JP4855060B2

JP4855060B2 - Optical element manufacturing method

Info

Publication number: JP4855060B2
Application number: JP2005360553A
Authority: JP
Inventors: 博雄木下; 健夫渡邊
Original assignee: Japan Science and Technology Agency; National Institute of Japan Science and Technology Agency
Current assignee: Japan Science and Technology Agency; National Institute of Japan Science and Technology Agency
Priority date: 2005-12-14
Filing date: 2005-12-14
Publication date: 2012-01-18
Anticipated expiration: 2025-12-14
Also published as: JP2007163311A

Description

本発明は、所定の光学特性を呈する光学膜を有する光学素子を製造する光学素子製造方法に関するものである。 The present invention relates to an optical element manufacturing method for manufacturing an optical element having an optical film exhibiting predetermined optical characteristics.

Ｘ線顕微鏡は、光源として用いるＸ線の波長領域が可視光よりも非常に短いため、可視光を光源として用いた光学顕微鏡と比べて高解像度の画像が得られ、生体、電子及び材料などの様々な分野で広く利用されている。Ｘ線顕微鏡は、Ｘ線光源から放出されるＸ線の波長領域に対して、分析に使用する波長領域以外の波長成分を除去する必要がある。したがって、Ｘ線顕微鏡には、所望とする特定の波長領域の光を選択して透過させる、いわゆるＸ線フィルタが広く用いられている。Ｘ線は、物質に対して非常に吸収率が高い。したがって、Ｘ線フィルタは、透過対象となる波長領域の光が当該フィルタに形成された光学膜にできるだけ吸収されにくくするために、μｍ単位の厚さの薄膜状に形成される必要がある。このＸ線フィルタは、選択的に光を透過させる光学膜を外力から保護するために、その周囲を覆う枠体を設けている。このような枠体には、例えば、Ｓｉ基板やガラス基板などの基板が広く用いられる。 Since the X-ray microscope uses an X-ray wavelength region that is much shorter than visible light, the X-ray microscope can obtain a higher resolution image than an optical microscope that uses visible light as a light source. Widely used in various fields. The X-ray microscope needs to remove wavelength components other than the wavelength region used for analysis from the wavelength region of X-rays emitted from the X-ray light source. Therefore, so-called X-ray filters that select and transmit light in a desired specific wavelength region are widely used in X-ray microscopes. X-rays have a very high absorption rate for substances. Therefore, the X-ray filter needs to be formed as a thin film having a thickness of μm so that light in a wavelength region to be transmitted is hardly absorbed by the optical film formed on the filter. This X-ray filter is provided with a frame covering its periphery in order to protect the optical film that selectively transmits light from external force. For such a frame, for example, a substrate such as a Si substrate or a glass substrate is widely used.

また、特許文献１には、Ｘ線透過特性の異なる複数の光学膜を重ね合わせることにより、所望とする波長領域を絞り込んで非常に狭い波長領域のＸ線のみを選択して透過させるＸ線フィルタが記載されている。 Patent Document 1 discloses an X-ray filter that narrows down a desired wavelength region and selectively transmits only X-rays in a very narrow wavelength region by overlapping a plurality of optical films having different X-ray transmission characteristics. Is described.

さらに、上述したμｍ単位の厚さの光学膜は、所定の波長領域の光を選択的に透過させる光学特性を呈するものに限らず、光学膜に入射した光の一部を透過させ、残りを反射して光の成分を２つの方向へ分割するビームスプリッタのような反射特性を呈するものなど様々な光学素子に用いられる。 Further, the above-mentioned optical film having a thickness of μm is not limited to the optical characteristic that selectively transmits light in a predetermined wavelength region, but transmits a part of the light incident on the optical film, and the rest. It is used in various optical elements such as a beam splitter that exhibits reflection characteristics such as a beam splitter that reflects and divides light components in two directions.

