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JP4839845B2 - Spectrometer - Google Patents
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JP4839845B2 - Spectrometer - Google Patents

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JP4839845B2
JP4839845B2 JP2006005790A JP2006005790A JP4839845B2 JP 4839845 B2 JP4839845 B2 JP 4839845B2 JP 2006005790 A JP2006005790 A JP 2006005790A JP 2006005790 A JP2006005790 A JP 2006005790A JP 4839845 B2 JP4839845 B2 JP 4839845B2
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light
optical system
concave mirror
measured
mirror
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JP2007187550A (en
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泰幸 鈴木
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Yokogawa Electric Corp
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/021Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0229Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/04Slit arrangements slit adjustment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12Generating the spectrum; Monochromators
    • G01J3/18Generating the spectrum; Monochromators using diffraction elements, e.g. grating
    • G01J3/1804Plane gratings

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectrometry And Color Measurement (AREA)

Description

本発明は、回折格子等の波長分散素子を用いて被測定光を分光する分光装置に関する。   The present invention relates to a spectroscopic device that splits light to be measured using a wavelength dispersion element such as a diffraction grating.

従来、波長分散素子に対して被測定光を往復させることにより、分解能を向上させるとともにダイナミックレンジを拡大させたダブルパス型の分光装置が開発されている。図10は、従来のダブルパス型の分光装置の構成を示す斜視図である。尚、図10に示す分光装置は、ツェルニー・ターナー型の光学系を有するダブルパス型の分光装置である。図10に示す通り、分光装置100は、入射スリット101、凹面鏡102、回折格子103、凹面鏡104、反射光学系105、及び射出スリット106を含んで構成される。   2. Description of the Related Art Conventionally, a double-pass spectroscopic device has been developed that improves the resolution and expands the dynamic range by reciprocating light to be measured with respect to a wavelength dispersion element. FIG. 10 is a perspective view showing the configuration of a conventional double-pass spectroscopic device. The spectroscopic device shown in FIG. 10 is a double-pass spectroscopic device having a Czerny-Turner type optical system. As shown in FIG. 10, the spectroscopic device 100 includes an entrance slit 101, a concave mirror 102, a diffraction grating 103, a concave mirror 104, a reflection optical system 105, and an exit slit 106.

分光装置100内に入射した被測定光は分光装置100内を往復して外部に射出される。つまり、往路では、入射スリット101から入射した被測定光が、凹面鏡102、回折格子103、及び凹面鏡104を順に介して反射光学系105に入射し、復路では反射光学系105から射出された被測定光が、凹面鏡104、回折格子103、及び凹面鏡102を順に介して射出スリット106から射出される。   The light to be measured that has entered the spectroscopic device 100 travels back and forth within the spectroscopic device 100 and is emitted to the outside. In other words, the measured light incident from the entrance slit 101 enters the reflective optical system 105 sequentially through the concave mirror 102, the diffraction grating 103, and the concave mirror 104 in the forward path, and is measured from the reflective optical system 105 in the backward path. Light is emitted from the exit slit 106 through the concave mirror 104, the diffraction grating 103, and the concave mirror 102 in this order.

入射スリット101は、分光装置100に入射する被測定光の強度を制限する。凹面鏡102は、入射スリット101から入射された往路を進む被測定光を平行光にして回折格子103に入射させるとともに、回折格子103で回折された復路を進む被測定光を射出スリット106に集光する。回折格子103は、多数の溝が形成された回折面103aを有しており、凹面鏡102からの往路を進む平行光及び凹面鏡104からの復路を進む平行光を波長毎に異なる角度で回折させる。   The entrance slit 101 limits the intensity of the light to be measured that enters the spectroscopic device 100. The concave mirror 102 converts the light to be measured traveling from the entrance slit 101 and traveling along the forward path into parallel light and enters the diffraction grating 103, and condenses the light to be measured that travels the backward path diffracted by the diffraction grating 103 onto the exit slit 106. To do. The diffraction grating 103 has a diffractive surface 103a in which a large number of grooves are formed, and diffracts parallel light traveling on the forward path from the concave mirror 102 and parallel light traveling on the return path from the concave mirror 104 at different angles for each wavelength.

尚、回折格子103は、回折面103aに含まれる回転軸RXの周りで回動可能に構成されている。これにより、回折格子103によって回折されて凹面鏡104に入射される往路を進む被測定光、及び、回折格子103によって回折されて凹面鏡102に入射される復路を進む被測定光の波長を可変することができる。   The diffraction grating 103 is configured to be rotatable around a rotation axis RX included in the diffraction surface 103a. This makes it possible to vary the wavelength of the measured light that travels in the forward path diffracted by the diffraction grating 103 and enters the concave mirror 104 and the measured light that travels in the backward path diffracted by the diffraction grating 103 and incident on the concave mirror 102. Can do.

凹面鏡104は、回折格子103によって回折された往路を進む被測定光のうち、凹面鏡104に入射した被測定光のみを反射光学系105に集光させるとともに、反射光学系105から射出される復路を進む被測定光を平行光にして回折格子103に入射させる。反射光学系105は、凹面鏡104からの被測定光の分散方向を逆向きにして(反転して)再度凹面鏡104に入射させる。射出スリット106は、凹面鏡102によって集光される復路を進む被測定光の波長帯域を制限する。   The concave mirror 104 condenses only the light to be measured incident on the concave mirror 104 out of the light to be measured diffracted by the diffraction grating 103 on the reflection optical system 105 and also returns the return path emitted from the reflection optical system 105. The traveling light to be measured is converted into parallel light and is incident on the diffraction grating 103. The reflective optical system 105 makes the dispersion direction of the light to be measured from the concave mirror 104 reverse (inverted) and makes it incident on the concave mirror 104 again. The exit slit 106 limits the wavelength band of the light to be measured that travels on the return path collected by the concave mirror 102.

次に、反射光学系105について説明する。図11は反射光学系105を拡大した斜視図であり、図12は反射光学系105の平面図である。図11,図12に示す通り、反射光学系105は、第1平面ミラー110、第2平面ミラー111、第3平面ミラー112、中間スリット113、リフレクタ114、及び第4平面ミラー115を含んで構成され、反射光学系105に入射した被測定光は、これらの光学部材を順に介して反射光学系105から射出される。   Next, the reflection optical system 105 will be described. 11 is an enlarged perspective view of the reflective optical system 105, and FIG. 12 is a plan view of the reflective optical system 105. As shown in FIG. As shown in FIGS. 11 and 12, the reflection optical system 105 includes a first plane mirror 110, a second plane mirror 111, a third plane mirror 112, an intermediate slit 113, a reflector 114, and a fourth plane mirror 115. Then, the light to be measured incident on the reflection optical system 105 is emitted from the reflection optical system 105 through these optical members in order.

図12に示す通り、反射光学系105を平面的に見た場合には、反射光学系105はほぼ対称に構成されている。つまり、反射光学系105を平面的に見ると、第1平面ミラー110(第4平面ミラー115)で反射される被測定光の光軸OXの延長線上に中間スリット113が配置されているとともに、この光軸OXに関して第2平面ミラー111と第4平面ミラー115とが対称に配置されており、光軸OXに関して第3平面ミラー112とリフレクタ114とが対称に配置されている。尚、反射光学系105は、図10に示す凹面鏡104の焦点位置が中間スリット113の位置になるよう各光学部材が配置されている。また、リフレクタ114は、中間スリット113を透過した被測定光の光路を上方向にずらすため(シフトさせるため)に設けられている。   As shown in FIG. 12, when the reflective optical system 105 is viewed in a plan view, the reflective optical system 105 is configured substantially symmetrically. That is, when the reflection optical system 105 is viewed in plan, the intermediate slit 113 is disposed on the extension line of the optical axis OX of the light to be measured reflected by the first plane mirror 110 (fourth plane mirror 115), and The second plane mirror 111 and the fourth plane mirror 115 are arranged symmetrically with respect to the optical axis OX, and the third plane mirror 112 and the reflector 114 are arranged symmetrically with respect to the optical axis OX. In the reflection optical system 105, each optical member is arranged so that the focal position of the concave mirror 104 shown in FIG. The reflector 114 is provided to shift (shift) the optical path of the light to be measured that has passed through the intermediate slit 113 upward.

