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JP4839097B2 - Vacuum equipment - Google Patents
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JP4839097B2 - Vacuum equipment - Google Patents

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JP4839097B2
JP4839097B2 JP2006040428A JP2006040428A JP4839097B2 JP 4839097 B2 JP4839097 B2 JP 4839097B2 JP 2006040428 A JP2006040428 A JP 2006040428A JP 2006040428 A JP2006040428 A JP 2006040428A JP 4839097 B2 JP4839097 B2 JP 4839097B2
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processing chamber
chamber
preparation chamber
holder
processed
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JP2007217756A (en
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智広 山田
晴邦 古瀬
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Ulvac Inc
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Description

本発明は、真空中で被処理体に対し所望のプロセスの実施を可能とする真空装置、より詳しくは、真空中で所望のプロセスが実施される処理室と、大気環境で被処理体の搬入出が行われる真空排気可能な予備室とから構成した真空装置に関する。   The present invention relates to a vacuum apparatus that enables a desired process to be performed on an object to be processed in a vacuum, and more specifically, to a processing chamber in which a desired process is performed in a vacuum, and to carry the object to be processed in an atmospheric environment. The present invention relates to a vacuum apparatus including a preliminary chamber capable of being evacuated and discharged.

真空中でシリコンウェハ等の被処理体に対しPVD、CVDによる薄膜形成やエッチング等の所望のプロセスを実施できるように構成した従来の真空装置では、真空の処理室への被処理体の搬入若しくはプロセスが終了した被処理体の搬出のため、処理室に、真空排気手段を設けた準備室を連結して構成することが知られている。   In a conventional vacuum apparatus configured to perform a desired process such as thin film formation or etching by PVD or CVD on an object to be processed such as a silicon wafer in a vacuum, the object to be processed is carried into a vacuum processing chamber or In order to carry out the object to be processed after the process is completed, it is known that a preparation chamber provided with a vacuum exhaust means is connected to the processing chamber.

この真空装置では、処理室と準備室との間にゲートバルブ等の隔絶手段を介設して処理室及び準備室相互間を隔絶自在とすると共に、処理室、準備室の少なくとも一方に搬送手段を設けて準備室内の被処理体の搬入出位置と処理室内の被処理体に対するプロセス位置との間で被処理体を搬送自在としていた。   In this vacuum apparatus, an isolation means such as a gate valve is interposed between the processing chamber and the preparation chamber so that the processing chamber and the preparation chamber can be isolated from each other, and at least one of the processing chamber and the preparation chamber is conveyed The object to be processed is freely transportable between the loading / unloading position of the object to be processed in the preparation chamber and the process position with respect to the object to be processed in the processing chamber.

被処理体を処理室内のプロセス位置まで搬入する場合、処理室及び準備室相互間を隔絶したゲートバルブの閉位置で大気環境の準備室に一旦被処理体を搬入し、この準備室を密閉した後、真空排気して準備室の圧力が所定の真空度に達すると、ゲートバルブを開位置に移動させ、搬送手段によって既に真空排気している処理室に被処理体を搬入する。処理室のプロセス位置に被処理体が搬送されてくると、ゲートバルブを再度閉位置に移動させて処理室及び準備室相互間を隔絶した後、所望のプロセスが実施される。   When the object to be processed is carried to the process position in the processing chamber, the object to be processed is once loaded into the air environment preparation chamber at the closed position of the gate valve that isolates the processing chamber and the preparation chamber, and the preparation chamber is sealed. Then, when the pressure in the preparation chamber reaches a predetermined degree of vacuum by evacuating, the gate valve is moved to the open position, and the object to be processed is carried into the processing chamber that has already been evacuated by the transfer means. When the object to be processed is transferred to the process position of the processing chamber, the gate valve is moved again to the closed position to isolate the processing chamber from the preparation chamber, and then a desired process is performed.

他方、プロセスが終了した被処理体を搬出する場合、ゲートバルブを再度開位置に移動させた後、搬送手段によって被処理体を処理室から準備室内の搬入出位置に移動する。搬入出位置に被処理体が搬送されてくると、ゲートバルブを再度閉位置に移動させた後、準備室をベントして準備室を大気環境に戻し、被処理体が搬出される(例えば、特許文献1参照)。
特開平5−125536号公報(例えば、図5)
On the other hand, when unloading the object to be processed, the gate valve is moved again to the open position, and then the object is moved from the processing chamber to the loading / unloading position in the preparation chamber by the transfer means. When the object to be processed is transported to the loading / unloading position, after moving the gate valve to the closed position again, the preparation chamber is vented to return the preparation chamber to the atmospheric environment, and the object to be processed is unloaded (for example, Patent Document 1).
Japanese Patent Laid-Open No. 5-125536 (for example, FIG. 5)

