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JP4750797B2 - Antigen supply device - Google Patents
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JP4750797B2 - Antigen supply device - Google Patents

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JP4750797B2
JP4750797B2 JP2007537500A JP2007537500A JP4750797B2 JP 4750797 B2 JP4750797 B2 JP 4750797B2 JP 2007537500 A JP2007537500 A JP 2007537500A JP 2007537500 A JP2007537500 A JP 2007537500A JP 4750797 B2 JP4750797 B2 JP 4750797B2
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antigen
exposure chamber
supply apparatus
cylindrical body
supply device
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JPWO2007037001A1 (en
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懐鵬 湯
晃広 瀬田
稔 奥田
一弘 橋口
公裕 大久保
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Shinryo Corp
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    • A62BDEVICES, APPARATUS OR METHODS FOR LIFE-SAVING
    • A62B11/00Devices for reconditioning breathing air in sealed rooms

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Description

本発明は、抗原供給装置に関し、特に抗原曝露室のための抗原供給装置に関する。   The present invention relates to an antigen supply apparatus, and more particularly to an antigen supply apparatus for an antigen exposure chamber.

アレルギ等の疾患に関する研究試験等のために、被験対象に抗原を曝露させるために所定量の抗原が供給されるようになされた抗原曝露室が使用される。この抗原曝露室に抗原を供給するために抗原供給装置が使用されるが、従来の抗原供給装置は、図1に示すように、ダストフィーダから抗原を直接抗原曝露室内に供給するか又は空調ダクト内に供給する方式によるものであり、しかも、水による洗浄ができないものであった。(例えば、非特許文献1参照)
このように、従来の抗原供給装置は、言うならば抗原を一方的に室内に供給するだけのものであり、そのため室内抗原濃度が不均一であった(図1の濃度分布図参照)。また、抗原の種類を変更する場合に洗浄が困難であり、ダクト内に以前に使用した抗原が残ってしまって再飛散したり、付着した抗原が長期間に亘って残ると抗原にカビが発生したりしていた。
An antigen exposure chamber in which a predetermined amount of antigen is supplied in order to expose a test subject to an antigen is used for research tests on diseases such as allergies. In order to supply the antigen to the antigen exposure chamber, an antigen supply device is used. As shown in FIG. 1, the conventional antigen supply device supplies the antigen directly from the dust feeder into the antigen exposure chamber or the air conditioning duct. It is based on the method of supplying the water into the inside, and it cannot be washed with water. (For example, see Non-Patent Document 1)
As described above, the conventional antigen supply apparatus is merely for unilaterally supplying the antigen into the room, so that the indoor antigen concentration is not uniform (see the concentration distribution diagram of FIG. 1). Also, when changing the type of antigen, it is difficult to wash, and if the antigen used before remains in the duct and resprays, or if the attached antigen remains for a long period of time, mold will form on the antigen I was doing.

更に、従来の装置は、装置内を十分に乾燥させないと、後の曝露運転時に曝露室内の湿度の制御が出来なくなり、更に、水滴に抗原が付着して室内濃度の立ち上がりに影響が出る場合もあった。   Furthermore, if the conventional apparatus is not sufficiently dried, the humidity in the exposure chamber cannot be controlled during the subsequent exposure operation, and further, the antigen may adhere to the water droplets and the rise in the indoor concentration may be affected. there were.

更に、静電気についても特別な対策を採らなければ抗原が付着し易いという問題点もあった。
無し 井手:医療研究のためのスギ花粉飛散装置の開発、環境技術、Vol.32, No.3, pp.33-37, 2003
Furthermore, there is also a problem that antigens are likely to adhere unless special measures are taken for static electricity.
None Ide: Development of cedar pollen scattering device for medical research, environmental technology, Vol.32, No.3, pp.33-37, 2003

本発明は、上記した従来技術による抗原供給装置における問題点を解決した抗原曝露室に抗原を供給するための抗原供給装置を提供することを目的としてなされたものである。   An object of the present invention is to provide an antigen supply apparatus for supplying an antigen to an antigen exposure chamber that has solved the problems in the antigen supply apparatus according to the prior art described above.