以上の構成の反射光学系105は、凹面鏡104からの被測定光の分散方向を逆向きにする。ここで、図11,図12に示す通り、凹面鏡104から反射光学系105に入射する被測定光の分散方向を符号D11を付した矢印で示す。尚、符号D11を付した矢印の先側が波長が短く、矢印の根本側が波長が長いとする。この被測定光が反射光学系105に入射すると、第1平面ミラー110、第2平面ミラー111、及び第3平面ミラー112で順に反射された後に中間スリット113に入射する。ここで、被測定光は中間スリット113のスリット幅に応じた波長選択がなされる。   The reflection optical system 105 having the above configuration reverses the dispersion direction of the light to be measured from the concave mirror 104. Here, as shown in FIG. 11 and FIG. 12, the dispersion direction of the light to be measured incident from the concave mirror 104 to the reflective optical system 105 is indicated by an arrow with a symbol D11. Here, it is assumed that the tip side of the arrow labeled D11 has a short wavelength and the base side of the arrow has a long wavelength. When this light to be measured enters the reflection optical system 105, it is sequentially reflected by the first plane mirror 110, the second plane mirror 111, and the third plane mirror 112 and then enters the intermediate slit 113. Here, the wavelength of light to be measured is selected according to the slit width of the intermediate slit 113.

中間スリット113を透過した被測定光は、リフレクタ114で上方向に反射された後に第4平面ミラー115及び第1平面ミラー110で反射されて反射光学系105から射出される。ここで、反射光学系105から射出される被測定光の分散方向は、符号D12を付した矢印で示す通り、反射光学系105に入射する被測定光の分散方向とは逆向きになる。反射光学系105によって、復路を進む被測定光の分散方向を往路を進む被測定光の分散方向とは逆向きにすることにより、復路を進む被測定光は回折格子103によって更に回折されるため、波長の分解能を向上させることができる。   The light to be measured that has passed through the intermediate slit 113 is reflected upward by the reflector 114, is then reflected by the fourth flat mirror 115 and the first flat mirror 110, and is emitted from the reflective optical system 105. Here, the dispersion direction of the light to be measured emitted from the reflection optical system 105 is opposite to the dispersion direction of the light to be measured incident on the reflection optical system 105 as indicated by an arrow with a symbol D12. By making the dispersion direction of the measurement light traveling in the backward path opposite to the dispersion direction of the measurement light traveling in the forward path by the reflection optical system 105, the measurement light traveling in the backward path is further diffracted by the diffraction grating 103. The resolution of the wavelength can be improved.

次に、従来の分光装置の他の例について説明する。図13は、従来のダブルパス型の分光装置の他の構成を示す斜視図である。尚、図13においては、図10に示した構成に相当する構成には同一の符号を付しており、これらについては説明を省略する。図13に示す分光装置120は、図10に示す分光装置100が備える反射光学系105に代えて反射光学系125を備えている。この反射光学系125は、反射光学系105と同様に、凹面鏡104からの被測定光の分散方向を逆向きにする。   Next, another example of a conventional spectroscopic device will be described. FIG. 13 is a perspective view showing another configuration of a conventional double-pass spectroscopic device. In FIG. 13, the same reference numerals are given to the components corresponding to those shown in FIG. 10, and description thereof will be omitted. A spectroscopic device 120 illustrated in FIG. 13 includes a reflective optical system 125 instead of the reflective optical system 105 included in the spectroscopic device 100 illustrated in FIG. 10. Similar to the reflective optical system 105, the reflective optical system 125 reverses the dispersion direction of the light to be measured from the concave mirror 104.

図14は、反射光学系125を拡大した斜視図である。図14に示す通り、反射光学系125は、スリット131、レンズ群132、及び平面ミラー133を含んで構成される。スリット131及び平面ミラー133は、その中心がレンズ群132の光軸上に位置するよう配置されている。スリット131は、凹面鏡104の焦点位置に配置されている。尚、スリット131は、凹面鏡104からの被測定光がスリット開口の下部に集光されるよう配置されている。レンズ群132は、スリット131を介した被測定光を平行光にするとともに、平面ミラー133で反射された平行光をスリット131に集光させる。平面ミラー133は、レンズ群132からの平行光を反射してレンズ群132に入射させる。   FIG. 14 is an enlarged perspective view of the reflective optical system 125. As shown in FIG. 14, the reflective optical system 125 includes a slit 131, a lens group 132, and a plane mirror 133. The slit 131 and the plane mirror 133 are arranged so that the centers thereof are located on the optical axis of the lens group 132. The slit 131 is disposed at the focal position of the concave mirror 104. The slit 131 is arranged so that the light to be measured from the concave mirror 104 is condensed at the lower part of the slit opening. The lens group 132 converts the light to be measured via the slit 131 into parallel light and condenses the parallel light reflected by the plane mirror 133 on the slit 131. The plane mirror 133 reflects the parallel light from the lens group 132 and makes it incident on the lens group 132.

上記構成において、スリット131のスリット開口の下部に集光された被測定光のうち、スリット131を透過した被測定光は、レンズ群132の光軸よりも下側の部分を通過してレンズ群132から平行光として射出される。ここで、レンズ群132から射出される平行光は上方に向けてある角度で射出される。レンズ群132から射出された平行光は、平面鏡133で上方に反射されてレンズ群132の上部に入射し、レンズ群132の光軸よりも上側の部分を通過してレンズ群132から射出されてスリット131のスリット開口の上部に集光される。図14に示す反射光学系125では、平面ミラー133で被測定光が反射される前後で被測定光の分散方向が逆向きになる。このため、分光装置120においても波長の分解能を向上させることができる。   In the above configuration, of the light to be measured collected at the lower portion of the slit opening of the slit 131, the light to be measured that has passed through the slit 131 passes through a portion below the optical axis of the lens group 132 and passes through the lens group. 132 is emitted as parallel light. Here, the parallel light emitted from the lens group 132 is emitted upward at an angle. The parallel light emitted from the lens group 132 is reflected upward by the plane mirror 133, enters the upper part of the lens group 132, passes through a portion above the optical axis of the lens group 132, and is emitted from the lens group 132. The light is condensed on the upper part of the slit opening of the slit 131. In the reflection optical system 125 shown in FIG. 14, the dispersion direction of the light to be measured is reversed before and after the light to be measured is reflected by the flat mirror 133. Therefore, the wavelength resolution can be improved also in the spectroscopic device 120.

尚、以上説明した従来技術の詳細については、以下の特許文献1〜3を参照されたい。
特開2000−88647号公報 特開平6−221922号公報 特開2003−139610号公報
For details of the conventional technology described above, refer to Patent Documents 1 to 3 below.
JP 2000-88647 A JP-A-6-221922 JP 2003-139610 A

ところで、図10〜図12を用いて説明した分光装置100においては、反射光学系105が4枚の平面ミラーと1つのリフレクタとから構成されており、反射光学系105を構成する光学部材が多いため小型化に向かず、組み立て調整が困難になるという問題がある。また、図13,図14を用いて説明した分光装置120では、反射光学系125にレンズ群132を用いているため波長分散が生じ、分光装置120の十分な性能を得ることができる波長範囲が限られてしまうという問題がある。ここで、波長分散が少ないレンズ(色消しレンズ)を用いることも考えられるが、このようなレンズは高価であるため分光装置120のコスト上昇を招いてしまうという問題がある。   By the way, in the spectroscopic device 100 described with reference to FIGS. 10 to 12, the reflection optical system 105 includes four plane mirrors and one reflector, and there are many optical members constituting the reflection optical system 105. Therefore, there is a problem that it is difficult to reduce the size and make assembly adjustment difficult. In the spectroscopic device 120 described with reference to FIGS. 13 and 14, since the lens group 132 is used in the reflective optical system 125, wavelength dispersion occurs, and a wavelength range in which sufficient performance of the spectroscopic device 120 can be obtained is obtained. There is a problem of being limited. Here, it is conceivable to use a lens (achromatic lens) having a small wavelength dispersion, but since such a lens is expensive, there is a problem that the cost of the spectroscopic device 120 is increased.

