JP4867604B2 - Manufacturing method of glass substrate for information recording medium - Google Patents
Manufacturing method of glass substrate for information recording medium Download PDFInfo
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- JP4867604B2 JP4867604B2 JP2006312641A JP2006312641A JP4867604B2 JP 4867604 B2 JP4867604 B2 JP 4867604B2 JP 2006312641 A JP2006312641 A JP 2006312641A JP 2006312641 A JP2006312641 A JP 2006312641A JP 4867604 B2 JP4867604 B2 JP 4867604B2
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- 239000000758 substrate Substances 0.000 title claims description 144
- 239000011521 glass Substances 0.000 title claims description 128
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 81
- 239000007788 liquid Substances 0.000 claims description 69
- 238000000034 method Methods 0.000 claims description 51
- 238000004140 cleaning Methods 0.000 claims description 42
- 230000008014 freezing Effects 0.000 claims description 11
- 238000007710 freezing Methods 0.000 claims description 11
- 238000007654 immersion Methods 0.000 claims description 7
- 238000005728 strengthening Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 20
- 238000000227 grinding Methods 0.000 description 13
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 13
- 239000000463 material Substances 0.000 description 10
- 238000005498 polishing Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910001413 alkali metal ion Inorganic materials 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 235000010333 potassium nitrate Nutrition 0.000 description 5
- 239000004323 potassium nitrate Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 229910001415 sodium ion Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 235000010344 sodium nitrate Nutrition 0.000 description 3
- 239000004317 sodium nitrate Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 229910001149 41xx steel Inorganic materials 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000012854 evaluation process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Landscapes
- Surface Treatment Of Glass (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
本発明は、磁気、光、光磁気等の性質を利用した記録層を有する情報記録媒体に用いる情報記録媒体用ガラス基板の製造方法に関する。 The present invention relates a magnetic, optical, in the manufacture how the glass substrate for an information recording medium used in the information recording medium having a recording layer using the properties such as a magneto-optical.
磁気、光、光磁気等の性質を利用した記録層を有する情報記録媒体のなかで、代表的なものとして磁気ディスクがある。磁気ディスク用基板として、従来アルミニウム基板が広く用いられていた。しかし、近年、記録密度向上のための磁気ヘッド浮上量の低減の要請に伴い、アルミニウム基板よりも表面の平滑性に優れ、しかも表面欠陥が少ないことから磁気ヘッド浮上量の低減を図ることができるガラス基板を磁気ディスク用基板として用いる割合が増えてきている。 Among information recording media having a recording layer utilizing properties such as magnetism, light, and magnetomagnetism, a typical example is a magnetic disk. Conventionally, aluminum substrates have been widely used as magnetic disk substrates. However, in recent years, with the demand for a reduction in the flying height of the magnetic head for improving the recording density, the surface smoothness is superior to that of an aluminum substrate and the surface defects are few, so that the flying height of the magnetic head can be reduced. The proportion of using glass substrates as magnetic disk substrates is increasing.
このような磁気ディスク等の情報記録媒体用ガラス基板の製造方法においては、ガラス基板の耐衝撃性や耐振動性を向上させ衝撃や振動によって基板が破損するのを防止する目的で、ガラス基板の表面に化学強化処理を施して基板を強化することが一般的に行われている。 In such a method for producing a glass substrate for an information recording medium such as a magnetic disk, for the purpose of improving the impact resistance and vibration resistance of the glass substrate and preventing the substrate from being damaged by impact and vibration, In general, a substrate is strengthened by applying a chemical strengthening treatment to the surface.
化学強化処理は、通常、加熱された化学強化処理液にガラス基板を浸漬して、ガラス基板の成分であるリチウムイオン、ナトリウムイオン等のアルカリ金属イオンをこれらのイオンよりイオン半径の大きなナトリウムイオン、カリウムイオン等のアルカリ金属イオンと置換するイオン交換法によって行われる。 In the chemical strengthening treatment, a glass substrate is usually immersed in a heated chemical strengthening treatment liquid, and alkali metal ions such as lithium ions and sodium ions, which are components of the glass substrate, are sodium ions having a larger ion radius than these ions, It is carried out by an ion exchange method for replacing alkali metal ions such as potassium ions.
化学強化処理が行われたガラス基板は、洗浄槽に投入され、ガラス基板の表面に付着した化学強化処理液の除去が行われる（例えば、特許文献１を参照。）。
しかしながら、洗浄後のガラス基板の表面に微小な異物が残存し、表面に記録層を形成した後に記録層の剥離や突起の発生等を引き起こすという問題が発生する場合があった。特に近年、記録密度向上のための磁気ヘッド浮上量の低減に伴い、かかる問題を防止する要請が非常に高まっている。 However, there may be a problem in that minute foreign matters remain on the surface of the glass substrate after cleaning, and after the recording layer is formed on the surface, peeling of the recording layer, generation of protrusions, and the like are caused. Particularly in recent years, with the reduction of the flying height of the magnetic head for improving the recording density, there has been a great demand for preventing such a problem.
