JP4884917B2 - Color filter manufacturing method, color filter, and liquid crystal display device - Google Patents

Description

  The present invention relates to a manufacturing method of a color filter suitable for a liquid crystal display device (LCD) such as a portable terminal, a portable game machine, a notebook computer, a TV monitor, a PALC (plasma address liquid crystal), a plasma display, and the like, and The present invention relates to a manufactured color filter and a liquid crystal display device using the color filter.

  In a conventional pattern formation method using a photomask, alignment is performed using a pattern formed in advance and an alignment mark. However, complete alignment is impossible by this method, particularly a color filter for liquid crystal In this case, it is necessary to enlarge the overlapping region between the black matrix and each pixel of red (R), green (G), and blue (B). For this reason, the width of the black matrix is inevitably increased, and the brightness of the liquid crystal display panel is lowered. Particularly in recent years, a bright display is required for liquid crystal televisions and portable terminals, but there is a problem that power consumption is large because measures are taken by strengthening the backlight.

On the other hand, as a method for producing a color filter, a laser beam such as a semiconductor laser or a gas laser is used on a photosensitive composition based on digital data such as a pixel pattern without using a photomask in order to reduce production costs. An exposure apparatus using a laser direct imaging system (hereinafter sometimes referred to as “LDI”) that performs direct patterning and patterning has been studied (for example, see Non-Patent Document 1 and Patent Document 1).
However, this method is intended to reduce the cost by maskless, and does not describe anything about the performance improvement of the color filter.

  Therefore, by maskless laser exposure, the overlapping width between the black matrix and the pixels can be narrowed and alignment (alignment) can be performed so that the edge properties match, and a color filter with high transmittance can be formed. Manufacturing method of color filter suitably used for liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook computers, TV monitors, PALC (plasma address liquid crystal), plasma display, and the like, and manufacturing method of the color filter The color filter formed by the above method and the liquid crystal display device using the color filter have not been provided yet, and further improvement and development are desired.

JP 2004-1244 A Akihito Ishikawa “Development shortening and mass production application by maskless exposure”, “Electronics packaging technology”, Technical Research Committee, Vol. 18, no. 6, 2002, p. 74-79

  This invention is made | formed in view of this present condition, and makes it a subject to solve the said various problems in the past and to achieve the following objectives. That is, according to the present invention, a maskless laser exposure can reduce the overlap width between the black matrix and the pixel and perform alignment (alignment) so as to match the edge property, and a color filter with high transmittance can be obtained. A method for producing a color filter that can be suitably used for liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook computers, and television monitors, PALC (plasma address liquid crystal), plasma displays, and the like It is an object of the present invention to provide a color filter formed by a filter manufacturing method and a liquid crystal display device using the color filter.

Means for solving the problems are as follows. That is,
<1> A photosensitive layer forming step of forming a photosensitive layer on the surface of a substrate using a photosensitive composition containing a binder, a polymerizable compound, a photopolymerization initiator, and a colorant and colored in black. A black matrix forming step of forming a black matrix by an exposure step of exposing the photosensitive layer and a developing step of developing the photosensitive layer exposed in the exposure step;
At least on the surface of the substrate on which the black matrix is formed using the photosensitive composition colored in three primary colors of red (R), green (G), and blue (B), at least R, For each color of G and B, a photosensitive layer forming process, an exposure process, and a developing process are sequentially repeated to form a pixel forming process,
The exposure step in the pixel forming step includes a light irradiating means and n (where n is a natural number of 2 or more) two-dimensionally arranged pixel parts that receive and emit light from the light irradiating means. An exposure head including a light modulation unit capable of controlling the image element portion according to pattern information, wherein the column direction of the image element portion is a predetermined set inclination angle with respect to a scanning direction of the exposure head. Using an exposure head arranged to form θ,
With respect to the exposure head, the usable pixel part designating means designates the pixel part to be used for N double exposure (where N is a natural number of 2 or more) among the usable graphic elements.
For the exposure head, the pixel part control means controls the pixel part so that only the pixel part specified by the used pixel part specifying means is involved in exposure,
A step of performing exposure by moving the exposure head relative to the photosensitive layer in a scanning direction;
In addition, the relationship between the overlap width (A) of the formed pixel and the black matrix and the width (B) of the black matrix, and (B) / (A) exceeding 2, the manufacture of a color filter Is the method.
<2> The method for producing a color filter according to <1>, wherein the width of the black matrix is 8 μm or more and 50 μm or less.
<3> The color according to any one of <1> to <2>, wherein the photosensitive layer forming step is a step of forming the photosensitive layer by applying the photosensitive composition to the surface of the substrate and drying the substrate. It is a manufacturing method of a filter.
<4> Using the photosensitive transfer material having a photosensitive transfer layer made of a photosensitive composition on the support, the photosensitive layer forming step uses the photosensitive transfer layer and the base material so that they come into contact with each other. The method for producing a color filter according to any one of <1> to <2>, wherein the photosensitive layer is formed by laminating the substrate and then peeling off the support.
<5> At least pigment C.I. I. Pigment Red 254 is colored green (G) with pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 and at least a pigment C.I. I. The method for producing a color filter according to any one of <1> to <4>, wherein Pigment Blue 15: 6 is used.

<6> The method for producing a color filter according to any one of <1> to <5>, wherein the exposure is performed using a laser beam having a wavelength of 350 to 415 nm.
<7> The method for producing a color filter according to any one of <1> to <6>, wherein the exposure is performed imagewise based on pattern information to be formed.
<8> The exposure is performed by a plurality of exposure heads, and the used drawing element specifying means is related to the exposure of the joint area between the heads, which is the overlapping exposure area on the exposed surface formed by the plurality of exposure heads. The method for manufacturing a color filter according to any one of <1> to <7>, wherein, among the element parts, the image element part used for realizing N double exposure in the inter-head connection region is designated. In the method for producing a color filter according to <8>, the exposure is performed by a plurality of exposure heads, and the used pixel portion designating unit is an overlapped exposure region on an exposed surface formed by the plurality of exposure heads. The position of the exposure head is determined by designating the pixel part to be used for realizing N double exposure in the head-to-head connection area among the picture-element parts involved in the exposure of the head-to-head connection area. Variations in the resolution and density unevenness of the pattern formed in the connection area between the heads on the exposed surface of the photosensitive layer due to the mounting angle deviation are averaged. As a result, the photosensitive layer is exposed with high definition. For example, a high-definition pattern is formed by developing the photosensitive layer thereafter.
<9> The exposure is performed by a plurality of exposure heads, and the used picture element specifying means is involved in exposure other than the inter-head connection region that is an overlapping exposure region on the exposed surface formed by the plurality of exposure heads. The manufacturing of the color filter according to any one of <1> to <8>, wherein the pixel part used to realize N double exposure in an area other than the inter-head connecting area among the picture element parts is designated. Is the method. In the method for producing a color filter according to <9>, the exposure is performed by a plurality of exposure heads, and the used pixel portion designating unit is an overlapped exposure region on the exposed surface formed by the plurality of exposure heads. Among the picture element parts involved in exposure other than the inter-head connecting area, the picture element part used for realizing the N-fold exposure outside the inter-head connecting area is designated, whereby the exposure head Variations in the resolution and density unevenness of the pattern formed in areas other than the joint area between the heads on the exposed surface of the photosensitive layer due to deviations in the mounting position and mounting angle are leveled. As a result, the photosensitive layer is exposed with high definition. For example, a high-definition pattern is formed by developing the photosensitive layer thereafter.
<10> When the set inclination angle θ is N for the number of N exposures, the number s of the pixel portions in the column direction, the interval p in the column direction of the pixel portions, and the exposure head tilted, the relative row direction pitch δ of pixel parts in the direction perpendicular to the scanning direction, the following equation with respect to theta _ideal satisfying spsinθ _ideal ≧ Nδ, which is set so as to satisfy the relation of θ ≧ θ _ideal < It is a manufacturing method of the color filter in any one of <1> to <9>.
<11> The method for producing a color filter according to any one of <1> to <10>, wherein N in N-fold exposure is a natural number of 3 or more. In the method for producing a color filter according to <11>, multiple drawing is performed when N in N double exposure is a natural number of 3 or more. As a result, due to the effect of filling, variations in the resolution and density unevenness of the pattern formed on the exposed surface of the photosensitive layer due to a shift in the mounting position and mounting angle of the exposure head are more precisely leveled.

<12> Use pixel part designation means,
A light spot position detecting means for detecting a light spot position as a pixel unit that is generated by the picture element unit and constitutes an exposure area on the exposed surface;
<1> to <11>, further comprising: a pixel part selection unit that selects a pixel part to be used for realizing the N-fold exposure based on a detection result by the light spot position detection unit. It is a manufacturing method of a color filter.
<13> The color filter production according to any one of <1> to <12>, wherein the used pixel part specifying unit specifies, in line units, the used pixel part used for realizing the N-fold exposure. Is the method.

<14> Based on at least two light spot positions detected by the light spot position detection means, the actual alignment between the light spot column direction on the surface to be exposed and the scanning direction of the exposure head when the exposure head is tilted. The inclination angle θ ′ is specified, and the picture element selection means selects the use picture element part so as to absorb the error between the actual inclination angle θ ′ and the set inclination angle θ. It is a manufacturing method of the color filter in any one.
<15> The actual inclination angle θ ′ is an average value, a median value, and a plurality of actual inclination angles formed by the row direction of the light spots on the surface to be exposed and the scanning direction of the exposure head when the exposure head is inclined. The method for producing a color filter according to <14>, wherein the color filter is any one of a maximum value and a minimum value.
<16> The pixel part selection means derives a natural number T close to t that satisfies the relationship of ttan θ ′ = N (where N represents N of N double exposure numbers) based on the actual inclination angle θ ′, and m <15> to <15> for selecting the pixel part from the first line to the T-th line in a line element (where m represents a natural number of 2 or more) arranged as a used pixel part The method for producing a color filter according to any one of the above.
<17> The pixel part selection means derives a natural number T close to t that satisfies the relationship of ttan θ ′ = N (where N represents N of N double exposure numbers) based on the actual inclination angle θ ′, and m In the picture element part arranged in a row (where m represents a natural number of 2 or more), the picture element part from line (T + 1) to m-th line is specified as an unused picture element part, and the unused picture element part is specified. The method for producing a color filter according to any one of <12> to <16>, wherein the picture element part excluding the element part is selected as a use picture element part.

<18> In a region including at least an overlapped exposure region on an exposed surface formed by a plurality of pixel part rows, the pixel part selection unit,
(1) Means for selecting a used pixel portion so that a total area of an overexposed region and an underexposed region is minimized with respect to an ideal N-fold exposure;
(2) Means for selecting a pixel part to be used so that the number of pixel units in an overexposed area and the number of pixel units in an underexposed area are equal to each other with respect to an ideal N double exposure;
(3) Means for selecting a pixel part to be used so that the area of an overexposed area is minimized and an underexposed area does not occur with respect to an ideal N double exposure, and (4) Ideal From <12>, which is one of means for selecting a used pixel portion so that the area of an underexposed area is minimized and an overexposed area does not occur with respect to typical N double exposure <17> A method for producing a color filter according to any one of the above.
<19> In the connection region between the heads, which is an overlapping exposure region on the exposed surface formed by the plurality of exposure heads,
(1) With respect to the ideal N-multiple exposure, from the pixel part involved in the exposure of the inter-head connection region, the total area of the overexposed region and the underexposed region is minimized. Means for identifying a used pixel part and selecting the pixel part excluding the unused pixel part as a used pixel part;
(2) Involvement in the exposure of the head-to-head connecting region so that the number of pixel units in the overexposed region and the number of pixel units in the underexposed region are equal to the ideal N-double exposure. Means for identifying an unused pixel part from the pixel part to be selected, and selecting the pixel part excluding the unused pixel part as a used pixel part;
(3) For the ideal N-multiple exposure, from the pixel part involved in the exposure of the inter-head connecting region, the area of the overexposed region is minimized and the underexposed region is not generated. A means for identifying an unused pixel part and selecting the pixel part excluding the unused pixel part as a used pixel part; and
(4) For the ideal N-multiple exposure, from the pixel part involved in the exposure of the inter-head connecting region, the area of the underexposed region is minimized and the region that is overexposed is not generated. , Means for identifying an unused pixel part and selecting the pixel part excluding the unused pixel part as a used pixel part;
The method for producing a color filter according to any one of <12> to <18>.
<20> The color filter manufacturing method according to <19>, wherein the unused pixel parts are specified in units of rows.