本発明は上記事情に鑑みてなされたものであり、小型化が可能であって安価且つ組み立て調整が容易な分光装置を提供することを目的とする。   The present invention has been made in view of the above circumstances, and an object thereof is to provide a spectroscopic device that can be reduced in size, is inexpensive, and can be easily assembled and adjusted.

上記課題を解決するために、本発明の分光装置は、波長分散素子(13)と、被測定光を前記波長分散素子に入射させて得られた光を反射の前後において分散方向が逆向きとなるように反射する反射光学系(15、35)とを備え、前記反射光学系で反射した光を再度前記波長分散素子に入射させて前記被測定光を分光する分光装置(10)において、前記反射光学系は、同心に配置されて曲率半径の比がn対n+1(nは正の整数)である凸面鏡(23、26、27、43と凹面鏡(22、42)とを含み、前記被測定光を前記波長分散素子に入射させて得られた光を前記凸面鏡でn回反射させるとともに、前記凹面鏡でn+1回反射させて分散方向を逆向きにすることを特徴としている。
この発明によると、被測定光を前記波長分散素子に入射させて得られた光は、反射光学系が備える凸面鏡でn回反射されるとともに、凹面鏡でn+1回反射されて反射光学系から射出された後に、再度波長分散素子に入射する
また、本発明の分光装置は、前記反射光学系が、前記凸面鏡と前記凹面鏡との間で複数回反射された光を反射して、再度前記凸面鏡と前記凹面鏡との間で複数回反射させる反射部材(44)を備えていることを特徴としている。
ここで、前記凸面鏡での合計の反射回数は2n回であり、前記凹面鏡での合計の反射回数は2(n+1)回であることを特徴としている。
In order to solve the above-described problems, the spectroscopic device of the present invention includes a wavelength dispersion element (13) and a dispersion direction opposite to each other before and after reflection of light obtained by making light to be measured enter the wavelength dispersion element. provided so as reflected reflecting optical system and a (15, 35), wherein in said light reflected by the reflecting optical system is incident again on the wavelength dispersion element spectroscope for dispersing the light to be measured (10), wherein The reflective optical system includes a convex mirror (23, 26, 27, 43 ) and a concave mirror (22, 42) that are concentrically arranged and have a radius of curvature ratio of n to n + 1 (n is a positive integer ) and a concave mirror (22, 42). The light obtained by making the measurement light incident on the wavelength dispersion element is reflected n times by the convex mirror , and reflected by the concave mirror n + 1 times to reverse the dispersion direction .
According to this invention, the light obtained by making the light to be measured incident on the wavelength dispersion element is reflected n times by the convex mirror provided in the reflective optical system, and is reflected n + 1 times by the concave mirror and emitted from the reflective optical system. Then, it enters the wavelength dispersion element again .
In the spectroscopic device of the present invention, the reflection optical system reflects the light reflected a plurality of times between the convex mirror and the concave mirror and again reflects the light a plurality of times between the convex mirror and the concave mirror. It is provided with a member (44) .
Here, the total number of reflections by the convex mirror is 2n times, and the total number of reflections by the concave mirror is 2 (n + 1) times.

本発明によれば、被測定光を前記波長分散素子に入射させて得られた光を、反射光学系が備える凸面鏡と凹面鏡との間で複数回反射させることにより反射しているため、分光装置を小型化することができるとともに安価にすることができ、更に組み立て調整を容易に行うことができるという効果がある。   According to the present invention, the light obtained by causing the light to be measured to be incident on the wavelength dispersion element is reflected by reflecting the light multiple times between the convex mirror and the concave mirror included in the reflective optical system. Can be reduced in size and can be made inexpensive, and further, assembly adjustment can be easily performed.

以下、図面を参照して本発明の実施形態による分光装置について詳細に説明する。図1は、本発明の一実施形態による分光装置の構成を示す斜視図である。尚、図1に示す分光装置は、ツェルニー・ターナー型の光学系を有するダブルパス型の分光装置である。図1に示す通り、本実施形態の分光装置10は、入射スリット11、凹面鏡12、波長分散素子としての回折格子13、凹面鏡14、反射光学系15、及び射出スリット16を含んで構成される。   Hereinafter, a spectroscopic device according to an embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 is a perspective view showing a configuration of a spectroscopic device according to an embodiment of the present invention. The spectroscopic device shown in FIG. 1 is a double-pass spectroscopic device having a Czerny-Turner type optical system. As shown in FIG. 1, the spectroscopic device 10 of this embodiment includes an entrance slit 11, a concave mirror 12, a diffraction grating 13 as a wavelength dispersion element, a concave mirror 14, a reflection optical system 15, and an exit slit 16.

分光装置10内に入射した被測定光は分光装置10内を往復して外部に射出される。つまり、往路では、入射スリット11から入射した被測定光が、凹面鏡12、回折格子13、及び凹面鏡14を順に介して反射光学系15に入射し、復路では反射光学系15から射出された被測定光が、凹面鏡14、回折格子13、及び凹面鏡12を順に介して射出スリット16から射出される。   The light to be measured that has entered the spectroscopic device 10 travels back and forth within the spectroscopic device 10 and is emitted to the outside. That is, in the forward path, the light to be measured that has entered from the entrance slit 11 enters the reflective optical system 15 through the concave mirror 12, the diffraction grating 13, and the concave mirror 14 in this order, and the measured light that has exited from the reflective optical system 15 in the backward path. Light is emitted from the exit slit 16 through the concave mirror 14, the diffraction grating 13, and the concave mirror 12 in this order.

入射スリット11は、分光装置10に入射する被測定光の強度を制限する。凹面鏡12は、入射スリット11から入射された往路を進む被測定光を平行光にして回折格子13に入射させるとともに、回折格子13で回折された復路を進む被測定光を射出スリット16に集光する。回折格子13は、多数の溝が形成された回折面13aを有しており、凹面鏡12からの往路を進む平行光及び凹面鏡14からの復路を進む平行光を波長毎に異なる角度で回折させる。   The entrance slit 11 limits the intensity of the light to be measured that enters the spectroscopic device 10. The concave mirror 12 converts the light to be measured, which travels from the entrance slit 11 and travels in the forward path, into parallel light and enters the diffraction grating 13, and condenses the light to be measured that travels the backward path diffracted by the diffraction grating 13 to the exit slit 16. To do. The diffraction grating 13 has a diffractive surface 13a in which a large number of grooves are formed, and diffracts parallel light traveling on the forward path from the concave mirror 12 and parallel light traveling on the return path from the concave mirror 14 at different angles for each wavelength.

尚、回折格子13は、回折面13aに含まれる回転軸RXの周りで回動可能に構成されている。これにより、回折格子13によって回折されて凹面鏡14に入射される往路を進む被測定光、及び、回折格子13によって回折されて凹面鏡12に入射される復路を進む被測定光の波長を可変することができる。   The diffraction grating 13 is configured to be rotatable around a rotation axis RX included in the diffraction surface 13a. Accordingly, the wavelength of the measured light that travels in the forward path diffracted by the diffraction grating 13 and enters the concave mirror 14 and the wavelength of the measured light that travels in the backward path diffracted by the diffraction grating 13 and incident on the concave mirror 12 are varied. Can do.

