JP4813600B2 - Liquid processing apparatus and liquid processing method - Google Patents

Description

Cross-reference of related applications

  This application claims priority to Japanese Patent Application No. 2008-29235 filed on February 8, 2008, and the entire contents of the Japanese Patent Application No. 2008-29235 are incorporated herein by reference. .

  The present invention relates to a liquid processing apparatus and a liquid processing method for supplying a processing liquid to a target object and processing the target object.

  A conventional liquid processing apparatus includes a nozzle (discharge port) and a liquid supply unit that supplies liquid into the nozzle, and supplies compressed liquid (pressurized processing liquid) to the object to be processed from the nozzle. Processing is in progress. In the liquid processing apparatus for supplying the compressed liquid in this way, the compressed liquid is rapidly supplied from the nozzle at the initial stage where the liquid supply means starts supplying the liquid, and the excessive momentum of the compressed liquid adversely affects the wafer. There is a possibility of coming out.

  Moreover, in the processing apparatus further provided with the compressed gas supply means which supplies compressed gas in a nozzle among the conventional liquid processing apparatuses, the liquid supplied from a liquid supply means, and the compression supplied from a compressed gas supply means In the initial stage where the gas begins to mix (when the open / close valve provided in the compressed gas supply means is opened), the compressed gas is rapidly ejected and the mist particles of the processing liquid (mixed fluid) supplied from the nozzle There is a problem that the size is not stable.

  To solve such a problem, the compressed gas supply means may be provided with a mass flow controller for adjusting the flow rate of the compressed gas so that the compressed gas is not rapidly ejected (Japanese Patent Laid-Open No. 2005-327833). ,reference).

  However, providing a mass flow controller for each nozzle as shown in Japanese Patent Laid-Open No. 2005-327833 for a liquid processing apparatus using a large number (for example, 20) of nozzles is not realistic in terms of cost. It has become.

  The present invention has been made in consideration of such points, and is a liquid processing apparatus capable of making the particle size of the mixed fluid supplied from the discharge port to the object to be processed uniform at a low cost. Provided is a liquid processing apparatus that can prevent an object to be processed from being adversely affected by excessive momentum of supplied liquid at a cost. Moreover, the liquid processing method using such a liquid processing apparatus is also provided.

A first aspect of the liquid processing apparatus according to the present invention is as follows.
In a liquid processing apparatus for processing an object to be processed,
A supply source for supplying the processing fluid;
A processing fluid supply path coupled to the supply source for guiding the processing fluid supplied from the supply source;
A discharge port connected to the processing fluid supply path and supplying the processing fluid guided by the processing fluid supply path to the object to be processed;
An on-off valve provided in the processing fluid supply path;
A flow rate adjustment valve provided on the downstream side of the on-off valve,
The flow rate adjusting valve is connected to a valve driving fluid supply section that supplies a valve driving fluid, and the opening / closing speed thereof is adjusted by the cooperation of the valve driving fluid and the processing fluid.

  With such a configuration, it is possible to prevent the object to be processed from being adversely affected by excessive momentum of the supplied liquid at low cost.

In the first aspect of the liquid processing apparatus according to the present invention,
A buffer portion that slows the flow rate of the processing fluid at the start of supply can be provided between the flow rate adjusting valve and the discharge port.

  With such a configuration, it is possible to more reliably prevent the object to be processed from being adversely affected by excessive momentum of the supplied liquid.

In the first aspect of the liquid processing apparatus according to the present invention,
The flow rate adjusting valve includes a valve driving fluid supply port to which a valve driving fluid is supplied from the valve driving fluid supply unit, and a processing fluid inlet to which the processing fluid is guided from the processing fluid supply path. And a reciprocating valve portion disposed between the valve driving fluid supply port and the processing fluid inlet.

In the first aspect of the liquid processing apparatus according to the present invention,
A valve driving fluid supply path for guiding the valve driving fluid is provided between the valve driving fluid supply section and the flow rate adjusting valve, and the pressure of the valve driving fluid is adjusted in the valve driving fluid supply path. A pressure adjusting unit can be provided.