<21> In order to specify a used pixel part in the used pixel part specifying means, among the usable pixel parts, N (n-1) pixel part columns for N multiple exposures The method for producing a color filter according to any one of <1> to <20>, wherein the reference exposure is performed using only the picture element portion that constitutes the above. In the method for producing a color filter according to <21>, in order to specify a used pixel part in the used pixel part specifying unit, among N usable pixel elements, (N-1) Reference exposure is performed using only the pixel part constituting the pixel part column for each column, and a simple pattern of substantially single drawing is obtained. As a result, the picture element portion in the head-to-head connection region is easily specified.
<22> In order to specify the used pixel part in the used pixel part specifying means, among the usable pixel elements, a N / N line pixel part row is configured for N of N multiple exposures. The method for producing a color filter according to any one of <1> to <20>, wherein the reference exposure is performed using only the picture element portion. In the method for producing a color filter according to <22>, in order to designate a use pixel part in the use pixel part designation unit, among the usable picture element parts, for N of N double exposure, Reference exposure is performed using only the pixel part constituting the pixel part column for each 1 / N row, and a simple pattern of substantially single drawing is obtained. As a result, the picture element portion in the head-to-head connection region is easily specified.

<23> The <1> to <22>, wherein the used pixel part designating unit includes an arithmetic unit connected to the light detector as a pixel part selection unit and a slit and a photodetector as a light spot position detection unit. The method for producing a color filter according to any one of the above.
<24> The method for producing a color filter according to any one of <1> to <23>, wherein N in N-exposure exposure is a natural number of 3 or more and 7 or less.

<25> The light modulation unit further includes a pattern signal generation unit that generates a control signal based on the pattern information to be formed, and the control signal generated by the pattern signal generation unit generates light emitted from the light irradiation unit. The method for producing a color filter according to any one of <1> to <24>, wherein the color filter is modulated according to the method. In the method for manufacturing a color filter according to <25>, the light modulation unit includes the pattern signal generation unit, so that the light emitted from the light irradiation unit is generated by the pattern signal generation unit. Is modulated according to.
<26> The method for producing a color filter according to any one of <1> to <25>, wherein the light modulator is a spatial light modulator.
<27> The method for producing a color filter according to <26>, wherein the spatial light modulator is a digital micromirror device (DMD).
<28> The method for producing a color filter according to any one of <1> to <27>, wherein the picture element portion is a micromirror.
<29> From <1> to <1> further including conversion means for converting the pattern information so that a dimension of a predetermined part of the pattern represented by the pattern information matches a dimension of a corresponding part that can be realized by the designated used pixel part. 28> The method for producing a color filter according to any one of the above.

<30> The method for producing a color filter according to any one of <1> to <29>, wherein the light irradiation unit can synthesize and irradiate two or more lights. In the method for producing a color filter according to <30>, since the light irradiation unit can synthesize and irradiate two or more lights, exposure is performed with exposure light having a deep focal depth. As a result, the exposure of the photosensitive layer is performed with extremely high definition. For example, when the photosensitive layer is subsequently developed, an extremely fine pattern is formed.
<31> The light irradiation means includes a plurality of lasers, a multimode optical fiber, and a collective optical system that condenses the laser light emitted from each of the plurality of lasers and couples the laser light to the multimode optical fiber. <1> to <30> The method for producing a color filter according to any one of <30>. In the method for manufacturing a color filter according to <31>, the light irradiation unit can collect the laser beams irradiated from the plurality of lasers by the collective optical system and couple the laser beams to the multimode optical fiber. Therefore, exposure is performed with exposure light having a deep focal depth. As a result, the exposure of the photosensitive layer is performed with extremely high definition. For example, when the photosensitive layer is subsequently developed, an extremely fine pattern is formed.

  <32> The method for producing a color filter according to any one of <1> to <31>, including at least one of a curing treatment step and a heat treatment step.

<33> A color filter manufactured by the method for manufacturing a color filter according to any one of <1> to <32>.
<34> A liquid crystal display device using the color filter according to <33>.

  According to the present invention, the conventional problems can be solved, and the alignment (alignment) is performed so that the edge matrix matches the width of the black matrix and the color filter by thinning the maskless laser exposure. Suitable for liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook PCs, TV monitors, PALC (plasma addressed liquid crystal), and plasma displays that can form color filters with high transmittance. A color filter manufacturing method, a color filter formed by the color filter manufacturing method, and a liquid crystal display device using the color filter can be provided.

(Color filter manufacturing method)
In the method for producing a color filter of the present invention, a black matrix forming step for forming a black matrix on the surface of a substrate and at least three primary colors of red (R), green (G), and blue (B) are colored. And a pixel forming step of forming pixels on the surface of the base material on which the black matrix is formed using the photosensitive composition.
The color filter of the present invention is manufactured by the method for manufacturing the color filter of the present invention.
The liquid crystal display device of the present invention uses the color filter of the present invention, and further includes other means as necessary.
Hereinafter, details of the color filter and the liquid crystal display device of the present invention will be clarified through the description of the method of manufacturing the color filter of the present invention.

The overlap width (A) of the pixels formed by the color filter manufacturing method of the present invention and the black matrix is (B) / (A) when the width of the black matrix is (B). It is necessary to exceed 2, preferably 2.5 or more, and more preferably 3 or more. When the value of (B) / (A) is 2 or less, pixel overlap partially occurs on the black matrix, and disconnection of ITO (indium tin oxide) or the like occurs.
The overlapping width of the pixel and the black matrix is 1 μm or more, and more preferably 3 μm or more. If the overlap width is less than 1 μm, white spots occur and it becomes difficult to form a color filter pattern.
Here, in the present invention, the “overlap width between the pixel and the black matrix” means the length on the short side when the overlap portion between the pixel and the black matrix is regarded as a substantially rectangular shape, and the width of the black matrix When there are two or more types, it means an overlap with the narrowest width. The width of the black matrix also means the length on the short side when the black matrix is regarded as a rectangular shape.

  The width of the black matrix formed by the method for producing a color filter of the present invention is preferably 8 μm or more and 50 μm or less, and more preferably 8 μm or more and 40 μm or less. If the width of the black matrix is less than 8 μm, it may be difficult to form the black matrix, and if it exceeds 50 μm, the transmittance of the color filter may decrease.

[Black matrix formation process]
The black matrix forming step includes a photosensitive layer forming step, an exposure step, and a developing step, and further includes other steps appropriately selected as necessary.

<Photosensitive layer forming step>
The photosensitive layer forming step forms a photosensitive layer on the surface of the substrate using a photosensitive composition containing a binder, a polymerizable compound, a photopolymerization initiator, and a colorant and colored in black. It is a process.

  The method for forming the photosensitive layer is not particularly limited and may be appropriately selected depending on the intended purpose. For example, the photosensitive layer may be formed by coating, or the sheet-like photosensitive layer may be pressurized or heated. The method of forming by laminating, combined use thereof, and the like are mentioned, and the photosensitive layer forming method of the first aspect and the photosensitive layer forming method of the second aspect shown below are preferable.

  As the photosensitive layer forming method of the first aspect, at least a photosensitive layer is formed on the surface of the base material by applying the photosensitive composition to the surface of the base material and drying, and further appropriately selected. The method of forming the other layer is mentioned.

  As a photosensitive layer forming method of the second aspect, a photosensitive transfer material having a photosensitive transfer layer (hereinafter sometimes simply referred to as “photosensitive layer”) made of a photosensitive composition on the support is used. The photosensitive transfer layer (photosensitive layer) is laminated on the surface of the substrate under at least one of heating and pressurization so that the photosensitive transfer layer (photosensitive layer) and the substrate are in contact with each other. The method of forming at least the photosensitive layer on the surface of the substrate and further forming other layers appropriately selected can be mentioned.

  In the photosensitive layer forming method of the first aspect, the method for applying and drying the photosensitive composition is not particularly limited and can be appropriately selected according to the purpose. For example, on the surface of the substrate, Examples include a method in which the photosensitive composition is dissolved, emulsified or dispersed in water or a solvent to prepare a photosensitive composition solution, and the solution is directly applied and dried for lamination.

  There is no restriction | limiting in particular as a solvent of the said photosensitive composition solution, According to the objective, it can select suitably, For example, methanol, ethanol, n-propanol, isopropanol, n-butanol, sec-butanol, n-hexanol Alcohols such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diisobutyl ketone, etc .; ethyl acetate, butyl acetate, n-amyl acetate, methyl sulfate, ethyl propionate, dimethyl phthalate, ethyl benzoate, and Esters such as methoxypropyl acetate; aromatic hydrocarbons such as toluene, xylene, benzene, ethylbenzene; carbon tetrachloride, trichloroethylene, chloroform, 1,1,1-trichloroethane, methylene chloride, monochlorobenzene Halogenated hydrocarbons of: ethers such as tetrahydrofuran, diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 1-methoxy-2-propanol; dimethylformamide, dimethylacetamide, dimethylsulfoxide, sulfolane, etc. . These may be used alone or in combination of two or more. Among these, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexane, ethyl carbitol acetate, butyl Preferred examples include carbitol acetate and propylene glycol methyl ether acetate. These solvents can be used alone or in combination of two or more.

  The amount of the solvent added during the preparation of the photosensitive composition is not particularly limited and can be appropriately selected according to the purpose. The total solid content concentration of the photosensitive composition is 5 to 80% by mass. It is preferable to add so that it may become, it is more preferable to add so that it may become 10-60 mass%, and it is especially preferable to add so that it may become 15-50 mass%.

The coating method is not particularly limited and can be appropriately selected depending on the purpose. For example, using a spin coater, a slit spin coater, a roll coater, a die coater, a curtain coater, etc. The method of apply | coating is mentioned. In this invention, it is preferable to carry out by the coating device (slit coater) using the slit-shaped nozzle which has a slit-shaped hole in the part which discharges a liquid. Specifically, JP-A-2004-89851, JP-A-2004-17043, JP-A-2003-170098, JP-A-2003-164787, JP-A-2003-10767, JP-A-2002-79163. Slit nozzles and slit coaters described in Japanese Patent Application Laid-Open No. 2001-310147 and the like are preferably used.
The drying conditions vary depending on each component, the type of solvent, the use ratio, and the like, but are usually about 60 to 110 ° C. for about 30 seconds to 15 minutes.

  There is no restriction | limiting in particular in the thickness of the said photosensitive layer, According to the objective, it can select suitably, 0.3-10 micrometers is preferable, 0.75-6 micrometers is more preferable, and 1-3 micrometers is especially preferable. If the thickness is less than 0.3 μm, pinholes are likely to occur when the coating solution for the photosensitive layer is applied, and the production suitability may be reduced. If the thickness exceeds 10 μm, unexposed portions are removed during development. May take a long time.

Other layers formed in the photosensitive layer forming method of the first aspect are not particularly limited and may be appropriately selected depending on the purpose. For example, an oxygen blocking layer, a release layer, an adhesive layer, a light absorbing layer And a surface protective layer.
There is no restriction | limiting in particular as a formation method of the said other layer, According to the objective, it can select suitably, For example, the method of apply | coating on the said photosensitive layer, The method of laminating | stacking the other layer formed in the sheet form Etc.

