JP4884038B2 - Slit nozzle cleaning device - Google Patents
Slit nozzle cleaning device Download PDFInfo
- Publication number
- JP4884038B2 JP4884038B2 JP2006066404A JP2006066404A JP4884038B2 JP 4884038 B2 JP4884038 B2 JP 4884038B2 JP 2006066404 A JP2006066404 A JP 2006066404A JP 2006066404 A JP2006066404 A JP 2006066404A JP 4884038 B2 JP4884038 B2 JP 4884038B2
- Authority
- JP
- Japan
- Prior art keywords
- slit nozzle
- cleaning liquid
- cleaning
- air
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/52—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter for removal of clogging particles
- B05B15/531—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter for removal of clogging particles using backflow
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
Landscapes
- Coating Apparatus (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
本発明は、スリットノズルの長手方向に沿って移動しつつ、スリットノズルの吐出口廻りを洗浄するスリットノズル洗浄装置に関する。 The present invention relates to a slit nozzle cleaning device that cleans around a discharge port of a slit nozzle while moving along the longitudinal direction of the slit nozzle.
ガラス基板等の基板上にレジスト膜やカラーフィルタとなる塗布液を一定幅で塗布する装置として従来からスリットノズルが用いられている。スリットノズルを用いれば塗布液の無駄をなくし且つ効率的に塗布を行えるが、幅広となる分ノズル先端の周辺部に塗布液の回り込み量も多く、これが乾燥すると大量の異物発生の原因となる。 A slit nozzle has been conventionally used as an apparatus for applying a coating liquid, which becomes a resist film or a color filter, on a substrate such as a glass substrate with a certain width. If a slit nozzle is used, the application liquid can be eliminated and the application can be performed efficiently. However, since the width of the application liquid increases, the amount of the application liquid wraps around the periphery of the nozzle tip, which causes a large amount of foreign matter when dried.
そこで、特許文献１では、スリットノズルの長手方向に沿って移動する洗浄部に、洗浄液の噴出口とガスの噴出口を形成した構造が開示されている（図１２参照）。 Therefore, Patent Document 1 discloses a structure in which a cleaning liquid jet and a gas jet are formed in a cleaning section that moves along the longitudinal direction of the slit nozzle (see FIG. 12).
また、特許文献２では、洗浄装置のＶ字状をなす受け面にノズルの下端部を臨ませ、この受け面に設けたリンスノズルからスリット近傍に洗浄液を噴出して洗浄する構造が開示されている（図８参照）。 Further, Patent Document 2 discloses a structure in which a lower end portion of a nozzle faces a V-shaped receiving surface of a cleaning device, and a cleaning liquid is jetted and cleaned near a slit from a rinse nozzle provided on the receiving surface. (See FIG. 8).
また特許文献３では、スリットノズルの移動方向の終端部近傍に、プリディスペンス部、洗浄部及びディップ部を配置した構成が開示されている。 Further, Patent Document 3 discloses a configuration in which a pre-dispensing part, a cleaning part, and a dip part are arranged in the vicinity of the terminal part in the movement direction of the slit nozzle.
ところで、特許文献１では、洗浄装置がスリットノズルの長手方向に沿って移動しながら洗浄を行うが、洗浄装置のＶ字状をなす受け面において、下方に連続して洗浄ノズルが設けられ、上方に連続してガスノズルが設けられているため（図１２参照）、スリットノズルの長手方向に沿って洗浄装置が往復動することで洗浄と乾燥とを行うことが推測される。この場合、例えば往動の際に洗浄液を噴出して復動の際にガスで乾燥させることになるため、洗浄から乾燥までに要する時間が長くなってしまう。 By the way, in Patent Document 1, the cleaning device performs cleaning while moving along the longitudinal direction of the slit nozzle. On the V-shaped receiving surface of the cleaning device, a cleaning nozzle is continuously provided below, Since the gas nozzle is continuously provided (see FIG. 12), it is presumed that the cleaning device reciprocates along the longitudinal direction of the slit nozzle to perform cleaning and drying. In this case, for example, the cleaning liquid is ejected at the time of forward movement and dried with gas at the time of backward movement, so that the time required from cleaning to drying becomes long.
