JP4724581B2 - Surface-treated metal material with excellent magnetic properties and method for producing the same - Google Patents
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本発明は、高けい素鉄系合金めっきを表面に有する磁気特性に優れた金属材とその製造方法に関するものである。 The present invention relates to a metal material having high magnetic iron-based alloy plating on the surface and excellent magnetic properties, and a method for producing the same.
鋼中のけい素は鋼板の強度を増す等の優れた特性を持つため、鉄鋼材料の添加元素として有益に用いられている。その中でも、特に、高けい素含有鋼板は電磁特性に優れるため、モーターやトランス等の電磁材料として幅広く用いられている。けい素の添加は、鋼の電気抵抗を高め、全鉄損を低下させる効果がある。したがって、高けい素含有鋼のけい素量が増えるほど鉄損が低減され、けい素量が6.5%で磁歪がゼロとなり、最大透磁率がピークとなり、理想的な電磁特性を示すことが従来から知られている。 Silicon in steel has excellent properties such as increasing the strength of steel plates, and is therefore beneficially used as an additive element in steel materials. Among them, in particular, high silicon-containing steel sheets are widely used as electromagnetic materials for motors and transformers because of their excellent electromagnetic characteristics. The addition of silicon has the effect of increasing the electrical resistance of the steel and reducing the total iron loss. Therefore, iron loss is reduced as the silicon content of high-silicon steel increases, and magnetostriction is zero when the silicon content is 6.5%, the maximum permeability is peak, and it has traditionally shown ideal electromagnetic characteristics. Are known.
現在、主に高けい素含有鋼板は圧延法によって製造されるが、加工性が悪いため、けい素量で3.5%程度までのものしか製造されていない。これは圧延時の加工で割れが入り、生産が難しいためである。これを克服するために、Siの成分比率を上げることなく特性を高めるために、圧延方法を種々工夫する等の方法が提案されている(特許文献1)。一方で、圧延法に代わる種々の方法が提案されている。例えば、四塩化けい素ガス中で化学気相蒸着し、加熱拡散させることで高けい素含有鋼板を作る方法が提案されている(特許文献2、3)。この方法では圧延時に割れが入る心配はない。また、蒸着法ではなく、溶融めっき法もしくは溶融塩電解法で、AlもしくはAl-Mnめっきを施し、電磁特性の優れた鋼板を製造する方法も提案されている(特許文献3、4)。この方法は、加工時の割れがなく、また、皮膜の成長速度も速く、経済的にも優れた方法と言える。 At present, high silicon-containing steel sheets are mainly produced by a rolling method, but due to poor workability, only about 3.5% silicon is produced. This is because cracks occur during processing during rolling, and production is difficult. In order to overcome this, a method such as devising various rolling methods has been proposed in order to improve the characteristics without increasing the Si component ratio (Patent Document 1). On the other hand, various methods in place of the rolling method have been proposed. For example, a method of producing a high silicon-containing steel sheet by chemical vapor deposition in silicon tetrachloride gas and heat diffusion is proposed (Patent Documents 2 and 3). With this method, there is no worry of cracking during rolling. In addition, a method for producing a steel plate having excellent electromagnetic properties by performing Al or Al-Mn plating by a hot dipping method or a molten salt electrolysis method instead of a vapor deposition method has been proposed (Patent Documents 3 and 4). This method has no cracking during processing, and the film growth rate is fast, so it can be said that this method is economically excellent.
しかしながら、例えば、特許文献1の方法は、本質的な解決方法ではなく、しかも経済的とは言えない。また、特許文献2、3の方法は、一般に、皮膜の成長速度が遅く、工業的に不可能ではないにせよ、経済的な方法とは考えられていない。特許文献3、4の溶融めっき法もしくは溶融塩電解法でAlもしくはAl-Mnめっきを施す方法は、けい素鋼板の特性と比べると、代替法としての限界が見られ、6.5%Si鋼と比べて劣ると言わざるを得ない。この方法を単純にけい素に適用することも考えられるが、溶融めっき法でけい素をめっきしようとすると、Alと比べて高いめっき浴温にしなくてはならず、また、けい素の酸化が激しく、実用的な方法とは言えない。 However, for example, the method of Patent Document 1 is not an essential solution and is not economical. In addition, the methods of Patent Documents 2 and 3 are generally not considered to be economical methods, although the film growth rate is generally slow and not industrially impossible. The method of applying Al or Al-Mn plating by the hot dipping method or the molten salt electrolysis method of Patent Documents 3 and 4 has a limit as an alternative method compared to the characteristics of silicon steel plate, compared with 6.5% Si steel I must say it is inferior. It is conceivable to apply this method to silicon. However, if silicon is to be plated by the hot dipping method, the plating bath temperature must be higher than that of Al. It is intense and not a practical method.
本発明は、上述の問題に鑑みて、特別な高温を必要とせず、かつ成膜速度の速い経済的な製造方法により、磁気特性に優れた表面処理金属材を提供しようとするものである。 In view of the above problems, the present invention seeks to provide a surface-treated metal material having excellent magnetic properties by an economical manufacturing method that does not require a special high temperature and has a high film formation rate.
本発明者らは、代替元素によらずSi濃度の高い金属材料の製造技術に拘り、種々の検討を行った。けい素は、前述のように融点が高く、酸化性も高く、また通常の水溶液からの電気めっきも不可能な元素である。 The inventors of the present invention have made various studies on the manufacturing technology of a metal material having a high Si concentration regardless of an alternative element. As described above, silicon is an element having a high melting point, high oxidizability, and impossibility of electroplating from a normal aqueous solution.
