JP4665117B2 - Compact high-energy focused ion beam system - Google Patents
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本発明は、ガスイオンにより集束イオンビームを形成する発明である。微小径の水素、ヘリウムイオンによる軽ガスイオンの集束イオンビームは、スッパタリング効果が小さく、比較的重いイオンはスパッタリング効果が大きい、またガスイオン全般に於いてイオン物質の物質中への残留が少ないことからイオンビーム物質の残留が少ない状態での物質表面への元素分析から表面加工まで幅広い分野で使用が期待されている。しかし、ビームエネルギー幅が小さく、高安定なイオンビームの発生と、高縮小率を持つレンズ系の開発が困難であったため、サブマイクロメートル以下の集束イオンビームの形成に至っていない。本発明によりkeV領域からMeV領域の集束イオンビームの形成が可能となる。 The present invention is an invention in which a focused ion beam is formed by gas ions. The focused ion beam of light gas ions with small-diameter hydrogen and helium ions has a small sputtering effect, relatively heavy ions have a large sputtering effect, and there is little residue of ionic substances in the gas ion in general. Therefore, it is expected to be used in a wide range of fields from elemental analysis to surface processing of materials with little residual ion beam material. However, since it has been difficult to generate a highly stable ion beam with a small beam energy width and to develop a lens system having a high reduction ratio, a focused ion beam of sub-micrometer or less has not been formed. The present invention makes it possible to form a focused ion beam from the keV region to the MeV region.
従来、keV領域（数keVから数100keV領域）の集束イオンビームは、液体金属イオン源を用いた集束イオンビーム形成装置(FIB)により形成され、ビーム径は数nm径に達しており、主に物質の表面加工に使用されている。 Conventionally, a focused ion beam in the keV region (several keV to several hundred keV region) is formed by a focused ion beam forming device (FIB) using a liquid metal ion source, and the beam diameter has reached several nanometers. Used for surface treatment of materials.
一方、MeV領域（数MeVから数10MeV領域）の集束イオンビームの場合には、独立した加速器と、磁気レンズ等の集束イオンビーム形成用のビームライン（以下、形成用ビームライン）との組み合わせにより実現している。
FIBでは、利用可能なイオン種が低温で液化する液体金属に限定されているため、物質に対して、金属イオン等の重いイオンの性質であるスパッタリング効果が大きく、また金属イオンは物質中の拡散効果が小さいため、液体金属が物質中に残留する。そこで、非破壊での物質表面の微量元素分析を行う場合や液体金属の物質中への残留が問題となる場合には限定的使用となっていた。一方、MeV領域の集束イオンビーム形成装置は、加速器とイオンビーム形成用ビームラインとが独立しているため、加速器本体の大きさに加えて10m程度の長尺の形成用ビームラインを必要としている。そこで、集束イオンビーム形成装置が大型化し、実験室レベルで集束イオンビーム形成装置を設置することは困難であった。形成されるビーム径は、イオンビーム形成用ビームラインの磁気四重極集束レンズ等の縮小率が数10〜100程度であるため、サブミクロンレベルまでであり、更なるビーム径の縮小化にはレンズ系の物点の大きさを小さくすること、即ち物点スリットの開口の縮小化が必要であり、それに伴い、ビーム電流の減少が生ずる。ここで、物点とは、集束レンズ系の光源の意味で、イオン源のイオンビーム引き出し孔を指している。また、形成用ビームラインは長尺であるため、装置周辺環境からの振動、ノイズ及び温度変化を受けやすい。 In FIB, the available ionic species are limited to liquid metals that liquefy at low temperatures, so the sputtering effect, which is the property of heavy ions such as metal ions, is large for materials, and metal ions diffuse in the materials. Since the effect is small, liquid metal remains in the material. Therefore, it has been limited use when non-destructive trace element analysis of the material surface is performed, or when residual liquid metal is a problem. On the other hand, the focused ion beam forming apparatus in the MeV region requires a long forming beam line of about 10 m in addition to the size of the accelerator body because the accelerator and the ion beam forming beam line are independent. . Therefore, the focused ion beam forming apparatus has been enlarged, and it has been difficult to install the focused ion beam forming apparatus at the laboratory level. The beam diameter to be formed is down to the submicron level because the reduction ratio of the magnetic quadrupole focusing lens etc. of the ion beam forming beam line is about several tens to 100. For further reduction of the beam diameter It is necessary to reduce the size of the object point of the lens system, that is, to reduce the aperture of the object point slit, and accordingly, the beam current decreases. Here, the object point means the light source of the focusing lens system and refers to the ion beam extraction hole of the ion source. Further, since the forming beam line is long, it is susceptible to vibration, noise, and temperature change from the environment around the apparatus.
