JP4731359B2 - Sample vaporizer and ICP analyzer for analyzer - Google Patents

Description

  The present invention is for vaporizing and introducing a liquid sample or a solid sample into a plasma ionization analyzer such as an ICP analyzer or an MIP analyzer, an analyzer having a burner or a frame, or a mass spectrometer. The present invention relates to a sample vaporizing apparatus for an analytical apparatus and an ICP analyzing apparatus using the same.

  2. Description of the Related Art Conventionally, there is known a heating vaporization introducing device that improves the detection sensitivity of an ICP analyzer.

Specifically, this type of heating and vaporization introducing device includes a gas injected into the chamber from a first gas outlet that introduces the gas discharged from the top hole into the chamber while spirally rotating inside the chamber. The gas injected into the chamber from the second gas outlet for injecting the gas released from the top through the chamber from the lower part of the cuvette into the chamber, and the first and second gas regulators, respectively. The flow rate is adjusted separately and independently (see, for example, Patent Document 1).
JP-A-5-121038

  However, in the conventional type, the cuvette and the top hole are largely separated from each other, so that the sample gas containing the sample component is not suitably derived from the top hole and remains in the chamber, and the plasma torch can be analyzed with high accuracy. It has the problem that it cannot.

  The present invention has been made paying attention to such problems, and the main purpose is to prevent the sample gas containing the sample component from remaining in the chamber and to effectively derive the sample gas toward the analyzer. An object of the present invention is to provide an excellent sample vaporizing apparatus for an analytical apparatus that can be used for high-accuracy component analysis.

  In other words, the sample vaporizing apparatus for an analyzer according to the present invention introduces a chamber having a predetermined internal space, a sample mounting portion arranged in the internal space and capable of mounting a sample, and a gas into the chamber. And a gas inlet for the sample mounting unit, and the sample mounting unit is made to approach the limit to the sample mounting unit and vaporizes the sample in the sample mounting unit using the gas. And a sample outlet that leads out of the chamber as sample gas.

  Here, the “sample” may be a liquid sample or a solid sample. Further, any material that can be analyzed with an analyzer such as powder, powder, particles, or a mixture thereof (including so-called slurry) may be used.

  In addition, as a method of placing the sample on the sample placement unit, when the sample is a liquid sample, for example, a method of supplying the sample placement unit using a pipette or the like can be used. In addition, when the sample is a solid sample, it can be picked up with tweezers or the like and supplied to the sample mounting unit, or after the solid sample is dispersed in water and sucked up with a pipette, There is a method of droplets. Moreover, there is a method in which a sample that has been automatically conveyed is automatically placed on a sample placement unit.

  Further, the liquid sample literally refers to a liquid sample, and is a broad concept including, for example, a solid sample dispersed in water or the like.

  In such a case, since the sample mounting portion and the sample outlet are close to the limit, the sample gas vaporized in the chamber is not guided to the sample outlet and is convected in the chamber. This can be prevented and the sample gas can be effectively derived toward the analyzer. In addition, since the sample outlet is close to the limit to the sample mounting part where the sample gas is generated, the flow velocity of the generated sample gas flowing out of the sample outlet is faster, and the analyzer can reach the analyzer quickly. By re-solidifying the sample gas due to the temperature drop, it is possible to prevent the sample from adhering to the wall surface in the tube from the sample vaporizer for the analyzer to the analyzer. Therefore, it contributes to the ability to perform highly accurate component analysis on the sample with the analyzer.

  In other words, excellent sample vaporization for analyzers that prevents sample gas containing sample components from remaining in the chamber, enables sample gas to be effectively derived toward the analyzer, and contributes to highly accurate component analysis. An apparatus can be provided.

  In addition, in order to perform highly accurate component analysis, the chamber has an insertion port into which the distal end side of the sample supply device can be inserted, and the sample mounting portion is supplied from the sample supply device. A sample can be placed, and the sample outlet is exposed to the sample placement part to the extent that it faces the top side of the sample placement part and does not interfere with the tip of the sample feeder inserted from the insertion opening. On the other hand, it is desirable to be close to the limit.

