JP4777066B2 - 新規な干渉顔料 - Google Patents
新規な干渉顔料 Download PDFInfo
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- JP4777066B2 JP4777066B2 JP2005506658A JP2005506658A JP4777066B2 JP 4777066 B2 JP4777066 B2 JP 4777066B2 JP 2005506658 A JP2005506658 A JP 2005506658A JP 2005506658 A JP2005506658 A JP 2005506658A JP 4777066 B2 JP4777066 B2 JP 4777066B2
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
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Description
(A)場合によっては、金属からなる層、
(B)層(A)が存在する場合、層(A)と層(C)との間に位置する、金属、ケイ素(Si)及び酸素(O)からなる少なくとも一つの層、及び
(C)場合によっては、層(B)の上の、SiOz(0.70≦z≦2.0)からなる層
を含む顔料に関する。層(B)は、
(A)金属からなる層、及び
(C)金属層上の、SiOy(0.70≦y≦1.80)からなる層
を含む顔料を、非酸化性雰囲気中、600℃を超える温度で焼成することによって得られる。
(A1)金属、特にアルミニウムからなる層、
(B)層(A1)と層(A2)との間に配設された、金属、Si及びOからなる層、及び
(A2)金属、特にアルミニウムからなる層、又は
(A1)金属、特にアルミニウムからなる層、
(B1)層(A1)と層(C)との間に配設された、金属、Si及びOからなる層、
(C)SiOyからなる層、
(B2)層(C)と層(A2)との間に配設された、金属、Si及びOからなる層、及び
(A2)金属、特にアルミニウムからなる層
を得ることができる。
(C1)SiOyからなる層、
(B)層(C1)と層(C2)との間に配設された、金属、Si及びOからなる層、及び
(C2)SiOyからなる層
を含む。
(C1)SiOzからなる層、
(B)層(C1)と層(C2)との間に配設された、金属、Si及びOからなる層、及び
(C2)SiOzからなる層
を含む顔料を得ることもできる。
(C1)SiOzからなる層、
(B1)層(C1)と層(A)との間に配設された、金属、Si及びOからなる層、
(A)金属、特にアルミニウムからなる層、
(B2)層(A)と層(C2)との間に配設された、金属、Si及びOからなる層、
及び
(C2)SiOzからなる層
を含む。
(D1)高い屈折率の材料、特にTiO2の層、
(C1)SiOzからなる層、
(B)層(C1)と層(C2)との間に配設された、金属、Si及びOからなる層、
(C2)SiOzからなる層、及び
(D2)高い屈折率の材料、特にTiO2の層
(0.70≦z≦2.0、特に1.10≦z≦2.0、とりわけ1.40≦z≦2.0)
を含む有色(干渉)顔料に関する。
a)(可動)支持体に分離剤を蒸着させて分離剤層を製造する工程、
b)分離剤層にSiOy(0.70≦y≦1.80)層を蒸着させる工程、
c)SiOy層にAl層を蒸着させる工程、
d)Al層にSiOy層を蒸着させる工程、
e)分離剤層を溶媒に溶解させる工程、及び
f)溶媒からSiOyを分離する工程
を含む方法(EP−B−990715)によって調製される。
変形(1):非酸化性雰囲気中で焼成し(→層(B))、酸素の存在で焼成し(SiOz→SiO2)、場合によっては、得られた顔料をTiO2でコーティングする(TiO2/SiOz/コア/SiOz/TiO2)。この場合、コアは、層(B)又は層(B)/層(A)/層(B)である。
TiO2コーティングされた金属小板を、非酸化性ガス雰囲気中600℃を超える、好ましくは700〜1100℃の範囲の温度で10分を超える時間、好ましくは数時間焼成する。焼成は、非酸化性ガス雰囲気、たとえばAr及び/又はHe、好ましくはAr中、場合によっては減圧、好ましくは700Torr(0.9333 105N/m2)未満の圧で実施する。
上記のように、SiOyコーティングされた金属小板をTiO2でコーティングしたのち、非酸化性雰囲気中で焼成する。このようにして、層(B)の他に、TiO2/SiOyの焼成によって形成されるさらなる層(E)が製造される。TiO2/SiOyを非酸化性雰囲気中で焼成することが、屈折率の変化を生じさせる中間層を製造すると推測される。しかし、中間層が連続層ではなく、むしろTiO2とSiOyとの界面の個々の領域だけが、屈折率の変化を生じさせる転換を受けるという可能性を排除することはできない。さらに、屈折率の変化はSiOyによるTiO2の還元のせいであると推測される。したがって、本発明の原理は、屈折率の変化を生じさせる中間層をSiOyによるTiO2の還元によって製造することに基づく。
TiO2+SiOy→SiOy+a+TiO2-a
実施例1
真空チャンバ中、約10-2Pa未満の圧力で、金属支持体に厚さ約50nmのNaCl層を蒸着させた。次いで、同じ圧力で、以下の層:SiO、Al及びSiOを順に付着させて、金属支持体上に以下の層構造:
SiO(270nm)/Al(40nm)/SiO(270nm)
を有するフィルムを形成した。
真空チャンバ中、約10-2Pa未満の圧力で、ガラス支持体に以下の層:TiO2(50nm)、SiO(270nm)、Al(50nm)、SiO(270nm)及びTiO2(50nm)を順に昇華させた。一方の試料を参考試料(RS)として使用し、他方の試料(S)をアルゴン雰囲気中700℃で0.5時間加熱した。
Claims (10)
- (A) 金属からなる少なくとも一つの層、及び
(C) SiO y からなる層(0.70≦y≦1.80)
を含む面平行な構造(フレーク)を非酸化性雰囲気中で焼成することを含む、顔料の製造方法。 - 焼成することが、Ar、He又はAr及びHeの非酸化性雰囲気中で実施される、請求項1記載の製造方法。
- 得られたフレークをさらなる層でコーティングする工程をさらに含む、請求項1記載の製造方法。
- 顔料が、
(A) 金属からなる少なくとも一つの層、
