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JP4889101B2 - Water discharge device - Google Patents
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JP4889101B2 - Water discharge device - Google Patents

Water discharge device Download PDF

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JP4889101B2
JP4889101B2 JP2006181302A JP2006181302A JP4889101B2 JP 4889101 B2 JP4889101 B2 JP 4889101B2 JP 2006181302 A JP2006181302 A JP 2006181302A JP 2006181302 A JP2006181302 A JP 2006181302A JP 4889101 B2 JP4889101 B2 JP 4889101B2
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water
cleaning
flow rate
water supply
nozzle
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JP2008008084A (en
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直樹 榊原
実 松井
剛志 山川
理典 柳瀬
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Toto Ltd
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Description

本発明は、吐水装置に関し、詳しくは給水された洗浄水を所定の吐水口から吐水する衛生洗浄装置の洗浄ノズルとして好適に利用できる吐水装置に関する。 The present invention relates to a water discharge device, and more particularly to a water discharge device that can be suitably used as a cleaning nozzle of a sanitary cleaning device that discharges supplied wash water from a predetermined water discharge port.

従来の吐水装置たとえば人体の局部を洗浄する人体衛生洗浄装置は、人体局部に対して吐水口から人体に吐水し、洗浄水で汚れを落とす。洗浄水の水勢は調整可能となっており、使用者は水勢を上げて、汚れをすばやく落としたり、刺激のある強い洗浄感の吐水によって洗浄を行うことができる。また、水勢を下げて、やわらかい感触の吐水で洗浄を行うこともでき、このように水勢を変えることによって好みの吐水を選択することができる。 A conventional water discharging apparatus, for example, a human body hygiene cleaning apparatus that cleans a local part of a human body, discharges water from the water outlet to the human body and removes dirt with the cleaning water. The water flow of the washing water can be adjusted, and the user can raise the water flow to quickly remove the dirt or perform washing with a stimulating and strong water discharge. In addition, the water flow can be lowered and washing can be performed with soft water discharge, and the desired water discharge can be selected by changing the water flow in this way.

また、なかには洗浄水に脈動を負荷して吐水させ、洗浄力を高め、かつ脈動を与えず吐水させた場合よりも使用する水量を減らして節水する、さらには、節水により水を温めるのに用いる熱量を節約して省エネを実現する人体洗浄装置がある。この場合、使用者は少ない流量でありながら強い水流での洗浄を欲する場合があった。こうした要求に適った吐水を実現するには、小流量の洗浄水をその流速を高めて通水する必要があり、例えば脈動用の電磁ポンプを使用するため、コスト的に高くなるという問題があった。 In addition, some pulsation is applied to the wash water to discharge water, increasing the detergency and saving water by reducing the amount of water used compared to discharging water without pulsation. There is a human body cleaning device that saves heat and saves energy. In this case, the user may want to wash with a strong water flow at a low flow rate. In order to realize water discharge that meets these requirements, it is necessary to pass a small flow rate of washing water at an increased flow rate. For example, a pulsating electromagnetic pump is used, which increases the cost. It was.

また、電気的な駆動を用いないで吐水位置を周期的に変更させる吐水装置も知られている。洗浄ノズル内に、洗浄水が流入する旋回室と、その旋回室の周面に沿って洗浄水が供給される給水部と、旋回室の上端に設けられた開口部と、一端部がこの開口部側に配置されて内部には旋回室に供給された洗浄水を一端部側から吐水可能とする吐水流路が形成された吐水体と、前記吐水体を把持する可撓性の把持体が備えられ、給水部へ供給された洗浄水の運動エネルギーとこの運動エネルギーにより生じる揚力および遠心力によって吐水体が旋回室内で傾斜した姿勢で首振り運動をおこない、洗浄水を一箇所に集中させることなく、ある程度の範囲にわたって洗浄水を吐出し、少ない洗浄水量で洗浄感の洗浄強さや洗浄広さを確保した洗浄を行う洗浄ノズルがある。(例えば、特許文献1参照。) There is also known a water discharge device that periodically changes the water discharge position without using electrical drive. A swirling chamber into which the cleaning water flows into the cleaning nozzle, a water supply unit to which the cleaning water is supplied along the peripheral surface of the swirling chamber, an opening provided at the upper end of the swirling chamber, and one end thereof A water discharge body in which a water discharge flow path is formed so that the wash water supplied to the swirl chamber can be discharged from one end side, and a flexible gripping body that holds the water discharge body. Equipped with the kinetic energy of the wash water supplied to the water supply unit and the lift and centrifugal force generated by this kinetic energy to swing the water spouting body in the swirl chamber and to concentrate the wash water in one place However, there is a cleaning nozzle that discharges cleaning water over a certain range and performs cleaning with a small amount of cleaning water and ensuring a cleaning strength and a wide cleaning area. (For example, refer to Patent Document 1.)

この場合は、例えば、刺激のある強い洗浄感を使用者が求め、洗浄流量を増やしたときに同時に首振り運動の周期(以下公転周波数)も早くなってしまい、洗浄流量を増大させたにも関わらず人体における着水時間が短くなることで皮膚の変形量が十分でなくなり、使用者が欲する十分な洗浄感を得られることができないといった問題があった。
特開2003−176560号
In this case, for example, the user seeks a strong feeling of washing with stimulation, and when the washing flow rate is increased, the period of the swing motion (hereinafter referred to as the revolution frequency) is also accelerated, and the washing flow rate is increased. Regardless of this, there is a problem that the amount of deformation of the skin is not sufficient due to the short landing time in the human body, and the user cannot obtain a sufficient feeling of cleaning desired by the user.
JP 2003-176560 A

今までの吐水装置、例えば上記構造を有する洗浄ノズルにおいて、使用者の欲する洗浄感を達成させる為に以下のような調整をしていた。
使用者が刺激のある強い洗浄感を欲する場合は、設定された最大水勢時に前記洗浄感を達成させるために、首振り運動の周期(以下公転周波数)を低速に設定する。たとえば、設定水勢に対する公転周波数を100Hz以下程度に設定すると刺激のある洗浄強さを達成することが実験の結果分かっている。この場合は、公転周波数を調整する手段としては、前記吐水体に付与する運動エネルギーを前記給水部の面積を大きくし前記旋回室に流入する洗浄水の流速を遅くすることや、前記吐水体の比重を大きくすることで、該運動エネルギーによって生じる揚力および遠心力を大きくするなどして公転周波数を調整していた。
In the conventional water discharge device, for example, the cleaning nozzle having the above-described structure, the following adjustments have been made in order to achieve the feeling of cleaning desired by the user.
When the user desires a strong washing feeling with stimulation, in order to achieve the washing feeling at the set maximum water force, the period of the swing motion (hereinafter referred to as the revolution frequency) is set to a low speed. For example, as a result of experiments, it has been found that when the revolution frequency with respect to the set water flow is set to about 100 Hz or less, a stimulating cleaning strength is achieved. In this case, as means for adjusting the revolution frequency, the kinetic energy imparted to the water spouting body can be increased by increasing the area of the water supply section and reducing the flow rate of the washing water flowing into the swirl chamber, The revolution frequency is adjusted by increasing the specific gravity and increasing the lift and centrifugal force generated by the kinetic energy.

