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JP4748799B2 - Low-frequency fired porcelain composition for high frequency and its manufacturing method - Google Patents
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JP4748799B2 - Low-frequency fired porcelain composition for high frequency and its manufacturing method - Google Patents

Low-frequency fired porcelain composition for high frequency and its manufacturing method Download PDF

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JP4748799B2
JP4748799B2 JP2006240049A JP2006240049A JP4748799B2 JP 4748799 B2 JP4748799 B2 JP 4748799B2 JP 2006240049 A JP2006240049 A JP 2006240049A JP 2006240049 A JP2006240049 A JP 2006240049A JP 4748799 B2 JP4748799 B2 JP 4748799B2
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直樹 木谷
幹夫 滝本
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本発明は、低誘電率で低誘電損失の高周波用低温焼成磁器組成物及び低温焼成磁器の製造方法に関する。   The present invention relates to a low-frequency fired ceramic composition for high frequency having a low dielectric constant and low dielectric loss, and a method for producing a low-temperature fired ceramic.

近年、高度情報化時代を迎え、半導体素子には、高速化、高集積化及び実装の高密度化が求められている。半導体素子における高速化を進めるためには、配線長の短縮等に加え、回路上の信号伝播速度の高速化が不可欠であるが、信号伝播速度は基板材料の比誘電率の平方根に反比例するため、より低い誘電率の基板材料が必要である。また、高集積化や実装の高密度化のためには抵抗率の低い配線材料(Ag、Au、Cu等)の使用が求められるが、これらの金属は融点が低いため、配線パターンの印刷後に基板を焼成する多層配線基板等では、低温焼成可能な基板材料を用いる必要がある。このため、電子機器用基板材料として従来広く用いられてきたアルミナ基板(誘電率:9〜9.5、焼成温度:1500℃前後)は高周波回路基板には適さず、これに代わる、より低い誘電率を有し低温焼成可能な材料が必要とされている。また、マイクロ波、ミリ波帯域での低損失化も要求されている。   In recent years, with the era of advanced information technology, semiconductor devices are required to have higher speed, higher integration, and higher mounting density. To increase the speed of semiconductor devices, it is essential to increase the signal propagation speed on the circuit in addition to shortening the wiring length, but the signal propagation speed is inversely proportional to the square root of the relative dielectric constant of the substrate material. A lower dielectric constant substrate material is required. In addition, the use of low-resistivity wiring materials (Ag, Au, Cu, etc.) is required for higher integration and higher mounting density. However, these metals have a low melting point, so that after wiring pattern printing, In a multilayer wiring board or the like that fires a substrate, it is necessary to use a substrate material that can be fired at a low temperature. For this reason, the alumina substrate (dielectric constant: 9 to 9.5, firing temperature: around 1500 ° C.) that has been widely used as a substrate material for electronic equipment is not suitable for high-frequency circuit boards, and has a lower dielectric constant instead. There is a need for materials that have low temperature firing. There is also a demand for low loss in the microwave and millimeter wave bands.

そこで、最近では、高速化に対応し得る低誘電率基板材料として、ガラスと無機質フィラーとからなるガラスセラミック材料が検討されている。この種のガラスセラミック材料は、誘電率が3〜7程度と低いことから高周波用絶縁基板として適しており、また、800℃〜1000℃の温度で焼成することができるため、導体抵抗の低いAg、Au、Cu等と同時焼成できるという特長がある。   Therefore, recently, a glass ceramic material made of glass and an inorganic filler has been studied as a low dielectric constant substrate material that can cope with high speed. This kind of glass-ceramic material is suitable as a high-frequency insulating substrate because of its low dielectric constant of about 3 to 7, and since it can be fired at a temperature of 800 ° C. to 1000 ° C., Ag having a low conductor resistance. , Au, Cu and the like can be fired simultaneously.

例えば、特許文献1には、ディオプサイド(CaMgSi26)型結晶相を析出可能なガラス相と、フィラーとしてMg及び/またはZnとTiとを含有する酸化物を含む1000℃以下で焼成可能な高周波用磁器組成物が開示されている。また、特許文献2には、SiO2、Al23、MO(Mはアルカリ土類金属元素)及びPbを含む結晶化ガラス成分と、Al23、SiO2、MgTiO3、(Mg,Zn)TiO3、TiO2、SrTiO3、MgAl24、ZnAl24、コージェライト、ムライト、エンスタタイト、ウイレマイト、CaAl2Si28、SrAl2Si28、(Sr,Ca)Al2Si28、フォルステライトの群から選ばれる少なくとも1種のフィラーとからなる高周波用配線基板が開示されている。 For example, Patent Document 1 discloses that a glass phase capable of precipitating a diopside (CaMgSi 2 O 6 ) type crystal phase and an oxide containing Mg and / or Zn and Ti as fillers is fired at 1000 ° C. or lower. A possible high frequency porcelain composition is disclosed. Patent Document 2 discloses a crystallized glass component containing SiO 2 , Al 2 O 3 , MO (M is an alkaline earth metal element) and Pb, Al 2 O 3 , SiO 2 , MgTiO 3 , (Mg, Zn) TiO 3 , TiO 2 , SrTiO 3 , MgAl 2 O 4 , ZnAl 2 O 4 , cordierite, mullite, enstatite, willemite, CaAl 2 Si 2 O 8 , SrAl 2 Si 2 O 8 , (Sr, Ca) A high-frequency wiring board comprising at least one filler selected from the group consisting of Al 2 Si 2 O 8 and forsterite is disclosed.