しかしながら、上記のものでは、搬送手段とゲートバルブとを別個に設けているため、各々に真空シールを設けたエアーシリンダ等の駆動源とその作動を制御する制御手段とを設ける必要があり、部品点数が増えてコスト高を招くと共に、装置自体の構造が複雑になるという問題があった。   However, in the above, since the conveying means and the gate valve are provided separately, it is necessary to provide a driving source such as an air cylinder provided with a vacuum seal for each, and a control means for controlling the operation thereof. There is a problem that the number of points increases and the cost increases, and the structure of the device itself is complicated.

そこで、本発明の目的は、上記点に鑑み、簡単な構造で処理室と準備室とを相互に隔絶することができ、その上、低コストな真空装置を提供することにある。   In view of the above, an object of the present invention is to provide a vacuum apparatus that can separate a processing chamber and a preparation chamber from each other with a simple structure and that is low in cost.

上記課題を解決するために、本発明は、真空中で被処理体に対し所望のプロセスが実施される処理室と、大気環境で被処理体の搬入出が行われる真空排気可能な準備室と、処理室と準備室との間で被処理体の搬送を可能とする搬送手段とを備え、前記処理室と準備室とを相互に仕切る仕切手段を前記搬送手段に一体に設け、この搬送手段を処理室側に移動させると、前記仕切手段によって処理室と準備室とが相互に隔絶されるように構成した真空装置において、前記搬送手段は、被処理体を保持するホルダと、駆動手段と、この駆動手段に連結されてホルダを処理室内のプロセス位置及び準備室内の搬入出位置の間で直線上に往復動させる、当該往復動方向に長手の支持板とを備え、前記仕切手段を前記支持板に設けたことを特徴とする。 In order to solve the above problems, the present onset Ming, a processing chamber for a desired process is performed with respect to the workpiece in a vacuum, a vacuum evacuable preparation chamber loading and unloading of the workpiece is performed in the atmospheric environment And a conveying means that enables conveyance of the object to be processed between the processing chamber and the preparation chamber, and a partitioning means for partitioning the processing chamber and the preparation chamber from each other is provided integrally with the conveying means. In the vacuum apparatus configured such that when the means is moved to the processing chamber side, the processing chamber and the preparation chamber are isolated from each other by the partitioning means , the transfer means includes a holder for holding the object to be processed, and a drive And a support plate which is connected to the driving means and reciprocates linearly between a process position in the processing chamber and a loading / unloading position in the preparation chamber, and is long in the reciprocating direction. Is provided on the support plate .

本発明によれば、例えば搬送手段にセットされた被処理体を準備室から処理室に搬送する際に搬送手段を処理室側に移動させるだけで、仕切手段によって処理室と準備室とが相互に隔絶されるため、駆動源を有するゲートバルブ等の隔絶手段を別途設ける必要がなく、部品点数を少なくして低コストで製作でき、装置自体の構造を簡素化できる。   According to the present invention, for example, when the workpiece set in the transport means is transported from the preparation chamber to the processing chamber, the transport means is moved to the processing chamber side, and the processing chamber and the preparation chamber are mutually connected by the partitioning means. Therefore, it is not necessary to separately provide isolation means such as a gate valve having a drive source, the number of parts can be reduced, and the device can be manufactured at low cost, and the structure of the apparatus itself can be simplified.

前記準備室に、ホルダに対し被処理体の受け渡しを行う受渡手段を設けておけば、真空の処理室への被処理体の搬入若しくはプロセスが終了した被処理体の搬出の際に、この受渡手段で被処理体を一旦保持させると共に搬送手段を処理室側に移動させて処理室と準備室とを相互に隔絶することで、処理室を真空に保持した状態で準備室のみを大気環境に戻して被処理体を搬入出できる。   If a delivery means for delivering the object to be processed to the holder is provided in the preparation chamber, this delivery is performed when the object to be processed is transferred into the vacuum processing chamber or when the object to be processed is completed. By temporarily holding the object to be processed by the means and moving the conveying means to the processing chamber side to isolate the processing chamber and the preparation chamber from each other, only the preparation chamber is brought into the atmospheric environment while the processing chamber is held in vacuum. The object to be processed can be loaded and unloaded.