上記課題を解決するために、本発明者らは鋭意検討を重ねた結果、以下の(1)〜(7)を要旨とする発明に至った。これは、けい素を主成分とする金属微粒子を分散させた鉄系めっきを金属材料上に形成することで、優れた磁気特性を示す金属材料になることを見出したことによるものである。 In order to solve the above-mentioned problems, the present inventors have intensively studied, and as a result, have arrived at the inventions having the following (1) to (7). This is because it has been found that a metal material exhibiting excellent magnetic properties can be obtained by forming an iron-based plating in which metal fine particles mainly composed of silicon are dispersed on a metal material.
即ち、
(1) Fe 2+ 、Ni 2+ 、Co 2+ イオンのうち少なくとも1種類を含む水溶液中に、Siを主成分としSiと不可避不純物以外に選択元素としてFe、Al、Mnのうち1種以上のみを含むことができる微粒子を懸濁させためっき浴を用いて、金属材料の少なくとも一部の表面に、前記Si微粒子が分散した鉄系めっき層を電気めっきで形成することで金属材料の少なくとも一部の表面に、Si含有鉄系めっき層を有する表面処理金属材であって、前記めっき層中のSi含有量が3.5質量%超10質量%以下であることを特徴とする表面処理金属材。
(2) 前記表面処理金属材が前記電気めっきの後、さらに1000℃以上1200℃以下の温度で加熱拡散処理されたものであることを特徴とする(1)に記載の表面処理金属材。
(3) 前記めっき層が、質量%で、Al:2.0%超8.0%以下、Mn:0.5%超1.5%以下の少なくとも1種類を含むことを特徴とする(1)または(2)に記載の表面処理金属材。
(4) 前記めっき層の厚さが、1μm以上100μm以下である(1) 〜(3)のいずれかに記載の表面処理金属材。
(5) 前記金属材料の組成が、質量%で、C:0.001%以上0.010%以下、Si:0.01%以上3.5%以下、Mn:1.5%以下、Al:0.001%以上3.0%以下であり、残部がFe及び不可避的不純物である(1)〜(4)のいずれかに記載の表面処理金属材。
(6) Fe2+、Ni2+、Co2+イオンのうち少なくとも1種類を含む水溶液中にSiを主成分とする微粒子を懸濁させためっき浴を用いて、金属材料の少なくとも一部の表面に、Si微粒子が分散した鉄系めっき層を電気めっきで形成するもので、前記Siを主成分とする微粒子がSiと不可避不純物以外に選択元素としてFe、Al、Mnのうち1種以上のみを含むことができることを特徴とする磁気特性に優れた表面処理金属材の製造方法。
(7) 前記電気めっき後、さらに1000℃以上1200℃以下の温度で加熱拡散処理する(6)に記載の表面処理金属材の製造方法。
That is,
(1) In an aqueous solution containing at least one of Fe 2+ , Ni 2+ , and Co 2+ ions, one or more of Fe, Al, and Mn as selective elements in addition to Si and unavoidable impurities in Si as a main component At least part of the surface of the metal material, and an iron-based plating layer in which the Si particles are dispersed is formed by electroplating on at least a part of the surface of the metal material. a part of the surface, a surface treated metal material having a Si-containing iron-based plating layer, the front surface process you wherein the Si content of the plating layer is not more than 3.5 mass percent 10 wt% Metal material.
(2) The surface-treated metal material according to (1), wherein the surface-treated metal material is subjected to a heat diffusion treatment at a temperature of 1000 ° C. to 1200 ° C. after the electroplating.
(3) the plating layer, by mass%, Al: 2.0 percent 8.0% or less, Mn: according to, characterized in that it comprises at least one 0.5 percent 1.5% or less (1) or (2) Table surface-treated metal material.
(4) the thickness of the plating layer is 1μm or more 100μm or less (1) front surface treated metal material according to any one of the - (3).
(5) The composition of the metal material is, by mass%, C: 0.001% to 0.010%, Si: 0.01% to 3.5%, Mn: 1.5% or less, Al: 0.001% to 3.0%, and the balance There is a Fe and unavoidable impurities (1) front surface treated metal material according to any one of the - (4).
(6) Using a plating bath in which fine particles containing Si as a main component are suspended in an aqueous solution containing at least one kind of Fe 2+ , Ni 2+ , and Co 2+ ions, An iron-based plating layer in which Si fine particles are dispersed is formed on the surface by electroplating, and the fine particles mainly composed of Si include only one or more of Fe, Al, and Mn as selective elements in addition to Si and inevitable impurities. The manufacturing method of the surface treatment metal material excellent in the magnetic characteristic characterized by being able to contain .
(7) The method for producing a surface-treated metal material according to (6), wherein after the electroplating, a heat diffusion treatment is further performed at a temperature of 1000 ° C. or higher and 1200 ° C. or lower.
本発明によれば、磁気特性に優れた金属材料を圧延法や蒸着法によらずに、効率よく提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the metal material excellent in the magnetic characteristic can be provided efficiently irrespective of a rolling method or a vapor deposition method.
以下、本発明の詳細について説明する。 Details of the present invention will be described below.
