, cuts the workpiece little by little by the downward movement of the broach. And finished to a predetermined dimension.

また、上記のブローチとして、炭化タングステン基超硬合金で構成されたブローチ(以下、超硬ブローチという)が知られている。
特開昭59−205215号公報
As the broach described above, a broach made of a tungsten carbide-based cemented carbide (hereinafter referred to as a cemented carbide broach) is known.
JP 59-205215 A

近年のブローチ加工装置の高性能化および高出力化はめざましく、一方でブローチ加工に対する省力化および省エネ化、さらに低コスト化の要求も強く、これに伴い、ブローチ加工は一段と高速化の傾向にあるが、上記の従来超硬ブローチにおいては、これを高速加工条件で用いた場合、摩耗が急速に進行するようになることから、比較的短時間で使用寿命に至るのが現状である。   In recent years, the performance and output of broaching machines have improved dramatically. On the other hand, there is a strong demand for labor saving, energy saving, and cost reduction for broaching. Accordingly, broaching has a tendency to further increase in speed. However, in the above conventional carbide broach, when it is used under high-speed machining conditions, the wear progresses rapidly, so that the service life is reached in a relatively short time.

そこで、本発明者等は、上述のような観点から、特に上記の従来超硬ブローチに着目し、これの耐摩耗性向上を図るべく、研究を行った結果、
(a)図2(a)および(b)にそれぞれ概略平面図および概略正面図で示される蒸着装置、すなわち装置中央部に設けた回転テーブルを挟んで、一方側にカソード電極(蒸発源)としてTiターゲットを設けたスパッタリング装置、他方側にカソード電極(蒸発源)としてWCターゲットを設けたスパッタリング装置を備え、かつ前記スパッタリング装置のそれぞれに、電磁コイルを設けてマグネトロンスパッタリング装置とした蒸着装置を用い、前記装置内の回転テーブル上に、これの中心軸から半径方向に所定距離離れた位置にリング状に上記の従来超硬ブローチ(以下、超硬ブローチ本体という)を装着し、前記電磁コイルにより磁場を形成して、装置中央部の超硬ブローチ本体装着部における磁束密度を100〜300G(ガウス)とし、前記装置内の加熱温度を300〜500℃とした状態で、かつ装置内に反応ガスとして、例えばCなどの炭化水素と窒素とArを、望ましくはC流量:25〜100sccm、窒素流量:200〜300sccm、Ar流量:150〜250sccmの割合で導入して、反応雰囲気を、例えば1PaのCの分解ガスと窒素とArの混合ガスとすると共に、前記両マグネトロンスパッタリング装置のWCターゲットのカソード電極(蒸発源)には、例えば出力:1〜3kW(周波数:40kHz)のスパッタ電力、同Tiターゲットには、例えば出力:3〜8kW(周波数:40kHz)のスパッタ電力を同時に印加した条件で、前記超硬ブローチ本体の表面に非晶質炭素系被膜を形成すると、この結果形成された非晶質炭素系被膜は、これの透過型電子顕微鏡による組織観察結果(倍率:250万倍)が図1(実施例の本発明被覆超硬ブローチ3の非晶質炭素系被膜を示す)に模式図で例示される通り、炭素系非晶質体の素地に、最大径で10nm(ナノメーター)以下の結晶質炭窒化チタン系化合物の微粒[以下、「結晶質Ti(C,N)系化合物微粒」で示す]が分散分布した組織をもつようになること。
Therefore, the present inventors, from the viewpoint as described above, paying particular attention to the above conventional carbide broach, and as a result of conducting research to improve the wear resistance thereof,
(A) As a cathode electrode (evaporation source) on one side of the vapor deposition apparatus shown in the schematic plan view and schematic front view in FIGS. A sputtering apparatus provided with a Ti target, a sputtering apparatus provided with a WC target as a cathode electrode (evaporation source) on the other side, and a vapor deposition apparatus provided with an electromagnetic coil in each of the sputtering apparatuses were used. The conventional carbide broach (hereinafter referred to as a carbide broach main body) is mounted in a ring shape on a rotary table in the apparatus at a predetermined distance in the radial direction from the central axis of the rotary table. A magnetic field is formed, and the magnetic flux density in the carbide broach body mounting portion in the center of the apparatus is set to 100 to 300 G (Gauss And then, in the state was 300 to 500 ° C. The heating temperature in the apparatus, and as a reaction gas into the apparatus, for example, hydrocarbons, nitrogen and Ar, such as C 2 H 2, preferably C 2 H 2 flow rate: 25 ˜100 sccm, nitrogen flow rate: 200 to 300 sccm, Ar flow rate: 150 to 250 sccm, and the reaction atmosphere is, for example, a 1 Pa C 2 H 2 decomposition gas and a mixed gas of nitrogen and Ar. For example, sputtering power of output: 1 to 3 kW (frequency: 40 kHz) is applied to the cathode electrode (evaporation source) of the WC target of the magnetron sputtering apparatus, and sputtering of output: 3 to 8 kW (frequency: 40 kHz) is applied to the Ti target, for example. When an amorphous carbon-based film is formed on the surface of the cemented carbide broach body under the condition that power is simultaneously applied, this results in formation. The structure of the amorphous carbon-based film thus obtained was observed with a transmission electron microscope (magnification: 2.5 million times). FIG. 1 shows the amorphous carbon-based film of the coated carbide broach 3 according to the present invention. ), A fine particle of a crystalline titanium carbonitride compound having a maximum diameter of 10 nm (nanometer) or less [hereinafter referred to as “crystalline Ti (C, N ) System compound fine particles ”have a distributed structure.

