JP4762165B2 - Low reflection film and method for producing the same - Google Patents

Description

  The present invention relates to a low reflection film and a method for producing the same, and more specifically, after forming a coating layer for a porous layer containing a soluble substance, the porous layer is formed by dissolving and extracting the soluble substance using a solvent. The present invention relates to a low reflection film in which pores are introduced into a coating layer for forming a porous layer and a method for producing the same.

  As display technology advances rapidly, image display devices such as LCDs, CRTs, PDPs or OLEDs typically display less contrast due to external light reflections and image reflections. An antireflection film is placed on the outermost surface of the device. The antireflection film provided with such functionality is coated with a substance for anti-glare (AR, Anti-Reflection) or low reflection (LR, Low-Reflection).

  An existing antireflection film is formed by laminating a transparent layer made of one or more metal oxides. The transparent layer made of a metal oxide is formed by a CVD (chemical vapor deposition) method or a PVD (physical vapor deposition) method, and the PVD method is mainly used. Although this metal oxide layer has excellent performance as an antireflection film, the vapor deposition method has disadvantages that mass production is not preferable because productivity is lowered and production cost is expensive.

  Thereafter, a method for producing an antireflection film by coating a film with a coating solution containing inorganic fine particles and a low refractive compound such as a fluorine compound instead of the vapor deposition process has been developed.

As an example, a method of producing an antireflection film by laminating a low refractive index layer on a support and a low refractive index layer using inorganic fine particles thereon and two or more kinds of fine particles such as MgF ₂ and SiO ₂ There is a method for producing an antireflection film by changing the refractive index by changing the mixing ratio depending on the thickness.

  In addition, a method for producing an antireflection film by forming a low refractive index layer using hollow fine particles has been developed. That is, there is a method for producing an antireflection film using an inorganic powder made of hollow silica and a binder.

JP 59-50401 A JP-A-2-245702

  However, the above-described conventional technique has a problem that the manufacturing cost is high in the case of inorganic fine particles, and the fluorine compound has a problem of being easily damaged when applied to a display device because of its low surface hardness and low scratch resistance. Therefore, a solution for this is being planned.

  The present invention has been devised to solve the above-described problems, and provides a low-reflection film having excellent scratch resistance and low cost, and a method for producing the same.

Forming a hard coating layer with inorganic hybrid hard coating solution - organic containing UV reactive silica particles child on at least one surface to achieve the above object, the transparent substrate film: manufacturing method of the low reflection film according to the present invention If, on top of the hard coating layer, the organic - inorganic hybrid hard coating solution, and the soluble product quality coating solution containing coating to form a porous layer coating layer by curing stage, the soluble material all or part of the dissolved solvent when viewed including the steps of forming a porous layer, the soluble substance, the organic - to the coating solution 100 parts by weight of inorganic hybrid hard coating solution and the soluble substance 25-35 includes parts, as the soluble material, water, any alcohol-based solvent It is soluble, and it is preferable to employ a method of manufacturing a low-reflection film, wherein the benzalkonium using one or more materials selected from organic or inorganic.

  In the method for producing a low reflection film according to the present invention, it is preferable to change the content of the soluble substance contained in the porous layer coating layer in order to control the optical properties of the low reflection film.

Low reflective film according to the present invention: The low reflective film according to the present invention is a low reflective film obtained by using the above-described method for producing a low reflective film, and includes a hard coating layer on a transparent substrate film, A porous layer is provided on the hard coating layer.

  In the low reflection film according to the present invention, the porous layer preferably has a porosity in the range of 10 to 50%.

  In the low reflection film according to the present invention, the porous layer has a refractive index smaller than that of the hard coating layer, the refractive index is in the range of 1.25 to 1.45, and the reflectance is 2% or less. It is.

  The hard coating layer of the low reflection film according to the present invention preferably has a surface hardness of 2H or more.

  The porous layer of the low reflection film according to the present invention preferably has nano-sized pores of 10 to 70 nm.

  The low reflection film and the manufacturing method thereof according to the present invention have a surface hardness that is extremely excellent by forming a coating layer by adding a soluble substance, and dissolving and extracting the coating layer in a solvent to produce a porous layer. Provides excellent antireflection performance of 2% or less. Further, the reflectance can be easily controlled by freely controlling the refractive index according to the amount of the soluble substance input, and a low-reflection film having a low production cost can be produced using a low-cost material.

  Hereinafter, the present invention will be described in detail with reference to the accompanying drawings and embodiments.