しかしながら、公転周波数は、設定された水勢流量と前記吐水体の比重や運動エネルギーを発生させる前記給水部の形状と洗浄流量に依存しており、一義的に決定されるため洗浄流量と公転周波数を独立して制御することができないという問題があった。 However, the revolution frequency depends on the set water flow rate, the specific gravity of the water spouting body and the shape of the water supply unit that generates kinetic energy, and the washing flow rate. There was a problem that it could not be controlled independently.

たとえば、公転周波数と洗浄強さの関係を示した図8(a)、衛生洗浄装置の設定流量と公転周波数の関係を示した図8(b)を使用して以下に説明する。
公転周波数と洗浄強さの関係は、図8(a)に示すとおり公転周波数が高い場合は洗浄強さが低下し(弱く)、小さい場合は洗浄強さは増加(強く)する関係が分かっている。また、設定流量と公転周波数の関係は、図8(b)に示すとおり、設定流量が多くなると、公転周波数は高くなる関係が分かっている。
For example, FIG. 8A showing the relationship between the revolution frequency and the cleaning strength and FIG. 8B showing the relationship between the set flow rate of the sanitary washing apparatus and the revolution frequency will be described below.
As shown in FIG. 8 (a), the relationship between the revolution frequency and the cleaning strength is such that when the revolution frequency is high, the cleaning strength is reduced (weak), and when it is small, the cleaning strength is increased (strong). Yes. In addition, as shown in FIG. 8B, the relationship between the set flow rate and the revolution frequency is known to increase as the set flow rate increases.

使用者の要望にあわせた水勢と洗浄感の設定を考えた場合、洗浄流量が最大のときに公転周波数が最小になり、洗浄流量が最小のときに公転周波数が最小になることが望まれる。しかし、従来のものは、図8(a)、(b)の関係から分かるように設定流量が最小時に公転周波数が最小に、最大時に公転周波数が最大になっているため、洗浄感の適正値を使用することができないでいた。 Considering the setting of the water flow and the feeling of cleaning according to the user's request, it is desirable that the revolution frequency is minimized when the cleaning flow rate is maximum, and the revolution frequency is minimized when the cleaning flow rate is minimum. However, since the revolution frequency is the minimum when the set flow rate is the minimum and the revolution frequency is the maximum when the maximum is the maximum, as is understood from the relationship of FIGS. Could not be used.

また、前記公転周波数の調整手段(例えば前記吐水体の比重)で最大設定流量で狙いの公転周波数を設定した場合は、最小設定流量で運動エネルギーが不足して、安定した首振り運動を確保できず、一箇所を集中的に洗浄してしまうという課題も発生していた。 In addition, when the target revolution frequency is set at the maximum set flow rate with the revolution frequency adjusting means (for example, the specific gravity of the water spouting body), the kinetic energy is insufficient at the minimum set flow rate, and stable swing motion can be secured. In addition, there has been a problem of intensive cleaning of one place.

本発明は上記問題を解決するためになされたもので、公転周波数と洗浄水の流量が独立して制御することを可能にする吐水装置を提供することにある。 The present invention has been made to solve the above-described problem, and it is an object of the present invention to provide a water discharger that can independently control the revolution frequency and the flow rate of cleaning water.

上記目的を達成するために請求項1の発明によれば、ノズルを備え、給水された洗浄水を前記ノズルから吐出する吐水装置であって、前記ノズルは、洗浄水が流入する旋回室と、前記旋回室の周面に沿って洗浄水を供給する第一給水部と、前記旋回室の上端に設けられた開口部と、一端部が前記開口部側に配置され、しかも内部には前記旋回室に供給された洗浄水を一端部側から吐水可能とする吐水流路が形成された吐水体と、前記吐水体を把持する可撓性の把持体とを備え、前記第一給水部から供給された洗浄水の運動エネルギーにより前記吐水体が前記旋回室内で傾斜した姿勢で首振り運動する吐水装置において、前記吐水体には前記旋回室の洗浄水を前記吐水流路に給水する給水口が形成され、前記吐水体の給水口に相対する位置に開口部を有し、前記開口部より前記旋回室に洗浄水を給水する第二給水部を有することにより、給水された洗浄水が前記第一給水部と第二給水部に分配された状態で供給され、前記吐水体が首振り運動を発生させる為に必要な洗浄流量を第一給水部に供給し、その他の洗浄流量を首振り運動に付与しない第二給水部に供給する構成としたため、首振り運動の周期(以下公転周波数)を、洗浄流量とは独立に制御することを可能とした。
In order to achieve the above object, according to the first aspect of the present invention, there is provided a water discharge device that includes a nozzle and that discharges the supplied cleaning water from the nozzle, the nozzle including a swirling chamber into which the cleaning water flows, A first water supply unit that supplies cleaning water along the circumferential surface of the swirl chamber, an opening provided at an upper end of the swirl chamber, and one end portion disposed on the opening side, and the swirl inside A water discharge body formed with a water discharge flow passage that allows water to be discharged from one end side of the washing water supplied to the chamber, and a flexible grip body that holds the water discharge body, and is supplied from the first water supply section In the water spouting device in which the water spouting body swings in an inclined posture in the swirl chamber by the kinetic energy of the washed water, the water spouting body has a water supply port for supplying the swirl chamber wash water to the water discharge channel. Formed and opened at a position facing the water inlet of the water spouting body. Has a part, by having a second water supply unit for supplying water to the washing water in the swirling chamber from said opening, provided in a state in which water has been cleaned water is distributed to the second water supply unit and the first water supply unit It is, since the water discharge body is to supply wash flow rate necessary for generating the oscillating motion to the first water supply unit and configured to supply the second water supply unit which does not impart other cleaning flow to swinging motion, neck The period of the swing motion (hereinafter referred to as revolution frequency) can be controlled independently of the cleaning flow rate.