上記目的を達成するために、本発明による抗原供給装置は、前記抗原曝露室の外気吹出口に近接して設置され、抗原曝露室外部のダストフィーダから供給された高濃度の抗原を抗原曝露室から吸い込んだ抗原曝露室内空気と混合して希釈した後に前記外気吹出口に向けて吹き出し、前記外気吹出口からの外気と混合させて抗原曝露室を充満させる構成とされている。   In order to achieve the above object, an antigen supply apparatus according to the present invention is installed in the vicinity of an outside air outlet of the antigen exposure chamber, and receives a high concentration of antigen supplied from a dust feeder outside the antigen exposure chamber. The mixture is diluted with the antigen-exposed room air sucked from the air, then blown out toward the outside air outlet, and mixed with the outside air from the outside air outlet to fill the antigen-exposed room.

具体的に構成においては、本発明による抗原供給装置は、垂直方向に延びた筒状体によって主として構成され、該筒状体の下端には、前記抗原曝露室内の空気を吸い込むための空気吸込口が設けられ、前記筒状体の該空気吸込口の上方には前記円筒体の軸線方向上方に流れる空気の流れを生じる軸流ファンが取り付けられ、更に前記筒状体の前記軸流ファンの上方には、前記抗原曝露室外部のダストフィーダから高濃度の抗原が噴射される供給口が設けられる。そして、当該抗原供給装置は、前記抗原曝露室の外気吹出口に近接して設置され、抗原曝露室外部のダストフィーダから供給された高濃度の抗原が前記空気吸込口から吸い込んだ抗原曝露室内の空気と混合されて希釈された後に前記筒状体上端から前記外気吹出口に向けて吹き出して前記外気吹出口からの外気と混合させて抗原曝露室を充満させる構成とされている。   Specifically, the antigen supply apparatus according to the present invention is mainly configured by a cylindrical body extending in the vertical direction, and an air suction port for sucking air in the antigen exposure chamber is provided at the lower end of the cylindrical body. An axial fan that generates an air flow that flows upward in the axial direction of the cylindrical body is attached above the air suction port of the cylindrical body, and further above the axial fan of the cylindrical body. Is provided with a supply port through which a high concentration of antigen is ejected from a dust feeder outside the antigen exposure chamber. The antigen supply apparatus is installed in the vicinity of the outside air outlet of the antigen exposure chamber, and the high concentration antigen supplied from the dust feeder outside the antigen exposure chamber is in the antigen exposure chamber where the antigen is sucked from the air suction port. After being diluted with air, the antigen exposure chamber is filled by blowing out from the upper end of the cylindrical body toward the outside air outlet and mixing with the outside air from the outside air outlet.

本発明の抗原供給装置は、更に、前記筒状体内部を洗浄するための洗浄水を前記筒状体に供給するための洗浄水配管と、前記洗浄水を排水するための洗浄水用ドレンとを含んでいても良い。洗浄水供給口は、筒状体の上部及び下部に設けて筒状体全体を効率良く洗浄できるようにするのが好ましい。   The antigen supply apparatus of the present invention further includes a cleaning water pipe for supplying cleaning water for cleaning the inside of the cylindrical body to the cylindrical body, a drain for cleaning water for draining the cleaning water, May be included. It is preferable that the cleaning water supply port is provided at the upper part and the lower part of the cylindrical body so that the entire cylindrical body can be efficiently cleaned.

前記ダストフィーダから高濃度の抗原が噴射される前記供給口は、前記筒状体の上端に設けられるのが好ましい。供給される抗原は1種類であっても良いし数種類であっても良い。   It is preferable that the supply port through which a high concentration antigen is ejected from the dust feeder is provided at the upper end of the cylindrical body. One type or several types of antigens may be supplied.

更に、前記筒状体は、静電気等による抗原の付着を防止するために、金属又は導電性樹脂からなる部材によって構成されるのが好ましい。   Furthermore, the cylindrical body is preferably composed of a member made of a metal or a conductive resin in order to prevent adhesion of an antigen due to static electricity or the like.