しかしながら、従来のガラスセラミックス材料は、誘電率は低くても、信号周波数10GHz以上の高周波帯域における誘電損失(tanδ)が概ね20×10-4以上と高く、すなわち、Qf値で5×103〜8×103程度であり、高周波用基板材料として実用化し得るに十分な特性を有していない。なお、ここでQf値とは測定周波数(f/GHz)とQ(≒1/tanδ)の積である。 However, even if the conventional glass ceramic material has a low dielectric constant, the dielectric loss (tan δ) in a high frequency band of 10 GHz or more is generally as high as 20 × 10 −4 or more, that is, the Qf value is 5 × 10 3 to It is about 8 × 10 3 , and does not have sufficient characteristics to be put into practical use as a high-frequency substrate material. Here, the Qf value is a product of the measurement frequency (f / GHz) and Q (≈1 / tan δ).

特開2000-188017号公報JP 2000-188017 A 特開2001-240470号公報Japanese Patent Laid-Open No. 2001-240470

従って、本発明は、Ag、Au、Cu等の低抵抗金属と同時焼成が可能であり、しかも低誘電率及び高周波領域で低誘電損失を実現する低温焼成磁器組成物、及び低温焼成磁器の製造方法を提供することを目的とする。   Therefore, the present invention can be fired simultaneously with a low-resistance metal such as Ag, Au, Cu, etc., and can produce a low-temperature fired porcelain composition that realizes low dielectric loss and low dielectric loss in a high-frequency region, and low-temperature fired porcelain It aims to provide a method.

本発明者らは、上記問題点を解決するべく検討した結果、MgとMnとSiとを特定の比率で含有する複合酸化物にBi23とLi2Oを添加した組成物は、850℃〜900℃程度の温度で焼成可能であり、かかる組成物を焼成して得られる低温焼成磁器は、低い比誘電率と低い誘電損失を有することを見出し、本発明を完成するに至った。 As a result of investigations to solve the above problems, the present inventors have found that a composition in which Bi 2 O 3 and Li 2 O are added to a composite oxide containing Mg, Mn, and Si in a specific ratio is 850. It has been found that a low-temperature fired porcelain that can be fired at a temperature of about 0 to 900 ° C. and is obtained by firing such a composition has a low relative dielectric constant and a low dielectric loss, and has completed the present invention.

すなわち、本発明は、以下の低温焼成磁器組成物及び低温焼成磁器の製造方法を提供する。
(1)MgO、MnO、SiO2を合計量で63〜98.7質量%、Bi231.0〜35質量%及びLi2O0.3〜2.0質量%を含み、MgOとSiO2とMnOの含有比(モル比)が(2−x):x:yで表されるとき、xは0.03〜1.0、yは1.2〜10の範囲であり、その少なくとも一部をMg、Mn、Siとの複合酸化物として含有する低温焼成磁器組成物。
(2)前記複合酸化物がフォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相であり、Bi23及びLi2Oの少なくとも一部をBi23-SiO2系結晶相及びLi2O-SiO2系結晶相として含む請求項1記載の低温焼成磁器組成物。
(3)Qf値が10,000以上である請求項1または2記載の低温焼成磁器組成物。
(4)MgO、MnO、SiO2の含有比が、(2−x):x:yで表され、xは0.03〜1.0、yは1.2〜10の範囲であるMgO、MnO、SiO2、の混合物及び/または複合酸化物63〜98.7質量%と、Bi231.0〜35質量%及びLi2O0.3〜2.0質量%とを含む原料粉を仮焼(750℃〜850℃)後粉砕して粉末とし、これにバインダーを含む成形助剤を加え所定形状に成形後、850℃〜900℃で焼成する低温焼成磁器組成物の製造方法。
That is, the present invention provides the following low-temperature fired ceramic composition and method for producing a low-temperature fired ceramic.
(1) MgO, MnO, from 63 to 98.7 wt% of SiO 2 in a total amount, including a Bi 2 O 3 1.0~35% by weight and Li 2 O0.3~2.0 wt%, the content ratio of MgO and SiO 2 and MnO When (molar ratio) is represented by (2-x): x: y, x is in the range of 0.03 to 1.0, y is in the range of 1.2 to 10, and at least a part thereof is a composite oxidation with Mg, Mn, and Si. Low-temperature fired porcelain composition contained as a product.
(2) The composite oxide comprises a forsterite crystal phase and / or an enstatite crystal phase, a tefroid crystal phase (Mn 2 SiO 4 ) and / or a rhodonite crystal phase (MnSiO 3 ), MgO—MnO—SiO 2 2. The low-temperature fired ceramic composition according to claim 1, wherein the composition is a crystalline phase and includes at least a part of Bi 2 O 3 and Li 2 O as a Bi 2 O 3 —SiO 2 crystalline phase and a Li 2 O—SiO 2 crystalline phase. object.
(3) The low-temperature fired ceramic composition according to claim 1 or 2, wherein the Qf value is 10,000 or more.
(4) MgO, MnO, the content ratio of SiO 2 is, (2-x): x : is represented by y, x is 0.03 to 1.0, y is MgO in the range of 1.2 to 10, MnO, SiO 2, of Raw material powder containing mixture and / or composite oxide 63-98.7% by mass, Bi 2 O 3 1.0-35% by mass and Li 2 O 0.3-2.0% by mass is calcined (750 ° C. to 850 ° C.) and then pulverized A method for producing a low-temperature fired porcelain composition comprising forming a powder and adding a molding aid containing a binder to the powder to form a predetermined shape, followed by firing at 850 ° C. to 900 ° C.