凹面鏡14は、回折格子13によって回折された往路を進む被測定光のうち、凹面鏡14に入射した被測定光のみを反射光学系15に集光させるとともに、反射光学系15から射出される復路を進む被測定光を平行光にして回折格子13に入射させる。反射光学系15は、凹面鏡14からの被測定光の分散方向を逆向きにして(反転して)再度凹面鏡14に入射させる。射出スリット16は、凹面鏡12によって集光される復路を進む被測定光の波長帯域を制限する。   The concave mirror 14 condenses only the measured light that has entered the concave mirror 14 among the measured light that travels on the forward path diffracted by the diffraction grating 13 and condenses the return path emitted from the reflective optical system 15. The traveling light to be measured is converted into parallel light and is incident on the diffraction grating 13. The reflecting optical system 15 makes the dispersion direction of the light to be measured from the concave mirror 14 reverse (inverted) and makes it incident on the concave mirror 14 again. The exit slit 16 limits the wavelength band of the light to be measured that travels on the return path collected by the concave mirror 12.

次に、反射光学系15について説明する。図2は反射光学系15を拡大した斜視図であり、図3は反射光学系15の平面図であり、図4は反射光学系15の側面図である。尚、図2では、凹面鏡14からの往路を進む被測定光が反射光学系15に入射する側から見た状態を図示している。図2〜図4に示す通り、反射光学系15は、スリット21、凹面鏡22、及び凸面鏡23を含んで構成され、反射光学系15に入射した被測定光は、これらの光学部材を順に介して反射光学系15から射出される。   Next, the reflection optical system 15 will be described. 2 is an enlarged perspective view of the reflective optical system 15, FIG. 3 is a plan view of the reflective optical system 15, and FIG. 4 is a side view of the reflective optical system 15. FIG. 2 shows a state in which the measured light traveling on the forward path from the concave mirror 14 is viewed from the side where it enters the reflecting optical system 15. As shown in FIGS. 2 to 4, the reflective optical system 15 includes a slit 21, a concave mirror 22, and a convex mirror 23, and the light to be measured incident on the reflective optical system 15 passes through these optical members in order. The light is emitted from the reflection optical system 15.

スリット21は、凹面鏡14の焦点位置に配置されている。従って、凹面鏡14によって集光された往路を進む被測定光は、スリット21のスリット開口の位置に集光される。また、図3に示す通り、反射光学系15を平面的に見た場合には、スリット21、凹面鏡22、及び凸面鏡23は同一直線上に配置されている。一方、図4に示す通り、反射光学系15を側面から見た場合には、反射光学系15内の光路が上下対称となるようにスリット21、凹面鏡22、及び凸面鏡23が配置されている。即ち、反射光学系15をなす各光学部材は、反射光学系15に対する被測定光の入射位置P1(スリット21のスリット開口の位置)と反射光学系15からの被測定光の射出位置P2とは、凹面鏡22及び凸面鏡23の中心を通る中心線に関して対称になるよう配置されている。   The slit 21 is disposed at the focal position of the concave mirror 14. Therefore, the light to be measured traveling on the forward path collected by the concave mirror 14 is collected at the position of the slit opening of the slit 21. As shown in FIG. 3, when the reflection optical system 15 is viewed in a plan view, the slit 21, the concave mirror 22, and the convex mirror 23 are arranged on the same straight line. On the other hand, as shown in FIG. 4, when the reflective optical system 15 is viewed from the side, the slit 21, the concave mirror 22, and the convex mirror 23 are arranged so that the optical path in the reflective optical system 15 is vertically symmetrical. That is, each optical member constituting the reflection optical system 15 has an incident position P1 of the measurement light with respect to the reflection optical system 15 (a position of the slit opening of the slit 21) and an emission position P2 of the measurement light from the reflection optical system 15. The concave mirror 22 and the convex mirror 23 are arranged so as to be symmetric with respect to the center line passing through the centers thereof.

凹面鏡22と凸面鏡23とは同心に配置されており、これらの曲率中心は被測定光の入射位置P1(スリット21)、被測定光の射出位置P2を通る直線上に設定されている。即ち、凹面鏡22及び凸面鏡23の曲率中心は、凹面鏡22及び凸面鏡23の中心を通る中心線と、被測定光の入射位置P1及び被測定光の射出位置P2を通る直線との交点に設定されている。図3及び図4に示す例では、凹面鏡22と凸面鏡23との曲率半径の比は2:1に設定されている。   The concave mirror 22 and the convex mirror 23 are arranged concentrically, and their centers of curvature are set on a straight line passing through the measurement light incident position P1 (slit 21) and the measurement light emission position P2. That is, the centers of curvature of the concave mirror 22 and the convex mirror 23 are set at the intersection of a center line passing through the centers of the concave mirror 22 and the convex mirror 23 and a straight line passing through the incident position P1 of the measured light and the emission position P2 of the measured light. Yes. In the example shown in FIGS. 3 and 4, the ratio of the radius of curvature between the concave mirror 22 and the convex mirror 23 is set to 2: 1.

上記構成において、凹面鏡14によってスリット21上に集光した被測定光は、スリット21に入射する。ここで、被測定光はスリット21のスリット幅に応じた波長選択がなされる。スリット21のスリット開口を透過した被測定光は、まず凹面鏡22に入射する。この被測定光は凹面鏡22によって反射された後で凸面鏡23に入射する。凸面鏡23に入射した被測定光は凸面鏡23によって反射された後で再度凹面鏡22に入射する。但し、先に入射した位置とは異なる位置に入射する。再度凹面鏡22に入射した被測定光は凹面鏡22によって反射された後で射出位置P2に集光され、反射光学系15から射出される。   In the above configuration, the light to be measured collected on the slit 21 by the concave mirror 14 enters the slit 21. Here, the wavelength of the light to be measured is selected according to the slit width of the slit 21. The light to be measured that has passed through the slit opening of the slit 21 first enters the concave mirror 22. The measured light is reflected by the concave mirror 22 and then enters the convex mirror 23. The light to be measured that has entered the convex mirror 23 is reflected by the convex mirror 23 and then enters the concave mirror 22 again. However, the light is incident on a position different from the position where the light is incident first. The light to be measured that has entered the concave mirror 22 again is reflected by the concave mirror 22, condensed at the emission position P <b> 2, and emitted from the reflective optical system 15.

以上の通り、図3及び図4に示す構成では、スリット21を透過した被測定光を凹面鏡22で2回反射させるとともに凸面鏡23で1回反射させて、凹面鏡22と凸面鏡23との間で合計3回反射させている。よって、凹面鏡22での反射回数と凸面鏡23での反射回数との比は、凹面鏡22と凸面鏡23との曲率半径の比と同じ2:1である。   As described above, in the configuration shown in FIGS. 3 and 4, the light to be measured that has passed through the slit 21 is reflected twice by the concave mirror 22 and once by the convex mirror 23, and is totaled between the concave mirror 22 and the convex mirror 23. Reflected 3 times. Therefore, the ratio of the number of reflections at the concave mirror 22 and the number of reflections at the convex mirror 23 is 2: 1, which is the same as the ratio of the curvature radii of the concave mirror 22 and the convex mirror 23.

反射光学系15は、凹面鏡22と凸面鏡23との間で被測定光を奇数回反射させることにより、凹面鏡14からの被測定光の分散方向を逆向きにする。ここで、図2に示す通り、凹面鏡14から反射光学系15に入射する被測定光の分散方向を符号D1を付した矢印で示す。尚、符号D1を付した矢印の先側が波長が短く、矢印の根本側が波長が長いとする。この被測定光が反射光学系15に入射すると、上述した通り、凹面鏡22と凸面鏡23との間で奇数回反射した後に反射光学系15から射出される。   The reflecting optical system 15 reflects the measured light an odd number of times between the concave mirror 22 and the convex mirror 23 to reverse the direction of dispersion of the measured light from the concave mirror 14. Here, as shown in FIG. 2, the dispersion direction of the light to be measured incident on the reflecting optical system 15 from the concave mirror 14 is indicated by an arrow with a symbol D <b> 1. Here, it is assumed that the tip side of the arrow labeled D1 has a short wavelength and the base side of the arrow has a long wavelength. When the light to be measured is incident on the reflection optical system 15, as described above, the light to be measured is emitted from the reflection optical system 15 after being reflected between the concave mirror 22 and the convex mirror 23 an odd number of times.

