JP4880922B2 - Disc processing base fabric - Google Patents
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- JP4880922B2 JP4880922B2 JP2005184620A JP2005184620A JP4880922B2 JP 4880922 B2 JP4880922 B2 JP 4880922B2 JP 2005184620 A JP2005184620 A JP 2005184620A JP 2005184620 A JP2005184620 A JP 2005184620A JP 4880922 B2 JP4880922 B2 JP 4880922B2
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- 238000012545 processing Methods 0.000 title claims description 68
- 239000004744 fabric Substances 0.000 title claims description 66
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 40
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 39
- 239000000835 fiber Substances 0.000 claims description 39
- 238000010521 absorption reaction Methods 0.000 claims description 35
- 239000007788 liquid Substances 0.000 claims description 32
- 229920001410 Microfiber Polymers 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 15
- 239000007864 aqueous solution Substances 0.000 claims description 14
- 239000005871 repellent Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 16
- 239000002002 slurry Substances 0.000 description 16
- 239000000758 substrate Substances 0.000 description 16
- 230000002940 repellent Effects 0.000 description 15
- 239000004745 nonwoven fabric Substances 0.000 description 13
- 238000005498 polishing Methods 0.000 description 13
- 239000008213 purified water Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 239000006061 abrasive grain Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- -1 polyethylene terephthalate Polymers 0.000 description 8
- 239000004480 active ingredient Substances 0.000 description 6
- 125000000129 anionic group Chemical group 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 230000008595 infiltration Effects 0.000 description 4
- 238000001764 infiltration Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- LQZZUXJYWNFBMV-UHFFFAOYSA-N 1-dodecanol group Chemical group C(CCCCCCCCCCC)O LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 229920002292 Nylon 6 Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 229920005749 polyurethane resin Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229960000878 docusate sodium Drugs 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- LGNQGTFARHLQFB-UHFFFAOYSA-N 1-dodecyl-2-phenoxybenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1OC1=CC=CC=C1 LGNQGTFARHLQFB-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 1
- JMGZBMRVDHKMKB-UHFFFAOYSA-L disodium;2-sulfobutanedioate Chemical compound [Na+].[Na+].OS(=O)(=O)C(C([O-])=O)CC([O-])=O JMGZBMRVDHKMKB-UHFFFAOYSA-L 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- SFNALCNOMXIBKG-UHFFFAOYSA-N ethylene glycol monododecyl ether Chemical compound CCCCCCCCCCCCOCCO SFNALCNOMXIBKG-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006350 polyacrylonitrile resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920003226 polyurethane urea Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Nonwoven Fabrics (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
本発明は、ディスク加工用基布およびその製造方法に関し、さらに詳しくは高精度の仕上げを要求される磁気記録媒体及び類似材料を製造する際に用いられるディスク加工用基布およびその製造方法に関する。 The present invention relates to a disk processing base fabric and a method for manufacturing the same, and more particularly to a disk processing base fabric used for manufacturing a magnetic recording medium and similar materials that require high-precision finishing and a method for manufacturing the same.
近年コンピューターなどの情報処理技術の発達に伴い、磁気記録媒体やシリコンウエハーに対する高精度の表面仕上げが要求されている。例えば磁気記録媒体のハードディスク等を製造する場合、基盤となるアルミニウム、ガラス等の表面を平滑化する加工を行うが、そこで用いられるディスク加工用基布に対する要求もますます高くなってきている。また、研磨方法の一種として、ディスク表面に微細な溝を形成させるために砥粒を分散させたスラリーと研磨用基布を用いたテクスチャ加工と呼ばれる表面加工処理がおこなわれることが増加しており、高容量化、高密度化のために最適な研磨用のディスク加工用基布が求められている。 In recent years, with the development of information processing technologies such as computers, high-precision surface finishing is required for magnetic recording media and silicon wafers. For example, when manufacturing a hard disk or the like of a magnetic recording medium, a process of smoothing the surface of a base such as aluminum or glass is performed. However, there is an increasing demand for a disk processing base fabric used there. Also, as a kind of polishing method, surface processing called “texturing” using a slurry in which abrasive grains are dispersed and a polishing base fabric to form fine grooves on the disk surface is increasing. Therefore, there is a demand for a polishing base fabric for polishing that is optimal for increasing the capacity and increasing the density.
このようなディスク加工用基布としてはスラリーを保持しやすい繊維を用いたシート状物が広く用いられているが、このような通常の基布を用いた場合、研磨に用いるスラリーが基布内部に大量に侵入し、基布表面での研磨効率が低下するという問題があった。 As such a disk processing base fabric, a sheet-like material using fibers that easily hold the slurry is widely used, but when such a normal base fabric is used, the slurry used for polishing is the inside of the base fabric. There was a problem that the polishing efficiency on the surface of the base fabric was lowered due to the large amount of penetration.
そこで、例えば特許文献1では一方の表面に500μm以下の厚さである親水性の層を有する、片方の吸水高さが20mm/時間以上であり、その反対側の吸水高さが5mm/時間以下である研磨基布が提案されている。しかし現在ではより高精度と高効率が要求されてきているが、この基布は基本的には全体が撥水性を有するために、裏側に存在するスラリーを十分に有効利用できず加工レートが上がらないという問題があった。また加工に用いるスラリーの挙動と水の挙動の違いから効果が十分でないという問題があった。
本発明の目的は、加工時に高精度かつ高効率性が得られるディスク加工用基布とその製造方法を提供することである。 An object of the present invention is to provide a disk processing base fabric that can obtain high accuracy and high efficiency during processing, and a method for manufacturing the same.