本発明者らが鋭意検討を重ねた結果、洗浄後のガラス基板の表面に残存する微小な異物は、化学強化処理のための処理槽や洗浄槽の周辺に付着した化学強化処理液の結晶に起因することが判明した。更に、これらの結晶は、化学強化処理液に浸漬したガラス基板を引き上げた後すぐに搬送が行われることにより、ガラス基板や搬送治具に付着した化学強化処理液が、処理槽の外壁、配管類、床面、あるいは洗浄槽の内壁や外壁等に落下し、冷却されて結晶化したものであることを突き止めた。 As a result of extensive studies by the present inventors, the minute foreign matter remaining on the surface of the glass substrate after the cleaning becomes a crystal of the chemical strengthening treatment liquid adhering to the periphery of the treatment tank or the cleaning tank for the chemical strengthening treatment. It turned out to be due. Furthermore, these crystals are transported immediately after pulling up the glass substrate immersed in the chemical strengthening treatment liquid, so that the chemical strengthening treatment liquid adhering to the glass substrate and the transport jig is transferred to the outer wall of the processing tank, piping. It was found that it was crystallized by being dropped on the floor, the inner surface or the outer wall of the washing tank, or cooled.
化学強化処理液としては、硝酸カリウム（ＫＮＯ3）、硝酸ナトリウム（ＮａＮＯ3）、炭酸カリウム（Ｋ2ＣＯ3）などの溶融塩や、これらの混合物の溶融塩を用い場合が多い。これらは、処理槽内で加熱されている間は液体状態であるが、ガラス基板や搬送治具から落下した後は冷却されて結晶化する。洗浄槽の周辺がこのような結晶で汚染されることで、洗浄槽の周辺に微細な結晶が飛散し、飛散した結晶が洗浄後の搬送過程においてガラス基板の表面に付着していたのである。 As the chemical strengthening treatment liquid, a molten salt such as potassium nitrate (KNO 3 ), sodium nitrate (NaNO 3 ), potassium carbonate (K 2 CO 3 ) or a mixture thereof is often used. These are in a liquid state while being heated in the treatment tank, but are cooled and crystallized after falling from the glass substrate or the conveying jig. Since the periphery of the cleaning tank is contaminated with such crystals, fine crystals are scattered around the cleaning tank, and the scattered crystals are attached to the surface of the glass substrate in the transport process after cleaning.
洗浄槽の周辺の汚染によるガラス基板の表面への異物の付着を防止するためには、化学強化処理液を貯留する処理槽や洗浄槽、及びそれらの周辺を数時間〜数十時間といった短い周期で定期的に清掃するという方法も考えられるが、そのたびに製造作業を停止せざるを得ず、生産性を大きく低下させるという問題があった。 In order to prevent foreign substances from adhering to the surface of the glass substrate due to contamination around the cleaning tank, the processing tank and the cleaning tank storing the chemical strengthening treatment liquid, and their surroundings, such as a short cycle of several hours to several tens of hours. However, there is a problem in that productivity must be greatly reduced because the manufacturing operation must be stopped each time.
本発明は上記のような技術的課題に鑑みてなされたものであり、本発明の目的は、処理槽や洗浄槽の周辺の化学強化処理液による汚染を最小限に抑えることで、ガラス基板への異物の付着を防止することができ、高い生産効率で製造することができる情報記録媒体用ガラス基板の製造方法を提供することである。 The present invention has been made in view of the technical problems as described above, and an object of the present invention is to minimize the contamination by the chemical strengthening treatment liquid around the processing tank and the cleaning tank, and thereby to the glass substrate. It is an object to provide a method for manufacturing a glass substrate for an information recording medium that can prevent the adhesion of foreign substances and can be manufactured with high production efficiency.
上記の課題を解決するために、本発明は以下の特徴を有するものである。 In order to solve the above problems, the present invention has the following features.
１．化学強化処理液にガラス基板を浸漬することによって前記ガラス基板を化学強化する工程を含む情報記録媒体用ガラス基板の製造方法において、処理槽に貯留された化学強化処理液にガラス基板を浸漬する浸漬工程と、前記化学強化処理液に浸漬した前記ガラス基板を引き上げる引き上げ工程と、引き上げた前記ガラス基板を前記処理槽の上方で２秒よりも長時間で、遅くともガラス基板の温度が処理液の凝固点よりも低くなるまで待機させる待機工程と、前記待機工程の後すみやかに、前記ガラス基板を前記処理槽の上方から搬出する搬出工程とを有することを特徴とする情報記録媒体用ガラス基板の製造方法。 1. In the manufacturing method of the glass substrate for information recording media including the step of chemically strengthening the glass substrate by immersing the glass substrate in the chemical strengthening treatment liquid, the immersion is performed by immersing the glass substrate in the chemical strengthening treatment liquid stored in the treatment tank. A pulling step of pulling up the glass substrate immersed in the chemical strengthening treatment liquid, and the glass substrate that has been pulled up in a time longer than 2 seconds above the treatment tank, and the temperature of the glass substrate at the latest is the freezing point of the treatment liquid A method for producing a glass substrate for an information recording medium, comprising: a standby step for waiting until the temperature becomes lower; and a unloading step for unloading the glass substrate from above the processing tank immediately after the standby step. .
２． 前記搬出工程の後、洗浄槽で前記ガラス基板を洗浄する洗浄工程を有することを特徴とする前記１に記載の情報記録媒体用ガラス基板の製造方法。 2. 2. The method for producing a glass substrate for an information recording medium according to 1, wherein the glass substrate is cleaned in a cleaning tank after the unloading step.
３． 前記待機工程は、引き上げたガラス基板の温度を、前記化学強化処理液の凝固点よりも低く化学強化処理液の凝固点−９℃以上の温度になるまで待機させる工程であることを特徴とする請求項１又は２に記載の情報記録媒体用ガラス基板の製造方法。 3. Claim the waiting step, the temperature of the glass substrate was pulled, wherein the a step of causing wait until the chemical strengthening treatment liquid temperature above the freezing point -9 ° C. of less than the freezing point of the chemical strengthening treatment solution A method for producing a glass substrate for an information recording medium according to 1 or 2.