本発明で述べる鉄系めっき層とは、鉄、ニッケル、コバルトのうち、いずれか1種もしくは2種以上を質量%で50%以上含有するめっきのことであり、以後、鉄系めっきと称する。電磁鋼板として利用する場合には、鉄、ニッケル、コバルトは電磁特性の優れた元素である。また、それらの合金とすることも構わないが、磁気特性を効果的に生じるためにはこれら3種類の元素を合計で50質量%以上含有することが必要である。 The iron-based plating layer described in the present invention is a plating containing 50% or more by mass% of any one or more of iron, nickel, and cobalt, and hereinafter referred to as iron-based plating. When used as an electromagnetic steel sheet, iron, nickel, and cobalt are elements having excellent electromagnetic characteristics. Although these alloys may be used, it is necessary to contain a total of 50% by mass or more of these three types of elements in order to effectively produce magnetic properties.
次に、本発明に用いられるけい素を主成分とする微粒子について説明する。この微粒子は、不可避的に表面に存在する酸化物等はあるものの、それ以外は酸素、窒素等との化合物を形成していない元素からなる微粒子のことである。その元素が、本発明ではけい素を主成分とするものである。本発明において、この微粒子がけい素を主成分とすることは必須であるが、磁気特性に有効な元素、例えばFe、Al、Mn等を含むことはさらに有効である。 Next, the fine particles mainly composed of silicon used in the present invention will be described. These fine particles are fine particles composed of elements that inevitably have oxides and the like present on the surface but otherwise do not form a compound with oxygen, nitrogen, or the like. This element is mainly composed of silicon in the present invention. In the present invention, it is essential that the fine particles contain silicon as a main component, but it is more effective that the fine particles contain an element effective for magnetic properties, for example, Fe, Al, Mn and the like.
Alは磁気特性に有効な元素であるが、Siと同様に圧延加工性を劣化させるので、本発明でめっき層中に存在させることは有効である。また、Si、Alと同様にMgは水溶液からの電気めっきが難しい元素であり、めっき層中に存在させるために、金属微粒子中に含有させることは有効である。また、加熱拡散を容易にする目的からも、Fe、Alとの合金にすることが好ましい。 Al is an element effective for magnetic properties, but it deteriorates rolling workability like Si, so that it is effective to be present in the plating layer in the present invention. In addition, like Si and Al, Mg is an element that is difficult to electroplate from an aqueous solution, and it is effective to contain Mg in the metal fine particles because it is present in the plating layer. Also, for the purpose of facilitating heat diffusion, an alloy with Fe or Al is preferable.
なお、「けい素を主成分とする」とは、微粒子中で、けい素が構成元素中で最大含有量を持つことであり、好ましくは50質量%以上を占めることをいう。 “Containing silicon as a main component” means that silicon has the maximum content among constituent elements in fine particles, and preferably 50% by mass or more.
このような微粒子をめっき層中に分散させるが、その分散量は、めっき層中のSi換算の質量%が3.5%超〜10%の範囲でなければならない。磁気特性、特に鉄損は、鋼中のけい素含有量が6.5%で最小となるが、その後、上昇に転じ、10%を越えるとSi含有量が3.5%のときの鉄損と変わらないか、劣るようになるため、10%超添加することは無意味である。3.5%以下のけい素含有量では、圧延法で製造が容易であり、本発明の効果が現れない。 Such fine particles are dispersed in the plating layer, and the amount of the dispersion should be in the range of more than 3.5% to 10% by mass in terms of Si in the plating layer. Magnetic properties, especially iron loss, are minimized when the silicon content in steel is 6.5%, but then turn up, and if it exceeds 10%, is it the same as the iron loss when the Si content is 3.5%? Since it becomes inferior, it is meaningless to add more than 10%. When the silicon content is 3.5% or less, the production by the rolling method is easy, and the effect of the present invention does not appear.
また、めっき層中にSiと同時にAlもしくはMnを存在させることで、電気抵抗を増加させ、磁気特性をさらに向上させることができる。その量はAlの質量%で2.0%超7.0%以下が望ましい。2.0%以下ではSiと同様に圧延法で製造が可能であり、本発明の効果が現れない。7.0%を超えると効果が飽和するためこれを上限とする。Mnの添加量は0.5%以下では効果が殆ど現れない。また1.5%を超えると効果が飽和するため、0.5%超1.5%以下とする。 In addition, the presence of Al or Mn simultaneously with Si in the plating layer can increase the electric resistance and further improve the magnetic properties. The amount is preferably 2.0% to 7.0% by mass% of Al. If it is 2.0% or less, it can be produced by a rolling method like Si, and the effect of the present invention does not appear. If it exceeds 7.0%, the effect is saturated, so this is the upper limit. When the amount of Mn added is 0.5% or less, almost no effect appears. Also, if it exceeds 1.5%, the effect will be saturated, so over 0.5% and 1.5% or less.
めっき厚は1μm〜100μmの範囲とすることが好ましい。磁気特性を示すためには、めっき厚が1μm未満では効果が期待できないことが多い。また、高Si含有鋼が優れた電磁特性を示す1kHz以上の高周波数域では、100μm超の厚みで効果が飽和するためである。 The plating thickness is preferably in the range of 1 μm to 100 μm. In order to show magnetic characteristics, the effect is often not expected when the plating thickness is less than 1 μm. Further, the effect is saturated at a thickness of more than 100 μm in a high frequency range of 1 kHz or higher where high Si-containing steel exhibits excellent electromagnetic characteristics.