また、前記第一給水部と前記第二給水部の流量比率を調整する流量調整部を有することにより、前記第一給水部と前記第二給水部の流量比率を調整する流量調整部を有することにより、前記第一給水口と前記第二給水口の流量比を調整することで、前記公転周波数を洗浄流量とは独立して設定することを可能とした。 Moreover, it has a flow rate adjustment part which adjusts the flow rate ratio of said 1st water supply part and said 2nd water supply part by having a flow rate adjustment part which adjusts the flow rate ratio of said 1st water supply part and said 2nd water supply part. By adjusting the flow rate ratio between the first water supply port and the second water supply port, the revolution frequency can be set independently of the cleaning flow rate.

また、前記第一給水部と前記第二給水部は前記旋回室の異なる高さ位置に設けたことにより、前記第一給水部で発生した、前記吐水体を首振り運動させる前記旋回室の円周に沿って発生する流れに干渉しない流れを形成させることを可能にした。 In addition, the first water supply unit and the second water supply unit are provided at different height positions of the swirl chamber, so that the swirl chamber circle that swings the water spouting body generated in the first water supply unit. It is possible to form a flow that does not interfere with the flow generated along the circumference.

本発明によれば、洗浄流量と前記公転周波数を独立させることにより、使用者が刺激のある強い洗浄感を欲し、洗浄流量を増加させたときに公転周波数も同時に上昇させることなく、(各水勢設定時に対する最適な)公転周波数設定を行うことで最大水勢時の刺激ある強い洗浄感を達成することが可能になり、また、従来の吐水装置で公転周波数の調整手段として行っていた前記吐水体の比重を小さくしたり前記第一給水部の断面積をより小さくするなどで、低水勢の公転周波数を大きくして、洗浄感ややわらかくかつ量感のある洗浄感を達成させながらも上記手段で、最大水勢時の刺激ある強い洗浄感を達成することが可能になるという効果が得られる。 According to the present invention, by making the cleaning flow rate and the revolution frequency independent, the user desires a strong and clean feeling of stimulation, and without increasing the revolution frequency at the same time when the cleaning flow rate is increased (each water flow By setting the revolution frequency (optimal for setting), it becomes possible to achieve a strong washing feeling with stimulation at the time of the maximum water flow, and the water spouting body that has been used as the means for adjusting the revolution frequency in the conventional water spouting device By reducing the specific gravity of the first water supply section or by reducing the cross-sectional area of the first water supply part, the revolution frequency of the low water force is increased, and while achieving a feeling of washing and a feeling of washing with softness and volume, the above means, An effect is obtained that it is possible to achieve a strong washing feeling with stimulation at the time of maximum water.

また、本発明により、ある一定洗浄流量における洗浄感を可変することが可能のため、各水勢変化をもたせる為の流量調整用手段が不要になり、かつ洗浄水を温水化するための熱交換器の制御が容易になるため省スペース、低コスト化を達成することができる等の効果もある。 In addition, according to the present invention, it is possible to vary the feeling of cleaning at a certain cleaning flow rate, so that there is no need for a flow rate adjusting means for changing each water flow, and the heat exchanger for warming the cleaning water Since this control becomes easy, there are effects such as space saving and cost reduction.

次に本発明に係る吐水装置、人体衛生洗浄装置の実施形態を実施例に基づき説明する。図1は、本発明の吐水装置を備えた人体衛生洗浄装置300を便器に設置した際の斜視図を示す。使用者は洗浄ノズルから吐水された洗浄水で洗浄を行い、その際図中に示すリモコン操作部7にて人体洗浄装置300の操作を行う。図2は本実施例の局部洗浄装置300の概略構成を表すブロック図である。 Next, an embodiment of a water discharge device and a human body hygiene cleaning device according to the present invention will be described based on examples. FIG. 1: shows the perspective view at the time of installing the human body hygiene washing | cleaning apparatus 300 provided with the water discharging apparatus of this invention in the toilet bowl. The user performs cleaning with the cleaning water discharged from the cleaning nozzle, and operates the human body cleaning apparatus 300 at the remote control operation unit 7 shown in the drawing. FIG. 2 is a block diagram showing a schematic configuration of the local cleaning device 300 of the present embodiment.

図2に示すように、局部洗浄装置300は、外部の給水源側から順に、給水ユニット302と熱交換ユニット304と流調弁306と洗浄ノズル308を設ける。洗浄ノズル308は、ノズル駆動モータ310により、装置本体内の待機位置とお尻又はビデの各洗浄位置との間を進退するよう構成されている。 As shown in FIG. 2, the local cleaning apparatus 300 includes a water supply unit 302, a heat exchange unit 304, a flow control valve 306, and a cleaning nozzle 308 in order from the external water supply source side. The cleaning nozzle 308 is configured to move back and forth between a standby position in the apparatus main body and each of the buttocks or bidet cleaning positions by a nozzle drive motor 310.

流調弁306は洗浄ノズル308の後端部に接続されている。洗浄ノズル308の後端部内には流路・流量比切替機構71が組み込まれている。この流路・流量比切替機構71はノズル端部と一体として装着されている。また、洗浄ノズル308の先端部にはノズルヘッド200が装着されており、このノズルヘッド200にはお尻洗浄用吐水孔31、ビデ洗浄用吐水孔33が形成されている。 The flow control valve 306 is connected to the rear end of the cleaning nozzle 308. A flow path / flow rate ratio switching mechanism 71 is incorporated in the rear end portion of the cleaning nozzle 308. The flow path / flow rate ratio switching mechanism 71 is mounted integrally with the nozzle end. A nozzle head 200 is attached to the tip of the cleaning nozzle 308, and a butt cleaning water discharge hole 31 and a bidet cleaning water discharge hole 33 are formed in the nozzle head 200.