  FIG. 1 is a cross-sectional view of a low reflection film according to an embodiment of the present invention. The low-reflection film comprises a hard coating layer 2 formed on the transparent substrate film 1 and a porous layer 3 formed on the hard coating layer 2 and having a refractive index lower than that of the hard coating layer 2. It is characterized by.

  As the transparent substrate film 1, any film can be used as long as it is a transparent film, and is not limited thereto.

  For example, cellulose derivatives such as diacetyl cellulose, triacetyl cellulose, propionyl cellulose, butyryl cellulose, acetyl propionyl cellulose, polyester, polyamide, polyimide, polyethersulfone, polysulfone, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, Examples include unstretched, uniaxially or biaxially stretched films of thermoplastic polymers such as polyether ketone, polymethyl methacrylate, polyethylene terephthalate, polycarbonate, polyurethane, and epoxy.

  Of these, a uniaxial or biaxially stretched polyester film excellent in transparency and heat resistance, and a triacetyl cellulose film can be desirably used in terms of transparency and no optical anisotropy. Although the thickness of the transparent base film 1 is not restricted, it is about 8-1000 micrometers, Desirably 40-100 micrometers can be used.

  The hard coating layer 2 is not particularly limited as long as it is a material excellent in scratch resistance. Here, the hard coating layer 2 means a coating layer having a hardness of H or higher in the pencil hardness test. As for the surface hardness of the hard coating layer 2, it is desirable to use a coating solution that can provide physical properties of a surface hardness of preferably 2H or more, and more preferably 4H or more. A reactive curable resin or a reactive organosilicon compound that is cured by UV or heat is desirably selected.

  As an example, a UV curable resin of an organic-inorganic hybrid type (reactive silica particles) can be used, and the silica particles can be produced by mixing with a hydrolyzable silane having a polymer unsaturated group and chemical bonding. The amount of hydrolyzable silane having a polymeric unsaturated group bonded to the reactive silica particles is about 0.05 to 99% by weight, desirably 5 to 85% by weight. When the amount of hydrolyzable silane is less than 0.05% by weight, the transparency and abrasion resistance of the cured film are affected, and when it is more than 99% by weight, the abrasion resistance is only slightly improved.

  Hydrolyzable silyl groups can be carboxylate silyl groups such as acetoxysilyl groups, alkoxysilyl groups such as methoxy or ethoxysilyl groups, halogen silyl groups such as chlorosilyl groups, amino and hydride silyl groups, and the like. Desirably an alkoxysilyl group is best used.

  The polymeric unsaturated group may be carboxy, hydroxy, acryloxy, methacryloxy, vinyl, prophenyl, butadienyl, styryl, cinnamoyl, malate, acrylamide group, and the like. Of these, unsaturated fatty carboxylic acids containing hydroxy groups and methacrylate compounds are desirable.

The average particle diameter of the reactive silica particles is desirably 0.0001 to 1 μm, and when used for a cured transparent film, 0.001 to 0.01 μm is desirable. The specific surface area of the silica particles is preferably 0.001 and 2M ² / g, and more preferably 0.001~0.1m ² / g, and most desirably 0.001~0.01m ² / g. The silica particles may be colloidal silica dispersed in an organic solvent such as a dry powder or methanol silica sol. The production of the reactive silica particles is performed at 20 to 150 ° C., and is performed in the range of 5 minutes to 24 hours.

  Moreover, a photoinitiator can be added to the hard coating layer 2 for UV curing, and a photoinitiator used in this technical field can be used.

  Examples include diphenyl ketone benzyl dimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-1-one, 4-hydroxycyclophenyl ketone, dimethoxy-2-phenylacetophenone, anthraquinone, fluorene, triphenylamine, carbazole, 3 -Methylacetophenone, 4-chloroacetophenone, 4,4-dimethoxyacetophenone, 4,4-diaminobenzophenone, etc. can be used alone or in a mixture of 0.1 to 10% by weight. When the photoinitiator is less than 0.1% by weight, the curing rate is slow, and when it is more than 10% by weight, it is uneconomical.

  The photo-stimulant can be used with a photo-initiator, and for example, triethylamine, diethylamine, methyldiethanolamine, ethanolamine, 4-dimethylamino-benzoic acid, isoamyl-4-dimethylaminobenzoate, etc. are used.

  In addition to the above substances, an antioxidant, UV absorber, light stabilizer, thermal polymerization inhibitor, leveling agent, surfactant, lubricant and the like can be used.