ここで、反射光学系15から射出される被測定光の分散方向は、符号D2を付した矢印で示す通り、反射光学系15に入射する被測定光の分散方向とは逆向きになる。反射光学系15によって、復路を進む被測定光の分散方向を往路を進む被測定光の分散方向とは逆向きにすることにより、復路を進む被測定光は回折格子13によって更に回折されるため、波長の分解能を向上させることができる。   Here, the dispersion direction of the light to be measured emitted from the reflection optical system 15 is opposite to the dispersion direction of the light to be measured incident on the reflection optical system 15 as indicated by an arrow with a symbol D2. By making the dispersion direction of the measurement light traveling on the return path opposite to the dispersion direction of the measurement light traveling on the forward path by the reflection optical system 15, the measurement light traveling on the return path is further diffracted by the diffraction grating 13. The resolution of the wavelength can be improved.

次に、反射光学系15の変形例について説明する。図5は、反射光学系15の第1変形例を示す側面図である。尚、図5においては、図4に示した光学部材と同一のものについては同一の符号を付してある。図5に示す通り、この第1変形例に係る反射光学系15は、スリット21、凹面鏡22、及び凸面鏡26を含んで構成され、反射光学系15に入射した被測定光は、これらの光学部材を順に介して反射光学系15から射出される。   Next, a modified example of the reflection optical system 15 will be described. FIG. 5 is a side view showing a first modification of the reflective optical system 15. In FIG. 5, the same components as those of the optical member shown in FIG. As shown in FIG. 5, the reflective optical system 15 according to the first modified example includes a slit 21, a concave mirror 22, and a convex mirror 26, and the light to be measured incident on the reflective optical system 15 is the optical member. Are sequentially emitted from the reflecting optical system 15.

図5に示す第1変形例に係る反射光学系15は、図4に示す凸面鏡23に代えて曲率半径の異なる凸面鏡26が設けられており、且つ被測定光の入射位置P1と被測定光の射出位置P2との間隔が広げられている点が相違する。図5に示す第1変形例に係る反射光学系15は、図4に示す反射光学系15と同様に、凹面鏡22と凸面鏡26とは同心に配置されており、これらの曲率中心は被測定光の入射位置P1(スリット21)、被測定光の射出位置P2を通る直線上に設定されている。しかしながら、図5に示す第1変形例に係る反射光学系15は、凹面鏡22と凸面鏡26との曲率半径の比が3:2に設定されている点が相違する。この相違に応じて被測定光の入射位置P1と被測定光の射出位置P2との間隔が広げられている。   The reflective optical system 15 according to the first modification shown in FIG. 5 is provided with a convex mirror 26 having a different radius of curvature in place of the convex mirror 23 shown in FIG. 4, and the measurement light incident position P1 and the measurement light The difference is that the distance from the injection position P2 is widened. In the reflective optical system 15 according to the first modification shown in FIG. 5, the concave mirror 22 and the convex mirror 26 are arranged concentrically, similarly to the reflective optical system 15 shown in FIG. Are set on a straight line passing through the incident position P1 (slit 21) and the emission position P2 of the light to be measured. However, the reflective optical system 15 according to the first modification shown in FIG. 5 is different in that the ratio of the radius of curvature of the concave mirror 22 and the convex mirror 26 is set to 3: 2. In accordance with this difference, the interval between the incident position P1 of the measured light and the emission position P2 of the measured light is widened.

上記構成の第1変形例に係る反射光学系15では、スリット21を透過した被測定光を凹面鏡22で3回反射させるとともに凸面鏡26で2回反射させて、凹面鏡22と凸面鏡26との間で合計5回反射させている。よって、凹面鏡22での反射回数と凸面鏡26での反射回数との比は、凹面鏡22と凸面鏡26との曲率半径の比と同じ3:2である。このように、第1変形例に係る反射光学系15においても、凹面鏡22と凸面鏡26との間で被測定光を奇数回反射させて、凹面鏡14からの被測定光の分散方向を逆向きにしていおり、波長の分解能を向上させることができる。   In the reflective optical system 15 according to the first modification having the above-described configuration, the light to be measured that has passed through the slit 21 is reflected three times by the concave mirror 22 and twice by the convex mirror 26, and between the concave mirror 22 and the convex mirror 26. Reflected a total of 5 times. Therefore, the ratio of the number of reflections at the concave mirror 22 and the number of reflections at the convex mirror 26 is 3: 2, which is the same as the ratio of the curvature radii of the concave mirror 22 and the convex mirror 26. As described above, also in the reflective optical system 15 according to the first modification, the measured light is reflected an odd number of times between the concave mirror 22 and the convex mirror 26, and the dispersion direction of the measured light from the concave mirror 14 is reversed. Therefore, the resolution of the wavelength can be improved.

図6は、反射光学系15の第2変形例を示す側面図である。尚、図6においても、図4に示した光学部材と同一のものについては同一の符号を付してある。図6に示す通り、この第2変形例に係る反射光学系15は、スリット21、凹面鏡22、及び凸面鏡27を含んで構成され、反射光学系15に入射した被測定光は、これらの光学部材を順に介して反射光学系15から射出される。   FIG. 6 is a side view showing a second modification of the reflective optical system 15. In FIG. 6 as well, the same components as those of the optical member shown in FIG. As shown in FIG. 6, the reflective optical system 15 according to the second modified example includes a slit 21, a concave mirror 22, and a convex mirror 27, and the light to be measured incident on the reflective optical system 15 is an optical member of these. Are sequentially emitted from the reflecting optical system 15.

図6に示す第2変形例に係る反射光学系15は、図4に示す凸面鏡23に代えて曲率半径の異なる凸面鏡27が設けられており、且つ被測定光の入射位置P1と被測定光の射出位置P2との間隔が広げられている点が相違する。図6に示す第2変形例に係る反射光学系15は、図4に示す反射光学系15と同様に、凹面鏡22と凸面鏡26とは同心に配置されており、これらの曲率中心は被測定光の入射位置P1(スリット21)、被測定光の射出位置P2を通る直線上に設定されている。しかしながら、図6に示す第2変形例に係る反射光学系15は、凹面鏡22と凸面鏡27との曲率半径の比は4:3に設定されている点が相違する。この相違に応じて被測定光の入射位置P1と被測定光の射出位置P2との間隔が広げられている。   The reflective optical system 15 according to the second modification shown in FIG. 6 is provided with a convex mirror 27 having a different radius of curvature instead of the convex mirror 23 shown in FIG. 4, and the incident position P1 of the measured light and the measured light The difference is that the distance from the injection position P2 is widened. In the reflective optical system 15 according to the second modification shown in FIG. 6, the concave mirror 22 and the convex mirror 26 are arranged concentrically like the reflective optical system 15 shown in FIG. 4, and the center of curvature of these is the light to be measured. Are set on a straight line passing through the incident position P1 (slit 21) and the emission position P2 of the light to be measured. However, the reflective optical system 15 according to the second modification shown in FIG. 6 is different in that the ratio of the radius of curvature of the concave mirror 22 and the convex mirror 27 is set to 4: 3. In accordance with this difference, the interval between the incident position P1 of the measured light and the emission position P2 of the measured light is widened.

上記構成の第2変形例に係る反射光学系15では、スリット21を透過した被測定光を凹面鏡22で4回反射させるとともに凸面鏡26で3回反射させて、凹面鏡22と凸面鏡26との間で合計7回反射させている。よって、凹面鏡22での反射回数と凸面鏡26での反射回数との比は、凹面鏡22と凸面鏡26との曲率半径の比と同じ4:3である。このように、第2変形例に係る反射光学系15においても、凹面鏡22と凸面鏡27との間で被測定光を奇数回反射させて、凹面鏡14からの被測定光の分散方向を逆向きにしていおり、波長の分解能を向上させることができる。   In the reflective optical system 15 according to the second modification having the above-described configuration, the light to be measured that has passed through the slit 21 is reflected four times by the concave mirror 22 and three times by the convex mirror 26, and between the concave mirror 22 and the convex mirror 26. Reflected 7 times in total. Therefore, the ratio of the number of reflections at the concave mirror 22 and the number of reflections at the convex mirror 26 is 4: 3, which is the same as the ratio of the curvature radii of the concave mirror 22 and the convex mirror 26. Thus, also in the reflective optical system 15 according to the second modification, the measured light is reflected an odd number of times between the concave mirror 22 and the convex mirror 27, and the dispersion direction of the measured light from the concave mirror 14 is reversed. Therefore, the resolution of the wavelength can be improved.