ここで、代表的な従来のＸ線フィルタの製造方法について、図１０を参照して説明する。まず、図１０の（ａ）に示すように、ユーザは、円板形状のＳｉ基板１０１の片面に所定の有機材料を塗布して有機材料膜１０２を形成し、さらに有機材料膜１０２に所定の光学材料を塗布して光学膜１０３を形成して、塗布基板１００を形成する。次に、図１０の（ｂ）に示すように、ユーザは、塗布基板１００を、当該塗布基板１００の有機材料膜１０２を溶解する溶解液１０４が満たされた溶液槽１０５に浸漬させる。その後、光学膜１０３は、有機材料膜１０２が溶解液１０４に溶解することにより、Ｓｉ基板１０１から剥離される。そして、光学膜１０３は、所定の基板に接着されて、フィルタやビームスプリッタなどの所定の光学特性を呈する光学素子となる。 Here, a typical method for manufacturing a conventional X-ray filter will be described with reference to FIG. First, as shown in FIG. 10A, the user applies a predetermined organic material to one surface of a disk-shaped Si substrate 101 to form an organic material film 102, and then the organic material film 102 has a predetermined An optical material is applied to form the optical film 103, and the coated substrate 100 is formed. Next, as shown in FIG. 10B, the user immerses the coated substrate 100 in a solution tank 105 filled with a solution 104 for dissolving the organic material film 102 of the coated substrate 100. Thereafter, the optical film 103 is peeled from the Si substrate 101 when the organic material film 102 is dissolved in the solution 104. The optical film 103 is bonded to a predetermined substrate to become an optical element exhibiting predetermined optical characteristics such as a filter and a beam splitter.

また、他のＸ線フィルタの製造方法を、図１１を参照して説明する。まず、図１１の（ａ）に示すように、ユーザは、Ｓｉ基板２０１の両面にＳｉＮ膜２０２を形成し、さらに当該Ｓｉ基板２０１の片面に所定の光学材料を塗布して光学膜２０３を形成する。つまり三層構造の塗布基板２００が形成される。次に、ユーザは、図１１の（ｂ）に示すように、塗布基板２００に、光学膜２０３と接していないＳｉＮ膜２０２の中心部にドライエッチング処理を施して、円形状のＳｉＮ膜孔部２０２ａを設ける。その後、ユーザは、図１１の（ｃ）に示すように、光学膜２０３と接合されたＳｉＮ膜２０２をエッチングストッパとして、ＫＯＨなどの溶液を用いたウェットエッチング処理をＳｉ基板２０１に施して、ＳｉＮ膜孔部２０２ａと同形状のＳｉ基板孔部２０１ａを設ける。さらに、ユーザは、図１１の（ｄ）に示すように、光学膜２０３に接合されたＳｉＮ膜２０２にドライエッチング処理を施して、Ｓｉ基板孔部２０１ａと同形状のＳｉＮ膜孔部２０２ｂを形成する。このようにして、Ｓｉ基板２０１を枠体として光学膜２０３が形成されたＸ線フィルタなどの光学素子が製造される。 Another X-ray filter manufacturing method will be described with reference to FIG. First, as shown in FIG. 11A, the user forms the SiN film 202 on both surfaces of the Si substrate 201, and then applies a predetermined optical material to one surface of the Si substrate 201 to form the optical film 203. To do. That is, the coated substrate 200 having a three-layer structure is formed. Next, as shown in FIG. 11B, the user performs dry etching on the coated substrate 200 at the center of the SiN film 202 that is not in contact with the optical film 203 to form a circular SiN film hole. 202a is provided. Thereafter, as shown in FIG. 11C, the user performs wet etching using a solution such as KOH on the Si substrate 201 using the SiN film 202 bonded to the optical film 203 as an etching stopper, and then adds SiN. An Si substrate hole 201a having the same shape as the film hole 202a is provided. Further, as shown in FIG. 11D, the user performs dry etching on the SiN film 202 bonded to the optical film 203 to form the SiN film hole 202b having the same shape as the Si substrate hole 201a. To do. In this manner, an optical element such as an X-ray filter in which the optical film 203 is formed using the Si substrate 201 as a frame is manufactured.

