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JP4801874B2 - Method for manufacturing metal-based circuit board - Google Patents
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JP4801874B2 - Method for manufacturing metal-based circuit board - Google Patents

Method for manufacturing metal-based circuit board Download PDF

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Publication number
JP4801874B2
JP4801874B2 JP2003132868A JP2003132868A JP4801874B2 JP 4801874 B2 JP4801874 B2 JP 4801874B2 JP 2003132868 A JP2003132868 A JP 2003132868A JP 2003132868 A JP2003132868 A JP 2003132868A JP 4801874 B2 JP4801874 B2 JP 4801874B2
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Japan
Prior art keywords
adhesive composition
insulating adhesive
metal foil
metal
circuit board
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JP2003132868A
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Japanese (ja)
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JP2004335929A (en
Inventor
芳彦 岡島
陽一 尾形
彰夫 岡本
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Denka Co Ltd
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Denki Kagaku Kogyo KK
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Description

【0001】
【発明が属する技術分野】
本発明は、熱放散性に優れ、高い絶縁破壊電圧値を有し、信頼性の高い金属ベース回路基板を、極めて生産性が高く提供できる金属ベース回路基板の製造方法に関する。
【0002】
【従来の技術】
高発熱電子部品を実装する回路基板として、金属ベース回路基板が熱放散性に優れるので用いられている。金属ベース回路基板を得る方法に関しては、熱伝導性の良好な金属板上に、無機フィラーを充填したエポキシ樹脂等の絶縁材を積層して金属絶縁基板(以下、金属ベース基板ともいう)を得た後に、前記金属絶縁基板の絶縁材の上に導電箔を張り合わせ、更にエッチング等により回路を形成する方法(特許文献1、特許文献2参照)、或いは、金属箔上に絶縁材を塗布し、加熱乾燥して得られた絶縁材付き金属箔を金属板上に積層して加熱加圧することにより金属ベース基板を作製する(特許文献3参照)。得られた金属ベース基板の導体箔をエッチング等により回路形成することで金属ベース回路基板を作製する等が知られている。
【0003】
【特許文献1】
特開平8−204301号公報。
【0004】
【特許文献2】
特開2001−313446公報。
【0005】
【特許文献3】
特開平8−083963号公報。
【0006】
しかしながら、いずれの方法であっても、導体箔を金属板に接着した後に回路形成する工程を行う必要があり、所望の回路形成ができなかった場合にはその部分の金属板を含め不良となってしまう為、多大な損失となる欠点を有している。
【0007】
また、導体箔/絶縁層/基板等の構造、すなわち、金属ベース基板とした状態で金属箔を加工して回路形成等の操作を行うために、枚葉処理になること、また、嵩張ったり、本来不要な重量が伴うことから、生産性が上らず、コストアップの要因となっている。更に、回路形成工程中において、金属板裏面に傷や凹み等の不良が発生しやすいという問題がある。
【0008】
【発明が解決しようとする課題】
本発明は、上記の事情に鑑みてなされたものであって、その目的は、外観上の不良のない、信頼性に優れる金属ベース回路基板を、生産性高く、回路形成時のロスを低減させながら製造する方法を提供することにある。
【0009】
【課題を解決するための手段】
本発明は、(1)連続的に供給される金属箔上に、絶縁接着剤組成物(a)を塗布し、前記絶縁接着剤組成物(a)を硬化する工程、
(2)更に連続的に供給される粘着剤付き樹脂フィルムを粘着剤が対するように前記絶縁接着剤組成物(a)からなる層上に積層し、前記金属箔と絶縁接着剤組成物(a)と粘着剤付き樹脂フィルムとをロールにて加圧接合して一体化し、金属箔複合体とする工程、
(3)前記金属箔複合体の金属箔を、連続的又は間歇的に回路形成する工程、
(4)前記回路形成された金属箔複合体の粘着剤付き樹脂フィルムを剥離し、前記回路形成された金属箔複合体の前記硬化した絶縁接着剤組成物(a)上に未硬化の絶縁接着剤組成物(b)を塗布し、前記未硬化の絶縁接着剤組成物(b)上に金属板を接合し、前記未硬化の絶縁接着剤組成物(b)を硬化して一体化する工程、を順次経ることを特徴とする金属ベース回路基板の製造方法である。
【0010】
本発明は、(1)の工程の絶縁接着剤組成物(a)の塗布と硬化とを、複数回繰り返すことを特徴とする前記の金属ベース回路基板の製造方法である。
【0011】
本発明は、絶縁接着剤組成物(a)が、硬化後のヤング率が8×10N/m以下であることを特徴とする前記の金属ベース回路基板の製造方法である。
【0012】
更に、本発明は、絶縁接着剤組成物(a、b)が、無機質充填材として酸化アルミニウム(Al)、窒化アルミニウム(AlN)、窒化硼素(BN)および酸化珪素(SiO)からなる群から選ばれる少なくとも1種以上を含有することを特徴とする前記の金属ベース回路基板の製造方法である。
【0013】
【発明の実施の形態】
以下、図に基づいて、本発明を詳細に説明する。
【0014】
本発明の(1)の工程は、図1に例示された通りに、連続的に供給される金属箔上に、絶縁接着剤組成物(a)を塗布し、絶縁接着剤組成物(a)を硬化する工程であり、続いて、(2)の工程、即ち、連続的に供給される粘着剤付き樹脂フィルムを粘着剤が対するように前記絶縁接着剤組成物(a)からなる層上に積層し、前記金属箔と絶縁接着剤組成物(a)と粘着剤付き樹脂フィルムとをロールにて加圧接合して一体化し、金属箔複合体とする工程、に続いている。
【0015】
図1では、連続的に供給される金属箔1上に塗布機2を用いて絶縁接着剤組成物(a)3を塗布し、加熱装置4により絶縁接着剤組成物(a)3を硬化する。その後、他の連続的に供給される粘着剤付き樹脂フィルム5を粘着剤が対するように前記絶縁接着剤組成物(a)からなる層上に積層し、前記金属箔と絶縁接着剤組成物(a)と粘着剤付き樹脂フィルムとを加圧接合ロール6により加圧接合して一体化する。その後、得られた一体化された金属箔複合体7は巻き取り機等によりロール状にする。