以上の通り、反射光学系1
5の凸面鏡及び凹面鏡の組み合わせとしては、同心であって、凸面鏡と凹面鏡の曲率半径の比がn:n+1(nは正の整数)である凸面鏡及び凹面鏡を用いることができる。かかる関係にある凸面鏡及び凹面鏡を用いた場合には、反射光学系15に入射した被測定光が凹面鏡でn+1回で反射されるとともに、凸面鏡でn回反射された後で、反射光学系15から射出される。上記のnの値を適宜変更することにより、被測定光の入射位置P1と被測定光の射出位置P2との間隔(オフセット)を容易に調整することができる。
As described above, the reflective optical system 1
As the combination of the convex mirror and the concave mirror, a convex mirror and a concave mirror that are concentric and the ratio of the curvature radii of the convex mirror and the concave mirror is n: n + 1 (n is a positive integer) can be used. When the convex mirror and the concave mirror having such a relationship are used, the light to be measured that has entered the reflective optical system 15 is reflected n + 1 times by the concave mirror and after being reflected n times by the convex mirror, and then from the reflective optical system 15. It is injected. By appropriately changing the value of n described above, the interval (offset) between the incident position P1 of the light to be measured and the emission position P2 of the light to be measured can be easily adjusted.

次に、分光装置10に設けられる反射光学系の他の構成例について説明する。図7は、反射光学系の他の構成例を示す斜視図である。尚、図7に示す反射光学系は、図2に示す反射光学系15と同様に、凹面鏡14からの往路を進む被測定光が反射光学系に入射する側から見た状態を図示している。また、図8は図7に示す他の構成例に係る反射光学系の平面図であり、図9は同反射光学系の側面図である。   Next, another configuration example of the reflection optical system provided in the spectroscopic device 10 will be described. FIG. 7 is a perspective view showing another configuration example of the reflection optical system. The reflection optical system shown in FIG. 7 shows a state viewed from the side where the light to be measured traveling from the concave mirror 14 enters the reflection optical system, similarly to the reflection optical system 15 shown in FIG. . 8 is a plan view of a reflective optical system according to another configuration example shown in FIG. 7, and FIG. 9 is a side view of the reflective optical system.

図7〜図9に示す通り、反射光学系35は、スリット41、凹面鏡42、凸面鏡43、及びリフレクタ44を含んで構成され、反射光学系35に入射した被測定光は、これらの光学部材を介して反射光学系35から射出される。スリット41は、凹面鏡14の焦点位置に配置されている。従って、凹面鏡14によって集光された往路を進む被測定光は、スリット41のスリット開口の位置に集光される。また、スリット41は、図8,図9に示す通り、凹面鏡42及び凸面鏡43の中心を通る中心線からずれた位置に配置されている。   As shown in FIGS. 7 to 9, the reflection optical system 35 includes a slit 41, a concave mirror 42, a convex mirror 43, and a reflector 44, and the light to be measured incident on the reflection optical system 35 uses these optical members. Through the reflection optical system 35. The slit 41 is disposed at the focal position of the concave mirror 14. Accordingly, the light to be measured traveling on the forward path collected by the concave mirror 14 is collected at the position of the slit opening of the slit 41. Moreover, the slit 41 is arrange | positioned in the position shifted | deviated from the centerline which passes along the center of the concave mirror 42 and the convex mirror 43, as shown in FIG.8, FIG.9.

また、反射光学系35を平面的に見た場合及び側面から見た場合の何れの場合であっても、反射光学系35内の光路が凹面鏡42及び凸面鏡43の中心を通る中心線に関してほぼ対称となるようにスリット41、凹面鏡42、凸面鏡43、及びリフレクタ44が配置されている。リフレクタ44は、反射光学系35を平面的に見た場合に、凹面鏡42及び凸面鏡43の中心を通る中心線に関してスリット41と対称に配置されている。また、図9に示す通り、リフレクタ44は互いに直交する反射面44a,44bを備えており、反射面44a,44bの各々が、凹面鏡42及び凸面鏡43の中心を通る中心線に対して45°の角度をなすよう配置されている。   Further, the optical path in the reflection optical system 35 is almost symmetrical with respect to the center line passing through the centers of the concave mirror 42 and the convex mirror 43 regardless of whether the reflection optical system 35 is viewed in a plan view or a side view. A slit 41, a concave mirror 42, a convex mirror 43, and a reflector 44 are arranged so that The reflector 44 is disposed symmetrically with the slit 41 with respect to a center line passing through the centers of the concave mirror 42 and the convex mirror 43 when the reflection optical system 35 is viewed in a plan view. Further, as shown in FIG. 9, the reflector 44 includes reflecting surfaces 44 a and 44 b that are orthogonal to each other, and each of the reflecting surfaces 44 a and 44 b is 45 ° with respect to a center line passing through the centers of the concave mirror 42 and the convex mirror 43. It is arranged to make an angle.

反射光学系35が備える凹面鏡42及び凸面鏡43は、図2〜図3を用いて説明した凹面鏡22及び凸面鏡23と同様に同心に配置されており、これらの曲率中心は被測定光の入射位置P1(スリット41)及び被測定光の射出位置P2を通り、凹面鏡42及び凸面鏡43の中心を通る中心線に垂直な面内に設定されている。尚、図8及び図9に示す例では、凹面鏡42と凸面鏡43との曲率半径の比が2:1に設定されている場合を例示して図示しているが、図5,図6を用いて説明した場合と同様に、他の比率にすることも可能である。被測定光の射出位置P2は、図8,図9に示す通り、被測定光の入射位置P1の上方に設定されている。   The concave mirror 42 and the convex mirror 43 included in the reflecting optical system 35 are arranged concentrically similarly to the concave mirror 22 and the convex mirror 23 described with reference to FIGS. 2 to 3, and the center of curvature of these is the incident position P1 of the light to be measured. It is set in a plane perpendicular to the center line passing through the centers of the concave mirror 42 and the convex mirror 43 through the (slit 41) and the emission position P2 of the light to be measured. 8 and 9, the case where the ratio of the curvature radii of the concave mirror 42 and the convex mirror 43 is set to 2: 1 is shown as an example, but FIGS. 5 and 6 are used. As in the case described above, other ratios are possible. The measurement light emission position P2 is set above the measurement light incidence position P1, as shown in FIGS.

上記構成において、凹面鏡14によってスリット41上に集光した被測定光は、スリット41に入射する。ここで、被測定光はスリット41のスリット幅に応じた波長選択がなされる。スリット41のスリット開口を透過した被測定光は、まず凹面鏡42に入射する。この被測定光は凹面鏡42によって反射された後で凸面鏡43に入射し、凸面鏡43で反射された後で凹面鏡42に再度入射する。   In the above configuration, the light to be measured collected on the slit 41 by the concave mirror 14 enters the slit 41. Here, the wavelength of the light to be measured is selected according to the slit width of the slit 41. The light to be measured that has passed through the slit opening of the slit 41 first enters the concave mirror 42. The measured light is reflected by the concave mirror 42 and then enters the convex mirror 43, and after being reflected by the convex mirror 43, it enters the concave mirror 42 again.

