JP4764780B2 - Equipment seismic isolation device - Google Patents

Description

  The present invention relates to an equipment seismic isolation device, and more specifically, an indoor space in which manufacturing equipment of a composite manufacturing equipment system is disposed, and a lower layer formed below the floor structure of the indoor space. The present invention relates to a device seismic isolation device provided in a manufacturing facility having a space.

  2. Description of the Related Art An air conditioning system that blows a clean air flow downward from a ceiling surface and sucks a descending air flow from a suction port on a floor surface is used in a manufacturing factory for precision parts that require a clean work space, a computer room, and the like. For example, in many semiconductor factories that manufacture electronic devices such as semiconductors, liquid crystals, diodes, etc., a one-way flow system that blows a clean air flow downward from the ceiling surface and sucks an air flow flowing down the indoor area from a suction port on the floor surface The air conditioning system is adopted. In this type of air conditioning system, indoor air containing dust and the like is diluted with clean air, sent from the floor inlet to the air circulation system, and purified by a high-performance filter such as a HEPA (High Efficiency Particulate Air) filter. After being recirculated into the room. According to such a one-way flow air conditioning system, high air cleanliness can be maintained indoors.

  In an electronic device manufacturing plant equipped with this type of air conditioning system, a two-layer manufacturing facility is known in which an underfloor equipment space in which auxiliary equipment of semiconductor manufacturing equipment can be placed is formed below an indoor space (for example, JP-A-2-243882). In the precision equipment manufacturing factory having such a multi-layer structure, the air flow that has passed through the floor surface suction port of the clean air flow is sent to the air circulation system via the underfloor equipment space.

In recent years, seismic isolation devices that improve the seismic isolation performance of buildings have been adopted in many buildings, but in manufacturing facilities equipped with high-precision production equipment or manufacturing equipment, First, measures are taken to locally isolate the manufacturing equipment itself and protect the production equipment or manufacturing equipment from the excitation force during the earthquake. For example, seismic isolation stands for locally isolating the manufacturing equipment itself are disclosed in Japanese Patent Application Laid-Open Nos. 2006-16910, 2005-127460, 9-32261, and 9-195570. Has been.
JP-A-2-243882 JP 2006-16910 A JP 2005-127460 A JP-A-9-32261 JP 9-195570 A

  2. Description of the Related Art An exposure apparatus (lithography or stepper) that irradiates a photoresist substrate with a laser beam to etch a precise and dense electrode pattern on the substrate is used in many manufacturing factories for producing semiconductor and liquid crystal panel substrates. The exposure equipment is an extremely precise vibration isolator, so it is difficult to support it with a seismic isolation stand. On the other hand, if earthquake acceleration acts on such a high-precision manufacturing equipment, it will greatly affect readjustment after the earthquake. If a large amount of labor and time are required and an excessive seismic force acts on the manufacturing apparatus, there is a concern that a fatal damage or the like that is difficult to recover from the apparatus may occur. For this reason, considering problems such as readjustment after an earthquake, it is considered desirable to perform seismic isolation using equipment seismic isolation means even for precision equipment such as an exposure apparatus.

  12 and 13 are partial longitudinal sectional views of a semiconductor manufacturing factory showing a configuration in which a stepper (reduction projection type exposure apparatus) is supported by a base isolation frame.

  A space 1 in a clean room of a semiconductor manufacturing factory (hereinafter referred to as “indoor space 1”) includes a floor structure 2 having air permeability and a ceiling structure 3 incorporating an air conditioning unit 9 (shown by a broken line). . The air conditioning unit 9 blows a clean air flow downward from the ceiling surface. The floor surface of the floor structure 2 is made of a perforated grating 5 laid on a steel joist 4, and the airflow flowing down the indoor space 1 passes through the opening of the grating 5 and falls to the lower space 6.