In the method for forming a photosensitive layer according to the second aspect, as a method for forming a photosensitive layer on the surface of the base material and other layers appropriately selected as necessary, a support and The photosensitive transfer material (photosensitive film) having a photosensitive layer obtained by laminating a photosensitive composition on a support and other layers appropriately selected as necessary, is heated and pressurized at least either Specifically, using the photosensitive transfer material having a photosensitive layer obtained by laminating the photosensitive composition on the support, the photosensitive layer is a base material. Preferred examples include a method of laminating so as to be on the surface side, and then peeling the support from the photosensitive layer.
By peeling the support, it is possible to prevent a blurred image from being generated on the image formed on the photosensitive layer due to light scattering or refraction by the support, and to obtain a predetermined pattern with high resolution. .
In addition, when the said photosensitive transfer material has a protective film mentioned later, this protective film is peeled and it laminates | stacks so that the said photosensitive layer may overlap with the said base material.

There is no restriction | limiting in particular in the said heating temperature, Although it can select suitably according to the objective, For example, 70-130 degreeC is preferable and 80-110 degreeC is more preferable.
There is no restriction | limiting in particular in the pressure of the said pressurization, Although it can select suitably according to the objective, For example, 0.01-1.0 MPa is preferable and 0.05-1.0 MPa is more preferable.

  There is no restriction | limiting in particular as an apparatus which performs at least any one of the said heating and pressurization, According to the objective, it can select suitably, For example, a heat press, a heat roll laminator (for example, Hitachi Industries, Ltd.) , Lamic II type), vacuum laminator (for example, MVLP500 manufactured by Meiki Seisakusho) and the like are preferable.

-Support-
The support is not particularly restricted and may be appropriately selected according to purpose. Is more preferable.

  There is no restriction | limiting in particular in the thickness of the said support body, According to the objective, it can select suitably, For example, 4-300 micrometers is preferable, 5-175 micrometers is more preferable, and 10-100 micrometers is especially preferable.

  There is no restriction | limiting in particular in the shape of the said support body, Although it can select suitably according to the objective, A long shape is preferable. There is no restriction | limiting in particular in the length of the said elongate support body, For example, the thing of 10-20,000m length is mentioned.

The support is preferably made of a synthetic resin and transparent, for example, polyethylene terephthalate, polyethylene naphthalate, polypropylene, polyethylene, cellulose triacetate, cellulose diacetate, poly (meth) acrylic acid alkyl ester, poly (Meth) acrylic acid ester copolymer, polyvinyl chloride, polyvinyl alcohol, polycarbonate, polystyrene, cellophane, polyvinylidene chloride copolymer, polyamide, polyimide, vinyl chloride / vinyl acetate copolymer, polytetrafluoroethylene, polytri Various plastic films such as fluoroethylene, cellulose-based film, nylon film and the like can be mentioned, and among these, polyethylene terephthalate is particularly preferable. These may be used alone or in combination of two or more.
As the support, for example, the support described in JP-A-4-208940, JP-A-5-80503, JP-A-5-173320, JP-A-5-72724, or the like is used. You can also.

  Formation of the photosensitive layer in the photosensitive transfer material can be performed by the same method as the application and drying of the photosensitive composition solution to the substrate (the photosensitive layer forming method of the first aspect).

-Protective film-
The protective film is a film having a function of preventing and protecting the photosensitive layer from being stained and damaged.
There is no restriction | limiting in particular in the thickness of the said protective film, According to the objective, it can select suitably, For example, 5-100 micrometers is preferable, 8-50 micrometers is more preferable, 10-40 micrometers is especially preferable.

  The portion of the protective film provided in the photosensitive transfer material is not particularly limited and can be appropriately selected depending on the purpose, but is usually provided on the photosensitive layer.

  When the protective film is used, the relationship between the adhesive force A of the photosensitive layer and the support and the adhesive force B of the photosensitive layer and the protective film is preferably adhesive force A> adhesive force B.

The static friction coefficient between the support and the protective film is preferably 0.3 to 1.4, and more preferably 0.5 to 1.2.
When the coefficient of static friction is less than 0.3, slipping is excessive, and thus when the roll is formed, winding deviation may occur. Sometimes.

The protective film is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include those used for the support, silicone paper, polyethylene, polypropylene laminated paper, polyolefin or polytetrafluoro. An ethylene sheet etc. are mentioned, Among these, a polyethylene film, a polypropylene film, etc. are mentioned as a particularly preferable thing.
Examples of the combination of the support and the protective film (support / protective film) include a combination described in paragraph No. 0151 of JP-A-2005-70767, a combination of polyethylene terephthalate / polyethylene terephthalate, and the like.

  As the protective film, in order to satisfy the above-described relationship of adhesive strength, it is preferable to perform surface treatment to adjust the adhesion between the protective film and the photosensitive layer. For example, as a method of the surface treatment, Examples include the method described in paragraph No. 0151 of JP-A-2005-70767.

-Other layers-
There is no restriction | limiting in particular as said other layer, According to the objective, it can select suitably, For example, a thermoplastic resin layer, an intermediate | middle layer, etc. are mentioned.

--- Thermoplastic resin layer--
The thermoplastic resin layer (hereinafter sometimes referred to as a “cushion layer”) enables alkali development, and prevents the transfer target from being contaminated by the thermoplastic resin layer protruding during transfer. In view of the above, it is preferably alkali-soluble, and when transferring the photosensitive transfer material onto the transfer object, a cushion that effectively prevents transfer defects caused by unevenness present on the transfer object It preferably has a function as a material, and is more deformable according to the unevenness present on the transferred body when the photosensitive transfer material is heated and adhered onto the transferred body. preferable.

As a material used for the thermoplastic resin layer, for example, an organic polymer substance described in JP-A-5-72724 is preferable, and the Viker Vicat method (specifically, American Materials Testing Method ASTM D1235) is used. It is particularly preferred that the softening point by the method of measuring the softening point of polymer is selected from organic polymer substances having a temperature of about 80 ° C. or lower. Specifically, polyolefins such as polyethylene and polypropylene, ethylene copolymers such as ethylene and vinyl acetate or saponified products thereof, ethylene and acrylate esters or saponified products thereof, polyvinyl chloride, vinyl chloride and vinyl acetate or saponified products thereof. Vinyl chloride copolymer such as fluoride, polyvinylidene chloride, vinylidene chloride copolymer, polystyrene, styrene copolymer such as styrene and (meth) acrylic acid ester or saponified product thereof, polyvinyl toluene, vinyl toluene and (meta ) Vinyl toluene copolymer such as acrylic ester or saponified product thereof, poly (meth) acrylic ester, (meth) acrylic ester copolymer such as butyl (meth) acrylate and vinyl acetate, vinyl acetate copolymer Combined nylon, copolymer nylon, N-alkoxymethylated sodium Ron, and organic polymers of the polyamide resins, such as N- dimethylamino nylon and the like.
The dry thickness of the thermoplastic resin layer is preferably 2 to 30 μm, more preferably 5 to 20 μm, and particularly preferably 7 to 16 μm.

--- Intermediate layer--
The intermediate layer is provided on the photosensitive layer, and is provided between the photosensitive layer and the thermoplastic resin layer when the photosensitive transfer material has the thermoplastic resin layer. In the formation of the photosensitive layer and the thermoplastic resin layer, an organic solvent is used. Therefore, when the intermediate layer is located between them, the layers can be prevented from being mixed with each other.

The intermediate layer is preferably one that is dispersed or dissolved in water or an aqueous alkali solution.
As the material for the intermediate layer, known materials can be used. For example, polyvinyl ether / maleic anhydride polymer, carboxyalkyl described in JP-A No. 46-2121 and JP-B No. 56-40824 Water-soluble salt of cellulose, water-soluble cellulose ether, water-soluble salt of carboxyalkyl starch, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, water-soluble polyamide, water-soluble salt of polyacrylic acid, gelatin, ethylene oxide polymer, various Water soluble salts of the group consisting of starch and the like, styrene / maleic acid copolymers, maleate resins, and the like.
These may be used alone or in combination of two or more. Among these, it is preferable to use a hydrophilic polymer, and among these hydrophilic polymers, it is preferable to use at least polyvinyl alcohol, and a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable.

There is no restriction | limiting in particular as said polyvinyl alcohol, Although it can select suitably according to the objective, The saponification rate is 80% or more.
When using the said polyvinyl pyrrolidone, 1-75 mass% is preferable with respect to solid content of this intermediate | middle layer, 1-60 mass% is more preferable, 10-50 mass% is especially preferable.
When the content is less than 1% by mass, sufficient adhesion to the photosensitive layer may not be obtained. On the other hand, when the content exceeds 75% by mass, the oxygen blocking ability may be decreased. Absent.

  The intermediate layer preferably has a low oxygen permeability. When the oxygen permeability of the intermediate layer is large and the oxygen blocking ability is low, it may be necessary to increase the amount of light at the time of exposure to the photosensitive layer, or it may be necessary to lengthen the exposure time, and the resolution also decreases. May end up.

There is no restriction | limiting in particular in the thickness of the said intermediate | middle layer, According to the objective, it can select suitably, It is preferable that it is about 0.1-5 micrometers, and 0.5-2 micrometers is more preferable.
If the thickness is less than 0.1 μm, the oxygen permeability may be too high. If the thickness exceeds 5 μm, it takes a long time for development or removal of the intermediate layer, which is not preferable.

  The structure of the photosensitive transfer material is not particularly limited and can be appropriately selected depending on the purpose. For example, a thermoplastic resin layer, an intermediate layer, and a photosensitive layer are formed on the support. The form etc. which have in order are mentioned. The photosensitive layer may be a single layer or a plurality of layers.

  The photosensitive transfer material is preferably stored, for example, wound around a cylindrical core, wound in a long roll shape. There is no restriction | limiting in particular in the length of the said elongate photosensitive transfer material, For example, it can select suitably from the range of 10-20,000m. Further, slitting may be performed so that the user can easily use, and a long body in the range of 100 to 1,000 m may be formed into a roll. In this case, it is preferable that the support is wound up so as to be the outermost side. Moreover, you may slit in the said roll-shaped photosensitive transfer material sheet form. When storing, from the viewpoint of protecting the end face and preventing edge fusion, it is preferable to install a separator (particularly moisture-proof and containing a desiccant) on the end face, and use a low moisture-permeable material for packaging. Is preferred.

  The photosensitive transfer material can be widely used for pattern formation of display members such as color filters, pillars, ribs, spacers, partition walls, etc. Among them, suitable for the method for producing a color filter of the present invention. Can be used.

  In addition, there is no restriction | limiting in particular as an exposure method to the laminated body which has the photosensitive layer formed by the photosensitive layer forming method of the said 2nd aspect, According to the objective, it can select suitably, For example, the said photosensitive layer In the case where a film-like photosensitive transfer material is laminated on a support via a cushion layer, the support and, if necessary, the cushion layer are also peeled off, and then the intermediate layer (oxygen barrier layer) is interposed. It is preferable to expose the photosensitive layer.

<< Binder >>
There is no restriction | limiting in particular as said binder, Although it can select suitably according to the objective, For example, it is preferable that it is alkali-soluble.

The alkali-soluble binder is preferably a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain.
Specifically, for example, JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957, JP-A-59-53836 and A methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, a partially esterified maleic acid copolymer described in JP-A-59-71048 Examples include coalescence. Moreover, the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned, In addition to this, what added the cyclic acid anhydride to the polymer which has a hydroxyl group can also be used preferably.
Further, as particularly preferred examples, copolymers of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, benzyl (meth) acrylate, (meth) acrylic acid and other monomers And a multi-component copolymer.

  These binder polymers having a polar group may be used alone or in the form of a composition used in combination with a normal film-forming polymer, based on the total solid content of the colored photosensitive resin composition. The content is generally 20 to 50% by mass, and preferably 25 to 45% by mass.