また、特許文献２及び特許文献３に開示される装置では、洗浄装置がスリットノズル下端部全体を同時に洗浄するため、均一な洗浄を行うことが難しく且つ大量の洗浄液を必要とする。 Further, in the apparatuses disclosed in Patent Document 2 and Patent Document 3, since the cleaning device cleans the entire lower end portion of the slit nozzle at the same time, it is difficult to perform uniform cleaning and requires a large amount of cleaning liquid.
上述した点に鑑み、本発明は、スリットノズルの洗浄及び乾燥までに要する時間を短縮させることができるスリットノズル洗浄装置を提供するものである。 In view of the above, the present invention provides a slit nozzle cleaning device that can shorten the time required for cleaning and drying the slit nozzle.
本発明に係るスリットノズル洗浄装置は、スリットノズルの長手方向に沿って移動可能とされ、スリットノズルに洗浄液を噴出する洗浄液噴出口を備えた洗浄液供給部と、スリットノズルに付着した洗浄液を拭き取る拭き取り部材と、エア噴出口を備えた乾燥部とが順に設けられている構成とする。 The slit nozzle cleaning device according to the present invention is capable of moving along the longitudinal direction of the slit nozzle, and is a wiper for wiping off the cleaning liquid attached to the slit nozzle, and a cleaning liquid supply unit provided with a cleaning liquid spout for jetting the cleaning liquid to the slit nozzle It is set as the structure by which the member and the drying part provided with the air jet nozzle are provided in order.
本発明に係るスリットノズル洗浄装置によれば、スリットノズルの長手方向に沿って移動可能とされ、スリットノズルに洗浄液を噴出する洗浄液噴出口を備えた洗浄液供給部と、スリットノズルに付着した洗浄液を拭き取る拭き取り部材と、エア噴出口を備えた乾燥部とが順に設けられているので、洗浄装置がスリットノズルに沿って往動する間に洗浄、拭き取り及び乾燥までが完了する。これにより、例えばスリットノズルに沿って往復することで洗浄更には乾燥までが完了する構成の洗浄装置の場合に比べて、洗浄に要する時間を大幅に短縮させることができる。 According to the slit nozzle cleaning device according to the present invention, the cleaning liquid supply unit provided with the cleaning liquid outlet that is movable along the longitudinal direction of the slit nozzle and jets the cleaning liquid to the slit nozzle, and the cleaning liquid attached to the slit nozzle Since the wiping member to be wiped off and the drying unit provided with the air jet nozzle are provided in order, the cleaning, wiping and drying are completed while the cleaning device moves forward along the slit nozzle. Accordingly, for example, the time required for cleaning can be greatly reduced as compared with the case of a cleaning apparatus configured to complete cleaning and further drying by reciprocating along the slit nozzle.
上述したスリットノズルの洗浄装置では、乾燥部に設けたエア噴出口とは別に、洗浄液供給部にエア噴出口を設けることもできる、これにより、例えば洗浄液噴出口から噴出された洗浄液を下方に導くことも可能になり、洗浄液に一方向（下向き）の流れをつくることができる。従って洗浄効率を高めることができると共に洗浄液が周囲に飛び散ることを防ぐこともできる。
またこの構成において、洗浄液供給部に設けられたエア噴出口と乾燥部に設けられたエア噴出口とを長手方向において連続した構成とすることもできる。これにより、エア供給配管を１本にすることもでき装置構成を簡略化できる。
In the above-described slit nozzle cleaning device, an air outlet can be provided in the cleaning liquid supply unit separately from the air outlet provided in the drying unit, and thereby, for example, the cleaning liquid ejected from the cleaning liquid outlet is guided downward. It is also possible to create a unidirectional (downward) flow in the cleaning liquid. Accordingly, the cleaning efficiency can be increased and the cleaning liquid can be prevented from splashing around.
In this configuration, the air jet port provided in the cleaning liquid supply unit and the air jet port provided in the drying unit may be continuous in the longitudinal direction. Thereby, the number of air supply pipes can be reduced to one, and the apparatus configuration can be simplified.
また、上述したスリットノズルの洗浄装置では、洗浄液噴出口の形状として、スリットノズルの長手方向に直行する方向を長軸方向とした長口（縦長）とすることもできる。これにより、スリットノズルにおいて洗浄液があたる面積を広げることができ、洗浄液による洗浄効果を更に高めることができる。従って、洗浄装置の長手方向へ沿った移動スピードを高めることも可能になり、例えば洗浄液を削減が可能になる。 Further, in the above-described slit nozzle cleaning apparatus, the shape of the cleaning liquid ejection port may be a long port (longitudinal) with the direction perpendicular to the longitudinal direction of the slit nozzle as the major axis direction. Thereby, the area which a cleaning liquid hits in a slit nozzle can be expanded, and the cleaning effect by a cleaning liquid can further be heightened. Accordingly, it is possible to increase the moving speed along the longitudinal direction of the cleaning device, and for example, it is possible to reduce the cleaning liquid.