  The lower space 6 is used as an equipment space in which auxiliary equipment, equipment, piping, wiring and the like of manufacturing equipment can be arranged, and also used as a maintenance space where workers and the like can walk. The airflow flowing down into the lower space 6 is returned to the air conditioning unit 9 of the ceiling structure 3 through an air circulation system (not shown) of the air conditioning system, and after being purified by the high performance filter of the air conditioning unit 9, the indoor space 1 Recirculate to

  A complex manufacturing system composed of the stepper 10 and the laser device 11 is disposed in the indoor space 1, and the power supply unit 12, the air conditioner 13, and the temperature controller 14 of the stepper 10 are disposed in the lower space 6. A coater developer 40 associated with the stepper 10 is disposed in the indoor space 1. As shown in FIG. 12, the stepper 10 and the laser device 11 are supported by a common seismic isolation frame 20 and are interconnected by a horizontal pipe 15 through which laser light passes. As shown in FIG. 13, the coater developer 40 may be further disposed on the seismic isolation rack 20.

  The seismic isolation rack 20 includes a rigid floor set 21 made of a steel structure panel, a support substrate 22 firmly fixed to the joist 4 or the horizontal member 30, and an isolation base interposed between the rigid floor set 21 and the substrate 22. It consists of seismic support 23. The seismic isolation bearing 23 protects precision devices (the stepper 10 and the laser device 11) on the rigid floor assembly 21 by interrupting the excitation force acting on the gantry 20 during an earthquake.

  The stepper 10 is connected to the power supply unit 12, the air conditioner 13, and the temperature controller 14 in the lower space 6 by pipes or wires 16, 17, 18. The power supply unit 12, the air conditioner 13, and the temperature controller 14 are firmly fixed to the floor structure 7 in the lower space 6 with anchor bolts or the like that can withstand short-term horizontal loads during an earthquake. The pipes or wires 16, 17, 18 have flexible joints, flexible tubes or flexible wiring portions 16a, 17a, 18a, or are composed of flexible tubes or flexible wires over the entire length, Vibration transmission between the auxiliary equipment (power supply unit 12, air conditioner 13 and temperature controller 14) and precision equipment (stepper 10 and laser device 11) is caused by local deformation of pipes or wirings 16, 17, 18 or possible. It is blocked by flexibility or the like.

  However, the seismic isolation frame 20 that supports both the stepper 10 and the laser device 11 and the seismic isolation frame 20 that further supports the coater developer 40 have a large plane size and a considerable floor area (horizontal projection area). 1 occupied. This restricts the floor area of the indoor space 1 that can be effectively used, or prevents the optimization of the scale of the manufacturing facility.

  On the other hand, the laser device 11 is relatively low in the necessity for being arranged on a precision processing material conveyance line such as a wafer, and can also be arranged in a space with a relatively low cleanliness. It can be considered that the laser device 11 is arranged in the lower layer space 6 and installed on the floor structure 7 in the same manner as the auxiliary machines 12, 13, and 14. However, the pipe 15 connecting the stepper 10 and the laser device 11 constitutes a path of a fine exposure optical system through which a laser beam to be irradiated onto a wafer or the like passes through a reticle, a reduction projection lens group, and the like. Etc., strict management is required. For this reason, the relative displacement or relative behavior of the stepper 10 and the laser device 11 must be reliably prevented. Such a condition is considered to be imposed more strictly in the future in conjunction with the recent trend of semiconductor manufacturing technology that pursues further miniaturization of circuit patterns and the like. That is, when the laser device 11 is arranged in the lower space 6 like the auxiliary machines 12, 13, and 14, as a result of relative displacement or relative behavior between the stepper 10 and the laser device 11 during an earthquake, A long and difficult readjustment work (optical axis adjustment work, etc.) is required during operation.

  For this reason, in order to reliably prevent the relative displacement or relative behavior of the stepper 10 and the laser device 11, the stepper 10 and the laser device 11 are separated from each other in the indoor space 1 by a single seismic isolation frame 20 as shown in FIGS. 11 and 12. Although the structure which supports on a floor must be employ | adopted, as above-mentioned, this restrict | limits the indoor space which can be utilized effectively or becomes a factor which prevents optimization of the scale of a manufacturing facility.

  The present invention has been made in view of such a problem, and an object of the present invention is to reduce the floor area of the indoor space occupied by a complex manufacturing apparatus system such as an exposure apparatus and the manufacturing apparatus system. It is providing the apparatus seismic isolation device which can prevent reliably the relative displacement or relative behavior of each manufacturing apparatus which comprises.

