JP4887873B2 - Method for producing pattern forming body - Google Patents

Description

  The present invention relates to a method for manufacturing a pattern formed body in which a plurality of functional parts having different heights are used, for example, for forming a color filter.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. However, since this color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for a color filter having a high specific gravity.

  Therefore, for the purpose of improving the production efficiency of color filters and the like, a method has been proposed in which two or more functional parts having different heights are collectively formed using, for example, a halftone mask or the like. Specifically, when forming the colored layer of the color filter for the transflective liquid crystal display device, after forming the colored layer forming layer for forming the colored layer, the colored layer forming layer is formed into a region for transmitting light. In the reflected light area and the transmitted light area, exposure is performed from the colored layer forming layer side using a photomask or the like in which a halftone part is formed in the normal opening and the reflected light area, and development is performed. For example, a method of forming colored layers having different film thicknesses at once is proposed (see, for example, Patent Document 1).

  Further, for example, as a method of forming the colored layer and the columnar spacers at once, for example, a photosensitive resin layer for forming the colored layer and the columnar spacer is formed, and this photosensitive resin layer is formed in the region where the columnar spacer is formed. Then, a method has been devised in which exposure is performed from the photosensitive resin layer side using a photomask or the like in which a halftone portion is formed in a region where a normal opening and a colored layer are formed, and the like.

  However, in any of the above cases, since the amount of energy irradiated to the area exposed using the halftone portion of the photomask is small, the curability of the functional portion formed in this area is low. There was a problem that the functional part made may peel off.

JP 2004-45757 A

  Therefore, it is possible to efficiently and collectively form a plurality of types of functional parts having different heights, and a method for producing a pattern forming body having good adhesion between each formed functional part and the substrate. Offer is desired.

  The present invention provides a transparent substrate, a first functional part formed in a pattern on the transparent substrate, a pattern formed on the transparent substrate, and higher in height than the first functional part. A method for producing a pattern forming body having at least two functional parts, wherein a photosensitive resin layer forming step of forming a photosensitive resin layer by applying a coating solution for forming a photosensitive resin layer on the transparent substrate; A back exposure process for exposing the photosensitive resin layer formed in the region for forming the first functional part and the region for forming the second functional part from the transparent substrate side; and the photosensitive resin layer The pattern forming body manufacturing method is characterized in that the first functional portion and the second functional portion are formed by a functional portion forming step including a developing step of developing the first functional portion.

  In the present invention, since the photosensitive resin layer is exposed from the transparent substrate side by the back surface exposure step, for example, the amount of energy applied to the region where the first functional part is formed in the back surface exposure step is set to the second function. Even when the amount of energy applied to the region where the functional part is formed is small, the curability of the first functional part on the transparent substrate side can be improved. Therefore, according to the present invention, it is possible to manufacture a pattern forming body having good adhesion between the first functional part and the second functional part and the transparent substrate. Further, according to the present invention, it is possible to collectively form the first functional part and the second functional part having different heights by adjusting the amount of energy irradiated in the back exposure process or the like. There is also an advantage that the pattern forming body can be manufactured efficiently.

  In the above invention, the functional part forming step includes a surface exposure step of exposing the photosensitive resin layer from the photosensitive resin layer side before the development step, and the surface exposure step includes at least the second exposure step. It is preferable to carry out with respect to the area | region which forms a functional part. Thereby, the curability of the surface of the second functional part to be formed can be made favorable, and the flatness of the surface of the second functional part can be made high.

  The present invention also provides a transparent substrate, a first functional part formed in a pattern on the transparent substrate, a pattern formed on the transparent substrate, and higher in height than the first functional part. A method for producing a pattern forming body having at least a second functional part, wherein a photosensitive resin layer is formed by applying a photosensitive resin layer forming coating solution on the transparent substrate. And a back exposure process for exposing only the photosensitive resin layer formed in the region for forming the first functional part from the transparent substrate side, and at least a region for forming the second functional part. The functional part forming step including a surface exposure step of exposing the photosensitive resin layer from the photosensitive resin layer side and a developing step of developing the photosensitive resin layer, the first functional portion and the Forming a second functional part; To provide a method of manufacturing that the patterning device.

  According to this invention, since the area | region which forms the said 1st functional part is exposed from the transparent substrate side, the sclerosis | hardenability by the side of the transparent substrate of a 1st functional part can be made favorable, 1st Adhesion between the functional part and the transparent substrate can be improved. Furthermore, since the area | region which forms the said 2nd functional part is exposed from the photosensitive resin layer side, the sclerosis | hardenability of the surface of a 2nd functional part can be made favorable, and a 2nd functional part The flatness of the surface can be made high. Further, according to the present invention, it is possible to collectively form the first functional portion and the second functional portion having different heights by adjusting the amount of energy irradiated in the back surface exposure step and the front surface exposure step. In addition, there is an advantage that the pattern forming body can be manufactured efficiently.

  Furthermore, the present invention is characterized in that the first functional part formed by the above-described method for producing a pattern forming body is a colored layer for reflected light, and the second functional part is a colored layer for transmitted light. A method for producing a color filter for a transflective liquid crystal display device is provided. According to the present invention, a color filter for a transflective liquid crystal display device having a colored layer for reflected light and a colored layer for transmitted light having different heights can be formed efficiently, and the surface of these colored layers is flat. The adhesiveness between the transparent substrate and each colored layer is high.