本発明によれば、処理槽や洗浄槽の周辺の化学強化処理液による汚染を最小限に抑えることで、ガラス基板への異物の付着を防止することができ、高い生産効率で製造することができる情報記録媒体用ガラス基板の製造方法を提供することができる。 According to the present invention, it is possible to prevent foreign substances from adhering to the glass substrate by minimizing contamination by the chemical strengthening treatment liquid around the treatment tank and the washing tank, and to manufacture with high production efficiency. The manufacturing method of the glass substrate for information recording media which can be provided can be provided.
以下、本発明の実施の形態について図面を参照しながら詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
（情報記録媒体用ガラス基板の製造方法）
情報記録媒体用ガラス基板は、一般的に、ブランク材作製工程、内外周加工工程、研削・研磨工程、化学強化工程、洗浄工程などの工程を経て製造される。ブランク材作製工程は情報記録媒体用ガラス基板の基になるブランク材を形成する工程であり、溶融ガラスをプレス成形して作製する方法や、シート状のガラスを切断して作製する方法が知られている。内外周加工工程は、中心孔の穿孔加工、内外周の形状や寸法精度確保のための研削加工、内外周の研磨加工等を行う工程である。研削・研磨工程は、記録層が形成される面の平坦度、表面粗さを満足させるための研削加工、研磨加工を行う工程である。通常は、粗研削加工、精研削加工、１次研磨加工、２次研磨加工といったようにいくつかの段階に分けて行われる場合が多い。化学強化工程は、化学強化処理液にガラス基板を浸漬することでガラス基板を強化する工程である。また、洗浄工程は、ガラス基板の表面に残った研磨剤や化学強化処理液等の異物を除去する工程である。
(Method for producing glass substrate for information recording medium)
The glass substrate for information recording media is generally manufactured through processes such as a blank material manufacturing process, an inner and outer peripheral processing process, a grinding / polishing process, a chemical strengthening process, and a cleaning process. The blank material production process is a process for forming a blank material that is the basis of a glass substrate for information recording media, and a method of producing a molten glass by press molding or a method of producing by cutting a sheet-like glass is known. ing. The inner and outer peripheral machining step is a step of performing drilling of the center hole, grinding for ensuring the shape and dimensional accuracy of the inner and outer circumferences, polishing of the inner and outer circumferences, and the like. The grinding / polishing step is a step of performing grinding and polishing to satisfy the flatness and surface roughness of the surface on which the recording layer is formed. Usually, it is often performed in several stages such as rough grinding, fine grinding, primary polishing, and secondary polishing. The chemical strengthening step is a step of strengthening the glass substrate by immersing the glass substrate in the chemical strengthening treatment liquid. The cleaning step is a step of removing foreign matters such as abrasives and chemical strengthening treatment liquid remaining on the surface of the glass substrate.
本発明の情報記録媒体用ガラス基板の製造方法は、これらの工程の内、主に化学強化工程と洗浄工程に特徴を有するものである。本発明においては、研削・研磨工程が完了した後に化学強化工程を行っても良いし、先に化学強化工程を行ってから研削・研磨工程を行ってもよい。また、研削・研磨工程がある段階まで進んだ時点で化学強化工程を行い、その後に研削・研磨工程の残りの工程を行って仕上げることもできる。 The manufacturing method of the glass substrate for information recording media of the present invention is characterized mainly by the chemical strengthening step and the cleaning step among these steps. In the present invention, the chemical strengthening step may be performed after the grinding / polishing step is completed, or the grinding / polishing step may be performed after the chemical strengthening step is performed first. Alternatively, the chemical strengthening process may be performed when the grinding / polishing process has progressed to a certain stage, and then the remaining processes of the grinding / polishing process may be performed.
なお、本発明の情報記録媒体用ガラス基板の製造方法においては、上記以外の種々の工程を有していても良い。例えば、ガラス基板の内部歪みを緩和するためのアニール工程、ガラス基板からのアルカリ金属イオンの析出を防止するための脱アルカリ処理工程、種々の検査・評価工程等を有していても良い。 In addition, in the manufacturing method of the glass substrate for information recording media of this invention, you may have various processes other than the above. For example, an annealing process for relaxing internal strain of the glass substrate, a dealkalization treatment process for preventing precipitation of alkali metal ions from the glass substrate, various inspection / evaluation processes, and the like may be included.
（化学強化工程）
化学強化工程は、加熱された化学強化処理液にガラス基板を浸漬することによってガラス基板の成分であるリチウムイオン、ナトリウムイオン等のアルカリ金属イオンをこれらのイオンよりイオン半径の大きなナトリウムイオン、カリウムイオン等のアルカリ金属イオンと置換するイオン交換法によって行われる。イオン半径の違いによって生じる歪みより、イオン交換された領域に圧縮応力が発生し、ガラス基板の表面が強化される。
(Chemical strengthening process)
In the chemical strengthening process, by immersing the glass substrate in a heated chemical strengthening solution, alkali metal ions such as lithium ions and sodium ions that are components of the glass substrate are converted into sodium ions and potassium ions having a larger ion radius than these ions. It is carried out by an ion exchange method for substituting alkali metal ions such as. Compressive stress is generated in the ion-exchanged region due to distortion caused by the difference in ion radius, and the surface of the glass substrate is strengthened.
