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JP4805663B2 - Near-field waveguide, near-field waveguide method, and optical shift register - Google Patents
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JP4805663B2 - Near-field waveguide, near-field waveguide method, and optical shift register - Google Patents

Near-field waveguide, near-field waveguide method, and optical shift register Download PDF

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JP4805663B2
JP4805663B2 JP2005346179A JP2005346179A JP4805663B2 JP 4805663 B2 JP4805663 B2 JP 4805663B2 JP 2005346179 A JP2005346179 A JP 2005346179A JP 2005346179 A JP2005346179 A JP 2005346179A JP 4805663 B2 JP4805663 B2 JP 4805663B2
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顕司 都鳥
玲子 吉村
宰 多田
史彦 相賀
紘 山田
美保 丸山
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Description

本発明は、近接場が導波される導波路、この導波路を用いた近接場導波方法、およびこの導波路を応用した光シフトレジスタに関する。   The present invention relates to a waveguide in which a near field is guided, a near field waveguide method using the waveguide, and an optical shift register using the waveguide.

情報伝達手段としては長距離通信から順に光を媒体とする傾向が見られ、光通信は基幹系光通信からFTTH(Fiver To The Home)へと普及してきている。今後は装置間、ボード間、チップ間、チップ内へと光による情報伝達の採用が進むと考えられている。しかし、光は波長以下の領域へ閉じ込めることが難しく(回折限界)、チップ間またはチップ内で導波路を形成するには特別な技術が必要とされている。   As information transmission means, there is a tendency to use light as a medium in order from long-distance communication, and optical communication has spread from backbone optical communication to FTTH (Fiver To The Home). In the future, it is considered that the adoption of information transmission by light will be advanced between devices, between boards, between chips, and within chips. However, it is difficult to confine light in a region below the wavelength (diffraction limit), and a special technique is required to form a waveguide between chips or within a chip.

従来、光を伝達するために、近接場を用いる技術(微小ドット列)、プラズモンを用いる技術(特許文献1)、励起子を用いる技術(特許文献2)が知られている。
特開2003−207667号公報 特開2004−157326号公報
Conventionally, in order to transmit light, a technique using a near field (a minute dot array), a technique using a plasmon (Patent Document 1), and a technique using an exciton (Patent Document 2) are known.
JP 2003-207667 A JP 2004-157326 A

しかし、微小ドット列における近接場の伝達効率は近接場が進むにつれて指数関数的に減少する。プラズモンは金属による吸収が無視できない。励起子はエネルギー緩和が速いため、緩和時間内での伝達しかできないという寿命の問題がある。   However, the transmission efficiency of the near field in the minute dot array decreases exponentially as the near field advances. Plasmon cannot be ignored by metal. Since excitons are fast in energy relaxation, there is a problem of lifetime that can only be transmitted within the relaxation time.

本発明の目的は、光の回折限界を超えた微小サイズの近接場導波路、この導波路を用いた近接場導波方法、およびこの導波路を応用した光シフトレジスタを提供することにある。   An object of the present invention is to provide a near-field waveguide having a minute size exceeding the diffraction limit of light, a near-field waveguide method using the waveguide, and an optical shift register using the waveguide.

本発明の一態様に係る近接場導波路は、エネルギー準位が量子化された量子ドットを配列した近接場導波部と、前記近接場導波部の両端の外側に設けられた1対の電極と、前記近接場導波部の一端の量子ドットに近接場を導入する近接場励起部と、前記近接場導波部の他端の量子ドットから近接場を出力する近接場出力部とを有することを特徴とする。   A near-field waveguide according to an aspect of the present invention includes a near-field waveguide unit in which quantum dots whose energy levels are quantized are arranged, and a pair of outer-field waveguide units provided outside both ends of the near-field waveguide unit. An electrode, a near-field excitation unit that introduces a near field into a quantum dot at one end of the near-field waveguide unit, and a near-field output unit that outputs a near field from the quantum dot at the other end of the near-field waveguide unit It is characterized by having.

本発明の他の態様に係る近接場導波方法は、エネルギー準位が量子化された量子ドットを配列した近接場導波部の一端の量子ドットに電子を注入し、前記近接場導波路の一端の電子が注入された量子ドットの電子軌道に近接場を励起し、前記近接場導波路に電圧を印加し、前記近接場導波路の前記量子ドットが配列する方向に沿って、局在化した近接場を電子軌道とともに移動させ、前記近接場導波路の他端の量子ドットの電子軌道に移動した近接場を出力することを特徴とする。   In the near-field waveguide method according to another aspect of the present invention, electrons are injected into a quantum dot at one end of a near-field waveguide unit in which quantum dots with quantized energy levels are arranged, and the near-field waveguide A near-field is excited in the electron trajectory of a quantum dot into which electrons at one end have been injected, a voltage is applied to the near-field waveguide, and localization is performed along the direction in which the quantum dots are arranged in the near-field waveguide. The near field is moved together with the electron orbit, and the near field moved to the electron orbit of the quantum dot at the other end of the near field waveguide is output.