  ADVANTAGE OF THE INVENTION According to this invention, there exists an effect that the pattern formation body which has 2 or more types of functional parts from which height differs with favorable adhesiveness with a transparent substrate can be manufactured efficiently.

  The present invention relates to a method for manufacturing a pattern forming body formed with a plurality of functional portions having different heights, for example, used for forming a color filter, and a method for manufacturing a color filter for a transflective liquid crystal display device. is there. Each will be described separately below.

A. First, the manufacturing method of the pattern formation body of this invention is demonstrated. According to the manufacturing method of the pattern forming body of the present invention, it is possible to form two or more types of functional parts having different heights at once, and the manufacturing method of the pattern forming body of the present invention includes each function. There are two embodiments depending on the exposure method of the photosensitive resin layer for forming the active part. Hereinafter, each embodiment will be described.

1. First Embodiment First, a first embodiment of the method for producing a pattern forming body of the present invention will be described. A first embodiment of the method for producing a pattern forming body of the present invention includes a transparent substrate, a first functional part formed in a pattern on the transparent substrate, a pattern formed on the transparent substrate, and A method for producing a pattern-formed body having at least a second functional part having a height higher than that of the first functional part, wherein a photosensitive resin layer-forming coating solution is applied onto the transparent substrate to produce a photosensitive property. A photosensitive resin layer forming step for forming a resin layer; and the photosensitive resin layer formed in a region for forming the first functional part and a region for forming the second functional part from the transparent substrate side. A method characterized in that the first functional part and the second functional part are formed by a functional part forming step including a back exposure step for exposing and a developing step for developing the photosensitive resin layer. is there.

  For example, as shown in FIG. 1, the pattern forming body manufacturing method of the present embodiment includes a photosensitive resin layer forming step (FIG. 1A) for forming a photosensitive resin layer 2 on a transparent substrate 1, for example, Using the photomask 14 provided with the light-shielding portion 11, the halftone portion 12, and the opening portion 13 or the like, a region (region indicated by a in the drawing) and a second functional portion. A back exposure process (FIG. 1B) for exposing the photosensitive resin layer 2 formed in the region (region indicated by b in the figure) from the transparent substrate 1 side, and the photosensitive resin layer 2 This is a method including a functional part forming step including a developing step (FIG. 1C) for developing. In the present embodiment, by the functional part formation step, for example, as shown in FIG. 1 (c), the first functional part 3 and the second higher than the first functional part 3. The functional part 4 is formed.

  Here, the manufacturing method of the pattern formed body of the present embodiment includes, for example, making the transmittance of the halftone part of the photomask used in the back exposure process multi-stage, adjusting the amount of energy irradiated in the back exposure process, etc. In addition to the first functional unit and the second functional unit, a method of forming a third functional unit, a fourth functional unit, or the like having different heights may be used. In addition to the first functional portion and the second functional portion, the functional portion whose film thickness continuously changes, for example, by continuously changing the transmittance of the halftone portion of the photomask. Etc. may be used.

  As described above, when a photosensitive resin layer is exposed from the photosensitive resin layer side using a photomask having a halftone portion to form two or more types of functional portions having different heights, the photomask The amount of energy applied to the region corresponding to the halftone part, that is, the region forming the functional part having a low height is compared with the amount of energy applied to the region forming the functional part having a high height. It will be less. For this reason, there is a problem that the photosensitive resin layer has low curability in a region where the functional portion having a low height is formed, and the functional portion may be peeled off.

  On the other hand, in this embodiment, the photosensitive resin layer is exposed from the transparent substrate side. Therefore, for example, even when the photosensitive resin layer is exposed using a photomask having the above-described halftone portion and two or more kinds of functional portions having different heights are collectively formed, the transparent substrate side The photosensitive resin layer can be sufficiently cured, and the adhesion between the first functional part and the second functional part and the transparent substrate can be improved.

  In addition, according to the present embodiment, the first functional part and the second functional part can be formed in a lump by adjusting the amount of energy irradiated in the back surface exposure step, and thus the pattern can be efficiently formed. It also has the advantage that the formed body can be manufactured.

  In general, when the photosensitive resin layer is exposed in the presence of oxygen, the curing reaction of the photosensitive resin layer may be inhibited by oxygen. In this embodiment, the photosensitive resin layer is photosensitive from the transparent substrate side. Since the exposure of the resin layer is performed, the curing reaction of the photosensitive resin layer can be hardly inhibited by oxygen, and the exposure time can be shortened. Therefore, the production efficiency can be improved.

  In addition, the method for producing the pattern forming body of the present embodiment can be used, for example, when forming a color filter for a transflective liquid crystal display device having a colored layer for transmitted light and a colored layer for reflected light having different heights, When forming a color filter having columnar spacers formed by increasing the thickness of the colored layer forming member for forming the colored layer, a monochrome color filter having an overcoat layer and columnar spacers is formed. In particular, it is particularly useful when forming a color filter having a liquid crystal alignment member formed of a plurality of colored layers having different heights. For example, when producing a color filter for a transflective liquid crystal display device having a colored layer for transmitted light and a colored layer for reflected light, for example, as shown in FIG. 2, the first functional part (colored layer for reflected light) 3 is formed in the region for reflected light r, and the second functional part (colored layer for transmitted light) 4 is formed in the region for transmitted light t, so that each colored layer (3 and 4), the transparent substrate 1 and A color filter for a transflective liquid crystal display device having good adhesion can be efficiently produced. For example, when manufacturing a color filter having a colored layer and a columnar spacer, for example, as shown in FIG. 3, the first functional part 3 is a colored layer and the second functional part 4 is a columnar spacer. A color filter having good adhesion between the colored layer 3 and the columnar spacer 4 and the transparent substrate 1 can be produced efficiently. In this case, the columnar spacer 4 is formed in the pixel region of the color filter.