ここで、図7〜図9に示す通り、スリット41を通過した被測定光の光軸は、凹面鏡42及び凸面鏡43の中心を通る中心線から斜め下方向にずれている。このため、被測定光が凹面鏡42及び凸面鏡43によってそれぞれ1回反射されることにより、被測定光は凹面鏡42の中心から斜め上方向の位置に入射する。より具体的には、前述した通り、反射光学系35を平面的に見た場合及び側面から見た場合の何れの場合であっても、反射光学系35内の光路が凹面鏡42及び凸面鏡43の中心を通る中心線に関してほぼ対称となるように設定されているため、凹面鏡42に対する第1回目の入射位置と第2回目の入射位置とは、凹面鏡42及び凸面鏡43の中心を通る中心線に関して対称である。   Here, as shown in FIGS. 7 to 9, the optical axis of the light to be measured that has passed through the slit 41 is shifted obliquely downward from the center line passing through the centers of the concave mirror 42 and the convex mirror 43. For this reason, the light to be measured is reflected once by the concave mirror 42 and the convex mirror 43, so that the light to be measured is incident obliquely upward from the center of the concave mirror 42. More specifically, as described above, the optical path in the reflective optical system 35 is the same as that of the concave mirror 42 and the convex mirror 43 regardless of whether the reflective optical system 35 is viewed planarly or from the side. Since the first incident position and the second incident position with respect to the concave mirror 42 are set symmetrically with respect to the center line passing through the center, the first incident position and the second incident position are symmetrical with respect to the center line passing through the centers of the concave mirror 42 and the convex mirror 43. It is.

凹面鏡42に再度入射した被測定光は、リフレクタ44に入射して下方に反射された後、凹面鏡42側に反射されて凹面鏡42に入射する。ここで、図7〜図9に示す通り、リフレクタ44で反射された被測定光は、凹面鏡42の中心から斜め下側に入射する。より具体的には、リフレクタ44で反射された被測定光は、凹面鏡42及び凸面鏡43の中心を通る中心線を含む垂直な面に関して、スリット41を通過した被測定光が凹面鏡42に最初に入射される入射位置と対称な位置に入射する。   The light to be measured that has entered the concave mirror 42 again enters the reflector 44 and is reflected downward, and then is reflected toward the concave mirror 42 and enters the concave mirror 42. Here, as shown in FIGS. 7 to 9, the light to be measured reflected by the reflector 44 is incident obliquely downward from the center of the concave mirror 42. More specifically, the measured light reflected by the reflector 44 is first incident on the concave mirror 42 with respect to a vertical plane including a center line passing through the centers of the concave mirror 42 and the convex mirror 43. The incident light is incident on a position symmetrical to the incident position.

この被測定光は凹面鏡42によって反射された後で凸面鏡43に入射し、凸面鏡43で反射された後で凹面鏡42に再度入射する。即ち、被測定光はスリット41を通過した後で凹面鏡42による3回目の反射及び凸面鏡43による2回目の反射がなされた後で凹面鏡42に再度入射する(4回目の入射)。ここで、前述した通り、反射光学系35内の光路は凹面鏡42及び凸面鏡43の中心を通る中心線に関してほぼ対称であるため、凹面鏡42に対する第3回目の入射位置と第4回目の入射位置とは、凹面鏡42及び凸面鏡43の中心を通る中心線に関して対称である。凹面鏡42による4回目の反射がなされた被測定光は、被測定光の射出位置P2で集光された後で凹面鏡14に向けて射出される。   The measured light is reflected by the concave mirror 42 and then enters the convex mirror 43, and after being reflected by the convex mirror 43, it enters the concave mirror 42 again. That is, after passing through the slit 41, the light to be measured is incident on the concave mirror 42 again after the third reflection by the concave mirror 42 and the second reflection by the convex mirror 43 (fourth incidence). Here, as described above, since the optical path in the reflection optical system 35 is substantially symmetrical with respect to the center line passing through the centers of the concave mirror 42 and the convex mirror 43, the third incident position and the fourth incident position with respect to the concave mirror 42 Is symmetric with respect to a center line passing through the centers of the concave mirror 42 and the convex mirror 43. The light to be measured that has been reflected by the concave mirror 42 for the fourth time is condensed at the emission position P2 of the light to be measured and then emitted toward the concave mirror 14.

以上の通り、図7〜図9に示す他の構成例に係る反射光学系35は、スリット41を透過した被測定光を凹面鏡42で2回反射させるとともに凸面鏡43で1回反射させ、その後でリフレクタ44で反射させることにより再度凹面鏡42で2回反射させるとともに凸面鏡43で1回反射させている。つまり、反射光学系35は、スリット41を透過した被測定光が射出位置P2に至るまでに、被測定光を凹面鏡42で計4回反射するとともに凸面鏡4で計2回反射して、凹面鏡42と凸面鏡43との間で合計6回反射させている。   As described above, the reflective optical system 35 according to the other configuration examples shown in FIGS. 7 to 9 reflects the light to be measured transmitted through the slit 41 twice by the concave mirror 42 and once by the convex mirror 43, and then By reflecting with the reflector 44, it is again reflected twice with the concave mirror 42 and once with the convex mirror 43. That is, the reflection optical system 35 reflects the measurement light by the concave mirror 42 a total of four times and reflects the measurement light by the convex mirror 4 a total of two times until the measurement light transmitted through the slit 41 reaches the emission position P2. And the convex mirror 43 are reflected a total of six times.

反射光学系35は、凹面鏡42と凸面鏡43との間で被測定光を偶数回反射させているため、図1〜図6に示す反射光学系15のように入射した被測定光の分散方向を逆向きにはせず、被測定光の分散方向を変えずに射出している。かかる反射光学系35は、分散方向が逆方向にはならないため波長の分解能が向上しないが、ダイナミックレンジの向上を図ることができる。   Since the reflective optical system 35 reflects the light to be measured an even number of times between the concave mirror 42 and the convex mirror 43, the reflection optical system 35 changes the dispersion direction of the incident light to be measured as in the reflective optical system 15 shown in FIGS. The light is emitted without changing the direction in which the light to be measured is dispersed. The reflective optical system 35 does not improve the wavelength resolution because the dispersion direction is not reversed, but can improve the dynamic range.

尚、図7〜図9に示す反射光学系35においても、反射光学系35の凸面鏡及び凹面鏡の組み合わせとしては、同心であって、凸面鏡と凹面鏡の曲率半径の比がn:n+1(nは正の整数)である凸面鏡及び凹面鏡を用いることができる。かかる関係にある凸面鏡及び凹面鏡を用いた場合には、反射光学系35に入射した被測定光が凹面鏡で2(n+1)回反射されるとともに、凸面鏡で2n回反射された後で、反射光学系35から射出される。上記のnの値を適宜変更することにより、被測定光の入射位置P1と被測定光の射出位置P2との間隔(オフセット)を容易に調整することができる。   7 to 9, the combination of the convex mirror and the concave mirror of the reflective optical system 35 is also concentric, and the ratio of the radius of curvature of the convex mirror and the concave mirror is n: n + 1 (n is a positive value). Convex mirrors and concave mirrors that are integers of When a convex mirror and a concave mirror having such a relationship are used, the light to be measured that has entered the reflective optical system 35 is reflected 2 (n + 1) times by the concave mirror, and after being reflected 2n times by the convex mirror, the reflective optical system Injected from 35. By appropriately changing the value of n described above, the interval (offset) between the incident position P1 of the light to be measured and the emission position P2 of the light to be measured can be easily adjusted.

以上説明した本実施形態による分光装置は、反射光学系15,35の光学部材の数を従来の反射光学系よりも少なくすることができる。このため、装置のコストを安価にすることができるとともに小型化が可能である。また、光学部品の数が少なく、且つ凹面鏡と凸面鏡との間の被測定光の反射回数を変えることで上記のオフセットを調整することができるため、組み立て調整を容易に行うことができる。   The spectroscopic device according to the present embodiment described above can reduce the number of optical members of the reflection optical systems 15 and 35 as compared with the conventional reflection optical system. For this reason, the cost of the apparatus can be reduced and the size can be reduced. In addition, since the number of optical components is small and the offset can be adjusted by changing the number of reflections of the light to be measured between the concave mirror and the convex mirror, assembly adjustment can be easily performed.