本発明においては、処理槽に貯留された化学強化処理液にガラス基板を浸漬する浸漬工程と、化学強化処理液に浸漬したガラス基板を引き上げる引き上げ工程と、引き上げた前記ガラス基板を前記処理槽の上方で２秒よりも長時間で、遅くともガラス基板の温度が処理液の凝固点よりも低くなるまで待機させる待機工程と、前記待機工程の後すみやかに、前記ガラス基板を前記処理槽の上方から搬出する搬出工程とを有している。 In the present invention, a dipping step of immersing the glass substrate in a chemical strengthening treatment liquid stored in the treatment tank, a pulling up step of pulling up the glass substrate immersed in the chemical strengthening treatment liquid, and the pulled up glass substrate of the treatment tank. A standby process for waiting for 2 seconds or more until the glass substrate temperature is lower than the freezing point of the processing liquid at the latest, and immediately after the standby process, the glass substrate is unloaded from above the processing tank. An unloading process.
図１は、本実施形態で用いる化学強化及び洗浄装置の一例を示す模式図である。この装置は、化学強化処理液１７を貯留する処理槽１１と洗浄液１８を貯留する洗浄槽１２を備えている。ガラス基板１４は搬送治具１３に収納され、垂直移動ロボット１５と水平移動ロボット１６により搬送される。
FIG. 1 is a schematic view showing an example of a chemical strengthening and cleaning apparatus used in the present embodiment. This apparatus includes a
浸漬工程は、処理槽１１に貯留された化学強化処理液１７にガラス基板１４を浸漬する工程である。ガラス基板１４は搬送治具１３に収納された状態で処理槽１１の上方に搬送された後、垂直移動ロボット１５によって下方に移動して化学強化処理液１７に浸漬される。
The dipping process is a process of dipping the
化学強化処理液１７としては、硝酸カリウム（ＫＮＯ3）、硝酸ナトリウム（ＮａＮＯ3）、炭酸カリウム（Ｋ2ＣＯ3）などの溶融塩や、これらの混合物（例えば、硝酸カリウムと硝酸ナトリウムの混合物、硝酸カリウムと炭酸カリウムの混合物など）の溶融塩を用いることができる。また、更に別の金属塩等を混合したものであっても良い。
The chemical
化学強化処理液１７は、上記の成分が融解する温度よりも高温になるよう加熱される。例えば、化学強化処理液として硝酸カリウムを用いる場合には融点である３３４℃よりも高温に、硝酸ナトリウムを用いる場合には融点である３０６℃よりも高温に加熱すればよい。一方、化学強化処理液の加熱温度が高すぎると、ガラス基板の温度が上がりすぎ、ガラス基板の変形を招く虞がある。このため、化学強化処理液の加熱温度はガラス基板のガラス転移点（Ｔｇ）よりも低い温度が好ましく、ガラス転移点−５０℃よりも低い温度とすることが更に好ましい。
The chemical strengthening
イオン交換によって強化される領域（以下、「強化層」という。）の厚みや強化の程度は、ガラス基板と化学強化処理液の温度、及び浸漬時間によって決まる。情報記録媒体用ガラス基板として必要な堅さ、強度、表面粗さを備えるという観点から、強化層の厚みは、研削・研磨工程が完了した後に化学強化工程を行う場合は５μｍ〜２００μｍ、化学強化工程の後に、更に研削・研磨工程を行う場合は、１０μｍ〜５００μｍの範囲が好ましい。このような強化層の厚みを得るために必要な浸漬時間は、通常、０．５時間〜２０時間程度となる。 The thickness of the region strengthened by ion exchange (hereinafter referred to as “strengthening layer”) and the degree of strengthening are determined by the temperature of the glass substrate and the chemical strengthening treatment liquid and the immersion time. From the viewpoint of providing the necessary rigidity, strength and surface roughness as a glass substrate for information recording media, the thickness of the reinforcing layer is 5 μm to 200 μm when the chemical strengthening process is performed after the grinding / polishing process is completed. When a grinding / polishing step is further performed after the step, a range of 10 μm to 500 μm is preferable. The immersion time necessary to obtain such a thickness of the reinforcing layer is usually about 0.5 to 20 hours.
引き上げ工程は、化学強化処理液１７に浸漬したガラス基板１４を引き上げる工程である。搬送治具１３に収納された状態で化学強化処理液１７に浸漬されていたガラス基板１４は、所定の浸漬時間が経過した後、垂直移動ロボット１５によって上方に移動して化学強化処理液１７から引き上げられる。
The pulling process is a process of pulling up the
待機工程は、引き上げたガラス基板１４を処理槽１１の上方で２秒よりも長時間待機させる工程である。ガラス基板１４を化学強化処理液１７から引き上げた直後は、ガラス基板１４や搬送治具１３に付着した化学強化処理液１７の滴が下方に落下する。このような待機工程を設けることで、落下する滴の大部分を処理槽１１の内部に回収することができ、装置周辺が落下する滴によって汚染されるのを防止することができる。
The standby step is a step of waiting the pulled-up
落下する滴の量は引き上げた直後の２秒間が最も多く、時間の経過に伴って急激に減少する。その後、引き上げたガラス基板の温度が化学強化処理液の凝固点よりも低くなると、化学強化処理液は結晶化するためほとんど落下することはなくなる。そのため、ガラス基板を処理槽の上方で待機させる時間が２秒よりも長時間であれば汚染防止の効果が得られる。また、引き上げたガラス基板の温度が化学強化処理液の凝固点よりも低くなるまで待機することは、更に高い効果が得られるため好ましい。一方、引き上げたガラス基板の温度が化学強化処理液の凝固点よりも低くなった後更に長時間待機しても、製造工程にかかる時間が必要以上に長くなり生産性が低下するだけで、汚染防止の効果が向上するわけではなく、好ましくない。 The amount of dropped drops is the largest for 2 seconds immediately after the drop, and decreases rapidly with the passage of time. Thereafter, when the temperature of the pulled glass substrate becomes lower than the freezing point of the chemical strengthening treatment liquid, the chemical strengthening treatment liquid crystallizes and hardly falls. Therefore, if the time for which the glass substrate waits above the treatment tank is longer than 2 seconds, the effect of preventing contamination can be obtained. Moreover, it is preferable to wait until the temperature of the pulled-up glass substrate becomes lower than the freezing point of the chemical strengthening treatment liquid because a higher effect can be obtained. On the other hand, if the temperature of the pulled glass substrate becomes lower than the freezing point of the chemical strengthening treatment liquid, even if waiting for a longer time, the manufacturing process will take longer than necessary and productivity will be reduced, preventing contamination. This is not preferable because it does not improve the effect.
