JP4739677B2 - セルフクリーニングコーティングを有する基材を製造する方法 - Google Patents
セルフクリーニングコーティングを有する基材を製造する方法 Download PDFInfo
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- JP4739677B2 JP4739677B2 JP2003583962A JP2003583962A JP4739677B2 JP 4739677 B2 JP4739677 B2 JP 4739677B2 JP 2003583962 A JP2003583962 A JP 2003583962A JP 2003583962 A JP2003583962 A JP 2003583962A JP 4739677 B2 JP4739677 B2 JP 4739677B2
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
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- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
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- C03C2217/00—Coatings on glass
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Description
まだフロートガラスのリボンの形態にあるガラス上に、便宜上SiOCと称する(コーティング中の実際の酸素および炭素含量を判断せずに)ケイ素の酸炭化物に基づく副層を堆積させたが、前記ガラスはフランスのサンゴバン・ガラス社(Saint-Gobain Glass France)からプラニルクス(Planilux)の名で販売されているもの等、厚さが4mmの透明なシリカ−ソーダ−石灰ガラスである。この副層は、Si前駆体、特に窒素中に希釈したSiH4/エチレン混合物を利用し、ガラスがまだ約550〜600℃の温度にあるときに、フロート室内のフラットガラス製造ライン上でフロートガラスのリボン上に横向きに配置されたノズルを用いてCVDにより堆積させた。得られたコーティングは、約50nmの厚さで、約1.55の屈折率であった。このように得られたSiOCアルカリ金属バリア副層が与えられたフロートガラスから、大きさが10cm×10cmの試料を切り出した。これらの試料をクリーニングし、すすぎ、乾燥して、UV/オゾン処理を45分間施した。
まず、22.3mlのテトラエトキシシラン、22.1mlの無水エタノールおよび9mlのHClを、溶液が透明になるまで脱塩水(pH1.25)に混合し、次いでフラスコを60℃の水浴中に1時間おくことにより、液体処理組成物を得た。
30分100℃、2時間保持;
15分150℃、2時間保持;
15分175℃、2時間保持;
10分200℃、保持なし;
3時間20分300℃、1時間保持;および
50℃で2時間30分、1時間保持。
このように形成されたコーティングの細孔は、カチオン性界面活性剤CTABを構造化剤として使用した場合2−3nmの大きさであり、コポリマーPE6800を構造化剤として使用した場合4−5nmの大きさであった。
1.試験は、約15cm2のコーティングに対して実施した;
2.試料の重さを量り、基材の厚さ、光透過率TLおよびヘイズHd(両方とも%)を測定した;
3.パルミチン酸溶液(クロロホルム1Lあたり8gの酸)を、ガラス/スプレー距離20cmで、3−4回連続して噴霧して、垂直な基材に堆積させた;
4.堆積したパルミチン酸の厚さ(ナノメートル)を決定するために、パルミチン酸の堆積の後、試料の重さを量った;
5.堆積後に、光透過率TLおよびヘイズHdを測定した;
6.約50W/m2の強度のUVA照射時間の関数としてヘイズの変化を測定した;
7.ヘイズが50%減少した時間をグラフにより決定した:この時間をt1/2消失と呼ぶ;および
8.コーティングの光触媒活性を、以下の方法で定義されるパルミチン酸消失速度v(nm/h)として評価した。
v(nm/h)=パルミチン酸厚さ(nm)/(2×t1/2消失(h))。
1および2:構造化剤としてCTABを利用、Ti/Si比はそれぞれ0.1および0.25;
3〜7:構造化剤としてPE6800を利用、Ti/Si比はそれぞれ0.1、0.25、0.5、1および2。
3’:0および0;
4’:0および0;
5’:13および0.75;
6’:19および0.57;および
7’:28および0.42。
サンゴバン・クォーツ社(Saint-Gobain Quartz)から「Needle-punched Quartzel mat」(繊維径7〜16μm)の名前で販売されている、ニードルパンチシリカ繊維フェルトの直径47mm、厚さ8mmおよび密度1000g/m2のディスクを、上記試験番号6の組成物に浸して更に含浸し、その後上記の熱処理を施した。このようにして得られたディスクの質量増加は10%であった。
Claims (10)
- 基本的に透明な基材であって、該基材表面の少なくとも一部にコーティングが与えられており、前記コーティングのメソポーラス構造が光触媒性を示し、粒子の形態でメソポーラス構造中に取り込まれている少なくとも部分的に結晶化した酸化チタンを含む基材を製造する方法であって、
コーティングのメソポーラス構造を構成する物質の少なくとも1つの前駆体および少なくとも1種の有機構造化剤を含む液体組成物の調製;
有機構造化剤の周囲での前駆体の沈殿および前駆体から誘導された分子の成長;
直径0.5〜100nmの酸化チタンの基本ナノ粒子または微結晶の液体組成物への添加;
塗布すべき表面への組成物の塗布;および
有機構造化剤の除去を連続して含む方法であって、
酸化チタン微結晶が、その完全性をメソポーラス構造中で基本的に保ったまま前記構造に取り入れられており、それらの一部がその中で集合してナノ粒子になることが可能である方法。 - 前記基材が、基本的に透明で、平坦または曲線状の板ガラスタイプである、請求項1に記載の方法。
- 前記コーティングが、二酸化ケイ素、亜当量酸化ケイ素、またはケイ素の酸炭化物、酸窒化物または酸炭窒化物から選択される、少なくとも部分的に酸化されているケイ素誘導体に基づく副層の介在とともに形成されている、請求項1また2のいずれかに記載の方法。
- 前記副層が、少なくとも5nmの厚さを有する請求項3に記載の方法。
- 前記副層が、10〜200nmの厚さを有する請求項4に記載の方法。
- 前記副層が、30〜120nmの厚さを有する請求項5に記載の方法。
- 前記コーティングがゾルゲル法により堆積されている、請求項1〜6のいずれかに記載の方法。
- 前記コーティングが30〜800nmの厚さを有する、請求項1〜7のいずれかに記載の方法。
- 前記酸化チタンが0.5〜100nmの直径を有するナノ粒子を含み、それら自体は直径0.5〜10nmの基本粒子または微結晶のクラスターから形成されている、請求項1〜8のいずれかに記載の方法。
- 前記基材が、ガラスまたは透明プラスティックに基づく基本的に透明な基材であって、反射防止機能性を有する薄層または複数の薄層が、基材表面とメソポーラス構造を有するコーティングとの間に挿入されている基材である請求項1〜9のいずれかに記載の方法。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0204775A FR2838734B1 (fr) | 2002-04-17 | 2002-04-17 | Substrat a revetement auto-nettoyant |