(b)上記(a)の非晶質炭素系被膜を形成するに際して、蒸着装置内に導入される反応ガスとしての炭化水素と窒素とArのそれぞれの流量と、マグネトロンスパッタリング装置のWCターゲットとTiターゲットに印加されるスパッタ電力を調整して、前記非晶質炭素系被膜が、オージェ分光分析装置で測定して、
W:5〜20原子%、
Ti:5〜20原子%、
窒素:0.5〜18原子%、
を含有し、残りが炭素と不可避不純物からなる組成を有するようにすると、この結果形成された非晶質炭素系被膜は、素地の炭素系非晶質体によってすぐれた潤滑性を具備し、かつ前記炭素系非晶質体からなる素地における結晶質Ti(C,N)系微粒の分散分布効果、および前記電磁コイルによる磁場成膜に際しての細粒化効果で、硬さが著しく向上すると共に、W成分の含有によって被膜強度も一段と向上するようになり、したがって、この非晶質炭素系被膜(以下、潤滑性非晶質炭素系被膜という)を形成してなる被覆超硬ブローチは、高速加工でも切刃部にチッピング(微少欠け)の発生なく、一段とすぐれた耐摩耗性を長期に亘って発揮するようになること。
(B) When forming the amorphous carbon-based film of (a), the flow rates of hydrocarbon, nitrogen, and Ar as reaction gases introduced into the vapor deposition apparatus, the WC target of the magnetron sputtering apparatus, and Ti Adjusting the sputtering power applied to the target, the amorphous carbon-based film is measured with an Auger spectroscopic analyzer,
W: 5 to 20 atomic%,
Ti: 5 to 20 atomic%,
Nitrogen: 0.5-18 atomic%,
And the remainder has a composition composed of carbon and inevitable impurities, the resulting amorphous carbon-based film has excellent lubricity due to the carbon-based amorphous body of the substrate, and With the dispersion distribution effect of the crystalline Ti (C, N) -based fine particles in the base made of the carbon-based amorphous body, and the fine graining effect in the magnetic field film formation by the electromagnetic coil, the hardness is remarkably improved, The coating strength is further improved by the inclusion of the W component. Therefore, the coated carbide broach formed by forming this amorphous carbon-based coating (hereinafter referred to as a lubricious amorphous carbon-based coating) is processed at high speed. However, it should exhibit excellent wear resistance over a long period without chipping (small chipping) at the cutting edge.

(c)上記(b)の潤滑性非晶質炭素系被膜の形成に先だって、同じく上記(a)の蒸着装置を用い、前記蒸着装置の対向配置の両マグネトロンスパッタリング装置の電磁コイルに、いずれも例えば電圧:50V、電流:10Aの条件で印加して、前記超硬ブローチ本体の装着部における磁束密度を140G(ガウス)とした磁場を形成すると共に、前記蒸着装置内の加熱温度を例えば400℃とした状態で、反応ガスとして窒素とArを、例えば窒素流量:300sccm、Ar流量:200sccmの割合で導入して、1Paの窒素とArの混合ガスからなる反応雰囲気、または反応ガスとしてCと窒素とArを、例えばC流量:50sccm、窒素流量:300sccm、Ar流量:230sccmの割合で導入して、1PaのCの分解ガスと窒素とArの混合ガスからなる反応雰囲気とし、Tiターゲットのカソード電極(蒸発源)には、例えば出力:12kW(周波数:40kHz)のスパッタ電力を印加し、一方超硬ブローチ本体には、例えば−100Vのバイアス電圧を印加した条件でグロー放電を発生させることにより、前記超硬ブローチ本体の表面にTiN層およびTiCN層のいずれか、または両方を積層した状態で形成すると、この結果形成されたTiN層およびTiCN層は、上記の超硬ブローチ本体および潤滑性非晶質炭素系被膜のいずれにもきわめて強固に密着し、高速ブローチ加工条件下でも前記潤滑性非晶質炭素系被膜の前記超硬ブローチ本体表面からの剥離を防止する密着接合層として作用すること。
以上(a)〜(c)に示される研究結果を得たのである。
(C) Prior to the formation of the lubricious amorphous carbon-based coating film of (b) above, the vapor deposition apparatus of (a) above is also used, and both of the magnet coils of the magnetron sputtering apparatus disposed opposite to the vapor deposition apparatus are used. For example, it is applied under conditions of voltage: 50 V and current: 10 A to form a magnetic field with a magnetic flux density of 140 G (Gauss) in the mounting portion of the cemented carbide broach body, and a heating temperature in the vapor deposition apparatus is, for example, 400 ° C. In this state, nitrogen and Ar are introduced as reaction gases at a rate of, for example, nitrogen flow rate: 300 sccm and Ar flow rate: 200 sccm, and a reaction atmosphere consisting of a mixed gas of 1 Pa of nitrogen and Ar, or C 2 H as the reaction gas. 2 and nitrogen and Ar, e.g., C 2 H 2 flow rate: 50 sccm, flow rate of nitrogen: 300 sccm, Ar flow rate: introduced at a rate of 230sccm A reaction atmosphere of a mixed gas of decomposition gas and nitrogen and Ar of C 2 H 2 of 1 Pa, the cathode electrode of the Ti target (evaporation source), for example, output: 12 kW (Frequency: 40 kHz) was applied to the sputter power, On the other hand, in the cemented carbide broach body, for example, a glow discharge is generated under a condition where a bias voltage of −100 V is applied, so that either or both of the TiN layer and the TiCN layer are laminated on the surface of the cemented carbide broach body. The TiN layer and the TiCN layer formed as a result of the above are extremely firmly adhered to both the above-described carbide broach body and the lubricious amorphous carbon-based film, and the lubricity is maintained even under high-speed broach processing conditions. Acting as an adhesive bonding layer for preventing the amorphous carbon-based coating from peeling from the surface of the cemented carbide broach body.
The research results shown in (a) to (c) above were obtained.