本発明のさらに他の態様に係る光シフトレジスタは、エネルギー準位が量子化された量子ドットを配列した近接場導波部と、前記近接場導波部の両端の外側に設けられた1対の電極と、前記近接場導波部の一端の量子ドットに近接場を導入する近接場励起部と、前記近接場導波部の他端の量子ドットから近接場を出力する近接場出力部とを有する近接場導波路と、前記近接場導波部中の量子ドットに保持されている近接場を読み出す近接場読出部とを有することを特徴とする。   An optical shift register according to still another aspect of the present invention includes a near-field waveguide unit in which quantum dots whose energy levels are quantized are arranged, and a pair provided outside both ends of the near-field waveguide unit. A near-field excitation unit that introduces a near field into a quantum dot at one end of the near-field waveguide unit, and a near-field output unit that outputs a near field from the quantum dot at the other end of the near-field waveguide unit; And a near-field readout section that reads out a near-field held by the quantum dots in the near-field waveguide section.

本発明の近接場導波路および近接場導波方法によれば、近接場を高い伝播効率で導波させることが可能となり、光シフトレジスタも実現できる。   According to the near-field waveguide and the near-field waveguide method of the present invention, the near-field can be guided with high propagation efficiency, and an optical shift register can be realized.

以下、本発明の実施形態に係る近接場導波路および近接場導波方法を詳細に説明する。   Hereinafter, the near-field waveguide and the near-field waveguide method according to the embodiment of the present invention will be described in detail.

近接場とは、伝播せず、物質表面に局在化した光である(「近接場光の基礎」大津元一・小林潔共著、オーム社、平成15年1月5日発行)。近接場は回折限界の制限を受けず、波長以下の領域に局在化させることができる。近接場の強度は物質の表面から離れるに従って指数関数的に減少するため、近接場の存在範囲は物質表面から波長程度である。また、同程度のサイズの微小球が存在していれば、近接場によって微小球の結合状態が形成されるため、近接場のエネルギーを移動させることができる。しかし、表面が接していない限り、近接場の伝播効率は指数関数的に減少する。   Near-field is light that does not propagate and is localized on the surface of the material ("Near-field light basics" by Otsuka Motoichi and Kobayashi Kiyoshi, Ohmsha, published on January 5, 2003). The near field is not limited by the diffraction limit and can be localized in a region below the wavelength. Since the near-field intensity decreases exponentially as the distance from the surface of the material increases, the near-field existence range is about the wavelength from the material surface. Further, if microspheres of the same size exist, the coupled state of the microspheres is formed by the near field, so that the energy of the near field can be moved. However, as long as the surfaces are not in contact, the propagation efficiency of the near field decreases exponentially.

表面に近接場が励起した微小球を移動させると、当然、局在化した近接場も移動する。ただし、微小球の物理的な移動を利用して近接場を移動させるのは、適切な方法とはいえない。ここで、近接場が局在化している物質表面とは物質の表皮に存在する電子軌道のことである、ということを考慮すべきである。すなわち、近接場が励起した微小球の表面の電子軌道を微小球と分離し、その電子軌道のみを移動させることができれば、近接場は電子軌道に付随して移動することになる。したがって、近接場導波路として、電子が注入可能であり、電子の注入前と注入後で最外殻電子軌道が大きく異なる物質系を利用すればよい。近接場が励起する前の電子軌道はSOMO軌道(アニオン状態)であるため、ホールがなく、再結合によるエネルギー緩和が存在しない。従って、励起子のように電子が寿命を持たない。また、プラズモン励起には必ず吸収があるが、本提案は吸収係数が小さい材料を用うることが可能であり、従って金属のように信号強度が大きく減衰することもない。   When a microsphere whose near field is excited on the surface is moved, naturally, the localized near field is also moved. However, it is not an appropriate method to move the near field using the physical movement of the microsphere. Here, it should be considered that the surface of the material in which the near field is localized is an electron orbit existing in the skin of the material. That is, if the electron orbit on the surface of the microsphere excited by the near field can be separated from the microsphere and only the electron orbit can be moved, the near field moves along with the electron orbit. Therefore, as the near-field waveguide, a material system in which electrons can be injected and the outermost electron trajectories are largely different before and after the injection of electrons may be used. Since the electron orbit before excitation of the near field is a SOMO orbit (anion state), there is no hole, and there is no energy relaxation due to recombination. Therefore, electrons do not have a lifetime like excitons. In addition, although plasmon excitation always has absorption, this proposal can use a material having a small absorption coefficient, and therefore the signal intensity is not greatly attenuated unlike metal.