【0016】
本発明で用いる塗布機2にはロールコーター、グラビアコーター、キスコーターや円筒状のメッシュを用いたスクリーン印刷機等を用いることができる。又、絶縁接着剤組成物(a)の粘性等により一度の塗布で所望の厚みの形成ができない場合には、絶縁接着剤組成物(a)の塗布と硬化とを複数回繰り返すことが有効である。絶縁接着剤組成物(a)3を2回以上積層して、所望の厚みとした場合の方が、一度に塗布して形成させた場合に比べて、塗布厚みのばらつきが少なくなり、金属ベース回路基板の特性を安定化させ易い利点も有る。
【0017】
本発明で用いる加熱装置4としては温風式加熱炉、遠赤外式加熱炉等が使用できる。加圧接合ロール6は材質にシリコーンゴムやウレタンゴム等を用いた各種ラミネーター装置が使用できる。又は、加熱炉と加圧接合ロールが一体化した装置を用いることも可能である。
【0018】
尚、図1に於いては、金属箔上に絶縁接着剤組成物(a)を塗布し加熱硬化させているが、製造上の理由により粘着剤付き樹脂フィルムと加圧接合し一体化した後に、絶縁接着剤組成物(a)を加熱硬化させる工程を追加することもできる。
絶縁接着剤組成物3の硬化速度が遅すぎる場合には、加熱装置4による硬化が不十分であっても絶縁接着剤組成物3の硬化を完了することができるので、好ましい方法である。つまり、絶縁接着剤組成物の硬化は、金属箔上に塗布された後から金属箔複合体の回路化工程以前の段階までに硬化が完了する様に、少なくとも一度以上複数回の加熱硬化を行えば良い。また、後工程が間歇的に処理されるような場合には金属箔複合体7をロール状とする必要はなく、例えば図4に例示した通りに、プレス機21や切断機等を用いて所定寸法の大きさの平板とすることもできる。
【0019】
金属箔1の材質については、特に限定されるものではなく、銅(Cu)、アルミニウム(Al)、ニッケル(Ni)、鉄(Fe)、錫(Sn)、銀(Ag)、チタニウム(Ti)、金(Au)、前記金属の合金、或いは前記金属や前記合金にNiメッキ、(Ni+Au)メッキ等の金属メッキが施されていても構わない。これらの金属或いは合金は、ロール状に供給することのできる厚みであることが必要であり、具体的には4〜300μmの厚さのものが用いることができる。
【0020】
絶縁接着剤組成物(a)は、酸化アルミニウム(Al)、窒化アルミニウム(AlN)、酸化ケイ素(SiO)、窒化硼素(BN)等の無機充填材を少なくとも1種以上樹脂に混合したものであり、使用する樹脂にはエポキシ樹脂、シリコーン樹脂、ポリイミド樹脂等が用いられる。又、樹脂と無機充填剤との界面の接着性を高める為に、シリコーンカップリング剤、チタネートカップリング剤等の表面処理剤を添加してもよい。また、前記の目的のために、混合に先立ち、無機充填剤の表面を処理することもできる。
【0021】
本発明の絶縁接着剤組成物(a)は、硬化後のヤング率が8×10N/m以下であることが好ましい。絶縁剤組成物が硬化後のヤング率が8×10N/mを超えるものでは、得られた金属箔複合体をロール状態にしたり、後工程に好適に供給するために巻き戻したりする等の操作を繰り返す際に、絶縁剤組成物の硬化物(以下、単に絶縁層という)にクラックが発生してしまい、得られる金属ベース回路基板の特性、ことに耐電圧性、絶縁破壊強度等の電気特性を著しく劣化させてしまうことがある。
【0022】
また、絶縁接着剤組成物のクラックの抑制と金属ベース回路基板の耐電圧特性、熱放散性の観点より、塗布する絶縁接着剤組成物の膜厚は30〜200μmが好ましい。絶縁接着剤組成物の膜厚が30μm未満の場合には耐電圧特性が低くなり好ましくないし、絶縁接着剤組成物の膜厚が200μmを超えると熱放散性が低下するとともに、絶縁接着剤組成物にクラックが発生してしまうことがあるためである。
【0023】
本発明に用いる粘着剤付き樹脂フィルムとしては、本発明に於ける(1)の工程で粘着剤付き樹脂フィルムと接合一体化後に前記絶縁接着剤組成物(a)の加熱硬化を行う場合には加熱硬化条件に対応できる粘着剤付き樹脂フィルムを選択する必要があるが、粘着剤付き樹脂フィルムと接合一体化させる以前に前記絶縁接着剤組成物(a)の硬化が完了している場合には、特に限定されずPVC(ポリ塩化ビニル)やPP(ポリプロピレン)、PE(ポリエチレン)、PET(ポリエチレンテレフタレート)などのフィルム状基材に天然ゴム系粘着剤、アクリル系粘着剤、合成ゴム系粘着剤等の粘着剤が塗布されたものを使用することができる。すなわち、次に示す(3)の工程において回路形成を行う為の処理に耐えられるもので有れば良い。そのため、耐熱温度が50度程度でエッチング液や剥離液等に耐えられる一般的な粘着剤付き樹脂フィルムであれば限定されないという利点がある。
【0024】
次に、本発明における(3)の工程について説明する。この工程では、図2並びに図5に例示する通りに、連続的(図2)又は間歇的(図5)に供給される金属箔複合体7の金属箔1上に、レジスト形成装置8を用いて、エッチングレジスト9を形成し、エッチング装置10およびレジスト剥離装置11を用いて回路形成することで回路形成された金属箔複合体12を得る。連続的な処理の場合には、必要に応じて、巻き取り機等によりロール状にする。
【0025】
本発明におけるレジスト形成装置8とは、スクリーン印刷法の場合はスクリーン印刷機およびレジスト硬化炉等のことであり、ドライフィルムやフォトレジストを使用する露光法の場合はラミネーター、レジストコーター、露光・現像装置、レジスト硬化炉等のことであり、金属箔のエッチング及びエッチングレジスト剥離には工業的に用いられているウエットエッチング装置及びドライエッチング装置、エッチングレジスト剥離装置を用いることができる。即ち、連続的又は間歇的に供給される金属箔複合体に対してエッチングレジストの形成、金属箔のエッチングおよびレジスト剥離を連続的又は間歇的(半連続的)に行うことで金属回路の形成が行える装置を用いれば良い。
【0026】
本発明においては、金属板と接合する前に回路形成を行うので、回路断線や短絡等の回路形成上の欠陥が生じた場合にはその部分を回路形成後即座に取り除くことができ、回路基板化された状態で取り除く従来の製法に比べ、材料ロスを少なくする事が可能であり、コスト的に有利な特徴を有している。
【0027】
更に、本発明の製造方法では、金属板に接合する以前に金属箔と絶縁接着剤組成物との密着性検査および電気的特性検査を実施することができる特徴がある。従来の製法では最終工程が終了した段階まで、金属箔と絶縁接着剤組成物との密着性検査および耐電圧特性の検査、絶縁抵抗の検査等が実施できないが、本発明によれば、回路形成部分の密着性不良部分または電気的不良部分を基板に接合してしまい、いわゆる不良基板を製造することを未然に防ぐことができる利点がある。
【0028】
加えて、本発明の製造方法に拠れば、従来の製造方法のように金属板を最初から最後の工程まで処理するいわゆる枚葉処理で行っていないので、金属板の嵩張りや重量等を考慮した製造設備にする必要がないし、又、回路形成工程中で金属板裏面の傷や凹こみ等の不良を発生し難いことから、高品質の金属ベース回路基板を高い歩留まりで提供できる利点も有している。
【0029】