  Further, the porous layer 3 has pores on the surface and inside thereof, and the porosity is not limited, but 10 to 50%, preferably 18 to 40% is suitable. If the porosity is 10% or less, there is a problem that the low refraction effect and the surface antireflection effect are lowered, and if the porosity is 50% or more, the scratch resistance and transmittance are lowered due to the formation of micropores. is there. The pore size of the porous layer 3 is 10 to 70 nm, and preferably 20 to 50 nm.

  The refractive index of the porous layer 3 is preferably smaller than that of the hard coating layer 2 and is not limited, but is in the range of 1.25 to 1.45, and the reflectance is 2% or less. It is good to be. The refractive index of the porous layer 3 can be adjusted by adjusting the porosity.

  The material of the porous layer 3 is not particularly limited, but a reactive curable resin or a reactive organosilicon compound that is cured by UV or heat is desirably selected. Moreover, the material excellent in surface strength, such as UV curable resin same as the hard coating layer 2, can be used.

  And the method of forming the porous layer 3 can use a well-known method in this technical field, More preferably, it is good to form by the manufacturing method mentioned later.

  The low reflection film according to the present invention can be laminated with another layer between the layers described above or outside thereof as necessary, in addition to the above-described configuration, and this is also included in the present invention. Moreover, the low reflection film according to the present invention is manufactured by a low reflection film manufacturing method described later.

  FIG. 2 is a procedural diagram relating to the method for producing a low reflection film of the present invention. In the method for producing the low reflection film, a step of forming a hard coating layer 2 on at least one surface of the transparent substrate film 1 (S10), a coating liquid containing a soluble material is applied on the hard coating layer 2 to form a porous layer And forming a porous layer 3 by dissolving all or part of the soluble material with a solvent (S30). In addition to the above steps, other steps can be added as necessary and are also included in the present invention.

  Each stage will be described. First, the hard coating layer 2 is formed on at least one surface of the transparent substrate film 1 (S10).

  The coating liquid for the hard coating layer 2 contains the curable resin and the photoinitiator described above, and other solvents and the like for the viscosity required during coating. The hard coating layer 2 can be formed by a method used in this technical field. For example, the hard coating layer 2 can be coated by an appropriate method such as die coating, casting, gravure and spin coating.

  The coating thickness is usually about 0.1 to 400 μm, preferably about 1 to 200 μm. After coating, it is dried by evaporation of volatiles at a temperature of 10-100 ° C. for 1 second to 24 hours, preferably 5 seconds to 2 hours. Thereafter, UV light is applied to cure.

The irradiation amount of UV light is about 0.01 to 10 J / cm ² , desirably 0.1 to ² J / cm ² . The refractive index of the hard coating layer 2 thus formed is preferably at least higher than the refractive index of the porous layer 3 laminated on the hard coating layer 2, and its surface strength is 2H or higher, more preferably 4H or higher. It is desirable.

  Next, a coating liquid containing a soluble material is applied to the top of the hard coating layer 2 to form a porous layer coating layer (S20).

  The coating method can be performed in the same manner as the hard coating layer 2, and is not limited. Coating can be performed by an appropriate method such as gravure and spin coating. The coating thickness is not limited, but is usually about 50 to 200 nm, desirably about 80 to 120 nm.

After application, the composition is dried by evaporation of volatiles at a temperature of 10-100 ° C. for 1 second to 24 hours, preferably 5 seconds to 2 hours. Thereafter, UV light is applied to cure. The irradiation amount of UV light is about 0.01 to 10 J / cm ² , desirably 0.1 to ² J / cm ² .

  Further, the hard coating layer 2 and the porous layer coating layer can be cured, respectively, but can also be cured once after each layer is formed, and this is also included in the present invention.

  The coating liquid containing the soluble material includes the binder and the photoinitiator described above. That is, the porous layer coating liquid for forming the porous layer 3 includes a binder and can be used without limitation as long as it is a substance insoluble in the solvent used to dissolve the soluble substance. The material is desirably selected from a reactive curable resin and a reactive organosilicon compound that are cured by UV or heat. Moreover, the material excellent in surface strength can be used using the same UV curable resin as the hard coating layer 2.