本発明の小型化された高エネルギー集束イオンビーム形成装置は、高エネルギーの集束イオンビームを形成するために、加速レンズ系と加速管とを組み合わせることにより構成されるイオンビーム形成装置である。本発明の装置では、従来装置のように加速器と独立してイオンビーム形成用ビームラインを併設する必要がなく、加速管を集束レンズの一部として使用することで、イオンビーム加速系と集束レンズ系、即ち、イオンビーム加速部と集束イオンビーム形成部とが一体化できるため、小型でコンパクトな装置を構成することができる。 The miniaturized high energy focused ion beam forming apparatus of the present invention is an ion beam forming apparatus configured by combining an acceleration lens system and an acceleration tube in order to form a high energy focused ion beam. In the apparatus of the present invention, unlike the conventional apparatus, it is not necessary to provide an ion beam forming beam line separately from the accelerator, and the ion beam acceleration system and the focusing lens are used by using the acceleration tube as a part of the focusing lens. Since the system, that is, the ion beam accelerating unit and the focused ion beam forming unit can be integrated, a small and compact apparatus can be configured.
本発明の加速管には、単孔レンズ効果による縮小率を持たせることで、集束レンズ系の一部として使用され、加速管を高縮小率化できる。そこで、これまでの高エネルギー集束イオンビーム形成装置では形成が困難であった数10nm径の高エネルギーナノビームの形成が可能となる。上記単孔レンズ効果とは、図３に示すように電極の入口部に発生する電場の歪みによる集束力（電場の凸レンズ的作用によるビームの集束力）を言い、従来の磁気四重極レンズと異なり、球面収差を小さく抑えることが可能であり、その結果として、集束点でpA（10-12A）以上のビーム電流を得ることができる。 The acceleration tube of the present invention has a reduction ratio due to the single hole lens effect, so that it can be used as a part of the converging lens system, and the acceleration tube can have a high reduction ratio. Therefore, it is possible to form a high-energy nanobeam with a diameter of several tens of nm, which has been difficult to form with conventional high-energy focused ion beam forming apparatuses. The single-hole lens effect refers to a focusing force due to an electric field distortion generated at the entrance of an electrode as shown in FIG. 3 (a beam focusing force due to a convex lens action of the electric field). In contrast, spherical aberration can be suppressed to a small value, and as a result, a beam current of pA (10 −12 A) or more can be obtained at the focal point.
本発明のイオンビーム形成装置は、縦型とすることができ、又従来のイオンビーム形成用のビームラインを併設する必要がないので、イオン源から加速器のレンズ系まで一体化することにより、装置周辺からの振動に強い装置とすることができ、又、装置全体がコンパクト化されて小型化できるという、本発明に特有の顕著な効果を生ずるものである。 The ion beam forming apparatus of the present invention can be a vertical type and does not need a beam line for forming a conventional ion beam, so that the apparatus can be integrated by integrating from the ion source to the lens system of the accelerator. A device that is resistant to vibration from the surroundings can be obtained, and a significant effect peculiar to the present invention that the entire device can be reduced in size and size can be achieved.