処理槽の上方で待機させるとは、化学強化処理液から引き上げたガラス基板から落下する化学強化処理液の滴が処理槽に回収され得る状態であれば良く、ガラス基板の移動を完全に停止していても良いし、上下方向や水平方向にゆっくり移動していても良い。また、付着した化学強化処理液が飛散しない程度にガラス基板に振動や衝撃を与えて滴の落下を促進することもできる。 Waiting above the treatment tank may be a state where the drop of the chemical strengthening treatment liquid falling from the glass substrate pulled up from the chemical strengthening treatment liquid can be collected in the treatment tank, and the movement of the glass substrate is completely stopped. It may be moved slowly or vertically. In addition, the drop of the droplet can be promoted by applying vibration or impact to the glass substrate to such an extent that the attached chemical strengthening treatment liquid does not scatter.
搬出工程は、待機工程の後、ガラス基板１４を処理槽１１の上方から搬出する工程である。搬送治具１３に収納されたガラス基板１４は、処理槽１１の上方で２秒よりも長時間待機した後、水平移動ロボット１６により水平方向に移動し、処理槽１１の上方から搬出される。ガラス基板１４等に付着した化学強化処理液は、待機工程の間に十分落下しているため、搬出工程中に滴が落下することによる装置周辺の汚染を最小限に抑えることができる。
The unloading process is a process of unloading the
なお、本発明においては、加熱された化学強化処理液に浸漬される際の熱衝撃によるガラス基板の割れや微細なクラックの発生を防止するため、化学強化処理液への浸漬に先立って、予熱槽でガラス基板を所定温度に加熱する予熱工程を有していても良い。 In the present invention, in order to prevent the occurrence of cracks and fine cracks in the glass substrate due to thermal shock when immersed in a heated chemical strengthening treatment liquid, preheating prior to immersion in the chemical strengthening treatment liquid is performed. You may have the pre-heating process which heats a glass substrate to predetermined temperature with a tank.
（洗浄工程）
洗浄工程は、化学強化工程の後、処理槽１１の上方から搬出されたガラス基板１４の表面に残存する化学強化処理液等の異物を十分に除去するために洗浄する工程である。搬送治具１３に収納されたガラス基板１４は、水平移動ロボット１６により水平方向に移動し、洗浄槽１２の上方に搬送された後、垂直移動ロボット１５によって下方に移動して洗浄槽１２に貯留された洗浄液１８に浸漬される。
(Washing process)
The cleaning step is a step of cleaning in order to sufficiently remove foreign substances such as a chemical strengthening treatment liquid remaining on the surface of the
洗浄液は、特に制限はなく、水、有機溶剤、界面活性剤を含んだ各種洗浄剤等の公知の洗浄液の中から適宜選択して用いることができる。特に水は、化学強化処理液が結晶化した微粒子を溶解することが容易であるため好ましく、異物の付着を防止する観点から、フィルタリングした純水、イオン交換水、超純水などが特に好ましい。結晶化した微粒子の溶解度を更に上げるため、３０〜１００℃程度に加熱した水を用いることも好ましい。 The cleaning liquid is not particularly limited, and can be appropriately selected from known cleaning liquids such as water, organic solvents, and various cleaning agents containing a surfactant. In particular, water is preferable because the chemical strengthening treatment liquid can easily dissolve crystallized fine particles, and filtered pure water, ion-exchanged water, ultrapure water, and the like are particularly preferable from the viewpoint of preventing adhesion of foreign substances. In order to further increase the solubility of the crystallized fine particles, it is also preferable to use water heated to about 30 to 100 ° C.
また、ガラス基板を洗浄液に浸漬するだけではなく、超音波を加えても良いし、スポンジ等でガラス基板の表面を擦るスクラブ式の洗浄を行っても良い。 In addition to immersing the glass substrate in the cleaning liquid, ultrasonic waves may be applied, or scrub cleaning may be performed by rubbing the surface of the glass substrate with a sponge or the like.
なお、洗浄工程は、複数の洗浄槽を用いて、複数段階に分けて行うこともできる。また、ガラス基板の表面に残存する化学強化処理液等の異物を除去するという効果以外の他の効果、例えば、ガラス基板の表面からのアルカリ金属イオン溶出を防止する効果等を併せ持った工程であっても良い。このような工程としては、例えば、ガラス基板を加熱した酸に浸漬する工程等が挙げられる。 Note that the cleaning step can be performed in a plurality of stages using a plurality of cleaning tanks. In addition, it is a process having both effects other than the effect of removing foreign substances such as chemical strengthening treatment liquid remaining on the surface of the glass substrate, for example, the effect of preventing elution of alkali metal ions from the surface of the glass substrate. May be. Examples of such a process include a process of immersing a glass substrate in heated acid.