  Here, the sample supply means an instrument for carrying a sample into the chamber, and specifically includes tweezers and pipettes as described above.

  As a desirable mode of the sample outlet of the present invention, the sample outlet may be formed at the tip of the sample outlet tube protruding into the chamber.

  If the chamber is of a substantially bell shape having a cross-sectional shape that gradually expands from the base end to the opening, and the sample outlet tube is of a substantially straight tube extending from the base end of the chamber toward the opening side, Since the gas introduced into the chamber can be prevented from being turbulent due to the shape of the chamber and the arrangement of the sample outlet tube, the sample components contained in the sample gas become uneven. The sample gas can be led out toward the analyzer while preventing the above.

  Here, the “base end of the chamber” refers to a “hanging portion” if compared to a bell, and the “opening of the chamber” similarly refers to an “opening”.

  In order to effectively lead out the sample gas to the analyzer, the sample mounting portion has a hollow portion formed in a substantially bowl-like shape, and the sample outlet has an inner dimension that is expanded from the hollow portion. It is preferable that it has.

  In order to vaporize the sample effectively, it is desirable that the sample mounting part is a heating type.

  If a straight wind shielding part is provided so as to face the gas introduction port and block the straight movement of the gas introduced from the gas introduction port, the gas introduced into the chamber is routed by the straight wind shielding part. Therefore, for example, the gas can be prevented from being led out directly from the sample outlet. Therefore, the sample gas can be derived toward the plasma torch while preventing the sample components contained in the sample gas from becoming uneven.

  In addition, even when the sample mounting part is a heating type, by providing a direct wind shielding part, it is possible to block the straight movement of the gas, and the gas directly hits the sample mounting part as the heating part. Can be prevented, and the temperature drop of the sample mounting portion can be prevented.

  In this case, if the direct wind shielding part is arranged between the gas inlet and the sample mounting part in a straight line, the above-described effect becomes remarkable.

  In order to contribute to a quick and highly accurate analysis, a gas mixed with a halogen gas may be introduced from the gas inlet and the elements in the sample may be vaporized as a halide.

  In this case, by generating a low-boiling halide, it is possible to vaporize at a heating temperature lower than usual, and it is possible to vaporize efficiently and to perform highly sensitive analysis. In the present invention, since the sample outlet is close to the limit to the sample mounting portion as the heating unit, the vicinity of the sample outlet and the sample outlet tube are strongly affected by the temperature. There may be adverse effects such as deformation, but by vaporizing as a halide, it can be vaporized at a temperature lower than usual, so the heating temperature can also be reduced, and the thermal influence on the sample outlet tube and the like can also be reduced.

  As a specific aspect of supplying the sample to the sample mounting unit, for example, an automatic sample supply unit that automatically supplies the sample to the sample mounting unit when the internal space is opened. The thing which has is mentioned.

  The “open state” here refers to a state in which the internal space is open to the outside, and the degree of opening may be such that the sample can be supplied to the sample mounting portion.

  As a desirable specific aspect of the ICP analyzer of the present invention, the ICP analyzer includes a chamber having a predetermined internal space, a sample mounting portion arranged in the internal space and capable of mounting a sample, A gas introduction port for introducing gas into the chamber, and a gas introduction port that faces directly above the sample placement unit and close to the sample placement unit. A sample outlet for evaporating the sample in the mounting portion and leading out of the chamber as a sample gas; a plasma torch for exciting the sample gas derived from the sample outlet using a high frequency inductively coupled plasma as an excitation source; and the sample gas And a detector that splits the light generated by the excitation of the light and a detector that detects the split light.

  In such a case, since the sample mounting portion and the sample outlet are close to the limit, the sample gas vaporized in the chamber is not guided to the sample outlet and is convected in the chamber. This can prevent the sample gas from being effectively led to the plasma torch. In addition, since the sample outlet is close to the limit to the sample mounting part where the sample gas is generated, the flow velocity of the generated sample gas flowing out of the sample outlet is faster, and the plasma torch can be reached quickly. The sample gas can be prevented from adhering to the wall surface in the tube from the sample outlet to the plasma torch by the solidification of the sample gas due to the temperature drop. Therefore, it contributes to the fact that a high-accuracy component analysis can be performed on a sample with a plasma torch.

