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JP4841801B2 - Manufacturing method of high purity titanium ingot - Google Patents
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JP4841801B2 - Manufacturing method of high purity titanium ingot - Google Patents

Manufacturing method of high purity titanium ingot Download PDF

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Publication number
JP4841801B2
JP4841801B2 JP2003120053A JP2003120053A JP4841801B2 JP 4841801 B2 JP4841801 B2 JP 4841801B2 JP 2003120053 A JP2003120053 A JP 2003120053A JP 2003120053 A JP2003120053 A JP 2003120053A JP 4841801 B2 JP4841801 B2 JP 4841801B2
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raw material
particle size
ingot
material grains
titanium
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JP2004323911A (en
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清 大塚
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Osaka Titanium Technologies Co Ltd
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Osaka Titanium Technologies Co Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、半導体用の配線材料等として好適に使用される高純度チタンインゴットの製造方法に関する。
【0002】
【従来の技術】
従来より、金属チタンインゴットは、クロール法によりスポンジチタンを製造し、これを溶解原料粒へ加工した後、不活性雰囲気中で溶解することにより製造される。半導体用の配線材料等に使用される高純度チタンインゴットの場合、各工程で次のような対策が講じられている。
【0003】
クロール法によるスポンジチタンの製造では、反応容器の内面を鉄にしてスポンジチタン製品のCr、Niによる汚染を防止することなどにより、スポンジチタン製品の高純度化が図られる。
【0004】
溶解原料粒への加工の際には、まず、反応容器内に生成された高純度スポンジチタン塊のなかから、特に不純物汚染が少ない中心部を採取する。スポンジチタン塊の中心採り技術は、例えば特許文献1に詳しく説明されている。
【0005】
【特許文献1】
特開平9−111361号公報
【0006】
スポンジチタン塊の中心部から採取された円柱状の中心塊は、高さ方向で複数の円盤状小塊に切断分割される。これは、中心塊といえども、その高さ方向で不純物濃度が相違するためである。円柱状の中心塊から円盤状の小塊を採取する操作やその円盤状の小塊は分塊と呼ばれている。そして、各分塊の細粒化には、展伸材用スポンジチタン塊の場合と異なり、切断プレスなどの切断手段が使用される。
【0007】
即ち、高純度を要求されない展伸材用のスポンジチタンの場合は、スポンジチタン塊がジョークラッシャーなどの破砕手段により平均粒径で1〜10mm程度まで細粒化され、更にブレンダーを混ぜることで均質化が図られる。ところが、半導体用の配線材料等として使用される高純度スポンジチタンの場合は、ジョークラッシャーなどの破砕手段を用いると、不純物の混入が問題になる。このため、高純度スポンジチタン塊(分塊)の細粒化には、切断プレスなどの切断手段が使用される。
【0008】
【発明が解決しようとする課題】
高純度スポンジチタン塊の細粒化に切断プレスなどの切断手段を用いると、細粒化工程における不純物汚染が最小限に抑制される。しかしながら、切断手段による細粒化では、小さく均一な溶解原料粒を得ることが困難であり、その粒径が例えば10〜300mmと広範囲にばらつくことになる。
【0009】
ところで、クロール法によって製造されたスポンジチタンでは、細粒化の後、溶解にあたって不純物分析が行われ、その分析結果から溶解後のインゴットの不純物濃度が予見される。半導体用の配線材料等として使用される高純度スポンジチタンの場合は、特にこの溶解原料粒の不純物分析が重要なのは言うまでもないことであり、各分塊ごとに溶解原料粒をサンプリングして正確な不純物分析を行い、必要なインゴット品質が得られるように分塊単位で溶解原料粒を選択使用することが求められる。