局部洗浄装置300は、流調弁306で流量調整された洗浄水を、流路・流量比切替機構71を介して洗浄ノズル308に送り込み、お尻洗浄用吐水孔31やビデ洗浄用吐水孔33から吐水する。 The local cleaning device 300 sends the cleaning water whose flow rate is adjusted by the flow control valve 306 to the cleaning nozzle 308 via the flow path / flow rate ratio switching mechanism 71, and the butt cleaning water discharge hole 31 and the bidet cleaning water discharge hole 33. Water is discharged from.

図2に示すように、局部洗浄装置300は電子制御装置312を備える。電子制御装置312は、リモコン操作部7に設けたお尻洗浄ボタン91やビデ洗浄ボタン93、流量比調整ボタン(図2におけるリモコン7の上側の△、▽)、人体洗浄装置の洗浄流量を調整する水勢ボタン(図2におけるリモコン7の下側の△、▽)、給水ユニット302、熱交換ユニット304、流調弁306、洗浄ノズル308、ノズル駆動モータ310のそれぞれと、電気信号の送受信が可能に接続されている。 As shown in FIG. 2, the local cleaning device 300 includes an electronic control device 312. The electronic control unit 312 adjusts the cleaning flow of the human body cleaning device, the buttocks cleaning button 91 and the bidet cleaning button 93 provided on the remote control operation unit 7, the flow rate adjustment button (Δ, ▽ on the upper side of the remote control 7 in FIG. 2). Can send and receive electrical signals to and from the water button (△, ▽ on the lower side of the remote control 7 in FIG. 2), the water supply unit 302, the heat exchange unit 304, the flow control valve 306, the cleaning nozzle 308, and the nozzle drive motor 310. It is connected to the.

電子制御装置312は、上記の各操作ボタンの操作に応じて、洗浄ノズル308の進退駆動、洗浄水の給水並びに止水、洗浄水の温水化、洗浄水の水勢調整、洗浄強さを調整する流量比切替調整等の制御を行う。 The electronic control device 312 adjusts the forward / backward drive of the cleaning nozzle 308, the supply and stop of the cleaning water, the warming of the cleaning water, the adjustment of the cleaning water flow, and the cleaning strength according to the operation of each operation button. Performs control such as flow ratio switching adjustment.

給水源(水道管)から送られた洗浄水(水道水)は、給水ユニット302に導かれ、このユニット302の有するストレーナでのごみ等の捕捉を経て、下流の熱交換ユニット304に至る。なお、給水ユニット302は、その管路に図示しない逆止弁、調圧のための調圧弁並びに管路開閉のための電磁弁を備える。よって、電磁弁による回路開放時に、洗浄水は、調圧弁により所定圧力に調圧された状態で、瞬間加熱方式の熱交換ユニット304に流入する。なお、給水ユニット302から熱交換ユニット304に至る間の管路には、リリーフ弁(図示省略)が配設されており、管路内圧力の不用意な上昇の回避が図られている。 Washing water (tap water) sent from a water supply source (water pipe) is guided to the water supply unit 302 and reaches a downstream heat exchange unit 304 through trapping of dust or the like with a strainer included in the unit 302. The water supply unit 302 includes a check valve (not shown), a pressure regulating valve for regulating pressure, and an electromagnetic valve for opening and closing the pipeline in the pipeline. Therefore, when the circuit is opened by the electromagnetic valve, the washing water flows into the instantaneous heating type heat exchange unit 304 in a state of being regulated to a predetermined pressure by the pressure regulating valve. In addition, a relief valve (not shown) is provided in the pipe line from the water supply unit 302 to the heat exchange unit 304, so that an inadvertent increase in the pressure in the pipe line is avoided.

熱交換ユニット304は、内蔵ヒータへの通電を介して通過する洗浄水を瞬間的に温水化するよう構成されている。なお、内蔵ヒータまたはその近傍に、その異常加熱を防止する図示しないバイメタルスイッチや温度ヒューズが装着されている。また、空焚き防止のためのフロートスイッチや、洗浄ノズル側からの洗浄水逆流を防止するためのバキュームブレーカが設置されている。 The heat exchange unit 304 is configured to instantaneously warm the wash water that passes through the energization of the built-in heater. Note that a bimetal switch or a thermal fuse (not shown) for preventing the abnormal heating is mounted on or near the built-in heater. In addition, a float switch for preventing idling and a vacuum breaker for preventing backflow of cleaning water from the cleaning nozzle side are installed.

この場合、熱交換ユニット304は、流入・流出洗浄水の温度を図示しない水温センサで検出しつつ、内蔵ヒータで洗浄水を設定温度の洗浄水に温水化する。そして、このようにして温水化された洗浄水は、流調弁306により所定の流量に流量調整を受けた上で、流路・流量比切替機構71を介して洗浄ノズル308に送られる。 In this case, the heat exchanging unit 304 detects the temperature of the inflow / outflow wash water with a water temperature sensor (not shown), and warms the wash water to the set temperature wash water with the built-in heater. The washing water heated in this way is subjected to flow adjustment to a predetermined flow rate by the flow control valve 306 and then sent to the washing nozzle 308 via the flow path / flow rate ratio switching mechanism 71.

次に洗浄ノズル308の構成について図3乃至図4を用いて説明する。図3の(a)は非通水時のノズルヘッド200の断面図、図3の(b)は通水時のノズルヘッド200の断面図、図4の(a)と(b)は図3のA−A断面図である。 Next, the configuration of the cleaning nozzle 308 will be described with reference to FIGS. 3A is a cross-sectional view of the nozzle head 200 when water is not passed, FIG. 3B is a cross-sectional view of the nozzle head 200 when water is passed, and FIGS. 4A and 4B are FIG. It is AA sectional drawing.

洗浄ノズル1に洗浄水が供給されると、ノズルヘッド200内の通水路62、旋回室流入路63、旋回室64における下部旋回室64aの順に通過する。 When the cleaning water is supplied to the cleaning nozzle 1, it passes through the water passage 62 in the nozzle head 200, the swirl chamber inflow passage 63, and the lower swirl chamber 64 a in the swirl chamber 64 in this order.

旋回室流入路63は通水路62より通水断面積が小さく構成されており、かつ旋回室64の中心に対して偏芯して洗浄水が供給されるように構成している。 The swirl chamber inflow passage 63 is configured to have a smaller water flow cross-sectional area than the water flow passage 62, and is configured to be eccentric with respect to the center of the swirl chamber 64 and to supply cleaning water.