<< polymerizable compound >>
The polymerizable compound is not particularly limited and may be appropriately selected depending on the intended purpose. A compound is preferable, for example, at least 1 sort (s) selected from the monomer which has a (meth) acryl group is mentioned suitably.

  There is no restriction | limiting in particular as a monomer which has the said (meth) acryl group, According to the objective, it can select suitably, For example, polyethyleneglycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) ) Monofunctional acrylates and monofunctional methacrylates such as acrylates; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentylglycol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (Meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin Poly (functional) alcohols such as tri (meth) acrylate, trimethylolpropane, glycerin, bisphenol, etc., which are subjected to addition reaction with ethylene oxide and propylene oxide, and converted to (meth) acrylate, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50- Urethane acrylates described in JP-A-6034, JP-A-51-37193, etc .; JP-A-48-64183, JP-B-49-43191, JP-B-52-30 Polyester acrylates described in each publication of such 90 No.; and epoxy resin and (meth) polyfunctional acrylates or methacrylates such as epoxy acrylates which are reaction products of acrylic acid. Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are particularly preferable. These may be used individually by 1 type and may use 2 or more types together.

10-60 mass% is preferable, as for solid content in the said photosensitive composition solid content of the said polymeric compound, 15-50 mass% is more preferable, and 20-40 mass% is especially preferable. If the solid content is less than 10% by mass, problems such as deterioration in developability and reduction in exposure sensitivity may occur, and if it exceeds 60% by mass, the adhesiveness of the photosensitive layer may become too strong. Yes, not preferred.
The ratio between the polymerizable compound and the binder is a mass ratio, preferably polymerizable compound / binder = 0.5 to 1.5, more preferably 0.6 to 1.2, and 0.65 to 1.1. Particularly preferred. If this range is exceeded, problems such as the generation of residues may occur during development, and if it is less than this range, the durability of the completed color filter may be reduced.

<< photopolymerization initiator >>
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound, and can be appropriately selected from known photopolymerization initiators. For example, it is visible from the ultraviolet region. It is preferable to have photosensitivity to the light of the photocatalyst, and may be an activator that generates an active radical by generating some action with a photoexcited sensitizer, and initiates cationic polymerization depending on the type of monomer. Initiator may be used.
The photopolymerization initiator preferably contains at least one component having a molecular extinction coefficient of at least about 50 within a wavelength range of about 300 to 800 nm. The wavelength is more preferably in the range of 330 to 500 nm.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton), phosphine oxide, hexaarylbiimidazole, oxime derivatives, organic peroxides, Examples include thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, and the like.
Specific examples include compounds described in paragraphs [0290] to [0299] and [0305] to [0308] of JP-A-2005-258431.

  Examples of the oxime derivative suitably used in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, and 2-acetoxy. Iminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2- ON, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one.

The content of the photopolymerization initiator is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, and 1 to 20% by mass with respect to the total solid components in the photosensitive composition. Particularly preferred.
When the content of the photopolymerization initiator is expressed by a mass ratio with the polymerizable compound, the photopolymerization initiator / polymerizable compound is preferably 0.01 to 0.2, more preferably 0.02 to 0.1. Preferably, 0.03 to 0.08 is particularly preferable. If it exceeds this range, there is a problem that a development residue or a precipitation failure occurs. If it is less than this range, sufficient sensitivity may not be obtained.

In addition to the photopolymerization initiator, a sensitizer can be added for the purpose of adjusting exposure sensitivity and photosensitive wavelength in exposure to the photosensitive layer described later.
The sensitizer can be appropriately selected using visible light, ultraviolet light, visible light laser, or the like as a light irradiation means described later.
The sensitizer is excited by active energy rays and interacts with other substances (for example, radical generator, acid generator, etc.) (for example, energy transfer, electron transfer, etc.), thereby generating radicals, acids, etc. It is possible to generate a useful group of

  The sensitizer is not particularly limited and may be appropriately selected from known sensitizers according to the purpose. For example, JP-A-2005-258431 discloses [0313] to [0314]. And the compounds described.

  The content of the sensitizer is preferably 0.05 to 30% by mass, more preferably 0.1 to 20% by mass, and 0.2 to 10% by mass with respect to all the components in the photosensitive composition. Particularly preferred. When the content is less than 0.05% by mass, the sensitivity to active energy rays is reduced, the exposure process takes time, and productivity may be reduced. The sensitizer may be precipitated from the photosensitive layer.

The said photoinitiator may be used individually by 1 type, and may use 2 or more types together.
Particularly preferable examples of the photopolymerization initiator include halogenated carbonization having the phosphine oxides, the α-aminoalkyl ketones, and the triazine skeleton, which can cope with laser light having a wavelength of 405 nm in the later-described exposure. Examples include a composite photoinitiator in which a hydrogen compound and an amine compound as a sensitizer are combined, a hexaarylbiimidazole compound, or titanocene.

<< Colorant >>
There is no restriction | limiting in particular as said coloring agent, According to the objective, it can select suitably, For example, an organic pigment, an inorganic pigment, dye, etc. are mentioned.
Any one selected from dendritic branched molecules in which metal ions are coordinated as coloring agents, and dendritic branched molecules containing at least one metal particle of metal particles and alloy particles, separately or in combination with these colorants It is also possible to contain other dendritic molecules.

  Examples of the colorant include black pigments and brown pigments. When a black matrix is formed, a black (K) colored composition is used as the photosensitive composition. A pigment is preferably used. In addition, the said coloring agent may be used individually by 1 type, and may be used in combination of 2 or more type.

  Examples of the pigment include coloring materials described in paragraphs [0038] to [0040] of JP-A-2005-17716, pigments described in paragraphs [0068] to [0072] of JP-A-2005-361447, Among the colorants described in paragraph numbers [0080] to [0088] of JP-A-2005-17521, black ones are preferable.

  The content of the colorant is preferably 1.0 to 80.0% by mass, more preferably 10.0 to 60.0% by mass, and more preferably 10.0 to 0.0% by mass with respect to the total solid components in the photosensitive composition. 50.0% by mass is particularly preferable.

  When the colorant as described above is used, the particle size of the pigment is preferably 1 to 200 nm, more preferably 10 to 80 nm, particularly preferably 20 to 70 nm, and 30 to 30 nm. Most preferably, it is 60 nm. Since the photosensitive layer is a thin layer, when the particle size of the pigment or the like is not in the above range, it cannot be uniformly dispersed in the resin layer, and it is difficult to produce a high-quality color filter. Therefore, it is not preferable.

<< Other ingredients >>
In the said photosensitive composition, you may contain components, such as a plasticizer, surfactant, a ultraviolet absorber, a thermal polymerization inhibitor, as another component, for example.

The plasticizer may be added to control film physical properties (flexibility) of the photosensitive layer.
Examples of the plasticizer include dimethyl phthalate, dibutyl phthalate, diisobutyl phthalate, diheptyl phthalate, dioctyl phthalate, dicyclohexyl phthalate, ditridecyl phthalate, butyl benzyl phthalate, diisodecyl phthalate, diphenyl phthalate, diallyl phthalate, octyl capryl phthalate, and the like. Phthalic acid esters: Triethylene glycol diacetate, tetraethylene glycol diacetate, dimethylglycol phthalate, ethyl phthalyl ethyl glycolate, methyl phthalyl ethyl glycolate, butyl phthalyl butyl glycolate, triethylene glycol dicabrylate, etc. Glycol esters of tricresyl phosphate, triphenyl phosphate, etc. Acid esters; Amides such as 4-toluenesulfonamide, benzenesulfonamide, Nn-butylbenzenesulfonamide, Nn-butylacetamide; diisobutyl adipate, dioctyl adipate, dimethyl sebacate, dibutyl sepacate, dioctyl Aliphatic dibasic acid esters such as sepacate, dioctyl azelate, dibutyl malate; triethyl citrate, tributyl citrate, glycerin triacetyl ester, butyl laurate, 4,5-diepoxycyclohexane-1,2-dicarboxylic acid Examples include glycols such as dioctyl acid, polyethylene glycol, and polypropylene glycol.

  The content of the plasticizer is preferably from 0.1 to 50 mass%, more preferably from 0.5 to 40 mass%, particularly preferably from 1 to 30 mass%, based on all components of the photosensitive layer.

The surfactant is not particularly limited and may be appropriately selected depending on the intended purpose. For example, the surfactant is appropriately selected from an anionic surfactant, a cationic surfactant, a nonionic surfactant, an amphoteric surfactant, and the like. You can choose.
Further, as the surfactant, the following formula (1)
^{_{C 8 F 17 SO 2 N (}} R 1) CH 2 CH 2 O (CH 2 CH 2 O n R 2) ··· (1)
Fluorosurfactants represented by the formula are preferred.
However, in the formula, ^{R 1} and ^{R 2} each represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, n is an integer of 2 to 30.
Examples of R ¹ include a methyl group, an ethyl group, and an isopropyl group, and examples of R ² include a hydrogen atom.
As said n, 10-25 are preferable and 10-20 are more preferable.
As specific examples of the surfactant represented by the above formula, Megafac F-141 (n = 5), F-142 (n = 10), F = 143 (n = 15), F-144 (n = 20) (Brand name: Dainippon Ink & Chemicals, Inc.).

Furthermore, as said surfactant, surfactant represented by following Formula (2)-(5) is mentioned suitably.
_{Rf1-X- (CH 2 CH 2} O) n R 1 ··· (2)
Rf1-X- (CH ₂ CH ₂ O) _n R ² (3)
_{Rf1-X- (CH 2 CH 2} O) n (CH 2 CH 2 CH 2 O) m R 1 ··· (4)
_{Rf1-X- (CH 2 CH 2} O) n (CH 2 CH 2 CH 2 O) m Rf2 ··· (5)

In the formula (2) ~ (5), R 1 and ^{R 2} are Tansomoto 18, preferably 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms.
Examples of the alkyl group include a saturated alkyl group and an unsaturated alkyl group.
Examples of the structure of the alkyl group include those having a linear structure and a branched structure, and among these, those having a branched structure are preferred.
Specific examples of the alkyl group include methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, octyl group, nonyl group, decyl group, dodecyl group, tridecyl group, tetradecyl group, hexadecyl group, otatadecyl group Eicosanyl group, docosanyl group, 2-chloroethyl group, 2-promoethyl group, 2-cyanoethyl group, 2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-promopropyl group and the like. In addition, these alkyl groups may be substituted with a halogen atom, an acyl group, an amino group, a cyano group, an alkyl group, an alkoxy group, an aryl group which may be substituted with alkyl or haloalkyl, an amide group, or the like.
In the formulas (2) to (5), Rf1 and Rf2 each independently represent a perfluoro group having 1 to 18 carbon atoms, preferably 2 to 12 carbon atoms, more preferably 4 to 10 carbon atoms.
Examples of the perfluoro group include a saturated perfluoro group and an unsaturated perfluoro group.
Examples of the structure of the perfluoro group include those having a linear structure and a branched structure. Among these, those having a branched structure are preferred, and at least one of Rf1 and Rf2 has a branched structure. A thing is mentioned more suitably.
Examples of the perfluoro group include perfluorononenyl, perfluoromethyl, perfluoropropylene, perfluorononinel, perfluorobenzoic acid, perfluoropropylene, perfluoropropyl, perfluoro (9-methyloctyl), perfluoro Fluoromethyloctyl, perfluorobutyl, perfluoro-3-methylbutyl, perfluorohexyl, perfluorooctyl, perfluoro 7-octylethyl, fluoroheptyl, perfluorodecyl, perfluorobutyl and the like can be mentioned. These perfluoro groups may be substituted with a halogen atom, acyl group, amino group, cyano group, alkyl group, alkoxy group, alkyl or haloalkyl, or may be substituted with an aryl group, an amide group, or the like. Good.
Rf1 and Rf2 may be the same as or different from each other.
In said Formula (2)-(5), n represents the integer of 1-40, Preferably the integer of 4-25 is represented.
In said Formula (2)-(5), m represents the integer of 0-40, Preferably the integer of 0-25 is represented.
In the formula (2) ~ (5), -X- _{is, - (CH 2) l -} (l 1 to 10, preferably represents an integer of 1 to 5), - CO-O -, - O -, -NHCO-, or -NHCOO- is represented.
The surfactants represented by the formulas (2) to (5) can be used alone or in combination of two or more.