次に、電子の注入前と注入後で最外殻電子軌道が大きく異なる物質について説明する。電子を注入することによって、電子軌道の状態を注入前と比較して大きく変えるためには、量子ドットを用いればよい。量子ドットとはnmオーダー以下のサイズを有し、エネルギー準位が離散化された微粒子をいう。量子ドットは、金属ナノ粒子、半導体ナノ粒子、有機分子のいずれであってもよい。代表的な量子ドットの材料は、ナノ粒子材料である、Cu、Au、Ag、Fe、Ni、Co、Zn、Cr、W、Ti、Al、In、Ir、Mn、Mo、Bi、Ptなどの金属、Si、Ge、Sn、Pb、ダイヤモンド、GaAs、AlAs、InAs、GaP、InSbなどのIII−V族半導体、ZnS、ZnSe、ZnTe、CdS、CdSe、CdTeなどのII−VI族半導体、TiO2、ZnOなどの酸化物、C60、カーボンナノチューブ、フェロセン、ニッケロセン、Na2SO4、CH3COONa、CH3COOK、(COONa)2、CuCl、CH3COOAg、MgSO4、CaSO4、(COO)2Ca、ZnSO4、ZnCl2、(COO)2Znなどの有機分子、無機分子からなる群より選択される少なくとも1種が用いられる。 Next, a substance in which outermost electron trajectories are largely different before and after electron injection will be described. In order to greatly change the state of the electron orbit by injecting electrons as compared with before injection, quantum dots may be used. A quantum dot is a fine particle having a size of the order of nm or less and having discrete energy levels. The quantum dots may be any of metal nanoparticles, semiconductor nanoparticles, and organic molecules. Typical quantum dot materials are nanoparticle materials such as Cu, Au, Ag, Fe, Ni, Co, Zn, Cr, W, Ti, Al, In, Ir, Mn, Mo, Bi, and Pt. III-V group semiconductors such as metals, Si, Ge, Sn, Pb, diamond, GaAs, AlAs, InAs, GaP, InSb, II-VI group semiconductors such as ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, TiO 2 , Oxides such as ZnO, C 60 , carbon nanotubes, ferrocene, nickelocene, Na 2 SO 4 , CH 3 COONa, CH 3 COOK, (COONa) 2 , CuCl, CH 3 COOAg, MgSO 4 , CaSO 4 , (COO) 2 Ca, ZnSO 4, ZnCl 2 , at least one is used is selected from the group consisting of organic molecules, inorganic molecules such as (COO) 2 Zn It is.

量子ドットはサイズが小さいため、各エネルギー準位の状態密度がバルクより小さく、注入された1電子の影響が大きくなる。たとえば、ナノサイズの微粒子では1電子の注入でクーロンブロッケード現象が起こることが判明している(「単一電子トンネリング概論」春山純志著、コロナ社、2002年初版)。単純化のために、量子ドットとしてNa+イオンおよびNa原子を例にとって説明する。Na+イオンは1S軌道、2S軌道、2Pxyz軌道が閉殻している。ここに電子を1つ注入すると1S、2S、2Pxyz軌道を覆う形で3S軌道が形成され、Na原子となる。このNa原子に近接場を励起した場合、3S軌道に励起され、1S、2S、2Pxyz軌道は3S軌道に静電遮蔽され、ほとんど影響を受けない。したがって、Na+イオンを配列し、一端のNa+イオンに電子を注入するとNa中性原子となってこの原子のみが3S軌道を持つことになり、その3S軌道に近接場を励起し、Na+イオンを配列した方向に電場を印加すれば、近接場が局在化した3S軌道が次々に移動し近接場が移動することになる。このとき、あたかもNa原子が移動しているように見える。 Since the quantum dot is small in size, the density of states of each energy level is smaller than that of the bulk, and the influence of the injected one electron becomes large. For example, it has been clarified that the Coulomb blockade phenomenon occurs by injection of one electron in nano-sized fine particles ("Introduction to Single Electron Tunneling" by Junji Haruyama, Corona, 2002 first edition). For the sake of simplicity, description will be made by taking Na + ions and Na atoms as examples of quantum dots. The Na + ion has a 1S orbit, 2S orbit, and 2P xyz orbit closed. When one electron is injected here, a 3S orbital is formed so as to cover the 1S, 2S, 2P xyz orbitals, and becomes Na atoms. When a near field is excited by this Na atom, it is excited by a 3S orbit and the 1S, 2S, and 2P xyz orbits are electrostatically shielded by a 3S orbit and are hardly affected. Thus, by arranging the Na + ions, only the atoms become Na neutral atoms when injecting electrons into one end of the Na + ions will have 3S trajectory to excite near-field to the 3S orbit, Na + When an electric field is applied in the direction in which ions are arranged, the 3S orbit where the near field is localized moves one after another, and the near field moves. At this time, it seems as if Na atoms are moving.

量子ドット間の電子の移動はトンネル効果で起こる。トンネル効果は、量子力学的な系でポテンシャルV0の高さがあるバリアに、V0よりも小さいエネルギーEの電子が衝突した時にバリアを突き抜ける現象である。バリアの内側でも外側でも確率tがゼロでない場合に起こる。シュレーディンガー方程式に従って計算すれば、バリアを通り抜ける透過率すなわちトンネル効果の確率tは下記の式で表わされる(たとえば、「単一電子トンネリング概論」春山純志著、コロナ社、2002年初版参照)。 Electron movement between quantum dots occurs by the tunnel effect. The tunnel effect is a phenomenon that penetrates a barrier when an electron having energy E smaller than V 0 collides with a barrier having a height of potential V 0 in a quantum mechanical system. Occurs when the probability t is not zero, either inside or outside the barrier. If calculated according to the Schroedinger equation, the transmission rate through the barrier, that is, the probability t of the tunnel effect, is expressed by the following equation (for example, “Introduction to Single Electron Tunneling” by Junji Haruyama, Corona, 2002, first edition).

Figure 0004805663
Figure 0004805663

この式によると、バリアの厚みaが薄いほどトンネリングが起こり易いことがわかる。
また、量子ドットに電子が注入されると、クーロンブロッケードが起こる場合がある。クーロンブロッケードが起こる条件として以下の3つが挙げられる。
According to this formula, it can be seen that tunneling is more likely to occur as the barrier thickness a decreases.
In addition, when electrons are injected into the quantum dots, Coulomb blockade may occur. There are the following three conditions for the occurrence of coulomb blockade.