又、ノズルヘッド200内には上記通水路62とは異なる洗浄水流路が形成されている。ノズルヘッド200内の通水路82においては、供給された洗浄水を旋回室64における上部旋回室64bに供給するための開口部84が、開口部84を有する部材91に通水路82の断面積をより大きな開口として1つ以上形成されており、その開口部84から上部旋回室64bに供給される。開口部84は、後述する吐水体70の給水口73に相対し、開口部84と吐水体70の受力部72とは位置関係に違いを持たせている。このため、開口部84からの洗浄水は、吐水体70に、後述する首振り運動を起こさせる運動エネルギーを付与しない。
なお、ここで、通水路62が「第一給水部」に、通水路82が「第二給水部」に該当する。
Further, a cleaning water flow path different from the water flow path 62 is formed in the nozzle head 200. In the water passage 82 in the nozzle head 200, the opening 84 for supplying the supplied wash water to the upper swirl chamber 64 b in the swirl chamber 64 has a cross-sectional area of the water passage 82 in the member 91 having the opening 84. One or more larger openings are formed, and the openings 84 are supplied to the upper swirl chamber 64b. The opening 84 is opposed to a water supply port 73 of the water spouting body 70 described later, and the opening 84 and the force receiving portion 72 of the water spouting body 70 have a difference in positional relationship. For this reason, the wash water from the opening 84 does not impart kinetic energy that causes the swinging motion described later to the spouting body 70.
Here, the water passage 62 corresponds to the “first water supply section”, and the water passage 82 corresponds to the “second water supply section”.

旋回室64内部には吐水体70が設けられており、この吐水体70は洗浄水が給水される給水口73と連通して洗浄水を噴射吐水する吐水口71、下部旋回室64a中の洗浄水より流れのエネルギーを受ける受力部72により構成されている。吐水体70の側面に開設された給水口73と、吐水体70の上面に開設された吐水口71とは、吐水流路で連通している。 A water spouting body 70 is provided inside the swirl chamber 64, and the water spouting body 70 communicates with a water supply port 73 to which the cleaning water is supplied to discharge the spout water, and the cleaning in the lower swirl chamber 64 a. It is comprised by the force receiving part 72 which receives the flow energy from water. The water supply port 73 opened on the side surface of the water discharge body 70 and the water discharge port 71 opened on the upper surface of the water discharge body 70 communicate with each other through the water discharge flow path.

中央に貫通孔75aを有する抜止部材75を旋回室64bの上部に洗浄ノズル61と一体に設け、抜止部材75は旋回部材70の受力部72が旋回室64b内の中心軸に対して傾斜公転可能になる様に貫通孔75aで旋回部材70の上方を支持している。 A retaining member 75 having a through hole 75a in the center is provided integrally with the cleaning nozzle 61 on the upper part of the swirl chamber 64b. The retaining member 75 is inclined and revolved with respect to the central axis in the swirl chamber 64b. The upper part of the turning member 70 is supported by the through hole 75a so as to be possible.

従って、旋回室流入路63から旋回室64内部に洗浄水が供給されて洗浄水が旋回室64内部で旋回することで発生する遠心力と洗浄水の運動エネルギーを吐水体70の受力部72が受け、吐水体70が旋回室64中心軸に対して傾斜して公転運動(首振り運動)する構成になっており、また、旋回流入路84からは前記遠心力と運動エネルギーに付与しない給水がなされる。 Accordingly, the wash water is supplied into the swirl chamber 64 from the swirl chamber inflow path 63 and the centrifugal force generated by swirling the wash water inside the swirl chamber 64 and the kinetic energy of the wash water are received by the force receiving portion 72 of the water spouting body 70. The water discharger 70 is configured to revolve (swing motion) while being inclined with respect to the central axis of the swirl chamber 64, and the water supply that is not applied to the centrifugal force and kinetic energy from the swirl inflow path 84. Is made.

以上の構成で吐水された洗浄水の軌跡について図5を用いて説明すると、吐水体70が、旋回室64中心軸まわりの公転運動をおこないながら、洗浄水を噴射吐水することで、吐水された洗浄水の軌跡は螺旋を描きながら円錐状に拡大吐水される。 The trajectory of the cleaning water discharged with the above configuration will be described with reference to FIG. 5. The water discharging body 70 was discharged by jetting and discharging the cleaning water while performing a revolving motion around the central axis of the swirl chamber 64. The trajectory of the washing water expands and discharges in a conical shape while drawing a spiral.

ここで、洗浄水の公転運動を行ないながら洗浄水を噴射吐水することで得られる洗浄軌跡の周期を公転周波数と定義付け、公転周波数と吐水形態に関して説明する。 Here, the period of the cleaning trajectory obtained by jetting and discharging the cleaning water while performing the revolving motion of the cleaning water is defined as the revolution frequency, and the revolution frequency and the water discharge form will be described.

図6(a)、図6(b)、図6(c)は流量一定の条件で、公転周波数を調整して皮膚(手の平)に向けて洗浄水を吐水させ、皮膚の変形状態を確認した実験結果である。図6(a)は公転周波数を30Hzとした場合、図6(b)は公転周波数を80Hzとした場合、図6(c)は公転周波数を100Hzとした場合である。この実験から、公転周波数が低い場合は皮膚の変形が大きく、早い場合は変形が小さいことが確認できた。これは、公転周波数が高いと着水部の皮膚の変形が発生する前に吐水が移動してしまい、皮膚の変形が起こらず、公転周波数が低いと十分な皮膚変形が発生することがわかる。 6 (a), 6 (b), and 6 (c), the revolution frequency was adjusted under the condition of a constant flow rate, and washing water was discharged toward the skin (palm) to confirm the deformation state of the skin. It is an experimental result. 6A shows a case where the revolution frequency is 30 Hz, FIG. 6B shows a case where the revolution frequency is 80 Hz, and FIG. 6C shows a case where the revolution frequency is 100 Hz. From this experiment, it was confirmed that the skin deformation was large when the revolution frequency was low, and that the deformation was small when the revolution frequency was low. This indicates that when the revolution frequency is high, the water discharge moves before the skin deformation of the water landing portion occurs, and the skin does not deform. When the revolution frequency is low, sufficient skin deformation occurs.