(B) 層(A)と層(C)との間に位置する、金属、ケイ素(Si)及び酸素(O)からなる少なくとも一つの層、及び
(C) SiOzからなる層(0.70≦z≦2.0)
を含む、請求項1記載の顔料の製造方法。 - 顔料が、
(B) 金属、ケイ素(Si)及び酸素(O)からなる少なくとも一つの層、及び
(C) 層(B)の上の、SiO z からなる少なくとも一つの層(0.70≦z≦2.0)
を含む、請求項1記載の顔料の製造方法。 - 顔料が、
(A) 金属からなる少なくとも一つの層、及び
(B) 層(A)と層(C)との間に位置する、金属、ケイ素(Si)及び酸素(O)からなる少なくとも一つの層、
を含む、請求項1記載の顔料の製造方法。 - 顔料が、
(C1) SiOzからなる層(0.70≦z≦2.0)、
(B) 層(C1)と層(C2)との間に位置する、金属、ケイ素(Si)及び酸素(O)からなる少なくとも一つの層、
(C2) 層(B)の上の、SiOzからなる少なくとも一つの層(0.70≦z≦2.0)
を含む、請求項1記載の顔料の製造方法。 - (D) TiO 2 、ZrO 2 、Fe 2 O 3 、Fe 3 O 4 、Cr 2 O 3 、チタン酸鉄、酸化鉄水和物、亜酸化チタン、ZnO、非晶質炭素、ダイヤモンド様炭素又は炭化ケイ素のさらなる層を含む、請求項7記載の顔料の製造方法。
- 層(A)及び層(B)の金属が、Ag、Al、Cu、Cr、Mo、Ni、Ti又はそれらの合金から選択される、請求項4又は6のいずれか記載の顔料の製造方法。
- 顔料が、以下の層構造:TiO2/SiOz/コア/SiOz/TiO2、SiC/SiOz/コア/SiOz/SiC又はC/SiOz/コア/SiOz/C
(コアは、層(B)又は層(B)/層(A)/層(B)で形成され、層(B)は、面平行な面に存在し、層(A)の側面には存在せず、SiOz層は、面平行な面だけに存在し、側面には存在せず、TiO2層は全面に適用され、0.70≦z≦2.0)
を有する、請求項6記載の顔料の製造方法。
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02405978.4 | 2002-11-13 | ||
| EP02405978 | 2002-11-13 | ||
| EP03405026 | 2003-01-23 | ||
| EP03405026.0 | 2003-01-23 | ||
| PCT/EP2003/050777 WO2004044060A1 (en) | 2002-11-13 | 2003-11-03 | Novel interference pigments |
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| Publication Number | Publication Date |
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| JP2006506518A JP2006506518A (ja) | 2006-02-23 |
| JP2006506518A5 JP2006506518A5 (ja) | 2006-12-14 |
| JP4777066B2 true JP4777066B2 (ja) | 2011-09-21 |
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| JP2005506658A Expired - Fee Related JP4777066B2 (ja) | 2002-11-13 | 2003-11-03 | 新規な干渉顔料 |
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| US (1) | US7452597B2 (ja) |
| EP (1) | EP1570008A1 (ja) |
| JP (1) | JP4777066B2 (ja) |
| KR (1) | KR20050075396A (ja) |
| AU (1) | AU2003301972A1 (ja) |
| CA (1) | CA2495007A1 (ja) |
| MX (1) | MXPA05002425A (ja) |
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| WO (1) | WO2004044060A1 (ja) |
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- 2003-11-03 WO PCT/EP2003/050777 patent/WO2004044060A1/en not_active Ceased
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- 2003-11-03 RU RU2005118747/15A patent/RU2005118747A/ru not_active Application Discontinuation
- 2003-11-03 US US10/531,483 patent/US7452597B2/en not_active Expired - Fee Related
- 2003-11-03 JP JP2005506658A patent/JP4777066B2/ja not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| CA2495007A1 (en) | 2004-05-27 |
| RU2005118747A (ru) | 2006-01-27 |
| EP1570008A1 (en) | 2005-09-07 |
| JP2006506518A (ja) | 2006-02-23 |
| US20060099420A1 (en) | 2006-05-11 |
| US7452597B2 (en) | 2008-11-18 |
| AU2003301972A1 (en) | 2004-06-03 |
| KR20050075396A (ko) | 2005-07-20 |
| MXPA05002425A (es) | 2005-05-27 |
| WO2004044060A1 (en) | 2004-05-27 |
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