本発明による抗原供給装置は、抗原曝露室の外気吹出口下方であって室内中央部に設置されるのが好ましい。また、本発明による抗原供給装置は、抗原曝露室の天井に吊り下げ棒等によって吊り下げる形式とされても良いし、又は抗原曝露室の床面上に設置する形式とされても良い。   The antigen supply apparatus according to the present invention is preferably installed in the center of the room below the outside air outlet of the antigen exposure room. Moreover, the antigen supply apparatus according to the present invention may be of a type that is suspended from the ceiling of the antigen exposure chamber by a hanging rod or the like, or may be of a type that is installed on the floor of the antigen exposure chamber.

発明効果Invention effect

上記のような構成を採用することにより、本発明による抗原供給装置によれば、従来の装置よりも速い立ち上がり時間でより均一な室内抗原濃度分布を得ることができる。また、簡単な設置方式であるので、容易に設置場所を変更することができる。   By adopting the configuration as described above, the antigen supply device according to the present invention can obtain a more uniform indoor antigen concentration distribution with a faster rise time than the conventional device. In addition, since the installation method is simple, the installation location can be easily changed.

更に、装置を金属又は導電性樹脂からなる構成部品によって構成しているので、静電気による抗原の付着が防止できる。   Furthermore, since the apparatus is composed of components made of metal or conductive resin, it is possible to prevent antigens from adhering due to static electricity.

更に、洗浄水による洗浄よって抗原を洗い流すことができるので、抗原が付着して残って再飛散したりカビする発生させることがなく、異なる種類の抗原曝露への移行を迅速に行うことができる。尚、洗浄水は、シミ、残滓等を残さないために純水を使用するのが好ましい。   Furthermore, since the antigen can be washed away by washing with washing water, it is possible to rapidly shift to different types of antigen exposure without causing the antigen to remain attached and re-scatter or mold. In addition, it is preferable to use pure water as washing water so as not to leave stains, residues and the like.

更に、水洗浄が可能であり且つ防水型の軸流ファンを採用することにより、水洗浄後に前記ファンを回すことによって自動乾燥が可能である。軸流ファンを回転させることにより乾燥を迅速に行うことができるので、曝露室内の湿度制御も残留水分に影響されることなく迅速且つ正確に行うことができる。   Further, by adopting a waterproof axial flow fan that can be washed with water, automatic drying is possible by turning the fan after washing with water. Since the drying can be performed quickly by rotating the axial fan, the humidity control in the exposure chamber can also be performed quickly and accurately without being affected by the residual moisture.

従来の抗原供給装置の構成、配置及び抗原濃度分布を示した図である。It is the figure which showed the structure, arrangement | positioning, and antigen concentration distribution of the conventional antigen supply apparatus. 本発明の抗原供給装置の第1の実施形態の構成図である。It is a block diagram of 1st Embodiment of the antigen supply apparatus of this invention. 図1に示されている抗原供給装置の配置及び抗原濃度分布を示した図である。It is the figure which showed arrangement | positioning and antigen concentration distribution of the antigen supply apparatus shown by FIG. 本発明の抗原供給装置の第2の実施形態の構成図である。It is a block diagram of 2nd Embodiment of the antigen supply apparatus of this invention. 抗原供給ノズルの高さを変えた場合の抗原曝露室内抗原濃度の立ち上がり時間を比較するための図であり、図5は抗原供給ノズルを抗原供給装置の下方端部に設けた場合を示している。FIG. 5 is a diagram for comparing the rise time of the antigen concentration in the antigen exposure chamber when the height of the antigen supply nozzle is changed, and FIG. 5 shows a case where the antigen supply nozzle is provided at the lower end of the antigen supply apparatus. . 抗原供給ノズルの高さを変えた場合の抗原曝露室内抗原濃度の立ち上がり時間を比較するための図であり、図6は抗原供給ノズルを抗原供給装置の上方端部に設けた場合を示している。FIG. 6 is a diagram for comparing the rise time of the antigen concentration in the antigen exposure chamber when the height of the antigen supply nozzle is changed, and FIG. 6 shows a case where the antigen supply nozzle is provided at the upper end of the antigen supply apparatus. .