【0010】
しかしながら、切断プレスなどの切断手段による細粒化では、粒径が例えば10〜300mmと広範囲にばらつき、これがためにサンプリング分析が困難になる。なぜなら、大粒径の場合、サンプリング作業が容易でない上に、各分塊の量に対して粒径が小さくないとサンプリング分析の精度を確保できない事情があり、更には分析用の溶解に大型の炉が必要となるからである。このような事情から、正確な不純物分析のためには、粒径は最大で75mmが限度と考えられる。
【0011】
そして、高純度スポンジチタンの場合、品質優先の観点から、切断手段で各分塊を最大粒径が75mm以下になるまで無理に細粒化しているが、極端な工数増加が問題になる。また、細粒の確保が困難な事情に鑑み、粒径範囲が10〜300mmのまま、サンプリング分析なしで溶解を行うことも試みた。この場合は、工数増加の問題は解決されるものの、溶解後のインゴットの不純物濃度を正確に予見できないため、スポンジチタンからチタンインゴットまでの通算歩留りが極端に悪化することになる。ちなみに、通算歩留りとは数式1で表される数値である。
【0012】
【数1】
(通算歩留り)=(高純度チタン規格に合格した中心部の歩留り)×(高純度チタン規格に合格したチタンインゴットの歩留り)×(チタンインゴットにおける製品歩留り)
【0013】
このようなことから、溶解原料粒の最大粒径を小さくせずとも、溶解前のサンプリング分析による不純物濃度と溶解後のインゴットの不純物濃度との相関を良くできるインゴット製造法の開発が待たれている。
【0014】
本発明はかかる要望に応えるものであり、最大粒径を大きくすることにより細粒化コストを抑制でき、なおかつ製品インゴットの不純物濃度を正確に予見することにより、必要な純度のインゴットを確実に製造できる高純度チタンインゴットの製造方法を提供することを目的とする。
【0015】
【課題を解決するための手段】
上記目的を達成するために、本発明者は切断手段による細粒化により得られた広い粒度範囲の溶解原料粒のなかから、サンプリング分析に適した細粒を篩い分けにより一部抽出することを企画し、抽出した細粒サンプルが、品質の上で、元のグループ内の粒全体を代表できるか否かについて詳細な調査を行った。その結果、1ブロックを切断手段により通常に細粒化して得られた広い粒度範囲の溶解原料粒のなかから篩い分けにより抽出した細粒サンプルの分析結果は、1ブロック全体を細粒に切断してからその一部をサンプリングして分析に供した結果を正確に反映するものであることが判明した。そして、このような篩い分けによる細粒サンプルの抽出によれば、細粒化における最大粒径をサンプリング分析に適したレベルまで小さくする必要がなく、細粒化コストを抑制できると共に、溶解原料粒の不純物濃度を正確に分析でき、これから製造されるチタンインゴットの不純物濃度を正確に予見できる。
【0016】
本発明の高純度チタンインゴットの製造方法は、かかる知見に基づいて開発されたものであり、クロール法により製造されたスポンジチタン塊の中心部を取り出し、これを切断手段により粒状に加工した後、不活性雰囲気中で溶解して高純度チタンインゴットを製造する高純度チタンインゴットの製造方法において、前記スポンジチタン塊の中心部を溶解原料粒に加工する際、前記中心部を高さ方向で複数の小塊に分け、各小塊ごとに、粒径の下限が20〜50mm、その粒径の上限が100〜300mmの溶解原料粒を得ると共に、得られた溶解原料粒から粒径が75mmを超えるものを除いてサンプリングして不純物分析を行い、その分析値により各小塊の不純物濃度を代表させ、要求される不純物濃度の製品が得られるように、その不純物濃度に合致した小塊を選出するか、或いは複数の小塊を組み合わせることにより、溶解原料粒を選定して溶解に供することを特徴としている。なお不活性雰囲気中とは、アルゴンなどの不活性ガス雰囲気又は真空中のことである。
【0017】
すなわち、本発明の高純度チタンインゴットの製造方法では、スポンジチタン塊の中心部を溶解原料粒に細粒化加工する際に、前記中心部を高さ方向で複数の小塊に分け、各小塊ごとにサンプリングを行う。具体的には、前記中心部を高さ方向で複数の小塊に分割し、各小塊、即ち各分塊ごとに溶解原料粒に加工してサンプリングを行うか、前記中心部に対して高さ方向で分塊と同時に細粒化して、小塊単位でサンプリングを行う。なぜなら、中心部といえども高さ方向で不純物濃度に差があるため、その高さ方向で複数の小塊に分割することにより、より細かな品質区分が可能となり、インゴット製品の品質精度が向上する。即ち、分塊ごとの品質の均一性が向上するため、サンプリング分析値の精度が上がり、溶解後のインゴットの不純物濃度との相関が上がるのである。
【0018】