For example, when a monochrome color filter having an overcoat layer and a columnar spacer is manufactured, the first functional part can be an overcoat layer, the second functional part can be a columnar spacer, and the like. In this case, the columnar spacer is formed in the pixel region of the monochrome color filter.
Hereinafter, the manufacturing method of the pattern formation body of this embodiment is demonstrated in detail for every process.

a. Functional part formation process First, the functional part formation process of the pattern formation body of this embodiment is demonstrated. The functional part forming process in this embodiment is a process having a photosensitive resin layer forming process, a back exposure process, and a developing process, which will be described later, and forms a first functional part and a second functional part having different heights. It is a process to do. In the present embodiment, the amount of energy applied to the region where the first functional part is formed is smaller than the amount of energy applied to the region where the second functional part is formed in the backside exposure step or the like. By doing so, it becomes possible to easily form the first functional part and the second functional part having different heights.

In the present embodiment, as described above, a plurality of functional portions having different heights may be formed by changing the amount of energy irradiation in the back surface exposure step or the like in three or more stages. As a method of changing the amount of energy irradiation in three or more stages, for example, a method using a photomask having a halftone part having a different light shielding rate, a method of adjusting an exposure region and the number of exposures by combining a plurality of photomasks, Examples include a method of adjusting the amount of energy irradiation from the energy source for the region. In this embodiment, it is usually possible to form a plurality of functional parts having different heights of about 2 to 5 types, particularly about 2 to 4 types.
Hereinafter, each step included in this step will be described.

(1) Photosensitive resin layer formation process First, the photosensitive resin layer formation process is demonstrated. The photosensitive resin layer forming step in the present embodiment is a step of forming a photosensitive resin layer by applying a photosensitive resin layer forming coating solution on a transparent substrate.

  In this step, the method for applying the photosensitive resin layer forming coating solution is not particularly limited as long as it is a method capable of applying the photosensitive resin layer forming coating solution on the transparent substrate. It is not a thing. Examples of such coating methods include spin coating, casting, dipping, bar coating, blade coating, roll coating, gravure coating, flexographic printing, spray coating, and die coating. In this step, after the photosensitive resin layer forming coating solution is applied, the photosensitive resin layer forming coating solution may be pre-baked. Further, this step may be a step of forming the photosensitive resin layer on the entire surface of the transparent substrate, or a step of forming the photosensitive resin layer only on a part of the transparent substrate.

  The film thickness of the photosensitive resin layer formed in this step is appropriately selected depending on the types of the first functional part and the second functional part to be formed, but at least the second functional part to be formed. The film thickness is equal to or greater than the film thickness. Usually, such a film thickness can be about 1.0 μm to 5.0 μm, and more preferably about 1.0 μm to 4.0 μm.

  The photosensitive resin layer-forming coating solution used in this step is not particularly limited as long as it contains a photosensitive resin that can be patterned by a backside exposure step and a development step described later. The first functional unit and the second functional unit to be selected are appropriately selected. The photosensitive resin may be a negative type or a positive type. For example, when the first functional portion and the second functional portion are colored layers, or when the first functional portion is a colored layer and the second functional portion is a columnar spacer, the above photosensitive layer is used. The photosensitive resin layer-forming coating solution may contain a photosensitive resin, a dye or pigment, and various additives. For example, when the first functional part is an overcoat layer of a monochrome color filter and the second functional part is a columnar spacer, the photosensitive resin layer forming coating liquid is exposed to visible light. On the other hand, a photosensitive resin having transparency and various additives can be contained. In addition, about the various materials used for the said coating liquid for photosensitive resin layer formation, it can be made to be the same as that used for formation of each functional part of a general pattern formation body.

  Further, the transparent substrate used in this step is not particularly limited as long as it has transparency to the energy irradiated in the backside exposure step described later, depending on the use of the pattern forming body and the like. It will be selected as appropriate. In this embodiment, it is preferable to use a transparent substrate having a transmittance of 50% or more, particularly 80% or more (i-line transmittance) with respect to the energy irradiated in the back surface exposure step. This is because the photosensitive resin layer can be efficiently exposed in the back surface exposure step. The transmittance is a value measured by an ultraviolet-visible near-infrared spectrophotometer (Lambda19 PERKIN ELMER).

  Specific examples of the transparent substrate include a non-flexible transparent rigid material such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plate, or a flexible resin film or optical resin plate. The transparent flexible material etc. which have are mentioned.

(2) Back exposure process Next, the back exposure process in this embodiment is demonstrated. The back surface exposure step in this embodiment is a step of exposing the photosensitive resin layer formed in the region for forming the first functional part and the region for forming the second functional part from the transparent substrate side. is there.

