JP4705606B2 - X-ray condenser lens - Google Patents

Description

  The present invention relates to a technique related to material evaluation by X-ray microbeam formation, and more particularly to an X-ray condenser lens that collects X-rays.

  In recent years, with the progress of nanotechnology development, structural evaluation of materials at the nanometer level is required. There are scanning microscopes, electron microscopes and the like as nanometer level evaluation methods, but all of them require high vacuum conditions and thinning of the sample, and it is difficult to measure the sample to be observed as it is. On the other hand, with the progress of X-ray focusing technology in recent years, micrometer level X-ray beams have been obtained, and X-ray diffraction and fluorescent X-rays using such X-ray beams have been obtained. Material evaluation such as analysis has finally become possible.

  X-ray beam condensing can be broadly divided into (A) a method using an X-ray optical element such as an X-ray mirror (see Non-Patent Document 1), and (B) asymmetric Bragg reflection of a crystal. (C) a method using an X-ray Fresnel zone plate (see Non-Patent Document 3), (D) a method using a transmissive laminated zone plate (see Non-Patent Document 4), (E) There is a method using an X-ray waveguide (see Non-Patent Document 5). Table 1 shows the current status and problems of each condensing method.

  Of these, the method of using the optical element for X-rays such as the X-ray mirror of (A) and the method of using the asymmetric Bragg reflection of the crystal of (B) are almost at the technical limit at present. Condensation is difficult.

On the other hand, in the hard X-ray region where the X-ray energy is 5 keV or more, a condensed beam having a beam size of 100 nanometers or less is obtained by the method using the X-ray Fresnel zone plate of (C). When the Fresnel zone plate is irradiated with an X-ray beam, a part of the X-ray beam is absorbed by the zone plate and is not transmitted, but the other X-ray beams pass through the zone plate as they are. At this time, assuming that the wavelength of the X-ray beam is λ and the focal length of the X-ray Fresnel zone plate is f, (2nλf) ^1/2 (n = 0), 1, 2,... And the position of {(2n + 1) λf} ^1/2 , or the position of {(2n + 1) λf} ^1/2 and {(2n + 2) λf} ^{1 / If} a shielding zone made of a material that does not transmit X-rays is provided between the position ² and the transmitted X-rays interfere with each other, the X-ray beam can be condensed.

  This condensing principle is the same as that of visible light, and details thereof are described in Non-Patent Document 6, for example, and it is known that the spatial resolution of the zone plate condensing system is substantially equal to the outermost zone width. . Therefore, in the case of an X-ray Fresnel zone plate, the maximum spatial resolution is defined by the width of the narrowest shielded zone constituting the zone plate. In order to manufacture such a zone plate, lithography technology for semiconductor manufacturing including electron beam drawing is used. Although the semiconductor lithography technology itself can draw a linear pattern of 10 nanometers, when producing a ring-shaped pattern necessary as an X-ray Fresnel zone plate, drawing of a width of about 40 nanometers is currently limited. Yes, the resolution of the X-ray Fresnel zone plate itself is about 50 nanometers. Furthermore, when producing an X-ray Fresnel zone plate, since it is necessary to precisely produce a large number of ring-shaped patterns, the X-ray Fresnel zone plate itself is very expensive.

The X-ray Fresnel zone plate collects X-rays by providing a shielding zone through which X-rays cannot be transmitted, whereas in the case of the method using the transmissive laminated zone plate (D), a heavy element that transmits X-rays A structure in which a layer and a light element layer that transmits X-rays are stacked is used. In Non-Patent Document 4, the distance along the Z direction from the center of the X-ray beam is a position of (2nλf ₁ ) ^1/2 (n = 0, 1, 2,...) And {(2n + 1) λf ₁ }. X-rays are linearly collected by the laminated Fresnel zone plate structure disposed in either the first region between the ^half positions or the second region excluding the first region. Possibilities have been proposed. In addition, a method of condensing dots in a spot shape by combining two stacked Fresnel zone plate structures has been recently proposed.