  The chamber has an insertion port into which the tip side of the sample supply unit can be inserted, and the sample mounting unit can mount the sample supplied from the sample supply unit. The lead-out port faces the sample mounting part so as to face the upper limit of the sample mounting part so as not to interfere with the tip of the sample feeder inserted from the insertion port. If it exists, a highly accurate component analysis can be suitably performed about a sample.

  As described above, according to the sample vaporizing apparatus for an analyzer of the present invention, the sample mounting portion and the sample outlet are close to the limit, so that the sample gas vaporized in the chamber is transferred to the sample outlet. It is prevented from being convected in the chamber without being guided, and the sample gas can be effectively led out toward the analyzer. In addition, since the sample outlet is close to the limit to the sample mounting part where the sample gas is generated, the flow velocity of the generated sample gas flowing out of the sample outlet is faster, and the analyzer can reach the analyzer quickly. By re-solidifying the sample gas due to the temperature drop, it is possible to prevent the sample from adhering to the wall surface in the tube from the sample vaporizer for the analyzer to the analyzer. Therefore, it contributes to the ability to perform highly accurate component analysis on the sample with the analyzer.

  In other words, excellent sample vaporization for analyzers that prevents sample gas containing sample components from remaining in the chamber, enables sample gas to be effectively derived toward the analyzer, and contributes to highly accurate component analysis. An apparatus can be provided.

  Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

  The ICP analyzer Z according to the present embodiment (corresponding to the “analyzer” of the present invention) can insert the tip of a tweezers P that holds a solid sample as a sample feeder as shown in FIGS. A chamber 1 having a proper insertion port 111, a hollow portion 231 arranged in the approximate center of the chamber and connected to and supported by a pair of heating electrodes H and for receiving a sample supplied from the tweezers P (of the present invention) A sample mounting part 2 provided with a “sample mounting part”), a gas inlet 31 for introducing gas into the chamber 1, and the gas inlet 31 facing the gas inlet 31. The hollow portion 4 includes a straight wind shielding portion 4 for blocking the straight movement of the introduced gas, and a sample outlet 51 facing directly above the hollow portion 231, and the hollow portion using the gas. The sample which vaporized the sample in 231 A sample vaporizing apparatus A for ICP analysis apparatus (corresponding to “sample vaporizing apparatus for analysis apparatus” of the present invention) comprising a sample extraction tube 5 for deriving the gas out of the chamber 1 and the high frequency inductively coupled plasma as an excitation source. A plasma torch B that excites the sample gas derived from the sample outlet 51, a spectrometer C (not shown) that separates light generated by the excitation of the sample gas, and a detector D that detects the dispersed light ( (Not shown).

  In this embodiment, the ICP analyzer Z is a cylinder E for supplying argon gas containing halogen gas (for example, chlorine gas) to the chamber 1 (hereinafter referred to as “halogen-containing argon gas”); An electromagnetic valve F for adjusting the flow rate of the halogen-containing argon gas, a power source (not shown) for applying a voltage to the heating electrode H, a power source and the electromagnetic valve F are configured to be controllable, and a detector D It is connected to a computer (not shown) that can input the spectrum of the measured light.

  Hereinafter, each part is demonstrated concretely.

  As shown in FIG. 2, the chamber 1 has a substantially bell-shaped cross-sectional shape that gradually expands from the base end 1 a to the opening 1 b and a substantially transparent glass chamber main body 11. A substantially cylindrical chamber support 12 that supports the flange portion 110, a chamber closing support 13 that closes and supports a lower opening of the chamber support 12, and a chamber inner body disposed on the inner edge of the chamber support 12. 14. The chamber 1 is provided with the substantially cylindrical insertion port 111 at the shoulder, and a drain discharge port 112 on the opposite side of the insertion port 111.