溶解原料粒の粒径の下限については、10mm未満を含むと微細粒が増加することによる表面積の増加等により不純物濃度の抑制が困難となり、50mm超では溶解原料粒の歩留り低下が問題になる。特に望ましい下限は20〜50mm、なかでも20〜40mmである。粒径の上限を100〜300mmとしたのは、100mm未満では切断手段による細粒化での工数増加が問題になり、300mm超ではVAR溶解にあたって消耗電極を作製するときの圧縮成形性やEB溶解時の原料投入方法に問題を生じるからである。
【0019】
そして、本発明ではこのような比較的広い粒径範囲に細粒化加工された溶解原料粒のなかから、粒径が75mmを超えるものを除いてサンプリングし不純物分析する。換言すると、前記溶解原料粒のなかから、粒径が75mm以下のものを分級により抽出してサンプリングし不純物分析に供する。これにより、切断手段を用いた細粒化の工程で無理な細粒化を行わずとも、正確なサンプリング分析が可能となる。
【0020】
【発明の実施の形態】
以下に本発明の実施形態を図面を参照して説明する。図1は中心採りを説明するためのスポンジチタン塊の立面図である。
【0021】
本実施形態では、まずクロール法により高純度スポンジチタンを製造する。クロール法によるスポンジチタンの製造では、還元工程、真空分離工程を経て反応容器内にスポンジチタン塊が製造される。還元工程では、反応容器内に収容された溶融Mgに対して四塩化チタンが滴下され、その四塩化チタンをMgで還元することよりスポンジチタン塊が製造される。真空分離工程では、反応容器を加熱し、その反応容器に接続された別の反応容器内を減圧することより、スポンジチタン塊に取り込まれていた未反応のMg及び副生した塩化Mgを分離し、別の反応容器内に回収する。
【0022】
反応容器内に製造されるスポンジチタン塊の高純度化のために、反応容器の容器本体を外面側がステンレス鋼、内面側が炭素鋼からなる複合材により構成する。容器本体の内面側を炭素鋼とすることにより、スポンジチタン塊のCr及びNiによる汚染が防止される。また、外面側のステンレス鋼により高温強度が確保される。
【0023】
こうして反応容器内に高純度スポンジチタン塊が製造されると、これを容器外へ取り出す。そして、図1に示すように、高純度スポンジチタン塊1の表層部、具体的には上端部、下端部及び外周部を切り捨てることにより、特に純度が高い中心部を採取する。この中心採りで除去する範囲は、スポンジチタン塊の上端から全高の10%以上、下端から全高の25%以上、外周から直径の18%以上の範囲が好ましい。高純度化の点からは除去範囲を広くするほど好ましいが、一方で歩留りが低下するので、高純度スポンジチタン塊重量の30%未満に相当する部分が好ましい。
【0024】
この中心採りにより、高純度スポンジチタン塊1の中心部からより高純度の円柱状スポンジチタン塊(中心塊2)が得られると、この中心塊2を切断手段により高さ方向で複数の円盤状ブロック(分塊3,3・・・)に分割する。分割数は通常4〜6である。そして、各分塊3の独立性を維持しつつ(他の分塊との間でスポンジチタン粒が混じり合わないようにして)、各分塊3を切断手段により細粒化する。
【0025】
分塊後に細粒化を行う代わりに、分塊と同時に細粒化を行ってもよい。即ち、中心採りの後、中心塊の高さ方向一端から切断手段により薄く削りながら細粒化を行い、1分塊に相当する所定量の細粒を得たところで、次の分塊について細粒化を行うという方法でも、高さ方向で細分された品質別の溶解原料粒を得ることができる。
【0026】
切断手段としては、液圧式のギロチンプレスやシャーリングなどを用いることができる。これらはジョークラッシャなどの破砕手段と比べて細粒化時の金属汚染を大幅に軽減でき、なかでもギロチンプレスが汚染防止の点から好ましい。スポンジチタン塊は硬く、これを切断手段で薄くスライスしていくことにより、粒径範囲は広いものの、不純物汚染を抑えた高純度の溶解原料粒が得られる。
【0027】
こうして例えば粒径範囲が20〜300mmの溶解原料粒が、分塊3ごとに得られる。各分塊3から得られた溶解原料粒に対しては、独立性を維持しつつ、篩い分けを行い、例えば粒径範囲が20〜75mmの溶解原料粒を抽出する。例えば、粒径範囲が20〜75mmの溶解原料粒を取り出す場合は、メッシュ75mmの篩を使用することにより、粒径範囲が20〜300mmの溶解原料粒を、20〜75mmの細粒と75mm超300mm以下の粗粒とに分級するわけである。そして、細粒のみをサンプリングして不純物分析に供し、その細粒の分析値で分塊3の不純物濃度を代表する。
【0028】
篩い分け作業は、分塊3の全体を切断手段で75mm以下に細粒化する作業と比べて格段に簡単である。篩い分けにより得られた細粒は、サンプリング分析に問題なく適用でき、なおかつ分塊3の全体を代表できる精度の分析値を示す。従って、溶解原料粒の最大粒径を小さくせずとも(例えば300mmのままで)、分塊3の不純物濃度を正確に分析することが可能となる。
【0029】
各分塊3ごとに溶解原料粒の不純物濃度が正確に分析されると、各分析値から、各分塊3から製造される製品インゴットの不純物濃度が正確に予見される。これにより、所望の製品品質を精度よく且つ経済的に得ることができる。即ち、要求される製品品質が得られるよう、その品質に合致した品質の分塊3を選び出す。また、複数の分塊3を組み合わせる。複数の分塊3の組み合わせにより、高純度の分塊のみならず、若干純度の劣る分塊も合わせて使用することができるようになり、経済性も向上する。