この発明は、上記の研究結果に基づいてなされたものであって、超硬ブローチ本体の表面に、
(a)マグネトロンスパッタリング装置にて、カソード電極(蒸発源)としてTiターゲットを用い、窒素とArの混合ガス、または炭化水素の分解ガスと窒素とArの混合ガスからなる反応雰囲気で磁場中成膜された、TiN層およびTiCN層のいずれか、または両方の積層からなり、かつ0.1〜3μmの平均層厚を有する密着接合層を介して、
(b)同じくマグネトロンスパッタリング装置にて、カソード電極(蒸発源)として、WCターゲットとTiターゲットを用い、炭化水素の分解ガスと窒素とArの混合ガスからなる反応雰囲気で磁場中成膜され、オージェ分光分析装置で測定して、
W:5〜20原子%、
Ti:5〜20原子%、
窒素:0.5〜18原子%、
を含有し、残りが炭素と不可避不純物からなる組成を有すると共に、透過型電子顕微鏡による観察で、炭素系非晶質体の素地に、結晶質Ti(C,N)系化合物微粒が分散分布した組織を示し、かつ1〜3μmの平均層厚を有する潤滑性非晶質炭素系被膜を蒸着形成してなる、特に高速ブローチ加工で潤滑性非晶質炭素系被膜がすぐれた耐摩耗性を発揮する被覆超硬ブローチに特徴を有するものである。
This invention was made based on the above research results, and on the surface of the carbide broach main body,
(A) In a magnetron sputtering apparatus, a Ti target is used as a cathode electrode (evaporation source), and a film is formed in a magnetic field in a reaction atmosphere composed of a mixed gas of nitrogen and Ar, or a mixed gas of hydrocarbon decomposition gas and nitrogen and Ar. Through a tight junction layer comprising either a TiN layer or a TiCN layer, or a laminate of both, and having an average layer thickness of 0.1 to 3 μm,
(B) Similarly, in a magnetron sputtering apparatus, a WC target and a Ti target are used as a cathode electrode (evaporation source), and a film is formed in a magnetic field in a reaction atmosphere composed of a hydrocarbon decomposition gas and a mixed gas of nitrogen and Ar. Measured with a spectroscopic analyzer,
W: 5 to 20 atomic%,
Ti: 5 to 20 atomic%,
Nitrogen: 0.5-18 atomic%,
And the remainder of the composition is composed of carbon and inevitable impurities, and the crystalline Ti (C, N) compound fine particles are dispersed and distributed on the base of the carbon-based amorphous body by observation with a transmission electron microscope. Demonstrated by depositing a lubricious amorphous carbon-based film with a texture and an average layer thickness of 1 to 3 μm, especially in high-speed broaching, the lubricating amorphous carbon-based film exhibits excellent wear resistance The coated carbide broach is characterized.