  With such a configuration, it is possible to prevent the processing fluid from being supplied to the discharge port at a sudden momentum, and to ensure that the object to be processed is adversely affected by the excessive momentum of the supplied liquid. Can be prevented.

A second aspect of the liquid processing apparatus according to the present invention is as follows.
In a liquid processing apparatus for processing an object to be processed,
A first supply source for supplying a first processing fluid;
A second supply source for supplying a second processing fluid;
A first processing fluid supply path coupled to the first supply source for guiding a first processing fluid supplied from the first supply source;
A second processing fluid supply path connected to the second supply source and guiding a second processing fluid supplied from the second supply source;
The first processing fluid is connected to the first processing fluid supply path and the second processing fluid supply path, and is guided by the first processing fluid supply path, and is guided by the second processing fluid supply path. A mixing unit that mixes the second processing fluid and generates a mixed fluid;
A discharge port connected to the mixing unit and supplying the mixed fluid generated in the mixing unit to the object to be processed;
An on-off valve provided in the first processing fluid supply path and the second processing fluid supply path;
A flow rate adjustment valve provided on the downstream side of the on-off valve of the first processing fluid supply path,
The flow rate adjusting valve is connected to a valve driving fluid supply section that supplies a valve driving fluid, and the opening / closing speed thereof is adjusted by the cooperation of the valve driving fluid and the first processing fluid.

  With such a configuration, the particle size of the mixed fluid supplied from the discharge port to the object to be processed can be made uniform at low cost.

In the second aspect of the liquid processing apparatus according to the present invention,
The first processing fluid supplied from the first supply source may be a gas, and the second processing fluid supplied from the second supply source may be a liquid.

In the second aspect of the liquid processing apparatus according to the present invention,
The first processing fluid supplied from the first supply source may be a liquid, and the second processing fluid supplied from the second supply source may be a gas.

In the second aspect of the liquid processing apparatus according to the present invention,
The valve driving fluid supplied from the valve driving fluid supply unit may be a gas.

In the second aspect of the liquid processing apparatus according to the present invention,
A buffer portion that slows the flow rate of the processing fluid at the start of supply can be provided between the flow rate adjusting valve and the discharge port.

  With such a configuration, the particle size of the mixed fluid supplied from the discharge port to the object to be processed can be made more uniform.

A first aspect of the liquid processing method according to the present invention is as follows.
A supply source for supplying a processing fluid, a processing fluid supply path connected to the supply source, a discharge port connected to the processing fluid supply path, and an on-off valve provided in the processing fluid supply path And a flow rate adjusting valve that is provided on the downstream side of the on-off valve and is connected to a valve driving fluid supply unit that supplies a valve driving fluid, and a liquid processing method using a liquid processing apparatus,
A processing fluid is supplied by the source;
The processing fluid supplied from the supply source is guided by the processing fluid supply path;
The opening and closing speed of the flow rate adjusting valve is adjusted by the cooperation of the valve driving fluid and the processing fluid in the flow rate adjusting valve;
The processing fluid guided by the processing fluid supply path is supplied to the object to be processed by the discharge port;
It has.

  By such a method, it is possible to prevent the object to be processed from being adversely affected by excessive momentum of the supplied liquid at low cost.

In the first aspect of the liquid processing method according to the present invention,
The flow rate of the processing fluid may be slowed by a buffer provided between the flow rate adjusting valve and the discharge port.

  By such a method, it can prevent more reliably that a to-be-processed object is adversely affected by the excessive momentum of the supplied liquid.