| FR02/04775 | 2002-04-17 | ||
| PCT/FR2003/001218 WO2003087002A1 (fr) | 2002-04-17 | 2003-04-16 | Substrat a revetement auto-nettoyant |
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| Publication Number | Publication Date |
|---|---|
| JP2005528312A JP2005528312A (ja) | 2005-09-22 |
| JP4739677B2 true JP4739677B2 (ja) | 2011-08-03 |
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| JP2003583962A Expired - Fee Related JP4739677B2 (ja) | 2002-04-17 | 2003-04-16 | セルフクリーニングコーティングを有する基材を製造する方法 |
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| US (1) | US7510763B2 (ja) |
| EP (1) | EP1497234B1 (ja) |
| JP (1) | JP4739677B2 (ja) |
| KR (1) | KR100973747B1 (ja) |
| CN (1) | CN100439271C (ja) |
| AT (1) | ATE486825T1 (ja) |
| AU (1) | AU2003262137A1 (ja) |
| BR (1) | BR0309276B1 (ja) |
| CA (1) | CA2482630C (ja) |
| DE (1) | DE60334788D1 (ja) |
| ES (1) | ES2355553T3 (ja) |
| FR (1) | FR2838734B1 (ja) |
| MX (1) | MXPA04010162A (ja) |
| PL (1) | PL218194B1 (ja) |
| PT (1) | PT1497234E (ja) |
| WO (1) | WO2003087002A1 (ja) |
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2002
- 2002-04-17 FR FR0204775A patent/FR2838734B1/fr not_active Expired - Fee Related
-
2003
- 2003-04-16 WO PCT/FR2003/001218 patent/WO2003087002A1/fr not_active Ceased
- 2003-04-16 PL PL372454A patent/PL218194B1/pl unknown
- 2003-04-16 DE DE60334788T patent/DE60334788D1/de not_active Expired - Lifetime
- 2003-04-16 AT AT03740626T patent/ATE486825T1/de active
- 2003-04-16 KR KR1020047016628A patent/KR100973747B1/ko not_active Expired - Fee Related
- 2003-04-16 CA CA 2482630 patent/CA2482630C/fr not_active Expired - Fee Related
- 2003-04-16 PT PT03740626T patent/PT1497234E/pt unknown
- 2003-04-16 MX MXPA04010162A patent/MXPA04010162A/es active IP Right Grant
- 2003-04-16 CN CNB038142031A patent/CN100439271C/zh not_active Expired - Fee Related
- 2003-04-16 EP EP20030740626 patent/EP1497234B1/fr not_active Expired - Lifetime
- 2003-04-16 US US10/510,714 patent/US7510763B2/en not_active Expired - Fee Related
- 2003-04-16 ES ES03740626T patent/ES2355553T3/es not_active Expired - Lifetime
- 2003-04-16 JP JP2003583962A patent/JP4739677B2/ja not_active Expired - Fee Related
- 2003-04-16 AU AU2003262137A patent/AU2003262137A1/en not_active Abandoned
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Also Published As
| Publication number | Publication date |
|---|---|
| US20060014050A1 (en) | 2006-01-19 |
| FR2838734B1 (fr) | 2005-04-15 |
| EP1497234A1 (fr) | 2005-01-19 |
| KR20040103962A (ko) | 2004-12-09 |
| DE60334788D1 (de) | 2010-12-16 |
| CN1662465A (zh) | 2005-08-31 |
| BR0309276A (pt) | 2005-02-22 |
| CA2482630C (fr) | 2012-08-07 |
| WO2003087002A1 (fr) | 2003-10-23 |
| ES2355553T3 (es) | 2011-03-28 |
| PL372454A1 (pl) | 2005-07-25 |
| JP2005528312A (ja) | 2005-09-22 |
| US7510763B2 (en) | 2009-03-31 |
| FR2838734A1 (fr) | 2003-10-24 |
| PT1497234E (pt) | 2011-02-09 |
| EP1497234B1 (fr) | 2010-11-03 |
| MXPA04010162A (es) | 2005-02-03 |
| KR100973747B1 (ko) | 2010-08-04 |
| CN100439271C (zh) | 2008-12-03 |
| BR0309276B1 (pt) | 2012-08-07 |
| PL218194B1 (pl) | 2014-10-31 |
| AU2003262137A1 (en) | 2003-10-27 |
| CA2482630A1 (fr) | 2003-10-23 |
| ATE486825T1 (de) | 2010-11-15 |
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