前記駆動手段は、駆動源に接続されたねじ山付きスピンドルと、このスピンドルの一端に連結されホルダを支持する支持板とを有し、このスピンドル、支持板の往復動方向に沿った少なくとも2箇所に、往復動方向と交差する両方向からスピンドル、支持板に押圧力を加える規制手段を設けたものとすれば、支持板、スピンドルの振れや撓みの影響を受けず、プロセス位置及び搬入出位置でホルダを正確に位置決めできる。   The drive means has a threaded spindle connected to a drive source and a support plate connected to one end of the spindle to support the holder, and at least two locations along the reciprocating direction of the spindle and support plate In addition, if there is a restricting means that applies a pressing force to the spindle and support plate from both directions crossing the reciprocating direction, it will not be affected by the swing or deflection of the support plate and spindle, and at the process position and loading / unloading position. The holder can be accurately positioned.

また、前記搬送手段に他の仕切手段をさらに設け、この搬送手段を準備室側に移動させると、他の仕切手段によって処理室と準備室とが相互に隔絶されるように構成しておけば、処理室を真空に保持した状態で、処理室への被処理体の搬入からプロセスが終了した被処理体の搬出までを搬送手段の一回の往復動によって行うことができ、処理時間を短縮できる。



In addition, if the transfer means is further provided with other partitioning means, and the transfer means is moved to the preparation chamber side, the processing chamber and the preparation chamber are separated from each other by the other partitioning means. In a state where the processing chamber is kept in a vacuum state, from the loading of the object to be processed into the processing chamber to the unloading of the object to be processed can be performed by a single reciprocation of the conveying means, thereby shortening the processing time. it can.



以上説明したように、本発明の真空装置は、簡単な構造で処理室と準備室とを隔絶することができ、その上、部品点数を少なくして低コストで製作できるという効果を奏する。   As described above, the vacuum apparatus of the present invention can isolate the processing chamber and the preparation chamber with a simple structure, and also has an effect that the number of parts can be reduced and can be manufactured at low cost.

上記課題を解決するために、本発明は、真空中で被処理体に対し所望のプロセスが実施される処理室と、大気環境で被処理体の搬入出が行われる真空排気可能な準備室と、処理室と準備室との間で被処理体の搬送を可能とする搬送手段とを備え、前記処理室と準備室とを相互に仕切る仕切手段を前記搬送手段に一体に設け、この搬送手段を処理室側に移動させると、前記仕切手段によって処理室と準備室とが相互に隔絶されるように構成した真空装置において、前記搬送手段は、被処理体を保持するホルダと、このホルダを、処理室内のプロセス位置及び準備室内の搬入出位置の間で直線上に往復動させる駆動手段とを備え前記駆動手段は、駆動源を有するスピンドルと、このスピンドルの一端に連結された前記ホルダを支持する支持板とを有し、このスピンドル、支持板の往復動方向に沿った少なくとも2箇所に、往復動方向と交差する両方向からスピンドル、支持板に押圧力を加える規制手段を設けたことを特徴とする。




In order to solve the above-described problems, the present invention provides a processing chamber in which a desired process is performed on a target object in a vacuum, and a preparation chamber capable of being evacuated in which the target object is carried in and out in an atmospheric environment. A transfer means that enables transfer of the object to be processed between the processing chamber and the preparation chamber, and a partition means for partitioning the processing chamber and the preparation chamber from each other is provided integrally with the transfer means. moving the processing chamber side, the in a vacuum device configured as a processing chamber and the preparatory chamber is isolated from each other by a partition means, said conveying means comprises a holder for holding the object to be processed, this holder and a driving means for reciprocating in a straight line between the loading and unloading position in the process position and preparation chamber of processing chamber, said driving means includes a spindle having a driving source, which is connected to one end of the spindle A support plate for supporting the holder; A, the spindle, the at least two locations along the reciprocating direction of the support plate and from both directions intersecting the reciprocating direction the spindle, characterized in that a regulating means for applying a pressing force to the supporting plate.




処理室21内には、PVD、CVDによる薄膜形成やエッチング等、この処理室21内で実施する所望のプロセスに応じて、公知構造を有する抵抗加熱式の蒸発源、スパッタリングカソード、被処理体加熱手段、ガス導入手段やプラズマ発生装置などが所定位置に適宜設けられる。準備室31の上面には、例えばスライド式の開閉扉(図示せず)が設けられ、準備室31に被処理体を搬入出する際に開閉できるようになっている。   In the processing chamber 21, a resistance heating type evaporation source having a known structure, a sputtering cathode, heating of an object to be processed according to a desired process to be performed in the processing chamber 21 such as thin film formation or etching by PVD or CVD. Means, gas introduction means, plasma generator and the like are appropriately provided at predetermined positions. For example, a slide-type opening / closing door (not shown) is provided on the upper surface of the preparation chamber 31 so that the object can be opened and closed when the object to be processed is carried into and out of the preparation chamber 31.