（ガラス基板）
本発明で用いることのできるガラス基板は、化学強化処理液に浸漬することでイオン交換が可能なガラス基板であれば特に制限されない。例えば、アルミノシリケートガラス、ソーダライムガラス、ソーダアルミノケイ酸ガラス、アルミノボロシリケートガラス、ボロシリケートガラスなどが挙げられる。中でも、アルミノシリケートガラスは、耐衝撃性や耐振動性に優れるため特に好ましい。
(Glass substrate)
The glass substrate that can be used in the present invention is not particularly limited as long as the glass substrate can be ion-exchanged by being immersed in a chemical strengthening treatment solution. Examples thereof include aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, and the like. Among these, aluminosilicate glass is particularly preferable because it is excellent in impact resistance and vibration resistance.
ガラス基板の大きさに限定はない。例えば、外径が２．５インチ、１．８インチ、１インチ、０．８インチなど種々の大きさのガラス基板を用いることができる。また、ガラス基板の厚みにも限定はない。例えば、２ｍｍ、１ｍｍ、０．６３ｍｍなど種々の厚みのガラス基板を用いることができる。 There is no limitation on the size of the glass substrate. For example, glass substrates having various sizes such as 2.5 inches, 1.8 inches, 1 inch, and 0.8 inches can be used. Moreover, there is no limitation also on the thickness of a glass substrate. For example, glass substrates having various thicknesses such as 2 mm, 1 mm, and 0.63 mm can be used.
（情報記録媒体）
本発明の方法により得られた情報記録媒体用ガラス基板の上に、少なくとも記録層を形成することで情報記録媒体を得ることができる。記録層は特に限定されず、磁気、光、光磁気等の性質を利用した種々の記録層を用いることができるが、特に磁性層を記録層として用いた情報記録媒体（磁気ディスク）の製造に好適である。
(Information recording medium)
An information recording medium can be obtained by forming at least a recording layer on the glass substrate for information recording medium obtained by the method of the present invention. The recording layer is not particularly limited, and various recording layers utilizing properties such as magnetism, light, and magnetomagnetism can be used. In particular, for the production of an information recording medium (magnetic disk) using the magnetic layer as a recording layer. Is preferred.
磁性層に用いる磁性材料としては、特に限定はなく公知の材料を適宜選択して用いることができる。例えば、Ｃｏを主成分とするＣｏＰｔ、ＣｏＣｒ、ＣｏＮｉ、ＣｏＮｉＣｒ、ＣｏＣｒＴａ、ＣｏＰｔＣｒ、ＣｏＮｉＰｔ、ＣｏＮｉＣｒＰｔ、ＣｏＮｉＣｒＴａ、ＣｏＣｒＰｔＴａ、ＣｏＣｒＰｔＳｉＯなどが挙げられる。また、磁性層を非磁性膜（例えば、Ｃｒ、ＣｒＭｏ、ＣｒＶなど）で分割してノイズの低減を図った多層構成としてもよい。 The magnetic material used for the magnetic layer is not particularly limited, and a known material can be appropriately selected and used. Examples thereof include CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, and CoCrPtSiO containing Co as a main component. The magnetic layer may be divided by a nonmagnetic film (for example, Cr, CrMo, CrV, etc.) to have a multilayer structure in which noise is reduced.
磁性層として、上記のＣｏ系材料の他、フェライト系や鉄−希土類系の材料や、ＳｉＯ2、ＢＮなどからなる非磁性膜中にＦｅ、Ｃｏ、ＣｏＦｅ、ＣｏＮｉＰｔ等の磁性粒子が分散された構造のグラニュラーなどを用いることもできる。磁性層は、面内型、垂直型の何れであっても良い。 As the magnetic layer, in addition to the above-mentioned Co-based material, ferrite or iron - and material of the rare earth-based, Fe, Co, CoFe, magnetic particles such CoNiPt are dispersed in a non-magnetic film made of SiO 2, BN A granular structure can also be used. The magnetic layer may be either an in-plane type or a vertical type.
磁性膜の形成方法としては、公知の方法を用いることがでる。例えば、スパッタリング法、無電解メッキ法、スピンコート法などが挙げられる。 As a method for forming the magnetic film, a known method can be used. For example, a sputtering method, an electroless plating method, a spin coating method, and the like can be given.
磁気ディスクには、更に必要により下地層、保護層、潤滑層等を設けても良い。これらの層はいずれも公知の材料を適宜選択して用いることができる。下地層の材料としては、例えば、Ｃｒ、Ｍｏ、Ｔａ、Ｔｉ、Ｗ、Ｖ、Ｂ、Ａｌ、Ｎｉなどが挙げられる。保護層の材料としては、例えば、Ｃｒ、Ｃｒ合金、Ｃ、ＺｒＯ2、ＳｉＯ2などが挙げられる。また、潤滑層としては、例えば、パーフロロポリエーテル（ＰＦＰＥ）等からなる液体潤滑剤を塗布し、必要に応じ加熱処理を行ったものなどが挙げられる。 The magnetic disk may further be provided with an underlayer, a protective layer, a lubricating layer, etc., if necessary. Any of these layers can be used by appropriately selecting a known material. Examples of the material for the underlayer include Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. Examples of the material for the protective layer include Cr, Cr alloy, C, ZrO 2 , and SiO 2 . Moreover, as a lubrication layer, the thing etc. which apply | coated the liquid lubricant which consists of perfluoro polyether (PFPE) etc., and heat-processed as needed are mentioned, for example.