【0030】
こうして溶解原料粒の選定が終わると、選定された原料粒を不活性雰囲気中で溶解して製品インゴットとなす。具体的には、VARやEB溶解等により、製品インゴットを製造する。溶解原料粒の選定が厳密に行われているため、所望の品質のインゴットが高い歩留りで製造される。
【0031】
【実施例】
次に、本発明の実施例を従来例と比較することにより、本発明の効果を明らかにする。
【0032】
(従来例1)
クロール法により製造した高純度スポンジチタン塊の中心部からスポンジチタン塊(中心塊)を採取し、これを液圧式ギロチンプレスにより分塊し、溶解原料粒へ細粒化した後、溶解に供する際に、溶解原料粒の粒度範囲を通常の10〜300mmとした。工数の増加はないが、溶解原料粒のサンプリング分析ができなかったため、前述した通算歩留りは5.0%であった。
【0033】
(従来例2)
中心塊の全てを、液圧式ギロチンプレスにより粒径範囲が10〜75mmの細粒に細粒化した。工数は約3倍に増加した。ただし、溶解原料粒のサンプリング分析が可能となり、この分析結果に基づく原料選定を行った結果、前述した通算歩留りは8.6%に向上した。
【0034】
比較例
中心塊の全てを、液圧式ギロチンプレスにより粒径範囲が10〜75mmの細粒に細粒化する代わりに、液圧式ギロチンプレスによる溶解原料粒の粒度範囲は通常の10〜300mmのままとし、篩い分けにより粒径範囲が10〜75mmのサンプリング分析用細粒を分離した。この細粒に対してサンプリング分析を行い、この分析結果に基づく原料選定を行った結果、前述した通算歩留りとして9.1%が得られた。工数は従来例1と実質同一である。
【0035】
実施例
液圧式ギロチンプレスによる溶解原料粒の粒度範囲を20〜300mmとし、篩い分けにより粒径範囲が20〜75mmのサンプリング分析用細粒を得た。この細粒に対してサンプリング分析を行い、この分析結果に基づく原料選定を行った結果、前述した通算歩留りとして11.5%が得られた。工数は従来例1と実質同一である。
【0036】
これらの結果を表1にまとめて示す。何れにおいてもサンプリング分析を行うにもかかわらず、通算歩留りが従来例2、比較例実施例の順で増大しているのは次の理由による。従来例2では、篩下が増加し、粒度10mm以下のスポンジチタンが増えたことにより中心採り歩留りは減少したが、インゴットでの成分分析精度が向上したので、通算歩留りは従来例1より増加した。比較例では、成分分析用サンプルのバラツキのため、インゴットでの歩留りは幾分減少したが、粒度範囲を300mmまで拡大したため、中心採り歩留りは増加し、通算歩留りは従来例2より増加した。実施例では、粒度を20mm未満でカットすることで、比較例より中心採り歩留りは減少したが、インゴットでの成分分析精度向上により、通算歩留りは最も増加した。
【0037】
【表1】

Figure 0004841801
【0038】
【発明の効果】
以上に説明したとおり、本発明の高純度チタンインゴットの製造方法は、スポンジチタン塊の中心部を溶解原料粒に加工する際、溶解原料粒の粒径の下限を20〜50mm、その粒径の上限を100〜300mmとし、得られた溶解原料粒から粒径が75mmを超えるものを除いてサンプリングして不純物分析を行い、その分析結果から予見される製品品質に基づき、所定の製品品質が得られるように溶解原料粒を選定して溶解に供することにより、最大粒径を無理に小さくする必要がなくなるので、細粒化コストを抑制できる。また、最大粒径を小さくせずとも製品インゴットの不純物濃度を正確に予見でき、これにより必要な純度のインゴットを確実に製造できる。
【図面の簡単な説明】
【図1】中心採りを説明するためのスポンジチタン塊の立面図である。
【符号の説明】
1 スポンジチタン塊
2 中心塊
3 分塊[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for producing a high-purity titanium ingot that is suitably used as a wiring material for semiconductors.
[0002]
[Prior art]
Conventionally, a metal titanium ingot is manufactured by manufacturing sponge titanium by a crawl method, processing this into dissolved raw material grains, and then dissolving it in an inert atmosphere. In the case of a high-purity titanium ingot used as a wiring material for semiconductors, the following measures are taken in each process.
