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JP4882476B2 - Semiconductor device and manufacturing method thereof - Google Patents
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JP4882476B2 - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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JP4882476B2
JP4882476B2 JP2006112904A JP2006112904A JP4882476B2 JP 4882476 B2 JP4882476 B2 JP 4882476B2 JP 2006112904 A JP2006112904 A JP 2006112904A JP 2006112904 A JP2006112904 A JP 2006112904A JP 4882476 B2 JP4882476 B2 JP 4882476B2
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conductor
bump
adhesive
semiconductor device
wire
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JP2007287896A (en
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聰 白濱
也寸志 稲井
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Nichia Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/0711Apparatus therefor
    • H10W72/07141Means for applying energy, e.g. ovens or lasers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07511Treating the bonding area before connecting, e.g. by applying flux or cleaning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07521Aligning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07531Techniques
    • H10W72/07532Compression bonding, e.g. thermocompression bonding
    • H10W72/07533Ultrasonic bonding, e.g. thermosonic bonding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/536Shapes of wire connectors the connected ends being ball-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5434Dispositions of bond wires the connected ends being on auxiliary connecting means on bond pads, e.g. on other bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5522Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a high reliability semiconductor light emitting device which avoids the deterioration of the bonding performance of a wire bond caused by a die bond resin flow even in a compact semiconductor device with a die bonding adhesive material disposed extremely closely to a wire bond zone. <P>SOLUTION: The method of manufacturing a semiconductor device comprises a first step of providing a bump on a conductor, a second step of settling a resin-containing element fixing adhesive material at the disposed bump side of the conductor, and a third step of connecting a conductive wire to the bump. The semiconductor light emitting device comprises a conductor, a bump provided on the conductor, an element fixing adhesive material settled on the conductor and a conductive wire connected to the bump. The bump is connected to the conductive wire above the adhesive material. <P>COPYRIGHT: (C)2008,JPO&amp;INPIT

Description

本発明は、半導体素子を用いた発光装置および光学センサなどに用いられる受光装置に関し、特に、液晶ディスプレイのバックライトや各種インジケーター等に用いられる小型の発光装置に関する。   The present invention relates to a light-emitting device using a semiconductor element and a light-receiving device used for an optical sensor, and more particularly to a small light-emitting device used for a backlight of a liquid crystal display, various indicators, and the like.

従来、表面実装型パッケージとして知られている半導体発光装置は、ガラスエポキシ等の基板にパターン形成などで導体配線を設け、その導体配線上に接着材を介して発光素子をダイボンドした後、金線等のワイヤで発光素子と導体配線とを電気的に接続し、最後に発光素子周辺を透光性の樹脂で被覆することにより構成されている。   Conventionally, a semiconductor light-emitting device known as a surface-mount package is a method in which a conductor wiring is provided on a substrate such as glass epoxy by pattern formation, and a light-emitting element is die-bonded on the conductor wiring via an adhesive, The light emitting element and the conductor wiring are electrically connected with a wire such as the like, and finally the periphery of the light emitting element is covered with a translucent resin.

特開2004−253745号公報JP 2004-253745 A

しかしながら、従来の半導体装置を小型にしようとすると、ダイボンド部とワイヤボンド部との距離が短くなり、ダイボンドのための接着材がワイヤボンド部に極めて近い位置に配置されることになる。   However, when trying to reduce the size of a conventional semiconductor device, the distance between the die bond portion and the wire bond portion is shortened, and an adhesive for die bonding is disposed at a position very close to the wire bond portion.

このような場合に接着材がワイヤボンド部に広がってしまうと、樹脂を含む接着材の上に金属のワイヤをワイヤボンドしにくく、ワイヤと導電体との導通がとれない場合が多かった。また、ワイヤボンドが行われた場合も、接合強度が弱く、熱ストレス等によってワイヤボンドが剥離する可能性があった。   In such a case, if the adhesive spreads over the wire bond portion, it is difficult to wire bond the metal wire on the adhesive containing resin, and there are many cases where the connection between the wire and the conductor cannot be obtained. Also, when wire bonding is performed, the bonding strength is weak and the wire bond may be peeled off due to thermal stress or the like.