In order to achieve the above object, the present invention provides a manufacturing facility having an indoor space in which manufacturing equipment of a complex manufacturing apparatus system is disposed, and a lower space formed below the floor structure of the indoor space. In the equipment seismic isolation device provided,
The upper and lower rigid floor assemblies spaced apart in the vertical direction, and the rigid struts that integrally connect the upper and lower rigid floor assemblies, the upper rigid floor assemblies are arranged via the seismic isolation bearings. Supported by a floor structure, the support column pierces the floor structure so as to be horizontally displaced, and suspends the lower rigid floor set in the lower space,
The first manufacturing equipment constituting the manufacturing apparatus system is fixed on the rigid floor set in the upper layer, and the second manufacturing equipment constituting the manufacturing apparatus system is fixed on the rigid floor set in the lower layer. Providing the equipment seismic isolation device.

  According to the above-described configuration of the present invention, the equipment seismic isolation device has a multi-layered rigid base in which upper and lower rigid floor groups are integrated by a rigid support, and the rigid base is attached to the floor structure via the base isolation support. Supported. The lower rigid floor set is suspended in the lower layer space by the support columns. The high-rigidity multi-layered frame supported by the seismic isolation bearings behaves horizontally or is displaced horizontally in response to the seismic force. The first and second manufacturing devices fixed on the upper and lower rigid floor assemblies respectively move horizontally or horizontally in an integrated manner with the multi-layer gantry, so that the first and second manufacturing devices are formed by a rigid pipe extending in the vertical direction. Equipment can be interconnected.

  According to such a structure, the 1st and 2nd manufacturing apparatus which comprises a composite manufacturing apparatus system can be arrange | positioned up and down, and the floor area of the indoor space which a manufacturing apparatus system occupies can be reduced. In addition, since the first and second manufacturing devices are horizontally or horizontally displaced integrally with the multi-layer gantry, the relative displacement or relative behavior of the first and second manufacturing devices can be reliably prevented.

  According to the device seismic isolation device of the present invention, the floor area of the indoor space occupied by a complex manufacturing apparatus system such as an exposure apparatus is reduced, and the relative displacement or relative behavior of each manufacturing apparatus constituting the manufacturing apparatus system is reduced. It can be reliably prevented.

  In a preferred embodiment of the present invention, the seismic isolation bearing comprises a rigid sliding bearing, an elastic sliding bearing, or a rolling bearing. Preferably, the seismic isolation bearing comprises a rigid sliding bearing disposed between the upper rigid floor set and the floor structure. More preferably, the sliding member of the rigid sliding bearing is fixed to the upper surface of the joist, and the mating member of the sliding bearing is fixed to the lower surface of the upper rigid floor set. By fixing the sliding material to the upper surface of the joists, it is possible to easily ensure vertical piping between the upper and lower devices and an area for the above-mentioned pillars to penetrate the floor structure between the joists.

  According to a further preferred embodiment of the present invention, the floor structure has a reinforcing material for interconnecting the joists. The reinforcing material is made of a steel material such as a structural shape steel, and is laid horizontally between joists to improve the rigidity of the floor structure. Preferably, the reinforcing member is not disposed in the joist region where the supporting column hangs down. Therefore, the supporting column and the reinforcing member that behave horizontally do not interfere with each other, and the behavior of the supporting column is not hindered by the reinforcing member.

  In an embodiment of the present invention, the manufacturing apparatus system is composed of a stepper and a laser device, the stepper being fixed on the upper rigid floor set, and the laser device being fixed on the lower rigid floor set. According to such a configuration, since the stepper and the laser device are horizontally displaced or horizontally moved integrally with the rigid frame in the event of an earthquake, the path of the fine exposure optical system (the pipe between the stepper and the laser device) is deformed during the earthquake. Therefore, the readjustment work (such as the optical axis adjustment work) after the earthquake is simplified.