つぎに、この発明の被覆超硬ブローチにおいて、これを構成する密着接合層および潤滑性非晶質炭素系被膜を上記の通りに限定した理由を説明する。
(a)密着接合層の平均層厚
TiN層およびTiCN層のいずれか、または両方の積層からなる密着接合層は、超硬ブローチ本体と潤滑性非晶質炭素系被膜の間にあって、これら両者と強固に密着接合し、さらに前記超硬ブローチ本体に対する密着接合性は磁場中成膜によって一層向上したものになるが、その平均層厚が0.1μm未満では、所望のすぐれた密着接合性を確保することができず、一方その平均層厚が3μmを越えると、特に高速ブローチ加工で熱塑性変形を起こし易くなり、これが潤滑性非晶質炭素系被膜におけるチッピング発生の原因となることから、その平均層厚が0.1〜3μmと定めた。
Next, in the coated carbide broach of the present invention, the reason why the adhesive bonding layer and the lubricious amorphous carbon-based film constituting the same are limited as described above will be described.
(A) Average layer thickness of tight junction layer The tight junction layer comprising either or both of the TiN layer and TiCN layer is between the carbide broach body and the lubricious amorphous carbon-based coating, and both Tightly bonded and bonded to the cemented carbide broach body is further improved by film formation in a magnetic field. However, if the average layer thickness is less than 0.1 μm, the desired excellent bonded bonding is ensured. On the other hand, if the average layer thickness exceeds 3 μm, it becomes easy to cause thermoplastic deformation particularly in high-speed broaching, which causes chipping in the lubricating amorphous carbon-based film. The layer thickness was determined to be 0.1 to 3 μm.

(b)潤滑性非晶質炭素系被膜のW含有量
W成分は、上記の潤滑性非晶質炭素系被膜の素地を形成して、被膜の強度を向上させる作用があるが、その含有量が5原子%未満では所望の高強度を確保することができず、これが摩耗促進の原因となり、一方その含有量が20原子%を越えると潤滑性が急激に低下し、切刃部にチッピングが発生し易くなることから、その含有量を5〜20原子%と定めた。
(B) W content of lubricious amorphous carbon-based coating W component forms the base of the above-mentioned lubricous amorphous carbon-based coating and has the effect of improving the strength of the coating. If it is less than 5 atomic%, the desired high strength cannot be ensured, which causes wear promotion. On the other hand, if its content exceeds 20 atomic%, the lubricity is drastically reduced and chipping occurs at the cutting edge. Since it becomes easy to generate | occur | produce, the content was defined as 5-20 atomic%.

(c)潤滑性非晶質炭素系被膜のTiおよびN含有量
Ti成分とN成分、さらにC(炭素)成分は磁場成膜下で結合して、被膜中に結晶質のTi(C,N)系化合物微粒として存在し、被膜の硬さを著しく向上させ、耐摩耗性を向上させる作用があるが、その含有量がTi成分が5原子%未満、およびN成分が0.5原子%未満になると、被膜中にTi(C,N)系微粒として存在する割合が少なくなり過ぎて、所望の高硬度を確保することができず、一方その含有量がTi成分が20原子%、およびN成分が18原子%を越えると強度および潤滑性が急激に低下し、切刃部にチッピングが発生するようになることから、その含有量をそれぞれTi:5〜20原子%、N:0.5〜18原子%と定めた。
(C) Ti and N contents of lubricating amorphous carbon-based film Ti component, N component, and C (carbon) component are combined under film formation of magnetic field, and crystalline Ti (C, N) is formed in the film. ) It exists as system compound fine particles and has the effect of remarkably improving the hardness of the film and improving the wear resistance, but its content is less than 5 atomic% for Ti component and less than 0.5 atomic% for N component. In this case, the ratio of Ti (C, N) -based fine particles present in the coating is too small, and the desired high hardness cannot be ensured, while the content thereof is 20 atomic% Ti component, and N When the component exceeds 18 atomic%, the strength and lubricity are drastically reduced and chipping occurs at the cutting edge, so the content is Ti: 5 to 20 atomic% and N: 0.5, respectively. It was defined as ˜18 atomic%.

(d)潤滑性非晶質炭素系被膜の平均層厚
その平均層厚が1μm未満では、所望の潤滑性および耐摩耗性効果を確保することができず、一方その平均層厚が3μmを越えると、切刃部にチッピングが発生し易くなることから、その平均層厚を1〜3μmと定めた。
(D) Average layer thickness of lubricating amorphous carbon-based coating If the average layer thickness is less than 1 μm, the desired lubricity and wear resistance effect cannot be ensured, while the average layer thickness exceeds 3 μm. Then, since chipping is likely to occur in the cutting edge portion, the average layer thickness was determined to be 1 to 3 μm.