めっき中に存在するけい素の定量は、蛍光X線等の方法で確認が可能である。鋼板中にけい素が有意に含まれる場合には、断面のEPMA分析等でけい素の存在を定量化することが可能である。けい素と酸素や窒素の分布を比較することで、化合物を形成していないけい素か酸化けい素等の化合物かを同定することもできる。また、圧延された鋼板とFeめっきの組織の違いから、めっきに存在するか鋼板に存在するかの識別も容易である。 Quantification of silicon present during plating can be confirmed by methods such as fluorescent X-rays. When silicon is significantly contained in the steel sheet, the presence of silicon can be quantified by EPMA analysis of a cross section or the like. By comparing the distribution of silicon and oxygen or nitrogen, it is also possible to identify whether the compound is not a compound such as silicon or silicon oxide. Moreover, it is easy to identify whether it exists in the plating or in the steel sheet because of the difference in structure between the rolled steel sheet and the Fe plating.
このようなけい素を主体とする微粒子を分散させた鉄めっきが金属材料の少なくとも一部の表面に存在することにより、磁気特性が向上するものである。 Such iron plating in which fine particles mainly containing silicon are dispersed is present on at least a part of the surface of the metal material, thereby improving the magnetic characteristics.
上記のめっき層をさらに加熱拡散処理することは、めっき層の均一性をさらに高めるためより望ましいことである。この加熱処理は、表面に酸化層を形成させないため、不活性もしくは還元性雰囲気で行われることが適当である。加熱温度は、1000℃以上であれば拡散が効率的に進めることが可能である。温度が高いほど拡散が速く進むが、経済性、汎用性から1200℃を上限とする。 It is more desirable to further subject the plating layer to heat diffusion treatment in order to further improve the uniformity of the plating layer. This heat treatment is suitably performed in an inert or reducing atmosphere in order not to form an oxide layer on the surface. If the heating temperature is 1000 ° C. or higher, diffusion can proceed efficiently. The higher the temperature, the faster the diffusion, but the upper limit is 1200 ° C due to economy and versatility.
基材となる金属材料は、鉄鋼やアルミニウム、銅等の金属が考えられるが、特に組成が、質量%で、C:0.001%以上0.010%以下、Si:0.01%以上3.5%以下、Al:0.001%以上3.0%以下、Mn:1.5%以下であり、残部がFe及び不可避的不純物である鉄鋼材料であれば、より良い磁気特性を示すことが期待できる。 The metal material used as the base material may be a metal such as steel, aluminum, or copper, but the composition is particularly mass%, C: 0.001% to 0.010%, Si: 0.01% to 3.5%, Al: 0.001 If it is a steel material that is not less than 3.0% and not more than 3.0% and Mn: not more than 1.5% and the balance is Fe and inevitable impurities, it can be expected to show better magnetic properties.
Cは、鋼板の強度向上等に有効な元素であり、0.001%以上の添加が望ましいが、0.01%を超えると鉄損に悪影響を示す。 C is an element effective for improving the strength of the steel sheet, and is preferably added in an amount of 0.001% or more. However, if it exceeds 0.01%, the iron loss is adversely affected.
Siは、電気抵抗を上げ磁気特性に効果的であるため、0.1%以上の添加が望ましいが、3.5%を超えると加工性に劣る。 Since Si increases electric resistance and is effective for magnetic properties, addition of 0.1% or more is desirable. However, if it exceeds 3.5%, workability is inferior.
Alも、Si同様磁気特性に有効な元素であり、0.001%以上の添加が望ましいが、鋼を鋳造する時や圧延時に悪影響を示すので、上限を3.0%とする。 Al is also an element effective for magnetic properties like Si, and is preferably added in an amount of 0.001% or more. However, since it shows an adverse effect when steel is cast or rolled, the upper limit is made 3.0%.
Mnも、Si、Alと同様に電気抵抗を上げるために有効であるが、経済性の観点から上限を1.5%とした。 Mn is also effective for increasing the electrical resistance like Si and Al, but the upper limit was set to 1.5% from the viewpoint of economy.
金属材料に施される鉄系めっき層の形成方法は、電気めっき法により形成するのが好適である。鉄めっきの場合のめっき浴成分は、例えば、非特許文献1に記載されるような硫酸鉄もしくは塩化鉄を用いる通常の方法で構わない。目的によっては、鉄、ニッケル、コバルト以外の元素、例えば、亜鉛と鉄との合金めっき浴とすることも可能である。亜鉛は耐食性等に寄与することが期待できる。ただし、亜鉛は、沸点が低いため、加熱拡散を伴う場合、温度には気をつけることが求められる。 The method for forming the iron-based plating layer applied to the metal material is preferably formed by electroplating. The plating bath component in the case of iron plating may be an ordinary method using iron sulfate or iron chloride as described in Non-Patent Document 1, for example. Depending on the purpose, an alloy plating bath of elements other than iron, nickel and cobalt, for example, zinc and iron can be used. Zinc can be expected to contribute to corrosion resistance and the like. However, since zinc has a low boiling point, it is required to be careful of temperature when accompanied by heat diffusion.