Figure 0004805663
Figure 0004805663

ここで、kはボルツマン定数、Tは温度、RTは接合トンネル抵抗、RQは抵抗量子(25.8kΩ)、Re(Zt(ω))は外場電磁場環境インピーダンスの実部、εは誘電率、Sは接合面積、aはトンネリングバリアの厚みである。 Here, k is the Boltzmann constant, T is temperature, R T is the junction tunneling resistance, R Q is the resistance quantum (25.8kΩ), Re (Zt ( ω)) is the real part of the external field electromagnetic environment impedance, epsilon is the dielectric Rate, S is the bonding area, and a is the thickness of the tunneling barrier.

まずバリアは電子がトンネルできるほど薄い必要があり、次にバリアの帯電エネルギー(量子ドットのエネルギー準位上昇分)が環境温度エネルギーkT(k:ボルツマン定数、T:絶対温度)より大きいことが条件である。したがって、バリアの静電容量が小さいという条件があるが、その静電容量を決める因子の1つである膜厚は上記のようにトンネリング可能な薄さにとどめるという制限がある。また、面積すなわち量子ドットの表面積の影響が決定的となり、必然的に量子ドットのサイズは小さいことが条件となる。以上のことから、注入電子軌道が存在する量子ドットと移動先の量子ドットとの間に、帯電エネルギーEcに対応するクーロンブロッケード電圧Vc以上の電圧が印加されるように、全体の電圧を印加すればよい。電圧は1対の電極間で、電極−量子ドット間およびそれぞれの量子ドット−量子ドット間に分圧されるが、入力端の量子ドットとそれに隣接する電極との距離を量子ドット間の距離より離すことによって、電極−量子ドット間にクーロンブッケ−ド電圧Vcを印加しやすくすることができる。量子ドット−量子ドット間ではSOMO(Single Occupied Molecular Orbital)準位が近くなるので、大きな電圧差を必要としない。したがって、入力端の量子ドットに電子が注入されれば、電子軌道に近接場を励起されて近接場を出力端の量子ドットまで順次移動させることができる。なお、複数の近接場を導波させる場合、複数の量子ドット列を並列に配置すればよい。 First, the barrier needs to be thin enough to allow electrons to tunnel, and then the barrier charging energy (quantum dot energy level increase) is larger than the environmental temperature energy kT (k: Boltzmann constant, T: absolute temperature). It is. Therefore, although there is a condition that the electrostatic capacitance of the barrier is small, the film thickness, which is one of the factors that determine the electrostatic capacitance, is limited to be thin enough to be tunneled as described above. In addition, the influence of the area, that is, the surface area of the quantum dots is decisive, and the size of the quantum dots is inevitably small. From the above, the overall voltage is set so that a voltage equal to or higher than the Coulomb blockade voltage V c corresponding to the charging energy E c is applied between the quantum dot in which the injected electron orbit exists and the quantum dot at the movement destination. What is necessary is just to apply. The voltage is divided between a pair of electrodes, between the electrodes and quantum dots, and between each quantum dot and quantum dot. The distance between the quantum dot at the input end and the adjacent electrode is determined by the distance between the quantum dots. by separating the electrode - it can be easily applied to mode voltage V c - Kuronbukke between quantum dots. Since the SOMO (Single Occupied Molecular Orbital) level is close between the quantum dot and the quantum dot, a large voltage difference is not required. Therefore, if electrons are injected into the quantum dot at the input end, the near field is excited by the electron trajectory, and the near field can be sequentially moved to the quantum dot at the output end. When guiding a plurality of near fields, a plurality of quantum dot arrays may be arranged in parallel.

次に、上記の近接場導波路を適用した光シフトレジスタについて説明する。この光シフトレジスタでは、1つの量子ドットをメモリとして用いる。近接場が励起されている最外殻電子雲は外部電場によって量子ドット間を移動させたり、停止させたりすることができる。たとえば、量子ドットを8個直列に並べると、8ビットの光シフトレジスタとして用いることができる。ビットをシフトさせるためには、必要な外場を量子ドット列と平行に印加する。外場の方向を制御することにより、ビットを右または左にシフトすることができる。従来技術としては光シフトレジスタ(特許第2610287号)や光インバータ回路(特開平6−95194号公報)が知られているが、いずれも双安定性素子を使用しており、構造も複雑である。これに対して、本発明の実施形態に係る、量子ドットを用いた光シフトレジスタはサイズも小さく、簡便な構造で構成することができる。   Next, an optical shift register to which the above near-field waveguide is applied will be described. In this optical shift register, one quantum dot is used as a memory. The outermost electron cloud in which the near field is excited can be moved between quantum dots or stopped by an external electric field. For example, when eight quantum dots are arranged in series, it can be used as an 8-bit optical shift register. In order to shift the bits, the required external field is applied parallel to the quantum dot array. By controlling the direction of the external field, the bits can be shifted to the right or left. Conventionally known are an optical shift register (Japanese Patent No. 2610287) and an optical inverter circuit (Japanese Patent Laid-Open No. 6-95194), both of which use bistable elements and have a complicated structure. . In contrast, the optical shift register using quantum dots according to the embodiment of the present invention is small in size and can be configured with a simple structure.