  The soluble material is for forming pores of the porous layer 3, and is water, alcohol-based (methanol, ethanol, isopropanol, butanol, etc.), ketone-based (methyl ethyl ketone, methyl butyl ketone, methyl isobutyl ketone, diethyl ketone, dike). The substance is not limited as long as it is a substance such as an organic substance or an inorganic substance that is dissolved in a solvent such as propyl ketone.

  As an example, the following monomers and their polymer materials correspond to this. As monomers, styrene, p-methylstyrene, m-methylstyrene, p-ethylstyrene, m-ethylstyrene, p-chlorostyrene, m-chlorostyrene, p-chloromethylstyrene, m-chloromethylstyrene, aromatic vinyl compounds of pt-butoxystyrene, mt-butoxystyrene, fluorostyrene, α-methylstyrene, vinyltoluene, chlorostyrene, and methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, Butyl methacrylate, octyl acrylate, octyl methacrylate, stearyl acrylate, stearyl methacrylate, benzyl acrylate, benzyl methacrylate, glycidyl acrylate, glycidyl methacrylate Acrylic and fluoroacrylic compounds such as acrylate, fluoroethyl acrylate, ethyl methacrylate, hexafluorobutyl methacrylate, hexafluoroisopropyl methacrylate, perfluoroalkyl acrylate, octafluorophenyl methacrylate, (meth) acrylic acid, maleic Unsaturated carboxylic acid compounds such as acid, fumaric acid, crotonic acid, itaconic acid and vinyl sulfonic acid; unsaturated sulfonic acid compounds such as vinyl sulfonic acid, aryl sulfonic acid and p-styrene sulfonic acid; and methyl acrylate. Acrylate compounds such as ethyl acrylate, butyl acrylate, octyl acrylate, methoxyethyl acrylate, phenyl acrylate, cyclohexyl acrylate, and (meth) acrylate Vinyl cyanide compounds such as rilonitrile and methacrylonitrile, and amide compounds such as 2- (meth) acrylamide-2-methylpropanesulfonic acid, (meth) acrylamide, N-isopropyl (meth) acrylamide, and N-vinylacetamide There is.

Examples of the inorganic compounds, zirconium oxynitrate hydrate _{[ZrO (NO 3) 2]} · H 2 O, oxy zirconium chloride hydrate _{(ZrOCl 2 · H 2 O)} , lithium nitrate (LiNO _3), lithium acetate (CH ₃ COOOLi), tin chloride hydrate (SnCl ₄ · nH ₂ O), indium nitrate hydrate (In (NO ₃ ) ₃ · nH ₂ O), indium chloride hydrate (InCl ₂ · nH ₂ O) ), 12-tungstophosphoric acid (H ₃ PW ₁₂ O ₄₀ ), 12-tungsto silicon acid (H ₄ SiW ₁₂ O ₄₀ ), and the like. One or a combination of two or more of these can be used.

Moreover, 10 to 50 parts by weight with respect to the coating solution 100 parts by weight as the content of soluble material added to the hard coating solution, preferably 18 to 40 parts by weight is not good.

The soluble material added to the hard coating solution is preferably 25 to 35 parts by weight with respect to 100 parts by weight of the coating solution containing the organic-inorganic hybrid hard coating solution and the soluble material. If the content of the soluble substance is added in an amount less than the lower limit, the nano-porous layer is not sufficiently formed, and there is a problem that the low refraction effect and the surface antireflection effect are lowered. Further, if the content of the soluble substance is added in an amount exceeding the upper limit, there is a problem that the scratch resistance and the transmittance are lowered due to the coating surface residue of the soluble substance and the formation of micropores.

  The refractive index of the porous layer 3 is preferably smaller than that of the hard coating layer 2 and is not limited, but is within the range of 1.25 to 1.45, and the reflectance is 2% or less. It is good to be. Furthermore, the refractive index of the porous layer 3 can be adjusted by adjusting the porosity.

  Next, the porous layer 3 is formed by forming pores in the coating layer for the porous layer by dissolving all or part of the soluble substance with a solvent (S30). The produced film is not limited, but is soaked at a solvent temperature of 25 to 80 ° C. for 1 to 60 minutes, preferably 5 to 15 minutes to dissolve and extract soluble substances, and then at 60 to 150 ° C. for 1 to 10 minutes. It is dried for a minute to produce the low reflection film of this embodiment.

The solvent is at least one selected from the group consisting of water and alcohol solvents (methanol, ethanol, isopropanol, butanol, etc. ) . In addition, a ketone system (methyl ethyl ketone, methyl butyl ketone, methyl isobutyl ketone, diethyl ketone, dipropyl ketone, etc.) can be considered.

