JP4908566B2 - Method for manufacturing low contact resistance contacts on high transition temperature superconductors - Google Patents
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- 239000002887 superconductor Substances 0.000 title claims description 47
- 230000007704 transition Effects 0.000 title claims description 29
- 238000000034 method Methods 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 178
- 229910052709 silver Inorganic materials 0.000 claims description 121
- 239000004332 silver Substances 0.000 claims description 120
- 239000011888 foil Substances 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 39
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000007921 spray Substances 0.000 claims description 37
- 229910052797 bismuth Inorganic materials 0.000 claims description 22
- 229910052745 lead Inorganic materials 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 description 38
- 239000010949 copper Substances 0.000 description 25
- 150000003378 silver Chemical class 0.000 description 13
- 239000000523 sample Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Description
本発明は、Tc(臨界温度)以下での大電流輸送のためのBiPbSrCaCuOからなるHTSC(高転移温度超伝導体化合物)固体本体の低接点抵抗接合部の開発に関する。このチューブ/ロッド状のHTSC伝導体、Bi(2223)(BiPbSrCaCuO)は77Kで非常に大きな電流を流すことができ、そしてその低熱伝導率により系において非常に低い熱損失を発生する。さらにこのHTSCと電流導線の間の接点抵抗が低い場合、これらのチューブ/ロッド状の伝導体は、凍結剤フリーの超伝導磁石/超伝導磁力発生器等のようなあらゆるシステムのための理想的な大電流輸送導線となる。 The present invention relates to the development of a low contact resistance junction of an HTSC (High Transition Temperature Superconductor Compound) solid body composed of BiPbSrCaCuO for high current transport below Tc (critical temperature). This tube / rod shaped HTSC conductor, Bi (2223) (BiPbSrCaCuO), can carry very large currents at 77K and generates very low heat losses in the system due to its low thermal conductivity. In addition, if the contact resistance between the HTSC and the current conductor is low, these tube / rod conductors are ideal for any system such as a cryogen-free superconducting magnet / superconducting magnet generator etc. A large current carrying conductor.
Cu、Al等のような従来の伝導体における大電流伝送のパラメータは、たいていはこの伝導体の抵抗によるものであり、これは相当な量のエネルギー損失を生じる。損失の少ない電流輸送は非常に初期から超伝導の魅力の主要な点でありつづけている。低いTcの従来の超伝導材料が高い界磁石(フィールドマグネット)(〜20テスラ)の製造で使用されてきており、これは現在容易に入手できる。運転温度、すなわち4.2K(液体ヘリウムの定常的な流れを必要とする)は大電流輸送の導線及びケーブルが大きくなることを妨げてきた。大輸送電流に関してこの分野における進歩は試作品レベルまでのみに制限されている。高いTcの超伝導化合物(HTSC)の出現により、運転温度が77Kに上げられるような大輸送電流導線に対する期待が高まってきている。しかしながら、乏しい柔軟性と低い臨界磁場が差し迫った用途に制限を加えてきた。しかしながら、77K、0.6Tの磁場で〜105A/cm2のJcを有するBi(2223)のHTSCマルチフィラメント(多芯)のケーブルの発達が良好な見込みを見せたが、この場合もやはりまさに従来型の答えではなかった。比較すると、この高いTc超伝導体からなるチューブ状の伝導体は良好な潜在性を示している。BSCCOチューブとロッドをベースとしたHTC電流導線は、電力エンジニアリングにおけるセラミック超伝導体の最初の応用であり、Cu及びAlのような良好な伝導体である伝統的な全ての金属導線と、同様に従来の超伝導体とをともに超える、大きな利点を提供する。銅に埋め込まれた従来の低いTcの超伝導体は、その零抵抗および臨界電流密度Jc(〜105A/cm2)によって定まる大電流を輸送する能力のせいで、全ての金属導線を超えるさらに良い選択肢であると考えられた。しかし4.2Kでの運転という制限のせいで、これらの材料はCuまたはAlに必ずしも取って代わっていない。 The parameters of high current transmission in conventional conductors such as Cu, Al, etc. are mostly due to the resistance of this conductor, which results in a considerable amount of energy loss. Lossless current transport has been a key feature of superconductivity from the very beginning. Conventional superconducting materials with low Tc have been used in the manufacture of high field magnets (~ 20 Tesla), which are now readily available. The operating temperature, 4.2K (requiring a steady flow of liquid helium) has prevented large current carrying wires and cables from growing. Advances in this area with respect to large transport currents are limited only to the prototype level. With the advent of high Tc