On the other hand, in the case of the method using the X-ray waveguide of (E), the size of the X-ray beam is determined by the size of the core constituting the waveguide. Here, when the refractive index in the X-ray region of the cladding layer covering the core layer is N1, and the refractive index in the X-ray region of the core layer is N2, the relationship of (the real part of N1) <(the real part of N2) There is. When an X-ray beam is incident on the core layer of the X-ray waveguide, the X-ray beam travels through the core layer. At this time, when the thickness of the core layer is sufficiently small, only X-rays in a specific state are transmitted. At this time, the thickness D of the core layer, the wavelength λ of the X-ray beam, and the X-ray beam to the cladding layer are transmitted. It is known that there is the following relationship with the incident angle φ (see Non-Patent Document 7).
2Dsin (φ) = mλ (m = 0, 1, 2,...) (1)

  The condition of formula (1) indicates that there is a limit to the incident angle φ of the X-ray incident on the X-ray waveguide, and X-rays having other incident angles cannot pass through the core layer. Is shown. The angle at which total reflection occurs is selected as the incident angle φ of the X-ray beam from the core layer to the cladding layer, and the length is such that all X-ray beams passing through the cladding layer are absorbed and do not pass through the waveguide exit. When the X-ray waveguide is used, the X-ray beam can be condensed to the size of the core layer at the exit of the waveguide. Since such an X-ray waveguide can be manufactured by vapor deposition, it is easy to reduce the thickness of the core layer to 10 nanometers or less, and an X-ray beam having a size of several nanometers can be manufactured. It is possible in principle.

  However, in the case of a method using an X-ray waveguide, an X-ray beam can be condensed in the thickness direction of the core, but the in-plane direction of the core perpendicular to the thickness direction and the traveling direction of the beam. X-rays cannot be collected. That is, the X-rays that can be extracted at the exit of the X-ray waveguide have the same size as the incident X-rays in the horizontal direction. It is difficult to obtain a point-shaped X-ray microbeam that is focused in a two-dimensional direction.

  As described above, it is difficult to obtain an X-ray beam having a size of 10 nanometers by a method using an X-ray Fresnel zone plate, and an X-ray beam having a size of several nanometers by a method using an X-ray waveguide. Although it is possible to obtain a ray beam, there is a problem that the X-ray beam is condensed in only a one-dimensional direction, an X-ray beam condensed in a two-dimensional direction cannot be obtained, and the X-ray intensity is weak. There was a point. As described above, with the progress of research on nanostructured materials, a technique for evaluating nanostructured materials with a spatial resolution of 10 nanometer level is required. However, the conventional X-ray beam focusing method has a level of 10 nanometer level. It is difficult to achieve a spatial resolution of

  In order to overcome such technical difficulties, the inventor sandwiched the upper and lower sides of the core thin film layer having a refractive index of N1 in the X-ray region with the clad thin film layer having a refractive index of N2, and having refractive indexes of N1 and N2. Using X-ray waveguides with a relationship of (real part of N1) <(real part of N2) between them, by incorporating a Fresnel zone plate into a part of the waveguide, at the nanometer level in the vertical and horizontal directions An X-ray condensing lens capable of forming a condensed X-ray microbeam has been proposed (Japanese Patent Application No. 2006-172450).

Yamauchi et al., “Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining”, Jpn.J.Appl.Phys., Vol.42, 2003, p.7129-7134 Tsusaka et al., “Formation of Parallel X-Ray Microbeam and Its Application”, Japanese Journal of Applied Physics, Vol.39, 2000, p.635-637 E. Spiller, “Soft X-ray Optics”, The international Society for Optical Engineering, p. 81-97 HCKang, J.Maser, GBStephenson, C.Liu, R.Conley, ATMacrander, and S.Vogt, “Nanometer Linear Focusing of Hard X Rays by a Multilayer Laue Lens”, Phys. Rev. Lett., 96, 127401, 2006 Jun Kawai, “X-ray traveling wave”, Surface Science, Vol. 22, no. 6, p. 397-403, 2001 Hiroshi Kubota, "Wave Optics", Iwanami Shoten, p. 305, 1971 W. Jark et al., “High gain beam compression in new-generation thin-film x-ray waveguide”, Applied Physics Letters, Vol. 78, No. 9, 2001, p.1192-1194