しかしながら、図１０に示した有機溶剤を用いた製造方法から得られる光学膜は、図１０の（ｂ）に示すように、当該光学膜がたわんでしまい平面形状とならない。このたわみの原因は、有機溶剤膜がその縁端から溶解するため、有機溶剤膜から剥離された光学膜の一部が、溶解していない有機溶剤膜と光学膜との間に作用する界面張力により引っ張られて、光学膜に残留応力が生じるからである。 However, the optical film obtained from the manufacturing method using the organic solvent shown in FIG. 10 does not have a planar shape because the optical film is bent as shown in FIG. The cause of this deflection is that the organic solvent film dissolves from its edge, so that part of the optical film peeled off from the organic solvent film acts between the undissolved organic solvent film and the optical film. This is because the residual stress is generated in the optical film.

また、図１１に示したエッチング処理を含む製造方法から得られるＳｉ基板を枠体として形成された光学膜は、図１０に示した有機溶剤を用いた製造方法により製造された光学膜に比べての平面化に優れている。しかし、この製法で製造された光学膜２０４は、上述したドライエッチング処理の際に膜の一部が破損することが多く、図１０に示した有機溶剤膜を用いた生成方法に比べて生産効率が低かった。 Further, the optical film formed using the Si substrate obtained from the manufacturing method including the etching process shown in FIG. 11 as a frame is compared with the optical film manufactured by the manufacturing method using the organic solvent shown in FIG. Excellent in flattening. However, the optical film 204 manufactured by this manufacturing method often breaks part of the film during the dry etching process described above, and the production efficiency is higher than that of the production method using the organic solvent film shown in FIG. Was low.

このように、上述した従来の製造方法で製造された光学膜では、製造の際に生じてしまう膜のたわみ及びエッチングの際の破損により、当該光学膜の平面度が損なわれてしまうので、光学特性が低下してしまった。 As described above, in the optical film manufactured by the above-described conventional manufacturing method, the flatness of the optical film is impaired due to the bending of the film that occurs during manufacturing and the damage during the etching. The characteristics have deteriorated.

特開２０００−１６２３９２号公報JP 2000-162392 A

本発明は、このような従来の実情に鑑みて提案されたものであり、生産性が高く平面化に優れた光膜膜を有する光学素子を製造する光学素子製造方法を提供することを目的とする。 The present invention has such a proposed in view of the conventional circumstances, to provide an optical element manufacturing method of manufacturing an optical optical element that have a light film film excellent in high planarization productivity With the goal.

上述した課題を解決するために、本発明に係る光学素子製造方法は、製造用基板の片面に溶解液により溶解される溶解物質を塗布して溶解膜を形成し、上記溶解膜上に光学材料を塗布して所定の光学特性を呈する光学膜を形成し、光硬化接着剤を硬化させる光を透過する材料からなり開口部を有する開口基板の片面に、上記光硬化接着剤を塗布して接着膜を形成し、上記接着膜と上記光学膜を対向させた状態で上記製造用基板に上記開口基板を重ね合わせ、上記接着膜を形成している光硬化接着剤に、当該光硬化接着剤を硬化させる光を上記開口基板側から照射して、上記光硬化接着剤を硬化させることにより、上記製造用基板と上記開口基板を一体化し、上記溶解膜を形成している溶解物質を溶解する溶解液に、上記一体化した上記製造用基板と上記開口基板を浸漬し、上記溶解液により上記溶解膜を形成している溶解物質を溶解することによって、上記光学膜を上記製造用基板から隔離し、上記開口基板を透過した光により上記光硬化接着剤が硬化された上記接着膜により、上記光学膜が、上記開口基板の片面に接着固定され、平面度を確保した状態で上記開口基板の開口部に設けられた光学素子を製造することを特徴とする。 In order to solve the above-described problems, an optical element manufacturing method according to the present invention forms a dissolved film by applying a dissolved substance dissolved by a dissolving liquid on one surface of a manufacturing substrate, and an optical material on the dissolved film. An optical film exhibiting predetermined optical properties is formed by coating the photo-curing adhesive, and the photo-curing adhesive is applied and bonded to one side of an opening substrate made of a light-transmitting material that cures the photo-curing adhesive. A film is formed, the opening substrate is overlaid on the manufacturing substrate in a state where the adhesive film and the optical film face each other, and the photocurable adhesive is applied to the photocurable adhesive forming the adhesive film. By dissolving the light to be cured from the opening substrate side and curing the photo-curing adhesive, the manufacturing substrate and the opening substrate are integrated to dissolve the dissolved material forming the dissolution film. For the above production integrated into the liquid The optical film is isolated from the manufacturing substrate by immersing the plate and the opening substrate and dissolving the dissolved substance forming the dissolution film with the dissolution liquid, and the light is transmitted through the opening substrate The optical film is bonded and fixed to one surface of the opening substrate by the adhesive film cured with the photo-curing adhesive, and an optical element provided in the opening portion of the opening substrate is manufactured in a state where flatness is ensured. It is characterized by that.