superconducting compounds (HTSC), expectations are increasing for high transport current conductors where the operating temperature can be increased to 77K. However, poor flexibility and low critical magnetic field have limited the use imminently. However, the development of Bi (2223) HTSC multifilament (multi-core) cable with a Jc of -10 5 A / cm 2 in a magnetic field of 77K and 0.6T showed good prospects. It wasn't exactly the traditional answer. By comparison, the tubular conductor made of this high Tc superconductor shows good potential. BSCCO tube and rod based HTC current conductors are the first application of ceramic superconductors in power engineering, as well as all traditional metal conductors that are good conductors such as Cu and Al It offers significant advantages over both conventional superconductors. Conventional low Tc superconductors embedded in copper surpass all metal conductors due to their ability to transport large currents determined by their zero resistance and critical current density Jc (˜10 5 A / cm 2 ). It was considered a better option. However, due to the limitation of operating at 4.2K, these materials do not necessarily replace Cu or Al.
77Kというより高い運転温度に加えて、このHTSC材料は低い熱伝導率を有し、これにより熱損失が通常の1/10未満となる。これは極低温の系での熱負荷を減少させ、結果として相当な冷却コストの減少になり、そして新しい革新的な冷却コンセプトを可能にする。それらの他の用途は磁気シールドおよび電流制限器の分野においてである。 In addition to the higher operating temperature of 77K, this HTSC material has a low thermal conductivity, which results in a heat loss of less than 1/10 of the usual. This reduces the heat load in the cryogenic system, resulting in a significant reduction in cooling costs and enables a new and innovative cooling concept. Their other use is in the field of magnetic shielding and current limiters.
このHTSCチューブ伝導体に大電流を給電する通常の伝導体(Cu、Al)からなる接合部の接点抵抗が10−4〜10−3Ωのオーダーである場合、全ての上記のようなHTSCチューブ伝導体を大電流用途(Ic>1000A)のために使用することは非効率的になりそして損失が多くなる。チューブ状の伝導体を最適に利用するために要求されることは、HTSCチューブ伝導体に接合する通常の伝導体の接点抵抗は少なくとも10−6Ωのオーダーにすべきということである。 When the contact resistance of a junction made of a normal conductor (Cu, Al) that supplies a large current to the HTSC tube conductor is on the order of 10 −4 to 10 −3 Ω, all the above HTSC tubes Using conductors for high current applications (Ic> 1000A) becomes inefficient and lossy. What is required in order to make optimal use of tubular conductors is that the contact resistance of conventional conductors joined to HTSC tube conductors should be on the order of at least 10 −6 Ω.
KH SandhageらによるJournal of Materials、Vol43、pp21(1991)の開示を参照してもよく、ここでHTSCファミリーの中で、Yベース超伝導体はチューブ状およびロッド状の伝導体を合成するためには多くの結晶学上の制限に苦心しており、薄膜の用途のみが商業化されていることが示される。さらにEH HellstormのMaterila Research Bulletin Vol XVII、pp45、(1992)による別の開示において、Tlベースの超伝導体は健康への危険性のせいでバルク用途のためには使用されていないことが示されている。S X Dou及びH K LiuによるSupercond.Science and Technol Vol6、pp297、(1993)の報告によると、Biベースの超伝導体(Bi2−X,PbXSr2Ca2Cu3Ox)及びBi(2212)のみが商業的に経済的でありそして好適な答えである。 Reference may be made to the disclosure of Journal of Materials, Vol 43, pp21 (1991) by KH Sandhage et al., Where within the HTSC family, Y-based superconductors are used to synthesize tubular and rod-like conductors. Struggles with many crystallographic limitations, indicating that only thin film applications are commercialized. In addition, another disclosure by EH Hellstorm's Materia Research Bulletin Vol XVII, pp45, (1992) shows that Tl-based superconductors are not used for bulk applications due to health risks. ing. Supercond. By S X Dou and H K Liu. Science and Technol Vol 6, pp 297, (1993) reports that only Bi-based superconductors (Bi 2 -X, Pb X Sr 2 Ca 2 Cu 3 O x ) and Bi (2212) are commercially economical. And is the preferred answer.