  In the X-ray condensing lens proposed in Japanese Patent Application No. 2006-172450, X-rays are condensed on the end face of the X-ray waveguide. Therefore, in measurement of a sample having a three-dimensional structure, a minute portion may be adjusted depending on the shape of the sample. Have difficulty. That is, in the X-ray condenser lens, if the sample is placed at a location away from the end face of the X-ray waveguide, the X-ray emitted from the waveguide becomes divergent light again in the direction perpendicular to the traveling direction. Since the sample is irradiated, there is a problem in that the characteristics of the nano beam condensed by the X-ray condenser lens cannot be effectively used. Therefore, in order to measure such a three-dimensional structure, it is necessary to secure a sufficient distance (working distance) between the condensing system and the sample and realize beam focusing on the nanometer level on the sample. .

  The present invention has been made to solve the above-mentioned problems, and a high-intensity X-ray microbeam of 10 nanometer level, which has been difficult with the conventional X-ray beam focusing technique, is used as a working distance for sample measurement. An object of the present invention is to provide an X-ray condensing lens that can be realized while sufficiently securing the above.

The X-ray condenser lens of the present invention includes an X-ray waveguide lens structure in which a clad layer is formed on both opposing surfaces of a core layer, and a downstream side of the X-ray waveguide lens structure along the traveling direction of the X-ray beam. with fraud and mitigating risk and arranged laminated Fresnel zone plate structure so that the position of the center axis coincides with the center axis of the X-ray waveguide lens structure, the X-ray waveguide lens structure, both sides of the counter A shielding zone made of a material that does not transmit X-rays, upstream of the core layer along a direction opposite to the traveling direction of the X-ray beam or a part of the core layer in which X-rays are incident in parallel In this shielding zone, the wavelength of X-ray is λ, the focal length of the X-ray waveguide lens structure is f, the traveling direction of the X-ray beam is AX, and the core layer is out of the directions orthogonal to the traveling direction AX. The laminating direction of the cladding layer is AZ, When the direction orthogonal to the serial AX and AZ and the AY, the position of the distance along the center of the X-ray beam in the AY direction (2nλf) ^1/2 (n is 0, 1, 2, ...) And the position of {(2n + 1) λf} ^1/2 and the second region excluding the first region, and the length along the AX direction is The laminated Fresnel zone plate structure has a heavy element layer made of a material that does not transmit X-rays and a light element made of a material that transmits X-rays. The heavy element layer has a distance along the AZ direction from the center of the X-ray beam when the focal length of the stacked Fresnel zone plate structure is f ₁ ( 2nλf ₁ ) ^1/2 and {(2n + 1) λf ₁ } ^1/2 Between the first region and the fourth region excluding the third region, and the end surface on the outlet side of the laminated Fresnel zone plate structure is located on the outlet side of the shielding zone. It is located at a distance L downstream from the end surface along the AX direction, and f = f ₁ between the focal length f of the X-ray waveguide lens structure and the focal length f ₁ of the laminated Fresnel zone plate structure. It is characterized in that the relationship + L holds.

Further , in one configuration example of the X-ray condenser lens of the present invention, the X-ray waveguide lens structure and the laminated Fresnel zone plate structure are formed on the same substrate.
In one configuration example of the X-ray condenser lens of the present invention, the heavy element layer of the laminated Fresnel zone plate structure includes W, Ru, Ta, Rb, Sr, Y, Zr, Nb, Mo, Pd, Ag. , Cd, In, Ba, Re, Os, Ir, Pt, Au, Pb, Tl, V, Cr, Mn, Fe, Co, Ni, Cu, Zn. The layer is made of a material including at least one of C, Si, Be, Ca, Sc, Ti, V, Cr, Mn, Te, and a polymer material.

  According to the present invention, it is possible to easily obtain a high-intensity X-ray microbeam condensed to the nanometer order, which has been difficult to realize in the past, and at the focal position of the X-ray condenser lens, quantum dots and nanodots can be obtained. It is possible to evaluate the structure of various nanomaterials of nanometer size, such as nanowires, nanoparticles and fine gates of highly integrated semiconductor materials, and contribute to the development of semiconductor materials and semiconductor devices. Further, in the present invention, by arranging the laminated Fresnel zone plate structure behind the X-ray waveguide lens structure, the working distance between the X-ray condensing lens and the sample is sufficiently secured, while at the nanometer level. It is possible to realize beam condensing with a diameter of.