  The sample mounting portion 2 is heated by a pair of heating electrodes H. As shown in FIG. 2, a pair of attachment pieces 21 for attachment to each heating electrode H and a pair of attachment pieces 21 are provided. A pair of upright pieces 22 each of which has both inner end portions erected substantially at right angles, and a sample placement piece 23 laid between the upper end portions of the upright pieces 22, have a substantially U shape in a downward view in cross section. These parts are integrally formed by bending a sheet metal or the like. In this embodiment, the tantalum material is used, but the metal type is not limited to this. Further, the material can be appropriately changed, for example, using a ceramic material, using a graphite material, or using a mixed material of metal and graphite. In the present embodiment, a recessed portion 231 that is recessed in a substantially bowl shape is provided in a substantially central portion of the sample mounting piece 23. Thereby, if it is a solid sample, a sample will be hard to drop, and if it is a liquid sample, it can be stored suitably.

  As shown in FIG. 2, the gas introduction port 31 receives supply of halogen-containing argon gas from the cylinder E through a gas supply pipe, and is provided at the tip of the gas introduction body 3 connected to the electromagnetic valve F. In addition to being formed, the blowout port 311 is opened upward. Therefore, the halogen-containing argon gas is blown upward from the gas inlet 31.

  As shown in FIGS. 2 and 3, the direct wind shielding portion 4 is a thin plate having a substantially circular shape in plan view, and is formed by punching a metal in the present embodiment. In the present embodiment, two through-holes 41 penetrating vertically are provided, and each heating electrode H is inserted through each through-hole 41. A region 42 between the through holes 41 is disposed at a position overlapping the gas inlet 31 in plan view, and the halogen-containing argon gas blown out from the gas inlet 31 first hits the region 42. Thus, the straight traveling of the halogen-containing argon gas is blocked.

  As shown in FIG. 2, the sample outlet tube 5 is a substantially transparent glass stepped substantially straight tube extending from the base end of the chamber 1 toward the open end, and has a rounded tip at the tip of the tip. While provided with a hole-like sample outlet 51, the opening 52 at the base end is connected to a pipe connected to the plasma torch B through a socket SK. The sample outlet 51 has an inner diameter (dy) that is slightly larger than the outer diameter (dx) of the recess 231 (see FIG. 4).

  Here, the reason why the inner diameter (dy) of the sample outlet 51 in which the tip of the sample outlet tube 5 is tapered is slightly larger than the outer diameter (dx) of the recess 231 is as follows. .

  This will be specifically described in (a) to (c) shown in FIG.

  Here, (a) shows that the inner diameter (dy) of the sample outlet 51 and the outer diameter (dx) of the recessed portion 231 substantially coincide with each other, and the distal end portion of the sample outlet tube 5 is not tapered. Is the case.

  (B) is a case where the inner diameter (dy) of the sample outlet 51 is clearly larger than the outer diameter (dx) of the recess 231 and the tip of the sample outlet 5 is not tapered.

  (C) is a case where the inner diameter (dy) of the sample outlet 51 and the outer diameter (dx) of the recess 231 substantially coincide with each other, and the tip of the sample outlet tube 5 is tapered (this application). Embodiment).

  In the case of (a), since the diameter of the sample outlet tube 5 is small, the flow velocity is larger than that in the case of (b) being large. Therefore, since it can be quickly guided to the plasma torch B, there is an advantage that the sample gas SG can be prevented from re-solidifying due to a temperature drop and the sample can be prevented from adhering to the wall surface in the tube up to the plasma torch B. However, when the sample gas SG is generated explosively (a large amount in an instant), there is a drawback that the sample gas SG escapes out of the sample outlet tube 5 and cannot be guided to the plasma torch B.

  In the case of (b), when there is too much sample gas SG guided to the plasma torch B, there is a drawback that the plasma disappears.

  In the case of (c), that is, in the case of the present embodiment, since the tip of the sample outlet tube 5 is narrowed, the flow rate can be maintained as in (a). In addition, since the portion entering from the tip of the sample outlet tube 5 is wider than the tip, the portion serves as a buffer, and the sample gas SG can be prevented from being excessively guided to the plasma torch B.