本発明のディスク加工用基布は、繊維を含むシート状物であって、加工使用面が極細繊維立毛を有し、加工使用面における液滴の吸液時間が10〜60秒/15μlであって、非使用面である裏面における液滴の吸液時間が0.001〜5秒/15μlであることを特徴とする。さらには、加工使用面における液滴の吸液水時間が、裏面における液滴吸液時間の5倍以上であること、該繊維が、0.1dtex以下の極細繊維であること、該シート状物が繊維と高分子弾性体からなるものであることが好ましい。 The disk processing base fabric of the present invention is a sheet-like material containing fibers, the processing use surface has very fine fiber napping, and the liquid absorption time of the droplet on the processing use surface is 10 to 60 seconds / 15 μl. The liquid absorption time of the droplets on the back surface, which is a non-use surface, is 0.001 to 5 seconds / 15 μl. Furthermore, the water absorption time of the droplets on the working surface is 5 times or more of the liquid absorption time on the back surface, the fibers are ultrafine fibers of 0.1 dtex or less , the sheet-like material Is preferably composed of a fiber and a polymer elastic body.
また別の本発明のディスク加工用基布の製造方法は、繊維を含み、加工使用面は極細繊維立毛を有し、かつ全層が親水性を示すシート状物の一方の表面に撥水剤を含有する溶液を10〜150g/m2塗布することを特徴とする。 Another method for producing a disk processing base fabric according to the present invention comprises a water repellent agent on one surface of a sheet-like material that contains fibers, the processing surface has ultrafine fibers, and the entire layer is hydrophilic. A solution containing 10 to 150 g / m 2 is applied .
本発明によれば、加工時に高精度かつ高効率性が得られるディスク加工用基布とその製造方法が提供される。 ADVANTAGE OF THE INVENTION According to this invention, the base fabric for disk processing from which high precision and high efficiency are obtained at the time of a process, and its manufacturing method are provided.
以下、本発明を詳細に説明する。
本発明のディスク加工用基布は、繊維を含むシート状物である。このとき均一に研磨するためには繊維として合成繊維を用いることが好ましく、より具体的な例としてはナイロン6、ナイロン6,6、ナイロン12などのポリアミド繊維、またはポリエチレンテレフタレート、ポリブチレンテレフタレートなどのポリエステル繊維などを挙げることができる。特にナイロン等のポリアミド繊維を用いた場合にはモジュラスが低く、研磨時にスクラッチ傷が発生しにくく適している。
Hereinafter, the present invention will be described in detail.
The base fabric for disk processing of the present invention is a sheet-like material containing fibers. In order to uniformly polish at this time, it is preferable to use a synthetic fiber as the fiber, and more specific examples include polyamide fibers such as nylon 6, nylon 6, 6, nylon 12, or polyethylene terephthalate, polybutylene terephthalate, etc. A polyester fiber etc. can be mentioned. In particular, when a polyamide fiber such as nylon is used, the modulus is low and scratch scratches are less likely to occur during polishing.
また、その繊維の繊度としては0.1dtex以下の極細繊維であることが好ましく、さらには0.0001〜0.1dtexの繊度であることが好ましい。繊度が小さい場合には極細繊維の強度が低下しがちであり、研磨時の表面強度や、繊維質基材としての強度も低下する傾向にある。また繊度が大きすぎる場合には、研磨工程時に被研磨基材を傷つけやすい傾向にある。さらに本発明のディスク加工用基布は表面に立毛を有するものであることが好ましい。特にその立毛が極細繊維からなる場合、親水性の制御を行いやすく最適である。 The fineness of the fiber is preferably an ultrafine fiber of 0.1 dtex or less, and more preferably 0.0001 to 0.1 dtex. When the fineness is small, the strength of the ultrafine fibers tends to decrease, and the surface strength during polishing and the strength as a fibrous base material tend to decrease. If the fineness is too large, the substrate to be polished tends to be damaged during the polishing step. Furthermore, the disk processing base fabric of the present invention preferably has napped surfaces. In particular, when the napping is made of ultrafine fibers, it is easy to control the hydrophilicity and is optimal.
本発明のディスク加工用基布は、繊維を含むいわゆる繊維質基材から構成されているものであるが、この繊維質基材としては、繊維のみからなる、織編物や不織布でも良いが、基材が弾性高分子を含むことが好ましく、極細繊維と弾性高分子からなる繊維質基材であることが最も好ましい。さらには繊維質基材が極細繊維が収束してなる繊維束によって構成されていることが好ましい。繊維質基材がこのような極細繊維からなる繊維束と弾性高分子から構成されている場合には、その基材内部では主に弾性高分子が繊維束の外部に存在しており、繊維束内には弾性高分子が存在していないことが好ましい。研磨用基布が柔軟になり研磨傷の発生が抑制される傾向にある。 The disk processing base fabric of the present invention is composed of a so-called fibrous base material containing fibers, and the fibrous base material may be a woven or knitted fabric or a non-woven fabric made of only fibers. The material preferably contains an elastic polymer, and most preferably a fibrous base material composed of ultrafine fibers and an elastic polymer. Furthermore, it is preferable that the fibrous base material is constituted by a fiber bundle in which ultrafine fibers are converged. When the fibrous base material is composed of a fiber bundle made of such ultrafine fibers and an elastic polymer, the elastic polymer is mainly present outside the fiber bundle inside the base material. It is preferable that no elastic polymer is present inside. The base fabric for polishing tends to be flexible and the occurrence of polishing flaws tends to be suppressed.