なお、被験者へのヒアリングによれば、公転周波数を低くした方が洗浄感に強さが増し、公転周波数が高い場合は洗浄感が減少する傾向が確認された。これは、上記に示すように皮膚の変形の大小が洗浄感に起因しているためと考えられる。 In addition, according to the interviews with the subjects, it was confirmed that the lower the revolution frequency, the stronger the feeling of washing, and the higher the revolution frequency, the less the feeling of washing. This is presumably because the skin deformation is caused by the feeling of washing as described above.

次に、本発明における給水流量と公転周波数の関係を図7に示す。ノズル308に供給される流量Qの洗浄水が分配されて、通水路62に供給される流量をQ1、通水路82に供給される流量をQ2とし、それぞれの通水路に供給する流量および流量比を調整した場合、公転周波数に寄与する通水路62からの供給水の流量と公転周波数は比例関係があり、たとえば低水勢の洗浄流量Qaでは公転周波数はfa、高水勢の洗浄流量Qbではfbの公転周波数となる。また、運動エネルギーを形成する、通水路62に連結されている旋回流入路63の断面積を小さくすることで旋回流入部に供給された洗浄水の流速が早くなる為、公転運動を支配する運動エネルギーが大きくなり、同じ流量であっても公転周波数をfc、fdに高めることが可能である。また、通水路62に供給される流量Q1の流量をQaとすることで公転周波数をfcを確保することが可能であることが分かっている為、高水勢時Qbでfeの公転周波数を得ようとした場合は、通水路82が供給する流量Q2はQ2=Qb−Qaとすることで良い。 Next, the relationship between the feed water flow rate and the revolution frequency in the present invention is shown in FIG. The flow rate Q supplied to the nozzle 308 is distributed, the flow rate supplied to the water passage 62 is Q1, the flow rate supplied to the water passage 82 is Q2, and the flow rate and flow ratio supplied to each water passage. Is adjusted, the revolution frequency is proportional to the flow rate of the supply water from the water passage 62 contributing to the revolution frequency. For example, the revolution frequency is fa for the low water washing flow rate Qa and fb for the high water washing flow rate Qb. Revolution frequency. Moreover, since the flow velocity of the washing water supplied to the swirling inflow portion is increased by reducing the cross-sectional area of the swirling inflow passage 63 connected to the water flow passage 62 that forms kinetic energy, the motion that governs the revolving motion. The energy increases, and the revolution frequency can be increased to fc and fd even at the same flow rate. Further, since it is known that the revolution frequency fc can be secured by setting the flow rate Q1 supplied to the water passage 62 to Qa, let's obtain the revolution frequency of fe at the high water flow rate Qb. In this case, the flow rate Q2 supplied by the water passage 82 may be Q2 = Qb−Qa.

また、図7に示した洗浄流量は後述する流調弁によって所定の流量に調整されているが、本発明の構成を有することによって、流量一定の条件においても通水路62と通水路82に供給される流量比を後述する流路流量比切替機構72を使用して流路と流量比を制御するだけでも同様の結果が得られることができる。 Further, the cleaning flow rate shown in FIG. 7 is adjusted to a predetermined flow rate by a flow control valve, which will be described later, but by having the configuration of the present invention, it is supplied to the water passage 62 and the water passage 82 even under a constant flow rate condition. The same result can be obtained simply by controlling the flow rate and the flow rate ratio using the flow rate ratio switching mechanism 72 described later.

流路流量比切替機構72は、上述したように洗浄ノズル1の通水路62と通水路82に洗浄水を給水し、通水路62と通水路82に対しては両経路に対し同時に給水可能であり、その給水の際には各経路ごとの流量Q1、Q2の流量比を調整するよう構成されている。 The flow rate ratio switching mechanism 72 supplies cleaning water to the water passage 62 and the water passage 82 of the cleaning nozzle 1 as described above, and can supply water to both the passage 62 and the water passage 82 simultaneously. Yes, when the water is supplied, the flow rate ratio between the flow rates Q1 and Q2 for each path is adjusted.

図9に示すように流路流量比切替機構71はノズル側から、ノズル内の各経路と連通した連通孔を有するステータ2aと、流路切換のために回転しステータ2aの各連通孔を選択的に開放するロータ2bと、このロータ2bに回転を伝達するためのカップリング2dと、ロータ2bをステータ2aに向けて付勢するスプリング2cとを有する。 As shown in FIG. 9, the flow rate ratio switching mechanism 71 selects, from the nozzle side, a stator 2a having a communication hole communicating with each path in the nozzle, and each communication hole of the stator 2a that rotates for channel switching. The rotor 2b is opened, the coupling 2d is for transmitting rotation to the rotor 2b, and the spring 2c is used to bias the rotor 2b toward the stator 2a.

図10は、流路流量比切替機構71を、ステータ2aの下側(ロータ2bに接しない側)から覗いて、各連通孔の開放状態を示す図である。ステータ2aでは図10(a)に示すように、矢印L方向に順に洗浄ノズル1内の通水路62に連通する第一の連通孔2f、通水路82に連通する第二の連通孔2g、ビデ経路207に連通する第三の連通孔2hが開口している。 FIG. 10 is a view showing an open state of each communication hole when the flow rate ratio switching mechanism 71 is viewed from the lower side of the stator 2a (the side not in contact with the rotor 2b). In the stator 2a, as shown in FIG. 10A, the first communication hole 2f communicating with the water passage 62 in the cleaning nozzle 1 in order in the direction of the arrow L, the second communication hole 2g communicating with the water passage 82, the bidet A third communication hole 2h communicating with the path 207 is opened.

ロータ2bは、図10(b)に示すように、ステータ2aに開口した上記各連通孔2f、2g、2hを選択的に開放できる切欠2iを有し、この切欠2iを連通孔2f、2g、2hの開口と重ねることでその連通孔2f、2g、2hを開放する。切欠2iは第一の連通孔2fと第二の連通孔2g双方に重なり合わせて連通した状態にすることができ、また同時に第一の連通孔2f、第二の連通孔2gとは重なり合わせずに、第三の連通孔2hとのみ連通することの出来る幅を持っている。 As shown in FIG. 10B, the rotor 2b has a notch 2i that can selectively open the communication holes 2f, 2g, and 2h that are opened in the stator 2a, and the notch 2i is connected to the communication holes 2f, 2g, The communication holes 2f, 2g, and 2h are opened by overlapping with the opening of 2h. The notch 2i can be in a state where both the first communication hole 2f and the second communication hole 2g overlap and communicate with each other, and at the same time, the first communication hole 2f and the second communication hole 2g do not overlap. Furthermore, it has a width that allows communication with only the third communication hole 2h.