本発明のスリットノズル洗浄装置によれば、洗浄時間を大幅に短縮させることが可能になる。従って、半導体製造装置をはじめとする液体塗布装置のノズルを洗浄する装置において、特に塗布液の凝固が問題となる装置に用いられて好適であり、洗浄作業頻度が低減することによる製造ライン全体の処理効率を向上させることが期待される。 According to the slit nozzle cleaning device of the present invention, the cleaning time can be greatly shortened. Accordingly, the apparatus for cleaning the nozzles of the liquid coating apparatus including the semiconductor manufacturing apparatus is particularly suitable for use in an apparatus in which the solidification of the coating liquid is a problem, and the entire production line is reduced by reducing the frequency of cleaning work. It is expected to improve the processing efficiency.
以下に本発明の実施の形態を添付図面に基づいて説明する。
図１は本発明に係るスリットノズル洗浄装置を適用した塗布装置の平面図、図２は図１に示した塗布装置の側面図、図３は同洗浄装置の全体斜視図、図４は同洗浄装置の全体斜視図である。
Embodiments of the present invention will be described below with reference to the accompanying drawings.
1 is a plan view of a coating apparatus to which a slit nozzle cleaning apparatus according to the present invention is applied, FIG. 2 is a side view of the coating apparatus shown in FIG. 1, FIG. 3 is an overall perspective view of the cleaning apparatus, and FIG. It is the whole apparatus perspective view.
図１及び図２に示すように、塗布装置は基台１に一対の平行なレール（２，２）が設けられ、これらレール（２，２）の中間位置となる基台１上面の中央に基板Ｗの載置ステージ３が固定されている。そしてこの基板載置ステージ３を跨ぐように移動機構（４，４）がレール（２，２）間に走行可能に架け渡され、これら移動機構（４，４）間には前後にビーム（５，５）が架設されており、平面視で枠状をなすフレームが構成されている。更にビーム（５，５）の中間で移動機構（４，４）間に昇降装置を介してスリットノズル６が取り付けられている。 As shown in FIGS. 1 and 2, the coating apparatus is provided with a pair of parallel rails (2, 2) on the base 1, and at the center of the upper surface of the base 1, which is an intermediate position between the rails (2, 2). The mounting stage 3 for the substrate W is fixed. Then, the moving mechanism (4, 4) is movably bridged between the rails (2, 2) so as to straddle the substrate mounting stage 3, and a beam (5) is moved back and forth between these moving mechanisms (4, 4). 5) is constructed, and a frame is formed in a frame shape in plan view. Further, a slit nozzle 6 is mounted between the moving mechanisms (4, 4) in the middle of the beams (5, 5) via an elevating device.
このような構成の塗布装置においては、本実施の形態のスリットノズル洗浄装置１０が基台１の一端側に配置されている。この洗浄装置１０は、基台１の幅方向に設けられたレール１１にプレート１２が係合され、プレート１２上に設けた洗浄用ブロック１３がスリットノズル６の長手方向に沿って往復動可能とされている。 In the coating apparatus having such a configuration, the slit nozzle cleaning apparatus 10 of the present embodiment is disposed on one end side of the base 1. In this cleaning apparatus 10, a plate 12 is engaged with a rail 11 provided in the width direction of the base 1, and a cleaning block 13 provided on the plate 12 can reciprocate along the longitudinal direction of the slit nozzle 6. Has been.
洗浄用ブロック１３は、図３及び図４に示すように側面視でＶ字状をなす左右の受け面（１４，１４）が形成され、底部に洗浄液の排出口１５が形成されている。 As shown in FIGS. 3 and 4, the cleaning block 13 has left and right receiving surfaces (14, 14) that are V-shaped in a side view, and a cleaning liquid discharge port 15 is formed at the bottom.