次に、本発明における(4)の工程について説明する。図3に例示した通りに、回路形成された金属箔複合体の粘着剤付き樹脂フィルム5を剥離機13を用いて剥離した後、絶縁接着剤組成物(a)面に塗布機14を用いて絶縁接着剤組成物(b)15を塗布し、加圧接合ロール17を用いて金属板16と接合した後に、切断機18を用いて所望サイズに回路形成された金属箔複合体12を切断する。最後に加熱装置19を用いて絶縁接着剤組成物(b)を硬化することにより金属ベース回路基板20を製造する。
【0030】
ここで、本発明に用いる絶縁接着剤組成物(b)としては、エポキシ樹脂、シリコーン樹脂、ポリイミド樹脂等を単独もしくは複数配合したものに酸化アルミニウム、窒化アルミニウム等の無機質充填材を1種類以上含有させ、放熱効果を確保させた組成物を塗布機等によりシート状にしたもの、あるいは、あらかじめ前記組成物をシート状に形成したものを接合に用いる等が挙げられ、これらのうち、絶縁接着剤組成物(b)として信頼性の面から絶縁接着剤組成物(a)に用いる樹脂および無機質充填材と同じものか、それに類似した組成物を用いることが、熱膨張等による硬化接合時のクラック抑制等の理由で、それに類似した樹脂組成物に絶縁接着剤組成物と同様の熱膨張特性を示す組成物を用いることが、熱膨張等による硬化接合時のクラック抑制等の理由で好ましく選択される。
【0031】
図3では、回路形成された金属箔複合体12の絶縁接着剤組成物(a)に対して絶縁接着剤組成物(b)15を塗布させ、金属板16と接合させたが、金属板16に絶縁接着剤組成物(b)を塗布して回路形成された金属箔複合体12の絶縁接着剤組成物(a)面と接合させることも可能である。また、一回の塗布で所望膜厚の塗布ができない場合には回路形成された金属箔複合体12の絶縁接着剤組成物(a)塗布面および金属板16にそれぞれ絶縁接着剤組成物(b)を塗布して接合させ金属ベース回路基板を形成させることもできる。又、図3ではロール状の回路形成された金属箔複合体を用いた例を示したが、間歇的に処理された平板状の回路形成された金属箔複合体を用いた場合も同様である。但し、この場合には、回路形成された金属箔複合体に絶縁接着剤組成物(b)を塗布する方法よりも、金属板16に絶縁接着剤組成物(b)を塗布して回路形成された金属箔複合体を積層して接合し一体化する方法、或いは、あらかじめ接合可能な範囲で硬化させたシート状の絶縁接着剤組成物(b)と回路形成された金属箔複合体を積層して接合し一体化する方法が取り扱い易く有効である。
【0032】
又、絶縁接着剤組成物(b)の硬化が遅すぎる場合や金属板との接合時に絶縁接着剤組成物が基材端部より流れ出る場合には、絶縁接着剤組成物(b)塗布後から回路形成された金属箔複合体と金属板との接合以前の段階で絶縁接着剤組成物(b)を接合可能な範囲まで硬化しておくことが有効である。
【0033】
図3では、絶縁接着剤組成物(b)を介した回路形成された金属箔複合体12と金属板16との接合に加圧接合ロール17を用いた例を開示したが、形状等に制約は無く、板状のプレス装置を用いても構わない。又、装置上の制約等により回路形成された金属箔複合体は金属板との接合以前に切断しておくことも可能である。
【0034】
接合された金属箔複合体を切り離す場合には、加圧接合ロール17と切断機18が一体化されたオートカットラミネータ等を使用するのが一般的である。また、加熱装置19としては温風式加熱炉および遠赤外式加熱炉等や加圧しながら加熱することがホットプレス炉等も使用できる。つまり、例示では加圧接合ロールにより接合して加熱装置により絶縁接着剤組成物(b)を硬化させ一体化したが、ホットプレス炉等を用いて加圧接合させながら絶縁接着剤組成物(b)を硬化させることも可能である。
【0035】
更に、本発明によれば、製造された金属ベース回路基板をプレス機やシャーリング、ワイヤーソウ等の切断機を用いて切断することにより、所望のサイズ・形状に加工することができる。
【0036】
本発明に用いられる金属板16は、アルミニウム、銅、鉄およびそれぞれの合金、もしくはこれらのクラッド材等からなり、その厚みは特に規定するものではないが、0.5〜5.0mmのものが一般的である。
【0037】
【実施例】
以下、実施例をもって、本発明をより詳細に説明する。
【0038】
(実施例1)
酸化アルミニウム(昭和電工(株)製、AS30)を充填率60体積%になるようにビスフェノールA型エポキシ樹脂に加え、混合して絶縁接着剤組成物を作製した。
【0039】
幅600mm、厚さ35μmの銅箔を連続的に供給して、前記箔上に幅590mm、膜厚が100μmの前記絶縁接着剤組成物を塗布し、温風式加熱炉を用いて連続的に前記絶縁接着剤組成物を硬化した。
【0040】
更に、前記絶縁接着剤組成物の層上に連続的に幅600mm、厚さ38μmのアクリル系粘着剤付きポリエチレンフィルムを粘着剤が対するように積層し、ラミネーターにより加圧接合し一体化し、巻き取り機によりロール状にした。この工程を連続に行うことにより幅600mm、長さ250mの金属箔複合体を作製した。
【0041】
次に、ロール状の金属箔複合体を連続的に、レジスト形成装置、エッチング装置、およびレジスト剥離装置に供給して35μmの銅回路を形成した後、巻き取り機によりロール状の回路形成された金属箔複合体を得た。
【0042】
次に、回路形成された金属箔複合体を連続的に外観検査機および耐電圧検査機に投入して外観検査および電気的特性検査を実施して合否判定をした後、良好であった金属箔複合体のアクリル系粘着剤付きポリエチレンフィルムを剥離した後、金属箔複合体のアクリル系粘着剤付きポリエチレンフィルムを剥離した部分に前記絶縁接着剤組成物を幅590mm、膜厚50μmとなるように塗布して縦600mm、横600mm、厚さ1.5mmのアルミニウム板に積層して接合、加熱一体化して金属ベース回路基板を得た。その後、縦70mm、横100mmのサイズにプレス機を用いて加工した。
【0043】
上記操作で得られた100枚の金属ベース回路基板を検査した結果、回路形成不良および電気的特性不良が無く、アルミニウム裏面に傷、凹み等が無く良好であった。
【0044】
(実施例2)
幅600mm、厚さ35μmの銅箔を連続的に供給して、前記銅箔上に幅590mm、膜厚50μmの実施例1で用いたのと同じ絶縁接着剤組成物を塗布し、温風式加熱炉を用いて連続的に前記絶縁接着剤組成物を硬化し、巻き取り機によりロール状にした。
【0045】
前記絶縁接着剤組成物の層上に、再び、前記絶縁接着剤組成物を幅590mm、膜厚50μmとなるように塗布して、温風式加熱炉を用いて連続的に上層の前記絶縁接着剤組成物を硬化した。その上に連続的に幅600mm、厚さ38μmのアクリル系粘着剤付きポリエチレンフィルムを粘着剤が対するように積層し、ラミネーターにより加圧接合し一体化し、巻き取り機によりロール状にした。この工程を連続に行うことにより幅600mm、長さ250mの金属箔複合体を作製した。
【0046】
次に、図4に示す通りに、ロール状の金属箔複合体をプレス機21に投入して打ち抜きを行い、縦500mm、横500mmの切断することにより平板状に金属箔複合体を加工した。その後、図5に示す通りに、金属箔複合体の表面に傷および凹みが無い、良好な部分のみを間歇的に、レジスト形成装置、エッチング装置、およびレジスト剥離装置に供給して回路形成することにより、35μm銅箔が回路化された平板状の金属箔複合体を得た。
【0047】
次に、回路形成された金属箔複合体を間歇的に外観検査機および耐電圧検査機に投入して外観検査および電気的特性検査を実施して合否判定をした後、良好であった金属箔複合体のアクリル系粘着剤付きポリエチレンフィルムを剥離した後、金属箔複合体のアクリル系粘着剤付きポリエチレンフィルムを剥離した部分を、