As for content of the said surfactant, 0.001-10 mass% is preferable with respect to solid content of the photosensitive composition.
When the content is less than 0.001% by mass, the effect of improving the surface shape may not be obtained, and when it exceeds 10% by mass, the adhesion may be deteriorated.

  When the photosensitive composition contains the surfactant, the fluidity as a coating liquid is improved, and the adhesion of the liquid in the nozzles and pipes and containers of spin coaters and slit coaters used in the coating process. Since the residue remaining as dirt in the nozzle can be effectively reduced, the amount of cleaning liquid and the work time required for cleaning when changing the coating liquid can be reduced, and the productivity of the color filter can be improved. Can do. In addition, it is possible to improve surface unevenness that occurs when the color resist layer is formed.

The thermal polymerization inhibitor is not particularly limited and may be appropriately selected depending on the intended purpose. For example, 4-methoxyphenol, hydroquinone, alkyl or aryl-substituted hydroquinone, t-butylcatechol, pyrogallol, 2-hydroxybenzophenone 4-methoxy-2-hydroxybenzophenone, cuprous chloride, phenothiazine, chloranil, naphthylamine, β-naphthol, 2,6-di-t-butyl-4-cresol, 2,2′-methylenebis (4-methyl- 6-t-butylphenol), pyridine, nitrobenzene, dinitrobenzene, picric acid, 4-toluidine, methylene blue, copper and organic chelating agent reactant, methyl salicylate, phenothiazine, nitroso compound, chelate of nitroso compound and Al, etc. It is done.
The content of the thermal polymerization inhibitor is preferably 0.0001 to 10% by mass, more preferably 0.0005 to 5% by mass, and particularly preferably 0.001 to 1% by mass with respect to all components of the photosensitive composition. preferable.

Examples of the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, nickel chelate-based, hindered amine-based compounds, etc., in addition to the compounds described in JP-A-5-72724.
Specifically, phenyl salicylate, 4-t-butylphenyl salicylate, 2,4-di-t-butylphenyl-3 ′, 5′-di-t-4′-hydroxybenzoate, 4-t-butylphenyl salicylate 2,4-di-hydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2'-hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, ethyl-2-cyano-3,3-di-phenyl acrylate, 2,2'-hydroxy-4- Methoxybenzophenone, nickel dibutyldithiocarbamate, bis (2,2,6,6-tetramethol-4-pyridine) -seba 4-t-butylphenyl salicylate, phenyl salicylate, 4-hydroxy-2,2,6,6-tetramethylpiperidine condensate, succinic acid-bis (2,2,6,6-tetramethyl-4 -Piperenyl) -ester, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole, 7-{[4-chloro-6- (diethylamino) -5 And triazin-2-yl] amino} -3-phenylcoumarin.
In addition, 0.5-15 mass% is preferable, as for content of the ultraviolet absorber with respect to the total solid of a photosensitive composition, 1-12 mass% is more preferable, and 1.2-10 mass% is especially preferable.

<Base material>
The substrate used in the photosensitive layer forming step is not particularly limited and may be appropriately selected from known materials having high surface smoothness to those having an uneven surface according to the purpose. However, a plate-like substrate (substrate) is preferable. Specifically, a glass plate (for example, soda glass plate, glass plate sputtered with silicon oxide, non-alkali glass plate, quartz glass plate, etc.), synthetic resin property Film, paper, and metal plate.

  The base material can be in good contact with the photosensitive composition or the photosensitive transfer material by performing a coupling treatment in advance. As said coupling process, the method as described in Unexamined-Japanese-Patent No. 2000-39033 is mentioned suitably.

  The base material can be used by forming a laminate formed by laminating the photosensitive layer so that the photosensitive layer in the photosensitive layer overlaps the base material. That is, by exposing the photosensitive layer of the laminate to the photosensitive layer, the exposed region can be cured, and a pattern can be formed by a development process described later.

  There is no restriction | limiting in particular in the thickness of the said board | substrate, Although it can select suitably according to the objective, Generally 700-1,200 micrometers is preferable.

<Exposure process>
There is no restriction | limiting in particular as said exposure, According to the objective, it can select suitably, Digital exposure, analog exposure, etc. are mentioned.
The light source for the exposure is not particularly limited as long as it can irradiate light in a wavelength region that can cure the photosensitive layer (for example, 365 nm, 405 nm, etc.), and can be appropriately selected and used. Specific examples include a xenon lamp, a carbon arc lamp, a semiconductor, a solid-state laser, an ultraviolet LD, and an infrared LD described in paragraph [0069] of JP-A-2005-3861. Furthermore, a light source (for example, an LD array, an organic EL array, etc.) in which a plurality of light emitting points are arranged two-dimensionally can also be used. More specifically, a semiconductor laser near 400 nm and a solid laser near 360 nm are preferably mentioned. Moreover, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned.
The exposure amount is usually about 5 to 200 mJ / cm ² , and preferably about 5 to 100 mJ / cm ² .

<Development process>
The developing step includes a step of developing the photosensitive layer by exposing the photosensitive layer by the exposing step and removing an unexposed portion.
There is no restriction | limiting in particular as the removal method of the said unhardened area | region, According to the objective, it can select suitably, For example, the method etc. which remove using a developing solution are mentioned.

  There is no restriction | limiting in particular as said developing solution, For example, well-known developing solutions, such as a thing of Unexamined-Japanese-Patent No. 5-72724, can be used. The developer preferably has a development type developing behavior of the photosensitive resin layer. For example, a developer containing a compound having a pKa of 7 to 13 at a concentration of 0.05 to 5 mol / L is preferable. A small amount of an organic solvent that is miscible with may be added.

Examples of the water-miscible organic solvent include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether. Benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like. The concentration of the organic solvent is preferably 0.1 to 30% by mass.
A known surfactant can be further added to the developer. The concentration of the surfactant is preferably 0.01% by mass to 10% by mass.

As a development method, a known method such as paddle development, shower development, shower & spin development, dip development or the like can be used.
Here, the shower development is a method in which an uncured portion can be removed by spraying a developer onto the exposed photosensitive resin layer by shower. In the shower development, it is preferable to spray an alkaline solution having a low solubility of the photosensitive resin layer by a shower or the like before development to remove the thermoplastic resin layer, the intermediate layer, or the like. Further, after the development, it is preferable to remove the development residue while spraying a cleaning agent or the like with a shower and rubbing with a brush or the like.
The developer temperature is preferably 20 ° C. to 40 ° C. The pH of the developer is preferably 8-13.

A roller conveyor or the like is installed in the developer tank that contains the developer, and the substrate moves horizontally. For this reason, it is preferable that the photosensitive layer is formed on the upper surface of the substrate in order to prevent the roller conveyor from being damaged.
When the substrate size exceeds 1 meter, when the substrate is transported horizontally, the developer stays in the vicinity of the center of the substrate, and a difference in development between the center of the substrate and the peripheral portion becomes a problem. In order to avoid this, the substrate is preferably inclined at an angle. In this case, the inclination angle is preferably 5 to 30 °.
In the development, it is preferable to spray pure water and moisten the photosensitive layer before development because a uniform development result is obtained. Further, after the development, if air is blown lightly on the substrate to remove excess liquid substantially and then washed with shower water, more uniform development can be performed. Furthermore, when the residue is removed by spraying ultrapure water at a pressure of 3 to 10 MPa with an ultrahigh pressure washing nozzle before the shower rinsing, a high-quality image having no residue is obtained. On the other hand, if the substrate is transported to a subsequent process with water droplets attached, it may stain the process or leave stains on the substrate. .

<Other processes>
There is no restriction | limiting in particular as said other process, Although selecting suitably from the process in a well-known color filter manufacturing method is mentioned, For example, a hardening process process, a heat treatment process, etc. are mentioned. These may be used alone or in combination of two or more.

-Curing process-
It is preferable to provide a curing treatment step for performing a curing treatment on the photosensitive layer after the development step. The curing treatment is preferable from the viewpoints of controlling the cross-sectional shape of the image, controlling the hardness of the image, controlling the surface unevenness of the image, and controlling the film thickness reduction of the image. There is no restriction | limiting in particular as said hardening process, Although it can select suitably according to the objective, For example, a whole surface exposure process, a whole surface heat processing, etc. are mentioned suitably.
Examples of the light source used for the entire surface exposure process include an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp and the like described in paragraph No. [0074] of JP-A-2005-3861.
In the entire surface exposure process, it is preferable from the viewpoint of simplification of equipment and power saving that the substrate is directly irradiated with light from a light source such as an ultra-high pressure mercury lamp or a metal halide without using an exposure mask. The entire surface exposure process may be performed from the upper surface or the lower surface of the photosensitive layer, or may be performed simultaneously on both surfaces.
The exposure amount can be appropriately adjusted according to the purpose within the range of the upper surface: 100 to 2,000 mJ / cm ² and the lower surface: 100 to 2,000 mJ / cm ² .

-Heat treatment process-
The heat treatment step is preferable in that the hardness of the image can be secured by reacting the monomer and the crosslinking agent contained in the photosensitive layer.
The temperature of the heat treatment is preferably in the range of 150 to 250 ° C. If the temperature of the heat treatment is less than 150 ° C., the hardness may be insufficient, and if it exceeds 250 ° C., the photosensitive layer may be colored and the color purity may deteriorate.
The heat treatment time is preferably 10 to 150 minutes. If the heat treatment time is less than 10 minutes, the hardness may be insufficient, and if it exceeds 150 minutes, the photosensitive layer may be colored and the color purity may be deteriorated.
The heat treatment may be changed at the time of black matrix formation, pixel formation, and further depending on the color to be formed in the pixel. In addition, after forming all the color pixels, a final heat treatment may be performed to stabilize the hardness. In that case, it is preferable in terms of hardness to perform at a higher temperature (for example, 240 ° C.).

[Pixel formation process]
In the pixel forming step, on the surface of the base material on which the black matrix is formed, at least for each color of R, G, and B, sequentially, a photosensitive layer forming step, an exposure step, a developing step, and further if necessary. Other steps that are appropriately selected are repeated to form pixels.
The pixel forming process is the same as the black matrix process except that the colorant is different and the exposure process is different. Therefore, only the difference between the colorant and the exposure process is different from the black matrix process. Is described below.

<Colorant>
Examples of the colorant include a yellow pigment, an orange pigment, a red pigment, a violet pigment, a blue pigment, and a green pigment, but when forming a pixel in a color filter, the photosensitive composition is at least as Since a plurality of colored compositions respectively colored in the three primary colors (R, G, B) are used, pigments such as a red pigment, a green pigment, a yellow pigment, a blue pigment, and a violet pigment are preferably used. In addition, the said coloring agent may be used individually by 1 type, or can also be used in combination of 2 or more type.

  Examples of the pigment include a coloring material described in paragraph Nos. 0038 to 0040 of JP-A No. 2005-17716, a pigment described in paragraph Nos. 0068 to 0072 of JP-A No. 2005-361447, and JP-A No. 2005-17521. Among the colorants described in paragraph Nos. 0080 to 0088 of the publication, red, green, yellow, blue, and purple are preferable.

  In the color filter of the present invention, the combination of the colorants for effectively realizing good display characteristics (darker color) in both the transmission mode and the reflection mode in a device such as a portable terminal or a portable game machine. (I) In the photosensitive composition of R, the pigment C.I. I. Pigment Red 254, and (ii) the pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 is used in combination, and in the photosensitive composition of (iii) B, pigment C.I. I. Pigment Blue 15: 6 is preferably used.