繊維質基材に用いられうる弾性高分子としては、ポリウレタン系樹脂、ポリウレタン・ポリウレア系樹脂、ポリアクリル酸系樹脂、ポリスチレン・ブタジエン系樹脂、ポリアクリロニトリル・ブタジエン系樹脂などが挙げられるが、加工性、耐摩耗性、耐加水分解性等の点よりポリウレタン系樹脂が好ましい。中でも研磨砥粒のスラリーがアルカリ性または酸性でポリウレタン系樹脂の加水分解劣化を伴うような場合には、エーテル系、またはカーボネート系ポリウレタンであることが好ましい。さらに繊維質基材中に高分子弾性重合体を重量比率5〜95%の範囲で含むことが好ましく、より好ましくは10〜50%の範囲であり、20〜40%の範囲であることが最も好ましい。さらには弾性高分子は湿式凝固法などによる多孔質状であることが、砥粒を把持しスクラッチなどの欠点を発生させることなく研磨する上で好ましい。 Examples of the elastic polymer that can be used for the fibrous base material include polyurethane resins, polyurethane / polyurea resins, polyacrylic acid resins, polystyrene / butadiene resins, and polyacrylonitrile / butadiene resins. In view of wear resistance, hydrolysis resistance, etc., polyurethane resins are preferred. In particular, when the slurry of the abrasive grains is alkaline or acidic and is accompanied by hydrolysis degradation of the polyurethane-based resin, it is preferably an ether-based or carbonate-based polyurethane. Further, it is preferable that the fibrous base material contains a high-molecular elastic polymer in the range of 5 to 95% by weight, more preferably in the range of 10 to 50%, and most preferably in the range of 20 to 40%. preferable. Furthermore, it is preferable that the elastic polymer is porous by a wet coagulation method or the like in order to hold the abrasive grains and polish without causing defects such as scratches.
さて本発明のディスク加工用基布は上述のような繊維を含むシート状物であるが、その加工使用面における液滴の吸液時間が10〜60秒/15μlであって、非使用面である裏面における液滴の吸液時間が0.001〜5秒/15μlであることを必須とする。さらには、加工使用面における液滴の吸液時間は15〜50秒/15μlであることが好ましく、裏面における液滴の吸液時間は0.01〜2秒/15μlであることが好ましい。また、加工使用面における液滴の吸液水時間が、裏面における液滴吸液時間の5倍以上であることが好ましい。本発明において液滴とは、水ではなく、加工に使用される加工液、スラリーの液滴により近い物性、例えば表面張力を示す10%イソプロピルアルコール水溶液であることが好ましい。そして液滴の代わりに精製水を用いた場合の吸水時間としては、加工使用面においては精製水15μlの液滴が600秒以上吸水されないことが好ましく、裏側においては吸水時間が0.01〜5秒/15μlであることが好ましい。
ここで液滴の吸液時間とは、基布の上2cmの高さから液滴15μl(1滴)を滴下し、基布に吸液し終わるまでの時間を測定し、単位を秒/15μlで表したものである。
Now, the disk processing base fabric of the present invention is a sheet-like material containing fibers as described above, and the liquid absorption time of the droplet on the processing and use surface is 10 to 60 seconds / 15 μl, and the non-use surface. It is essential that the liquid absorption time of a droplet on a certain back surface is 0.001 to 5 seconds / 15 μl. Furthermore, it is preferable that the liquid absorption time of the liquid droplet on the working surface is 15 to 50 seconds / 15 μl, and the liquid absorption time of the liquid droplet on the back surface is preferably 0.01 to 2 seconds / 15 μl. Moreover, it is preferable that the liquid absorption time of the droplet on the processing and use surface is 5 times or more of the liquid absorption time on the back surface. In the present invention, the droplets are preferably not a water but a 10% isopropyl alcohol aqueous solution that exhibits properties close to that of the working fluid used for processing and the droplets of the slurry, for example, surface tension. And as for the water absorption time when purified water is used instead of droplets, it is preferable that a droplet of 15 μl of purified water is not absorbed for 600 seconds or more on the processing use surface, and the water absorption time is 0.01 to 5 on the back side. Preferably it is sec / 15 μl.
Here, the liquid absorption time of the liquid droplets is measured by measuring the time taken to drop 15 μl (1 drop) of liquid droplets from a height of 2 cm above the base fabric and completing the liquid absorption on the base fabric, and the unit is seconds / 15 μl. It is represented by.
本発明のディスク加工用基布では、このように加工使用面と非加工面である裏面において液滴の吸液速度が異なることにより、基布使用時に、加工液が裏側へすぐに抜けてしまわずかつ均一にディスク表面にとどまり、さらに加工時に基布裏面からバックロール等で圧力がかかることによって、加工液の加工効率がより向上させるのである。 In the disk processing base fabric of the present invention, the liquid absorption speed of the liquid droplets is different between the processing use surface and the back surface, which is a non-processing surface. The processing efficiency of the processing liquid is further improved by staying on the disk surface slightly and uniformly and applying pressure from the back of the base fabric with a back roll or the like during processing.