符号の説明Explanation of symbols

1,1’ 抗原供給装置、 A 抗原曝露室、 2 外気吹出口、
3 円筒ダクト、 4 抗原供給ノズル、 5 空気吸入口、
6 軸流ファン、 7 洗浄水供給配管、 8 電動バルブ、
9 洗浄水噴射ノズル、 10 洗浄水用ドレン、
11 抗原濾過装置付きトラップ、 12 天吊棒
1, 1 'antigen supply device, A antigen exposure chamber, 2 outside air outlet,
3 cylindrical duct, 4 antigen supply nozzle, 5 air inlet,
6 Axial fan, 7 Washing water supply pipe, 8 Electric valve,
9 Washing water injection nozzle, 10 Washing water drain,
11 Trap with antigen filter, 12 Ceiling rod

図2は、本発明による抗原供給装置の第1の実施形態の構成を示す断面図である。また、図3は、この実施形態による抗原供給装置の設置方法を示す配置図及びこの装置を使用した場合の抗原曝露室内の抗原の濃度分布を示した分布図である。この実施形態による抗原供給装置は抗原曝露室の床面に設置するタイプのものであり、図3に示されているように、抗原供給装置1は抗原曝露室Aのほぼ中央の外気吹出口2の下方床面に設置されている。図3の配置図からわかるように、抗原曝露室Aの外部に設けられたダストフィーダから供給される高濃度の抗原が抗原供給装置1の上部から導入され、抗原供給装置1によって希釈調整された抗原が該抗原供給装置から吹き出されて抗原曝露室の外気吹出口2から吹き出される外気と混合されて抗原曝露室全体に充満する構成となっている。   FIG. 2 is a cross-sectional view showing the configuration of the first embodiment of the antigen supply apparatus according to the present invention. FIG. 3 is a layout diagram showing the method of installing the antigen supply apparatus according to this embodiment and a distribution chart showing the concentration distribution of the antigen in the antigen exposure chamber when this apparatus is used. The antigen supply apparatus according to this embodiment is of a type installed on the floor surface of the antigen exposure chamber. As shown in FIG. 3, the antigen supply apparatus 1 includes the outside air outlet 2 at the center of the antigen exposure chamber A. It is installed on the floor below. As can be seen from the layout diagram of FIG. 3, a high concentration antigen supplied from a dust feeder provided outside the antigen exposure chamber A was introduced from the upper part of the antigen supply apparatus 1 and diluted and adjusted by the antigen supply apparatus 1. The antigen is blown out from the antigen supply device and mixed with the outside air blown out from the outside air outlet 2 of the antigen exposure chamber to fill the entire antigen exposure chamber.