  For the seismic isolation support that supports the vibration isolator that is the source of vibration itself, such as a stepper, the condition for supporting the equipment rigidly during operation and the desired seismic isolation function by horizontally displacing the equipment during an earthquake Conditions are imposed at the same time. An elastic sliding bearing with an elastic body makes it difficult to rigidly support the device due to deformation of the elastic body. Therefore, the rigid sliding bearing that can rigidly support the device until the occurrence of slipping is the above-mentioned seismic isolation bearing. Is preferably used. Preferably, the rigid sliding bearing has a surface sliding layer in which a friction coefficient is set so that sliding does not occur due to vibration of the manufacturing equipment itself.

  If desired, stepper auxiliaries (power supply unit, air conditioner and temperature controller) are further fixed on the underlying rigid floor set along with the laser device. According to such a configuration, since the entire device system of the stepper including the auxiliary machines can be horizontally displaced or behaved horizontally with the rigid base, the flexible connection means or the It is possible to reduce or eliminate the number of flexible deformation portions installed, or to prevent damage to the flexible joint or the flexible tube during an earthquake.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

  FIGS. 1 and 2 are a front view and a side view showing an embodiment of the device seismic isolation device according to the present invention, and FIGS. 3 and 4 are a clean room space (indoor space) and an underfloor equipment space (lower space). FIG.

  FIG. 1 shows a cross-sectional structure of a clean room in a semiconductor manufacturing factory. In the clean room internal space 1 (indoor space 1), a manufacturing line composed of various manufacturing apparatuses and a transfer apparatus is arranged. An air conditioning unit (fan filter unit) 9 including a high-performance filter such as a HEPA filter is incorporated in the ceiling structure 3 of the clean room. The air conditioning unit 9 blows a clean air flow downward from the ceiling surface as indicated by an arrow. The floor structure 2 in the indoor space 1 includes a metal perforated grating 5 having a large number of air holes through which airflow can be passed, a joist 4 that supports the grating 5, and a horizontal member 30 that supports the joist 4. And a beam member 31 that supports the horizontal member 30. The joists 4, the horizontal members 30 and the beam members 31 are made of structural steel materials such as structural square steel pipes, concrete-filled steel pipes, H-shaped steels, and I-shaped steels. The airflow flowing down the indoor space 1 passes through the opening of the grating 5 and falls to the lower space 6.

  A pillar 32 that supports the beam member 31 is disposed in the lower space 6. The pillars 32 are arranged perpendicular to the lower layer space 6. In this example, the floor structure 7 in the lower space 6 is also composed of grating, joists, horizontal members and beam members, and the pillars, joists, horizontal members and beam members are structural square steel pipes, concrete-filled steel pipes. It consists of structural steel materials such as H-shaped steel and I-shaped steel.

  The lower space 6 is used as an equipment space in which auxiliary equipment, equipment, piping, wiring and the like of the manufacturing apparatus can be arranged, and also used as a maintenance space where workers and the like can walk. The airflow flowing down into the lower space 6 is returned to the air conditioning unit 9 of the ceiling structure 2 through an air circulation system (not shown) of the air conditioning system, and after being purified by the high performance filter of the air conditioning unit 9, the indoor space 1 Recirculate to

  A stepper (reduction projection type exposure apparatus) 10 and a coater / developer 40 constituting the production line are arranged in the indoor space 1, and the laser device 11, the power supply unit 12, the air conditioner 13 and the temperature controller 14 are arranged in the lower layer space 6. . The stepper 10 is connected to the power supply unit 12, the air conditioner 13, and the temperature controller 14 by piping or wiring 16, 17, 18 interposing flexible joints, flexible pipes or flexible wiring portions 16 a, 17 a, 18 a. The The stepper 10 is positioned immediately above the laser device 11 and is connected to the laser device 11 by a vertical rigid pipe 15. When the production line is in operation, the coater developer 40 applies a photosensitive (resist) solution to the wafer surface and supplies the wafer to the stepper 10. Laser light from the laser device 11 passes through the pipe 15 and enters the reticle and the reduction projection lens group of the stepper 10, and a minute and precise circuit pattern is reduced and projected onto the wafer.