そこで本発明は、半導体装置において、ダイボンドのための接着材がワイヤボンド部に極めて近い位置に配置されるような小型の半導体装置の場合であっても、ダイボンド樹脂流れによるワイヤボンドの接合性低下を回避し、信頼性の高い半導体発光装置を提供することを目的とする。   Accordingly, the present invention provides a semiconductor device in which the bonding property of the wire bond is lowered due to the flow of the die bond resin even in the case of a small semiconductor device in which the adhesive for die bonding is disposed at a position very close to the wire bond portion. The object is to provide a highly reliable semiconductor light emitting device.

以上の目的を達成するために、本発明に係る半導体装置の製造方法は、絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置の製造方法であって、導電体にバンプを設ける第1の工程と、前記第1の工程の後、前記導電体の前記バンプが配置された側の前記導電体に、樹脂を含む素子固定用の接着材を載置し、さらに接着材の上に素子を配置する第2の工程と、前記バンプに導電性ワイヤを接続する第3の工程と、を含むことを特徴とする。前記第2の工程は、前記バンプの一部に前記接着材を配置させる工程を含み、前記導電性ワイヤはバンプの接着材から露出された部位に接続する
In order to achieve the above object, a method for manufacturing a semiconductor device according to the present invention includes a conductor formed on an insulating substrate or a conductor formed in an opening of a concave ceramic package. A method for manufacturing a semiconductor device , comprising: a first step of providing a bump on a conductor; and an element including a resin in the conductor on the side where the bump of the conductor is disposed after the first step. The method includes a second step of placing a fixing adhesive and further disposing an element on the adhesive, and a third step of connecting a conductive wire to the bump. The second step is viewed contains a step of placing the adhesive on a portion of the bump, the conductive wire is connected to the site that was exposed from the adhesive of the bump.

前記第2の工程は、前記素子にて前記接着材を加圧し、前記接着材を前記バンプの一部に延在させる工程を含むことが好ましい。
The second step pressurizes the adhesive in the device, it is preferable that the adhesive material comprising the step of extending a portion of the bump.

前記第3の工程は、前記バンプと前記素子とを前記導電性ワイヤにより接続する工程を含むことが好ましい。   The third step preferably includes a step of connecting the bump and the element with the conductive wire.

さらに前記接着材の少なくとも一部と前記素子とを樹脂で被覆する工程を含むことが好ましい。
Furthermore, it is preferable to include a step of covering at least a part of the adhesive and the element with a resin.

また、本発明に係る半導体装置は、絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置であって、導電体と、前記導電体に設けられたバンプと、前記導電体に載置される素子を固定するための接着材と前記接着材の上に配置された素子と、前記バンプに接続される導電性ワイヤと、を備え、前記バンプは、前記接着材より上方で前記導電性ワイヤと接続されていることを特徴とする。

The semiconductor device according to the present invention is a semiconductor device in which a conductor is formed on an insulating substrate, or a conductor is formed in an opening of a concave ceramic package, and the conductor, A bump provided on the conductor; an adhesive for fixing an element placed on the conductor; an element disposed on the adhesive; a conductive wire connected to the bump; The bump is connected to the conductive wire above the adhesive.

前記接着材の少なくとも一部を樹脂で被覆することが好ましい。   It is preferable to coat at least a part of the adhesive with a resin.

本発明は、半導体装置において、ダイボンドのための接着材がワイヤボンド部に極めて近い位置に配置されるような小型の半導体装置の場合であっても、ダイボンド樹脂流れによるワイヤボンドの接合性低下を回避し、信頼性の高い半導体発光装置を提供することができる。   The present invention reduces the bondability of the wire bond due to the flow of the die bond resin even in the case of a small semiconductor device in which the bonding material for die bonding is arranged at a position very close to the wire bond portion in the semiconductor device. A highly reliable semiconductor light-emitting device can be avoided.

本発明を実施するための最良の形態を、以下に説明する。ただし、以下に示す形態は、本発明の技術思想を具体化するための半導体装置を例示するものであって、本発明は半導体装置を以下に限定するものではない。   The best mode for carrying out the present invention will be described below. However, the modes shown below exemplify a semiconductor device for embodying the technical idea of the present invention, and the present invention does not limit the semiconductor device to the following.