Here, the C.I. I. The content of Pigment Red 254 is preferably 0.274 to 0.335 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.280 to 0.329 g / m ^2. m ² is more preferable, and 0.290 to 0.320 g / m ² is particularly preferable.
C. in said (ii). I. The content of Pigment Green 36 is preferably 0.355 to 0.437 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and 0.364 to 0.428 g / m ^2. m ² is more preferable, and 0.376 to 0.412 g / m ² is particularly preferable.
C. in said (ii). I. The content of CI Pigment Yellow 139 is preferably 0.052~0.078g / ^{m 2,} more preferably from 0.060~0.070g / ^{m 2,} 0.062~0.068g / ^{m 2} is particularly preferred. In (ii), C.I. I. Pigment green 36 / C.I. I. The pigment yellow 139 ratio is preferably 5.4 to 6.7, more preferably 5.6 to 6.6, and particularly preferably 5.8 to 6.4.
C. in (iii) above. I. The content of Pigment Blue 15: 6 is preferably 0.28 to 0.38 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.29 to 0.36 g. / more preferably ^m is ^2, and particularly preferably 0.30～0.34G / ^{m 2.}

  In addition, the color filter of the present invention realizes high display characteristics (wide color reproduction range and high color temperature) when used in a large-screen liquid crystal display device such as a notebook personal computer display or a television monitor. Examples of the combination of the colorants include (I) the pigment C.I. in the red (R) photosensitive composition. I. Pigment red 254 and C.I. I. Pigment Red 177 is used, and in the photosensitive composition of (II) green (G), pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150 is used in combination, and in the photosensitive composition of (III) blue (B), pigment C.I. I. Pigment blue 15: 6 and C.I. I. Pigment violet 23 is preferably used in combination.

Here, the C.I. I. The content of Pigment Red 254 is preferably 0.6 to 1.1 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and 0.80 to 0.96 g / m ^2. m ² is more preferable, and 0.82 to 0.94 g / m ² is particularly preferable.
C. in (I) above. I. The content of Pigment Red 177 is preferably 0.10 to 0.30 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.20 to 0.24 g / m ^2. m ² is more preferable, and 0.21 to 0.23 g / m ² is particularly preferable.
C. in said (II). I. The content of Pigment Green 36 is preferably 0.80 to 1.45 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.90 to 1.34 g / m ^2. m ² is more preferable, and 0.95 to 1.29 g / m ² is particularly preferable.
C. in said (II). I. The content of pigment yellow 150 is preferably 0.30~0.65g / ^{m 2,} and more preferably 0.38~0.58g / ^{m 2.} In (II), C.I. I. Pigment green 36 / C.I. I. The pigment yellow 150 ratio is preferably 0.40 to 0.50.
C. in said (III). I. The content of Pigment Blue 15: 6 is preferably 0.50 to 0.75 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and is preferably 0.59 to 0.8. It is more preferably 67 g / m ² , and particularly preferably 0.60 to 0.66 g / m ² .
C. in said (III). I. The content of Pigment Violet 23 is preferably 0.03 to 0.10 g / m ² when the photosensitive composition is applied with a dry film thickness of 1 to 3 μm, and preferably 0.06 to 0.08 g / m. ² is more preferable, and 0.066 to 0.074 g / m ² is particularly preferable. In (III), C.I. I. Pigment Blue 15: 6 / C.I. I. It is preferable that the pigment violet 23 ratio is 12-50.

<Exposure process>
In the exposure step, a maskless pattern exposure method (hereinafter sometimes referred to as “digital exposure”) in which a two-dimensional image is formed by performing exposure while performing relative scanning while modulating light based on image data. The description will focus on the exposure process using the above.

  Digital exposure is an exposure method in which a two-dimensional image is formed by using two-dimensional spatial light modulation devices and performing relative scanning while modulating light based on image data.

  More specifically, an object called a “mask” in which an image (exposure pattern; hereinafter also referred to as a pattern) is formed of a material that does not transmit or weakens and transmits exposure light is disposed in the optical path of exposure light. In contrast to a conventional mask exposure method (hereinafter, also referred to as “analog exposure”) in which a photosensitive layer is exposed in a pattern corresponding to the image, the photosensitive layer is formed without using the “mask”. It is an exposure method that exposes in a pattern.

In the digital exposure, an ultra-high pressure mercury lamp or a laser is used as a light source.
The ultra-high pressure mercury lamp is a discharge lamp in which mercury is enclosed in a quartz glass tube or the like, and is a lamp whose mercury vapor pressure is set high to increase luminous efficiency, and the mercury vapor pressure during lighting is about 5 MPa. Some are (W. Ellenbaas: Light Sources, Philips Technical Library 148-150). Of the emission line spectrum, a single exposure wavelength of 405 nm ± 40 nm is used, and h-line (405 nm) can be mainly used.

  Lasers use the phenomenon of stimulated emission that occurs in materials with inversion distributions, oscillators and amplifiers that produce monochromatic light with stronger coherence and directivity by amplification and oscillation of light waves, crystals, glass, liquids as excitation media, There are pigments, gases, and the like. From these media, known lasers such as solid lasers (YAG lasers), liquid lasers, gas lasers (argon lasers, He-Ne lasers, carbon dioxide lasers, excimer lasers), and semiconductor lasers are used in the wavelength region. Can be used.

  The semiconductor laser is a light emitting diode that induces and emits coherent light at a pn junction when electrons and holes flow out to the junction by carrier injection, excitation by an electron beam, ionization by collision, optical excitation, etc. The laser used. The wavelength of the emitted coherent light is determined by the semiconductor compound. The wavelength of the laser is a single exposure wavelength of 405 nm ± 40 nm.

  In the present invention, the single exposure wavelength refers to the dominant wavelength in the case of using a laser, and in the case of using an ultrahigh pressure mercury lamp, the emission wavelength other than 405 nm is cut to a wavelength larger than 365 nm or 405 nm with an ND filter or the like. This means one wavelength only.

As the exposure method, digital exposure using a laser is performed.
The digital exposure means is not particularly limited and may be appropriately selected according to the purpose. For example, a light irradiation means for irradiating light described in JP-A-2005-258431 is formed. Examples include light modulation means for modulating light emitted from the light irradiation means based on pattern information.

  The digital exposure is performed by generating a control signal based on pattern formation information to be formed and using light modulated in accordance with the control signal. Specifically, the light exposure means for the photosensitive layer, and It has n pixel elements arranged in a two-dimensional form (where n is a natural number of 2 or more) that receives and emits light from the light irradiation means, and controls the pixel elements according to pattern information An exposure head provided with possible light modulation means, wherein the exposure head is arranged such that the column direction of the picture element portion forms a predetermined set inclination angle θ with respect to the scanning direction of the exposure head, With respect to the exposure head, the usable pixel part designating means designates the pixel part to be used for N double exposure (where N is a natural number of 2 or more) among the usable picture element parts. The pixel part used by the pixel part control means As only the pixel parts designated by the constant unit is involved in the exposure, and controls the pixel parts, the photosensitive layer to, performed by relatively moving the exposure head in the scanning direction.

In the present invention, “N double exposure” means that the exposed surface is irradiated with a straight line parallel to the scanning direction of the exposure head in almost all of the exposed region on the exposed surface of the photosensitive layer. This means exposure by setting that intersects N light spot rows (pixel rows). Here, the “light spot array (pixel array)” is a direction in which the angle formed with the scanning direction of the exposure head is smaller in the array of light spots (pixels) as pixel units generated by the pixel unit. Refers to a sequence of Note that the arrangement of the picture element portions is not necessarily a rectangular lattice shape, and may be, for example, an arrangement of parallelograms.
Here, “substantially all areas” of the exposure area is described as a straight line parallel to the scanning direction of the exposure head by tilting the pixel part rows at both side edges of each picture element part. Since the number of drawing element rows of the used drawing element parts to be crossed decreases, even if it is used to connect a plurality of exposure heads in such a case, it is parallel to the scanning direction due to errors in the mounting angle and arrangement of the exposure heads. The number of pixel parts in the used pixel part that intersect with a straight line may slightly increase or decrease, and the connection between the pixel parts in each used pixel part is only a fraction of the resolution. However, due to errors such as the mounting angle and the arrangement of the picture element parts, the pitch of the picture element parts along the direction orthogonal to the scanning direction does not exactly match the pitch of the picture element parts of other parts, and is parallel to the scanning direction. The number of used pixel parts that intersect with the straight line may increase or decrease within a range of ± 1. It is an order. In the following description, N multiple exposures where N is a natural number of 2 or more are collectively referred to as “multiple exposure”.
N in the N-fold exposure is not particularly limited as long as it is a natural number of 2 or more, and can be appropriately selected according to the purpose. However, a natural number of 3 to 20 is preferable, and a natural number of 3 to 7 is preferable. More preferred.

  The wavelength of the laser in the present invention is not particularly limited and can be appropriately selected according to the purpose. However, from the purpose of shortening the exposure time of the photosensitive composition, 330 to 650 nm is preferable, and 365 to 445 nm is more preferable. Preferably, 395 to 415 nm is particularly preferable.

The beam diameter of the laser is not particularly limited, but among them, from the viewpoint of the resolution of the dark color separation barrier, the 1 / e ² value of the Gaussian beam is preferably 5 to 30 μm, and more preferably 7 to 20 μm.
The amount of energy of the laser beam is not particularly limited, but in particular, from the viewpoint of exposure time and resolution, 1 to 100 mJ / cm ² is preferable, and 5 to 20 mJ / cm ² is more preferable.

In the present invention, it is preferable to spatially modulate the laser beam according to the image data. For this purpose, it is preferable to use a digital microdevice (DMD) which is a spatial light modulation element described in JP-A-2005-258431.
In addition, the black matrix image information formed in advance is optically captured, and the drawing pattern of the R, G, and B pixels is corrected so as to match the image, and exposure is performed. It is preferable to control.

  Although there is no restriction | limiting in particular as such an exposure apparatus, For example, the laser direct imaging apparatus "INPREX IP-3000 (made by Fuji Photo Film)" can be used.

In the production of the color filter of the present invention, for example, as described in Japanese Patent Application Laid-Open No. 11-248921 and Japanese Patent No. 3255107, a base is formed by overlapping colored photosensitive compositions that form a color filter. It is preferable from the viewpoint of cost reduction that a transparent electrode is formed thereon and further a spacer is formed by overlapping projections for split orientation.
When the colored photosensitive composition is sequentially applied and stacked, the film thickness becomes thin each time the coating is performed due to the leveling of the coating solution. For this reason, it is preferable to overlap the four colors of K (black), R, G, and B, and further overlap the divisional alignment protrusions. On the other hand, when a transfer material having a thermoplastic resin layer is used, it is preferable that three or two colors be overlapped because the thickness is kept constant.
Further, the size of the base is preferably 25 μm or more, and particularly preferably 30 μm or more from the viewpoint of preventing deformation of the photosensitive resin layer when the transfer material is laminated and laminated, and maintaining a constant thickness.

(Color filter)
The color filter of the present invention is manufactured by the method for manufacturing the color filter of the present invention.
The color filter has a pigment C.I. I. Pigment Red 254, green (G) coloring pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139, as well as blue (B) coloring pigment C.I. I. When manufactured using CI Pigment Blue 15: 6, the chromaticities of all the single colors of red (R), green (G) and blue (B) by the D65 light source are, for example, values shown in Table 1 below. It becomes. Within this range, the colors of the reflection mode and the transmission mode are balanced.

Here, the chromaticity is measured with a microspectroscopy hardness meter (Olympus Optical Co., Ltd., OSP100 or 200), calculated as a result of a D65 light source field of view of 2 degrees, and expressed as an xyY value of the xyz color system. Further, the difference from the target chromaticity is represented by the ΔE ^* ab value of the L ^* a ^* b ^* color system.