In the present invention, the end face on the exit side of the laminated Fresnel zone plate structure is positioned at a distance L downstream from the end face on the exit side of the shielding zone along the traveling direction AX of the X-ray beam, by such relation f = f ₁ + L is established between the focal length f of the ray waveguide lens structure as a stacked focal length f ₁ of the Fresnel zone plate structure, at a position away from the X-ray focusing lens It becomes easy to collect X-rays, and an X-ray beam that can be easily used for analysis can be obtained.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1A is a plan view showing a configuration of an X-ray condenser lens according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along line II of the X-ray condenser lens of FIG. It is. In FIG. 1A, an X-ray shielding layer having an X-ray waveguide lens structure, which will be described later, and an X-ray beam passing through the X-ray waveguide lens structure and the laminated Fresnel zone plate structure are seen through. And

  The X-ray condensing lens of the present embodiment incorporates a Fresnel zone plate in a part of an X-ray waveguide, and an X-ray waveguide lens structure 13 on the same substrate and a one-dimensional Fresnel zone. It is composed of a laminated Fresnel zone plate structure 14 called a plate.

  The X-ray waveguide lens structure 13 includes an X-ray waveguide portion 8 for condensing the X-ray beam in the vertical direction, an X-ray zone plate portion 9 and X-ray for condensing the X-ray beam in the horizontal direction. Condensing part 10 is comprised. In FIG. 1, 1 is a silicon substrate, 2 is a lower ruthenium layer which is a cladding layer formed on the silicon substrate 1, 3 is a carbon layer which is a core layer formed on the lower ruthenium layer 2, and 4 is carbon. An upper ruthenium layer 5, which is a cladding layer formed on the layer 3, is an X-ray zone plate formed in a part of an X-ray waveguide composed of the lower ruthenium layer 2, the carbon layer 3 and the upper ruthenium layer 4. Is an X-ray shielding layer made of a tantalum material.

The stacked Fresnel zone plate structure 14 is a structure in which heavy element layers 6 that hardly transmit X-rays and light element layers 7 that transmit X-rays are alternately stacked.
In the example of FIGS. 1A and 1B, the traveling direction of the X-ray beam is AX, and the stacking direction of the core layer and the cladding layer of the X-ray waveguide lens structure 13 out of the directions orthogonal to the traveling direction AX. The direction orthogonal to AZ, AX and AZ is AY.

  Assuming that the refractive index in the X-ray region of the cladding layer of the X-ray waveguide lens structure 13 is N1, and the refractive index in the X-ray region of the core layer is N2, between the refractive indexes N1 and N2, (N1 Real number part) <(real part of N2). In the present embodiment, in order to prevent X-rays leaking from the cladding layer, the thickness of the lower ruthenium layer 2 and the upper ruthenium layer 4 is 100 nanometers, and the thickness of the carbon layer 3 through which X-rays pass is 10 nanometers. M.

The X-ray shielding layer 5 of the X-ray waveguide lens structure 13 has the center of the X-ray beam (II in FIG. 1A) where λ is the wavelength of the X-ray and f is the focal length as the condenser lens. The distance along the direction AY perpendicular to the traveling direction AX of the X-ray beam from the line) is a first distance between the position Y _2n (n is 0, 1, 2,...) And the position Y _{2n + 1} . And the second region excluding the first region and the focal length f along the direction opposite to the traveling direction AX of the X-ray beam from the focal point 16 of the X-ray condenser lens. Arranged upstream. The distances (coordinates) Y _2n and Y _{2n + 1} from the center of the X-ray beam of the X-ray shielding layer 5 are obtained by the following equations.
Y _2n = (2nλf) ^1/2 (2)
Y _{2n + 1} = {(2n + 1) λf} ^1/2 (3)

FIG. 2 shows a case where the X-ray shielding layer 5 is provided in the first region between Y _2n (n is 0, 1, 2,...) And Y _{2n + 1} . In FIG. 2, it is assumed that the X-ray shielding layer 5 under the upper ruthenium layer 4 is seen through. In the case where the X-ray shielding layer 5 is provided in the second region except between Y _2n and Y _{2n + 1} , the X-ray shielding layer 5 may be disposed between the black background regions in FIG.