また、本明細書は特許請求の範囲に示される部材を、実施の形態の部材に特定するものでは決してない。実施の形態に記載されている構成部品の寸法、材質、形状、その相対的配置等は、特に特定的な記載がない限りは、本発明の範囲をそれのみに限定する趣旨ではなく、単なる説明例にすぎない。なお、各図面が示す部材の大きさや位置関係等は、説明を明確にするため誇張していることがある。さらに以下の説明において、同一の名称、符号については同一もしくは同質の部材を示しており、詳細な説明を適宜省略する。   Further, the present specification by no means specifies the members shown in the claims to the members of the embodiments. The dimensions, materials, shapes, relative arrangements, and the like of the components described in the embodiments are not intended to limit the scope of the present invention only to the description unless otherwise specified. It's just an example. Note that the size, positional relationship, and the like of the members shown in each drawing may be exaggerated for clarity of explanation. Further, in the following description, the same name and reference sign indicate the same or the same members, and detailed description will be omitted as appropriate.

ダイボンドのための接着材がワイヤボンド部に極めて近い位置に配置されるような小型の半導体装置の場合であっても、ダイボンド樹脂流れによるワイヤボンドの接合性低下を回避し、信頼性の高い半導体発光装置を提供するため、本発明者らは種々の検討を行った。   Even in the case of a small semiconductor device where the bonding material for die bonding is located very close to the wire bonding part, it avoids a decrease in wire bondability due to the flow of die bonding resin, and is a highly reliable semiconductor In order to provide a light-emitting device, the present inventors have made various studies.

その結果、導電体にバンプを設けた後に、素子を固定するための樹脂を含む接着材を導電体のバンプが形成された側に載置し、バンプに導電性ワイヤを接続することにより、上述の問題を解決するに至った。   As a result, after providing bumps on the conductor, an adhesive containing resin for fixing the element is placed on the side of the conductor where the bumps are formed, and a conductive wire is connected to the bumps. It came to solve the problem.

以下、図面を参照しながら本形態に係る半導体装置の製造方法について説明する。   Hereinafter, a method for manufacturing a semiconductor device according to this embodiment will be described with reference to the drawings.

図1は本形態にかかる半導体装置の製造方法の一例を示す図である。   FIG. 1 is a diagram showing an example of a method for manufacturing a semiconductor device according to this embodiment.

まず、導電体102上に、キャピラリ108等と金ワイヤ105により、バンプ109を設ける(図1a、b)。次に導電体102上のバンプが設けられた側に、接着材110を載置する(図1c)。ここでバンプが設けられた側とは、接着材が広がる部分を含む箇所をいう。そして、載置された接着材の上に半導体素子103を配置し、半導体素子の上面の電極とバンプ109をワイヤボンディングなどの方法で接続する(図1d、e)。ワイヤの接続は、バンプを設けた後であれば、接着材110を載置する前でも後でも、どちらでもよい。   First, bumps 109 are provided on the conductor 102 by using a capillary 108 and the like and a gold wire 105 (FIGS. 1a and 1b). Next, the adhesive 110 is placed on the side of the conductor 102 where the bumps are provided (FIG. 1c). Here, the side where the bumps are provided means a portion including a portion where the adhesive material spreads. Then, the semiconductor element 103 is disposed on the placed adhesive, and the electrodes on the upper surface of the semiconductor element and the bumps 109 are connected by a method such as wire bonding (FIGS. 1d and e). The wire may be connected either before or after placing the adhesive 110 as long as the bump is provided.

また、パンプ109に接続するワイヤは接着材110によって固定された半導体素子とを繋ぐものでも、別の導電体や別の半導体素子とを繋ぐワイヤでもよい。   The wire connected to the bump 109 may be a wire connecting a semiconductor element fixed by the adhesive 110, or a wire connecting another conductor or another semiconductor element.

また、図1fのように、パンプとワイヤとの接続部界面に窪み113ができるようにすると、封止樹脂で半導体装置を封止するような場合に、封止樹脂との密着性をあげることができる。   Further, as shown in FIG. 1f, when the depression 113 is formed at the interface between the bump and the wire, the adhesion to the sealing resin is improved when the semiconductor device is sealed with the sealing resin. Can do.