また、イオン源から加速管のレンズ系まで一体でなく分割している場合、各々の機器が振動するため、振動がビームに与える影響が大きくなる。しかし、本発明のように一体の場合、全体として振動するため、ビームに与える振動の影響が小さいという、効果が生ずる。 In addition, when the ion source and the lens system of the acceleration tube are not integrated but divided, each device vibrates, so that the influence of the vibration on the beam becomes large. However, in the case of being integrated as in the present invention, since it vibrates as a whole, there is an effect that the influence of vibration on the beam is small.
本発明は、高エネルギーの集束イオンビームを形成するために加速レンズ系と加速管のみを組み合わせて設け、前記加速管をイオンビームの集束レンズの一部として使用することで、加速管に、イオンビームの加速機能とイオンビームの集束レンズ機能との両機能を持たせることで、加速管においてイオンビーム加速部と集束イオンビーム形成部とを形成し、それらを一体化することにより加速管をコンパクト化したことを特徴とする小型化された高エネルギー集束イオンビーム形成装置である。 In the present invention, in order to form a high-energy focused ion beam, only an accelerating lens system and an accelerating tube are provided in combination, and the accelerating tube is used as a part of the focusing lens for the ion beam. By providing both the beam acceleration function and the ion beam focusing lens function, the ion beam acceleration part and the focused ion beam forming part are formed in the acceleration tube, and the acceleration tube is made compact by integrating them. This is a miniaturized high energy focused ion beam forming apparatus.
本発明の装置の操作を図１に基づいて説明すると、イオン源から発生されたガス状のイオンが、加速レンズ系を構成する中央に一つの孔を備えた多段電極に供給され、その孔を通過する際にその電極によって生ずる電場の作用により加速されると同時にそのガスイオンの径を順次集束化する。このように、加速レンズ系で加速され、且つ集束化されたガスイオンが、加速管を構成する多段電極の中央孔を通過する際に更に加速されると同時に、加速管電極の電場作用によりガスイオンを更に集束化させる。その結果、本発明の集束イオンビーム形成装置により、その集束点におけるガスイオンは、数ｎｍ単位までに集束されたイオンビームが得られる。 The operation of the apparatus of the present invention will be described with reference to FIG. 1. Gaseous ions generated from an ion source are supplied to a multistage electrode having a single hole in the center constituting an acceleration lens system. When passing, the gas ions are accelerated by the action of an electric field generated by the electrodes, and at the same time, the diameters of the gas ions are sequentially focused. As described above, the gas ions accelerated and focused by the acceleration lens system are further accelerated when passing through the central hole of the multistage electrode constituting the acceleration tube, and at the same time, the gas ion is generated by the electric field action of the acceleration tube electrode. The ions are further focused. As a result, by the focused ion beam forming apparatus of the present invention, an ion beam can be obtained in which the gas ions at the focus point are focused to a few nanometers.
以下、本発明を実施例に基づいて説明する。
（実施例1）
本発明では、図１に示すようにプラズマ型イオン源、加速レンズ系、及び加速管の構成によりkeV領域からMeV領域の集束イオンビームの形成を可能とする。加速レンズ系及び加速管も加速レンズの一部として使うことにより、実験室レベルの集束ガスイオンビーム形成装置の開発が可能であるとともに、ビーム径はナノメートル化が可能である。
Hereinafter, the present invention will be described based on examples.
(Example 1)
In the present invention, a focused ion beam from the keV region to the MeV region can be formed by the configuration of the plasma ion source, the acceleration lens system, and the acceleration tube as shown in FIG. By using an accelerating lens system and an accelerating tube as a part of the accelerating lens, a laboratory-level focused gas ion beam forming apparatus can be developed, and the beam diameter can be made nanometer.
本発明の装置の加速レンズ系は、ガスイオンビームを加速しながら同時に、電場の単孔レンズ効果による集束力を応用することで、ガスイオンビームの加速及び集束を同時に行うことができる。 The acceleration lens system of the apparatus of the present invention can accelerate and focus the gas ion beam simultaneously by accelerating the gas ion beam and simultaneously applying the focusing force due to the single hole lens effect of the electric field.