  Further, in addition to facing the sample outlet 51 directly above the recess 231, the sample outlet 51 is brought close to the limit to the recess 231 to the extent that it does not interfere with the tip of the tweezers P inserted from the insertion port 111. It is arranged in the position. Note that, for example, when the sample is placed in the recess 231 by inserting the tweezers P into the insertion port 111 under the condition that “the sample outlet 51 is close to the limit with respect to the recess 231”, for example. The tweezers P and the sample outlet tube 5 may be in contact with each other. Similarly, when the tweezers P is inserted into and removed from the insertion port 111, the tweezers P and the sample outlet tube 5 may be in contact with each other.

  As shown in FIG. 1, the plasma torch B is made of, for example, a quartz triple tube. Specifically, a sample gas channel B1 through which the sample gas SG flows, a plasma gas channel B2 through which argon gas flows, and a cooling gas (for example, a cooling gas channel B3 through which argon gas flows) are arranged concentrically from the inside to the outside in this order. In addition, an induction coil B4 connected to a high frequency power source is provided around the outer periphery in the vicinity of the tip, and the sample gas SG supplied to the plasma torch B by the high frequency magnetic field by the induction coil B4 is plasma. And is configured to emit plasma light.

  The spectroscope C separates a specific spectral line by dispersing the light bundle obtained from the plasma torch B. In this embodiment, for example, a Zernitana type spectrometer using a planar grating is used as the spectrometer C, but the type of spectrometer is not limited to this.

  The detector D detects the intensity of the light split by the spectroscope C, and in the present embodiment, a CCD type photodetector is used.

  Next, a method of using the ICP analyzer Z thus configured will be described.

  (1) About placing the sample in the recess 231 of the sample

  In the present embodiment, the tweezers P are used as the sample supply device, but the type is not limited to this.

  When the sample is liquid, a pipette having a tapered shape or the like can be used as the sample supply device.

  In this case, the tip of the pipette PP into which the liquid sample has been sucked is inserted into the insertion port 111 of the chamber 1, and further to a predetermined position where the pipette PP is stably supported using the insertion port 111 of the chamber 1. Plug in. Then, the droplet port P1 provided at the tip of the pipette PP is positioned substantially directly above the recess 231 (see FIG. 9). Thus, the liquid sample can be suitably dropped onto the recess 231 and the recess 231 has a substantially bowl shape, so that the liquid sample can be suitably stored. When the droplet operation is finished, the pipette PP is removed from the insertion port 111 of the chamber 1 and a plug (not shown) is plugged into the insertion port 111.

  (2) About sample vaporization

  In this way, the halogen-containing argon gas G is supplied into the chamber 1 using the gas inlet 31 by controlling the electromagnetic valve F with a computer while the sample is stored in the hollow portion 231.

  Here, the supply flow rate of the halogen-containing argon gas G is controlled by the electromagnetic valve F so that the supply flow rate of the halogen-containing argon gas G ≦ the flow rate of the sample gas SG. This is because, when the supply flow rate is greater than the derived flow rate, the gas convects in the chamber 1 and eventually pressure loss occurs.

  At the same time, the sample mounting portion 2 is heated to a predetermined temperature by controlling the current or voltage flowing through the heating electrode by a computer. This predetermined temperature can be set as appropriate according to the type of sample.

  Thus, the sample is heated and vaporized. At this time, the sample is vaporized as a halide by the halogen-containing argon gas G, and is led out from the sample outlet 51 toward the plasma torch B as the sample gas SG (see FIG. 5).

  Here, the halogen-containing argon gas G blown out directly from the gas inlet 31 is prevented from going straight by the straight wind shielding portion 4. That is, the halogen-containing argon gas G is not directly derived from the sample outlet 51. Further, the halogen-containing argon gas G can be prevented from directly hitting the heating electrode H, and the temperature drop of the electrode can be prevented.

  In addition, since the sample outlet 51 is brought close to the limit with respect to the recess 231, the sample gas SG is efficiently derived from the sample outlet 51.

  (3) Analysis of sample

  In this way, the sample gas SG is carried to the plasma torch B.