前記絶縁接着剤組成物が縦490mm、横490mm、膜厚50μmとなるように塗布された縦500mm、横500mm、厚さ1.5mmのアルミニウム板に積層して接合、加熱一体化して金属ベース回路基板を得た。その後、縦70mm、横100mmのサイズにプレス機を用いて加工した。上記操作で得られた100枚の金属ベース回路基板を検査した結果、回路形成不良および電気的特性不良が無く、アルミニウム裏面に傷、凹み等が無く良好であった。
【0048】
(比較例1)
縦600mm、横600mm、厚さ1.5mmのアルミニウム板上に実施例1と同じ絶縁接着剤組成物を150μmになるように塗布し、乾燥してBステージ状態とし、その後厚さ35μmの銅箔を前記絶縁接着剤組成物上に積層してプレスし、絶縁接着剤組成物を加熱、硬化させて金属ベース基板を作製した。
【0049】
前記の金属ベース基板について所望の位置にエッチングレジストを形成して銅箔をエッチングした後、エッチングレジストを除去して回路を形成し、金属ベース回路基板を作製した。その後、縦70mm、横100mmのサイズにプレス機を用いて加工した。
【0050】
前記操作で得られた100枚の金属ベース回路基板を外観検査機よる外観検査および電気的特性検査を実施して結果、一部の基板に不良部分が含まれていた。又、アルミニウム裏面には製造途中に発生したと思われる傷、凹み等が多数発生していた。
【0051】
(比較例2)
縦500mm、横500mm、厚さ1.5mmのアルミニウム板上に実施例1と同じ絶縁接着剤組成物を75μmになるように塗布し、温風乾燥機により前記絶縁接着剤組成物を硬化した。その後、前記絶縁接着剤組成物の層上に、再び、前記絶縁接着剤組成物を75μm塗布し、加熱して上層の絶縁剤組成物をBステージ状態とし、その後厚さ35μmの銅箔を前記絶縁接着剤組成物上に積層してプレスし、絶縁接着剤組成物を加熱、硬化させて金属ベース基板を作製した。
【0052】
前記の金属ベース基板の銅箔について所望の位置にエッチングレジストを形成して銅箔をエッチングした後、エッチングレジストを除去して回路を形成して金属ベース回路基板を作製した。その後、縦70mm、横100mmのサイズにプレス機を用いて加工した。
【0053】
前記操作で得られた100枚の金属ベース回路基板を外観検査機よる外観検査および電気的特性検査を実施して結果、一部の基板に不良部分が含まれていた。又、アルミニウム裏面には製造途中に発生したと思われる傷、凹み等が多数発生していた。
【0054】
実施例1、実施例2、比較例1、及び比較例2にて製造された金属ベース回路基板の諸物性を表1に示す。
【0055】
【表1】

Figure 0004801874
【0056】
【発明の効果】
本発明の金属ベース回路基板の製造方法は、絶縁接着剤組成物の塗布から金属板に接合する工程までが連続的に実施できるので、生産性が飛躍的に向上する効果があるし、又、絶縁接着剤組成物の塗布から回路化までのプロセス後に基板化するので金属板裏面の傷、凹み等の異常発生を防止できるし、更に、金属板と接合する前に製品良否の検査等を実施することが可能で不良基板製造等のロスを低減できる特徴があり、産業上非常に有用である。
【図面の簡単な説明】
【図1】本発明に係る金属ベース回路基板の製造方法における(1)工程及び(2)工程を例示する模式図。
【図2】本発明に係る金属ベース回路基板の製造方法における(3)工程を例示する模式図。
【図3】本発明に係る金属ベース回路基板の製造方法における(4)工程を例示する模式図。
【図4】本発明に係る金属ベース回路基板の製造方法において、(2)工程後に打ち抜き加工する場合を例示する模式図。
【図5】本発明の金属ベース回路基板の製造方法における(3)工程の他の一例を示す模式図。
【符号の説明】
1 金属箔
2 塗布機
3 絶縁接着剤組成物(a)
4 加熱装置
5 粘着剤付き樹脂フィルム
6 加圧接合ロール
7 金属箔複合体
8 レジスト形成装置
9 エッチングレジスト
10 エッチング装置
11 レジスト剥離装置
12 回路形成された金属箔複合体
13 剥離機
14 塗布機
15 絶縁接着剤組成物(b)
16 金属板
17 加圧接合ロール
18 切断機
19 加熱装置
20 金属ベース回路基板
21 プレス機[0001]
[Technical field to which the invention belongs]
The present invention relates to a method of manufacturing a metal base circuit board that can provide a highly reliable metal base circuit board that has excellent heat dissipation, a high dielectric breakdown voltage value, and high reliability.
[0002]
[Prior art]
As a circuit board for mounting a high heat generation electronic component, a metal base circuit board is used because of its excellent heat dissipation. Regarding a method for obtaining a metal base circuit board, an insulating material such as an epoxy resin filled with an inorganic filler is laminated on a metal plate having good thermal conductivity to obtain a metal insulating board (hereinafter also referred to as a metal base board). After that, a method of forming a circuit by etching or the like (see Patent Document 1 and Patent Document 2), or applying an insulating material on the metal foil, and laminating a conductive foil on the insulating material of the metal insulating substrate, A metal base substrate is produced by laminating a metal foil with an insulating material obtained by heating and drying on a metal plate and applying heat and pressure (see Patent Document 3). It is known to form a metal base circuit board by forming a circuit on the obtained conductive foil of the metal base board by etching or the like.