第1及び第2の各真空チャンバ2、3には、クライオポンプ、ターボ分子ポンプやロータリーポンプなどから構成された真空排気システム5が接続され、処理室21及び準備室31をそれぞれ独立に、または同時に所定の真空度(例えば、10×10−6Pa)まで真空排気できる。処理室21の準備室31と背向する側面には搬送手段6が設けられている。 Each of the first and second vacuum chambers 2 and 3 is connected to an evacuation system 5 composed of a cryopump, a turbo molecular pump, a rotary pump, or the like, and each of the processing chamber 21 and the preparation chamber 31 is independent or At the same time, it can be evacuated to a predetermined degree of vacuum (for example, 10 × 10 −6 Pa). Conveying means 6 is provided on the side of the processing chamber 21 that faces away from the preparation chamber 31.

図2及び図3に示すように、搬送手段6は、ガラス基板やシリコンウェハーなどの被処理体を保持するホルダ61と、処理室21内で所望のプロセスが実施されるプロセス位置及び準備室31内で被処理体の搬入出が行われる搬入出位置の間でホルダ61を移動自在とする駆動手段とから構成されている。   As shown in FIGS. 2 and 3, the transport unit 6 includes a holder 61 that holds a target object such as a glass substrate or a silicon wafer, a process position in which a desired process is performed in the processing chamber 21, and a preparation chamber 31. It is comprised from the drive means which makes the holder 61 movable between the carrying in / out positions in which a to-be-processed object is carried in.

例えば被処理体が半導体製造に用いられる略円形のシリコンウェハである場合、ホルダ61は、シリコンウェハの外形に略一致し、所定の高さ寸法を有する枠体61aから構成され、板状の支持板62上面に取付られている。これにより、被処理体を上方から落とし込むだけで、ホルダ61の所定位置にセットされて保持される。   For example, when the object to be processed is a substantially circular silicon wafer used for semiconductor manufacturing, the holder 61 is constituted by a frame body 61a that substantially matches the outer shape of the silicon wafer and has a predetermined height, and has a plate-like support. It is attached to the upper surface of the plate 62. As a result, it is set and held at a predetermined position of the holder 61 simply by dropping the object to be processed from above.

また、支持板62の一端は、ねじ山付きのスピンドル63の一端に連結されている。スピンドル63は、ホルダ61をプロセス位置と搬入出位置との間で移動するのに必要な長さに定寸され、モータ(駆動源)64aに接続されたウォーム64bと外接するウォームホイール64cの内歯と噛み合っている。この場合、ホルダ61を支持する支持板62、スピンドル63、モータ64aを有するウォーム64b及びウォームホイール64cが駆動手段を構成する。   One end of the support plate 62 is connected to one end of a spindle 63 with a thread. The spindle 63 is sized to have a length necessary for moving the holder 61 between the process position and the loading / unloading position, and is arranged inside a worm wheel 64c that circumscribes a worm 64b connected to a motor (drive source) 64a. It meshes with teeth. In this case, the support plate 62 that supports the holder 61, the spindle 63, the worm 64b having the motor 64a, and the worm wheel 64c constitute drive means.

本実施の形態では、駆動手段62、63、64a、64b、64cは、支持板62を除き、第1のチャンバ2に連結された真空排気可能な第3のチャンバ60内に収納され、駆動手段62、63、64a、64b、64cの待機状態(処理室側に位置する状態)で、支持板62で支持されたホルダ61が処理室21内のプロセス位置に存するように設置されている。   In the present embodiment, the driving means 62, 63, 64a, 64b, 64c are housed in a third chamber 60 connected to the first chamber 2 and capable of being evacuated, except for the support plate 62, and the driving means. The holder 61 supported by the support plate 62 is placed at the process position in the processing chamber 21 in the standby state of 62, 63, 64a, 64b, 64c (a state positioned on the processing chamber side).

そして、モータ64aをいずれか一方に回転させると、ウォームホイル64cを介してスピンドル63が準備室31側に向かって水平移動し、これに伴って、スピンドル63に連結された支持板62が移動し、隔壁4に形成した開口41を通ってホルダ61が準備室31内の搬入出位置まで移動する。次いで、モータ64aを逆回転させると、スピンドル63が逆方向に水平移動してホルダ61が処理室21内でプロセス位置に移動する。これにより、ホルダ61をプロセス位置と搬入出位置との間で往復動させることが可能になる。   When the motor 64a is rotated in either direction, the spindle 63 moves horizontally toward the preparation chamber 31 via the worm wheel 64c, and the support plate 62 connected to the spindle 63 moves accordingly. The holder 61 moves to the loading / unloading position in the preparation chamber 31 through the opening 41 formed in the partition wall 4. Next, when the motor 64 a is rotated in the reverse direction, the spindle 63 moves horizontally in the reverse direction, and the holder 61 moves to the process position in the processing chamber 21. Thereby, the holder 61 can be reciprocated between the process position and the carry-in / out position.