本発明に係る光学素子製造方法は、光硬化接着剤からなる接着膜より一体化された開口基板と製造用基板を、溶解膜を溶解する溶解液に浸漬し、製造用基板における溶解膜が溶解して、光学膜を製造用基板から隔離させる。このことにより、本発明に係る光学素子製造方法は、平面化に優れた光学膜を容易に開口基板の開口部に形成することができる。 In the optical element manufacturing method according to the present invention, an opening substrate integrated with an adhesive film made of a photo-curing adhesive and a manufacturing substrate are immersed in a dissolving solution for dissolving the dissolving film, and the dissolving film on the manufacturing substrate is dissolved. Then, the optical film is isolated from the manufacturing substrate. As a result, the optical element manufacturing method according to the present invention can easily form an optical film excellent in planarization in the opening of the opening substrate.

以下、本発明を適用した具体的な実施の形態について、図面を参照しながら詳細に説明する。 Hereinafter, specific embodiments to which the present invention is applied will be described in detail with reference to the drawings.

薄膜フィルタ１は、図１に示すように、所定の波長領域の透過対象光１０ａを透過させる光透過膜１０と、当該光透過膜１０において所定の光学特性を呈する部分の外周を囲む枠体である開口基板１１と、光透過膜１０と開口基板１１とを接着する接着膜１２とからなる。 As shown in FIG. 1, the thin film filter 1 is a light transmitting film 10 that transmits transmission target light 10 a in a predetermined wavelength region, and a frame that surrounds the outer periphery of a portion that exhibits predetermined optical characteristics in the light transmitting film 10. It consists of an opening substrate 11 and an adhesive film 12 that bonds the light transmission film 10 and the opening substrate 11 together.

薄膜フィルタ１は、開口基板１１に設けられた光透過膜１０により、透過対象光１０ａ、例えば極端紫外線やＸ線などの比較的波長の短い光から、選択的に波長領域を絞って透過させるものである。ここで、透過対象光１０ａは、Ｘ線や極端紫外線などの波長の短い光であり、物質に非常に吸収されやすい。したがって、光透過膜１０は、透過対象光１０ａの物質に対する吸収をできるだけ回避するために、μｍ単位の薄膜の形状となっている。また、光透過膜１０の材料は、透過対象の波長領域によって異なるが、金属と非金属に分けられる。ここで、金属薄膜の原料としては、Ｂｅ，Ａｌ，Ｓｃ，Ｔｉ，Ｖ，Ｃｒ，Ｍｎ，Ｆｅ，Ｃｏ，Ｎｉ，Ｃｕ，Ｚｎ，Ｍｏ，Ａｇ，Ｗ，Ｐｔ，Ａｕ等の金属が用いられる。非金属性の薄膜としては、ポリプロピレン、ポリエチレン、ポリ塩化ビニル等の高分子材料からなる薄膜や、窒化珪素（Ｓｉ_３Ｎ_４）、珪素（Ｓｉ）、炭化珪素（ＳｉＣ）、酸化アルミニウム（Ａｌ_２Ｏ_３）、ボロンナイトライド（ＢＮ）等の無機材料からなる薄膜が用いられる。 The thin film filter 1 allows a light transmitting film 10 provided on an opening substrate 11 to selectively transmit light having a relatively short wavelength such as extreme ultraviolet light and X-rays, while narrowing the wavelength region. It is. Here, the transmission target light 10a is light having a short wavelength, such as X-rays or extreme ultraviolet rays, and is very easily absorbed by a substance. Therefore, the light transmission film 10 has a shape of a thin film of μm in order to avoid absorption of the transmission target light 10a with respect to the substance as much as possible. Moreover, although the material of the light transmissive film | membrane 10 changes with wavelength ranges of transmission object, it is divided into a metal and a nonmetal. Here, metals such as Be, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ag, W, Pt, and Au are used as raw materials for the metal thin film. Examples of the non-metallic thin film include a thin film made of a polymer material such as polypropylene, polyethylene, and polyvinyl chloride, silicon nitride (Si ₃ N ₄ ), silicon (Si), silicon carbide (SiC), and aluminum oxide (Al ₂ A thin film made of an inorganic material such as O ₃ ) or boron nitride (BN) is used.