この発明の被覆超硬ブローチは、これを構成する潤滑性非晶質炭素系被膜の硬さが、これの炭素系非晶質体の素地に、磁場成膜により超微細となった状態で分散分布する結晶質Ti(C,N)系化合物微粒によって著しく向上したものになり、前記炭素系非晶質体の素地がW成分の作用で高強度を具備するようになることと相俟って、特に各種のTi合金やAl合金、さらにCu合金などの工作物の高速ブローチ加工で、チッピングの発生なく、すぐれた耐摩耗性を長期に亘って発揮するものである。   The coated carbide broach of the present invention is dispersed in a state where the hardness of the lubricating amorphous carbon-based coating film constituting the same is superfine by magnetic field film formation on the carbon-based amorphous body. Combined with the fact that the crystalline Ti (C, N) -based compound fine particles that are distributed are significantly improved, and the base of the carbon-based amorphous body has high strength due to the action of the W component. In particular, high-speed broaching of workpieces such as various Ti alloys, Al alloys, and Cu alloys exhibits excellent wear resistance over a long period of time without occurrence of chipping.

つぎに、この発明の被覆超硬ブローチを実施例により具体的に説明する。   Next, the coated carbide broach of the present invention will be specifically described with reference to examples.

原料粉末として、いずれも0.8〜3μmの平均粒径を有するWC粉末、TiC粉末、VC粉末、TaC粉末、NbC粉末、Cr3 2 粉末、およびCo粉末を用意し、これら原料粉末を、表1に示される配合組成に配合し、さらにワックスを加えてアセトン中で72時間ボールミル混合し、減圧乾燥した後、100MPaの圧力で所定形状の各種の圧粉体にプレス成形し、これらの圧粉体を、6Paの真空雰囲気中、7℃/分の昇温速度で1370〜1470℃の範囲内の所定の温度に昇温し、この温度に1時間保持後、炉冷の条件で焼結して、直径:50mm×長さ:1000mmの超硬ブローチ本体形成用丸棒焼結体を形成し、さらに前記の丸棒焼結体から、研削加工にて、切刃部最大径:40mm×切刃部長さ:600mm×全長:800mmの寸法および図2に示される形状を有し、かつ前記切刃部における荒刃:25刃、仕上げ刃:25刃の超硬ブローチ本体A−1〜A−10を製造した。 As raw material powders, WC powder, TiC powder, VC powder, TaC powder, NbC powder, Cr 3 C 2 powder, and Co powder all having an average particle diameter of 0.8 to 3 μm are prepared. Blended into the composition shown in Table 1, added with wax, ball milled in acetone for 72 hours, dried under reduced pressure, pressed into various compacts of a predetermined shape at a pressure of 100 MPa. The powder is heated to a predetermined temperature within a range of 1370 to 1470 ° C. at a heating rate of 7 ° C./min in a 6 Pa vacuum atmosphere, held at this temperature for 1 hour, and then sintered under furnace cooling conditions. Then, a round bar sintered body for forming a carbide broach main body having a diameter: 50 mm × length: 1000 mm is formed, and further, from the round bar sintered body, a cutting blade portion maximum diameter: 40 mm × by grinding. Cutting edge length: 600 mm x total length: 80 Carbide broach bodies A-1 to A-10 having a size of 0 mm and a shape shown in FIG. 2 and having rough blades at the cutting edge portion: 25 blades and finishing blades: 25 blades were produced.