[0003]
In the production of sponge titanium by the crawl method, the purity of the sponge titanium product can be increased by making the inner surface of the reaction vessel iron and preventing contamination of the sponge titanium product with Cr and Ni.
[0004]
When processing into melted raw material grains, first, a central portion with particularly low impurity contamination is collected from the high-purity sponge titanium lump produced in the reaction vessel. The technique of centering the sponge titanium mass is described in detail in, for example, Patent Document 1.
[0005]
[Patent Document 1]
JP-A-9-111361 [0006]
A columnar central lump collected from the center of the titanium sponge lump is cut and divided into a plurality of disk-shaped small lump in the height direction. This is because even in the central mass, the impurity concentration differs in the height direction. The operation of collecting a disk-shaped small lump from a cylindrical central lump and the disk-shaped small lump are called a divided lump. Then, unlike the case of the sponge titanium lump for wrought material, a cutting means such as a cutting press is used for refining each chunk.
[0007]
That is, in the case of sponge titanium for wrought material that does not require high purity, the sponge titanium lump is refined to an average particle size of about 1 to 10 mm by a crushing means such as a jaw crusher, and further homogenized by mixing a blender. Is achieved. However, in the case of high-purity sponge titanium used as a wiring material for semiconductors and the like, if crushing means such as a jaw crusher is used, mixing of impurities becomes a problem. For this reason, cutting means, such as a cutting press, are used for refinement | miniaturization of a high purity sponge titanium lump (fraction lump).
[0008]
[Problems to be solved by the invention]
When a cutting means such as a cutting press is used for atomizing the high-purity titanium sponge mass, impurity contamination in the atomizing process is minimized. However, it is difficult to obtain small and uniform dissolved raw material grains by the finer means by the cutting means, and the particle diameter varies widely, for example, from 10 to 300 mm.
[0009]
By the way, in the sponge titanium manufactured by the crawl method, after the fine granulation, the impurity analysis is performed in the dissolution, and the impurity concentration of the ingot after the dissolution is predicted from the analysis result. In the case of high-purity sponge titanium used as a wiring material for semiconductors, it is needless to say that the analysis of impurities in the dissolved raw material grains is particularly important. It is required to perform analysis and select and use the melted raw material grains in units of chunks so that the required ingot quality can be obtained.
[0010]
However, when the particle size is reduced by a cutting means such as a cutting press, the particle size varies over a wide range, for example, 10 to 300 mm, which makes sampling analysis difficult. This is because in the case of a large particle size, the sampling operation is not easy, and there is a situation in which the accuracy of the sampling analysis cannot be ensured unless the particle size is small with respect to the amount of each chunk. This is because a furnace is required. For these reasons, it is considered that the maximum particle size is 75 mm for accurate impurity analysis.
[0011]
In the case of high-purity sponge titanium, from the viewpoint of quality priority, each chunk is forcibly finely divided by a cutting means until the maximum particle size becomes 75 mm or less, but an extreme increase in the number of steps is a problem. Moreover, in view of the situation where it is difficult to secure fine particles, an attempt was made to perform dissolution without sampling analysis while the particle size range was 10 to 300 mm. In this case, although the problem of increase in the number of man-hours is solved, the total yield from sponge titanium to titanium ingot is extremely deteriorated because the impurity concentration of the ingot after melting cannot be accurately predicted. By the way, the total yield is a numerical value expressed by Equation 1.
[0012]
[Expression 1]
(Total yield) = (Yield of the center that passed the high purity titanium standard) x (Yield of the titanium ingot that passed the high purity titanium standard) x (Product yield of the titanium ingot)
[0013]
For this reason, development of an ingot production method that can improve the correlation between the impurity concentration obtained by sampling analysis before melting and the impurity concentration of the ingot after melting is awaited without reducing the maximum particle size of the melting raw material grains. Yes.
[0014]
The present invention responds to such a demand, and it is possible to reduce the cost of refining by increasing the maximum particle size and to accurately produce the ingot of the required purity by accurately predicting the impurity concentration of the product ingot. It aims at providing the manufacturing method of the high purity titanium ingot which can be performed.
[0015]
[Means for Solving the Problems]
In order to achieve the above-mentioned object, the present inventor is to extract a part of fine particles suitable for sampling analysis by sieving from a wide range of dissolved raw material particles obtained by finely pulverizing with a cutting means. A detailed survey was conducted to determine whether the fine grain samples planned and extracted could represent the whole grains in the original group in terms of quality. As a result, the analysis result of the fine-grained sample extracted by sieving from the melted raw material grains in a wide particle size range obtained by normally finely pulverizing one block by cutting means is that the whole block is cut into fine grains. After that, it was found that some of them were accurately sampled and used for analysis. And, according to the extraction of the fine grain sample by such sieving, it is not necessary to reduce the maximum particle size in the fine graining to a level suitable for sampling analysis, and it is possible to suppress the fine grain cost and dissolve the raw material grains. Thus, the impurity concentration of the titanium ingot produced from this can be accurately predicted.