このように、接着材を介して素子をダイボンドする際に、接着材を配置する前に導電体にバンプを形成し、ワイヤボンドをしたい場所の上方にあらかじめワイヤを接続する部位を導電体とは別に設けておくことにより、接着材がワイヤボンド部に極めて近い場所に配置されるような小型の半導体装置の場合であっても、このバンプの接着材から露出された部位とワイヤとを接続することにより、接着材の影響を受けずに導通を取ることができる。   In this way, when die-bonding an element via an adhesive, a bump is formed on the conductor before placing the adhesive, and the portion where the wire is connected in advance above the place where the wire bond is desired is the conductor. By providing it separately, even in the case of a small semiconductor device in which the adhesive is disposed at a location very close to the wire bond portion, the portion exposed from the adhesive of the bump is connected to the wire. Thus, conduction can be achieved without being affected by the adhesive.

また、本形態の半導体装置の製造方法によると、直接ワイヤボンドができない、あるいはしにくい材質や表面状態であっても、ボールボンディングでバンプを設けることができる素材であれば確実な導通をとることができる。   In addition, according to the method for manufacturing a semiconductor device of this embodiment, even if the material or surface state is not capable of direct wire bonding or is difficult to perform, reliable conduction is obtained as long as the material can provide bumps by ball bonding. Can do.

一般に、ワイヤボンディングは1次側と2次側で接続部におけるワイヤの形状が異なり、1次側より2次側のほうが接続しにくい。特に、2次側の接続面の金属被膜が薄かったり、粗悪だったりすると、超音波のエネルギーが有効に伝播せず、確実なボンディングができない可能性がある。   In general, in wire bonding, the shape of the wire in the connection portion is different between the primary side and the secondary side, and the secondary side is more difficult to connect than the primary side. In particular, if the metal film on the connection surface on the secondary side is thin or inferior, ultrasonic energy does not propagate effectively, and there is a possibility that reliable bonding cannot be performed.

しかし、1次ボンディングの要領でボールボンディングをしてバンプを形成すると、素子とバンプを接続するときの2次側は、バンプの上にボンディングすることができるため、ワイヤとバンプとの接触面積が大きくなり、超音波のエネルギーも有効に伝播し、確実な接続をとることが可能となり、信頼性の高い半導体装置を提供することができる。   However, if a bump is formed by ball bonding in the manner of primary bonding, the secondary side when the element and the bump are connected can be bonded on the bump, so that the contact area between the wire and the bump is small. As a result, the energy of the ultrasonic wave propagates effectively and a reliable connection can be established, and a highly reliable semiconductor device can be provided.

また、前記第2の工程は、前記パンプの一部に前記接着材を配置させる工程を含むことが好ましい。   Moreover, it is preferable that the said 2nd process includes the process of arrange | positioning the said adhesive material in a part of said pump.

この工程を含むことにより、接着材をワイヤボンド部にまで広げた場合であっても、小型の半導体装置を提供することが可能となる。本形態によれば、ワイヤボンド部、すなわちバンプ部にまで接着材を配置しても、バンプの少なくとも一部を露出させていることにより、その露出させた部分で導通をとることができるので、小型の半導体装置を提供することが可能となる。   By including this step, a small semiconductor device can be provided even when the adhesive is spread to the wire bond portion. According to this embodiment, even if the adhesive is disposed up to the wire bond portion, that is, the bump portion, by exposing at least a part of the bump, conduction can be achieved at the exposed portion. A small semiconductor device can be provided.

また前記第2の工程は、前記素子にて前記接着材を加圧し、前記接着材を前記バンプの一部に延材させる工程を含むことが好ましい。   Moreover, it is preferable that the said 2nd process includes the process of pressurizing the said adhesive material with the said element, and extending the said adhesive material to a part of said bump.

このようにすることにより、素子を固定する工程で接着材を広げることができる。   By doing in this way, an adhesive material can be spread in the process of fixing an element.

前記第3の工程は、前記バンプと前記素子とを前記導電性ワイヤにより接続する工程を含むことが好ましい。   The third step preferably includes a step of connecting the bump and the element with the conductive wire.

このようにすると、素子とその素子を接続するワイヤボンド部を極めて近い位置に配置することができるため、さらに小型の半導体装置を提供することができる。ワイヤの長さを短くすることができるので、ワイヤにかかる力を軽減し、ワイヤの断線を起こりにくくすることもできる。   In this case, since the element and the wire bond portion that connects the element can be arranged at extremely close positions, a further smaller semiconductor device can be provided. Since the length of the wire can be shortened, it is possible to reduce the force applied to the wire and to prevent the wire from being broken.