  The exposure method in this step may be a method capable of exposing the photosensitive resin layer formed in the region forming the first functional part and the region forming the second functional part from the transparent substrate side. The method is not particularly limited, and for example, a method of exposing the regions for forming the first functional portion and the second functional portion in a lump may be used. For example, the first functional portion is formed. A method may be used in which the exposure of the region and the exposure of the region forming the second functional part are performed separately.

  For example, as shown in FIG. 1B, a region for forming the first functional portion (in the drawing, as shown in FIG. 1B) can be used to collectively expose the regions for forming the first functional portion and the second functional portion. , A region indicated by a) and a region for forming the second functional portion (region indicated by b in the figure), a light masking portion 11, a halftone portion 12, a photomask 14 having an opening portion 13, and the like. And a method of exposing from the transparent substrate 1 side. Usually, in this case, exposure is performed with the photomask 14 disposed so that the region (region indicated by a in the drawing) forming the first functional portion and the halftone portion 12 correspond to each other. Thereby, the amount of energy applied to the region forming the first functional part can be made smaller than the amount of energy applied to the region forming the second functional part. This is because the height of the two functional parts can be made different.

  Further, for example, as shown in FIG. 4A, a region for forming the first functional portion (region indicated by a in the drawing) and a region for forming the second functional portion (shown by b in the drawing). And a method of uniformly exposing the region) from the transparent substrate 1 side using a photomask 14 or the like. In this case, a region for forming the second functional part (a region indicated by b in the figure) is further formed from the transparent substrate 1 side or by a surface exposure process described later, as shown in FIG. 4B, for example. It is necessary to expose from the photosensitive resin layer 2 side. Thereby, the energy amount irradiated to the area | region which forms the said 1st functional part, and the area | region which forms a 2nd functional part can be varied, and a 1st functional part and a 2nd functional part are different. This is because the height can be made different.

  Further, as a method of separately performing the exposure of the region forming the first functional part and the exposure of the region forming the second functional part, for example, as shown in FIG. After exposing only the region for forming the functional portion (the region indicated by a in the figure) from the transparent substrate 1 side using the photomask 14 or the like, as shown in FIG. 5B, the second functional portion. There is a method of exposing the region (region indicated by b in the figure) from the transparent substrate 1 side using a photomask 14 or the like. Note that the order of the exposure is not particularly limited, and a region where the second functional part is formed may be exposed first. In this case, the amount of energy applied to the region forming the first functional part is different from the amount of energy applied to the region forming the second functional part, whereby the first function is set. The height of the sex part and the second functional part can be made different.

  Here, the energy source used for the exposure in this step is not particularly limited as long as the photosensitive resin layer can be exposed, and is appropriately selected according to the type of the photosensitive resin layer and the like. Is done. Such an energy source can be the same as an energy source used for exposing a general photosensitive resin, and examples thereof include an ultrahigh pressure mercury lamp, a low pressure mercury lamp, and a metal halide lamp. . The photomask that can be used in this step can be the same as that used in the production of a general pattern forming body.

  The exposure method in the present embodiment uses a laser from the transparent substrate side to the region for forming the first functional portion and the region for forming the second functional portion, for example, without using the energy source or the photomask. The irradiation method may be used.

(3) Development Step Next, the development step in this embodiment will be described. The developing step in this embodiment is a step of developing the photosensitive resin layer. By this step, the photosensitive resin layer formed in the region other than the region for forming the first functional part and the second functional part is completely removed. Moreover, about the area | region in which a 1st functional part is formed, an uncured photosensitive resin layer will be removed so that the film thickness of a 1st functional part may become the target thickness.

  The developing solution and the developing method used for such development can be the same as the method for producing a general pattern forming body, and thus detailed description thereof is omitted here.

(4) Other steps The functional part forming step of the present embodiment may have other steps as necessary in addition to the photosensitive resin layer forming step, the back surface exposure step and the developing step. Before the development step, a surface exposure step of exposing the photosensitive resin layer from the photosensitive resin layer side, a post-baking step of post-baking the first functional portion and the second functional portion after the development step, etc. You may have.

  In this embodiment, in particular, it is preferable to have the surface exposure step in addition to the steps described above. Thereby, the surface of the second functional part can be prevented from being roughened due to insufficient exposure, and the flatness of the surface of the second functional part can be increased. Further, it is possible to adjust the total energy amount irradiated to the region forming the first functional part and the total energy amount irradiated to the region forming the second functional part, and the first function to be formed is formed. It is also possible to finely adjust the film thickness ratio and the like of the functional part and the second functional part. Hereinafter, the surface exposure process will be described.

(Surface exposure process)
The front surface exposure step in this embodiment is a step of exposing the photosensitive resin layer from the photosensitive resin layer side before the development step, and may be performed before the back surface exposure step. It may be performed after the back exposure process.

  Further, this step may be a step of exposing a photosensitive resin layer formed in a region for forming the first functional part and a region for forming the second functional part, for example, and for example, the second function described above. The process of exposing only the photosensitive resin layer formed in the area | region which forms a property part from the photosensitive resin layer side may be sufficient. In addition, in this embodiment, it is preferable that it is the process of exposing the area | region which forms the said 2nd functional part at least. Thereby, the curability of the surface of the second functional part to be formed can be made sufficient, and the flatness of the surface of the second functional part can be made high.