次に、図2を参照して抗原供給装置1の詳細を説明する。図2に示されているように、抗原供給装置1は、全体として上下方向に延びた長い筒状の構造になされている。抗原供給装置1の上部には円筒ダクト3が設けられており、抗原曝露室Aの外部に設けられたダストフィーダからの高濃度の抗原(例えば、スギ花粉、ダニ抗原粒子、ハウスダスト等)が円筒ダクト3の上端に設けられた抗原供給ノズル4から下方に向けて噴射供給される。円筒ダクト3は、スギ花粉等の抗原が静電気によって付着しないように金属又は導電性樹脂等によって形成されている。一方、抗原供給装置1の下方端部の円筒ダクト3の下方には空気吸入口5が設けられており、空気吸入口5の上方で且つ円筒ダクト3の下端には軸流ファン6が設けられている。従って、軸流ファン6の回転によって抗原供給装置1内を長手方向上方へ流れる空気の流れが形成され、該空気の流れによって空気吸入口5を介して抗原曝露室A内の空気が抗原供給装置1内へと吸い込まれる。このような構成により、円筒ダクト3内では、空気吸入口5を介する抗原曝露室A内の空気の上向きの流れと、抗原供給ノズル4を介するダストフィーダからの高濃度の抗原の下向きの流れがぶつかって適度に混合希釈され、最終的に抗原供給装置1の上方から出て行く。抗原供給装置1の上方から出て行った適度に希釈された抗原を含む空気は、抗原供給装置1の上方の抗原曝露室Aの天井面に設けられた外気吹出口2からの導入される外気と更に混合されて抗原曝露室Aの内部全体に充満する。   Next, details of the antigen supply apparatus 1 will be described with reference to FIG. As shown in FIG. 2, the antigen supply apparatus 1 has a long cylindrical structure extending in the vertical direction as a whole. A cylindrical duct 3 is provided in the upper part of the antigen supply apparatus 1, and high concentration antigens (for example, cedar pollen, mite antigen particles, house dust, etc.) from a dust feeder provided outside the antigen exposure chamber A are received. The antigen supply nozzle 4 provided at the upper end of the cylindrical duct 3 is jetted and supplied downward. The cylindrical duct 3 is formed of metal or conductive resin so that antigens such as cedar pollen do not adhere due to static electricity. On the other hand, an air suction port 5 is provided below the cylindrical duct 3 at the lower end of the antigen supply apparatus 1, and an axial fan 6 is provided above the air suction port 5 and at the lower end of the cylindrical duct 3. ing. Accordingly, the rotation of the axial flow fan 6 forms a flow of air that flows upward in the longitudinal direction in the antigen supply device 1, and the air in the antigen exposure chamber A is passed through the air suction port 5 by the air flow. It is sucked into 1. With such a configuration, in the cylindrical duct 3, there is an upward flow of air in the antigen exposure chamber A via the air inlet 5 and a downward flow of high concentration antigen from the dust feeder via the antigen supply nozzle 4. It collides and is moderately mixed and diluted, and finally exits from the antigen supply apparatus 1. The air containing the appropriately diluted antigen that has flowed out from above the antigen supply apparatus 1 is introduced from the outside air outlet 2 provided on the ceiling surface of the antigen exposure chamber A above the antigen supply apparatus 1. And the whole inside of the antigen exposure chamber A is filled.

抗原供給装置1には更に、使用後の抗原等を洗い流すための洗浄水供給配管7が設けられている。洗浄水供給配管7は、図示されているように、洗浄水供給源(図示せず)からの洗浄水を電動バルブ8を介して円筒ダクト3の上端及び下端に設けられた洗浄水噴射ノズル9から吹き出すように配管されている。更に、抗原供給装置1の下端には、洗浄水を排水するための洗浄水用ドレン10が設けられている。洗浄水用ドレン10は、抗原供給装置を洗浄した洗浄水を集め、抗原濾過装置付きトラップ11を介して抗原曝露室外へと排出される。このような構成により、抗原曝露室Aを実験等により使用した後は、洗浄水噴射ノズル9を介して装置の上下から洗浄水を噴射して使用済み抗原をきれいに洗い流し、次いで、軸流ファン6を回転させることによって乾燥させることができ、抗原曝露室を迅速に次の実験に使用できる状態とすることができる。   The antigen supply apparatus 1 is further provided with a washing water supply pipe 7 for washing away the used antigen and the like. As shown in the figure, the cleaning water supply pipe 7 is supplied with cleaning water from a cleaning water supply source (not shown) via an electric valve 8 at the upper and lower ends of the cylindrical duct 3. It is piped to blow out from. Furthermore, a drain 10 for washing water for draining washing water is provided at the lower end of the antigen supply apparatus 1. The washing water drain 10 collects the washing water obtained by washing the antigen supply device, and is discharged out of the antigen exposure chamber through the trap 11 with the antigen filtering device. With such a configuration, after the antigen exposure chamber A is used by experiments or the like, washing water is jetted from the upper and lower sides of the apparatus via the washing water jet nozzle 9 to cleanly wash the used antigen, and then the axial fan 6 Can be dried, and the antigen exposure chamber can be quickly made ready for the next experiment.