そして、本実施の形態においては特に、このＶ字状をなす左右の受け面（１４，１４）に、洗浄液供給部１７、拭き取り部材１６、乾燥部１８が順に設けられている。
具体的には、洗浄装置１０が実際に移動した際に、先ずは洗浄、次に拭き取り、さらには乾燥が順に行われるような配置順であれば構わない。従って、洗浄装置１０のスタート位置を図３に示すような状態とし図中矢印方向（ＸからＹ）に移動させる場合は、図４に示すように左右の受け面（１４，１４）手前側から順に洗浄液供給部１７、拭き取り部材１６、乾燥部１８を設けるようにしている。つまり、洗浄装置１０の進行方向を基準として、拭き取り部材１６の前段に洗浄液供給部１７が設けられ、拭き取り部材１６の後段に乾燥部１８が設けられている。これにより、洗浄装置１０が実際に移動した場合は、行きだけの移動でスリットノズル６に対して洗浄、拭き取り、乾燥を順に行うことができる。
And in this Embodiment, the washing | cleaning-liquid supply part 17, the wiping off member 16, and the drying part 18 are provided in order in the receiving surface (14, 14) which makes this V shape especially right and left.
Specifically, when the cleaning apparatus 10 actually moves, the arrangement order may be such that the cleaning, the wiping, and the drying are sequentially performed first. Therefore, when the start position of the cleaning device 10 is in the state shown in FIG. 3 and moved in the direction of the arrow (X to Y) in the figure, as shown in FIG. 4, from the front side of the left and right receiving surfaces (14, 14). A cleaning liquid supply unit 17, a wiping member 16, and a drying unit 18 are sequentially provided. That is, the cleaning liquid supply unit 17 is provided upstream of the wiping member 16 and the drying unit 18 is provided downstream of the wiping member 16 based on the traveling direction of the cleaning device 10. Thereby, when the washing | cleaning apparatus 10 actually moves, it can wash | clean, wipe off with respect to the slit nozzle 6, and can be dried in order only by a movement.
なお、洗浄装置１０のスタート位置を図３に示す場合から逆とした場合は（ＹからＸ）、左右の受け面（１４，１４）において、拭き取り部材１６を挟んでの洗浄液供給部１７と乾燥部１８の配置位置が図４に示す状態から逆となる。 When the start position of the cleaning device 10 is reversed from the case shown in FIG. 3 (from Y to X), the cleaning liquid supply unit 17 and the drying member 16 with the wiping member 16 sandwiched between the left and right receiving surfaces (14, 14) are dried. The arrangement position of the part 18 is reversed from the state shown in FIG.
洗浄液供給部１７は、Ｖ字状をなす左右の受け面（１４，１４）にスリットノズル６に洗浄液を噴出する洗浄液噴出口１９が複数設けられている。図示の例では左右にそれぞれ２つの口を設けているが、噴出口１９の個数はこれに限定されない。 The cleaning liquid supply unit 17 is provided with a plurality of cleaning liquid outlets 19 for ejecting the cleaning liquid to the slit nozzle 6 on the left and right receiving surfaces (14, 14) having a V-shape. In the illustrated example, two ports are provided on the left and right, respectively, but the number of the ejection ports 19 is not limited to this.
洗浄液噴出口１９は、その形状がスリットノズル６の長手方向に直行する方向を長軸方向とした長口（縦長形状）とされている。これにより、スリットノズル６の吐出口近傍の広範囲にわたって洗浄液を強く当てることができ、洗浄効率を向上させることができる。そしてこのように洗浄効果が向上したことから、洗浄装置１０の長手方向へ沿った移動スピードも高めることも可能になり例えば洗浄液削減も可能になる。 The cleaning liquid ejection port 19 has a long opening (longitudinal shape) whose shape is a direction perpendicular to the longitudinal direction of the slit nozzle 6. As a result, the cleaning liquid can be strongly applied over a wide range in the vicinity of the discharge port of the slit nozzle 6, and the cleaning efficiency can be improved. Since the cleaning effect is thus improved, the moving speed of the cleaning device 10 along the longitudinal direction can be increased, and for example, the cleaning liquid can be reduced.