  A multi-layered device seismic isolation device 50 that supports the stepper 10 and the laser device 11 is supported by the floor structure 2 in the indoor space 1. The equipment seismic isolation device 50 includes a rigid frame having a two-layer structure and a plurality of rigid sliding bearings 70 that support the rigid frame on the floor structure 2.

  FIG. 5 is a perspective view schematically showing the structure of the rigid frame of the device seismic isolation device 50.

  As shown in FIG. 5A, the rigid frame of the device seismic isolation device 50 has a rigid structure in which upper and lower rigid floor groups 51 and 52 are integrally connected by a vertical rigid column 53. The rigid floor groups 51 and 52 are made of steel joists 55 with respect to a frame 54 having a rectangular shape in plan view in which structural steel materials such as structural steel or structural steel pipes (in this example, H-shaped steel) are integrally assembled. And a steel structure panel in which a floor plate 56 such as a steel plate is fixed on the joist 55. The lower end of the column 53 is fixed to the upper surface corner of the rigid floor set 51 by fixing means such as welding, and the upper end of the column 53 is fixed to the lower surface corner of the rigid floor set 51 by fixing means such as welding. As shown in FIG. 5 (B), the upper rigid floor set 52 is horizontally disposed on the joists 4 of the floor structure 2, and the columns 53 penetrate vertically through the area between the joists 4, and the lower layers The rigid floor group 51 is suspended horizontally in the lower layer space 6. The support | pillar 53 consists of structural steel materials (in this example, H-section steel), such as a structural steel or a structural steel pipe.

  As shown in FIGS. 1 and 2, the sliding plate 25 is installed between the floor structure 2 and the rigid floor assembly 52, and the floor surface opening of the floor structure 2 formed around the rigid floor assembly 52 is formed. Close. The inner end portion of the sliding plate 25 is fixed to the upper surface of the rigid floor set 52, and the outer end portion of the sliding plate 25 is slidably disposed on the grating 5 around the floor opening. The sliding plate 25 is inclined so as to compensate for the level difference between the floor surface level of the floor structure 2 and the upper surface of the rigid floor assembly 52.

  As shown in the partially enlarged view of FIG. 1, the rigid sliding bearing 70 has a passive and sliding friction type sliding portion 73 that supports a vertical load and responds to an excitation force. The sliding portion 73 includes a sliding material 71. And a sliding mat member 72. The sliding material 71 is made of a circular steel material having a composite structure having a surface sliding layer (PTFE layer) 75 on the upper surface.

  FIG. 6 is an exploded perspective view of the rigid sliding bearing 70 showing the positional relationship between the rigid sliding bearing 70 and the joists 4 and the frame body 54.

  The joist 4 has a horizontal upper surface 4 a, and the substrate 74 of the sliding material 71 is fixed to the upper surface 4 a of the joist 4. The sliding material 71 is disposed on the joist 4 with the horizontal surface sliding layer 75 facing upward. The joists 4 are interconnected by a reinforcing material 8. The reinforcing material 8 is made of structural steel such as an angle steel laid between the joists 4.

  The mating material 72 is made of a rectangular stainless steel plate that is horizontally fixed to the frame body 54 of the rigid floor set 52, and the lower surface of the mating material 72 faces the surface sliding layer 75. If desired, a steel plate coated with PTFE or the like may be used as the counterpart material 72. As shown in the partially enlarged view of FIG. 1, the counterpart material 72 is in surface contact with the surface sliding layer 75, and the vertical load of the device seismic isolation device 50 acts on the surface sliding layer 75 as a surface pressure. When the shearing force acting between the mating member 72 and the surface sliding layer 75 does not reach the frictional resistance force between the two, the rigid sliding bearing 70 transmits the shearing force, but the shearing force exceeding the frictional resistance force is the mating material. When acting between 72 and the surface sliding layer 75, slip occurs between them, and the transmission path of the shearing force is substantially interrupted. The rigid sliding bearing 70 acts to attenuate the seismic force by causing the mating material 72 and the surface sliding layer 75 to slip in response to an earthquake input exceeding a predetermined shearing force.