  The color filter has a pigment C.I. I. Pigment red 254 and C.I. I. Pigment Red 177, pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 150, and blue (B) coloring pigment C.I. I. Pigment blue 15: 6 and C.I. I. When manufactured using Pigment Violet 23, the chromaticities of all the single colors of red (R), green (G), and blue (B) by the F10 light source are, for example, the values shown in Table 2 below. . If it is this range, it is preferable as a color filter for TV with a wide color reproduction range and high color temperature.

Here, the chromaticity is measured with a microspectroscopy hardness meter (manufactured by Olympus Optical Co., Ltd., OSP100 or 200), calculated as a result of the F10 light source field of view of 2 degrees, and expressed as an xyY value of the xyz color system. Further, the difference from the target chromaticity is represented by the ΔE ^* ab value of the L ^* a ^* b ^* color system.

(Liquid crystal display device)
The liquid crystal display device of the present invention comprises a liquid crystal sealed between a pair of substrates arranged opposite to each other, has the color filter of the present invention, and further has other members as necessary. It becomes.
The color filter of the present invention is intended to be formed on the counter substrate of the liquid crystal display device (the substrate on the side where there is no active element such as a TFT). A BOA method for forming the layer or an HA method having a high aperture structure on the TFT substrate can also be used.

An overcoat film or a transparent conductive film can be further formed on the color filter as necessary. Thereafter, liquid crystal is sealed between the color filter and the counter substrate, and a liquid crystal display device is manufactured.
The liquid crystal display method to be applied is not particularly limited and is appropriately selected according to the purpose. For example, ECB (Electrically Controlled Birefringence), TN (Twisted Nematic), OCB (Optically Compensatory Bend), VA (Vertically Aligned), HAN (Hybrid Aligned Nematic), STN (Supper Twisted Nematic), IPS (In-Plane Switching), GH (Guest Host), FLC (ferroelectric liquid crystal), AFLC (antiferroelectric liquid crystal), and PDLC (Polymer dispersed liquid crystal).

  The basic configuration of the liquid crystal display device includes: (1) a driving side substrate in which driving elements such as thin film transistors (hereinafter referred to as “TFTs”) and pixel electrodes (conductive layers) are arrayed, and a color filter. And a color filter side substrate provided with a counter electrode (conductive layer) opposite to each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap, and (2) the color filter is disposed on the drive side substrate. Directly formed color filter integrated drive substrate and counter substrate having a counter electrode (conductive layer) are arranged to face each other with a spacer interposed therebetween, and a liquid crystal material is sealed in the gap portion. It is done.

The liquid crystal display device of the present invention can display a clear color in both the transmissive mode and the reflective mode by using the color filter of the present invention having a good chromaticity in the D65 light source field of view of 2 degrees. It can be suitably used for devices such as a portable terminal and a portable game machine that combine the mode and the reflection mode.
In addition, the liquid crystal display device of the present invention can achieve high color purity and color temperature by using the color filter of the present invention having good chromaticity in the F10 light source field of view of 2 degrees. The liquid crystal display device can be suitably used.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited thereto. Unless otherwise specified, “parts”, “%”, and “molecular weight” represent “parts by mass”, “mass%”, and “mass average molecular weight”, respectively. Moreover, about the used material, unless there is particular notice, it is the same component (the same manufacturer and the same goods).

Example 1
<Formation of color filter pattern>
(1) Formation of Black Matrix An alkali-free glass substrate was cleaned with a UV cleaning device, then brush-cleaned with a cleaning agent, and further ultrasonically cleaned with ultrapure water. The substrate was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state. The substrate is cooled, adjusted to a temperature of 23 ° C., and then coated with a glass substrate coater (manufactured by FAS Asia Co., Ltd., trade name: MH-1600) having a slit-like nozzle. Composition K1 was applied. Subsequently, a part of the solvent was dried by VCD (vacuum drying apparatus, manufactured by Tokyo Ohka Kogyo Co., Ltd.) for 30 seconds to eliminate the fluidity of the coating layer, and then pre-baked for 3 minutes at 120 ° C. A photosensitive layer K1 was formed.

-Preparation of photosensitive composition K1-
The following amounts of K pigment dispersion 1 and propylene glycol monomethyl ether acetate (MMPG-Ac manufactured by Daicel Chemical Industries, Ltd.) were weighed, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 RPM for 10 minutes. Subsequently, methyl ethyl ketone, binder 2, hydroquinone monomethyl ether, DPHA solution, 2,4-bis (trichloromethyl) -6- [4 '-(N, N-bisethoxycarbonylmethylamino)-in the amounts shown in Table 3 below. 3′-Bromophenyl] -s-triazine (manufactured by Wako Pure Chemical Industries, Ltd.) (hereinafter referred to as “BBBT”) and Surfactant 1 are weighed out and this temperature is 25 ° C. (± 2 ° C.) The photosensitive composition K1 was prepared by adding in order and stirring at 150 RPM for 30 minutes at a temperature of 40 ° C. (± 2 ° C.).

Of the compositions listed in Table 3,
The composition of K pigment dispersion 1 is 13.1% by mass of carbon black (manufactured by Degussa Japan, trade name: Nippon 35), 0.65% by mass of a dispersant represented by the following formula (6), and polymer (benzyl methacrylate) / Methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 37,000) 6.72% by mass, and propylene glycol monomethyl ether acetate 79.53% by mass.
The composition of the binder 2 is composed of 27% by mass of a polymer (random copolymer of benzyl methacrylate / methacrylic acid = 78/22 molar ratio, molecular weight 38,000) and 73% by mass of propylene glycol monomethyl ether acetate.
The composition of the DPHA solution is composed of 76% by mass of dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD DPHA), and 24% by mass of propylene glycol monomethyl ether.
The composition of the surfactant 1 is composed of 30% by mass of the following structure 1 and 70% by mass of methyl ethyl ketone (MEK).

However, in the formula of the structure 1, the numerical values of x and y represent a molar ratio.

-Exposure process-
The photosensitive layer K1 on the substrate is subjected to an exposure apparatus using a super high pressure mercury lamp (manufactured by Dainippon Screen Mfg. Co., MAP1200L) in an N ₂ atmosphere, with a line width of 30 μm, a vertical pitch of 300 μm, and a horizontal pitch of 100 μm. Then, exposure was carried out at an energy of 100 mJ / cm ² through a photomask having a lattice pattern.

-Development process-
After the exposure is completed, pure water is sprayed onto the surface of the photosensitive layer K1 using a shower nozzle so that the surface is uniformly moistened. Developed by Fujifilm Electronics Materials Co., Ltd. (100-fold diluted solution) with a flat nozzle pressure of 0.04 MPa for 80 seconds at 23 ° C. and then developed with ultrapure water using an ultra-high pressure washing nozzle. Residue was removed by spraying at a pressure of 0.8 MPa to obtain a black matrix pattern. Thereafter, heat treatment was performed at 220 ° C. for 30 minutes.

(2) Formation of red (R) pixels The following photosensitive composition R1 having the composition described in Table 4 below is used for the substrate on which the black matrix is formed, and heat treatment is performed in the same process as the formation of the black matrix. An R pixel was formed. The R1 photosensitive layer thickness was 1.5 μm, and the coating amount of the pigment (CI Pigment Red 254) was 0.274 g / m ² .

-Preparation of photosensitive composition R1-
R pigment dispersion 1, R pigment dispersion 2, and propylene glycol monomethyl ether acetate in the amounts shown in Table 4 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Subsequently, methyl ethyl ketone, cyclohexanone, binder 1, DPHA solution, B-CIM (manufactured by Hodogaya Chemical Co., Ltd.), NBCA (manufactured by Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine in the amounts shown in Table 4 below. Was added in this order at a temperature of 24 ° C. (± 2 ° C.) and stirred at 150 rpm for 30 minutes. Further, the surfactant 1 in the amount shown in Table 4 below was weighed out, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 rpm for 5 minutes, and filtered through nylon mesh # 200. By the above, photosensitive composition R1 was prepared.

Of the compositions listed in Table 4,
The composition of R pigment dispersion 1 is C.I. I. Pigment Red 254 (manufactured by Ciba Specialty Chemicals) 8% by mass, 0.8% by mass of a dispersant represented by the formula (6), a polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, (Molecular weight 37,000) 8% by mass and propylene glycol monomethyl ether acetate 83% by mass.
The composition of R pigment dispersion 2 is C.I. I. Pigment Red 254 (manufactured by Ciba Specialty Chemicals) 5.3 mass%, acrylic acid mono (dimethylaminopropyl) amide / methacrylic acid (polyethylene glycol monomethyl ether) ester / methacrylic acid (polymethyl methacrylate-containing alcohol) ester 1.6 mass %, And 93% by mass of propylene glycol monomethyl ether acetate.
The composition of the binder 1 is composed of 27% by mass of a polymer (random copolymer of benzyl methacrylate / methacrylic acid / methyl methacrylate = 38/25/37, molecular weight 38,000) and 73% by mass of propylene glycol monomethyl ether acetate. .

-Exposure process and development process-
The photosensitive layer R1 on the substrate is exposed to dots of 20 mJ / m ^{2 with} a laser beam having a wavelength of 405 nm by an exposure apparatus described below, and a part of the photosensitive layer is cured. I let you. The exposure is performed in an N ₂ atmosphere, a 15-step step wedge pattern (Δlog E = 0.15), a dot pattern with a line width of 90 μm × 270 μm, a horizontal pitch of 300 μm, a vertical pitch of 300 μm, and an overlapping width of 5 μm with the black matrix. I did so. Then, it developed and heat-processed by the method similar to the formation method of a black matrix.

<< Exposure equipment >>
The combined laser light source described in JP-A-2005-258431 as the light irradiating means, and 768 sets of micromirror arrays in which 1024 micromirrors are arranged in the main scanning direction as the light modulating means are arranged in the sub-scanning direction. Of these, an exposure apparatus provided with an exposure head having a DMD controlled so as to drive only 1024 × 256 rows and an optical system for imaging light onto the pattern forming material was used.

As the DMD setting inclination angle, an angle slightly larger than the angle θ _ideal that is a double exposure using a usable 1024 column × 256 row micromirror was adopted.
This angle θ _ideal is formed by the number of N double exposures N, the number s of usable micromirrors in the row direction, the interval p of the usable micromirrors in the row direction, and the micromirrors with the exposure head tilted. It calculated | required using following formula 1-Formula 3 with respect to the pitch (delta) of the scanning line to be performed.
spsinθ _ideal ≧ Nδ (Formula 1)
pcosθ _ideal = δ (Formula 2)
stanθ _ideal = N (Formula 3)
Since s = 256 and N = 2, the angle θ _ideal is about 0.45 degrees. Therefore, 0.50 degrees was adopted as the set inclination angle θ.

  First, the state of the exposure pattern on the exposed surface was examined in order to correct the variation in resolution and uneven exposure in double exposure. The results are shown in FIG. However, in FIG. 1, for convenience of explanation, every other column exposure pattern of the micromirror 58 that can be used is divided into an exposure pattern based on the pixel column group A and an exposure pattern based on the pixel column group B. The actual exposure pattern on the exposed surface is a superposition of these two exposure patterns.

As shown in FIG. 1, as a result of the deviation of the relative position between the exposure heads 32 ₁₂ and 32 ₂₁ from the ideal state, both the exposure pattern by the pixel column group A and the exposure pattern by the pixel column group B are both. Thus, it can be seen that, in the exposure areas overlapping on the coordinate axes orthogonal to the scanning direction of the exposure head in the exposure areas 32 ₁₂ and 32 ₂₁ , an overexposed area is generated as compared with the ideal double exposure state.

As the light spot position detecting means, a set of a slit and a light detector is used, and for the exposure head 32 ₁₂ , the positions of the light spots P (1,1) and P (256,1) in the exposure area 32 ₁₂ are determined. for ₂₁ detects the position of the point P of the exposure area _{32 21} (1,1024) and P (256, 1024), and the straight line of the inclination angle connecting them, an angle and the scanning direction forms the exposure head measurement did.