開口基板１１は、円板形状でその中心部に開口部１１ａを有し、この開口部１１ａに光透過膜１０が形成されるものとする。また、光透過膜１０と当該開口基板１１との間を接着する接着膜は、感光することにより接着作用を生じる材料からなる。したがって、開口基板１１は、上述した接着作用を生じる光を透過させる必要があるため、ガラスなどの透明な基板を用いる必要がある。 The opening substrate 11 has a disk shape and has an opening 11a at the center thereof, and the light transmission film 10 is formed in the opening 11a. The adhesive film that adheres between the light transmission film 10 and the opening substrate 11 is made of a material that generates an adhesive action when exposed to light. Therefore, since the aperture substrate 11 needs to transmit the light that causes the above-described adhesive action, it is necessary to use a transparent substrate such as glass.

なお、本実施形態に係る薄膜フィルタ１は、本発明に係る所定の光学特性を呈する光学膜を有する光学素子の一形態である。よって、薄膜フィルタ１のように光透過特性を呈する光透過膜として用いた光学素子に限らず、光反射特性を呈する光学素子など、薄膜形状の光学膜からなる光学素子であればいかなるものを用いるようにしてもよい。 The thin film filter 1 according to the present embodiment is an embodiment of an optical element having an optical film exhibiting predetermined optical characteristics according to the present invention. Therefore, not only an optical element used as a light transmission film exhibiting a light transmission characteristic like the thin film filter 1 but also any optical element made of a thin film optical film such as an optical element exhibiting a light reflection characteristic is used. You may do it.

次に、上述した開口基板１１の開口部１１ａに光透過膜１０が形成されてなる薄膜フィルタ１の製造方法を説明する。ここで、薄膜フィルタ１の製造工程では、開口基板１１とは別に、円形状の円形基板を用いる。この円形基板２０は、開口基板１１に対して外形が略同一形状であるが、開口基板１１と異なり開口部を有さないものである。 Next, a manufacturing method of the thin film filter 1 in which the light transmission film 10 is formed in the opening 11a of the above-described opening substrate 11 will be described. Here, in the manufacturing process of the thin film filter 1, a circular circular substrate is used separately from the aperture substrate 11. The circular substrate 20 has substantially the same outer shape as the opening substrate 11, but does not have an opening unlike the opening substrate 11.

まず、開口基板１１の一方の面は、製造工程に従って、図２に示すように、所定の波長光を吸収することにより接着力が生じる光硬化接着剤が塗布されて、光硬化接着膜１２が形成される。 First, as shown in FIG. 2, according to the manufacturing process, one surface of the opening substrate 11 is coated with a photo-curing adhesive that generates an adhesive force by absorbing light having a predetermined wavelength, so that the photo-curing adhesive film 12 is formed. It is formed.