  Prior to the generation of the sample gas SG, the computer controls an electromagnetic valve (not shown) to be in an open state, whereby an argon gas having an appropriate flow rate is supplied to the plasma gas channel B2 and the cooling gas channel B3 of the plasma torch B. And a high frequency power is supplied to the induction coil B4 by controlling the power source to generate the plasma flame BA.

  Thus, if the sample gas SG flows into the sample gas flow path B1, it is turned into plasma in the plasma flame BA. At this time, each measurement target component contained in the sample gas SG emits light having a unique wavelength into plasma, and the spectroscope C separates this light. And the detector D detects the light of each wavelength divided | segmented.

  Then, a spectral spectrum representing the amount of the measurement target component constituting the measurement target sample is input to the computer, and the computer analyzes the spectral spectrum to accurately determine the amount of the measurement target component constituting the measurement target sample. Can be sought.

  Therefore, according to the ICP analyzer Z according to the present embodiment configured as described above, since the sample placement unit 2 having the depression 231 and the sample outlet 51 are close to the limit, It is possible to prevent the sample gas SG vaporized in step (b) from being convected in the chamber 1 without being led to the sample outlet 51 and to effectively lead the sample gas SG toward the plasma torch B. In addition, since the sample outlet 51 is close to the limit to the sample mounting portion 2 where the sample gas SG is generated, the flow velocity of the generated sample gas SG flowing out of the sample outlet 51 is increased, and the plasma torch B is quickly reached. Since the sample gas SG is re-solidified due to the temperature drop, it can be avoided that the sample adheres to the wall surface in the tube from the sample outlet 51 to the plasma torch B. Therefore, highly accurate component analysis can be performed on the sample.

  That is, excellent ICP analysis that prevents the sample gas SG from remaining in the chamber 1, can effectively lead the sample gas SG toward the plasma torch B, and can perform highly accurate component analysis. An apparatus Z can be provided.

  Since the sample outlet 51 is formed at the tip of the sample outlet tube 5 that protrudes into the chamber 1, it can be realized with a simple configuration without causing unnecessary cost increase.

  The chamber body 11 has a substantially bell shape having a cross-sectional shape that gradually expands from the base end 1a to the opening 1b, and the sample outlet tube 5 extends from the base end 1a of the chamber main body 11 to the opening 1b. Therefore, the halogen-containing argon gas introduced into the chamber body 11 is prevented from being turbulent due to the shape of the chamber body 11 and the arrangement of the sample outlet tube 5. The sample gas SG can be derived toward the plasma torch B while preventing the sample components contained in the sample gas SG from becoming uneven.

  The hollow portion 231 is formed in a substantially bowl shape, and the sample outlet 51 has an inner diameter that is expanded from the hollow portion 231, so that the sample gas SG is effectively applied to the plasma torch B. Can be derived automatically.

  Since the depression 231 is a heating type, the sample can be vaporized effectively.

  Since the straight wind shielding portion 4 is provided so as to face the gas inlet 31 and block the straight advance of the halogen-containing argon gas G introduced from the gas inlet 31, the halogen-containing argon introduced into the chamber 1. The path of the gas G is blocked by the direct wind shielding part 4, and the halogen-containing argon gas G can be prevented from being directly led out from the sample outlet 51. Therefore, the sample gas SG can be derived toward the plasma torch B while preventing the components of the sample contained in the sample gas SG from becoming uneven.

  Further, the straight wind shielding part 4 is provided between the gas inlet 31 and the sample mounting part 2 which is a heating type in a straight line, thereby effectively blocking the straight movement of the halogen-containing argon gas G. It is possible to prevent the halogen-containing argon gas G from directly hitting the sample placement unit 2 as the heating unit, and to prevent a temperature drop of the sample placement unit 2.

  A gas mixed with a halogen gas is introduced from the gas inlet 31 to vaporize an element in the sample as a halide, which contributes to quick and highly accurate analysis without pretreatment. This is because by generating a low-boiling halide, it is possible to vaporize at a heating temperature lower than usual, and it is possible to vaporize efficiently.