この同時集束・加速型のレンズ系によりコンパクトな装置ながら、50keV程度で2000程度の高縮小率を得ることができる。更に、1MVまで加速する場合、加速管により3程度の縮小率が得られるので、全体の縮小率としては6000を超える。イオン源引き出し口での物点の大きさを、2×10-4ｍとすると、最終径は30nm程度となる。 With this simultaneous focusing / acceleration type lens system, a high reduction ratio of about 2000 can be obtained at about 50 keV while being compact. Furthermore, when accelerating to 1 MV, a reduction ratio of about 3 is obtained by the acceleration tube, so the overall reduction ratio exceeds 6000. If the size of the object point at the ion source outlet is 2 × 10 −4 m, the final diameter is about 30 nm.
加速レンズ系及び加速管の配置に関しては、図中の加速レンズ系で高縮小率を得ると焦点が加速レンズの電極間となる。この焦点を電極外に出すため、加速管を低倍率の加速レンズとして使用し、ビーム径の縮小化を行うとともに、ビームエネルギーを上げる。
（実施例2）
実施例1での二段加速レンズ系に対して、更に数段の加速レンズを加えることで、レンズ系を高縮小率化する。この場合、加速レンズ系の各加速電極の入口部で絞り電極を用いるので、集束点でのビーム電流が減少するため、更なるイオン源の高輝度化を必要とする。加速管に入射するビームエネルギーも増加するため、実施例1よりも加速管の加速電圧をあげる必要がある。このため、実施例1の加速管より電圧勾配を大きくする、或は加速管を長くすることを必要とする。
Regarding the arrangement of the acceleration lens system and the acceleration tube, when a high reduction ratio is obtained with the acceleration lens system in the figure, the focal point becomes between the electrodes of the acceleration lens. In order to bring this focal point out of the electrode, the acceleration tube is used as a low-magnification acceleration lens to reduce the beam diameter and increase the beam energy.
(Example 2)
The lens system is increased in reduction ratio by adding several stages of acceleration lenses to the two-stage acceleration lens system in the first embodiment. In this case, since the aperture electrode is used at the entrance of each acceleration electrode of the acceleration lens system, the beam current at the focusing point is reduced, and thus further enhancement of the brightness of the ion source is required. Since the beam energy incident on the accelerator tube also increases, it is necessary to increase the acceleration voltage of the accelerator tube as compared with the first embodiment. For this reason, it is necessary to make the voltage gradient larger than the acceleration tube of Example 1, or to make the acceleration tube longer.
実施例においては、加速レンズ系における集束レンズである各加速電極には、球面収差を低減するため光学レンズと同様な絞りが必要であり、この絞りとして各加速電極に絞り電極が設けられている。即ち、図３に示されるように、加速イオン系の各電極は上下２層の電極から構成され、その前面の電極が絞り電極となっており、又加速管の一部の電極も同様の構造になっている。 In the embodiment, each accelerating electrode, which is a focusing lens in the accelerating lens system, requires a diaphragm similar to the optical lens in order to reduce spherical aberration, and each accelerating electrode is provided with a diaphragm electrode as this diaphragm. . That is, as shown in FIG. 3, each electrode of the acceleration ion system is composed of two upper and lower electrodes, the front electrode thereof is a diaphragm electrode, and some electrodes of the acceleration tube have the same structure. It has become.
イオン源の輝度は光の輝度と同様にステラジアン当たりのビーム電流を表しており、その輝度が高いほど絞り電極でビームを絞っても、光学顕微鏡の様に試料を明るく見ることが出来る。即ち、試料上での単位面積当たりの電流量を稼ぐことができる。 The brightness of the ion source represents the beam current per steradian similarly to the brightness of the light, and the higher the brightness, the brighter the sample can be seen like an optical microscope, even if the beam is focused by the aperture electrode. That is, the amount of current per unit area on the sample can be earned.
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| JPH0640477B2 (en) * | 1989-05-17 | 1994-05-25 | 株式会社神戸製鋼所 | Focused ion beam device |
| JPH05128985A (en) * | 1991-11-04 | 1993-05-25 | Ulvac Japan Ltd | Microbeam generating device |
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