図３に示すように、円形基板２０には、製造工程に従って、当該円形基板２０の一方の円形面に、所定の有機溶剤に溶解する高分子材料が塗布されて、高分子材料膜２１が形成される。この高分子材料は、例えば、アセトンやアルコールなどの有機溶剤に溶解するメタクリル樹脂（PolyMethyl MethAcrylate:PMMA）からなる。さらに、円形基板２０には、図３に示すように、製造工程に従って、高分子材料膜２１に所定の光透過物質が塗布されて、高分子材料膜２１の上に光透過膜１０が形成される。 As shown in FIG. 3, on the circular substrate 20, a polymer material that dissolves in a predetermined organic solvent is applied to one circular surface of the circular substrate 20 in accordance with the manufacturing process to form a polymer material film 21. Is done. This polymer material is made of, for example, methacrylic resin (PolyMethyl Meth Acrylate: PMMA) that is dissolved in an organic solvent such as acetone or alcohol. Further, as shown in FIG. 3, a predetermined light transmitting material is applied to the polymer material film 21 on the circular substrate 20 according to the manufacturing process, and the light transmitting film 10 is formed on the polymer material film 21. The

次に、円形基板２０に形成された光透過膜１０には、図４に示すように、製造工程に従って、開口基板１１の光硬化接着膜１２が設置される。 Next, as shown in FIG. 4, the light curable adhesive film 12 of the opening substrate 11 is installed on the light transmission film 10 formed on the circular substrate 20 according to the manufacturing process.

さらに、開口基板１１には、図５に示すように、製造工程に従って、高精度の平面計測を行うフィゾー干渉計２が設置される。フィゾー干渉計２は、開口基板１１と円形基板２０との間に挟まれた光透過膜１０を被測定物として平面度の計測を行う。具体的にフィゾー干渉計が行う計測処理は、光源と平行鏡を用いて平行光を出射し、その出射光が、当該干渉計に設けられた基準面２ａ、及び、開口部１１ａを通過して被測定物である光透過膜１０でそれぞれ反射して、基準面２ａと光透過膜１０との光路長の差によって表れる干渉縞に基づいて平面度の計測を行う。すなわち、光透過膜１０の平面度は、当該膜の凹凸の高低差を示したものである。フィゾー干渉計２による計測により、光透過膜１０の平面度が所定の精度を満たした場合には、次の製造工程に進む。一方、フィゾー干渉計２を用いた計測により、光透過膜１０が所定の精度を満たされていない場合には、所定の平面度が確保された光透過膜１０が形成されるまで、上述した開口基板１０及び円形基板２０に所定の材料を塗布する塗布工程が繰り返される。 Further, as shown in FIG. 5, a Fizeau interferometer 2 that performs high-precision plane measurement is installed on the aperture substrate 11 in accordance with the manufacturing process. The Fizeau interferometer 2 measures flatness using the light transmission film 10 sandwiched between the aperture substrate 11 and the circular substrate 20 as an object to be measured. Specifically, the measurement process performed by the Fizeau interferometer emits parallel light using a light source and a parallel mirror, and the emitted light passes through the reference surface 2a and the opening 11a provided in the interferometer. The flatness is measured based on the interference fringes reflected by the light transmission film 10 that is the object to be measured and appearing due to the difference in optical path length between the reference surface 2a and the light transmission film 10. That is, the flatness of the light transmission film 10 indicates the level difference of the unevenness of the film. When the flatness of the light transmission film 10 satisfies a predetermined accuracy by the measurement by the Fizeau interferometer 2, the process proceeds to the next manufacturing process. On the other hand, when the light transmission film 10 does not satisfy the predetermined accuracy by the measurement using the Fizeau interferometer 2, the opening described above is formed until the light transmission film 10 having a predetermined flatness is formed. The application process of applying a predetermined material to the substrate 10 and the circular substrate 20 is repeated.

このように、フィゾー干渉計２を用いることにより、所望とする平面性を有する光透過膜１０を確実に形成することができる。 In this way, by using the Fizeau interferometer 2, the light transmission film 10 having a desired flatness can be reliably formed.