このようなステータ2aとロータ2bの構造においては、ステータ2aに対しロータ2bを矢印R方向に回転させロータ2bの切欠2iと、第一の連通孔2fと第二の連通孔2gの開口との重なり具合を連続的に変化させたときに、第一の連通孔2fの開口の開放される面積が大きくなり、逆に第二の連通孔2gの開口の開放される面積が小さくなる。この時、通水路62への給水流量Q1が増加し、通水路82への給水流量Q2が減少する。一方ロータ2bを矢印L方向に回転させた時には第一の連通孔2fの開口の開放される面積が小さくなりそれに伴い第二の連通孔2gの開口の開放される面積が大きくなる。 In such a structure of the stator 2a and the rotor 2b, the rotor 2b is rotated in the direction of the arrow R with respect to the stator 2a, and the notch 2i of the rotor 2b, the first communication hole 2f, and the opening of the second communication hole 2g are formed. When the overlapping state is continuously changed, the area where the opening of the first communication hole 2f is opened is increased, and conversely, the area where the opening of the second communication hole 2g is opened is reduced. At this time, the water supply flow rate Q1 to the water passage 62 increases, and the water supply flow rate Q2 to the water passage 82 decreases. On the other hand, when the rotor 2b is rotated in the direction of the arrow L, the area where the opening of the first communication hole 2f is opened is reduced, and accordingly, the area of the opening of the second communication hole 2g is increased.

この時、通水路62への給水流量Q1が減少し、通水路82への給水流量Q2が増加する。これによって通水路62と通水路82への給水流量Q1、Q2を連続的に調整することが可能となる。具体的には図10(c)に示すように切欠2iの中心を、第一の連通孔2fと第二の連通孔2gのちょうど中間に位置する状態を回転角0°とすると、第一の連通孔2fと第二の連通孔2gの形状が同じである場合は、図10(d)のように、ステータ2aに対しロータ2bを矢印R方向に回転させた場合、第一の連通孔2fの開放される面積が大きくなり同時に第二の連通孔2gの開放される面積が小さくなるため通水路62への給水流量を増加させ、通水路82への給水流量を減少させることができる。なお、図上黒塗りしている部分が、連通孔2f、2g、2hと切欠2iが連通している部位である。図10(e)のようにステータ2aに対しロータ2bを矢印L方向に回転させた場合、逆に通水路62への給水流量が減少し、通水路82への給水流量が増加する。 At this time, the water supply flow rate Q1 to the water passage 62 decreases, and the water supply flow rate Q2 to the water passage 82 increases. This makes it possible to continuously adjust the water supply flow rates Q1 and Q2 to the water passage 62 and the water passage 82. Specifically, as shown in FIG. 10 (c), when the center of the notch 2i is located in the middle between the first communication hole 2f and the second communication hole 2g, the rotation angle is 0 °. When the shapes of the communication hole 2f and the second communication hole 2g are the same, when the rotor 2b is rotated in the arrow R direction with respect to the stator 2a as shown in FIG. 10 (d), the first communication hole 2f Since the open area of the second communication hole 2g and the open area of the second communication hole 2g become small at the same time, the feed water flow rate to the water passage 62 can be increased and the feed water flow rate to the water passage 82 can be decreased. In addition, the part which is painted black on a figure is a site | part which the communicating holes 2f, 2g, 2h and the notch 2i communicate. When the rotor 2b is rotated in the direction of arrow L with respect to the stator 2a as shown in FIG. 10 (e), the water supply flow rate to the water passage 62 decreases and the water supply flow rate to the water passage 82 increases.

また、ロータ2bは、図10(f)のように自身が有する切欠のすべてをステータ2aの有する連通孔のどれとも重なり合わない状態にすることができ、これによりノズルへの洗浄水の給水を止めることもできる。 Further, as shown in FIG. 10 (f), the rotor 2b can make all of the notches thereof not overlap any of the communication holes of the stator 2a, thereby supplying cleaning water to the nozzles. You can also stop.

なお、ノズル内に残存した水の排出(水抜き)の便のため、このロータ2bを図10(g)に示すように総ての連通孔開口と重なることもできる切欠2jを有するようにして、水抜き時には図10(h)のように切欠2iと2jにより総ての連通孔2f、2g、2hを開口させることもできる。 For the convenience of discharging (draining) the water remaining in the nozzle, the rotor 2b has a notch 2j that can overlap all the communication hole openings as shown in FIG. 10 (g). When draining, all the communication holes 2f, 2g, and 2h can be opened by the notches 2i and 2j as shown in FIG. 10 (h).

図9に示すようにカップリング2dは流路流量比切替機構71の有する駆動モータ2eの回転軸に装着され、スリット2lに回転軸ピン2kを位置させる。また、このカップリング2dは回転キー2mをロータ2bのスリット2nに係合させている。よって駆動モータ2eが正逆回転すると、その回転は回転軸ピン2kにてカップリング2dに、また回転キー2mにてロータ2bに伝達される。そして、ロータ2bの回転により切欠2iが上記したように各連通孔2f、2g、2hを選択的に開放し、ノズルの各経路へ送り込む洗浄水の流量を調整する。すなわち、電子制御装置6は駆動モータ2eの回転を制御し、上記のようにノズルの各経路へ送り込まれる洗浄水の流量比が調整される。 As shown in FIG. 9, the coupling 2d is attached to the rotation shaft of the drive motor 2e of the flow rate ratio switching mechanism 71, and the rotation shaft pin 2k is positioned in the slit 21. The coupling 2d engages the rotary key 2m with the slit 2n of the rotor 2b. Therefore, when the drive motor 2e rotates forward and backward, the rotation is transmitted to the coupling 2d by the rotation shaft pin 2k and to the rotor 2b by the rotation key 2m. Then, by the rotation of the rotor 2b, the notch 2i selectively opens the communication holes 2f, 2g, 2h as described above, and adjusts the flow rate of the cleaning water fed to each path of the nozzle. That is, the electronic control unit 6 controls the rotation of the drive motor 2e and adjusts the flow rate ratio of the cleaning water fed into each path of the nozzle as described above.