（実施例１）
ガラス材料としてアルミノシリケートガラスを用い、溶融ガラスをプレス成形してブランク材を作製した。内外周加工工程、研削・研磨工程を経て、外径６５ｍｍ、内径２０ｍｍ、厚み０．６３５ｍｍのガラス基板とした。表面粗さは、表裏ともに算術平均高さＲａ（ＪＩＳ Ｂ０６０１：２００１）が０．４〜０．５ｎｍとなるように仕上げた。
Example 1
Aluminosilicate glass was used as the glass material, and the blank glass was produced by press molding the molten glass. The glass substrate having an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm was obtained through an inner and outer peripheral processing step and a grinding / polishing step. The surface roughness was finished so that the arithmetic average height Ra (JIS B0601: 2001) was 0.4 to 0.5 nm on both sides.
化学強化処理液として、硝酸カリウム（ＫＮＯ3）の溶融塩を用意した。硝酸カリウムの融点は３３４℃である。化学強化処理液の加熱温度は４００℃とした。 As the chemical strengthening treatment liquid, a molten salt of potassium nitrate (KNO 3 ) was prepared. The melting point of potassium nitrate is 334 ° C. The heating temperature of the chemical strengthening treatment liquid was 400 ° C.
ガラス基板１０枚を１つの搬送治具にセットし、４００℃に加熱した予熱槽に投入して予熱を行った後、処理槽に貯留した化学強化処理液に浸漬した。浸漬時間は２時間とした。ガラス基板を化学強化処理液から引き上げ、処理槽の上方で２．２秒間待機した後、処理槽の上方から搬出した。その後、洗浄槽に貯留した純水に浸漬し、ガラス基板に付着した化学強化処理液等を除去した。純水温度は６０℃とし、洗浄槽に超音波を付加した。 Ten glass substrates were set in one conveyance jig, put into a preheating tank heated to 400 ° C. and preheated, and then immersed in a chemical strengthening treatment liquid stored in the treatment tank. The immersion time was 2 hours. The glass substrate was pulled up from the chemical strengthening treatment liquid, and after waiting for 2.2 seconds above the treatment tank, it was carried out from above the treatment tank. Then, the chemical strengthening process liquid etc. which were immersed in the pure water stored in the washing tank and adhered to the glass substrate were removed. The pure water temperature was 60 ° C., and ultrasonic waves were added to the cleaning tank.
ガラス基板を入れ替えて同様の工程を２０回繰り返し、処理済みの基板２００枚を得た。１回目に処理した搬送治具、１０回目に処理した搬送治具、及び２０回目に処理した搬送治具からそれぞれ１０枚ずつのガラス基板を抜き取り、ガラス基板の表面に付着する異物の数を評価した。評価はクリーンルーム内の光学顕微鏡で行い、ガラス基板１枚当たりに存在する１μｍ以上の異物の数を求めた。ここでは、ガラス基板１枚当たりに存在する１μｍ以上の異物の数が２未満であれば性能上問題とならず良好（○）、２以上の場合は性能上問題あり（×）と判断した。 The glass substrate was replaced and the same process was repeated 20 times to obtain 200 processed substrates. Ten glass substrates are extracted from each of the conveyance jig processed the first time, the conveyance jig processed the 10th time, and the conveyance jig processed the 20th time, and the number of foreign substances adhering to the surface of the glass substrate is evaluated. did. The evaluation was performed with an optical microscope in a clean room, and the number of foreign matters having a size of 1 μm or more present per glass substrate was determined. Here, it was judged that there was no problem in performance if the number of foreign matters having a size of 1 μm or more present per glass substrate was less than 2 (◯), and that there were problems in performance if the number was 2 or more (×).
評価結果を表１に示す。ガラス基板１枚当たりに存在する１μｍ以上の異物の数は、１回目に処理した基板の平均が０．７個、１０回目に処理した基板の平均が０．８個、２０回目に処理した基板の平均が１．３個であり、いずれも良好であることが確認された。 The evaluation results are shown in Table 1. The number of foreign matters of 1 μm or more present on one glass substrate is 0.7 on the average of the substrates processed at the first time, 0.8 on the average of the substrates processed on the 10th time, and the substrate processed on the 20th time. The average of 1.3 was 1.3, and it was confirmed that all were good.
（実施例２）
ガラス基板を化学強化処理液から引き上げた後、処理槽の上方で待機する時間を１５秒間とした以外は、実施例１と同様の条件で処理を行い、処理済みのガラス基板について表面に付着する異物の数を評価した。１５秒間待機した時点におけるガラス基板の温度は３２５℃であり、硝酸カリウムの凝固点よりも低温であった。なお、実施例２の処理は、実施例１の処理の後、装置周辺を清掃すると共に、化学強化処理液と洗浄液を未使用のものに入れ替えた後に行った。
(Example 2)
After pulling up the glass substrate from the chemical strengthening treatment solution, the treatment is performed under the same conditions as in Example 1 except that the waiting time above the treatment tank is 15 seconds, and the treated glass substrate adheres to the surface. The number of foreign bodies was evaluated. The temperature of the glass substrate at the time of waiting for 15 seconds was 325 ° C., which was lower than the freezing point of potassium nitrate. In addition, the process of Example 2 was performed after cleaning the periphery of the apparatus after the process of Example 1 and replacing the chemical strengthening treatment liquid and the cleaning liquid with unused ones.