[0016]
The method for producing a high purity titanium ingot of the present invention was developed based on such knowledge, and after taking out the central part of the sponge titanium mass produced by the crawl method and processing it into a granular shape by a cutting means, In the method for producing a high purity titanium ingot that is melted in an inert atmosphere to produce a high purity titanium ingot, when the central portion of the sponge titanium lump is processed into a melting raw material grain, the central portion has a plurality of height directions. Divided into small lumps, for each of the small lumps, obtained are melted raw material grains having a particle size lower limit of 20 to 50 mm and an upper limit of particle size of 100 to 300 mm, and the particle diameter of the obtained melted raw material particles exceeds 75 mm. The sample is sampled and analyzed for impurities, and the analysis value is used to represent the impurity concentration of each small lump, so that a product with the required impurity concentration can be obtained. It is characterized by selecting a melting raw material particle for melting by selecting a small lump that matches the pure substance concentration or by combining a plurality of small lumps. In addition, in inert atmosphere is inert gas atmosphere, such as argon, or a vacuum.
[0017]
That is, in the method for producing a high-purity titanium ingot of the present invention, when the center portion of the sponge titanium lump is refined into a melt raw material grain, the center portion is divided into a plurality of small lump in the height direction, Sampling is done for each lump. Specifically, the central portion is divided into a plurality of small chunks in the height direction, and each small chunk, that is, each batch, is processed into a melted raw material grain for sampling, or is higher than the central portion. In the vertical direction, the particles are refined at the same time as the chunks, and sampling is performed in units of small chunks. Because even in the center, there is a difference in the impurity concentration in the height direction, and by dividing it into multiple small blocks in the height direction, finer quality classification becomes possible and the quality accuracy of ingot products improves To do. That is, since the uniformity of quality for each chunk is improved, the accuracy of the sampling analysis value is increased, and the correlation with the impurity concentration of the ingot after melting is increased.
[0018]
As for the lower limit of the particle diameter of the dissolved raw material grains, when it is less than 10 mm, it is difficult to suppress the impurity concentration due to an increase in surface area due to an increase in fine grains, and when it exceeds 50 mm, the yield of the dissolved raw material grains decreases. A particularly desirable lower limit is 20 to 50 mm, particularly 20 to 40 mm. The reason why the upper limit of the particle size is set to 100 to 300 mm is that if it is less than 100 mm , an increase in the number of man-hours due to fine graining by cutting means becomes a problem. Ru der because cause problems in raw material input method when.
[0019]
In the present invention, the dissolved raw material grains refined into such a relatively wide particle size range are sampled except for those having a particle size exceeding 75 mm and analyzed for impurities. In other words, particles having a particle size of 75 mm or less are extracted from the dissolved raw material particles by classification, sampled, and subjected to impurity analysis. Thus, accurate sampling analysis can be performed without excessively reducing the size of the particles by using the cutting means.
[0020]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an elevational view of a titanium sponge lump for explaining centering.
[0021]
In this embodiment, first, high purity sponge titanium is produced by a crawl method. In the production of sponge titanium by the crawl method, a sponge titanium lump is produced in the reaction vessel through a reduction process and a vacuum separation process. In the reduction step, titanium tetrachloride is dropped into the molten Mg accommodated in the reaction vessel, and a titanium sponge mass is produced by reducing the titanium tetrachloride with Mg. In the vacuum separation step, unreacted Mg and by-product Mg chloride taken into the sponge titanium mass are separated by heating the reaction vessel and reducing the pressure in another reaction vessel connected to the reaction vessel. Collect in a separate reaction vessel.
[0022]
In order to increase the purity of the sponge titanium mass produced in the reaction vessel, the vessel main body of the reaction vessel is constituted by a composite material made of stainless steel on the outer surface side and carbon steel on the inner surface side. By using carbon steel for the inner surface side of the container body, contamination of the sponge titanium lump with Cr and Ni is prevented. Moreover, high temperature strength is ensured by the stainless steel on the outer surface side.