微粒子の製造方法は特に規定しない。けい素もしくはけい素合金のインゴットを粉砕して分級する方法が経済的かつ一般的である。微粒子のサイズは、めっき中に存在させることから、めっき皮膜厚より小さいことが必要となる。磁気特性を示すためには小さいサイズの方が効果的で、さらにめっきへの取り込みの効率から、直径5μm以下の粉末が50%以上(平均粒径が5μm程度を示す)を占めることが適当である。さらに望ましくは、直径1μm以下の粉末が50%以上を占めることである。 The method for producing fine particles is not particularly defined. A method of pulverizing and classifying silicon or a silicon alloy ingot is economical and general. Since the size of the fine particles is present during plating, it is necessary to be smaller than the plating film thickness. Smaller sizes are more effective for exhibiting magnetic properties, and it is appropriate that powder with a diameter of 5 μm or less accounts for 50% or more (average particle size is about 5 μm) from the efficiency of incorporation into plating. is there. More desirably, the powder having a diameter of 1 μm or less accounts for 50% or more.
上記のけい素を主成分とする微粒子をめっき液中に懸濁させてめっき液とする。懸濁させる微粒子の量は厳しく規定されるものではないが、あまり少ないと必要量が取り込めず、めっき効率が下がり、ある程度以上多くても効果がなく、経済的に見合わないためめっき液1L当たり、5g以上50g以下でよい。粉末を効率よくめっき皮膜中に取り込むために、めっき液に界面活性剤を加えることは好ましい。しかし、界面活性剤を過度に加えると、めっきそのものの効率の低下、鉄比率の高いめっき液の場合、表面性状の悪化等の問題を生じることもあるので、界面活性剤の添加量はめっき液1L当たり0.01g以上、5g以下にすることが望ましい。 The fine particles containing silicon as a main component are suspended in a plating solution to obtain a plating solution. The amount of fine particles to be suspended is not strictly defined, but if it is too small, the required amount cannot be taken in, the plating efficiency will be reduced, and if it exceeds a certain level, it will not be effective and it will not be economically appropriate, so it will not be economically appropriate. 5 g or more and 50 g or less. In order to efficiently incorporate the powder into the plating film, it is preferable to add a surfactant to the plating solution. However, excessive addition of a surfactant may cause problems such as a decrease in the efficiency of the plating itself and deterioration of surface properties in the case of a plating solution with a high iron ratio. Desirably 0.01 g or more and 5 g or less per liter.
上記のような、めっき液を用いて、金属材料に電気めっきする方法は、従来から行われている電気めっきの方法で構わない。 A method of electroplating a metal material using a plating solution as described above may be a conventional electroplating method.
また、Siを含む鉄系めっき層の形成方法としては、上記、水溶液からの電気めっきの他に、非水溶液溶媒を用いた低融点の溶融塩電解法も有効である。 In addition to the above-described electroplating from an aqueous solution, a low melting point molten salt electrolysis method using a non-aqueous solvent is also effective as a method for forming an iron-based plating layer containing Si.
電気めっき法により、Siを含む金属めっきを形成した後、加熱拡散処理することは、例えば、連続ライン中での、合金化炉のような加熱でも、めっき後のコイル毎に加熱するバッチ焼鈍でも構わない。冷却速度は特に規定しない。強度、加工性等求められる特性によって、任意の冷却速度を選ぶことが可能である。 After forming a metal plating containing Si by electroplating, heat diffusion treatment can be performed, for example, in a continuous line, such as heating in an alloying furnace, or batch annealing in which each coil after plating is heated. I do not care. The cooling rate is not specified. An arbitrary cooling rate can be selected depending on required properties such as strength and workability.
このようにして製造された表面処理金属材料は、その後、周知の後処理、例えば、化成処理、絶縁被膜の形成等を行うことができる。 The surface-treated metal material thus manufactured can then be subjected to well-known post-treatments such as chemical conversion treatment and formation of an insulating film.
本発明の表面処理金属材は、無方向性電磁鋼板と同等、もしくはそれを凌ぐ特性を持つ材料としてモーター等に使用することができる。 The surface-treated metal material of the present invention can be used for a motor or the like as a material having characteristics equivalent to or surpassing that of a non-oriented electrical steel sheet.
(実施例1)
質量%で、C:0.015%、Si:0.05%、Mn:0.2%、Al:0.03%を含み、残部がFe及び不可避的不純物である板厚0.1mmの冷間圧延鋼板を用いて、これを脱脂、酸洗後、下記に示すめっき条件での電気めっき法により、Si微粒子分散Feめっきを冷間圧延鋼板の表面に施した。
<めっき条件>
陽極:SS400
浴組成:FeSO4・7H2O 250g/L FeCl2・4H2O 35g/L NH4Cl 20g/L
(pHを3.0〜3.5に調整) 界面活性剤(第一製薬工業製;シャロールDC-902P)0.05g/L
添加微粒子:Si微粒子(純度:99.8%、平均粒径0.8μm)
微粒子添加量:25〜50g/Lの範囲で変化
めっき浴温:35℃
電流密度:10A/dm2〜50A/dm2
通電時間:30〜600sec
浴の攪拌:板速度が60m/minに相当するように攪拌
上記条件で電気めっきすることにより、Si微粒子を分散させたFeめっきを形成した。めっき厚は、電流密度もしくは通電時間で制御した。微粒子の分散量は、めっき液中への添加量で制御した。冷却後の鋼板を、JIS-C2550(2000)に示された方法で、1kg当りの鉄損(W1/10k)を測定した。結果を表1に示す。
(Example 1)
By using a cold rolled steel sheet with a thickness of 0.1 mm, which includes C: 0.015%, Si: 0.05%, Mn: 0.2%, Al: 0.03%, the balance being Fe and unavoidable impurities. After degreasing and pickling, Si fine particle-dispersed Fe plating was applied to the surface of the cold-rolled steel sheet by electroplating under the following plating conditions.