本発明の低温焼成磁器組成物は、液相形成成分としてBiとLiの酸化物を用いた結果、フォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相を主相とする磁器組成物において低温焼結性を実現した。また、Bi23は多量に導入しても誘電損失を低下させないことが判明し、これにより高Qf値を実現できる。従って、本発明によれば、16GHz以上の高周波域で利用できる誘電率(9以下)、高Qf(10,000以上)の低損失LTCC(低温焼成多層基板)材料として最適であり、各種のマイクロ波用回路素子等において利用できる。しかも、850℃〜900℃で焼成できるため、Cu、Au、Ag等による配線を同時焼成により形成することができる。 As a result of using the oxides of Bi and Li as liquid phase forming components, the low-temperature fired ceramic composition of the present invention has a forsterite crystal phase and / or an enstatite crystal phase, a tefroid crystal phase (Mn 2 SiO 4 ). In addition, low temperature sinterability was realized in a porcelain composition having a rhonite-based crystal phase (MnSiO 3 ) and an MgO—MnO—SiO 2 crystal phase as a main phase. Further, it has been found that Bi 2 O 3 does not lower the dielectric loss even if it is introduced in a large amount, whereby a high Qf value can be realized. Therefore, according to the present invention, it is most suitable as a low loss LTCC (low temperature fired multilayer substrate) material having a dielectric constant (9 or less) and a high Qf (10,000 or more) that can be used in a high frequency range of 16 GHz or more. It can be used in circuit elements. And since it can bake at 850 to 900 degreeC, the wiring by Cu, Au, Ag, etc. can be formed by simultaneous baking.

(A)磁器組成物
本発明の低温焼成磁器組成物は、MgOとMnOとSiO2を合計量で63〜98.7質量%、Bi231.0〜35質量%及びLi2O0.3〜2.0質量%を含み、MgO、SiO2、MnOの含有比(モル比)が(2−x):x:yで表されるとき、xは0.03〜1.0、yは1.2〜10の範囲であり、その少なくとも一部をMg、Mn、Siの複合酸化物として含有する低温焼成磁器組成物である。
Mg、Mn、Siを含有する複合酸化物に対してBi23とLi2Oとを含有させることにより、加熱時、Bi23-SiO2系液相とLi2O-SiO2系液相とが形成され、この液相反応を介して850℃〜900℃程度の温度で焼成できる。
(A) ceramic compositions low-temperature-sintered ceramic composition of the present invention, 63 to 98.7 wt% of MgO and MnO and SiO 2 in a total amount, Bi 2 O 3 1.0 to 35% by weight and Li 2 O0.3~2.0 mass %, When the content ratio (molar ratio) of MgO, SiO 2 , MnO is represented by (2-x): x: y, x is in the range of 0.03 to 1.0, y is in the range of 1.2 to 10, It is a low-temperature fired porcelain composition containing at least a part as a complex oxide of Mg, Mn, and Si.
By adding Bi 2 O 3 and Li 2 O to the composite oxide containing Mg, Mn, and Si, the Bi 2 O 3 —SiO 2 liquid phase and the Li 2 O—SiO 2 system are heated during heating. A liquid phase is formed and can be fired at a temperature of about 850 ° C. to 900 ° C. through this liquid phase reaction.