以下、図面を参照しながら、本発明の実施例を説明する。   Embodiments of the present invention will be described below with reference to the drawings.

(実施例1)
図1(a)および(b)に本実施例の近接場導波路を示す。図1(a)は平面図、図1(b)は断面図である。図1(a)および(b)に示すように、Siを電子ビームリソグラフィーにより加工し、直径約10nm、高さ約10nmの円柱状の量子ドット1を2nmの間隔を隔てて一列に配列して、近接場導波部10を形成した。量子ドット1間にはSiO2を形成した。近接場導波部10の全長は約5μmである。量子ドット列の一端(入力端)の量子ドット1と他端(出力端)の量子ドット1の外側に、それぞれ5nmの間隔を隔てて1対の電極11、12を形成した。図1(b)に示すように、入力端の量子ドット1の上方に近接場励起部13として光ファイバープローブを配置し、出力端の量子ドット1の上方に近接場出力部14として光ファイバープローブを配置した。各光ファイバープローブは先端部を先鋭化し先端部の側面に金属膜をコーティングしたものである。
(Example 1)
1A and 1B show the near-field waveguide of this example. FIG. 1A is a plan view, and FIG. 1B is a cross-sectional view. As shown in FIGS. 1A and 1B, Si is processed by electron beam lithography, and cylindrical quantum dots 1 having a diameter of about 10 nm and a height of about 10 nm are arranged in a line at intervals of 2 nm. The near-field waveguide unit 10 was formed. SiO 2 was formed between the quantum dots 1. The total length of the near-field waveguide 10 is about 5 μm. A pair of electrodes 11 and 12 were formed on the outer side of the quantum dot 1 at one end (input end) and the quantum dot 1 at the other end (output end) of the quantum dot array, respectively, with an interval of 5 nm. As shown in FIG. 1B, an optical fiber probe is disposed as the near-field excitation unit 13 above the quantum dot 1 at the input end, and an optical fiber probe is disposed as the near-field output unit 14 above the quantum dot 1 at the output end. did. Each optical fiber probe has a sharpened tip and a metal film coated on the side of the tip.

図2(a)〜(e)を参照して、上記の近接場導波路における近接場の伝播について説明する。図2(a)に示すように、電極11、12間に電圧を印加し、近接場導波路10の入力端近傍の電極11から入力端の量子ドット1へ電子を注入する。次に、近接場励起部13によって、電子が注入された入力端の量子ドット1の電子軌道に近接場を励起する。図2(b)、(c)、(d)に示すように、電極11、12により近接場導波路10に電圧を印加し、近接場導波路10に沿って、局在化した近接場を電子軌道とともに順次移動させ、最終的に出力端の量子ドット1まで移動させる。図2(e)に示すように、近接場導波路10の出力端の量子ドット1の電子軌道に移動した近接場を、近接場出力部14によって出力する。   The near-field propagation in the near-field waveguide will be described with reference to FIGS. As shown in FIG. 2A, a voltage is applied between the electrodes 11 and 12, and electrons are injected from the electrode 11 near the input end of the near-field waveguide 10 into the quantum dot 1 at the input end. Next, the near field excitation unit 13 excites the near field in the electron trajectory of the quantum dot 1 at the input end where the electrons are injected. 2B, 2C, and 2D, a voltage is applied to the near-field waveguide 10 by the electrodes 11 and 12, and the localized near-field along the near-field waveguide 10 is changed. It moves sequentially with the electron orbit and finally moves to the quantum dot 1 at the output end. As shown in FIG. 2 (e), the near-field output unit 14 outputs the near-field moved to the electron orbit of the quantum dot 1 at the output end of the near-field waveguide 10.

上記のように量子ドット1のサイズが約10nmのとき、クーロンブロッケード電圧は約50mVとなる。近接場導波部10の両端に電圧を印加しない状態で、近接場励起部13から波長532nmの近接場を励起し続けても、近接場出力部14で出力は観測されなかった。一方、出力端の電極12に対して入力端の電極11に、約−1Vの電圧を印加した状態で、近接場励起部13から波長532nmの近接場を励起し続けた場合、近接場出力部14で近接場の出力が観測された。   As described above, when the size of the quantum dot 1 is about 10 nm, the Coulomb blockade voltage is about 50 mV. No output was observed at the near-field output unit 14 even when the near-field excitation unit 13 continued to excite a near-field having a wavelength of 532 nm without applying a voltage to both ends of the near-field waveguide unit 10. On the other hand, when the near-field excitation unit 13 continues to excite a near-field having a wavelength of 532 nm with a voltage of about −1 V applied to the input-end electrode 11 with respect to the output-end electrode 12, the near-field output unit 14 the near field output was observed.