Using the actual inclination angle θ ′, the following equation 4
ttanθ ′ = N (Formula 4)
The natural number T closest to the value t satisfying the relationship is derived for each of the exposure heads 32 ₁₂ and 32 ₂₁ . T = 254 for the exposure head _{32 12,} the exposure head _{32 21} T = 255 was derived respectively. As a result, the micromirrors constituting the portions 78 and 80 covered with diagonal lines in FIG. 2 were identified as micromirrors that are not used during the main exposure.

Thereafter, the micromirrors corresponding to the light spots other than the light spots constituting the regions 78 and 80 covered with the oblique lines in FIG. 2 were similarly covered with the regions 82 and the shaded areas in FIG. Micromirrors corresponding to the light spots constituting the region 84 were identified and added as micromirrors that are not used during the main exposure.
With respect to the micromirrors that are specified not to be used at the time of exposure, a signal for setting the angle of the always-off state is sent by the pixel element control means, and these micromirrors are substantially exposed. It was controlled not to be involved.
The operation when performing exposure using the exposure apparatus is as follows.
After the substrate is sucked and held on the exposure stage, the exposure stage is moved in one direction by the exposure stage driving unit. When the exposure stage passes a predetermined position, the camera reads an alignment mark recorded at a predetermined position on the substrate. Based on the read position data of the alignment mark, position correction data of the substrate is calculated.
After the position correction data is calculated, the exposure stage is moved in the other direction, and exposure of the corrected drawing pattern (image) is started.

(3) Formation of green (G) pixels The following photosensitive composition G1 having the composition shown in Table 5 below is used on the substrate on which the black matrix and red (R) pixels are formed, and is the same as the formation of the black matrix. Through this process, a heat-treated green (G) pixel was formed. The G1 photosensitive layer thickness is 1.4 μm, the coating amount of the pigment (CI Pigment Green 36) is 0.355 g / m ² , and the coating amount of the pigment (CI Pigment Yellow 139) is 0.052 g. / M ² . Exposure, development, and heat treatment were performed in the same manner as the red (R) pixel. The exposure amount was equivalent to 40 mJ / cm ² .

-Preparation of photosensitive composition G1-
G pigment dispersion 1, Y pigment dispersion 1, and propylene glycol monomethyl ether acetate in the amounts shown in Table 5 below were weighed, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Next, the amounts of methyl ethyl ketone, binder 1, DPHA solution, B-CIM (Hodogaya Chemical Co., Ltd.), NBCA (Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine in the amounts shown in Table 5 below are measured. Were added in this order at a temperature of 24 ° C. (± 2 ° C.) and stirred at 150 rpm for 30 minutes. Furthermore, the surfactant 1 in the amount shown in Table 5 below was weighed, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 rpm for 5 minutes, and filtered through nylon mesh # 200. The photosensitive composition G1 was prepared by the above.

In addition, among the compositions described in Table 5,
The composition of G pigment dispersion 1 is C.I. I. Pigment Green 36 (manufactured by Toyo Ink Manufacturing Co., Ltd., dispersion) 18% by mass, polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 38,000) 12% by mass, cyclohexanone 35% %, And 35% by mass of propylene glycol monomethyl ether acetate.
The composition of the Y pigment dispersion 1 is C.I. I. Pigment Yellow 139 (manufactured by Toyo Ink Mfg. Co., Ltd., trade name: Pariolol Yellow L1820) 18% by mass, polymer (random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio, molecular weight 38,000) 15 It consists of 15% by mass of cyclohexanone and 52% by mass of propylene glycol monomethyl ether acetate.

(4) Formation of blue (B) pixel On the substrate on which the black matrix, red (R) pixel, and green (G) pixel are formed, the following photosensitive composition B1 having the composition shown in Table 6 below is used. A heat-treated blue (B) pixel was formed by the same process as the formation of the red (R) pixel, and a target color filter was produced.
The film thickness of the B1 photosensitive layer was 1.4 μm, and the coating amount of pigment (CI Pigment Blue 15: 6) was 0.29 g / m ² . Exposure, development, and heat treatment were performed in the same manner as the K photosensitive layer. The exposure amount was 50 mJ / cm ² .

-Preparation of photosensitive composition B1-
The amounts of B pigment dispersion 1 and propylene glycol monomethyl ether acetate described in Table 6 below were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), and stirred at 150 rpm for 10 minutes. Next, the amounts of methyl ethyl ketone, binder 2, DPHA solution, B-CIM (Hodogaya Chemical Co., Ltd.), NBCA (Kurokin Kasei Co., Ltd.), N-phenyl mercaptobenzimidazole, and phenothiazine in the amounts shown in Table 6 below are measured. And added in this order at a temperature of 25 ° C. (± 2 ° C.) and stirred at a temperature of 40 ° C. (± 2 ° C.) at 150 rpm for 30 minutes. Furthermore, the surfactant 1 in the amount shown in Table 6 below was weighed out, added at a temperature of 24 ° C. (± 2 ° C.), stirred at 30 RPM for 5 minutes, and filtered through nylon mesh # 200. By the above, photosensitive composition B1 was prepared.

Of the compositions listed in Table 6,
The composition of B pigment dispersion 1 is C.I. I. Pigment Blue 15: 6 (manufactured by Toyo Ink Mfg. Co., Ltd.) 10% by mass, Dispersant 1 (EFKA-6745, EFKA ADDITIVES B.V) 0.5% by mass, Dispersant 2 (Disparon DA-725, Enomoto) (Made by Kasei Co., Ltd.) 0.63% by mass, polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 38,000) 12.5% by mass, and propylene glycol monomethyl ether acetate 76 .37% by mass.

(Examples 2 to 4, Reference Example 5 )
A color filter was produced in the same manner as in Example 1 except that the exposure was performed while changing the width of the black matrix and the overlapping width of the pixels and the black matrix as shown in Table 7.

(Comparative Examples 1-3)
In the exposure apparatus of Embodiment 1, the set inclination angle θ is calculated with N = 1 based on the above equation 3, and the natural number T closest to the value t satisfying the relationship of t tan θ ′ = 1 is derived based on the above equation 4. A color filter was prepared in the same manner as in Example 1 except that the exposure was performed by performing multiple exposure (N = 1) and changing the width of the black matrix and the overlapping width of the pixels and the black matrix as shown in Table 7. Manufactured.

  The exposure of the exposed surface in Comparative Examples 1 to 3 was performed in the same manner as in Examples 1 to 3 except that the drawing image correction was not performed.

(Comparative Examples 4-7)
In place of the exposure apparatus described in the first embodiment, exposure is performed using an exposure apparatus using a super high pressure mercury lamp (Dai Nippon Screen Manufacturing Co., Ltd., MAP 1200L), and the width of the black matrix and the overlap width of the pixels and the black matrix A color filter was produced in the same manner as in Example 1 except that the exposure was changed as shown in Table 7.

[Evaluation]
In Examples 1 to 4, Reference Example 5 and Comparative Examples 1 to 7, the presence or absence of white spots and display quality were evaluated as follows. The results are shown in Table 7.

<Evaluation of presence or absence of white spots>
The white matrix at the boundary between the black matrix and each of the red (R) pixel, the green (G) pixel, and the blue (B) pixel is observed with an optical microscope, and 500 locations in the pattern are arbitrarily selected. And whether there is a gap between each pixel. Specifically, among 500 locations, the case where there was no gap was indicated as ◯, and the case where there was also a gap was indicated as x.

<Evaluation of display quality>
Liquid crystal display devices having LED backlights were produced using the color filters of Examples 1 to 4, Reference Example 5 and Comparative Examples 1 to 7, and the display quality was evaluated based on the following four-stage criteria.
-Evaluation criteria-
◎ ・ ・ ・ There is no uneven display color and bright display is possible.
○: Display color unevenness is slightly observed, but bright display is possible.
Δ: Display color unevenness is slightly observed, and brightness is reduced.
X: Display color unevenness is remarkable.

From the results of Table 7, compared with Comparative Examples 1 to 7, the exposure in the pixel formation process is performed by laser, the alignment is corrected, and the overlap width (A) of the formed pixel and the black matrix and the black matrix width In Examples 1 to 4 and Reference Example 5 in which the value of B / A with (B) was 2 or more, it was found that there was no white spot. Moreover, it confirmed that the liquid crystal display device using the color filter of Examples 1-4 and the reference example 5 showed a favorable display characteristic compared with the liquid crystal display device using the color filter of Comparative Examples 1-7. did.

  The color filter manufacturing method of the present invention can perform alignment (alignment) by matching the edge properties by narrowing the overlapping width between the black matrix and the color filter by maskless laser exposure, and transmitting the transmittance. A color filter manufactured by the method of manufacturing the color filter has excellent display characteristics, and is used for a liquid crystal display device (LCD) such as a portable terminal, a portable game machine, a notebook computer, and a TV monitor. Suitable for PALC (Plasma Address Liquid Crystal), plasma display, etc.

FIG. 1 is an explanatory view showing an example of unevenness in a pattern on an exposed surface when there is a relative position shift and a mounting angle error between adjacent exposure heads. FIG. 2 is an explanatory diagram showing exposure using only the used pixel portion selected in the example of FIG.

Claims (7)

A photosensitive layer forming step of forming a photosensitive layer on the surface of a substrate using a photosensitive composition containing a binder, a polymerizable compound, a photopolymerization initiator, and a colorant and colored black; A black matrix forming step of forming a black matrix by an exposure step of exposing a layer and a developing step of developing the photosensitive layer exposed in the exposure step;
At least on the surface of the substrate on which the black matrix is formed using the photosensitive composition colored in three primary colors of red (R), green (G), and blue (B), at least R, For each color of G and B, a photosensitive layer forming process, an exposure process, and a developing process are sequentially repeated to form a pixel forming process,
The exposure step in the pixel forming step includes a light irradiating means and n (where n is a natural number of 2 or more) two-dimensionally arranged pixel parts that receive and emit light from the light irradiating means. An exposure head including a light modulation unit capable of controlling the image element portion according to pattern information, wherein the column direction of the image element portion is a predetermined set inclination angle with respect to a scanning direction of the exposure head. Using an exposure head arranged to form θ,
With respect to the exposure head, the usable pixel part designating means designates the pixel part to be used for N double exposure (where N is a natural number of 2 or more) among the usable graphic elements.
For the exposure head, the pixel part control means controls the pixel part so that only the pixel part specified by the used pixel part specifying means is involved in exposure,
A step of performing exposure by moving the exposure head relative to the photosensitive layer in a scanning direction;
And the relationship between the overlap width (A) of the formed pixel and the black matrix and the width (B) of the black matrix, (B) / (A) is 2.7-6,
The method for producing a color filter, wherein the overlap width (A) is 3 μm or more and 5 μm or less . The method for producing a color filter according to claim 1, wherein the width of the black matrix is 8 μm or more and 30 μm or less.   The method for producing a color filter according to claim 1, wherein the photosensitive layer forming step is a step of forming a photosensitive layer by applying the photosensitive composition to the surface of the substrate and drying.   The photosensitive layer forming step uses a photosensitive transfer material having a photosensitive transfer layer made of a photosensitive composition on a support, and is laminated on the substrate so that the photosensitive transfer layer and the substrate are in contact with each other. The method for producing a color filter according to claim 1, which is a step of forming a photosensitive layer by peeling the support.   At least pigment C.I. I. Pigment Red 254 is colored green (G) with pigment C.I. I. Pigment green 36 and pigment C.I. I. Pigment Yellow 139 and at least a pigment C.I. I. The manufacturing method of the color filter in any one of Claim 1 to 4 which uses pigment blue 15: 6.   A color filter manufactured by the method for manufacturing a color filter according to claim 1.   A liquid crystal display device using the color filter according to claim 6.