The heavy element layer 6 of the laminated Fresnel zone plate structure 14 has an X-ray beam from the center of the X-ray beam (II-II line in FIG. 1B) when the focal length of the condenser lens is f ₁ . traveling direction AX and distance along the direction AZ orthogonal (the n 0, 1, 2, · · ·) is Z _2n third region between the position and the position of the Z _{2n + 1,} this third It is arranged in any one of the fourth areas excluding the area, and is arranged upstream from the focal point 16 of the X-ray condenser lens by the focal length f ₁ along the direction opposite to the traveling direction AX of the X-ray beam. The distances (coordinates) Z _2n and Z _{2n + 1} from the center of the X-ray beam of the heavy element layer 6 are obtained by the following equations.
Z _2n = (2nλf ₁ ) ^1/2 (4)
Z _{2n + 1} = {(2n + 1) λf ₁ } ^1/2 (5)

The case where the heavy element layer 6 in the third region between the Z _2n (n is 0, 1, 2, ...) and Z _{2n + 1} shown in FIG. When the heavy element layer 6 is provided in the fourth region except between Z _2n and Z _{2n + 1} , the heavy element layer 6 is disposed between the black background regions in FIG. 3, and the black background region in FIG. The light element layer 7 may be disposed.

In order to efficiently collect the X-rays in the X-ray zone plate portion 9, it is necessary that no X-rays pass through the X-ray shielding layer 5. In this embodiment, the X-ray zone plate portion 9 The length (the dimension in the left-right direction in FIG. 1A) is 75 microns. At this time, the ratio of the X-rays that pass through the X-ray shielding layer 5 is estimated to be about 2.54 × 10 ⁻⁴ % from the absorption coefficient of tantalum. Absent.

  Next, a manufacturing method of the X-ray waveguide lens structure 13 of the present embodiment will be described. First, a mesa structure is formed on the silicon substrate 1 by etching, and the lower ruthenium layer 2 is formed only on the mesa structure using a mask, for example, by vapor deposition. Tantalum is deposited on the lower ruthenium layer 2 and then processed by a method such as electron beam lithography to form the X-ray shielding layer 5. Subsequently, the carbon layer 3 is formed on the lower ruthenium layer 2 by sputtering, for example. At this time, the thickness of the carbon layer 3 is set to be equal to or less than the thickness of the X-ray shielding layer 5. Finally, the upper ruthenium layer 4 is formed on the carbon layer 3 and the X-ray shielding layer 5, for example, by vapor deposition, whereby the production of the X-ray waveguide lens structure 13 is completed.

Next, a manufacturing method of the laminated Fresnel zone plate structure 14 of the present embodiment will be described. The overlap of tungsten is made such that the position at a distance L downstream from the end surface on the exit side of the X-ray shielding layer 5 along the traveling direction AX of the X-ray beam becomes the end surface on the exit side of the laminated Fresnel zone plate structure 14. The element layers 6 and the light element layers 7 made of tungsten silicide are alternately formed by, for example, sputtering. In the present embodiment, the heavy element layer 6 is provided in a third region between Z _2n shown in Formula (4) and Z _{2n + 1} shown in Formula (5). At this time, the position of the center in the AZ direction (II-II line in FIG. 1B) of the X-ray beam incident from the X-ray waveguide lens structure 13 coincides with the center of the heavy element layer 6 at the center. Deploy. This completes the production of the X-ray condenser lens.

  When the X-ray beam 11 is incident on the X-ray condensing lens thus manufactured from the left side of FIGS. 1A and 1B, it proceeds in a waveguide mode depending on the length of the X-ray waveguide lens structure 13. In this embodiment, the length of the X-ray waveguide lens structure 13 and the length of the laminated Fresnel zone plate structure 14 are each 10 millimeters. Since this value is sufficiently larger than the wavelength of the X-ray, only the X-ray beam that passes through the X-ray waveguide lens structure 13 satisfies the formula (1), and the direction perpendicular to the silicon substrate 1 is present. The size of the X-ray beam in the vertical direction (FIG. 1B) is about 10 nanometers.