本発明の低温焼成磁器組成物は、MgOとMnOとSiO2を合計量で63〜98.7質量%、好ましくは75〜97.7質量%、Bi231.0〜35質量%、好ましくは2.0〜24.5質量%、Li2O0.3〜2.0質量%、好ましくは0.3〜0.5質量%の範囲である(合計で100質量%とする)。
MgOとMnOとSiO2の含有量が過少であると、これらを主相とすることによる高Qfという特徴が損なわれる。また、過剰だと低温焼結性が喪失する。Bi23の含有量が過少であると低温焼結性が実現できない。また、過剰だと嵩密度が4g/cm3以上となる上、さらに2Bi23・3SiO2が主相となるため誘電率が高くなり望ましくない。Li2Oの含有量が過少であると低温焼結性が実現できない。また、過剰だと16GHzの高周波領域における誘電損失が10×10-4以上と高く、高Qf値を実現できない。
The low-temperature fired ceramic composition of the present invention comprises MgO, MnO and SiO 2 in a total amount of 63 to 98.7% by mass, preferably 75 to 97.7% by mass, Bi 2 O 3 1.0 to 35% by mass, preferably 2.0 to 24.5 wt%, Li 2 O0.3~2.0% by weight, preferably (to 100 wt% in total) in a range of 0.3 to 0.5 wt%.
If the contents of MgO, MnO and SiO 2 are too small, the characteristic of high Qf due to these being the main phase is impaired. Moreover, if it is excessive, low-temperature sinterability is lost. If the Bi 2 O 3 content is too small, low temperature sinterability cannot be realized. On the other hand, if it is excessive, the bulk density becomes 4 g / cm 3 or more, and further, 2Bi 2 O 3 .3SiO 2 becomes the main phase, so the dielectric constant becomes high, which is not desirable. If the Li 2 O content is too low, low temperature sinterability cannot be realized. If it is excessive, the dielectric loss in the high frequency region of 16 GHz is as high as 10 × 10 −4 or more, and a high Qf value cannot be realized.

MgO、MnO、SiO2の含有比を2−x:x:yとすると、xは0.03〜1.0、yは1.2〜10の範囲とする。
Mg、Mn、Siの複合酸化物は、MgOとMnOとSiO2の量比が上記範囲を満たすものであればよい。
When the content ratio of MgO, MnO, and SiO 2 is 2-x: x: y, x is in the range of 0.03 to 1.0 and y is in the range of 1.2 to 10.
The composite oxide of Mg, Mn, and Si may be any as long as the quantitative ratio of MgO, MnO, and SiO 2 satisfies the above range.

従って、本発明の低温焼成磁器は、フォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相を主体とし、さらにBi23-SiO2系結晶相及びLi2O-SiO2系結晶相から主として構成されるものである。ここで、「テフロイド系結晶相」とはテフロイド及びこれに類する結晶相、「ロードナイト結晶相」とはロードナイト及びこれに類する結晶相、「MgO-MnO-SiO2系結晶相」とは、MgO-MnO-SiO2系結晶相及びこれに類する結晶相であり、磁器組成物の成分から構成される同型の結晶相を含んでもよい。フォルステライト系結晶相、エンスタタイト系結晶相、Bi23-SiO2系結晶相及びLi2O-SiO2系結晶相についても同様である。
目標とする物性値を実現するものであれば各相の具体的な含有比は限定されないが、通常は、フォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相を磁器の全体積の63%以上含み、好ましくは80%以上、より好ましくは90%以上、さらに好ましくは95%以上を含む。
なお、発明の効果を損なわない限りにおいて、SiO2系結晶相等や非晶質等を含んでも良い。
本発明の低温焼成磁器は、Qf値が10,000以上であり、850℃〜900℃の温度範囲での焼成によって相対密度95%以上まで緻密化されたものである。
Therefore, the low-temperature fired porcelain of the present invention comprises a forsterite crystal phase and / or an enstatite crystal phase, a tefroid crystal phase (Mn 2 SiO 4 ) and / or a rhodonite crystal phase (MnSiO 3 ), MgO—MnO— It is mainly composed of a SiO 2 crystal phase and is mainly composed of a Bi 2 O 3 —SiO 2 crystal phase and a Li 2 O—SiO 2 crystal phase. Here, “Tefloid crystal phase” means Tefroid and similar crystal phases, “Rhodonite crystal phase” means rhodonite and similar crystal phases, and “MgO—MnO—SiO 2 crystal phase” means MgO— It is a MnO—SiO 2 -based crystal phase and a similar crystal phase, and may include the same type of crystal phase composed of components of the porcelain composition. The same applies to the forsterite crystal phase, the enstatite crystal phase, the Bi 2 O 3 —SiO 2 crystal phase, and the Li 2 O—SiO 2 crystal phase.
The specific content ratio of each phase is not limited as long as the target physical property value is realized, but usually, forsterite crystal phase and / or enstatite crystal phase, tefroid crystal phase (Mn 2 SiO 4 ) and / or rhodonite-based crystal phase (MnSiO 3 ), MgO—MnO—SiO 2 -based crystal phase contains 63% or more of the total volume of the porcelain, preferably 80% or more, more preferably 90% or more, still more preferably Including 95% or more.
As long as the effects of the invention are not impaired, a SiO 2 crystal phase or the like or an amorphous material may be included.
The low-temperature fired ceramic of the present invention has a Qf value of 10,000 or more and is densified to a relative density of 95% or more by firing in a temperature range of 850 ° C. to 900 ° C.