[0003]
[Patent Document 1]
JP-A-8-204301.
[0004]
[Patent Document 2]
JP 2001-313446 A.
[0005]
[Patent Document 3]
JP-A-8-083963.
[0006]
However, in any of the methods, it is necessary to perform a circuit forming process after the conductive foil is bonded to the metal plate. If a desired circuit cannot be formed, the metal plate in that portion becomes defective. Therefore, there is a disadvantage that a great loss occurs.
[0007]
In addition, a structure such as a conductive foil / insulating layer / substrate, that is, processing a metal foil in a state where it is a metal base substrate to perform operations such as circuit formation, becomes a single wafer processing, and is bulky. Since unnecessary weight is inherently involved, productivity is not increased and this is a factor of cost increase. Furthermore, there is a problem that defects such as scratches and dents are likely to occur on the back surface of the metal plate during the circuit formation process.
[0008]
[Problems to be solved by the invention]
The present invention has been made in view of the above circumstances, and its object is to provide a highly reliable metal base circuit board that is free from defects in appearance and has high productivity and reduces loss during circuit formation. It is to provide a method of manufacturing.
[0009]
[Means for Solving the Problems]
The present invention includes (1) a step of applying an insulating adhesive composition (a) on a continuously supplied metal foil and curing the insulating adhesive composition (a);
(2) Further, the resin film with the pressure-sensitive adhesive that is continuously supplied is laminated on the layer made of the insulating adhesive composition (a) so that the pressure-sensitive adhesive is opposed, and the metal foil and the insulating adhesive composition (a ) And the pressure-sensitive adhesive resin film are integrated by pressure joining with a roll to form a metal foil composite,
(3) a step of forming a circuit of the metal foil of the metal foil composite continuously or intermittently;
(4) the circuit with an adhesive resin film formed metal foil composite was peeled off, unhardened insulating adhesive on the cured insulating adhesive composition of the circuit formed metal foil composite (a) Applying the agent composition (b), bonding a metal plate on the uncured insulating adhesive composition (b), and curing and integrating the uncured insulating adhesive composition (b) The metal base circuit board manufacturing method is characterized by sequentially passing through the steps.
[0010]
This invention is the manufacturing method of the said metal base circuit board characterized by repeating application | coating and hardening of the insulating adhesive composition (a) of the process of (1) in multiple times.
[0011]
The present invention is the method for producing a metal base circuit board, wherein the insulating adhesive composition (a) has a Young's modulus after curing of 8 × 10 9 N / m 2 or less.
[0012]
Further, according to the present invention, the insulating adhesive composition (a, b) is made of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), boron nitride (BN) and silicon oxide (SiO 2 ) as the inorganic filler. The method for producing a metal base circuit board as described above, comprising at least one selected from the group consisting of:
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in detail with reference to the drawings.
[0014]
In the step (1) of the present invention, as illustrated in FIG. 1, the insulating adhesive composition (a) is applied onto the continuously supplied metal foil, and the insulating adhesive composition (a) is applied. (2), that is, on the layer made of the insulating adhesive composition (a) so that the pressure-sensitive adhesive faces the resin film with pressure-sensitive adhesive that is continuously supplied. This is followed by the step of laminating and integrating the metal foil, the insulating adhesive composition (a), and the resin film with the pressure-sensitive adhesive by rolls to form a metal foil composite.
[0015]
In FIG. 1, an insulating adhesive composition (a) 3 is applied onto a continuously supplied metal foil 1 using a coating machine 2, and the insulating adhesive composition (a) 3 is cured by a heating device 4. . Thereafter, another continuously supplied resin film 5 with pressure-sensitive adhesive is laminated on the layer made of the insulating adhesive composition (a) so that the pressure-sensitive adhesive is opposed, and the metal foil and the insulating adhesive composition ( a) and the adhesive-attached resin film are pressure bonded by the pressure bonding roll 6 to be integrated. Thereafter, the obtained integrated metal foil composite 7 is formed into a roll by a winder or the like.
[0016]
As the coating machine 2 used in the present invention, a roll coater, a gravure coater, a kiss coater, a screen printing machine using a cylindrical mesh, or the like can be used. In addition, when the desired thickness cannot be formed by a single application due to the viscosity of the insulating adhesive composition (a), it is effective to repeat the application and curing of the insulating adhesive composition (a) multiple times. is there. When the insulating adhesive composition (a) 3 is laminated two or more times to obtain a desired thickness, the coating thickness variation is smaller than when the insulating adhesive composition (a) 3 is applied and formed at a time. There is also an advantage that the characteristics of the circuit board can be easily stabilized.
[0017]
As the heating device 4 used in the present invention, a hot air heating furnace, a far infrared heating furnace, or the like can be used. Various types of laminator devices using silicone rubber, urethane rubber, or the like can be used for the pressure bonding roll 6. Alternatively, an apparatus in which a heating furnace and a pressure bonding roll are integrated can be used.
[0018]
In FIG. 1, the insulating adhesive composition (a) is applied on a metal foil and heated and cured, but after pressure bonding and integration with a resin film with an adhesive for manufacturing reasons, A step of heat-curing the insulating adhesive composition (a) can also be added.
When the curing rate of the insulating adhesive composition 3 is too slow, the curing of the insulating adhesive composition 3 can be completed even if the curing by the heating device 4 is insufficient, which is a preferable method. In other words, the insulating adhesive composition is cured at least once and multiple times so that the curing is completed before it is applied on the metal foil and before the circuitization process of the metal foil composite. Just do it. Further, when the subsequent process is intermittently processed, the metal foil composite 7 does not need to be rolled, and for example, as illustrated in FIG. It may be a flat plate having a size.
[0019]
The material of the metal foil 1 is not particularly limited, and copper (Cu), aluminum (Al), nickel (Ni), iron (Fe), tin (Sn), silver (Ag), titanium (Ti) Gold (Au), an alloy of the metal, or metal plating such as Ni plating or (Ni + Au) plating may be applied to the metal or the alloy. These metals or alloys must have a thickness that can be supplied in the form of a roll, and specifically those having a thickness of 4 to 300 μm can be used.
[0020]
The insulating adhesive composition (a) is made by mixing at least one inorganic filler such as aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), silicon oxide (SiO 2 ), boron nitride (BN) with a resin. An epoxy resin, a silicone resin, a polyimide resin, or the like is used as the resin to be used. Moreover, in order to improve the adhesiveness at the interface between the resin and the inorganic filler, a surface treatment agent such as a silicone coupling agent or a titanate coupling agent may be added. For the above purpose, the surface of the inorganic filler can be treated prior to mixing.
