JP4875476B2 - 建材 - Google Patents
建材 Download PDFInfo
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- JP4875476B2 JP4875476B2 JP2006324968A JP2006324968A JP4875476B2 JP 4875476 B2 JP4875476 B2 JP 4875476B2 JP 2006324968 A JP2006324968 A JP 2006324968A JP 2006324968 A JP2006324968 A JP 2006324968A JP 4875476 B2 JP4875476 B2 JP 4875476B2
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- Japan
- Prior art keywords
- coating
- group
- weight
- ink
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004566 building material Substances 0.000 title claims description 31
- 238000000576 coating method Methods 0.000 claims description 128
- 239000011248 coating agent Substances 0.000 claims description 126
- 239000000463 material Substances 0.000 claims description 68
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 62
- 239000000758 substrate Substances 0.000 claims description 42
- 239000003973 paint Substances 0.000 claims description 41
- 239000011941 photocatalyst Substances 0.000 claims description 24
- 230000001699 photocatalysis Effects 0.000 claims description 22
- 239000004094 surface-active agent Substances 0.000 claims description 14
- 238000002834 transmittance Methods 0.000 claims description 6
- 238000004381 surface treatment Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 86
- 239000010410 layer Substances 0.000 description 78
- 239000000976 ink Substances 0.000 description 77
- 239000010408 film Substances 0.000 description 51
- 239000002585 base Substances 0.000 description 40
- -1 γ-chloropropyl groups Chemical group 0.000 description 38
- 239000008119 colloidal silica Substances 0.000 description 36
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 35
- 239000000243 solution Substances 0.000 description 33
- 229920002050 silicone resin Polymers 0.000 description 29
- 239000007787 solid Substances 0.000 description 25
- 239000003960 organic solvent Substances 0.000 description 24
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 150000001282 organosilanes Chemical class 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- 239000000377 silicon dioxide Substances 0.000 description 20
- 239000003054 catalyst Substances 0.000 description 19
- 239000008199 coating composition Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- 150000002430 hydrocarbons Chemical group 0.000 description 18
- 239000000049 pigment Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 17
- 238000006460 hydrolysis reaction Methods 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 15
- 239000000843 powder Substances 0.000 description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 239000011247 coating layer Substances 0.000 description 12
- 230000007062 hydrolysis Effects 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 238000013461 design Methods 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 11
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000006482 condensation reaction Methods 0.000 description 9
- 238000001035 drying Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000007639 printing Methods 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000010422 painting Methods 0.000 description 7
- 125000005372 silanol group Chemical group 0.000 description 7
- 150000003377 silicon compounds Chemical class 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 238000005507 spraying Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000004568 cement Substances 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 238000006068 polycondensation reaction Methods 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 5
- 239000012445 acidic reagent Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 239000002734 clay mineral Substances 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 4
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 4
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000005055 methyl trichlorosilane Substances 0.000 description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 239000012783 reinforcing fiber Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- TYKCBTYOMAUNLH-MTOQALJVSA-J (z)-4-oxopent-2-en-2-olate;titanium(4+) Chemical compound [Ti+4].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O TYKCBTYOMAUNLH-MTOQALJVSA-J 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 2
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- 229940106681 chloroacetic acid Drugs 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000013065 commercial product Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 2
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 2
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 2
- QHNXEVRKFKHMRL-UHFFFAOYSA-N dimethylazanium;acetate Chemical compound CNC.CC(O)=O QHNXEVRKFKHMRL-UHFFFAOYSA-N 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- WNEDOMBPJDUQPS-BFIADXHOSA-L dioctyltin(2+);(z)-4-hydroxy-4-oxobut-2-enoate Chemical compound CCCCCCCC[Sn](OC(=O)\C=C/C(O)=O)(OC(=O)\C=C/C(O)=O)CCCCCCCC WNEDOMBPJDUQPS-BFIADXHOSA-L 0.000 description 2
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Description
本発明における塗装の対象である基材1としては適宜のものを用いることができるが、例えばセメント系の無機質板を用いることができる。無機質板の作製には、セメントと補強繊維を主成分とする湿潤シート(グリーンシート)を用いることができる。この湿潤シートは、セメント系の水性スラリーを原料組成物として用いて、長網式、丸網式の各種の抄造法により抄造することができるが、押出成形等の他の適宜の手法も採用することができる。原料組成物としては、例えば水硬性のセメント成分が30〜95質量%、シリカ、珪石粉、フライアッシュ等の充填材が2〜60質量%、パルプ等の補強繊維が3〜10質量%を占める固形分からなるものとし、この固形分100重量部に対し、水50〜2000重量部程度の割合としたスラリーを用いることができる。尚、セメント成分は、普通ポルトランドセメントをはじめ、高炉セメント等の、適宜に組成調整されたものを用いることができる。補強繊維のパルプは、針葉樹パルプ、広葉樹パルプ、古紙パルプ、あるいはこれらのうち二種以上の混合物等を用いることができる。この湿潤シートを養生硬化することにより、基材1を得ることができる。
このような基材1に対して、模様層2の形成に先立って、この模様層2が形成される面に親水性処理を施す。
光触媒塗膜3は、光触媒機能を有する酸化物を含有する無機塗料を基材1の表面に塗布成膜することで形成することができる。
〔n=0〜3を示し、R1、R2は1価の炭化水素基を示す。〕
また、無機塗料の他の例としては、一般式が下記式〔5〕で表される加水分解性オルガノシランを有機溶媒または水分散されたコロイダルシリカ中で、官能基(X)1モルに対し水0.001〜0.5モルを使用する条件下で部分加水分解したオルガノシランのシリカ分散オリゴマー溶液と、
〔式中、R3は同一または異種の置換もしくは非置換の炭素数1〜8の1価の炭化水素基を示し、nは0〜3の整数、Xは加水分解性基を示す。〕
〔式中、R4は同一または異種の置換もしくは非置換の炭素数1〜8の1価の炭化水素基を示し、aおよびbはそれぞれ0.2≦a≦2、0.0001≦b≦3、a+b<4の関係を満たす数である。〕
式〔6〕中のR4は炭素数1〜8の置換もしくは非置換の1価の炭化水素基を示し、具体的には上述のR2と同様の炭化水素基が例示されるが、好ましくは、炭素数1〜4のアルキル基、フェニル基、ビニル基、γ−グリシドキシプロピル基、γ−メタクリロキシプロピル基、γ−アミノプロピル基、3,3,3−トリフルオロプロピル基等の置換炭化水素基、より好ましくはメチル基、及び、フェニル基である。また、前記〔6〕式中のa及びbはそれぞれ0.2≦a≦2、0.0001≦b≦3、a+b<4の関係を満たす数である。aが0.2未満またはbが3を超えると硬化塗膜にクラックを生じる等の不都合があり、また、aが2.0を超え4以下の場合またはbが0.0001未満では硬化がうまく進行しない。
界面活性剤処理は、基材1に対して適宜の界面活性剤を塗布することで行うことができる。界面活性剤としては、適宜のものを用いることができ、その親水基がイオン性であっても非イオン性であってもよく、また低分子型でも高分子型でも良い。このような界面活性剤は、例えばアクリル系、ウレタン系、フッ素系、シリコン系などの樹脂に1重量%以下の割合で混合したものを基材1に塗布することができる。また、この界面活性剤を、水や適宜の溶剤など、この界面活性剤を溶解させることができる溶媒に1重量%以下の割合で混合して基材1に塗布しても良い。この界面活性剤の種類や塗布量を調整することで処理後の基材1の表面の親水性を調整することができる。
アルコキシシラン縮合体コーティング5は、下記式〔7〕で表される4官能性アルコキシシランのみを加水分解重縮合させて得られるシリコーンレジンを含む無機塗料組成物を基材1に塗布成膜して形成することができる。
[式中、Rは炭素数7までのアルキル基又はアリール基]
無機塗料組成物を製造する方法は、特に限定はされず、各成分を通常の方法および装置等を用いて混合すればよい。塗料に導入する際の各成分の形態についても、それ自身液状のものや、溶媒に溶解してなる溶液、分散媒中に分散してなる分散液等の液状、粉体等の固体状等を問わず、特に限定はされない。
このような親水性処理を施した後、基材1の親水性処理が施された面に対して、水性インクを印刷塗布して模様層2が形成される。
(式中、R1は同一または異種の、アルキル基、シクロアルキル基、アルケニル基、ハロゲン置換炭化水素基、γ−メタクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基およびγ−メルカプトプロピル基からなる群より選ばれる、炭素数1〜8の1価炭化水素基を示し、nは0〜3の整数、Xはアルコキシ基、アセトキシ基、オキシム基、エノキシ基、アミノ基、アミノキシ基およびアミド基からなる群より選ばれる加水分解性基を示す。)
(式中、R2は同一または異種の、アルキル基、シクロアルキル基、アルケニル基、ハロゲン置換炭化水素基、γ−メタクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基およびγ−メルカプトプロピル基からなる群より選ばれる、炭素数1〜8の1価炭化水素基を示し、aおよびbはそれぞれ0.2≦a≦2、0.0001≦b≦3、a+b<4の関係を満たす数である。)
基材1としてポリカーボネート樹脂板(筒中プラスチック工業株式会社製の「ポリカエースECK100L」;光透過率89%)を用い、この基材1に対して次のようにして親水性処理として光触媒塗膜3を形成する処理を行った。
次いで、クリアー層6を形成した。このクリアー層6は、アクリル系エマルションをベースにしたアクリル樹脂塗料をスプレー塗装し、120℃で5分乾燥焼付けすることで、乾燥後塗膜厚みが20μmとなるように形成した。
実施例1と同一の基材1に対し、界面活性剤(住友スリーエム株式会社製の「3M ノベックFC4432」)、イソプロピルアルコール(IPA)100重量部に対して0.5重量部添加したものを、スプレーで湿潤塗膜量で30g/m2塗布し、常温乾燥することで、界面活性剤処理を施した。
実施例1と同一の基材1に対し、親水性処理として次のようにアルコキシシラン縮合コーティングを施した。
実施例1と同一の基材1に対し、インク受理層を形成した。インク受理層は、アクリル系エマルション樹脂を70重量部、吸湿性樹脂(インキ吸収性ポリマー)としてポリビニルアルコールを30重量部、白色顔料として酸化チタンを100重量部(PWC=50%)を含む受理層形成用組成物を塗布成膜して、厚み30μmに形成した。
実施例1と同一の基材1に対し、何ら処理を施すことなく、カッティングシートとして住友スリーエム株式会社製の「スコッチカル」を貼着した。
実施例1〜3及び比較例1〜2で得られた建材に対し、JIS K5600に規定されるキセノンウエザオメーターを用いた促進耐候性試験を3000時間行った後、JIS K5600で規定されるクロスカット(1mm幅5×5マス)によるセロハン粘着テープを用いた剥離試験をおこなった。
また、実施例1〜3及び比較例1〜2につき、上記付着性評価時の同様の促進耐候性試験を行った後の建材を目視で観察し、外観の評価を行った。
2 模様層
3 光触媒塗膜
5 アルコキシシラン縮合体コーティング
6 クリアー層
7 無機質塗料層
8 光触媒層
Claims (5)
- 基材表面に親水性処理を施した後、水性インクを塗布して模様層を形成し、模様層に対してクリアー層、無機質塗料層及び光触媒層を順次積層して設けて成ることを特徴とする建材。
- 上記親水性処理が、基材の表面に光触媒塗膜を形成する処理であることを特徴とする請求項1に記載の建材。
- 上記親水性処理が、界面活性剤による表面処理であることを特徴とする請求項1に記載の建材。
- 上記親水性処理が、基材の表面にアルコキシシラン縮合体コーティングを施す処理であることを特徴とする請求項1に記載の建材。
- 基材が可視光透過率80%以上であることを特徴とする請求項1乃至4のいずれか一項に記載の建材。
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