<Plating conditions>
Anode: SS400
Bath composition: FeSO 4・ 7H 2 O 250g / L FeCl 2・ 4H 2 O 35g / L NH 4 Cl 20g / L
(pH adjusted to 3.0-3.5) Surfactant (Daiichi Pharmaceutical Co., Ltd .; Charol DC-902P) 0.05g / L
Additive fine particles: Si fine particles (Purity: 99.8%, average particle size 0.8μm)
Addition amount of fine particles: Change in the range of 25-50g / L Plating bath temperature: 35 ° C
Current density: 10 A / dm 2 to 50 A / dm 2
Energizing time: 30 ~ 600sec
Stirring of the bath: Stirring so that the plate speed corresponds to 60 m / min. Electroplating was performed under the above conditions to form Fe plating in which Si fine particles were dispersed. The plating thickness was controlled by current density or energization time. The amount of fine particles dispersed was controlled by the amount added to the plating solution. The iron loss per kilogram (W 1 / 10k ) of the steel sheet after cooling was measured by the method shown in JIS-C2550 (2000). The results are shown in Table 1.
表1から分かるように、本発明によるめっき皮膜を形成することで鉄損が大幅に下がり、優れた電磁特性を示す電磁鋼板が製造できる。 As can be seen from Table 1, by forming the plating film according to the present invention, the iron loss is greatly reduced, and an electrical steel sheet exhibiting excellent electromagnetic properties can be produced.
(実施例2)
質量%で、C:0.003%、Si:3.0%、Mn:0.2%、Al:1.2%を含み、残部がFe及び不可避的不純物である板厚0.1mmの冷間圧延鋼板を用いて、これを脱脂、酸洗後、下記に示すめっき条件での電気めっき法により、Si微粒子分散Niめっきを冷間圧延鋼板の表面に施した。
<めっき条件>
陽極:SS400
浴組成:NiSO4・6H2O 240g/L NiCl2・6H2O 45g/L H3BO3 20g/L
(pHを3.0〜4.5) 界面活性剤(第一製薬工業製;シャロールDC-902P)0.05g/L
添加金属微粒子:Si微粒子(純度:99.8%、平均粒径0.8μm)
微粒子添加量:25〜50g/Lの範囲で変化
めっき浴温:35℃
電流密度:10A/dm2〜50A/dm2
通電時間:30〜600sec
浴の攪拌:板速度が60m/minに相当するように攪拌
上記条件で電気めっきすることにより、Si微粒子を分散させたNiめっきを形成した。めっき厚は、電流密度もしくは通電時間で制御した。微粒子の分散量は、めっき液中への添加量で制御した。めっき後の鋼板を、JIS-C2550(2000)に示された方法で、1kg当りの鉄損(W1/10k)を測定した。結果を表2に示す。
(Example 2)
Using cold-rolled steel sheet with a thickness of 0.1 mm, which includes C: 0.003%, Si: 3.0%, Mn: 0.2%, Al: 1.2%, the balance being Fe and unavoidable impurities, After degreasing and pickling, Si fine particle dispersed Ni plating was applied to the surface of the cold-rolled steel sheet by electroplating under the following plating conditions.
<Plating conditions>
Anode: SS400
Bath composition: NiSO 4 · 6H 2 O 240g / L NiCl 2 · 6H 2 O 45g / LH 3 BO 3 20g / L
(pH 3.0-4.5) Surfactant (Daiichi Pharmaceutical Co., Ltd .; Charol DC-902P) 0.05g / L
Additive metal fine particles: Si fine particles (purity: 99.8%, average particle size 0.8 μm)
Addition amount of fine particles: Change in the range of 25-50g / L Plating bath temperature: 35 ° C
Current density: 10 A / dm 2 to 50 A / dm 2
Energizing time: 30 ~ 600sec
Stirring of the bath: Stirring so that the plate speed corresponds to 60 m / min. Electroplating was performed under the above conditions to form Ni plating in which Si fine particles were dispersed. The plating thickness was controlled by current density or energization time. The amount of fine particles dispersed was controlled by the amount added to the plating solution. The iron loss per kilogram (W 1 / 10k ) of the steel sheet after plating was measured by the method shown in JIS-C2550 (2000). The results are shown in Table 2.
表2から分かるように、本発明によるめっき皮膜を形成することで鉄損が大幅に下がり、優れた電磁特性を示す電磁鋼板が製造できる。 As can be seen from Table 2, by forming the plating film according to the present invention, the iron loss is greatly reduced, and an electrical steel sheet exhibiting excellent electromagnetic properties can be produced.