[0021]
The insulating adhesive composition (a) of the present invention preferably has a Young's modulus after curing of 8 × 10 9 N / m 2 or less. When the insulating composition has a Young's modulus after curing exceeding 8 × 10 9 N / m 2 , the obtained metal foil composite is rolled or rewound to be suitably supplied to a subsequent process. When the operation such as the above is repeated, cracks occur in the cured product of the insulating composition (hereinafter simply referred to as the insulating layer), and the characteristics of the resulting metal base circuit board, particularly withstand voltage, dielectric breakdown strength, etc. The electrical characteristics of the battery may be significantly degraded.
[0022]
The thickness of the insulating adhesive composition to be applied is preferably 30 to 200 μm from the viewpoint of suppressing cracks in the insulating adhesive composition, withstand voltage characteristics of the metal base circuit board, and heat dissipation. When the film thickness of the insulating adhesive composition is less than 30 μm, the withstand voltage characteristics are low, which is not preferable. When the film thickness of the insulating adhesive composition exceeds 200 μm, the heat dissipation property is lowered and the insulating adhesive composition is also reduced. This is because cracks may occur.
[0023]
As the resin film with an adhesive used in the present invention, when the insulating adhesive composition (a) is heat-cured after being joined and integrated with the resin film with an adhesive in the step (1) in the present invention. It is necessary to select a resin film with a pressure-sensitive adhesive that can cope with the heat-curing conditions, but when the curing of the insulating adhesive composition (a) is completed before it is integrally joined with the resin film with a pressure-sensitive adhesive. , Not particularly limited, natural rubber adhesives, acrylic adhesives, synthetic rubber adhesives on film substrates such as PVC (polyvinyl chloride), PP (polypropylene), PE (polyethylene), PET (polyethylene terephthalate) What applied the adhesives, such as these, can be used. That is, what is necessary is just to be able to endure the process for forming a circuit in the following step (3). Therefore, there is an advantage that the heat-resistant temperature is not limited as long as it is a general resin film with an adhesive that can withstand an etching solution or a stripping solution at a temperature of about 50 degrees.
[0024]
Next, the step (3) in the present invention will be described. In this step, as illustrated in FIGS. 2 and 5, a resist forming apparatus 8 is used on the metal foil 1 of the metal foil composite 7 that is supplied continuously (FIG. 2) or intermittently (FIG. 5). Then, an etching resist 9 is formed, and a circuit is formed by using the etching apparatus 10 and the resist stripping apparatus 11 to obtain a metal foil composite 12 having a circuit formed thereon. In the case of continuous processing, it is rolled by a winder or the like as necessary.
[0025]
The resist forming apparatus 8 in the present invention is a screen printing machine, a resist curing furnace or the like in the case of the screen printing method, and a laminator, resist coater, exposure / development in the case of an exposure method using a dry film or a photoresist. For example, a wet etching apparatus, a dry etching apparatus, and an etching resist stripping apparatus that are industrially used can be used for etching the metal foil and stripping the etching resist. That is, formation of an etching resist, etching of the metal foil and stripping of the resist on the metal foil composite supplied continuously or intermittently continuously or intermittently (semi-continuously) can form a metal circuit. A device capable of performing this may be used.
[0026]
In the present invention, since the circuit is formed before joining to the metal plate, if a defect in circuit formation such as circuit disconnection or short circuit occurs, that part can be removed immediately after the circuit formation, and the circuit board Compared with the conventional manufacturing method which removes in the state of being made into a material, it is possible to reduce the material loss, and it has an advantageous feature in terms of cost.
[0027]
Furthermore, the manufacturing method of the present invention is characterized in that an adhesion test and an electrical property test between the metal foil and the insulating adhesive composition can be performed before bonding to the metal plate. In the conventional manufacturing method, until the final process is completed, the adhesion test between the metal foil and the insulating adhesive composition and the withstand voltage characteristic test, the insulation resistance test, etc. cannot be performed. There is an advantage that it is possible to prevent the production of a so-called defective substrate by bonding a poorly adhered portion or an electrically defective portion to the substrate.
[0028]
In addition, according to the manufacturing method of the present invention, the so-called single wafer processing in which the metal plate is processed from the first to the last step as in the conventional manufacturing method is not performed, so the bulk and weight of the metal plate are considered. It is not necessary to use the same manufacturing equipment, and defects such as scratches and dents on the back side of the metal plate are unlikely to occur during the circuit formation process, so there is an advantage that a high-quality metal base circuit board can be provided at a high yield. is doing.
[0029]
Next, step (4) in the present invention will be described. As illustrated in FIG. 3, after the resin film 5 with the adhesive of the metal foil composite having the circuit formed is peeled using the peeling machine 13, the coating machine 14 is used on the surface of the insulating adhesive composition (a). After applying the insulating adhesive composition (b) 15 and bonding it to the metal plate 16 using the pressure bonding roll 17, the metal foil composite 12 having a circuit formed in a desired size is cut using a cutting machine 18. . Finally, the metal base circuit board 20 is manufactured by curing the insulating adhesive composition (b) using the heating device 19.
[0030]
Here, as the insulating adhesive composition (b) used in the present invention, one or more inorganic fillers such as aluminum oxide and aluminum nitride are contained in one or a combination of epoxy resin, silicone resin, polyimide resin and the like. The composition in which the heat dissipation effect is ensured is made into a sheet shape by a coating machine or the like, or the composition previously formed into a sheet shape is used for bonding, and among these, an insulating adhesive From the viewpoint of reliability as the composition (b), it is possible to use the same resin or inorganic filler as the insulating adhesive composition (a) or a composition similar thereto. For reasons such as suppression, it is possible to use a composition having the same thermal expansion characteristics as the insulating adhesive composition for a resin composition similar to the resin composition. Is preferably selected because such a suppressing cracks.
[0031]
In FIG. 3, the insulating adhesive composition (b) 15 is applied to the insulating adhesive composition (a) of the metal foil composite 12 formed with a circuit and bonded to the metal plate 16. It is also possible to apply the insulating adhesive composition (b) to the insulating adhesive composition (a) surface of the metal foil composite 12 formed as a circuit. Further, when the desired film thickness cannot be applied by a single application, the insulating adhesive composition (b) is applied to the insulating adhesive composition (a) application surface of the metal foil composite 12 formed on the circuit and the metal plate 16, respectively. ) Can be applied and bonded to form a metal base circuit board. FIG. 3 shows an example using a metal foil composite with a roll-shaped circuit formed, but the same applies to the case of using a metal foil composite with a flat plate processed intermittently. . However, in this case, the circuit is formed by applying the insulating adhesive composition (b) to the metal plate 16 rather than the method of applying the insulating adhesive composition (b) to the circuit-formed metal foil composite. A method of laminating and joining the laminated metal foil composites, or laminating the sheet-like insulating adhesive composition (b) cured in advance to the extent that it can be joined and the circuit-formed metal foil composite. The method of joining and integrating them is easy to handle and effective.