上記のように駆動手段62、63、64a、64b、64cを構成した場合、長尺の支持板62及びスピンドル63を水平移動させるときホルダ61を支持する支持板62、スピンドル63の振れや撓みの影響を受けて、ホルダ61をプロセス位置及び搬入出位置で正確に位置決めできない虞がある。このため、スピンドル63を面取り加工して、支持板62の上面及び下面と同一水平面上に位置する平坦な上面63a及び下面63bをその長手方向に沿って形成すると共に、支持板62及びスピンドル63の往復動方向に沿った少なくとも2箇所に、支持板62、スピンドル63を上下方向から押圧力を加えて支持板62、スピンドル63の振れや撓みを規制する規制手段7を設けた。   When the drive means 62, 63, 64a, 64b, and 64c are configured as described above, when the long support plate 62 and the spindle 63 are moved horizontally, the swinging and bending of the support plate 62 and the spindle 63 that support the holder 61 are prevented. Under the influence, the holder 61 may not be accurately positioned at the process position and the loading / unloading position. Therefore, the spindle 63 is chamfered to form a flat upper surface 63a and a lower surface 63b that are located on the same horizontal plane as the upper and lower surfaces of the support plate 62 along the longitudinal direction thereof. At least two places along the reciprocating direction were provided with restricting means 7 for applying a pressing force to the support plate 62 and the spindle 63 from above and below to restrict the deflection and deflection of the support plate 62 and the spindle 63.

規制手段7は、支持板62、スピンドル63の上面63a及び下面63bと面接触するガイドローラ71と、このガイドローラ71の回転軸71aを回転自在に支持するフレーム72とから構成されている。フレーム72は、第1及び第3の各チャンバ2、60の壁面にシール手段を介して取付けたアジャストボルト73の一端に連結され、アジャストボルト73を介して支持板62、スピンドル63へのガイドローラ71の押圧力を変化できるようになっている。これにより、モータ64aを回転させて支持板62、スピンドル63を往復動させる際、規制手段7によって支持板62及びスピンドル63の振れや撓みを規制することで、ホルダ61を、プロセス位置と搬入出位置との間で同一線上を常時往復動させることができる。   The restricting means 7 includes a support plate 62, a guide roller 71 in surface contact with the upper surface 63a and the lower surface 63b of the spindle 63, and a frame 72 that rotatably supports the rotation shaft 71a of the guide roller 71. The frame 72 is connected to one end of an adjusting bolt 73 attached to the wall surface of each of the first and third chambers 2 and 60 via a sealing means, and the guide roller to the support plate 62 and the spindle 63 via the adjusting bolt 73. The pressing force of 71 can be changed. As a result, when the motor 64a is rotated to reciprocate the support plate 62 and the spindle 63, the holder 61 can be brought into and out of the process position by restricting the swinging and bending of the support plate 62 and the spindle 63 by the restricting means 7. It can always reciprocate on the same line with the position.

また、処理室21と準備室31とを相互に隔絶するため、支持板62の他端に、所定の厚さを有する仕切手段である仕切板8を設けている。仕切板8は、隔壁4に設けた開口41の外形より若干大きい形状を有し、仕切板8の処理室21側の側面には、その外周に沿ってOリング81が設けられている。そして、駆動手段62、63、64a、64b、64cを作動させてホルダ61を搬入出位置からプロセス位置に移動させたとき、仕切板8の側面に設けたOリング81が、開口41の周囲を囲繞するようにその全周に亘って隔壁4に当接することで、処理室21と準備室31とが相互に隔絶される。   Further, in order to isolate the processing chamber 21 and the preparation chamber 31 from each other, a partition plate 8 which is a partition means having a predetermined thickness is provided at the other end of the support plate 62. The partition plate 8 has a shape slightly larger than the outer shape of the opening 41 provided in the partition wall 4, and an O-ring 81 is provided along the outer periphery of the side surface of the partition plate 8 on the processing chamber 21 side. When the driving means 62, 63, 64a, 64b, 64c are operated to move the holder 61 from the loading / unloading position to the process position, the O-ring 81 provided on the side surface of the partition plate 8 moves around the opening 41. The processing chamber 21 and the preparation chamber 31 are isolated from each other by abutting against the partition 4 over the entire circumference so as to surround.