図3の下部に示された分布図は、図2に示した抗原供給装置1を図3の上部に示した配置により使用したときの抗原の濃度分布を示したものである。この分布図から明らかなように、本発明による抗原供給装置を使用した場合の抗原濃度分布は、図1の下部に示した従来の抗原供給方法による濃度分布と比較して著しく均一であることがわかる。   The distribution diagram shown in the lower part of FIG. 3 shows the concentration distribution of the antigen when the antigen supply apparatus 1 shown in FIG. 2 is used in the arrangement shown in the upper part of FIG. As is apparent from this distribution chart, the antigen concentration distribution when the antigen supply apparatus according to the present invention is used is remarkably uniform as compared with the concentration distribution by the conventional antigen supply method shown in the lower part of FIG. Recognize.

図4は、本発明の抗原供給装置の第2の実施形態の構成を示した断面図である。この実施形態は抗原曝露室の天井に吊り下げる形態になされたものである。図からわかるように、抗原供給装置1’は、抗原曝露室の天井に設けられた外気吹出口2の下方に、天吊棒12を介して吊り下げられている。天吊棒12は抗原供給装置1’の円筒ダクト3に固定されている。抗原供給装置1’のその他の構成は図2の抗原供給装置1と同様であり、従って、図2と同じ符号で示されている。それらの機能も同様であるので説明は省略する。図2の抗原供給装置1と異なる点は、洗浄水用配管7が天井から配管されている点であるが、これは、天井吊り下げ形式であるからである。また、抗原供給装置1’は全体が図2の抗原供給装置1よりも短くなっているが、これも天井から吊り下げる形式であることにより、重量を出来るだけ軽くするためである。   FIG. 4 is a cross-sectional view showing the configuration of the second embodiment of the antigen supply apparatus of the present invention. This embodiment is configured to be suspended from the ceiling of the antigen exposure chamber. As can be seen from the figure, the antigen supply device 1 ′ is suspended through a ceiling rod 12 below the outside air outlet 2 provided on the ceiling of the antigen exposure chamber. The ceiling rod 12 is fixed to the cylindrical duct 3 of the antigen supply apparatus 1 '. The other configuration of the antigen supply apparatus 1 ′ is the same as that of the antigen supply apparatus 1 of FIG. 2, and is therefore indicated by the same reference numerals as in FIG. 2. Since these functions are also the same, description thereof will be omitted. The difference from the antigen supply apparatus 1 in FIG. 2 is that the washing water pipe 7 is piped from the ceiling, because this is a ceiling-suspended type. Further, the whole antigen supply apparatus 1 'is shorter than the antigen supply apparatus 1 shown in FIG. 2, but this is also a type in which it is suspended from the ceiling, so that the weight can be reduced as much as possible.

図5及び6は、抗原供給ノズルの高さを変えた場合の抗原曝露室内抗原濃度の立ち上がり時間を比較したものである。図5は抗原供給ノズルを抗原供給装置の下方端部に設けた場合を示しており、図6は抗原供給ノズルを抗原供給装置の上方端部に設けた場合を示している。各々の図の下部のグラフから明らかなように、抗原供給ノズルの位置が低いと抗原曝露室の抗原濃度の立ち上がりに時間がかかる。従って、濃度の立ち上がりの観点から、本発明の各実施形態に示したように、抗原供給ノズルは出来るだけ高い位置に設置するのが好ましい。   5 and 6 compare the rise time of the antigen concentration in the antigen exposure chamber when the height of the antigen supply nozzle is changed. FIG. 5 shows a case where the antigen supply nozzle is provided at the lower end portion of the antigen supply device, and FIG. 6 shows a case where the antigen supply nozzle is provided at the upper end portion of the antigen supply device. As is clear from the graphs at the bottom of each figure, when the position of the antigen supply nozzle is low, it takes time for the antigen concentration in the antigen exposure chamber to rise. Therefore, from the viewpoint of rising concentration, it is preferable to install the antigen supply nozzle at a position as high as possible, as shown in each embodiment of the present invention.

更に、洗浄水は水道水ではなく純水を使用する方が水垢が残らずに綺麗に洗浄できるので好ましい。   Furthermore, it is preferable to use pure water instead of tap water because washing water can be cleaned cleanly without leaving any scale.