この大電流電気接合についての接点抵抗の問題は、Biベースのチューブ伝導体に大電流を給電する通常の伝導体として銀を使用することによってのみ解決が可能である。これの大きな問題はBi(2223)セラミック表面に銀の給電器を接続することである。 This contact resistance problem for high current electrical junctions can only be solved by using silver as the normal conductor for feeding high currents to Bi based tube conductors. The major problem with this is connecting a silver feeder to the Bi (2223) ceramic surface.
この問題は部分的にいくつかの方法で取り組まれてきた。 This problem has been addressed in several ways.
米国特許第5,149,686号及び米国特許(出願番号20030132023)は電気的接点を作製するために、非超伝導金属(Ag、Au)をマイクロメートルのオーダーの小さなバー形状のHTSCにスパッタリングをすることを開示する。 US Pat. No. 5,149,686 and US Pat. No. 20030132023 sputter non-superconducting metals (Ag, Au) on small bar-shaped HTSCs on the order of micrometers to make electrical contacts. To disclose.
マイクロメートルのオーダーのHTSCへのAg/Auフィルムのプラズマスプレー技術がY YamadaによりBismuth Based High Temperature Superconductors(編集 H Maeda及びT Togano) pp277(1996)で開示されている。 Plasma spray technology of Ag / Au film onto micrometer order HTSC is disclosed by Y Yamada in Bismuth Based High Temperature Superconductors (Editor H Maeda and T Togano) pp 277 (1996).
それからこの大電流給電器はHTSC表面にハンダ付けされそして77Kで10−6Ωオーダーの接点抵抗が得られている。 The high current feeder is then soldered to the HTSC surface and a contact resistance on the order of 10 −6 Ω is obtained at 77K.
小さいサンプルの場合には、スパッタリング技術が成功してきているが、特にビスマスベースの大きなサンプルの場合(例えばチューブ/ロッド状伝導体)には、プラズマ付着が使用される。 Sputtering techniques have been successful for small samples, but plasma deposition is used, especially for large samples based on bismuth (eg, tube / rod conductors).
米国特許番号5,506,199号およびK K MichishitaらのBismuth Based High Temperature Superconductors(編集 H Maeda及びT Togano) pp253(1996)はAgチューブ、シートまたはワイヤーをBi2212溶融物の大きなサンプルに部分的に入れることによるプロセスを開示する。 US Patent No. 5,506,199 and KK Michishita et al. Bismuth Based High Temperature Superconductors (edited H Maeda and T Togano) pp253 (1996) is a large sample of Ag22, sheet or wire in Bi2212 melt. Disclose the process by including.
本発明の主目的は上述の欠点を取り除く、高転移温度超伝導体に低接点抵抗の接点(コンタクト)を製造する方法を提供することである。 The main object of the present invention is to provide a method for producing a low contact resistance contact in a high transition temperature superconductor which eliminates the above-mentioned drawbacks.
本発明の別の目的は高転移温度超伝導体に低接点抵抗の接合部(ジョイント)を製造するための三層プロセスを提供することである。 Another object of the present invention is to provide a three-layer process for producing low contact resistance joints in high transition temperature superconductors.
本発明のさらに別の目的はBiCaCuO超伝導体に対して低接点抵抗を提供することである。 Yet another object of the present invention is to provide low contact resistance for BiCaCuO superconductors.