上述した流路流量比切替機構71と流量調整弁306を使用することで、所定の流量に対する流量比を制御することが可能になり、通水路62には所望の公転周波数を確保する為に必要な給水を行い公転周波数を給水流量とは独立して制御することを可能にした。 The flow rate ratio switching mechanism 71 and the flow rate adjustment valve 306 described above can be used to control the flow rate ratio with respect to a predetermined flow rate, which is necessary for securing a desired revolution frequency in the water passage 62. The revolving frequency can be controlled independently of the feed water flow rate.

人体衛生洗浄装置300を便器に設置した際の斜視図である。It is a perspective view at the time of installing the human body hygiene washing | cleaning apparatus 300 in a toilet bowl. 人体衛生洗浄装置300の概略構成図を表すブロック図である。2 is a block diagram illustrating a schematic configuration diagram of a human body hygiene cleaning apparatus 300. FIG. 実施例のノズル装置308に設置されたノズルヘッド200の縦断面図で、(a)は無通水状態で(b)は通水状態での断面図である。It is the longitudinal cross-sectional view of the nozzle head 200 installed in the nozzle apparatus 308 of an Example, (a) is a non-water-permeable state, (b) is sectional drawing in a water-permeable state. 実施例のノズル装置308に設置されたノズルヘッド200の断面図に示されたA−A断面図である。It is AA sectional drawing shown by sectional drawing of the nozzle head 200 installed in the nozzle apparatus 308 of an Example. 実施例における吐水形態を示す図である。It is a figure which shows the water discharge form in an Example. 公転周波数と皮膚の変形状態を調査した実験結果を示す。(a)は公転周波数30Hz、(b)は公転周波数80Hz、(c)は公転周波数180Hzの吐水時における皮膚変形状態を示す図である。The experimental result which investigated the revolution frequency and the deformation state of the skin is shown. (A) is a revolution frequency 30Hz, (b) is a revolution frequency 80Hz, (c) is a figure which shows the skin deformation | transformation state at the time of water discharge of the revolution frequency 180Hz. 実施例における洗浄水の流量と公転周波数の関係を示す図である。It is a figure which shows the relationship between the flow volume of the wash water and revolution frequency in an Example. (a)は従来の吐水装置における公転周波数と洗浄流量の関係を示す図、(b)は公転周波数と洗浄流量の関係を示す図である。(A) is a figure which shows the relationship between the revolution frequency and the washing | cleaning flow volume in the conventional water discharging apparatus, (b) is a figure which shows the relationship between the revolution frequency and the washing | cleaning flow volume. 流路流量比切替機構の分解概略斜視図を示す。The disassembled schematic perspective view of a flow-path flow ratio switching mechanism is shown. 流路流量比切替機構71を、ステータ2aの下側(ロータ2bに接しない側)から覗いて、各連通孔の開放状態を示す図である。It is a figure which shows the open state of each communicating hole seeing the flow-path flow ratio switching mechanism 71 from the lower side (side which does not contact the rotor 2b) of the stator 2a.

符号の説明Explanation of symbols

1 ノズル
62 第一給水部
64 旋回室
64a 上部旋回室
64b 下部旋回室
70 吐水体
71 流路・流量比切替機構(流量調整部)
72 把持体
82 第二給水部
84 開口部


DESCRIPTION OF SYMBOLS 1 Nozzle 62 1st water supply part 64 Swirling chamber 64a Upper swirl chamber 64b Lower swirl chamber 70 Water spouting body 71 Flow path / flow rate ratio switching mechanism (flow rate adjusting unit)
72 Grasping body 82 Second water supply portion 84 Opening portion


Claims (3)

ノズルを備え、給水された洗浄水を前記ノズルから吐出する吐水装置であって、前記ノズルは、洗浄水が流入する旋回室と、前記旋回室の周面に沿って洗浄水を供給する第一給水部と、前記旋回室の上端に設けられた開口部と、一端部が前記開口部側に配置され、しかも内部には前記旋回室に供給された洗浄水を一端部側から吐水可能とする吐水流路が形成された吐水体と、前記吐水体を把持する可撓性の把持体とを備え、前記第一給水部から供給された洗浄水の運動エネルギーにより前記吐水体が前記旋回室内で傾斜した姿勢で首振り運動する吐水装置において、
前記吐水体には前記旋回室の洗浄水を前記吐水流路に給水する給水口が形成され、前記吐水体の給水口に相対する位置に開口部を有し、前記開口部より前記旋回室に洗浄水を給水する第二給水部を有することを特徴とする吐水装置。
A water discharge device that includes a nozzle and discharges supplied cleaning water from the nozzle, the nozzle supplying a cleaning water along a swirling chamber into which the cleaning water flows and a circumferential surface of the swirling chamber. A water supply unit, an opening provided at the upper end of the swirl chamber, and one end portion are disposed on the opening portion side, and the cleaning water supplied to the swirl chamber can be discharged from the one end side inside. A water discharge body in which a water discharge flow path is formed; and a flexible gripping body that holds the water discharge body. The water discharge body is moved in the swirl chamber by the kinetic energy of the cleaning water supplied from the first water supply section. In a water discharge device that swings in an inclined posture,
The water spouting body is formed with a water supply port for supplying the cleaning water of the swirl chamber to the water discharge channel, and has an opening at a position facing the water supply port of the water spouting body. A water discharge device having a second water supply unit for supplying cleaning water.
請求項1記載の吐水装置において、前記第一給水部と前記第二給水部の流量比率を調整する流量調整部を有することを特徴とする吐水装置。   The water discharging apparatus according to claim 1, further comprising a flow rate adjusting unit that adjusts a flow rate ratio between the first water supply unit and the second water supply unit. 請求項1記載の吐水装置において、前記第一給水部と前記第二給水部は前記旋回室の異なる高さ位置に設けたことを特徴とした吐水装置。   The water discharging apparatus according to claim 1, wherein the first water supply section and the second water supply section are provided at different height positions of the swirl chamber.
JP2006181302A 2006-06-30 2006-06-30 Water discharge device Expired - Fee Related JP4889101B2 (en)

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JP5674244B2 (en) * 2011-03-30 2015-02-25 Toto株式会社 Water discharge device

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