フィゾー干渉計２により、所望とする光透過膜１０の平面度が確保されると、フィゾー干渉計２が開口基板１１から取り外されて、光硬化接着膜１２には、図６に示すように、製造工程に従って、接着力を作用させる接着剤硬化光３が照射される。ここで、光硬化接着膜１２に作用する接着剤硬化光３は、例えば２００〜４００ｎｍの波長領域の紫外線が一般的に用いられる。また、光硬化接着膜１２が接着剤硬化光３を吸収するには、接着剤硬化光３が開口基板１１を透過しなければならない。したがって、開口基板１１は、接着剤硬化光３を十分に透過させるため、透明なガラス基板によって構成されている。なお、開口基板１１は、透明なガラス基板に限らず、光硬化接着膜１２に接着力を作用させる光を十分に透過し、また光透過膜１０の枠体として充分な強度を有するものであれば、いかなる材料を用いるようにしてもよい。 When the desired flatness of the light transmission film 10 is secured by the Fizeau interferometer 2, the Fizeau interferometer 2 is removed from the opening substrate 11, and the photocuring adhesive film 12 has a structure as shown in FIG. In accordance with the manufacturing process, the adhesive curing light 3 for applying the adhesive force is irradiated. Here, as the adhesive curing light 3 acting on the photo-curing adhesive film 12, for example, ultraviolet rays in a wavelength region of 200 to 400 nm are generally used. Further, in order for the light curing adhesive film 12 to absorb the adhesive curing light 3, the adhesive curing light 3 must pass through the opening substrate 11. Therefore, the opening substrate 11 is configured by a transparent glass substrate in order to sufficiently transmit the adhesive curing light 3. Note that the aperture substrate 11 is not limited to a transparent glass substrate, and may be a substrate that sufficiently transmits light that causes an adhesive force to act on the light curable adhesive film 12 and has sufficient strength as a frame of the light transmissive film 10. Any material may be used.

次に、光硬化接着膜１２によって接着された開口基板１１と円形基板２０は、製造工程に従って、図７に示すように、高分子材料膜２１を溶解する有機溶液４に浸漬される。その後、有機溶液４が満たされた液槽５中において高分子材料膜２１が溶解し、円形基板２０から光透過膜１０が剥離されて、図８に示すように、開口基板１１の開口部１１ａに光透過膜１０が形成されてなる薄膜フィルタ１が製造される。 Next, the opening substrate 11 and the circular substrate 20 bonded by the photo-curing adhesive film 12 are immersed in the organic solution 4 in which the polymer material film 21 is dissolved, as shown in FIG. Thereafter, the polymer material film 21 is dissolved in the liquid tank 5 filled with the organic solution 4, and the light transmission film 10 is peeled off from the circular substrate 20. As shown in FIG. A thin film filter 1 having a light transmissive film 10 formed thereon is manufactured.

ところで、上述した製造方法に対して、従来の代表的な光学膜の製造法では、開口基板１１と円形基板２０とを接着せずに、高分子材料膜２１と光透過膜１０からなる円形基板２０を液槽５に浸漬させて、図９に示すように、高分子材料膜２１が有機溶液４に溶解されて、光透過膜１０が円形基板２０から剥離される。ここで、高分子材料膜２１と光透過膜１０との間には界面張力６が作用している。したがって、光透過膜１０は、高分子材料膜２１が溶解して剥離された光透過膜１０の一部が、剥離されていない光透過膜１０と高分子材料膜２１との間に作用する界面張力６によって引っ張られてたわんでしまう。 By the way, in contrast to the manufacturing method described above, in the conventional representative optical film manufacturing method, the circular substrate formed of the polymer material film 21 and the light transmission film 10 without bonding the aperture substrate 11 and the circular substrate 20. As shown in FIG. 9, the polymer material film 21 is dissolved in the organic solution 4, and the light transmission film 10 is peeled from the circular substrate 20. Here, an interfacial tension 6 acts between the polymer material film 21 and the light transmission film 10. Therefore, the light transmissive film 10 is an interface where a part of the light transmissive film 10 which is separated by dissolution of the polymer material film 21 acts between the light transmissive film 10 and the polymer material film 21 which are not separated. It is pulled by the tension 6 and bent.

これに対して、本実施の形態に係る薄膜フィルタ１の製造方法は、光硬化接着膜２２と光透過膜１０との間に作用する接着力が、高分子材料膜２１と光透過膜１０との間に作用する界面張力６に対して非常に大きいのでたわみが生じることなく、平面化に優れた薄膜形状の光学膜を形成されてなる光学素子を製造することができる。 In contrast, in the method of manufacturing the thin film filter 1 according to the present embodiment, the adhesive force acting between the light curable adhesive film 22 and the light transmissive film 10 is such that the polymer material film 21 and the light transmissive film 10 Since the interfacial tension 6 acting between the layers is very large, there is no deflection, and an optical element formed with a thin film-shaped optical film excellent in planarization can be manufactured.