本発明のさらなる目的はチューブ状のHTSCに対して接点を提供することである。 A further object of the present invention is to provide a contact for a tubular HTSC.
本発明のさらに進んだ目的はロッド状のHTSCに対して接点を提供することである。 A further object of the present invention is to provide a contact for a rod-shaped HTSC.
本発明のまた別の目的は10−7〜10−6Ωの範囲にある接点抵抗を有する接点を提供することである。 Another object of the present invention is to provide a contact having a contact resistance in the range of 10 −7 to 10 −6 Ω.
本発明は高転移温度超伝導体(HTSC)に向けた、特に超伝導体中に銀を含むこともあり含まないこともある(Bi,Pb)2Sr2Ca2Cu3O10+xに向けた接触点を製造するための三層プロセスを表す。この接点構造は金属スプレーガンによる二の付着銀層の間に挟まれた穿孔された銀ホイルを伴い、続いて空気中で熱処理をうける三層構造である。この接点はチューブ及びロッドの上に製造されている。この作製された銀の接点は10−6Ωの低抵抗という特徴を有する。さらに、この接点はHTSCを冷却するために使用される凍結剤に実質的な熱負荷を加えることなく200アンペアの連続電流を流すことが可能である。 The present invention is directed to high transition temperature superconductors (HTSC), and in particular to (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x , which may or may not contain silver in the superconductor. Fig. 3 represents a three-layer process for producing contact points. This contact structure is a three-layer structure with a perforated silver foil sandwiched between two deposited silver layers by a metal spray gun, followed by heat treatment in air. This contact is made on the tube and rod. The fabricated silver contact is characterized by a low resistance of 10 −6 Ω. In addition, this contact can carry a continuous current of 200 amps without adding a substantial heat load to the cryogen used to cool the HTSC.
従って、本発明は該超伝導体の端部に溝をつくること、第一銀層を金属スプレーガンにより120℃の温度で付着すること、前記の付着銀層を200〜250℃の温度範囲で2〜5時間の範囲の時間加熱すること、穿孔された銀ホイルを前記加熱された第一銀層に巻くこと、第二銀層を金属スプレーガンにより120℃の温度で付着すること、前記第一銀層と巻いた穿孔銀ホイルと第二銀層とを組み合わせたものを830〜850℃の温度範囲で空気中で100〜150時間の範囲の時間加熱し結果として10−7〜10−6Ωの範囲にある接点抵抗を有する接合部を得ること、を含む高転移温度超伝導体に低接点抵抗の接点を製造する方法を提供する。 Therefore, in the present invention, a groove is formed at the end of the superconductor, the first silver layer is deposited by a metal spray gun at a temperature of 120 ° C., and the deposited silver layer is deposited at a temperature range of 200 to 250 ° C. Heating for a period ranging from 2 to 5 hours, winding a perforated silver foil around the heated first silver layer, depositing a second silver layer with a metal spray gun at a temperature of 120 ° C., A combination of one silver layer, a wound perforated silver foil and a second silver layer was heated in air at a temperature range of 830 to 850 ° C. for 100 to 150 hours, resulting in 10 −7 to 10 −6. Obtaining a junction having a contact resistance in the range of Ω provides a method of manufacturing a low contact resistance contact on a high transition temperature superconductor.
本発明の実施態様において、高転移温度超伝導体が長さ200〜300mmの範囲にある中空筒状チューブであってもよい。 In an embodiment of the present invention, the high transition temperature superconductor may be a hollow cylindrical tube having a length in the range of 200 to 300 mm.
本発明の別の実施態様において、高転移温度超伝導体が長さ150mmの中実ロッドであってもよい。 In another embodiment of the present invention, the high transition temperature superconductor may be a solid rod having a length of 150 mm.
本発明のさらに別の実施態様において、チューブの壁厚が2〜3mmの範囲にあってもよい。 In yet another embodiment of the invention, the tube wall thickness may be in the range of 2-3 mm.