A second aspect of the liquid processing method according to the present invention includes:
A first supply source for supplying a first processing fluid; a second supply source for supplying a second processing fluid; a first processing fluid supply path connected to the first supply source; and the second supply. A second processing fluid supply path connected to a source, a mixing section connected to the first processing fluid supply path and the second processing fluid supply path, and a discharge port connected to the mixing section; On-off valves provided in the first processing fluid supply path and the second processing fluid supply path, provided on the downstream side of the on-off valve in the first processing fluid supply path, and a valve driving fluid A liquid processing method using a liquid processing apparatus having a flow rate adjustment valve connected to a fluid supply section for supplying valve driving,
A first processing fluid is supplied by the first supply source;
A second processing fluid is supplied by the second supply source;
The first processing fluid supplied from the first supply source is guided by the first processing fluid supply path;
The second processing fluid supplied from the second supply source is guided by the second processing fluid supply path;
In the flow rate adjusting valve, the opening / closing speed of the flow rate adjusting valve is adjusted by the cooperation of the valve driving fluid and the first processing fluid;
In the mixing unit, the first processing fluid and the second processing fluid are mixed to generate a mixed fluid;
The mixed fluid generated in the mixing unit is supplied to the object to be processed;
It has.

  By such a method, the particle size of the mixed fluid supplied from the discharge port to the object to be processed can be made uniform at low cost.

In the second embodiment of the liquid processing method according to the present invention,
The flow rate of the first processing fluid may be slowed by a buffer provided between the flow rate adjusting valve and the discharge port.

  By such a method, the particle size of the mixed fluid supplied from the discharge port to the object to be processed can be made more surely uniform.

  According to the present invention, the flow rate adjusting valve connected to the valve driving fluid supply section for supplying the valve driving fluid is provided on the downstream side of the on-off valve. For this reason, the liquid processing apparatus which does not have a bad influence on a to-be-processed object at low cost by the excessive momentum of the supplied liquid can be provided. It is also possible to provide a liquid processing apparatus that makes the particle size of the mixed fluid supplied from the discharge port to the target object uniform at a low cost. Furthermore, a liquid processing method using such a liquid processing apparatus can also be provided.

FIG. 1 is a configuration diagram showing a liquid processing apparatus according to a first embodiment of the present invention. FIG. 2 is a cross-sectional view showing the flow rate adjusting valve of the liquid processing apparatus according to the first embodiment of the present invention. FIG. 3 is a cross-sectional view showing an arrangement mode of the buffer portion of the liquid processing apparatus according to the first embodiment of the present invention. FIG. 4 is a block diagram showing a liquid processing apparatus according to the second embodiment of the present invention.

BEST MODE FOR CARRYING OUT THE INVENTION

First Embodiment Hereinafter, a first embodiment of a liquid processing apparatus and a liquid processing method according to the present invention will be described with reference to the drawings. Here, FIG. 1 to FIG. 3 are diagrams showing a first embodiment of the present invention.

  As shown in FIG. 1, the liquid processing apparatus includes a first processing fluid made of a gas such as nitrogen gas and a liquid made of pure water or the like on a target object such as a semiconductor wafer (hereinafter also simply referred to as a wafer). 2 The mixed fluid produced by mixing the processing fluid is supplied and processed. In the following description, the first processing fluid will be described using nitrogen gas as an example, and the second processing fluid will be described using pure water as an example.

  As shown in FIG. 1, the liquid processing apparatus includes a nitrogen gas supply source (first supply source) 52 that supplies nitrogen gas, a pure water supply source (second supply source) 53 that supplies pure water, and nitrogen gas. Nitrogen gas supply paths (first processing fluid supply paths) 62u and 62l that are connected to the supply source 52 and guide the nitrogen gas supplied from the nitrogen gas supply source 52, and the pure water supply source 53. A pure water supply path 63 (second processing fluid supply path) for guiding the pure water supplied from the pure water supply source 53. In FIG. 1, of the nitrogen gas supply paths 62u and 62l, the upstream side of the flow rate adjustment valve 10 is a nitrogen gas supply path 62u, and the downstream side of the flow rate adjustment valve 10 is a nitrogen gas supply path 62l.

  Further, as shown in FIG. 1, a cleaning liquid supply unit (fluid supply unit) 25 is connected to the nitrogen gas supply path 621 and the pure water supply path 63. The cleaning liquid supply unit 25 mixes the nitrogen gas guided by the nitrogen gas supply path 621 and the pure water guided by the pure water supply path 63 to generate a mixed fluid, and the mixing unit 26. And a discharge port 27 for supplying the mixed fluid generated in the mixing unit 26 to the object to be processed.