  In addition, about the area | region exposed in this process, the energy amount irradiated, etc., it selects suitably according to the exposure area | region in the back surface exposure process mentioned above, the energy amount irradiated in a back surface exposure process, etc.

  Moreover, the exposure method in this process will not be specifically limited if it is the method exposed from the said photosensitive resin layer side, For example, the photomask which has an opening part and a light-shielding part, an opening part, a halftone part, and light shielding A method of irradiating energy using a photomask having a portion or the like, or a method of irradiating energy using a laser or the like may be used. Moreover, the method of irradiating energy for each area in multiple times may be used.

  Since the photomask, energy source, exposure method, and the like used in this step can be the same as those in the above-described backside exposure step, detailed description thereof is omitted here.

b. Other Steps In addition to the functional part forming step, the pattern forming body manufacturing method according to the present embodiment includes other steps as appropriate, such as a light shielding part forming step for forming a light shielding part on a transparent substrate. You may have. Such other steps are appropriately selected according to the type of pattern forming body to be manufactured, and can be the same as the respective steps in manufacturing a general pattern forming body.

2. Second Embodiment Next, a second embodiment of the method for producing a pattern forming body of the present invention will be described. A second embodiment of the method for producing a pattern forming body of the present invention includes a transparent substrate, a first functional part formed in a pattern on the transparent substrate, a pattern formed on the transparent substrate, and A method for producing a pattern-formed body having at least a second functional part having a height higher than that of the first functional part, wherein a photosensitive resin layer-forming coating solution is applied onto the transparent substrate to produce a photosensitive property. A photosensitive resin layer forming step for forming a resin layer, a back exposure step for exposing only the photosensitive resin layer formed in the region for forming the first functional part from the transparent substrate side, and at least the first 2 Functional part formation including the surface exposure process which exposes the said photosensitive resin layer formed in the area | region which forms a functional part from the said photosensitive resin layer side, and the image development process which develops the said photosensitive resin layer Depending on the process, the first functional part and the above A method characterized by forming the second functional unit.

  For example, as shown in FIG. 6, the pattern forming body manufacturing method of the present embodiment includes a photosensitive resin layer forming step (FIG. 6A) for forming a photosensitive resin layer 2 on a transparent substrate 1, for example, Using a photomask 14 or the like, a backside exposure process (FIG. 5) for exposing only the photosensitive resin layer 2 formed in the region (region indicated by a in the figure) where the first functional part is formed from the transparent substrate 1 side. 6 (b)) and a photosensitive resin layer 2 formed in at least a region (region indicated by b in the figure) where the second functional portion is formed using, for example, a photomask 14 or the like. This is a method having a functional part forming step including a surface exposure step (FIG. 6C) for exposing from the layer 2 side and a developing step (FIG. 6D) for developing the photosensitive resin layer 2. According to this embodiment, the 1st functionality part 3 and the 2nd functionality part 4 higher than the 1st functionality part 3 are formed by this functionality part formation process.

  Here, in the method of manufacturing the pattern formed body of this embodiment, for example, the transmittance of the halftone part of the photomask used in the back exposure process or the front exposure process is multistage, or irradiation is performed in the back exposure process or the front exposure process. In addition to the first functional part and the second functional part, the third functional part and the fourth functional part having different heights may be formed by adjusting the amount of energy. Good. In addition to the first functional portion and the second functional portion, the functional portion whose film thickness continuously changes, for example, by continuously changing the transmittance of the halftone portion of the photomask. Etc. may be used.

  As described above, when a photosensitive resin layer is exposed from the photosensitive resin layer side using a photomask having a halftone portion to form two or more types of functional portions having different heights, the photomask The amount of energy applied to the region corresponding to the halftone part, that is, the region forming the functional part having a low height is compared with the amount of energy applied to the region forming the functional part having a high height. It will be less. Therefore, the curability of the photosensitive resin layer in the region where the functional part having a low height is formed is low, and the adhesion between the transparent substrate and the functional part is low, so that the functional part is peeled off, etc. There was a problem that there was.

  On the other hand, in this embodiment, the photosensitive resin layer in the region where the first functional portion is formed is exposed from the transparent substrate side by the back surface exposure step. Therefore, for example, even when the amount of energy irradiated when forming the first functional portion is small, the curability of the photosensitive resin layer on the transparent substrate side can be improved, and the first function The adhesiveness between the adhesive part and the transparent substrate can be improved. Further, since the region where the second functional part is formed is exposed from the photosensitive resin layer side, the surface of the second functional part can be sufficiently cured. Thereby, the flatness of the 2nd functional part surface can be made high.

  In addition, according to the present embodiment, the first functional part and the second functional part can be collectively formed by adjusting the amount of energy irradiated in the back surface exposure process and the front surface exposure process. There is also an advantage that the pattern forming body can be manufactured efficiently.