これにより、処理室21と準備室31とを隔絶するゲートバルブ等の隔絶手段を別途設ける必要がないため、部品点数が少なくして低コストで製作でき、装置自体の構造を簡素化できる。また、駆動手段62、63、64a、64b、64cを作動させてホルダ61を搬入出位置からプロセス位置に移動させたとき、仕切板8の側面が隔壁4に面接触して処理室21側への移動が制限されることと、ホルダ61が同一線上を常時往復動することとが相俟って、ホルダ61を、ひいては被処理体をプロセス位置と搬入出位置とで正確に位置決できる。   Thereby, it is not necessary to separately provide a separating means such as a gate valve that separates the processing chamber 21 and the preparation chamber 31, so that the number of parts can be reduced and the device can be manufactured at a low cost, and the structure of the apparatus itself can be simplified. Further, when the drive means 62, 63, 64a, 64b, 64c are operated to move the holder 61 from the loading / unloading position to the process position, the side surface of the partition plate 8 comes into surface contact with the partition wall 4 toward the processing chamber 21 side. In combination with the fact that the movement of the holder 61 is always reciprocated on the same line, the holder 61 and thus the object to be processed can be accurately positioned at the process position and the loading / unloading position.

さらに、真空の処理室21への被処理体の搬入若しくはプロセスが終了した被処理体の搬出の際に、処理室21を真空に保持した状態で準備室31のみを大気環境にして被処理体の搬入出ができるように、準備室31に、この準備室31内でホルダ61の上方で被処理体を一旦保持する受渡手段(図示せず)を設けている。   Furthermore, when the object to be processed is carried into the vacuum processing chamber 21 or the object to be processed after the process is completed, only the preparation chamber 31 is brought into the atmospheric environment while the processing chamber 21 is kept in a vacuum state. The preparation chamber 31 is provided with delivery means (not shown) for temporarily holding the object to be processed above the holder 61 in the preparation chamber 31.

受渡手段は、例えば少なくとも2本のリフトピン及び舌片から構成される。この場合、各リフトピンは、ホルダ61の搬入出位置の下方に配置され、エアーシリンダ等の駆動源によって昇降自在である。そして、各リフトピンの上端がホルダ61の下方に位置する下降位置から、駆動源を介して上昇位置に移動させると、枠体61aと支持板62との間の間隙を通って被処理体の下面に当接し、枠体61aより高い位置に被処理体を持ち上げて担持する。   The delivery means is composed of at least two lift pins and a tongue piece, for example. In this case, each lift pin is disposed below the loading / unloading position of the holder 61 and can be raised and lowered by a driving source such as an air cylinder. When the upper end of each lift pin is moved from the lowered position below the holder 61 to the raised position via the drive source, the lower surface of the object to be processed passes through the gap between the frame body 61a and the support plate 62. The object to be processed is lifted and carried at a position higher than the frame body 61a.

他方、各舌片は、ホルダ61の搬入出位置の上方に配置され、エアーシリンダ等の駆動源によって支持板62の往復動方向に沿って平行移動自在である。そして、被処理体から離間した待機位置から、駆動源を介して支持位置に移動させると、各リフトピンで担持された被処理体の下側を通ってその先端が突出し、この状態で各リフトピンを下降位置に移動させると、各舌片上に被処理体が載置される。   On the other hand, each tongue piece is disposed above the loading / unloading position of the holder 61 and can be translated in the reciprocating direction of the support plate 62 by a driving source such as an air cylinder. Then, when moving from the standby position separated from the object to be processed to the support position via the driving source, the tip protrudes through the lower side of the object to be processed supported by each lift pin, and in this state, each lift pin is When moved to the lowered position, the object to be processed is placed on each tongue piece.

次に、本発明の真空装置1の作動を説明する。先ず、仕切板8によって、処理室21及び準備室31相互間を隔絶した待機状態で真空排気システム5を作動させて処理室21を所定の真空度まで真空排気する。それと同時に、大気環境の準備室において、駆動源を作動させて受渡手段の各舌片を支持位置に移動させると共に準備室31の上面の開閉扉を開け、例えば、バキュームチャックを有する公知の構造を有する搬送ロボットにより、各舌片の所定位置に被処理体をセットし、その後、準備室31を真空排気する。   Next, the operation of the vacuum device 1 of the present invention will be described. First, the vacuum evacuation system 5 is operated by the partition plate 8 in a standby state in which the processing chamber 21 and the preparation chamber 31 are separated from each other, and the processing chamber 21 is evacuated to a predetermined degree of vacuum. At the same time, in the preparation chamber of the atmospheric environment, the drive source is operated to move each tongue of the delivery means to the support position, and the open / close door on the upper surface of the preparation chamber 31 is opened, for example, a known structure having a vacuum chuck. The object to be processed is set at a predetermined position of each tongue piece by the carrying robot, and then the preparation chamber 31 is evacuated.