このような本発明のディスク加工用基布の形状としては、長さ方向、幅方向で厚さが均一であることが好ましい。ディスク加工用基布の幅は5〜300mm、さらに好ましくは7〜200mmであることが好ましく、長さ方向が幅方向よりも長いテープ状であることが好ましい。また厚さとしては0.3〜1.2mmが好ましく、0.3mm未満では強度が不足する傾向にあり、1.2mm以上では厚く作業性が低下する傾向にある。厚さを最適化するため、または生産性を上げるためには、厚い基布を一旦製造し、スライスして所定の厚さにするのも良い方法である。 The shape of the disk processing base fabric of the present invention is preferably uniform in the length direction and the width direction. The width of the base fabric for disk processing is preferably 5 to 300 mm, more preferably 7 to 200 mm, and the length direction is preferably a tape shape longer than the width direction. The thickness is preferably 0.3 to 1.2 mm. If the thickness is less than 0.3 mm, the strength tends to be insufficient. If the thickness is 1.2 mm or more, the workability tends to decrease. In order to optimize the thickness or increase the productivity, it is also a good method to once manufacture a thick base fabric and slice it to a predetermined thickness.
このような本発明のディスク加工用基布は、もう一つの本発明であるディスク加工用基布の製造方法によって得ることができる。すなわち、繊維を含みかつ全層が親水性を示すシート状物の加工使用面に撥水剤を含有する溶液を10〜150g/m2塗布する製造方法である。このとき撥水剤としてはフッ素系撥水剤であることが最も好ましい。 Such a disc processing base fabric of the present invention can be obtained by another method of manufacturing a disc processing base fabric of the present invention. That is, a manufacturing method comprises the fibers and all the layers to the solution 10 to 150 g / m 2 coating containing water repellent processing use surface of the sheet-like material exhibits hydrophilicity. At this time, the water repellent is most preferably a fluorine-based water repellent.
またこの本発明で用いられるシート状物は特には極細繊維からなる立毛を有し、繊維と弾性高分子からなる繊維質基材であることが好ましいが、そのようなシート状物は、例えば以下のような方法で製造することができる。すなわち、まず極細繊維形成性繊維によって、不織布を作成する。極細繊維成形性繊維としては、例えば、溶剤溶解性の異なる2種以上の繊維形成性高分子を用い公知の紡糸法で繊維を作成した後、一成分を抽出除去する方法があり、紡糸後の延伸により繊維に必要な強度を与えることもできる。なかでもナイロン6/ポリエチレンの組み合わせが工業的に生産しやすいため好ましい。得られた繊維はニードルパンチングなどにより不織布に加工される。このとき不織布にカレンダー加工を施し、不織布表面の平滑性と、不織布内部密度を高めることが好ましい。次に、従来公知の方法にて、得られた不織布に高分子弾性重合体を充填し、その後基材中の極細繊維形成性繊維を極細化することによって、極細繊維からなる繊維質基材が得られる。この繊維質基材の表面をサンドペーパーなどでバフがけする事によって極細繊維からなる立毛が形成される。 The sheet-like material used in the present invention is particularly preferably a fibrous base material having napped fibers made of ultrafine fibers and made of fibers and an elastic polymer. It can manufacture by the method of. That is, a non-woven fabric is first made from ultrafine fiber-forming fibers. Examples of the ultrafine fiber formable fiber include a method of extracting and removing one component after forming a fiber by a known spinning method using two or more types of fiber-forming polymers having different solvent solubility. The necessary strength can be given to the fiber by drawing. Of these, the nylon 6 / polyethylene combination is preferred because it is easy to produce industrially. The obtained fiber is processed into a nonwoven fabric by needle punching or the like. At this time, it is preferable to calender the nonwoven fabric to increase the smoothness of the nonwoven fabric surface and the nonwoven fabric internal density. Next, a fibrous base material composed of ultrafine fibers is obtained by filling the resulting nonwoven fabric with a polymer elastic polymer by a conventionally known method and then ultrafinening the ultrafine fiber-forming fibers in the base material. can get. By raising the surface of the fibrous base material with sandpaper or the like, napped fibers made of ultrafine fibers are formed.
本発明の製造方法で用いられるシート状物は全層が親水性を示すものであるが、これは例えば、シート状物にあらかじめ親水剤を含有する溶液を全層に浸漬し、乾燥したものであることが好ましい。ここであらかじめ用いる親水剤として、アニオン性、またはノニオン性の浸透剤を用いて処理すると効果がある。具体的にはアニオン性の浸透剤としてジオクチルスルホサクシネート・ナトリウム塩、ドデシルジフェニルエーテルジスルホン酸・ナトリウム塩、ドデシルベンゼンスルホン酸・ナトリウム塩、ナフタレンスルホン酸・ナトリウム塩、などであり、ノニオン性浸透剤では2級ラウリルアルコール・エトキシレート、ドデシルアルコールのエチレンオキシド付加物、エチレンオキシド付加アルキルフェニルエーテルなどである。処理量については使用する剤によって異なるが基布に対して固着量で0.01〜5重量%の範囲である。 The sheet-like material used in the production method of the present invention has hydrophilicity in all layers. For example, this is a sheet-like material that has been previously dipped in a solution containing a hydrophilic agent and dried. Preferably there is. It is effective to use an anionic or nonionic penetrant as the hydrophilic agent used in advance. Specific examples of anionic penetrants include dioctyl sulfosuccinate / sodium salt, dodecyl diphenyl ether disulfonic acid / sodium salt, dodecyl benzene sulfonic acid / sodium salt, naphthalene sulfonic acid / sodium salt, etc. Secondary lauryl alcohol / ethoxylate, ethylene oxide adduct of dodecyl alcohol, ethylene oxide-added alkylphenyl ether, and the like. The amount of treatment varies depending on the agent used, but is in the range of 0.01 to 5% by weight with respect to the base fabric.