  As shown in FIG. 1, a nitrogen gas on / off valve 20 is provided in the nitrogen gas supply path 62u. Further, a nitrogen gas pressure adjusting valve 22 for adjusting the pressure with respect to the nitrogen gas supplied from the nitrogen gas supply source 52 is provided between the nitrogen gas supply source 52 and the nitrogen gas on-off valve 20 in the nitrogen gas supply path 62u. A nitrogen gas flow meter 23 for measuring the flow rate of nitrogen gas flowing in the nitrogen gas supply path 62u is provided downstream of the nitrogen gas pressure adjusting valve 22.

  As shown in FIG. 1, an air supply unit 54 is connected to the nitrogen gas on-off valve 20 through air supply paths 64 and 64a. The air from the air supply unit 54 flows into the nitrogen gas on / off valve 20, and the open / closed state of the nitrogen gas on / off valve 20 is controlled by the force applied from the air.

  As shown in FIG. 1, the air supply path 64 is provided with an air pressure adjustment valve 42 that adjusts the pressure applied to the air supplied from the air supply unit 54, and an air pressure adjustment valve 42 is provided downstream of the air pressure adjustment valve 42. An air switching valve 41 that controls supply / stop (on / off) of the air is provided.

  Further, as shown in FIG. 1, the pure water supply path 63 is provided with a pure water flow meter 33 for measuring the flow rate of pure water flowing through the pure water supply path 63, and downstream of the pure water flow meter 33. On the side, a pure water on-off valve 30 is provided. And the air from the air supply part 54 flows in into the pure water on-off valve 30 via the air supply path 64b, and the opening / closing state of the pure water on-off valve 30 is controlled by the force applied from this air. It has become.

  Further, as shown in FIG. 1, a valve driving fluid supply unit 51 that supplies a valve driving fluid made of a gas such as air is provided downstream of the nitrogen gas on / off valve 20 in the nitrogen gas supply paths 62u and 62l. A flow rate adjusting valve 10 connected through a valve driving fluid supply path 61 is provided. In addition, below, it demonstrates using the air mentioned as the example as a valve drive fluid.

  As shown in FIG. 2, the flow rate adjusting valve 10 has an air supply port (valve driving fluid supply port) 71 through which air is guided by a valve driving fluid supply passage 61 and a nitrogen gas supply passage 62u. A guided nitrogen gas inlet (processing fluid inlet) 72, a reciprocating valve part 75 disposed between the air supply port 71 and the nitrogen gas inlet 72, and a nitrogen gas supply path 62l. And a nitrogen gas outlet (fluid outlet for processing) 73 that flows into the outlet.

  The flow rate adjusting valve 10 is adjusted in its opening / closing speed by the cooperation of air and nitrogen gas (see FIG. 2). That is, a pressing force by air guided by the air supply port 71 is applied to the upper portion of the valve portion 75, and a pressing force by nitrogen gas guided by the nitrogen gas inlet 72 is applied to the lower portion of the valve portion 75. Then, the opening / closing speed of the valve portion 75 is adjusted by the balance between the pressing force by the air applied to the upper portion of the valve portion 75 and the pressing force by the nitrogen gas applied to the lower portion of the valve portion 75.

  Further, as shown in FIG. 1, in the nitrogen gas supply path 62 l, a buffer portion 15 having a hollow inside is provided on the downstream side of the flow rate adjustment valve 10 and the upstream side of the cleaning liquid supply portion 25. Yes. A filter 45 is provided on the downstream side of the buffer portion 15.

  Further, as shown in FIG. 1, the valve driving fluid supply passage 61 is provided with an air pressure adjusting valve (pressure adjusting unit) 12 for adjusting the pressure with respect to the air supplied from the valve driving fluid supply unit 51. A valve drive fluid switching valve 11 for controlling supply / stop (on / off) of air is provided downstream of the air pressure adjustment valve.