(B)低温焼成磁器の製造方法
本発明の低温焼成磁器は、MgOとMnOとSiO2の含有比が(2−x):x:yで表され、xは0.03〜1.0、yは1.2〜10であるMgOとMnOとSiO2の混合物及び/または複合酸化物63〜98.7質量%と、Bi231.0〜35質量%及びLi2O0.3〜2.0質量%とを含む原料粉を所定形状に成形後、850℃〜900℃で焼成することにより製造できる。
主原料であるMgとMnとSiO2は各金属酸化物の混合物でもよいが、エンスタタイト(MgSiO3)等の複合酸化物にSiO2とMgOとMnOを必要量混合したものでもよい。出発原料として用い得るMgOとMnOとSiO2は、各金属の酸化物粉末のほかに、焼結過程で酸化物を形成し得る炭酸塩、酢酸塩、硝酸塩等の形態で添加できる。
(B) Manufacturing method of low-temperature fired porcelain In the low-temperature fired porcelain of the present invention, the content ratio of MgO, MnO, and SiO 2 is represented by (2-x): x: y, x is 0.03 to 1.0, and y is 1.2 to A raw material powder containing a mixture of MgO, MnO and SiO 2 and / or composite oxide 63-98.7% by mass, Bi 2 O 3 1.0-35% by mass and Li 2 O 0.3-2.0% by mass is predetermined. It can manufacture by baking at 850 to 900 degreeC after shaping | molding in a shape.
The main raw materials Mg, Mn, and SiO 2 may be a mixture of metal oxides, or may be a composite oxide such as enstatite (MgSiO 3 ) mixed with required amounts of SiO 2 , MgO, and MnO. MgO, MnO and SiO 2 that can be used as starting materials can be added in the form of carbonates, acetates, nitrates and the like that can form oxides during the sintering process, in addition to oxide powders of the respective metals.

上記の主成分原料に対して、焼結助剤としてBi23粉末、Li2O粉末を上記の割合、好ましくは主成分原料75〜97.7質量%、Bi232.0〜24.5質量%、Li2O0.3〜0.5質量の範囲となるように添加混合する。Bi23とLi2Oも、各金属の酸化物粉末のほかに、焼結過程で酸化物を形成し得る炭酸塩、酢酸塩、硝酸塩等の形態で添加できる。
Mg2SiO4、Mn2SiO4、SiO2、MgO、MnO、Bi23、Li2O等の原料粉末は分散性を高め、望ましい誘電率や低誘電損失を得るために2.0μm以下、特に1.0μm以下の微粉末とすることが望ましい。
To the above main component material, Bi 2 O 3 powder, Li 2 O powder proportion of the as a sintering aid, preferably the main component material 75 to 97.7 wt%, Bi 2 O 3 2.0~24.5 weight %, Li 2 O is added and mixed so as to be in the range of 0.3 to 0.5 mass. Bi 2 O 3 and Li 2 O can also be added in the form of carbonates, acetates, nitrates, and the like that can form oxides during the sintering process, in addition to the oxide powders of the respective metals.
Raw material powders such as Mg 2 SiO 4 , Mn 2 SiO 4 , SiO 2 , MgO, MnO, Bi 2 O 3 , Li 2 O increase dispersibility, and 2.0 μm or less in order to obtain a desirable dielectric constant and low dielectric loss, In particular, it is desirable to use a fine powder of 1.0 μm or less.

上記の割合で添加混合した混合粉末に適宜バインダーを添加した後、例えば、金型プレス、押し出し成形、ドクターブレード法、圧延法等により任意の形状に成形後、酸化雰囲気中または、N2、Ar等の非酸化性雰囲気中において850℃〜1000℃、特に850℃〜900℃の温度で1〜3時間焼成することにより相対密度95%以上に緻密化することができる。この時の焼成温度が850℃より低いと、磁器が十分に緻密化せず、1000℃を越えると緻密化は可能であるが、Ag、Au、Cu等の低融点な導体を配線材料として用いることが難しくなる。 After appropriately adding a binder to the mixed powder added and mixed at the above ratio, for example, after molding into an arbitrary shape by a die press, extrusion molding, doctor blade method, rolling method, etc., in an oxidizing atmosphere or N 2 , Ar In a non-oxidizing atmosphere such as 850 ° C. to 1000 ° C., in particular at a temperature of 850 ° C. to 900 ° C. for 1 to 3 hours, it can be densified to a relative density of 95% or more. If the firing temperature at this time is lower than 850 ° C., the porcelain is not sufficiently densified, and if it exceeds 1000 ° C., densification is possible, but a low-melting conductor such as Ag, Au, or Cu is used as the wiring material. It becomes difficult.