  Here, the method for producing the pattern formed body of the present embodiment can be used when forming a color filter for a transflective liquid crystal display device having a colored layer for transmitted light and a colored layer for reflected light having different heights. When forming a color filter having columnar spacers formed by increasing the thickness of the colored layer forming member for forming the colored layer, a monochrome color filter having an overcoat layer and columnar spacers is formed. This is particularly useful when forming a color filter having a liquid crystal alignment member formed of a plurality of colored layers having different heights. About each functional element formed using the manufacturing method of the pattern formation body of this embodiment, it can be made the same as that of the 1st embodiment mentioned above. In the present embodiment, for example, as shown in FIG. 7, for example, a light shielding portion 21 or the like is formed on the transparent substrate 1 in the region where the second functional portion is formed (region indicated by b in the figure). Even in the case where the second functional portion is formed (the region indicated by b in the figure) is exposed from the photosensitive resin layer 2 side by the surface exposure step ( In FIG. 7A, it is possible to form the second functional part on the light shielding part 21 (FIG. 7B). Hereinafter, the manufacturing method of the pattern formation body of this embodiment is demonstrated in detail for every process.

a. Functional part formation process First, the functional part formation process of the pattern formation body of this embodiment is demonstrated. The functional part forming process in this embodiment is a process having a photosensitive resin layer forming process, a back surface exposure process, a front surface exposure process, and a development process, which will be described later, and the first functional part and the second function having different heights. This is a step of forming a sex part. In the present embodiment, the amount of energy applied to the region where the first functional part is formed in the back surface exposure step and the surface exposure step is less than the amount of energy applied to the region where the second functional part is formed. By doing so, it is possible to easily form the first functional part and the second functional part having different heights.

  In this embodiment, as described above, a plurality of functional parts having different heights may be formed by changing the energy irradiation amount in the back surface exposure process and the front surface exposure process in three or more stages. Good. As a method of changing the energy irradiation amount in three or more steps, for example, in a back surface exposure process or a front surface exposure process, a method using a photomask having a halftone portion with a different light shielding rate, or an exposure region combining a plurality of photomasks And a method of adjusting the number of exposures, a method of adjusting the amount of energy irradiation from the energy source for each region, and the like. In the present embodiment, it is usually possible to form a plurality of functional parts having different heights of about 2 to 5 types, particularly about 2 to 4 types.

  Hereinafter, the back surface exposure step and the front surface exposure step included in this step will be described. The photosensitive resin layer forming step and the developing step are the same as the steps in the first embodiment described above, and thus detailed description thereof is omitted here.

(1) Back exposure process First, the back exposure process in this embodiment is demonstrated. The back surface exposure step in this embodiment is a step of exposing the photosensitive resin layer from the transparent substrate side only in a region where the first functional portion is formed. The amount of energy irradiated in this step is usually such that the photosensitive resin layer in the region where the first functional part is formed is not completely cured, that is, when development is performed by the development step, the first functional part. The amount of the photosensitive resin layer is set to such an extent that a part of the photosensitive resin layer is eluted so that the film thickness becomes a target film thickness.

  In addition, the exposure method is not particularly limited as long as the exposure can be performed by irradiating the region where the first functional portion is formed with energy in a pattern shape. A method using a mask or the like may be used, or a method using a laser or the like may be used.

  Note that the energy source, photomask, and the like used in this step can be the same as those described in the back exposure step of the first embodiment described above, and thus description thereof is omitted here.

(2) Surface exposure process Next, the surface exposure process in this embodiment is demonstrated. The front surface exposure step in this embodiment is a step of exposing the photosensitive resin layer from the side of the photosensitive resin layer to at least a region where the second functional portion is formed, and is performed before the back surface exposure step. Alternatively, it may be performed after the back exposure step.

  Further, in this step, for example, as shown in FIG. 6C, only the photosensitive resin layer 2 formed in the region for forming the second functional part (the region indicated by b in the figure) is exposed. For example, as shown in FIG. 8, for example, using a photomask 14 having a light shielding portion 11, a halftone portion 12, and an opening portion 13, a region for forming the first functional portion and It may be a step of exposing a region where the second functional part is formed. Further, for example, only a region where the first photosensitive resin layer is formed using a photomask or the like is exposed from the photosensitive resin layer 2 side, and only a region where the second photosensitive resin layer is formed using a photomask or the like. The process etc. which expose from the photosensitive resin layer 2 side may be sufficient.

  The exposure method in this step may be, for example, a method of irradiating energy using a photomask or the like, or a method of irradiating energy in a pattern with a laser or the like.

  The photomask, energy source, exposure method, and the like used in this step can be the same as those described in the back exposure step of the “first embodiment” described above, and detailed description thereof is omitted here. .

(3) Other processes The functional part forming process of the present embodiment includes other processes as necessary in addition to the photosensitive resin layer forming process, the back surface exposure process, the front surface exposure process, and the development process. Alternatively, after the development step, a post-baking step for post-baking the first functional portion and the second functional portion may be included.

b. Other Steps In addition to the functional part forming step, the pattern forming body manufacturing method according to the present embodiment includes other steps as appropriate, such as a light shielding part forming step for forming a light shielding part on a transparent substrate. You may have. Such other steps are appropriately selected according to the type of pattern forming body to be manufactured, and can be the same as the respective steps in manufacturing a general pattern forming body.

B. Next, a method for manufacturing a color filter for a transflective liquid crystal display device according to the present invention will be described. In the method for producing a color filter for a transflective liquid crystal display device according to the present invention, the first functional part formed by the above-described method for producing a pattern forming body is a colored layer for reflected light, and the second functional part is It is a method characterized by being a colored layer for transmitted light.