(実施例3)
質量%で、C:0.003%、Si:3.0%、Mn:0.2%、Al:1.2%を含み、残部がFe及び不可避的不純物である板厚0.1mmの冷間圧延鋼板を用いて、これを脱脂、酸洗後、下記に示すめっき条件での電気めっき法により、Si-48%Fe微粒子分散Feめっきを冷間圧延鋼板の表面に施した。
<めっき条件>
陽極:SS400
浴組成:FeSO4・7H2O 250g/L FeCl2・4H2O 35g/L NH4Cl 20g/L
(pHを3.0〜3.5に調整) 界面活性剤(第一製薬工業製;シャロールDC-902P)0.05g/L
添加金属微粒子:Si-48%Fe微粒子(平均粒径3.4μm)
微粒子添加量:50〜100g/Lの範囲で変化
めっき浴温:35℃
電流密度:10A/dm2〜50A/dm2
通電時間:30〜600sec
浴の攪拌:板速度が60m/minに相当するように攪拌
上記条件で電気めっきすることにより、Si-48%Fe微粒子を分散させたFeめっきを形成した。めっき厚は、電流密度もしくは通電時間で制御した。微粒子の分散量は、めっき液中への添加量で制御した。めっき後の鋼板を、JIS-C2550(2000)に示された方法で、1kg当りの鉄損(W1/10k)を測定した。No.54〜No.57は、その後、N2-10%H2雰囲気で1200℃、1時間加熱処理を行った。結果を表3に示す。
(Example 3)
Using cold-rolled steel sheet with a thickness of 0.1 mm, which includes C: 0.003%, Si: 3.0%, Mn: 0.2%, Al: 1.2%, the balance being Fe and unavoidable impurities, After degreasing and pickling, Si-48% Fe fine particle-dispersed Fe plating was applied to the surface of the cold-rolled steel sheet by electroplating under the following plating conditions.
<Plating conditions>
Anode: SS400
Bath composition: FeSO 4・ 7H 2 O 250g / L FeCl 2・ 4H 2 O 35g / L NH 4 Cl 20g / L
(pH adjusted to 3.0-3.5) Surfactant (Daiichi Pharmaceutical Co., Ltd .; Charol DC-902P) 0.05g / L
Additive metal fine particles: Si-48% Fe fine particles (average particle size 3.4μm)
Addition amount of fine particles: Change in the range of 50-100g / L Plating bath temperature: 35 ° C
Current density: 10 A / dm 2 to 50 A / dm 2
Energizing time: 30 ~ 600sec
Stirring of the bath: Stirring so that the plate speed corresponds to 60 m / min Electroplating was performed under the above conditions to form Fe plating in which Si-48% Fe fine particles were dispersed. The plating thickness was controlled by current density or energization time. The amount of fine particles dispersed was controlled by the amount added to the plating solution. The iron loss per kilogram (W 1 / 10k ) of the steel sheet after plating was measured by the method shown in JIS-C2550 (2000). No. 54 to No. 57 were then heat-treated at 1200 ° C. for 1 hour in an N 2 -10% H 2 atmosphere. The results are shown in Table 3.
表3から分かるように、本発明によるめっき皮膜を形成することで鉄損が大幅に下がり、優れた電磁特性を示す電磁鋼板が製造できる。 As can be seen from Table 3, by forming the plating film according to the present invention, the iron loss is greatly reduced, and an electrical steel sheet exhibiting excellent electromagnetic properties can be produced.
(実施例4)
質量%で、C:0.003%、Si:3.0%、Mn:0.2%、Al:1.2%を含み、残部がFe及び不可避的不純物である板厚0.1mmの冷間圧延鋼板を用いて、これを脱脂、酸洗後、下記に示すめっき条件での電気めっき法により、Si-40%Al微粒子分散Ni-20%Feめっきを冷間圧延鋼板の表面に施した。
<めっき条件>
陽極:SS400
浴組成:FeSO4・7H2O 18g/L NiCl2・6H2O 20g/L NiSO4・7H2O 320g/L
(pHを2.8〜3.0に調整) 界面活性剤(第一製薬工業製;シャロールDC-902P)0.05g/L
添加微粒子:Si-40%Al合金微粒子(平均粒径3.4μm)
微粒子添加量:50〜100g/Lの範囲で変化
めっき浴温:35℃
電流密度:10A/dm2〜50A/dm2
通電時間:30〜600sec
浴の攪拌:板速度が60m/minに相当するように攪拌
上記条件で電気めっきすることにより、Si-40%Al微粒子を分散させたNi-20%Feめっきを形成した。めっき厚は、電流密度もしくは通電時間で制御した。微粒子の分散量は、めっき液中への添加量で制御した。めっき後の鋼板を、JIS-C2550(2000)に示された方法で、1kg当りの鉄損(W1/10k)を測定した。No.72〜No.75は、その後、N2-10%H2雰囲気で1200℃、1時間加熱処理を行った。結果を表4に示す。
(Example 4)
Using cold-rolled steel sheet with a thickness of 0.1 mm, which includes C: 0.003%, Si: 3.0%, Mn: 0.2%, Al: 1.2%, the balance being Fe and unavoidable impurities, After degreasing and pickling, Si-40% Al fine particle dispersed Ni-20% Fe plating was applied to the surface of the cold-rolled steel sheet by electroplating under the following plating conditions.