本発明の方法によれば、Mg、Mn及びSiの複合酸化物である固相とBi23-SiO2系液相及びLi2O-SiO2系液相とのより活性な固液反応が生じる結果、少ない焼結助剤量で磁器を緻密化することができる。そのために、誘電損失を増大させる要因となる粒界の非晶質相の量を最小限に抑えることができる。このように本発明の製造方法によれば、磁器中に、少なくともMg、Mn、Siを含むフォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相、Bi23-SiO2系結晶相及びLi2O-SiO2系結晶相を析出させることにより、16GHz程度でも比誘電率を9以下に制御できるとともに、低誘電損失、従って高Qf値の高周波用磁器を得ることができる。 According to the method of the present invention, a more active solid-liquid reaction between a solid phase, which is a composite oxide of Mg, Mn, and Si, and a Bi 2 O 3 —SiO 2 liquid phase and a Li 2 O—SiO 2 liquid phase As a result, the porcelain can be densified with a small amount of sintering aid. Therefore, it is possible to minimize the amount of the amorphous phase at the grain boundary that causes the dielectric loss to increase. Thus, according to the production method of the present invention, the forsterite crystal phase and / or enstatite crystal phase, tefroid crystal phase (Mn 2 SiO 4 ) and / or at least Mg, Mn, and Si are contained in the porcelain. Alternatively, by depositing rhodonite crystal phase (MnSiO 3 ), MgO—MnO—SiO 2 crystal phase, Bi 2 O 3 —SiO 2 crystal phase and Li 2 O—SiO 2 crystal phase, the ratio can be increased even at about 16 GHz. The dielectric constant can be controlled to 9 or less, and a high-frequency porcelain having a low dielectric loss and thus a high Qf value can be obtained.

(C)磁器組成物の用途
本発明における磁器組成物は、850℃〜900℃で焼成可能であることから、特にAg、Au、Cuなどを配線する配線基板の絶縁基板として用いることができる。かかる磁器組成物を用いて配線基板を作製する場合には、例えば、上記のようにして調合した混合粉末を公知のテープ成形法、例えばドクターブレード法、押し出し成形等に従い、絶縁層形成用のグリーンシートを作製した後、そのシートの表面に配線回路層用として、Ag、Au及びCuのうちの少なくとも1種の金属、特に、Ag粉末を含む導体ペーストを用いて、グリーンシート表面にスクリーン印刷法等によって配線パターンを回路パターン状に印刷し、場合によってはシートにスルーホールやビアホール形成後、上記導体ペーストを充填する。その後、複数のグリーンシートを積層圧着した後、上述した条件で焼成することにより、配線層と絶縁層とを同時に焼成することができる。
(C) Use of Porcelain Composition Since the porcelain composition in the present invention can be baked at 850 ° C. to 900 ° C., it can be used as an insulating substrate of a wiring substrate for wiring Ag, Au, Cu and the like. In the case of producing a wiring board using such a porcelain composition, for example, the mixed powder prepared as described above can be used to form an insulating layer forming green according to a known tape molding method such as a doctor blade method, extrusion molding or the like. After producing the sheet, a screen printing method is performed on the surface of the green sheet using a conductive paste containing at least one metal of Ag, Au and Cu, in particular, Ag powder, for the wiring circuit layer on the surface of the sheet. A wiring pattern is printed in a circuit pattern by, for example, and in some cases, a through hole or a via hole is formed on a sheet, and then the conductor paste is filled. Thereafter, the plurality of green sheets are laminated and pressure-bonded, and then fired under the above-described conditions, whereby the wiring layer and the insulating layer can be fired simultaneously.

以下、実施例及び比較例により本発明を具体的に説明するが、これらは本発明を限定するものではない。
実施例1〜29
平均粒径が1μm以下のMg2SiO4、Mn2SiO4、MgO、SiO2、MnO、Bi23、Li2CO3を酸化物換算の含有比が表1の割合となるように混合し、仮焼(750℃〜850℃)後粉砕して粉末とした。これらの仮焼物に有機バインダー、可塑剤、トルエンを添加し、ドクターブレード法により厚さ150μmのグリーンシートを作成した。そして、このグリーンシートを5枚積層し、70℃の温度で150kg/cm2の圧力を加えて熱圧着した。得られた積層体を大気中で、500℃で脱バインダーした後、大気中で表1の条件下に焼成して多層基板用磁器を得た。なお、表1には、原料混合物中のMg、Mn及びSiの含有量合計(酸化物換算値)及びMgO/SiO2/MnO比も併せて示した。
EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, these do not limit this invention.
Examples 1-29
Mg 2 SiO 4 , Mn 2 SiO 4 , MgO, SiO 2 , MnO, Bi 2 O 3 , and Li 2 CO 3 having an average particle size of 1 μm or less are mixed so that the content ratio in terms of oxide is the ratio shown in Table 1. And calcined (750 ° C. to 850 ° C.) and then pulverized into powder. An organic binder, a plasticizer, and toluene were added to these calcined materials, and a green sheet having a thickness of 150 μm was prepared by a doctor blade method. Then, five green sheets were laminated and thermocompression bonded by applying a pressure of 150 kg / cm 2 at a temperature of 70 ° C. The resulting laminate was debindered at 500 ° C. in the air and then fired in the air under the conditions shown in Table 1 to obtain a multilayer substrate porcelain. Table 1 also shows the total content of Mg, Mn and Si in the raw material mixture (oxide conversion value) and the MgO / SiO 2 / MnO ratio.