  As shown in FIG. 9, for example, the method for manufacturing a color filter for a transflective liquid crystal display device according to the present invention uses a thin first functional part 3 manufactured by the method for manufacturing a pattern forming body described above as reflected light. The colored layer and the thick second functional part 4 are used as the colored layer for transmitted light.

  The method for producing a color filter for a transflective liquid crystal display device according to the present invention includes, for example, a colored layer forming layer forming step of forming a colored layer forming layer by applying a colored layer forming coating solution on a transparent substrate; A back exposure process for exposing the colored layer forming layer formed in the region for forming the colored layer for reflected light and the region for forming the colored layer for transmitted light from the transparent substrate side, and for forming the colored layer A colored layer forming step of forming a colored layer forming layer by applying a colored layer forming coating solution on the transparent substrate; The back surface exposure step of exposing only the colored layer forming layer formed in the region for forming the reflected light region from the transparent substrate side, and at least the region for forming the transmitted light colored layer. The colored layer forming layer is replaced with the colored layer. Can be a process having a surface exposure step of exposing the formed for layer side, a colored layer forming step and a developing step of developing the colored layer forming layer.

  According to the present invention, in any of the above methods, since the colored layer forming layer in the region for forming the reflected light colored layer is exposed from the transparent substrate side, Adhesiveness with the transparent substrate can be improved, and the colored layer for reflected light can be prevented from peeling off.

  Moreover, according to this invention, the film thickness of the said colored layer for reflected light and the colored layer for transmitted light may differ by adjusting the energy amount irradiated in the said back surface exposure process or a surface exposure process. It is possible to manufacture a color filter for a transflective liquid crystal display device efficiently.

  In addition, about the layer formation process for colored layer formation in the manufacturing method of the color filter for said transflective liquid crystal display devices, a back surface exposure process, a surface exposure process, a development process, etc., "Manufacture of a pattern formation body" mentioned above. It can be the same as the method described in “Method”, and the colored layer forming coating solution used at this time is the same as that used when forming a colored layer of a general color filter. Detailed explanation here is omitted.

  Note that the transflective liquid crystal display device manufactured according to the present invention may have a light-shielding portion 21 as shown in FIG. 9, for example, and the reflection when used in a liquid crystal display device, for example. The transparent resin layer for adjusting the optical path difference in the light region and the transmitted light region may be formed between the colored layer for reflected light and the transparent substrate. The step of forming the light shielding part, the step of forming the transparent resin layer, and the like can be the same as the respective steps in manufacturing a color filter for a general transflective liquid crystal display device. Detailed description of is omitted.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  The following examples illustrate the present invention more specifically.

[Example 1]
(Photosensitive resin layer forming step)
As a transparent substrate, a glass substrate (Corning 1317 glass) having a size of 300 mm × 400 mm, a thickness of 0.7 mm and an i-line transmittance of 91% was prepared, and this substrate was washed according to a conventional method. A coating solution for forming a colored layer for a green colored layer (negative photosensitive resin composition) prepared according to the component composition shown below on this transparent substrate is applied by spin coating, and dried under reduced pressure at 500 Pa, A photosensitive resin layer (colored layer) was formed.
<Colored layer forming coating solution for forming a green colored layer>
Green pigment ... 4.2 parts by weight Yellow pigment ... 1.8 parts by weight Pigment dispersant and pigment dispersion resin ... 3.0 parts by weight acrylic polymerizable monomer ... 4.0 parts by weight polymer ( Alkali-soluble acrylic copolymer) ... 5.0 parts by weight Starting material (Irgacure 907 and Irgacure 369) ... 1.4 parts by weight

(Back exposure process and development process)
Using an exposure machine, a colored layer forming photomask having an opening in a portion corresponding to the reflected light region is formed on the transparent substrate side in the region where the first functional portion (reflected light colored layer) is to be formed. After the proximity back exposure is performed on only the photosensitive resin layer with an energy amount of 5 mJ / cm ² , the photosensitive resin layer is photosensitive using a colored layer forming photomask having an opening in a portion corresponding to the transmitted light region. Only the photosensitive resin layer formed in the region for forming the second functional part (colored layer for transmitted light) from the resin layer side was subjected to proximity back exposure with an energy amount of 80 mJ / cm ² . Thereafter, development is performed and baking is performed at 240 ° C. for 20 minutes, whereby a first functional part (colored layer for reflected light) having a line width of 80 μm and a film thickness of 1.0 μm and a second functional part having a line width of 80 μm and a film thickness of 1.6 μm. A functional part (colored layer for transmitted light) was formed to obtain a color filter for a transflective liquid crystal display device.

[Evaluation]
Shape observation and surface roughness measurement were performed on the first functional portion and the second functional portion of the color filter for a transflective liquid crystal display device obtained in Example 1. Shape observation is confirmed using an ultra-deep shape measurement microscope (VK-8500 KEYENCE), and surface roughness is measured using a scanning probe microscope (AS-7B-M Takano). It was.
As a result, in the first functional part, both the edge part shape and the surface roughness were somewhat difficult, but peeling did not occur, and in the second functional part, both the edge part shape and the surface roughness were good. No peeling occurred.