(実施例2)
図3に、本実施例の近接場導波路の斜視図を示す。ガラス基板(図示せず)上に、ポリスチレン中に直径約4nmのAuからなる量子ドット1を分散させた膜20を約0.5μmの厚さに塗布した。図3に示すように、複数の量子ドット1は、一列に配列されている必要はなく、集合体でもよい。この膜20の両端にAu膜をスパッタして電極21、22を形成した。電極21、22間の距離は約50μmである。膜20の電極21、22間の領域を近接場導波路として用いる。入力端の上方に近接場励起部23として光ファイバープローブを配置し、出力端の上方に近接場出力部24として光ファイバープローブを配置した。
(Example 2)
FIG. 3 shows a perspective view of the near-field waveguide of this embodiment. On a glass substrate (not shown), a film 20 in which quantum dots 1 made of Au having a diameter of about 4 nm were dispersed in polystyrene was applied to a thickness of about 0.5 μm. As shown in FIG. 3, the plurality of quantum dots 1 do not have to be arranged in a line, and may be an aggregate. Electrodes 21 and 22 were formed by sputtering an Au film on both ends of the film 20. The distance between the electrodes 21 and 22 is about 50 μm. A region between the electrodes 21 and 22 of the film 20 is used as a near-field waveguide. An optical fiber probe was disposed as the near-field excitation unit 23 above the input end, and an optical fiber probe was disposed as the near-field output unit 24 above the output end.

近接場出力部24を電極21、22間の近接場導波路上の位置Aに設置し、電極21、22間に約500Vの電圧を印加して、近接場励起部23により近接場を励起させたところ、位置Aに設置した近接場出力部24で近接場を観測することができた。電極21、22間での電圧の印加を止めたところ、近接場出力部24で近接場を観測することはできなかった。次に、近接場出力部24を電極21、22間の近接場導波路上からはずれた位置Bに設置したところ、電極21、22間に約500Vの電圧を印加して、近接場励起部23により近接場を励起させても、近接場出力部24で近接場を観測することはできなかった。   A near-field output unit 24 is installed at a position A on the near-field waveguide between the electrodes 21 and 22, and a voltage of about 500 V is applied between the electrodes 21 and 22 to excite the near-field by the near-field excitation unit 23. As a result, the near field was able to be observed by the near field output unit 24 installed at the position A. When the application of the voltage between the electrodes 21 and 22 was stopped, the near field could not be observed at the near field output unit 24. Next, when the near-field output unit 24 is installed at a position B off the near-field waveguide between the electrodes 21 and 22, a voltage of about 500 V is applied between the electrodes 21 and 22, and the near-field excitation unit 23 is applied. Even when the near field was excited by the near field, the near field could not be observed at the near field output unit 24.

Auからなる量子ドットの代わりに、Ag、Pb、Ti、TiO2、Al、Cu、In、Ir、W、Cr、Ni、Fe、Co、Zn、Ge、Sn、Mn、Mo、Bi、Pt、GaAs、AlAs、InAs、GaP、InSb、ZnO、ZnS、CdS、ZnSe、CdSe、ZnTe、CdTeからなる量子ドットを用いた場合にも、上記と同様な結果が観測された。 Instead of quantum dots of Au, Ag, Pb, Ti, TiO 2, Al, Cu, In, Ir, W, Cr, Ni, Fe, Co, Zn, Ge, Sn, Mn, Mo, Bi, Pt, Similar results were observed when quantum dots made of GaAs, AlAs, InAs, GaP, InSb, ZnO, ZnS, CdS, ZnSe, CdSe, ZnTe, and CdTe were used.

(実施例3)
図4(a)は本実施例に係る近接場導波路の斜視図である。図4(b)は本実施例に係る近接場導波路と1対の平面導波路とを組み合わせた導波路の平面図である。ガラス基板30上に電極31、32を形成した。これらの電極31、32間に、ポリスチレン中にC60からなる量子ドット1を分散させた膜40を塗布した。この膜40が近接場導波路として用いられ、その長さは約2μmである。この膜40の両端に、ガラス基板30上の電極31、32と接続する電極41、42を形成した。さらに、膜40の両端に、コアとクラッドを有し先端を先鋭化させた平面導波路43、44を設けた。平面導波路43、44は先端を先鋭化しているため、先端で近接場が発生する。入力端の平面導波路43を近接場励起部として用い、出力端の平面導波路44を近接場出力部として用いる。電極31、32間に約2kVの電圧を印加し、平面導波路43により近接場を励起させたところ、平面導波路44で近接場を観測することができた。
(Example 3)
FIG. 4A is a perspective view of the near-field waveguide according to the present embodiment. FIG. 4B is a plan view of a waveguide obtained by combining a near-field waveguide and a pair of planar waveguides according to this embodiment. Electrodes 31 and 32 were formed on the glass substrate 30. Between these electrodes 31 and 32, were coated with a film 40 formed by dispersing the quantum dot 1 made of C 60 in polystyrene. This film 40 is used as a near-field waveguide, and its length is about 2 μm. Electrodes 41 and 42 connected to the electrodes 31 and 32 on the glass substrate 30 were formed at both ends of the film 40. Further, planar waveguides 43 and 44 having a core and a clad and having sharpened tips are provided at both ends of the film 40. Since the planar waveguides 43 and 44 have sharpened tips, a near field is generated at the tips. The planar waveguide 43 at the input end is used as the near-field excitation unit, and the planar waveguide 44 at the output end is used as the near-field output unit. When a near field was excited by the planar waveguide 43 by applying a voltage of about 2 kV between the electrodes 31 and 32, the near field could be observed by the planar waveguide 44.