開口基板の開口部に形成された光透過膜を示した斜視図である。It is the perspective view which showed the light transmissive film | membrane formed in the opening part of an opening board | substrate. 開口基板の一方の面に所定の塗布剤を塗布する塗布工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the application | coating process which apply | coats a predetermined coating agent to one surface of an opening board | substrate. 円形基板の一方の面に所定の塗布剤を塗布する塗布工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the application | coating process which apply | coats a predetermined coating agent to one surface of a circular board | substrate. 開口基板を円形基板に設置する設置工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the installation process which installs an opening board | substrate in a circular board | substrate. フィゾー干渉計を開口基板に設置する設置工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the installation process which installs a Fizeau interferometer in an opening board | substrate. 接着剤硬化光を照射する照射工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the irradiation process which irradiates adhesive agent hardening light. 開口基板と円形基板とを、液槽に満たされた有機溶液に浸漬させる浸漬工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the immersion process which immerses an opening board | substrate and a circular substrate in the organic solution with which the liquid tank was filled. 開口基板の開口部に薄膜フィルタが形成される形成工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the formation process in which a thin film filter is formed in the opening part of an opening board | substrate. 開口基板を用いずに、液槽中で円形基板に塗布された光透過膜が隔離する隔離工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the isolation | separation process in which the light-transmitting film apply | coated to the circular board | substrate in the liquid tank isolates without using an opening board | substrate. 従来の薄膜フィルタの製造工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the manufacturing process of the conventional thin film filter. 従来の薄膜フィルタの製造工程を示した基板の断面図である。It is sectional drawing of the board | substrate which showed the manufacturing process of the conventional thin film filter.

Explanation of symbols

１光学フィルタ、２フィゾー干渉計、３接着剤硬化光、４有機溶液、５液槽、６表面張力、１０光透過膜、１１開口基板、１２光硬化接着膜、２０円形基板、２１高分子材料膜 DESCRIPTION OF SYMBOLS 1 Optical filter, 2 Fizeau interferometer, 3 Adhesive hardening light, 4 Organic solution, 5 Liquid tank, 6 Surface tension, 10 Light transmission film, 11 Opening substrate, 12 Photo hardening adhesive film, 20 Circular substrate, 21 Polymer material film

Claims

Applying a dissolved substance that is dissolved by the dissolving liquid on one side of the production substrate to form a dissolved film,
An optical material is applied on the dissolved film to form an optical film exhibiting predetermined optical characteristics,
Forming an adhesive film by applying the above-mentioned photo-curing adhesive on one side of an opening substrate made of a material that transmits light that cures the photo-curing adhesive,
The opening substrate is overlaid on the manufacturing substrate with the adhesive film and the optical film facing each other.
By irradiating the photo-curing adhesive forming the adhesive film with light for curing the photo-curing adhesive from the opening substrate side, and curing the photo-curing adhesive, the manufacturing substrate and the above Integrate the aperture substrate,
The integrated manufacturing substrate and the opening substrate are immersed in a dissolving solution for dissolving the dissolving substance forming the dissolving film,
The optical film is isolated from the production substrate by dissolving the dissolved material forming the dissolved film with the dissolving liquid,
The optical film is bonded and fixed to one surface of the opening substrate by the adhesive film in which the photo-curing adhesive is cured by the light transmitted through the opening substrate, and the opening portion of the opening substrate is secured in a state where flatness is ensured. production method made optical element child, characterized in that for manufacturing an optical element provided in the.

A flatness measuring instrument for measuring flatness is installed on one side of the opening substrate facing the adhesive film in the opening substrate superimposed on the manufacturing substrate with the adhesive film and the optical film facing each other. And
The flatness of the optical film is ensured by measuring the flatness of the optical film sandwiched between the aperture substrate and the manufacturing substrate using the flatness measuring device. Item 2. A method for producing an optical element according to Item 1 .