[0032]
In addition, when the curing of the insulating adhesive composition (b) is too slow or when the insulating adhesive composition flows out from the end of the base material at the time of joining with the metal plate, after the insulating adhesive composition (b) is applied. It is effective to harden the insulating adhesive composition (b) to the extent that it can be joined before the joining of the metal foil composite formed with a circuit and the metal plate.
[0033]
FIG. 3 discloses an example in which the pressure bonding roll 17 is used for bonding the metal foil composite 12 formed with a circuit and the metal plate 16 via the insulating adhesive composition (b). There is no need to use a plate-like press device. In addition, the metal foil composite formed with a circuit due to restrictions on the apparatus can be cut before joining with the metal plate.
[0034]
When separating the joined metal foil composite, it is common to use an auto-cut laminator or the like in which the pressure joining roll 17 and the cutting machine 18 are integrated. As the heating device 19, a hot air furnace, a far-infrared heater, etc., a hot press furnace for heating while applying pressure, or the like can be used. That is, in the illustrated example, the insulating adhesive composition (b) is cured and integrated by using a pressure bonding roll and heated by a heating device, but the insulating adhesive composition (b) while being pressure bonded using a hot press furnace or the like. ) Can be cured.
[0035]
Furthermore, according to the present invention, the manufactured metal base circuit board can be processed into a desired size and shape by cutting using a cutting machine such as a press, shearing, or wire saw.
[0036]
The metal plate 16 used in the present invention is made of aluminum, copper, iron and their respective alloys, or cladding materials thereof, and the thickness thereof is not particularly specified, but is 0.5 to 5.0 mm. It is common.
[0037]
【Example】
Hereinafter, the present invention will be described in more detail with reference to examples.
[0038]
Example 1
Aluminum oxide (AS30, manufactured by Showa Denko KK) was added to the bisphenol A type epoxy resin so as to have a filling rate of 60% by volume, and mixed to prepare an insulating adhesive composition.
[0039]
A copper foil having a width of 600 mm and a thickness of 35 μm is continuously supplied, and the insulating adhesive composition having a width of 590 mm and a thickness of 100 μm is applied onto the foil, and continuously using a hot air heating furnace. The insulating adhesive composition was cured.
[0040]
Further, a polyethylene film with an acrylic pressure-sensitive adhesive having a width of 600 mm and a thickness of 38 μm is continuously laminated on the layer of the insulating adhesive composition so that the pressure-sensitive adhesive is opposed to the pressure-sensitive adhesive, and is united by pressure bonding with a laminator. Rolled with a machine. By carrying out this process continuously, a metal foil composite having a width of 600 mm and a length of 250 m was produced.
[0041]
Next, a roll-shaped metal foil composite was continuously supplied to a resist forming apparatus, an etching apparatus, and a resist stripping apparatus to form a 35 μm copper circuit, and then a roll-shaped circuit was formed by a winder. A metal foil composite was obtained.
[0042]
Next, after the metal foil composite with the circuit formed was continuously put into an appearance inspection machine and a withstand voltage inspection machine, an appearance inspection and an electrical property inspection were conducted, and a pass / fail judgment was made. After peeling the polyethylene film with acrylic adhesive of the composite, the insulating adhesive composition was applied to the part of the metal foil composite from which the polyethylene film with acrylic adhesive was peeled so as to have a width of 590 mm and a film thickness of 50 μm. Then, they were laminated on an aluminum plate having a length of 600 mm, a width of 600 mm, and a thickness of 1.5 mm, joined and heated to obtain a metal base circuit board. Then, it processed into the size of length 70mm and width 100mm using the press.
[0043]
As a result of inspecting 100 metal base circuit boards obtained by the above operation, there were no defective circuit formation and poor electrical characteristics, and there were no scratches, dents, etc. on the back surface of the aluminum.
[0044]
(Example 2)
A copper foil having a width of 600 mm and a thickness of 35 μm was continuously supplied, and the same insulating adhesive composition as that used in Example 1 having a width of 590 mm and a thickness of 50 μm was applied onto the copper foil. The insulating adhesive composition was continuously cured using a heating furnace and formed into a roll using a winder.
[0045]
On the insulating adhesive composition layer, the insulating adhesive composition is again applied so as to have a width of 590 mm and a film thickness of 50 μm, and the upper layer of the insulating adhesive is continuously applied using a hot air heating furnace. The agent composition was cured. A polyethylene film with an acrylic pressure-sensitive adhesive having a width of 600 mm and a thickness of 38 μm was continuously laminated thereon so as to face the pressure-sensitive adhesive, and were pressure-bonded and integrated with a laminator, and formed into a roll with a winder. By carrying out this process continuously, a metal foil composite having a width of 600 mm and a length of 250 m was produced.
[0046]
Next, as shown in FIG. 4, the roll-shaped metal foil composite was put into the press machine 21 and punched, and the metal foil composite was processed into a flat plate shape by cutting 500 mm long and 500 mm wide. Thereafter, as shown in FIG. 5, a circuit is formed by intermittently supplying only good portions having no scratches and dents on the surface of the metal foil composite to a resist forming apparatus, an etching apparatus, and a resist stripping apparatus. Thus, a flat metal foil composite in which a 35 μm copper foil was circuitized was obtained.
[0047]
Next, after the metal foil composite with the circuit formed was intermittently thrown into an appearance inspection machine and a withstand voltage inspection machine, an appearance inspection and an electrical property inspection were conducted, and a pass / fail judgment was made, and then the metal foil that was good After peeling the polyethylene film with acrylic pressure-sensitive adhesive of the composite, the part where the polyethylene film with acrylic pressure-sensitive adhesive of the metal foil composite was peeled off,
The insulating adhesive composition is laminated on an aluminum plate having a length of 500 mm, a width of 500 mm, and a thickness of 1.5 mm applied so as to have a length of 490 mm, a width of 490 mm, and a film thickness of 50 μm. A substrate was obtained. Then, it processed into the size of length 70mm and width 100mm using the press. As a result of inspecting 100 metal base circuit boards obtained by the above operation, there were no defective circuit formation and poor electrical characteristics, and there were no scratches, dents, etc. on the back surface of the aluminum.
[0048]
(Comparative Example 1)
The same insulating adhesive composition as in Example 1 was applied to an aluminum plate having a length of 600 mm, a width of 600 mm, and a thickness of 1.5 mm so as to have a thickness of 150 μm, dried to obtain a B-stage state, and then a copper foil having a thickness of 35 μm. Was laminated on the insulating adhesive composition and pressed, and the insulating adhesive composition was heated and cured to prepare a metal base substrate.
[0049]
An etching resist was formed at a desired position on the metal base substrate and the copper foil was etched. Then, the etching resist was removed to form a circuit, and a metal base circuit substrate was produced. Then, it processed into the size of length 70mm and width 100mm using the press.
[0050]
The 100 metal base circuit boards obtained by the above operation were subjected to an appearance inspection and an electrical property inspection using an appearance inspection machine. As a result, some of the substrates contained defective portions. In addition, many scratches, dents, etc. that were thought to have occurred during the production were generated on the back surface of the aluminum.