ついで、上記の超硬ブローチ本体A−1〜A−10のそれぞれを、アセトン中で超音波洗浄し、乾燥した状態で、図1に示される蒸着装置内の回転テーブル上に、これの中心軸から半径方向に所定距離離れた位置にリング状に装着し、一方側のマグネトロンスパッタリング装置のカソード電極(蒸発源)として、純度:99.9質量%のTiターゲット、他方側のマグネトロンスパッタリング装置のカソード電極(蒸発源)として、純度:99.6質量%のWCターゲットを前記回転テーブルを挟んで対向配置し、
(a)まず、装置内を真空排気して0.01Paの真空に保持しながら、ヒーターで装置内を200℃に加熱した後、Arガスを装置内に導入して0.5Paの圧力のAr雰囲気とし、この状態で前記回転テーブル上で自転しながら回転する前記超硬ブローチ本体に−800Vのバイアス電圧を印加して前記超硬ブローチ本体表面を20分間Arガスボンバード洗浄し、
(b)ついで、前記蒸着装置の対向配置の両マグネトロンスパッタリング装置の電磁コイルに、いずれも電圧:50V、電流:10Aの条件で印加して、前記超硬ブローチ本体の装着部における磁束密度を140G(ガウス)とした磁場を形成すると共に、前記蒸着装置内の加熱温度を400℃とした状態で、反応ガスとして窒素とArを、窒素流量:300sccm、Ar流量:200sccmの割合で導入して、1Paの窒素とArの混合ガスからなる反応雰囲気、または反応ガスとしてCと窒素とArを、C流量:50sccm、窒素流量:300sccm、Ar流量:230sccmの割合で導入して、1PaのCの分解ガスと窒素とArの混合ガスからなる反応雰囲気とし、Tiターゲットのカソード電極(蒸発源)には出力:12kW(周波数:40kHz)のスパッタ電力を印加し、一方上記超硬ブローチ本体には、−100Vのバイアス電圧を印加した条件でグロー放電を発生させることにより、前記超硬ブローチ本体の表面に表3,4に示される目標層厚のTiN層およびTiCN層のいずれか、または両方の積層からなる密着接合層を形成し、
(c)さらに、前記電磁コイルに印加する条件を、電圧:50〜100V、電流:10〜20Aの範囲内の所定の値として、上記超硬ブローチ本体の装着部における磁束密度を100〜300G(ガウス)の範囲内の所定の値とし、前記蒸着装置内の加熱温度は400℃、上記超硬ブローチ本体のバイアス電圧は−100Vとしたままで、前記蒸着装置内に反応ガスとして、C(炭化水素)と窒素とArを、C流量:25〜100sccm、窒素流量:200〜300sccm、Ar流量:150〜250sccmの範囲内の所定の流量で導入して、反応雰囲気を、1PaのCの分解ガスと窒素とArの混合ガスとすると共に、前記両マグネトロンスパッタリング装置のWCターゲットのカソード電極(蒸発源)には、例えば出力:0.5〜3.5kW(周波数:40kHz)の範囲内の所定のスパッタ電力、同Tiターゲットには、出力:2.5〜8.5kW(周波数:40kHz)の範囲内の所定のスパッタ電力を同時に印加した条件で、同じく表2,3に示される目標組成および目標層厚の潤滑性非晶質炭素系被膜を蒸着形成することにより、本発明被覆超硬ブローチ1〜10および比較被覆超硬ブローチ1〜12をそれぞれ製造した。
なお、比較被覆超硬ブローチ1〜12は、構成成分のうちの少なくともいずれかの成分含有量がこの発明の範囲から外れた潤滑性非晶質炭素系被膜を形成したものである。
Next, each of the above-mentioned carbide broach main bodies A-1 to A-10 is ultrasonically cleaned in acetone and dried, and then the central axis of the main body is placed on the rotary table in the vapor deposition apparatus shown in FIG. Is mounted in a ring shape at a predetermined distance in the radial direction, and the cathode electrode (evaporation source) of the magnetron sputtering apparatus on one side is a Ti target having a purity of 99.9% by mass, the cathode of the magnetron sputtering apparatus on the other side As an electrode (evaporation source), a WC target having a purity of 99.6% by mass is disposed opposite to the rotary table,
(A) First, the inside of the apparatus is evacuated and kept at a vacuum of 0.01 Pa, and the inside of the apparatus is heated to 200 ° C. with a heater, and then Ar gas is introduced into the apparatus and Ar at a pressure of 0.5 Pa is introduced. In this state, a bias voltage of −800 V is applied to the carbide broach body rotating while rotating on the rotary table in this state, and the surface of the carbide broach body is cleaned with Ar gas bombardment for 20 minutes,
(B) Next, the magnetic flux density in the mounting part of the carbide broach body is 140 G by applying the voltage to the electromagnetic coils of both magnetron sputtering apparatuses opposed to the vapor deposition apparatus under the conditions of voltage: 50 V and current: 10 A. In addition to forming a magnetic field (Gauss) and heating temperature in the vapor deposition apparatus at 400 ° C., nitrogen and Ar are introduced as reaction gases at a rate of nitrogen flow rate: 300 sccm, Ar flow rate: 200 sccm, A reaction atmosphere composed of a mixed gas of nitrogen and Ar of 1 Pa, or C 2 H 2 , nitrogen and Ar as reaction gases are introduced at a rate of C 2 H 2 flow rate: 50 sccm, nitrogen flow rate: 300 sccm, Ar flow rate: 230 sccm. , the reaction atmosphere of a mixed gas of 1Pa of C 2 decomposed gas of H 2 and nitrogen and Ar, cathodic electrodeposition of Ti target (Evaporation source) is applied with a sputter power of 12 kW (frequency: 40 kHz), while the super-hard broach body is subjected to glow discharge under the condition that a bias voltage of −100 V is applied. On the surface of the hard broach body, a tight junction layer composed of either a TiN layer or a TiCN layer having a target layer thickness shown in Tables 3 and 4 or a laminate of both is formed,
(C) Furthermore, assuming that the conditions to be applied to the electromagnetic coil are predetermined values in the range of voltage: 50 to 100 V and current: 10 to 20 A, the magnetic flux density in the mounting portion of the carbide broach body is 100 to 300 G ( The heating temperature in the vapor deposition apparatus is 400 ° C., the bias voltage of the carbide broach body is −100 V, and C 2 H is used as a reactive gas in the vapor deposition apparatus. 2 (hydrocarbon), nitrogen, and Ar are introduced at a predetermined flow rate within a range of C 2 H 2 flow rate: 25-100 sccm, nitrogen flow rate: 200-300 sccm, Ar flow rate: 150-250 sccm, While using a 1 Pa C 2 H 2 decomposition gas and a mixed gas of nitrogen and Ar, the cathode electrode (evaporation source) of the WC target of both the magnetron sputtering devices Is, for example, output: 0.5 to 3.5 kW (frequency: 40 kHz) in a predetermined sputtering power, and the same Ti target has an output: 2.5 to 8.5 kW (frequency: 40 kHz). The coated carbide broaches 1 to 10 of the present invention are formed by vapor-depositing a lubricating amorphous carbon-based film having a target composition and a target layer thickness shown in Tables 2 and 3 under the condition that a predetermined sputtering power is simultaneously applied. And comparative coated carbide broaches 1-12, respectively.
The comparative coated carbide broaches 1 to 12 are formed by forming a lubricating amorphous carbon-based film in which the content of at least one of the constituent components is out of the scope of the present invention.