また、前記接着材の少なくとも一部を樹脂で被覆する工程を含むことが好ましい。外部環境からの外力や水分などから半導体素子を保護するために素子を樹脂で被覆する際に、本形態のように、接着材を素子下部だけではなく周辺にまで広げて、その上から封止樹脂を被覆することにより、封止樹脂を濡れ性よく配置することができる。   Moreover, it is preferable to include the process of coat | covering at least one part of the said adhesive material with resin. When covering the element with resin to protect the semiconductor element from external force or moisture from the external environment, as in this embodiment, spread the adhesive not only to the bottom of the element but also to the periphery, and seal from above By covering the resin, the sealing resin can be arranged with good wettability.

次に、図面を参照しながら本形態に係る半導体装置について説明する。   Next, a semiconductor device according to this embodiment will be described with reference to the drawings.

図2は本形態にかかる半導体装置を示す図である。   FIG. 2 is a diagram showing a semiconductor device according to this embodiment.

導電体202と、導電体202に設けられたバンプ209と、導電体202に載置される素子を固定するための接着材210と、前記バンプに接続される導電性ワイヤ205と、を備え、バンプ209は接着材210より上方で前記導電性ワイヤ205と接続される。   A conductor 202; a bump 209 provided on the conductor 202; an adhesive 210 for fixing an element placed on the conductor 202; and a conductive wire 205 connected to the bump. The bump 209 is connected to the conductive wire 205 above the adhesive 210.

すなわち、素子を接着するための接着材が配置される部分よりも上方に、パンプによりワイヤボンド部を形成しているので、接着材の影響を受けずにワイヤボンドをすることができる。   That is, since the wire bond portion is formed by the bump above the portion where the adhesive for adhering the elements is disposed, wire bonding can be performed without being affected by the adhesive.

また、このとき、バンプ209と、接着材210によって固定される素子を、導電性ワイヤ205により接続することにより、ワイヤボンド部と素子の載置部を近づけることが可能になり、半導体装置を小型化することができる。また、ワイヤの長さを短くすることができるので、ワイヤにかかる力を軽減し、ワイヤの断線を起こりにくくすることもできる。   At this time, by connecting the bump 209 and the element fixed by the adhesive 210 with the conductive wire 205, the wire bond part and the element mounting part can be brought close to each other, and the semiconductor device can be reduced in size. Can be Moreover, since the length of a wire can be shortened, the force concerning a wire can be reduced and it can also make it difficult to break a wire.

また、接着材210の少なくとも一部を樹脂211で被覆する際に、接着材210を素子下部だけではなく周辺にまで広げて、その上から封止樹脂を被覆することにより、封止樹脂を濡れ性よく配置することができる。   Further, when covering at least a part of the adhesive 210 with the resin 211, the adhesive 210 is wetted by spreading the adhesive 210 not only to the lower part of the element but also to the periphery and covering the sealing resin from above. It can be arranged with good quality.

また、図3のように、バンプ309とワイヤ305の接続部分に凹形状を設けることにより、封止樹脂との密着性をさらに高めることもできる。
以下、本発明の実施の形態の各構成について詳述する。
Further, as shown in FIG. 3, by providing a concave shape in the connection portion between the bump 309 and the wire 305, the adhesion with the sealing resin can be further enhanced.
Hereafter, each structure of embodiment of this invention is explained in full detail.

[導電体]
本形態における導電体は、樹脂にインサート成型されたリードフレームや、基材に設けられた導体配線である。
[conductor]
The conductor in this embodiment is a lead frame insert-molded in resin or a conductor wiring provided on the base material.

半導体素子や発光素子を、導電性ワイヤやバンプなどの接続部材で電気配線できる金属であれば、その材料は特に限定されないが、例えば、銅、アルミニウム、金、銀、タングステン、鉄、ニッケル等の金属または鉄―ニッケル合金、燐青銅、鉄入り銅等あるいはこれらの表面に銀、アルミニウム、銅、金等の金属メッキ膜が施されたもの等が挙げられる。   The material is not particularly limited as long as it is a metal that can electrically wire a semiconductor element or a light emitting element with a connecting member such as a conductive wire or bump. For example, copper, aluminum, gold, silver, tungsten, iron, nickel, etc. Examples thereof include metals, iron-nickel alloys, phosphor bronze, iron-containing copper, etc., or those having a surface plated with a metal plating film such as silver, aluminum, copper, or gold.