  The stepper 10 includes a drive unit that drives a wafer or the like at high speed and high accuracy, and has an in-machine vibration system that includes the drive unit and the like as an in-machine excitation source. For this reason, the stepper 10 includes a unique vibration control system or vibration control mechanism that controls or suppresses vibration of the in-machine vibration system. Therefore, the rigid floor set 52 that supports the stepper 10 normally desirably supports the stepper 10 as a rigid body and operates the stepper 10 depending on the function of the vibration control system or the vibration control mechanism of the stepper 10. . On the other hand, the rigid sliding bearing 70 must exhibit a seismic isolation action that attenuates the excitation force acting on the rigid floor set 52 during an earthquake. For this reason, the friction coefficient of the surface sliding layer 75 ensures the support rigidity required by the vibration control system or the vibration control mechanism of the stepper 10, and slips between the surface material and the counterpart material 72 depending on the vibration of the in-machine vibration system of the stepper 10. In addition, when a horizontal excitation force equal to or greater than a predetermined value (trigger value) is applied, the horizontal excitation force is set as a trigger so that slip occurs between the counterpart material 72. That is, the friction coefficient of the surface sliding layer 75 is set to a value in which the support rigidity required by the stepper 10 and the seismic isolation effect in response to the seismic force are compatible. Thus, the rigid sliding bearing 70 normally works as a rigid body that does not affect the in-machine vibration system of the stepper 10, and in the event of an earthquake, the relative sliding of the counterpart material 72 and the surface sliding layer 75 responds to the earthquake input. Attenuates seismic force.

  If desired, an oil damper 90 (shown in phantom) that restricts the horizontal displacement of the equipment seismic isolation device 50 or biases the rigid floor set 51 to the initial position is disposed on the side of the rigid floor set 52.

  Next, the operation of the device seismic isolation device 50 will be described with reference to FIG.

  As shown by the arrows in FIG. 7, when the earthquake acceleration during an earthquake acts on the equipment seismic isolation device 50 as a short-term horizontal load, the sliding counterpart material 72 slides on the sliding material 71, and the equipment seismic isolation device 50 is shown in FIG. It behaves in the horizontal direction as shown in FIG. The seismic force acting on the rigid frame is attenuated by the frictional energy consumption of the sliding portion 73 and the seismic force attenuation effect due to the horizontal behavior. The oil damper 90 functions to restore the horizontal displacement of the rigid frame and attenuates the seismic force acting on the rigid frame by the oil viscosity.

  The equipment seismic isolation device 50 behaves horizontally as described above in response to an earthquake input. However, since the upper and lower rigid floor groups 51 and 52 behave horizontally in an integrated manner, the laser device 11 on the rigid floor groups 51 and 52 and The stepper 10 maintains the initial relative position, so that the rigid pipe 15 is not deformed.

  Thus, according to the device seismic isolation device 50 having the above-described configuration, the stepper 10 and the laser device 11 can be arranged in multiple layers, and the floor area occupied by the stepper 10 and the laser device 11 can be greatly reduced. Further, according to the device seismic isolation device 50 having the above configuration, the relative horizontal behavior or horizontal displacement of the stepper 10 and the laser device 11 can be surely prevented, so that the readjustment work at the time of re-operation after the earthquake disaster (Optical axis adjustment work, etc.) is simplified.

  FIG. 8 is a front view of an equipment seismic isolation device 50 showing another embodiment of the present invention. In FIG. 8, the same reference numerals are assigned to substantially the same constituent members or constituent elements as those of the above-described embodiment.

  In the device seismic isolation device 50 of the present example, the upper rigid floor set 52 is extended horizontally, and the coater developer 40 is further fixed on the rigid floor set 52. The rigid sliding bearing 70 is disposed between the rigid floor set 52 and the joist 4 so as to support the loads of the stepper 10, the laser device 11, and the coater developer 40, and enables relative displacement or relative behavior between them. According to such a device seismic isolation device 50, the stepper 10 and the laser device 11 are arranged in multiple layers to reduce the occupied floor area of the stepper 10 and the laser device 11, and the relative relationship between the stepper 10, the laser device 11, and the coater developer 40 Horizontal behavior or horizontal displacement can be prevented.

  The other configuration of the device seismic isolation device 50 shown in FIG. 8 is substantially the same as that of the first embodiment, and thus further detailed description is omitted.