  In addition, since the sample outlet 51 is close to the limit to the sample mounting portion 2 as the heating unit, the vicinity of the sample outlet 51 and the sample outlet tube 5 are strongly affected by temperature, and the tube may be deformed depending on the material. However, since it can be vaporized at a lower temperature than usual by vaporizing as a halide, the heating temperature can also be reduced, and the thermal influence on the sample outlet tube 5 and the like can also be reduced.

  The present invention is not limited to the above embodiment.

  For example, a halogen-containing argon gas is used as an analysis gas, but a gas that reacts with a sample such as hydrogen gas or oxygen gas can be used instead of the halogen gas. Further, for example, other inert gases (gas that does not react with the sample) such as neon gas and nitrogen gas can be used.

  Further, the configuration of the chamber 1 and the sample outlet tube 5 such as the shape and material is not limited to this embodiment.

  For example, as shown in FIG. 7, an embodiment in which a protruding portion 11 </ b> X that protrudes integrally inside the chamber main body 11 and has a substantially cylindrical shape and a tapered shape is also conceivable. In this case, the lower end side of the sample outlet tube 5 does not need to be tapered as in the above embodiment.

  In this embodiment, the sample is a solid sample. However, in the case of a solid, the sample is a powder, powder, particles, or a mixture (including so-called slurry) sample. As long as it can be analyzed.

  Further, the configuration of the sample placement unit is not limited to that of the present embodiment, for example, a rectangular shape or a polygonal shape in plan view.

  Moreover, the sample supply method to a sample mounting part can be suitably changed according to the kind of sample. For example, when the sample is a liquid sample, for example, a method of supplying to the sample mounting unit using a pipette or the like can be mentioned. In addition, when the sample is a solid sample, it can be picked up with tweezers or the like and supplied to the sample mounting unit, or after the solid sample is dispersed in water and sucked up with a pipette, There is a method of droplets.

  Further, for example, an automatic sample supply unit that automatically supplies a predetermined amount of sample to the sample mounting unit when the chamber 1 is detected from the closed state to the open state shown in FIG. 8 is used. be able to.

  Further, the sample vaporization apparatus A for ICP analysis apparatus of the above embodiment may be applied to an MIP analysis apparatus, another high temperature plasma analysis apparatus, an analysis apparatus having a burner or a frame, or a mass analysis apparatus. it can.

  For example, when the sample vaporizer A for ICP analyzer is applied to the MIP analyzer as the sample vaporizer AA for MIP analyzer, the MIP analyzer X is used for the MIP analyzer as shown in FIG. An aspirator X2 that sucks a sample gas from the sample vaporizer AA and introduces it into the discharge tube X1, and a plasma generator X3 that generates light by exciting the sample gas introduced into the discharge tube X1 with the microwave-induced plasma X31. , Taking in the light generated by the plasma generation part X3, and splitting the light for each predetermined wavelength, the light detection part X5 for detecting the light split by the spectral part X4, and the light detection part And an information processing device X6 that receives a light intensity signal from X5 and calculates the composition, particle size information, and number of particles of the measurement sample. Bayoi.

  In addition, the specific configuration of each part is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.

1 is an overall schematic diagram schematically showing a configuration of an ICP analyzer according to an embodiment of the present invention. The whole schematic diagram which shows schematically the structure of the sample vaporization apparatus for ICP analyzers concerning the embodiment. The figure for demonstrating the positional relationship of the direct wind shielding part and gas inlet which concern on the embodiment. The principal part enlarged view of the sample vaporization apparatus for ICP analyzers concerning the embodiment. The figure for demonstrating operation | movement of the sample vaporization apparatus for ICP analyzers concerning the embodiment. The figure for demonstrating the sample derivation | leading-out effect by the setting relationship of the internal diameter of the sample derivation | leading-out port which concerns on the same embodiment, and the outer diameter of a hollow part. The figure which shows schematically the structure of the principal part of the sample vaporization apparatus for ICP analyzers in other embodiment of this invention. The figure which shows schematically the structure of the sample vaporization apparatus for ICP analyzers in other embodiment of this invention. The figure which shows schematically the structure of the sample vaporization apparatus for ICP analyzers using the sample supply device in other embodiment of this invention. The whole schematic diagram which shows schematically the structure of the MIP analyzer in other embodiment of this invention.