以上、実施形態により本発明の抗原供給装置を詳細に説明したが、本発明はこれらの実施形態に限定されず、本発明の技術的思想の範囲内で種々の変更、変形が可能である。   As mentioned above, although the antigen supply apparatus of this invention was demonstrated in detail by embodiment, this invention is not limited to these embodiment, A various change and deformation | transformation are possible within the range of the technical idea of this invention.

例えば、抗原としてはあらゆる抗原を使用することができる。抗原曝露室の外気吹出口が室の中央にあり、その真下に抗原供給装置を設けるのが好ましいが、室構造の関係から必ずしもこれに限定されなくても良い。

For example, any antigen can be used as the antigen. It is preferable that the outside air outlet of the antigen exposure chamber is in the center of the chamber, and an antigen supply device is provided immediately below the center, but this is not necessarily limited to this because of the chamber structure.

Claims (5)

抗原曝露室に抗原を供給するための抗原供給装置であって、
垂直方向に延びた筒状体であって、下端に前記抗原曝露室内の空気を吸い込むための空気吸込口が設けられ、該空気吸込口の上方に前記筒状体の軸線方向上方に流れる空気の流れを生じる軸流ファンが取り付けられ、更に前記筒状体の前記軸流ファンの上方に前記抗原曝露室外部のダストフィーダから高濃度の抗原が噴射される供給口が設けられた、前記筒状体によって主として構成され、
前記抗原曝露室の外気吹出口に近接して設置され、抗原曝露室外部のダストフィーダから供給された高濃度の抗原が前記空気吸込口から吸い込んだ抗原曝露室内の空気と混合されて希釈された後に前記筒状体上端から前記外気吹出口に向けて吹き出して前記外気吹出口からの外気と混合させて抗原曝露室を充満させる構成とされた抗原供給装置。
An antigen supply apparatus for supplying an antigen to an antigen exposure chamber,
A cylindrical body extending in the vertical direction, provided with an air suction port for sucking air in the antigen-exposed chamber at the lower end, and air flowing upward in the axial direction of the tubular body above the air suction port An axial flow fan for generating a flow is attached, and the cylindrical body is further provided with a supply port for injecting a high-concentration antigen from a dust feeder outside the antigen exposure chamber above the axial flow fan of the cylindrical body. Composed mainly by the body,
Installed in close proximity to the outside air outlet of the antigen exposure chamber and diluted with high-concentration antigen supplied from a dust feeder outside the antigen exposure chamber mixed with air in the antigen exposure chamber sucked from the air inlet. An antigen supply apparatus configured to fill the antigen exposure chamber by being blown out from the upper end of the cylindrical body toward the outside air outlet and mixed with outside air from the outside air outlet.
請求項に記載の抗原供給装置であって、
前記筒状体内部を洗浄するための洗浄水を前記筒状体に供給するための洗浄水配管と、
前記洗浄水を排水するための洗浄水用ドレンとを更に含む抗原供給装置。
The antigen supply device according to claim 1 ,
A cleaning water pipe for supplying cleaning water for cleaning the inside of the cylindrical body to the cylindrical body;
An antigen supply apparatus further comprising a washing water drain for draining the washing water.
請求項に記載の抗原供給装置であって、
ダストフィーダから高濃度の抗原が噴射される前記供給口が前記筒状体の上端に設けられている抗原供給装置。
The antigen supply device according to claim 1 ,
An antigen supply apparatus, wherein the supply port through which a high concentration of antigen is ejected from a dust feeder is provided at an upper end of the cylindrical body.
請求項に記載の抗原供給装置であって、
前記筒状体が、金属又は導電性樹脂からなる部材によって構成されている抗原供給装置。
The antigen supply device according to claim 1 ,
An antigen supply apparatus, wherein the cylindrical body is constituted by a member made of metal or conductive resin.
請求項に記載の抗原供給装置であって、
抗原曝露室の天井に吊り下げる形式又は抗原曝露室の床面上に設置する形式とされた抗原供給装置。
The antigen supply device according to claim 1 ,
An antigen supply apparatus that is suspended from the ceiling of the antigen exposure chamber or installed on the floor of the antigen exposure chamber.
JP2007537500A 2005-09-28 2005-09-28 Antigen supply device Expired - Lifetime JP4750797B2 (en)

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