  FIG. 9 is a front view of an equipment seismic isolation device 50 showing another embodiment of the present invention. In FIG. 9, the same reference numerals are assigned to substantially the same constituent members or constituent elements as those of the above-described embodiments.

  The manufacturing apparatus system includes arbitrary manufacturing equipment 10 ′, 11 ′, 40 ′, and the equipment seismic isolation device 50 is used to support the manufacturing equipment 10 ′, 11 ′ on the floor structure 2.

  In the equipment seismic isolation device 50 shown in FIG. 9, a plurality of elastic sliding bearings 80 that support the rigid frame to the floor structure 2 are interposed between the rigid floor group 52 and the joists 4. The elastic sliding bearing 80 includes a passive and sliding friction type sliding portion 83 that supports a vertical load and responds to an excitation force. As shown in the partially enlarged view of FIG. 9, the sliding portion 83 includes a sliding material 81 and a sliding partner material 82. The mating member 82 is a rectangular stainless steel plate that is horizontally fixed to the steel panel member 37 on the joist 4, and the sliding member 81 includes a surface sliding layer (PTFE layer) that slides on the surface of the mating member 82. It consists of a circular steel plate with a composite structure. The sliding member 81 is supported by a circular steel intermediate plate 84, and the plate 84 is supported by the upper anchor plate 86 via an elastic support portion 85 made of a rubber material or laminated rubber. The upper anchor plate 86 is firmly fixed to the frame body 54 of the rigid floor group 52 by anchor bolts (not shown).

  The other configuration of the device seismic isolation device 50 shown in FIG. 9 is substantially the same as that of the first embodiment, and thus further detailed description is omitted.

  FIG. 10 is a front view of an equipment seismic isolation device 50 showing still another embodiment of the present invention. In FIG. 10, the same reference numerals are assigned to substantially the same constituent members or constituent elements as those of the above-described embodiments.

  In the device seismic isolation device 50 of this example, the upper rigid floor set 52 is extended horizontally, and the manufacturing equipment 40 ′ is further fixed on the rigid floor set 52. A plurality of elastic sliding bearings 80 that support the rigid frame to the floor structure 2 are interposed between the rigid floor group 52 and the joists 4. The elastic sliding bearing 80 is arranged between the rigid floor set 52 and the joist 4 so as to support the load of the manufacturing equipment 10 ′, 11 ′, 40 ′, and enables relative displacement or relative behavior between the two.

  Since the other structure of the apparatus seismic isolation apparatus 50 shown in FIG. 10 is substantially the same as the said 3rd Example, the further detailed description is abbreviate | omitted.

  The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited to the above-described embodiments, and various modifications or changes can be made within the scope of the present invention described in the claims. Needless to say, such variations and modifications are also included in the scope of the present invention.

  For example, as shown in FIG. 11, the rigid frame of the device seismic isolation device 50 may be reinforced by a steel brace 57. The lower end of the brace 57 is connected to the joint between the rigid floor set 51 and the vertical column 53 by a steel bracket 59, and the upper end of the brace 57 is connected to the frame intermediate part of the rigid floor set 52 by a steel bracket 58. Connected. The brace 57 is disposed at a position where the brace 57 does not interfere with the joist 4 during the horizontal behavior of the device seismic isolation device 50.

  Moreover, in the said Example, although the stepper 10 and the laser apparatus 11 were illustrated as a manufacturing apparatus system which requires local seismic isolation, the apparatus seismic isolation apparatus of this invention is similarly to other manufacturing apparatus systems which require local seismic isolation. It can be applied.

  Further, in the above-described embodiment, auxiliary equipment such as a power supply unit and an air conditioner are arranged on the floor structure in the underfloor equipment space, but these auxiliary equipment may be arranged on the rigid floor assembly 51.

  The equipment seismic isolation device of the present invention is used in a manufacturing facility having a lower layer space below an indoor space in which a manufacturing line is arranged. In particular, the device seismic isolation device of the present invention has a production line for producing electronic devices such as semiconductors, liquid crystals, diodes, etc., and is preferably used in medium and large-scale clean rooms equipped with a one-way flow type air conditioning system. The The device seismic isolation device of the present invention enables a design in which precision devices such as steppers are arranged in the indoor space of a clean room, and precision devices such as laser devices are arranged in a lower layer space, thereby reducing the space for installing manufacturing equipment. Contribute.