また洗浄液噴出口１９の上方にはエア噴出口（２０，２０）が開口されている。これにより、スリットノズル６が洗浄装置１０のＶ字状をなす左右の受け面（１４，１４）内に収まった状態で実際にエアを噴出させた場合、洗浄液噴出口１９から下方の排出口１５へと向かう一方向（下方）のエアの流れを形成することができ、スリットノズル（例えばスリットノズルの吐出口の廻り）６に付着した洗浄液が上方へ舞い上がることなく下方の排出口１５へと導くことができる。 Air jets (20, 20) are opened above the cleaning liquid jet 19. Thereby, when air is actually ejected in a state where the slit nozzle 6 is accommodated in the left and right receiving surfaces (14, 14) forming the V shape of the cleaning device 10, the discharge port 15 below the cleaning liquid outlet 19 is provided. A flow of air in one direction (downward) toward the head can be formed, and the cleaning liquid adhering to the slit nozzle (for example, around the discharge port of the slit nozzle) 6 is guided to the lower discharge port 15 without rising upward. be able to.
拭き取り部材１６は、左右の受け面（１４，１４）の長さ方向の略中間位置に設けられており、例えばスリットノズル（スリットノズルの吐出口の廻り）６に付着した洗浄液を拭き取るためのものである。拭き取り部材１６としては、例えばフェルトやスポンジ等を用いることができる。なお、拭き取り部材１６は、Ｖ字状をなす左右の受け面（１４，１４）において下方（排出口１５の近傍）に設けられている。
なお、図４に示す場合では、排出口１５を挟んで左右の拭き取り部材（１６，１６）は長さ方向に若干ずらして取り付けられている。即ち左右対象に取り付けないことでスリットノズル６を拭き取る際の干渉を防いでいる。
The wiping member 16 is provided at a substantially intermediate position in the length direction of the left and right receiving surfaces (14, 14). For example, the wiping member 16 is for wiping the cleaning liquid adhering to the slit nozzle (around the discharge port of the slit nozzle) 6. It is. As the wiping member 16, for example, felt or sponge can be used. The wiping member 16 is provided below (in the vicinity of the discharge port 15) on the left and right receiving surfaces (14, 14) having a V-shape.
In the case shown in FIG. 4, the left and right wiping members (16, 16) are attached with a slight shift in the length direction across the discharge port 15. That is, the interference at the time of wiping off the slit nozzle 6 is prevented by not attaching to the left and right objects.
乾燥部１８では左右の受け面（１４，１４）の上方にスリット状に形成された乾燥用のエア噴出口（２３，２３）が開口している。これにより、スリットノズル（例えばスリットノズルの吐出口の廻り）６にエアを吹きかけることができ、スリットノズル６を乾燥させることができる。 In the drying unit 18, drying air jets (23, 23) formed in a slit shape are opened above the left and right receiving surfaces (14, 14). Thereby, air can be sprayed on the slit nozzle 6 (for example, around the discharge port of the slit nozzle), and the slit nozzle 6 can be dried.
なお、本実施の形態のスリットノズル洗浄装置１０では、上述した洗浄液噴出口１９の上方に設けられた洗浄液供給部１７のエア噴出口（２０，２０）と、乾燥部１８の上方に設けられたエア噴出口（２３，２３）とを連続せず独立して設け、別々のエア供給管２１，２２を用いて異なる圧力のエア（後述するように乾燥部１８での噴出圧を大きくする）を供給するようにしているが、それぞれのエア噴出口が連続した構成とすることもできる。この場合は、エア供給配管を１本にすることができ装置構造を簡素化することができる。 In the slit nozzle cleaning device 10 of the present embodiment, the air nozzles (20, 20) of the cleaning liquid supply unit 17 provided above the cleaning liquid jet port 19 and the drying unit 18 are provided. Air outlets (23, 23) are provided independently without being continuous, and air of different pressures (increase the jet pressure at the drying section 18 as will be described later) using separate air supply pipes 21, 22 are provided. Although it supplies, it can also be set as the structure with which each air jet nozzle was continued. In this case, the number of air supply pipes can be reduced to one and the device structure can be simplified.
因みに本実施の形態のようにそれぞれのエア噴出口を独立して設けた場合は、例えば洗浄液供給部１７のエア噴出口（２０，２０）からのエアの噴出圧は、洗浄液噴出口１９から噴出される洗浄液に方向性をもたせる程度の小さいエア圧とし、乾燥部１８のエア噴出口（２３，２３）からのエア噴出圧は、乾燥を促すために大きいエア圧とすることができる。すなわちエア圧をそれぞれで調整することが可能になる。 Incidentally, when each air jet is provided independently as in the present embodiment, for example, the jet pressure of air from the air jet (20, 20) of the cleaning liquid supply unit 17 is jetted from the cleaning liquid jet 19 The air pressure is small enough to give direction to the cleaning liquid, and the air ejection pressure from the air ejection ports (23, 23) of the drying unit 18 can be a large air pressure to promote drying. That is, the air pressure can be adjusted individually.