得られた焼結体について誘電率、誘電損失を以下の方法で評価した。測定はJIS R1627「マイクロ波用ファインセラミックスの誘電率特性の試験方法」に準じて行った。すなわち、上記の多層基板用磁器を直径1〜5mm、厚み2〜3mmの試料の円盤状に切り出し、円盤状試料の両端面を2枚の平行導体板で短絡して誘電体共振器を構成し、この誘電体共振器のTE011モードの共振特性と無負荷Qを16〜20GHzでネットワークアナライザー(ヒューレット・パッカード社製8722C)を用いて測定し、誘電率と誘電損失(tanδ)を算定し、測定周波数とQ(=1/tanδ)からQf値を計算した。結果を表2に示す。
また、各試料についてX線回折測定を行い、標準試料のX線回折ピークとの比較によって磁器の構成相を同定したところ、フォルステライト結晶相(Mg2SiO4)及び/またはエンスタタイト結晶相(MgSiO3)、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相、Bi23-SiO2系結晶相(典型的には、ユーリタイト2Bi23・3SiO4)、Li2O-SiO2系結晶相の各相の存在が確認された。
The obtained sintered body was evaluated for dielectric constant and dielectric loss by the following methods. The measurement was performed according to JIS R1627 “Test method for dielectric constant characteristics of fine ceramics for microwaves”. That is, the above-mentioned multilayer substrate porcelain is cut into a disk shape of a sample having a diameter of 1 to 5 mm and a thickness of 2 to 3 mm, and both ends of the disk sample are short-circuited by two parallel conductor plates to form a dielectric resonator. The TE011 mode resonance characteristics and no-load Q of this dielectric resonator were measured at 16-20 GHz with a network analyzer (Hewlett Packard 8722C), and the dielectric constant and dielectric loss (tan δ) were calculated and measured. The Qf value was calculated from the frequency and Q (= 1 / tan δ). The results are shown in Table 2.
Further, X-ray diffraction measurement was performed on each sample, and the constituent phase of the porcelain was identified by comparison with the X-ray diffraction peak of the standard sample. As a result, the forsterite crystal phase (Mg 2 SiO 4 ) and / or the enstatite crystal phase ( MgSiO 3 ), Tefloid crystal phase (Mn 2 SiO 4 ) and / or rhodonite crystal phase (MnSiO 3 ), MgO—MnO—SiO 2 crystal phase, Bi 2 O 3 —SiO 2 crystal phase (typically Was confirmed to be present in the respective phases of eulite (2Bi 2 O 3 .3SiO 4 ) and Li 2 O—SiO 2 based crystal phase.

以上の結果から明らかなように、MgO、SiO2、MnO、Bi23及びLi2Oを本発明の範囲で含み、結晶相として、フォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相、Bi23-SiO2系結晶相、Li2O-SiO2系結晶相が主として析出した本発明の磁器は、いずれも誘電率が9以下、Qf値が10,000以上の優れた値を示す。但し、Biの含有量が増すと嵩密度が増加する傾向があり、本発明におけるBiの上限値35質量%(実施例23)では嵩密度が4.09に達した。 As is clear from the above results, MgO, SiO 2 , MnO, Bi 2 O 3 and Li 2 O are included in the scope of the present invention, and the forsterite crystal phase and / or the enstatite crystal phase are used as the crystal phase, Tefloid crystal phase (Mn 2 SiO 4 ) and / or rhodonite crystal phase (MnSiO 3 ), MgO—MnO—SiO 2 crystal phase, Bi 2 O 3 —SiO 2 crystal phase, Li 2 O—SiO 2 system The porcelain of the present invention in which the crystal phase is mainly precipitated exhibits excellent values such that the dielectric constant is 9 or less and the Qf value is 10,000 or more. However, when the Bi content increases, the bulk density tends to increase, and the bulk density reaches 4.09 at the upper limit of 35 mass% (Example 23) of Bi in the present invention.