  Next, the operation of the present embodiment having such a configuration will be described.

Regarding the nitrogen gas (first processing fluid), first, a process until the nitrogen gas flows into the mixing unit 26 of the cleaning liquid supply unit 25 will be described.

  First, nitrogen gas is supplied from the nitrogen gas supply source 52 (first processing fluid supply step) (see FIG. 1). The nitrogen gas is guided by the nitrogen gas supply paths 62u and 62l (first processing fluid guiding step) (see FIG. 1). The following steps are performed while nitrogen gas is being guided by the nitrogen gas supply paths 62u and 62l.

  The nitrogen gas supplied from the nitrogen gas supply source 52 sequentially passes through the nitrogen gas pressure adjustment valve 22 and the nitrogen gas flow meter 23 (see FIG. 1).

  Next, the nitrogen gas reaches the nitrogen gas on-off valve 20 (see FIG. 1). The open / close state of the nitrogen gas on / off valve 20 is adjusted by the force applied by the air supplied from the air supply unit 54.

  Next, the nitrogen gas reaches the flow rate adjustment valve 10 and flows in from the nitrogen gas inlet 72 of the flow rate adjustment valve 10 (see FIG. 2). At this time, air supplied from the valve driving fluid supply unit 51 flows in from the air supply port 71, and a pressing force by the air supplied from the air supply port 71 is applied to the upper portion of the valve unit 75 (FIG. 2). reference).

  Thus, since nitrogen gas flows in from the lower part of the valve part 75 in the state which the pressing force by the air was added to the upper part of the valve part 75, air and nitrogen gas cooperate and the flow regulating valve 10 The opening / closing speed is adjusted (flow rate adjusting step), and it is possible to prevent nitrogen gas from flowing out of the nitrogen gas outlet 73 with sudden momentum (see FIG. 2).

  That is, according to the present embodiment, when the nitrogen gas on-off valve is opened, nitrogen gas may be suddenly supplied to the cleaning liquid supply unit when the nitrogen gas on-off valve is opened. A valve 10 is provided, and nitrogen gas is introduced from below the valve portion 75 of the flow rate adjusting valve 10 in a state where a pressing force by air is applied to the upper portion of the valve portion 75 of the flow rate adjusting valve 10 (see FIG. 2). . For this reason, even if the nitrogen gas flows into the flow rate adjusting valve 10 with a sudden momentum when the nitrogen gas on-off valve 20 is opened, the flow rate adjusting valve 10 can be opened slowly and suddenly. It is possible to prevent the nitrogen gas from being supplied to the cleaning liquid supply unit 25 at a rapid pace.

  Here, as shown in FIG. 1, the valve driving fluid supply passage 61 is provided with an air pressure adjusting valve 12 that adjusts the pressure applied to the air supplied from the valve driving fluid supply unit 51. For this reason, the pressing force by the air applied to the upper part of the valve part 75 can be adjusted appropriately, and it can prevent more reliably that nitrogen gas is supplied to the washing | cleaning liquid supply part 25 with sudden force.

  The nitrogen gas having passed through the flow rate adjusting valve 10 as described above can be further prevented from flowing into the buffer portion 15 having a hollow inside and being supplied to the cleaning liquid supply portion 25 with a sudden momentum.

  After passing through the filter 45, the nitrogen gas that has passed through the buffer unit 15 flows into the mixing unit 26 of the cleaning liquid supply unit 25 that is to process the wafer (see FIG. 1).

Next, with respect to pure water (second processing fluid), a process until pure water flows into the mixing unit 26 of the cleaning liquid supply unit 25 will be described.

  First, pure water is supplied from the pure water supply source 53 (second processing fluid supply step) (see FIG. 1). And this pure water is guided by the pure water supply path 63 (2nd process fluid guide process) (refer FIG. 1). The following steps are performed while pure water is being guided by the pure water supply path 63.

  The pure water supplied from the pure water supply source 53 passes through a pure water flow meter 33 that measures the flow rate of pure water flowing in the pure water supply path 63 (see FIG. 1). Thereafter, the pure water reaches the pure water on-off valve 30. The open / close state of the pure water on / off valve 30 is adjusted by the force applied by the air supplied from the air supply unit 54.