[0051]
(Comparative Example 2)
The same insulating adhesive composition as in Example 1 was applied to an aluminum plate having a length of 500 mm, a width of 500 mm, and a thickness of 1.5 mm so as to be 75 μm, and the insulating adhesive composition was cured by a hot air dryer. Thereafter, 75 μm of the insulating adhesive composition is again applied onto the insulating adhesive composition layer, and heated to bring the upper insulating composition into a B-stage state. Thereafter, a copper foil having a thickness of 35 μm is added to the layer. The insulating adhesive composition was laminated and pressed, and the insulating adhesive composition was heated and cured to prepare a metal base substrate.
[0052]
An etching resist was formed at a desired position on the copper foil of the metal base substrate and the copper foil was etched, and then the etching resist was removed to form a circuit to produce a metal base circuit board. Then, it processed into the size of length 70mm and width 100mm using the press.
[0053]
The 100 metal base circuit boards obtained by the above operation were subjected to an appearance inspection and an electrical property inspection using an appearance inspection machine. As a result, some of the substrates contained defective portions. In addition, many scratches, dents, etc. that were thought to have occurred during the production were generated on the back surface of the aluminum.
[0054]
Table 1 shows various physical properties of the metal base circuit boards manufactured in Example 1, Example 2, Comparative Example 1, and Comparative Example 2.
[0055]
[Table 1]
Figure 0004801874
[0056]
【The invention's effect】
The method for producing a metal base circuit board according to the present invention can be continuously carried out from the application of the insulating adhesive composition to the step of joining to the metal plate, and has the effect of dramatically improving productivity, Since it is made into a substrate after the process from application of insulating adhesive composition to circuit formation, it can prevent abnormalities such as scratches and dents on the back side of the metal plate, and in addition, inspection of product quality etc. is performed before joining with the metal plate It is possible to reduce the loss of manufacturing defective substrates and the like, which is very useful in industry.
[Brief description of the drawings]
FIG. 1 is a schematic view illustrating steps (1) and (2) in a method for manufacturing a metal base circuit board according to the present invention.
FIG. 2 is a schematic view illustrating step (3) in the method for manufacturing a metal base circuit board according to the present invention.
FIG. 3 is a schematic view illustrating step (4) in the method for manufacturing a metal base circuit board according to the present invention.
FIG. 4 is a schematic view illustrating the case of punching after the step (2) in the method for manufacturing a metal base circuit board according to the present invention.
FIG. 5 is a schematic view showing another example of the step (3) in the method for producing a metal base circuit board according to the present invention.
[Explanation of symbols]
1 Metal foil 2 Coating machine 3 Insulating adhesive composition (a)
DESCRIPTION OF SYMBOLS 4 Heating device 5 Resin film 6 with pressure-sensitive adhesive 6 Pressure bonding roll 7 Metal foil composite 8 Resist forming device 9 Etching resist 10 Etching device 11 Resist stripping device 12 Metal foil composite 13 with circuit formed Stripping machine 14 Coating machine 15 Insulation Adhesive composition (b)
16 Metal plate 17 Pressure bonding roll 18 Cutting machine 19 Heating device 20 Metal base circuit board 21 Press machine

Claims (5)

(1)連続的に供給される金属箔上に、絶縁接着剤組成物(a)を塗布し、前記絶縁接着剤組成物(a)を硬化する工程、
(2)更に連続的に供給される粘着剤付き樹脂フィルムを粘着剤が対するように前記絶縁接着剤組成物(a)からなる層上に積層し、前記金属箔と絶縁接着剤組成物(a)と粘着剤付き樹脂フィルムとをロールにて加圧接合して一体化し、金属箔複合体とする工程、
(3)前記金属箔複合体の金属箔を、連続的又は間歇的に回路に形成する工程、
(4)前記回路形成された金属箔複合体の粘着剤付き樹脂フィルムを剥離し、前記回路形成された金属箔複合体の前記硬化した絶縁接着剤組成物(a)上に未硬化の絶縁接着剤組成物(b)を塗布し、前記未硬化の絶縁接着剤組成物(b)上に金属板を接合し、前記未硬化の絶縁接着剤組成物(b)を硬化して一体化する工程、
を順次経ることを特徴とする金属ベース回路基板の製造方法。
(1) A step of applying an insulating adhesive composition (a) on a continuously supplied metal foil and curing the insulating adhesive composition (a).
(2) Further, the resin film with the pressure-sensitive adhesive that is continuously supplied is laminated on the layer made of the insulating adhesive composition (a) so that the pressure-sensitive adhesive is opposed, and the metal foil and the insulating adhesive composition (a ) And the pressure-sensitive adhesive resin film are integrated by pressure joining with a roll to form a metal foil composite,
(3) forming a metal foil of the metal foil composite in a circuit continuously or intermittently;
(4) the circuit with an adhesive resin film formed metal foil composite was peeled off, unhardened insulating adhesive on the cured insulating adhesive composition of the circuit formed metal foil composite (a) Applying the agent composition (b), bonding a metal plate on the uncured insulating adhesive composition (b), and curing and integrating the uncured insulating adhesive composition (b) ,
A method of manufacturing a metal-based circuit board, wherein
(1)の工程の絶縁接着剤組成物(a)の塗布と硬化とを、複数回繰り返すことを特徴とする請求項1記載の金属ベース回路基板の製造方法。The method for producing a metal base circuit board according to claim 1, wherein the application and curing of the insulating adhesive composition (a) in the step (1) are repeated a plurality of times. 絶縁接着剤組成物(a)が、硬化後のヤング率が8×10N/m以下であることを特徴とする請求項1又は請求項2記載の金属ベース回路基板の製造方法。The method for producing a metal base circuit board according to claim 1 or 2, wherein the insulating adhesive composition (a) has a Young's modulus after curing of 8 x 10 9 N / m 2 or less. 絶縁接着剤組成物(a、b)が、無機質充填材として酸化アルミニウム(Al)、窒化アルミニウム(AlN)、窒化硼素(BN)および酸化珪素(SiO)からなる群から選ばれる少なくとも1種以上を含有することを特徴とする請求項1、請求項2又は請求項3記載の金属ベース回路基板の製造方法。The insulating adhesive composition (a, b) is at least selected from the group consisting of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), boron nitride (BN), and silicon oxide (SiO 2 ) as the inorganic filler. The method for producing a metal base circuit board according to claim 1, wherein the metal base circuit board contains at least one kind. (3)の工程の後、絶縁接着剤組成物との密着性検査及び電気的特性検査を行うことを特徴とする請求項1、請求項2、請求項3又は請求項4記載の金属ベース回路基板の製造方法。5. The metal base circuit according to claim 1, 2, 3 or 4, wherein after the step (3), an adhesion test with the insulating adhesive composition and an electrical property test are performed. A method for manufacturing a substrate.
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