また、導体配線の材料とする金属は、金属相互間の接着性の良さ、いわゆる濡れ性等を考慮して選択されることが好ましい。例えば、導電体にAuバンプを超音波ダイボンドによって接合するとき、導体配線は、金または金を含む合金とすると、接着性が向上し、好ましい。   The metal used as the material for the conductor wiring is preferably selected in consideration of good adhesion between the metals, so-called wettability. For example, when the Au bump is bonded to the conductor by ultrasonic die bonding, it is preferable that the conductor wiring is gold or an alloy containing gold because adhesion is improved.

[バンプ]
本形態におけるバンプは、導電体と導電性ワイヤとを接続できる金属で形成されていれば良い。よって、使用するワイヤや導電体と合金を形成することができるものであれば、その材料は特に限定されない。例えば、金、銅、白金、アルミニウム等の金属及びそれらの合金等である。
[bump]
The bump in this embodiment may be formed of a metal that can connect the conductor and the conductive wire. Therefore, the material is not particularly limited as long as it can form an alloy with the wire or conductor to be used. For example, metals such as gold, copper, platinum, and aluminum, and alloys thereof.

[接着材]
本形態における接着材には、熱硬化性樹脂などを挙げることができる。熱硬化性樹脂としては、エポキシ樹脂、シリコーン樹脂、アクリル樹脂、イミド樹脂などが挙げられる。また、ダイボンドすると共に電気的接続を行うには、Agペースト、カーボンペーストなどを用いることができる。
[Adhesive]
Examples of the adhesive in this embodiment include a thermosetting resin. Examples of the thermosetting resin include an epoxy resin, a silicone resin, an acrylic resin, and an imide resin. Moreover, Ag paste, carbon paste, or the like can be used for die bonding and electrical connection.

[導電性ワイヤ]
本形態における導電性ワイヤは、導体配線とのオーミック性、機械的接続性、電気伝導性及び熱伝導性がよいものが求められる。熱伝導度としては0.01cal/(s)(cm)(℃/cm)以上が好ましく、より好ましくは0.5cal/(s)(cm)(℃/cm)以上である。また、作業性などを考慮して導電性ワイヤの直径は、好ましくは、Φ10μm以上、Φ45μm以下である。このような導電性ワイヤとして具体的には、金、銅、白金、アルミニウム等の金属及びそれらの合金を用いた導電性ワイヤが挙げられる。このような導電性ワイヤは、導電体に形成させたワイヤボンディング領域や導電体に形成したバンプと、半導体素子の電極と、をワイヤボンディング機器によって容易に接続させることができる。
[Conductive wire]
The conductive wire in this embodiment is required to have good ohmic properties with the conductor wiring, mechanical connectivity, electrical conductivity and thermal conductivity. Preferably 0.01cal / (s) (cm 2 ) (℃ / cm) or higher as heat conductivity, and more preferably 0.5cal / (s) (cm 2 ) (℃ / cm) or more. In consideration of workability and the like, the diameter of the conductive wire is preferably Φ10 μm or more and Φ45 μm or less. Specific examples of such conductive wires include conductive wires using metals such as gold, copper, platinum, and aluminum, and alloys thereof. Such a conductive wire can easily connect a wire bonding region formed on a conductor or a bump formed on the conductor and an electrode of a semiconductor element by a wire bonding apparatus.

以下、本発明に係る実施例について詳述する。なお、本発明は以下に示す実施例のみに限定されないことは言うまでもない。   Examples according to the present invention will be described in detail below. Needless to say, the present invention is not limited to the following examples.

実施例1
この実施例の半導体装置は、図2に示すように、表面実装型の半導体発光装置であり、パンプを設けた導電体202上に半導体発光素子203が載置されている。
Example 1
As shown in FIG. 2, the semiconductor device of this embodiment is a surface-mount type semiconductor light-emitting device, and a semiconductor light-emitting element 203 is placed on a conductor 202 provided with a bump.

本実施例における導電体202は、絶縁性基板201の上に形成され、基板に開けられたスルーホールを介して半導体装置裏面の外部電極と接続されている。この導電体202の上に金ワイヤを用いてボールボンディングによりパンプ209を形成する。   The conductor 202 in this embodiment is formed on the insulating substrate 201 and is connected to the external electrode on the back surface of the semiconductor device through a through hole opened in the substrate. A bump 209 is formed on the conductor 202 by ball bonding using a gold wire.