  Next, the pure water flows into the mixing unit 26 of the cleaning liquid supply unit 25 for processing the wafer (see FIG. 1). The cleaning liquid supply unit 25 is the same as the cleaning liquid supply unit 25 to which nitrogen gas is supplied.

As described above with respect to the supply of the mixed fluid , when nitrogen gas and pure water flow into the mixing unit 26 of the predetermined cleaning liquid supply unit 25, the nitrogen gas and pure water are mixed in the mixing unit 26. A mixed fluid is generated (mixing step) (see FIG. 1). Thereafter, the mixed fluid generated in the mixing unit 26 is ejected to the object to be processed through the discharge port 27 (processing step) (see FIG. 1).

  As described above, according to the present embodiment, the flow rate adjusting valve 10 can prevent the nitrogen gas from being supplied to the cleaning liquid supply unit 25 at a sudden moment when the supply is started. Furthermore, the particle size of the mixed fluid can be made uniform when the mixed fluid is ejected to the wafer through the discharge port 27 in this way.

  Further, as described above, it is possible to more reliably prevent nitrogen gas from being suddenly supplied to the cleaning liquid supply unit 25 by the buffer unit 15. Furthermore, the particle size of the mixed fluid ejected to the wafer can be made more uniform.

  Further, according to the present embodiment, the flow rate of the nitrogen gas supplied to the cleaning liquid supply unit 25 can be adjusted only by providing one inexpensive flow rate adjustment valve 10 as compared with the mass flow controller (nitrogen gas). Can be prevented from being supplied suddenly) (see FIG. 1). For this reason, unlike the prior art disclosed in Japanese Patent Application Laid-Open No. 2005-327833, it is not necessary to provide a mass flow controller in each cleaning liquid supply unit, and the above-described effects can be realized at low cost.

  By the way, although the arrangement | positioning aspect of the buffer part 15 was not mentioned above, as shown in FIG. 3, you may arrange | position so that the inflow port 15a may orthogonally cross in the direction where 62 l of nitrogen gas supply paths are extended ( In addition, the arrow shown in FIG. 3 has shown the direction through which nitrogen gas flows. Thus, by arranging the inlet 15a of the buffer portion 15, the nitrogen gas flowing through the nitrogen gas supply path 62l is more likely to flow into the buffer portion 15.

  For this reason, it is possible to further reliably prevent the nitrogen gas from being suddenly supplied to the cleaning liquid supply unit 25 at the start of supply, and more reliably to reduce the particle size of the mixed fluid ejected to the wafer. It can be made uniform.

Second Embodiment Next, a second embodiment of the present invention will be described with reference to FIG. In the second embodiment shown in FIG. 4, pure water connected to a pure water supply source (supply source) 53 is supplied with a pressurized cleaning liquid from the cleaning liquid supply unit 25 (pure water in this embodiment). The flow rate adjusting valve 10 is provided in the supply paths 63u and 63l. And in this Embodiment, the structure of the member arrange | positioned between the fluid supply part 51 for valve drive and the flow regulating valve 10, and the member arrange | positioned between the air supply part 54 and the flow regulating valve 10 The configuration is substantially the same as that of the first embodiment. In FIG. 4, of the pure water supply paths 63u and 63l, the upstream side of the flow rate adjustment valve 10 is a pure water supply path 63u, and the downstream side of the flow rate adjustment valve 10 is a pure water supply path 63l.

  In the second embodiment shown in FIG. 4, the same parts as those in the first embodiment shown in FIGS. 1 to 3 are denoted by the same reference numerals, and detailed description thereof is omitted.

  As shown in FIG. 4, in the present embodiment, the flow rate adjusting valve 10 is provided in the pure water supply paths 63 u and 63 l, and the flow rate of pure water supplied to the cleaning liquid supply unit 25 by the flow rate adjusting valve 10 is set. It can be adjusted, and the same effect as in the first embodiment can be obtained.