[0023]
When a high-purity sponge titanium mass is thus produced in the reaction vessel, it is taken out of the vessel. And as shown in FIG. 1, the center part with especially high purity is extract | collected by discarding the surface layer part of the high purity sponge titanium lump 1, specifically an upper end part, a lower end part, and an outer peripheral part. The range to be removed by centering is preferably a range of 10% or more of the total height from the upper end of the sponge titanium block, 25% or more of the total height from the lower end, and 18% or more of the diameter from the outer periphery. From the viewpoint of high purity, it is preferable to increase the removal range. On the other hand, since the yield decreases, a portion corresponding to less than 30% of the weight of the high purity sponge titanium lump is preferable.
[0024]
When a center of the high-purity sponge titanium lump 1 is obtained by this centering to obtain a higher-purity cylindrical sponge titanium lump (center lump 2), the central lump 2 is cut into a plurality of disk shapes in the height direction by cutting means. Divide into blocks (Segments 3, 3 ...). The number of divisions is usually 4-6. Then, while maintaining the independence of each of the chunks 3 (so that the sponge titanium particles do not mix with other chunks), each of the chunks 3 is refined by a cutting means.
[0025]
Instead of performing the granulation after the smashing, the smashing may be performed simultaneously with the smashing. That is, after centering, finely pulverizing while cutting thinly from one end in the height direction of the central mass with a cutting means, and obtaining a predetermined amount of fine particles corresponding to one partial mass, Even by the method of crystallization, it is possible to obtain dissolved raw material grains classified by quality in the height direction.
[0026]
As the cutting means, a hydraulic guillotine press or shearing can be used. These can significantly reduce metal contamination at the time of refining as compared with a crushing means such as a jaw crusher. Among them, a guillotine press is preferable from the viewpoint of preventing contamination. The titanium sponge lump is hard, and by slicing it thinly with a cutting means, a high-purity dissolved raw material particle with reduced impurity contamination can be obtained although the particle size range is wide.
[0027]
Thus, for example, melted raw material grains having a particle size range of 20 to 300 mm are obtained for each of the chunks 3. The dissolved raw material grains obtained from the respective chunks 3 are screened while maintaining independence, and for example, dissolved raw material grains having a particle size range of 20 to 75 mm are extracted. For example, when taking out melted raw material grains having a particle size range of 20 to 75 mm, by using a sieve with a mesh of 75 mm, the melted raw material grains having a particle size range of 20 to 300 mm are mixed with fine particles of 20 to 75 mm and more than 75 mm. It is classified into coarse particles of 300 mm or less. Then, only fine particles are sampled and subjected to impurity analysis, and the impurity concentration of the chunk 3 is represented by the analysis value of the fine particles.
[0028]
The sieving operation is much simpler than the operation of making the whole chunk 3 finer to 75 mm or less with a cutting means. The fine particles obtained by sieving can be applied to sampling analysis without any problem, and show an analysis value with an accuracy that can represent the whole of the chunk 3. Accordingly, it is possible to accurately analyze the impurity concentration of the chunk 3 without reducing the maximum particle diameter of the dissolved raw material grains (for example, as it is at 300 mm).
[0029]
When the impurity concentration of the dissolved raw material grains is accurately analyzed for each of the chunks 3, the impurity concentration of the product ingot produced from each of the chunks 3 is accurately predicted from each analysis value. Thereby, desired product quality can be obtained accurately and economically. That is, the mass 3 that matches the quality is selected so that the required product quality can be obtained. A plurality of chunks 3 are combined. By combining a plurality of shards 3, not only high-purity shards but also slightly inferior slums can be used together, and economic efficiency is improved.
[0030]
When the selection of the melted raw material grains is completed in this way, the selected raw material grains are melted in an inert atmosphere to form a product ingot. Specifically, a product ingot is manufactured by VAR, EB dissolution, or the like. Since the selection of the melting raw material grains is strictly performed, an ingot of a desired quality is manufactured with a high yield.
[0031]
【Example】
Next, the effect of the present invention will be clarified by comparing an example of the present invention with a conventional example.
[0032]
(Conventional example 1)
When collecting sponge titanium lumps (center lumps) from the center of high purity sponge titanium lumps produced by the crawl method, dividing them with a hydraulic guillotine press, making them into dissolved raw material grains, and then subjecting them to dissolution In addition, the particle size range of the melted raw material grains was set to the usual 10 to 300 mm. Although there was no increase in the number of man-hours, the total yield mentioned above was 5.0% because sampling analysis of dissolved raw material grains could not be performed.
[0033]
(Conventional example 2)
All of the central mass was finely divided into fine particles having a particle size range of 10 to 75 mm by a hydraulic guillotine press. The man-hour has increased about 3 times. However, sampling analysis of dissolved raw material grains became possible, and as a result of selecting raw materials based on the analysis results, the above-mentioned total yield was improved to 8.6%.