Explanation of symbols

A ... Sample vaporizer for analyzer (sample vaporizer for ICP analyzer)
B ... Plasma torch C ... Spectrometer D ... Detector Z ... Analyzer (ICP analyzer)
P: Sample feeder (tweezers)
PP ··· Sample supply (pipette)
P1 ··· Droplet SG ··· Sample gas dy ··· Inner dimensions (inner diameter) of sample outlet 51
DESCRIPTION OF SYMBOLS 1 ... Chamber 4 ... Direct wind shielding part 5 ... Sample outlet pipe 31 ... Gas inlet 51 ... Sample outlet 111 ... Insertion port 231 ..Indentation (sample placement part)

Claims (11)

Have a predetermined internal space, a chamber which have a sectional shape which gradually widens from top to bottom,
A sample placement unit arranged in the internal space and capable of placing a sample;
A gas inlet for introducing gas into the chamber;
A sample outlet tube protruding into the chamber from the upper part of the chamber;
A sample outlet port that is formed at a tip portion of the sample outlet tube and faces the upper side of the sample mounting portion , and leads the vaporized sample out of the chamber as a sample gas using the gas; A sample vaporizing apparatus for an analyzer, comprising: The chamber has an insertion port into which the tip side of the sample supply device can be inserted,
The tip of the sample supply device faces the upper side of the sample mounting portion,
The sample placement unit can place the sample supplied from the sample supply unit,
2. The analyzer according to claim 1 , wherein the sample outlet is close to the sample mounting portion so that the sample outlet tube does not interfere with the supply of the sample by the sample supplier. Sample vaporizer. The chamber is of a substantially bell shape having a cross-sectional shape that gradually expands from the base end to the opening;
The sample vaporizing apparatus for an analyzer according to claim 1 or 2 , wherein the sample outlet tube has a substantially straight tube shape extending from the base end of the chamber toward the opening side. Having said sample placing portion recess formed by recessed substantially bowl shape, claims 1 to 3 wherein the sample outlet is characterized in that having inner dimensions that were expanded from the recess Any one of the sample vaporization apparatuses for analyzers. The sample vaporizing apparatus for an analyzer according to any one of claims 1 to 4 , wherein the sample mounting portion is a heating type. 6. The sample vaporization for an analyzer according to any one of claims 1 to 5, further comprising a direct wind shielding portion facing the gas inlet to block the straight advance of the gas introduced from the gas inlet. apparatus. The sample vaporization apparatus for an analyzer according to claim 6, wherein the direct wind shielding part is arranged between the gas introduction port and the sample mounting part in a straight line. A gas mixed with a halogen gas is introduced from the gas inlet,
The sample vaporizer for an analyzer according to any one of claims 1 to 7 , wherein an element in the sample is vaporized as a halide. When the internal space is opened,
Wherein the sample mounting portion, according to claim 1 analyzer for sample vaporization apparatus, wherein in that it comprises a sample automatic supply unit automatically supplying the sample. Have a predetermined internal space, a chamber which have a sectional shape which gradually widens from top to bottom,
A sample placement unit arranged in the internal space and capable of placing a sample;
A gas inlet for introducing gas into the chamber;
A sample outlet tube protruding into the chamber from the upper part of the chamber;
A sample outlet port that is formed at a tip portion of the sample outlet tube and faces the upper side of the sample mounting portion , and leads the vaporized sample out of the chamber as a sample gas using the gas;
A plasma torch for exciting a sample gas derived from the sample outlet using a high frequency inductively coupled plasma as an excitation source;
A spectroscope that separates light generated by excitation of the sample gas;
An ICP analyzer, comprising: a detector for detecting the dispersed light. The chamber has an insertion port into which the tip side of the sample supply device can be inserted,
The tip of the sample supply device faces the upper side of the sample mounting portion,
The sample placement unit can place the sample supplied from the sample supply unit,
11. The ICP analyzer according to claim 10 , wherein the sample outlet is close to the sample mounting portion so that the sample outlet tube does not interfere with the supply of the sample by the sample supplier. .