  Hereinafter, the present invention will be described in detail through examples. The embodiments of the present invention are merely illustrative, and do not limit or limit the protection scope of the present invention.

A hard coating solution (product name: DN-0080, product manufacturer: DSM) is coated on a triacetyl cellulose film (hereinafter referred to as a TAC film), thermally dried at 70 ° C. for 1 minute, and then used with a high-pressure mercury lamp. It was cured by irradiating with 700 mJ / cm ² of ultraviolet rays.

The coating liquid for the porous layer was mixed with a hard coating liquid (product name: DN-0080, product manufacturer: DSM) with a polyacrylic acid content of 25 % by weight.

Next, the mixed coating liquid for porous layer is coated on the TAC film on which the hard coating layer is formed to a thickness of 110 nm, and then thermally dried at 70 ° C. for 1 minute, and then 700 mJ / hour using a high pressure mercury lamp. It was cured by irradiating cm ² ultraviolet rays.

  Then, the manufactured film is allowed to stand at a temperature of 50 ° C. for 10 minutes using water as a solvent, and after removing polyacrylic acid and drying at 80 ° C. for 5 minutes, a porous layer is formed to form a low reflection film Manufactured. The size of the formed pores was about 50 nm.

  The porous layer coating solution was prepared in the same manner as in Example 1 except that the polyacrylic acid content was 30% by weight and mixed with a hard coating solution (product name: DN-0080, product manufacturer: DSM).

  The porous layer coating solution was prepared in the same manner as in Example 1 except that the polyacrylic acid content was 35% by weight and mixed with a hard coating solution (product name: DN-0080, product manufacturer: DSM).

[Reference Example 1]
A hard coating solution (product name: DN-0080, product manufacturer: DSM) is coated on a triacetyl cellulose film (hereinafter referred to as a TAC film), thermally dried at 70 ° C. for 1 minute, and then used with a high-pressure mercury lamp. It was cured by irradiating with 700 mJ / cm ² of ultraviolet rays.

  The coating liquid for the porous layer was mixed with a hard coating liquid (product name: DN-0080, product manufacturer: DSM) with a polyacrylic acid content of 20% by weight.

Next, the mixed coating liquid for porous layer is coated on the TAC film on which the hard coating layer is formed to a thickness of 110 nm, and then thermally dried at 70 ° C. for 1 minute, and then 700 mJ / hour using a high pressure mercury lamp. It was cured by irradiating cm ² ultraviolet rays.

  Then, the manufactured film is allowed to stand at a temperature of 50 ° C. for 10 minutes using water as a solvent, and after removing polyacrylic acid and drying at 80 ° C. for 5 minutes, a porous layer is formed to form a low reflection film Manufactured. The size of the formed pores was about 50 nm.

[Reference Example 2]
A hard coating solution (product name: DN-0080, product manufacturer: DSM) was coated on a triacetyl cellulose film (hereinafter referred to as a TAC film), heat-dried at 70 ° C. for 1 minute, and then cured with ultraviolet rays.

  The porous layer coating solution was mixed with a hard coating solution (product name: DN-0080, product manufacturer: DSM) with a 12-tungstophosphoric acid content of 20% by weight.

  Next, the mixed coating solution for the porous layer was coated on the TAC film on which the hard coating layer was formed to a thickness of 110 nm, then thermally dried at 70 ° C. for 1 minute, and then UV-cured.

  The produced film is allowed to stand at 50 ° C. for 10 minutes using ethanol as a solvent, 12-tungstophosphoric acid is removed and dried at 80 ° C. for 5 minutes, and then a porous layer is formed to reduce reflection. A film was produced. The size of the formed pores was about 40 nm.

Comparative example

[Comparative Example 1]
A hard coating solution (product name: DN-0080, product manufacturer: DSM) was coated on the TAC film, heat-dried at 70 ° C. for 1 minute, and then cured with ultraviolet rays to eliminate the porous layer.

[Comparative Example 2]
The porous layer coating solution was prepared in the same manner as in Example 1 except that the polyacrylic acid content was 7% by weight and mixed with a hard coating solution (product name: DN-0080, product manufacturer: DSM).

And the low reflection film manufactured by the Example , the reference example, and the comparative example measured the physical property as follows, and showed the result in the following Table 1.