  That is, according to the present embodiment, pure water flows from below the valve portion 75 in a state in which a pressing force by air is applied to the upper portion of the valve portion 75, so that the air and pure water cooperate. Thus, the opening / closing speed of the flow rate adjusting valve 10 is adjusted (flow rate adjusting step), and it is possible to prevent the pure water from flowing out of the pure water outlet (processing fluid outlet) 73 suddenly (FIG. 2). reference).

  That is, according to the present embodiment, the pure water may be suddenly supplied to the cleaning liquid supply unit when the pure water on-off valve is opened. The valve 10 is provided, and pure water flows in from below the valve portion 75 of the flow rate adjusting valve 10 with a pressing force applied by air applied to the upper portion of the valve portion 75 of the flow rate adjusting valve 10 (see FIG. 2). . For this reason, even when pure water flows into the flow rate adjusting valve 10 with a sudden momentum when the pure water on-off valve 30 is opened, the flow rate adjusting valve 10 can be opened slowly, and suddenly It is possible to prevent the pure water from being supplied to the cleaning liquid supply unit 25 at a rapid pace. Further, in the mass flow controller used in the conventional technique, only the gas flow rate can be controlled, but when the flow rate adjustment valve 10 as in the present embodiment is used, the liquid flow rate is controlled. You can also.

  Further, the pure water that has passed through the flow rate adjusting valve 10 flows into the buffer portion 15 having a hollow inside, and the flow rate of pure water at the start of supply is further slowed (see FIG. 4). For this reason, even when the flow rate of pure water at the start of supply cannot be sufficiently slowed by the flow rate adjusting valve 10, it can be slowed down in the buffer unit 15, and the cleaning liquid supply unit 25 suddenly It can prevent more reliably that pure water is supplied with momentum.

  As described above, since it is possible to prevent the pure water from being supplied to the cleaning liquid supply unit 25 suddenly by the flow rate adjusting valve 10 and the buffer unit 15, it is possible to prevent the pure water from being excessively driven in the processing step. Can be prevented. For this reason, it is possible to prevent the wafer from being adversely affected by the excessive momentum of pure water.

  Also according to the present embodiment, the flow rate of pure water supplied to the cleaning liquid supply unit 25 can be adjusted by providing only one inexpensive flow rate adjustment valve 10 as compared with the mass flow controller (pure water). It is possible to prevent water from being supplied suddenly (see FIG. 4). For this reason, the above-described effects can be realized at low cost.

Claims (13)