It is a front view which shows the Example of the equipment seismic isolation apparatus which concerns on this invention. It is a side view of the apparatus seismic isolation apparatus shown in FIG. It is a top view of the apparatus seismic isolation apparatus shown in FIG. It is a top view of the lower space which shows arrangement | positioning of an auxiliary machine. It is a perspective view which shows roughly the structure of the rigid frame of an apparatus seismic isolation apparatus. It is a disassembled perspective view which shows the positional relationship of a rigid sliding support, a joist and a frame. It is a fragmentary sectional view which shows the behavior of the apparatus seismic isolation device at the time of an earthquake. It is a front view of the apparatus seismic isolation apparatus which shows 2nd Example of this invention. It is a front view of the apparatus seismic isolation apparatus which shows 3rd Example of this invention. It is a front view of the apparatus seismic isolation apparatus which shows 4th Example of this invention. It is a perspective view which shows the modification of the rigid frame of an apparatus seismic isolation apparatus. It is a partial longitudinal cross-sectional view of the semiconductor manufacturing factory which shows the exposure apparatus support structure (comparative example) using a seismic isolation bearing. It is a partial longitudinal cross-sectional view of the semiconductor manufacturing factory which shows the other exposure apparatus support structure (comparative example) using a seismic isolation bearing.

Explanation of symbols

1: Clean room space (indoor space)
2: Floor structure in indoor space 3: Ceiling structure 4: joist 5: perforated grating 6: lower space (under-floor equipment space)
7: Floor structure in lower space 10, 10 ': Stepper 11, 11': Laser device 12, 12 ': Power supply unit 13: Air conditioner 14: Temperature controller 15: Rigid piping 16, 17, 18: Piping or wiring 25: Sliding plate 30: Horizontal member 40: Coater developer 50: Equipment seismic isolation device 51, 52: Rigid floor assembly 53: Rigid support 54: Frame body 55: joist 56: Floor board 70: Rigid sliding bearing 80: Elastic sliding Support

Claims (6)

In an equipment seismic isolation device provided in a manufacturing facility having an indoor space in which manufacturing equipment of a composite manufacturing equipment system is arranged and a lower layer space formed below the floor structure of the indoor space,
The upper and lower rigid floor assemblies spaced apart in the vertical direction, and the rigid struts that integrally connect the upper and lower rigid floor assemblies, the upper rigid floor assemblies are arranged via the seismic isolation bearings. Supported by a floor structure, the support column pierces the floor structure so as to be horizontally displaced, and suspends the lower rigid floor set in the lower space,
The first manufacturing equipment constituting the manufacturing apparatus system is fixed on the rigid floor set in the upper layer, and the second manufacturing equipment constituting the manufacturing apparatus system is fixed on the rigid floor set in the lower layer. A featured equipment seismic isolation device.   The equipment seismic isolation device according to claim 1, wherein the seismic isolation bearing is a rigid sliding bearing.   The said rigid sliding support is comprised from the sliding material fixed to the upper surface of the joist of the said floor structure, and the other party member fixed to the lower surface of the said rigid floor assembly of the upper layer, It is characterized by the above-mentioned. Equipment seismic isolation device as described.   4. The equipment seismic isolation device according to claim 2, wherein the floor structure includes a reinforcing member that interconnects the joists and improves the rigidity of the floor structure.   The manufacturing apparatus system includes a stepper and a laser device, and the stepper is fixed on the rigid floor set of the upper layer as the first manufacturing device, and the laser device is the rigid of the lower layer as the second manufacturing device. The equipment seismic isolation device according to any one of claims 1 to 4, wherein the device seismic isolation device is fixed on a floor set. 5. The device according to claim 2, wherein a friction coefficient of a sliding surface of the rigid sliding bearing is set so that slippage due to vibration of the first manufacturing and manufacturing device itself does not occur. Seismic isolation device.

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