評価結果を表１に併せて示す。ガラス基板１枚当たりに存在する１μｍ以上の異物の数は、１回目に処理した基板の平均が０．８個、１０回目に処理した基板の平均が０．８個、２０回目に処理した基板の平均が０．７個であり、いずれも良好であり、繰り返し処理を行っても異物の数は増加していないことが確認された。 The evaluation results are also shown in Table 1. The number of foreign matters of 1 μm or more present on one glass substrate is 0.8 on the average of the substrates processed at the first time, 0.8 on the average of the substrates processed on the 10th time, and the substrate processed on the 20th time. The average number of particles was 0.7, both of which were good, and it was confirmed that the number of foreign matters did not increase even after repeated treatment.
（実施例３）
ガラス基板を化学強化処理液から引き上げた後、処理槽の上方で待機する時間を３秒間とした以外は、実施例１と同様の条件で処理を行い、処理済みのガラス基板について表面に付着する異物の数を評価した。なお、実施例３の処理は、実施例２の処理の後、装置周辺を清掃すると共に、化学強化処理液と洗浄液を未使用のものに入れ替えた後に行った。
(Example 3)
After pulling up the glass substrate from the chemical strengthening treatment solution, the treatment is performed under the same conditions as in Example 1 except that the waiting time above the treatment tank is 3 seconds, and the treated glass substrate adheres to the surface. The number of foreign bodies was evaluated. In addition, the process of Example 3 was performed after cleaning the periphery of the apparatus after the process of Example 2 and replacing the chemical strengthening treatment liquid and the cleaning liquid with unused ones.
評価結果を表１に併せて示す。ガラス基板１枚当たりに存在する１μｍ以上の異物の数は、１回目に処理した基板の平均が０．８個、１０回目に処理した基板の平均が０．８個、２０回目に処理した基板の平均が１個であり、いずれも良好であることが確認された。 The evaluation results are also shown in Table 1. The number of foreign matters of 1 μm or more present on one glass substrate is 0.8 on the average of the substrates processed at the first time, 0.8 on the average of the substrates processed on the 10th time, and the substrate processed on the 20th time. The average of 1 was 1 and it was confirmed that both were good.
（比較例１）
ガラス基板を化学強化処理液から引き上げた後、処理槽の上方で待機する時間を１．５秒間とした以外は、実施例１と同様の条件で処理を行い、処理済みのガラス基板について表面に付着する異物の数を評価した。処理槽から洗浄槽への搬送中に、ガラス基板や搬送治具に付着した化学強化処理液の滴が装置周辺に落下して汚染されていくのが目視で確認された。なお、比較例１の処理は、実施例３の処理の後、装置周辺を清掃すると共に、化学強化処理液と洗浄液を未使用のものに入れ替えた後に行った。
(Comparative Example 1)
After pulling up the glass substrate from the chemical strengthening treatment solution, the treatment is performed under the same conditions as in Example 1 except that the time for waiting above the treatment tank is 1.5 seconds. The number of adhering foreign matters was evaluated. During conveyance from the treatment tank to the cleaning tank, it was visually confirmed that the chemical strengthening treatment liquid droplets adhering to the glass substrate and the conveyance jig dropped around the apparatus and were contaminated. In addition, the process of the comparative example 1 was performed after replacing the chemical strengthening process liquid and the washing | cleaning liquid to the unused thing while cleaning the apparatus periphery after the process of Example 3. FIG.
評価結果を表１に併せて示す。ガラス基板１枚当たりに存在する１μｍ以上の異物の数は、１回目に処理した基板の平均が０．８個、１０回目に処理した基板の平均が２．３個、２０回目に処理した基板の平均が５．２個であり、処理を繰り返すことで性能上問題となるレベルまで異物の数が増加することが確認された。 The evaluation results are also shown in Table 1. The number of foreign matters having a size of 1 μm or more present on one glass substrate is 0.8 on the average of the substrates processed at the first time, 2.3 on the average of the substrates processed on the 10th time, and the substrate processed on the 20th time. It was confirmed that the number of foreign substances increased to a level causing performance problems by repeating the process.
１１ 処理槽
１２ 洗浄槽
１３ 搬送治具
１４ ガラス基板
１７ 化学強化処理液
１８ 洗浄液
DESCRIPTION OF
Claims (3)
処理槽に貯留された化学強化処理液にガラス基板を浸漬する浸漬工程と、
前記化学強化処理液に浸漬した前記ガラス基板を引き上げる引き上げ工程と、
引き上げた前記ガラス基板を前記処理槽の上方で２秒よりも長時間で、遅くともガラス基板の温度が処理液の凝固点よりも低くなるまで待機させる待機工程と、
前記待機工程の後すみやかに、前記ガラス基板を前記処理槽の上方から搬出する搬出工程とを有することを特徴とする情報記録媒体用ガラス基板の製造方法。 In the method for producing a glass substrate for an information recording medium, comprising the step of chemically strengthening the glass substrate by immersing the glass substrate in a chemical strengthening treatment liquid,
An immersion step of immersing the glass substrate in the chemical strengthening treatment liquid stored in the treatment tank;
A pulling step of pulling up the glass substrate immersed in the chemical strengthening treatment liquid;
A standby step of waiting for the glass substrate that has been pulled up above the processing tank to be longer than 2 seconds and at the latest until the temperature of the glass substrate is lower than the freezing point of the processing liquid;
A method for producing a glass substrate for an information recording medium, comprising: an unloading step of unloading the glass substrate from above the processing tank immediately after the standby step.
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