比較例1〜10
平均粒径が1μm以下のMg2SiO4、Mn2SiO4、MgO、SiO2、MnO、Bi23、Li2CO3を各酸化物換算の組成が表1の割合となるように混合し実施例1〜29と同様にして、表1の条件下に焼成して多層基板用磁器を得た。結果を表2にまとめて示す。
Bi23量が1.0質量%未満である試料(比較例2)及びLi2O量が0.3質量%未満である試料(比較例3、4)では焼結しない。Li2O量が2.0質量%を超えた場合及びMnO量が1.0molを超えた場合、誘電損失が大きくQf値が10,000未満になる(比較例5、6、8、9)。Bi23量が35質量%以上である試料(比較例7)では、膨れて敷き板に融着を起こす。
Comparative Examples 1-10
Mg 2 SiO 4 , Mn 2 SiO 4 , MgO, SiO 2 , MnO, Bi 2 O 3 , and Li 2 CO 3 with an average particle size of 1 μm or less are mixed so that the composition in terms of each oxide is the ratio shown in Table 1. In the same manner as in Examples 1 to 29, firing was performed under the conditions shown in Table 1 to obtain a ceramic for a multilayer substrate. The results are summarized in Table 2.
The sample with the Bi 2 O 3 content of less than 1.0% by mass (Comparative Example 2) and the sample with the Li 2 O content of less than 0.3% by mass (Comparative Examples 3 and 4) do not sinter. When the amount of Li 2 O exceeds 2.0 mass% and when the amount of MnO exceeds 1.0 mol, the dielectric loss is large and the Qf value is less than 10,000 (Comparative Examples 5, 6, 8, 9). In the sample (Comparative Example 7) in which the amount of Bi 2 O 3 is 35% by mass or more, the sample swells and causes fusion on the floor plate.

Figure 0004748799
Figure 0004748799

Figure 0004748799
Figure 0004748799

以上の例に示すように本発明によれば、850℃〜900℃の低温で、低誘電率、低誘電損失の高周波用低温焼成磁器組成物を得ることができる。   As shown in the above examples, according to the present invention, a low-temperature fired ceramic composition for high frequency having a low dielectric constant and low dielectric loss can be obtained at a low temperature of 850 ° C. to 900 ° C.

Claims (4)

ZnOを含まず、MgO、MnO、SiO2を合計量で63〜98.7質量%、Bi231.0〜35質量%及びLi2O0.3〜2.0質量%を含み、MgOとMnOとSiO2の含有比(モル比)が(2−x):x:yで表されるとき、xは0.03〜1.0、yは1.2〜10の範囲であり、その少なくとも一部をMg、Mn、Siとの複合酸化物として含有する低温焼成磁器組成物。 ZnO is not included, MgO, MnO and SiO 2 are included in a total amount of 63 to 98.7% by mass, Bi 2 O 3 1.0 to 35% by mass and Li 2 O 0.3 to 2.0% by mass, and include MgO, MnO and SiO 2 . When the content ratio (molar ratio) is represented by (2-x): x: y, x is in the range of 0.03 to 1.0, and y is in the range of 1.2 to 10, and at least a part thereof is composed of Mg, Mn, and Si. A low-temperature fired porcelain composition contained as a composite oxide. 前記複合酸化物がフォルステライト系結晶相及び/またはエンスタタイト系結晶相、テフロイド系結晶相(Mn2SiO4)及び/またはロードナイト系結晶相(MnSiO3)、MgO-MnO-SiO2系結晶相であり、Bi23及びLi2Oの少なくとも一部をBi23-SiO2系結晶相及びLi2O-SiO2系結晶相として含む請求項1記載の低温焼成磁器組成物。 The composite oxide includes a forsterite crystal phase and / or an enstatite crystal phase, a tefroid crystal phase (Mn 2 SiO 4 ) and / or a rhodonite crystal phase (MnSiO 3 ), an MgO—MnO—SiO 2 crystal phase. The low-temperature fired ceramic composition according to claim 1, comprising at least a part of Bi 2 O 3 and Li 2 O as a Bi 2 O 3 -SiO 2 crystal phase and a Li 2 O-SiO 2 crystal phase. Qf値が10,000以上である請求項1または2記載の低温焼成磁器組成物。   The low-temperature fired ceramic composition according to claim 1 or 2, wherein the Qf value is 10,000 or more. MgO、MnO、SiO2の含有比が、(2−x):x:yで表され、xは0.03〜1.0、yは1.2〜10の範囲であるMgO、MnO、SiO2の混合物及び/または複合酸化物63〜98.7質量%と、Bi231.0〜35質量%及びLi2O0.3〜2.0質量とを含む原料粉を仮焼(750℃〜850℃)後粉砕して粉末とし、これにバインダーを含む成形助剤を加え所定形状に成形後、850℃〜900℃で焼成することを特徴とする請求項1に記載の低温焼成磁器組成物の製造方法。 MgO, MnO, SiO 2 content ratio is expressed by (2-x): x: y, where x is in the range of 0.03 to 1.0 and y is in the range of 1.2 to 10 and / or a mixture of MgO, MnO, SiO 2 and / or a composite oxide 63 to 98.7 wt%, and pulverized after calcination (750 ° C. to 850 ° C.) the raw material powder and a Bi 2 O 3 1.0 to 35% by weight and Li 2 O0.3~2.0 mass and powder, The method for producing a low-temperature fired porcelain composition according to claim 1, wherein a molding aid containing a binder is added to the resultant and then molded into a predetermined shape, followed by firing at 850 ° C to 900 ° C.
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