本発明のさらなる別の実施態様において、チューブの外径が12〜30mmの範囲にあってもよい。 In yet another embodiment of the present invention, the outer diameter of the tube may be in the range of 12-30 mm.
本発明のさらなる別の実施態様において、高転移温度超伝導体が純粋な(Bi,Pb)2Sr2Ca2Cu3O10+xであってもよい。 In still another embodiment of the present invention, the high transition temperature superconductor may be pure (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x .
本発明のさらに進んだ実施態様において、高転移温度超伝導体が10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+xであってもよい。 In a further embodiment of the present invention, the high transition temperature superconductor may be (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x with 10 % by weight silver.
高転移温度超伝導体(HTSC)への低接点抵抗の接合部を作製するために、二つのタイプのサンプルを採用した、すなわちチューブ状及び/またはロッド状のHTSCである。図1はHTSCサンプル(1)を示す。このチューブの径は200〜300mmの範囲にあり、12〜30mmの範囲にある外径、および2〜3mmの範囲にある壁厚を伴う。チューブの端部は機械加工され、概して20mmの長さの溝(2)を得る。これらの溝に接点が作製された。ロッドサンプルは長さ150mm、そして径が3〜5mmの範囲の寸法であった。使用したHTSCサンプルは純粋な(Bi,Pb)2Sr2Ca2Cu3O10+xのもの及び10質量%の銀を伴ったものであった。 Two types of samples have been employed to make low contact resistance junctions to high transition temperature superconductors (HTSCs): tube-shaped and / or rod-shaped HTSC. FIG. 1 shows an HTSC sample (1). The tube diameter is in the range of 200-300 mm, with an outer diameter in the range of 12-30 mm, and a wall thickness in the range of 2-3 mm. The end of the tube is machined to obtain a groove (2) that is generally 20 mm long. Contacts were made in these grooves. The rod sample was 150 mm long and had a diameter in the range of 3-5 mm. The HTSC samples used were pure (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x and with 10% by weight silver.
接点を作製する方法は以下に記載される。 Methods for making the contacts are described below.
接点の構造を図1に示す。銀(3)金属の第一層を、チューブの温度を約120℃に上げ、金属スプレーガンの助けをかりて、溝(2)に付着させた。この銀層を250〜300℃の温度範囲で、2〜5時間の範囲の時間、空気中で加熱した。次に銀ホイル(4)を採用し、一表面はギザギザ(knurled)であって、そして第一スプレー付着銀層の周りに巻いた。このギザギザの表面が第一層に接しつづけるようにした。このホイルは1〜1.5mmの範囲の径の等間隔の孔で穿孔した。そして最大18の孔を3つの段で開けた。帯(ストリップ)は幅2cmで、長さ4〜6cmの範囲であった。外部接点を作製するために小さな巻かれない部分(6)を残して、ホイルを完全に巻いた後に、銀の第三層(5)を、HTSCサンプルの温度を120℃に維持した状態で、金属スプレーガンの助けをかりて、付着させた。最終の接点システムは、空気中で、100〜150時間の範囲の時間、830〜850℃の温度範囲で加熱した。その後このHTSCサンプルを冷却した。これら全てのサンプルの外部接続は編んだ銅線によって銀の金属リングへ接続した。 The structure of the contact is shown in FIG. A first layer of silver (3) metal was deposited in the groove (2) with the tube temperature raised to about 120 ° C. and with the aid of a metal spray gun. The silver layer was heated in air at a temperature range of 250-300 ° C. for a time in the range of 2-5 hours. A silver foil (4) was then employed, one surface was knurled and wound around the first spray deposited silver layer. The jagged surface was kept in contact with the first layer. The foil was perforated with equally spaced holes with a diameter ranging from 1 to 1.5 mm. And up to 18 holes were drilled in 3 steps. The strip was 2 cm wide and 4-6 cm long. After completely winding the foil, leaving a small unrolled portion (6) to make the external contacts, the silver third layer (5) was maintained with the HTSC sample temperature maintained at 120 ° C. Adhered with the help of a metal spray gun. The final contact system was heated in air at a temperature range of 830-850 ° C. for a time in the range of 100-150 hours. The HTSC sample was then cooled. The external connections for all these samples were connected to a silver metal ring by braided copper wire.