以上、本発明の実施形態による分光装置について説明したが、本発明は上記実施形態に制限される訳ではなく、本発明の範囲内で自由に変更が可能である。例えば、上述した反射光学系15,35の凹面鏡及び凸面鏡は個別の光学部材としてもよいが、凸面鏡と凹面鏡との位置調整を省くためにこれらを一体的に形成することが望ましい。例えば、円筒形状のガラス部材の上面を凹形状にするとともに底面を凸形状にし、上面及び底面にクロム(Cr)等の金属を蒸着すれば、上面が凸面鏡であり底面が凹面鏡である光学部材とすることができる。尚、かかる光学部材を形成する場合にも、凸面鏡及び凹面鏡を同心とし、凸面鏡と凹面鏡の曲率半径の比をn:n+1(nは正の整数)にする必要がある。   The spectroscopic device according to the embodiment of the present invention has been described above. However, the present invention is not limited to the above-described embodiment, and can be freely changed within the scope of the present invention. For example, although the concave mirror and the convex mirror of the reflection optical systems 15 and 35 described above may be separate optical members, it is desirable to integrally form the concave mirror and the concave mirror in order to eliminate the positional adjustment. For example, if a cylindrical glass member has a concave top surface and a convex bottom surface, and a metal such as chromium (Cr) is deposited on the top and bottom surfaces, the top surface is a convex mirror and the bottom surface is a concave mirror. can do. Even when such an optical member is formed, it is necessary that the convex mirror and the concave mirror are concentric, and the ratio of the radius of curvature of the convex mirror and the concave mirror is n: n + 1 (n is a positive integer).

更に、凸面鏡及び凹面鏡以外に、スリットも一体化することが望ましい。スリットを一体化する場合には、同じく円筒形状のガラス部材の上面にクロム(Cr)等の金属を蒸着してスリットを形成し、このガラス部材の底面と、凸面鏡及び凹面鏡が形成された光学部材の上面とを接着すれば、スリット、凸面鏡、及び凹面鏡が一体的に形成された光学部材を得ることができる。また更に、図7に示す反射光学系35の場合には、上面にスリットが形成されたガラス部材の上面にリフレクタ44を接着するか、或いはガラス部材の上面の一部をリフレクタ44の形状に成形すれば、スリット、凸面鏡、凹面鏡、及びリフレクタが一体化された光学部材を得ることができる。尚、ガラス部材を使用することにより屈折率の波長依存性の影響が生ずると考えられるが、スリットにより反射光学系に入射する波長領域が制限されるため屈折率の波長依存性による影響は少ない。以上説明した本実施形態の分光装置を用いれば、可視光領域から光通信に用いられる赤外光領域の広範囲に亘る波長領域の測定が可能になる。   Furthermore, it is desirable to integrate the slit in addition to the convex mirror and the concave mirror. In the case of integrating the slit, a slit is formed by vapor-depositing a metal such as chromium (Cr) on the top surface of the cylindrical glass member, and the bottom surface of the glass member and the optical member on which the convex mirror and the concave mirror are formed. If the upper surface is bonded, an optical member in which the slit, convex mirror, and concave mirror are integrally formed can be obtained. Further, in the case of the reflective optical system 35 shown in FIG. 7, the reflector 44 is bonded to the upper surface of the glass member having a slit formed on the upper surface, or a part of the upper surface of the glass member is formed into the shape of the reflector 44. Then, an optical member in which the slit, the convex mirror, the concave mirror, and the reflector are integrated can be obtained. In addition, although it is thought that the influence of the wavelength dependence of a refractive index arises by using a glass member, since the wavelength range which injects into a reflective optical system is restrict | limited by a slit, there is little influence by the wavelength dependence of a refractive index. If the spectroscopic device of the present embodiment described above is used, it is possible to measure the wavelength region over a wide range from the visible light region to the infrared light region used for optical communication.

本発明の一実施形態による分光装置の構成を示す斜視図である。It is a perspective view which shows the structure of the spectroscopic device by one Embodiment of this invention. 反射光学系15を拡大した斜視図である。2 is an enlarged perspective view of a reflective optical system 15. FIG. 反射光学系15の平面図である。2 is a plan view of a reflective optical system 15. FIG. 反射光学系15の側面図である。3 is a side view of the reflective optical system 15. FIG. 反射光学系15の第1変形例を示す側面図である。6 is a side view showing a first modification of the reflective optical system 15. FIG. 反射光学系15の第2変形例を示す側面図である。FIG. 10 is a side view showing a second modification of the reflective optical system 15. 反射光学系の他の構成例を示す斜視図である。It is a perspective view which shows the other structural example of a reflective optical system. 図7に示す他の構成例に係る反射光学系の平面図である。It is a top view of the reflective optical system which concerns on the other structural example shown in FIG. 図7に示す他の構成例に係る反射光学系の側面図である。It is a side view of the reflective optical system which concerns on the other structural example shown in FIG. 従来のダブルパス型の分光装置の構成を示す斜視図である。It is a perspective view which shows the structure of the conventional double pass type | mold spectroscopy apparatus. 反射光学系105を拡大した斜視図である。It is the perspective view which expanded the reflective optical system 105. FIG. 反射光学系105の平面図である。2 is a plan view of a reflective optical system 105. FIG. 従来のダブルパス型の分光装置の他の構成を示す斜視図である。It is a perspective view which shows the other structure of the conventional double pass type | mold spectroscopy apparatus. 反射光学系125を拡大した斜視図である。It is the perspective view which expanded the reflective optical system 125. FIG.

符号の説明Explanation of symbols

10 分光装置
13 回折格子
15 反射光学系
22 凹面鏡
23,26,27 凸面鏡
35 反射光学系
42 凹面鏡
43 凸面鏡
44 リフレクタ
DESCRIPTION OF SYMBOLS 10 Spectrometer 13 Diffraction grating 15 Reflective optical system 22 Concave mirror 23, 26, 27 Convex mirror 35 Reflective optical system 42 Concave mirror 43 Convex mirror 44 Reflector

Claims (3)

波長分散素子と、被測定光を前記波長分散素子に入射させて得られた光を反射の前後において分散方向が逆向きとなるように反射する反射光学系とを備え、前記反射光学系で反射した光を再度前記波長分散素子に入射させて前記被測定光を分光する分光装置において、
前記反射光学系は、同心に配置されて曲率半径の比がn対n+1(nは正の整数)である凸面鏡と凹面鏡とを含み、前記被測定光を前記波長分散素子に入射させて得られた光を前記凸面鏡でn回反射させるとともに、前記凹面鏡でn+1回反射させて分散方向を逆向きにすることを特徴とする分光装置。
A wavelength dispersion element, and a reflection optical system that reflects light obtained by making the light to be measured incident on the wavelength dispersion element so that the dispersion direction is opposite before and after reflection, and is reflected by the reflection optical system In a spectroscopic device for allowing the measured light to enter the wavelength dispersion element again and split the measured light,
The reflective optical system includes a convex mirror and a concave mirror arranged concentrically and having a radius of curvature ratio of n to n + 1 (n is a positive integer), and is obtained by causing the light to be measured to enter the wavelength dispersion element. The spectroscopic apparatus is characterized in that the reflected light is reflected n times by the convex mirror and is reflected n + 1 times by the concave mirror to reverse the dispersion direction .
前記反射光学系は、前記凸面鏡と前記凹面鏡との間で複数回反射された光を反射して、再度前記凸面鏡と前記凹面鏡との間で複数回反射させる反射部材を備えていることを特徴とする請求項1記載の分光装置。The reflection optical system includes a reflecting member that reflects light reflected a plurality of times between the convex mirror and the concave mirror and reflects the light a plurality of times again between the convex mirror and the concave mirror. The spectroscopic device according to claim 1. 前記凸面鏡での合計の反射回数は2n回であり、前記凹面鏡での合計の反射回数は2(n+1)回であることを特徴とする請求項2記載の分光装置。3. The spectroscopic apparatus according to claim 2, wherein the total number of reflections at the convex mirror is 2n, and the total number of reflections at the concave mirror is 2 (n + 1).
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