  The X-ray that has passed through the X-ray waveguide 8 then enters the X-ray zone plate portion 9. At this time, a part of the X-rays passing through the waveguide is absorbed by the X-ray shielding layer 5, and other X-rays reach the X-ray condensing unit 10. Since the X-ray beam cannot spread in the direction perpendicular to the silicon substrate 1, the size of the X-ray beam in the vertical direction (vertical direction in FIG. 1B) is approximately the same as in the case of the X-ray waveguide portion 8. It will be about 10 nanometers.

  Therefore, the vertical size of the X-ray beam at the exit 15 of the X-ray waveguide lens structure 13 is about 10 nanometers. The X-ray beam emitted from the outlet 15 is emitted with a divergence angle twice as large as the incident angle in the vertical direction. The X-ray beam is condensed again by the laminated Fresnel zone plate structure 14 disposed behind the X-ray waveguide lens structure 13.

  On the other hand, the X-ray zone plate portion 9 of the X-ray waveguide lens structure 13 and the horizontal plane of the X-ray condensing portion 10 do not constrain the mode of the X-ray beam. X-rays emitted from the light travel through the X-ray condensing unit 10 and the laminated Fresnel zone plate structure 14 as a one-dimensional spherical wave. As a result, the X-rays traveling through the X-ray condensing unit 10 and the laminated Fresnel zone plate structure 14 are condensed in the horizontal direction (up and down direction in FIG. 1A) by the interference effect.

  Therefore, if the position of the focal point 16 by the X-ray zone plate part 9 and the X-ray condensing part 10 of the X-ray waveguide lens structure 13 and the condensing position by the multilayer Fresnel zone plate structure 14 are made to coincide, A distance can be taken between the line condensing lens and the focal point 16. Thereby, in this Embodiment, the freedom degree of the alignment at the time of sample measurement can be raised.

As illustrated above, the X-ray condensing lens of the present embodiment can perform two-dimensional condensing of the X-ray beam while effectively utilizing the energy of the incident X-ray beam. Since an intense X-ray microbeam can be realized, a higher-level structural evaluation of a nanometer level material becomes possible.
When the X-ray condenser lens of the present embodiment is used for material evaluation, the light emitted from the X-ray condenser lens is directly irradiated to the material to be evaluated, or the light emitted from the X-ray condenser lens is further emitted. The material may be evaluated by collecting the light with a mirror or the like and irradiating the material to be evaluated, detecting X-rays diffracted by the material or fluorescent X-rays generated from the material.

  In addition, this invention is not limited to embodiment shown in FIGS. 1-3. For example, although the X-ray shielding layer 5 is provided in the core layer of the X-ray waveguide lens structure 13 in the present embodiment, it may be provided outside the core layer. In this case, the X-ray shielding layer 5 may be provided upstream from the focal point 16 of the X-ray condenser lens by the focal length f.

  Further, in the present embodiment, tungsten is used as the material of the heavy element layer 6, but the material of the heavy element layer 6 is Ru, Ta, Rb, Sr, Y, Zr, Nb, Mo, Pd, Ag, Any material containing at least one of Cd, In, Ba, Re, Os, Ir, Pt, Au, Pb, Tl, V, Cr, Mn, Fe, Co, Ni, Cu, and Zn may be used. In addition, tungsten silicide is used as the material of the light element layer 7, but the material of the light element layer 7 is C, Si, Be, Ca, Sc, Ti, V, Cr, Mn, Te, or a polymer material. A material containing at least one may be used, and polyimide, polymethyl methacrylate, a fluororesin, or a chlorine resin may be used.

  In this embodiment, carbon is used as the material for the core layer. However, the material for the core layer may be a material including at least one of carbon, silicon, beryllium, and a polymer material. Further, as the material of the core layer, a material containing at least one of boron, beryllium, aluminum, fluorine, calcium, magnesium, and titanium may be used, and polyimide, polymethyl methacrylate, fluorine resin, or chlorine resin is used. Also good.