バンプ209を形成した後、導電体202に発光素子203を接着する為の接着材210としてエポキシ樹脂を配置し、半導体発光素子203を接着する。本実施例における半導体装置はバンプと素子との距離が0.2mm程度と極めて短いため、エポキシ樹脂がバンプ209近辺にまで配置されるが、バンプ209の上部はエポキシ樹脂から露出するようにする。   After the bump 209 is formed, an epoxy resin is disposed as an adhesive 210 for bonding the light emitting element 203 to the conductor 202, and the semiconductor light emitting element 203 is bonded. Since the distance between the bump and the element is as short as about 0.2 mm in the semiconductor device in this embodiment, the epoxy resin is arranged up to the vicinity of the bump 209, but the upper part of the bump 209 is exposed from the epoxy resin.

次に、金ワイヤ205を用いて半導体発光素子203のボンディングパッドに1次ボンディングを行い、バンプ209の上に2次ボンディングを行い、半導体発光素子とバンプとを接続する。半導体発光素子のもう一方の電極もワイヤボンディングで導電体と接続する。   Next, primary bonding is performed on the bonding pads of the semiconductor light emitting device 203 using the gold wire 205, and secondary bonding is performed on the bumps 209 to connect the semiconductor light emitting device and the bumps. The other electrode of the semiconductor light emitting element is also connected to the conductor by wire bonding.

この基板を、トランスファモールド法により透光性樹脂211で封止し、レンズを持つ半導体発光装置とする。   This substrate is sealed with a translucent resin 211 by a transfer mold method to obtain a semiconductor light emitting device having a lens.

本実施例では青色に発光する半導体素子を用い、さらに黄色に発光する蛍光体を封止樹脂に含むことで、白色系に発光する半導体発光装置としている。   In this embodiment, a semiconductor light emitting device that emits white light is used by using a semiconductor element that emits blue light and further including a phosphor that emits yellow light in a sealing resin.

実施例2
この実施例の半導体発光装置は、図3に示したように、基材の開口部内に半導体素子と保護素子を実装した表面実装型の半導体発光装置である。
Example 2
As shown in FIG. 3, the semiconductor light emitting device of this example is a surface mount type semiconductor light emitting device in which a semiconductor element and a protective element are mounted in an opening of a base material.

凹状のセラミックパッケージ312の開口部内に、導電体302が施されている。この導電体302は、タングステンの表面を、ニッケル、金でメッキしている。実施例1と同様、素子を実装する前に金パンプ309を形成し、その後で接着材310に銀ペーストを用いツェナーダイオード314を固定し、接着材315としてエポキシ樹脂で半導体発光素子303を固定している。ツェナーダイオードの接着部と、半導体素子のワイヤボンド部が近い位置に配置されているが、パンプの上部を露出させるように銀ペーストを配置しているので、バンプ上部で確実な接続を取ることができる。   A conductor 302 is provided in the opening of the concave ceramic package 312. The conductor 302 has a tungsten surface plated with nickel and gold. As in Example 1, the gold pump 309 is formed before mounting the element, and then the Zener diode 314 is fixed to the adhesive 310 using a silver paste, and the semiconductor light emitting element 303 is fixed with an epoxy resin as the adhesive 315. ing. The bonding part of the Zener diode and the wire bond part of the semiconductor element are arranged close to each other, but since the silver paste is arranged so as to expose the upper part of the pump, it is possible to make a reliable connection at the upper part of the bump. it can.

半導体素子の電極と導体配線をワイヤボンディングにより接続した後、開口部を透光性樹脂311で封止する。   After the electrode of the semiconductor element and the conductor wiring are connected by wire bonding, the opening is sealed with a translucent resin 311.

本実施例では半導体素子と保護素子を一つのパッケージに搭載した半導体装置となっており、このように構成することにより、小型で信頼性の高い半導体装置とすることができる。   In this embodiment, the semiconductor device includes a semiconductor element and a protection element mounted in one package. With this configuration, a small and highly reliable semiconductor device can be obtained.

本発明の半導体装置は、液晶ディスプレイのバックライト等のように、極めて小型の発光部品を必要とする装置を使用する装置に利用可能である。   The semiconductor device of the present invention can be used for a device that uses a device that requires extremely small light-emitting components, such as a backlight of a liquid crystal display.