この上記手順で作製された接点の抵抗率は4点プローブ法により測定し、そして表−1にまとめた。 The resistivity of the contacts made by this procedure was measured by the 4-point probe method and summarized in Table-1.
4点プローブ法のために、電圧タップは電流接点の近くで超伝導体に直接ハンダづけした。2つのワイヤーをその電流接点に取り付け、一方は電流を流すためのものであり、他方は接点の表面における電圧を検知するためのものであった。他方の電圧タップは電流接点の近くで超伝導体に直接ハンダづけした。測定精度は約±10%であった。測定はサンプル温度が77Kと4.2Kで、磁場がある場合とない場合の両方で行った。 For the 4-point probe method, the voltage tap was soldered directly to the superconductor near the current contact. Two wires were attached to the current contact, one for flowing current and the other for detecting the voltage at the surface of the contact. The other voltage tap was soldered directly to the superconductor near the current contact. The measurement accuracy was about ± 10%. Measurements were taken with sample temperatures of 77K and 4.2K, both with and without a magnetic field.
金属スプレーガンによって付着した第一層と穿孔銀ホイルとから本質的に構成される二層構造も随意的に用意した。最終組み立て品は空気中で830〜850℃の温度範囲で100〜150時間の範囲の時間加熱した。しかしながら、接点抵抗は10−5Ωの範囲であることを観測した。 A two-layer structure consisting essentially of a first layer deposited by a metal spray gun and perforated silver foil was also optionally provided. The final assembly was heated in air at a temperature range of 830-850 ° C. for a time in the range of 100-150 hours. However, the contact resistance was observed to be in the range of 10 −5 Ω.
低い比抵抗の材料およびHTSCケーブルは77Kにおいて大電流輸送を要求する超伝導磁石や他の非超伝導装置にエネルギーを与えるために使用することが可能である。銅の比抵抗は10−9Ω−mのオーダーである。チューブ状の伝導体の特徴は材料の零損失および低熱伝導率によるものである。 Low resistivity materials and HTSC cables can be used to energize superconducting magnets and other non-superconducting devices that require high current transport at 77K. The specific resistance of copper is on the order of 10 −9 Ω-m. The characteristics of the tubular conductor are due to the zero loss of the material and the low thermal conductivity.
特に電流輸送において非常に低い出力損失または低い熱負荷を要求する装置、つまりは低接点抵抗のチューブ伝導体が不可欠である。例えばその閉回路系が10Kの温度を発する凍結剤フリーの磁力系の場合のように、1Wより大きなあらゆる熱負荷が有害となり、チューブ状の伝導体だけが使用される。 In particular, devices that require very low power loss or low heat load in current transport, ie low contact resistance tube conductors, are essential. Any heat load greater than 1 W is detrimental, such as in the case of a cryogen-free magnetic system whose closed circuit system emits a temperature of 10K, and only a tubular conductor is used.
低接点抵抗の接合部の重要性はこれらの装置において極めて重大である。また低い熱伝導率は銅の1/10であり、大輸送電流を従来どおりに使用する場合の凍結剤の損失を避けるための第一候補となる。 The importance of low contact resistance joints is critical in these devices. In addition, the low thermal conductivity is 1/10 that of copper, which is a first candidate for avoiding the loss of the freezing agent when a large transport current is used as usual.
本発明の新規性は10−7〜10−6Ωの低接点抵抗、及び凍結剤に全く熱負荷を加えることなく少なくとも2時間連続的に200アンペアの電流移送する能力にある。 The novelty of the present invention lies in the low contact resistance of 10 −7 to 10 −6 Ω and the ability to carry a current of 200 amps continuously for at least 2 hours without any heat load on the cryogen.
前記新規性は、三層を組み立てる工程を採用すること、及び金属スプレーガンによる付着銀層の間に挟んだ穿孔銀ホイルを使用することという自明でない進歩性によって得られる。 The novelty is obtained by the unobvious inventive step of adopting the process of assembling three layers and using perforated silver foil sandwiched between deposited silver layers by a metal spray gun.