つぎに、上記本発明被覆超硬ブローチ1〜10および比較被覆超硬ブローチ1〜12を用い、いずれも外径:80mm×中心部の貫通孔(中心孔)の穴径:40mm×全長:40mmの寸法をもった工作物について、
(a)工作物の材質:質量%で、Ti−0.15%Pbの組成を有するTi合金(JIS・TB340PbH)、
引き抜き速度:40m/min.
加工数:5000個
の条件(引き抜き条件Aという)での工作物中心孔の高速穴加工(通常の引き抜き速度は25m/min.)、
(b)工作物の材質:純Al(JIS・A1050)、
引き抜き速度:90m/min.
加工数:15000個、
の条件(引き抜き条件Bという)での工作物中心孔の高速穴加工(通常の引き抜き速度は70m/min.)、
を行い、加工後の荒刃および仕上げ刃における最大逃げ面摩耗幅を測定した。この測定結果を表2,3に示した。
Next, using the coated carbide broaches 1 to 10 and the comparative coated carbide broaches 1 to 12 of the present invention, the outer diameter: 80 mm × the diameter of the central through hole (center hole): 40 mm × the total length: 40 mm For workpieces with dimensions of
(A) Workpiece material: Ti alloy (JIS TB340PbH) having a composition of Ti-0.15% Pb in mass%,
Drawing speed: 40 m / min.
Number of machining: High-speed drilling of the workpiece center hole under the condition of 5000 pieces (referred to as drawing condition A) (normal drawing speed is 25 m / min.),
(B) Workpiece material: pure Al (JIS A1050),
Drawing speed: 90 m / min.
Number of processing: 15000
High-speed drilling of the center hole of the workpiece under the conditions (drawing condition B) (normal drawing speed is 70 m / min.),
The maximum flank wear width on the rough and finished blades after processing was measured. The measurement results are shown in Tables 2 and 3.

Figure 0004645943
Figure 0004645943

Figure 0004645943
Figure 0004645943

Figure 0004645943
Figure 0004645943

この結果得られた本発明被覆超硬ブローチ1〜10および比較被覆超硬ブローチ1〜12を構成する潤滑性非晶質炭素系被膜について、その組成をオージェ分光分析装置、その層厚を走査型電子顕微鏡を用いて測定したところ、いずれも目標組成および目標層厚と実質的に同じ組成および平均層厚(断面5箇所の平均値)を示し、また、その組織を透過型電子顕微鏡を用いて観察(倍率:250万倍)したところ、前記本発明被覆超硬ブローチ1〜10および比較被覆超硬ブローチ1〜10とも、炭素系非晶質体の素地に、結晶質のTi(C,N)系化合物微粒が分散分布した組織を示した。   As a result, the composition of the present invention coated carbide broaches 1 to 10 and comparative coated carbide broaches 1 to 12 of the lubricating amorphous carbon-based film is determined by the Auger spectroscopic analyzer and the layer thickness by the scanning type. When measured using an electron microscope, both showed the same composition and average layer thickness (average value of five cross-sections) as the target composition and target layer thickness, and the structure was measured using a transmission electron microscope. When observed (magnification: 2.5 million times), both the coated carbide broaches 1 to 10 of the present invention and the comparative coated carbide broaches 1 to 10 were formed of crystalline Ti (C, N) on the base of the carbon-based amorphous body. ) A structure in which system compound fine particles are dispersed and distributed is shown.