60からなる量子ドットの代わりに、カーボンナノチューブ、フェロセン、ニッケロセン、Na2SO4、CH3COONa、CH3COOK、(COONa)2、CuCl、CH3COOAg、MgSO4、CaSO4、(COO)2Ca、ZnSO4、ZnCl2、(COO)2Znからなる量子ドットを用いた場合にも、近接場の導波を確認できた。 Instead of C 60 quantum dots, carbon nanotubes, ferrocene, nickelocene, Na 2 SO 4 , CH 3 COONa, CH 3 COOK, (COONa) 2 , CuCl, CH 3 COOAg, MgSO 4 , CaSO 4 , (COO) Even when quantum dots made of 2 Ca, ZnSO 4 , ZnCl 2 , (COO) 2 Zn were used, near-field waveguiding could be confirmed.

(実施例4)
8個の量子ドット1を配列した以外は実施例1と同様にして近接場導波路10を形成し、8ビットのシフトレジスタとして用いた。図5に、本実施例の光シフトレジスタの概念図を示す。図6(a)および(b)に、本実施例の光シフトレジスタの動作を模式的に示す。実施例1と同様に、Siを電子ビームリソグラフィーにより加工し、直径約10nm、高さ約10nmの円柱状の8個の量子ドット1を2nmの間隔を隔てて一列に配列して、近接場導波部10を形成した。量子ドット1間にはSiO2を形成した。近接場導波部10の全長は約5μmである。量子ドット列の入力端の量子ドット1と出力端の量子ドット1の外側に、それぞれ5nmの間隔を隔てて1対の電極11、12を形成した。入力端の量子ドット1の上方に近接場励起部13として光ファイバープローブを配置し、出力端の量子ドット1の上方に近接場出力部14として光ファイバープローブを配置した。
Example 4
A near-field waveguide 10 was formed in the same manner as in Example 1 except that eight quantum dots 1 were arranged, and used as an 8-bit shift register. FIG. 5 shows a conceptual diagram of the optical shift register of this embodiment. 6A and 6B schematically show the operation of the optical shift register of this embodiment. Similar to Example 1, Si was processed by electron beam lithography, and eight columnar quantum dots 1 having a diameter of about 10 nm and a height of about 10 nm were arranged in a row at intervals of 2 nm to obtain near-field conduction. A wave portion 10 was formed. SiO 2 was formed between the quantum dots 1. The total length of the near-field waveguide 10 is about 5 μm. A pair of electrodes 11 and 12 were formed outside the quantum dot 1 at the input end and the quantum dot 1 at the output end of the quantum dot array, respectively, with a spacing of 5 nm. An optical fiber probe is disposed as the near-field excitation unit 13 above the quantum dot 1 at the input end, and an optical fiber probe is disposed as the near-field output unit 14 above the quantum dot 1 at the output end.

この光シフトレジスタでは、近接場の入力にタイミングを合わせて近接場導波路10の列方向に電場を印加することによって最外殻電子雲と近接場をシフトさせ、任意の量子ビット1に近接場を記憶させる。ここでは、「11011000」という8ビットの情報を入力した状態を示している。図6(b)に示すように、この情報の読み出しは、近接場読出部15としての近接場光学顕微鏡のファイバープローブを用いて行う。   In this optical shift register, the outermost electron cloud and the near field are shifted by applying an electric field in the column direction of the near-field waveguide 10 in synchronization with the input of the near-field, and the near-field is transferred to an arbitrary qubit 1. Remember. Here, a state in which 8-bit information “11011000” is input is shown. As shown in FIG. 6B, this information is read using a fiber probe of a near-field optical microscope as the near-field reading unit 15.

なお、情報の読み出しは、それぞれのビットに繋いだ近接場導波路によっても行うことができる。   Information can also be read out by a near-field waveguide connected to each bit.

実施例1の近接場導波路の平面図および断面図。2 is a plan view and a cross-sectional view of a near-field waveguide according to Embodiment 1. FIG. 実施例1の近接場導波路における近接場の伝播を模式的に示す図。The figure which shows typically propagation of the near field in the near field waveguide of Example 1. FIG. 実施例2の近接場導波路の斜視図。FIG. 6 is a perspective view of a near-field waveguide according to a second embodiment. 実施例3の近接場導波路の斜視図、および実施例3の近接場導波路と1対の平面導波路とを組み合わせた導波路の平面図。The perspective view of the near-field waveguide of Example 3, and the top view of the waveguide which combined the near-field waveguide of Example 3 and a pair of planar waveguide. 実施例4の光シフトレジスタの概念図。FIG. 10 is a conceptual diagram of an optical shift register according to a fourth embodiment. 実施例4の光シフトレジスタの動作を模式的に示す図。FIG. 10 is a diagram schematically illustrating the operation of the optical shift register according to the fourth embodiment.

符号の説明Explanation of symbols

1…量子ドット、10…近接場導波部、11、12…電極、13…近接場励起部、14…近接場出力部、15…近接場読出部、20…膜、21、22…電極、23…近接場励起部、24…近接場出力部、30…ガラス基板、31、32…電極、40…膜、41、42…電極、43、44…平面導波路。   DESCRIPTION OF SYMBOLS 1 ... Quantum dot, 10 ... Near field waveguide part, 11, 12 ... Electrode, 13 ... Near field excitation part, 14 ... Near field output part, 15 ... Near field read-out part, 20 ... Membrane, 21, 22 ... Electrode, DESCRIPTION OF SYMBOLS 23 ... Near field excitation part, 24 ... Near field output part, 30 ... Glass substrate, 31, 32 ... Electrode, 40 ... Film | membrane, 41, 42 ... Electrode, 43, 44 ... Planar waveguide.