本発明にかかる半導体装置の製造方法の一例を示す図である。It is a figure which shows an example of the manufacturing method of the semiconductor device concerning this invention. 本発明にかかる半導体装置の一例を示す図である。It is a figure which shows an example of the semiconductor device concerning this invention. 本発明にかかる半導体装置の一例を示す図である。It is a figure which shows an example of the semiconductor device concerning this invention.

符号の説明Explanation of symbols

102、202、302 導電体
103、203、303 半導体発光素子
105、205 金ワイヤ
108 キャピラリ
109、209、309 バンプ
110、210、310 接着材
113 窪み
201 絶縁性基板
211、311 透光性樹脂
312 パッケージ
314 ツェナーダイオード
315 接着材
102, 202, 302 Conductor 103, 203, 303 Semiconductor light emitting device 105, 205 Gold wire 108 Capillary 109, 209, 309 Bump 110, 210, 310 Adhesive 113 Depression 201 Insulating substrate 211, 311 Translucent resin 312 Package 314 Zener diode 315 Adhesive

Claims (7)

絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置の製造方法であって、
導電体にバンプを設ける第1の工程と、
前記第1の工程の後、前記導電体の前記バンプが配置された側の前記導電体に、樹脂を含む素子固定用の接着材を載置し、さらに接着材の上に素子を配置する第2の工程と、
前記バンプに導電性ワイヤを接続する第3の工程と、
を含むことを特徴とする半導体装置の製造方法。
A method of manufacturing a semiconductor device in which a conductor is formed on an insulating substrate, or a conductor is formed in an opening of a concave ceramic package,
A first step of providing bumps on the conductor;
After the first step, an adhesive for fixing an element including a resin is placed on the conductor on the side where the bumps of the conductor are arranged, and an element is arranged on the adhesive . Two steps;
A third step of connecting a conductive wire to the bump;
A method for manufacturing a semiconductor device, comprising:
前記第2の工程は、前記バンプの一部に前記接着材を配置させる工程を含み、前記導電性ワイヤはバンプの接着材から露出された部位に接続する請求項1に記載の半導体装置の製造方法。 The second step is viewed contains a step of placing the adhesive on a portion of the bump, the conductive wires of the semiconductor device according to claim 1 connected to the site that was exposed from the adhesive bumps Production method. 前記第2の工程は、前記素子にて前記接着材を加圧し、前記接着材を前記バンプの一部に延在させる工程を含む請求項2に記載の半導体装置の製造方法。 The second step pressurizes the adhesive in the device, method of manufacturing a semiconductor device according to claim 2, said adhesive material comprising the step of extending a portion of the bump. 前記第3の工程は、前記バンプと前記素子とを前記導電性ワイヤにより接続する工程を含む請求項1から3のいずれか一項に記載の半導体装置の製造方法。   4. The method for manufacturing a semiconductor device according to claim 1, wherein the third step includes a step of connecting the bump and the element with the conductive wire. 5. さらに前記接着材の少なくとも一部と前記素子とを樹脂で被覆する工程を含む請求項1から4のいずれか一項に記載の半導体装置の製造方法。 The method for manufacturing a semiconductor device according to claim 1, further comprising a step of covering at least a part of the adhesive and the element with a resin. 絶縁性基板の上に導電体が形成されてなる、または凹状のセラミックパッケージの開口部内に導電体が形成されてなる半導体装置であって、
導電体と、
前記導電体に設けられたバンプと、
前記導電体に載置される素子を固定するための接着材と、
前記接着材の上に配置された素子と、
前記バンプに接続される導電性ワイヤと、を備え、
前記バンプは、前記接着材より上方で前記導電性ワイヤと接続されていることを特徴とする半導体装置。
A semiconductor device in which a conductor is formed on an insulating substrate, or a conductor is formed in an opening of a concave ceramic package,
A conductor;
A bump provided on the conductor;
An adhesive for fixing an element placed on the conductor;
An element disposed on the adhesive;
A conductive wire connected to the bump,
The semiconductor device according to claim 1, wherein the bump is connected to the conductive wire above the adhesive.
前記接着材の少なくとも一部と前記素子とを樹脂で被覆した請求項6に記載の半導体装置。 The semiconductor device according to claim 6, wherein at least a part of the adhesive and the element are covered with a resin.
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