In a liquid processing apparatus for processing an object to be processed,
A supply source for supplying the processing fluid;
A processing fluid supply path coupled to the supply source for guiding the processing fluid supplied from the supply source;
A discharge port connected to the processing fluid supply path and supplying the processing fluid guided by the processing fluid supply path to the object to be processed;
An on-off valve provided in the processing fluid supply path;
A flow rate adjustment valve provided on the downstream side of the on-off valve,
The flow rate adjusting valve is connected to a valve driving fluid supply unit that supplies a valve driving fluid, and an opening / closing speed thereof is adjusted by a balance between a pressing force by the valve driving fluid and a pressing force by the processing fluid. A liquid processing apparatus.   2. The liquid processing apparatus according to claim 1, wherein a buffer unit is provided between the flow rate adjusting valve and the discharge port to slow down the flow rate of the processing fluid when supply is started.   The flow rate adjusting valve includes a valve driving fluid supply port to which a valve driving fluid is supplied from the valve driving fluid supply unit, and a processing fluid inlet to which the processing fluid is guided from the processing fluid supply path. And a reciprocating valve portion disposed between the valve driving fluid supply port and the processing fluid inflow port. A valve drive fluid supply path for guiding the valve drive fluid is provided between the valve drive fluid supply section and the flow rate adjusting valve,
The liquid processing apparatus according to claim 1, wherein a pressure adjusting unit that adjusts a pressure of the valve driving fluid is provided in the valve driving fluid supply path. In a liquid processing apparatus for processing an object to be processed,
A first supply source for supplying a first processing fluid;
A second supply source for supplying a second processing fluid;
A first processing fluid supply path coupled to the first supply source for guiding a first processing fluid supplied from the first supply source;
A second processing fluid supply path connected to the second supply source and guiding a second processing fluid supplied from the second supply source;
The first processing fluid is connected to the first processing fluid supply path and the second processing fluid supply path, and is guided by the first processing fluid supply path, and is guided by the second processing fluid supply path. A mixing unit that mixes the second processing fluid and generates a mixed fluid;
A discharge port connected to the mixing unit and supplying the mixed fluid generated in the mixing unit to the object to be processed;
An on-off valve provided in the first processing fluid supply path and the second processing fluid supply path;
A flow rate adjustment valve provided on the downstream side of the on-off valve of the first processing fluid supply path,
The flow rate adjusting valve is connected to a valve driving fluid supply unit that supplies a valve driving fluid, and an opening / closing speed thereof is adjusted by a balance between a pressing force by the valve driving fluid and a pressing force by the first processing fluid. A liquid processing apparatus. The first processing fluid supplied from the first supply source comprises a gas,
The liquid processing apparatus according to claim 5, wherein the second processing fluid supplied from the second supply source is a liquid. The first processing fluid supplied from the first supply source comprises a liquid,
The liquid processing apparatus according to claim 5, wherein the second processing fluid supplied from the second supply source is made of a gas.   The liquid processing apparatus according to claim 5, wherein the valve driving fluid supplied from the valve driving fluid supply unit is made of a gas.   The liquid processing apparatus according to claim 5, wherein a buffer unit is provided between the flow rate adjusting valve and the discharge port to slow down the flow rate of the processing fluid when supply is started. A supply source for supplying a processing fluid, a processing fluid supply path connected to the supply source, a discharge port connected to the processing fluid supply path, and an on-off valve provided in the processing fluid supply path And a flow rate adjusting valve that is provided on the downstream side of the on-off valve and is connected to a valve driving fluid supply unit that supplies a valve driving fluid, and a liquid processing method using a liquid processing apparatus,
A processing fluid is supplied by the source;
The processing fluid supplied from the supply source is guided by the processing fluid supply path;
By the balance between the pressing force of the pressing force and the processing fluid by the valve driving fluid within the flow control valve, and the opening and closing speed of the flow regulating valve is adjusted,
The processing fluid guided by the processing fluid supply path is supplied to the object to be processed by the discharge port;
A liquid treatment method comprising:   The liquid processing method according to claim 10, wherein the flow rate of the processing fluid is slowed by a buffer provided between the flow rate adjusting valve and the discharge port. A first supply source for supplying a first processing fluid; a second supply source for supplying a second processing fluid; a first processing fluid supply path connected to the first supply source; and the second supply. A second processing fluid supply path connected to a source, a mixing section connected to the first processing fluid supply path and the second processing fluid supply path, and a discharge port connected to the mixing section; On-off valves provided in the first processing fluid supply path and the second processing fluid supply path, provided on the downstream side of the on-off valve in the first processing fluid supply path, and a valve driving fluid A liquid processing method using a liquid processing apparatus having a flow rate adjustment valve connected to a fluid supply section for supplying valve driving,
A first processing fluid is supplied by the first supply source;
A second processing fluid is supplied by the second supply source;
The first processing fluid supplied from the first supply source is guided by the first processing fluid supply path;
The second processing fluid supplied from the second supply source is guided by the second processing fluid supply path;
By the balance between the pressing force by the pressing force and the fluid for the first treatment with the valve driving fluid within the flow control valve, and the opening and closing speed of the flow regulating valve is adjusted,
In the mixing unit, the first processing fluid and the second processing fluid are mixed to generate a mixed fluid;
The mixed fluid generated in the mixing unit is supplied to the object to be processed;
A liquid treatment method comprising:   The liquid processing method according to claim 12, wherein the flow rate of the first processing fluid is slowed by a buffer provided between the flow rate adjusting valve and the discharge port.

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