なお、洗浄液供給部１７のエア噴出口（２０，２０）及び乾燥部のエア噴出口（２３，２３）を連続させた場合はもちろんであるが、本実施の形態のようにそれぞれが独立して設けられている場合であっても、図４に示すように、Ｖ字状をなす左右の受け面（１４，１４）において拭き取り部材１６の上方にはエア噴出口は延在している。しかしエア噴出口の形状、長さ、形成位置等はこれに限定されない。 Needless to say, the air outlets (20, 20) of the cleaning liquid supply unit 17 and the air outlets (23, 23) of the drying unit are made continuous, but each is independent as in the present embodiment. Even if it is provided, as shown in FIG. 4, the air jets extend above the wiping member 16 on the left and right receiving surfaces (14, 14) having a V-shape. However, the shape, length, formation position and the like of the air jet are not limited to this.
また、本実施の形態のスリットノズル洗浄装置１０では、Ｖ字状をなす左右の受け面（１４，１４）に対して、スリットノズル６の高さ位置を垂直方向で変えることもできる。これにより、スリットノズル６に対して例えば拭き取り部材を接触させることなく移動でき、スリットノズル６に対して洗浄と乾燥のみを行うこともできる。 Moreover, in the slit nozzle cleaning apparatus 10 of this Embodiment, the height position of the slit nozzle 6 can also be changed with respect to the V-shaped left and right receiving surfaces (14, 14) in the vertical direction. Thereby, it can move, for example, without making a wiping member contact with respect to the slit nozzle 6, and only washing | cleaning and drying can also be performed with respect to the slit nozzle 6. FIG.
次に、スリットノズル洗浄装置の実際の動作を説明する。
塗布が終了したスリットノズル６の下端の吐出口を洗浄するには、先ず、洗浄装置１０を図１に示すスタート位置に待機させておき、移動機構４によってスリットノズル６を洗浄装置１０の上方まで移動させる。
Next, the actual operation of the slit nozzle cleaning device will be described.
In order to clean the discharge port at the lower end of the slit nozzle 6 after the application, first, the cleaning device 10 is kept at the start position shown in FIG. 1 and the slit nozzle 6 is moved up to above the cleaning device 10 by the moving mechanism 4. Move.
次いで、スリットノズル６を下降させて、下端の吐出口を拭き取り部材（１６，１６）に当接させる。この後、洗浄液噴出口１９から洗浄液をスリットノズル６の吐出口廻りに吹き付けると共にエア噴出口２０からエアを噴出させた状態で、噴出洗浄装置１０をレール１１に沿って一端から他端に向けて（ＸからＹ）移動させる。
これにより、スリットノズル６の洗浄液供給部１７に臨む部分は洗浄液により洗浄され、洗浄された部分は洗浄装置１０が移動することで拭き取り部材（１６，１６）によって拭き取られ、更に洗浄液が拭き取られた部分は洗浄装置１０が移動することで乾燥部１８に臨みエアにより乾燥される。
Next, the slit nozzle 6 is lowered, and the discharge port at the lower end is brought into contact with the wiping member (16, 16). Thereafter, the cleaning liquid is sprayed from the cleaning liquid outlet 19 around the outlet of the slit nozzle 6 and the air is ejected from the air outlet 20 so that the spray cleaning device 10 is directed from one end to the other along the rail 11. Move from (X to Y).
As a result, the portion of the slit nozzle 6 facing the cleaning liquid supply unit 17 is cleaned with the cleaning liquid, and the cleaned portion is wiped by the wiping members (16, 16) as the cleaning device 10 moves, and further the cleaning liquid is wiped off. When the cleaning device 10 is moved, the portion that has been subjected to the drying unit 18 is dried by air.
このように本実施の形態のスリットノズル洗浄装置１０によれば、スリットノズル６に沿った行きだけの移動だけで、スリットノズル６の吐出口廻りを洗浄及び乾燥させることが可能になり、例えば行き及び帰りの移動により洗浄及び乾燥を行う洗浄装置の場合に比べて洗浄時間を大幅に短縮することができる。 As described above, according to the slit nozzle cleaning device 10 of the present embodiment, it is possible to clean and dry the area around the discharge port of the slit nozzle 6 only by movement along the slit nozzle 6. In addition, the cleaning time can be greatly shortened as compared with the case of the cleaning apparatus that performs cleaning and drying by the return movement.