(1) Refractive Index and Porosity Using a spectroscopic ellipsometer (Eli-SE, manufactured by Korea Ellipso Technology), reflected light was measured at an incident angle of 60 ° and a photon energy of 1.20 to 4.80 eV. The refractive index and porosity of the porous layer produced in the comparative example were measured.

(2) Transmittance and Haze Using a spectrophotometer (HZ-1, manufactured by Japan SUGA), total light transmittance and haze of low reflection films produced in Examples and Comparative Examples. Was measured.
Total light transmittance (%)
5: 95% or more 4: 93% or more 3: 90% or more 2: 85% or more 1: 80% or more

(3) Reflectance Using a UV spectrometer (UV-Spectrophotometer, manufactured by Nippon SHIMADZU), the reflectance of the low-reflection films produced in Examples and Comparative Examples was measured. The wavelength region was a visible light region of 380 to 780 nm. The minimum reflectance (%) of the low reflection film was obtained from the obtained reflectance spectrum.

(4) Pencil Hardness Using a pencil hardness tester (PHT, Korea Sokbo Science), a 500 g load was applied to measure the pencil hardness of the low reflection films produced in the examples and comparative examples. A pencil manufactured by Mitsubishi Corp. was used and applied 5 times per pencil hardness. Those with two or more scratches were excluded from the spec.
Scratches: 0 OK Scratches: 1 OK Scratches: 2 or more NG

(5) Scratch resistance Low reflection film produced in Examples and Comparative Examples by using a steel wool tester (WT-LCM100, Korean Protech) and reciprocating 10 times under 1 kg / (2 cm × 2 cm). Were tested for scratch resistance. Steel wool # 0000 was used.
A: 0 scratches A ': 1-10 scratches B: 11-20 scratches C: 21-30 scratches D: 31 or more scratches

(6) Adhesiveness After forming 100 squares by drawing 11 straight lines at 1 cm intervals on the surface of the low-reflective film produced in Examples and Comparative Examples, tape (CT-24, Japan NICHIBAN) The product was subjected to a peel test three times. Three 100 squares were tested and the average value recorded. The adhesion was recorded as follows.
Adhesiveness = n / 100
n: Number of squares not peeled out of all squares 100: Number of squares overall Therefore, 100/100 is recorded when none is peeled off.

(7) Pore size The pore size was measured using FE-SEM (S4300, manufactured by Hitachi, Ltd. Japan).

  As described above, the low reflection film and the manufacturing method thereof according to the present invention are excellent in scratch resistance and can reduce the manufacturing cost. Therefore, this invention can fully be utilized in the technical field of a low reflection film.

It is sectional drawing of the low reflection film by one Embodiment of this invention. It is a procedure figure regarding the manufacturing method of a low reflection film.

DESCRIPTION OF SYMBOLS 1 Transparent base film 2 Hard coating layer 3 Porous layer

Claims (7)

Forming a hard coating layer with inorganic hybrid hard coating liquid, - organic containing UV reactive silica particles child on at least one surface of the transparent substrate film
On top of the hard coating layer, the organic - the steps of the inorganic hybrid hard coating solution, coating solution containing a soluble product quality was applied to form a porous layer coating layer is cured,
All or part of the soluble material is dissolved in a solvent when viewed including the steps of forming a porous layer,
The soluble substance is contained in an amount of 25 to 35 parts by weight with respect to 100 parts by weight of the coating liquid containing the organic-inorganic hybrid hard coating liquid and the soluble substance.
As the soluble substance, water, soluble in either alcohol Solvent, and method for producing a low-reflection film, wherein the benzalkonium using one or more materials selected from organic or inorganic . The method for producing a low reflection film according to claim 1, wherein the content of the soluble substance contained in the coating layer for the porous layer is changed in order to control the optical properties of the low reflection film. The claim 1 or a low-reflection film obtained by using the manufacturing method of the low-reflection film according to claim 2,
A low reflection film comprising a hard coating layer on a transparent substrate film and a porous layer on the hard coating layer. The low reflective film according to claim 3 , wherein the porous layer has a porosity in the range of 10 to 50%. The porous layer is provided with the hard coating layer is less than refractive index, the refractive index is in the range of 1.25 to 1.45, and, according to claim 3 or claim 4 reflectance of 2% or less The low reflection film as described in 2. The low reflection film according to any one of claims 3 to 5 , wherein the hard coating layer has a surface hardness of 2H or more. The low-reflection film according to any one of claims 3 to 6 , wherein the porous layer has nano-sized pores of 10 to 70 nm.

Images