次いで、処理室21及び準備室31が所定の真空度(10×10−6Pa)に達すると、モータ64aを回転させてホルダ61を準備室31内の搬入出位置に移動させる。ホルダ61が搬入出位置に到達すると、各リフトピンを上昇位置に移動させ、各リフトピンで被処理体を一旦担持させた後、各舌片を待機位置に戻す。そして、各リフトピンを再度下降位置に移動させると、ホルダ61の枠体61aに被処理体がセットされる。 Next, when the processing chamber 21 and the preparation chamber 31 reach a predetermined degree of vacuum (10 × 10 −6 Pa), the motor 64 a is rotated to move the holder 61 to the loading / unloading position in the preparation chamber 31. When the holder 61 reaches the loading / unloading position, the lift pins are moved to the ascending position, the workpieces are once carried by the lift pins, and then the tongue pieces are returned to the standby position. Then, when each lift pin is moved again to the lowered position, the object to be processed is set on the frame 61 a of the holder 61.

次いで、モータ64aを逆回転させてホルダ61を準備室31内の搬入出位置から処理室21内のプロセス位置に移動させる。仕切板8の側面に設けたOリング81が隔壁4に当接すると、処理室21と準備室31とが相互に隔絶されると共に、ホルダ61が処理室21内のプロセス位置に到達して位置決めされる。   Next, the motor 64 a is rotated in the reverse direction to move the holder 61 from the loading / unloading position in the preparation chamber 31 to the process position in the processing chamber 21. When the O-ring 81 provided on the side surface of the partition plate 8 abuts against the partition wall 4, the processing chamber 21 and the preparation chamber 31 are isolated from each other, and the holder 61 reaches the process position in the processing chamber 21 and is positioned. Is done.

次いで、この位置で所望のプロセスが実施され、このプロセスが終了すると、モータ64aを回転させてホルダ61を再度準備室31内の搬入出位置に移動させる。そして、各リフトピンを上昇位置に移動させ、枠体61aより高い位置に被処理体を持ち上げて担持した後、各舌片を支持位置に移動させ、各リフトピンを再度下降位置に移動させて被処理体を各舌片で支持させると共に、モータ64aを逆回転させてホルダ61を準備室31内の搬入出位置から処理室21内のプロセス位置に移動させる。最後に、処理室21及び準備室31をベントして大気環境に戻し、開閉扉を開けて、搬送ロボットによってホルダ61から被処理体を搬出する。   Next, a desired process is performed at this position, and when this process is completed, the motor 64a is rotated to move the holder 61 to the loading / unloading position in the preparation chamber 31 again. Then, each lift pin is moved to the raised position, and the object to be processed is lifted and carried at a position higher than the frame body 61a, then each tongue piece is moved to the support position, and each lift pin is moved again to the lowered position to be processed. The body is supported by each tongue piece, and the motor 64a is rotated in the reverse direction to move the holder 61 from the loading / unloading position in the preparation chamber 31 to the process position in the processing chamber 21. Finally, the processing chamber 21 and the preparation chamber 31 are vented to return to the atmospheric environment, the door is opened, and the object to be processed is unloaded from the holder 61 by the transfer robot.

尚、本実施の形態では、支持板62の他端にのみ仕切板8を設けたものについて説明したが、これに限定されるものではなく、同一の形態を有する仕切板をホルダ61の両側に設け、搬送手段によってホルダ61を準備室31内の搬入出位置に移動させたとき、他の仕切板の側面に設けたOリングが、開口41の周囲を囲繞するように隔壁4に当接することで、処理室21と準備室31とが相互に隔絶されるように構成してもよい。これにより、処理室21を真空に保持した状態で、処理室21への被処理体の搬入からプロセスが終了した被処理体の準備室31からの搬出までを搬送手段6の一回の往復動によって行うことでき、処理時間を短縮できる。   In the present embodiment, the partition plate 8 provided only at the other end of the support plate 62 has been described. However, the present invention is not limited to this, and partition plates having the same configuration are provided on both sides of the holder 61. When the holder 61 is moved to the loading / unloading position in the preparation chamber 31 by the conveying means, the O-ring provided on the side surface of the other partition plate comes into contact with the partition wall 4 so as to surround the opening 41. Thus, the processing chamber 21 and the preparation chamber 31 may be separated from each other. Thereby, in a state where the processing chamber 21 is kept in a vacuum, the reciprocating motion of the transport means 6 is performed once from the loading of the processing target into the processing chamber 21 to the unloading of the processing target after the process is completed. The processing time can be shortened.