本発明の製造方法では、シート状物の一方の表面に撥水剤を含有する溶液を塗布することが必須である。また、撥水剤を含有する溶液の塗布方法はグラビア塗布であることが好ましい。より具体的には、撥水性の強い層を表面側のみに5〜300μmの範囲に薄く成形することが好ましく、処理の方法は70〜200メッシュのグラビアロールで1〜4回塗布することが好ましい。またこのときのグラビアロールとバックロールとのクリアランスが、加工する基布の厚みに対して50〜90%の圧縮で処理することが好ましい。より好ましくは60〜80%の範囲である。このとき50%以下の条件で加工を行うと加工時に撥水剤のしみ込みが大きくなりすぎ、撥水剤が加工表面にとどまらず、表面が目的の性能を得にくくなる傾向にある。一方90%以上では、撥水剤の処理ムラが発生し、得られるディスク加工用基布による安定した加工が困難な傾向にある。 In the production method of the present invention, it is essential to apply a solution containing a water repellent to one surface of the sheet-like material. Moreover, it is preferable that the coating method of the solution containing a water repellent is gravure coating. More specifically, it is preferable to form a strongly water-repellent layer thinly in the range of 5 to 300 μm only on the surface side, and the treatment method is preferably applied 1 to 4 times with a 70 to 200 mesh gravure roll. . Moreover, it is preferable to process by the compression of 50 to 90% with respect to the thickness of the base fabric to process the clearance of the gravure roll and back roll at this time. More preferably, it is 60 to 80% of range. At this time, if the processing is performed under the condition of 50% or less, the penetration of the water repellent becomes too large at the time of processing, and the water repellent does not stay on the processed surface and the surface tends to make it difficult to obtain the desired performance. On the other hand, if it is 90% or more, processing irregularities of the water repellent agent occur, and stable processing by the obtained disk processing base fabric tends to be difficult.
このようにして得られた本発明のディスク加工用基布を用いる加工方法は、精度と加工速度に優れたディスクを得ることができる方法である。加工としては特に磁気記録基板のテクスチャ加工やその後に行われるクリーニング加工において好ましく用いられる。例えばハードディスクを製造する際のテクスチャ加工では、本発明のディスク加工用基布を用い、研磨砥粒を分散させたスラリーとともにおこなわれる。ディスク加工用基布と共に使用される研磨砥粒スラリーは酸化アルミニウム、二酸化珪素、酸化セリウム、酸化ジルコニウム、窒化珪素、単または多結晶ダイアモンド、などでありそれぞれ粒径は0.05〜0.5μm程度のものが好ましく使用される。また、テクスチャ加工の後に行われるクリーニング加工においては、研磨砥粒を用いてテクスチャ加工して得たハードディスクの表面を、必要に応じて水、薬剤等を加え本発明の研磨用基布でブラッシングすることにより、ハードディスク表面に残存した砥粒粒子や各種破片を有効に除去することができ、生産効率を大きく改善することができる。 The processing method using the disk processing base fabric of the present invention thus obtained is a method capable of obtaining a disk excellent in accuracy and processing speed. The processing is preferably used particularly in texture processing of the magnetic recording substrate and cleaning processing performed thereafter. For example, the texture processing when manufacturing a hard disk is performed with a slurry in which abrasive grains are dispersed using the disk processing base fabric of the present invention. The abrasive abrasive slurry used with the disk processing fabric is aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, silicon nitride, single or polycrystalline diamond, etc., each having a particle size of about 0.05 to 0.5 μm. Are preferably used. Further, in the cleaning process performed after texturing, the surface of the hard disk obtained by texturing using abrasive grains is brushed with the polishing base cloth of the present invention with water and chemicals added as necessary. As a result, the abrasive grains and various debris remaining on the hard disk surface can be effectively removed, and the production efficiency can be greatly improved.
以下、実施例により、本発明を更に具体的に説明する。なお各測定方法は下記の方法によった。
(1)吸液時間
50mm×50mmにカットした測定用サンプルを7枚準備し、温度20℃、湿度60%のデシケータに12時間以上放置し試験片とする。温度20℃、湿度60%に保たれた室内で平坦な面に静置された試験片上2cmの高さから、液滴をマイクロピペットで一滴(15μl)滴下する。滴下後より基布に吸液し終わるまでの時間を測定した。測定は各測定サンプル1枚につき1回実施し、全7枚で計7回測定を行う。得られた測定値の最短時間と最長時間をのぞいた5回の結果を平均して求めたものを液滴の吸液水速度とし、単位は秒/15mlで表した。液滴としては、重量比率10%のイソプロピルアルコール(IPA)水溶液及び、精製水を用いた。
Hereinafter, the present invention will be described more specifically with reference to examples. In addition, each measuring method was based on the following method.
(1) Liquid absorption time Seven samples for measurement cut to 50 mm × 50 mm are prepared, and left in a desiccator at a temperature of 20 ° C. and a humidity of 60% for 12 hours or more to obtain a test piece. One drop (15 μl) of a droplet is dropped from a height of 2 cm on a test piece placed on a flat surface in a room maintained at a temperature of 20 ° C. and a humidity of 60% with a micropipette. The time from dripping to completion of liquid absorption on the base fabric was measured. The measurement is performed once for each measurement sample, and a total of seven measurements are performed on all seven samples. The average of 5 results excluding the shortest time and longest time of the measured values obtained was obtained as the liquid absorption speed of the droplets, and the unit was expressed in seconds / 15 ml. As droplets, an isopropyl alcohol (IPA) aqueous solution having a weight ratio of 10% and purified water were used.