[Example 2]
(Photosensitive resin layer forming step)
The photosensitive resin layer forming step was performed in the same manner as in Example 1.
(Back exposure process, front exposure process and development process)
Using an exposure machine, a colored layer forming photomask having an opening in a portion corresponding to the reflected light region is formed on the transparent substrate side in the region where the first functional portion (reflected light colored layer) is to be formed. After the proximity back exposure is performed on only the photosensitive resin layer with an energy amount of 5 mJ / cm ² , the photosensitive resin layer is photosensitive using a colored layer forming photomask having an opening in a portion corresponding to the transmitted light region. Near surface exposure was performed with an energy amount of 80 mJ / cm ² only on the photosensitive resin layer formed in the region where the second functional part (colored layer for transmitted light) was formed from the resin layer side. Thereafter, development is performed and baking is performed at 240 ° C. for 20 minutes, whereby a first functional part (colored layer for reflected light) having a line width of 80 μm and a film thickness of 1.0 μm and a second functional part having a line width of 80 μm and a film thickness of 2.9 μm. A functional part (colored layer for transmitted light) was formed to obtain a color filter for a transflective liquid crystal display device.

[Example 3]
A color filter for a transflective liquid crystal display device was obtained in the same manner as in Example 2 except that the energy amount of the back exposure was set to 15 mJ / cm ² . The obtained first functional part had a line width of 80 μm and a film thickness of 1.3 μm, and the second functional part had a line width of 80 μm and a film thickness of 2.9 μm.

[Example 4]
A color filter for a transflective liquid crystal display device was obtained in the same manner as in Example 2 except that the energy amount of the back exposure was 80 mJ / cm ² . The obtained first functional part had a line width of 80 μm and a film thickness of 1.6 μm, and the second functional part had a line width of 80 μm and a film thickness of 2.9 μm.

[Comparative Example 1]
Instead of performing backside exposure on the photosensitive resin layer formed in the region where the first functional portion (colored layer for reflected light) is formed, a photo having a halftone portion in the portion corresponding to the reflected light region A color filter for a transflective liquid crystal display device was obtained in the same manner as in Example 2 except that the proximity surface exposure was performed with an energy amount of 30 mJ / cm ² using a mask (i-line transmittance of 15%). The obtained first functional part had a line width of 80 μm and a film thickness of 1.0 μm, and the second functional part had a line width of 80 μm and a film thickness of 2.9 μm.

[Comparative Example 2]
The same as Comparative Example 1 except that the amount of energy of surface exposure performed on the photosensitive resin layer formed in the region where the first functional part (colored layer for reflected light) is formed was 100 mJ / cm ^2. Thus, a color filter for a transflective liquid crystal display device was obtained. The obtained first functional part had a line width of 80 μm and a film thickness of 1.3 μm, and the second functional part had a line width of 80 μm and a film thickness of 2.9 μm.

[Comparative Example 3]
The same as Comparative Example 1 except that the amount of energy of surface exposure performed on the photosensitive resin layer formed in the region where the first functional part (colored layer for reflected light) is formed was 300 mJ / cm ^2. Thus, a color filter for a transflective liquid crystal display device was obtained. The obtained first functional part had a line width of 80 μm and a film thickness of 1.6 μm, and the second functional part had a line width of 80 μm and a film thickness of 2.9 μm.

[Evaluation]
The first functional part and the second functional part of the color filters for transflective liquid crystal display devices obtained in Examples 2 to 5 and Comparative Examples 1 to 4 were evaluated. The first functional part was evaluated according to the evaluation criteria shown below. Moreover, about the 2nd functional part, surface roughness was measured and evaluated. Shape observation and surface roughness measurement were performed in the same manner as described above.
A: Edge shape and surface roughness were both good and no peeling occurred.
Δ: The edge part shape and the surface roughness were somewhat difficult, but no peeling occurred.
X: Peeling occurred.

From the results shown in Table 1, when the first functional part having a thin film thickness was formed by surface exposure using a photomask having a halftone part, peeling occurred in the first functional part (Comparative Examples 1 to 3). . On the other hand, when the thin first functional part was formed by back exposure, the first functional part was not peeled off (Examples 2 to 4).
Moreover, when the surface roughness was observed about the 2nd functional part, all were flat.

It is process drawing explaining an example of the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the pattern formation body of this invention. It is explanatory drawing for demonstrating the manufacturing method of the color filter for transflective liquid crystal display devices of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2 ... Photosensitive resin layer 3 ... 1st functional part 4 ... 2nd functional part

Claims (2)

A transparent substrate; a first functional part formed in a pattern on the transparent substrate; and a second functional part formed in a pattern on the transparent substrate and having a height higher than that of the first functional part. A pattern forming body having at least
A photosensitive resin layer forming step of forming a photosensitive resin layer by applying a photosensitive resin layer forming coating solution on the transparent substrate;
A back exposure step of exposing only the photosensitive resin layer formed in the region for forming the first functional part from the transparent substrate side;
A surface exposure step of exposing at least the photosensitive resin layer formed in the region for forming the second functional part from the photosensitive resin layer side;
A method for producing a pattern forming body, wherein the first functional portion and the second functional portion are formed by a functional portion forming step including a developing step of developing the photosensitive resin layer. The first functional part formed by the method for producing a pattern forming body according to claim 1 is a colored layer for reflected light, and the second functional part is a colored layer for transmitted light. A method for producing a color filter for a transmissive liquid crystal display device.

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