表2,3に示される結果から、潤滑性非晶質炭素系被膜が、炭素系非晶質体の素地に、結晶質のTi(C,N)系化合物微粒が分散分布した組織を有する本発明被覆超硬ブローチ1〜10は、いずれもブローチ加工を、高速条件で行なった場合にも、すぐれた耐摩耗性を発揮するのに対して、潤滑性非晶質炭素系被膜の構成成分のうちの少なくともいずれかの含有量がこの発明から外れた比較被覆超硬ブローチ1〜12においては、高速ブローチ加工では、前記潤滑性非晶質炭素系被膜の摩耗進行がきわめて速い場合や、切刃部にチッピングが発生する場合が生じ、この結果比較的短時間で使用寿命に至ることが明らかである。
上述のように、この発明の被覆超硬ブローチは、通常の条件でのブローチ加工は勿論のこと、特に各種の工作物のブローチ加工を、高速条件で行なった場合にも、すぐれた耐摩耗性を発揮するものであるから、ブローチ加工の省力化および省エネ化、さらに低コスト化に十分満足に対応できるものである。
From the results shown in Tables 2 and 3, the lubricating amorphous carbon-based coating has a structure in which crystalline Ti (C, N) -based compound particles are dispersed and distributed on a carbon-based amorphous body. The invention coated carbide broaches 1 to 10 all exhibit excellent wear resistance even when broaching is performed under high-speed conditions, while the components of the lubricating amorphous carbon-based coating are In the comparative coated carbide broaches 1 to 12 in which the content of at least one of them is out of the present invention, in the high-speed broaching process, when the progress of wear of the lubricious amorphous carbon-based coating is extremely fast, It is clear that chipping may occur in the part, and as a result, the service life is reached in a relatively short time.
As described above, the coated carbide broach of the present invention has excellent wear resistance not only when broaching under normal conditions, but also when broaching various workpieces under high speed conditions. Therefore, it can fully satisfy the labor saving and energy saving of broaching, and further cost reduction.

本発明被覆超硬ブローチ3の潤滑性非晶質炭素系被膜を透過型電子顕微鏡を用いて組織観察した結果(倍率:250万倍)を示す模式図である。It is a schematic diagram which shows the result (magnification: 2.5 million times) which carried out the structure | tissue observation of the lubricous amorphous carbon type | system | group film of this invention coated carbide broach 3 using the transmission electron microscope. 本発明被覆超硬ブローチ1〜10および比較被覆超硬ブローチ1〜12の密着接合層および潤滑性非晶質炭素系被膜を形成するのに用いた蒸着装置を示し、(a)は概略平面図、(b)は概略正面図である。The vapor deposition apparatus used for forming the adhesion bonding layer of the present invention coated carbide broaches 1 to 10 and the comparative coated carbide broaches 1 to 12 and the lubricating amorphous carbon-based film is shown, (a) is a schematic plan view. (B) is a schematic front view. ブローチを例示する概略正面図である。It is a schematic front view which illustrates a broach.

Claims (1)

炭化タングステン基超硬合金で構成されたブローチ本体の表面に、
(a)マグネトロンスパッタリング装置にて、カソード電極(蒸発源)としてTiターゲットを用い、窒素とArの混合ガス、または炭化水素の分解ガスと窒素とArの混合ガスからなる反応雰囲気で磁場中成膜された、窒化チタン層および炭窒化チタン層のいずれか、または両方の積層からなり、かつ0.1〜3μmの平均層厚を有する密着接合層を介して、
(b)マグネトロンスパッタリング装置にて、カソード電極(蒸発源)として、炭化タングステンターゲットとTiターゲットを用い、炭化水素の分解ガスと窒素とArの混合ガスからなる反応雰囲気で磁場中成膜され、オージェ分光分析装置で測定して、
W:5〜20原子%、
Ti:5〜20原子%、
窒素:0.5〜18原子%、
を含有し、残りが炭素と不可避不純物からなる組成を有すると共に、透過型電子顕微鏡による観察で、炭素系非晶質体の素地に、結晶質炭窒化チタン系化合物の微粒が分散分布した組織を示し、かつ1〜3μmの平均層厚を有する潤滑性非晶質炭素系被膜を蒸着形成してなる、潤滑性非晶質炭素系被膜がすぐれた耐摩耗性を発揮する表面被覆超硬合金製ブローチ。
On the surface of the broach body made of tungsten carbide base cemented carbide,
(A) In a magnetron sputtering apparatus, a Ti target is used as a cathode electrode (evaporation source), and a film is formed in a magnetic field in a reaction atmosphere composed of a mixed gas of nitrogen and Ar, or a mixed gas of hydrocarbon decomposition gas and nitrogen and Ar. Through a tight junction layer consisting of a laminate of either or both of a titanium nitride layer and a titanium carbonitride layer and having an average layer thickness of 0.1 to 3 μm,
(B) In a magnetron sputtering apparatus, a tungsten carbide target and a Ti target are used as a cathode electrode (evaporation source), and a film is formed in a magnetic field in a reaction atmosphere composed of a hydrocarbon decomposition gas and a mixed gas of nitrogen and Ar. Measured with a spectroscopic analyzer,
W: 5 to 20 atomic%,
Ti: 5 to 20 atomic%,
Nitrogen: 0.5-18 atomic%,
And the balance is composed of carbon and inevitable impurities, and a structure in which fine particles of crystalline titanium carbonitride compound are dispersed and distributed on the base of the carbon-based amorphous body by observation with a transmission electron microscope. Made of a surface-coated cemented carbide alloy that exhibits excellent wear resistance, and has a lubricious amorphous carbon-based coating formed by vapor deposition of a lubricating amorphous carbon-based coating having an average layer thickness of 1 to 3 μm brooch.
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