  In this embodiment, ruthenium is used as the material of the cladding layer, but any material containing at least one of tungsten, ruthenium, and tantalum may be used. Further, as a material for the cladding layer, a material containing at least one of nickel, cobalt, chromium, vanadium, titanium, germanium, molybdenum, zirconium, indium, rhenium, silver, gold, platinum, and tantalum may be used. The material of the X-ray shielding layer 5 may be the same as that of the clad layer, or a material other than the clad layer may be used from the materials listed as the clad layer material.

  The present invention can be applied to an X-ray condensing device.

It is the top view and sectional drawing which show the structure of the X-ray condensing lens which concerns on embodiment of this invention. It is a top view for demonstrating the position of the X-ray shielding layer of the X-ray waveguide lens structure in embodiment of this invention. It is sectional drawing for demonstrating the position of the heavy element layer of the laminated | stacked Fresnel zone plate structure in embodiment of this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Silicon substrate, 2 ... Lower ruthenium layer, 3 ... Carbon layer, 4 ... Upper ruthenium layer, 5 ... X-ray shielding layer, 6 ... Heavy element layer, 7 ... Light element layer, 8 ... X-ray waveguide part, 9 ... X-ray zone plate part, 10 ... X-ray condensing part, 11 ... X-ray beam, 13 ... X-ray waveguide lens structure, 14 ... Laminated Fresnel zone plate structure, 15 ... Exit of X-ray waveguide lens structure, 16: The focal point of the X-ray condenser lens.

Claims (3)

An X-ray waveguide lens structure in which clad layers are formed on both opposing surfaces of the core layer;
Along the traveling direction of the X-ray beam the X-ray waveguide lens Oite downstream of structure, the position of the central axis X-ray waveguide lens geometric center axis coincident so arranged laminated Fresnel With zone plate structure,
The X-ray waveguide lens structure has a part of the core layer on which X-rays are incident in parallel with the opposing both surfaces, or upstream of the core layer along the direction opposite to the traveling direction of the X-ray beam. A shielding zone made of a material that does not transmit X-rays;
The shielding zone has an X-ray wavelength of λ, a focal length of the X-ray waveguide lens structure f, an advancing direction of the X-ray beam AX, and the core layer and the out of the directions orthogonal to the advancing direction AX When the stacking direction of the cladding layer is AZ and the direction orthogonal to the AX and AZ is AY, the distance along the AY direction from the center of the X-ray beam is (2nλf) ^1/2 (n is 0, 1, 2,...) And the position of {(2n + 1) λf} ^1/2 , arranged in any one of the second regions excluding the first region, The length along the AX direction is set to such a dimension that there is no X-ray that passes through the shielding zone,
The laminated Fresnel zone plate structure is a structure in which a heavy element layer made of a material that does not transmit X-rays and a light element layer made of a material that transmits X-rays are alternately stacked. When the focal length of the type Fresnel zone plate structure is f ₁ , the distance along the AZ direction from the center of the X-ray beam is (2nλf ₁ ) ^1/2 and {(2n + 1) λf ₁ } ^1/2 Arranged in one of the third region between the positions of the first region and the fourth region excluding the third region,
The end surface on the exit side of the laminated Fresnel zone plate structure is at a position of a distance L downstream from the end surface on the exit side of the shielding zone along the AX direction,
An X-ray condenser lens, wherein a relationship of f = f ₁ + L is established between a focal length f of the X-ray waveguide lens structure and a focal length f ₁ of the laminated Fresnel zone plate structure. The X-ray condenser lens according to claim 1,
An X-ray condenser lens, wherein the X-ray waveguide lens structure and the laminated Fresnel zone plate structure are fabricated on the same substrate . The X-ray condensing lens according to claim 1 or 2 ,
The layered Fresnel zone plate structure heavy element layers are W, Ru, Ta, Rb, Sr, Y, Zr, Nb, Mo, Pd, Ag, Cd, In, Ba, Re, Os, Ir, Pt, Au. , Pb, Tl, V, Cr, Mn, Fe, Co, Ni, Cu, and a material containing at least one of Zn,
The X-ray condenser lens , wherein the light element layer is made of a material including at least one of C, Si, Be, Ca, Sc, Ti, V, Cr, Mn, Te, and a polymer material .

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