Claims (5)

近接場を移動させるために並んだ量子ドットで構成された近接場導波部と、
前記近接場導波部の一端の量子ドットに電子をトンネル効果によって注入することによって、電子注入前と特性が異なる最外殻電子軌道を形成し、前記近接場導波部に電圧を印加し近接場を移動させるために近接場導波部の両端の外側に設けられた1対の電極と、
前記近接場導波部の一端の量子ドットの電子軌道に近接場を励起するための近接場励起部と、
前記近接場導波部の他端の量子ドットから近接場を出力する近接場出力部と
を有することを特徴とする近接場導波路。
A near-field waveguide composed of quantum dots arranged to move the near-field,
By injecting electrons into a quantum dot at one end of the near-field waveguide by tunnel effect, an outermost electron orbit having different characteristics from that before electron injection is formed, and a voltage is applied to the near-field waveguide to apply proximity. A pair of electrodes provided outside the ends of the near-field waveguide to move the field;
A near-field excitation unit for exciting a near-field in an electron orbit of a quantum dot at one end of the near-field waveguide unit;
A near-field waveguide comprising: a near-field output unit that outputs a near-field from a quantum dot at the other end of the near-field waveguide unit.
前記量子ドットは離散的なエネルギー準位をもつ有機材料または無機材料で形成されていることを特徴とする請求項1に記載の近接場導波路。   The near-field waveguide according to claim 1, wherein the quantum dots are formed of an organic material or an inorganic material having discrete energy levels. 前記量子ドットは、Cu、Au、Ag、Fe、Ni、Co、Zn、Cr、W、Ti、Al、In、Ir、Mn、Mo、Bi、Pt、Si、Ge、Sn、Pb、GaAs、AlAs、InAs、GaP、InSb、ZnS、ZnSe、ZnTe、CdS、CdSe、CdTe、TiO2、ZnO、C60、カーボンナノチューブ、フェロセン、ニッケロセン、Na2SO4、CH3COONa、CH3COOK、(COONa)2、CuCl、CH3COOAg、MgSO4、CaSO4、(COO)2Ca、ZnSO4、ZnCl2、(COO)2Znからなる群より選択されることを特徴とする請求項1に記載の近接場導波路。 The quantum dots are Cu, Au, Ag, Fe, Ni, Co, Zn, Cr, W, Ti, Al, In, Ir, Mn, Mo, Bi, Pt, Si, Ge, Sn, Pb, GaAs, AlAs. , InAs, GaP, InSb, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, TiO 2 , ZnO, C 60 , carbon nanotubes, ferrocene, nickelocene, Na 2 SO 4 , CH 3 COONa, CH 3 COOK, (COONa) 2. Proximity according to claim 1, characterized in that it is selected from the group consisting of 2 , CuCl, CH 3 COOAg, MgSO 4 , CaSO 4 , (COO) 2 Ca, ZnSO 4 , ZnCl 2 , (COO) 2 Zn. Field waveguide. 近接場を移動させるために並んだ量子ドットで構成された近接場導波部の一端の量子ドットに電子を注入し、
前記近接場導波部の一端の電子が注入された量子ドットの電子軌道に近接場を励起し、
前記近接場導波部に電圧を印加し、前記近接場導波部の前記量子ドットが配列する方向に沿って、局在化した近接場を電子軌道とともに移動させ、
前記近接場導波部の他端の量子ドットの電子軌道に移動した近接場を出力する
ことを特徴とする近接場導波方法。
Electrons are injected into the quantum dot at one end of the near-field waveguide unit composed of quantum dots arranged to move the near-field,
Exciting a near field to an electron orbit of a quantum dot into which electrons at one end of the near field waveguide are injected,
A voltage is applied to the near-field waveguide, and along the direction in which the quantum dots of the near-field waveguide are arranged, the localized near-field is moved together with the electron trajectory,
A near-field waveguide method for outputting a near-field moved to an electron orbit of a quantum dot at the other end of the near-field waveguide unit.
近接場を移動させるために並んだ量子ドットで構成された近接場導波部と、
前記近接場導波部の一端の量子ドットに電子を注入し、前記近接場導波部に電圧を印加し近接場を移動させるために近接場導波部の両端の外側に設けられた1対の電極と、
前記近接場導波部の一端の量子ドットの電子軌道に近接場を励起するための近接場励起部と、
前記近接場導波部の他端の量子ドットから近接場を出力する近接場出力部と、
前記近接場導波部中の量子ドットに保持されている近接場を読み出す近接場読出部と
を有することを特徴とする光シフトレジスタ。
A near-field waveguide composed of quantum dots arranged to move the near-field,
A pair provided outside both ends of the near-field waveguide to inject electrons into quantum dots at one end of the near-field waveguide and apply a voltage to the near-field waveguide to move the near-field. Electrodes,
A near-field excitation unit for exciting a near-field in an electron orbit of a quantum dot at one end of the near-field waveguide unit;
A near-field output unit that outputs a near-field from a quantum dot at the other end of the near-field waveguide; and
An optical shift register comprising: a near-field readout unit that reads out a near-field held by a quantum dot in the near-field waveguide unit.
JP2005346179A 2005-11-30 2005-11-30 Near-field waveguide, near-field waveguide method, and optical shift register Expired - Fee Related JP4805663B2 (en)

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