上述した実施の形態のスリットノズル洗浄装置１０では、拭き取り部材（１６，１６）としてフェルトやスポンジを用いた場合を説明したが、これ以外にもゴムや樹脂等を用いることもできる。 In the slit nozzle cleaning device 10 according to the above-described embodiment, the case where felt or sponge is used as the wiping member (16, 16) has been described. However, other than this, rubber, resin, or the like can be used.
なお、本発明は上述の実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲でその他様々な構成が取り得る。 The present invention is not limited to the above-described embodiment, and various other configurations can be taken without departing from the gist of the present invention.
１…基台、２…レール、３…基板載置ステージ、４…移動機構、５…ビーム、６…スリットノズル、１０…洗浄装置、１１…レール、１２…プレート、１３…洗浄用ブロック、１４…受け面、１５…排出口、１６…拭き取り部材、１７…洗浄液供給部、１８…乾燥部、１９…洗浄液噴出口、２０…エア噴出口（洗浄液供給部）、２１，２２…エア供給管、２３…エア噴出口（乾燥部）、Ｗ…基板
DESCRIPTION OF SYMBOLS 1 ... Base, 2 ... Rail, 3 ... Substrate mounting stage, 4 ... Moving mechanism, 5 ... Beam, 6 ... Slit nozzle, 10 ... Cleaning device, 11 ... Rail, 12 ... Plate, 13 ... Cleaning block, 14 DESCRIPTION OF SYMBOLS ... Reception surface, 15 ... Discharge port, 16 ... Wiping member, 17 ... Cleaning liquid supply part, 18 ... Drying part, 19 ... Cleaning liquid outlet, 20 ... Air outlet (cleaning liquid supply part), 21, 22 ... Air supply pipe, 23: Air outlet (drying section), W: Substrate
Claims (1)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006066404A JP4884038B2 (en) | 2006-03-10 | 2006-03-10 | Slit nozzle cleaning device |
| PCT/JP2007/052671 WO2007105401A1 (en) | 2006-03-10 | 2007-02-15 | Slit nozzle cleaning apparatus |
| TW096107884A TW200738345A (en) | 2006-03-10 | 2007-03-07 | Slit nozzle cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006066404A JP4884038B2 (en) | 2006-03-10 | 2006-03-10 | Slit nozzle cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007237122A JP2007237122A (en) | 2007-09-20 |
| JP4884038B2 true JP4884038B2 (en) | 2012-02-22 |
Family
ID=38509239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006066404A Expired - Lifetime JP4884038B2 (en) | 2006-03-10 | 2006-03-10 | Slit nozzle cleaning device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4884038B2 (en) |
| TW (1) | TW200738345A (en) |
| WO (1) | WO2007105401A1 (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4985007B2 (en) * | 2006-03-22 | 2012-07-25 | 東レ株式会社 | Coating device cleaning device, coating method and coating device, and method for manufacturing liquid crystal display member |
| JP4850680B2 (en) * | 2006-12-15 | 2012-01-11 | 中外炉工業株式会社 | Discharge nozzle cleaning device |
| KR100897240B1 (en) | 2007-09-21 | 2009-05-14 | 주식회사 디엠에스 | Slit coater with cleaning device |
| EP2302396B1 (en) * | 2008-07-17 | 2018-09-26 | PHC Holdings Corporation | Analyzing device, and analyzing method using the analyzing device |
| JP5258811B2 (en) * | 2010-02-17 | 2013-08-07 | 東京エレクトロン株式会社 | Slit nozzle cleaning device and coating device |
| JP5771432B2 (en) * | 2011-04-13 | 2015-08-26 | 東京応化工業株式会社 | Coating device |
| JP5841449B2 (en) * | 2012-02-10 | 2016-01-13 | 東京エレクトロン株式会社 | Wiping pad, nozzle maintenance device using the pad, and coating treatment device |
| CN103286090B (en) * | 2013-05-09 | 2016-01-13 | 深圳市华星光电技术有限公司 | Clean device and the Photoresisting coating machines of erasing rubber in light blockage coating processing procedure |
| CN106513355B (en) * | 2015-09-09 | 2019-11-26 | 沈阳芯源微电子设备股份有限公司 | A kind of nozzle cleaning and cleaning method |
| CN105182689A (en) * | 2015-10-30 | 2015-12-23 | 京东方科技集团股份有限公司 | Adhesive coating device and cleaning method for adhesive discharging nozzle thereof |
| CN106378331A (en) * | 2016-11-28 | 2017-02-08 | 武汉华星光电技术有限公司 | Mixed type metal opening non-contact cleaning device and cleaning method |
| CN206425274U (en) * | 2017-01-05 | 2017-08-22 | 惠科股份有限公司 | Cleaning device for nozzle |