また、本実施の形態では、搬送手段6を処理室側に設けているが、搬送手段6を移動させたとき、これと一体の仕切手段で処理室21と準備室31とが相互に隔絶されるものであれば、これに限定されるものではなく、準備室31側に設けてもよい。   In the present embodiment, the transfer means 6 is provided on the processing chamber side. However, when the transfer means 6 is moved, the process chamber 21 and the preparation chamber 31 are isolated from each other by a partition means integrated therewith. As long as it is a thing, it will not be limited to this, You may provide in the preparation room 31 side.

本発明の真空装置の構成を概略的に説明する図。BRIEF DESCRIPTION OF THE DRAWINGS The figure which illustrates schematically the structure of the vacuum apparatus of this invention. 図1に示す搬送手段の詳細を説明する断面図Sectional drawing explaining the detail of the conveying means shown in FIG. 図1に示す搬送手段の詳細を説明する斜視図The perspective view explaining the detail of the conveyance means shown in FIG.

符号の説明Explanation of symbols

1 真空装置
2 処理室
3 準備室
4 隔壁
6 搬送手段
61 ホルダ
8 仕切手段
DESCRIPTION OF SYMBOLS 1 Vacuum apparatus 2 Processing chamber 3 Preparation chamber 4 Partition 6 Transfer means 61 Holder 8 Partition means

Claims (3)

真空中で被処理体に対し所望のプロセスが実施される処理室と、大気環境で被処理体の搬入出が行われる真空排気可能な準備室と、処理室と準備室との間で被処理体の搬送を可能とする搬送手段とを備え、前記処理室と準備室とを相互に仕切る仕切手段を前記搬送手段に一体に設け、この搬送手段を処理室側に移動させると、前記仕切手段によって処理室と準備室とが相互に隔絶されるように構成した真空装置において、
前記搬送手段は、被処理体を保持するホルダと、このホルダを、処理室内のプロセス位置及び準備室内の搬入出位置の間で直線上に往復動させる駆動手段とを備え
前記駆動手段は、駆動源を有するスピンドルと、このスピンドルの一端に連結された前記ホルダを支持する支持板とを有し、このスピンドル、支持板の往復動方向に沿った少なくとも2箇所に、往復動方向と交差する両方向からスピンドル、支持板に押圧力を加える規制手段を設けたことを特徴とする真空装置。
A processing chamber in which a desired process is performed on a target object in a vacuum, a preparation chamber in which the target object is carried in and out in an atmospheric environment, and a processing chamber between the processing chamber and the preparation chamber. A partitioning means for partitioning the processing chamber and the preparation chamber, the partitioning means is provided integrally with the transporting means, and the partitioning means is moved to the processing chamber side. In the vacuum apparatus configured so that the processing chamber and the preparation chamber are isolated from each other by
Said conveying means includes a holder for holding the object to be processed, the this holder, and drive means for reciprocating in a straight line between the loading and unloading position in the process position and preparation chamber of processing chamber,
The drive means includes a spindle having a drive source and a support plate that supports the holder connected to one end of the spindle, and the spindle and the support plate are reciprocated in at least two locations along the reciprocating direction of the spindle. 1. A vacuum apparatus comprising a regulating means for applying a pressing force to a spindle and a support plate from both directions intersecting with a moving direction .
前記準備室内に、前記ホルダに対し被処理体の受け渡しを行う受渡手段を設けたことを特徴とする請求項1記載の真空装置。 The vacuum apparatus according to claim 1 , wherein delivery means for delivering an object to be processed to the holder is provided in the preparation chamber. 前記搬送手段に他の仕切手段をさらに設け、この搬送手段を準備室側に移動させると、他の仕切手段によって処理室と準備室とが相互に隔絶されるように構成したことを特徴とする請求項1または請求項2記載の真空装置。
The transfer means is further provided with another partitioning means, and when the transfer means is moved to the preparation chamber side, the processing chamber and the preparation chamber are separated from each other by the other partitioning means. The vacuum apparatus according to claim 1 or 2.
JP2006040428A 2006-02-17 2006-02-17 Vacuum equipment Expired - Fee Related JP4839097B2 (en)

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