以下の例は説明だけの目的で挙げられており、本発明の範囲を限定するように解釈されるべきでない。 The following examples are given for illustrative purposes only and should not be construed to limit the scope of the invention.
例1
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは305mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザ(knurled)であった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場での接点抵抗を測定し、そして得られた値は5.1x10−6Ωであった。
Example 1
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 305 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. A first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was knurled. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance at zero applied magnetic field at 77 K was measured and the value obtained was 5.1 × 10 −6 Ω.
例2
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは300mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場での接点抵抗を測定し、そして得られた値は2.02x10−7Ωであった。
Example 2
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 300 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance at zero applied magnetic field at 77 K was measured and the value obtained was 2.02 × 10 −7 Ω.
例3
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは300mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。4.2Kで零印加磁場で測定した接点抵抗は1.5x10−8Ωであった。
Example 3
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 300 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured with a zero applied magnetic field at 4.2 K was 1.5 × 10 −8 Ω.
例4
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは300mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで0.09テスラの印加磁場で測定した接点抵抗は4.8x10−7Ωであった。
Example 4
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 300 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77 K with an applied magnetic field of 0.09 Tesla was 4.8 × 10 −7 Ω.
例5
銀を伴わない(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは300mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場で測定した接点抵抗は6.09x10−7Ωであった。
Example 5
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor without silver was employed and a groove was made at the end. The length of the tube was 300 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77 K with zero applied magnetic field was 6.09 × 10 −7 Ω.
例6
銀を伴わない(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは300mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は2.4mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。4.2Kで零印加磁場で測定した接点抵抗は8.5x10−8Ωであった。
Example 6
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor without silver was employed and a groove was made at the end. The length of the tube was 300 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 2.4 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured with a zero applied magnetic field at 4.2 K was 8.5 × 10 −8 Ω.
例7
銀を伴わない(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは305mmであり、そしてこのチューブの外径は12.4mmであり、壁厚は1mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで0.03テスラの印加磁場で測定した接点抵抗は9.5x10−7Ωであった。
Example 7
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor without silver was employed and a groove was made at the end. The length of the tube was 305 mm and the outer diameter of the tube was 12.4 mm and the wall thickness was 1 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77 K with an applied magnetic field of 0.03 Tesla was 9.5 × 10 −7 Ω.
例8
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは200mmであり、そしてこのチューブの外径は30.8mmであり、壁厚は2.8mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場で測定した接点抵抗は3.8x10−7Ωであった。
Example 8
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 200 mm and the outer diameter of the tube was 30.8 mm and the wall thickness was 2.8 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77 K with zero applied magnetic field was 3.8 × 10 −7 Ω.
例9
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のチューブを採用し、そしてその端部に溝を作製した。このチューブの長さは200mmであり、そしてこのチューブの外径は30.8mmであり、壁厚は2.8mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。4.2Kで零印加磁場で測定した接点抵抗は2.3x10−8Ωであった。
Example 9
A tube of (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor with 10% by weight of silver was employed and a groove was made at the end. The length of the tube was 200 mm and the outer diameter of the tube was 30.8 mm and the wall thickness was 2.8 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured with a zero applied magnetic field at 4.2 K was 2.3 × 10 −8 Ω.
例10
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のロッドを採用し、そしてその端部に溝を作製した。このロッドの長さは150mmであり、そしてこの外径は3mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場で測定した接点抵抗は3.7x10−7Ωであった。
Example 10
A (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor rod with 10% by weight silver was employed and a groove was made at the end. The rod length was 150 mm and the outer diameter was 3 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77K and zero applied magnetic field was 3.7 × 10 −7 Ω.