[実施例1]
極細繊維の製造
ナイロン−6とポリエチレンをチップの状態で50:50の重量比で混合して押出機により溶融紡糸を行い、ポリエチレンが海成分の海島断面混合紡糸繊維を紡糸、延伸、捲縮、カットして繊度8dtex、51mm長の短繊維を作製した。得られた繊維の海成分であるポリエチレンを溶解除去して極細繊維化し、任意の繊維束の断面を電子顕微鏡写真にて2000倍に拡大・観察したところ、島成分の平均直径から算出した繊維の平均繊度は、0.0052dtexであった。
[Example 1]
Manufacture of ultrafine fibers Nylon-6 and polyethylene are mixed at a weight ratio of 50:50 in the form of chips and melt-spun by an extruder, and a sea-island cross-section mixed fiber in which polyethylene is a sea component is spun, drawn, crimped, Cut to produce a short fiber having a fineness of 8 dtex and a length of 51 mm. Polyethylene, which is the sea component of the obtained fiber, was dissolved and removed to make ultrafine fibers, and the cross section of an arbitrary fiber bundle was magnified and observed 2000 times with an electron micrograph, and the fiber calculated from the average diameter of the island component The average fineness was 0.0052 dtex.
ディスク加工用基布の作成
上記の極細化する前の短繊維を、カードおよびクロスレイヤーを用いて積層し、3バーブのニードル針を用い1400本/cm2の針密度でニードルパンチして不織布を作成した。得られた不織布は目付570g/m2、厚さ2.5mmであった。該不織布を150℃の乾燥機で加熱し、30℃の金属ロールで冷却ニップし固定化した。このニップ処理された不織布の目付は、560g/m2、厚さ1.9mmであった。
Preparation of a base fabric for disk processing The above-mentioned short fibers before being thinned are laminated using a card and a cross layer, and a non-woven fabric is formed by needle punching with a needle density of 1400 / cm 2 using a 3 barb needle needle. Created. The obtained nonwoven fabric had a basis weight of 570 g / m 2 and a thickness of 2.5 mm. The nonwoven fabric was heated with a dryer at 150 ° C., and cooled and niped with a metal roll at 30 ° C. to be fixed. The basis weight of the nip-treated non-woven fabric was 560 g / m 2 and thickness 1.9 mm.
ニップ処理後の該不織布に、ポリエーテルエステル系ポリウレタン14%濃度のDMF溶液にシリコーン系の凝固調節剤を添加したものを1060g/m2含浸し、不織布表面を基材厚さの70%にスクイーズして、余分なポリウレタン樹脂を除去した後、10%ジメチルホルムアミド(以下DMFとする)水溶液の水バス中で凝固して多孔質の高分子弾性体とし、140℃で乾燥した。その後、80℃のトルエンでディップ、ニップを繰り返し、ポリエチレンを抽出した。得られた極細繊維からなる基材は、目付445g/m2であった。該基材表面にDMF溶液を200メッシュで2ロール、グラビア塗布し、乾燥後、320メッシュのサンドペーパーで研磨し、さらに、400メッシュのサンドペーパーで逆方向から研磨し基材表面を立毛させ、表面が多くの立毛繊維により覆われている立毛基材を得た。 The nonwoven fabric after the nip treatment is impregnated with 1060 g / m 2 of a DMF solution having a polyether ester polyurethane concentration of 14% and a silicone coagulation regulator added, and the nonwoven fabric surface is squeezed to 70% of the substrate thickness. Then, after removing the excess polyurethane resin, it was solidified in a water bath of 10% dimethylformamide (hereinafter referred to as DMF) aqueous solution to form a porous polymer elastic body, and dried at 140 ° C. Thereafter, dip and nip were repeated with toluene at 80 ° C. to extract polyethylene. The obtained substrate made of ultrafine fibers had a basis weight of 445 g / m 2 . The DMF solution is applied to the substrate surface in two rolls with 200 mesh and gravure, dried, polished with 320 mesh sandpaper, and further polished with 400 mesh sandpaper in the reverse direction to raise the substrate surface. A napped base material whose surface was covered with many napped fibers was obtained.
この立毛基材に親水剤としてジオクチルスルホサクシネート・ナトリウム塩を重量比率3%の固着量となるよう有効成分5%の液中に浸漬、ニップ後乾燥して全層親水性の基材を得た。該基材の表面側に有効成分10%のフッ素系撥水剤を70メッシュのグラビアロールで2回計70g/m2付与し、バックアップロールとのクリアランスを基材厚の80%として処理を行い、撥水性の強い層を表面側のみに200μmの範囲となるように成形し、基布とした。 Dicotyl sulfosuccinate sodium salt as a hydrophilic agent is immersed in this napped base material in a solution of 5% active ingredient so as to give a fixed amount of 3% by weight, and dried after nip to obtain a hydrophilic base material for all layers. It was. Applying 70 g / m 2 of 70% gravure roll with a 10% active ingredient fluorine-based water repellent to the surface side of the base material twice, and treating the clearance with the backup roll as 80% of the base material thickness. A strong water-repellent layer was molded only on the surface side so as to be in the range of 200 μm to obtain a base fabric.