| CN106733358B (en) * | 2017-02-06 | 2019-10-01 | 京东方科技集团股份有限公司 | Nozzle cleaning device and coating fluid coating apparatus |
| KR102807346B1 (en) * | 2022-12-26 | 2025-05-13 | 시바우라 메카트로닉스 가부시끼가이샤 | Substrate processing apparatus and substrate processing method |
| JP2025060123A (en) * | 2023-09-29 | 2025-04-10 | 芝浦メカトロニクス株式会社 | Substrate Processing Equipment |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3169636B2 (en) * | 1991-06-07 | 2001-05-28 | コニカ株式会社 | Coating method and coating device |
| JPH0593289A (en) * | 1991-07-04 | 1993-04-16 | Sky Alum Co Ltd | Cleaning liquid removal device |
| JPH10216598A (en) * | 1997-02-04 | 1998-08-18 | Toray Ind Inc | Coating method and coating device, and color filter manufacturing method and manufacturing device |
| JP4451175B2 (en) * | 2004-03-19 | 2010-04-14 | 大日本スクリーン製造株式会社 | Nozzle cleaning apparatus and substrate processing apparatus |
-
2006
- 2006-03-10 JP JP2006066404A patent/JP4884038B2/en not_active Expired - Lifetime
-
2007
- 2007-02-15 WO PCT/JP2007/052671 patent/WO2007105401A1/en not_active Ceased
- 2007-03-07 TW TW096107884A patent/TW200738345A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007105401A1 (en) | 2007-09-20 |
| JP2007237122A (en) | 2007-09-20 |
| TW200738345A (en) | 2007-10-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2007105401A1 (en) | Slit nozzle cleaning apparatus | |
| JP5258811B2 (en) | Slit nozzle cleaning device and coating device | |
| KR100954472B1 (en) | Cleaning device of the discharge nozzle | |
| US5976269A (en) | Printing mask cleaning apparatus and method | |
| CN104768762B (en) | Ink-jet recording apparatus | |
| US8506045B2 (en) | Inkjet head cleaning apparatus and method | |
| JP2013165137A (en) | Wiping pad, nozzle maintenance device using the pad, and coating processing device | |
| JP2008546596A (en) | Wiper device | |
| KR20060044725A (en) | Slit Nozzle Cleaner | |
| CN102046386A (en) | Multicolor printhead maintenance station | |
| JP5303335B2 (en) | Conveying belt cleaning mechanism and inkjet recording apparatus including the same | |
| KR100839781B1 (en) | Device for cleaning dies for coating | |
| KR101346911B1 (en) | Nozzle Cleaning device of Slit Coater | |
| CN108297548A (en) | Record head and the ink-jet recording apparatus for having record head | |
| JP2006272579A (en) | Discharging surface cleaning device for liquid discharging head | |
| JP6580177B2 (en) | Substrate dryer | |
| JP3180143U (en) | Coating nozzle cleaning device | |
| JP2007268391A (en) | Pre-discharge device and pre-discharge method | |
| JP2008273065A (en) | Cleaning device for liquid material discharge device | |
| JP2019122922A (en) | Cleaning device and inkjet application device | |
| JP2010051839A (en) | Cleaning device | |
| JP2010201742A (en) | Preliminary discharge section and ink jet device | |
| CN110124920A (en) | A kind of nozzle cleaning device and coating apparatus | |
| JP5917610B2 (en) | Substrate processing equipment | |
| KR20070113524A (en) | Slit Die Nozzle Cleaning Device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20060421 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060421 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081225 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100511 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100709 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20101221 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110322 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20110329 |
|
| A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20110428 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111109 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111206 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141216 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4884038 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |