JP4901239B2 - 水溶性ガス中の不純物のサンプリング方法 - Google Patents
水溶性ガス中の不純物のサンプリング方法 Download PDFInfo
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- JP4901239B2 JP4901239B2 JP2006046113A JP2006046113A JP4901239B2 JP 4901239 B2 JP4901239 B2 JP 4901239B2 JP 2006046113 A JP2006046113 A JP 2006046113A JP 2006046113 A JP2006046113 A JP 2006046113A JP 4901239 B2 JP4901239 B2 JP 4901239B2
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- water
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- impurities
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Description
Claims (1)
- 水溶性ガス中に含まれている不純物を捕集液中に捕捉するサンプリング方法において、温度を調節して前記水溶性ガスの飽和濃度を調節した前記捕集液中に前記水溶性ガスを流通させて前記水溶性ガスを加水分解させることにより前記不純物を捕集液中に捕捉する加水分解段階と、前記水溶性ガスが飽和状態となった捕集液中に継続して水溶性ガスを流通させ、水溶性ガスの過飽和状態で前記不純物を捕集液中に溶解させて捕捉する溶解段階とを行うことを特徴とする水溶性ガス中の不純物のサンプリング方法。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006046113A JP4901239B2 (ja) | 2006-02-23 | 2006-02-23 | 水溶性ガス中の不純物のサンプリング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006046113A JP4901239B2 (ja) | 2006-02-23 | 2006-02-23 | 水溶性ガス中の不純物のサンプリング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007225404A JP2007225404A (ja) | 2007-09-06 |
| JP4901239B2 true JP4901239B2 (ja) | 2012-03-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006046113A Expired - Fee Related JP4901239B2 (ja) | 2006-02-23 | 2006-02-23 | 水溶性ガス中の不純物のサンプリング方法 |
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| JP (1) | JP4901239B2 (ja) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101076359B1 (ko) | 2009-05-29 | 2011-10-25 | 주식회사 에이에스피 | 실란 또는 할로겐화실란 미량원소 분석 전처리 장치 |
| CN103033438B (zh) * | 2012-11-21 | 2015-02-25 | 苏州金宏气体股份有限公司 | 检测高纯及超纯氨中总不挥发物质含量的方法 |
| JP7591031B2 (ja) * | 2019-08-26 | 2024-11-27 | パーティクル・メージャーリング・システムズ・インコーポレーテッド | トリガされるサンプリングシステム及び方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06117977A (ja) * | 1992-10-01 | 1994-04-28 | Sharp Corp | 気体捕集装置 |
| JPH06148041A (ja) * | 1992-10-30 | 1994-05-27 | Sharp Corp | 雰囲気中金属不純物の捕集方法及びその捕集装置 |
| JPH06174612A (ja) * | 1992-12-01 | 1994-06-24 | Mitsubishi Corp | 不純物捕集装置 |
| JPH0894504A (ja) * | 1994-09-20 | 1996-04-12 | Mitsubishi Corp | 不純物捕集装置 |
| JPH0989732A (ja) * | 1995-09-21 | 1997-04-04 | Toshiba Corp | ガスの生成方法、ガスの生成装置及びこれを用いた気相成長装置 |
| JPH10296031A (ja) * | 1997-04-25 | 1998-11-10 | Hitachi Ltd | 大気サンプリング装置 |
| US5882378A (en) * | 1997-07-25 | 1999-03-16 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method to detect metal impurities in the semiconductor process gases |
| JP2000338098A (ja) * | 1999-05-25 | 2000-12-08 | Shin Etsu Chem Co Ltd | 加水分解性成分含有気体材料中の該成分の連続的定量方法 |
| JP2001201439A (ja) * | 2000-01-20 | 2001-07-27 | Fujitsu Ltd | 雰囲気汚染物質の試料採取装置及び試料採取方法 |
| JP2002148156A (ja) * | 2000-11-08 | 2002-05-22 | Nippon Sanso Corp | 金属不純物のサンプリング容器 |
| JP2003302317A (ja) * | 2002-04-11 | 2003-10-24 | Oki Electric Ind Co Ltd | 気中化学汚染不純物成分の捕集方法 |
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2006
- 2006-02-23 JP JP2006046113A patent/JP4901239B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
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| JP2007225404A (ja) | 2007-09-06 |
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