ここで得られた基布の加工面において精製水15μlの液滴が吸水されるまでの時間を測定したが600秒以上放置しても少しもしみこむ気配もなかった。実際に一晩放置したところ液滴が乾燥してしまうまで基材中にしみこむことは無かった。さらにこの面における10%IPA水溶液の液滴の吸液時間が25秒/15μlであった。一方裏面側における精製水の吸水時間は2秒/15μlであり、10%IPA水溶液の液滴の吸液時間は0.5秒/15μlであった。該基布を3.5cmにスリットしアルミニウムハードデイスクのテクスチャ加工に適したディスク加工用基布を得た。 The time required for the 15 μl of purified water droplets to be absorbed on the processed surface of the base fabric obtained here was measured, but even if it was left for 600 seconds or longer, there was no sign of infiltration. When it was actually allowed to stand overnight, it did not penetrate into the substrate until the droplets were dried. Furthermore, the liquid absorption time of a 10% IPA aqueous solution droplet on this surface was 25 seconds / 15 μl. On the other hand, the water absorption time of the purified water on the back surface side was 2 seconds / 15 μl, and the liquid absorption time of the 10% IPA aqueous solution was 0.5 seconds / 15 μl. The base fabric was slit to 3.5 cm to obtain a disk processing base fabric suitable for texture processing of an aluminum hard disk.
該ディスク加工用基布を用い、研磨剤に0.07μmの多結晶ダイアモンド砥粒を含有しておりアニオン性の分散剤を含んでいるスラリーを用いてテクスチャ加工を実施した。テクスチャ加工後のディスクの表面平均粗さはRa=2.40Åと良好であるうえ、スクラッチなどの欠点が非常に少ないテクスチャ加工が行われ、またその加工時のピークカウントが2700と多く高効率な物であり、使用されたスラリーの量も少なく、得られたディスクの磁気特性は18.8と非常に良好な物となった。 Using the disk processing base fabric, texturing was carried out using a slurry containing 0.07 μm polycrystalline diamond abrasive grains in an abrasive and containing an anionic dispersant. The surface roughness of the disk after texturing is good at Ra = 2.40 mm, and texturing is performed with very few defects such as scratches, and the peak count during processing is as high as 2700, which is highly efficient. The amount of slurry used was small, and the magnetic properties of the obtained disk were very good at 18.8.
[比較例1]
実施例1と同様にして立毛基材を得た。
この立毛基材を、フッ素系撥水剤の有効成分5%の液中に浸漬、ニップした後、乾燥して、基材に対して撥水剤の重量比率が3%の固着量となった全層撥水性の基材を得た。該基材の加工表面側に有効成分10%のジオクチルスルホサクシネート・ナトリウム塩水溶液を110メッシュのグラビアロールで2回、バックアップロールとのクリアランスを基材厚の80%として処理を行い、親水性の強い層を裏面側のみに150μmの範囲で成形した基布を得た。
[Comparative Example 1]
A napped base material was obtained in the same manner as in Example 1.
This napped base material was dipped in a solution containing 5% of an active ingredient of a fluorine-based water repellent, nipped, and then dried, so that the weight ratio of the water repellent to the base material was 3%. A full-layer water-repellent substrate was obtained. The substrate surface is treated with 10% active ingredient dioctylsulfosuccinate / sodium salt aqueous solution twice with a 110 mesh gravure roll, and the clearance with the backup roll is set to 80% of the substrate thickness to make the substrate hydrophilic. A base fabric was obtained in which a strong layer was molded on the back side only in the range of 150 μm.
ここで得られた基布の加工面において精製水15μlの液滴が吸水されるまでの時間を測定したが600秒以上放置しても少しもしみこむ気配もなかった。実際に一晩放置したところ液滴が乾燥してしまうまで基材中にしみこむことは無かった。さらにこの面における10%IPA水溶液の液滴の吸液時間は123秒/15μlであった。一方裏面側における精製水の吸水時間は5秒/15μlであり、10%IPA水溶液の液滴の吸液時間は4秒/15μlであった。該基布を3.5cmにスリットし加工用の基布とした。 The time required for the 15 μl of purified water droplets to be absorbed on the processed surface of the base fabric obtained here was measured, but even if it was left for 600 seconds or longer, there was no sign of infiltration. When it was actually allowed to stand overnight, it did not penetrate into the substrate until the droplets were dried. Furthermore, the liquid absorption time of the 10% IPA aqueous solution droplet on this surface was 123 sec / 15 μl. On the other hand, the water absorption time of the purified water on the back surface side was 5 seconds / 15 μl, and the liquid absorption time of the 10% IPA aqueous solution was 4 seconds / 15 μl. The base fabric was slit to 3.5 cm to obtain a processing base fabric.
該基布を用い、研磨剤に0.07μmの多結晶ダイアモンド砥粒を含有したアニオン性の分散剤を含んでいるスラリーを用いてテクスチャ加工を実施した。加工時にスラリーが該基布上ではじかれ均一な加工が困難であった。テクスチャ加工後のディスクの表面平均粗さRa=1.82Åであり、スクラッチなどの欠点も少なく良好であったものの、その加工時のピークカウントが1800と効率が悪く、使用されたスラリーの量は非常に多く消費され効率の悪い物となった。さらに最終的に得られたディスクの磁気特性は14.5と非常に低い値であった。 Using the base fabric, texturing was performed using a slurry containing an anionic dispersant containing 0.07 μm polycrystalline diamond abrasive grains in the abrasive. During processing, the slurry was repelled on the base fabric, and uniform processing was difficult. Although the surface average roughness Ra of the textured disk was 1.82 mm and it was good with few defects such as scratches, the peak count at the time of processing was 1800 and the efficiency was poor, and the amount of slurry used was It was consumed very much and became inefficient. Further, the magnetic characteristics of the finally obtained disk were as low as 14.5.