[0034]
( Comparative example )
Instead of refining all of the central mass into fine particles having a particle size range of 10 to 75 mm by a hydraulic guillotine press, the particle size range of the dissolved raw material particles by the hydraulic guillotine press is kept at the usual 10 to 300 mm, Fine particles for sampling analysis having a particle size range of 10 to 75 mm were separated by sieving. Sampling analysis was performed on the fine granules, and raw materials were selected based on the analysis results. As a result, the above-mentioned total yield was 9.1%. The number of man-hours is substantially the same as in Conventional Example 1.
[0035]
( Example )
Fine particles for sampling analysis having a particle size range of 20 to 75 mm were obtained by sieving by setting the particle size range of dissolved raw material particles by a hydraulic guillotine press to 20 to 300 mm. Sampling analysis was performed on the fine granules, and raw materials were selected based on the analysis results. As a result, the above-mentioned total yield was 11.5%. The number of man-hours is substantially the same as in Conventional Example 1.
[0036]
These results are summarized in Table 1. Regardless of whether sampling analysis is performed in any case, the total yield increases in the order of Conventional Example 2, Comparative Example , and Example for the following reason. In Conventional Example 2, the centering yield decreased due to an increase in sieves and an increase in sponge titanium having a particle size of 10 mm or less. However, since the component analysis accuracy in the ingot was improved, the total yield increased from Conventional Example 1. . In the comparative example , the yield in the ingot was somewhat reduced due to variations in the sample for component analysis, but since the particle size range was expanded to 300 mm, the center yield was increased and the total yield was increased from the conventional example 2. In the examples , by cutting the grain size at less than 20 mm, the center yield was reduced as compared with the comparative example , but the total yield increased most due to the improved component analysis accuracy in the ingot.
[0037]
[Table 1]
Figure 0004841801
[0038]
【The invention's effect】
As described above, the high purity titanium ingot manufacturing method of the present invention has a lower limit of the particle size of the dissolved raw material particles of 20 to 50 mm when the center part of the sponge titanium lump is processed into the dissolved raw material particles. The upper limit is set to 100 to 300 mm, and the obtained dissolved raw material grains are sampled except for those having a particle size exceeding 75 mm to perform impurity analysis, and a predetermined product quality is obtained based on the product quality predicted from the analysis result. As described above, by selecting the melting raw material grains and subjecting them to melting, it is not necessary to forcibly reduce the maximum particle diameter, so that the cost for refining can be suppressed. In addition, the impurity concentration of the product ingot can be accurately predicted without reducing the maximum particle size, so that an ingot having the required purity can be reliably produced.
[Brief description of the drawings]
FIG. 1 is an elevational view of a titanium sponge lump for explaining centering.
[Explanation of symbols]
1 Titanium sponge lump 2 Central lump 3 Split lump

Claims (1)

クロール法により製造されたスポンジチタン塊の中心部を取り出し、これを切断手段により粒状に加工した後、不活性雰囲気中で溶解して高純度チタンインゴットを製造する高純度チタンインゴットの製造方法において、前記スポンジチタン塊の中心部を溶解原料粒に加工する際、前記中心部を高さ方向で複数の小塊に分け、各小塊ごとに、粒径の下限が20〜50mm、その粒径の上限が100〜300mmの溶解原料粒を得ると共に、得られた溶解原料粒から粒径が75mmを超えるものを除いてサンプリングして不純物分析を行い、その分析値により各小塊の不純物濃度を代表させ、要求される不純物濃度の製品品質が得られるように、その不純物濃度に合致した小塊を選出するか、或いは複数の小塊を組み合わせることにより、溶解原料粒を選定して溶解に供することを特徴とする高純度チタンインゴットの製造方法。In the method for producing a high-purity titanium ingot that takes out the central part of the sponge titanium mass produced by the crawl method, processes it into a granular shape by a cutting means, and then dissolves it in an inert atmosphere to produce a high-purity titanium ingot. When processing the central part of the sponge titanium mass into dissolved raw material grains, the central part is divided into a plurality of small masses in the height direction, and for each small mass, the lower limit of the particle size is 20 to 50 mm. While obtaining the melted raw material grains having an upper limit of 100 to 300 mm, sampling the obtained melted raw material grains excluding those having a particle size exceeding 75 mm, and performing impurity analysis, and the impurity concentration of each small mass is represented by the analysis value It is allowed, as product quality required impurity concentration is obtained, by combining or selecting a blob that match the impurity concentration, or a plurality of nodules, dissolved A method for producing a high-purity titanium ingot, comprising selecting raw material grains and subjecting them to melting.
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