例11
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のロッドを採用し、そしてその端部に溝を作製した。このロッドの長さは150mmであり、そしてこの外径は3mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。4.2Kで零印加磁場で測定した接点抵抗は4.05x10−8Ωであった。
Example 11
A (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor rod with 10% by weight silver was employed and a groove was made at the end. The rod length was 150 mm and the outer diameter was 3 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured with a zero applied magnetic field at 4.2 K was 4.05 × 10 −8 Ω.
例12
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のロッドを採用し、そしてその端部に溝を作製した。このロッドの長さは150mmであり、そしてこの外径は5mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。77Kで零印加磁場で測定した接点抵抗は3.0x10−7Ωであった。
Example 12
A (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor rod with 10% by weight silver was employed and a groove was made at the end. The rod length was 150 mm and the outer diameter was 5 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured at 77 K with a zero applied magnetic field was 3.0 × 10 −7 Ω.
例13
10質量%の銀を伴う(Bi,Pb)2Sr2Ca2Cu3O10+x高転移温度超伝導体のロッドを採用し、そしてその端部に溝を作製した。このロッドの長さは150mmであり、そしてこの外径は5mmであった。第一銀層をこの溝に熱金属スプレーガンにより120℃の温度で付着し、続けて250℃の温度で2時間加熱した。幅2cmの銀金属ホイルを採用し、そして孔径1mmの18個の孔の穿孔を3つの段それぞれに行った。このホイルの一表面はギザギザであった。それからこの銀ホイルのギザギザの面が第一銀層に接触する状態で、このホイルを第一銀層の周りに巻いた。その後にこの第二銀層を熱金属スプレーガンにより120℃の温度で第一銀層と巻いた穿孔銀ホイルとを組み合わせたものに付着した。この三層構造の全体を空気中で100時間830℃で焼結した。この銀接点への電気接点を確立するために、端部に穿孔された銀ホイルの端部に孔を開け、そして大電流導線を接続した。4.2Kで零印加磁場で測定した接点抵抗は4.7x10−8Ωであった。
Example 13
A (Bi, Pb) 2 Sr 2 Ca 2 Cu 3 O 10 + x high transition temperature superconductor rod with 10% by weight silver was employed and a groove was made at the end. The rod length was 150 mm and the outer diameter was 5 mm. The first silver layer was deposited in this groove by a hot metal spray gun at a temperature of 120 ° C. and subsequently heated at a temperature of 250 ° C. for 2 hours. A silver metal foil with a width of 2 cm was employed, and 18 holes with a hole diameter of 1 mm were drilled in each of the three stages. One surface of this foil was jagged. The foil was then wrapped around the first silver layer with the jagged surface of the silver foil in contact with the first silver layer. This second silver layer was then adhered to a combination of the first silver layer and the wound perforated silver foil at a temperature of 120 ° C. with a hot metal spray gun. The entire three-layer structure was sintered in air at 830 ° C. for 100 hours. In order to establish an electrical contact to this silver contact, a hole was drilled at the end of the silver foil drilled at the end and a high current conductor was connected. The contact resistance measured with a zero applied magnetic field at 4.2 K was 4.7 × 10 −8 Ω.
前述の例に記載された手順で作製した接点の抵抗率は4点プローブ法で測定し、そして表−1にまとめた。 The resistivity of the contacts made by the procedure described in the previous example was measured by the 4-point probe method and summarized in Table-1.
4点プローブ法のために、電圧タップは電流接点の近くで超伝導体に直接ハンダづけした。2つのワイヤーをその電流接点に取り付け、一方は電流を流すためのものであり、他方は接点の表面における電圧を検知するためのものであった。他方の電圧タップは電流接点の近くで超伝導体に直接ハンダづけした。測定精度は約±10%であった。 For the 4-point probe method, the voltage tap was soldered directly to the superconductor near the current contact. Two wires were attached to the current contact, one for flowing current and the other for detecting the voltage at the surface of the contact. The other voltage tap was soldered directly to the superconductor near the current contact. The measurement accuracy was about ± 10%.
これらの全てのサンプルの外部接続は編んだ銅線によって銀の金属リングへ接続した。 The external connections for all these samples were connected to a silver metal ring by braided copper wire.
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