[比較例2]
実施例1と同様にして立毛基材を得た。
この立毛基材に、実施例1と同様に親水剤としてジオクチルスルホサクシネート・ナトリウム塩を重量比率3%の固着量となるよう有効成分5%の液中に浸漬、ニップ後乾燥して全層親水性の基材を得て、実施例1と異なり撥水剤を塗布せずに基布とした。
[Comparative Example 2]
A napped base material was obtained in the same manner as in Example 1.
In this napped base material, dioctylsulfosuccinate sodium salt as a hydrophilic agent was immersed in a solution of 5% active ingredient so as to give a fixed amount of 3% by weight as in Example 1, and dried after nip to dry all layers. A hydrophilic base material was obtained and, unlike Example 1, a base fabric was obtained without applying a water repellent.
ここで得られた基布の加工面において精製水15μlの液滴が吸水されるまでの時間は47秒であった。さらにこの面における10%IPA水溶液の液滴吸水速度が5秒/15μlであった。一方裏面側における精製水の吸水時間は4.5秒/15μlであり、10%IPA水溶液の液滴の吸液時間は3秒/15μlであった。該基布を3.5cmにスリットし加工用の基布とした。 The time required for the 15 μl of purified water droplets to be absorbed on the processed surface of the base fabric obtained here was 47 seconds. Further, the water absorption rate of the 10% IPA aqueous solution on this surface was 5 seconds / 15 μl. On the other hand, the water absorption time of the purified water on the back surface side was 4.5 seconds / 15 μl, and the liquid absorption time of the 10% IPA aqueous solution was 3 seconds / 15 μl. The base fabric was slit to 3.5 cm to obtain a processing base fabric.
該基布を用い、研磨剤に0.07μmの多結晶ダイアモンド砥粒を含有しておりアニオン性の分散剤を含んでいるものを用いてテクスチャ加工を実施した。テクスチャ加工後のディスクの表面平均粗さRa=1.77Åであり、スクラッチなどの欠点も良好であったが、その加工時のピークカウントが1900と効率が悪く、使用されたスラリーの量も多く、最終的に得られたディスクの磁気特性は17.8と通常の値であった。 Using the base fabric, texturing was carried out using a polishing agent containing 0.07 μm polycrystalline diamond abrasive grains and an anionic dispersant. The surface roughness Ra of the disk after texture processing was 1.77 mm, and defects such as scratches were good, but the peak count during processing was 1900 and the efficiency was poor, and the amount of slurry used was large. The magnetic characteristics of the finally obtained disk were 17.8 normal values.
[比較例3]
比較例1(実施例1)と同様にして立毛基材を得た。
この立毛基材を、比較例1と同じくフッ素系撥水剤の有効成分5%の液中に浸漬、ニップした後、乾燥して、基材に対して撥水剤の重量比率が3%の固着量となった全層撥水性の基材を得て、比較例1と異なり親水剤を塗布せずに基布とした。
[Comparative Example 3]
A napped substrate was obtained in the same manner as in Comparative Example 1 (Example 1).
This napped base material was dipped in a solution containing 5% of an active ingredient of a fluorine-based water repellent as in Comparative Example 1, nipped and dried, and the weight ratio of the water repellent to the base was 3%. An all-layer water-repellent substrate having a fixed amount was obtained and used as a base fabric without applying a hydrophilic agent unlike Comparative Example 1.
ここで得られた基布の加工面において精製水15μlの液滴が吸水されるまでの時間を測定したが600秒以上放置しても少しもしみこむ気配もなかった。実際に一晩放置したところ液滴が乾燥してしまうまで基材中にしみこむことは無かった。さらにこの面における10%IPA水溶液の液滴の吸液速度が150秒/15μlであった。一方裏面側においても精製水15μlの液滴が給水されるまでの時間を測定したが600秒以上放置しても少しもしみこむ気配もなかった。実際に一晩放置したところ液滴が乾燥してしまうまで基材中にしみこむことは無かった。さらにこの面における10%IPA水溶液の液滴の吸液時間は97秒/15μlであった。該基布を3.5cmにスリットし加工用の基布とした。 The time required for the 15 μl of purified water droplets to be absorbed on the processed surface of the base fabric obtained here was measured, but even if it was left for 600 seconds or longer, there was no sign of infiltration. When it was actually allowed to stand overnight, it did not penetrate into the substrate until the droplets were dried. Further, the liquid absorption speed of the 10% IPA aqueous solution droplet on this surface was 150 seconds / 15 μl. On the other hand, on the back side, the time required for supplying 15 μl of purified water droplets was measured, but even if left for 600 seconds or longer, there was no sign of infiltration. When it was actually allowed to stand overnight, it did not penetrate into the substrate until the droplets were dried. Furthermore, the liquid absorption time of the 10% IPA aqueous solution droplets on this surface was 97 seconds / 15 μl. The base fabric was slit to 3.5 cm to obtain a processing base fabric.
該基布を用い、研磨剤に0.07μmの多結晶ダイアモンド砥粒を含有しておりアニオン性の分散剤を含んでいるものを用いてテクスチャ加工を実施したが、加工面の撥水性が強いためスラリーが基布表面ではじかれ不均一になり、加工ができなかった。 Texturing was carried out using the base fabric and the abrasive containing 0.07 μm polycrystalline diamond abrasive grains and containing an anionic dispersant, but the processed surface has strong water repellency. Therefore, the slurry was repelled on the surface of the base fabric and became non-uniform and could not be processed.
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