<Plating conditions>
Anode: SS400
Bath composition: FeSO 4・ 7H 2 O 18g / L NiCl 2・ 6H 2 O 20g / L NiSO 4・ 7H 2 O 320g / L
(Adjust pH to 2.8-3.0) Surfactant (Daiichi Pharmaceutical Co., Ltd .; Charol DC-902P) 0.05g / L
Additive fine particles: Si-40% Al alloy fine particles (average particle size 3.4μm)
Addition amount of fine particles: Change in the range of 50-100g / L Plating bath temperature: 35 ° C
Current density: 10 A / dm 2 to 50 A / dm 2
Energizing time: 30 ~ 600sec
Stirring of the bath: Stirring so that the plate speed corresponds to 60 m / min Electroplating was performed under the above conditions to form Ni-20% Fe plating in which Si-40% Al fine particles were dispersed. The plating thickness was controlled by current density or energization time. The amount of fine particles dispersed was controlled by the amount added to the plating solution. The iron loss per kilogram (W 1 / 10k ) of the steel sheet after plating was measured by the method shown in JIS-C2550 (2000). No. 72 to No. 75 were then heat-treated at 1200 ° C. for 1 hour in an N 2 -10% H 2 atmosphere. The results are shown in Table 4.
表4から分かるように、本発明によるめっき皮膜を形成することで鉄損が大幅に下がり、優れた電磁特性を示す電磁鋼板が製造できる。 As can be seen from Table 4, by forming the plating film according to the present invention, the iron loss is greatly reduced, and an electrical steel sheet exhibiting excellent electromagnetic properties can be produced.
(実施例5)
質量%で、C:0.003%、Si:3.0%、Mn:0.2%、Al:1.2%を含み、残部がFe及び不可避的不純物である板厚0.1mmの冷間圧延鋼板を用いて、これを脱脂、酸洗後、下記に示すめっき条件での電気めっき法により、Si-40%Al微粒子分散Feめっきを冷間圧延鋼板の表面に施した。
<めっき条件>
陽極:SS400
浴組成:FeSO4・7H2O 18g/L NiCl2・6H2O 20g/L NiSO4・7H2O 320g/L
(pHを2.8〜3.0に調整) 界面活性剤(第一製薬工業製;シャロールDC-902P)0.05g/L
添加微粒子:Si-33%Al-17%Mn合金微粒子(平均粒径3.4μm)
微粒子添加量:50〜100g/Lの範囲で変化
めっき浴温:35℃、電流密度:50A/dm2、通電時間:170sec
浴の攪拌:板速度が60m/minに相当するように攪拌
上記条件で電気めっきすることにより、Si-33%Al-17%Mn微粒子を分散させたNi-20%Feめっきを形成した。微粒子の分散量は、めっき液中への添加量で制御した。めっき後の鋼板を、JIS-C2550(2000)に示された方法で、1kg当りの鉄損(W1/10k)を測定した。結果を表5に示す。
(Example 5)
Using cold-rolled steel sheet with a thickness of 0.1 mm, which includes C: 0.003%, Si: 3.0%, Mn: 0.2%, Al: 1.2%, the balance being Fe and unavoidable impurities, After degreasing and pickling, Si-40% Al fine particle dispersed Fe plating was applied to the surface of the cold-rolled steel sheet by electroplating under the following plating conditions.
<Plating conditions>
Anode: SS400
Bath composition: FeSO 4・ 7H 2 O 18g / L NiCl 2・ 6H 2 O 20g / L NiSO 4・ 7H 2 O 320g / L
(Adjust pH to 2.8-3.0) Surfactant (Daiichi Pharmaceutical Co., Ltd .; Charol DC-902P) 0.05g / L
Additive fine particles: Si-33% Al-17% Mn alloy fine particles (average particle size 3.4μm)
Addition amount of fine particles: Change in the range of 50-100g / L Plating bath temperature: 35 ° C, current density: 50A / dm 2, energization time: 170sec
Stirring of bath: Stirring so that the plate speed corresponds to 60 m / min. Electroplating was performed under the above conditions to form Ni-20% Fe plating in which Si-33% Al-17% Mn fine particles were dispersed. The amount of fine particles dispersed was controlled by the amount added to the plating solution. The iron loss per kilogram (W 1 / 10k ) of the steel sheet after plating was measured by the method shown in JIS-C2550 (2000). The results are shown in Table 5.
表5から分かるように、本発明によるめっき皮膜を形成することで鉄損が大幅に下がり、優れた電磁特性を示す電磁鋼板が製造できる。 As can be seen from Table 5, by forming the plating film according to the present invention, the iron loss is greatly reduced, and an electrical steel sheet exhibiting excellent electromagnetic properties can be produced.
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| JP3143684B2 (en) * | 1991-08-09 | 2001-03-07 | 奥野製薬工業株式会社 | Coating method of granular material and composite plating method by magnetic metal coating |
| JPH07102361A (en) * | 1993-08-10 | 1995-04-18 | Nkk Corp | Surface-treated steel sheet with excellent brazability |
| JP3399724B2 (en) * | 1995-10-24 | 2003-04-21 | ヤンマー株式会社 | Sliding member for internal combustion engine |
| JPH09320885A (en) * | 1996-05-28 | 1997-12-12 | Read Rite S M I Kk | Magnetic thin film and method therefor |
| DK1516076T3 (en) * | 2002-06-25 | 2008-06-23 | Integran Technologies Inc | Method for electroplating metallic and metal matrix composite sheets, coatings and microcomponents |
| JP2006082363A (en) * | 2004-09-15 | 2006-03-30 | Seiko Epson Corp | Liquid repellent film |
-
2006
- 2006-03-28 JP JP2006089016A patent/JP4724581B2/en not_active Expired - Lifetime
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| JP2007262492A (en) | 2007-10-11 |
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